[go: up one dir, main page]

CN116236978B - Gas distributor and gas-solid reactor comprising same - Google Patents

Gas distributor and gas-solid reactor comprising same Download PDF

Info

Publication number
CN116236978B
CN116236978B CN202310118194.4A CN202310118194A CN116236978B CN 116236978 B CN116236978 B CN 116236978B CN 202310118194 A CN202310118194 A CN 202310118194A CN 116236978 B CN116236978 B CN 116236978B
Authority
CN
China
Prior art keywords
gas
distribution
distributor
distribution plate
outlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202310118194.4A
Other languages
Chinese (zh)
Other versions
CN116236978A (en
Inventor
黄龙
王鹏
孙东亮
邓雅军
宇波
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Institute of Petrochemical Technology
Original Assignee
Beijing Institute of Petrochemical Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Institute of Petrochemical Technology filed Critical Beijing Institute of Petrochemical Technology
Priority to CN202310118194.4A priority Critical patent/CN116236978B/en
Priority to PCT/CN2023/081950 priority patent/WO2024159584A1/en
Publication of CN116236978A publication Critical patent/CN116236978A/en
Application granted granted Critical
Publication of CN116236978B publication Critical patent/CN116236978B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/0278Feeding reactive fluids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/001Controlling catalytic processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)

Abstract

本发明属于化工设备领域,具体涉及一种气体分布器及包含其的气‑固反应器。该气体分布器包括沿气体流动方向依次设置的渐扩组件和分布板组件,渐扩组件包括双层分散罩,内外层分散罩之间为第一气体通道,内层分散罩内部为与第一气体通道连通的第二气体通道,沿气体流动方向第二气体通道的横截面积逐渐增大;分布板组件包括至少两个平行且间隔设置的气体分布板,相邻两气体分布板的间距Δh满足:Ch为气体射流会聚系数,取0.02~0.1m·s,为分布器出口截面气体平均流速,单位m/s,φ为气体分布板的孔隙率。本发明可提高出口气体分布均匀性且普适性好,能广泛应用于各类直径范围的反应器,特别适用于大直径反应器。

The invention belongs to the field of chemical equipment, and specifically relates to a gas distributor and a gas-solid reactor containing the same. The gas distributor includes a gradually expanding component and a distribution plate component that are arranged sequentially along the gas flow direction. The gradually expanding component includes a double-layer dispersion cover. There is a first gas channel between the inner and outer dispersion covers. The inside of the inner dispersion cover is connected to the first gas channel. The cross-sectional area of the second gas channel connected by the gas channel gradually increases along the gas flow direction; the distribution plate assembly includes at least two parallel and spaced gas distribution plates, and the distance between two adjacent gas distribution plates is Δh satisfy: Ch h is the gas jet convergence coefficient, which takes 0.02~0.1m·s, is the average gas flow velocity at the distributor outlet section, in m/s, and φ is the porosity of the gas distribution plate. The invention can improve the uniformity of outlet gas distribution and has good universal applicability, and can be widely used in reactors with various diameter ranges, and is especially suitable for large-diameter reactors.

Description

一种气体分布器及包含其的气-固反应器A gas distributor and a gas-solid reactor containing the same

技术领域Technical field

本发明属于化工设备技术领域,具体涉及一种气体分布器,特别是可用于大型反应器的多级扩压减速气体分布器,以及包含该气体分布器的气-固反应器。The invention belongs to the technical field of chemical equipment, and specifically relates to a gas distributor, especially a multi-stage diffusion deceleration gas distributor that can be used in large reactors, and a gas-solid reactor including the gas distributor.

背景技术Background technique

催化氧化、催化加氢、催化脱水、临氢胺化技术等各类连续催化反应过程具有高效、节能、环保、易于控制等优点,广泛应用于化工生产。现阶段,我国化工产业结构的装置大型化、生产智能化升级步伐加快,化工中各类气-固反应器年产量要求越来越大。原料气进入气-固反应器后,在催化剂反应层发生化学反应并制得相应的化工产品,上述反应过程中的一个关键因素是原料气在进入催化剂反应层时的分布均匀性。分布不均匀的原料气进入下游列管式、固定床式等结构反应器的气体流量不均匀,使得反应器在大型化后催化剂的负荷不均匀,即空速差异巨大,从而导致目标选择性、原料转化率、产品产量等均明显降低。Various continuous catalytic reaction processes such as catalytic oxidation, catalytic hydrogenation, catalytic dehydration, and hydroamination technology have the advantages of high efficiency, energy saving, environmental protection, and easy control, and are widely used in chemical production. At this stage, my country's chemical industry structure is accelerating the upgrading of equipment and intelligent production, and the annual output requirements of various gas-solid reactors in the chemical industry are increasing. After the raw material gas enters the gas-solid reactor, a chemical reaction occurs in the catalyst reaction layer and corresponding chemical products are produced. A key factor in the above reaction process is the uniformity of the distribution of the raw material gas when entering the catalyst reaction layer. The gas flow rate of the unevenly distributed raw gas entering the downstream tubular, fixed-bed and other structural reactors is uneven, which causes the catalyst load to be uneven after the reactor is enlarged, that is, the space velocity varies greatly, resulting in target selectivity, The raw material conversion rate and product yield were significantly reduced.

当反应器直径较小时,原料气在流动过程中会因自由扩散作用逐步分布均匀,此时经过简单进气装置的初步处理后即可使得气体分布较均匀,满足工程需求。然而,随着化工厂的年产量要求越来越大,反应器的直径也越来越大,气体在流动过程中因自身的扩散作用将无法满足气体的均布性要求,这种特性在大直径反应器中表现尤为明显,这就是所谓的“放大效应”,正是这种效应造成很多反应器工程放大过程中出现不能达产、或者不能重现中试试验结果等情况。例如,年产2万吨乙醛生产线用的催化氧化反应器的直径为2m,而年产10万吨乙醛生产线用的催化氧化反应器的直径可达4m,年产10万吨的丁二醇气相脱氢制丁内酯催化脱氢反应器直径更是达到了5~6m,若年产10万吨的反应器仅采用年产2万吨反应器的气体分布方式,必将导致生产线无法达产,甚至生产线无法启动,造成不可估量的经济损失。因此,对于高产能的大直径反应器,配置专门的气体分布装置是十分必要的。When the diameter of the reactor is small, the raw material gas will gradually be evenly distributed due to free diffusion during the flow process. At this time, after preliminary treatment by a simple air inlet device, the gas distribution can be made more even to meet engineering needs. However, as the annual output requirements of chemical plants become larger and larger, the diameter of the reactor is also getting larger and larger. The gas diffusion during the flow process will not be able to meet the gas uniformity requirements. This characteristic is not suitable for large-scale production. The performance is particularly obvious in diameter reactors. This is the so-called "amplification effect". It is this effect that causes many reactor projects to fail to reach production or fail to reproduce pilot test results during the scale-up process. For example, the diameter of the catalytic oxidation reactor used in an acetaldehyde production line with an annual output of 20,000 tons is 2m, while the diameter of the catalytic oxidation reactor used in an acetaldehyde production line with an annual output of 100,000 tons can reach 4m. The diameter of the catalytic dehydrogenation reactor for alcohol gas phase dehydrogenation to butyrolactone has reached 5 to 6 meters. If the reactor with an annual output of 100,000 tons only uses the gas distribution method of the reactor with an annual output of 20,000 tons, the production line will not be able to reach Production, and even the production line cannot be started, causing immeasurable economic losses. Therefore, for large-diameter reactors with high productivity, it is necessary to configure special gas distribution devices.

气体分布器是将气体进行均匀分布的装置,是高产能大直径反应器的重要部件。气体分布器通常安装在反应器中催化剂反应层的前端,将原料气均匀分布,使得进入催化剂反应层的原料气流量均匀。中国专利文献CN105597655A公开了一种气体分布器,包括过渡段及其内部设置的一个或若干分布板,若干分布板沿气体流动方向间隔排布,每个分布板的边缘均与过渡段的内壁连接,且分布板上设置有若干通孔。另有中国专利文献CN103619465A公开了一种包括气体分布板和截锥形侧壁的气体分布器,气体分布板具有通孔,分布器侧壁的上端连接反应器的进气口,下端与气体分布板的周缘连接。虽然上述现有技术均声称可以使气体流出分布器时达到均匀流动的目的,但事实上,由于分布板布置在过渡段(分布器侧壁)的内腔中,使得气体流经过渡段时中心区域气体主流速度很大,即与分布器中气体主体流动方向相同的速度分量很大,导致分布板下方外圆区域出现严重回流(CN103619465A出现回流的程度会小些),降低了气体分布的均匀性。The gas distributor is a device that distributes gas evenly and is an important component of high-capacity large-diameter reactors. The gas distributor is usually installed at the front end of the catalyst reaction layer in the reactor to evenly distribute the raw gas so that the flow of raw gas entering the catalyst reaction layer is uniform. Chinese patent document CN105597655A discloses a gas distributor, which includes a transition section and one or several distribution plates arranged inside. Several distribution plates are arranged at intervals along the gas flow direction, and the edge of each distribution plate is connected to the inner wall of the transition section. , and there are several through holes on the distribution board. Another Chinese patent document CN103619465A discloses a gas distributor including a gas distribution plate and a truncated cone-shaped side wall. The gas distribution plate has a through hole. The upper end of the distributor side wall is connected to the gas inlet of the reactor, and the lower end is connected to the gas distribution port. Peripheral connections of boards. Although the above-mentioned prior art all claims to achieve uniform flow when the gas flows out of the distributor, in fact, since the distribution plate is arranged in the inner cavity of the transition section (side wall of the distributor), the center of the gas flowing through the transition section is The regional gas mainstream velocity is very large, that is, the velocity component in the same direction as the main gas flow in the distributor is very large, resulting in severe backflow in the outer circle area below the distribution plate (CN103619465A has a smaller degree of backflow), reducing the uniformity of gas distribution. sex.

由此可见,现有的气体分布器的分布效果还有很大的提升空间。另外,现有技术中的分布器基本上只给出了限定化工反应工程和/或限定产能的相对优选结构尺寸,且尺寸相差巨大,并未系统性考虑分布器的结构参数如不同分布板数、通孔直径、分布板间距等对气体分布效果的影响,因此现有的分布器应用扩展性差。并且,现有技术中的分布器也没有考虑外延基础如进口管道直径、进口流速等对气体分布效果的影响,实际上,在工程中即使是同样的分布器,由于受到设计规定差异、现场配管方式等的影响,在不同工厂的气体分布效果也是差异巨大。It can be seen that there is still a lot of room for improvement in the distribution effect of existing gas distributors. In addition, the distributors in the prior art basically only provide relatively preferred structural dimensions that limit chemical reaction engineering and/or limited production capacity, and the sizes vary greatly, and the structural parameters of the distributor, such as the number of different distribution plates, are not systematically considered. , through hole diameter, distribution plate spacing, etc. affect the gas distribution effect, so the existing distributor has poor application scalability. Moreover, the distributors in the prior art do not consider the influence of epitaxial bases such as inlet pipe diameter, inlet flow rate, etc. on the gas distribution effect. In fact, even the same distributor in the project will be affected by differences in design regulations and on-site piping. Due to the influence of methods, etc., the gas distribution effects in different factories also vary greatly.

发明内容Contents of the invention

鉴于此,本发明要解决的技术问题是现有的气体分布器的分布效果受外延结构或工艺条件影响较大且出口气体分布不均匀,进而通过优化气体分布器的结构,提供一种几乎不受外延结构或工艺条件影响、可使气体均匀分布且适用于大型反应器的气-固气体分布器。In view of this, the technical problem to be solved by the present invention is that the distribution effect of the existing gas distributor is greatly affected by the epitaxial structure or process conditions and the outlet gas distribution is uneven, and then by optimizing the structure of the gas distributor, it provides an almost indispensable gas distributor. Affected by the epitaxial structure or process conditions, the gas-solid gas distributor can distribute the gas evenly and is suitable for large reactors.

为实现上述目的,本发明提供了以下技术方案:In order to achieve the above objects, the present invention provides the following technical solutions:

根据本发明的实施例,第一方面,本发明提供了一种气体分布器,包括:According to an embodiment of the present invention, in a first aspect, the present invention provides a gas distributor, including:

渐扩组件,包括第一气体分散罩及位于所述第一气体分散罩内部的第二气体分散罩,所述第二气体分散罩具有气体进口和气体出口,在所述气体进口与所述气体出口之间形成第二气体通道,沿气体流动方向上所述第二气体通道的横截面积逐渐增大;反应原料气体的进口管道设置在所述第一气体分散罩上靠近所述第二气体分散罩的气体出口处,所述第一气体分散罩与所述第二气体分散罩之间的空间形成第一气体通道,所述第一气体通道与所述第二气体通道相连通;和The gradually expanding assembly includes a first gas dispersion cover and a second gas dispersion cover located inside the first gas dispersion cover. The second gas dispersion cover has a gas inlet and a gas outlet. Between the gas inlet and the gas A second gas channel is formed between the outlets, and the cross-sectional area of the second gas channel gradually increases along the gas flow direction; the inlet pipe of the reaction raw material gas is arranged on the first gas dispersion cover close to the second gas At the gas outlet of the dispersion cover, the space between the first gas dispersion cover and the second gas dispersion cover forms a first gas channel, and the first gas channel is connected with the second gas channel; and

分布板组件,包括至少两个平行且间隔设置的气体分布板,所述气体分布板上设置有若干通孔,相邻两个所述气体分布板之间的间距Δh满足:The distribution plate assembly includes at least two parallel and spaced gas distribution plates. The gas distribution plates are provided with a number of through holes. The distance Δh between two adjacent gas distribution plates satisfies:

其中,Ch为气体射流会聚系数,在本发明中是指对气体经过通孔射流影响范围的修正系数,单位为m·s,取值为0.02~0.1;为气体分布器出口截面气体平均流速,单位为m/s;φ为气体分布板的孔隙率;Δh单位为mm;Among them, Ch h is the gas jet convergence coefficient, which in the present invention refers to the correction coefficient on the influence range of the gas passing through the through-hole jet, the unit is m·s, and the value is 0.02 to 0.1; is the average gas flow velocity at the outlet section of the gas distributor, in m/s; φ is the porosity of the gas distribution plate; Δh is in mm;

所述渐扩组件和所述分布板组件沿气体流动方向依次设置,所述第二气体通道的最大横截面积不小于所述气体分布板的面积。The gradually expanding component and the distribution plate component are arranged sequentially along the gas flow direction, and the maximum cross-sectional area of the second gas channel is not less than the area of the gas distribution plate.

在本发明的实施例中,所述气体分布板为圆形,其直径D0满足:其中,Q为流经气体反应器的气体体积流量,单位为m3/h;π为圆周率,取值为3.1415926;D0单位为mm。In the embodiment of the present invention, the gas distribution plate is circular, and its diameter D 0 satisfies: Among them, Q is the gas volume flow rate flowing through the gas reactor, the unit is m 3 /h; π is the pi ratio, the value is 3.1415926; D 0 unit is mm.

在本发明的实施例中,所述气体分布器出口截面气体平均流速u为0.1~2.5m/s。In an embodiment of the present invention, the average gas flow velocity u at the outlet section of the gas distributor is 0.1 to 2.5 m/s.

在本发明的实施例中,所述气体分布板的孔隙率φ的取值为0.3~0.5。In an embodiment of the present invention, the porosity φ of the gas distribution plate ranges from 0.3 to 0.5.

在本发明的实施例中,所述通孔在所述气体分布板上呈60°交错排布,所述通孔为圆孔,相邻两个所述通孔的孔心距d满足:其中,D3为所述通孔的直径,单位为mm,取值为0.01~0.03D0,D0为气体分布板的直径;φ为气体分布板的孔隙率,取值为0.3~0.5;π为圆周率,取值为3.1415926。In the embodiment of the present invention, the through holes are arranged staggered at 60° on the gas distribution plate, the through holes are round holes, and the hole center distance d of two adjacent through holes satisfies: Among them, D 3 is the diameter of the through hole, the unit is mm, and the value is 0.01 to 0.03D 0 , D 0 is the diameter of the gas distribution plate; φ is the porosity of the gas distribution plate, and the value is 0.3 to 0.5; π is pi, and its value is 3.1415926.

在本发明的实施例中,所述通孔的形状为三角形、正方形、长方形、菱形、十字形、六边形或椭圆形。In an embodiment of the present invention, the shape of the through hole is a triangle, a square, a rectangle, a rhombus, a cross, a hexagon or an ellipse.

在本发明的实施例中,所述通孔呈同心圆排布、直排或错排。In an embodiment of the present invention, the through holes are arranged in concentric circles, straight rows or staggered rows.

在本发明的实施例中,所述气体分布板的个数为3~6。In an embodiment of the present invention, the number of the gas distribution plates is 3 to 6.

在本发明的实施例中,所述气体分布板垂直于气体流动方向设置。In an embodiment of the present invention, the gas distribution plate is arranged perpendicular to the gas flow direction.

在本发明的实施例中,所述分布板组件还包括第一筒体,所述气体分布板的周缘与所述第一筒体的内壁连接,所述第一筒体的内部空间形成第三气体通道,所述第三气体通道与所述第二气体通道连通。In an embodiment of the present invention, the distribution plate assembly further includes a first cylinder, the peripheral edge of the gas distribution plate is connected to the inner wall of the first cylinder, and the internal space of the first cylinder forms a third cylinder. Gas channel, the third gas channel is connected with the second gas channel.

在本发明的实施例中,所述第二气体分散罩与所述第二气体通道的横截面之间的夹角α为30~70°,优选为45~65°。In an embodiment of the present invention, the angle α between the cross section of the second gas dispersion cover and the second gas channel is 30° to 70°, preferably 45° to 65°.

在本发明的实施例中,所述第二气体分散罩的高度H2满足:其中,Bh为第二气体分散罩的高度系数,取0.5~0.8;D0为气体分布板的直径(如前所述),单位为mm;α为第二气体分散罩与第二气体通道的横截面之间的夹角,取30~70°,优选取45~65°。In an embodiment of the present invention, the height H2 of the second gas dispersion cover satisfies: Among them, B h is the height coefficient of the second gas dispersion hood, which is 0.5 to 0.8; D 0 is the diameter of the gas distribution plate (as mentioned above), in mm; α is the second gas dispersion hood and the second gas channel The angle between the cross sections is 30 to 70°, preferably 45 to 65°.

在本发明的实施例中,所述第一气体分散罩的顶部与所述第二气体分散罩的气体进口之间的间距不小于0.25D0,D0为气体分布板的直径(如前所述),单位为mm。In an embodiment of the present invention, the distance between the top of the first gas dispersion hood and the gas inlet of the second gas dispersion hood is not less than 0.25D 0 , where D 0 is the diameter of the gas distribution plate (as mentioned above (described above), the unit is mm.

在本发明的实施例中,所述进口管道为至少1个,当所述进口管道为2个以上时,所述进口管道对称设置于所述第一气体分散罩的外壁上。In an embodiment of the present invention, there is at least one inlet pipe. When there are more than two inlet pipes, the inlet pipes are symmetrically arranged on the outer wall of the first gas dispersion cover.

在本发明的实施例中,所述进口管道的直径Dinlet或等效直径De为0.1~0.2D0,D0为气体分布板的直径(如前所述),单位为mm。In an embodiment of the present invention, the diameter D inlet or the equivalent diameter De of the inlet pipe is 0.1 to 0.2D 0 , where D 0 is the diameter of the gas distribution plate (as mentioned above), and the unit is mm.

在本发明的实施例中,所述进口管道的长度Linlet为1.0~2.0Dinlet,Dinlet为进口管道的直径(如前所述),单位为mm。In the embodiment of the present invention, the length L inlet of the inlet pipe is 1.0 to 2.0 D inlet , where D inlet is the diameter of the inlet pipe (as mentioned above), and the unit is mm.

在本发明的实施例中,所述进口管道与所述第一气体分散罩的底面之间的间距hinlet为0~900mm。In an embodiment of the present invention, the distance h inlet between the inlet pipe and the bottom surface of the first gas dispersion cover is 0 to 900 mm.

根据本发明的实施例,第二方面,本发明还提供了一种气-固反应器,包括上述气体分布器。According to an embodiment of the present invention, in a second aspect, the present invention also provides a gas-solid reactor, including the above gas distributor.

