CN116196910A - Device for Enhancing Adsorption Rate of Large Volume Getters by Dielectric Barrier Discharge Plasma - Google Patents
Device for Enhancing Adsorption Rate of Large Volume Getters by Dielectric Barrier Discharge Plasma Download PDFInfo
- Publication number
- CN116196910A CN116196910A CN202111439143.9A CN202111439143A CN116196910A CN 116196910 A CN116196910 A CN 116196910A CN 202111439143 A CN202111439143 A CN 202111439143A CN 116196910 A CN116196910 A CN 116196910A
- Authority
- CN
- China
- Prior art keywords
- getter
- vacuum
- vacuum chamber
- flange
- diffuser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/34—Regenerating or reactivating
- B01J20/3441—Regeneration or reactivation by electric current, ultrasound or irradiation, e.g. electromagnetic radiation such as X-rays, UV, light, microwaves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Abstract
本发明涉及一种介质阻挡放电等离子体增强大体积吸气剂吸附速率的装置,包括真空腔室、加热棒、吸气剂容器、金属电极介质板、扩压器、供气系统、气压采集系统、抽真空系统和放电系统,其中真空腔室前端与扩压器连接,所述扩压器与供气系统连接,真空腔室后端分别通过管路与抽真空系统和气压采集系统连接,吸气剂容器和金属电极介质板交错设于所述真空腔室中,且所述吸气剂容器内设有加热棒和吸气剂材料,所述金属电极介质板下端与设于真空腔室外侧的放电系统相连。本发明保证大体积吸气剂封装反应的同时,通过加热棒的加热耦合能量以及等离子体中产生的活性物种可加快整个装置中吸气剂的吸气速率。
The invention relates to a device for enhancing the adsorption rate of a large-volume getter by dielectric barrier discharge plasma, including a vacuum chamber, a heating rod, a getter container, a metal electrode dielectric plate, a diffuser, an air supply system, and an air pressure collection system , vacuum system and discharge system, wherein the front end of the vacuum chamber is connected to the diffuser, the diffuser is connected to the gas supply system, and the rear end of the vacuum chamber is respectively connected to the vacuum system and the air pressure collection system through pipelines. The aerosol container and the metal electrode dielectric plate are alternately arranged in the vacuum chamber, and the getter container is provided with a heating rod and a getter material, and the lower end of the metal electrode dielectric plate is arranged outside the vacuum chamber. connected to the discharge system. The invention guarantees the encapsulation reaction of the large-volume getter, and at the same time, the gas-absorption rate of the getter in the whole device can be accelerated through the heating coupling energy of the heating rod and the active species generated in the plasma.
Description
技术领域technical field
本发明涉及热学、电磁与材料应用领域,具体地说是一种介质阻挡放电等离子体增强大体积吸气剂吸附速率的装置。The invention relates to the application fields of heat, electromagnetism and materials, in particular to a device for enhancing the adsorption rate of large-volume getters by dielectric barrier discharge plasma.
背景技术Background technique
当前很多领域的工业应用以及基础科学研究均需在真空环境下进行,包括镀膜、热处理、微机电系统、表面科学、原子物理、纳米技术及半导体工业等。对于真空技术而言,内部真空环境及真空度的大小直接影响着工作范围和效率,特别是步入21世纪之后,随着各项应用指标的不断提高和基础学科研究的深入,其运行以及研究的环境均需要不同程度的高真空甚至超高真空来维系,这也对真空封装过程的工艺以及后续真空环境的获得手段提出了更高的要求和挑战。因此,除了采用常规的真空获取手段,如机械泵,分子泵,低温泵等技术之外,基于吸气材料发展而来的真空吸附技术也逐渐受到关注并展露出了更加重要的作用。At present, industrial applications and basic scientific research in many fields need to be carried out in a vacuum environment, including coating, heat treatment, micro-electromechanical systems, surface science, atomic physics, nanotechnology and semiconductor industry. For vacuum technology, the internal vacuum environment and vacuum degree directly affect the working range and efficiency, especially after entering the 21st century, with the continuous improvement of various application indicators and the deepening of basic discipline research, its operation and research All environments require different degrees of high vacuum or even ultra-high vacuum to maintain, which also puts forward higher requirements and challenges for the process of vacuum packaging process and the means of obtaining the subsequent vacuum environment. Therefore, in addition to the conventional means of obtaining vacuum, such as mechanical pumps, molecular pumps, cryopumps, etc., vacuum adsorption technology based on getter materials has gradually attracted attention and played a more important role.
