CN115793027A - Measuring system and method for calibrating working efficiency of X-ray filter and mirror - Google Patents

Abstract

The invention relates to a measurement system and method for calibrating the working efficiency of X-ray filters and mirrors, which includes a vacuum unit, an aiming and collimating unit, a sample placement unit, an adjustment unit, an angle measurement unit and a signal acquisition control unit; The adjustment unit is used to adjust the working state of the aiming collimation unit, the sample placement unit and the angle measurement unit, the adjustment unit is connected with the signal acquisition control unit; the vacuum unit is connected with the first vacuum chamber; the sample placement unit It includes a filter sample holder and a reflector sample holder; the aiming and collimating unit is placed in the first vacuum chamber, the sample placement unit, the adjustment unit and the angle measurement unit are placed in the second vacuum chamber, and the two vacuum chambers are sealed by Vacuum flange connection. Compared with the prior art, the invention can simultaneously measure a plurality of filters and reflector samples, and measure input signals and output signals in real time, significantly improving measurement efficiency and reducing measurement errors.

Description

Measuring system and method for calibrating working efficiency of X-ray filter and mirror

technical field

The invention relates to the field of calibration of working efficiency of X-ray optical elements, in particular to a measurement system and method for calibrating the working efficiency of X-ray filters and mirrors.

Background technique

The absolute measurement of soft X-ray energy spectrum is a core content of ICF (inertial confinement fusion, inertial confinement fusion) research, in which soft X-ray filters and soft X-ray mirrors are important adjustments and Dispersion element. These components are important instruments commonly used in the field of ICF energy spectroscopy and radiation flow diagnosis, such as the Dante spectrometer used in the NIF laser facility in the United States, the SXS (Soft x-ray spectrometer) energy spectrometer in the Shenguang III laser facility in my country, and the FXRD (Flat x-ray spectrometer) energy spectrometer. x-ray diode) are the core measurement components. In order to ensure the accuracy of the measurement results, accurate calibration measurements must be made on the operating efficiency of these optical components.

The existing X-ray element calibration devices for synchrotron radiation are mainly divided into transmission filter calibration devices and reflective reflectance meter devices. Due to the limitations of the optical structure, the existing calibration device is difficult to take into account the calibration measurement of transmission and reflection optical elements, and it takes a lot of time in the process of sample replacement, which greatly reduces the calibration efficiency, especially when the working hours of the synchrotron radiation device are tight. Under the circumstances, this has caused great difficulties in the calibration of X-ray optical components. At the same time, because the existing reflectance meter uses a single detector, it cannot detect the input signal and the output signal at the same time, which causes a large number of measurement errors when the intensity of the synchrotron radiation beam changes with time.

Contents of the invention

The object of the present invention is to provide a measurement system and method for calibrating the working efficiency of X-ray filters and mirrors in order to overcome the above-mentioned defects in the prior art.

The purpose of the present invention can be achieved through the following technical solutions:

A measurement system for calibrating the working efficiency of X-ray filters and mirrors, comprising a vacuum unit, an aiming collimation unit, a sample placement unit, an adjustment unit, an angle measurement unit and a signal acquisition control unit; the adjustment unit is used for Adjust the working state of the aiming collimation unit, the sample placement unit and the angle measurement unit, the adjustment unit is connected with the signal acquisition control unit; the vacuum unit is connected with the first vacuum chamber; the sample placement unit includes a filter sample holder and the reflector sample holder; the aiming and collimating unit is placed in the first vacuum chamber, the sample placement unit, the adjustment unit and the angle measurement unit are placed in the second vacuum chamber, and the two vacuum chambers are connected by a sealed vacuum flange .

Further, the vacuum unit is equipped with a vacuum pump and a high-precision vacuum gauge, and the vacuum degree of the device is ≤10 ^-3 Pa.

Further, the aiming and collimating unit includes a vertically adjustable first slit and a second slit and a vertically adjustable first CCD camera and a second CCD camera for monitoring the slit spot, the first slit It is a horizontal slit, the second slit is a vertical slit, the adjustment range of the slit width is 1-3mm, the slit spacing is 200mm, and the edge of the slit is coated with X-ray phosphor.

Further, the goniometric unit includes a scintillator and a vertically adjustable third CCD camera for monitoring the scintillator spot, the scintillator is arranged on the inner wall of the second vacuum chamber, the third CCD camera is connected to the adjustment unit, The scintillator is a GAGG plastic scintillator, and the scintillator is placed at the end of the optical path, with a diameter of 300 mm.

Further, the signal acquisition control unit includes two silicon photodiode detectors inside the second vacuum chamber, a weak current meter, a host computer, and a cable and a vacuum aircraft set on the second vacuum chamber for leading out signals. Insert the flange, the silicon photodiode is AXUV-100 standard detector, the sensitivity difference between the front and rear detectors is ≤2%, and the signal-to-noise ratio is ≥100.

Further, the sensitivity of the weak ammeter is on the pA level, and the data can be transmitted to the host computer in real time.

Further, the host computer receives the real-time signal of the weak current meter, and processes the electrical signals output by the front and rear silicon photodiode detectors, and calculates the transmittance of the filter sample and the reflectance of the mirror sample.

Further, the adjustment unit includes a vacuum electric control adjustment frame mounted in the slit, silicon photodiode, filter sample holder and mirror sample holder, and the vacuum electric control adjustment frame is used for the slit, silicon photodiode and The filter sample is adjusted vertically by 30mm; the vacuum electric control adjustment frame in the adjustment unit is adjusted vertically by 30mm, horizontally by 30mm and angled from 0 to 20° to the multilayer mirror mirror sample; The vertical adjustment of 15mm is performed on the first CCD camera and the second CCD camera of the slit; the vertical adjustment of 200mm is performed on the third CCD camera for observing the scintillator facula.

Further, the host computer in the signal acquisition control unit controls all the electronic control adjustment racks, and automatically switches the X-ray beam energy, filter samples and mirror samples through the Labview program.

Further, the host computer receives the real-time signal of the weak current meter, and calculates the average value and variance of the signal from the same sample at the same time period.

A method for measuring a measurement system for calibrating the operating efficiency of an X-ray filter and a mirror, comprising the following steps:

S1. Place multiple filter samples and mirror samples in the filter sample holder and mirror sample holder in the sample placement unit respectively, and adjust the vacuum degree in the device to ≤10 ^-3 Pa through the vacuum unit;

S2. Switch the X-ray beam of synchrotron radiation to the 0th-order diffracted light, aim and collimate the optical path through the aiming and collimating unit, measure the grazing incidence angle of the mirror sample by the angle measuring unit, and adjust the adjustment unit to the required value of the mirror sample the measurement angle;

S3. Switch the synchrotron radiation X-ray beam to 750eV energy, place the first silicon photodiode detector in the optical path through the adjustment unit (4), measure the data of the sample that has not passed the mirror, and then place the second silicon photodiode detector The photodiode detector is placed in the optical path to measure the data of the sample passing through the mirror;

S4. Scan the synchrotron radiation X-ray beam in the energy range of 100-1500eV, first move the two silicon photodiode detectors vertically out of the optical path through the adjustment unit (4), replace the filter sample and the mirror sample, and then pass The adjustment unit (4) places the first silicon photodiode detector in the optical path to measure the data of the sample that has not passed the reflector, and then places the second silicon photodiode detector in the optical path to measure the data of the sample that has not passed the reflector. For the data of the mirror sample, the signal acquisition control unit (6) processes the electrical signals output by the front and rear silicon photodiode detectors, and calculates the transmittance of the filter sample and the reflectance of the mirror sample.

Compared with the prior art, the present invention has the following beneficial effects:

1. The present invention considers the calibration of the working efficiency of the X-ray transmissive and reflective optical elements simultaneously in the design of the optical structure, by being provided with a filter sample holder and a reflector sample holder in the second vacuum chamber, it can simultaneously For calibrating X-ray filters and mirrors, multiple samples can be accommodated in the sample holder; a lot of time for changing samples is saved, and the measurement efficiency of calibrating X-ray optical components is significantly improved.

2. The present invention adopts two silicon photodiodes with sensitivity difference ≤ 2% as the signal detector, which can measure the input signal and the output signal after the transmission or reflection of the optical element in real time, avoiding the band caused by the synchrotron radiation beam intensity changing with time. A large number of errors come, which significantly improves the measurement accuracy of the calibrated X-ray optical components.

3. The present invention measures the grazing incidence angle of the reflection mirror in real time by using the third CCD camera to monitor and observe the X-ray spot on the X-ray scintillator at the end of the optical path, while the traditional reflectance meter directly uses the rotation angle as the grazing incidence angle. The angle method effectively avoids the angle measurement error caused by the sample installation and equipment aging of the traditional reflectance meter, and significantly improves the measurement accuracy of the calibrated X-ray reflector.

4. The present invention is provided with an adjustment unit for adjusting the working state of the aiming collimation unit, the sample placement unit and the angle measurement unit, and the vacuum electric control adjustment frame in the adjustment unit performs the adjustment on the slit, the silicon photodiode and the filter sample. Vertical adjustment; vertical, horizontal and angular adjustment of the multilayer mirror mirror sample; vertical adjustment of the first CCD camera and the second CCD camera for observing the slit; precise vertical adjustment of the third CCD camera for observing the scintillator facula , to achieve the satisfaction of different measurement requirements, and has practicability.

Description of drawings

Fig. 1 is a structural representation of the present invention;

Fig. 2 is a schematic diagram of a filter sample holder of the present invention;

Fig. 3 is the schematic diagram of mirror sample holder of the present invention;

Fig. 4 is a schematic diagram of the method for measuring the grazing incidence angle of the mirror according to the present invention.

Symbols in the figure: vacuum unit 1, aiming and collimating unit 2, sample placement unit 3, adjustment unit 4, angle measurement unit 5, signal acquisition control unit 6, mirror sample holder outer frame 31, mirror sample holder turntable 32, Mirror frame 33 , mirror sample 34 , filter holder sample holder outer frame 35 , filter holder sample holder fixing sheet 36 , filter sample 37 , GAGG plastic scintillator 51 .

Detailed ways

The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments. This embodiment is carried out on the premise of the technical solution of the present invention, and detailed implementation and specific operation process are given, but the protection scope of the present invention is not limited to the following embodiments.

A measurement system for calibrating the working efficiency of X-ray filters and mirrors, including a vacuum unit 1, an aiming and collimating unit 2, a sample placement unit 3, an adjustment unit 4, an angle measurement unit 5 and a signal acquisition control unit 6; The adjustment unit 4 is used to adjust the working state of the aiming collimation unit 2, the sample placement unit 3 and the angle measurement unit 5, the adjustment unit 4 is connected with the signal acquisition control unit 6; the vacuum unit 1 is connected with the first vacuum chamber; the sample placement unit The placement unit 3 includes a filter sample holder and a reflector sample holder; the aiming collimation unit 2 is placed in the first vacuum chamber, and the sample placement unit 3, the adjustment unit 4 and the angle measurement unit 5 are placed in the second vacuum chamber. The two vacuum chambers are connected by sealed vacuum flanges.

The vacuum unit 1 is equipped with a vacuum pump and a high-precision vacuum gauge, and the vacuum degree of the device is ≤10 ^-3 Pa; the aiming and collimating unit 2 includes a vertically adjustable first slit and a second slit and a vertically adjustable slit for monitoring The first CCD camera and the second CCD camera of the light spot, the first slit is a horizontal slit, the second slit is a vertical slit, the slit width adjustment range is 1-3mm, the slit spacing is 200mm, and the edge of the slit is painted There are X-ray phosphors.

The goniometer unit 5 includes a scintillator and a vertically adjustable third CCD camera for monitoring the scintillator spot, the scintillator is arranged on the inner wall of the second vacuum chamber, the third CCD camera is connected with the adjustment unit 4, the scintillator It is a GAGG plastic scintillator, placed at the end of the light path, with a diameter of 300mm.

The signal acquisition control unit 6 includes two silicon photodiode detectors inside the second vacuum chamber, a weak current meter, a host computer, and a cable and a vacuum aviation insertion flange arranged on the second vacuum chamber for leading out signals. The above-mentioned silicon photodiode is AXUV-100 standard detector, the sensitivity difference between the front and back detectors is ≤2%, and the signal-to-noise ratio is ≥100; the sensitivity of the weak current meter is on the order of pA, and the data can be transmitted to the host computer in real time.

The upper computer receives the real-time signal of the weak current meter, and processes the electrical signal output by the front and rear silicon photodiode detectors, and calculates the transmittance of the filter sample and the reflectance of the mirror sample.

The adjustment unit 4 includes a vacuum electric control adjustment frame mounted in the slit, silicon photodiode, filter sample holder and mirror sample holder, and the vacuum electric control adjustment frame carries out a 30mm adjustment for the slit, silicon photodiode and filter sample. vertical adjustment; the vacuum electric control adjustment frame in the adjustment unit performs vertical adjustment of 30 mm, horizontal adjustment of 30 mm and angle adjustment of 0 to 20 degrees for the multilayer mirror mirror sample; the first CCD of the observation slit The camera and the second CCD camera are adjusted vertically by 15 mm; the third CCD camera for observing the scintillator facula is adjusted vertically by 200 mm.

The upper computer in the signal acquisition control unit 6 controls all the electronic control adjustment racks, and automatically switches the X-ray beam energy and samples through the Labview program.

A method for measuring a measurement system for calibrating the operating efficiency of an X-ray filter and a mirror, comprising the following steps:

S1. Place multiple filter samples and reflector samples in the filter sample holder and reflector sample holder in the sample placement unit 3 respectively, and adjust the vacuum degree in the device to ≤10 ⁻³ Pa through the vacuum unit 1;

S2. Switch the synchrotron radiation X-ray beam to the 0th-order diffracted light, aim and collimate the optical path through the aiming and collimating unit 2, the angle measuring unit 5 measures the grazing incidence angle of the mirror sample, and adjust the adjusting unit 4 to the reflecting mirror The measurement angle required for the sample;

S3. Switch the synchrotron radiation X-ray beam to 750eV energy, and place the silicon photodiode detector in the optical path through the adjustment unit 4;

S4. Scan the synchrotron radiation X-ray beam in the energy range of 100-1500eV, switch the silicon photodiode detector and the sample through the adjustment unit 4, and use the signal acquisition control unit 6 to pair the electrical signals output by the front and rear silicon photodiode detectors Process and calculate the transmittance for the filter sample and the reflectance for the mirror sample.

In this embodiment, the content of the present invention will be further described by taking the measurement device and method of calibrating an X-ray filter for ICF soft X-ray energy spectrum measurement and a compact X-ray multilayer film array mirror as examples.

As shown in Figure 1-3, it is a schematic structural diagram of a measurement system for calibrating the working efficiency of X-ray filters and mirrors, including a vacuum unit 1, an aiming and collimating unit 2, a sample placement unit 3, and an adjustment unit 4. Angle measurement unit 5, signal acquisition control unit 6, mirror sample holder outer frame 31, mirror sample holder turntable 32, mirror frame 33, mirror sample 34, filter holder sample holder 35, filter holder sample holder fixing sheet 36. Filter sample 37 and GAGG plastic scintillator 51.

A plurality of X-ray filter samples 37 are placed in filter holder grooves customized with the filter holder sample holder 35, the surface of the filter sample frame is flat with the surface of the filter holder groove, and 36 pairs of filter holder sample holder fixing sheets are used. The sheet sample 37 is fixed, and the adjustment unit 4 can vertically adjust the filter sample 37 by 30mm.

The compact X-ray multilayer film array mirror sample 34 is fixed from the side by the mirror frame 33, and the surface of the mirror frame 33 is in the same plane as the selection center of the mirror sample holder turntable 32 to ensure the measurement accuracy of the grazing incidence angle. The adjustment unit 4 can adjust the mirror sample 34 with a vertical adjustment range of 30mm, a horizontal adjustment of 30mm, and an angle adjustment of 0° to 20°.

Based on the above-mentioned device, the measurement method for calibrating the X-ray filter for ICF soft X-ray energy spectrum measurement and the compact X-ray multilayer film array mirror in this embodiment includes the following steps:

Step 1. Place the X-ray filter and multi-layer film array mirror samples in the sample holder, and adjust the vacuum degree in the device to ^≤10-3 Pa through the front-stage mechanical pump and the post-molecular pump in the vacuum unit 1, Use a vacuum gauge to observe whether the vacuum degree meets the requirements, and if it meets the requirements, proceed to step 2.

Step 2. Switch the synchrotron radiation beamline to 0th order diffracted light. Two slits coated with X-ray phosphor powder with a distance of 150 mm are used in the aiming collimation unit 2. By monitoring the first and second CCD cameras, it is confirmed that the beamline optical path passes through the two slits; as shown in Figure 4, the angle measurement Unit 5 monitors the third CCD camera and cooperates with the GAGG plastic scintillator 51 to measure the spot position of the beam line directly, the position of the beam line parallel to the mirror sample 37, and the position of the beam line reflected by the mirror sample 37, and passes between the three spots. The exact positional relationship of the mirror sample 37 is calculated for the grazing incidence angle.

Step 3. Switch the synchrotron radiation X-ray beam to 750eV energy, adjust the positions of the front and rear silicon photodiode detectors respectively through the adjustment unit 4, monitor the signal change in the signal acquisition control unit 6, and when the signal is basically stable, detect The detector is located in the beamline optical path, record the position of the detector at this time.

Step 4. For any sample, scan the synchrotron radiation X-ray beam in the energy range of 100-1500eV, automatically switch the detector through the adjustment device 4, process the signals of the front and rear detectors through the signal control unit 6, and calculate the filter The transmittance of the sample 37 and the reflectance of the mirror sample 34 and other relevant parameters.

Step 5. Reset the synchrotron radiation X-ray beam, and automatically switch samples through the adjustment device 4 . For the mirror sample 34 , repeat steps 1 and 4. For filter sample 37, repeat step 4.

The preferred specific embodiments of the present invention have been described in detail above. It should be understood that those skilled in the art can make many modifications and changes according to the concept of the present invention without creative efforts. Therefore, all technical solutions that can be obtained by those skilled in the art based on the concept of the present invention through logical analysis, reasoning or limited experiments on the basis of the prior art shall be within the scope of protection defined by the claims.

Claims (10)

1. a measuring system for calibrating X-ray filter and mirror operating efficiency is characterized in that, comprises vacuum unit (1), aiming at collimation unit (2), sample placement unit (3), adjustment unit ( 4), angle measurement unit (5) and signal acquisition control unit (6); The adjustment unit (4) is used to adjust the working state of the aiming collimation unit (2), the sample placement unit (3) and the angle measurement unit (5), and the adjustment unit (4) is connected with the signal acquisition control unit (6) ; The vacuum unit (1) is connected with the first vacuum chamber; The sample placement unit (3) includes a filter sample holder and a mirror sample holder; The aiming and collimation unit (2) is placed in the first vacuum chamber, the sample placement unit (3), the adjustment unit (4) and the goniometric unit (5) are placed in the second vacuum chamber, and the two vacuum chambers pass through Sealed vacuum flange connection. 2. A kind of measurement system for calibrating the working efficiency of X-ray filters and mirrors according to claim 1, characterized in that, the vacuum unit (1) is equipped with a vacuum pump and a high-precision vacuum gauge, and the device vacuum Degree ≤ 10 ^-3 pa. 3. A measurement system for calibrating the working efficiency of X-ray filters and mirrors according to claim 1, characterized in that said aiming and collimating unit (2) comprises a vertically adjustable first slit And the second slit and the vertically adjustable first CCD camera and second CCD camera for monitoring the slit spot, the first slit is a horizontal slit, the second slit is a vertical slit, and the slit width adjustment range The distance between the slits is 1 to 3 mm, the distance between the slits is 200 mm, and the edges of the slits are coated with X-ray fluorescent powder. 4. A kind of measurement system for calibrating the working efficiency of X-ray filters and mirrors according to claim 1, characterized in that, the angle measuring unit (5) includes a scintillator and a vertically adjustable A third CCD camera for monitoring the scintillator spot, the scintillator is arranged on the inner wall of the second vacuum chamber, the third CCD camera is connected with the adjustment unit (4), the scintillator is a GAGG plastic scintillator, and the scintillator is placed at the end of the optical path , with a diameter of 300mm. 5. A kind of measurement system for calibrating the working efficiency of X-ray filters and mirrors according to claim 1, characterized in that, said signal acquisition control unit (6) comprises two inside the second vacuum chamber A silicon photodiode detector, a weak current meter, a host computer, and a cable for leading out signals and a vacuum aviation insertion flange arranged on the second vacuum cavity. Sensor sensitivity difference ≤ 2%, signal-to-noise ratio ≥ 100. 6. A kind of measurement system for calibrating the working efficiency of X-ray filters and mirrors according to claim 5, characterized in that, the sensitivity of the weak galvanometer is on the order of pA, and the data can be imported in real time PC. 7. A measurement system for calibrating the working efficiency of X-ray filters and mirrors according to claim 6, wherein the host computer receives the real-time signal of the weak current meter, and measures the front and rear silicon photonics secondary The electrical signal output by the tube detector is processed to calculate the transmittance of the filter sample and the reflectance of the mirror sample. 8. A measurement system for calibrating the working efficiency of X-ray filters and mirrors according to claim 1, characterized in that, the adjustment unit (4) includes a slit, a silicon photodiode, a filter The vacuum electric control adjustment frame in the sheet sample holder and the reflector sample holder, the vacuum electric control adjustment frame carries out vertical adjustment of 30mm to the slit, silicon photodiode and filter sample; the vacuum electric control adjustment in the adjustment unit The multilayer mirror mirror sample is adjusted vertically by 30mm, horizontally by 30mm, and angled from 0° to 20°; the first CCD camera and the second CCD camera for the observation slit are adjusted vertically by 15mm; The third CCD camera of the scintillator spot is adjusted vertically by 200mm. 9. A kind of measurement system for calibrating the working efficiency of X-ray filters and mirrors according to claim 5, characterized in that, the host computer in the signal acquisition control unit (6) controls all electric control adjustments rack, and automatically switch the X-ray beam energy and filter samples and mirror samples through the Labview program. 10. according to claim 1-9 arbitrary described a kind of measuring method for the measurement system of calibration X-ray filter and reflector working efficiency, it is characterized in that, comprises the following steps: S1. Place multiple filter samples and reflector samples in the filter sample holder and reflector sample holder in the sample placement unit (3), respectively, and adjust the vacuum degree in the device to ≤10 ⁻ through the vacuum unit (1). ³ Pa; S2, switch the synchrotron radiation X-ray beam to the 0th order diffracted light, aim and collimate the optical path through the aiming and collimating unit (2), the angle measuring unit (5) measures the grazing incidence angle of the mirror sample, and adjust the unit ( 4) Adjust to the measurement angle required by the mirror sample; S3. Switch the synchrotron radiation X-ray beam to 750eV energy, place the first silicon photodiode detector in the optical path through the adjustment unit (4), measure the data of the sample that has not passed the mirror, and then place the second silicon photodiode detector The photodiode detector is placed in the optical path to measure the data of the sample passing through the mirror; S4. Scan the synchrotron radiation X-ray beam in the energy range of 100-1500eV, first move the two silicon photodiode detectors vertically out of the optical path through the adjustment unit (4), replace the filter sample and the mirror sample, and then pass The adjustment unit (4) places the first silicon photodiode detector in the optical path to measure the data of the sample that has not passed the reflector, and then places the second silicon photodiode detector in the optical path to measure the data of the sample that has not passed the reflector. For the data of the mirror sample, the signal acquisition control unit (6) processes the electrical signals output by the front and rear silicon photodiode detectors, and calculates the transmittance of the filter sample and the reflectance of the mirror sample.

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