与现有技术相比,本发明的技术方案具有如下优点:Compared with the existing technology, the technical solution of the present invention has the following advantages:

1、本发明实施例提供的气体分布器,包括沿气体流动方向依次设置的渐扩组件和分布板组件,渐扩组件包括第一气体分散罩及位于其内部的第二气体分散罩,第二气体分散罩具有气体进口和气体出口,在第二气体分散罩的气体进口与气体出口之间形成第二气体通道,沿气体流动方向上第二气体通道的横截面积逐渐增大;反应原料气体的进口管道设置在第一气体分散罩上靠近第二气体分散罩的气体出口处,第一气体分散罩与第二气体分散罩之间的空间形成第一气体通道,第一气体通道与第二气体通道相连通;分布板组件包括至少两个平行且间隔设置的气体分布板,气体分布板上设置有若干通孔,相邻两个气体分布板之间的间距Δh(单位mm)满足:其中,Ch为气体射流会聚系数,单位为m·s,取值为0.02~0.1,/>为气体分布器出口截面气体平均流速,单位为m/s,φ为气体分布板的孔隙率。由此使得气体进入分布器后,在第一气体通道中受到第二气体分散罩壁面的阻挡,沿着第二气体分散罩的外壁面向第二气体分散罩的气体进口流动并聚集,实现了气体的第一级扩压整流;随后,气体进入第二气体通道,随着流通面积的逐渐增大,中心区域气体主流速度逐渐减小,气体实现了第二级减速预分布;通过将渐扩组件与分布板组件分开设置,二者顺序连接,使得气体从渐扩组件流进分布板组件后,在多层多孔结构的气体分布板的作用下,一方面由于节流阻力,促使气流径向均匀,另一方面由于通孔节流作用形成气体射流,经过多个通孔的各股射流气体会在气体分布板下方聚集产生一个会聚区,分布板间距Δh满足上述条件时,可确保会聚区具有足够的空间使气体射流间相互卷吸和干扰,促进气体实现第三级的节流主分布。气体依次经过上述“扩压整流”-“减速预分布”-“节流主分布”三级分布,能够进一步提高分布器出口气体分布的均匀性,同时由于“扩压整流”作用,还能消除进口管道的结构参数(直径、长度、高度)以及分布器进口气体流速分布对分布器性能的影响,极大地提高了分布器的普适性,使得本发明的气体分布器能够广泛应用于各类直径范围的反应器,特别适用于大直径反应器,均具有很好的气体均匀分布效果。1. The gas distributor provided by the embodiment of the present invention includes a gradually expanding component and a distribution plate component that are arranged sequentially along the gas flow direction. The gradually expanding component includes a first gas dispersion cover and a second gas dispersion cover located inside it. The gas dispersion hood has a gas inlet and a gas outlet. A second gas channel is formed between the gas inlet and the gas outlet of the second gas dispersion hood. The cross-sectional area of the second gas channel gradually increases along the gas flow direction; the reaction raw material gas The inlet pipe is arranged on the first gas dispersion cover close to the gas outlet of the second gas dispersion cover. The space between the first gas dispersion cover and the second gas dispersion cover forms a first gas channel, and the first gas channel and the second gas dispersion cover form a first gas channel. The gas channels are connected; the distribution plate assembly includes at least two parallel and spaced gas distribution plates. A number of through holes are provided on the gas distribution plate. The distance Δh (unit: mm) between two adjacent gas distribution plates satisfies: Among them, C h is the gas jet convergence coefficient, the unit is m·s, the value is 0.02~0.1,/> is the average gas flow velocity at the outlet section of the gas distributor, in m/s, and φ is the porosity of the gas distribution plate. As a result, after the gas enters the distributor, it is blocked by the wall surface of the second gas dispersion cover in the first gas channel, flows and gathers along the outer wall of the second gas dispersion cover toward the gas inlet of the second gas dispersion cover, thereby realizing the gas The first-stage diffusion rectification; then, the gas enters the second gas channel. As the flow area gradually increases, the main flow velocity of the gas in the central area gradually decreases, and the gas achieves the second-stage deceleration pre-distribution; by gradually expanding the component It is set up separately from the distribution plate assembly, and the two are connected sequentially, so that after the gas flows from the gradually expanding assembly into the distribution plate assembly, under the action of the multi-layer porous structure of the gas distribution plate, on the one hand, due to the throttling resistance, the air flow is made radially uniform , on the other hand, due to the through-hole throttling effect to form a gas jet, each jet gas passing through multiple through-holes will gather under the gas distribution plate to form a convergence area. When the distribution plate spacing Δh meets the above conditions, it can ensure that the convergence area has Enough space allows the gas jets to entrain and interfere with each other, promoting the third-level throttling main distribution of gas. The gas is sequentially distributed through the above three levels of "diffusion rectification" - "deceleration pre-distribution" - "throttle main distribution", which can further improve the uniformity of gas distribution at the distributor outlet. At the same time, due to the "diffusion rectification" effect, it can also eliminate The influence of the structural parameters (diameter, length, height) of the inlet pipeline and the gas flow rate distribution at the inlet of the distributor on the performance of the distributor greatly improves the universality of the distributor, making the gas distributor of the present invention widely used in various types of applications. Reactors in a wide range of diameters, especially suitable for large diameter reactors, all have good gas uniform distribution effects.

2、本发明实施例提供的气体分布器,首创性地针对气体分布器的各项结构参数提出了系统、完整的设计思路,得到理性、科学的计算公式,实现分布器关键结构参数如气体分布板直径、通孔直径及孔心距、第二气体分散罩高度等的准确设定,且上述结构参数设定具有通用性,能够适用于各类直径范围的反应器。2. The gas distributor provided by the embodiment of the present invention is the first to propose a systematic and complete design idea for various structural parameters of the gas distributor, obtain rational and scientific calculation formulas, and realize the key structural parameters of the distributor such as gas distribution. The plate diameter, through hole diameter, hole center distance, second gas dispersion cover height, etc. are accurately set, and the above structural parameter settings are universal and can be applied to reactors with various diameter ranges.

3、本发明实施例提供的气体分布器结构简单,可整体嵌入现有反应器中,也可以拆分成多个组件分别安装到现有反应器中,无需改造现有反应器的结构,装配方便,造价低廉。3. The gas distributor provided by the embodiment of the present invention has a simple structure and can be embedded in an existing reactor as a whole, or can be split into multiple components and installed in the existing reactor respectively. There is no need to modify the structure or assembly of the existing reactor. Convenient and low cost.

由此可见,本发明提供了一种气体分布效果好、适用范围广、易于新建和改造实施的反应器用气体分布器,可满足各类直径范围的反应器特别是大型反应器的气体均匀分布要求,具有重大的工程价值。It can be seen that the present invention provides a gas distributor for reactors with good gas distribution effect, wide application range, easy construction and renovation implementation, and can meet the uniform gas distribution requirements of reactors in various diameter ranges, especially large reactors. , has great engineering value.

附图说明Description of the drawings

为了更清楚地说明本发明具体实施方式或现有技术中的技术方案,下面将对具体实施方式或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图是本发明的一些实施方式,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly explain the specific embodiments of the present invention or the technical solutions in the prior art, the accompanying drawings that need to be used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings in the following description The drawings illustrate some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without exerting any creative effort.

图1为实施例1提供的气体分布器的结构示意图。Figure 1 is a schematic structural diagram of the gas distributor provided in Embodiment 1.

图2为图1的剖面图。Figure 2 is a cross-sectional view of Figure 1.

图1和图2中附图标记说明如下:The reference numbers in Figures 1 and 2 are explained as follows:

1-进口管道,2-第一气体分散罩,21-封头,22-第二筒体,3-第二气体分散罩,31-气体进口,32-气体出口,4-气体分布板,5-第一筒体,6-分布器出口。1-Inlet pipe, 2-First gas dispersion cover, 21-Head, 22-Second cylinder, 3-Second gas dispersion cover, 31-Gas inlet, 32-Gas outlet, 4-Gas distribution plate, 5 -First cylinder, 6-distributor outlet.

图3为图1中的分布板通孔平面布置示意图。Figure 3 is a schematic diagram of the layout of the distribution plate through holes in Figure 1.

图4a为图1所示的气体分布器的气体分布原理示意图(正视图剖面)。Figure 4a is a schematic diagram of the gas distribution principle of the gas distributor shown in Figure 1 (front view cross-section).

图4b为图1所示的气体分布器的气体分布原理示意图(侧视图剖面)。Figure 4b is a schematic diagram of the gas distribution principle of the gas distributor shown in Figure 1 (side view cross-section).

图5为实施例1的分布器出口气体不均匀度随出口截面气体平均流速的变化图。Figure 5 is a diagram showing the variation of gas unevenness at the outlet of the distributor in Embodiment 1 with the average flow rate of the gas at the outlet cross-section.

图6为实施例1的分布器出口气体不均匀度随第二气体分散罩的夹角α的变化图。Figure 6 is a diagram showing the variation of the gas unevenness at the distributor outlet according to the angle α of the second gas dispersion cover in Embodiment 1.

图7为实施例1的分布器出口气体不均匀度随第二气体分散罩的高度与对应的圆锥体高度之比的变化图。Figure 7 is a diagram showing the variation of the gas unevenness at the distributor outlet in Embodiment 1 with the ratio of the height of the second gas dispersion cover to the corresponding cone height.

图8为实施例1的分布器出口气体不均匀度随分布板通孔直径的变化图。Figure 8 is a graph showing the variation of the gas unevenness at the distributor outlet according to the diameter of the through hole of the distribution plate in Embodiment 1.

图9为实施例1的分布器出口气体不均匀度随分布板孔隙率的变化图。Figure 9 is a diagram showing the variation of gas unevenness at the distributor outlet with the porosity of the distribution plate in Embodiment 1.

图10为实施例1的分布器出口气体不均匀度随分布板间距的变化图。Figure 10 is a diagram showing the variation of gas unevenness at the distributor outlet in Embodiment 1 with the spacing between distribution plates.

图11为实施例1的分布器出口气体不均匀度随分布板数量的变化图。Figure 11 is a graph showing the variation of gas unevenness at the distributor outlet in Embodiment 1 with the number of distribution plates.

图12为实施例1的分布器出口气体不均匀度随进口管道直径的变化图。Figure 12 is a graph showing the variation of gas unevenness at the outlet of the distributor in Embodiment 1 with the diameter of the inlet pipe.

图13为实施例1的分布器出口速度云图。Figure 13 is a graph of the outlet velocity of the distributor in Embodiment 1.

图14为实施例2的分布器出口速度云图。Figure 14 is a graph of the outlet velocity of the distributor in Embodiment 2.

图15为实施例3的分布器出口速度云图。Figure 15 is a graph of the outlet velocity of the distributor in Embodiment 3.

图16为实施例4的分布器出口速度云图。Figure 16 is a graph of the outlet velocity of the distributor in Embodiment 4.

图17a为对比例1的反应器气体速度分布云图(-1.34~28.64m/s主流速度范围)。Figure 17a is the reactor gas velocity distribution cloud diagram of Comparative Example 1 (mainstream velocity range -1.34~28.64m/s).

图17b为对比例1的反应器气体速度分布云图(0~28.64m/s主流速度范围)。Figure 17b is the reactor gas velocity distribution cloud diagram of Comparative Example 1 (mainstream velocity range of 0~28.64m/s).

图18a为对比例2的分布器出口速度分布云图(-0.34~2.27m/s主流速度范围)。Figure 18a shows the distribution cloud diagram of the distributor outlet velocity in Comparative Example 2 (main stream velocity range of -0.34~2.27m/s).

图18b为对比例2的分布器出口速度分布云图(0~2.27m/s主流速度范围)。Figure 18b shows the distribution cloud diagram of the distributor outlet velocity in Comparative Example 2 (mainstream velocity range of 0~2.27m/s).

图19为对比例3提供的气体分布器的结构示意图。Figure 19 is a schematic structural diagram of the gas distributor provided in Comparative Example 3.

图20为对比例3的分布器出口速度分布云图。Figure 20 is a cloud diagram of the distributor outlet velocity distribution in Comparative Example 3.

图21a为对比例4的分布器出口速度分布云图(-0.15~2.33m/s主流速度范围)。Figure 21a is a cloud diagram of the distributor outlet velocity distribution of Comparative Example 4 (mainstream velocity range of -0.15~2.33m/s).

图21b为对比例4的分布器出口速度分布云图(0~2.33m/s主流速度范围)。Figure 21b is a cloud diagram of the distributor outlet velocity distribution of Comparative Example 4 (main stream velocity range of 0~2.33m/s).

图22a为对比例5的分布器出口速度分布云图(-0.1.6~2.52m/s主流速度范围)。Figure 22a is a cloud diagram of the distributor outlet velocity distribution of Comparative Example 5 (main stream velocity range of -0.1.6~2.52m/s).

图22b为对比例5的分布器出口速度分布云图(0~2.52m/s主流速度范围)。Figure 22b is a cloud diagram of the distributor outlet velocity distribution of Comparative Example 5 (mainstream velocity range of 0~2.52m/s).

图23a为对比例6的分布器出口速度分布云图(-1.67~5.66m/s主流速度范围)。Figure 23a is a cloud diagram of the distributor outlet velocity distribution of Comparative Example 6 (main flow velocity range -1.67~5.66m/s).

图23b为对比例6的分布器出口速度分布云图(0~5.66m/s主流速度范围)。Figure 23b is a cloud diagram of the distributor outlet velocity distribution of Comparative Example 6 (mainstream velocity range of 0~5.66m/s).

图24为对比例7分布器在出口平均流速为0.1m/s时出口气体速度分布云图。Figure 24 is a cloud diagram of the outlet gas velocity distribution of the sparger of Comparative Example 7 when the average outlet flow rate is 0.1m/s.

图25a为对比例7分布器在出口平均流速为1m/s时出口气体速度分布云图(-0.5~3.24m/s主流速度范围)。Figure 25a is a cloud diagram of the outlet gas velocity distribution of the sparger of Comparative Example 7 when the average outlet flow velocity is 1m/s (mainstream velocity range of -0.5~3.24m/s).

图25b为对比例7分布器在出口平均流速为1m/s时出口气体速度分布云图(0~3.24m/s主流速度范围)。Figure 25b is a cloud diagram of the outlet gas velocity distribution of the sparger of Comparative Example 7 when the average outlet flow velocity is 1 m/s (main stream velocity range of 0 to 3.24 m/s).

图26a为对比例7分布器在出口平均流速为3m/s时出口气体速度分布云图(-1.25~9.27m/s主流速度范围)。Figure 26a is a cloud diagram of the outlet gas velocity distribution of the sparger of Comparative Example 7 when the average outlet flow velocity is 3m/s (mainstream velocity range -1.25~9.27m/s).

图26b为对比例7分布器在出口平均流速为3m/s时出口气体速度分布云图(0~9.27m/s主流速度范围)。Figure 26b is a cloud diagram of the outlet gas velocity distribution of the sparger of Comparative Example 7 when the average outlet flow velocity is 3m/s (mainstream velocity range of 0~9.27m/s).

图27a为对比例7分布器在出口平均流速为7m/s时出口气体速度分布云图(-3.06~21.9m/s主流速度范围)。Figure 27a is a cloud diagram of the outlet gas velocity distribution of the sparger of Comparative Example 7 when the average outlet flow velocity is 7m/s (mainstream velocity range -3.06~21.9m/s).

图27b为对比例7分布器在出口平均流速为7m/s时出口气体速度分布云图(0~21.9m/s主流速度范围)。Figure 27b is a cloud diagram of the outlet gas velocity distribution of the sparger of Comparative Example 7 when the average outlet flow velocity is 7m/s (mainstream velocity range of 0~21.9m/s).

图28为对比例7的分布器出口气体不均匀度随出口平均流速的变化图。Figure 28 is a graph showing the variation of the gas unevenness at the outlet of the distributor of Comparative Example 7 with the outlet average flow rate.

图29a为对比例8分布器在进口管道直径130mm时出口气体速度分布云图(-0.54~4.76m/s主流速度范围)。Figure 29a shows the outlet gas velocity distribution cloud diagram of the sparger of Comparative Example 8 when the inlet pipe diameter is 130mm (main flow velocity range -0.54~4.76m/s).

图29b为对比例8分布器在进口管道直径130mm时出口气体速度分布云图(0~4.76m/s主流速度范围)。Figure 29b shows the outlet gas velocity distribution cloud diagram of the sparger of Comparative Example 8 when the inlet pipe diameter is 130mm (main stream velocity range of 0~4.76m/s).

图30a为对比例8分布器在进口管道直径283mm时出口气体速度分布云图(-0.36~3.43m/s主流速度范围)。Figure 30a is a cloud diagram of the outlet gas velocity distribution of the sparger of Comparative Example 8 when the inlet pipe diameter is 283mm (main flow velocity range -0.36~3.43m/s).

图30b为对比例8分布器在进口管道直径283mm时出口气体速度分布云图(0~3.43m/s主流速度范围)。Figure 30b is a cloud diagram of the outlet gas velocity distribution of the sparger of Comparative Example 8 when the inlet pipe diameter is 283mm (main stream velocity range of 0~3.43m/s).

图31为对比例8分布器在进口管道直径566mm时出口气体速度分布云图。Figure 31 is a cloud diagram of the outlet gas velocity distribution of the sparger of Comparative Example 8 when the inlet pipe diameter is 566mm.

图32为对比例8分布器在进口管道直径849mm时出口气体速度分布云图。Figure 32 is a cloud diagram of the outlet gas velocity distribution of the sparger of Comparative Example 8 when the inlet pipe diameter is 849mm.

图33为对比例8的分布器出口气体不均匀度随进口管道直径的变化图。Figure 33 is a diagram showing the variation of the gas unevenness at the distributor outlet with the diameter of the inlet pipe of Comparative Example 8.

具体实施方式Detailed ways

提供下述实施例是为了更好地进一步理解本发明,并不局限于所述最佳实施方式,不对本发明的内容和保护范围构成限制,任何人在本发明的启示下或是将本发明与其他现有技术的特征进行组合而得出的任何与本发明相同或相近似的产品,均落在本发明的保护范围之内。The following examples are provided to better understand the present invention. They are not limited to the best embodiments and do not limit the content and protection scope of the present invention. Anyone who is inspired by the present invention or uses the present invention to Any product that is identical or similar to the present invention by combining it with other features of the prior art falls within the protection scope of the present invention.

实施例中未注明具体实验步骤或条件者,按照本领域内的文献所描述的常规实验步骤的操作或条件即可进行。所用试剂或仪器未注明生产厂商者,均为可以通过市购获得的常规试剂产品。If no specific experimental steps or conditions are specified in the examples, the procedures can be carried out according to the conventional experimental steps or conditions described in literature in the field. If the manufacturer of the reagents or instruments used is not indicated, they are all conventional reagent products that can be purchased commercially.

需要说明的是,本发明中,“所述通孔在所述气体分布板上呈60°交错排布”是指,在所述气体分布板上不处于最外围的通孔的周围(即360°)均匀分布有六个通孔。术语“分布器”与“气体分布器”为同一个概念,“分散罩”与“气体分散罩”为同一个概念,“分布板”与“气体分布板”为同一个概念。同一个参数符号在本发明中指代的含义相同。It should be noted that in the present invention, "the through holes are staggered at 60° on the gas distribution plate" means that the through holes on the gas distribution plate are not located around the outermost through holes (ie, 360 degrees). °) There are six through holes evenly distributed. The terms "distributor" and "gas distributor" are the same concept, "dispersion hood" and "gas distribution hood" are the same concept, and "distribution plate" and "gas distribution plate" are the same concept. The same parameter symbol has the same meaning in the present invention.

为了定量的评价气体分布器的分布效果,本发明定义了分布器出口气体不均匀度σ,其计算方法为:该公式中,M为分布器出口截面各离散点的数目,ui为分布器出口截面各离散点上的主流速度,即与分布器中气体主体流动方向相同的速度分量,/>为分布器出口截面气体平均流速,∑为累加求和计算符号。根据该公式的物理意义,分布器出口气体不均匀度σ值越小,气体分布越均匀,越可以提高化工反应效率。当气体完全均匀分布时,分布器出口气体不均匀度σ值为零,这是理想分布状态,但实际而言,当分布器出口气体不均匀度σ值不大于0.4时,气体已基本接近均匀分布,且σ值越小越好。因此,本发明建议将分布器出口气体不均匀度σ值不大于0.4,作为满足化工反应生产的定量评价标准。In order to quantitatively evaluate the distribution effect of the gas distributor, the present invention defines the gas unevenness σ at the distributor outlet, and its calculation method is: In this formula, M is the number of discrete points in the sparger outlet section, u i is the mainstream velocity at each discrete point in the sparger outlet section, that is, the velocity component in the same direction as the main flow of the gas in the sparger, /> is the average gas flow velocity at the distributor outlet section, and Σ is the cumulative summation calculation symbol. According to the physical meaning of this formula, the smaller the value of gas unevenness σ at the outlet of the distributor, the more uniform the gas distribution will be, and the more chemical reaction efficiency can be improved. When the gas is completely uniformly distributed, the gas non-uniformity σ value at the distributor outlet is zero, which is an ideal distribution state. However, in reality, when the gas non-uniformity σ value at the distributor outlet is not greater than 0.4, the gas is basically close to uniform. distribution, and the smaller the σ value, the better. Therefore, the present invention recommends that the gas non-uniformity σ value at the outlet of the distributor be no more than 0.4 as a quantitative evaluation standard for chemical reaction production.

化工生产过程中,原料气由进气管道进入催化反应器,在反应器中经分布器均匀分布后,进入催化剂反应层参与化学反应。在此反应过程中的一个关键因素是原料气在进入催化剂反应层时的分布均匀性。当反应器直径较大时,由于“放大效应”,分布器的均匀分布效果明显降低,难以满足工程上的气体分布均匀性要求。为解决这一技术问题,本发明首创性地提出了“扩压整流”-“减速预分布”-“节流主分布”的多级分布思想,发明了以“双层分散罩-多层分布板”为主体的多级扩压减速气体分布器,该气体分布器不仅能够满足大型化工反应器对气体均匀分布的要求,同时还能消除进口管道的结构参数及进口气体流速分布对分布器性能的影响,极大地提高分布器的普适性,使得本发明的气体分布器能够广泛应用于各类直径范围的反应器,特别适用于大直径反应器。In the chemical production process, the raw material gas enters the catalytic reactor through the air inlet pipe. After being evenly distributed in the reactor through the distributor, it enters the catalyst reaction layer to participate in chemical reactions. A key factor in this reaction process is the uniformity of the distribution of the feed gas when entering the catalyst reaction layer. When the diameter of the reactor is large, the uniform distribution effect of the distributor is significantly reduced due to the "amplification effect", making it difficult to meet the engineering gas distribution uniformity requirements. In order to solve this technical problem, the present invention pioneered the multi-level distribution idea of "expansion rectification"-"deceleration pre-distribution"-"throttle main distribution", and invented the "double-layer dispersion cover-multi-layer distribution" "plate" is the main body of the multi-stage diffusion deceleration gas distributor. This gas distributor can not only meet the requirements for uniform gas distribution in large chemical reactors, but also eliminate the impact of the structural parameters of the inlet pipeline and the flow rate distribution of the inlet gas on the distributor performance. The influence greatly improves the universality of the distributor, so that the gas distributor of the present invention can be widely used in reactors with various diameter ranges, and is especially suitable for large-diameter reactors.

