CN115772652A - Sputtering coating equipment for processing infrared window piece - Google Patents
Sputtering coating equipment for processing infrared window piece Download PDFInfo
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- CN115772652A CN115772652A CN202211552245.6A CN202211552245A CN115772652A CN 115772652 A CN115772652 A CN 115772652A CN 202211552245 A CN202211552245 A CN 202211552245A CN 115772652 A CN115772652 A CN 115772652A
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Abstract
The utility model relates to a technical field of sputter coating equipment provides an infrared window processing is with sputter coating equipment, including the equipment cavity, the equipment cavity is connected with evacuating device, be equipped with radio frequency electrode in the equipment cavity, radio frequency electrode electric connection radio frequency power supply, the week side of radio frequency electrode encloses and is equipped with the target, still including the magnetic element that is used for producing magnetic field and carry out absorbent material loading adsorption component to the window, still including the controller of controlling each mechanism's action. The beneficial effect of this application does: evacuating device is inside to extract air to equipment shell, reaches the atmospheric pressure condition of sputter coating, and radio frequency power supplies power to the radio frequency electrode, makes the particle sputter on target surface come and deposit in order to form the coating on the window piece surface, adsorbs the subassembly through setting up the material loading in this application and can realize carrying out the material loading automatically to the window piece, can once coat a plurality of window pieces moreover, has improved coating efficiency.
Description
Technical Field
The invention relates to the technical field of coating equipment, in particular to sputtering coating equipment for processing an infrared window.
Background
Sputter coating is a widely used physical vapor deposition method for preparing surface coatings. The existing sputtering coating method comprises the following steps: in the reaction chamber, the target material (or target material) surface is bombarded by the charged particles, so that the bombarded particles deposit on the substrate surface to form a coating or film. Compared with the traditional vacuum evaporation method, the sputtering coating method has many advantages, such as strong adhesion of the film layer and the base material, capability of preparing a high-melting-point substance film, capability of preparing a compound film by reactive sputtering and the like.
A film plating apparatus in the prior art, such as a sputtering film plating apparatus described in patent document with an authorization publication number of CN201162041Y, which is capable of reducing the cost, and is used for plating a film on a workpiece, the sputtering film plating apparatus has a film plating chamber, the film plating chamber has a first workpiece stage for placing the workpiece, a target for placing a target, and a dc power supply, the first workpiece stage is electrically connected to an anode or ground of the dc power supply, the target is electrically connected to a cathode of the dc power supply, the sputtering film plating apparatus further has a second workpiece stage, a front surface of the second workpiece stage has a clamping seam for clamping the workpiece, the second workpiece stage is arranged and electrically connected to the first workpiece stage, and when the front surface of the second workpiece stage is opposite to the target, the workpiece is arranged in the clamping seam for coating, the second workpiece platform is arranged and electrically connected to the target, the front surface of the second workpiece platform is right opposite to the first workpiece platform, the workpiece is arranged on the first workpiece platform for coating, the workpiece is arranged on the second workpiece platform for coating after the second workpiece platform is arranged and electrically connected to the first workpiece platform, the second workpiece platform is used as the target after the second workpiece platform is arranged and electrically connected to the target, the workpiece is arranged on the first workpiece platform for coating, and therefore the coating deposited on the second workpiece platform, particularly the precious metal film, can be recycled, and the cost of sputtering coating equipment is reduced.
However, the inventors have found that the following problems still exist with the above-described solution: the material loading of coating film product needs the manual adjustment centre gripping, and it is inconvenient to use, starts primary equipment moreover, and the product quantity of coating film is limited, and coating film efficiency is not high-efficient.
Disclosure of Invention
The application provides an infrared window processing is with sputter coating equipment has solved the above-mentioned problem among the correlation technique, not only can treat the product of coating film automatically and carry out the material loading, can also once plate a plurality of equipment of coating film, and degree of automation is high, and the coating film is high-efficient.
Therefore, the technical scheme adopted by the sputtering coating equipment for processing the infrared window piece is as follows:
the utility model provides an infrared window processing is with sputter coating equipment, includes the equipment cavity, the equipment cavity is connected with evacuating device, be equipped with the radio frequency electrode in the equipment cavity, radio frequency electrode electric connection radio frequency power, the week side of radio frequency electrode encloses and is equipped with the target, still including the magnetic element that is used for producing magnetic field and carry out absorbent material loading adsorption component to the window, still including the controller of each mechanism's action of control.
