CN116065122A - Composite deuterium storage coating for neutron launch tube and preparation method thereof - Google Patents
Composite deuterium storage coating for neutron launch tube and preparation method thereof Download PDFInfo
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Abstract
Description
技术领域technical field
本发明涉及中子发生技术领域,具体涉及一种中子发射管用复合储氘涂层材料及其制备方法。The invention relates to the technical field of neutron generation, in particular to a composite deuterium storage coating material for a neutron emission tube and a preparation method thereof.
背景技术Background technique
中子发射管是一种小型加速器中子源,其作用是将离子源、靶和气压调节系统全部密封在陶瓷管内,构成结构简单紧凑、使用方便的电真空器件。氘靶作为中子发射管和中子发生器的关键部件,要求氘靶具有很高的储氘能力,由于中子管工作中会受到大束流氘离子的轰击,靶膜表面温度随之升高,还要求靶膜具有较高的热稳定性。此外,靶膜的结合强度、抗氢脆性能、抗氧化性能都是影响氘靶质量的关键因素。The neutron emission tube is a small accelerator neutron source. Its function is to seal the ion source, target and air pressure adjustment system in a ceramic tube, forming an electric vacuum device with a simple and compact structure and easy to use. The deuterium target, as a key component of the neutron emission tube and neutron generator, requires the deuterium target to have a high deuterium storage capacity. Since the neutron tube will be bombarded by a large beam of deuterium ions during operation, the surface temperature of the target film will increase accordingly. , also requires the target film to have high thermal stability. In addition, the binding strength, anti-hydrogen embrittlement performance, and anti-oxidation performance of the target film are all key factors affecting the quality of the deuterium target.
国内外中子发射管、中子发生器的中子源大多采用钼、钨、铜等金属作为衬底,表面镀钛、锆、钪等元素作为吸氘薄膜材料。研究表明,钛作为目前吸氢密度最高的金属材料之一,具有价格便宜,钛膜制备工艺简单,并且吸氘稳定性的特点,普遍被用作中子管、中子发生器氘靶的吸氘膜材料,可以吸入高浓度的氘和氢同位素氚,同时可以在金属衬底上形成薄膜,适宜的钛层厚度能够保证其表面温度足够低,从而保持靶内活性总量不变。但纯钛膜作为吸氘薄膜也存在一些缺陷:1、钛膜极易被O和C等元素污染,在表面形成一层碳化物或氧化物膜层,从而影响薄膜的吸放氘性能;2、纯钛膜吸氢之后会出现特有的氢脆现象,使得材料力学性能恶化,导致靶膜粉化或整块脱落,造成中子管的高压击穿;3、纯钛膜不能达到较高的氘钛比,中子产额较低。如Huang WC等公开了一种磁控共溅射制备的Mg/Nb储氢复合薄膜的方法,其后续需要在较高的温度和氢分压下才能完成吸氢过程,虽能够储氢但未解决氢脆粉化和吸氢率低的问题。CN106544628A发明中提出了一种制备含氘金属薄膜的方法,在溅射沉积过程中通入高纯氘气直接形成含氘金属薄膜,能够有效避免纯金属薄膜吸氘出现的氢脆、掉粉等问题,但其却未能解决储氘薄膜表面易形成氧化物而影响中子产额的问题。The neutron sources of neutron emission tubes and neutron generators at home and abroad mostly use molybdenum, tungsten, copper and other metals as the substrate, and the surface is plated with titanium, zirconium, scandium and other elements as the deuterium-absorbing film material. Studies have shown that titanium, as one of the metal materials with the highest hydrogen absorption density at present, has the characteristics of cheap price, simple preparation process of titanium film, and stable deuterium absorption. The deuterium film material can absorb high concentrations of deuterium and hydrogen isotope tritium, and can form a thin film on the metal substrate at the same time. The appropriate thickness of the titanium layer can ensure that the surface temperature is low enough to keep the total activity in the target unchanged. However, pure titanium film also has some defects as a deuterium-absorbing film: 1. The titanium film is easily polluted by elements such as O and C, and a layer of carbide or oxide film is formed on the surface, thereby affecting the deuterium absorption and release performance of the film; 2. 1. After the pure titanium film absorbs hydrogen, there will be a unique hydrogen embrittlement phenomenon, which will deteriorate the mechanical properties of the material, cause the target film to pulverize or fall off in one piece, and cause the high-voltage breakdown of the neutron tube; 3. The pure titanium film cannot reach a higher The ratio of deuterium to titanium has a lower neutron yield. For example, Huang WC et al. disclosed a method of Mg/Nb hydrogen storage composite film prepared by magnetron co-sputtering. Its follow-up requires a higher temperature and hydrogen partial pressure to complete the hydrogen absorption process. Although it can store hydrogen, it cannot Solve the problems of hydrogen embrittlement pulverization and low hydrogen absorption rate. In the invention of CN106544628A, a method for preparing a deuterium-containing metal film is proposed. During the sputtering deposition process, high-purity deuterium gas is introduced to directly form a deuterium-containing metal film, which can effectively avoid the hydrogen embrittlement and powder drop that occur when the pure metal film absorbs deuterium. However, it fails to solve the problem that oxides are easily formed on the surface of the deuterium storage film and affect the neutron yield.
发明内容Contents of the invention
本发明的目的是提供一种中子发射管用复合储氘涂层材料及其制备方法,通过采用反应磁控溅射方法,在基材表面上沉积金属过渡层来进一步增强涂层与基底间结合强度。在金属过渡层表面沉积制备金属氘化物薄膜,通过控制溅射过程中通入氘气的百分比来调控沉积涂层中的储氘量,在满足较高储氘密度与良好热稳定性的前提下,提高涂层抗氢脆和储氘性能,最后在储氘薄膜表面沉积保护层,来提升储氘复合薄膜的抗氧化和抗碳化性能。The object of the present invention is to provide a composite deuterium storage coating material for neutron emission tubes and a preparation method thereof. By adopting the reactive magnetron sputtering method, a metal transition layer is deposited on the surface of the substrate to further enhance the bonding between the coating and the substrate strength. Deposition and preparation of metal deuteride films on the surface of the metal transition layer, the amount of deuterium storage in the deposited coating is regulated by controlling the percentage of deuterium gas introduced during the sputtering process, under the premise of satisfying the high deuterium storage density and good thermal stability , improve the anti-hydrogen embrittlement and deuterium storage performance of the coating, and finally deposit a protective layer on the surface of the deuterium storage film to improve the anti-oxidation and anti-carbonization performance of the deuterium storage composite film.
为解决上述技术问题,本发明提供一种中子发射管用复合储氘涂层材料,其包括金属过渡层、MDx储氘层和保护层。In order to solve the above technical problems, the present invention provides a composite deuterium storage coating material for a neutron launch tube, which includes a metal transition layer, an MD x deuterium storage layer and a protective layer.
本发明还提供一种中子发射管,其包括基体、依次附着在基体上的金属过渡层、MDx储氘层和保护层。The invention also provides a neutron emission tube, which includes a base body, a metal transition layer attached to the base body in sequence, an MD x deuterium storage layer and a protective layer.
其中,所述基体采用高导热系数的金属。Wherein, the base body adopts metal with high thermal conductivity.
其中,所述MDx中的M为Mg、Ti、Ni、La、Co、Zr、Hf、Al中的一种或者多种合金。Wherein, M in the MDx is one or more alloys of Mg, Ti, Ni, La, Co, Zr, Hf, Al.
其中,所述MDx储氘层中的x值指代氘与钛的原子比,为0.5~2.5。Wherein, the x value in the MD x deuterium storage layer refers to the atomic ratio of deuterium to titanium, which is 0.5-2.5.
其中,所述金属过渡层、MDx储氘层和保护层的总厚度不超过30μm。Wherein, the total thickness of the metal transition layer, MD x deuterium storage layer and protective layer is not more than 30 μm.
其中,所述的金属过渡层厚度不超过5.0μm。Wherein, the thickness of the metal transition layer is not more than 5.0 μm.
其中,所述MDx储氘层厚度不超过20μm。Wherein, the thickness of the MD x deuterium storage layer is not more than 20 μm.
其中,所述表面保护层为钯或钯合金,厚度为0.1~5.0μm。Wherein, the surface protection layer is palladium or palladium alloy, with a thickness of 0.1-5.0 μm.
本发明还提供上述中子发射管用复合储氘涂层材料的制备方法,其包括:The present invention also provides a preparation method for the composite deuterium storage coating material for the neutron launch tube, which includes:
第一步,将基体表面抛光至粗糙度Ra<0.8μm,超声清洗并烘干后得到表面光洁平整的基体材料试样;In the first step, the surface of the substrate is polished to a roughness of Ra<0.8 μm, ultrasonically cleaned and dried to obtain a substrate material sample with a smooth and flat surface;
第二步,在基体表面以气相沉积方法沉积制备金属过渡层;The second step is to prepare a metal transition layer by vapor deposition on the surface of the substrate;
第三步,在金属过渡层上以气相沉积方法沉积制备MDx储氘涂层;In the third step, the MDx deuterium storage coating is prepared by vapor deposition on the metal transition layer;
第四步,在MDx储氘涂层上以气相沉积方法沉积制备保护层。The fourth step is to prepare a protective layer by vapor deposition on the MDx deuterium storage coating.
所述气相沉积方法为物理气相沉积法。The vapor deposition method is a physical vapor deposition method.
所述物理气相沉积法可以选择,电子束蒸发镀膜、磁控溅射镀膜、电弧等离子体镀膜、离子镀膜及分子束外延镀膜等。The physical vapor deposition method can be selected from electron beam evaporation coating, magnetron sputtering coating, arc plasma coating, ion coating and molecular beam epitaxy coating.
本发明的有益效果Beneficial effects of the present invention
(1)本发明的中子发射管用复合储氘涂层,由金属过渡内层、MDx储氘涂层和保护外层构成。内层是金属过渡层,因其溅射形成的薄膜晶粒较为致密,与基体结合力好,能使较为疏松的TiDx层与基体有较好的连接,另外金属层还可以吸收沉积过程中未完全反应的氘气;MDx储氘涂层具有组分可控、平衡压力低、储氘量高的优点;此外,外层保护层可有效避免因储氘层的氧化和碳化而导致中子产额降低的问题。(2)本发明提供的中子发射管储氘用MDx涂层的制备方法是一种物理气相沉积工艺。本发明制备方法简单、可靠,可以以一种金属化合物的形式储存氘,所制备的薄膜厚度小、重量轻且能与基体有良好的结合力。(1) The composite deuterium storage coating for a neutron launch tube of the present invention is composed of a metal transition inner layer, an MDx deuterium storage coating and a protective outer layer. The inner layer is a metal transition layer, because the thin film grains formed by sputtering are relatively dense and have good bonding force with the substrate, which can make the relatively loose TiDx layer and the substrate have a better connection. Fully reacted deuterium gas; MDx deuterium storage coating has the advantages of controllable composition, low equilibrium pressure, and high deuterium storage capacity; in addition, the outer protective layer can effectively avoid neutron production due to oxidation and carbonization of the deuterium storage layer. The problem of lowering the amount. (2) The preparation method of the MDx coating for deuterium storage in neutron emission tubes provided by the present invention is a physical vapor deposition process. The preparation method of the invention is simple and reliable, can store deuterium in the form of a metal compound, and the prepared thin film has small thickness, light weight and good binding force with the matrix.
本发明的金属过渡内层、MDx储氘涂层和保护外层构成的复合涂层制备在金属结构材料表面。通过物理气相沉积过程中通入氘气的百分比来调控沉积涂层中的储氘量。在满足较高储氘密度与良好热稳定性的前提下,进一步增强涂层与基底间结合强度,提高涂层抗氢脆与抗氧化性能。复合涂层由结构结构材料基体、金属过渡层、MDx储氘层和保护层依次布设。复合涂层由物理气相沉积法进行制备,涂层总厚度不超过30μm。涂层制备工艺简单,成本低廉,且采用一种金属化合物储氘的形式,具有空气稳定性好、平衡压力低、储氘量高的优点,在600℃高温测试下,其储氘量可达7.9wt%。The composite coating composed of the metal transition inner layer, the MDx deuterium storage coating and the protective outer layer is prepared on the surface of the metal structural material. The amount of deuterium stored in the deposited coating is regulated by the percentage of deuterium gas introduced during the physical vapor deposition process. Under the premise of satisfying high deuterium storage density and good thermal stability, the bonding strength between the coating and the substrate is further enhanced, and the anti-hydrogen embrittlement and anti-oxidation properties of the coating are improved. The composite coating consists of a structural material matrix, a metal transition layer, an MDx deuterium storage layer and a protective layer in sequence. The composite coating is prepared by physical vapor deposition, and the total thickness of the coating does not exceed 30 μm. The coating preparation process is simple, the cost is low, and a metal compound is used to store deuterium, which has the advantages of good air stability, low equilibrium pressure, and high deuterium storage capacity. Under the high temperature test at 600°C, the deuterium storage capacity can reach 7.9 wt%.
附图说明Description of drawings
图1为本发明中子发射管用TiDx复合储氘涂层的结构布设图;Fig. 1 is the structural layout drawing of TiDx composite deuterium storage coating for neutron launch tube of the present invention;
图2为本发明中子发射管用TiDx复合储氘涂层的截面SEM图;Fig. 2 is the cross-sectional SEM figure of TiDx composite deuterium storage coating for neutron launch tube of the present invention;
图3为本发明中子发射管用TiDx复合储氘涂层XRD图谱。Fig. 3 is the XRD spectrum of the TiDx composite deuterium storage coating for the neutron emission tube of the present invention.
具体实施方式Detailed ways
本发明提供一种中子发射管用复合储氘涂层材料,其包括金属过渡层、MDx储氘层和保护层。The invention provides a composite deuterium storage coating material for a neutron launch tube, which comprises a metal transition layer, an MD x deuterium storage layer and a protective layer.
本发明还提供一种中子发射管,其包括基体、依次附着在基体上的金属过渡层、MDx储氘层和保护层。The invention also provides a neutron emission tube, which includes a base body, a metal transition layer attached to the base body in sequence, an MD x deuterium storage layer and a protective layer.
所述基体采用高导热系数的金属,优选为无氧铜、紫铜、钨、不锈钢中的一种或多种复合。The base is made of metal with high thermal conductivity, preferably one or more composites of oxygen-free copper, red copper, tungsten, and stainless steel.
所述金属过渡层为Mg、Ti、Ni、La、Co、Zr、Hf、Al中的一种或多种合金。The metal transition layer is one or more alloys of Mg, Ti, Ni, La, Co, Zr, Hf, Al.
所述MDx中的M为Mg、Ti、Ni、La、Co、Zr、Hf、Al中的一种或者多种合金,优选为Ti。M in the MDx is one or more alloys of Mg, Ti, Ni, La, Co, Zr, Hf, Al, preferably Ti.
所述MDx储氘层中的x值指代氘与钛的原子比,优选为0.5~2.5。The x value in the MD x deuterium storage layer refers to the atomic ratio of deuterium to titanium, preferably 0.5-2.5.
所述金属过渡层、MDx储氘层和保护层的总厚度不超过30μm,更优选为0.3~30μm。The total thickness of the metal transition layer, MD x deuterium storage layer and protective layer is not more than 30 μm, more preferably 0.3-30 μm.
所述的金属过渡层厚度不超过5.0μm,更优选为0.1~5.0μm。The thickness of the metal transition layer is no more than 5.0 μm, more preferably 0.1-5.0 μm.
所述MDx储氘层厚度不超过20μm,更优选为0.1~20μm。The thickness of the MD x deuterium storage layer is no more than 20 μm, more preferably 0.1-20 μm.
所述表面保护层为进一步地,所述表面保护层是钯或钯合金,厚度为0.1~5.0μm。The surface protection layer is further, the surface protection layer is palladium or a palladium alloy with a thickness of 0.1-5.0 μm.
本发明还提供上述中子发射管用复合储氘涂层材料的制备方法,其包括:The present invention also provides a preparation method for the composite deuterium storage coating material for the neutron launch tube, which includes:
第一步,将基体表面抛光至粗糙度Ra<0.8μm,超声清洗并烘干后得到表面光洁平整的基体材料试样;In the first step, the surface of the substrate is polished to a roughness of Ra<0.8 μm, ultrasonically cleaned and dried to obtain a substrate material sample with a smooth and flat surface;
第二步,在基体表面以气相沉积方法沉积制备金属过渡层;The second step is to prepare a metal transition layer by vapor deposition on the surface of the substrate;
第三步,在金属过渡层上以气相沉积方法沉积制备MDx储氘涂层;In the third step, the MDx deuterium storage coating is prepared by vapor deposition on the metal transition layer;
第四步,在MDx储氘涂层上以气相沉积方法沉积制备保护层。The fourth step is to prepare a protective layer by vapor deposition on the MDx deuterium storage coating.
所述气相沉积方法为物理气相沉积法。The vapor deposition method is a physical vapor deposition method.
所述物理气相沉积法可以选择,电子束蒸发镀膜、磁控溅射镀膜、电弧等离子体镀膜、离子镀膜及分子束外延镀膜等。The physical vapor deposition method can be selected from electron beam evaporation coating, magnetron sputtering coating, arc plasma coating, ion coating and molecular beam epitaxy coating.
以下采用实施例及附图来详细说明本发明的实施方式,借此对本发明如何应用技术手段来解决技术问题,并达成技术效果的实现过程能充分理解并据以实施。The implementation of the present invention will be described in detail below with examples and accompanying drawings, so as to fully understand and implement the process of how to apply technical means to solve technical problems and achieve technical effects in the present invention.
实施例1Example 1
一种中子发射管用复合储氘涂层的制备方法,包括以下步骤:A preparation method for a composite deuterium storage coating for a neutron launch tube, comprising the following steps:
(1)选用无氧铜作为基体材料,将基体材料单面抛光至粗糙度为0.1~2.0μm,采用直径为100mm的纯钛(Ti)靶进行溅射;(1) Select oxygen-free copper as the base material, polish the base material on one side to a roughness of 0.1-2.0 μm, and use a pure titanium (Ti) target with a diameter of 100 mm for sputtering;
(2)采用机械泵、分子泵依次对磁控溅射室进行抽真空操作,直至真空度达到2.0×10-4Pa;(2) Use a mechanical pump and a molecular pump to vacuumize the magnetron sputtering chamber in sequence until the vacuum degree reaches 2.0×10 -4 Pa;
(3)通入工作气体Ar气,控制进气流量为20sccm,调整溅射气压为0.8Pa,溅射功率为200W,靶基距为80mm,经20min溅射沉积获得0.2μm厚度的纯Ti过渡层;(3) Introduce the working gas Ar gas, control the intake flow rate to 20sccm, adjust the sputtering pressure to 0.8Pa, the sputtering power to 200W, the target base distance to 80mm, and obtain a pure Ti transition with a thickness of 0.2μm after 20min sputtering deposition layer;
(4)采用直径为100mm的纯钛(Ti)靶在纯Ti过渡层上采用反应射频溅射法沉积制备TiDx储氘涂层;(4) A pure titanium (Ti) target with a diameter of 100 mm is used to deposit and prepare a TiD x deuterium storage coating on the pure Ti transition layer by reactive radio frequency sputtering;
(5)通入工作气体Ar气和反应气体D2的混合气体,其中Ar:D2=20:1sccm,调整涂层沉积压力为0.8Pa,溅射功率为200W,靶基距为80mm,经2h的反应射频磁控溅射法沉积制备1.0μm厚的TiDx储氘涂层。(5) Introduce the mixed gas of working gas Ar gas and reaction gas D 2 , where Ar:D 2 =20:1sccm, adjust the coating deposition pressure to 0.8Pa, sputtering power to 200W, and target base distance to 80mm. A 1.0 μm thick TiD x deuterium storage coating was deposited by reactive radio frequency magnetron sputtering for 2 hours.
(6)采用直径为100mm的纯钯(Pd)靶在TiDx储氘涂层上采用射频溅射法沉积制备Pd保护涂层;(6) Adopting a pure palladium (Pd) target with a diameter of 100 mm on the TiD x deuterium storage coating is deposited by radio frequency sputtering to prepare a Pd protective coating;
(7)通入工作气体Ar气,控制进气流量为20sccm,调整溅射气压为0.8Pa,溅射功率为150W,靶基距为80mm,经30min溅射沉积获得0.2μm厚度的纯Pd保护层,最终得到厚度为1.4μm的Ti/TiDx/Pd储氘复合涂层,其结构布设图如1所示。(7) Introduce the working gas Ar gas, control the intake flow rate to 20sccm, adjust the sputtering pressure to 0.8Pa, the sputtering power to 150W, the target base distance to 80mm, and obtain a pure Pd protection with a thickness of 0.2μm after 30min sputtering deposition layer, and finally a Ti/TiD x /Pd deuterium storage composite coating with a thickness of 1.4 μm is obtained, and its structural layout is shown in Figure 1.
对实施例1制备得到的复合涂层进行钛氘比和储氘量测试,测试结果表明,涂层与基体结合力为23N,结合力良好,且TiDx储氘涂层的钛氘比为Ti:D=1:1,总储氘量约为4.3wt%。The composite coating prepared in Example 1 is tested for titanium-deuterium ratio and deuterium storage capacity. The test results show that the bonding force between the coating and the substrate is 23N, and the bonding force is good, and the TiD x deuterium storage coating has a titanium-deuterium ratio of Ti :D=1:1, the total deuterium storage capacity is about 4.3wt%.
实施例2Example 2
一种中子发射管用复合储氘涂层的制备方法,包括以下步骤:A preparation method for a composite deuterium storage coating for a neutron launch tube, comprising the following steps:
(1)选用无氧铜作为基体材料,将基体材料单面抛光至粗糙度为0.1~2.0μm,采用直径为100mm的纯钛(Ti)靶进行溅射;(1) Select oxygen-free copper as the base material, polish the base material on one side to a roughness of 0.1-2.0 μm, and use a pure titanium (Ti) target with a diameter of 100 mm for sputtering;
(2)采用机械泵、分子泵依次对磁控溅射室进行抽真空操作,直至真空度达到2.0×10-4Pa;(2) Use a mechanical pump and a molecular pump to vacuumize the magnetron sputtering chamber in sequence until the vacuum degree reaches 2.0×10 -4 Pa;
(3)通入工作气体Ar气,控制进气流量为20sccm,调整溅射气压为0.8Pa,溅射功率为200W,靶基距为80mm,经20min溅射沉积获得0.2μm厚度的纯Ti过渡层;(3) Introduce the working gas Ar gas, control the intake flow rate to 20sccm, adjust the sputtering pressure to 0.8Pa, the sputtering power to 200W, the target base distance to 80mm, and obtain a pure Ti transition with a thickness of 0.2μm after 20min sputtering deposition layer;
(4)采用直径为100mm的纯钛(Ti)靶在纯Ti过渡层上采用反应射频溅射法沉积制备TiDx储氘涂层;(4) A pure titanium (Ti) target with a diameter of 100 mm is used to deposit and prepare a TiD x deuterium storage coating on the pure Ti transition layer by reactive radio frequency sputtering;
(5)通入工作气体Ar气和反应气体D2的混合气体,其中Ar:D2=20:5sccm,调整涂层沉积压力为0.8Pa,溅射功率为200W,靶基距为80mm,经2h的反应射频磁控溅射法沉积制备1.1μm厚的TiDx储氘涂层。(5) Introduce the mixed gas of working gas Ar gas and reaction gas D 2 , where Ar:D 2 =20:5sccm, adjust the coating deposition pressure to 0.8Pa, sputtering power to 200W, and target base distance to 80mm. A 1.1 μm thick TiD x deuterium storage coating was deposited by reactive radio frequency magnetron sputtering for 2h.
(6)采用直径为100mm的纯钯(Pd)靶在TiDx储氘涂层上采用射频溅射法沉积制备Pd保护涂层;(6) Adopting a pure palladium (Pd) target with a diameter of 100 mm on the TiD x deuterium storage coating is deposited by radio frequency sputtering to prepare a Pd protective coating;
(7)通入工作气体Ar气,控制进气流量为20sccm,调整溅射气压为0.8Pa,溅射功率为150W,靶基距为80mm,经20min溅射沉积获得0.2μm厚度的纯Pd保护层,最终得到厚度为1.5μm的Ti/TiDx/Pd储氘复合涂层,其结构布设图如1所示。(7) Introduce the working gas Ar gas, control the intake flow rate to 20sccm, adjust the sputtering pressure to 0.8Pa, the sputtering power to 150W, the target base distance to 80mm, and obtain a pure Pd protection with a thickness of 0.2μm after 20min sputtering deposition layer, and finally a Ti/TiD x /Pd deuterium storage composite coating with a thickness of 1.5 μm is obtained, and its structural layout is shown in Figure 1.
对实施例2制备得到的复合涂层进行钛氘比和储氘量测试,测试结果表明,涂层与基体结合力为22N,结合力良好,且TiDx储氘涂层的钛氘比为Ti:D=1:1.5,总储氘量约为5.7wt%。The composite coating prepared in Example 2 is tested for titanium-deuterium ratio and deuterium storage capacity. The test results show that the bonding force between the coating and the substrate is 22N, and the bonding force is good, and the TiD x deuterium storage coating has a titanium-deuterium ratio of Ti :D=1:1.5, the total deuterium storage capacity is about 5.7wt%.
实施例3Example 3
一种中子发射管用复合储氘涂层的制备方法,包括以下步骤:A preparation method for a composite deuterium storage coating for a neutron launch tube, comprising the following steps:
(1)选用无氧铜作为基体材料,将基体材料单面抛光至粗糙度为0.1~2.0μm,采用直径为100mm的纯镁(Mg)靶进行溅射;(1) Select oxygen-free copper as the base material, polish the base material on one side to a roughness of 0.1-2.0 μm, and use a pure magnesium (Mg) target with a diameter of 100 mm for sputtering;
(2)采用机械泵、分子泵依次对磁控溅射室进行抽真空操作,直至真空度达到2.0×10-4Pa;(2) Use a mechanical pump and a molecular pump to vacuumize the magnetron sputtering chamber in sequence until the vacuum degree reaches 2.0×10 -4 Pa;
(3)通入工作气体Ar气,控制进气流量为20sccm,调整溅射气压为0.8Pa,溅射功率为200W,靶基距为80mm,经1h溅射沉积获得0.8μm厚度的纯Ti过渡层;(3) Introduce the working gas Ar gas, control the intake flow rate to 20sccm, adjust the sputtering pressure to 0.8Pa, the sputtering power to 200W, the target base distance to 80mm, and obtain a pure Ti transition with a thickness of 0.8μm after 1h sputtering deposition layer;
(4)采用直径为100mm的纯镁(Mg)靶在纯Mg过渡层上采用反应射频溅射法沉积制备MgDx储氘涂层;(4) Adopting a pure magnesium (Mg) target with a diameter of 100mm on the pure Mg transition layer adopts reactive radio frequency sputtering method to deposit and prepare MgD x deuterium storage coating;
(5)通入工作气体Ar气和反应气体D2的混合气体,其中Ar:D2=20:8sccm,调整涂层沉积压力为0.8Pa,溅射功率为200W,靶基距为80mm,经6h的反应射频磁控溅射法沉积制备4.2μm厚的MgDx储氘涂层。(5) Introduce the mixed gas of working gas Ar gas and reaction gas D 2 , where Ar:D 2 =20:8sccm, adjust the coating deposition pressure to 0.8Pa, sputtering power to 200W, and target base distance to 80mm. The 4.2μm thick MgD x deuterium storage coating was deposited by reactive radio frequency magnetron sputtering for 6h.
(6)采用直径为100mm的钯铜合金靶在MgDx储氘涂层上采用射频溅射法沉积制备PdCu合金保护涂层;(6) Adopting a palladium-copper alloy target with a diameter of 100mm on the MgD x deuterium storage coating adopts radio frequency sputtering deposition to prepare a PdCu alloy protective coating;
(7)通入工作气体Ar气,控制进气流量为20sccm,调整溅射气压为0.8Pa,溅射功率为150W,靶基距为80mm,经20min溅射沉积获得0.3μm厚度的PdCu合金保护层,最终得到厚度为5.3μm的Mg/MgDx/PdCu储氘复合涂层,其结构布设图如1所示。(7) Introduce the working gas Ar gas, control the intake flow rate to 20sccm, adjust the sputtering pressure to 0.8Pa, the sputtering power to 150W, the target base distance to 80mm, and obtain a PdCu alloy protection with a thickness of 0.3μm after 20min sputtering deposition layer, and finally a Mg/MgD x /PdCu deuterium storage composite coating with a thickness of 5.3 μm is obtained, and its structural layout is shown in Figure 1.
对实施例3制备得到的复合涂层进行镁氘比和储氘量测试,测试结果表明,涂层与基体结合力为26N,结合力良好,且MgDx储氘涂层的金属氘比为Mg:D=1:2.0,总储氘量约为7.9wt%。The composite coating prepared in Example 3 is tested for the ratio of magnesium to deuterium and the amount of stored deuterium. The test results show that the bonding force between the coating and the substrate is 26N, and the bonding force is good, and the metal deuterium ratio of the MgD × deuterium storage coating is Mg :D=1:2.0, the total deuterium storage capacity is about 7.9wt%.
实施例4Example 4
一种中子发射管用复合储氘涂层的制备方法,包括以下步骤:A preparation method for a composite deuterium storage coating for a neutron launch tube, comprising the following steps:
(1)选用无氧铜作为基体材料,将基体材料单面抛光至粗糙度为0.1~2.0μm,依次用丙酮、乙醇和去离子水超声清洗后备用;(1) Use oxygen-free copper as the base material, polish the base material on one side to a roughness of 0.1-2.0 μm, and then use acetone, ethanol and deionized water to ultrasonically clean it before use;
(2)采用机械泵、分子泵依次对蒸发镀膜室进行抽真空操作,直至真空度达到2.0×10-4Pa;(2) Use a mechanical pump and a molecular pump to vacuumize the evaporation coating chamber in sequence until the vacuum degree reaches 2.0×10 -4 Pa;
(3)采用粒径为3-5mm的纯Ti颗粒作为蒸发源在基底上沉积制备纯Ti过渡层。(3) Pure Ti particles with a particle size of 3-5 mm are used as an evaporation source to deposit a pure Ti transition layer on the substrate.
