CN115726018A - Electrodeposition system - Google Patents

Abstract

Embodiments of the present invention provide an electrodeposition system. The electrodeposition system includes: the electrodeposition liquid container is provided with an upper opening and is used for containing electrodeposition liquid; the heating container is arranged in the heating container, a heating medium is contained in the heating container, and the heating container is arranged to heat the heating medium so as to heat the electrodeposition liquid; the anode support is arranged on the electrodeposition liquid container and partially covers the opening of the electrodeposition liquid container, and is used for supporting an anode of the electrodeposition system; at least one cathode supporting device is arranged above the electrodeposition liquid container and used for supporting the cathodes, and the cathode supporting device is arranged to control the cathodes to rotate. According to the electrodeposition system provided by the embodiment of the invention, the cathode supporting device is used for controlling the plurality of cathodes to rotate, and the plurality of cathodes rotate to increase the disturbance of the electrodeposition liquid, so that the concentration distribution in the electrodeposition liquid is more uniform.

Description

Electrodeposition system

technical field

Embodiments of the present invention relate to the technical field of electrodeposition, and in particular to an electrodeposition system.

Background technique

Molybdenum-99 (Mo-99) is the most widely used medical radioisotope clinically in my country. In related technologies, when molybdenum-99 is obtained, uranium dioxide coating can be electrodeposited on the surface of the alloy tube through electrodeposition technology, and the alloy tube covered with uranium dioxide coating can be used as an irradiated target. Under the action of irradiation, the uranium in the uranium dioxide coating of the target is fissioned to form molybdenum-99, and then the molybdenum-99 is finally obtained through procedures such as dissolving the target and chemical separation.

However, when the uranium dioxide coating is electrodeposited on the surface of the alloy tube, the deposition ions are consumed at the interface of the alloy tube and the solution, so that the concentration of the electrodeposition solution may be uneven, resulting in concentration polarization and affecting the efficiency of electrodeposition.

Contents of the invention

In view of the above problems, an embodiment of the present invention provides an electrodeposition system. The electrodeposition system includes: an electrodeposition liquid container, an upper opening of the electrodeposition liquid container, and the electrodeposition container is used to hold the electrodeposition liquid; The container is set to heat the heating medium to heat the electrodeposition liquid; the anode support is arranged on the electrodeposition liquid container and partially covers the opening of the electrodeposition liquid container, and the anode support is used to support the anode of the electrodeposition system; at least one cathode The supporting device is arranged above the electrodeposition liquid container and is used to support multiple cathodes, and the cathode supporting device is configured to control the rotation of the multiple cathodes.

In the electrodeposition system provided by the embodiment of the present invention, the rotation of multiple cathodes is controlled by the cathode support device, and the cathodes are located in the electrodeposition solution. The rotation of multiple cathodes can stir the electrodeposition solution, increase the disturbance of the electrodeposition solution, and make the electrodeposition solution The concentration distribution is more uniform, thereby preventing the phenomenon of concentration polarization.

Description of drawings

The above and/or additional aspects and advantages of the present invention will become apparent and comprehensible from the description of the embodiments in conjunction with the following drawings.

FIG. 1 is a schematic structural view of an electrodeposition system according to an embodiment of the present invention.

Fig. 2 is a schematic structural diagram of an electrodeposition system according to another embodiment of the present invention.

Fig. 3 is a schematic structural diagram of an electrodeposition liquid container in an electrodeposition system according to an embodiment of the present invention.

Fig. 4 is a schematic structural diagram of a cathode supporting device of an electrodeposition system according to an embodiment of the present invention.

Fig. 5 is a schematic structural view of a support tube in a cathode support device according to an embodiment of the present invention.

FIG. 6 is a structural schematic diagram of another angle of the support tube in FIG. 5 .

FIG. 7 is a structural schematic diagram of another angle of the support tube in FIG. 6 .

FIG. 8 is a cross-sectional view of the support tube in FIG. 5 .

Fig. 9 is an exploded view of a rotating assembly in a cathode support device according to an embodiment of the present invention.

FIG. 10 is a structural schematic diagram of another angle of the cathode supporting device in FIG. 4 .

Fig. 11 is a schematic structural diagram of an electrodeposition system according to yet another embodiment of the present invention.

Fig. 12 is a structural block diagram of an electrodeposition liquid regulating component in an electrodeposition system according to an embodiment of the present invention.

Fig. 13 is a schematic structural diagram of an electrodeposition system provided with a circulation container and an electrodeposition liquid delivery device according to an embodiment of the present invention.

FIG. 14 is a schematic structural view of an electrodeposition system provided with an outer casing according to an embodiment of the present invention.

Fig. 15 is a schematic structural view of an outer casing in an electrodeposition system according to an embodiment of the present invention.

FIG. 16 is a structural schematic diagram of another angle of the outer casing in FIG. 15 .

FIG. 17 is a schematic diagram of another angle of the outer casing in FIG. 16 .

It should be noted that the drawings are not necessarily drawn to scale, and are only shown in a schematic manner that does not affect the understanding of those skilled in the art.

Detailed ways

The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the application shall have the usual meanings understood by those skilled in the art to which the application belongs. If the descriptions such as "first" and "second" are involved in the whole text, the descriptions such as "first" and "second" are only used to distinguish similar objects, and cannot be understood as indicating or implying their relative importance, sequence, etc. The order or the number of technical features indicated by implicit indication should be understood as "first", "second" and other described data can be interchanged under appropriate circumstances. If "and/or" appears throughout the text, it means to include three parallel plans, taking "A and/or B" as an example, including plan A, or plan B, or a plan that satisfies both A and B. In addition, for the convenience of description, spatially relative terms such as "above", "below", "top" and "bottom" may be used here, only to describe the space between one device or feature and other devices or features as shown in the figure. The positional relationship should be understood to also include different orientations in use or operation other than the orientation shown in the drawings.

Embodiments of the present invention provide an electrodeposition system. The electrodeposition system includes: an electrodeposition liquid container, an upper opening of the electrodeposition liquid container, and the electrodeposition container is used to hold the electrodeposition liquid; The container is set to heat the heating medium to heat the electrodeposition liquid; the anode support is arranged on the electrodeposition liquid container and partially covers the opening of the electrodeposition liquid container, and the anode support is used to support the anode of the electrodeposition system; at least one cathode The supporting device is arranged above the electrodeposition liquid container and is used to support multiple cathodes, and the cathode supporting device is configured to control the rotation of the multiple cathodes. Among them, multiple cathodes are used as cathodes of the electrodeposition system, and ions in the electrodeposition solution can be deposited on the surface of the cathodes.

In the electrodeposition system provided by the embodiments of the present invention, the rotation of multiple cathodes is controlled by the cathode support device, and the cathodes are located in the electrodeposition solution. The rotation of multiple cathodes can stir the electrodeposition solution, increase the disturbance of the electrodeposition solution, and make the electrodeposition solution The concentration distribution in the medium is more uniform, and the components are uniform, thereby preventing the phenomenon of concentration polarization.

The electrodeposition system provided by the embodiments of the present invention will be described in more detail below.

As shown in FIG. 1 and FIG. 2 , the electrodeposition system may include: an electrodeposition solution container 100 , a heating container 200 , an anode support 300 , a cathode support device 400 and other structures.

The electrodeposition solution container 100 is used for containing the electrodeposition solution. The upper part of the electrodeposition solution container 100 can be provided with an opening, that is, the electrodeposition solution container 100 is an open container, and the opening can be used for putting in and taking out the cathode 500 and the anode. In some embodiments, the electrodeposition solution container 100 may be in a pool structure to accommodate the electrodeposition solution. In some embodiments, the electrodeposition solution container 100 may be in a square shape to maximize space utilization.

In some embodiments, the electrodeposition system can be applied to the preparation of irradiation targets, that is, the alloy tube is used as the cathode, and the electrodeposition system in the embodiment of the present invention is used to electrodeposit uranium dioxide on the surface of the alloy tube to obtain irradiation The target is irradiated to produce molybdenum-99 by fission of uranium. Wherein, during the electrodeposition of uranium dioxide, the electrodeposition solution contains nitric acid, and the electrodeposition temperature reaches 90° C. Therefore, the electrodeposition solution container 100 can be made of acid-resistant and high-temperature-resistant materials, such as glass fiber reinforced plastic tank material, chemical ceramics , chemical enamel, quartz glass and other materials.

In some embodiments, the electrodeposition liquid container 100 can be made of polytetrafluoroethylene, and materials such as glass fiber reinforced plastic tanks, chemical ceramics, chemical enamel, and quartz glass are relatively brittle and not resistant to shock and vibration. In contrast, polytetrafluoroethylene Ethylene is resistant to acids and temperatures, is easy to process and is resistant to shock and vibration. In addition, PTFE also has good insulating properties, which further improves the safety of the electrodeposition system. In this embodiment, the electrodeposition liquid container is made of polytetrafluoroethylene material, which can meet the requirements of high temperature resistance, acid and alkali resistance, and insulation of the electrodeposition liquid container.

The heating container 200 is used for heating the electrodeposition liquid in the electrodeposition liquid container 100 . The electrodeposition liquid container 100 may be disposed in a heating container 200 formed with a space for accommodating the electrodeposition liquid container 100 . A heating medium is contained in the heating container 200 , and the heating container 200 can heat the heating medium, and then use the heating medium to indirectly heat the electrodeposition liquid in the electrodeposition liquid container 100 .

In this embodiment, the heating container 200 heats the electrodeposition liquid in the electrodeposition liquid container 100 through a heating medium, so as to provide more uniform heating temperature for different positions of the electrodeposition liquid container 100 . The heating medium may be a fluid medium, such as water, oil, and the like. In some embodiments, the heating medium can be oil, which has a higher boiling point than water, and can provide a higher heating temperature.

In some embodiments, the heating container 200 needs to provide a heating temperature within a predetermined range. For example, when preparing an irradiation target covered with uranium dioxide coating, the heating temperature of the electrodeposition solution may be about 90° C. Accordingly, in some embodiments, an electrodeposition system may include a temperature measurement device and a heating controller. The temperature measuring device is arranged on the heating container 200 for measuring the temperature of the heating container 200, and the heating controller is connected with the heating container 200 and the temperature measuring device for controlling the heating of the heating container 200 according to the temperature measured by the temperature measuring device. By setting a temperature measuring device and a heating controller, the temperature of the heating container 200 can be controlled within a predetermined range, so as to control the temperature of the electrodeposition solution to be kept within a predetermined range, so as to ensure normal progress of electrodeposition.

The electrodeposition system has an anode and a cathode, and the anode and cathode of the electrodeposition system are inserted into the electrodeposition liquid to form a potential difference in the electrodeposition liquid to realize electrodeposition. In this embodiment, the anode support 300 is used to support the anode of the electrodeposition system. The anode support 300 is disposed on the electrodeposition liquid container 100 and partially covers the opening of the electrodeposition liquid container 100 , so that the anode of the electrodeposition system can be inserted into the electrodeposition liquid through the opening. The anode supporter 300 may be disposed in the middle of the electrodeposition liquid container 100 to place the anode in the middle of the electrodeposition liquid container 100 . There can be multiple cathodes in the electrodeposition system, and the multiple cathodes can be divided into multiple groups and arranged on both sides of the anode, so as to conduct electrodeposition on multiple cathodes at the same time, which improves the efficiency of electrodeposition.

Specifically, the anode support member 300 can be a cover plate arranged on the electrodeposition liquid container 100, which covers a part of the opening of the electrodeposition liquid container 100, and a socket can be provided on the cover plate, and the anode can be inserted into the socket, and then Insert into the electrodeposition solution for work.

The cathode supporting device 400 is used to support the cathode 500, and the number of the cathode 500 may be one or multiple, for example, the cathode supporting device 400 may support 16 cathodes 500, which is not limited in the present invention. When the cathode supporting device 400 supports multiple cathodes 500, electrodeposition can be performed on the multiple cathodes 500 at the same time, so as to improve the efficiency of electrodeposition. The cathode 500 can be made of conductive material. For example, the cathode 500 can be made of metal. When the cathode 500 is electrodeposited with uranium dioxide coating to prepare the irradiation target, the cathode 500 can be made of alloy, such as zirconium alloy. The shape of the cathode 500 can be tubular, and the tubular cathode 500 can have a hollow cavity. Of course, the cathode 500 can also be in other shapes, which is not limited in the present invention.