非蒸散型吸气剂(Non-Evaporable Getter,NEG)因其平衡气压低、吸气容量大和吸气速率高等特性,已在电真空器件、超高真空获得、原子能工业等科学研究和工业生产中得到了应用。一般来说,目前该类型吸气材料在进行工作时均需要对其进行加热处理,而后吸气剂才具有吸气功能,该过程称为吸气剂的激活过程。传统激活吸气剂的过程一般采用电热丝或者电热棒进行加热,吸气剂在高温下激活并开始吸收气体。Non-evaporable getter (Non-Evaporable Getter, NEG) has been used in scientific research and industrial production of electric vacuum devices, ultra-high vacuum acquisition, atomic energy industry, etc. because of its low equilibrium pressure, large suction capacity and high suction rate. got applied. Generally speaking, at present, this type of getter material needs to be heat-treated when it is working, and then the getter can have the getter function, and this process is called the activation process of the getter. The traditional process of activating the getter is generally heated by a heating wire or a heating rod, and the getter is activated at a high temperature and begins to absorb gas.
不过,尽管NEG在高真空及超高真空器件中应用具有独特的优势并且已被广泛应用,但随着我国新世纪工业化进程的加快,该型吸气方式的局限性也逐步体现出来:①工业化装置不再局限于小型的真空器件(如化学激光的吸附系统),往往需要进行放大化处理,而对于大型装置获得高真空时仍须在常规获取手段的基础上采用吸气剂进行吸附处理,该种情况下往往需要增加吸气剂用量,即可能需要大体积的吸气剂才能达到大装置的高真空效果。如何保证大体积吸气剂的封装、吸气是一项技术问题。②吸气剂对部分气体的吸附具有选择性,根据气体种类的不同,吸气速率会受到极大的影响。对于部分较难吸收的气体而言,如氮气,往往需要几百摄氏度的高温才能激活吸气剂吸气,并且激活之后的吸气速率很慢。如何有效提高定量吸气剂对较难吸附气体的吸附速率是十分重要的。However, although NEG has unique advantages in the application of high vacuum and ultra-high vacuum devices and has been widely used, with the acceleration of industrialization in the new century in my country, the limitations of this type of suction method are gradually reflected: ①Industrialization Devices are no longer limited to small vacuum devices (such as chemical laser adsorption systems), which often need to be scaled up. For large devices to obtain high vacuum, it is still necessary to use getters for adsorption on the basis of conventional acquisition methods. In this case, it is often necessary to increase the amount of getter, that is, a large volume of getter may be required to achieve the high vacuum effect of a large device. How to ensure the encapsulation and air absorption of the large-volume getter is a technical problem. ② The getter is selective in the adsorption of some gases, and the getter rate will be greatly affected depending on the type of gas. For some gases that are difficult to absorb, such as nitrogen, a high temperature of several hundred degrees Celsius is often required to activate the getter to inhale, and the inhalation rate after activation is very slow. How to effectively increase the adsorption rate of quantitative getters for difficult-to-adsorb gases is very important.
以上这些问题的存在会限制吸气剂的全面应用功能,如何设计一种适应于当前大体积吸气剂应用、并且改善吸气剂对难吸附气体吸附速率的装置是十分重要的。The existence of the above problems will limit the comprehensive application function of the getter. It is very important to design a device that is suitable for the current application of large-volume getters and improves the adsorption rate of the getter to the difficult-to-adsorb gas.
发明内容Contents of the invention
本发明的目的在于提供一种介质阻挡放电等离子体增强大体积吸气剂吸附速率的装置,保证大体积吸气剂封装反应的同时,通过加热棒的加热耦合能量以及等离子体中产生的活性物种可加快整个装置中吸气剂的吸气速率。The purpose of the present invention is to provide a device for enhancing the adsorption rate of large-volume getters by dielectric barrier discharge plasma, which ensures the encapsulation reaction of large-volume getters, and at the same time couples the energy through the heating of the heating rod and the active species generated in the plasma. The getter rate can be accelerated throughout the device.