根据本发明的实施例,本发明提供的气体分布器包括:According to an embodiment of the present invention, the gas distributor provided by the present invention includes:

渐扩组件,包括第一气体分散罩及位于所述第一气体分散罩内部的第二气体分散罩,所述第二气体分散罩具有气体进口和气体出口,在所述气体进口与所述气体出口之间形成第二气体通道,沿气体流动方向上所述第二气体通道的横截面积逐渐增大;反应原料气体的进口管道设置在所述第一气体分散罩上靠近所述第二气体分散罩的气体出口处,所述第一气体分散罩与所述第二气体分散罩之间的空间形成第一气体通道,所述第一气体通道与所述第二气体通道相连通;和The gradually expanding assembly includes a first gas dispersion cover and a second gas dispersion cover located inside the first gas dispersion cover. The second gas dispersion cover has a gas inlet and a gas outlet. Between the gas inlet and the gas A second gas channel is formed between the outlets, and the cross-sectional area of the second gas channel gradually increases along the gas flow direction; the inlet pipe of the reaction raw material gas is arranged on the first gas dispersion cover close to the second gas At the gas outlet of the dispersion cover, the space between the first gas dispersion cover and the second gas dispersion cover forms a first gas channel, and the first gas channel is connected with the second gas channel; and

分布板组件,包括至少两个平行且间隔设置的气体分布板,所述气体分布板上设置有若干通孔,相邻两个所述气体分布板之间的间距Δh(单位mm)满足:The distribution plate assembly includes at least two parallel and spaced gas distribution plates. The gas distribution plates are provided with a number of through holes. The distance Δh (unit mm) between two adjacent gas distribution plates satisfies:

其中,Ch为气体射流会聚系数,在本发明中是指对气体经过通孔射流影响范围的修正系数,单位为m·s,取值为0.02~0.1,为气体分布器出口截面气体平均流速,单位为m/s,φ为气体分布板的孔隙率;Among them, Ch h is the gas jet convergence coefficient. In the present invention, it refers to the correction coefficient on the influence range of the gas passing through the through-hole jet. The unit is m·s and the value is 0.02~0.1. is the average gas flow velocity at the outlet section of the gas distributor, in m/s, and φ is the porosity of the gas distribution plate;

所述渐扩组件和所述分布板组件沿气体流动方向依次设置,所述第二气体通道的最大横截面积不小于所述气体分布板的面积。The gradually expanding component and the distribution plate component are arranged sequentially along the gas flow direction, and the maximum cross-sectional area of the second gas channel is not less than the area of the gas distribution plate.

本发明的渐扩组件中,第一气体通道和第二气体通道的横截面积均沿气体流动方向逐渐增大,这使得气体从进口管道进入第一气体通道后,随着气体的流动,气体的动压减小,静压增大,实现了对气体的扩压整流,接着气体进入第二气体通道,其动压进一步减小,静压进一步增大,实现了对气体的减速预分布。In the gradually expanding assembly of the present invention, the cross-sectional areas of the first gas channel and the second gas channel gradually increase along the gas flow direction, which makes the gas enter the first gas channel from the inlet pipe. As the gas flows, the gas The dynamic pressure decreases and the static pressure increases, achieving diffusion and rectification of the gas. Then the gas enters the second gas channel, its dynamic pressure further decreases, and the static pressure further increases, achieving deceleration and pre-distribution of the gas.

本发明人研究发现,现有技术直接将分布板布置在分散罩(对应于本发明中的“第二气体通道”)内,由于中心区域气体主流速度很大,会导致分布板下方外圆区域出现严重回流,降低了分布板功效,因此本发明首创性地设置双层分散罩,并将其与分布板组件分开设置,二者顺序连接,由此使得气体进入分布器后,在第一气体通道中受到第二气体分散罩壁面的阻挡,沿着第二气体分散罩的外壁面向第二气体分散罩的气体进口流动并聚集,实现了气体的第一级扩压整流;随后,气体进入第二气体通道,随着流通面积的逐渐增大,中心区域气体主流速度逐渐减小,气体实现了第二级减速预分布;通过将双层分散罩(渐扩组件)与分布板组件分开设置,二者顺序连接,使得气体从渐扩组件流进分布板组件后,在多层多孔结构的气体分布板的作用下,一方面由于节流阻力,促使气流径向均匀,另一方面由于通孔节流作用形成气体射流,经过多个通孔的各股射流气体会在气体分布板下方聚集产生一个会聚区,分布板间距Δh满足上述条件时,可确保会聚区具有足够的空间使各股气体射流间相互卷吸和干扰,促进气体实现节流主分布,进而有效提高分布器出口气体分布的均匀性,同时由于“扩压整流”作用,还能消除进口管道的结构参数(直径、长度、高度)以及分布器进口气体流速分布对分布器性能的影响,极大地提高了分布器的普适性,使得本发明的气体分布器能够广泛应用于各类直径范围的反应器,特别适用于大直径反应器,均具有很好的气体均匀分布效果。The inventor found through research that the existing technology directly arranges the distribution plate in the dispersion cover (corresponding to the "second gas channel" in the present invention). Since the main flow velocity of the gas in the central area is very large, the outer circular area below the distribution plate will be Severe backflow occurs, which reduces the efficiency of the distribution plate. Therefore, the present invention is the first to set up a double-layer dispersion cover and set it separately from the distribution plate assembly. The two are connected in sequence, so that after the gas enters the distributor, the first gas The channel is blocked by the wall of the second gas dispersion hood, flows and gathers along the outer wall of the second gas dispersion hood toward the gas inlet of the second gas dispersion hood, realizing the first-stage diffusion rectification of the gas; subsequently, the gas enters the second gas dispersion hood. In the second gas channel, as the circulation area gradually increases, the main flow velocity of the gas in the central area gradually decreases, and the gas realizes the second-stage deceleration pre-distribution; by setting the double-layer dispersion cover (gradual expansion component) and the distribution plate component separately, The two are connected sequentially, so that after the gas flows from the gradually expanding component into the distribution plate component, under the action of the gas distribution plate with a multi-layer porous structure, on the one hand due to the throttling resistance, the air flow is made radially uniform, and on the other hand due to the through holes The throttling effect forms a gas jet. Each jet gas passing through multiple through holes will gather under the gas distribution plate to form a convergence area. When the distribution plate spacing Δh meets the above conditions, it can ensure that the convergence area has enough space for each strand of gas. The jets entrain and interfere with each other, promoting the main distribution of gas to achieve throttling, thereby effectively improving the uniformity of gas distribution at the outlet of the distributor. At the same time, due to the "diffusion rectification" effect, the structural parameters of the inlet pipe (diameter, length, height) and the influence of the gas flow rate distribution at the sparger inlet on the performance of the sparger, which greatly improves the universality of the sparger, so that the gas sparger of the present invention can be widely used in reactors with various diameter ranges, especially suitable for large-scale reactors. diameter reactors, all have good gas uniform distribution effects.

在本发明的实施例中,从第二气体分散罩的气体出口开始布置多层分布板,分布板间距是关键参数,决定了分布板组件的长度。根据常识,分布板数量越多,则气流速度分布越均匀。然而本发明人研究后惊讶地发现,只有当分布板间距处于合理范围时,才能达到分布板布置越多,气流分布越均匀的效果。当分布板间距较小,则会出现分布板“短路”现象,分布板功能失效,此时在一定的分布板组件长度限定下,增加分布板数量反而会降低气体分布均匀性。这一现象的可能解释为:当分布板间距较小,且气体流过分布板通孔流速较大时,气体将直接穿过下层分布板,无法在分布板下方形成会聚区,此时气体流经两层分布板与流经单层分布板的流动情况相类似,即下层分布板不起作用,功能失效,此时间距较小的多层分布板仅相当于一层分布板,根据计算研究和工程经验,一层分布板很难达到气体均匀分布的效果。分布板短路会明显降低反应器的生产产能,合理的增加分布板间距可避免分布板“短路”现象。但当分布板间距较大时,会导致分布板组件整体长度较长,不利于实际的生产线建设。通过上述分析,本发明认为相邻两个气体分布板之间的间距Δh(单位mm)应满足:其中/>为气体分布器出口截面气体平均流速,单位为m/s,取值为0.1~2.5;φ为气体分布板的孔隙率,取值为0.3~0.5;发明人通过理论分析以及实际工程经验,建议气体射流会聚系数Ch的取值为0.02~0.1。并且考虑到实际施工安装,分布板间距的绝对高度值应大于100mm。In the embodiment of the present invention, multi-layer distribution plates are arranged starting from the gas outlet of the second gas dispersion hood, and the spacing between the distribution plates is a key parameter, which determines the length of the distribution plate assembly. According to common sense, the greater the number of distribution plates, the more even the air velocity distribution will be. However, after research, the inventor surprisingly found that only when the distribution plate spacing is within a reasonable range, the more distribution plates are arranged, the more uniform the airflow distribution can be achieved. When the spacing between distribution plates is small, the distribution plate "short circuit" phenomenon will occur and the function of the distribution plate will fail. At this time, under a certain length limit of the distribution plate components, increasing the number of distribution plates will reduce the uniformity of gas distribution. The possible explanation for this phenomenon is: when the distance between the distribution plates is small and the flow rate of the gas flowing through the through holes of the distribution plate is high, the gas will directly pass through the lower distribution plate and cannot form a convergence area under the distribution plate. At this time, the gas flow The flow situation through two-layer distribution plates is similar to that through a single-layer distribution plate, that is, the lower distribution plate does not work and its function fails. At this time, the multi-layer distribution plate with a small distance is only equivalent to one layer of distribution plate. According to calculation research Based on engineering experience, it is difficult to achieve uniform gas distribution with one layer of distribution plate. A short circuit of the distribution plate will significantly reduce the production capacity of the reactor. Reasonably increasing the spacing between the distribution plates can avoid the "short circuit" phenomenon of the distribution plates. However, when the distance between distribution boards is large, the overall length of the distribution board components will be longer, which is not conducive to actual production line construction. Through the above analysis, the present invention believes that the distance Δh (unit mm) between two adjacent gas distribution plates should satisfy: Among them/> is the average flow rate of gas at the outlet section of the gas distributor, in m/s, with a value of 0.1 to 2.5; φ is the porosity of the gas distribution plate, with a value of 0.3 to 0.5. Through theoretical analysis and practical engineering experience, the inventor suggests The value of the gas jet convergence coefficient Ch is 0.02 to 0.1. And considering the actual construction and installation, the absolute height value of the distribution plate spacing should be greater than 100mm.

在合理的分布板间距基础上,分布板数量越多,气体的分布效果越好。然而研究发现,当分布板数量大于4后,分布板数量的增加对气流速度分布均匀化的提升有限;同时当分布板数量大于6时会导致分布板组件整体长度较长,不利于实际的生产线建设。考虑化工实际建设与生产,本发明中分布板数量为至少2层,优选为3~6层。On the basis of reasonable distribution plate spacing, the greater the number of distribution plates, the better the gas distribution effect. However, research has found that when the number of distribution plates is greater than 4, the increase in the number of distribution plates has limited improvement in the uniformity of air flow velocity distribution; at the same time, when the number of distribution plates is greater than 6, the overall length of the distribution plate assembly will be longer, which is not conducive to the actual production line. construction. Considering the actual construction and production of chemical industry, the number of distribution plates in the present invention is at least 2 layers, preferably 3 to 6 layers.

在本发明的一些实施例中,所述气体分布板为圆形,其直径D0(单位mm)满足:其中,Q为流经气体反应器的气体体积流量,单位为m3/h,π为圆周率,取值为3.1415926,/>为气体分布器出口截面气体平均流速,单位为m/s,取值为0.1~2.5。这里需要说明的是,为方便计算和施工,气体分布板直径D0、第二气体分散罩的气体出口横截面直径、第一气体分散罩的底面直径都相同,统称为分布器直径。分布器直径主要依据生产规模要求,由设计工艺条件下的气体流量所确定。分布器直径的主要约束条件为:(a)气体经过气体分布器形成均匀分布的气流,进入反应器中的催化剂反应层,在催化剂的作用下参与化工反应,均匀的较大的流速可强化反应中的传质和传热过程;(b)较大的流速有利于增加反应器的生产负荷,提高产能,一般要求气体的流速大于0.1m/s;(c)气体流速还应满足化工反应过程的需求,过大的流速会导致原料气在催化层中停留时间过短,化学反应不充分,反应器流速的上限受到化学反应类型的限制;(d)特别而言,对于气-固相反应,气体流速的上限还受到反应器压降的限制,气体流速过大,流经催化层后,压降过大,将无法满足下游生产需求,如依据1952年Ergun提出的反应器压降关联公式,压降与流速平方关联。因此对现有大部分反应器而言,进入催化剂床层气体的平均流速一般会低于2.5m/s,极为罕见会出现5m/s以上的速度。在上述约束条件下,大型气-固反应器中,一般要求进入催化剂反应层的气体平均流速为0.1~2.5m/s。In some embodiments of the present invention, the gas distribution plate is circular, and its diameter D 0 (unit mm) satisfies: Among them, Q is the gas volume flow rate flowing through the gas reactor, the unit is m 3 /h, π is the pi ratio, the value is 3.1415926,/> It is the average gas flow velocity at the outlet section of the gas distributor, the unit is m/s, and the value is 0.1 to 2.5. It should be noted here that, to facilitate calculation and construction, the gas distribution plate diameter D 0 , the gas outlet cross-sectional diameter of the second gas dispersion hood, and the bottom diameter of the first gas dispersion hood are all the same, collectively referred to as the distributor diameter. The diameter of the distributor is mainly determined by the production scale requirements and the gas flow rate under the design process conditions. The main constraints on the diameter of the distributor are: (a) The gas passes through the gas distributor to form a uniformly distributed gas flow, enters the catalyst reaction layer in the reactor, and participates in chemical reactions under the action of the catalyst. A uniform and larger flow rate can strengthen the reaction The mass transfer and heat transfer process in the reactor; (b) A larger flow rate is conducive to increasing the production load of the reactor and increasing the production capacity. Generally, the gas flow rate is required to be greater than 0.1m/s; (c) The gas flow rate should also meet the requirements of the chemical reaction process demand, excessive flow rate will result in the residence time of the raw material gas in the catalytic layer being too short, and the chemical reaction will be insufficient. The upper limit of the reactor flow rate is limited by the type of chemical reaction; (d) In particular, for gas-solid phase reactions , the upper limit of the gas flow rate is also limited by the pressure drop of the reactor. If the gas flow rate is too large, the pressure drop after flowing through the catalytic layer will be too large, and it will not be able to meet the downstream production needs. For example, according to the reactor pressure drop correlation formula proposed by Ergun in 1952 , the pressure drop is related to the square of the flow rate. Therefore, for most existing reactors, the average flow velocity of the gas entering the catalyst bed is generally lower than 2.5m/s, and it is extremely rare for a velocity of more than 5m/s to occur. Under the above constraints, in large gas-solid reactors, the average flow rate of gas entering the catalyst reaction layer is generally required to be 0.1 to 2.5 m/s.

现有技术中对分布板结构的设计往往是针对具体工程问题,依据经验进行设计确定,目前并未公开有设计方法或标准,导致现有文献给出的优选值难以扩展或迁移至其他工况工程中,不利于工程应用。对于本发明所涉及的用于大型气-固反应器的分布器,更是未见有公开的设计方法或标准。因此,本发明系统研究了分布板结构对气体分布效果的影响,并制定出相应的优选参数。The design of distribution plate structures in the prior art is often based on specific engineering problems and is determined based on experience. Currently, no design methods or standards have been disclosed, making it difficult to expand or transfer the optimal values given in existing literature to other working conditions. In engineering, it is not conducive to engineering applications. For the distributor used in the large-scale gas-solid reactor involved in the present invention, there is no published design method or standard. Therefore, the present invention systematically studies the influence of the distribution plate structure on the gas distribution effect, and formulates corresponding optimal parameters.

本发明中对气体分布板的厚度不作限定,本领域公知气体分布板的厚度应满足气体流速所需的机械强度。并且本发明对气体分布板上的通孔的形状及其排布方式也不作特别限定,现有技术中的任何形状(如三角形、正方形、长方形、菱形、十字形、六边形或椭圆形)和/或排布方式(如常见的直排、错排或同心圆排布)的通孔都适用于本发明。作为示例,在本发明的一些实施例中,分布板垂直于气体流动方向设置,分布板结构设计为交错布置圆形通孔的圆形板。为便于圆形通孔的加工,优选分布板厚度H3小于10mm,分布板上的圆形通孔交错60度布置。本发明人在大量研究后发现,分布板圆形通孔直径对气体分布影响如下:(1)当圆形通孔直径为小于0.01D0时,圆形通孔直径较小,气体流经通孔后易形成强射流流动,气体分布效果变差,分布器出口气体均匀性随圆形通孔直径减小而降低;(2)当圆形通孔直径为0.01D0~0.04D0时,圆形通孔直径较为合理,气体通过圆形通孔产生合适的节流效应,分布板下方聚集产生合理的会聚区,会聚区气体射流间相互卷吸和干扰,气体分布效果较优,且分布器出口气体均匀性在该区间内较为稳定;(3)当圆形通孔直径大于0.04D0时,圆形通孔直径较大,气体流经通孔后不能形成有效的节流效应,气体分布效果较差,分布器出口气体均匀性随圆形通孔直径增大而降低。此外,实际工程中分布板往往需要采用先切割再组装的方式进行施工,这种施工方式不可避免地会破坏一定数量的通孔,本发明人基于多年工程经验发现,当圆形通孔直径大于0.03D0时,因施工所破坏的通孔数量占比上升,分布板实际通孔面积与理论通孔面积具有明显的差异,导致分布板实际分布效果不理想。因此综合考虑,本发明的分布板通孔直径D3(单位mm)优选为(0.01~0.03)D0,其中,D0是分布器直径(单位mm)。The thickness of the gas distribution plate is not limited in the present invention. It is well known in the art that the thickness of the gas distribution plate should meet the mechanical strength required by the gas flow rate. Moreover, the invention does not specifically limit the shape and arrangement of the through holes on the gas distribution plate. Any shape in the prior art (such as triangle, square, rectangle, rhombus, cross, hexagon or ellipse) And/or arrangement (such as common straight arrangement, staggered arrangement or concentric circle arrangement) through holes are suitable for the present invention. As an example, in some embodiments of the present invention, the distribution plate is arranged perpendicular to the direction of gas flow, and the distribution plate structure is designed as a circular plate with staggered circular through holes. In order to facilitate the processing of circular through holes, it is preferred that the thickness H 3 of the distribution plate is less than 10 mm, and the circular through holes on the distribution plate are arranged in a staggered manner at 60 degrees. After extensive research, the inventor found that the diameter of the circular through hole of the distribution plate has the following effects on gas distribution: (1) When the diameter of the circular through hole is less than 0.01D 0 , the diameter of the circular through hole is smaller, and the gas flows through the through hole. Strong jet flow is easily formed behind the hole, and the gas distribution effect becomes worse. The uniformity of gas at the distributor outlet decreases as the diameter of the circular through hole decreases; (2) When the diameter of the circular through hole is 0.01D 0 ~ 0.04D 0 , The diameter of the circular through hole is relatively reasonable, and the gas will produce a suitable throttling effect through the circular through hole. The gas will gather under the distribution plate to form a reasonable convergence area. The gas jets in the convergence area will entrain and interfere with each other. The gas distribution effect will be better and the distribution will be better. The gas uniformity at the outlet of the device is relatively stable within this interval; (3) When the diameter of the circular through hole is greater than 0.04D 0 , the diameter of the circular through hole is larger, and the gas cannot form an effective throttling effect after flowing through the through hole. The distribution effect is poor, and the uniformity of gas at the distributor outlet decreases as the diameter of the circular through hole increases. In addition, in actual projects, distribution boards often need to be constructed by cutting first and then assembling. This construction method will inevitably destroy a certain number of through holes. Based on many years of engineering experience, the inventor found that when the diameter of the circular through hole is larger than When 0.03D 0 , the proportion of the number of through holes destroyed by construction increases, and there is a significant difference between the actual through hole area of the distribution plate and the theoretical through hole area, resulting in unsatisfactory actual distribution effect of the distribution plate. Therefore, all things considered, the diameter D 3 (unit mm) of the distribution plate through hole of the present invention is preferably (0.01 to 0.03) D 0 , where D 0 is the diameter of the distributor (unit mm).

在本发明中,分布板面积较大,圆形通孔数量较多,圆形通孔交错60度布置时,根据几何关系,此时分布板圆形通孔孔心距d(单位mm)满足公式:其中,φ为分布板的孔隙率,即圆形通孔面积之和与分布板圆面积之比,取值为0.3~0.5;D3为圆形通孔直径(单位mm),取值为0.01~0.03D0,D0为气体分布板的直径;π为圆周率,计算时可取3.1415926。In the present invention, the distribution plate has a large area and a large number of circular through holes. When the circular through holes are arranged staggered at 60 degrees, according to the geometric relationship, the center distance d (unit mm) of the circular through holes of the distribution plate satisfies formula: Among them, φ is the porosity of the distribution plate, that is, the ratio of the sum of the circular through hole areas and the circular area of the distribution plate, and the value is 0.3 to 0.5; D 3 is the diameter of the circular through hole (unit: mm), and the value is 0.01 ~0.03D 0 , D 0 is the diameter of the gas distribution plate; π is the pi ratio, which can be taken as 3.1415926 for calculation.

