CN115562107A - Valve control system based on Ether CAT extreme speed control technology - Google Patents
Valve control system based on Ether CAT extreme speed control technology Download PDFInfo
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- CN115562107A CN115562107A CN202211184983.XA CN202211184983A CN115562107A CN 115562107 A CN115562107 A CN 115562107A CN 202211184983 A CN202211184983 A CN 202211184983A CN 115562107 A CN115562107 A CN 115562107A
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
- G05B19/042—Programme control other than numerical control, i.e. in sequence controllers or logic controllers using digital processors
- G05B19/0423—Input/output
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- G—PHYSICS
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- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/24—Pc safety
- G05B2219/24215—Scada supervisory control and data acquisition
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Abstract
The invention provides a valve control system based on an Ether CAT extreme speed control technology, which comprises an upper computer, a processor, a signal transmission module and an atomic layer deposition valve, wherein the upper computer is connected with the processor through a pipeline; the processor is in communication connection with the upper computer; the processor is used for receiving the control information sent by the upper computer and processing the control information to obtain a control instruction; the signal transmission module is connected with the processor and the atomic layer deposition valve; the processor transmits a control instruction to the signal transmission module by adopting an Ether CAT extreme speed control technology, and the atomic layer deposition valve controls the opening and closing state of the atomic layer deposition valve according to the control instruction received by the signal transmission module. The valve control system of the present invention can accommodate the performance and ALD process requirements of current high speed valves.
Description
Technical Field
The invention relates to an atomic layer deposition control technology, in particular to a valve control system based on an Ether CAT extreme speed control technology.
Background
Atomic layer deposition refers to a method of forming a thin film by alternately pulsing precursors and reactants into a reaction chamber and causing adsorption and chemical reaction on the surface of a deposition substrate. The atomic layer deposition process is carried out by two half reactions of A and B in four elementary steps: 1) Carrying out pulse adsorption reaction on a gas-phase precursor A; 2) Purging redundant precursors by inert gas; 3) Carrying out pulse adsorption reaction on a reactant B; 4) And purging redundant reactants and byproducts by using inert gas, and then sequentially circulating to realize the layer-by-layer growth of the thin film on the surface of the substrate. During the atomic layer deposition process, four elementary steps need to be repeatedly executed in a quick cycle. Therefore, how to open and close the valve at high frequency and precisely control the opening or closing time of the valve are very important for atomic deposition (ALD) process, so the key to improve ALD process is to select the valve capable of opening and closing at high speed and control the valve at high speed and precisely in time.
Typically, a high speed diaphragm valve dedicated for atomic layer deposition, such as ALD3 or ALD6 from Swagelok, is selected, which can be actuated by its actuator to complete the opening or closing of the valve in 5ms or less. In the traditional control method for controlling the high-speed valve by using the common PLC, the PLC scanning period is generally only 10ms, and the performance of the existing high-speed valve and the requirements of ALD process cannot be met.
Disclosure of Invention
In view of the above disadvantages of the prior art, the present invention aims to provide a valve control system based on the Ether CAT extreme speed control technology, which is used for solving the problems in the prior art that the performance and ALD process requirements of the current high speed valve cannot be met.
In order to achieve the above objects and other related objects, the present invention provides a valve control system based on the ethercat extreme speed control technology, comprising an upper computer, a processor, a signal transmission module and an atomic layer deposition valve;
the processor is in communication connection with the upper computer; the processor is used for receiving the control information sent by the upper computer and processing the control information to obtain a control instruction;
the signal transmission module is connected with the processor and the atomic layer deposition valve; the processor transmits a control instruction to the signal transmission module by adopting an Ether CAT extreme speed control technology, and the atomic layer deposition valve controls the opening and closing state of the atomic layer deposition valve according to the control instruction received by the signal transmission module.