本发明的目的是通过以下技术方案来实现的:The purpose of the present invention is achieved through the following technical solutions:
一种介质阻挡放电等离子体增强大体积吸气剂吸附速率的装置,包括真空腔室、加热棒、吸气剂容器、金属电极介质板、扩压器、供气系统、气压采集系统、抽真空系统和放电系统,其中真空腔室前端与扩压器连接,所述扩压器与供气系统连接,真空腔室后端分别通过管路与抽真空系统和气压采集系统连接,吸气剂容器和金属电极介质板交错设于所述真空腔室中,且所述吸气剂容器内设有加热棒和吸气剂材料,所述金属电极介质板下端与设于真空腔室外侧的放电系统相连。A device for enhancing the adsorption rate of a large-volume getter by dielectric barrier discharge plasma, including a vacuum chamber, a heating rod, a getter container, a metal electrode dielectric plate, a diffuser, a gas supply system, an air pressure collection system, and a vacuum pump System and discharge system, wherein the front end of the vacuum chamber is connected to the diffuser, the diffuser is connected to the gas supply system, the rear end of the vacuum chamber is respectively connected to the vacuum pumping system and the air pressure collection system through pipelines, and the getter container and the metal electrode dielectric plate are interlaced in the vacuum chamber, and the getter container is provided with a heating rod and a getter material, and the lower end of the metal electrode dielectric plate is connected with the discharge system arranged outside the vacuum chamber connected.
所述真空腔室前端设有前法兰与所述扩压器后端密封连接,所述真空腔室后端设有两个后法兰,且其中一个后法兰通过第一管路与抽真空系统连接,另一个后法兰通过第二管路与气压采集系统连接,所述真空腔室上侧设有盖板,且所述盖板与真空腔室上端密封连接,所述加热棒穿过所述盖板后插入到对应的吸气剂容器中。The front end of the vacuum chamber is provided with a front flange which is in sealing connection with the rear end of the diffuser. connected to the vacuum system, the other rear flange is connected to the air pressure collection system through the second pipeline, a cover plate is provided on the upper side of the vacuum chamber, and the cover plate is sealed and connected to the upper end of the vacuum chamber, and the heating rod wears After passing through the cover plate, insert it into the corresponding getter container.
所述吸气剂容器上端与所述盖板一体固连,所述吸气剂容器下端螺纹连接有封盖,所述吸气剂容器壁面带孔。The upper end of the getter container is integrally connected with the cover plate, the lower end of the getter container is threadedly connected with a cover, and the wall surface of the getter container has holes.
所述吸气剂容器为壁面带孔的空心筒体结构。The getter container is a hollow cylindrical structure with holes on the wall.
所述放电系统包括高压交流电源和真空电极法兰,其中真空腔室下侧设有腔体法兰,且所述真空电极法兰分别与对应的腔体法兰密封连接,所述金属电极介质板下端穿过对应的腔体法兰后与对应的真空电极法兰连接,所述真空电极法兰通过导线与所述高压交流电源相连。The discharge system includes a high-voltage AC power supply and a vacuum electrode flange, wherein a cavity flange is provided on the lower side of the vacuum chamber, and the vacuum electrode flanges are respectively sealed and connected to the corresponding cavity flanges, and the metal electrode medium The lower end of the plate is connected to the corresponding vacuum electrode flange after passing through the corresponding cavity flange, and the vacuum electrode flange is connected to the high-voltage AC power supply through wires.
任意相邻两个金属电极介质板之间均设有一个吸气剂容器,且相邻两个金属电极介质板中,其中一个金属电极介质板与所述高压交流电源的高压输出接线端A相连,另一个金属电极介质板与所述高压交流电源的低压输出接线端B相连,并且所述高压交流电源的低压输出接线端B同时与地线连接。A getter container is provided between any adjacent two metal electrode dielectric plates, and one of the metal electrode dielectric plates is connected to the high-voltage output terminal A of the high-voltage AC power supply among the two adjacent metal electrode dielectric plates , the other metal electrode dielectric plate is connected to the low-voltage output terminal B of the high-voltage AC power supply, and the low-voltage output terminal B of the high-voltage AC power supply is connected to the ground wire at the same time.