本发明人研究后发现,分布板的孔隙率对气体分布影响如下:(1)当分布板孔隙率约等于0.3时,分布器出口气体均匀分布效果最好;(2)当分布板孔隙率大于0.3时,分布板流通面积较大,节流效应变差,分布板的分布效果下降;(3)当分布板孔隙率小于0.3时,分布板靠近壁面区域由于遮挡面积较多,该区域主流速度梯度变化较大,涡流区域占比较多;同时,分布板中心区域由于分布板通孔面积较少,气流通过通孔时真实流速较大,射流效应明显。这两种现象共同导致分布板起到的均匀分布效果下降,此时分布器出口气体均匀性随分布板孔隙率减小而降低。此外,本发明人基于多年工程经验发现,当分布板孔隙率小于0.3时,分布板通孔面积较少,分布板对气体阻力较大,压力损失较大,耗能明显增高,不利于下游催化层中的化工反应过程。考虑到实际施工中不可避免地会破坏一定数量的通孔,导致其实际孔隙率小于与理论值,因此,本发明中分布板孔隙率φ优选为0.3~0.5。After research, the inventor found that the porosity of the distribution plate has the following effects on gas distribution: (1) When the porosity of the distribution plate is approximately equal to 0.3, the uniform distribution effect of gas at the distributor outlet is best; (2) When the porosity of the distribution plate is greater than When 0.3, the circulation area of the distribution plate is larger, the throttling effect becomes worse, and the distribution effect of the distribution plate decreases; (3) When the porosity of the distribution plate is less than 0.3, the area near the wall of the distribution plate has a large shielding area, and the mainstream velocity in this area decreases. The gradient changes greatly, and the vortex area occupies a large proportion; at the same time, in the center area of the distribution plate, due to the smaller through hole area of the distribution plate, the real flow velocity of the airflow is larger when passing through the through hole, and the jet effect is obvious. These two phenomena together lead to a decrease in the uniform distribution effect of the distribution plate. At this time, the uniformity of the gas at the distributor outlet decreases as the porosity of the distribution plate decreases. In addition, based on many years of engineering experience, the inventor found that when the porosity of the distribution plate is less than 0.3, the through hole area of the distribution plate is small, the distribution plate has greater gas resistance, greater pressure loss, and significantly increased energy consumption, which is not conducive to downstream catalysis. Chemical reaction process in the layer. Considering that a certain number of through holes will inevitably be damaged during actual construction, resulting in the actual porosity being smaller than the theoretical value, therefore, the porosity φ of the distribution plate in the present invention is preferably 0.3 to 0.5.

在本发明的一些实施例中,所述分布板组件还包括第一筒体,所述气体分布板的周缘与所述第一筒体的内壁连接,所述第一筒体的内部空间形成第三气体通道,所述第三气体通道与所述第二气体通道连通。为方便安装,本发明中的所述第一筒体的形状可以是圆柱形,第二气体分散罩的气体出口端与第一筒体的气体入口端通过螺栓密封垫等顺序复合连接,连接处密封;气体经第二气体分散罩减速预分布后进入第三气体通道,第一筒体内壁安装支撑构件,从第三气体通道入口开始布置多层分布板,各层分布板之间具有上述合理间距。In some embodiments of the present invention, the distribution plate assembly further includes a first cylinder, the periphery of the gas distribution plate is connected to the inner wall of the first cylinder, and the internal space of the first cylinder forms a third cylinder. Three gas channels, the third gas channel is connected with the second gas channel. In order to facilitate installation, the shape of the first cylinder in the present invention may be cylindrical, and the gas outlet end of the second gas dispersion cover and the gas inlet end of the first cylinder are sequentially compositely connected through bolt seals, etc., and the connection points Sealing; the gas enters the third gas channel after being decelerated and pre-distributed by the second gas dispersion cover. A support member is installed on the inner wall of the first cylinder. A multi-layer distribution plate is arranged starting from the entrance of the third gas channel. The above-mentioned reasonable distribution plates are arranged between each layer of distribution plate. spacing.

在本发明的一些实施例中,所述第二气体分散罩与所述第二气体通道的横截面之间的夹角α为30~70°,从理论角度来说,第二气体分散罩的夹角α不在上述范围也是可以解决出口气体分布均匀性的问题,比如可以采用很多层(大于10层)分布板来解决,但在工程上显然是不可行的。关于该夹角,目前现有技术中未见有相关的结构设计指导依据,发明人通过分析和多年工程经验发现,第二气体分散罩的壁面与第二气体通道的横截面的夹角对气体分布均匀性影响如下:(1)该夹角小于45°,沿气体流动方向分散罩内壁面扩散程度较大,分散罩壁面处的流体容易出现边界层分离,进而产生旋涡,使气体的实际流通截面积减少,气体扩压减速效果较差,分布器出口气体均匀性差;(2)该夹角大于65°,沿气体流动方向分散罩内壁面扩散程度小,减速预分布效果不明显,同时分散罩高度明显增加,不利于实际安装加工。通过上述分析,本发明优选该夹角α为45~65°。In some embodiments of the present invention, the angle α between the cross section of the second gas dispersion cover and the second gas channel is 30° to 70°. From a theoretical perspective, the angle α of the second gas dispersion cover is Even if the included angle α is not within the above range, the problem of outlet gas distribution uniformity can be solved. For example, many layers (more than 10 layers) of distribution plates can be used to solve the problem, but it is obviously not feasible in engineering. Regarding this angle, there is currently no relevant structural design guidance in the prior art. Through analysis and years of engineering experience, the inventor found that the angle between the wall of the second gas dispersion cover and the cross-section of the second gas channel has a negative impact on the gas. The effects of distribution uniformity are as follows: (1) The included angle is less than 45°, and the degree of diffusion on the inner wall of the dispersion hood is greater along the direction of gas flow. The fluid on the wall of the dispersion hood is prone to boundary layer separation, which in turn generates vortices and reduces the actual circulation of the gas. The cross-sectional area is reduced, the gas diffusion deceleration effect is poor, and the gas uniformity at the distributor outlet is poor; (2) The included angle is greater than 65°, the diffusion degree on the inner wall of the dispersion hood along the gas flow direction is small, the deceleration pre-distribution effect is not obvious, and at the same time the dispersion The height of the cover is significantly increased, which is not conducive to actual installation and processing. Based on the above analysis, in the present invention, it is preferred that the included angle α is 45 to 65°.

一般情况下,分布器的进口管道为顶部进气,进口管道的直径与外延设备匹配,再进行气体分布。然而本发明人经过计算分析以及实际工程经验等多方总结,惊讶地发现在这种进气方式下气体分布效果严重依赖于进口管道直径和进口流动均匀性,当进口管道直径较小或进口流动均匀性较差时,分布器的气体分布效果严重恶化,因此该类型的分布器的气体分布效果明显受限于进口管道直径和进口流动均匀性。而实际工程中进口管道直径及布置位置受现场空间、外延设备等多因素限制,并且实际进口气体流动很难保证较好的均匀性,因此顶部进气类型的分布器在实际工程中的适用性很差。为此,本发明人创造性提出了“扩压整流”-“减速预分布”-“节流主分布”的多级分布思想,将本发明中的渐扩组件设置成双层分散罩结构,即在第二气体分散罩的外部套设第一气体分散罩,所述第一气体分散罩与所述第二气体分散罩之间的空间形成第一气体通道,所述第一气体通道与所述第二气体通道连通设置;并且将反应原料气体的进口管道设置在所述第一气体分散罩上靠近所述第二气体分散罩的气体出口处,通过这种分布器侧面进气方式以及第一气体通道对气体进行扩压整流,一方面可以消除进口管道直径大小和进口流速分布对分布器性能的影响,极大提高了分布器适用性,另一方面还能进一步提升分布器出口气体分布的均匀性。Generally, the inlet pipe of the distributor is the top air inlet, and the diameter of the inlet pipe matches the epitaxial equipment, and then the gas is distributed. However, after calculation and analysis and practical engineering experience, the inventor surprisingly found that the gas distribution effect under this air intake method depends heavily on the diameter of the inlet pipe and the uniformity of the inlet flow. When the diameter of the inlet pipe is small or the inlet flow is uniform, When the performance is poor, the gas distribution effect of the distributor is seriously deteriorated. Therefore, the gas distribution effect of this type of distributor is obviously limited by the diameter of the inlet pipe and the uniformity of the inlet flow. However, in actual projects, the diameter and layout of the inlet pipe are limited by many factors such as on-site space and extension equipment, and it is difficult to ensure good uniformity of the actual inlet gas flow. Therefore, the applicability of the top air inlet type distributor in actual projects is limited. Very poor. To this end, the inventor creatively proposed the multi-level distribution idea of "diffusion rectification" - "deceleration pre-distribution" - "throttle main distribution", and set the gradually expanding component in the present invention into a double-layer dispersion cover structure, that is, A first gas dispersion cover is set outside the second gas dispersion cover. The space between the first gas dispersion cover and the second gas dispersion cover forms a first gas channel. The first gas channel and the The second gas channel is connected and arranged; and the inlet pipe of the reaction raw material gas is arranged on the first gas dispersion cover close to the gas outlet of the second gas dispersion cover. Through this side air intake method of the distributor and the first The gas channel expands and rectifies the gas. On the one hand, it can eliminate the influence of the diameter of the inlet pipe and the inlet flow rate distribution on the performance of the distributor, greatly improving the applicability of the distributor. On the other hand, it can further improve the gas distribution at the outlet of the distributor. Uniformity.

在本发明的一些实施例中,第一气体分散罩由封头和圆柱形的第二筒体通过焊接或者螺栓密封圈等顺序复合连接,连接处密封;封头可以是通用的,符合所在建设地允许的规范要求即可,这是本领域技术人员熟知的,如GB/T2519-2010标准中的椭球形封头,封头的顶部即为第一气体分散罩的顶部。在所述第二筒体的内壁安装有支撑构件,第二气体分散罩通过该支撑构件与第二筒体连接,第二气体分散罩的气体出口横截面直径与第二筒体的未与封头连接的一端(对应第一气体分散罩的底面)横截面直径、气体分布板直径D0都相同,统称为分布器直径。且第一气体分散罩的底面与第二气体分散罩的气体出口横截面位于同一平面上,第一气体分散罩的圆柱形第二筒体与第一气体分散罩等高。从分布器侧面进口管道进入第一气体分散罩内的气体,沿着第二气体分散罩的外壁面流向封头并聚集,气体进行第一级扩压整流;封头内的气体,从第二气体分散罩的气体进口流入第二气体分散罩中,由于气体流通面积渐扩,对气体进行了第二级减速预分布;之后气体进入第三气体通道,在多层多孔结构的气体分布板的作用下,一方面由于节流阻力,促使气流径向均匀,另一方面由于通孔节流作用形成气体射流,经过多个通孔的各股射流气体会在气体分布板下方聚集产生一个会聚区,分布板间距h满足上述条件时,可确保会聚区具有足够的空间使气体射流间相互卷吸和干扰,促进气体实现第三级的节流主分布。气体经过上述三级分布后从分布器出口均匀流出,本发明的气体分布器均匀分布气体的原理示意图见图4a和图4b。In some embodiments of the present invention, the first gas dispersion cover is composed of a head and a cylindrical second cylinder sequentially connected through welding or bolt sealing rings, and the connection is sealed; the head can be universal and conform to the construction in which it is located. It suffices to comply with the permitted specification requirements of the country. This is well known to those skilled in the art. For example, for the ellipsoidal head in the GB/T2519-2010 standard, the top of the head is the top of the first gas dispersion cover. A support member is installed on the inner wall of the second cylinder, and the second gas dispersion cover is connected to the second cylinder through the support member. The cross-sectional diameter of the gas outlet of the second gas dispersion cover is equal to the diameter of the unsealed gas outlet of the second cylinder. The cross-sectional diameter of one end connected to the head (corresponding to the bottom surface of the first gas dispersion cover) and the diameter D0 of the gas distribution plate are both the same, collectively referred to as the distributor diameter. The bottom surface of the first gas dispersion hood and the gas outlet cross-section of the second gas dispersion hood are located on the same plane, and the cylindrical second cylinder of the first gas dispersion hood is of the same height as the first gas dispersion hood. The gas entering the first gas dispersion hood from the inlet pipe on the side of the distributor flows to the head along the outer wall of the second gas dispersion hood and collects. The gas undergoes first-stage diffusion rectification; the gas in the head flows from the second gas dispersion hood to the head. The gas inlet of the gas dispersion hood flows into the second gas dispersion hood. Due to the gradual expansion of the gas circulation area, the gas is pre-distributed by the second-stage deceleration; then the gas enters the third gas channel and is placed between the multi-layer porous structure gas distribution plate. Under the action, on the one hand, the throttling resistance makes the air flow radially uniform, and on the other hand, due to the throttling effect of the through holes, a gas jet is formed. Each jet gas passing through multiple through holes will gather under the gas distribution plate to create a convergence area. , when the distribution plate spacing h meets the above conditions, it can ensure that the convergence area has enough space to entrain and interfere with each other among the gas jets, and promote the third-level throttling main distribution of gas. After passing through the above three-stage distribution, the gas flows out uniformly from the outlet of the distributor. The schematic diagram of the principle of uniform gas distribution by the gas distributor of the present invention is shown in Figure 4a and Figure 4b.

在本发明的实施例中,第一气体分散罩的总高度H1(单位mm)优选为(H2+0.25D0),其中H2为第二气体分散罩高度,亦是第一气体分散罩的第二筒体高度,单位为mm,D0为分布器直径(单位mm)。如果采用其他结构的封头,则第一气体分散罩总高度H1为第二筒体高度与该结构封头高度之和。In embodiments of the present invention, the total height H 1 (unit mm) of the first gas dispersion hood is preferably (H 2 +0.25D 0 ), where H 2 is the height of the second gas dispersion hood and is also the height of the first gas dispersion hood. The height of the second cylinder of the cover, in mm, and D 0 is the diameter of the distributor (in mm). If a head of other structures is used, the total height H 1 of the first gas dispersion cover is the sum of the height of the second cylinder and the height of the head of this structure.

关于第二气体分散罩的高度,目前也没有相关文献对此开展研究,其高度对分布器的分布均匀性影响尚无可参考依据。为方便计算和施工,第二气体分散罩的形状对应于一圆台的侧面。本发明研究发现,第二气体分散罩高度对气体分布均匀性影响如下:(1)当第二气体分散罩高度大于其圆台所对应的圆锥体高度的80%时,第二气体分散罩入口面积较小,第二气体分散罩入口流速较大,气体在第二气体分散罩内的减速预分布效果变差,整体气体最终预分布的不均匀性随第二气体分散罩高度增加而增加,此外第二气体分散罩高度较大也不利于实际安装加工;(2)当第二气体分散罩高度小于其圆台所对应的圆锥体高度的50%时,第二气体分散罩入口面积较大,气体减速预分布得到提升,但第二气体分散罩高度较低,气体在第一气体分散罩内流动路径较短,导致气体扩压整流效果变差,整体气体最终预分布不均匀性随分散罩高度降低而增加,此外第二气体分散罩高度较小也不利于吊耳等辅助安装装置的布置。通过上述分析,本发明优选第二气体分散罩高度为其所对应的圆锥体高度的0.5~0.8倍,即第二气体分散罩的高度H2(单位mm)满足:其中,Bh为第二气体分散罩的高度系数,取0.5~0.8,α为第二气体分散罩与第二气体通道的横截面之间的夹角,取值为30~70°,优选取45~65°,D0为分布器直径(单位mm)。Regarding the height of the second gas dispersion cover, there is currently no relevant literature to study this, and there is no reference basis for the impact of its height on the distribution uniformity of the distributor. To facilitate calculation and construction, the shape of the second gas dispersion cover corresponds to the side of a circular cone. The present invention has found that the height of the second gas dispersion hood has the following effects on the uniformity of gas distribution: (1) When the height of the second gas dispersion hood is greater than 80% of the height of the cone corresponding to the truncated cone, the inlet area of the second gas dispersion hood Smaller, the inlet flow velocity of the second gas dispersion hood is larger, the deceleration pre-distribution effect of the gas in the second gas dispersion hood becomes worse, and the unevenness of the final pre-distribution of the overall gas increases as the height of the second gas dispersion hood increases. In addition A large height of the second gas dispersion hood is also not conducive to actual installation and processing; (2) When the height of the second gas dispersion hood is less than 50% of the height of the cone corresponding to the truncated cone, the inlet area of the second gas dispersion hood is larger, and the gas The deceleration pre-distribution is improved, but the height of the second gas dispersion hood is lower, and the gas flow path in the first gas dispersion hood is shorter, resulting in a worse gas diffusion and rectification effect. The overall gas final pre-distribution unevenness increases with the height of the dispersion hood. In addition, the small height of the second gas dispersion cover is not conducive to the arrangement of auxiliary installation devices such as lifting lugs. Through the above analysis, in the present invention, it is preferred that the height of the second gas dispersion cover is 0.5 to 0.8 times the height of its corresponding cone, that is, the height H 2 (unit mm) of the second gas dispersion cover satisfies: Wherein, B h is the height coefficient of the second gas dispersion hood, which ranges from 0.5 to 0.8, and α is the angle between the second gas dispersion hood and the cross section of the second gas channel, which ranges from 30 to 70°, preferably 45~65°, D 0 is the diameter of the distributor (unit: mm).

一般情况下,气体分布器的进口管道只有1个,且设置在分布器的顶部。在本发明的实施例中,优选分布器的进口管道为至少2个,对称设置于所述第一气体分散罩的外壁上。所述进口管道通过焊接或者螺栓密封圈等与第一气体分散罩相连接,连接处密封,气体通过进口管道进入第一气体通道中。本发明人基于多年工程经验,优选进口管道的结构参数如下:Generally, there is only one inlet pipe of the gas distributor, and it is set at the top of the distributor. In the embodiment of the present invention, it is preferred that the distributor has at least two inlet pipes, which are symmetrically arranged on the outer wall of the first gas dispersion cover. The inlet pipe is connected to the first gas dispersion cover through welding or bolt sealing rings, the connection is sealed, and the gas enters the first gas channel through the inlet pipe. Based on many years of engineering experience, the inventor prefers that the structural parameters of the inlet pipeline are as follows:

进口管道截面优选为圆形截面,进口管道的直径和长度主要依据分布器直径确定,主要约束条件为:(1)进口管道与第一气体分散罩相连,其直径不宜过大,以免导致第一气体分散罩侧面较大开孔,一般要求进口管道直径小于0.2D0,D0为分布器直径;(2)为满足大产能生产需求,保证进口管道进气通畅,进口管道直径也不宜太小,一般要求进口管道直径大于0.1D0,D0为分布器直径;(3)为保证原料气体在进口管道中气体分布尽量均匀,进口管道长度不宜过短,一般要求进口管道长度大于1.0Dinlet;(4)为便于现场安装,进口管道长度不宜过长,一般要求进口管道长度小于2.0Dinlet。此外,进口管道在安装时,应尽量安装在第一气体分散罩外壁面的低位,优选的,进口管道距第一气体分散罩的底面之间的间距hinlet为0~900mm。The inlet pipe cross-section is preferably a circular cross-section. The diameter and length of the inlet pipe are mainly determined based on the diameter of the distributor. The main constraints are: (1) The inlet pipe is connected to the first gas dispersion cover, and its diameter should not be too large to avoid causing the first gas dispersion cover. The larger openings on the side of the gas dispersion cover generally require the diameter of the inlet pipe to be less than 0.2D 0 , and D 0 is the diameter of the distributor; (2) In order to meet the needs of large-capacity production and ensure smooth air intake in the inlet pipe, the diameter of the inlet pipe should not be too small. , it is generally required that the diameter of the inlet pipeline is greater than 0.1D 0 , and D 0 is the diameter of the distributor; (3) In order to ensure that the raw gas is distributed as uniformly as possible in the inlet pipeline, the length of the inlet pipeline should not be too short, and it is generally required that the length of the inlet pipeline is greater than 1.0D inlet ; (4) In order to facilitate on-site installation, the length of the inlet pipe should not be too long. Generally, the length of the inlet pipe is required to be less than 2.0D inlet . In addition, when installing the inlet pipe, it should be installed as low as possible on the outer wall of the first gas dispersion hood. Preferably, the distance h inlet between the inlet pipe and the bottom surface of the first gas dispersion hood is 0 to 900 mm.

本发明实施例提供的气体分布器的分布性能基本不受进口管道截面形状、管道进气速度等的影响。若进口管道截面不宜或无法采用圆形,也可采用椭圆或长方形或正方形等工程上常见的截面形状,此时采用等效直径De计算,De为0.1~0.2D0,D0为分布器直径。若进口管道不宜或无法采用两条通道,也可采用单条或多条通道,所有进口管道截面积总和最好与两条进口管道的截面积总和相等,且尽量对称布置在第二气体分散罩的外壁面上。The distribution performance of the gas distributor provided by the embodiment of the present invention is basically not affected by the cross-sectional shape of the inlet pipe, the air inlet velocity of the pipe, etc. If the cross section of the inlet pipe is not suitable or cannot be circular, common cross-sectional shapes in engineering such as ellipse, rectangle or square can also be used. At this time, the equivalent diameter D e is used to calculate, D e is 0.1 to 0.2D 0 , and D 0 is the distribution device diameter. If it is not appropriate or impossible to use two channels for the inlet pipeline, a single or multiple channels can also be used. The sum of the cross-sectional areas of all inlet pipelines is preferably equal to the sum of the cross-sectional areas of the two inlet pipelines, and they should be arranged as symmetrically as possible on the second gas dispersion cover. on the outer wall.

本发明实施例提供的气体分布器结构简约,可整体嵌入现有反应器中,也可以拆分成多个组件分别安装到现有反应器中,无需改造现有反应器的结构,装配方便,造价低廉。The gas distributor provided by the embodiment of the present invention has a simple structure and can be embedded into an existing reactor as a whole, or can be split into multiple components and installed in the existing reactor respectively. There is no need to modify the structure of the existing reactor, and it is easy to assemble. Low cost.

