CN115966994A - Gas control method of laser and laser - Google Patents
Gas control method of laser and laser Download PDFInfo
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- CN115966994A CN115966994A CN202111188144.0A CN202111188144A CN115966994A CN 115966994 A CN115966994 A CN 115966994A CN 202111188144 A CN202111188144 A CN 202111188144A CN 115966994 A CN115966994 A CN 115966994A
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Abstract
The embodiment of the application provides a gas control method of a laser and the laser. In the embodiment of the application, in the process of emitting light by normal discharge of the laser, the light-emitting voltage of the laser and the discharge energy variation of the laser are obtained; and determining whether to inject working gas into a cavity of the laser according to the light-emitting voltage and/or the discharge energy variation. Therefore, the gas supplement of the laser is controlled by determining whether the gas injection is carried out or not, so that the laser can discharge in a relatively stable state for a long time and delay the discharge time. The laser maintains stable performance for a long time, production efficiency is improved, and cost is saved.
Description
Technical Field
The invention relates to the field of control, in particular to a gas control method of a laser and the laser.
Background
The excimer laser is a pulsed gas laser with wavelength in ultraviolet band, whose working substance is made of inert gas (neon, argon, krypton, xenon, etc.) and halogen element (fluorine, chlorine, bromine, etc.), and when it is in ground state, it is formed into two atomic gas mixed state, and when it is excited to high energy level by short pulse current, it can be formed into compound, and every molecule of the compound is formed into excimer state by that two gases respectively contribute one atom. Ultraviolet laser light is radiated when electrons transition from a high energy level to a low energy level.
The lithography machine has a severe requirement for the deep ultraviolet pulse laser emitted by the light source. The deep ultraviolet laser emitted by an excimer laser is required to have narrow line width, large energy, high repetition frequency, stable wavelength and stable dosage stability. During the discharge process of the light source, the gas degradation can generate single pulse energy fluctuation, average pulse energy drift and single pulse energy overshoot, which all affect the stability of each index of the laser.
Disclosure of Invention
The technical problem to be solved by the present invention is to overcome the deficiencies of the prior art, and provide a gas control method for a laser and a laser, which are used for controlling the laser to supplement working gas, so as to ensure long-time stable operation of the laser.
In order to achieve the above technical object, in one aspect, the present invention provides a gas control method for a laser, including: acquiring the light emitting voltage of the laser and the discharge energy variation of the laser in the light emitting process of the normal discharge of the laser; and determining whether to inject working gas in the cavity of the laser according to the light-emitting voltage and/or the discharge energy variation.
Specifically, obtaining the light-emitting voltage of the laser and the discharge energy variation of the laser includes: collecting the discharge voltage of a power supply module of the laser as the emergent light voltage; and collecting the discharge voltage variation and the energy variation of the laser, and determining the discharge energy variation according to the discharge voltage variation and the energy variation.
Specifically, determining whether to inject working gas into the cavity of the laser according to the light extraction voltage includes: determining a voltage difference value according to the collected discharge voltage and a voltage threshold value, and performing low-pass filtering on the voltage difference value; and determining whether the low-pass filtering result is larger than zero, if so, quickly injecting working gas into the cavity of the laser, wherein the quick injection of the working gas means that the amount of the injected working gas in the preset time is larger than the gas threshold amount.
Specifically, the fast injection of the working gas into the cavity of the laser includes: and controlling a gas management module according to a controller of the laser, and injecting working gas into the cavity through a passage for quickly injecting gas and a gas valve.
Specifically, determining whether to inject working gas into a cavity of the laser according to the discharge energy variation includes: determining a variation difference according to the discharge energy variation and a preset discharge energy variation, and performing low-pass filtering on the variation difference; and determining whether the low-pass filtering result is greater than zero, and if so, injecting working gas into the cavity of the laser.
Specifically, the determining a variation difference according to the discharge energy variation and a preset discharge energy variation, and performing low-pass filtering on the variation difference includes: determining a variation difference according to the discharge energy variation and a target discharge energy variation, and performing low-pass filtering on the variation difference, wherein the target discharge energy variation meets the corresponding relation between the discharge energy variation and the number of emergent light pulses; wherein, inject working gas into the cavity of laser instrument, include: and when the air pressure is larger than zero, the air in the cavity of the laser is ventilated again.
Specifically, the determining a variation difference according to the discharge energy variation and a preset discharge energy variation, and performing low-pass filtering on the variation difference includes: determining a variation difference according to the discharge energy variation and a first discharge energy variation, and performing low-pass filtering on the variation difference, wherein the first discharge energy variation meets the corresponding relation between the discharge energy variation and the number of emergent light pulses, and the target discharge energy variation is larger than the first discharge energy variation; wherein, inject working gas into the cavity of laser instrument, include: and when the gas is larger than zero, quickly injecting working gas into the cavity of the laser.
Specifically, the determining a variation difference according to the discharge energy variation and a preset discharge energy variation, and performing low-pass filtering on the variation difference includes: determining a variation difference according to the discharge energy variation and a second discharge energy variation, and performing low-pass filtering on the variation difference, wherein the second discharge energy variation satisfies the corresponding relation between the discharge energy variation and the number of the emergent light pulses, and the first discharge energy variation is larger than the second discharge energy variation; wherein, inject working gas into the cavity of laser instrument, include: and when the quantity of the working gas is larger than zero, slowly injecting the working gas into the cavity of the laser, wherein the quantity of the working gas injected in a preset time is smaller than the gas threshold quantity.
In addition, the method further comprises: acquiring a pressure value of a cavity of the laser, comparing the pressure value with an exhaust threshold value, and performing low-pass filtering on a comparison result; and when the filtering result is larger than zero, controlling a gas valve of the laser to exhaust through the controller until the pressure value is smaller than an exhaust threshold value.
In another aspect, the present invention provides a gas control apparatus for a laser, including: the acquisition module is used for acquiring the light emitting voltage of the laser and the discharge energy variation of the laser in the light emitting process of the normal discharge of the laser; and the determining module is used for determining whether to inject working gas in the cavity of the laser according to the light-emitting voltage and/or the discharge energy variation.
In another aspect, the present invention provides a laser, including: a controller and a cavity; the controller is used for acquiring the light emitting voltage of the laser and the discharge energy variation of the laser in the light emitting process of the normal discharge of the laser; and the controller determines whether to inject working gas in the cavity of the laser according to the light-emitting voltage and/or the discharge energy variation.
In the embodiment of the application, in the process of emitting light by normal discharge of the laser, the light-emitting voltage of the laser and the discharge energy variation of the laser are obtained; and determining whether to inject working gas into a cavity of the laser according to the light-emitting voltage and/or the discharge energy variation. Therefore, the gas supplement of the laser is controlled by determining whether the gas injection is carried out or not, so that the laser can discharge in a stable state for a long time and delay the discharge time. The laser maintains stable performance for a long time, production efficiency is improved, and cost is saved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the prior art descriptions will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic flow chart of a gas control method for a laser according to an embodiment of the present disclosure;
FIG. 2 is a schematic view of a gas supply system according to an embodiment of the present application;
FIG. 3 is a schematic view of a gas filling process according to an embodiment of the present application;
fig. 4 is a schematic diagram illustrating a corresponding relationship between a discharge energy variation and a number of light emitting pulses according to an embodiment of the present application;
FIG. 5 is a schematic view of a gas filling process according to an embodiment of the present application;
FIG. 6 is a schematic view of a gas filling process according to an embodiment of the present application;
fig. 7 is a schematic diagram of a frame of a gas control device of a laser according to an embodiment of the present application.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As shown in fig. 1, the present application provides a method of gas control for a laser, the method 100 comprising:
101: and in the process of emitting light by the normal discharge of the laser, obtaining the light-emitting voltage of the laser and the discharge energy variation of the laser.
102: and determining whether to inject working gas in the cavity of the laser according to the light-emitting voltage and/or the discharge energy variation.
It should be noted that the main body of the method 100 may be a laser, and more specifically, may be a controller in the laser, and the controller may be a processor such as a microprocessor.
Currently, laser venting requires stopping the laser discharge and the entire venting process takes tens of minutes, which reduces the wafer output efficiency. As the cost of the gas increases, frequent aeration also leads to increased production costs. Therefore, the gas needs to be managed, and in the discharging process of the laser, the gas is dynamically supplemented and exhausted in a micro-scale manner, so that the laser can maintain stable system performance for a long time, and the aims of improving the production efficiency and saving the cost are fulfilled.
The following is set forth in detail with respect to the above steps:
101: and in the process of emitting light by the normal discharge of the laser, obtaining the light-emitting voltage of the laser and the discharge energy variation of the laser.
The light emitting voltage refers to a discharge voltage.
The light output voltage can be obtained by the controller of the laser and the discharge energy variation can be determined.
Specifically, obtaining the light emitting voltage of the laser and the discharge energy variation of the laser includes: collecting discharge voltage of a power supply module of a laser as emergent light voltage; and collecting the discharge voltage variation and the energy variation of the laser, and determining the discharge energy variation according to the discharge voltage variation and the energy variation.
For example, as shown in fig. 2, the laser includes a gas supply system including a discharge chamber or cavity 203, a power module 202, a main controller or controller 201, a gas management module 204, and a halogen mixed gas or working gas 205. The laser emits light under normal working conditions, and in operation, the controller 201 controls the power supply module 202 to release high voltage to the halogen mixed gas in the cavity 203, so that the halogen mixed gas is ionized to generate laser. The controller 201 can thus obtain the current discharge voltage from the power module 202 as the light emission voltage.
In addition, when the laser is operating normally, the silicon wafer is in a relatively constant energy mode, which is a constant energy mode. And observing the output voltage change of the unit energy variable in the constant energy mode. The variable in the energy closed-loop control process of the single-cavity laser is delta M, and the delta M represents the discharge capacity change of the laser, namely the discharge energy change. Can be determined by the following equation:
wherein V is voltage, E is energy, j is Burst pulse sequence, i is specific pulse sequence in Burst pulse sequence, n is specific pulse sequence number in Burst pulse sequence, f filter Is a filter function. During the experiment, manual air supplement can be performed, and the change trend of delta M before and after air supplement is observed.
Thus, Δ M, i.e., the discharge energy variation amount, may be determined by the controller.
102: and determining whether to inject working gas into a cavity of the laser according to the light-emitting voltage and/or the discharge energy variation.
Specifically, determining whether to inject working gas into a cavity of the laser according to the light extraction voltage includes: determining a voltage difference value according to the collected discharge voltage and a voltage threshold value, and performing low-pass filtering on the voltage difference value; and determining whether the low-pass filtering result is larger than zero, if so, quickly injecting working gas into the cavity of the laser, wherein the quick injection of the working gas means that the amount of the injected working gas in the preset time is larger than the gas threshold amount.
For example, in the working process of the laser, as the laser emits light, the gas is gradually exhausted, and in order to maintain stable spectral performance of the laser (for example, the index of the laser is qualified), the gas needs to be supplied to the laser, the controller is required to control the gas management module to open the valve, and the halogen mixed gas is supplied to the laser.
As described above, the controller of the laser may collect the discharge voltage V of the power module in real time, as shown in fig. 3, through a process 311 of low-pass filtering the voltage, the difference between the discharge voltage, i.e. the measured voltage 301, and the voltage threshold, i.e. the voltage supplement value threshold 302, is calculated by the adder 304, and as the discharge voltage fluctuates along with the light emitting frequency, the difference is passed through the low-pass filter or the circuit, and the step 303 is performed: low-pass filtering, and determining whether the filtering result is greater than zero, executing step 305: greater than 0? And whether the measured value is greater than 0, if so, performing fast injection of the working gas, that is, performing fast charging in step 306, that is, fast injecting the working gas. If not, the operation is not carried out.
Wherein, the low-pass filtering can satisfy the following formula:
a＝1/(1+f s )3)
V(l)＝(1-a)V(l-1)-aM l 4)
wherein a is an intermediate quantity parameter, f s For the frequency of the laser pulse, V (l) is the output of the low-pass filter at the first time, V (l-1) is the output of the low-pass filter at the first-1 time, M (l) Is the first input of the low-pass filter.
Wherein, inject working gas fast into the cavity of laser instrument promptly and fill gas soon, include: and controlling the gas management module according to a controller of the laser, and injecting working gas into the cavity through the passage for quickly injecting gas and the gas valve.
The laser may include two gas injection paths, a fast gas injection path and a slow gas injection path.
For example, as described above, the controller 201 controls the gas management module 204 to open the gas valve and inject the working gas 205 into the chamber 203 through the fast injection gas path, as shown in fig. 2.
Specifically, determining whether to inject working gas into a cavity of the laser according to the discharge energy variation includes: determining a variation difference according to the discharge energy variation and a preset discharge energy variation, and performing low-pass filtering on the variation difference; and determining whether the low-pass filtering result is greater than zero, and if so, injecting working gas into the cavity of the laser.
And the preset discharge energy variation satisfies the corresponding relation between the discharge energy variation and the number of emergent light pulses.
And (3) renewing the working gas in the laser, and debugging the overall performance of the laser to ensure that the laser reaches a steady state, namely the performance indexes of dose stability, line width and wavelength are qualified within a target temperature range. The variation of Δ M with the number of light output pulses, i.e. the above correspondence, can be tested. This relationship may be as shown in fig. 4, and the relationship in fig. 4 is as shown in the following equation 5):
ΔM t ＝f(t)5)
where t represents the number of light emission pulses. In FIG. 4, the abscissa is t and the ordinate is Δ M, i.e., Δ M t . f (t) is a curve in the graph and can be expressed as a function of the corresponding relation.
Thereby, the preset discharge energy variation amount can be set on the function of f (t). Determining a variation difference according to the discharge energy variation and a preset discharge energy variation, and performing low-pass filtering on the variation difference; and determining whether the low-pass filtering result is greater than zero, and if so, injecting working gas into the cavity of the laser.
Wherein, confirm the variation difference according to discharge energy variation and preset discharge energy variation, carry out low-pass filtering to the variation difference, include: determining a variation difference according to the discharge energy variation and the target discharge energy variation, and performing low-pass filtering on the variation difference, wherein the target discharge energy variation meets the corresponding relation between the discharge energy variation and the number of the emergent light pulses; wherein, inject working gas into the cavity of laser instrument, include: and when the gas is larger than zero, the gas in the cavity of the laser is ventilated again.
As described above, the preset discharge energy variation can be set as a function of f (t), such as a plurality of thresholds, and the target Δ M of the gas supply Eyes of a person Namely, target discharge energy variation amount: Δ M Eyes of a user ＝f(t Eyes of a user )，t Eyes of a person The number of light output pulses is one in fig. 4.
As shown in fig. 5, the controller of the laser may acquire Δ M in real time, i.e. calculate according to the manner described above, i.e. obtain the measured Δ M501. Since the measured delta M501 fluctuates with the light emitting frequency, the delta M is compared with the air supplement target delta M Eyes of a user That is, the target air supplement value threshold 502 is calculated by the adder 304, and the step 303 is performed on the difference: low-pass filtering, the controller determines whether the value is greater than zero after the low-pass filtering, that is, step 305 is executed: greater than 0? Is expressed as if greater than 0, if Δ M>ΔM Eyes of a person The working gas in the chamber needs to be replaced. The controller may then rebreathe via the gas management module as described above, i.e., step 505 is performed: and (5) ventilating again.
Wherein, confirm the variation difference according to discharge energy variation and preset discharge energy variation, carry out low-pass filtering to the variation difference, include: determining a variation difference according to the discharge energy variation and a first discharge energy variation, and performing low-pass filtering on the variation difference, wherein the first discharge energy variation satisfies a corresponding relation between the discharge energy variation and the number of light-emitting pulses, and the target discharge energy variation is larger than the first discharge energy variation; wherein, inject working gas into the cavity of laser instrument, include: and when the gas is larger than zero, quickly injecting working gas into the cavity of the laser.
As mentioned above, the preset discharge energy variation can be set as a function of f (t), such as multiple thresholds, and the Buqi threshold 1 Δ M 1 First discharge energy variation amount: Δ M 1 ＝f(t 1 )，t 1 The number of light output pulses is one in fig. 4. And Δ M 1 <ΔM Eyes of a user 。
As shown in FIG. 5, the controller of the laser may be implementedΔ M is then collected, i.e. calculated as described above, i.e. the measured Δ M501 is obtained. Since the measured delta M501 fluctuates with the light emitting frequency, the measured delta M is compared with the air supplement threshold value 1 delta M 1 That is, "the air supplement value threshold value 1"503 performs difference calculation by the adder 304, and performs step 303 on the difference: low-pass filtering, the controller determines whether the value is greater than zero after the low-pass filtering, and then executes step 305: greater than 0? Is expressed as if greater than 0, if Δ M 1 <ΔM<ΔM Eyes of a user Then the controller may fast charge the chamber with the working gas in the manner described above, i.e. execute step 506: and (6) quick charging. Up to Δ M<ΔM 1 。
Wherein, the determining the variation difference according to the discharge energy variation and the preset discharge energy variation, and the low-pass filtering the variation difference comprises: determining a variation difference according to the discharge energy variation and a second discharge energy variation, and performing low-pass filtering on the variation difference, wherein the second discharge energy variation satisfies a corresponding relation between the discharge energy variation and the number of light-emitting pulses, and the first discharge energy variation is larger than the second discharge energy variation; wherein, to the cavity injection working gas of laser instrument, include: and if the quantity of the working gas is larger than zero, slowly injecting the working gas into the cavity of the laser, wherein the slow injection of the working gas means that the quantity of the injected working gas in the preset time is smaller than the gas threshold quantity.
As previously mentioned, a preset discharge energy variation can be set as a function of f (t), e.g., a plurality of thresholds, a "gassing threshold 2" Δ M 2 I.e., the second discharge energy variation amount: Δ M 2 ＝f(t 2 )，t 2 The number of light output pulses is one in fig. 4. And Δ M 2 <ΔM 1 <ΔM Eyes of a user 。
As shown in fig. 5, the controller of the laser may acquire Δ M in real time, i.e. calculate according to the manner described above, i.e. obtain the measured Δ M501. Since the measured Δ M501 fluctuates with the light emitting frequency, it is compared with the air supplement threshold 2 Δ M 2 That is, "supplement value threshold 2"504 performs difference calculation by the adder 304, and performs step 303 on the difference: low-pass filtering, the controller determines whether the value is greater than zero after the low-pass filtering, that is, step 305 is executed: big (a)At 0? Is expressed as if greater than 0, if Δ M 2 <M<ΔM 1 Then, the controller may perform slow charging of the working gas into the cavity through the gas management module, that is, execute step 507: and (5) slowly charging. Up to Δ M<ΔM 2 The inflation is stopped. If less than 0 is always the no state, no is performed.
The cavity of laser instrument injects working gas slowly promptly and fills gas slowly, includes: and controlling the gas management module according to a controller of the laser, and injecting working gas into the cavity through the passage for injecting gas at a low speed and the gas valve.
For example, as described above, the controller 201 controls the gas management module 204 to open the gas valve and inject the working gas 205 into the chamber 203 through the slow injection gas path, as shown in fig. 2.
Examples are: as shown in FIG. 4, Δ M is selected Eyes of a user Is 180,. DELTA.M 2 Is 160,. DELTA.M 1 Is 170. Then at 160, as previously described, at<ΔM<170 working gas is slowly filled, and the controller collects delta M in real time and judges whether the delta M is lower than 160. If 170<M<180, quickly charging working gas to 160%<ΔM<170, the working gas is slowly charged until Δ M is lower than 160, and the charging is stopped.
Here, Δ M is selected from FIG. 4 based on the lifetime curve of the corresponding working gas of the laser, and experience Eyes of a person 、ΔM 1 、ΔM 2 。
In addition, the method 100 further comprises: acquiring a pressure value of a cavity of the laser, comparing the pressure value with an exhaust threshold value, and performing low-pass filtering on a comparison result; and when the filtering result is greater than zero, controlling a gas valve of the laser to exhaust through the controller until the pressure value is less than an exhaust threshold value.
For example, as described above, as shown in fig. 6, the controller tests the pressure value of the cavity in real time, compares the cavity pressure value, i.e. the measured cavity pressure 601, with the exhaust threshold value, i.e. the cavity pressure exhaust threshold value 602, through the process 611 of low-pass filtering for the cavity pressure, calculates the difference value, and performs the step 303: low pass filtering, the controller determines whether the exhaust is greater than zero after passing through the exhaust if exhaust process 612, and then executes step 305: greater than 0? And is indicated as being greater than 0. If the result after filtering is greater than zero, that is, yes, the controller controls the gas management module to exhaust through the gas valve until the gas pressure is less than an exhaust threshold, that is, the target cavity pressure, and then step 603 is executed: and exhausting to the target cavity pressure. If not, the exhaust is not performed.
For example, a standard chamber pressure of 4000 mBar, if the chamber pressure during operation is above a threshold value of 4500 mBar, the chamber is vented until the chamber pressure is below 4500 mBar.
The whole gas supplementing process comprises gas injection and gas removal, and dynamic balance is maintained in the whole light emitting process until performance indexes such as laser dose stability and the like exceed standards.
The embodiment of the application also provides a gas control device of the laser, which is applied to the laser. As shown in fig. 7, the apparatus 700 includes:
the obtaining module 701 is configured to obtain a light emitting voltage of the laser and a discharge energy variation of the laser in a process of emitting light by normal discharge of the laser.
The determining module 702 is configured to determine whether to inject the working gas into the cavity of the laser according to the variation of the light-emitting voltage and/or the discharge energy.
Specifically, the obtaining module 701 includes: the acquisition unit is used for acquiring the discharge voltage of a power supply module of the laser as the emergent light voltage; and the acquisition unit is used for acquiring the discharge voltage variation and the energy variation of the laser and determining the discharge energy variation according to the discharge voltage variation and the energy variation.
Specifically, the determining module 702 includes: the filtering unit is used for determining a voltage difference value according to the collected discharge voltage and the voltage threshold value and performing low-pass filtering on the voltage difference value; and the gas injection unit is used for determining whether the low-pass filtering result is greater than zero, and if so, quickly injecting working gas into the cavity of the laser, wherein the quick injection of the working gas means that the quantity of the injected working gas in a preset time is greater than a gas threshold quantity.
Specifically, the gas injection unit is used for controlling the gas management module according to a controller of the laser, and injecting working gas into the cavity through a rapid gas injection passage and a gas valve.
Specifically, the filtering unit is configured to determine a variation difference according to the discharge energy variation and a preset discharge energy variation, and perform low-pass filtering on the variation difference; and the gas injection unit is used for determining whether the low-pass filtering result is greater than zero, and if so, injecting working gas into the cavity of the laser.
Specifically, the filtering unit is configured to determine a variation difference according to the discharge energy variation and a target discharge energy variation, and perform low-pass filtering on the variation difference, where the target discharge energy variation satisfies a correspondence between the discharge energy variation and the number of light-emitting pulses; and the gas injection unit is used for performing rebreathing on gas in the cavity of the laser when the gas injection amount is larger than zero.
Specifically, the filtering unit is configured to determine a variation difference according to the discharge energy variation and a first discharge energy variation, and perform low-pass filtering on the variation difference, where the first discharge energy variation satisfies a correspondence between the discharge energy variation and the number of light emitting pulses, and the target discharge energy variation is greater than the first discharge energy variation; and the gas injection unit is used for rapidly injecting working gas into the cavity of the laser when the working gas is larger than zero.
Specifically, the filtering unit is configured to determine a variation difference according to the discharge energy variation and a second discharge energy variation, and perform low-pass filtering on the variation difference, where the second discharge energy variation satisfies a correspondence between the discharge energy variation and the number of light-emitting pulses, and the first discharge energy variation is greater than the second discharge energy variation; the gas injection unit is used for injecting working gas into the cavity of the laser at a slow speed when the gas injection amount is larger than zero, wherein the slow injection of the working gas means that the amount of the working gas injected in a preset time is smaller than a gas threshold amount.
In addition, the apparatus 700 further comprises: the comparison module is used for acquiring a pressure value of a cavity of the laser, comparing the pressure value with an exhaust threshold value and performing low-pass filtering on a comparison result; and the exhaust module is used for controlling a gas valve of the laser to exhaust through the controller when the filtering result is greater than zero until the pressure value is less than an exhaust threshold value.
For the specific implementation of the apparatus 700, reference is made to the aforementioned method, and therefore, the detailed description thereof is omitted here.
The embodiment of the application also provides a laser, a controller and a cavity; the controller is used for acquiring the light emitting voltage of the laser and the discharge energy variation of the laser in the light emitting process of the normal discharge of the laser; and the controller determines whether to inject working gas in the cavity of the laser according to the light-emitting voltage and/or the discharge energy variation.
In addition, the laser may further include the aforementioned power module, gas management module, and the like.
It is not repeated herein, and for the reasons that are not exhaustive, reference is made to the above description.
It should be understood that the specific order or hierarchy of steps in the processes disclosed is an example of exemplary approaches. Based upon design preferences, it is understood that the specific order or hierarchy of steps in the processes may be rearranged without departing from the scope of the present disclosure. The accompanying method claims present elements of the various steps in a sample order, and are not meant to be limited to the specific order or hierarchy presented.
The foregoing description of the embodiments and specific examples of the invention have been presented for purposes of illustration and description; it is not intended to be the only form in which a particular embodiment of the invention may be practiced or utilized. The embodiments are intended to cover the features of the various embodiments as well as the method steps and sequences for constructing and operating the embodiments. However, other embodiments may be utilized to achieve the same or equivalent functions and step sequences.
In the foregoing detailed description, various features are grouped together in a single embodiment for the purpose of streamlining the disclosure. This method of disclosure is not to be interpreted as reflecting an intention that the claimed embodiments of the subject matter require more features than are expressly recited in each claim. Rather, as the following claims reflect, invention lies in less than all features of a single disclosed embodiment. Thus, the following claims are hereby expressly incorporated into the detailed description, with each claim standing on its own as a separate preferred embodiment of the invention.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. To those skilled in the art; various modifications to these embodiments will be readily apparent, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the disclosure. Thus, the present disclosure is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
What has been described above includes examples of one or more embodiments. It is, of course, not possible to describe every conceivable combination of components or methodologies for purposes of describing the aforementioned embodiments, but one of ordinary skill in the art may recognize that many further combinations and permutations of various embodiments are possible. Accordingly, the embodiments described herein are intended to embrace all such alterations, modifications and variations that fall within the scope of the appended claims. Furthermore, to the extent that the term "includes" is used in either the detailed description or the claims, such term is intended to be inclusive in a manner similar to the term "comprising" as "comprising" is interpreted when employed as a transitional word in a claim. Furthermore, any use of the term "or" in the specification of the claims is intended to mean a "non-exclusive or".
Those of skill in the art will further appreciate that the various illustrative logical blocks, elements, and steps described in connection with the embodiments disclosed herein may be implemented as electronic hardware, computer software, or combinations of both. To clearly illustrate the interchangeability of hardware and software, various illustrative components, elements, and steps have been described above generally in terms of their functionality. Whether such functionality is implemented as hardware or software depends upon the particular application and design requirements of the overall system. Skilled artisans may implement the described functionality in varying ways for each particular application, but such implementation decisions should not be interpreted as causing a departure from the scope of the present embodiments.
The various illustrative logical blocks or elements described in connection with the embodiments disclosed herein may be implemented or performed with a general purpose processor, a digital signal processor, an Application Specific Integrated Circuit (ASIC), a field programmable gate array or other programmable logic device, discrete gate or transistor logic, discrete hardware components, or any combination thereof designed to perform the functions described herein. A general-purpose processor may be a microprocessor, but in the alternative, the processor may be any conventional processor, controller, microcontroller, or state machine. A processor may also be implemented as a combination of computing devices, e.g., a digital signal processor and a microprocessor, a plurality of microprocessors, one or more microprocessors in conjunction with a digital signal processor core, or any other similar configuration.
The steps of a method or algorithm described in connection with the embodiments disclosed herein may be embodied directly in hardware, in a software module executed by a processor, or in a combination of the two. A software module may be stored in RAM memory, flash memory, ROM memory, EPROM memory, EEPROM memory, registers, hard disk, a removable disk, a CD-ROM, or any other form of storage medium known in the art. For example, a storage medium may be coupled to the processor such that the processor can read information from, and write information to, the storage medium. In the alternative, the storage medium may be integral to the processor. The processor and the storage medium may reside in an ASIC, which may be located in a user terminal. In the alternative, the processor and the storage medium may reside in different components in a user terminal.
In one or more exemplary designs, the functions described above in connection with the embodiments of the invention may be implemented in hardware, software, firmware, or any combination of the three. If implemented in software, the functions may be stored on or transmitted over as one or more instructions or code on a computer-readable medium. Computer-readable media includes both computer storage media and communication media that facilitate transfer of a computer program from one place to another. Storage media may be any available media that can be accessed by a general purpose or special purpose computer. For example, such computer-readable media can comprise, but is not limited to, RAM, ROM, EEPROM, CD-ROM or other optical disk storage, magnetic disk storage or other magnetic storage devices, or any other medium that can be used to carry or store program code in the form of instructions or data structures and that can be read by a general-purpose or special-purpose computer, or a general-purpose or special-purpose processor. Additionally, any connection is properly termed a computer-readable medium, and, thus, is included if the software is transmitted from a website, server, or other remote source via a coaxial cable, fiber optic cable, twisted pair, digital Subscriber Line (DSL), or wirelessly, e.g., infrared, radio, and microwave. Such discs (disk) and disks (disc) include compact disks, laser disks, optical disks, DVDs, floppy disks and blu-ray disks where disks usually reproduce data magnetically, while disks usually reproduce data optically with lasers. Combinations of the above may also be included in the computer-readable medium.
The above-mentioned embodiments are intended to illustrate the objects, technical solutions and advantages of the present invention in further detail, and it should be understood that the above-mentioned embodiments are merely exemplary embodiments of the present invention, and are not intended to limit the scope of the present invention, and any modifications, equivalent substitutions, improvements and the like made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (10)
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