It should be noted that the cathode support device 400 described in the embodiment of the present invention is described as supporting the cathode in the electrodeposition system for electrodepositing uranium dioxide, but it can be understood that the cathode support device described in the embodiment of the present invention The structure of 400 is not limited by the polarity of the electrodes. When the structure of the cathode support device 400 is used in other electrodeposition systems, the cathode support device 400 can also be used to support the anode. That is to say, the cathode supporting device 400 can not only support the cathode of the electrodeposition system, but also support the anode of the electrodeposition system.

The number of cathode supporting devices 400 may be one or multiple, for example, four cathode supporting devices 400 may be provided, which is not limited in the present invention. When multiple cathode supporting devices 400 are provided, more cathodes 500 can be electrodeposited at the same time, further improving the efficiency of electrodeposition.

In some embodiments, the cathode supporting device 400 is configured to control the rotation of a plurality of cathodes 500, that is, when the cathode 500 is supported on the cathode supporting device 400, the cathode 500 can surround the cathode 500 under the action of the cathode supporting device 400 Outer axis rotation. The cathode 500 may be partially or fully immersed in the electrodeposition solution. In this embodiment, the rotation of multiple cathodes 500 is controlled by the cathode supporting device 400, and the cathodes 500 are located in the electrodeposition solution. The rotation of multiple cathodes 500 can increase the disturbance of the electrodeposition solution and make the concentration distribution in the electrodeposition solution more uniform. , The composition is uniform, so as to prevent the phenomenon of concentration polarization and ensure the normal progress of electrodeposition.

As shown in FIG. 3 , in some embodiments, in order to further prevent concentration polarization, a magnetic stirring part 110 may be provided in the electrodeposition solution container 100, and a magnetic driving part may be provided at the bottom of the heating container 200. The magnetic driving part It is set to drive the magnetic stirring part 110 to rotate by magnetic force. By setting the magnetic stirring part 110 and driving the magnetic stirring part 110 to rotate through the magnetic drive part to stir the electrodeposition liquid, the disturbance of the electrodeposition liquid in the electrodeposition liquid container 100 can be further strengthened, so that the electrodeposition liquid in the electrodeposition liquid container 100 The concentration distribution of the deposition solution is uniform and the components are uniform, which can eliminate the concentration polarization and ensure the normal progress of electrodeposition. In addition, the magnetic driving part is set to drive the magnetic stirring part 110 to rotate through magnetic force, which can avoid opening holes in the bottom of the electrodeposition liquid container 100, thereby increasing the sealing performance of the bottom of the electrodeposition liquid container 100 and preventing leakage of the electrodeposition liquid.

As shown in Figure 3, in some embodiments, the magnetic stirring part 110 can be circular, and the circumferential direction of the magnetic stirring part 110 can be provided with a plurality of paddles, to increase the stirring performance of the magnetic stirring part 110, a plurality of paddles It can be uniformly distributed in the circumferential direction of the magnetic stirring part 110 to ensure the stability of the rotation of the magnetic stirring part 110 . In some embodiments, the magnetic stirring part 110 is made of polytetrafluoroethylene, which can resist high temperature and acid and alkali corrosion.

As shown in FIG. 4 , in some embodiments, the cathode support device 400 may include a connecting member 410 and a rotating assembly 420 . Among them, a plurality of cathodes 500 are connected to the connector 410, and the connector 410 is used to connect with a power source to supply power to the cathode 500; the rotating assembly 420 is connected to the connecting member 410, and the rotating assembly 420 is used to drive the connecting member 410 to rotate to drive the cathode 500 in the Rotate in the electrodeposition solution.

Specifically, the rotating assembly 420 can be drivingly connected with the connecting member 410 and drive the connecting member 410 to rotate. The connecting piece 410 may be in the shape of a disk, and the connecting piece 410 can rotate around its own axis driven by the rotating component 420 . In this embodiment, the connector 410 keeps the plurality of cathodes 500 connected together in a relatively static manner, and the connector 410 can drive the plurality of cathodes 500 to rotate with the rotation of the connector 410, that is, the plurality of cathodes 500 surround The axis of the link 410 rotates. The connecting piece 410 can be a conductor, for example, the material of the connecting piece 410 can be metal, and the connecting piece 410 can also be directly or indirectly electrically connected to the power supply, so that the power of the power supply can be transferred to the cathode 500 through the connecting piece 410 .

In some embodiments, the cathode support device 400 further includes a support tube 430 for supporting the cathode 500 , and the support tube 430 is fixedly connected to the connector 410 so that the cathode 500 can be connected to the connector 410 . The number of support tubes 430 can be the same as the number of cathodes 500, and the number of support tubes 430 can be multiple, and the plurality of support tubes 430 can be evenly distributed along the circumferential direction of the connector 410, so as to achieve uniformity on multiple cathodes 500. Electrodeposition.

As shown in FIGS. 5 and 6 , in some embodiments, the cathode 500 is tubular, the support tube 430 is elastic, and the support tube 430 is configured to shrink radially inward to extend into the cathode 500 , and the cathode 500 The inner supports the cathode 500 by virtue of the radially outward restoring force. The cathode support device 400 provided in this embodiment supports the cathode 500 inside the tubular cathode 500 through the radially outward tension of the support tube 430, so that the support tube 430 supports the cathode 500 from the inside of the tube, so that the cathode 500 can be used during electrodeposition. The outer surface of the cathode 500 is fully plated, which improves the utilization rate of the cathode 500 .

In this embodiment, the support tube 430 can be elastically deformed along the radial direction of the support tube 430. Specifically, when the tubular cathode 500 needs to be installed on the support tube 430, the support tube 430 can be made to deform along the radial direction of the support tube 430. Elastic deformation occurs inward, and the diameter of the support tube 430 becomes smaller. At this time, the diameter of the support tube can be smaller than the inner diameter of the tubular cathode 500 , and the support tube 430 can enter the lumen of the cathode 500 . After the support tube 430 enters the lumen of the cathode 500, the support tube 430 can generate a restoring force radially outward along the support tube 430, and at this time, the support tube 430 can exert an elastic restoring force radially outward on the inner wall of the cathode 500 , to support the cathode 500 , so that the cathode 500 is fixed on the support tube 430 .