(4)将基底放置在样品台中央,调节基板中央与钨舟的距离d=12~18cm。打开电子束电源,缓慢调节电子束电流至70mA,打开挡板进行蒸发沉积镀膜,经20min蒸发沉积获得0.15μm厚度的纯Ti过渡层;(4) Place the substrate on the center of the sample stage, and adjust the distance between the center of the substrate and the tungsten boat d=12-18cm. Turn on the electron beam power supply, slowly adjust the electron beam current to 70mA, open the baffle for evaporation deposition coating, and obtain a pure Ti transition layer with a thickness of 0.15 μm after 20 minutes of evaporation deposition;
(5)采用粒径为3-5mm的纯Ti颗粒作为蒸发源在纯Ti过渡层上采用反应蒸发镀法沉积制备TiDx储氘涂层;(5) Adopting pure Ti particles with a particle diameter of 3-5 mm as an evaporation source on the pure Ti transition layer by reactive evaporation plating to prepare TiD x deuterium storage coating;
(6)通入反应气体D2,控制氘气的流量为10sccm。打开电子束电源,缓慢调节电子束电流至70mA,打开挡板进行蒸发沉积镀膜,经60min反应蒸发沉积获得0.5μm厚度的TiDx储氘涂层;(6) The reaction gas D 2 is introduced, and the flow rate of the deuterium gas is controlled to be 10 sccm. Turn on the electron beam power supply, slowly adjust the electron beam current to 70mA, open the baffle plate for evaporative deposition coating, and obtain a TiD x deuterium storage coating with a thickness of 0.5 μm by evaporative deposition after 60 minutes of reaction;
(7)采用粒径为3-5mm的纯Pd颗粒作为蒸发源在TiDx储氘涂层上蒸发镀法沉积制备Pd保护涂层;(7) adopting pure Pd particles with a particle diameter of 3-5 mm as an evaporation source to prepare a Pd protective coating by evaporation deposition on the TiD x deuterium storage coating;
(8)打开电子束电源,缓慢调节电子束电流至80mA,打开挡板进行蒸发沉积镀膜,经20min蒸发沉积获得0.2μm厚度的纯Pd过渡层。最终得到厚度为0.85μm的Ti/TiDx/Pd储氘复合涂层,其结构布设图如1所示。(8) Turn on the electron beam power supply, slowly adjust the electron beam current to 80mA, open the baffle for evaporation deposition coating, and obtain a pure Pd transition layer with a thickness of 0.2 μm after 20 minutes of evaporation deposition. Finally, a Ti/TiD x /Pd deuterium storage composite coating with a thickness of 0.85 μm is obtained, and its structural layout is shown in Figure 1 .
对实施例4制备得到的复合涂层进行钛氘比和储氘量测试,测试结果表明,涂层与基体结合力为16N,结合力良好,且TiDx复合储氘涂层的钛氘比为Ti:D=1:1.7,总储氘量约为5.5wt%。The composite coating that embodiment 4 prepares is carried out titanium-deuterium ratio and storage deuterium amount test, and test result shows, coating and substrate binding force is 16N, and binding force is good, and the titanium-deuterium ratio of TiD x composite deuterium storage coating is Ti:D=1:1.7, the total deuterium storage capacity is about 5.5wt%.
所有上述的首要实施这一知识产权,并没有设定限制其他形式的实施这种新产品和/或新方法。本领域技术人员将利用这一重要信息,上述内容修改,以实现类似的执行情况。但是,所有修改或改造基于本发明新产品属于保留的权利。All of the above-mentioned primary implementations of this intellectual property rights are not intended to limit other forms of implementations of this new product and/or new method. Those skilled in the art will, with this important information, modify the above to achieve a similar implementation. However, all modifications or alterations to the new product based on the present invention belong to reserved rights.
以上所述,仅是本发明的较佳实施例而已,并非是对本发明作其它形式的限制,任何熟悉本专业的技术人员可能利用上述揭示的技术内容加以变更或改型为等同变化的等效实施例。但是凡是未脱离本发明技术方案内容,依据本发明的技术实质对以上实施例所作的任何简单修改、等同变化与改型,仍属于本发明技术方案的保护范围。The above is only a preferred embodiment of the present invention, and is not intended to limit the present invention to other forms. Any skilled person who is familiar with this profession may use the technical content disclosed above to change or modify the equivalent of equivalent changes. Example. However, any simple modifications, equivalent changes and modifications made to the above embodiments according to the technical essence of the present invention without departing from the content of the technical solution of the present invention still belong to the protection scope of the technical solution of the present invention.
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