所述扩压器为一端粗、另一端细的空心金属圆筒,且所述扩压器的粗端与所述真空腔室连接,所述扩压器的细端通过气体管路与供气系统连接。The diffuser is a hollow metal cylinder with one end thick and the other end thin, and the thick end of the diffuser is connected to the vacuum chamber, and the thin end of the diffuser is connected to the gas supply through the gas pipeline. system connection.
所述供气系统包括依次串联的供气气源和质量流量计。The gas supply system includes a gas supply source and a mass flow meter connected in series in sequence.
所述抽真空系统包括真空泵,且所述真空泵与所述真空腔室之间的管路上设有阀门。The vacuum pumping system includes a vacuum pump, and a valve is arranged on the pipeline between the vacuum pump and the vacuum chamber.
所述气压采集系统包括依次串联的真空计、真空计显示器、数字信息采集卡和电脑。The air pressure acquisition system includes a vacuum gauge, a vacuum gauge display, a digital information acquisition card and a computer connected in series in sequence.
本发明的优点与积极效果为:Advantage of the present invention and positive effect are:
1、本发明的真空腔室结构可保证大体积吸气剂封装,并且本发明利用加热棒对吸气剂容器内的吸气剂材料进行加热激活,并利用任意相邻两个金属电极介质板之间产生等离子体与中间对应的吸气剂容器中的吸气剂反应,可以加快整个装置中吸气剂的吸气速率。1. The vacuum chamber structure of the present invention can ensure large-volume getter packaging, and the present invention uses a heating rod to heat and activate the getter material in the getter container, and uses any two adjacent metal electrode dielectric plates The plasma generated between them reacts with the getter in the corresponding getter container in the middle, which can accelerate the getter rate of the getter in the whole device.
2、本发明的供气系统可实时监测入气参数情况,同时气压采集系统可实时监测真空腔室内的气压情况,从而可以实时进行调节,保证反应环境符合要求。2. The gas supply system of the present invention can monitor the gas intake parameters in real time, and the air pressure acquisition system can monitor the air pressure in the vacuum chamber in real time, so that real-time adjustments can be made to ensure that the reaction environment meets the requirements.
附图说明Description of drawings
图1为本发明的结构示意图。Fig. 1 is a structural schematic diagram of the present invention.
其中,1为真空腔室,2为盖板,3为密封件,4为连接法兰,5为螺栓,6为密封法兰,7为加热棒,8为直通卡套接头,9为前法兰,10为扩压器,11为气体管路,12为质量流量计,13为供气气源,14为后法兰,15为阀门,16为真空泵,17为真空计,18为真空计显示器,19为数字信息采集卡,20为电脑,21为吸气剂容器,22为封盖,23为高压交流电源,24为金属电极介质板,25为导线,26为真空电极法兰,27为地线,28为腔体法兰。Among them, 1 is the vacuum chamber, 2 is the cover plate, 3 is the seal, 4 is the connecting flange, 5 is the bolt, 6 is the sealing flange, 7 is the heating rod, 8 is the straight ferrule joint, 9 is the front method Lan, 10 is a diffuser, 11 is a gas pipeline, 12 is a mass flow meter, 13 is a gas supply source, 14 is a rear flange, 15 is a valve, 16 is a vacuum pump, 17 is a vacuum gauge, and 18 is a vacuum gauge Display, 19 is a digital information acquisition card, 20 is a computer, 21 is a getter container, 22 is a cover, 23 is a high-voltage AC power supply, 24 is a metal electrode dielectric plate, 25 is a wire, 26 is a vacuum electrode flange, 27 is the ground wire, and 28 is the cavity flange.
具体实施方式Detailed ways
下面结合附图对本发明作进一步详述。The present invention will be described in further detail below in conjunction with the accompanying drawings.