本发明中的反应器应用于气-固相反应,包括但是不限定于催化氧化、催化加氢、催化加氢裂解、催化脱水、临氢胺化、催化脱氢、催化异构、催化氨氧化等,具体地,包括但是不限定于乙烯直接氧化制备环氧乙烷、丙烯氨氧化制备丙烯腈、丙烯氧化制备丙烯醛和丙烯酸、1,4-丁二醇脱氢制备γ-丁内酯、草酸二甲酯加氢制乙二醇、乙醇氧化制乙醛、顺酐气相加氢制γ-丁内酯、醋酸胺化脱水制乙腈、甲基吡啶氨氧化制备氰基吡啶、甲苯氨氧化制备苯甲腈、丙酮加氢制异丙醇、丙酮临氢胺化制异丙胺、吡啶加氢制备哌啶、环己醇脱氢制环己酮、2-丁醇脱氢制甲乙酮、糠醛气相加氢制糠醇、丁醛或辛醛气相加氢制丁醇或丁醇。The reactor in the present invention is used for gas-solid phase reactions, including but not limited to catalytic oxidation, catalytic hydrogenation, catalytic hydrocracking, catalytic dehydration, hydroamination, catalytic dehydrogenation, catalytic isomerization, and catalytic ammonia oxidation. etc., specifically, including but not limited to the direct oxidation of ethylene to prepare ethylene oxide, the ammonia oxidation of propylene to prepare acrylonitrile, the oxidation of propylene to prepare acrolein and acrylic acid, the dehydrogenation of 1,4-butanediol to prepare γ-butyrolactone, Hydrogenation of dimethyl oxalate to ethylene glycol, oxidation of ethanol to acetaldehyde, gas phase hydrogenation of maleic anhydride to γ-butyrolactone, amination and dehydration of acetic acid to acetonitrile, ammoxidation of methylpyridine to cyanopyridine, and ammoxidation of toluene. Hydrogenation of benzonitrile and acetone to produce isopropyl alcohol, hydroamination of acetone to produce isopropylamine, hydrogenation of pyridine to produce piperidine, dehydrogenation of cyclohexanol to produce cyclohexanone, dehydrogenation of 2-butanol to produce methyl ethyl ketone, gas phase addition of furfural Hydrogen to produce furfuryl alcohol, butyraldehyde or octylaldehyde and gas phase hydrogenation to produce butanol or butanol.

本发明首创性地设计了具有双层分散罩的渐扩组件与分布板组件顺序复合连接的分布器结构,在第二气体分散罩的外侧和内侧分别构造了扩压整流区和减速预分布区,经第一级扩压整流后的气体流入减速预分布区,实现了气体的第二级减速预分布,随后通过内置多层分布板的第三气体通道进行第三级节流主分布。本发明人在大量研究后发现,本发明的气体分布器可在分布器出口截面平均流速为0.1~2.5m/s范围内实现气体均匀分散,且气体分布效果基本不受出口平均流速影响,均匀分布的稳定性好。The present invention is the first to design a distributor structure in which the gradually expanding component and the distribution plate component of the double-layer dispersion cover are sequentially and compositely connected. A diffusion rectification area and a deceleration pre-distribution area are respectively constructed on the outside and inside of the second gas dispersion cover. , the gas after the first-stage expansion and rectification flows into the deceleration pre-distribution area, realizing the second-stage deceleration pre-distribution of the gas, and then carries out the third-stage throttling main distribution through the third gas channel of the built-in multi-layer distribution plate. After extensive research, the inventor found that the gas distributor of the present invention can achieve uniform gas dispersion in the range of the average flow velocity of the distributor outlet cross-section of 0.1 to 2.5 m/s, and the gas distribution effect is basically not affected by the average flow velocity of the outlet and is uniform. The distribution stability is good.

下面结合具体实施例,对本发明提供的气体分布器作进一步说明。The gas distributor provided by the present invention will be further described below with reference to specific embodiments.

实施例1:10万吨/年乙醇氧化制乙醛反应器用的多级扩压减速气体分布器Example 1: Multi-stage pressure diffusion deceleration gas distributor for 100,000 tons/year ethanol oxidation to acetaldehyde reactor

为了进一步理解本发明,下面结合一个10万吨/年乙醇氧化制乙醛生产装置的实施例,详细地说明本发明所述的气体分布器。10万吨乙醛生产装置,采用空气和乙醇混合后进入反应器,原料气体积流量Q为30268m3/h,进料温度120℃,进料压力30KPa。采纳绝热式反应器,反应器床层为平铺的电解银催化剂。In order to further understand the present invention, the gas distributor of the present invention will be described in detail below with reference to an example of a 100,000 tons/year ethanol oxidation to acetaldehyde production device. The 100,000-ton acetaldehyde production device uses air and ethanol mixed before entering the reactor. The raw gas volume flow Q is 30268m 3 /h, the feed temperature is 120°C, and the feed pressure is 30KPa. An adiabatic reactor is used, and the reactor bed is a flat electrolytic silver catalyst.

如图1和图2所示,本实施提供的气体分布器包括沿气体流动方向依次设置的渐扩组件和分布板组件,其中:As shown in Figures 1 and 2, the gas distributor provided in this implementation includes a gradually expanding component and a distribution plate component that are sequentially arranged along the direction of gas flow, wherein:

所述渐扩组件包括第一气体分散罩2及位于第一气体分散罩2内部的第二气体分散罩3,所述第二气体分散罩3具有气体进口31和气体出口32,在所述气体进口31与所述气体出口32之间形成第二气体通道,沿气体流动方向上所述第二气体通道的横截面积逐渐增大;所述第一气体分散罩2与所述第二气体分散罩3之间的空间形成第一气体通道,所述第一气体通道与所述第二气体通道连通设置,在所述第一气体分散罩2上靠近所述第二气体分散罩3的气体出口32处设有进口管道1。The gradually expanding assembly includes a first gas dispersion cover 2 and a second gas dispersion cover 3 located inside the first gas dispersion cover 2. The second gas dispersion cover 3 has a gas inlet 31 and a gas outlet 32. A second gas channel is formed between the inlet 31 and the gas outlet 32, and the cross-sectional area of the second gas channel gradually increases along the gas flow direction; the first gas dispersion cover 2 and the second gas dispersion cover The space between the covers 3 forms a first gas channel, the first gas channel is connected with the second gas channel, and the first gas dispersion cover 2 is close to the gas outlet of the second gas dispersion cover 3 There are inlet pipelines 1 at 32 locations.

在本实施例中,第一气体分散罩2由封头21和圆柱形的第二筒体22通过焊接顺序复合而成,连接处密封,在该第二筒体22的内壁安装有支撑构件,第二气体分散罩3通过该支撑构件与第一气体分散罩2的第二筒体22连接,第二气体分散罩3与第一气体分散罩2的第二筒体22等高,第二气体分散罩3对应于一圆台的侧面,该圆台的底面(即第二气体分散罩的气体出口横截面)与第一气体分散罩第二筒体的未与封头连接的一端(即第一气体分散罩的底面)位于同一平面上;在第一气体分散罩2的外壁上对称设置有2个圆形的进口管道1,所述进口管道1通过螺栓密封圈与第一气体分散罩2相连接,连接处密封。In this embodiment, the first gas dispersion cover 2 is composed of a head 21 and a cylindrical second cylinder 22 through a welding sequence. The connection is sealed. A supporting member is installed on the inner wall of the second cylinder 22. The second gas dispersion cover 3 is connected to the second cylinder 22 of the first gas dispersion cover 2 through the supporting member. The second gas dispersion cover 3 is of the same height as the second cylinder 22 of the first gas dispersion cover 2. The dispersion hood 3 corresponds to the side of a truncated cone, the bottom surface of the truncated cone (i.e., the gas outlet cross section of the second gas dispersion hood) and the end of the second cylinder of the first gas dispersion hood that is not connected to the head (i.e., the first gas dispersion hood). The bottom surface of the dispersion hood) is located on the same plane; two circular inlet pipes 1 are symmetrically arranged on the outer wall of the first gas dispersion hood 2, and the inlet pipe 1 is connected to the first gas dispersion hood 2 through a bolt sealing ring. , the connection is sealed.

所述分布板组件包括第一筒体5和至少两个平行且间隔设置的气体分布板4,第一筒体5为圆柱形,通过焊接与第一气体分散罩2的第二筒体22密封连接,每个所述气体分布板4均为圆形薄板,其上都设置有若干通孔,如图3所示,且每个所述气体分布板4的周缘均与所述第一筒体5的内壁紧密连接,所述第一筒体5的内部空间形成第三气体通道,所述第三气体通道与所述第二气体通道连通,第三气体通道的气体出口即为分布器出口6。The distribution plate assembly includes a first cylinder 5 and at least two parallel and spaced apart gas distribution plates 4. The first cylinder 5 is cylindrical and is sealed with the second cylinder 22 of the first gas dispersion cover 2 by welding. connection, each gas distribution plate 4 is a circular thin plate with a number of through holes provided on it, as shown in Figure 3, and the periphery of each gas distribution plate 4 is connected to the first cylinder 5 are tightly connected, the internal space of the first cylinder 5 forms a third gas channel, the third gas channel is connected with the second gas channel, and the gas outlet of the third gas channel is the distributor outlet 6 .

在本实施例中,基于给定的工艺需求,根据本发明所给出的公式和/或参数范围可以设计出分布器的结构参数。为了详细说明本发明所给出的公式和/或参数范围是最优的,本实施例中详细地分析了各分布器结构参数数值对分布器分布效果的影响。分析某结构参数数值对分布器分布效果影响的过程中,该结构参数取不同的数值,而其他结构参数保持不变,分析分布器出口气体不均匀度随该结构参数变化的变化趋势。气体分布器的结构参数分别设计如下:In this embodiment, based on given process requirements, the structural parameters of the distributor can be designed according to the formula and/or parameter range given by the present invention. In order to explain in detail that the formulas and/or parameter ranges given in the present invention are optimal, the influence of each distributor structural parameter value on the distribution effect of the distributor is analyzed in detail in this embodiment. In the process of analyzing the influence of a certain structural parameter value on the distribution effect of the distributor, the structural parameter takes different values, while other structural parameters remain unchanged, and the changing trend of the gas unevenness at the distributor outlet as the structural parameter changes is analyzed. The structural parameters of the gas distributor are designed as follows:

①分布器直径①Diameter of distributor

对于本实施例中的多级扩压减速气体分布器,经计算得到图5所示的分布器出口气体不均匀度随出口平均流速的变化结果图。从图5中可以看出,在0.1~7m/s出口平均流速范围,本实施例所述的分布器的出口气体不均度均为0.36,这说明气体流经本实施例的分布器后分布均匀,可以很好的满足工程需求。而且,随着出口气体平均流速增加,分布器出口气体不均度保持不变,说明本实施例的分布器均匀分布的稳定性好且对流量的依赖性很小,在实际工程应用中,有宽泛的适用范围,适用性优势明显。For the multi-stage diffusion deceleration gas distributor in this embodiment, the result chart of the gas unevenness at the distributor outlet as a function of the outlet average flow rate is obtained through calculation, as shown in Figure 5. As can be seen from Figure 5, in the average outlet flow velocity range of 0.1 to 7m/s, the outlet gas unevenness of the distributor described in this embodiment is 0.36, which shows that the gas distribution after flowing through the distributor of this embodiment Uniform and can well meet engineering needs. Moreover, as the average flow rate of the outlet gas increases, the unevenness of the gas at the outlet of the distributor remains unchanged, indicating that the uniform distribution of the distributor in this embodiment has good stability and has little dependence on the flow rate. In practical engineering applications, there are Wide scope of application and obvious applicability advantages.

取分布器出口气体平均速度为0.75m/s,依据本发明所提供的气体分布器直径D0的计算公式:Taking the average velocity of the gas at the distributor outlet as 0.75m/s, according to the calculation formula of the gas distributor diameter D 0 provided by the present invention:

取整后,得分布器直径为DN3800mm。After rounding, the diameter of the distributor is DN3800mm.

②第二气体分散罩的结构②Structure of the second gas dispersion cover

对于本实施例所述的多级扩压减速气体分布器,经过计算得到图6所示的分布器出口气体不均匀度随第二气体分散罩的夹角α的变化图。从图6中可以看出,该夹角越大,第二气体分散罩壁面高度越高,气体扩压整流路径越长,出口气体不均匀度越低,这与本发明人多年的工程经验一致;(2)该夹角小于45°,分布器出口气体不均匀性大于0.4,气体分布均匀性差,这是因为,气体沿流动方向在第二气体分散罩内壁面扩散程度较大,第二气体分散罩壁面处的流体越容易出现边界层分离,进而产生旋涡,使气体的实际流通截面积减少,气体扩压减速效果差;(3)该夹角大于65°,沿流动方向第二气体分散罩内壁面扩散程度小,减速预分布效果不明显,同时,夹角较大后第二气体分散罩高度明显增加,不利于实际安装加工。通过上述分析,本发明确定该夹角α优选为45~65°,在本实施例中取50°。For the multi-stage diffusion deceleration gas distributor described in this embodiment, the distribution diagram of the gas unevenness at the distributor outlet as a function of the angle α of the second gas dispersion cover is obtained through calculation. It can be seen from Figure 6 that the greater the included angle, the higher the wall height of the second gas dispersion cover, the longer the gas diffusion rectification path, and the lower the outlet gas unevenness. This is consistent with the inventor's many years of engineering experience. ; (2) The included angle is less than 45°, the gas non-uniformity at the distributor outlet is greater than 0.4, and the gas distribution uniformity is poor. This is because the gas diffuses to a greater extent along the flow direction on the inner wall of the second gas dispersion cover, and the second gas The fluid at the wall of the dispersion cover is more likely to have boundary layer separation, which in turn generates vortices, reducing the actual flow cross-sectional area of the gas, and the gas diffusion deceleration effect is poor; (3) The angle is greater than 65°, and the second gas is dispersed along the flow direction. The degree of diffusion on the inner wall of the hood is small, and the deceleration pre-distribution effect is not obvious. At the same time, the height of the second gas dispersion hood increases significantly when the included angle is large, which is not conducive to actual installation and processing. Through the above analysis, the present invention determines that the included angle α is preferably 45 to 65°, and is 50° in this embodiment.

对于本实施例所述的多级扩压减速气体分布器,经过计算得到图7所示的分布器出口气体不均匀度随第二气体分散罩的高度与对应的圆锥体高度之比的变化图。从图7中可以看出:(1)当第二气体分散罩高度大于其所对应的圆锥体高度的80%时,分布器出口不均匀度大于0.4,气体分布器效果较差;(2)当第二气体分散罩高度等于其所对应的圆锥体高度的50%-55%时,分布器出口不均匀度基本处于最低值0.27,气体分布器效果较好。考虑到分布器外壁可能会安装吊耳等辅助装置,第二气体分散罩高度(对应于第一气体分散罩的第二筒体高度)一般不宜过小。通过上述分析,本发明确定第二气体分散罩的高度H2为对应圆锥体高度的0.5~0.8倍,具体可采用下式计算:其中,Bh为第二气体分散罩的高度系数,取0.5~0.8,α为第二气体分散罩与第二气体通道的横截面之间的夹角,D0为分布器直径(单位mm)。For the multi-stage diffusion deceleration gas distributor described in this embodiment, the distribution diagram of the gas unevenness at the distributor outlet as shown in Figure 7 changes with the ratio of the height of the second gas dispersion cover to the corresponding cone height. . It can be seen from Figure 7: (1) When the height of the second gas dispersion cover is greater than 80% of the height of its corresponding cone, the unevenness of the distributor outlet is greater than 0.4, and the gas distributor effect is poor; (2) When the height of the second gas dispersion cover is equal to 50%-55% of the height of its corresponding cone, the unevenness of the distributor outlet is basically at the lowest value of 0.27, and the gas distributor effect is better. Considering that auxiliary devices such as lifting lugs may be installed on the outer wall of the distributor, the height of the second gas dispersion hood (corresponding to the height of the second cylinder of the first gas dispersion hood) generally should not be too small. Through the above analysis, the present invention determines that the height H 2 of the second gas dispersion cover is 0.5 to 0.8 times the height of the corresponding cone. Specifically, it can be calculated using the following formula: Among them, B h is the height coefficient of the second gas dispersion hood, which takes 0.5 to 0.8, α is the angle between the cross section of the second gas dispersion hood and the second gas channel, and D 0 is the diameter of the distributor (unit mm) .

本实施例中分布器直径D0为3800mm,第二气体分散罩与第二气体通道的横截面之间的锐夹角α取值为50°,第二气体分散罩的高度系数Bh取为0.7,第二气体分散罩的高度H2计算为:In this embodiment, the distributor diameter D 0 is 3800 mm, the acute angle α between the second gas dispersion cover and the cross section of the second gas channel is 50°, and the height coefficient B h of the second gas dispersion cover is 0.7, the height H2 of the second gas dispersion cover is calculated as:

③第一气体分散罩的结构③Structure of the first gas dispersion cover

对于本实施例所述的多级扩压减速气体分布器,封头结构采用中国GB/T2519-2010标准中椭球形封头或者同类型的其他符合标准的封头。本实施例中取EHA类型椭球形封头,主要参数:长轴3800mm,短轴1900mm;故而第一气体分散罩的高度H1为:For the multi-stage diffusion deceleration gas distributor described in this embodiment, the head structure adopts the ellipsoidal head in the Chinese GB/T2519-2010 standard or other heads of the same type that meet the standard. In this embodiment, an EHA type ellipsoidal head is used. The main parameters are: long axis 3800mm, short axis 1900mm; therefore, the height H 1 of the first gas dispersion cover is:

H1=(H2+0.25D0)=1585+0.25×3800=2535mm。H 1 =(H 2 +0.25D 0 )=1585+0.25×3800=2535mm.

④分布板结构④Distribution board structure

对于本实施例所述的多级扩压减速气体分布器,为方便加工,分布板厚度H3取为5mm,分布板上的圆形通孔交错60度布置,如图3所示。以下分别确定分布板的通孔直径和相邻两个通孔间的孔心距。For the multi-stage expansion deceleration gas distributor described in this embodiment, in order to facilitate processing, the thickness H3 of the distribution plate is taken to be 5mm, and the circular through holes on the distribution plate are arranged staggered at 60 degrees, as shown in Figure 3. The following determines the through hole diameter of the distribution plate and the hole center distance between two adjacent through holes.

经过计算得到图8所示的分布器出口气体不均匀度随分布板圆形通孔直径的变化图。从图8中可以看出,(1)当圆形通孔直径小于35mm(约0.01D0)时,圆形通孔直径较小,气体流经通孔后易形成强射流流动,气体分布效果较差,分布器出口气体不均匀度随圆形通孔直径减小而增大;(2)当圆形通孔直径为40mm~150mm(约0.001D0~0.04D0)时,圆形通孔直径较为合理,气体通过圆形通孔产生合适的节流效应,分布板下方聚集产生合理的会聚区,会聚区气体射流间相互卷吸和干扰,气体分布效果较优,且分布器出口气体不均匀度在该区间内保持稳定的较低值;(3)当圆形通孔直径大于150mm(约0.04D0)时,圆形通孔直径较大,气体流经通孔后不能形成有效的节流效应,气体分布效果较差,分区器出口气体不均匀度随圆形通孔直径增大而增大。此外,实际工程中分布板往往需要采用先切割再组装的方式进行施工,这种施工方式不可避免地会破坏一定数量的通孔。本发明人基于多年工程经验发现,当圆形通孔直径大于110mm(约0.03D0)时,因施工所破坏的通孔数量占比上升,分布板实际通孔面积与理论通孔面积显现出较明显的差异,导致分布板实际分布效果明显低于理论计算。因此,本发明中分布板的圆形通孔直径D3优选为(35mm~110mm),即(0.01~0.03)D0,其中,D0是分布器直径,在本实施例中圆形通孔直径D3取为40mm。After calculation, the variation of gas unevenness at the distributor outlet with the diameter of the circular through hole of the distribution plate is obtained as shown in Figure 8. It can be seen from Figure 8 that (1) when the diameter of the circular through hole is less than 35mm (about 0.01D 0 ), the diameter of the circular through hole is small, and the gas flows through the through hole to easily form a strong jet flow, and the gas distribution effect is The gas unevenness at the distributor outlet increases as the diameter of the circular through hole decreases; (2) When the diameter of the circular through hole is 40mm ~ 150mm (about 0.001D 0 ~ 0.04D 0 ), the circular through hole The hole diameter is relatively reasonable, and the gas will produce a suitable throttling effect through the circular through hole. The gas will gather under the distribution plate to create a reasonable convergence area. The gas jets in the convergence area will entrain and interfere with each other. The gas distribution effect is better, and the gas at the outlet of the distributor The non-uniformity remains at a stable low value in this interval; (3) When the diameter of the circular through hole is greater than 150mm (about 0.04D 0 ), the diameter of the circular through hole is larger, and the gas cannot form an effective gas after flowing through the through hole. Due to the throttling effect, the gas distribution effect is poor, and the gas unevenness at the partitioner outlet increases as the diameter of the circular through hole increases. In addition, in actual projects, distribution boards often need to be constructed by cutting first and then assembling. This construction method will inevitably destroy a certain number of through holes. Based on many years of engineering experience, the inventor found that when the diameter of the circular through hole is greater than 110mm (about 0.03D 0 ), the proportion of the number of through holes destroyed by construction increases, and the actual through hole area of the distribution plate and the theoretical through hole area show a difference. The obvious difference results in the actual distribution effect of the distribution plate being significantly lower than the theoretical calculation. Therefore, the diameter D 3 of the circular through hole of the distribution plate in the present invention is preferably (35 mm to 110 mm), that is, (0.01 to 0.03) D 0 , where D 0 is the diameter of the distributor. In this embodiment, the circular through hole The diameter D3 is taken as 40mm.

根据几何关系,此时分布板圆形通孔的孔心距、分布板圆形通孔直径和分布板孔隙率之间存在一定的数学关系。对于本实施例所述的多级扩压减速气体分布器,经过计算得到图9所示的分布器出口气体不均匀度随分布板孔隙率的变化图。从图9中可以看出,当孔隙率为0.3时,分布器出口气体不均匀度最小,这是因为,当分布板孔隙率大于0.3时,分布板流通面积较大,气体节流效应变差,分布板分布效果下降;当分布板孔隙率小于0.3时,分布板靠近壁面区域由于遮挡面积较多,该区域主流速度梯度变化较大,涡流区域占比较多,而分布板中心区域由于分布板通孔面积较少,气流通过通孔时真实流速较大,射流效应明显。这两种现象共同导致分布板起到的分布效果下降,分布器出口气体不均匀度随分布板孔隙率减小而增大。此外,本发明人基于多年工程经验发现,当分布板孔隙率小于0.3时,分布板通孔面积较少,分布板对气体阻力较大,压力损失较大,耗能明显增高,不利于下游催化层中的化工反应过程。根据本发明人多年工程经验,分布板实际施工安装过程中,不可避免地会破坏一定数量的通孔,导致分布板实际孔隙率小于与理论值。经理论分析和实际工程经验,确定本发明的分布板孔隙率φ优选为0.3~0.5,在本实施例中取0.4,相应地,相邻两个圆形通孔间的孔心距采用如下公式计算:According to the geometric relationship, there is a certain mathematical relationship between the hole center distance of the circular through hole of the distribution plate, the diameter of the circular through hole of the distribution plate and the porosity of the distribution plate. For the multi-stage diffusion deceleration gas distributor described in this embodiment, the graph of the change of gas unevenness at the distributor outlet with the porosity of the distribution plate as shown in Figure 9 is obtained through calculation. It can be seen from Figure 9 that when the porosity is 0.3, the gas unevenness at the distributor outlet is minimal. This is because when the porosity of the distribution plate is greater than 0.3, the distribution plate flow area is larger and the gas throttling effect becomes worse. , the distribution effect of the distribution plate decreases; when the porosity of the distribution plate is less than 0.3, the area near the wall of the distribution plate has a large shielding area, the mainstream velocity gradient in this area changes greatly, and the vortex area occupies a large area, while the central area of the distribution plate is due to the distribution plate. The area of the through hole is small, the actual flow speed of the air flow through the through hole is larger, and the jet effect is obvious. These two phenomena jointly cause the distribution effect of the distribution plate to decrease, and the gas unevenness at the distributor outlet increases as the porosity of the distribution plate decreases. In addition, based on many years of engineering experience, the inventor found that when the porosity of the distribution plate is less than 0.3, the through hole area of the distribution plate is small, the distribution plate has greater gas resistance, greater pressure loss, and significantly increased energy consumption, which is not conducive to downstream catalysis. Chemical reaction process in the layer. According to the inventor's many years of engineering experience, during the actual construction and installation process of the distribution board, a certain number of through holes will inevitably be damaged, resulting in the actual porosity of the distribution board being smaller than the theoretical value. Through theoretical analysis and practical engineering experience, it is determined that the porosity φ of the distribution plate of the present invention is preferably 0.3 to 0.5. In this embodiment, it is 0.4. Correspondingly, the hole center distance between two adjacent circular through holes adopts the following formula calculate:

⑤分布板组件的结构⑤Structure of distribution board assembly

从第三气体通道入口开始布置多层分布板,分布板间距和分布板数量决定了第三气体通道的长度,以下分别确定这三项结构参数。A multi-layer distribution plate is arranged starting from the entrance of the third gas channel. The spacing between distribution plates and the number of distribution plates determine the length of the third gas channel. These three structural parameters are determined below.

分布板间距确定:当分布板间距较小,且气体流过分布板通孔流速较大时,气体将直接穿过下层分布板,无法在分布板下方形成会聚区,此时气体流经两层分布板与流经单层分布板的流动情况相类似,即第二块分布板不起作用,出现“短路”现象。分布板短路会明显降低反应器的生产产能,增加分布板间距可避免分布板“短路”现象。对于本实施例所述的多级扩压减速气体分布器,经过计算得到图10所示的分布器出口气体不均匀度随分布板间距的变化图。从图10中可以看出,当分布板间距为100mm时,分布器出口气体不均匀度高达1.3,这是由分布板“短路”现象导致的。随后,随着分布板间距的增加,分布器出口气体不均匀度下降。当板间距增加至400mm时,分布器出口气体不均匀度将至最低值。最后一层分布板下方无回流,同时分布器出口气体最大流速明显降低。说明增加分布板间距可解决分布板“短路”现象,这与本发明人多年的工程经验一致。随后,随着分布板间距的增加,分布器出口气体不均匀度略有上升。当分布板间距处于350mm~550mm范围时,分布器出口气体不均匀度小于0.4,有利于化工反应过程。通过上述分析,本发明提出分布板间距Δh的计算公式:取整后取值为400mm,在本实施例中,气体射流会聚系数Ch在优选的0.02~0.1范围内取0.044。同时,考虑到实际施工安装,分布板间距的绝对高度值大于100mm。Determination of the distribution plate spacing: When the distribution plate spacing is small and the gas flow rate through the distribution plate through holes is high, the gas will directly pass through the lower distribution plate and cannot form a convergence area under the distribution plate. At this time, the gas flows through the two layers The distribution plate is similar to the flow through a single-layer distribution plate, that is, the second distribution plate does not work and a "short circuit" occurs. A short circuit of the distribution plate will significantly reduce the production capacity of the reactor. Increasing the spacing between the distribution plates can avoid the "short circuit" phenomenon of the distribution plates. For the multi-stage diffusion deceleration gas distributor described in this embodiment, the variation diagram of the gas unevenness at the distributor outlet with the spacing between the distribution plates is obtained through calculation, as shown in Figure 10. As can be seen from Figure 10, when the distribution plate spacing is 100mm, the gas unevenness at the distributor outlet is as high as 1.3, which is caused by the "short circuit" phenomenon of the distribution plate. Subsequently, as the spacing between distribution plates increases, the gas unevenness at the distributor outlet decreases. When the plate spacing increases to 400mm, the gas unevenness at the distributor outlet will reach the lowest value. There is no backflow under the last layer of distribution plate, and the maximum flow rate of gas at the distributor outlet is significantly reduced. It shows that increasing the spacing between distribution boards can solve the "short circuit" phenomenon of distribution boards, which is consistent with the inventor's many years of engineering experience. Subsequently, as the spacing between distribution plates increases, the gas unevenness at the distributor outlet increases slightly. When the spacing between distribution plates is in the range of 350mm to 550mm, the gas unevenness at the distributor outlet is less than 0.4, which is beneficial to the chemical reaction process. Through the above analysis, the present invention proposes a calculation formula for the distribution plate spacing Δh: The value after rounding is 400mm. In this embodiment, the gas jet convergence coefficient Ch is 0.044 in the preferred range of 0.02 to 0.1. At the same time, considering the actual construction and installation, the absolute height value of the distribution plate spacing is greater than 100mm.

分布板数量确定:对于本实施例所述的多级扩压减速气体分布器,经过计算得到图11所示的分布器出口气体不均匀度随分布板数量的变化图。从图11可以看出,在分布板间距为400mm的情况下,分布板数量越多气体的分布效果越好,但当多孔分布板数量大于4后,分布板数量数量的增加对气流速度分布均匀化的提升有限,这与本发明人多年的工程经验一致。此外,实际工程中,当多孔分布板数量大于6时会导致第三气体通道的长度较长,不利于实际的生产线建设。考虑化工实际建设与生产,本发明中的分布板数量N优选为3~6层,在本实施例中分布板数量N取4。Determination of the number of distribution plates: For the multi-stage diffusion deceleration gas distributor described in this embodiment, the distribution diagram of the gas unevenness at the distributor outlet as a function of the number of distribution plates is obtained through calculation as shown in Figure 11. It can be seen from Figure 11 that when the spacing between distribution plates is 400mm, the more distribution plates, the better the gas distribution effect. However, when the number of porous distribution plates is greater than 4, the increase in the number of distribution plates will have an even effect on the distribution of air flow velocity. The improvement is limited, which is consistent with the inventor's many years of engineering experience. In addition, in actual projects, when the number of porous distribution plates is greater than 6, the length of the third gas channel will be longer, which is not conducive to actual production line construction. Considering the actual construction and production of the chemical industry, the number N of distribution plates in the present invention is preferably 3 to 6 layers. In this embodiment, the number N of distribution plates is 4.

由此,本实施例中第三气体通道长度H4为:H4=N×Δh=4×400=1600mm。Therefore, the third gas channel length H 4 in this embodiment is: H 4 =N×Δh=4×400=1600mm.

⑥进气通道结构⑥Inlet channel structure

一般情况下分布器进口管道为顶部进气,这类分布器的气体分布效果受限于进口管道直径和进口气体流动均匀性。本发明人创造性开发了分布器侧面进气方式,基于这一思想,本实施例中设计进口管道截面取圆形截面,进口管道优选为两条通道。经过计算得到图12所示的分布器出口气体不均匀度随进口管道直径的变化图。从图12可以看出,随着进口管道直径在280~600mm范围内变化,本实施例的分布器出口气体不均匀度均约为0.4,波动很小,这说明本发明通过侧面进气和双层分散罩对进口气体进行扩压整流,可以很大程度地消除进口管道直径大小对分布器性能的影响,极大提高了分布器适用性。Generally, the inlet pipe of the distributor is top-intake. The gas distribution effect of this type of distributor is limited by the diameter of the inlet pipe and the uniformity of the inlet gas flow. The inventor creatively developed the side air intake method of the distributor. Based on this idea, in this embodiment, the inlet pipe section is designed to be a circular section, and the inlet pipe is preferably two channels. After calculation, the variation of gas unevenness at the distributor outlet with the diameter of the inlet pipe is obtained as shown in Figure 12. It can be seen from Figure 12 that as the diameter of the inlet pipe changes in the range of 280 to 600 mm, the gas unevenness at the distributor outlet in this embodiment is about 0.4, with very small fluctuations. This shows that the present invention uses side air intake and double The layered dispersion hood diffuses and rectifies the inlet gas, which can largely eliminate the influence of the diameter of the inlet pipe on the performance of the distributor and greatly improves the applicability of the distributor.

本实施例中,进口管道直径Dinlet在优选的(0.1~0.2)D0即380mm~760mm范围内,取为565mm;进口管道长度Linlet在优选的(1.0~2.0)Dinlet即565mm~1130mm范围内,取为900mm;进口管道的高度(即进口管道距第一气体分散罩的底面之间的间距)hinlet在优选的0~900mm范围内取为435mm。In this embodiment, the inlet pipe diameter D inlet is within the preferred range of (0.1 to 0.2) D 0 , that is, 380 mm to 760 mm, and is taken to be 565 mm; the inlet pipe length L inlet is within the preferred range of (1.0 to 2.0) D inlet , that is, 565 mm to 1130 mm. Within the range, it is taken as 900mm; the height of the inlet pipe (that is, the distance between the inlet pipe and the bottom surface of the first gas dispersion cover) h inlet is taken as 435mm in the preferred range of 0 ~ 900mm.

⑦分布器出口气体分布效果⑦Gas distribution effect at the distributor outlet

为说明本实施例分布器的气体分布效果,经计算得到如图13所示的分布器出口速度云图。从图13可以看出,出口速度范围为0~0.98m/s,速度均大于0,小于2.0m/s,这表明实施例1的分布器出口没有回流,且流入催化剂反应层的流速适合于化工反应需求。该云图中流速主要以黄色为主,该区间的流速范围约为0.75m/s,这表明实施例1的分布器出口流速主要分布于平均值0.75m/s上下,分布均匀性好。实施例1的分布器出口气体不均匀度仅为0.142,小于建议值0.4,进一步说明实施例1的分布器气体分布效果好。In order to illustrate the gas distribution effect of the sparger in this embodiment, the sparger outlet velocity cloud diagram shown in Figure 13 was calculated. It can be seen from Figure 13 that the outlet velocity ranges from 0 to 0.98m/s, and the velocities are all greater than 0 and less than 2.0m/s. This shows that there is no backflow at the distributor outlet of Example 1, and the flow rate into the catalyst reaction layer is suitable for Chemical reaction requirements. The flow velocity in this cloud diagram is mainly yellow, and the flow velocity range in this interval is about 0.75m/s, which shows that the flow velocity at the distributor outlet of Example 1 is mainly distributed around the average value of 0.75m/s, and the distribution uniformity is good. The gas unevenness at the distributor outlet of Example 1 is only 0.142, which is less than the recommended value of 0.4, which further illustrates that the gas distribution effect of the distributor of Example 1 is good.

实施例2:5万吨/年乙醇氧化制乙醛反应器用的多级扩压减速气体分布器Example 2: Multi-stage pressure expansion deceleration gas distributor for 50,000 tons/year ethanol oxidation to acetaldehyde reactor

为了进一步理解本发明,下面给出5万吨/年乙醛生产装置的实施例。5万吨乙醇空气催化氧化制乙醛反应器,采用空气和乙醇混合后进入反应器,乙醇进料量为13100kg/h,空气进料量量为7900kg/h,进料温度135℃,混合后体积Q为15600m3/h(工况)。采纳绝热式反应器,反应器床层为平铺的电解银催化剂。In order to further understand the present invention, an example of a 50,000 tons/year acetaldehyde production device is given below. 50,000 tons of ethanol air catalytic oxidation to acetaldehyde reactor, air and ethanol are mixed into the reactor, the ethanol feed amount is 13100kg/h, the air feed amount is 7900kg/h, the feed temperature is 135°C, after mixing The volume Q is 15600m 3 /h (working condition). An adiabatic reactor is used, and the reactor bed is a flat electrolytic silver catalyst.

实施例2的分布器结构除以下结构参数外,其余均与实施例1相同。The distributor structure of Embodiment 2 is the same as that of Embodiment 1 except for the following structural parameters.

①分布器直径①Diameter of distributor

取分布器出口平均速度为0.77m/s,计算得到气体分布器直径D0为2676mm,取整后为DN2700mm。Taking the average velocity of the distributor outlet as 0.77m/s, the gas distributor diameter D 0 is calculated to be 2676mm, which is DN2700mm after rounding.

②第二气体分散罩的结构②Structure of the second gas dispersion cover

第二气体分散罩的夹角α为60度,第二气体分散罩的高度系数Bh取为0.7,计算得到第二气体分散罩高度H2为1637mm。The included angle α of the second gas dispersion hood is 60 degrees, the height coefficient B h of the second gas dispersion hood is taken as 0.7, and the calculated height H 2 of the second gas dispersion hood is 1637 mm.

③第一气体分散罩的结构③Structure of the first gas dispersion cover

第一气体分散罩的高度H1为2312mm。The height H1 of the first gas dispersion cover is 2312mm.

④分布板结构④Distribution board structure

分布板厚度H3为5mm,圆形通孔直径D3为40mm。The thickness H3 of the distribution plate is 5mm, and the diameter D3 of the circular through hole is 40mm.

分布板孔隙率φ取0.35,孔心距计算为65mm。The porosity φ of the distribution plate is taken as 0.35, and the hole center distance is calculated as 65mm.

⑤分布板组件的结构⑤Structure of distribution board assembly

气体射流会聚系数Ch为取0.053,分布板间距Δh为350mm,分布板数量N取3,第三气体通道长度H4为1050mm。The gas jet convergence coefficient Ch is 0.053, the distribution plate spacing Δh is 350mm, the number of distribution plates N is 3, and the third gas channel length H 4 is 1050mm.

⑥进气通道结构⑥Inlet channel structure

进口管道直径Dinlet为300mm,长度Linlet为400mm,高度hinlet为400mm。The diameter D inlet of the inlet pipe is 300mm, the length L inlet is 400mm, and the height h inlet is 400mm.

⑦出口气体分布效果⑦Exit gas distribution effect

为说明实施例2分布器的气体分布效果,经计算得到如图14所示的分布器出口速度云图。从图14可以看出,出口速度范围为0~1.47m/s,速度均大于0,小于2.0m/s,这表明实施例2的分布器出口没有回流,且流入催化剂反应层的流速适合化工反应需求。该云图中流速主要以青绿、浅黄色为主,该区间的流速范围约为0.5~1.0m/s,这表明实施例2的分布器出口流速主要分布于平均值0.77m/s上下,分布均匀性好。实施例2的分布器出口气体不均匀度仅为0.208,小于建议值0.4,进一步说明实施例2的分布器气体分布效果好。In order to illustrate the gas distribution effect of the sparger in Example 2, the sparger outlet velocity cloud diagram shown in Figure 14 was calculated. It can be seen from Figure 14 that the outlet velocity ranges from 0 to 1.47m/s, and the velocities are all greater than 0 and less than 2.0m/s. This shows that there is no backflow at the distributor outlet of Example 2, and the flow rate into the catalyst reaction layer is suitable for the chemical industry. Respond to needs. The flow velocity in this cloud diagram is mainly green and light yellow, and the flow velocity range in this interval is about 0.5-1.0m/s, which shows that the flow velocity at the outlet of the distributor in Example 2 is mainly distributed around the average value of 0.77m/s, and the distribution is uniform. Good sex. The gas unevenness at the distributor outlet of Example 2 is only 0.208, which is less than the recommended value of 0.4, which further illustrates that the gas distribution effect of the distributor of Example 2 is good.

实施例3:2万吨/年醋酸氨气缩合脱水制乙腈反应器用多级扩压减速气体分布器Example 3: 20,000 tons/year ammonia acetate condensation and dehydration to produce acetonitrile reactor with multi-stage pressure diffusion deceleration gas distributor

为了进一步理解本发明,下面给出2万吨/年乙腈生产装置的实施例。2万吨/年的醋酸和氨气经过缩合脱水制备乙腈反应器,催化剂在列管中装填,采用等温式反应器设计。醋酸进料量为13600kg/h,氨气进料量为8230kg/h,进入反应器分布器前温度为390℃,混合后体积进入分布器的流量Q为12800m3/h(工况),进入反应器上管板(即催化剂反应层入口)的平均气速为1.2m/s。In order to further understand the present invention, an example of a 20,000 tons/year acetonitrile production device is given below. 20,000 tons/year acetic acid and ammonia are condensed and dehydrated to prepare an acetonitrile reactor. The catalyst is loaded in the tubes and an isothermal reactor design is adopted. The feed amount of acetic acid is 13600kg/h, the feed amount of ammonia is 8230kg/h, the temperature before entering the reactor distributor is 390°C, the flow rate Q of the volume entering the distributor after mixing is 12800m 3 /h (working condition), enter The average gas velocity of the tube plate on the reactor (ie, the entrance to the catalyst reaction layer) is 1.2m/s.

实施例3的分布器结构除以下结构参数外,其余均与实施例1相同。The distributor structure of Embodiment 3 is the same as that of Embodiment 1 except for the following structural parameters.

①分布器直径①Diameter of distributor

取气体分布器直径D0为DN2000mm。Take the gas distributor diameter D 0 as DN2000mm.

②第二气体分散罩的结构②Structure of the second gas dispersion cover

第二气体分散罩的夹角α为55度,第二气体分散罩的高度系数Bh取为0.7,计算得到第二气体分散罩高度H2为1000mm。The included angle α of the second gas dispersion hood is 55 degrees, the height coefficient B h of the second gas dispersion hood is taken as 0.7, and the calculated height H 2 of the second gas dispersion hood is 1000 mm.

③第一气体分散罩的结构③Structure of the first gas dispersion cover

第一气体分散罩的高度H1为1500mm。The height H1 of the first gas dispersion cover is 1500mm.

④分布板结构④Distribution board structure

分布板厚度H3为5mm,圆形通孔直径D3为30mm,分布板孔隙率φ取0.4,孔心距计算为45mm。The thickness H3 of the distribution plate is 5mm, the diameter D3 of the circular through hole is 30mm, the porosity φ of the distribution plate is 0.4, and the hole center distance is calculated as 45mm.

⑤分布板组件的结构⑤Structure of distribution board assembly

气体射流会聚系数Ch为取0.067,分布板间距Δh为450mm,分布板数量N取3,第三气体通道长度H4为1350mm。The gas jet convergence coefficient Ch is 0.067, the distribution plate spacing Δh is 450mm, the number of distribution plates N is 3, and the third gas channel length H 4 is 1350mm.

⑥进气通道结构⑥Inlet channel structure

进口管道直径Dinlet为300mm,长度Linlet为400mm,高度hinlet为400mm。The diameter D inlet of the inlet pipe is 300mm, the length L inlet is 400mm, and the height h inlet is 400mm.

⑦出口气体分布效果⑦Exit gas distribution effect

为说明实施例3的分布器气体分布效果,经计算得到如图15所示的分布器出口速度云图。从图15可以看出,出口速度范围为0~2.0m/s,速度均大于0,这表明实施例3的分布器出口没有回流,且流入催化剂反应层的流速适合化工反应需求。该云图中流速主要以浅黄色为主,该区间的流速范围约为0.7~1.5m/s,这表明实施例3的分布器出口流速主要分布于平均值1.2m/s上下,分布均匀性好。实施例3的分布器出口气体不均匀度为0.39,小于建议值0.4,进一步说明实施例3的分布器气体分布效果好。In order to illustrate the gas distribution effect of the sparger in Embodiment 3, the sparger outlet velocity cloud diagram shown in Figure 15 was calculated. It can be seen from Figure 15 that the outlet velocity ranges from 0 to 2.0 m/s, and the velocities are all greater than 0. This shows that there is no backflow at the distributor outlet of Example 3, and the flow rate into the catalyst reaction layer is suitable for chemical reaction needs. The flow velocity in this cloud diagram is mainly light yellow, and the flow velocity range in this interval is about 0.7-1.5m/s. This shows that the flow velocity at the outlet of the distributor in Example 3 is mainly distributed around the average value of 1.2m/s, and the distribution uniformity is good. . The gas non-uniformity at the outlet of the distributor in Example 3 is 0.39, which is less than the recommended value of 0.4, which further illustrates that the gas distribution effect of the distributor in Example 3 is good.

实施例4:5万吨/年丁二醇(BDO)临氢脱氢制γ-丁内酯(GBL)反应器用多级扩压减速气体分布器Example 4: 50,000 tons/year butanediol (BDO) hydrodehydrogenation to produce γ-butyrolactone (GBL) reactor using a multi-stage diffusion deceleration gas distributor

1套5万吨/年1,4-丁二醇(BDO)临氢脱氢制γ-丁内酯(GBL)反应器,脱氢催化剂在列管中装填,采用等温式反应器设计。BDO进料量为6688kg/h,氢气进料量为2080kg/h,进入反应器分布器前温度为240℃,混合后体积进入分布器的流量Q为26700m3/h(工况),进入反应器上管板(即催化剂反应层入口)的平均气速为0.35m/s。One set of 50,000 tons/year 1,4-butanediol (BDO) hydrodehydrogenation to γ-butyrolactone (GBL) reactor. The dehydrogenation catalyst is loaded in the tubes and adopts an isothermal reactor design. The BDO feed rate is 6688kg/h, the hydrogen feed rate is 2080kg/h, the temperature before entering the reactor distributor is 240°C, the volume flow Q after mixing entering the distributor is 26700m 3 /h (working condition), entering the reaction The average gas velocity of the tube plate on the device (i.e., the entrance of the catalyst reaction layer) is 0.35m/s.

实施例4的分布器结构除以下结构参数外,其余均与实施例1相同。The distributor structure of Embodiment 4 is the same as that of Embodiment 1 except for the following structural parameters.

①分布器直径①Diameter of distributor

取气体分布器直径D0为DN5200mm。Take the gas distributor diameter D 0 as DN5200mm.

②第二气体分散罩的结构②Structure of the second gas dispersion cover

第二气体分散罩的夹角α为50度,第二气体分散罩的高度系数Bh取为0.7,计算得到第二气体分散罩高度H2为2170mm。The included angle α of the second gas dispersion hood is 50 degrees, the height coefficient B h of the second gas dispersion hood is taken as 0.7, and the calculated height H 2 of the second gas dispersion hood is 2170 mm.

③第一气体分散罩的结构③Structure of the first gas dispersion cover

第一气体分散罩的高度H1为3470mm。The height H1 of the first gas dispersion cover is 3470mm.

④分布板结构④Distribution board structure

分布板厚度H3为5mm,圆形通孔直径D3为80mm,分布板孔隙率φ取0.35,孔心距计算为130mm。The thickness H3 of the distribution plate is 5mm, the diameter D3 of the circular through hole is 80mm, the porosity φ of the distribution plate is 0.35, and the hole center distance is calculated as 130mm.

⑤分布板组件的结构⑤Structure of distribution board assembly

气体射流会聚系数Ch为取0.09,分布板间距Δh为300mm,分布板数量N取4,第三气体通道长度H4为1200mm。The gas jet convergence coefficient C h is 0.09, the distribution plate spacing Δh is 300 mm, the distribution plate number N is 4, and the third gas channel length H 4 is 1200 mm.

⑥进气通道结构⑥Inlet channel structure

进口管道直径Dinlet为800mm,长度Linlet为1200mm,高度hinlet为650mm。The diameter D inlet of the inlet pipe is 800mm, the length L inlet is 1200mm, and the height h inlet is 650mm.

⑦出口气体分布效果⑦Exit gas distribution effect

为说明实施例4的分布器气体分布效果,经计算得到如图16所示的分布器出口速度云图。从图16可以看出,出口速度范围为0~0.47m/s,速度均大于0,小于2.0m/s,这表明实施例4的分布器出口没有回流,且流入催化剂反应层的流速适合化工反应需求。该云图中流速主要以浅黄色为主,该区间的流速范围约为0.35m/s,这表明实施例4的分布器出口流速主要分布于平均值0.35m/s上下,分布均匀性好。实施例4的分布器出口气体不均匀度仅为0.166,小于建议值0.4,进一步说明实施例4的分布器气体分布效果好。In order to illustrate the gas distribution effect of the sparger in Embodiment 4, the sparger outlet velocity cloud diagram shown in Figure 16 was calculated. It can be seen from Figure 16 that the outlet velocity ranges from 0 to 0.47m/s, and the velocities are all greater than 0 and less than 2.0m/s. This shows that there is no backflow at the distributor outlet of Example 4, and the flow rate into the catalyst reaction layer is suitable for the chemical industry. Respond to needs. The flow velocity in this cloud diagram is mainly light yellow, and the flow velocity range in this interval is about 0.35m/s. This shows that the flow velocity at the outlet of the distributor in Example 4 is mainly distributed around the average value of 0.35m/s, and the distribution uniformity is good. The gas unevenness at the distributor outlet of Example 4 is only 0.166, which is less than the recommended value of 0.4, which further illustrates that the gas distribution effect of the distributor of Example 4 is good.

对比例1:5万吨/年乙醇氧化制乙醛反应器(未安装分布器)Comparative Example 1: 50,000 tons/year ethanol oxidation to acetaldehyde reactor (without distributor installed)

现有工业装置为5万吨/年,工艺参数与实施例2一致,不同的是,本对比例采用直径为424mm单进口通道,从分布器封头顶部垂直进气,且无分散罩及其下方的分布板。对工况进行计算,得到进入催化剂床层的分布效果图,如图17a和图17b所示,图17b中没有显示的区域为速度值小于0的区域,速度值小于0的区域中气体流动与主流方向相反,为回流区。从图17a可以看出,速度范围波动为-1.34~28.64m/s,流入催化剂反应层的局部流速很大,而且存在较大面积区域回流,不利于化工反应。通过计算发现气体分布极其不均匀,不均匀度值达到3.65,为实施例2的17.5倍,不利于化工反应。The existing industrial equipment is 50,000 tons/year, and the process parameters are consistent with Example 2. The difference is that this comparative example uses a single inlet channel with a diameter of 424mm, vertical air intake from the top of the distributor head, and no dispersion cover and its distribution board below. Calculate the working conditions and obtain the distribution effect diagram entering the catalyst bed, as shown in Figure 17a and Figure 17b. The area not shown in Figure 17b is the area where the velocity value is less than 0. The gas flow in the area where the velocity value is less than 0 is consistent with The direction of the main flow is opposite, which is the return flow area. As can be seen from Figure 17a, the velocity range fluctuates from -1.34 to 28.64m/s. The local flow velocity flowing into the catalyst reaction layer is very large, and there is a large area of backflow, which is not conducive to chemical reactions. Through calculation, it was found that the gas distribution was extremely uneven, and the unevenness value reached 3.65, which was 17.5 times that of Example 2, which was not conducive to chemical reactions.

现有工业体系银催化剂仅可使用2~3个月即出现乙醇转化率明显下降,且有十分明显的积碳现象,一个典型的周期中,其初期、中期和末期的每产出1吨乙醛单耗的乙醇如表1所示。通过对比发现,现有不安装任何分布器的反应器乙醇单耗较实施例2高出18.3kg/吨乙醛(按照整个周期产能计算),且从初期至末期寿命将缩短了1612小时。The silver catalyst in the existing industrial system can only be used for 2 to 3 months before the ethanol conversion rate drops significantly, and there is a very obvious carbon deposition phenomenon. In a typical cycle, the output of 1 ton of ethanol in the early, middle and final stages The ethanol consumed per unit of aldehyde is shown in Table 1. Through comparison, it was found that the ethanol unit consumption of the existing reactor without any distributor is 18.3kg/ton of acetaldehyde higher than that of Example 2 (calculated based on the entire cycle production capacity), and the life span from the initial stage to the end will be shortened by 1612 hours.

表1实施例2和对比例1应用的反应结果Table 1 Reaction results applied in Example 2 and Comparative Example 1

备注:乙醇为95vol%含量。Note: Ethanol content is 95vol%.

对比例2:5万吨/年乙醇氧化制乙醛反应器(只有分布板的分布器且分布器顶部垂直进气)Comparative Example 2: 50,000 tons/year ethanol oxidation to acetaldehyde reactor (sparger with only distribution plate and vertical air intake at the top of the distributor)

对比例2是在对比例1所述的反应器中增加了多层分布板,分布板结构同实施例2,但不安装分散罩。这一分布器的结构类似于中国专利CN105102104B,可等效于该专利思想在本发明中的应用。Comparative Example 2 is a multi-layer distribution plate added to the reactor described in Comparative Example 1. The structure of the distribution plate is the same as that of Example 2, but a dispersion cover is not installed. The structure of this distributor is similar to Chinese patent CN105102104B, which is equivalent to the application of this patent idea in the present invention.

依据实施例2的同等进料条件,对对比例2的分布器出口气体分布效果进行计算,结果如18a和图18b所示,图18b中没有显示的区域为回流区,从图18a可以看出,速度范围波动为-0.34~2.27m/s,存在一定面积区域的回流,气体不均匀度为0.6,约为实施例2的3倍。根据该计算结果类推,将专利CN105102104B公开的分布器应用于本发明,气体分布效果差。这主要是因为,这类分布器没有分散罩,在进口管道直径较小时,进入反应器的中心区域气体流速很大,导致分布板均匀分布的效果差。Based on the same feeding conditions of Example 2, the gas distribution effect at the distributor outlet of Comparative Example 2 was calculated. The results are shown in Figure 18a and Figure 18b. The area not shown in Figure 18b is the reflux area, as can be seen from Figure 18a , the velocity range fluctuates from -0.34 to 2.27m/s, there is backflow in a certain area, and the gas unevenness is 0.6, which is about three times that of Example 2. By analogy from this calculation result, when the distributor disclosed in patent CN105102104B is applied to the present invention, the gas distribution effect is poor. This is mainly because this type of distributor does not have a dispersion cover. When the diameter of the inlet pipe is small, the gas flow rate entering the central area of the reactor is very high, resulting in poor uniform distribution of the distribution plate.

对比例3:5万吨/年乙醇氧化制乙醛反应器用分布器Comparative Example 3: Distributor for 50,000 tons/year ethanol oxidation to acetaldehyde reactor

如图19所示,本对比例提供的气体反应器除进口管道的设置位置及数量之外,其余结构均与实施例2相同。在本对比例中,在第一气体分散罩的封头顶部连接一个直径为424mm的进口管道,该进口管道与实施例2中的两个直径300mm进口管道的进口面积相等,气体由该进口管道直接进入第二气体分散罩中。As shown in Figure 19, the gas reactor provided in this comparative example has the same structure as Example 2 except for the location and number of inlet pipes. In this comparative example, an inlet pipe with a diameter of 424 mm is connected to the top of the head of the first gas dispersion hood. The inlet pipe has the same inlet area as the two inlet pipes with a diameter of 300 mm in Example 2. The gas flows through the inlet pipe. Directly into the second gas dispersion hood.

依据实施例2的同等进料条件,对本对比例的分布器出口气体分布效果进行计算,结果如图20所示。从图20可以看出,速度范围波动为0~1.80m/s,最大速度小于2m/s,流入催化剂反应层的气体流速有利于化工反应,且不存在回流区域,气体不均匀度量化为0.36,小于建议值0.4。Based on the same feeding conditions of Example 2, the gas distribution effect at the distributor outlet of this comparative example was calculated, and the results are shown in Figure 20. As can be seen from Figure 20, the velocity range fluctuates from 0 to 1.80m/s, and the maximum velocity is less than 2m/s. The gas flow rate flowing into the catalyst reaction layer is conducive to chemical reactions, and there is no backflow area. The gas unevenness is measured as 0.36 , less than the recommended value of 0.4.

反观实施例2,其分布器出口最大气体速度仅有1.47m/s,分布器出口气体不均匀度仅为0.208,相比于对比例3,实施例2分布器出口的最大速度和不均匀度进一步降低了18%和42%,这说明本发明所述的多级扩压减速气体分布器采用对称的双侧面进口管道,可充分利用双层分散罩之间的区域进行扩压整流,不仅可以进一步提升气体分布效果,而且可以明显降低进口管道直径对分布效果的影响,有利于提高气体分布器的适用性。In contrast, in Example 2, the maximum gas velocity at the distributor outlet is only 1.47m/s, and the gas unevenness at the distributor outlet is only 0.208. Compared with Comparative Example 3, the maximum velocity and unevenness at the distributor outlet in Example 2 are It is further reduced by 18% and 42%, which shows that the multi-stage diffusion deceleration gas distributor of the present invention adopts symmetrical double-side inlet pipes, which can fully utilize the area between the double-layer dispersion hoods for diffusion rectification, not only The gas distribution effect can be further improved, and the influence of the diameter of the inlet pipe on the distribution effect can be significantly reduced, which is beneficial to improving the applicability of the gas distributor.

对比例4:5万吨/年乙醇氧化制乙醛反应器(分布板间距大的分布器)Comparative Example 4: 50,000 tons/year ethanol oxidation to acetaldehyde reactor (sparger with large distribution plate spacing)

分布板的布置方式对分布器的气体分布效果影响很大,只有分布板间距处于合理范围时,气流分布才能达到较均匀的分布状态。为了说明这一现象,对比例4是在实施例2的基础上,板间距取大于本发明板间距公式计算出的最大值。按照本发明所给的公式计算,实施例2的最大板间距为470mm,所以对比例4的板间距取700mm。The layout of the distribution plates has a great influence on the gas distribution effect of the distributor. Only when the distance between the distribution plates is within a reasonable range, the air flow distribution can achieve a relatively uniform distribution state. In order to illustrate this phenomenon, Comparative Example 4 is based on Example 2, and the plate spacing is larger than the plate spacing formula of the present invention. The calculated maximum value. Calculated according to the formula given by the present invention, the maximum plate spacing of Example 2 is 470mm, so the plate spacing of Comparative Example 4 is 700mm.

依据实施例2的同等进料条件,对对比例4的分布器出口气体分布效果进行计算,结果如21a和图21b所示,图21b中没有显示的区域为回流区,从图21a可以看出,速度范围波动为-0.34~3.96m/s,存在一定面积区域的回流,气体不均匀度为0.72,约为实施例2的3.6倍。这说明当分布板间距较大时,分布器出口气体均匀性差,不利于实际工程生产。这是因为,当分布板间距较大时,分布板下方空间较大,气体流动过程受的扰动较小,气体间相互卷吸和干扰运动与主流运动相比较弱,气体主要以主流流动为主,导致气体均匀性分布降低。同时当分布板间距较大时,会导致主分布通道长度较长,不利于实际的生产线建设。Based on the same feeding conditions of Example 2, the gas distribution effect at the distributor outlet of Comparative Example 4 was calculated. The results are shown in Figure 21a and Figure 21b. The area not shown in Figure 21b is the reflux area, as can be seen from Figure 21a , the velocity range fluctuates from -0.34 to 3.96m/s, there is backflow in a certain area, and the gas unevenness is 0.72, which is approximately 3.6 times that of Example 2. This shows that when the spacing between distribution plates is large, the gas uniformity at the distributor outlet is poor, which is not conducive to actual engineering production. This is because when the distance between the distribution plates is large, the space under the distribution plates is larger, and the gas flow process is less disturbed. The mutual entrainment and interference movement between the gases are weaker than the mainstream movement, and the gas is mainly flowed by the mainstream. , resulting in reduced gas uniformity distribution. At the same time, when the distance between distribution boards is large, the length of the main distribution channel will be long, which is not conducive to actual production line construction.

对比例5:5万吨/年乙醇氧化制乙醛反应器(分布板间距小的分布器)Comparative Example 5: 50,000 tons/year ethanol oxidation to acetaldehyde reactor (distributor with small spacing between distribution plates)

分布板间距过小,会导致分布板“短路”现象,导致分布器分布效果大大降低。为了说明这一现象,对比例5是在实施例2的基础上,将分布板间距缩小为100mm。If the spacing between the distribution plates is too small, it will cause the distribution plate to "short circuit" and greatly reduce the distribution effect of the distributor. In order to illustrate this phenomenon, Comparative Example 5 is based on Example 2, with the distribution plate spacing reduced to 100 mm.

依据实施例2的同等进料条件,对对比例5的分布器出口气体分布效果进行计算,结果如图22a和图22b所示。从图22a可以看出,分布板间距为100mm时分布器出口最大流速值高达2.52m/s,明显大于平均流速0.77m/s;从图22b可以看出,当速度范围取(0~2.52)m/s时,该出口云图出现大面积的空白区,说明出口存在大面积回流区域,气体不均匀度值为0.86,明显大于分布板间距合理的实施例2。这说明分布板间距对分布器分布效果有着重要的影响,采用本发明所述的分布板间距确定方法,可有效避免短间距分布板的“短路”问题。Based on the same feeding conditions of Example 2, the gas distribution effect at the distributor outlet of Comparative Example 5 was calculated, and the results are shown in Figures 22a and 22b. It can be seen from Figure 22a that when the distribution plate spacing is 100mm, the maximum flow velocity value at the distributor outlet is as high as 2.52m/s, which is significantly larger than the average flow velocity of 0.77m/s; as can be seen from Figure 22b, when the velocity range is (0~2.52) m/s, a large blank area appears in the outlet cloud map, indicating that there is a large backflow area at the outlet, and the gas non-uniformity value is 0.86, which is significantly larger than Example 2 with reasonable distribution plate spacing. This shows that the spacing between distribution plates has an important impact on the distribution effect of the distributor. Using the method for determining the spacing between distribution plates of the present invention can effectively avoid the "short circuit" problem of short-spacing distribution plates.

对比例6:5万吨/年乙醇氧化制乙醛反应器(分布板在第二气体分散罩内的分布器)Comparative Example 6: 50,000 tons/year ethanol oxidation to acetaldehyde reactor (distributor with distribution plate in the second gas dispersion hood)

分布板是分布器的重要气体分布组件,其设置位置对气体分布均匀性也有着重要影响。对比例6是在实施例2所述的反应器的基础上,调整分布板的位置到第二气体分散罩内,即从第二气体分散罩的气体进口开始布置多层分布板,分布板的结构及间距同实施例2。这一分布器的结构类似于中国专利文献CN105597655A所公开的分布器,可等效于该专利思想在本发明中的应用。The distribution plate is an important gas distribution component of the distributor, and its location also has an important impact on the uniformity of gas distribution. Comparative Example 6 is based on the reactor described in Example 2, adjusting the position of the distribution plate into the second gas dispersion hood, that is, arranging a multi-layer distribution plate starting from the gas inlet of the second gas dispersion hood. The structure and spacing are the same as in Embodiment 2. The structure of this distributor is similar to the distributor disclosed in Chinese patent document CN105597655A, and can be equivalent to the application of this patent idea in the present invention.

依据实施例2的同等进料条件,对对比例6的分布器出口气体分布效果进行计算,结果如图23a和图23b所示,图23b中没有显示的区域为回流区。从图23a可以看出,速度范围波动为-1.67~5.66m/s,流入催化剂反应层的流速很大,且存在大面积回流区,不均匀度值为2.06,约为实施例2的10倍,不利于化工反应。此外,从图23b可以看出,分布器出口存在大面积回流区。根据该计算结果类推,将CN105597655A公开的分布器应用于本发明,将很难满足化工反应对气体流速和分布均匀性的要求。这主要是因为这类分布器将分布板布置在分散罩中,气体经过分散罩时,中心区域气体主流速度很大,导致分布板下方外圆区域出现严重回流,降低气体分布的均匀性。对比本发明实施例2则不存在上述问题,这是因为本发明设计了双层分散罩与分布板组件顺序复合的连接结构,待第二级减速预分布结束后,再通过内置多孔分布板的第三气体通道进行第三级均匀分布,可有效提高气体分布的均匀性。Based on the same feeding conditions of Example 2, the gas distribution effect at the distributor outlet of Comparative Example 6 was calculated. The results are shown in Figures 23a and 23b. The area not shown in Figure 23b is the reflux area. As can be seen from Figure 23a, the velocity range fluctuates from -1.67 to 5.66m/s, the flow rate into the catalyst reaction layer is very large, and there is a large reflux area. The non-uniformity value is 2.06, which is approximately 10 times that of Example 2. , which is not conducive to chemical reactions. In addition, it can be seen from Figure 23b that there is a large recirculation area at the outlet of the distributor. According to the analogy of the calculation results, if the distributor disclosed in CN105597655A is applied to the present invention, it will be difficult to meet the requirements of chemical reactions for gas flow rate and distribution uniformity. This is mainly because this type of distributor arranges the distribution plate in the dispersion hood. When the gas passes through the dispersion hood, the main flow velocity of the gas in the central area is very large, resulting in severe backflow in the outer circle area below the distribution plate, reducing the uniformity of gas distribution. Compared with Embodiment 2 of the present invention, the above problem does not exist. This is because the present invention designs a connection structure in which the double-layer dispersion cover and the distribution plate assembly are sequentially combined. After the second-stage deceleration pre-distribution is completed, the built-in porous distribution plate is The third gas channel performs third-level uniform distribution, which can effectively improve the uniformity of gas distribution.