By adopting the technical scheme: evacuating device is inside to extract air to equipment shell, reaches the atmospheric pressure condition of sputter coating, and radio frequency power supplies power to the radio frequency electrode, makes the particle sputter on target surface come and deposit in order to form the coating on the window piece surface, adsorbs the subassembly through setting up the material loading in this application and can realize carrying out the material loading automatically to the window piece, can once coat a plurality of window pieces moreover, has improved coating efficiency.
Optionally, the radio frequency power supply is fixed outside the equipment cavity, a ground terminal of the radio frequency power supply is connected with the feeding clamping assembly, an anode of the radio frequency power supply is electrically connected with the radio frequency electrode, and the equipment cavity is connected to the ground.
By adopting the technical scheme: the radio-frequency electrode can provide radio-frequency voltage for the equipment shell, so that gas discharge in the equipment cavity generates plasma, ions in the plasma are accelerated to bombard the target under the action of the cathode electric field, and particles on the surface of the target are sputtered out and deposited on the surface of the window sheet to form a coating.
Optionally, the radio frequency electrode is vertically installed inside the cavity of the device in a cylindrical shape, and the magnetic induction lines generated by the magnetic elements are parallel or partially parallel to the axis of the radio frequency electrode.
By adopting the technical scheme: with the arrangement, the excited target material has surface particles capable of diffusing to the circumferential side and can be sputtered onto a plurality of window sheets simultaneously, thereby improving the sputtering coating efficiency.
Optionally, the vacuum pumping device is installed outside the upper portion of the equipment cavity, and an air pumping port of the vacuum pumping device is communicated with the equipment cavity.
By adopting the technical scheme: before sputtering coating, firstly, a vacuumizing device is started to suck air in the cavity of the equipment so as to enable the air pressure condition of sputtering coating to be achieved.
Optionally, the material loading adsorption component comprises a rotary table connected to the bottom of the equipment cavity in a rotating mode and a driving piece arranged at the bottom of the equipment cavity and used for driving the rotary table to rotate, and a plurality of adsorption pieces are arranged on the rotary table.
By adopting the technical scheme: through setting up the carousel, the carousel can rotate under the drive of driving piece, rotates to the material loading position after with the window piece material loading to adsorb the piece by the absorption piece absorption back, the carousel rotates the material loading of next window piece and adsorbs to can carry out sputter coating to a plurality of window pieces simultaneously.
Optionally, the adsorption piece comprises an installation cavity arranged on the turntable, the installation cavity is communicated with a plurality of vertical hollow adsorption plates, a plurality of suckers are arranged on the adsorption plates, and a negative pressure device is arranged in the installation cavity.
By adopting the technical scheme: and a negative pressure device is arranged in the mounting cavity, and the window sheet can be adsorbed by the sucker by starting the negative pressure device.
Optionally, the mounting cavity is rotatably connected to the turntable through a turnover mechanism.
By adopting the technical scheme: because the relation of dislocation, when carrying out the material loading to the window, probably there is the problem of the inconvenient operation in position, through setting up tilting mechanism, can make the absorption piece rotate on the carousel, make it rotate the outside towards the material loading position, the material loading resets after finishing, treats that coated film window one side puts towards the central point of equipment cavity, the problem of the material loading of being convenient for has been solved in the aforesaid setting.
Optionally, the turnover mechanism comprises a rotating motor arranged on the side of the bottom of the turntable, an output shaft of the rotating motor is provided with an installation disc, and the installation cavity is installed on the installation disc.
By adopting the technical scheme: the rotary motor is started to drive the installation cavity to rotate, so that the adsorption piece is rotated, and the loading is facilitated.
Optionally, the door body is rotatably connected to the equipment cavity, and the feeding manipulator is installed at the door body of the equipment cavity.
By adopting the technical scheme: the preferred door body department of feeding position in this application, opens a body during the material loading, and the carousel rotates to a body position department, starts to rotate the motor, rotates the motor and drives the outside upset of adsorption component, has a material loading manipulator to carry the window piece to a body department and the laminating adsorbs the piece, adsorbs the piece and adsorbs the window piece and realize the material loading, has removed manual operation from, has improved coating film efficiency.
Optionally, an inductive switch is arranged between the door body and the equipment cavity, and the inductive switch is electrically connected with the controller.
By adopting the technical scheme: the controller is used for controlling the radio frequency power supply, the power supply of the magnetic element, the action of the vacuumizing device and the like, and after the feeding is finished, the door body is closed to touch the inductive switch, so that the sputtering coating work is started.