如图1所示,本发明包括真空腔室1、加热棒7、吸气剂容器21、金属电极介质板24、扩压器10、供气系统、气压采集系统、抽真空系统和放电系统,其中真空腔室1前端与扩压器10连接,所述扩压器10通过气体管路11与供气系统连接,真空腔室1后端分别通过管路与抽真空系统和气压采集系统连接,吸气剂容器21和金属电极介质板24交错设于所述真空腔室1中,且所述吸气剂容器21内设有加热棒7和吸气剂材料,所述金属电极介质板24下端与设于真空腔室1外侧的放电系统相连。As shown in Figure 1, the present invention includes a vacuum chamber 1, a heating rod 7, a getter container 21, a metal electrode dielectric plate 24, a
如图1所示,所述真空腔室1前端设有前法兰9,且所述前法兰9通过螺栓5与所述扩压器10后端的法兰连接,所述前法兰9与扩压器10后端的法兰之间设有密封件3保证密封,所述真空腔室1后端设有两个后法兰14,且其中一个后法兰14通过第一管路与抽真空系统连接,另一个后法兰14通过第二管路与气压采集系统连接,所述真空腔室1上侧设有盖板2,且所述盖板2通过螺栓5与设于真空腔室1上端外侧的连接法兰4固连,所述盖板2与连接法兰4之间同样设有密封件3,所述加热棒7穿过所述盖板2后插入到对应的吸气剂容器21中,本实施例中,所述加热棒7为电加热棒,其上端与电线连接,另外所述盖板2上侧设有密封法兰6,且所述加热棒7穿过对应的密封法兰6并通过焊接的直通卡套接头8密封后插入至所述真空腔室1中,所述密封法兰6固定所述加热棒7的同时也保证加热棒7与盖板2之间的密封。As shown in Figure 1, the front end of the vacuum chamber 1 is provided with a front flange 9, and the front flange 9 is connected to the flange at the rear end of the
如图1所示,所述吸气剂容器21为壁面带孔的空心筒体结构,所述吸气剂容器21下端螺纹连接有封盖22,可通过打开所述封盖22实现吸气剂材料的添加与置换,本实施例中,所述空心筒体与所述盖板2焊接为一体,且所述空心筒体中心线与所述盖体2上侧对应的密封法兰6中心线重合,这样将盖板2扣置于真空腔体1上时可将所有吸气剂容器21一体装入,方便安装,所述加热棒7设于对应的吸气剂容器21中用于加热吸气剂材料实现激活。As shown in Figure 1, the getter container 21 is a hollow cylindrical structure with holes on the wall, and the lower end of the getter container 21 is threadedly connected with a cover 22, and the getter container 22 can be opened to realize Addition and replacement of materials, in this embodiment, the hollow cylinder and the cover plate 2 are welded together, and the centerline of the hollow cylinder corresponds to the centerline of the sealing flange 6 on the upper side of the cover 2 overlap, so that when the cover plate 2 is buckled on the vacuum cavity 1, all the getter containers 21 can be integrated into it, which is convenient for installation. The heating rod 7 is arranged in the corresponding getter container 21 for heating and absorbing The aerosol material is activated.
如图1所示,所述放电系统包括高压交流电源23和真空电极法兰26,其中真空腔室1下侧设有腔体法兰28,且所述真空电极法兰26分别与对应的腔体法兰28密封连接,所述真空电极法兰23与腔体法兰28之间可设置绝缘垫等元件防止漏电,所述金属电极介质板24下端穿过对应的腔体法兰28后与对应的真空电极法兰26连接,所述真空电极法兰26通过导线25与所述高压交流电源23相连。所述金属电极介质板24下端插装于对应的腔体法兰28中实现固定。As shown in Figure 1, the discharge system includes a high-voltage
如图1所示,任意相邻两个金属电极介质板24之间均设有一个吸气剂容器21,且任意相邻两个金属电极介质板24中,其中一个金属电极介质板24与所述高压交流电源23的高压输出接线端A相连,另一个金属电极介质板24与所述高压交流电源23的低压输出接线端B相连,并且所述高压交流电源23的低压输出接线端B同时与地线27连接。本实施例中,所述高压交流电源23为中频交流电源或射频电源,输出功率在10~1000瓦特。相邻两个金属电极介质板24与中间的吸气剂容器21距离相同,并且相邻两个金属电极介质板24具有相同的电位差,从而可以使相邻两个金属电极介质板24之间产生等离子体并与吸气剂反应。本实施例中,所述金属电极介质板24可以是镀金属薄膜的绝缘板,也可以是粘有金属材料的绝缘板。As shown in Figure 1, a getter container 21 is provided between any adjacent two metal electrode dielectric plates 24, and in any adjacent two metal electrode dielectric plates 24, one of the metal electrode dielectric plates 24 is connected to the The high-voltage output terminal A of the high-voltage
如图1所示,所述扩压器10为一端粗、另一端细的空心金属圆筒,且所述扩压器10的粗端与所述真空腔室1连接,所述扩压器10的细端通过气体管路11与供气系统连接。As shown in Figure 1, the
如图1所示,本实施例中,所述供气系统包括依次串联的供气气源13和质量流量计12,所述质量流量计12实时检测输入气体流速以便于系统控制,其为本领域公知技术。As shown in Figure 1, in this embodiment, the gas supply system includes a
如图1所示,本实施例中,所述抽真空系统包括真空泵16,且所述真空泵16与所述真空腔室1之间的管路上设有阀门15,所述抽真空系统可以使真空腔室1内部达到低气压真空水平。As shown in Figure 1, in the present embodiment, the vacuum pumping system includes a vacuum pump 16, and a valve 15 is arranged on the pipeline between the vacuum pump 16 and the vacuum chamber 1, and the vacuum pumping system can make a vacuum The interior of chamber 1 reaches a subatmospheric vacuum level.
如图1所示,本实施例中,所述气压采集系统包括依次串联的真空计17、真空计显示器18、数字信息采集卡19和电脑20,真空计17实时检测真空腔室1中的气压值并传输至真空计显示器18上显示读取,真空计显示器18经由数字信息采集卡19与电脑20连接,可由电脑20上的相应软件直接采集气压变化曲线。所述真空计17、真空计显示器18、数字信息采集卡19和电脑20均为本领域公知技术。As shown in Figure 1, in the present embodiment, the air pressure acquisition system includes a
本实施例中,所述密封件3可采用无氧铜密封圈、石墨密封圈、O型圈等元件,所述无氧铜、石墨等为耐高温材料,可满足使用要求。In this embodiment, the sealing member 3 can use oxygen-free copper sealing rings, graphite sealing rings, O-rings and other components, and the oxygen-free copper and graphite are high temperature resistant materials, which can meet the requirements of use.
本实施例中,各个法兰可采用不锈钢、铝、铁、铜及合金等金属材料制成。In this embodiment, each flange can be made of metal materials such as stainless steel, aluminum, iron, copper and alloys.
本实施例中,所述加热棒7为电加热棒或电加热管,其可为铁铬铝或镍铬等电热合金制成。In this embodiment, the heating rod 7 is an electric heating rod or an electric heating tube, which can be made of an electric heating alloy such as Fe-Cr-Al or Ni-Cr.
本发明的工作原理为:Working principle of the present invention is:
本发明工作时先通过抽真空系统抽取真空腔室1的气体,获得吸气剂工作时较低的气压环境,然后通过供气系统和扩压器10可在一定范围内适当调节工作气压、气体种类及流速,加热棒7开始对吸气剂容器12内的吸气剂材料进行加热激活吸气时,放电系统中的高压交流电源23向金属电极介质板24通电,任意相邻两个金属电极介质板24之间产生等离子体并与中间对应的吸气剂容器12中的吸气剂反应。本发明通过加热棒7的加热耦合能量,同时通过等离子体中产生的活性物种可加快整个装置中吸气剂的吸气速率。When the present invention works, the gas in the vacuum chamber 1 is first extracted through the vacuum system to obtain a lower air pressure environment when the getter works, and then the working air pressure and gas pressure can be properly adjusted within a certain range through the air supply system and the
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202111439143.9A CN116196910B (en) | 2021-11-30 | 2021-11-30 | Device for enhancing the adsorption rate of large volume getter by dielectric barrier discharge plasma |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202111439143.9A CN116196910B (en) | 2021-11-30 | 2021-11-30 | Device for enhancing the adsorption rate of large volume getter by dielectric barrier discharge plasma |
Publications (2)
Publication Number | Publication Date |
---|---|
CN116196910A true CN116196910A (en) | 2023-06-02 |
CN116196910B CN116196910B (en) | 2024-11-15 |
Family
ID=86508117
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202111439143.9A Active CN116196910B (en) | 2021-11-30 | 2021-11-30 | Device for enhancing the adsorption rate of large volume getter by dielectric barrier discharge plasma |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN116196910B (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080179741A1 (en) * | 2007-01-31 | 2008-07-31 | Christof Streck | Increasing reliability of copper-based metallization structures in a microstructure device by using aluminum nitride |
CN102938356A (en) * | 2012-10-23 | 2013-02-20 | 北京市北分仪器技术有限责任公司 | Vacuum maintaining system for vacuum device |
CN112569894A (en) * | 2019-09-30 | 2021-03-30 | 中国科学院大连化学物理研究所 | Device for activating large-volume getter and enhancing adsorption rate by radio frequency discharge plasma |
CN112584597A (en) * | 2019-09-30 | 2021-03-30 | 中国科学院大连化学物理研究所 | Device for activating large-volume getter and enhancing adsorption rate by heating and radio frequency discharge plasma |
-
2021
- 2021-11-30 CN CN202111439143.9A patent/CN116196910B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080179741A1 (en) * | 2007-01-31 | 2008-07-31 | Christof Streck | Increasing reliability of copper-based metallization structures in a microstructure device by using aluminum nitride |
CN102938356A (en) * | 2012-10-23 | 2013-02-20 | 北京市北分仪器技术有限责任公司 | Vacuum maintaining system for vacuum device |
CN112569894A (en) * | 2019-09-30 | 2021-03-30 | 中国科学院大连化学物理研究所 | Device for activating large-volume getter and enhancing adsorption rate by radio frequency discharge plasma |
CN112584597A (en) * | 2019-09-30 | 2021-03-30 | 中国科学院大连化学物理研究所 | Device for activating large-volume getter and enhancing adsorption rate by heating and radio frequency discharge plasma |
Non-Patent Citations (1)
Title |
---|
邹龙生: "等离子体应用于蒸发回收油田废水的技术", vol. 1, 31 October 2019, 天津科学技术出版社, pages: 65 * |
Also Published As
Publication number | Publication date |
---|---|
CN116196910B (en) | 2024-11-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103179772B (en) | Produce method and the special purpose device thereof of DC Atmospheric Pressure Glow Discharge | |
CN116196910A (en) | Device for Enhancing Adsorption Rate of Large Volume Getters by Dielectric Barrier Discharge Plasma | |
CN109112492A (en) | A kind of device suitable for more narrow thin pipe inner surface plated film | |
CN108131274B (en) | A vacuum pumping system | |
CN111246651A (en) | Device and method for generating large-scale plasma plume by utilizing spray gun array | |
CN100527287C (en) | Fully-sealed high vacuum electron beam accelerating and scanning integrated structure | |
CN105555001A (en) | Normal-voltage glow plasma device | |
CN209120524U (en) | Atmospheric pressure low-power consumption room-temperature plasma fluidic device based on impulse modulation radio frequency | |
CN112584597A (en) | Device for activating large-volume getter and enhancing adsorption rate by heating and radio frequency discharge plasma | |
CN114588738B (en) | Double-loop RF capacitively coupled discharge plasma-enhanced getter device | |
CN114588739B (en) | Cylindrical radio frequency inductively coupled discharge plasma enhanced getter device | |
CN107754572A (en) | A kind of microwave plasma industrial organic exhaust gas processing system | |
CN114615785B (en) | Double-plate RF capacitively coupled discharge plasma enhanced getter device | |
CN114597109A (en) | Planar RF Inductively Coupled Discharge Plasma Enhanced Getter Device | |
CN112569894B (en) | Device for activating large-volume getter and enhancing adsorption rate by radio frequency discharge plasma | |
CN204231738U (en) | Atmospheric low-temperature plasma glycerol polymerization continuous-flow type powder body material reforming apparatus | |
CN110013817A (en) | An atomic-level powder modification equipment | |
CN112584596B (en) | Device for enhancing adsorption rate of radio frequency discharge plasma | |
CN104302083B (en) | Streamlined powder material modification device for graft polymerization of low-temperature plasma under normal pressure | |
CN116371323A (en) | A low-temperature plasma disproportionation reaction unit, disproportionation reactor and disproportionation method | |
CN105170058B (en) | A kind of quick microwave plasma reaction unit for preparing material | |
CN101351075A (en) | Apparatus for processing plasma | |
CN104144553A (en) | A photoionized plasma generator | |
CN204305450U (en) | Atmospheric low-temperature plasma continuous-flow type powder body material reforming system | |
CN207654919U (en) | A kind of microwave plasma industrial organic exhaust gas processing system |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |