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CN116445854A - Superlattice tough high-entropy alloy nitride ceramic coating and preparation method thereof - Google Patents

Superlattice tough high-entropy alloy nitride ceramic coating and preparation method thereof Download PDF

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CN116445854A
CN116445854A CN202310108958.1A CN202310108958A CN116445854A CN 116445854 A CN116445854 A CN 116445854A CN 202310108958 A CN202310108958 A CN 202310108958A CN 116445854 A CN116445854 A CN 116445854A
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superlattice
entropy alloy
nitride ceramic
ceramic coating
argon
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易思广
卢文壮
赵东旭
潘家港
张云鹏
杜星祝
孙玉利
左敦稳
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Nanjing University of Aeronautics and Astronautics
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Abstract

A superlattice tough high-entropy alloy nitride ceramic coating and a preparation method thereof are characterized in that the coating is formed by alternately arranging two high-entropy alloy nitride ceramics with face-centered cubic (fcc) structures in a nano-scale thickness. The hardness of the superlattice high-entropy alloy nitride ceramic coating obtained after annealing at 750 ℃ for one hour is more than 40GPa, the requirement of superhard material is met, and the fracture toughness exceeds 5MPa m 1/2 The effect of simultaneously hardening and toughening the high-entropy nitride ceramic film is realized. The superlattice tough high-entropy alloy nitride ceramic coating provided by the invention is processed in advanceHas wide application prospect in the fields of tools, aerospace equipment and the like.

Description

一种超晶格强韧高熵合金氮化物陶瓷涂层及制备方法A superlattice tough high-entropy alloy nitride ceramic coating and its preparation method

技术领域technical field

本发明涉及材料表面涂层技术领域,尤其是一种陶瓷涂层技术,具体地说是一种超晶格强韧高熵合金氮化物陶瓷涂层及制备方法和应用。The invention relates to the technical field of material surface coatings, in particular to a ceramic coating technology, in particular to a superlattice tough high-entropy alloy nitride ceramic coating and its preparation method and application.

背景技术Background technique

传统的过渡金属氮化物陶瓷,如TiN、TiAlN和CrAlN等,因具有高硬度、高弹性模量和高耐磨性等优异的力学性能,以及高熔点、耐烧蚀等高温稳定性能,在刀具、模具等机械制造以及航空、航天、核能等高端装备领域广泛应用。在机械制造中,高硬度显然是一个非常受追捧的特性,因为它可以防止刀具在极端工作压力下的磨损,以延长其寿命并提高加工性能。通常,硬度增强是通过限制位错和滑移、减少材料中的塑性变形来实现,然而,这会导致材料脆化、抗损伤容限显著降低。因此,为了提高涂层工具的耐用性,有必要设计具有强韧特性的涂层材料。Traditional transition metal nitride ceramics, such as TiN, TiAlN and CrAlN, have excellent mechanical properties such as high hardness, high elastic modulus and high wear resistance, as well as high temperature stability such as high melting point and ablation resistance. , Die and other machinery manufacturing and aviation, aerospace, nuclear energy and other high-end equipment fields are widely used. High hardness is obviously a highly sought-after characteristic in machine building, as it prevents the tool from wearing out under extreme working pressures to prolong its life and improve machining performance. Typically, hardness enhancement is achieved by confining dislocations and slip, reducing plastic deformation in the material, however, this leads to embrittlement of the material and a significant reduction in damage tolerance. Therefore, in order to improve the durability of coated tools, it is necessary to design coating materials with strong and tough properties.

自2004年以来,高熵合金的出现突破了传统的材料设计理念,大大拓展了成分空间。随着Rost等人首次报道的高熵氧化物(MgNiCoCuZn)O,“高熵”的概念被引入陶瓷中,并激发了高熵陶瓷的研究兴趣。高熵陶瓷是基于间隙相的固溶体,含有4种或更多种金属元素,由于熵稳定性赋予高熵氮化物独特的物理和机械性能,使得它们在硬度、断裂韧性、耐腐蚀性和高温稳定性方面超过了传统的氮化物陶瓷,因此高陶瓷引起了越来越多的关注。Since 2004, the emergence of high-entropy alloys broke through the traditional concept of material design and greatly expanded the composition space. With the high-entropy oxide (MgNiCoCuZn)O first reported by Rost et al., the concept of "high-entropy" was introduced into ceramics and stimulated research interest in high-entropy ceramics. High-entropy ceramics are solid solutions based on interstitial phases, containing 4 or more metal elements, due to entropy stability endow high-entropy nitrides with unique physical and mechanical properties, making them stable in hardness, fracture toughness, corrosion resistance and high temperature In terms of performance, it surpasses the traditional nitride ceramics, so high ceramics have attracted more and more attention.