The working principle and the beneficial effects of the invention are as follows:
1. evacuating device is inside to extract air to equipment shell, reaches the atmospheric pressure condition of sputter coating, and radio frequency power supplies power to the radio frequency electrode, makes the particle sputter on target surface come and deposit in order to form the coating on the window piece surface, adsorbs the subassembly through setting up the material loading in this application and can realize carrying out the material loading automatically to the window piece, can once coat a plurality of window pieces moreover, has improved coating efficiency.
2. Through setting up tilting mechanism, can make absorption piece rotate on the carousel, make it rotate the outside towards the material loading position, the material loading resets after finishing, treats that coated film's window piece one side puts towards the central point of equipment cavity, the problem of the material loading of being convenient for has been solved in the aforesaid setting.
Drawings
The invention is described in further detail below with reference to the drawings and the detailed description.
Fig. 1 is a schematic structural view of an apparatus cavity in embodiment 1 of the present application;
FIG. 2 is a schematic view of the overall structure of embodiment 1 of the present application;
fig. 3 is a schematic top view of the loading adsorption assembly in embodiment 1 of the present application;
fig. 4 is a schematic structural view of an apparatus cavity in embodiment 2 of the present application.
In the figure: 100. an equipment cavity; 110. a door body; 120. an inductive switch; 200. a vacuum pumping device; 300. a radio frequency electrode; 400. a radio frequency power supply; 500. a target material; 600. a magnetic element; 700. a feeding adsorption component; 710. a turntable; 720. a drive member; 730. an adsorbing member; 731. installing a cavity; 732. an adsorption plate; 733. a suction cup; 734. a negative pressure device; 800. a controller; 900. a turnover mechanism; 910. rotating the motor; 920. mounting a disc; 1000. a feeding manipulator.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any inventive step, are intended to be within the scope of the present invention.
Example 1
Referring to fig. 1 to 3, a sputtering coating apparatus for processing an infrared window includes an apparatus cavity 100, the apparatus cavity 100 may be made of a conductive material, and an insulating protective layer may be disposed on an outer side of the apparatus cavity for safety, wherein the apparatus cavity 100 is connected to a vacuum pumping device 200, the vacuum pumping device 200 pumps air into an apparatus housing to achieve an air pressure condition of sputtering coating, a radio frequency electrode 300 is disposed in the apparatus cavity 100, the radio frequency electrode 300 is electrically connected to a radio frequency power supply 400, a target 500 is disposed around the radio frequency electrode 300, the radio frequency power supply 400 supplies power to the radio frequency electrode 300, so that particles on a surface of the target 500 are sputtered and deposited on a surface of the window to form a coating, a magnetic element 600 for generating a magnetic field, a loading adsorption assembly 700 for adsorbing the window, and a controller 800 for controlling actions of each mechanism. In this embodiment, through setting up material loading adsorption component 700 can realize carrying out the material loading to the window automatically, can once plate a plurality of windows moreover, improve the coating film efficiency.
Specifically, the rf power supply 400 is fixed to the outside of the equipment chamber 100, the ground terminal thereof is connected to the feeding clamping component, the anode thereof is electrically connected to the rf electrode 300, and the equipment chamber 100 is connected to the ground. The rf electrode 300 provides rf voltage to the inside of the chamber 100, so that the gas discharge in the chamber generates plasma, and the ions therein are accelerated by the cathode electric field to bombard the target 500, so that the particles on the surface of the target 500 are sputtered and deposited on the surface of the window to form a coating.
In this embodiment, the rf electrode 300 is vertically installed inside the apparatus cavity 100 in a cylindrical shape, and the magnetic induction lines generated by the magnetic elements 600 are parallel or partially parallel to the axis of the rf electrode 300. With the arrangement, the excited target material 500 has surface particles which can be diffused to the circumferential side and can be sputtered onto a plurality of window sheets simultaneously, thereby improving the sputtering film coating efficiency.
Specifically, in order to facilitate the evacuation of the interior of the equipment chamber 100, in this embodiment, the evacuation device 200 is installed at the outer side of the upper portion of the equipment chamber 100, and the evacuation port thereof is communicated with the equipment chamber 100. Before sputter coating, the vacuum pumping device 200 is first started to pump air in the equipment cavity 100 to reach the air pressure condition of sputter coating.
Importantly, the loading adsorption assembly 700 in this embodiment includes a turntable 710 rotatably connected to the bottom of the equipment cavity 100, and further includes a driving member 720 disposed at the bottom of the equipment cavity 100 and driving the turntable 710 to rotate, the driving member 720 may be a motor, and the turntable 710 is provided with a plurality of adsorption members 730. Through setting up carousel 710, carousel 710 can rotate under the drive of driving piece 720, rotates to the material loading position after with the window to adsorb behind the 730 by adsorbing the piece 730, carousel 710 rotates to next station and carries out the material loading of next window and adsorb to can carry out sputter coating to a plurality of windows simultaneously.
Specifically, the adsorption member 730 includes an installation cavity 731 disposed on the rotary plate 710, the installation cavity 731 is communicated with a plurality of vertical hollow adsorption plates 732, the adsorption plates 732 are provided with a plurality of suction cups 733, and a negative pressure device 734 is disposed in the installation cavity 731. The negative pressure device 734 is arranged in the installation cavity 731, the suction cup 733 can adsorb the window sheet by starting the negative pressure device 734, the negative pressure device 734 is communicated with the inside of the equipment cavity 100, wherein the negative pressure device 734 can pump air in the installation cavity 731 to enable negative pressure to be formed in the installation cavity 731, and the window sheet is convenient to adsorb.
Preferably, an inductive switch 120 is arranged between the door body 110 and the equipment cavity 100, and the inductive switch 120 is electrically connected to the controller 800.
By adopting the technical scheme: the controller 800 is used for controlling the radio frequency power supply 400, the power supply of the magnetic element 600, the action of the vacuum pumping device 200 and the like, and after the feeding is finished, the door body 110 closes the touch inductive switch 120 to start the sputtering coating work.
Certainly, in order to facilitate loading, the present embodiment further includes a loading manipulator 1000, a door 110 is rotatably connected to the equipment chamber 100, and the loading manipulator 1000 is installed at the door 110 of the equipment chamber 100.
The preferred door body 110 department of well material position in this application, open door body 110 during the material loading, carousel 710 rotates to door body 110 position department, starts to rotate motor 910, rotates motor 910 and drives the outside upset of adsorption member 730, carries the window sheet to door body 110 department and laminating adsorption member 730 by material loading manipulator 1000, and adsorption member 730 adsorbs the window sheet and realizes the material loading, has removed manual operation from, has improved coating film efficiency.
Example 2
Referring to fig. 1 and 4, the present embodiment is different from embodiment 1 in that, in order to facilitate loading, the installation cavity 731 of the present embodiment is rotatably connected to the rotary plate 710 by the turnover mechanism 900.
The specific principle is as follows: because the relation of dislocation, when carrying out the material loading to the window, probably there is the problem of the inconvenient operation in position, through setting up tilting mechanism 900, can be so that adsorb 730 and rotate on carousel 710, make it rotate the outside towards the material loading position, the material loading resets after finishing, and the window one side of treating the coating film puts towards the central point of equipment cavity 100, and the problem of the material loading of being convenient for has been solved in the above-mentioned setting.
Specifically, tilting mechanism 900 is including setting up the rotation motor 910 at carousel 710 bottom avris, be equipped with mounting disc 920 on the output shaft of rotation motor 910, installation cavity 731 is installed on mounting disc 920. The rotating motor 910 is started to drive the installation cavity 731 to rotate, so that the adsorption piece 730 rotates, and the loading is facilitated.
The present invention is not limited to the above preferred embodiments, and any modifications, equivalent substitutions, improvements, etc. within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. The utility model provides an infrared window processing is with sputter coating equipment, which characterized in that, includes equipment cavity (100), equipment cavity (100) are connected with evacuating device (200), be equipped with radio frequency electrode (300) in equipment cavity (100), radio frequency electrode (300) electric connection radio frequency power supply (400), the week side of radio frequency electrode (300) is enclosed and is equipped with target (500), still including magnetic element (600) that are used for producing magnetic field and carry out absorbent material loading absorption assembly (700) to the window, still including controller (800) of the action of each mechanism of control.
2. The sputtering coating apparatus for infrared window processing according to claim 1, wherein the rf power source (400) is fixed outside the apparatus chamber (100), the ground terminal thereof is connected to the loading clamping assembly, the anode thereof is electrically connected to the rf electrode (300), and the apparatus chamber (100) is connected to the ground.
3. The sputtering coating equipment for infrared window processing according to claim 1, wherein the radio frequency electrode (300) is vertically installed inside the equipment cavity (100) in a cylindrical shape, and the magnetic induction lines generated by the magnetic elements (600) are parallel or partially parallel to the axis of the radio frequency electrode (300).
4. The sputtering coating equipment for infrared window processing according to claim 1, wherein the vacuum-pumping device (200) is installed outside the upper part of the equipment chamber (100), and the pumping port thereof is communicated with the equipment chamber (100).
5. The sputtering coating equipment for infrared window processing according to any one of claims 1 to 4, wherein the loading adsorption assembly (700) comprises a turntable (710) rotatably connected to the bottom of the equipment cavity (100), and further comprises a driving member (720) disposed at the bottom of the equipment cavity (100) for driving the turntable (710) to rotate, and the turntable (710) is provided with a plurality of adsorption members (730).
6. The sputtering coating device for infrared window processing according to claim 5, wherein the adsorption member (730) comprises an installation cavity (731) disposed on the turntable (710), the installation cavity (731) is connected to a plurality of hollow vertical adsorption plates (732), the adsorption plates (732) are provided with a plurality of suction cups (733), and the installation cavity (731) is provided with a negative pressure device (734).
7. The sputtering coating device for infrared window processing according to claim 6, wherein the mounting cavity (731) is rotatably connected to the turntable (710) by a turnover mechanism (900).
8. The sputtering coating apparatus for infrared window processing according to claim 7, wherein the turning mechanism (900) comprises a rotating motor (910) disposed at the bottom side of the rotating disc (710), an output shaft of the rotating motor (910) is provided with a mounting disc (920), and the mounting cavity (731) is mounted on the mounting disc (920).
9. The sputtering coating equipment for infrared window processing according to any one of claims 6 to 8, further comprising a feeding manipulator (1000), wherein the door body (110) is rotatably connected to the equipment cavity (100), and the feeding manipulator (1000) is installed at the door body (110) of the equipment cavity (100).
10. The sputtering coating equipment for infrared window processing according to claim 9, wherein an inductive switch (120) is arranged between the door body (110) and the equipment cavity (100), and the inductive switch (120) is electrically connected to the controller (800).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211552245.6A CN115772652A (en) | 2022-12-05 | 2022-12-05 | Sputtering coating equipment for processing infrared window piece |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211552245.6A CN115772652A (en) | 2022-12-05 | 2022-12-05 | Sputtering coating equipment for processing infrared window piece |
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| CN115772652A true CN115772652A (en) | 2023-03-10 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202211552245.6A Pending CN115772652A (en) | 2022-12-05 | 2022-12-05 | Sputtering coating equipment for processing infrared window piece |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2009066551A1 (en) * | 2007-11-19 | 2009-05-28 | Ebara-Udylite Co., Ltd. | Sputtering apparatus and film forming method |
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| CN102251224A (en) * | 2011-07-11 | 2011-11-23 | 中国科学院金属研究所 | Device and method for depositing film on SiC fiber surface |
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| JP6868929B1 (en) * | 2020-07-30 | 2021-05-12 | 株式会社シンクロン | Transfer device and film formation device using it |
| CN213203180U (en) * | 2020-06-09 | 2021-05-14 | 江苏菲沃泰纳米科技股份有限公司 | Sputtering coating equipment |
| CN115161597A (en) * | 2022-07-22 | 2022-10-11 | 深圳市一诺真空科技有限公司 | Substrate antibacterial preparation process, antibacterial substrate and coating equipment |
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2022
- 2022-12-05 CN CN202211552245.6A patent/CN115772652A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009066551A1 (en) * | 2007-11-19 | 2009-05-28 | Ebara-Udylite Co., Ltd. | Sputtering apparatus and film forming method |
| CN102234768A (en) * | 2010-04-30 | 2011-11-09 | 鸿富锦精密工业（深圳）有限公司 | Sputtering device |
| CN102251224A (en) * | 2011-07-11 | 2011-11-23 | 中国科学院金属研究所 | Device and method for depositing film on SiC fiber surface |
| CN108251816A (en) * | 2018-03-20 | 2018-07-06 | 嘉兴岱源真空科技有限公司 | A kind of high temperature resistant load-bearing workpiece rotating turret and nano material making apparatus |
| CN213203180U (en) * | 2020-06-09 | 2021-05-14 | 江苏菲沃泰纳米科技股份有限公司 | Sputtering coating equipment |
| JP6868929B1 (en) * | 2020-07-30 | 2021-05-12 | 株式会社シンクロン | Transfer device and film formation device using it |
| CN115161597A (en) * | 2022-07-22 | 2022-10-11 | 深圳市一诺真空科技有限公司 | Substrate antibacterial preparation process, antibacterial substrate and coating equipment |
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