Preferably, the signal transmission module includes a signal input unit and a signal output unit; the signal input unit and the signal output unit are internally integrated with distributed clocks;
the input end of the signal input unit is electrically connected with the atomic layer deposition valve, and the output end of the signal input unit is in communication connection with the processor; the signal input unit is used for acquiring a current opening and closing state signal of the atomic layer deposition valve and feeding the current opening and closing state signal of the atomic layer deposition valve back to the processor through an internal distribution clock;
the input end of the signal output unit is in communication connection with the processor, and the output end of the signal output unit is electrically connected with the atomic layer deposition valve; the signal output unit controls the opening and closing state of the atomic deposition valve at the atomic layer deposition valve through an internal distribution clock based on the control instruction and the internal distribution clock.
Preferably, the system clock of the processor and the distributed clock of the signal input unit are unified to the distributed clock of the signal output unit, so that the control instruction obtained by the processor is accompanied by a time stamp and is driven to be output by the signal output unit at a time specified by the time stamp.
Preferably, the valve control system further comprises a solid state relay electrically connecting the signal output unit and the atomic layer deposition valve; and the signal output unit transmits the control instruction to the solid-state relay, and controls the opening and closing state of the atomic layer deposition valve through the solid-state relay.
Preferably, the valve control system further comprises a detection module and a safety control module;
the detection module is used for detecting the safety information of the atomic lamination process reaction chamber;
the safety control module is connected with the detection module; and the safety control module processes the safety information and controls the atomic layer deposition valve according to a processing result.
Preferably, the detection module comprises a temperature sensor and a gas sensor, and correspondingly, the safety information of the atomic layer deposition reaction chamber comprises temperature information and gas leakage information.
Preferably, the safety control module comprises a safety input unit, a safety output unit and a sub-processor CPU;
the safety input unit is connected with the detection module and used for acquiring the safety information;
the subprocessors process the safety information, judge whether the safety condition is met, and generate a safety control command according to the processing result whether the safety condition is met;
and the safety output unit outputs the safety control command so as to control the atomic layer deposition valve according to the safety control command.
Preferably, the valve control system further comprises a valve power supply;
the input end of the valve power supply is connected with the safety output unit, and the output end of the valve power supply is connected with the solid-state relay; and controlling whether the valve power supply supplies power to the atomic layer deposition valve or not according to the safety control instruction.
As described above, the valve control system based on the ethercat extreme speed control technology of the present invention has the following beneficial effects:
(1) The valve control system is based on the Ether CAT extreme speed control technology, and the signal input unit and the signal output unit of the signal transmission module are internally integrated with the distributed clocks, so that a control instruction (valve opening or valve closing) obtained by a CPU (central processing unit) of the processor is accompanied with a time stamp to be driven and output by the signal output unit at the time designated by the time stamp, and the time stamp is irrelevant to the scanning period of the processor, and thus, the accurate time control is realized. In addition, the signal output unit and the signal input unit have extremely short on/off time characteristics, and the output and input signal with the timestamp have extremely low time delay so as to fully exert the high-speed performance of the atomic deposition valve; therefore, the performance of the high-speed deposition valve in the atomic deposition process and the requirements of the ALD process can be met.
(2) The safety control module is provided with a processor (namely a sub-processor CPU) and can independently complete safety analysis and safety control, so that the safety and the efficiency of the valve control system are improved.
Drawings
Fig. 1 is a schematic structural diagram of a valve control system based on the Ether CAT extreme speed control technology according to the present invention.
Detailed Description
The embodiments of the present invention are described below with reference to specific embodiments, and other advantages and effects of the present invention will be easily understood by those skilled in the art from the disclosure of the present specification. The invention is capable of other and different embodiments and of being practiced or of being carried out in various ways, and its several details are capable of modification in various respects, all without departing from the spirit and scope of the present invention.
Please refer to fig. 1. It should be noted that the drawings provided in this embodiment are only for schematically illustrating the basic idea of the present invention, and the components related to the present invention are only shown in the drawings and not drawn according to the number, shape and size of the components in actual implementation, and the form, quantity and proportion of each component in actual implementation may be arbitrarily changed, and the component layout may be more complicated.
The invention adopts the extreme speed control technology (XFC) based on the industrial Ethernet (EtherCAT) distributed clock technology, and uses the high-speed IO module with the time stamp function of Beckhoff company, such as EL2252, so that the valve opening and closing control precision of 0.1ms can be easily realized, which is hundreds of times higher than the traditional scheme of using a common PLC to control the valve, and the process requirement of atomic layer deposition is well met. Extreme speed control technology (XFC) represents a very fast and highly time-deterministic control technique that can achieve I/O response times of less than 100 mus. The extreme speed control technology (XFC) is implemented based on the following technology:
based on the distributed clock XFC technique, all the ethernet CAT devices are equipped with their own local clock and automatically and continuously synchronized with all the other clocks via ethernet CAT communications. The run time offset can be compensated for by calculation. Also, the current time of the distributed clock is also referred to as the system time, since it can always be valid throughout the system.
Time stamping typically involves the transmission of process data in their respective data formats (e.g., a digital quantity value represented by a bit and an analog quantity value represented by a word). Thus, when transmitting the records, the time-dependence of the process records is fixed during the communication cycle. It shows that the time resolution and accuracy are also limited by the communication period.
The timestamp data type contains a timestamp in addition to the user data. The time stamp (typically expressed in terms of a ubiquitous system time) can provide highly accurate time information for process recording. The timestamp may be used for input (e.g., to identify the time an event has occurred) and output (e.g., to time a response). In this way, for example, the exact point location can be determined in time when the output is switched. The switching task is performed independently of the bus cycle.
The time stamp terminal module can execute one switching task or switching event per bus cycle, while the multi-time stamp terminal module can execute 32 switching tasks or switching events per cycle at most.
Oversampling typically involves the process data being transmitted exactly once per communication cycle. The time resolution of a process record is therefore directly dependent on the communication cycle time. Higher time resolution is possible only if the cycle time is shortened, but the cycle time is often limited by relevant practical conditions.
The supersampled data type enables multiple sampling of a process record and all data transmitted subsequently generated (input) or previously generated (output) contained in an array within a communication cycle. The oversampling factor describes the number of samples in a communication period and is therefore a multiple of 1. Even under the condition of general communication cycle time, the sampling rate of 200kHz can be easily reached.
The high-speed IO and DIO modules have extremely short on/off time characteristics, and the AIO module has extremely short time conversion; the IO module with the timestamp function can accurately lock the system time when a digital quantity or analog quantity event occurs, and the value of the digital quantity or analog quantity can also be accurately output in preset time; the terminal module with the oversampling function can make the resolution of actual value acquisition or set value output much higher than the communication cycle time.
The general upper control computer provides a human-computer interface and general control logic, an atomic layer deposition process formula edited by an operator is downloaded from the upper control computer to the processor CPU, and the processor CPU executes a formula command, wherein the formula command comprises repeatedly opening and closing an atomic layer deposition valve, so that a precursor, reaction gas and cleaning gas alternately enter a deposition chamber in sequence to complete a coating process. In order to improve the efficiency and the safety of control, the invention provides a valve control system based on an Ether CAT extreme speed control technology, which comprises an upper computer, a processor, a data transmission module and an atomic layer deposition valve;
the processor is in communication connection with the upper computer; the processor is used for receiving the control information sent by the upper computer and processing the control information to obtain a control instruction;
the signal transmission module is connected with the processor and the atomic layer deposition valve; the processor transmits a control instruction to the signal transmission module by adopting an Ether CAT extreme speed control technology, and the atomic layer deposition valve controls the opening and closing state of the atomic layer deposition valve according to the control instruction received by the signal transmission module.
In the embodiment of the invention, the upper computer is in communication connection with the processor based on the Ether NET. The processor receives control information sent by the upper computer through an Ether NET protocol, and obtains a control instruction for controlling the atomic layer deposition valve after processing the control information.
In the embodiment of the invention, the control information sent by the upper computer is an atomic layer deposition process formula, and the processor is specifically a processor in the PLC, namely a PCL CPU. That is to say, the host computer adopts Ether NET to send control information to the PLC controller, then is handled control information by the treater in the PLC controller and obtains control instruction, and control instruction is based on Ether CAT transmission in order to control atomic layer deposition valve.
The signal transmission module comprises a signal input unit and a signal output unit; the signal input unit and the signal output unit are internally integrated with distributed clocks;
the input end of the signal input unit is electrically connected with the atomic layer deposition valve, and the output end of the signal input unit is in communication connection with the processor; the signal input unit is used for acquiring a current opening and closing state signal of the atomic layer deposition valve and feeding the current opening and closing state signal of the atomic layer deposition valve back to the processor through an internal distribution clock;
the input end of the signal output unit is in communication connection with the processor, and the output end of the signal output unit is electrically connected with the atomic layer deposition valve; and the signal output unit controls the opening and closing states of the atomic deposition valve at the atomic layer deposition valve based on the control instruction and an internal distributed clock.
The signal input unit and the signal output unit of the signal transmission module are internally integrated with distributed clocks, and the precision of the distributed clocks is 100ns; a signal input unit and a signal output unit of the signal transmission module are provided with time stamps; namely, the digital input unit provides information with time stamp for the processor, and the signal output module receives the information with time stamp sent by the processor and drives output at the time specified by the time stamp.
Specifically, the signal output unit is a high-speed DO module, an EL2252 is adopted, the output delay time of the signal output unit is less than 1 mu s, in terms of control implementation, the distributed clock of the signal output unit (EL 2252) is designated as the system time, the system clock of the processor and the distributed clock of the signal input unit are unified to the distributed clock of the signal output unit (EL 2252), a control instruction (valve opening or valve closing) obtained by a CPU of the processor is attached with a time stamp, and the control instruction is driven and output at the time designated by the time stamp through the signal output unit, and the control precision is independent of the scanning period of the processor, so that precise time control is achieved, and is less than 0.1ms. The signal input unit is a high-speed DI module, adopts EL1252, and acquires the valve opening and closing state received by the same clock information mark, and feeds back and transmits the valve opening and closing state to the processor, so that the processor can confirm whether the valve is correctly opened and closed.
The valve control system also comprises a solid-state relay, wherein the solid-state relay is electrically connected with the signal output unit and the atomic layer deposition valve; and the signal output unit transmits the control instruction to the solid-state relay, and controls the opening and closing state of the atomic layer deposition valve through the solid-state relay.
The control instruction transmitted by the signal output unit is firstly sent to the solid-state relay, the solid-state relay is a high-speed solid-state relay, and the atomic layer deposition valve is indirectly controlled through the high-speed solid-state relay. According to the invention, the high-speed solid-state relay is additionally arranged between the signal output unit (the high-speed DO output interface) and the atomic layer deposition valve, so that the high-speed DO module in the data transmission module is prevented from being damaged by the operation of opening and closing the valve at a high speed, the protection of the high-speed DO module is realized, and the long-life and reliable use of the deposition equipment is realized.
The valve control system also comprises a detection module and a safety control module;
the detection module is used for detecting the safety information of the atomic lamination process reaction chamber;
the safety control module is connected with the detection module; and the safety control module processes the safety information and controls the atomic layer deposition valve according to a processing result.
In the invention, the safety information of the atomic layer deposition reaction chamber comprises temperature information, the detection module acquires a temperature signal of the atomic layer deposition reaction chamber, specifically, a plurality of temperature sensors can be arranged, the temperature information is acquired through the temperature sensors, the safety control module can process and judge the temperature information, and when the temperature is over-temperature, the process requirements of the process reaction chamber can be damaged, and even the danger of high-temperature explosion can be caused; therefore, the safety control module can control the atomic layer deposition valve according to the specific condition of the over-temperature, for example, by closing part of the atomic layer deposition valve. In another embodiment, the safety information may be a gas leakage signal, and the corresponding detection module includes a gas sensor to detect whether there is a gas leakage in the ald process chamber.
The safety control module comprises a safety input unit, a safety output unit and a sub-processor CPU;
the safety input unit is connected with the detection module and used for acquiring the safety information;
the subprocessors process the safety information, judge whether the safety condition is met, and generate a safety control command according to the processing result whether the safety condition is met;
and the safety output unit outputs the safety control command so as to control the atomic layer deposition valve according to the safety control command.
The safety control module provided by the invention is provided with the processor (namely a sub-processor CPU) and can independently complete safety analysis and safety control, so that the safety and the efficiency of the valve control system are improved.
In addition, the safety control module and the processor are in communication connection based on Ether CAT, when the valve control system is initialized, the processor is in communication connection with the safety control module and controls the opening of the safety control module, so that the safety control module works independently to achieve the purpose of improving the safety of the valve control system.
The valve control system of the invention also comprises a valve power supply; the input end of the valve power supply is connected with the safety output unit, and the output end of the valve power supply is connected with the solid-state relay; and controlling whether the valve power supply supplies power to the atomic layer deposition valve or not according to the safety control instruction.
Specifically, the valve power supply provides power for the atomic layer deposition valve, the valve power supply is controlled to supply power to the atomic layer deposition valve when the ALD process requirement meets the safety condition, and the valve power supply is forbidden to supply power to the atomic layer deposition valve when the safety condition does not meet, namely, the purposes of closing the valve and forbidding opening the valve are achieved in a valve power-off mode.
The invention realizes the valve safety control of the atomic layer deposition process by the way whether the valve power supply supplies power to the atomic layer deposition valve.
According to the valve control system based on the Ether CAT extreme speed control technology, the time precision of opening and closing the valve can reach 0.1ms, and the repeated gas flow circulation set by a process formula can be accurately realized by matching with an atomic layer deposition valve (a high-speed diaphragm valve such as ALD3 or ALD 6) so as to achieve an excellent atomic layer deposition effect. In addition, the safety control module controls the power supply of the valve, and the safety requirement of the atomic layer deposition equipment is also ensured.
In summary, the invention adopts a high-speed and precise time control technology to realize the control idea of the high-speed diaphragm valve, and is different from the traditional method of using a PLC (programmable logic controller) and shortening the scanning period of the PLC, but a hardware and software implementation method based on time characteristics is adopted to realize the ALD process requirement. Therefore, the invention effectively overcomes various defects in the prior art and has high industrial utilization value.
The foregoing embodiments are merely illustrative of the principles and utilities of the present invention and are not intended to limit the invention. Any person skilled in the art can modify or change the above-mentioned embodiments without departing from the spirit and scope of the present invention. Accordingly, it is intended that all equivalent modifications or changes which may be made by those skilled in the art without departing from the spirit and scope of the present invention as defined in the appended claims.
Claims (8)
1. A valve control system based on an Ether CAT extreme speed control technology is characterized by comprising an upper computer, a processor, a signal transmission module and an atomic layer deposition valve;
the processor is in communication connection with the upper computer based on Ether NET; the processor is used for receiving the control information sent by the upper computer and processing the control information to obtain a control instruction;
the signal transmission module is connected with the processor and the atomic layer deposition valve; the processor transmits a control instruction to the signal transmission module by adopting an Ether CAT extreme speed control technology, and the atomic layer deposition valve controls the opening and closing state of the atomic layer deposition valve according to the control instruction received by the signal transmission module.
2. The valve control system based on the Ether CAT extreme speed control technology according to claim 1, wherein the signal transmission module comprises a signal input unit and a signal output unit; the signal input unit and the signal output unit are internally integrated with distributed clocks;
the input end of the signal input unit is electrically connected with the atomic layer deposition valve, and the output end of the signal input unit is in communication connection with the processor; the signal input unit is used for acquiring a current opening and closing state signal of the atomic layer deposition valve and feeding the current opening and closing state signal of the atomic layer deposition valve back to the processor through an internal distribution clock;
the input end of the signal output unit is in communication connection with the processor, and the output end of the signal output unit is electrically connected with the atomic layer deposition valve; the signal output unit controls the opening and closing state of the atomic deposition valve at the atomic layer deposition valve through an internal distribution clock based on the control instruction and the internal distribution clock.
3. The valve control system based on the Ether CAT extreme speed control technology as claimed in claim 2, wherein the system clock of the processor and the distributed clock of the signal input unit are unified to the distributed clock of the signal output unit, so that the control instruction obtained by the processor is attached with a time stamp and is driven to be output at the time specified by the time stamp through the signal output unit.
4. The valve control system based on the Ether CAT extreme speed control technology of claim 3, wherein the valve control system further comprises a solid state relay electrically connecting the signal output unit and the atomic layer deposition valve; and the signal output unit transmits the control instruction to the solid-state relay, and controls the opening and closing state of the atomic layer deposition valve through the solid-state relay.
5. The valve control system based on the Ether CAT extreme speed control technology of claim 4, wherein the valve control system further comprises a detection module and a safety control module;
the detection module is used for detecting the safety information of the atomic lamination process reaction chamber;
the safety control module is connected with the detection module; and the safety control module processes the safety information and controls the atomic layer deposition valve according to a processing result.
6. The valve control system based on the Ether CAT extreme speed control technology as claimed in claim 5, wherein the detection module comprises a temperature sensor and a gas sensor, and correspondingly, the safety information of the atomic layer deposition reaction chamber comprises temperature information and gas leakage information.
7. The valve control system based on the Ether CAT extreme speed control technology according to claim 5, wherein the safety control module comprises a safety input unit, a safety output unit and a sub-processor CPU;
the safety input unit is connected with the detection module and used for acquiring the safety information;
the sub-processor processes the safety information, judges whether the safety information meets the safety condition or not, and generates a safety control command according to the processing result of whether the safety condition is met or not;
and the safety output unit outputs the safety control command so as to control the atomic layer deposition valve according to the safety control command.
8. The valve control system based on the Ether CAT extreme speed control technology of claim 7, wherein the valve control system further comprises a valve power supply;
the input end of the valve power supply is connected with the safety output unit, and the output end of the valve power supply is connected with the solid-state relay; and controlling whether the valve power supply supplies power to the atomic layer deposition valve or not according to the safety control instruction.
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| CN202211184983.XA CN115562107A (en) | 2022-09-27 | 2022-09-27 | Valve control system based on Ether CAT extreme speed control technology |
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| CN202211184983.XA CN115562107A (en) | 2022-09-27 | 2022-09-27 | Valve control system based on Ether CAT extreme speed control technology |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116700123A (en) * | 2023-08-01 | 2023-09-05 | 南京德克威尔自动化有限公司 | Integrated EtherCAT bus I/O module |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1529839A (en) * | 2001-03-07 | 2004-09-15 | Ӧ�ò��Ϲ�˾ | Valve Control System of Atomic Layer Deposition Chamber |
| CN105353680A (en) * | 2015-11-19 | 2016-02-24 | 许昌学院 | Control equipment for atomic layer deposition instrument |
| CN113549903A (en) * | 2021-07-20 | 2021-10-26 | 昆明理工大学 | Remote control system and method of atomic layer deposition equipment |
-
2022
- 2022-09-27 CN CN202211184983.XA patent/CN115562107A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1529839A (en) * | 2001-03-07 | 2004-09-15 | Ӧ�ò��Ϲ�˾ | Valve Control System of Atomic Layer Deposition Chamber |
| CN105353680A (en) * | 2015-11-19 | 2016-02-24 | 许昌学院 | Control equipment for atomic layer deposition instrument |
| CN113549903A (en) * | 2021-07-20 | 2021-10-26 | 昆明理工大学 | Remote control system and method of atomic layer deposition equipment |
Non-Patent Citations (2)
| Title |
|---|
| BECKHOFF: "Documentation 2-Channel Digital Output Terminals, 24V DC, 0.5A" * |
| 陈利君: "EtherCAT分布时钟技术及其工业应用" * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116700123A (en) * | 2023-08-01 | 2023-09-05 | 南京德克威尔自动化有限公司 | Integrated EtherCAT bus I/O module |
| CN116700123B (en) * | 2023-08-01 | 2023-10-17 | 南京德克威尔自动化有限公司 | Integrated EtherCAT bus I/O module |
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Application publication date: 20230103 |