In addition, it should be noted that the support tube 430 in the embodiment of the present invention can be a conductor, for example, the support tube 430 can be made of stainless steel, and in other embodiments, the material of the support tube 430 can be other metals or alloys. The electric energy of the power supply can be conducted to the support tube 430 through the connecting piece 410 , and then to the cathode 500 through the support tube 430 , so as to realize the power supply of the power supply to the cathode 500 . In some embodiments, the cathode supporting device 400 can support the tubular cathode 500 involved in other electrodeposition processes, which is not limited in the present invention.

In some embodiments, the support tube 430 is provided with a plurality of linear notches 431 , and the linear notches 431 extend to one end of the support tube 430 along the axial direction of the support tube 430 . A plurality of linear gaps 431 can extend from the middle of the support tube 430 to one end of the support tube 430 in the axial direction of the support tube 430. The linear gaps 431 divide the tube wall of the support tube 430 into a plurality of sub-tube walls 432. The sub-tube walls 432 A certain angle can be opened outward along the radial direction of the support tube 430, and one end of the plurality of sub-tube walls 432 is connected to the part of the support tube 430 that is not divided by the linear gap 431, and the other end of the sub-tube wall 432 forms a free end. The free end of the wall 432 can be elastically deformed in the radial direction of the support tube 430 so that the support tube 430 can support the cathode 500 inside the tube.

As shown in FIG. 7 , in some embodiments, a plurality of linear notches 431 are evenly distributed along the circumferential direction of the support tube 430 . The widths of the plurality of linear notches 431 can be the same, and the plurality of linear notches 431 are evenly distributed along the circumferential direction of the support tube 430, so that a plurality of sub-tube walls 432 with uniform width can be divided, and the sub-tube walls 432 with uniform width have the same deformation amount. In the case of , almost the same elastic recovery force can be generated, so that the cathode 500 is subjected to a more uniform force, preventing damage to the cathode 500, and can also make the friction between the support tube 430 and the inner wall of the cathode 500 more uniform, so that the support tube 430 The fixing effect on the cathode 500 is better.

In some embodiments, the support tube 430 is provided with a protrusion 433 protruding from the outer surface of the support tube 430 for increasing the friction between the support tube 430 and the cathode 500 . The raised portion 433 may be disposed on a portion of the support tube 430 capable of contacting the inner wall of the cathode 500 , for example, the raised portion 433 may be disposed on the sub-tube wall 432 . By providing the raised portion 433, the friction force between the support tube 430 and the inner wall of the cathode 500 can be increased, so that the fixing between the support tube 430 and the cathode 500 is more stable; at the same time, the raised portion 433 can also prevent the friction force from If it is too tight, the insertion and removal of the cathode 500 will be affected.

In some embodiments, the protrusion 433 is an annular protrusion, and the linear notch 431 passes through the annular protrusion. The annular protrusion can be arranged coaxially with the support tube 430. Since the linear notch 431 passes through the annular protrusion, a complete annular protrusion can be divided into multiple sub-protrusions by multiple linear notches 431, and the same annular protrusion can be divided into sub-protrusions. A plurality of sub-protrusions are arranged on different sub-pipe walls 432 respectively. By arranging the annular protrusion, the elastic restoring force on the cathode 500 can be distributed more uniformly in the circumferential direction.

In some embodiments, there are multiple protrusions 433 , and the plurality of protrusions 433 are uniformly arranged along the axial direction of the support tube 430 . By arranging a plurality of protrusions 433 evenly along the axial direction of the support tube 430, the elastic restoring force received by the cathode 500 can be distributed more uniformly in the axial direction, and at the same time, the distance between the support tube 430 and the inner wall of the cathode 500 can be increased. Friction, so that the connection between the support tube 430 and the cathode 500 is more stable.

In some embodiments, the support tube 430 is further provided with a positioning portion 434, the raised portion 433 is located between the end of the support tube 430 away from the connecting piece 410 and the positioning portion 434, and the positioning portion 434 protrudes from the outer surface of the support tube 430 , and the outer diameter of the positioning portion 434 is larger than the inner diameter of the cathode 500 , which is used to define the installation position of the cathode 500 . The positioning part 434 in this embodiment is located between the connector and the raised part 433, and the outer diameter of the positioning part 434 is larger than the inner diameter of the cathode 500. When the support tube 430 is inserted into the cathode 500 to a certain depth, the tube of the cathode 500 can The opening interferes with the positioning part 434, and the positioning part 434 limits the axial movement of the support tube 430 along the cathode 500, so that the support tube 430 can no longer be inserted into the cathode 500, so that the depth of the support tube 430 inserted into the cathode 500 can be controlled, and then The depth of the cathode 500 in the electrodeposition solution can be controlled by controlling the height of the support tube 430 .

As shown in FIG. 8 , in some embodiments, the linear notch 431 passes through the positioning portion 434 and extends to a side of the positioning portion 434 away from the raised portion 433 . The linear gap 431 passes through the positioning part 434, and the positioning part 434 can be divided into multiple sub-positioning parts. The sub-positioning parts formed by the division of the positioning part 434 can be respectively arranged on different sub-tube walls 432, so that the positioning part 434 is also elastic. When the cathode 500 needs to be detached from the support tube 430 , the elastic positioning portion 434 can be pressed to make the cathode 500 easy to pull out from the support tube 430 . At the same time, the linear notch 431 passes through the positioning portion 434 and extends to the side of the positioning portion 434 away from the raised portion 433 , which is beneficial to adjust the elasticity of the support tube 430 and generate greater friction between the support tube 430 and the cathode 500 .

In some embodiments, the support tube 430 is provided with a mounting portion 435 , and the mounting portion 435 is disposed at the other end of the support tube 430 away from the linear notch 431 . Moreover, the connecting piece 410 is provided with a mounting hole, and the mounting portion 435 is inserted into and fixed in the mounting hole, so that the support tube 430 can be detachably connected to the connecting piece 410 through the mounting portion 435 . The installation part 435 may be a cylinder formed at one end of the support tube 430 , and the diameter of the cylinder matches the diameter of the installation hole, so that the support tube 430 is mounted on the connecting piece 410 .

As shown in FIG. 9 , multiple mounting holes are provided on the connecting piece 410 for connecting multiple support tubes 430 . For example, 16 support tubes 430 may be connected to the connecting member 410 . Through this arrangement, multiple cathodes 500 can be installed on one connector 410 to simultaneously use multiple cathodes 500 for electrodeposition to improve electrodeposition efficiency; at the same time, multiple cathodes 500 can be installed on one connector 410, The stirring effect of the cathode 500 on the electrodeposition liquid can be improved. In some embodiments, a plurality of installation holes may be provided on the connecting member 410 near the edge, and the plurality of installation holes are evenly distributed along the circumferential direction of the connecting member 410 .

As shown in FIGS. 9 and 10 , in some embodiments, the cathode support device 400 further includes a mounting plate 440 . The mounting plate 440 partially covers the opening of the electrodeposition liquid container 100 , so as to cover the opening of the electrodeposition liquid container 100 together with the anode support to prevent the electrodeposition liquid from splashing out. At least one rotating component 420 is mounted on the mounting plate 440 , and the rotating component 420 mounted on the mounting plate 440 can drive the connecting member 410 to rotate.

In some embodiments, the rotating assembly 420 includes a drive motor 421 and a rotating shaft 422 . The driving motor 421 is arranged on the mounting plate 440, the mounting plate 440 is provided with a shaft hole, the rotating shaft 422 passes through the shaft hole and is rotatably connected in the shaft hole, one end of the rotating shaft 422 is fixedly connected with the connector 410, and the other end is connected with the driving The motor 421 is connected, and the driving motor 421 is used to drive the rotating shaft 422 to rotate to drive the connecting member 410 to rotate. As shown in FIG. 11 , in some embodiments, a plurality of rotating assemblies 420 are installed on a mounting plate 440. By installing a plurality of rotating assemblies 420 on one mounting plate 440, multiple sets of cathodes 500 can be further installed, for example, each Two rotating assemblies can be installed on the mounting plate 440 to improve the efficiency of electrodeposition.

In some embodiments, the rotating assembly 420 further includes a motor bracket 423 and a coupling 424 . The drive motor 421 is arranged on the motor bracket 423, and the motor bracket 423 is fixedly connected on the mounting plate 440, and an accommodation space is formed between the motor bracket 423 and the installation plate 440; the shaft coupling 424 is arranged in the accommodation space, and the shaft coupling 424 It is connected between the output shaft of the driving motor 421 and the rotating shaft 422 . The motor bracket 423 is used to support the driving motor 421 , and at the same time, an accommodating space for accommodating the coupling 424 is formed between the driving motor 421 and the mounting plate 440 . It can be understood that since the electrodeposition liquid container 100 has a relatively high temperature, and the rotating shaft 422 adjacent to the electrodeposition liquid container 100 also has a relatively high temperature, the rotating shaft 422 may be deformed due to thermal expansion, thereby being inconsistent with the driving motor 421 A displacement difference is generated between the output shafts. By setting a coupling 424 between the output shaft of the driving motor 421 and the rotating shaft 422, the displacement difference between the driving motor 421 and the rotating shaft 422 can be compensated, and the driving motor 421 and the driving motor 421 caused by the displacement difference can be alleviated. The additional load between the output shafts can also compensate for the offset between the two shafts due to inaccurate manufacturing and installation.

In some embodiments, the rotating assembly 420 further includes a bearing seat 425 and a bearing 426 . The bearing seat 425 is fixedly connected in the shaft hole on the mounting plate 440 , the bearing 426 is installed in the bearing seat 425 , and the rotating shaft 422 is connected in the bearing 426 . By arranging the bearing 426, the resistance when the rotating shaft 422 rotates in the shaft hole of the installation seat is reduced, and the bearing seat 425 is used to fix the bearing 426 in the shaft hole.

In some embodiments, the rotating assembly 420 further includes a bearing seat cover 427 , which is fixedly connected to the bearing seat 425 , and a space for accommodating the bearing 426 is formed between the bearing seat cover 427 and the bearing seat 425 . An annular fixing plate protrudes radially outward from one end of the bearing seat 425 . The diameters of the bearing seat cover 427 and the annular fixing plate can be larger than the diameter of the shaft hole, so as to realize the limit of the bearing seat 425 on the mounting plate 440 . Specifically, the corresponding positions of the bearing seat cover 427 and the annular fixing plate are provided with through holes, and fasteners can be used to fix the bearing seat cover 427 and the bearing seat 425 on the mounting plate 440, and the bearing seat cover 427 and the annular fixing plate are respectively Located on both sides of the mounting plate 440 .

In some embodiments, a protrusion is formed at one end of the rotating shaft 422 , and the connecting member 410 can be supported on the protrusion to realize the positioning between the connecting member 410 and the rotating shaft 422 . The rotating shaft 422 passes through the connecting piece 410 , the bearing seat 425 , the bearing 426 , the bearing seat cover 427 , and the nut 428 sequentially, and the other end of the rotating shaft 422 is fixed to the coupling 424 through the nut 428 . After one end of the rotating shaft 422 is fixed by the nut 428 , there is a part protruding from the nut 428 , and the part of the rotating shaft 422 protruding from the nut 428 is connected with the coupling 424 .

As shown in FIG. 10 , in some embodiments, the cathode support device 400 further includes a lifting assembly 450 . The lifting assembly 450 is connected with the mounting plate 440 for driving the mounting plate 440 and driving the connecting member 410 to move along the axial direction of the rotating shaft 422 . Wherein, when the lifting assembly 450 controls the mounting plate 440 to move downward until the mounting plate 440 covers a part of the opening of the electrodeposition liquid container 100 , the cathode 500 is immersed in the electrodeposition liquid. The lifting assembly 450 can drive the cathode 500 to move up and down, so as to facilitate the installation and disassembly of the cathode 500 .

The lifting assembly 450 is fixedly connected to the mounting plate 440, the lifting assembly 450 can drive the mounting plate 440 to move along the axial direction of the rotating shaft 422, and the mounting plate 440 moves along the axial direction of the rotating shaft 422 to further drive the connecting member 410 and the mounting plate 410 to be installed on the connecting member. The cathode 500 on the component 410 moves along the axial direction of the rotating shaft 422 . When the mounting plate 440 covers a part of the opening of the electrodeposition liquid container 100 , the cathode 500 is soaked in the electrodeposition liquid, thereby realizing electrodeposition on the cathode 500 . In addition, because in the embodiment of the present invention, the cathode 500 rotates and stirs the electrodeposition liquid, the electrodeposition liquid may splash out of the electrodeposition liquid container 100, therefore, the mounting plate 440 covers part of the opening of the electrodeposition liquid container 100, Electrodeposition liquid can be prevented from splashing out.

As shown in FIG. 4 , in some embodiments, the lifting assembly 450 includes a support plate 451 , a lifting driving member 452 and a sliding member 453 . The quantity of supporting plate 451 can be two, and lifting driving part 452 is fixed between two supporting plates 451, and sliding part 453 is fixedly connected with mounting plate 440, and lifting driving part 452 is driven and connected with sliding part 453, and lifting driving part 452 uses The sliding member 453 is driven to move on the lifting driving member 452 to drive the mounting plate 440 to move along the axial direction of the rotating shaft 422 . The supporting plate 451 is used for installing the lifting driving member 452 and can install the lifting assembly 450 on the carrying device of the electrodeposition system. The two supporting plates 451 can better fix the lifting driving member 452 . The sliding part 453 of the lifting assembly 450 is fixedly connected with the mounting plate 440 , and the lifting driving part 452 drives the sliding part 453 to move on the lifting driving part 452 , and then drives the mounting plate 440 to move through the sliding part 453 . Specifically, in this embodiment, the lifting driving member 452 may be a cylinder.

In some embodiments, the lifting assembly 450 further includes: at least two guide rods 454 fixedly connected between the two support plates 451; wherein the guide rods 454 pass through the slider 453, and the lifting driver 452 is used to drive the slider 453 moves along guide bar 454. The guide rod 454 is used for guiding the movement of the sliding member 453 on the lifting driving member 452 . By providing two guide rods 454 and passing the two guide rods 454 through the slider 453 , the slider 453 can be prevented from rotating about the axis of the guide rod 454 . The lifting driving part 452 can be arranged between the two guide rods 454, so that when the sliding part 453 moves on the lifting driving part 452, the balance on both sides of the sliding part 453 can be maintained.

In another embodiment of the lifting assembly 450, the lifting assembly 450 includes: two support plates 451; at least two guide rods 454, fixedly connected between the two support plates 451, the guide rods 454 are arranged parallel to the rotating shaft 422; A member 453 is slidably connected to at least two guide rods 454. The slider 453 is fixedly connected to the mounting plate 440. The sliding member 453 is configured to slide on the guide rods 454 to drive the mounting plate 440 along the axial direction of the rotating shaft 422. direction movement; the transmission part, the two ends of the transmission part are rotatably connected to the two support plates 451, the sliding part 453 has a transmission matching part that matches the transmission part, and the rotation of the transmission part passes through the connection between the transmission part and the transmission part. Cooperate to drive the sliding part 453 to move along the connecting rod; the lifting driving part is installed on the support plate 451, and the lifting driving part is drivingly connected with the transmission part, and the lifting driving part is used to drive the transmission part to rotate. Specifically, the transmission member may be a screw or lead screw, and the transmission matching portion is a screw hole provided on the sliding member 453 .

As shown in FIG. 12 , in some embodiments, the electrodeposition system further includes a power supply and an electrodeposition liquid regulating assembly. The power supply is connected to the anode and the cathode 500 for powering the anode and the cathode 500 . The electrodeposition liquid regulating component is connected with the electrodeposition liquid container 100, and is used for monitoring and adjusting the acidity of the electrodeposition liquid.

In the process of electrodeposition, the cathode of the electrodeposition system will generate a large amount of hydrogen and produce a large amount of OH ^- , and the cations in the solution, such as U ions, will combine with the OH ^- in the solution to form hydroxide, and the hydroxide will eventually be The form of oxide is deposited on the cathode, which affects the normal progress of electrodeposition. Therefore, in the process of electrodeposition, it is necessary to detect and adjust the pH value of the electrodeposition solution. The electrodeposition system provided by the embodiment of the present invention has an electrodeposition liquid adjustment component, which can detect and adjust the pH value of the electrodeposition liquid, so as to keep the pH value of the electrodeposition liquid stable.

In some embodiments, the electrodeposition solution regulation assembly includes an acidity monitoring unit 610 and an acidity controller 620 . The acidity monitoring unit 610 is connected to the electrodeposition liquid container 100 and configured to monitor the acidity of the electrodeposition liquid in real time. The acidity controller 620 is connected with the acidity monitoring part 610, and the acidity controller 620 is set to collect the acidity data monitored by the acidity monitoring part 610 in real time and control the acidity of the electrodeposition solution according to the acidity data. In this embodiment, the acidity monitoring part 610 is used to monitor the acidity of the electrodeposition solution in real time and generate the acidity data of the electrodeposition solution. The acidity controller 620 collects the acidity data of the electrodeposition solution, and based on the acidity data of the electrodeposition solution The acidity of the liquid is controlled. The acidity controller 620 can preset a control program to control the acidity of the electrodeposition solution within a predetermined range, and the acidity control can be automatically performed by the acidity controller 620 .

In some embodiments, the electrodeposition liquid regulating assembly further includes an acid liquid storage container 640 , an alkali liquid storage container 650 and an acid and alkali liquid delivery device 630 . The acid solution storage container 640 is used for storing acid solution, the lye solution storage container 650 is used for storing lye solution, the acid solution delivery device 630 is connected to the electrodeposition solution container 100, and is connected with the acid solution storage container 640 and the lye solution storage container 650 , the acid and alkali solution delivery device 630 can selectively deliver the alkaline solution or the acid solution to the electrodeposition solution container 100 . Wherein, the acid-base solution delivery device 630 is also connected to the acid controller 620 , and the acid controller 620 is used to control the acid-base solution delivery device 630 to deliver acid solution or lye solution to the electrodeposition solution container 100 according to the acidity data. In this embodiment, the acid and alkali solution delivery device 630 may be a peristaltic pump.

The acid-base solution delivery device 630 is connected to the electrodeposition solution container 100, and is connected with the acid solution storage container 640 and the lye solution storage container 650, the acid-base solution delivery device 630 and the acid solution storage container 640 and the lye solution storage container 650 A control valve may be provided on the pipeline, and the acid-alkali delivery device 630 may selectively and quantitatively deliver the acid solution in the acid solution storage container 640 or the lye solution in the lye solution storage container 650 to the electrodeposition solution container 100, To adjust the acidity of the electrodeposition solution. The acidity controller 620 can control the working state of the acid-base liquid delivery device 630 and the control valve based on the acidity data collected by the acidity detector.

In some embodiments, the acidity controller 620 is further configured to: compare the preset acidity value of the electrodeposition solution with the current acidity of the electrodeposition solution monitored by the acidity monitoring unit 610 . In this embodiment, the preset acidity value may be a preset pH value, and the acidity monitoring unit 610 may monitor the pH value of the electrodeposition solution. When the acidity of the electrodeposition solution is lower than the predetermined acidity value, that is, when the pH value of the electrodeposition solution is greater than the preset pH value, the acid-base solution delivery device 630 is controlled to deliver the acid solution into the electrodeposition solution container 100 . When the acidity of the electrodeposition solution is higher than the preset acidity value, that is, when the pH value of the electrodeposition solution is lower than the preset pH value, the acid-base solution delivery device 630 is controlled to deliver the alkali solution into the electrodeposition solution container 100 .

Specifically, when the acidity controller 620 judges that the acidity of the electrodeposition solution is too low based on the acidity data and the preset acidity value, it can control the acid-base solution delivery device 630 and the control valve to realize the acid solution storage container 640 and the electrodeposition solution container 100 and make the acid solution in the acid solution storage container 640 enter the electrodeposition solution container 100 to improve the acidity of the electrodeposition solution; When it is high, the acid-base liquid conveying device 630 and the control valve can be controlled to realize the communication between the lye storage container 650 and the electrodeposition liquid container 100, and the lye in the lye liquid storage container 650 can enter the electrodeposition liquid container 100, so as to Increase the alkalinity of the electrodeposition solution.

In some embodiments, after starting to deliver acid or alkali to the electrodeposition solution container 100, the acidity controller 620 is further configured to: determine whether the acidity of the electrodeposition solution reaches a preset acid value, and when the acidity of the electrodeposition solution reaches When the acidity value is preset, the acid-alkali delivery device 630 is controlled to stop delivering acid or lye. The acidity monitoring unit 610 monitors the acidity of the electrodeposition solution in real time, and therefore, real-time changes in the acidity of the electrodeposition solution can be obtained. To prevent excessive delivery of acid or lye, when the acidity data of the electrodeposition solution monitored in real time by the acidity monitoring unit 610 reaches a preset acid value, the acid and lye delivery device 630 is controlled to stop delivering acid or lye.

As shown in FIG. 12 and FIG. 13 , in some embodiments, the electrodeposition system further includes a circulation container 660 and an electrodeposition liquid delivery device 670 . The circulation container 660 is used to store the electrodeposition liquid; the electrodeposition liquid delivery device 670 is connected between the circulation container 660 and the electrodeposition liquid container 100, and is used to drive the electrodeposition liquid to circulate between the electrodeposition liquid container 100 and the circulation container 660 . By driving the electrodeposition liquid to circulate and flow between the electrodeposition liquid container 100 and the circulation container 660, the composition of the electrodeposition liquid can be made more uniform, and the electrodeposition efficiency can be further improved.

In some embodiments, the circulation container 660 is arranged above the electrodeposition liquid container 100, and the electrodeposition liquid in the circulation container 660 flows to the electrodeposition liquid container 100 by its own gravity; The electrodeposition liquid in the liquid container 100 is sent to the circulation container 660 . With this arrangement, it is only necessary to transport the electrodeposition liquid in the electrodeposition liquid container 100 to the circulation container 660 , and the electrodeposition liquid in the circulation container 660 can naturally flow back to the electrodeposition liquid container 100 . In this embodiment, the electrodeposition liquid delivery device 670 may be a peristaltic pump.

As shown in FIG. 12 , in some embodiments, a filter device 680 is provided between the electrodeposition solution container 100 and the circulation container 660 for filtering solid precipitation in the electrodeposition solution. During the electrodeposition process, solid precipitation may be generated in the electrodeposition solution. By setting the filter device 680, the solid precipitation in the electrodeposition solution can be filtered out to prevent the solid precipitation from affecting the electrodeposition process.

In some embodiments, a circulation pipeline is provided between the electrodeposition liquid container 100 and the circulation container 660, the electrodeposition liquid delivery device 670 is disposed on the circulation pipeline; the filter device 680 is detachably disposed on the circulation pipeline. After the filter device 680 is used for a period of time, the filter performance will decrease. Therefore, in this embodiment, the filter device 680 is detachably arranged in the circulation pipeline, which can facilitate the replacement of the filter device 680 .

As shown in FIG. 14 , in some embodiments, the electrodeposition system further includes an outer housing 700 . The outer casing 700 forms a closed chamber. Wherein, the electrodeposition liquid container 100, the anode support 300 and the cathode support device 400 are arranged inside the chamber, and the power supply is arranged outside the chamber. In some embodiments, the electrodeposition system further includes an outer shell support 800 on which the outer shell 700 is disposed, and the outer shell support 800 is used to support the outer shell 700 .

During the electrodeposition of uranium dioxide, the main component of the electrodeposition solution is uranyl nitrate, which is corrosive and irritating to the eyes, skin and mucous membranes; in addition, uranium is radioactive and may affect the electrodeposition system. Radiation injury to the operator. Therefore, in this embodiment, the electrodeposition system further includes an outer casing 700, which forms a closed chamber, and the electrodeposition solution container 100, the anode support 300 and the cathode support device 400 are arranged in the outer casing 700 to Prevent the damage caused by the electrodeposition liquid to the operator.

It can be understood that the chamber of the outer casing 700 has limited space and there is radioactive contamination in the chamber. Therefore, only necessary structures are arranged in the chamber, and structures such as a power supply are arranged outside the chamber to save space in the chamber, and Prevent the power supply and other structures from being polluted, and also facilitate the control and operation of the power supply and other structures.

In some embodiments, in order to heat the electrodeposition liquid in the electrodeposition liquid container 100 , the heating container 200 may be arranged in the chamber. In some embodiments, one or more of the heating controller, the acid controller 620 and the electrodeposition liquid delivery device 670 are located outside the chamber to facilitate operation and prevent radioactive contamination.

In some embodiments, the power supply can be a programmable power supply, and the current of the programmable power supply can be precisely adjusted. For example, the current resolution of the programmable power supply can be 1mA. By programming the programmable power supply, the current of the power supply during electrodeposition can be controlled. Current output, and automatically adjust the current over time to improve the quality of electrodeposition.

As shown in Figure 15 and Figure 16, in some embodiments, the outer shell 700 is provided with an interface 710, and the operating gloves are sealed and connected to the interface 710, and the operating gloves are used for the operator to operate in the outer shell 700; the outer shell 700 An observation window 720 is provided on the cathode 500 for observing the operation and the electrodeposition reaction of the electrodeposition solution on the cathode 500 . The number of interfaces 710 provided on the outer casing 700 may be two, and the two interfaces 710 are respectively sealed and connected with operating gloves, through which the operator operates the structure inside the outer casing 700 . The observation window 720 provided on the outer casing 700 can be inclined, which is convenient for the operator to observe while operating. In some embodiments, the observation window 720 may be made of glass.

As shown in Figure 17, the outer casing 700 can also be provided with a door 730, the door 730 can be arranged on the side of the outer casing 700, the door 730 can be rotatably connected with the outer casing 700, so as to open or close the outer casing 700, so that The assembly and disassembly of components inside the outer housing 700 facilitates the insertion and removal of the cathode 500 before and after electrodeposition.

Regarding the embodiments of the present application, it should also be noted that, under the condition of no conflict, the embodiments of the present application and the features in the embodiments can be combined with each other to obtain new embodiments.

The above is only an embodiment of the present invention, and does not limit the patent scope of the present invention. Any equivalent structure or equivalent process transformation made by using the description of the present invention and the contents of the accompanying drawings, or directly or indirectly used in other related technologies fields, all of which are equally included in the scope of patent protection of the present invention.

Claims (12)

1. An electrodeposition system, comprising:

the upper part of the electrodeposition liquid container is provided with an opening, and the electrodeposition liquid container is used for containing electrodeposition liquid;

a heating container, wherein the electrodeposition container is arranged in the heating container, a heating medium is contained in the heating container, and the heating container is arranged to heat the heating medium so as to heat the electrodeposition liquid;

an anode support disposed on the bath container and partially covering an opening of the bath container, the anode support for supporting an anode of the electrodeposition system;

at least one cathode support device disposed above the bath container for supporting a plurality of cathodes, the cathode support device configured to control rotation of the plurality of cathodes.

2. The system of claim 1,

a magnetic stirring part is arranged in the electrodeposition container;

the bottom of the heating container is provided with a magnetic driving part which is arranged to drive the magnetic stirring piece to rotate.

3. The system of claim 1, wherein the cathode support apparatus comprises:

the cathodes are connected to the connecting piece, and the connecting piece is used for being connected with a power supply to supply power to the cathodes;

and the rotating assembly is connected with the connecting piece and is used for driving the connecting piece to rotate.

4. The system of claim 3, wherein the cathode support apparatus further comprises:

a plurality of support tubes fixedly connected to the connecting member and uniformly distributed along an axial direction of the connecting member, the support tubes being used for supporting the cathode.

5. The system of claim 4, wherein the cathode is a tubular electrodeposition cathode;

the support tube has elasticity, is arranged to be contracted radially inward to protrude into the cathode, and supports the cathode in the cathode by means of a restoring force radially outward.

6. The system of claim 3, wherein the cathode support apparatus further comprises:

a mounting plate on which at least one of the rotating assemblies is mounted.

7. The system of claim 6, wherein the rotating assembly comprises:

the driving motor is arranged on the mounting plate;

the pivot, be provided with the shaft hole on the mounting panel, the pivot passes the shaft hole and rotatably connect in the shaft hole, the one end of pivot with connecting piece fixed connection, the other end with the driving motor drive is connected, driving motor is used for the drive the pivot is rotatory.

8. The system of claim 7, wherein the rotating assembly further comprises:

the driving motor is arranged on the motor support, the motor support is fixedly connected to the mounting plate, and an accommodating space is formed between the motor support and the mounting plate;

and the coupler is arranged in the accommodating space and connected between the output shaft of the driving motor and the rotating shaft.

9. The system of claim 7, wherein the rotating assembly further comprises:

the bearing block is fixedly connected in the shaft hole;

the bearing is installed in the bearing seat, and the rotating shaft is connected in the bearing.

10. The system of claim 7, wherein the cathode support apparatus further comprises:

the lifting assembly is connected with the mounting plate and used for driving the mounting plate and driving the connecting piece to move along the axial direction of the rotating shaft; wherein,

when the lifting component controls the mounting plate to move downwards to cover the mounting plate on part of the opening of the electrodeposition liquid container, the cathode is soaked in the electrodeposition liquid.

11. The system of claim 10, wherein the lift assembly further comprises:

two support plates;

the lifting driving piece is fixed between the two supporting plates;

the slider, the slider with mounting panel fixed connection, the lift driving piece with the slider drive is connected, the lift driving piece is used for the drive the slider is in move on the lift driving piece, in order to drive the mounting panel is followed the axial direction of pivot removes.

12. The system of claim 11, wherein the lift assembly further comprises: at least two guide rods fixedly connected between the two support plates; wherein,

the guide rod penetrates through the sliding piece, and the lifting driving piece is used for driving the sliding piece to move along the guide rod.

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