CN116395637A - A tail gas recovery device - Google Patents
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- 238000011084 recovery Methods 0.000 title claims abstract description 54
- 239000007789 gas Substances 0.000 claims abstract description 189
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 41
- 239000001257 hydrogen Substances 0.000 claims abstract description 41
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 38
- 238000001179 sorption measurement Methods 0.000 claims abstract description 35
- 239000012535 impurity Substances 0.000 claims abstract description 23
- 238000002955 isolation Methods 0.000 claims description 28
- 238000011144 upstream manufacturing Methods 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 230000001105 regulatory effect Effects 0.000 claims description 8
- 238000001914 filtration Methods 0.000 claims description 7
- 238000000926 separation method Methods 0.000 claims description 7
- 238000000746 purification Methods 0.000 claims description 6
- 238000004868 gas analysis Methods 0.000 claims description 5
- 230000003139 buffering effect Effects 0.000 abstract 2
- 238000000034 method Methods 0.000 description 23
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 12
- 239000000446 fuel Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000003345 natural gas Substances 0.000 description 6
- 239000002912 waste gas Substances 0.000 description 6
- 229910021536 Zeolite Inorganic materials 0.000 description 5
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 5
- 239000010457 zeolite Substances 0.000 description 5
- 238000005265 energy consumption Methods 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000010815 organic waste Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000012855 volatile organic compound Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000003795 desorption Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000053 physical method Methods 0.000 description 2
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- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
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- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
- C01B3/506—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification at low temperatures
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
- C01B3/56—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by contacting with solids; Regeneration of used solids
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Abstract
Description
技术领域technical field
本发明涉及尾气处理技术领域,尤其涉及一种尾气回收装置。The invention relates to the technical field of tail gas treatment, in particular to a tail gas recovery device.
背景技术Background technique
目前,在半导体材料的外延生长和发光二极体芯片的制造过程中,主要工艺采用金属有机物化学气相沉积法(MOCVD),工艺流程中生产所需特气为高纯度NH3和SiH4,载气为高纯度N2和H2。由于MOCVD系统中特气非完全参与反应,尾气中含有有毒有害物质,故必须对反应过后的尾气进行处理,在生产完成后绝大部分会排向尾气放空。At present, in the epitaxial growth of semiconductor materials and the manufacturing process of light-emitting diode chips, the main process is metal-organic chemical vapor deposition (MOCVD). The special gases required for production in the process flow are high-purity NH 3 and SiH 4 . The gases are high-purity N 2 and H 2 . Since the special gas in the MOCVD system does not fully participate in the reaction, the tail gas contains toxic and harmful substances, so the tail gas after the reaction must be treated, and most of it will be discharged to the tail gas after the production is completed.
现有的MOCVD机台尾气回收常利用水喷淋吸收、膜组式循环吸收、硫酸酸碱中和吸收等,但以上几种方法仅仅是将尾气中NH3进行回收,而尾气中的氢气未进行有效回收,会造成能源的浪费,且氢气在排放过程中存在一定的安全风险,严重可能会造成重大生产事故。Existing MOCVD equipment tail gas recovery often uses water spray absorption, membrane group circulation absorption, sulfuric acid acid-base neutralization absorption, etc., but the above methods only recover NH 3 in the tail gas, and the hydrogen in the tail gas is not Effective recovery will result in a waste of energy, and there are certain safety risks in the hydrogen discharge process, which may seriously cause major production accidents.
因此,如何对尾气中的氢气进行回收,是本领域技术人员目前需要解决的技术问题。Therefore, how to recover the hydrogen in the tail gas is a technical problem to be solved by those skilled in the art.
发明内容Contents of the invention
有鉴于此,本发明的目的在于提供一种尾气回收装置,以实现对尾气中的氢气进行回收。In view of this, the object of the present invention is to provide a tail gas recovery device to recover the hydrogen in the tail gas.
为了实现上述目的,本发明提供了如下技术方案:In order to achieve the above object, the present invention provides the following technical solutions:
一种尾气回收装置,包括依次连接的加压设备、气体吸附分离器、缓冲设备和纯化器,以对尾气进行回收净化;A tail gas recovery device, including sequentially connected pressurization equipment, gas adsorption separator, buffer equipment and purifier, to recover and purify the tail gas;
加压设备用于将尾气压入气体吸附分离器,气体吸附分离器用于吸附尾气中的水分和杂质,缓冲设备用于储存和释放尾气,纯化器用于对尾气进行纯化处理。The pressurization equipment is used to inject the tail gas into the gas adsorption separator, the gas adsorption separator is used to absorb the moisture and impurities in the tail gas, the buffer device is used to store and release the tail gas, and the purifier is used to purify the tail gas.
可选地,在上述的尾气回收装置中,缓冲设备包括缓冲罐,在缓冲设备处于第一状态时,缓冲罐用于储存尾气;Optionally, in the above tail gas recovery device, the buffer device includes a buffer tank, and when the buffer device is in the first state, the buffer tank is used to store the tail gas;
在缓冲设备处于第二状态时,缓冲罐释放尾气,纯化器对缓冲罐内的尾气进行纯化处理。When the buffer device is in the second state, the buffer tank releases tail gas, and the purifier performs purification treatment on the tail gas in the buffer tank.
可选地,在上述的尾气回收装置中,缓冲设备还包括旁通阀、第一隔断阀和第二隔断阀,Optionally, in the above exhaust gas recovery device, the buffer device further includes a bypass valve, a first isolation valve and a second isolation valve,
缓冲罐设置于第一支路,第一隔断阀和第二隔断阀分别设置于缓冲罐的两侧,以控制第一支路的通断;旁通阀设置于第二支路,以控制第二支路的通断;The buffer tank is set in the first branch, and the first block valve and the second block valve are respectively set on both sides of the buffer tank to control the on-off of the first branch; the bypass valve is set in the second branch to control the On-off of two branches;
旁通阀和第一隔断阀打开,第二隔断阀关闭,缓冲设备处于第一状态;The bypass valve and the first isolation valve are opened, the second isolation valve is closed, and the buffer device is in the first state;
第二隔断阀打开,旁通阀和第一隔断阀关闭,缓冲设备处于第二状态。The second isolation valve is opened, the bypass valve and the first isolation valve are closed, and the buffer device is in the second state.
可选地,在上述的尾气回收装置中,纯化器包括一级氢气纯化器和深冷纯化器,一级氢气纯化器和深冷纯化器依次布置于缓冲设备下游。Optionally, in the above tail gas recovery device, the purifier includes a primary hydrogen purifier and a cryogenic purifier, and the primary hydrogen purifier and cryogenic purifier are sequentially arranged downstream of the buffer device.
可选地,在上述的尾气回收装置中,还包括气水分离设备,气水分离设备设置于气体吸附分离器上游,以分离尾气中的气体与水分。Optionally, the above tail gas recovery device further includes gas-water separation equipment, which is arranged upstream of the gas adsorption separator to separate gas and moisture in the tail gas.
可选地,在上述的尾气回收装置中,还包括过滤设备,以过滤尾气中的杂质。Optionally, in the above-mentioned tail gas recovery device, filtering equipment is also included to filter impurities in the tail gas.
可选地,在上述的尾气回收装置中,过滤设备包括粗过滤器和细过滤器,粗过滤器设置于加压设备上游,细过滤器设置于粗过滤器下游及气体吸附分离器上游。Optionally, in the above exhaust gas recovery device, the filtering device includes a coarse filter and a fine filter, the coarse filter is arranged upstream of the pressurizing device, and the fine filter is arranged downstream of the coarse filter and upstream of the gas adsorption separator.
可选地,在上述的尾气回收装置中,粗过滤器包括第一粗过滤器和第二粗过滤器,在第一粗过滤器和第二粗过滤器中的一个处于工作状态时,另一个处于非工作状态;和/或,Optionally, in the above exhaust gas recovery device, the coarse filter includes a first coarse filter and a second coarse filter, and when one of the first coarse filter and the second coarse filter is in working condition, the other is in non-working condition; and/or,
细过滤器包括第一细过滤器和第二细过滤器,在第一细过滤器和第二细过滤器中的一个处于工作状态时,另一个处于非工作状态。The fine filter includes a first fine filter and a second fine filter, and when one of the first fine filter and the second fine filter is in a working state, the other is in a non-working state.
可选地,在上述的尾气回收装置中,还包括气体分析设备,气体分析设备设置于纯化器下游,以检测尾气中氢气的纯度。Optionally, in the above-mentioned tail gas recovery device, gas analysis equipment is also included, and the gas analysis equipment is arranged downstream of the purifier to detect the purity of hydrogen in the tail gas.
可选地,在上述的尾气回收装置中,还包括尾气流量调节设备,尾气流量调节设备用于控制尾气的排放量。Optionally, in the above-mentioned tail gas recovery device, a tail gas flow regulating device is also included, and the tail gas flow regulating device is used to control the discharge of tail gas.
本发明提供的尾气回收装置包括依次连接的加压设备、气体吸附分离器、缓冲设备和纯化器,以对尾气进行回收净化,含有氢气的尾气在经过加压设备加压后进入气体吸附分离器,气体吸附分离器可吸附去除尾气中绝大部分的水分,并将杂质吸附至PPM级。经缓冲设备的缓冲作用后,纯化器对尾气进行纯化,由此得到达到工艺标准的氢气,实现对尾气中的氢气的回收。The tail gas recovery device provided by the present invention includes sequentially connected pressurization equipment, gas adsorption separator, buffer equipment and purifier to recover and purify the tail gas, and the tail gas containing hydrogen enters the gas adsorption separator after being pressurized by the pressurization device , The gas adsorption separator can absorb and remove most of the water in the tail gas, and adsorb the impurities to the PPM level. After being buffered by the buffer equipment, the purifier purifies the tail gas, thereby obtaining hydrogen that meets the process standard, and realizes the recovery of hydrogen in the tail gas.
此外,当需要对上游设备进行检修或维护时,缓冲装置的存在确保了位于缓冲装置下游的设备用气的稳定性和连续性。In addition, when the upstream equipment needs to be overhauled or maintained, the existence of the buffer device ensures the stability and continuity of gas consumption for the equipment located downstream of the buffer device.
而且,利用本发明提供的尾气回收装置将尾气中的氢气进行回收利用,回收的氢气可作为燃料和工艺原料进行重复使用,如在对废气进行蓄热式催化燃烧(RTO)处理时,可利用氢气代替天然气作为燃料,对工艺有机废气进行处理,实现氢气的重复利用,避免了能源的浪费。Moreover, the hydrogen in the tail gas is recycled by using the tail gas recovery device provided by the present invention, and the recovered hydrogen can be reused as fuel and process raw materials. Hydrogen replaces natural gas as fuel to treat process organic waste gas to realize the reuse of hydrogen and avoid energy waste.
本发明提供的尾气回收装置用于外延MOCVD设备所产生的尾气进行回收时,因外延MOCVD尾气中气体种类少、纯度高、易回收、回收效率高,可大大降低回收和使用成本,且尾气回收装置使用物理方法对氢气进行回收,无需辅助燃料和燃烧反应,增加整体装置稳定性和安全性的同时,也降低了能耗。When the tail gas recovery device provided by the present invention is used to recover the tail gas produced by epitaxial MOCVD equipment, because the gas in the epitaxial MOCVD tail gas has fewer types, high purity, easy recovery, and high recovery efficiency, the cost of recovery and use can be greatly reduced, and the tail gas recovery The device uses physical methods to recover hydrogen without auxiliary fuel and combustion reaction, which increases the stability and safety of the overall device and reduces energy consumption.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention. Those skilled in the art can also obtain other drawings based on these drawings without creative work.
图1为本发明实施例公开的尾气回收装置的整体结构图;Fig. 1 is the overall structural diagram of the tail gas recovery device disclosed in the embodiment of the present invention;
图2为本发明实施例公开的尾气回收装置用于废气处理的结构图;Fig. 2 is a structural diagram of an exhaust gas recovery device disclosed in an embodiment of the present invention for waste gas treatment;
其中:in:
101为第一粗过滤器;102为第二粗过滤器;101 is the first coarse filter; 102 is the second coarse filter;
200为加压设备;200 is pressurized equipment;
300为气水分离设备;300 is gas-water separation equipment;
401为第一细过滤器;402为第二细过滤器;401 is the first fine filter; 402 is the second fine filter;
500为气体吸附分离器;500 is a gas adsorption separator;
601为缓冲罐;602为旁通阀;603为第一隔断阀;604为第二隔断阀;601 is a buffer tank; 602 is a bypass valve; 603 is a first isolation valve; 604 is a second isolation valve;
701为一级氢气纯化器;702为深冷纯化器;701 is a primary hydrogen purifier; 702 is a cryogenic purifier;
800为尾气调节装置;800 is an exhaust gas regulating device;
900为废气处理设备。900 is exhaust gas treatment equipment.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图1-图2,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出新颖性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings 1-2 in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Example. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making novel efforts belong to the scope of protection of the present invention.
在本发明的描述中,需要理解的是,术语“上”、“下”、“顶面”、“底面”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的位置或元件必须具有特定方位、以特定的方位构成和操作,因此不能理解为本发明的限制。此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性。In the description of the present invention, it should be understood that the orientation or positional relationship indicated by the terms "upper", "lower", "top", "bottom", etc. is based on the orientation or positional relationship shown in the drawings, and is only In order to facilitate the description of the present invention and simplify the description, it does not indicate or imply that the referred position or element must have a specific orientation, be constructed and operate in a specific orientation, and thus should not be construed as a limitation of the present invention. In addition, the terms "first" and "second" are used for descriptive purposes only, and should not be understood as indicating or implying relative importance.
如图1所示,本发明公开的尾气回收装置,包括依次连接的加压设备200、气体吸附分离器500、缓冲设备和纯化器,以对尾气进行回收净化;加压设备200用于将尾气压入气体吸附分离器500,气体吸附分离器500用于吸附尾气中的水分和杂质,缓冲设备用于储存和释放尾气,纯化器用于对尾气进行纯化处理。As shown in Figure 1, the tail gas recovery device disclosed in the present invention includes pressurized
本发明提供的尾气回收装置包括依次连接的加压设备200、气体吸附分离器500、缓冲设备和纯化器,以对尾气进行回收净化,含有氢气的尾气在经过加压设备200加压后进入气体吸附分离器500,气体吸附分离器500可吸附去除尾气中绝大部分的水分,并将杂质吸附至PPM级。经缓冲设备的缓冲作用后,纯化器对尾气进行纯化,由此得到达到工艺标准的氢气,实现对尾气中的氢气的回收。The tail gas recovery device provided by the present invention includes a
此外,当需要对上游设备进行检修或维护时,缓冲装置的存在确保了位于缓冲装置下游的设备用气的稳定性和连续性。In addition, when the upstream equipment needs to be overhauled or maintained, the existence of the buffer device ensures the stability and continuity of gas consumption for the equipment located downstream of the buffer device.
而且,利用本发明提供的尾气回收装置将尾气中的氢气进行回收利用,回收的氢气可作为燃料和工艺原料进行重复使用,如在对废气进行RTO处理时,可利用氢气代替天然气作为燃料,对工艺有机废气进行处理,实现氢气的重复利用,避免了能源的浪费。Moreover, the hydrogen in the tail gas is recycled by using the tail gas recovery device provided by the present invention, and the recovered hydrogen can be reused as fuel and process raw materials. For example, when the waste gas is subjected to RTO treatment, hydrogen can be used instead of natural gas as fuel. The organic waste gas of the process is treated to realize the reuse of hydrogen and avoid the waste of energy.
本发明提供的尾气回收装置用于外延MOCVD设备所产生的尾气进行回收时,因外延MOCVD尾气中气体种类少、纯度高、易回收、回收效率高,可大大降低回收和使用成本,且尾气回收装置使用物理方法对氢气进行回收,无需辅助燃料和燃烧反应,增加整体装置稳定性和安全性的同时,也降低了能耗。When the tail gas recovery device provided by the present invention is used to recover the tail gas produced by epitaxial MOCVD equipment, because the gas in the epitaxial MOCVD tail gas has fewer types, high purity, easy recovery, and high recovery efficiency, the cost of recovery and use can be greatly reduced, and the tail gas recovery The device uses physical methods to recover hydrogen without auxiliary fuel and combustion reaction, which increases the stability and safety of the overall device and reduces energy consumption.
为了优化上述技术方案,缓冲设备包括缓冲罐601,以在缓冲设备处于第一状态时,缓冲罐601用于储存尾气;在缓冲设备处于第二状态时,缓冲罐601释放尾气,纯化器对缓冲罐601内的尾气进行纯化处理。In order to optimize the above-mentioned technical scheme, the buffer equipment includes a
将缓冲罐601作为中介容器,在缓冲设备处于第一状态时,缓冲罐601作为储存设备,用于储存经缓冲罐601上游的设备处理后的尾气。在缓冲设备处于第二状态时,缓冲罐601作为释放设备,释放在第一状态时储存的尾气。缓冲设备的存在确保了位于缓冲装置下游的设备用气的稳定性和连续性,方便对缓冲设备上游的设备进行检修与维护。The
具体的,如图1所示,缓冲设备处存在两条支路,第一隔断阀603、第二隔断阀604和缓冲罐601位于第一支路,且第一隔断阀603和第二隔断阀604分别设置于缓冲罐601的两侧,旁通阀602位于第二支路。第一隔断阀603、第二隔断阀604与旁通阀602共同作用,以控制缓冲设备的第一状态和第二状态的切换。Specifically, as shown in Figure 1, there are two branches at the buffer equipment, the
第一隔断阀603位于缓冲罐601的上游,打开第一隔断阀603和旁通阀602,关闭第二隔断阀604,使得第一支路关闭,第二支路打开,缓冲设备处于第一状态。经缓冲罐601上游的设备处理后的尾气一部分经第一隔断阀603到达缓冲罐601并填充满缓冲罐601,一部分经旁通阀602通过第二支路到达纯化器。The
关闭第一隔断阀603和旁通阀602,打开第二隔断阀604,使得第一支路打开,第二支路关闭,缓冲设备处于第二状态。因第一隔断阀603关闭,位于缓冲罐601上游的设备不再提供处理后的尾气,第二隔断阀604打开,使得缓冲罐601得以将在第一状态储存的尾气释放,尾气经第二隔断阀604通过第一支路到达纯化器,使得即使缓冲罐601上游的设备进行检修或维护时,纯化器能够不间断工作,提高了工作效率。Close the
为提高氢气的纯化程度,降低氢气中杂质的含量,纯化器包括一级氢气纯化器701和深冷纯化器702,在缓冲设备下游依次布置一级氢气纯化器701和深冷纯化器702,以对尾气进行纯化。一级纯化器可使尾气中的杂质降低至PPB级,一级纯化后的气体进入深冷纯化器702,对气体中的杂质进行进一步吸附,最终使气体中的杂质降低至1PPB以下,达到工艺氢气的使用标准,以供下游机台使用。使用两级不同形式的纯化器,确保了将尾气中的杂质分离出来,得到高纯度的可生产的氢气,提高了供气的稳定性。需要说明的是,本发明中使用的纯化器为吸附式纯化器,相比钯膜纯化器的压损较小,能耗也较低。In order to improve the purification degree of hydrogen and reduce the content of impurities in hydrogen, the purifier includes a
若尾气中含有大量杂质,杂质会对尾气回收装置的各部分造成磨损及破坏。为减少杂质进入下游设备,延长尾气回收装置的使用寿命,设置过滤设备,以去除尾气中的杂质。If the exhaust gas contains a large amount of impurities, the impurities will cause wear and damage to all parts of the exhaust gas recovery device. In order to reduce impurities entering downstream equipment and prolong the service life of the exhaust gas recovery device, filter equipment is installed to remove impurities in the exhaust gas.
具体的,因过滤精度不同,过滤设备包括粗过滤器和细过滤器,粗过滤器可过滤掉尾气中的大颗粒固体颗粒物,粗过滤器为物理吸附,对尾气进行粗净化,可脱除不溶于水的非极性或极性弱的杂质组分。细过滤器在粗过滤器的基础上可过滤掉尾气中的小颗粒杂质,细过滤器可为化学吸附,对尾气进行精净化,可脱除溶于水的极性杂质。其中,为避免杂质对加压设备200及气体吸附分离器500的损坏,将粗过滤器设置于加压设备200上游,细过滤器设置于粗过滤器下游及气体吸附分离器500上游。Specifically, due to the difference in filtration accuracy, the filtration equipment includes a coarse filter and a fine filter. The coarse filter can filter out large solid particles in the tail gas. Non-polar or weakly polar impurity components in water. On the basis of the coarse filter, the fine filter can filter out small particles of impurities in the exhaust gas, and the fine filter can be used for chemical adsorption to perform fine purification of the exhaust gas and remove polar impurities dissolved in water. Wherein, in order to avoid damage to the
因过滤器的滤芯需要及时更换,为保证尾气回收装置能够持续工作,将粗过滤器的数量设置为两个,第一粗过滤器101和第二粗过滤器102分别接入尾气处理过程。在第一粗过滤器101和第二粗过滤器102中的一个处于工作状态时,另一个处于非工作状态。第一粗过滤器101和第二粗过滤器102一用一备,使得在一台粗过滤器正常工作的情况下,另一台可以进行检修或轮换,完成滤芯的更换。同样,可将细过滤器设置为第一细过滤器401和第二细过滤器402,实现一用一备。Because the filter element of the filter needs to be replaced in time, in order to ensure that the exhaust gas recovery device can continue to work, the number of coarse filters is set to two, and the first
在本发明的一实施例中,可在气体吸附分离器500上游设置气水分离设备300,以分离出尾气中的气体与水分,气体与水分分离,减少了气体在纯化过程中吸附剂的运行负荷,增加了纯化器的吸附剂的使用寿命。In an embodiment of the present invention, a gas-
气体的吸附分离方法通常采用变温吸附或变压吸附两种循环过程,在本发明中采用变压吸附器。变压吸附的产品纯度高,且一般可在室温和不高的压力下工作,床层再生时不用加热,减少了能源消耗,此外,变压吸附器的设备简单,操作及维护便利,能够连续循环操作,达到完全自动化。在变压吸附的过程中可去除气体中绝大部分水分和过滤阶段未去除的其余杂质,并将杂质吸附至PPM级。The gas adsorption and separation method usually adopts two cycle processes of temperature swing adsorption or pressure swing adsorption, and a pressure swing adsorber is used in the present invention. The products of pressure swing adsorption are of high purity, and can generally work at room temperature and low pressure. No heating is required during bed regeneration, which reduces energy consumption. In addition, the equipment of pressure swing adsorption is simple, easy to operate and maintain, and can be continuously Cyclic operation to achieve complete automation. In the process of pressure swing adsorption, most of the water in the gas and the remaining impurities not removed in the filtration stage can be removed, and the impurities can be adsorbed to the PPM level.
在如图1所示的尾气回收装置的末端可设置气体分析设备,以检测经纯化器纯化后的气体中氢气的纯度。若氢气符合工艺使用标准,可直接收集或使用,若氢气不符合工艺使用标准,则说明上游对尾气处理的过程中存在问题,此时需要对各设备进行检修。Gas analysis equipment can be installed at the end of the tail gas recovery device as shown in Figure 1 to detect the purity of hydrogen in the gas purified by the purifier. If the hydrogen meets the process use standard, it can be directly collected or used. If the hydrogen does not meet the process use standard, it means that there is a problem in the upstream tail gas treatment process. At this time, the equipment needs to be repaired.
如图2所示,本发明提供的尾气回收装置可用于RTO工艺处理中。目前,随着半导体生产企业工业化程度的不断提高,环保政策对于有机污染废气的排放控制更加严格,遂将沸石转轮+RTO工艺处理方式引入到半导体生产企业中。在工艺流程中,VOCs废气通过沸石浓缩转轮后,能有效被吸附于沸石中,达到去除的目的。经过沸石吸附的挥发性有机气体被洁净后直接通过烟囱排放到大气中,吸附的挥发性有机物被传送至脱附区,于脱附区中利用一小股加热气体将挥发性有机物进行脱附,脱附后的沸石转轮旋转至吸附区,持续吸附挥发性有机气体。脱附后的浓缩有机废气送至焚化炉进行燃烧,转化成二氧化碳及水蒸气后排放至大气中。在此过程中,燃料可采用天然气,但天然气需重新进行外购,且管道工程及天然气购买成本高,所以在本发明中,可将此类行业生产过程的尾气中未进行有效处理的氢气进行回收利用,利用氢气为燃料,避免造成能源的浪费。在缓冲设备后设置废气处理设备900,利用氢气代替天然气作为燃料,实现对废气的处理。As shown in Figure 2, the tail gas recovery device provided by the present invention can be used in RTO process treatment. At present, with the continuous improvement of the industrialization level of semiconductor production enterprises, the environmental protection policy has stricter control on the emission of organic pollution waste gas, so the zeolite runner + RTO process treatment method has been introduced into semiconductor production enterprises. In the process flow, after the VOCs waste gas passes through the zeolite concentration wheel, it can be effectively absorbed in the zeolite to achieve the purpose of removal. The volatile organic gases adsorbed by zeolite are cleaned and discharged directly into the atmosphere through the chimney, and the adsorbed volatile organic compounds are transported to the desorption zone, where a small stream of heating gas is used to desorb the volatile organic compounds. After desorption, the zeolite wheel rotates to the adsorption area to continuously adsorb volatile organic gases. The desorbed concentrated organic waste gas is sent to the incinerator for combustion, converted into carbon dioxide and water vapor, and then discharged into the atmosphere. In this process, natural gas can be used as fuel, but the natural gas needs to be re-purchased, and the cost of pipeline engineering and natural gas purchase is high, so in the present invention, the hydrogen that has not been effectively treated in the tail gas of this type of industrial production process can be processed Recycling, using hydrogen as fuel, avoiding waste of energy. After the buffer equipment, waste
在本发明的一实施例中,在废气处理设备900的上游设置尾气调节装置800,根据废气处理设备900所需氢气的需求量进行调节。尾气调节装置800可设置于加压设备200上游,使得下游的设备及管道可减设置等级及规格,大大降低建设成本。或者,尾气调节装置800设置在缓冲设备和废气处理设备900之间,使得气体根据需求量进入废气处理设备900。In an embodiment of the present invention, a tail
需要说明的是,本发明提供的尾气回收装置可用于尾气处理技术领域或其他领域。其他领域为除尾气处理技术领域之外的任意领域。上述仅为示例,并不对本发明提供的尾气回收装置的应用领域进行限定。It should be noted that the tail gas recovery device provided by the present invention can be used in the technical field of tail gas treatment or other fields. Other fields refer to any field except the field of tail gas treatment technology. The above is only an example, and does not limit the application field of the tail gas recovery device provided by the present invention.
本说明书中各个实施例采用递进的方式描述,每个实施例重点说明的都是与其他实施例的不同之处,各个实施例之间相同相似部分互相参见即可。Each embodiment in this specification is described in a progressive manner, each embodiment focuses on the difference from other embodiments, and the same and similar parts of each embodiment can be referred to each other.
对所公开的实施例的上述说明,使本领域专业技术人员能够实现或使用本发明。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见的,本文中所定义的一般原理可以在不脱离本发明的精神或范围的情况下,在其它实施例中实现。因此,本发明将不会被限制于本文所示的这些实施例,而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。The above description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the present invention will not be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
在本说明书的描述中,参考术语“一个实施例”、“示例”、“具体示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施例或示例中。在本说明书中,对上述术语的示意性表述不一定指的是相同的实施例或示例。而且,描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施例或示例中以合适的方式结合。In the description of this specification, descriptions referring to the terms "one embodiment", "example", "specific example" and the like mean that specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment of the present invention. In an embodiment or example. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
以上公开的本发明优选实施例只是用于帮助阐述本发明。优选实施例并没有详尽叙述所有的细节,也不限制该发明仅为的具体实施方式。显然,根据本说明书的内容,可作很多的修改和变化。本说明书选取并具体描述这些实施例,是为了更好地解释本发明的原理和实际应用,从而使所属技术领域技术人员能很好地理解和利用本发明。本发明仅受权利要求书及其全部范围和等效物的限制。The preferred embodiments of the invention disclosed above are only to help illustrate the invention. The preferred embodiments do not exhaust all details nor limit the invention to only specific embodiments. Obviously, many modifications and variations can be made based on the contents of this specification. This description selects and specifically describes these embodiments in order to better explain the principle and practical application of the present invention, so that those skilled in the art can well understand and utilize the present invention. The invention is to be limited only by the claims, along with their full scope and equivalents.
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CN217989665U (en) * | 2022-09-16 | 2022-12-09 | 新特能源股份有限公司 | Device for reducing tail gas dust removal and silicon powder recovery processing |
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