对比例7:考察在进口管道直径固定条件下对比例2的气体分布效果受气体流量的影响Comparative Example 7: Examine the gas distribution effect of Comparative Example 2 under the condition of fixed inlet pipe diameter and the influence of gas flow rate

一般情况下分布器的进口管道为顶部进气,但该类分布器的气体分布效果明显受限于气体流量。为了说明这一现象,对比例7是在对比例2所述的反应器的基础上,固定进口管道直径,改变气体流量,使分布器出口截面平均流速分布为0.1m/s、0.5m/s、1m/s、1.5m/s、2m/s、3m/s、5m/s、7m/s,然后通过计算分析其对分布器出口不均匀度的影响。图24、25a-b、26a-b、27a-b分别给出分布器出口截面平均流速分布为0.1m/s、1m/s、3m/s、7m/s时的出口速度分布云图。从图24中可以看出,当分布器出口平均流速为0.1m/s时,分布器出口没有回流,气体较均匀,不均匀性为0.44。当分布器出口平均流速分别为1m/s、3m/s和7m/s时,分布器出口速度云图如图25a-b、26a-b、27a-b所示。从图中可以看出,分布器出口出现回流,且流速范围波动较大,最大流速分别为3.24m/s、9.27m/s、21.9m/s,约为平均流速的3倍,不利于化工反应。此外,出口气体不均匀度为0.6,大于出口平均流速为0.1m/s时的0.44。为了进一步分析流量对分布器出口气体不均匀度的影响,图28为对比例7分布器出口气体不均匀度随出口平均流速变化曲线。从图28可以看出,当出口平均流速为0.1m/s时,顶部进气方式的分布器的气体不均匀度为最小值0.44,随着出口平均流速的增加,气体不均匀度增加。这说明顶部进气的分布器对于小流量气体可以达到较好的分布效果,而当气体流量大时,气体分布效果变差。对比本发明实施例1中关于分布器出口气体不均匀度随出口平均流速的变化图(图13),可以明显看出采用本发明所述的分布器,通过侧面进气和双层分散罩对进口气体进行扩压整流和减速预分布,消除了气体流量对分布器性能的影响,从而极大提高分布器适用性。Generally, the inlet pipe of the distributor is top-intake, but the gas distribution effect of this type of distributor is obviously limited by the gas flow rate. In order to illustrate this phenomenon, Comparative Example 7 is based on the reactor described in Comparative Example 2. The diameter of the inlet pipe is fixed and the gas flow rate is changed so that the average flow velocity distribution of the distributor outlet section is 0.1m/s and 0.5m/s. , 1m/s, 1.5m/s, 2m/s, 3m/s, 5m/s, 7m/s, and then analyze its impact on the unevenness of the distributor outlet through calculation. Figures 24, 25a-b, 26a-b, and 27a-b respectively show the outlet velocity distribution cloud diagrams when the average flow velocity distribution of the distributor outlet section is 0.1m/s, 1m/s, 3m/s, and 7m/s. It can be seen from Figure 24 that when the average flow velocity at the distributor outlet is 0.1m/s, there is no backflow at the distributor outlet, the gas is relatively uniform, and the non-uniformity is 0.44. When the average flow velocity at the distributor outlet is 1m/s, 3m/s and 7m/s respectively, the velocity cloud diagrams at the distributor outlet are shown in Figures 25a-b, 26a-b and 27a-b. It can be seen from the figure that there is backflow at the outlet of the distributor, and the flow rate range fluctuates greatly. The maximum flow rates are 3.24m/s, 9.27m/s, and 21.9m/s respectively, which are about 3 times the average flow rate, which is not conducive to the chemical industry. reaction. In addition, the outlet gas non-uniformity is 0.6, which is greater than 0.44 when the average outlet flow velocity is 0.1m/s. In order to further analyze the influence of flow rate on the gas unevenness at the distributor outlet, Figure 28 is a curve of the gas unevenness at the distributor outlet of Comparative Example 7 as a function of the outlet average flow rate. It can be seen from Figure 28 that when the average outlet flow velocity is 0.1m/s, the gas unevenness of the top air inlet distributor is a minimum value of 0.44. As the average outlet flow rate increases, the gas unevenness increases. This shows that the top-inlet distributor can achieve better distribution effects for small flow rates of gas, but when the gas flow rate is large, the gas distribution effect becomes worse. Comparing the graph of the change of gas unevenness at the distributor outlet with the average flow rate of the outlet in Example 1 of the present invention (Fig. 13), it can be clearly seen that using the distributor of the present invention, the side air intake and the double-layer dispersion cover The inlet gas undergoes expansion rectification and deceleration pre-distribution, which eliminates the impact of gas flow on the performance of the distributor, thereby greatly improving the applicability of the distributor.

对比例8:考察在固定气体流量条件下对比例2的气体分布效果受进口管道直径的影响Comparative Example 8: Examine the gas distribution effect of Comparative Example 2 under the condition of fixed gas flow rate and the influence of the diameter of the inlet pipe

一般情况下分布器的进口管道为顶部进气,但该类分布器的气体分布效果也明显受限于进口管道直径。为了说明这一现象,对比例8是在对比例2所述的反应器的基础上,固定气体流量,改变进口管道直径为130mm、283mm、566mm、849mm,通过计算分析其对分布器出口气体不均匀度的影响。图29a-b、30a-b、31、32、分别给出进口管道直径为130mm、283mm、566mm、849mm时的出口速度分布云图。从图29a-b、30a-b中看出,当分布器进口管道直径为130mm和283mm的较小直径时,分布器出口出现回流,且流速范围波动较大,最大流速分别为4.76m/s和3.43m/s,约为平均流速的5-6倍,出口气体不均匀度分别为0.99和0.86。这说明进口管道直径较小时,从顶部进气的分布器分布效果较差,不利于化工反应。从图31和32中看出,当分布器进口管道直径为566mm和849mm的较大直径时,分布器出口没有回流,出口气体不均匀度也分别为0.4和0.29的较小值。这说明进口管道直径较大时,从顶部进气的分布器可以取得较好分布效果。为了进一步分析进口管道直径对分布器出口气体不均匀度的影响,图33为对比例8分布器出口气体不均匀度随进口管道直径的变化曲线。从图33可以看出,当进口管道直径为130mm时,顶部进气方式的分布器的气体不均匀度为最大值0.99,随着进口管道直径的增加,气体不均匀度也随之下降,当进口管道直径为849mm时,顶部进气方式的分布器的气体不均匀度为最小值0.29。这说明顶部进气的分布器对于大进口管道直径可以达到较好的分布效果,而当进口管道直径减小时,气体分布效果变差。对比本发明实施例1中关于分布器出口气体不均匀度随进口管道直径变化图(图13),可以明显看出采用本发明所述的分布器,通过侧面进气和双层分散罩对进口气体进行扩压整流和减速预分布,消除了进口管道直径对分布器性能的影响,从而极大提高分布器适用性。Generally, the inlet pipe of the distributor is top-intake, but the gas distribution effect of this type of distributor is also obviously limited by the diameter of the inlet pipe. In order to illustrate this phenomenon, Comparative Example 8 is based on the reactor described in Comparative Example 2. The gas flow rate is fixed, and the diameter of the inlet pipe is changed to 130mm, 283mm, 566mm, and 849mm. Through calculation and analysis, it has no effect on the gas at the distributor outlet. Effect of uniformity. Figures 29a-b, 30a-b, 31, and 32 respectively show the outlet velocity distribution cloud diagrams when the diameter of the inlet pipe is 130mm, 283mm, 566mm, and 849mm. It can be seen from Figures 29a-b and 30a-b that when the distributor inlet pipe diameter is the smaller diameter of 130mm and 283mm, backflow occurs at the distributor outlet, and the flow rate range fluctuates greatly, and the maximum flow rate is 4.76m/s respectively. and 3.43m/s, which are about 5-6 times the average flow velocity, and the outlet gas non-uniformity is 0.99 and 0.86 respectively. This shows that when the diameter of the inlet pipe is small, the distribution effect of the air distributor from the top is poor, which is not conducive to chemical reactions. It can be seen from Figures 31 and 32 that when the distributor inlet pipe diameter is the larger diameter of 566mm and 849mm, there is no backflow at the distributor outlet, and the outlet gas unevenness is also the smaller value of 0.4 and 0.29 respectively. This shows that when the diameter of the inlet pipe is larger, the distributor that takes in air from the top can achieve better distribution results. In order to further analyze the influence of the diameter of the inlet pipe on the unevenness of the gas at the distributor outlet, Figure 33 shows the variation curve of the unevenness of the gas at the distributor outlet in Comparative Example 8 with the diameter of the inlet pipe. It can be seen from Figure 33 that when the diameter of the inlet pipe is 130mm, the gas unevenness of the top air inlet distributor is the maximum value of 0.99. As the diameter of the inlet pipe increases, the gas unevenness also decreases. When When the diameter of the inlet pipe is 849mm, the gas unevenness of the top air inlet distributor is the minimum value 0.29. This shows that the top-intake distributor can achieve better distribution effects for large inlet pipe diameters, but when the inlet pipe diameter decreases, the gas distribution effect becomes worse. Comparing the graph of the variation of gas unevenness at the distributor outlet with the diameter of the inlet pipe in Example 1 of the present invention (Fig. 13), it can be clearly seen that using the distributor of the present invention, the inlet is affected by the side air intake and the double-layer dispersion cover. The gas undergoes diffusion rectification and deceleration pre-distribution, which eliminates the impact of the diameter of the inlet pipe on the performance of the distributor, thereby greatly improving the applicability of the distributor.

显然,上述实施例仅仅是为清楚地说明所作的举例,而并非对实施方式的限定。对于所属领域的普通技术人员来说,在上述说明的基础上还可以做出其它不同形式的变化或变动。这里无需也无法对所有的实施方式予以穷举。而由此所引申出的显而易见的变化或变动仍处于本发明创造的保护范围之中。Obviously, the above-mentioned embodiments are only examples for clear explanation and are not intended to limit the implementation. For those of ordinary skill in the art, other different forms of changes or modifications can be made based on the above description. An exhaustive list of all implementations is neither necessary nor possible. The obvious changes or modifications derived therefrom are still within the protection scope of the present invention.

Claims (13)

1.一种气体分布器,其特征在于,包括:1. A gas distributor, characterized in that it includes: 渐扩组件,包括第一气体分散罩及位于所述第一气体分散罩内部的第二气体分散罩,所述第二气体分散罩具有气体进口和气体出口,在所述气体进口与所述气体出口之间形成第二气体通道,沿气体流动方向上所述第二气体通道的横截面积逐渐增大;反应原料气体的进口管道设置在所述第一气体分散罩上靠近所述第二气体分散罩的气体出口处,所述第一气体分散罩与所述第二气体分散罩之间的空间形成第一气体通道,所述第一气体通道与所述第二气体通道相连通;和The gradually expanding assembly includes a first gas dispersion cover and a second gas dispersion cover located inside the first gas dispersion cover. The second gas dispersion cover has a gas inlet and a gas outlet. Between the gas inlet and the gas A second gas channel is formed between the outlets, and the cross-sectional area of the second gas channel gradually increases along the gas flow direction; the inlet pipe of the reaction raw material gas is arranged on the first gas dispersion cover close to the second gas At the gas outlet of the dispersion cover, the space between the first gas dispersion cover and the second gas dispersion cover forms a first gas channel, and the first gas channel is connected with the second gas channel; and 分布板组件,包括至少两个平行且间隔设置的气体分布板,所述气体分布板上设置有若干通孔,相邻两个所述气体分布板之间的间距Δh满足:The distribution plate assembly includes at least two parallel and spaced gas distribution plates. The gas distribution plates are provided with a number of through holes. The distance Δh between two adjacent gas distribution plates satisfies: 其中,Ch为气体射流会聚系数,单位为m·s,取值为0.02~0.1,为气体分布器出口截面气体平均流速,单位为m/s,φ为气体分布板的孔隙率;Δh单位为mm;Among them, C h is the gas jet convergence coefficient, the unit is m·s, and the value is 0.02~0.1. is the average gas flow velocity at the outlet section of the gas distributor, in m/s, φ is the porosity of the gas distribution plate; Δh is in mm; 所述渐扩组件和所述分布板组件沿气体流动方向依次设置,所述第二气体通道的最大横截面积不小于所述气体分布板的面积。The gradually expanding component and the distribution plate component are arranged sequentially along the gas flow direction, and the maximum cross-sectional area of the second gas channel is not less than the area of the gas distribution plate. 2.根据权利要求1所述的气体分布器,其特征在于,所述气体分布板为圆形,其直径D0满足:其中,Q为流经气体反应器的气体体积流量,单位为m3/h;π为圆周率,取值为3.1415926;D0单位为mm;和/或,2. The gas distributor according to claim 1, characterized in that the gas distribution plate is circular and its diameter D0 satisfies: Among them, Q is the gas volume flow rate flowing through the gas reactor, the unit is m 3 /h; π is the pi ratio, the value is 3.1415926; D 0 unit is mm; and/or, 所述为0.1~2.5m/s;和/或,described is 0.1~2.5m/s; and/or, 所述φ的取值为0.3~0.5。The value of φ is 0.3~0.5. 3.根据权利要求2所述的气体分布器,其特征在于,所述通孔在所述气体分布板上呈60°交错排布,所述通孔为圆孔,相邻两个所述通孔的孔心距d满足:其中,D3为所述通孔的直径,单位为mm,取值为0.01~0.03D03. The gas distributor according to claim 2, wherein the through holes are arranged staggered at 60° on the gas distribution plate, and the through holes are round holes, and two adjacent through holes are arranged in a staggered manner at 60°. The hole center distance d satisfies: Among them, D 3 is the diameter of the through hole, the unit is mm, and the value is 0.01 to 0.03D 0 . 4.根据权利要求1所述的气体分布器,其特征在于,所述通孔的形状为三角形、正方形、长方形、菱形、十字形、六边形或椭圆形;和/或,所述通孔呈同心圆排布、直排或错排。4. The gas distributor according to claim 1, wherein the shape of the through hole is a triangle, a square, a rectangle, a rhombus, a cross, a hexagon or an ellipse; and/or the through hole is Arranged in concentric circles, straight or staggered. 5.根据权利要求1所述的气体分布器,其特征在于,所述气体分布板的个数为3~6;和/或,5. The gas distributor according to claim 1, characterized in that the number of the gas distribution plates is 3 to 6; and/or, 所述气体分布板垂直于气体流动方向设置。The gas distribution plate is arranged perpendicular to the gas flow direction. 6.根据权利要求1~5任一项所述的气体分布器,其特征在于,所述分布板组件还包括第一筒体,所述气体分布板的周缘与所述第一筒体的内壁连接,所述第一筒体的内部空间形成第三气体通道,所述第三气体通道与所述第二气体通道连通。6. The gas distributor according to any one of claims 1 to 5, wherein the distribution plate assembly further includes a first cylinder, and the periphery of the gas distribution plate and the inner wall of the first cylinder are Connected, the internal space of the first cylinder forms a third gas channel, and the third gas channel is connected with the second gas channel. 7.根据权利要求1所述的气体分布器,其特征在于,所述第二气体分散罩与所述第二气体通道的横截面之间的夹角α为30~70°。7. The gas distributor according to claim 1, wherein the angle α between the second gas distribution cover and the cross section of the second gas channel is 30 to 70°. 8.根据权利要求2所述的气体分布器,其特征在于,所述第二气体分散罩的高度H2满足:其中,Bh为第二气体分散罩的高度系数,取0.5~0.8;α为所述第二气体分散罩与所述第二气体通道的横截面之间的夹角,取30~70°。8. The gas distributor according to claim 2, wherein the height H of the second gas distribution cover satisfies: Wherein, B h is the height coefficient of the second gas dispersion cover, which is taken as 0.5-0.8; α is the angle between the cross section of the second gas dispersion cover and the second gas channel, which is taken as 30-70°. 9.根据权利要求7或8所述的气体分布器,其特征在于,所述第二气体分散罩与所述第二气体通道的横截面之间的夹角α为45~65°。9. The gas distributor according to claim 7 or 8, characterized in that the angle α between the second gas dispersion cover and the cross section of the second gas channel is 45 to 65°. 10.根据权利要求2所述的气体分布器,其特征在于,所述第一气体分散罩的顶部与所述第二气体分散罩的气体进口之间的间距不小于0.25D010. The gas distributor according to claim 2, wherein the distance between the top of the first gas dispersion hood and the gas inlet of the second gas dispersion hood is not less than 0.25D 0 . 11.根据权利要求2所述的气体分布器,其特征在于,所述进口管道为至少1个,当所述进口管道为2个以上时,所述进口管道对称设置于所述第一气体分散罩的外壁上。11. The gas distributor according to claim 2, characterized in that there is at least one inlet pipe, and when there are more than two inlet pipes, the inlet pipes are symmetrically arranged on the first gas distributor. on the outer wall of the cover. 12.根据权利要求11所述的气体分布器,其特征在于,所述进口管道的直径Dinlet或等效直径De为0.1~0.2D0;和/或,12. The gas distributor according to claim 11, wherein the diameter D inlet or the equivalent diameter De of the inlet pipe is 0.1 to 0.2 D 0 ; and/or, 所述进口管道的长度Linlet为1.0~2.0Dinlet;和/或,The length L inlet of the inlet pipe is 1.0~2.0D inlet ; and/or, 所述进口管道与所述第一气体分散罩的底面之间的间距hinlet为0~900mm。The distance h inlet between the inlet pipe and the bottom surface of the first gas dispersion cover is 0 to 900 mm. 13.一种气-固反应器,其特征在于,包括权利要求1~12任一项所述的气体分布器。13. A gas-solid reactor, characterized by comprising the gas distributor according to any one of claims 1 to 12.
CN202310118194.4A 2023-02-01 2023-02-01 Gas distributor and gas-solid reactor comprising same Active CN116236978B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202310118194.4A CN116236978B (en) 2023-02-01 2023-02-01 Gas distributor and gas-solid reactor comprising same
PCT/CN2023/081950 WO2024159584A1 (en) 2023-02-01 2023-03-16 Gas distributor and gas-solid reactor containing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202310118194.4A CN116236978B (en) 2023-02-01 2023-02-01 Gas distributor and gas-solid reactor comprising same

Publications (2)

Publication Number Publication Date
CN116236978A CN116236978A (en) 2023-06-09
CN116236978B true CN116236978B (en) 2023-09-22

Family

ID=86623656

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202310118194.4A Active CN116236978B (en) 2023-02-01 2023-02-01 Gas distributor and gas-solid reactor comprising same

Country Status (2)

Country Link
CN (1) CN116236978B (en)
WO (1) WO2024159584A1 (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103071430A (en) * 2013-01-30 2013-05-01 中国石油化工股份有限公司 Radial fixed bed reactor for oxydehydrogenation of butylene
KR20140039916A (en) * 2012-09-25 2014-04-02 한국전력공사 Absorption tower for treating acidic gas
CN105597655A (en) * 2016-03-16 2016-05-25 北京化工大学 Gas distribution device
CN111589377A (en) * 2020-05-29 2020-08-28 德艾柯工程技术(上海)有限公司 Gas distributor for horizontal reactor
CN211936906U (en) * 2020-03-06 2020-11-17 建德市双超钙业有限公司 Effectual gas distributor disperses
CN112522863A (en) * 2020-11-26 2021-03-19 内蒙古工业大学 Airflow fiber laying device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201454503U (en) * 2009-08-31 2010-05-12 中国石油化工股份有限公司 Axial flow fixed bed gas-solid catalytic reactor
US8734728B2 (en) * 2011-06-20 2014-05-27 Honeywell International Inc. NH3 oxidizer gas distributor
CN104226208B (en) * 2013-06-06 2016-07-06 神华集团有限责任公司 A kind of gas distributor for multiphase flow reactor and multiphase flow reactor
US9410750B1 (en) * 2015-01-23 2016-08-09 Technip Process Technology, Inc. Gas distributor for heat exchange and/or mass transfer column
KR20190092154A (en) * 2018-01-30 2019-08-07 삼성전자주식회사 Sealing device and Gas flow control device of semiconductor equipment
CN114425283B (en) * 2020-10-15 2023-05-02 中国石油化工股份有限公司 Hydrocarbon ammoxidation reaction device, oxygen-containing gas distributor and application thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140039916A (en) * 2012-09-25 2014-04-02 한국전력공사 Absorption tower for treating acidic gas
CN103071430A (en) * 2013-01-30 2013-05-01 中国石油化工股份有限公司 Radial fixed bed reactor for oxydehydrogenation of butylene
CN105597655A (en) * 2016-03-16 2016-05-25 北京化工大学 Gas distribution device
CN211936906U (en) * 2020-03-06 2020-11-17 建德市双超钙业有限公司 Effectual gas distributor disperses
CN111589377A (en) * 2020-05-29 2020-08-28 德艾柯工程技术(上海)有限公司 Gas distributor for horizontal reactor
CN112522863A (en) * 2020-11-26 2021-03-19 内蒙古工业大学 Airflow fiber laying device

Also Published As

Publication number Publication date
CN116236978A (en) 2023-06-09
WO2024159584A1 (en) 2024-08-08

Similar Documents

Publication Publication Date Title
CN108636298A (en) The oxonation device of synthesis gas preparing ethylene glycol device
CN103721643B (en) A kind of Z-type butylene oxidation-dehydrogenation fixed bed radial reactor
CN103071433B (en) For the gas pre-distributor of the fixed bed reactors of preparing cis-anhydride by n-butane oxidation
CN116236978B (en) Gas distributor and gas-solid reactor comprising same
CN104084065A (en) Ethylene and oxygen mixing method
CN101952022A (en) Isothermal chemical reactor with plate heat exchanger
CN201140063Y (en) Double-cone diversion air inlet distributor for organic silicon monomer fluidized bed reactor
CN104724705B (en) Chassis assembly for polycrystalline silicon reducing furnace
CN207478534U (en) Annular gas distributor and reactor
CN109289710A (en) A gas-solid axial radial two-dimensional flow reactor
CN101725367B (en) Mine Ventilation Gas Treatment Device's Vacuum Air Intake Rectifier
CN215539811U (en) Gas uniform distribution conversion system for flue gas acid making
CN203862223U (en) Distribution plate for propylene epoxidation reaction
CN207872118U (en) Gas distributor and reactor
CN221832288U (en) Combined gas distributor applied to large horizontal reactor
CN203494495U (en) Reactor for producing vinyl acetate through ethylene gaseous phase method
CN222943214U (en) Falling film distributor for falling film absorber
CN208554114U (en) A kind of board-like reaction tube and plate-type reactor
CN109045947B (en) A fluidized bed cluster reactor
CN200968789Y (en) High efficiency dish-ring type heat exchanger
CN118874343A (en) A radial reactor
CN202700474U (en) Static bed axial radical reactor with calandria wall type inner and outer barrels
CN112957909B (en) A gas uniform conversion system for flue gas acid production
CN103084122A (en) Radial reactor
CN101949659B (en) High-efficiency U-shaped heat exchanger

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant