CN115480452A - A suction cup assembly, exposure device and photolithography system - Google Patents

Abstract

The invention belongs to the technical field of photoetching, and particularly discloses a sucker assembly, an exposure device and a photoetching system. The sucking disc subassembly includes: the substrate adsorption surface of the sucker is provided with a plurality of substrate adsorption areas which are concentric with the sucker, each substrate adsorption area comprises a main adsorption area, and at least the outermost substrate adsorption area comprises an edge adsorption area positioned outside the main adsorption area; every main adsorption zone's edge all encloses and is equipped with first sealing member, and the outward flange of edge adsorption zone encircles and is provided with the second sealing member, and the lower extreme of first sealing member and second sealing member is sealed to be inlayed and is located the sucking disc, and the upper end of first sealing member and second sealing member can elasticity protrusion basement adsorption plane, and the height that first sealing member can protrude basement adsorption plane is greater than the height that the second sealing member can protrude basement adsorption plane. The sucker assembly, the exposure device and the photoetching system disclosed by the invention can improve the adsorption capacity and the adsorption effect on the warped substrate.

Description

A suction cup assembly, exposure device and photolithography system

technical field

The present invention relates to the technical field of lithography, in particular to a chuck assembly, an exposure device and a lithography system

Background technique

In lithography, the exposure table is used to project and expose the circuit pattern on the mask plate through an optical projection system, so that the circuit pattern is projected on the silicon wafer for manufacturing integrated circuits at a certain magnification or reduction ratio. Before the exposure, the silicon wafer is usually picked up by a transfer mechanism and placed on the suction cup of the exposure table, so that the suction cup can vacuum absorb the silicon wafer to fix the silicon wafer on the exposure table to prevent the silicon wafer from being exposed during the exposure process. generate movement.

With the continuous development of technology in the integrated circuit manufacturing industry, there are various silicon wafer processing techniques, which often cause large warping deformation of silicon wafers. When the existing exposure device adopts the suction cup to absorb the warped silicon wafer, there are problems such as low adsorption efficiency, poor adsorption effect and low flatness of the silicon wafer after adsorption, which affects the stability of the exposure of the silicon wafer and the weight of the exposure.

Contents of the invention

The purpose of the present invention is to provide an adsorption device, which can improve the adsorption capacity of the adsorption device for warped substrates, and improve the stability and reliability of substrate adsorption.

Another object of the present invention is to provide an exposure device that improves the stability and quality of substrate exposure.

Another object of the present invention is to provide a photolithography system to improve photolithography stability and photolithography quality.

To achieve the above object, the present invention adopts the following technical solutions:

A suction cup assembly, comprising:

A suction cup, the substrate adsorption surface of the suction cup has several substrate adsorption regions concentrically arranged with the suction cup, each of the substrate adsorption regions includes a main adsorption region, and the outer diameter of the main adsorption region is smaller than that of the substrate of the corresponding size. Outer diameter, at least the outermost said substrate adsorption zone includes an edge adsorption zone located outside said main adsorption zone;

The first sealing member, the edge of each of the main adsorption areas is surrounded by the first sealing member, the lower end of the first sealing member is sealingly embedded in the suction cup, and the upper end of the first sealing member can Elastically protruding from the adsorption surface of the substrate;

The second sealing member is arranged around the outer edge of the edge adsorption area, the lower end of the second sealing member is sealingly embedded in the suction cup, and the upper end of the second sealing member can elastically protrude from the adsorption surface of the base The height at which the first sealing member can protrude from the substrate adsorption surface is greater than the height at which the second sealing member can protrude from the substrate adsorption surface.

As a preferred technical solution of the suction cup assembly, the maximum height of the first sealing member that can protrude from the adsorption surface of the substrate is 3 mm to 5 mm, and the maximum height that the second sealing member can protrude from the adsorption surface of the substrate 0.1 mm to 0.5 mm.

As a preferred technical solution of the suction cup assembly, the adsorption surface of the base is provided with a first sealing groove and a second sealing groove, the first sealing groove is provided in one-to-one correspondence with the first sealing member, and the second sealing groove The grooves are provided in one-to-one correspondence with the second sealing elements, the lower end of the first sealing element is embedded in the first sealing groove, and the lower end of the second sealing element is embedded in the second sealing groove , the groove depth and groove width of the first sealing groove are respectively greater than the groove depth and groove width of the second sealing groove.

As a preferred technical solution of the suction cup assembly, the first sealing member includes a sealing body and a clamping portion, and the first sealing groove includes a receiving groove portion and an installation groove portion connected to each other, and the installation groove portion is located on the receiving groove portion Below the groove, and the groove width of the installation groove gradually increases from the bottom of the groove to the notch, the clamping part is clamped in the installation groove, and the sealing body can be completely accommodated in the in the receiving tank.

As a preferred technical solution of the suction cup assembly, the cross section of the sealing body is a strip ring, and the length direction of the strip ring is consistent with the thickness direction of the suction cup; or

The cross-section of the sealing body is in the shape of a broken line segment, and the broken line segment at the end of the broken line segment is inclined in a direction away from the clamping part and in a direction away from the center of the suction cup; or

The cross section of the sealing body is a triangular ring, and one side of the triangular ring is connected to the clamping portion.

As a preferred technical solution of the suction cup assembly, a plurality of annular main adsorption grooves are concentrically and spaced in the main adsorption area, and a plurality of annular edge adsorption grooves are concentrically and spaced in the edge adsorption area, Both the main adsorption groove and the edge adsorption groove can communicate with the air source device, and the distance between two adjacent edge adsorption grooves is smaller than the distance between two adjacent main adsorption grooves.

As a preferred technical solution of the suction cup assembly, the main suction groove and the edge suction groove can be independently communicated with the air source device.

As a preferred technical solution of the suction cup assembly, the suction cup, the first seal and the second seal are all made of static dissipative materials; and/or

The suction cup is embedded with an electrostatic conductive column, the upper end of the electrostatic conductive column is flush with the adsorption surface of the substrate, and the lower end of the electrostatic conductive column is grounded.

An exposure device, comprising a suction cup base and the above suction cup assembly, the suction cup assembly is arranged on the suction cup base.

As a preferred technical solution of the exposure device, the suction cup is embedded with an electrostatic conductive column, and the upper end surface of the electrostatic conductive column is flush with the adsorption surface of the substrate;

An electrostatic guiding structure and a grounding structure are provided on the suction cup base, the suction cup base is made of conductive material, and the electrostatic guiding structure abuts against the lower end of the electrostatic conductive column to guide the static electricity from the electrostatic conductive column to the ground structure.

As a preferred technical solution of the exposure device, the electrostatic guiding structure includes a conductive member and an elastic member, the lower end of the elastic member is fixed to the suction cup seat, and the conductive member is supported on the upper end of the elastic member, so that the conductive member The piece can elastically protrude from the upper surface of the suction cup seat and abut against the lower end of the static electricity conductive column.

As a preferred technical solution of the exposure device, the conductive member is a conductive ball.

As a preferred technical solution of the exposure device, the static electricity guiding structure further includes a limiting member, and the limiting member is used to limit the maximum height of the conductive member protruding from the upper surface of the suction cup seat.

As a preferred technical solution of the exposure device, the suction cup is provided with an adsorption hole in the innermost main adsorption area, and the suction hole penetrates the suction cup along the thickness direction of the suction cup; the exposure device also includes A handover mechanism for the handover of the substrate, the handover mechanism includes:

An adsorption column, which is perpendicular to the adsorption surface of the substrate, the upper end of the adsorption column can extend into the adsorption hole and move relative to the adsorption hole in a direction perpendicular to the adsorption surface of the substrate, and the inside of the adsorption column A handover airway is provided, the upper end of the handover airway runs through the upper end surface of the adsorption column, and the handover airway communicates with the gas source device;

The suction nozzle is arranged on the upper end of the adsorption column and communicates with the transfer air passage, the outer surface of the suction nozzle can be sealed and fitted with the inner wall of the adsorption hole, and the upper end of the suction nozzle is higher than the The upper end surface of the adsorption column.

As a preferred technical solution of the exposure device, the suction nozzle and the adsorption column are both made of static dissipative materials, the transfer mechanism is provided with a conductor structure made of conductive material, the adsorption column and the connected to the conductor structure, and the conductor structure is grounded.

As a preferred technical solution of the exposure device, the periphery of the opening of the suction nozzle is turned outwards to form a folded edge.

As a preferred technical solution of the exposure device, the exposure device also includes an upper plate, the suction cup base is rotatably arranged on the upper plate, and an air bearing is coaxially arranged on the inner side of the suction cup base. The inner ring of the bearing is detachably connected with the upper plate, and the outer ring of the air bearing is connected with the suction cup seat.

As a preferred technical solution of the exposure device, the outer ring of the air bearing is connected to the inner side wall of the suction cup base through a horizontally arranged reed.

As a preferred technical solution of the exposure device, the outer wall of the suction cup seat is detachably connected with an air floating member, and a plurality of air floating members are evenly spaced along the circumferential direction of the suction cup seat, and the air floating member The lower end surface of the suction cup seat is flush with the lower end surface of the suction cup seat or the lower end surface of the air floating member protrudes from the lower end surface of the suction cup seat, and the air floating member can be supported on the upper plate by air floating.

As a preferred technical solution of the exposure device, the outer wall of the suction cup base is protruded with an air-floating installation part, and the air-floating installation part is provided in one-to-one correspondence with the air-floating member, and the air-floating installation part and the air-floating installation part The air floating part is threadedly connected to adjust the height of the lower end surface of the air floating part protruding from the lower end surface of the suction cup seat by screwing the air floating part.

As a preferred technical solution of the exposure device, the lower surface of the suction cup seat is provided with an air flotation gas distribution channel, and the outer wall of the suction cup seat is provided with an air flotation inflation port communicating with the air flotation gas distribution channel, An air flotation channel is opened in the air flotation member, an air flotation hole is opened on the lower surface of the air flotation member, one end of the air flotation channel communicates with the air flotation hole, and each of the air flotation members The air flotation channels are all in communication with the air flotation distribution channels.