为了开发具有合适机械和物理性能的高熵氮化物陶瓷涂层,学者们通过元素设计和制备工艺优化,调整材料的化学成分、优化涂层生长参数,以控制化学计量、微观结构和织构,提升涂层性能。此外,学者们从涂层结构角度也提出了许多策略来增加陶瓷薄膜抑制裂纹扩展的能力。超晶格结构是一种有效的增韧方法,采用化学上不同但结构相干的纳米层交替沉积,使得过渡金属氮化物的硬度和断裂韧性均获得了较大提升。In order to develop high-entropy nitride ceramic coatings with suitable mechanical and physical properties, scholars have adjusted the chemical composition of materials and optimized coating growth parameters through element design and preparation process optimization to control stoichiometry, microstructure and texture. Improve coating performance. In addition, scholars have also proposed many strategies from the perspective of coating structure to increase the ability of ceramic films to inhibit crack propagation. Superlattice structure is an effective toughening method, and the hardness and fracture toughness of transition metal nitrides have been greatly improved by the alternate deposition of chemically different but structurally coherent nanolayers.

发明内容Contents of the invention

本发明的目的是解决现有的高熵合金氮化物陶瓷涂层韧性和硬度相互制约的问题,发明一种超晶格强韧高熵合金氮化物陶瓷涂层,同时提供相应的制备方法。The purpose of the present invention is to solve the problem that the existing high-entropy alloy nitride ceramic coating toughness and hardness are mutually restricted, to invent a superlattice tough high-entropy alloy nitride ceramic coating, and to provide a corresponding preparation method at the same time.

本发明的技术方案之一是:One of technical solutions of the present invention is:

一种超晶格强韧高熵合金氮化物陶瓷涂层,其特征在于,超晶格结构由两种面心立方体(fcc)结构高熵合金氮化物陶瓷以纳米级的厚度交替沉积构成。A superlattice tough high-entropy alloy nitride ceramic coating is characterized in that the superlattice structure is composed of two kinds of face-centered cubic (fcc) structure high-entropy alloy nitride ceramics deposited alternately with nanoscale thickness.

2. 根据权利要求1所述的超晶格强韧高熵合金氮化物陶瓷涂层, 其特征在于,两种面心立方体结构高熵合金氮化物为TiZrNbMoHfN、TiZrNbMoTaN、TiZrNbMoWN和TiZrHfNbTaN中任意两种的组合。2. superlattice tough high-entropy alloy nitride ceramic coating according to claim 1, is characterized in that, two kinds of face-centered cubic structure high-entropy alloy nitrides are arbitrary two in TiZrNbMoHfN, TiZrNbMoTaN, TiZrNbMoWN and TiZrHfNbTaN The combination.

3. 根据权利要求1所述的超晶格强韧高熵合金氮化物陶瓷涂层,其特征在于,超晶格结构调制周期即每一层氮化物的厚度为2~25nm,所得超晶格高熵合金氮化物陶瓷涂层的硬度大于40GPa,满足超硬材料的要求,断裂韧性超过5MPa·m1/2,实现了对高熵氮化物陶瓷薄膜增加硬度的同时增韧的效果。3. superlattice tough high-entropy alloy nitride ceramic coating according to claim 1, is characterized in that, the thickness of superlattice structure modulation period is 2~25nm of each layer of nitride, gained superlattice The hardness of the high-entropy alloy nitride ceramic coating is greater than 40GPa, which meets the requirements of superhard materials, and the fracture toughness exceeds 5MPa·m 1/2 , realizing the effect of increasing the hardness and toughening of the high-entropy nitride ceramic film.

本发明的技术方案之二是:The second technical scheme of the present invention is:

一种超晶格强韧高熵合金氮化物陶瓷涂层的制备方法,其特征在于,它包括以下步骤:A method for preparing a superlattice tough high-entropy alloy nitride ceramic coating is characterized in that it comprises the following steps:

步骤一,将基体放置在真空腔体内,通入高纯氩气,控制真空腔气压为0.33~0.8Pa,控制脉冲偏压为-800~-600V,氩气辉光放电产生等离子体对基底表面进行活化清洗;Step 1, place the substrate in the vacuum chamber, feed high-purity argon gas, control the vacuum chamber pressure to 0.33~0.8Pa, control the pulse bias voltage to -800~-600V, and argon glow discharge to generate plasma on the substrate surface Perform activation cleaning;

步骤二,在基体表面进行磁控溅射厚度为200~500nm的Ti过渡层沉积,过渡层磁控溅射气源为氩气,磁控溅射室气压为0.4~0.8Pa;磁控溅射的阴极靶材为Ti单质的金属靶材;Step 2, depositing a Ti transition layer with a thickness of 200-500nm by magnetron sputtering on the surface of the substrate, the gas source of the transition layer magnetron sputtering is argon, and the pressure of the magnetron sputtering chamber is 0.4-0.8Pa; the magnetron sputtering The cathode target material is the metal target material of Ti single substance;

步骤三,在合金过渡层表面进行高熵氮化物陶瓷涂层射频反应磁控溅射沉积,射频反应磁控溅射气源为氩气和氮气,氮气和氩气的流量比为(0.25~1):1,反应磁控溅射室工作气压为0.4~0.8Pa;射频反应磁控溅射的阴极靶材为高熵合金靶材中的TiZrNbMoHf、TiZrNbMoTa、TiZrNbMoW或TiZrHfNbTa;样品上施加的偏压为-70~-200V;沉积温度为350~450℃;双层周期超晶格结构通过TiZrNbMoHf-TiZrNbMoTa或TiZrNbMoW-TiZrHfNbTa组合的合金靶材上方计算机控制的挡板开启与关闭实现。Step 3, high-entropy nitride ceramic coating is deposited by radio-frequency reactive magnetron sputtering on the surface of the alloy transition layer, the gas source of radio-frequency reactive magnetron sputtering is argon and nitrogen, and the flow ratio of nitrogen and argon is (0.25~1 ): 1, the working pressure of the reactive magnetron sputtering chamber is 0.4-0.8Pa; the cathode target of RF reactive magnetron sputtering is TiZrNbMoHf, TiZrNbMoTa, TiZrNbMoW or TiZrHfNbTa in the high-entropy alloy target; the bias voltage applied to the sample The temperature is -70~-200V; the deposition temperature is 350~450°C; the double-layer periodic superlattice structure is realized by opening and closing the computer-controlled baffle above the alloy target of TiZrNbMoHf-TiZrNbMoTa or TiZrNbMoW-TiZrHfNbTa combination.

涂层制备结束后在氩气保护条件下进行退火,改善或消除涂层制备过程中所产生的组织缺陷以及残余应力、防止涂层开裂和剥落,包括以下步骤:After the coating is prepared, annealing is carried out under the protection of argon to improve or eliminate the structural defects and residual stress generated during the coating preparation process, and prevent the coating from cracking and peeling, including the following steps:

步骤一:涂层制备结束后,关闭电源和氮气气源、保持氩气流量,在氩气保护环境下750℃保温60min;Step 1: After the coating is prepared, turn off the power and nitrogen source, keep the flow of argon, and keep it warm at 750°C for 60 minutes under the protection of argon;

步骤二:保温60min结束后,以-5℃/min的速度在真空腔体内缓冷至室温。Step 2: After 60 minutes of heat preservation, slowly cool to room temperature in a vacuum chamber at a rate of -5°C/min.

所述的超晶格强韧高熵合金氮化物陶瓷涂层应用于核电设施、加工工具、航天航空装备或医疗器械的耐磨、耐蚀、耐高温表面功能涂层中。The superlattice tough high-entropy alloy nitride ceramic coating is applied to wear-resistant, corrosion-resistant and high-temperature-resistant surface functional coatings of nuclear power facilities, processing tools, aerospace equipment or medical devices.

本发明的有益效果是:The beneficial effects of the present invention are:

本发明的氮化物陶瓷涂层经750℃退火一小时后所得超晶格高熵合金氮化物陶瓷涂层的硬度大于40GPa,满足超硬材料的要求,断裂韧性超过5MPa·m1/2,实现了对高熵氮化物陶瓷薄膜同时硬化和增韧的效果。本发明提供的超晶格强韧高熵合金氮化物陶瓷涂层在先进涂层加工工具、航天航空装备等领域中具有广阔的应用前景。The nitride ceramic coating of the present invention is annealed at 750°C for one hour, and the hardness of the superlattice high-entropy alloy nitride ceramic coating obtained is greater than 40GPa, which meets the requirements of superhard materials, and the fracture toughness exceeds 5MPa·m 1/2 , realizing The effect of simultaneous hardening and toughening on high-entropy nitride ceramic thin films. The superlattice strong and tough high-entropy alloy nitride ceramic coating provided by the invention has broad application prospects in the fields of advanced coating processing tools, aerospace equipment and the like.

本发明可广泛应用于核电设施、加工工具、航天航空装备或医疗器械的耐磨、耐蚀、耐高温表面功能涂层中。The invention can be widely used in wear-resistant, corrosion-resistant and high-temperature-resistant surface functional coatings of nuclear power facilities, processing tools, aerospace equipment or medical equipment.

附图说明Description of drawings

图1为实施例制备的超晶格强韧高熵合金氮化物陶瓷涂层的X射线衍射谱图。如图1所示,涂层呈现出清晰的单相面心立方结构。Fig. 1 is the X-ray diffraction spectrum of the superlattice tough high-entropy alloy nitride ceramic coating prepared in the embodiment. As shown in Figure 1, the coating presents a clear single-phase face-centered cubic structure.

图2为实施例制备的超晶格强韧高熵合金氮化物陶瓷涂层的载荷位移曲线图。Fig. 2 is the load-displacement curve of the superlattice tough high-entropy alloy nitride ceramic coating prepared in the embodiment.

实施方式Implementation

下面结构附图和实施例对本发明作进一步的说明。The following structural drawings and embodiments further illustrate the present invention.

实施例Example

如图1-图2所示。As shown in Figure 1-Figure 2.

一种超晶格强韧高熵合金氮化物陶瓷涂,通过以下步骤制备而成:A superlattice tough high-entropy alloy nitride ceramic coating is prepared through the following steps:

1. 基体清洗。选用硬质合金基体,依次采用丙酮和无水乙醇分别超声波清洗15min,氮气吹干后放入磁控溅射设备的腔体内。1. Substrate cleaning. The cemented carbide substrate was selected, ultrasonically cleaned with acetone and absolute ethanol for 15 minutes respectively, dried with nitrogen, and then placed into the cavity of the magnetron sputtering equipment.

2. 基体表面等离子体活化。依次开启机械泵和分子泵,将腔体抽真空至5.0×10- 4Pa,通入高纯氩气控制真空腔体内气压为0.8Pa,控制脉冲偏压为-600V,辉光放电产生等离子体,对基底表面进行活化清洗30min。2. Plasma activation of the substrate surface. Turn on the mechanical pump and the molecular pump in sequence, vacuumize the chamber to 5.0×10 - 4 Pa, feed high-purity argon to control the pressure in the vacuum chamber to 0.8Pa, control the pulse bias to -600V, and glow discharge to generate plasma , and activate and clean the surface of the substrate for 30 minutes.

3. 高熵合金过渡层制备。控制Ar流量调节气压为0.8Pa。打开与Ti单质的金属靶材串联的射频电源,脉冲偏压-150V,沉积厚度为200nm的Ti过渡层。3. Preparation of high-entropy alloy transition layer. Control the flow rate of Ar to adjust the air pressure to 0.8Pa. Turn on the radio frequency power supply connected in series with the metal target of simple substance Ti, pulse bias -150V, and deposit a Ti transition layer with a thickness of 200nm.

4. 通入N2,调节N2和Ar流量比为1:2,气压0.5Pa,保持与TiZrNbMoHf和TiZrNbMoTa高熵合金靶材连接的射频电源输出功率比为1:1,脉冲偏压-70V,沉积温度为450℃,控制TiZrNbMoHf和TiZrNbMoTa合金靶材上方挡板每30s交替开启一次(TiZrNbMoHf上方挡板打开,TiZrNbMoTa上方挡板关闭)调制周期为5nm,总厚度为2µm的 TiZrNbMoHf-TiZrNbMoTa超晶格高熵陶瓷涂层。4. Feed in N 2 , adjust the flow ratio of N 2 and Ar to 1:2, the air pressure to 0.5Pa, keep the output power ratio of the RF power supply connected to the TiZrNbMoHf and TiZrNbMoTa high-entropy alloy targets at 1:1, and pulse bias -70V , the deposition temperature is 450°C, the baffles above the TiZrNbMoHf and TiZrNbMoTa alloy targets are controlled to open alternately every 30s (the baffles above TiZrNbMoHf are opened, and the baffles above TiZrNbMoTa are closed). The modulation period is 5nm, and the total thickness is 2µm. High-entropy ceramic coatings.

5. 涂层制备结束后在氩气保护条件下进行退火,改善或消除涂层制备过程中所产生的组织缺陷以及残余应力、防止涂层开裂和剥落,包括以下步骤:5. After the coating is prepared, annealing is carried out under the protection of argon to improve or eliminate the tissue defects and residual stress generated during the coating preparation process, and prevent the coating from cracking and peeling, including the following steps:

步骤一:涂层制备结束后,关闭电源和氮气气源、保持氩气流量,在氩气保护环境下750℃保温60min;Step 1: After the coating is prepared, turn off the power and nitrogen source, keep the flow of argon, and keep it warm at 750°C for 60 minutes under the protection of argon;

步骤二:保温60min结束后,以-5℃/min的速度在真空腔体内缓冷至室温。Step 2: After 60 minutes of heat preservation, slowly cool to room temperature in a vacuum chamber at a rate of -5°C/min.

所述的超晶格强韧高熵合金氮化物陶瓷涂层应用于核电设施、加工工具、航天航空装备或医疗器械的耐磨、耐蚀、耐高温表面功能涂层中。The superlattice tough high-entropy alloy nitride ceramic coating is applied to wear-resistant, corrosion-resistant and high-temperature-resistant surface functional coatings of nuclear power facilities, processing tools, aerospace equipment or medical devices.

6. 对本实施例制备的高熵氮化物陶瓷涂层采用纳米压痕法进行硬度测试,硬度为41.37GPa,采用原位纳米力学系统进行微机械悬臂弯曲试验,测得涂层断裂韧性为5.2MPa·m1/2。X射线衍射谱图如图1所示,涂层呈现出清晰的单相面心立方结构。载荷位移曲线图如图2所示。6. The hardness of the high-entropy nitride ceramic coating prepared in this example was tested by nanoindentation method, and the hardness was 41.37GPa. The micromechanical cantilever bending test was carried out by using the in-situ nanomechanical system, and the fracture toughness of the coating was measured to be 5.2MPa · m 1/2 . The X-ray diffraction spectrum is shown in Figure 1, and the coating presents a clear single-phase face-centered cubic structure. The load-displacement curve is shown in Figure 2.

实施例Example

一种超晶格强韧高熵合金氮化物陶瓷涂,通过以下步骤制备而成:A superlattice tough high-entropy alloy nitride ceramic coating is prepared through the following steps:

1. 基体清洗。选用硬质合金基体,依次采用丙酮和无水乙醇分别超声波清洗15min,氮气吹干后放入磁控溅射设备的腔体内。1. Substrate cleaning. The cemented carbide substrate was selected, ultrasonically cleaned with acetone and absolute ethanol for 15 minutes respectively, dried with nitrogen, and then placed into the cavity of the magnetron sputtering equipment.

2. 基体表面等离子体活化。依次开启机械泵和分子泵,将腔体抽真空至5.0×10- 4Pa,通入高纯氩气控制真空腔体内气压为0.33Pa,控制脉冲偏压为-800V,辉光放电产生等离子体,对基底表面进行活化清洗30min。2. Plasma activation of the substrate surface. Turn on the mechanical pump and the molecular pump in sequence, vacuumize the chamber to 5.0×10 - 4 Pa, pass high-purity argon gas to control the pressure in the vacuum chamber to 0.33Pa, control the pulse bias to -800V, and glow discharge to generate plasma , and activate and clean the surface of the substrate for 30 minutes.

3. 高熵合金过渡层制备。控制Ar流量调节气压为0.4Pa。打开与Ti单质的金属靶材串联的射频电源,脉冲偏压-150V,沉积厚度为100nm的Ti过渡层。3. Preparation of high-entropy alloy transition layer. Control the flow rate of Ar to adjust the air pressure to 0.4Pa. Turn on the radio frequency power supply connected in series with the metal target of simple substance Ti, pulse bias -150V, and deposit a Ti transition layer with a thickness of 100nm.

4. 通入N2,调节N2和Ar流量比为1:4,气压0.4Pa,保持与TiZrNbMoHf和TiZrNbMoW高熵合金靶材连接的射频电源输出功率比为1:1,脉冲偏压-200V,沉积温度为350℃,控制TiZrNbMoHf和TiZrNbMoW合金靶材上方挡板每15s交替开启一次(TiZrNbMoHf上方挡板打开,TiZrNbMoW上方挡板关闭)调制周期为2nm,总厚度为1µm的 TiZrNbMoHf-TiZrNbMoW超晶格高熵陶瓷涂层。4. Feed in N 2 , adjust the flow ratio of N 2 and Ar to 1:4, the air pressure to 0.4Pa, keep the output power ratio of the RF power supply connected to the TiZrNbMoHf and TiZrNbMoW high-entropy alloy targets at 1:1, pulse bias -200V , the deposition temperature is 350°C, and the baffles above the TiZrNbMoHf and TiZrNbMoW alloy targets are controlled to open alternately every 15s (the baffles above TiZrNbMoHf are opened, and the baffles above TiZrNbMoW are closed). The modulation period is 2nm, and the total thickness is 1µm. High-entropy ceramic coatings.

5. 涂层制备结束后在氩气保护条件下进行退火,改善或消除涂层制备过程中所产生的组织缺陷以及残余应力、防止涂层开裂和剥落,包括以下步骤:5. After the coating is prepared, annealing is carried out under the protection of argon to improve or eliminate the tissue defects and residual stress generated during the coating preparation process, and prevent the coating from cracking and peeling, including the following steps:

步骤一:涂层制备结束后,关闭电源和氮气气源、保持氩气流量,在氩气保护环境下750℃保温60min;Step 1: After the coating is prepared, turn off the power and nitrogen source, keep the flow of argon, and keep it warm at 750°C for 60 minutes under the protection of argon;

步骤二:保温60min结束后,以-5℃/min的速度在真空腔体内缓冷至室温。Step 2: After 60 minutes of heat preservation, slowly cool to room temperature in a vacuum chamber at a rate of -5°C/min.

所述的超晶格强韧高熵合金氮化物陶瓷涂层应用于核电设施、加工工具、航天航空装备或医疗器械的耐磨、耐蚀、耐高温表面功能涂层中。The superlattice tough high-entropy alloy nitride ceramic coating is applied to wear-resistant, corrosion-resistant and high-temperature-resistant surface functional coatings of nuclear power facilities, processing tools, aerospace equipment or medical devices.

6. 对本实施例制备的高熵氮化物陶瓷涂层采用纳米压痕法进行硬度测试,硬度为41.87GPa,采用原位纳米力学系统进行微机械悬臂弯曲试验,测得涂层断裂韧性为5.22MPa·m1/26. The hardness of the high-entropy nitride ceramic coating prepared in this example was tested by nano-indentation method, and the hardness was 41.87GPa. The fracture toughness of the coating was measured to be 5.22MPa by the in-situ nanomechanical system for micro-mechanical cantilever bending test. · m 1/2 .

实施例Example

一种超晶格强韧高熵合金氮化物陶瓷涂,通过以下步骤制备而成:A superlattice tough high-entropy alloy nitride ceramic coating is prepared through the following steps:

1. 基体清洗。选用硬质合金基体,依次采用丙酮和无水乙醇分别超声波清洗15min,氮气吹干后放入磁控溅射设备的腔体内。1. Substrate cleaning. The cemented carbide substrate was selected, ultrasonically cleaned with acetone and absolute ethanol for 15 minutes respectively, dried with nitrogen, and then placed into the cavity of the magnetron sputtering equipment.

2. 基体表面等离子体活化。依次开启机械泵和分子泵,将腔体抽真空至5.0×10- 4Pa,通入高纯氩气控制真空腔体内气压为0.5Pa,控制脉冲偏压为-700V,辉光放电产生等离子体,对基底表面进行活化清洗30min。2. Plasma activation of the substrate surface. Turn on the mechanical pump and the molecular pump in sequence, vacuumize the chamber to 5.0×10 - 4 Pa, feed high-purity argon to control the pressure in the vacuum chamber to 0.5Pa, control the pulse bias to -700V, and glow discharge to generate plasma , and activate and clean the surface of the substrate for 30 minutes.

3. 高熵合金过渡层制备。控制Ar流量调节气压为0.4Pa。打开与Ti单质的金属靶材串联的射频电源,脉冲偏压-150V,沉积厚度为500nm的Ti过渡层。3. Preparation of high-entropy alloy transition layer. Control the flow rate of Ar to adjust the air pressure to 0.4Pa. Turn on the radio frequency power supply connected in series with the metal target of simple substance Ti, pulse bias -150V, and deposit a Ti transition layer with a thickness of 500nm.

4. 通入N2,调节N2和Ar流量比为1:1,气压0.8Pa,保持与TiZrNbMoHf和TiZrHfNbTaN高熵合金靶材连接的射频电源输出功率比为1:1,脉冲偏压-120V,沉积温度为400℃,控制TiZrNbMoHf和TiZrHfNbTaN合金靶材上方挡板每150s交替开启一次(TiZrNbMoHf上方挡板打开,TiZrHfNbTaN上方挡板关闭)调制周期为25nm,得到总厚度为5µm的 TiZrNbMoHf-TiZrHfNbTaN超晶格高熵陶瓷涂层。4. Feed in N 2 , adjust the flow ratio of N 2 and Ar to 1:1, the air pressure to 0.8Pa, keep the output power ratio of the RF power supply connected to the TiZrNbMoHf and TiZrHfNbTaN high-entropy alloy targets at 1:1, pulse bias -120V , the deposition temperature was 400°C, and the baffles above the TiZrNbMoHf and TiZrHfNbTaN alloy targets were controlled to open alternately every 150s (the baffles above TiZrNbMoHf were opened, and the baffles above TiZrHfNbTaN were closed). Lattice high-entropy ceramic coatings.

5. 涂层制备结束后在氩气保护条件下进行退火,改善或消除涂层制备过程中所产生的组织缺陷以及残余应力、防止涂层开裂和剥落,包括以下步骤:5. After the coating is prepared, annealing is carried out under the protection of argon to improve or eliminate the tissue defects and residual stress generated during the coating preparation process, and prevent the coating from cracking and peeling, including the following steps:

步骤一:涂层制备结束后,关闭电源和氮气气源、保持氩气流量,在氩气保护环境下750℃保温60min;Step 1: After the coating is prepared, turn off the power and nitrogen source, keep the flow of argon, and keep it warm at 750°C for 60 minutes under the protection of argon;

步骤二:保温60min结束后,以-5℃/min的速度在真空腔体内缓冷至室温。Step 2: After 60 minutes of heat preservation, slowly cool to room temperature in a vacuum chamber at a rate of -5°C/min.

所述的超晶格强韧高熵合金氮化物陶瓷涂层应用于核电设施、加工工具、航天航空装备或医疗器械的耐磨、耐蚀、耐高温表面功能涂层中。The superlattice tough high-entropy alloy nitride ceramic coating is applied to wear-resistant, corrosion-resistant and high-temperature-resistant surface functional coatings of nuclear power facilities, processing tools, aerospace equipment or medical devices.

6. 对本实施例制备的高熵氮化物陶瓷涂层采用纳米压痕法进行硬度测试,硬度为43.54GPa,采用原位纳米力学系统进行微机械悬臂弯曲试验,测得涂层断裂韧性为5.1MPa·m1/26. The hardness of the high-entropy nitride ceramic coating prepared in this example was tested by the nano-indentation method, and the hardness was 43.54GPa. The micro-mechanical cantilever bending test was carried out by the in-situ nanomechanical system, and the fracture toughness of the coating was measured to be 5.1MPa · m 1/2 .

本发明未涉及部分与现有技术相同或可采用现有技术加以实现。The parts not involved in the present invention are the same as the prior art or can be realized by adopting the prior art.

Claims (6)

1. The superlattice tough high-entropy alloy nitride ceramic coating is characterized in that the superlattice structure is formed by alternately depositing two high-entropy alloy nitride ceramics with face-centered cubic (fcc) structures in a nano-scale thickness.
2. The superlattice tough high-entropy alloy nitride ceramic coating according to claim 1, wherein the two face-centered cubic structured high-entropy alloy nitrides are a combination of any two of TiZrNbMoHfN, tiZrNbMoTaN, tiZrNbMoWN and tizrshfnbtan.
3. The superlattice tough high-entropy alloy nitride ceramic coating according to claim 1, characterized in that the superlattice structure modulation period, i.e. the thickness of each layer of nitride is 2-25 nm, the hardness of the obtained superlattice high-entropy alloy nitride ceramic coating is more than 40GPa, the requirement of superhard material is met, and the fracture toughness exceeds 5 MPa-m 1/2 The effect of toughening the high-entropy nitride ceramic film while increasing the hardness is achieved.
4. A method for preparing the superlattice tough high-entropy alloy nitride ceramic coating according to claim 1, which is characterized by comprising the following steps:
placing a substrate in a vacuum cavity, introducing high-purity argon, controlling the air pressure of the vacuum cavity to be 0.33-0.8 Pa, controlling the pulse bias to be-800 to-600V, and activating and cleaning the surface of the substrate by using plasma generated by argon glow discharge;
secondly, ti transition layer deposition with the magnetron sputtering thickness of 200-500 nm is carried out on the surface of the substrate, the magnetron sputtering air source of the transition layer is argon, and the air pressure of a magnetron sputtering chamber is 0.4-0.8 Pa; the cathode target material of the magnetron sputtering is a metal target material of Ti simple substance;
thirdly, performing radio frequency reaction magnetron sputtering deposition of a high-entropy nitride ceramic coating on the surface of the alloy transition layer, wherein a radio frequency reaction magnetron sputtering gas source is argon and nitrogen, the flow ratio of the nitrogen to the argon is (0.25-1): 1, and the working pressure of a reaction magnetron sputtering chamber is 0.4-0.8 Pa; the cathode target of the radio frequency reaction magnetron sputtering is TiZrNbMoHf, tiZrNbMoTa, tiZrNbMoW or TiZrHfNbTa in the high-entropy alloy target; the bias voltage applied to the sample is-70 to-200V; the deposition temperature is 350-450 ℃; the double-layer periodic superlattice structure is realized by opening and closing a baffle plate controlled by a computer above an alloy target material combined by TiZrNbMoHf-TiZrNbMoTa or TiZrNbMoW-TiZrHfNbTa.
5. The method of claim 4, wherein the annealing is performed under argon protection after the coating is prepared, thereby improving or eliminating the structural defects and residual stress generated during the coating preparation process and preventing the cracking and peeling of the coating, comprising the steps of:
step one: after the coating is prepared, the power supply and the nitrogen source are turned off, the argon flow is maintained, and the temperature is kept for 60min at 750 ℃ under the protection of argon;
step two: after the heat preservation is finished for 60min, slowly cooling to room temperature in the vacuum cavity at a speed of-5 ℃/min.
6. A superlattice tough high-entropy alloy nitride ceramic coating according to claim 1, which is characterized by being applied to a wear-resistant, corrosion-resistant and high-temperature-resistant surface functional coating of nuclear power facilities, processing tools, aerospace equipment or medical instruments.
CN202310108958.1A 2023-02-14 2023-02-14 Superlattice tough high-entropy alloy nitride ceramic coating and preparation method thereof Pending CN116445854A (en)

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