As a preferred technical solution of the exposure device, the exposure device further includes a vertical preload structure, and the vertical preload structure is used to apply a vertical preload force between the suction cup seat and the upper plate, The vertical preload structures are provided on opposite sides of each of the air floating elements along the circumferential direction of the suction cup seat.

As a preferred technical solution of the exposure device, the vertical preload structure includes a magnetic preload member, the magnetic preload member includes a magnet, and the upper plate includes an upper plate body and is embedded on the upper plate body. The metal support plate, the magnet is detachably connected to the suction cup seat, and the magnet is arranged directly above the metal support plate.

As a preferred technical solution of the exposure device, the metal support plate is provided in one-to-one correspondence with the air-floating elements, and the air-floating elements can be air-supported on the metal supporting plate.

As a preferred technical solution of the exposure device, the magnetic preloader also includes a mounting cylinder, the lower end surface of the mounting cylinder is provided with a magnet mounting groove, the magnet is embedded in the magnet mounting groove, and the mounting The cylinder is detachably connected to the suction cup seat, and the installation cylinder is made of magnetic isolation material.

A photolithography system includes the above-mentioned exposure device.

The beneficial effects of the present invention are:

In the suction cup assembly provided by the present invention, by setting the first sealing member in each main adsorption area, when the air source device vacuumizes the main adsorption area inside the first sealing member, it can realize the adsorption of the main body area of the substrate of the corresponding size ;By setting the edge adsorption area and the second seal on the outside of the outermost main adsorption area, the adsorption to the edge of the substrate of the corresponding size can be realized, so as to ensure that the substrate as a whole can be in a flat state, and can effectively realize the adsorption of the warped substrate , and the substrate is flattened during the substrate adsorption process to improve the quality of subsequent substrate processing.

The exposure device provided by the present invention, by adopting the above-mentioned sucker assembly, improves the adsorption capacity of the exposure device on warped substrates, expands the applicability of the exposure device to the substrate, and improves exposure stability and exposure quality.

The lithography system provided by the present invention improves the applicability and warpage tolerance of the lithography equipment to the substrate by using the above-mentioned exposure device, and improves the lithography stability and lithography quality.

Description of drawings

FIG. 1 is a schematic structural view of an exposure device provided in Embodiment 1 of the present invention;

FIG. 2 is a partial structural schematic diagram of the exposure device provided by Embodiment 1 of the present invention;

Fig. 3 is the local enlargement figure of I place in Fig. 2;

4 is a cross-sectional view of the exposure device provided by Embodiment 1 of the present invention;

Fig. 5 is a partial enlarged view of J in Fig. 4;

Fig. 6 is a partial enlarged view at K in Fig. 4;

Fig. 7 is a partial enlarged view of L place in Fig. 4;

Fig. 8 is a cross-sectional view of the air flotation fixing part provided by Embodiment 1 of the present invention;

Fig. 9 is a schematic diagram of the back structure of the suction cup holder provided by Embodiment 1 of the present invention;

Fig. 10 is a schematic view of the front structure of the suction cup seat provided by Embodiment 1 of the present invention;

FIG. 11 is a partial cross-sectional view of the exposure device provided by Embodiment 1 of the present invention;

Fig. 12 is a schematic structural view of the suction cup assembly provided by Embodiment 1 of the present invention;

Figure 13 is a partial enlarged view at M in Figure 12;

Fig. 14 is a cross-sectional view of the suction cup assembly provided by Embodiment 1 of the present invention;

Figure 15 is a partial enlarged view at N in Figure 14;

Fig. 16 is a cross-sectional view of the electrostatic guiding structure provided by Embodiment 1 of the present invention;

Fig. 17 is a schematic structural diagram of the transfer mechanism provided by Embodiment 1 of the present invention;

Fig. 18 is a partial structural sectional view of the suction cup assembly provided by Embodiment 2 of the present invention;

Fig. 19 is a partial structural sectional view of the suction cup assembly provided by the third embodiment of the present invention.

The markings in the figure are as follows:

100. Adsorption device; 200. Exposure platform; 300. Base;

1, suction cup assembly; 11, suction cup; 111, main adsorption area; 1111, main adsorption groove; 1112, main connecting groove; 1113, main air hole; 112, edge adsorption area; 1121, edge adsorption groove; 1122, edge Connecting groove; 1123, edge air hole; 1124, ventilation hole; 1125, edge adsorption airway; 113, first sealing groove; 114, second sealing groove; 115, adsorption hole; 12, first sealing member; 121, sealing Main body; 122, clamping part; 13, second sealing member; 14, electrostatic conductive column;

2. Handover mechanism; 21. Base; 22. Vertical movement component; 23. Support plate; 24. Adsorption column; 241. Handover airway; 25. Suction nozzle; 251. Flange part;

3. Upper plate assembly; 31. Upper plate; 311. Upper plate body; 312. Metal support plate; 32. Rz guide assembly; 321. Fixed guide seat; 322. Air bearing guide seat; 3221. External connection boss; 33 , Reed; 34, Air Floating Part; 341, Connecting Part; 342, Air Floating Part; 35, Magnetic Preloading Part; 351, Mounting Tube; 3511, Limiting Part;

4. Suction cup seat assembly; 41. Suction cup seat; 411. Main body plate; 412. Inner connection boss; 413. Air flotation installation part; 4131. Installation hole; 4132. Accommodating groove; 4134, transfer airway; 414, air flotation gas distribution groove; 415, joint accommodation groove; 416, suction cup adsorption groove; 417, suction cup adsorption airway; 418, vacuum airway; 4181, vacuum gas distribution airway; 4182, radial airway; 4183, axial airway; 419, installation groove; 4191, first groove; 4192, second groove; 4110, limit groove; 4111, main groove; 4112, extension groove ; 42, air flotation gas distribution assembly; 421, air flotation inflation joint; 422, gas distribution joint; 423, gas distribution main joint; 424, adapter joint; 425, air supply joint; 426, plug; ;44, electrostatic guiding structure; 441, conductive ball; 442, elastic piece; 443, limit piece; 4431, ring part; 4432, ear plate part; 4443, limit hole; 45, upper sealing plate; 46, grounding structure ;

5. Air foot; 6. Vertical adjustment mechanism; 7. Support component; 8. Air guide component.

detailed description

The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected" and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integrated ; It can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediary, and it can be the internal communication of two components or the interaction relationship between two components. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention in specific situations.

In the present invention, unless otherwise clearly specified and limited, a first feature being "on" or "under" a second feature may include direct contact between the first and second features, and may also include the first and second features Not in direct contact but through another characteristic contact between them. Moreover, "above", "above" and "above" the first feature on the second feature include that the first feature is directly above and obliquely above the second feature, or simply means that the first feature is horizontally higher than the second feature. "Below", "beneath" and "under" the first feature to the second feature include that the first feature is directly below and obliquely below the second feature, or simply means that the first feature has a lower level than the second feature.

In the description of this embodiment, the terms "up", "down", "right", and other orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of description and simplification of operations, rather than indicating Or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore should not be construed as limiting the invention. In addition, the terms "first" and "second" are only used to distinguish in description, and have no special meaning.

As shown in FIG. 1 , this embodiment provides an exposure device, which is mainly used in photolithography equipment to perform photolithography exposure treatment on substrates 300 such as silicon wafer substrates and glass substrates, so that the integrated circuits are formed on the substrate 300. required circuit diagram. The exposure device mainly includes an exposure table 200 and an adsorption device 100. The adsorption device 100 is used to transfer and absorb the substrate 300 to be exposed, and fix the substrate 300 on the exposure table 200 to ensure the stability of the exposure and the exposure quality of the substrate 300; the exposure table 200 is used to implement rough adjustment and fine adjustment to the substrate 300 in all directions, and after the leveling and focusing of the substrate 300 is completed, optical exposure processing is performed on the substrate 300 .

In order to facilitate the description of the structure of the exposure device, an XYZ coordinate system is constructed taking the direction shown in Figure 1 as an example, where the XY plane is parallel to the adsorption surface of the exposure device, the Z direction is parallel to the XY plane, and X, Y and Z satisfy the right-hand law.

As shown in Figures 1 and 2, specifically, the exposure table 200 includes a fixed base (not shown), an air foot 5, a vertical adjustment mechanism 6, an Rz adjustment mechanism, a support assembly 7, an upper plate assembly 3 and a suction cup seat assembly 4. The fixed base is used to fix and support the entire exposure device, and the air foot 5 is horizontally arranged on the fixed base, and is used to perform coarse motion adjustment of the substrate 300 placed on the exposure table 200 in the X-direction and Y-direction, thereby It is ensured that the substrate 300 is facing the optical system and the scanning exposure process on the substrate 300 is realized. An X-direction coarse motion adjustment mechanism and a Y-direction coarse motion adjustment mechanism are arranged between the air foot 5 and the fixed base, so as to respectively realize the coarse motion adjustment of the air foot 5 in the X direction and the Y direction. In this embodiment, the setting of the fixed base and the air foot 5 and the use of the X-direction coarse motion adjustment mechanism and the Y-direction coarse motion adjustment mechanism to realize the coarse motion adjustment of the air foot 5 in the X and Y directions are conventional technical means in the field , which will not be described in detail in this embodiment.

The upper plate assembly 3 includes an upper plate 31, the suction cup seat assembly 4 is arranged on the upper plate 31, the upper plate 31 is located above the air foot 5, and is parallel to and spaced from the air foot 5, and is arranged between the upper plate 31 and the air foot 5 There is a vertical adjustment mechanism 6 and a support assembly 7, and in order to realize the rotation adjustment in the Rz direction, an Rz adjustment mechanism (not shown) is arranged on the upper plate 31, and the vertical adjustment mechanism 6, the support assembly 7 and the Rz adjustment mechanism are arranged You can refer to the relevant description in the patent CN201820746378.X or refer to the existing technology for setting, which is not the focus of the present invention, and will not be repeated in this embodiment.

The suction cup seat assembly 4 includes a suction cup seat 41 , and the suction cup assembly 1 can be adsorbed on the upper surface of the suction cup seat 41 . Preferably, as shown in FIGS. 2 and 5 , in order to improve the motion precision of the suction cup base 41 rotating around the Z axis, an Rz guide assembly 32 is also provided on the upper plate 31 . In this embodiment, the Rz guide assembly 32 is arranged inside the suction cup seat 41, and includes a fixed guide seat 321 and an air-floating guide seat 322 coaxially arranged with the suction cup seat 41. The fixed guide seat 321 is detachably connected to the upper plate 31, and the air bearing The floating guide seat 322 is sleeved on the outer side of the fixed guide seat 321 and connected to the inner side wall of the suction cup seat 41 . The inner surface and the lower end surface of the air-floating guide seat 322 are all provided with air-floating holes, and the air-floating holes on the inner surface of the air-floating guiding seat 322 are used to pass positive pressure gas between the air-floating guiding seat 322 and the fixed guiding seat 321 so that the air An air film is formed between the floating guide seat 322 and the fixed guide seat 321, and the air float holes on the lower surface of the air float guide seat 322 are used to feed positive pressure gas between the air float guide seat 322 and the upper plate 31 to make the air float guide An air film is formed between the seat 322 and the upper plate 31 to reduce friction when the air-floating guide seat 322 rotates relative to the fixed guide seat 321 and improve the rotation accuracy of the air-floating guide seat 322 .

In this embodiment, the Rz guide assembly 32 is an air bearing, the inner ring of the air bearing is a fixed guide seat 321 , and the outer ring of the air bearing is an air bearing seat 322 . Since the air bearing is an existing mature product, using the air bearing as the Rz guide assembly 32 can effectively reduce design and processing costs.

Preferably, the inner side wall of the suction cup seat 41 is connected to the air-floating guide seat 322 by horizontally arranged reeds 33 , and a plurality of reeds 33 are arranged at intervals along the circumferential direction of the air-floating guide seat 322 . The reed 33 is used to decouple the problem of compressing the air film caused by the vertical and horizontal tilt of the air bearing, and at the same time provide vertical support for the air bearing guide seat 322 .

Preferably, the reed 33 has a sheet structure parallel to the XY plane, so as to simplify the structure of the reed 33 . For the convenience of reed 33 and the connection of air-floating guide seat 322, the outer side wall of air-floating guide seat 322 protrudes outwards and is provided with outer connection boss 3221, and the inner side of suction cup seat 41 is provided with inner connection boss 412, and the inner connection boss 412 and the outer connection boss 3221 are all correspondingly arranged with the reed 33 one by one. and the external connecting boss 3221 are connected by screw parts.

In order to improve the accuracy and speed of the rotation adjustment of the suction cup base 41 around Rz, the suction cup base 41 is air-floated connected with the upper plate 31 through the air bearing structure, so that the suction cup base 41 can be selectively air-supported on the upper plate 31 . Specifically, the suction cup seat 41 includes a ring-shaped main body disk portion 411 and an air-floating installation portion 413 protruding from the outer wall of the main body disk portion 411. A plurality of air-floating installation portions 413 are arranged at intervals along the circumferential direction of the suction cup seat 41, each Each of the air-floating mounting parts 413 is connected with an air-floating element 34 , the lower surface of the air-floating element 34 can be in contact with the upper plate 31 , and the air-floating element 34 can be air-supported on the upper plate 31 .

By connecting the air float 34 on the outer side wall of the sucker seat 41, the air float 34 can drive the sucker seat 41 to be air-floated and supported on the upper plate 31, thereby avoiding setting up air float holes at the bottom of the sucker seat 41 to carry out the air float support structure. Setting, can simplify the structure of suction cup seat 41; Simultaneously, because air floating member 34 is provided with a plurality of at intervals along the circumferential direction of suction cup seat 41, compared with directly forming air film between suction cup seat 41 and upper plate 31, can effectively Reduce the air pressure and gas volume required for the formation of the air film, saving costs. Preferably, a plurality of air-floating installation parts 413 and air-floating elements 34 are evenly spaced along the circumferential direction of the suction cup seat 41 to improve the force stability of the suction cup seat 41 .

As shown in Figure 2, Figure 6 and Figure 8, in order to facilitate the installation of the air float 34 on the air float installation part 413, the air float installation part 413 is provided with a connected installation hole 4131 and a receiving groove 4132, and the receiving groove 4132 passes through the air The lower surface of the floating mounting portion 413 and the side wall away from the main body plate portion 411 . The air bearing 34 includes an air bearing part 342 and a connecting part 341. The upper end surface of the air bearing part 342 is connected to the connecting part 341. The connecting part 341 is penetrated in the mounting hole 4131 and is detachably connected with the air bearing mounting part 413. The air bearing The part 342 is located in the receiving groove 4132, and the side of the air-floating part 342 away from the main body plate part 411 is provided with an air supply joint 425, and the bottom surface of the air-floating part 342 is provided with an air-floating hole, and an air-floating air channel is arranged inside. This arrangement facilitates the connection of the air-floating element 34 and the air-floating installation part 413 , and at the same time facilitates the setting of the air supply joint 425 .

Furthermore, both the mounting hole 4131 and the connecting portion 341 are cylindrical, the inner wall of the mounting hole 4131 is provided with an internal thread, and the outside of the connecting portion 341 is provided with an external thread, and the air flotation mounting portion 413 and the connecting portion 341 are connected through internal threads and external threads. threaded connection. Preferably, the upper end of the connecting portion 341 is screwed with a locking nut 36, and the lower surface of the locking nut 36 fits with the air-floating mounting portion 413 to lock the air-floating mounting portion 413 and the connecting portion 341, thereby improving the connection between the suction cup seat 41 and the air-floating mounting portion 413. Connection stability of the air float 34 .

Preferably, the diameter of the air floating part 342 is larger than that of the connecting part 341 to increase the air floating area. Further, the groove depth of the receiving groove 4132 is greater than the size of the air floating part 342 along the thickness direction of the suction cup seat 41, so that the installation of the air floating part 34 relative to the suction cup seat 41 in the Z direction can be adjusted by screwing the air floating part 34 position, thereby adjusting the height of the lower surface of the air floating member 34 protruding from the lower surface of the suction cup seat 41 . In this embodiment, preferably, the lower surface of the air floating member 34 is flush with the lower end surface of the suction cup seat 41 or the lower surface of the air floating member 34 protrudes from the lower surface of the suction cup seat 41 to reduce the air floatation of the suction cup seat 41 Raise the difficulty.

As shown in FIG. 2 and FIG. 9 , preferably, in order to ensure the consistency of gas pressure at each air-floating element 34 , each air-floating element 34 is communicated through an air-floating and gas-distributing assembly 42 . Specifically, the inside of the suction cup seat 41 is provided with an air flotation gas distribution channel, and the outer wall of the suction cup seat 41 is provided with an air flotation inflation port communicating with the air flotation gas distribution channel. The positive pressure gas is passed into the air flotation gas distribution channel. The inside of the air-floating part 34 is provided with an air-floating air passage and the bottom of the air-floating part 34 is provided with an air-floating hole, and one end of the air-floating air passage communicates with the air-floating hole, and the other end of the air-floating air passage of each air-floating part 34 is connected to the air-floating air passage. The air flotation is divided into gas and air passages. This kind of arrangement can effectively ensure that the internal air pressure of each air-floating element 34 is consistent by filling the positive-pressure gas into the air-floating air-distributing air channel, and passing the positive-pressure gas into each air-floating element 34 through the air-floating air-dividing air channel. .

In order to facilitate the setting of the air flotation air distribution channel, the lower surface of the suction cup seat 41 is provided with an air flotation air distribution groove 414, and the lower surface of the suction cup seat 41 is provided with a joint receiving groove 415 corresponding to each air flotation installation part 413. The joint receiving grooves 415 are sequentially connected through the air flotation and gas distribution grooves 414 . Each joint receiving groove 415 is provided with a gas distribution joint 422; the air flotation gas distribution groove 414 is provided with a gas distribution pipe, and the two ends of the gas distribution pipe are respectively connected with the gas distribution joints 422 in two adjacent joint accommodation grooves 415. Connected, the air channel formed in the gas distribution pipe and the gas distribution joint 422 is the air flotation gas distribution channel; among the multiple gas distribution joints 422, at least one gas distribution joint 422 is connected to the air flotation charging port. The air flotation member 34 is provided with an air supply joint 425 communicating with the air flotation air channel, and each air flotation installation part 413 is provided with a transfer air channel 4134, and one end of the transfer air channel 4134 passes through the air flotation installation part 413 away from One side wall of the main body plate 411 is sealed with an adapter 424 , the other end of the adapter air channel 4134 communicates with the corresponding gas distribution joint 422 , and the adapter 424 communicates with the air supply joint 425 through a pipeline.

With the above setting, when the gas is supplied to the gas distribution joint 422 through the air flotation charging port, the gas is supplied to each gas distribution joint 422 through the gas distribution joint 422 and the gas distribution pipe, and then supplied to the air flotation installation part through the gas distribution joint 422 413 on the transfer air passage 4134, and through the transfer joint 424, the air supply joint 425, and the air flotation air passage flow to the air flotation hole of the air float 34.

Preferably, each air flotation installation part 413 is provided with an air flotation air supply channel 4133, and one end of the air flotation air supply channel 4133 passes through the side wall of the air flotation installation part 413 away from the main body disk 411 to form an air flotation Inflatable port, the other end of the air flotation air supply channel 4133 communicates with the joint receiving groove 415 . In actual use, an air flotation charging joint 421 is selectively provided at one of the air flotation charging ports, and the joint receiving groove 415 corresponding to the air flotation air supply air channel 4133 is provided to communicate with the air flotation air supply air channel 4133 The main gas distribution joint 423, the gas distribution main joint 423 is connected with the gas distribution joint 422 in the joint receiving groove 415 through the air pipe, so that the two ends of other air flotation air supply channels 4133 are blocked with plugs 426. This arrangement can improve the flexibility of use of the suction cup seat 41 , and a suitable air flotation charging port can be reasonably selected to communicate with the air source device according to the spatial layout.

Preferably, the bottom surface of the suction cup seat 41 is provided with a lower sealing plate, which covers the notch of the air flotation and gas distribution groove 414 and closes the lower side notch of the air flotation and gas distribution groove 414 . The setting of the lower sealing plate can prevent the air distribution trachea arranged in the air flotation and gas distribution groove 414 from being exposed, improve the integrity of the suction cup seat 41, prevent the gas distribution trachea from breaking away from the air flotation and gas distribution groove 414, and facilitate gas distribution Tracheal sealing. Preferably, the lower sealing plate has an arc-shaped structure and covers all the air flotation and gas separation grooves 414, so as to simplify the structure of the lower sealing plate.

In order to facilitate the installation of the lower sealing plate, a lower sealing groove is provided on the ground of the suction cup seat 41, and the lower sealing groove is arranged at the notch of the air flotation and gas distribution groove 414, and the groove width of the lower sealing groove is larger than that of the air flotation and gas distribution groove 414 The groove width is , and the lower sealing plate is embedded in the lower sealing groove.

Further, the upper plate assembly 3 also includes a vertical preload structure, which is used to apply a vertical preload force between the suction cup seat 41 and the upper plate 31 . In this embodiment, the vertical preload structure adopts a magnetic preload to achieve preload between the suction cup base 41 and the upper plate 31 . In other embodiments, the vertical preload structure can also use air bearing preload to achieve preload between the suction cup seat 41 and the upper plate 31 . Preferably, vertical preload structures are provided on opposite sides of each air floating member 34 along the circumferential direction of the suction cup base 41 to improve the stability and force balance of the suction cup base 41 when supported by air.

The vertical preload structure includes a magnetic preload 35, the magnetic preload 35 includes a magnet 351, the upper plate 31 includes an upper plate body 311 and a metal support plate 312 embedded in the upper plate body 311, the magnet 351 and the suction cup seat 41 The connection is detachable, and the magnet 351 is disposed directly above the metal support plate 312 .

Preferably, the metal support plate 312 is provided in one-to-one correspondence with the air-floating elements 34 , and the air-floating elements 34 can be air-supported on the metal support plate 312 . This kind of setting can make the magnetic preloading parts 35 on both sides of the same air floating part 34 share the metal support plate 312 , and simplify the processing and assembly of the upper plate 31 .

Preferably, the upper surface of the metal support plate 312 protrudes from the upper surface of the upper plate 31, and/or the lower surface of the air float 34 protrudes from the lower surface of the suction cup seat 41, so that the lower surface of the suction cup seat 41 can be aligned with the upper surface. There is always a gap between the plates 31, and the suction cup seat 41 is only supported on the upper plate 31 by the air-floating member 34, which can reduce the range of the air-floating effect and improve the accuracy of the air-floating effect. In this embodiment, the lower surface of the air floating element 34 protrudes from the lower surface of the suction cup base 41 and the upper surface of the metal support plate 312 protrudes from the upper surface of the upper plate 31 body. And preferably, the height of the upper surface of the metal support plate 312 protruding from the upper surface of the upper plate 31 is less than 2 mm, so as to improve the vertical compactness of the exposure table 200 .

The magnet 352 is installed on the air bearing installation part 413 to simplify the installation structure of the magnet 352 and improve the compactness of the structure. The air flotation installation part 413 is provided with an installation cavity, the installation cavity at least penetrates the lower end surface of the air flotation installation part 413, and the magnet 352 is arranged in the air flotation installation cavity. Further, the magnetic preloader 35 also includes an installation cylinder 351, the lower end surface of the installation cylinder 351 is provided with a magnet installation groove, and the magnet 352 is embedded in the magnet installation groove. The stability and convenience of mounting on the mounting portion 413 simplifies the processing of the magnet 352 .

Further, the installation cavity is a cylindrical cavity, and the opening of the upper end of the installation cavity extends radially with a limiting groove. The installation barrel 351 includes a cylindrical barrel, the upper end of the barrel extends radially outwards to define a limiting portion 3511 , and the limiting portion 3511 is embedded in the limiting groove. The setting of the stopper 3511 and the stopper groove can prevent the magnetic preloader 35 from rotating relative to the air bearing installation part 413 and limit the downward movement of the magnetic preloader 35 relative to the air bearing installer 413, thereby improving the magnetic preloader 35. Installation stability. Preferably, two limiting grooves are arranged as mirror images of the installation cavity, and the limiting part 3511 is arranged correspondingly to the limiting grooves.

Preferably, the mounting cylinder 351 is made of a magnetic isolation material to converge the magnetic field lines of the magnet 352, enhance the magnetic attraction between the magnet 352 and the metal support plate 312, and at the same time reduce the impact of the magnet 352 on other metal parts on the exposure table 200. Impact. Further, the lower surface of the magnet 352 is flush with the lower surface of the air bearing installation part 413, so as to prevent the magnet 352 from directly contacting the metal support plate 312 and causing the magnetic attraction force between the magnet 352 and the metal support plate 312 to be too large, thereby causing air The problem that the air pressure required for air flotation of the floating member 34 is relatively large.

In the embodiment, three air-floating installation parts 413 are arranged at uniform intervals along the circumferential direction of the suction cup seat 41 , and the air-floating support components 7 are provided in one-to-one correspondence with the air-floating installation parts 413 . In other embodiments, the number of air bearing installation parts 413 can be set according to requirements.

As shown in FIG. 10 and FIG. 11 , the adsorption device 100 includes a suction cup assembly 1 , and the suction cup assembly 1 is arranged on a suction cup seat 41 for absorbing and carrying a substrate 300 . The suction cup seat 41 adopts vacuum suction to fix or release the suction cup assembly 1 , so as to realize the pick-and-place and stable placement of the suction cup assembly 1 on the suction cup seat 41 . In order to realize the suction of the suction cup assembly 1 by the suction cup seat 41, a suction cup adsorption groove 416 is provided on the upper surface of the suction cup seat 41, and a suction cup adsorption air channel 417 is provided inside the suction cup seat 41, and one end of the suction cup adsorption air channel 417 connects with the suction cup adsorption groove. 416 communicates, and the other end penetrates the outer wall of the suction cup seat 41 to form an external air port, and the external air port is sealed with a gas pipe joint connected to the gas source nuclear device.

After the suction cup assembly 1 is placed on the suction cup seat 41, the lower surface of the suction cup assembly 1 abuts against the upper surface of the suction cup seat 41, and the air source device vacuumizes the air in the suction cup adsorption groove 416 through the air pipe joint and the suction cup adsorption air channel 417 , so that a vacuum state is formed in the suction cup adsorption groove 416, and the suction cup assembly 1 is adsorbed on the suction cup seat 41 under the action of negative pressure.

As shown in Figure 2, in order to realize the installation and positioning of the suction cup assembly 1 on the suction cup base 41, preferably, one of the suction cup base 41 and the suction cup assembly 1 is provided with a positioning column 43, and the other is provided with a positioning slot, and the positioning column 43 is inserted set in the positioning slot. To simplify installation and processing, in this embodiment, the upper end of the suction cup base 41 is provided with a positioning column 43 , and the lower surface of the suction cup assembly 1 is provided with a positioning groove, and the positioning column 43 protrudes from the upper surface of the suction cup base 41 . Preferably, at least two positioning columns 43 are arranged at intervals along the circumference of the suction cup seat 41 to improve positioning accuracy.

Preferably, the positioning post 43 is a cylindrical structure, and the outer diameter of its upper end gradually decreases to form a conical head for guiding, so that the positioning post 43 can be inserted into the positioning groove. Furthermore, the positioning slot is a long slot extending radially along the suction cup assembly 1 , and the slot width of the positioning slot is equal to the diameter of the positioning post 43 , and the length of the positioning slot is greater than the diameter of the positioning post 43 . With this arrangement, after the first positioning post 43 is inserted into the corresponding positioning slot, the positioning post 43 can move in the positioning slot, thereby facilitating the insertion of another positioning post 43 into the corresponding positioning slot, reducing the difficulty of positioning. In this embodiment, there are two positioning columns 43, and the two positioning columns 43 are not on the same diameter of the suction cup seat 41, that is, the extension directions of the two positioning grooves are not on the same straight line, so as to prevent the suction cup assembly 1 from being opposite to the suction cup seat 41. Shake radially.

As shown in FIGS. 12-15 , the suction cup assembly 1 includes a suction cup 11 , which is in the shape of a disk, so as to be suitable for the shape of a substrate 300 such as a silicon wafer or a glass wafer that is commonly used in the past. In order to make the suction cup 11 carry out vacuum adsorption to the substrate 300, the lower surface of the suction cup 11 facing the suction cup seat 41 is a fixed adsorption surface, and the fixed adsorption surface abuts against the upper surface of the suction cup seat 41, and the upper surface of the suction cup 11 away from the suction cup seat 41 is the substrate adsorption surface. The surface is used for adsorbing the substrate 300 .

The substrate adsorption surface of the suction cup 11 has several substrate adsorption regions arranged concentrically with the suction cup 11, each substrate adsorption region includes a main adsorption region 111, the outer diameter of the main adsorption region 111 is smaller than the outer diameter of the substrate 300 of the corresponding size, and at least The outermost substrate adsorption area includes an edge adsorption area 112 located outside the main adsorption area 111 .

The suction cup assembly 1 also includes a first seal 12 and a second seal 13, and the edge of each main adsorption area 111 is surrounded by the first seal 12, and the second seal 13 surrounds the outer edge of the edge adsorption area 112 set, and the lower ends of the first sealing member 12 and the second sealing member 13 are all embedded in the suction cup 11, the upper ends of the first sealing member 12 and the second sealing member 13 can elastically protrude from the base adsorption surface, and the first sealing member The height at which the element 12 can protrude from the substrate adsorption surface is greater than the height at which the second sealing element 13 can protrude from the substrate adsorption surface.

The suction cup assembly 1 provided in this embodiment is provided with the first sealing member 12 and the second sealing member 13 that can elastically protrude from the suction surface of the substrate. When the first sealing member 12 and the second sealing member 13 are not in contact with the substrate 300, The upper ends of the first sealing member 12 and the second sealing member 13 are higher than the substrate adsorption surface; when the substrate 300 is adsorbed onto the suction cup 11, the first sealing member 12 and the second sealing member 13 are sunken inside the suction cup 11, and their upper end surfaces flush with the surface of the substrate.

By arranging the first sealing member 12 on the substrate adsorption surface of the suction cup 11, when the suction cup 11 adsorbs the warped substrate 300, since the upper end surface of the first sealing member 12 protrudes from the substrate adsorption surface, the first sealing member 12 The upper end surface is first in contact with the lower surface of the base 300; due to the elasticity of the first seal 12, the first seal 12 will be partially deformed under the gravity of the base 300, so that the shape of the upper end of the first seal 12 is consistent with the bottom surface of the base 300. adaptation. When the main adsorption area 111 is vacuumed, the substrate 300 moves downward under the action of vacuum negative pressure, and further squeezes the first sealing member 12, so that the upper edge of the first sealing member 12 is completely attached to the substrate 300, and the main A closed vacuum adsorption cavity is formed in the adsorption area 111, no vacuum leakage occurs, and the adsorption capacity and adsorption effect on the substrate 300 are improved; The deformation is retracted into the suction cup 11, the lower surface of the substrate 300 is in contact with the adsorption surface of the substrate, and the substrate 300 is closely attached to the adsorption surface of the substrate under the action of vacuum negative pressure, and the main part of the substrate 300 changes from a warped state to a flat state. The adsorption force between the substrate 300 and the suction cup 11 is further improved, so that the substrate 300 is stably and firmly adsorbed on the suction cup 11 .

By setting the second sealing member 13, when the main body part of the substrate 300 is adsorbed by the main adsorption area 111 to abut against the substrate adsorption surface, the edge of the substrate 300 moves downward under the negative pressure of the edge adsorption area 112 to be in contact with the second adsorption area. The upper end of the sealing member 13 abuts, so that the edge adsorption area 112 forms a sealed vacuum adsorption chamber, which enhances the effect on the edge adsorption of the substrate 300. As the vacuum degree of the edge adsorption area 112 increases, the substrate 300 presses against the second sealing member 13 , the second sealing member 13 is retracted into the suction cup 11 , and the edge area of the substrate 300 abuts against the suction surface of the substrate.

That is, the suction cup assembly 1 provided in this embodiment, by setting the first sealing member 12 in each main adsorption area 111, when the air source device vacuumizes the main adsorption area 111 inside the first sealing member 12, it can realize the The adsorption of the main body area of the substrate 300 of the corresponding size; by setting the edge adsorption region 112 and the second seal 13 outside the outermost main adsorption region 111, the adsorption of the edge of the substrate 300 of the corresponding size can be realized, thereby ensuring that the substrate 300 as a whole Being able to be in a flat state can effectively realize the adsorption of the warped substrate 300 , and the substrate 300 can be flattened during the adsorption process of the substrate 300 to improve the processing quality of the subsequent substrate 300 .

In order to improve the adsorption effect on the substrate 300, a plurality of annular main adsorption grooves 1111 are concentrically and spaced in each main adsorption area 111, and a plurality of annular edge adsorption grooves 1121 are concentrically and spaced in the edge adsorption area 112 Both the main suction groove 1111 and the edge suction groove 1121 can communicate with the air source device, so as to realize the vacuuming of the main suction groove 1111 and the edge suction groove 1121 . Preferably, the groove widths of all the main adsorption grooves 1111 are equal, and the spacing between two adjacent main adsorption grooves 1111 is equal; the groove widths of all edge adsorption grooves 1121 are equal, and the adjacent two edge adsorption grooves 1121 are equally spaced to improve the processing convenience of the suction cup 11 .

Preferably, the distance between two adjacent edge adsorption grooves 1121 is smaller than the distance between two adjacent main adsorption grooves 1111, thereby increasing the density of edge adsorption grooves 1121 in the edge adsorption region 112, Therefore, under the same air pressure, the adsorption ability of the edge adsorption groove 1121 to the substrate 300 can be enhanced, and the smoothness of the edge of the substrate 300 to be adsorbed can be effectively improved. Preferably, the distance between two adjacent edge suction grooves 1121 is less than half of the distance between two adjacent main suction grooves 1111 .

The width of the main adsorption groove 1111 is preferably 2mm-5mm, and the distance between two adjacent main adsorption grooves 1111 is preferably 0.5mm-1.5mm. The width of the edge adsorption grooves 1121 is preferably 0.5 mm˜2 mm, and the distance between two adjacent edge adsorption grooves 1121 is preferably 0.5 mm˜1.5 mm.

Further, the radial width of the edge adsorption area 112 is 5 mm to 30 mm, so as to avoid the weakening of the adsorption ability to the edge of the substrate 300 caused by the excessively large edge adsorption area 112 . But it can be understood that the radial width of the edge adsorption area 112 can be determined according to the outer diameter of the edge adsorption area 112 , and the radial width of the edge adsorption area 112 can be larger when the outer diameter of the edge adsorption area 112 is larger.

In order to make the suction cup 11 suitable for the adsorption of substrates 300 of different sizes, such as 8-inch and 12-inch substrates 300, in this embodiment, at least two main adsorption areas 111 are provided. Preferably, the main adsorption groove 1111 corresponding to each main adsorption area 111 can be separately communicated with the gas source device, so as to realize the individual vacuum control of each main adsorption area 111, so that the suction cup 11 can be applied to different sizes of While adsorbing the substrate 300 , when adsorbing a substrate 300 of a smaller size, only the main adsorption area 111 covered by the substrate 300 of this size can be vacuumed to reduce energy consumption.

Further, the edge adsorption groove 1121 in the edge adsorption area 112 can be separately connected to the air source device, so that after the main part of the substrate 300 is adsorbed by the main adsorption area 111, the edge adsorption area 112 is then vacuumed to improve the efficiency of the substrate. While the effect of 300 edge adsorption is reduced, the cost is reduced.

Specifically, in this embodiment, the suction cup 11 includes a circular first main adsorption area and a second main adsorption area located outside the first adsorption area. An edge adsorption area 112 is arranged outside the second main adsorption area. The maximum outer diameter of the adsorption area is slightly smaller than the 8-inch silicon wafer substrate 300 , and the maximum outer diameter of the edge adsorption area 112 is suitable for the 12-inch substrate 300 . When it is necessary to expose the 8-inch substrate 300, the main adsorption groove 1111 of the first main adsorption area is communicated with the vacuum source; The main adsorption grooves 1111 in the main adsorption area are all connected with the gas source core device to adsorb the main part of the 12-inch substrate 300, and then vacuumize the edge adsorption grooves 1121 in the edge adsorption area 112 to realize the 12-inch substrate 300 edge snap. In other embodiments, the number of main adsorption regions 111 may be three or more, and the size of each main adsorption region 111 may be determined according to the size of the applicable substrate 300 , which is not specifically limited in this embodiment.

In this embodiment, preferably, the main adsorption grooves 1111 in each main adsorption area 111 communicate with each other, so as to simplify the connection between the adsorption grooves 111 and the vacuum source. Specifically, in each main adsorption area 111, a main communication groove 1112 is formed along the radial direction of the suction cup 11, and the main communication groove 1112 penetrates each main adsorption groove 1111 in the main adsorption area 111 in the radial direction, Each main adsorption groove 1111 is communicated with the main communication groove 1112 , so that each main adsorption groove 1111 in the same main adsorption area 111 is communicated. Preferably, the groove bottom of the main communication groove 1112 is flush with the groove bottom of the main adsorption groove 1111 , which facilitates the processing of the main adsorption groove 1111 and the main communication groove 1112 .

More preferably, there are multiple main communication grooves 1112 along the circumferential direction of the suction cup 11 to improve the speed and consistency of the expansion of the vacuum chamber in the main suction area 111 . The main communication grooves 1112 of two adjacent main adsorption areas 111 are misplaced in the circumferential direction of the suction cup 11, which is conducive to the division and positioning of different main adsorption areas 111, and on the other hand prevents the mutual interaction between two adjacent main adsorption areas 111. is turned on to reduce the vacuum degree of the main adsorption area 111 .

Further, the edge adsorption grooves 1121 in each edge adsorption region 112 communicate with each other. Specifically, in each edge adsorption area 112, an edge communication groove 1122 is formed along the radial direction of the suction cup 11. The setting of the edge communication groove 1122 can refer to the setting of the main communication groove 1112, and will not be repeated here. And preferably, the edge communication groove 1122 and the main communication groove 1112 are arranged in a misalignment in the circumferential direction of the suction cup 11 .

As shown in Figures 10-15, in order to vacuumize the main adsorption area 111 and the edge adsorption area 112, the main air hole 1113 is opened in the main adsorption area 111, and the edge air hole 1123 is opened in the suction cup 11 corresponding to the edge adsorption area 112. The corresponding edge adsorption area 112 and each main adsorption area 111 inside the suction cup seat 41 are provided with a vacuum air passage 418 respectively. The groove bottom of the main communication groove 1112, the upper end of the edge air hole 1123 communicates with the groove bottom of the edge communication groove 1122, and the other end of the vacuum air channel 418 can communicate with the air source device.

Preferably, each air hole (including the main air hole 1113 and the edge air hole 1123) corresponding to each adsorption area (including the main adsorption area 111 and the edge adsorption area 112) is arranged at intervals along the circumferential direction of the suction cup 11 to increase the vacuuming speed and vacuum extension consistency. Preferably, the main air holes 1113 in each main adsorption area 111 are arranged in one-to-one correspondence with the main communication grooves 1112 .

Since the air holes corresponding to each adsorption area are arranged at intervals in the circumferential direction of the suction cup 11, preferably, each vacuum air channel 418 includes a vacuum distribution air channel 4181 arranged around the suction cup seat 41 and a radial direction along the suction cup seat 41. The radial air passages 4182 are provided, and each radial air passage 4182 communicates with two axial air passages 4183 extending upwards, one of which passes through the groove bottom of the corresponding vacuum distribution air passage 4181, and the other The axial air channel 4183 passes through the upper surface of the suction cup seat 41 and communicates with the corresponding air hole. The number and position of the radial air passages 4182 connected to each vacuum distribution air passage 4181 correspond to the number and position of the communication grooves (including the main communication groove 1112 and the edge communication groove 1122 ) corresponding to the adsorption area. . This setting can ensure the consistency of the vacuum pressure at each air hole in the same adsorption area, and improve the adsorption stability and force balance of the substrate 300 .

In order to facilitate the processing of the suction cup seat 41, each radial air passage 4182 runs through the outer wall surface of the suction cup seat 41, and one radial air passage 4182 in the plurality of radial air passages 4182 communicated with the same vacuum distribution air passage 4181 The air guide assembly 8 is connected, and the ends of the remaining radial air passages 4182 are blocked by plugs. The air source device evacuates the vacuum air channel 418 through the air guide assembly 8, and the setting of the air guide assembly 8 can refer to the settings in the patent application CN201820746378.X, which will not be repeated here.

Preferably, all the vacuum air distribution channels 4181 are located outside the suction cup adsorption groove 416, and among the two axial air channels 4183, the axial air channel 4183 located on the outside communicates with the vacuum air distribution channel 4181, which is beneficial for the suction cup Processing of seat 41. Since the outermost edge adsorption area 112 is located on the outside of the suction cup 11, in order to facilitate the connection between the edge adsorption area 112 and the corresponding vacuum air passage 418, an edge adsorption air passage 1125 is provided in the suction cup 11 in the radial direction. The ends communicate with the edge air holes 1123 , and each edge communication groove 1122 has a vent hole 1124 at the bottom of the groove, and the lower end of the vent hole 1124 communicates with the edge adsorption air channel 1125 . The position of the edge air hole 1123 in the radial direction of the suction cup 11 can be changed by setting the edge adsorption air channel 1125 , so that the opening position of the edge air hole 1123 can be selected according to the processing conditions of the suction cup 11 . Preferably, a plurality of ventilation holes 1124 are provided at intervals along the radial direction of the edge adsorption air channel 1125 .

As shown in Figure 15, in order to facilitate the installation of the first sealing member 12, a first sealing groove 113 is provided on the adsorption surface of the base, and the first sealing groove 113 is provided in one-to-one correspondence with the first sealing member 12, and the first sealing member 12 The lower end is embedded in the first sealing groove 113 . In order to facilitate the installation of the second sealing member 13, a second sealing groove 114 is provided on the adsorption surface of the base. Seal groove 114.

In this embodiment, the first sealing groove 113 includes an installation groove and an accommodation groove connected along the thickness direction of the suction cup 11, the installation groove is located below the accommodation groove, and the groove width of the installation groove is smaller than that of the accommodation groove. width. The lower end of the first sealing member 12 is clamped in the installation groove, and when the first sealing member 12 is compressed and deformed, the upper end of the first sealing member 12 is accommodated in the receiving groove. The clamping method can facilitate the installation and disassembly of the first sealing member 12 and simplify the processing of the suction cup 11 . In other embodiments, the connection of the first sealing member 12 in the first sealing groove 113 may also be other detachable connection methods such as threaded connection.

In order to improve the installation stability of the first sealing member 12 in the first sealing groove 113, in this embodiment, preferably, the groove width of the installation groove gradually decreases from the bottom of the groove to the opening of the groove, and the installation groove The width of the notch is smaller than the width of the lower end of the first sealing member 12, so that the shrinking notch strengthens the clamping effect on the lower end of the first sealing member 12, so that the first sealing member 12 is connected with the installation groove to improve the connection tightness and stability. More preferably, in this embodiment, the installation groove is a dovetail groove, which is convenient for processing. Further preferably, the cross section of the receiving groove is rectangular, and the groove width of the receiving groove is larger than the groove width of the installation groove, so as to improve the stability of the second groove. The accommodating capacity of the sealing element 12 is improved, and the processing of the first sealing groove 113 is facilitated.

Preferably, the first sealing member 12 includes a sealing body 121 and a locking portion 122 connected to the lower end of the sealing body 121 , the cross-sectional shape of the locking portion 122 is adapted to the cross-sectional shape of the installation groove. In this embodiment, the cross section of the sealing body 121 is a long ring structure, and the length direction of the long ring structure is consistent with the thickness direction of the suction cup 11 , so as to enhance the deformation ability of the first sealing member 12 .

The lateral surface of the second sealing groove 114 is rectangular, and the groove depth of the second sealing groove 114 is smaller than the groove depth of the first sealing groove 113 , and the groove width of the second sealing groove 114 is smaller than the groove width of the installation groove. The second seal 13 is preferably an O-ring, and the dimensions of the second seal 13 along the radial direction and the axial direction of the suction cup 11 are both smaller than the dimensions of the first seal 12 in the corresponding directions. By setting the cross-sectional size of the second sealing member 13 to be smaller than the cross-sectional size of the first sealing member 12 , it is possible to prevent the setting of the second sealing member 13 from interfering with the adsorption of the substrate 300 by the main adsorption area 111 .

Preferably, the maximum height of the first sealing member 12 protruding from the substrate adsorption surface is 3 mm to 5 mm, and the maximum height of the second sealing member 13 protruding from the substrate adsorption surface is 0.1 mm to 0.5 mm. Realize adsorption to the substrate 300 , ensure the deformability of the first sealing member 12 , and prevent the second sealing member 13 from protruding too high from the adsorption surface of the substrate to affect the adsorption of the main adsorption area 111 to the main body of the substrate 300 .

In this embodiment, the first sealing member 12 and the second sealing member 13 are preferably made of silicone rubber, which have better supporting strength, deformation ability and sealing performance. In other embodiments, the first seal 12 and the second seal 13 can also be made of other materials, such as fluorine rubber, as long as the hardness of the first seal 12 and the second seal 13 cannot be too hard, so as not to Affect the adsorption reliability of the substrate 300, and at the same time, it should not be too soft, so as to prevent the upper end surface of the first sealing member 12 from adhering to the silicon wafer after the substrate 300 is adsorbed, which will affect the transfer reliability of the substrate 300 and the contamination of the silicon wafer. The hardness of the first sealing member 12 is preferably 45-55 Shore hardness. The second sealing member 13 can adopt a common sealing ring structure.

As shown in FIG. 2 , FIG. 3 and FIG. 16 , preferably, in order to guide away the static electricity generated by friction during the transfer process of the substrate 300 , the exposure device further includes a static electricity guiding component. Specifically, the electrostatic guide assembly includes an electrostatic conductive column 14 embedded in the suction cup 11. The upper end surface of the electrostatic conductive column 14 is flush with the adsorption surface of the substrate, so that the electrostatic conductive column 14 can be in contact with the substrate 300. The electrostatic conductive column 14 The lower end is grounded.

In order to facilitate the grounding treatment of the electrostatic conductive column 14, the electrostatic guide assembly also includes an electrostatic guide structure 44 arranged on the suction cup seat 41. The suction cup seat 41 is made of a conductive material, and the suction cup seat 41 is provided with a grounding structure. The lower end of the static conductive column 14 abuts to guide the static electricity from the static conductive column 14 to the ground structure, reducing the influence of static electricity on the handover and processing of the substrate 300 .

Preferably, the electrostatic guide structure 44 includes a conductive member and an elastic member 442, the lower end of the elastic member 442 is fixed to the suction cup seat 41, and the upper end of the conductive member is supported on the upper end of the elastic member 442, so that the conductive member can elastically protrude from the suction cup seat 41. The upper surface is connected with the lower end of the electrostatic conductive column 14 . By arranging the elastic member 442 , the contact reliability between the conductive member and the electrostatic conductive column 14 can be ensured, and the problem that the conductive member cannot be in contact with the electrostatic conductive column 14 due to processing or installation errors can be avoided.

Further, the static conductive column 14 is in an inverted "T" shape, and the suction cup 11 is provided with a socket, and the shape of the socket matches the shape of the static conductive column 14 . The electrostatic conductive column 14 with an inverted "T" structure can realize the installation, positioning and positioning of the electrostatic conductive column 14 on the suction cup 11 , and prevent the electrostatic conductive column 14 from jumping out along the circumferential direction of the suction cup 11 .

Further, the conductive member is a conductive ball 441, and the lower surface of the electrostatic conductive column 14 is a plane, thus, the contact between the electrostatic conductive column 14 and the conductive member can always be a point contact, which is beneficial to eliminate the static electricity on the substrate 300 only by static electricity. The conductive posts 14 lead to the conductive balls 441 . In other embodiments, the conductive member may also have other shapes, such as a cone.

In order to facilitate the installation of the electrostatic guide structure 44, the upper surface of the suction cup seat 41 is provided with a mounting groove 419, and the elastic member 442 and the conductive ball 441 are all arranged in the mounting groove 419, and the conductive ball 441 can protrude upward through the notch of the mounting groove 419. out the upper surface of the suction cup seat 41. Preferably, the installation groove 419 includes a first groove portion 4191 and a second groove portion 4192 connected up and down, and the diameter of the first groove portion 4191 is greater than the diameter of the second groove portion 4192 . The elastic member 442 is partly accommodated in the second groove 4192 and abuts against the bottom of the second groove 4192. The conductive ball 441 is accommodated in the first groove 4191 and the diameter of the first groove 4191 is slightly larger than that of the conductive ball. The diameter of the ball 441 .

In order to prevent the conductive ball 441 from jumping out of the mounting groove 419 , the electrostatic guiding structure 44 further includes a limiting member 443 for limiting the maximum height of the conductive ball 441 protruding upward from the upper surface of the suction cup seat 41 .

In this embodiment, the limiting member 443 is installed at the notch of the installation groove 419, and has a plate-like structure parallel to the XY plane. The limiting member 443 is provided with a circular limiting hole 4443 along the Z direction to limit The diameter of the positioning hole 4443 is smaller than the diameter of the conductive ball 441 , and the conductive ball 441 partially passes through the limiting hole 4443 and the upper part protrudes from the upper surface of the suction cup seat 41 through the limiting hole 4443 .

Preferably, the limiting member 443 includes an annular ring portion 4431 and an ear plate portion 4432 extending outward along the radial direction of the ring portion 4431 , and the inner ring of the ring portion 4431 forms the aforementioned limiting hole 4443 . The notch of the installation groove 419 communicates with the limit groove 4110, the limit groove 4110 includes a connected main groove part 4111 and an extension groove part 4112, the cross section of the main groove part 4111 is circular, and the diameter of the main groove part 4111 is slightly larger than the ring The outer shape of the main groove part 4431, and the installation groove 419 penetrates the groove bottom of the main groove part 4111. The ring portion 4431 is located in the main groove portion 4111 , the ear plate portion 4432 is located in the extension groove portion 4112 , and the ear plate portion 4432 is detachably connected to the groove bottom of the extension groove portion 4112 .

Preferably, the thickness of the limiting member 443 is smaller than the depth of the limiting groove 4110, so that the limiting member 443 is sunk in the suction cup seat 41, so as to prevent the limiting member 443 from being in contact with the electrostatic conductive column 14 and affecting the electrostatic guidance of the conductive ball 441 Effect. Furthermore, a plurality of lug portions 4432 are provided at intervals along the circumferential direction of the ring portion 4431 , and the extension grooves 4112 are provided in one-to-one correspondence with the lug portions 4432 to improve the connection reliability between the limiting member 443 and the suction cup seat 41 .

In this embodiment, the limiting member 443 is made of a static dissipative material, and the conductive ball 441 and the elastic member 442 are both made of a conductive material.

As shown in Fig. 2, Fig. 7 and Fig. 17, the adsorption device 100 also includes a transfer mechanism 22, which is used to transfer the substrate 300, suck the substrate 300 to be exposed to the chuck assembly 11, or transfer the exposed substrate 300 It is removed from the chuck 11 to realize the handover between the exposure of the substrate 300 and the previous or subsequent process.

The transfer mechanism 22 includes a base 21 , a supporting plate 23 , a vertical movement assembly 22 and an adsorption assembly. The base 21 is used to support and fix the handover mechanism 22, the supporting plate 23 is arranged above the base 21, and is connected with the base 21 through the vertical movement assembly 22, so that the supporting plate 23 is driven by the vertical movement assembly 22 along the direction of the vertical suction cup 11 movement to drive the suction assembly to move in a direction perpendicular to the suction cup 11.

The suction cup 11 defines a suction hole 114 in the innermost main suction area 111 , and the suction hole 114 penetrates the suction cup 11 along the thickness direction of the suction cup 11 . The adsorption assembly is arranged along a direction perpendicular to the suction cup 11 , and includes a vertically arranged adsorption column 24 and a suction nozzle 25 arranged on the top of the adsorption column 24 , and the lower end of the adsorption column 24 is connected to the supporting plate 23 . The adsorption column 24 is perpendicular to the adsorption surface of the substrate, and the upper end of the adsorption column 24 can extend into the adsorption hole 114 and can move relative to the adsorption hole 114 in a direction perpendicular to the adsorption surface of the substrate. The adsorption column 24 is provided with a transfer air channel 241, and the transfer air The upper end of the channel 241 runs through the upper surface of the adsorption column 24, and the transfer air channel 241 communicates with the air source device through the supporting plate 23; It can fit tightly with the inner wall of the adsorption hole 114 , and the upper end of the suction nozzle 25 is higher than the upper end surface of the adsorption column 24 .

The structure of the handover mechanism 2 provided in this embodiment and the docking structure between the handover mechanism 2 and the suction cup 11 are basically the same as those in the patent application CN201820746378. The same structure as that in the patent application CN201820746378.X in the transfer mechanism 2 will be described in detail.

In this embodiment, the upper edge of the suction nozzle 25 is folded outwards to form a hem portion 251. The setting of the hem portion 251 can better fit the suction nozzle 25 to the edge of the adsorption hole 115. 115 for sealing, thereby enhancing the airtightness of adsorption.

Preferably, in this embodiment, both the suction nozzle 25 and the adsorption column 24 are made of static dissipative materials, and the supporting plate 23 and the base 21 are both made of conductive materials, so that the supporting plate 23 and the base 21 form a conductive structure, The base 21 is grounded. This arrangement can smoothly guide the static electricity generated by friction during the transfer process of the substrate 300 , avoiding safety or other problems caused by static electricity.

This embodiment also provides a lithography system, including the exposure device described above, and the lithography system provided by this embodiment, by using the exposure device above, improves the applicability and warpage tolerance of the lithography equipment to the substrate, Improved photolithographic stability and photolithographic quality.

Embodiment two

As shown in FIG. 18, the second embodiment provides an exposure device, including an exposure table 200 and an adsorption device 100. Compared with the first embodiment, the exposure device provided by the second embodiment is basically the same as that of the first embodiment. The structure of the first sealing member 12 in the suction cup assembly 11 is different. This embodiment only describes the structure different from the first embodiment, and does not repeat the same structure as the first embodiment.

In this embodiment, the cross section of the sealing body 121 is a triangular ring, and one side of the triangular ring is connected to the clamping portion 122 . This setting can enhance the deformation ability of the sealing body 121 . Preferably, the wall thickness of the triangular ring is 0.2mm-0.5mm.

This embodiment also provides a lithography system, including the exposure device described above, and the lithography system provided by this embodiment, by using the exposure device above, improves the applicability and warpage tolerance of the lithography equipment to the substrate, Improved photolithographic stability and photolithographic quality.

Embodiment Three

As shown in Figure 19, this embodiment provides an exposure device, and compared with Embodiment 1, the exposure device provided by this Embodiment 2 is basically the same as Embodiment 1, except that the first The sealing member 12 has a different structure, and this embodiment only describes the structure different from that of the first embodiment, and does not repeat the same structure as the first embodiment.

In this embodiment, the cross-section of the sealing body 121 is preferably in the shape of a broken line extending along the axial direction of the first sealing member 12 . That is to say, the sealing main body 121 includes a plurality of folded line plate parts 1211 connected in succession. When the first sealing member 12 is not squeezed, the angle between two adjacent broken line plate parts 1211 is 60°-100°, and the adjacent The two broken line plate parts 1211 are connected by arc transition. With this structure of the first sealing member 12, when the first sealing member 12 is subjected to extrusion force, the two adjacent broken line plate parts 1211 are close to each other, and the deformation ability is strong, which can reduce the vacuum adsorption pressure used for the complete adsorption of the substrate 300 size.

In this embodiment, the sealing body 121 includes three folded plate portions 1211 , and the thickness of a single folded plate portion 1211 is 0.3-0.5 mm. In other embodiments, the sealing body 121 may include two, four or more folded plate portions 1211, and the number of folded plate portions 1211 and the thickness of the folded plate portions 1211 may be determined according to the requirements of the first sealing member 12. The deformation ability is self-designed.

In this embodiment, preferably, the folded line portion 1211 located at the uppermost end of the first sealing member 12 extends outward along the center of the first sealing member 12 in a direction away from the engaging portion 122 , so that the upper end of the first sealing member 12 Forming the tapered opening is beneficial to improve the contact tightness between the base 300 and the first sealing member 12 and prevent vacuum leakage.

This embodiment also provides a lithography system, including the exposure device described above, and the lithography system provided by this embodiment, by using the exposure device above, improves the applicability and warpage tolerance of the lithography equipment to the substrate, Improved photolithographic stability and photolithographic quality.

Embodiment Four

This embodiment provides a substrate adsorption method, which uses the adsorption device in Embodiment 1, Embodiment 2 or Embodiment 3 to adsorb the substrate 300 .

The substrate adsorption method provided in this embodiment comprises steps:

Step S101: the adsorption column 24 moves upwards, so that the suction nozzle 25 protrudes from the adsorption surface of the substrate;

Step S102: the substrate transfer robot moves the substrate 300 onto the transfer mechanism 2, and makes the substrate 300 contact with the suction nozzle 25;

Step S103: Vacuum the handover airway 241 so that the suction nozzle 25 absorbs the substrate 300;

Step S104: Continuously evacuate the handover airway 241, the substrate 300 squeezes the suction nozzle 25 to deform the suction nozzle 25, the substrate 300 contacts the upper end surface of the adsorption column 24, and the adsorption column 24 performs secondary adsorption on the substrate 300;

Step S105: the substrate transfer manipulator returns;

Step S106: The adsorption column 24 drives the substrate 300 to move downward until the substrate 300 contacts the first sealing member 12, and vacuumizes the main adsorption area 111, so that the suction cup 11, the adsorption column 24 and the suction nozzle 25 simultaneously adsorb the substrate 300 ;

Step S107: the adsorption column 24 drives the base 300 to continue to move downward, so that the base 300, the first sealing member 12 and the suction cup 11 form a sealed adsorption chamber;

Step S108: the adsorption column 24 continues to drive the base 300 to move downward until the suction nozzle 25 falls into the lowest point of the adsorption hole 115, the adsorption column 24 stops moving, and stops vacuuming the transfer airway 241;

Step S109: continue to vacuumize the main adsorption area of the suction cup 11 until the first sealing member 12 is completely pressed into the first sealing groove 113, and the main body area of the substrate 300 is completely absorbed by the suction cup 11;

Step S110 : After stopping the vacuuming of the main adsorption area 111 , vacuumize the edge adsorption area 112 until the second sealing member 13 is completely retracted into the second sealing groove 114 .

Note that the above are only preferred embodiments of the present invention and applied technical principles. Those skilled in the art will understand that the present invention is not limited to the specific embodiments described herein, and that various obvious changes, readjustments and substitutions can be made by those skilled in the art without departing from the protection scope of the present invention. Therefore, although the present invention has been described in detail through the above embodiments, the present invention is not limited to the above embodiments, and can also include more other equivalent embodiments without departing from the concept of the present invention, and the present invention The scope is determined by the scope of the appended claims.

Claims (26)

1. A sucker assembly, characterized in that, comprising: A suction cup (11), the base adsorption surface of the suction cup (11) has several substrate adsorption regions concentrically arranged with the suction cup (11), each of the substrate adsorption regions includes a main adsorption region (111), the The outer diameter of the main adsorption area (111) is smaller than the outer diameter of the substrate (300) of a corresponding size, and at least the outermost substrate adsorption area includes an edge adsorption area (112) located outside the main adsorption area (111); The first seal (12), the edge of each of the main adsorption areas (111) is surrounded by the first seal (12), and the lower end of the first seal (12) is sealed and embedded in the The suction cup (11), the upper end of the first sealing member (12) can elastically protrude from the adsorption surface of the base; The second seal (13) is arranged around the outer edge of the edge adsorption area (112), the lower end of the second seal (13) is embedded in the suction cup (11), and the second seal The upper end of the member (13) can elastically protrude from the base adsorption surface, and the height of the first seal (12) that can protrude from the base adsorption surface is greater than the height that the second seal (13) can protrude from the base. The height of the adsorption surface of the substrate. 2. The suction cup assembly according to claim 1, characterized in that, the maximum height of the first sealing member (12) that can protrude from the adsorption surface of the base is 3 mm to 5 mm, and the second sealing member (13 ) can protrude from the adsorption surface of the substrate to a maximum height of 0.1 mm to 0.5 mm. 3. The suction cup assembly according to claim 1, wherein the suction surface of the base is provided with a first sealing groove (113) and a second sealing groove (114), and the first sealing groove (113) is in contact with the second sealing groove (114). The first seal (12) is set in one-to-one correspondence, the second seal groove (114) is set in one-to-one correspondence with the second seal (13), and the lower end of the first seal (12) is embedded In the first sealing groove (113), the lower end of the second sealing member (13) is embedded in the second sealing groove (114), the groove depth of the first sealing groove (113) and The groove width is respectively greater than the groove depth and groove width of the second sealing groove (114). 4. The suction cup assembly according to claim 3, characterized in that, the first sealing member (12) includes a sealing body (121) and a clamping portion (122), and the first sealing groove (113) includes a communication The receiving groove and the installation groove, the installation groove is located below the accommodation groove, and the groove width of the installation groove gradually increases from the bottom of the groove to the notch, and the clamping part (122 ) is clamped in the installation groove, and the sealing body (121) can be completely accommodated in the accommodation groove. 5. The suction cup assembly according to claim 4, characterized in that, the cross section of the sealing body (121) is a strip ring, and the length direction of the strip ring is consistent with the thickness direction of the suction cup (11) ;or The cross-section of the sealing body (121) is in the shape of a broken line, and the broken line section at the end of the broken line is inclined away from the clamping portion (122) and away from the center of the suction cup (11); or The cross section of the sealing body (121) is a triangular ring, and one side of the triangular ring is connected to the clamping portion (122). 6. The suction cup assembly according to claim 1, characterized in that, a plurality of annular main suction grooves (1111) are concentrically and spaced in the main suction area (111), and the edge suction area (112) A plurality of annular edge adsorption grooves (1121) are arranged concentrically and at intervals. Both the main adsorption groove (1111) and the edge adsorption groove (1121) can communicate with the gas source device. The distance between the edge suction grooves (1121) is smaller than the distance between two adjacent main suction grooves (1111). 7. The suction cup assembly according to claim 6, characterized in that, the main suction groove (1111) and the edge suction groove (1121) can communicate with the air source device independently. 8. The suction cup assembly according to any one of claims 1-7, characterized in that, the suction cup (11), the first seal (12) and the second seal (13) are all made of electrostatic made of dissipative material; and/or The suction cup (11) is embedded with an electrostatic conductive column (14), the upper end of the electrostatic conductive column (14) is flush with the adsorption surface of the substrate, and the lower end of the electrostatic conductive column (14) is grounded. 9. An exposure device, characterized by comprising a suction cup base (41) and the suction cup assembly according to any one of claims 1-8, the suction cup assembly being arranged on the suction cup base (41). 10. The exposure device according to claim 9, characterized in that, the suction cup (11) is embedded with an electrostatic conductive column (14), and the upper end surface of the electrostatic conductive column (14) is in contact with the adsorption surface of the substrate flat; An electrostatic guiding structure (44) and a grounding structure (46) are provided on the suction cup seat (41), the suction cup seat (41) is made of a conductive material, and the electrostatic guiding structure (44) and the electrostatic conductive column The lower ends of (14) are abutted to guide static electricity from the static electricity conductive column (14) to the ground structure (46). 11. The exposure device according to claim 10, characterized in that, the electrostatic guide structure (44) comprises a conductive member and an elastic member (442), and the lower end of the elastic member (442) is in contact with the suction cup seat (41 ) is fixed, the conductive member is supported on the upper end of the elastic member (442), so that the conductive member can elastically protrude from the upper surface of the suction cup seat (41) and connect with the static conductive column (14) bottom abutment. 12. The exposure device according to claim 11, characterized in that, the conductive member is a conductive ball (441). 13. The exposure device according to claim 11, characterized in that, the electrostatic guiding structure (44) further comprises a limiting member (443), and the limiting member (443) is used to limit the protruding of the conductive member The maximum height of the upper surface of the suction cup seat (41). 14. The exposure device according to claim 9, characterized in that, the suction cup (11) is provided with an adsorption hole (114) in the innermost main adsorption area (111), and the adsorption hole (114) penetrating through the suction cup (11) along the thickness direction of the suction cup (11); the exposure device further includes a handover mechanism (2) for substrate (300) handover, and the handover mechanism (2) includes: An adsorption column (24), which is perpendicular to the adsorption surface of the substrate, the upper end of the adsorption column (24) can extend into the adsorption hole (114) and can be perpendicular to the adsorption hole (114) along the The direction of the adsorption surface of the substrate moves, the adsorption column (24) is provided with a handover airway (241), the upper end of the handover airway (241) runs through the upper end surface of the adsorption column (24), and the handover airway (241) passes through the upper surface of the adsorption column (24). Road (241) communicates with the air source device; A suction nozzle (25), arranged on the upper end of the adsorption column (24) and communicated with the transfer air channel (241), the outer surface of the suction nozzle (25) can be connected to the inner wall of the adsorption hole (114) Sealing fit, and the upper end of the suction nozzle (25) is higher than the upper end surface of the adsorption column (24). 15. The exposure device according to claim 14, characterized in that, both the suction nozzle (25) and the adsorption column (24) are made of static dissipative materials, and the transfer mechanism (2) is provided with A conductor structure made of conductor material, the adsorption column (24) is connected to the conductor structure, and the conductor structure is grounded. 16. The exposure device according to claim 14, characterized in that, the periphery of the opening of the suction nozzle (25) is turned outward to form a folded edge portion (251). 17. The exposure device according to any one of claims 9-16, characterized in that, the exposure device further comprises an upper plate (31), and the suction cup seat (41) is rotatably arranged on the upper plate (31) On the inner side of the suction cup seat (41), an air bearing is arranged coaxially, the inner ring of the air bearing is detachably connected to the upper plate (31), and the outer ring of the air bearing is connected to the upper plate (31). The suction cup seat (41) is connected. 18. The exposure device according to claim 17, characterized in that, the outer ring of the air bearing and the inner side wall of the suction cup seat (41) are connected by a reed (33) arranged horizontally. 19. The exposure device according to claim 17, characterized in that, an air float (34) is detachably connected to the outer wall of the suction cup seat (41), and the air float (34) is along the surface of the suction cup seat (41) is provided with a plurality of uniform intervals in the circumferential direction, and the lower end surface of the air floating member (34) is flush with the lower end surface of the suction cup seat (41) or the lower end surface of the air floating member (34) is convex. Out of the lower end surface of the suction cup seat (41), the air-floating member (34) can be air-floated and supported on the upper flat plate (31). 20. The exposure device according to claim 19, characterized in that, the outer wall of the suction cup seat (41) is protruded with an air bearing installation part (413), and the air bearing installation part (413) is connected to the air bearing The floating parts (34) are provided in one-to-one correspondence, and the air floating installation part (413) is threadedly connected with the air floating part (34), so as to adjust the air floating part ( 34) The lower end surface protrudes the height of the lower end surface of the suction cup seat (41). 21. The exposure device according to claim 19, characterized in that, the lower surface of the suction cup seat (41) is provided with an air flotation air distribution channel, and the outer wall of the suction cup seat (41) is provided with a The air flotation charging port of the air flotation sub-air channel, the air flotation member (34) is provided with an air flotation channel, the lower surface of the air flotation member (34) is provided with an air flotation hole, and the air flotation channel One end of each is communicated with the air flotation hole, and the air flotation air channels of each of the air flotation components (34) are in communication with the air flotation air distribution channels. 22. The exposure device according to claim 19, characterized in that, the exposure device further comprises a vertical preload structure, and the vertical preload structure is used to place the chuck seat (41) and the upper plate A vertical preload force is applied between (31), and each of the air floating elements (34) is provided with the vertical preload structures on opposite sides along the circumferential direction of the suction cup seat (41). 23. The exposure device according to claim 22, characterized in that, the vertical preload structure includes a magnetic preload (35), and the magnetic preload (35) includes a magnet (351), and the upper The flat plate (31) includes an upper flat body (311) and a metal support plate (312) embedded in the upper flat body (311), the magnet (351) is detachably connected to the suction cup seat (41), And the magnet (351) is arranged directly above the metal support plate (312). 24. The exposure device according to claim 23, characterized in that, the metal support plate (312) is provided in one-to-one correspondence with the air float (34), and the air float (34) can be air floated supported on the metal support plate (312). 25. The exposure device according to claim 23, characterized in that, the magnetic preloader (35) further comprises a mounting cylinder (351), and a magnet mounting groove is opened on the lower end surface of the mounting cylinder (351), so that The magnet (351) is embedded in the magnet installation groove, the installation cylinder (351) is detachably connected to the suction cup seat (41), and the installation cylinder (351) is made of a magnetic isolation material. 26. A photolithography system, comprising the exposure device according to any one of claims 9-23.

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