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CN115458439B - Slow lifting groove body with spraying function for cleaning machine - Google Patents

Slow lifting groove body with spraying function for cleaning machine Download PDF

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Publication number
CN115458439B
CN115458439B CN202211031171.1A CN202211031171A CN115458439B CN 115458439 B CN115458439 B CN 115458439B CN 202211031171 A CN202211031171 A CN 202211031171A CN 115458439 B CN115458439 B CN 115458439B
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CN
China
Prior art keywords
plate
rod
cleaning
cleaning tank
sliding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202211031171.1A
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Chinese (zh)
Other versions
CN115458439A (en
Inventor
谭鑫
陈立民
赵亮
姜君
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qujing Sunshine New Energy Co ltd
Original Assignee
Qujing Sunshine New Energy Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Qujing Sunshine New Energy Co ltd filed Critical Qujing Sunshine New Energy Co ltd
Priority to CN202211031171.1A priority Critical patent/CN115458439B/en
Publication of CN115458439A publication Critical patent/CN115458439A/en
Application granted granted Critical
Publication of CN115458439B publication Critical patent/CN115458439B/en
Active legal-status Critical Current
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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00Accessories or details of general applicability for machines or apparatus for cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The invention relates to a slow lifting groove body with a spraying function for a cleaning machine, which comprises the following components: the cleaning tank, mounting panel, spray set, be provided with the mounting panel in the cleaning tank, the mounting panel with the bottom surface of cleaning tank is parallel, the cleaning tank top is provided with spray set, installs the basket of flowers that has placed the silicon chip on the mounting panel, place in the cleaning tank washs, after the washing is accomplished the mounting panel lifts out the basket of flowers from the washing liquid, spray set starts this moment, will adhere to the foam on the silicon chip dashes down, avoids the silicon chip to leave the stain when later drying.

Description

Slow lifting groove body with spraying function for cleaning machine
Technical Field
The invention belongs to the technical field of monocrystalline silicon wafer cleaning, and particularly relates to a slow lifting groove body with a spraying function for a cleaning machine.
Background
The surface of the silicon wafer has a small amount of pollution, which affects the quality and causes defects, so that the silicon wafer must be cleaned.
The existing cleaning machine is characterized in that a plurality of silicon wafers are uniformly arranged in a cleaning basket, and then the cleaning basket is placed in a cleaning tank, so that a large amount of floating foam is generated on the water surface in the cleaning process, the cleaning basket is required to be slowly lifted after the cleaning is finished, the floating foam is very easy to lift up on the silicon wafers, and after the floating foam is dried, the silicon wafers generate stains to influence the surface quality.
Disclosure of Invention
Therefore, the invention aims to solve the defects in the prior art and provides a slow lifting groove body with a spraying function for a cleaning machine.
Therefore, the technical scheme is that the slow lifting groove body with the spraying function for the cleaning machine comprises the following components: the cleaning tank, mounting panel, spray set, be provided with the mounting panel in the cleaning tank, the mounting panel with the bottom surface of cleaning tank is parallel, the cleaning tank top is provided with spray set.
Preferably, the mounting plate is connected with the lifting device.
Preferably, the lifting device includes: a first mounting frame, a first motor, a first screw rod, a first lifting plate, a first connecting plate, a second mounting frame, a sliding rod and a second lifting plate,
The cleaning tank is characterized in that one side outside the cleaning tank is provided with a first installation frame, the bottom of the first installation frame is provided with a first motor, an output shaft of the first motor is connected with one end of a first screw rod, the other end of the first screw rod is connected with the top of the first installation frame in a rotating mode, the first screw rod is connected with a first lifting plate in a threaded mode, the front end and the rear end of the first lifting plate are connected with the first installation frame in a sliding mode, one side, away from the first installation frame, of the cleaning tank is provided with a second installation frame, the top and the bottom of the second installation frame are respectively connected with two ends of a sliding rod in a rotating mode, the sliding rod is connected with the second lifting plate in a sliding mode, the top end of the second lifting plate is connected with the bottom end of the other first connecting plate, two sides of the mounting plate are respectively provided with a second connecting plate, the second connecting plate is connected with the mounting plate in a vertical mode, and the top end of the second connecting plate is connected with the bottom of one connecting plate in a vertical mode.
Preferably, a plurality of fixing plates are arranged on the mounting plate.
Preferably, the middle part of the mounting plate is hollowed out.
Preferably, the spraying device comprises: the shower is fixed at the edge of the top of the cleaning tank, a plurality of nozzles are arranged on the shower, and one end of the shower is connected with one end of the first water inlet pipe.
Preferably, a supporting frame is arranged on the cleaning tank.
Preferably, the support frame is provided with a second motor, the output end of the second motor is connected with one end of a second screw rod, and the other end of the second screw rod is rotationally connected with the support frame.
Preferably, the support frame is provided with auxiliary device, be provided with auxiliary device on the support frame, auxiliary device includes: the device comprises a movable plate, a third motor, a first fan-shaped cam, a second fan-shaped cam, a swinging plate, a sliding rail, a sliding rod, a rack, a fan-shaped gear, a first swinging rod, a second swinging rod, a first roller, a second roller, a first rotating shaft, a second rotating shaft, a connecting column, a sliding sleeve and a torsion spring, wherein the movable plate is in threaded connection with the second screw rod, the movable plate is in sliding connection with the supporting frame, the movable plate is provided with the third motor, an output shaft of the third motor is respectively connected with the center of the first fan-shaped cam and the center of the second fan-shaped cam, an output shaft of the third motor is in rotary connection with the swinging plate, the first fan-shaped cam is in central symmetry with the center of the first fan-shaped cam, one side of the swinging plate is provided with the sliding rail, the sliding rail is in sliding connection with the sliding rod, the upper part of the sliding rod is provided with a section of the rack, the rack is meshed with the fan-shaped gear, the fan-shaped gear is vertically connected with the first rotating shaft, the first rotating shaft is vertically connected with the first rotating roller, the first rotating shaft is vertically connected with the second rotating rod is vertically connected with the first rotating shaft, the second rotating rod is vertically connected with the other end of the swinging rod, the first rotating rod is vertically connected with the swinging rod, the other end is vertically connected with the swinging rod, and is in contact with the other end of the swinging rod, the sliding sleeve is rotationally connected with the middle part of the second swinging rod, the movable plate is connected with the first swinging rod through a torsion spring, and the movable plate is connected with the second swinging rod through another torsion spring.
Preferably, the second swinging rod is in a V shape, and a cleaning brush is arranged at the bottom of the sliding rod.
The technical scheme of the invention has the following advantages: the flower basket with the silicon chips is arranged on the mounting plate, the mounting plate is arranged in the cleaning tank for cleaning, the flower basket is lifted out of the cleaning liquid by the mounting plate after the cleaning is finished, and the spraying device is started at the moment to wash down the floating foam attached to the silicon chips, so that the phenomenon that the silicon chips are stained when the silicon chips are subsequently dried is avoided.
Drawings
The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate the invention and together with the embodiments of the invention, serve to explain the invention. In the drawings:
FIG. 1 is a schematic front view of the present invention;
FIG. 2 is a schematic view of the installation of a shower pipe of the present invention;
FIG. 3 is a schematic view of the installation of the support frame of the present invention;
FIG. 4 is a schematic view of the auxiliary device of the present invention;
FIG. 5 is a schematic view of the installation of a third motor of the present invention;
1, cleaning a tank; 2. a mounting plate; 3. a first mounting frame; 4. a first motor; 5. a first screw; 6. a first lifting plate; 7. a first connection plate; 8. a second connecting plate; 9. a second mounting frame; 10. a slide bar; 11. a second lifting plate; 12. a fixing plate; 13. a shower pipe; 14. a spout; 15. a first water inlet pipe; 16. a support frame; 17. a second motor; 18. a second screw; 19. a movable plate; 20. a third motor; 21. a first sector cam; 22. a second sector cam; 23. a swinging plate; 24. a slide rail; 25. a slide bar; 26. a rack; 27. a sector gear; 28. a first swing lever; 29. a second swing lever; 30. a first roller; 31. a second roller; 32. a first rotation shaft; 33. a second rotation shaft; 34. a connecting column; 35. a sliding sleeve; 36. a cleaning brush; 37. a torsion spring.
Detailed Description
In order to make the technical problems, technical schemes and beneficial effects to be solved more clear, the invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
It will be understood that when an element is referred to as being "mounted" or "disposed" on another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly or indirectly connected to the other element.
It is to be understood that the terms "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are merely for convenience in describing and simplifying the description based on the orientation or positional relationship shown in the drawings, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus are not to be construed as limiting the invention.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
The invention provides a slow lifting groove body with a spraying function for a cleaning machine, which is shown in figure 1 and comprises the following components: the cleaning tank 1, mounting panel 2, spray set, be provided with mounting panel 2 in the cleaning tank 1, mounting panel 2 with the bottom surface of cleaning tank 1 is parallel, cleaning tank 1 top is provided with spray set.
The working principle of the technical scheme has the beneficial effects that: the flower basket (a special tool for storing, etching and carrying silicon wafers widely used in semiconductor manufacturing) with the silicon wafers is arranged on the mounting plate, the single flower basket uniformly arranges and places a plurality of silicon wafers by using the clamping grooves at the bottom of the single flower basket, the mounting plate is arranged in the cleaning tank for cleaning, the mounting plate lifts the flower basket out of the cleaning liquid after the cleaning is finished, and at the moment, the spraying device is started to wash down floating foam attached to the silicon wafers, so that the pollution is avoided when the silicon wafers are subsequently dried.
In one embodiment, the mounting plate 2 is connected to a lifting device, and the lifting device drives the mounting plate 2 to move.
In one embodiment, as shown in fig. 1-2, the lifting device comprises: a first mounting frame 3, a first motor 4, a first screw 5, a first lifting plate 6, a first connecting plate 7, a second connecting plate 8, a second mounting frame 9, a slide bar 10, a second lifting plate 11,
The cleaning tank 1 outside one side is provided with first mounting frame 3, first mounting frame 3 bottom is provided with first motor 4, first motor 4's output shaft with the one end of first screw rod 5 is connected, first screw rod 5's the other end with the top of first mounting frame 3 rotates to be connected, first screw rod 5 with first lifter plate 6 threaded connection, the front end, the rear end of first lifter plate 6 with first mounting frame 3 sliding connection, the cleaning tank 1 outside keep away from one side of first mounting frame 3 is provided with second mounting frame 9, the top and the bottom of second mounting frame 9 respectively with slide bar 10's both ends rotation are connected, slide bar 10 is last with second lifter plate 11 sliding connection, the top of second lifter plate 11 with another the bottom of first connector plate 7 is connected, the both sides of mounting plate 2 all are provided with second connecting plate 8, second connecting plate 8 with mounting plate 2 are perpendicular to be connected, the top of second connecting plate 8 with the connecting plate is perpendicular to the bottom of connecting plate.
The working principle of the technical scheme has the beneficial effects that: the first motor 4 drives the first screw 5 to rotate, the first screw 5 drives the first lifting plate 6 to move up and down, so that the first connecting plate 7, the second connecting plate 8 and the second lifting plate 11 follow the first lifting plate 6 to move, the flower basket is fixed on the mounting plate 2, the first lifting plate 6 descends, then the silicon wafer is cleaned in the cleaning liquid, and after the cleaning is completed, the first lifting plate 6 ascends, so that the silicon wafer leaves the cleaning liquid and is drained.
In one embodiment, a plurality of fixing plates 12 are provided on the mounting plate 2 for fixing the flower basket.
In one embodiment, the middle part of the mounting plate 2 is hollowed out, so that a part of cleaning liquid can be drained when the silicon wafer rises.
In one embodiment, the spray device comprises: the shower 13, spout 14, first inlet tube 15, shower 13 is fixed rinse tank 1 top edge, be provided with a plurality of on the shower 13 spout 14, the one end of shower 13 with the one end of first inlet tube 15 is connected, first inlet tube 15 lets in with water in the shower 13, rivers follow spout 14 department blowout sprays the silicon chip, can reduce the production of washing liquid surface bubble simultaneously.
In one embodiment, the cleaning tank 1 is provided with a supporting frame 16, which plays a supporting role.
In one embodiment, the support 16 is provided with a second motor 17, an output end of the second motor 17 is connected with one end of a second screw 18, the other end of the second screw 18 is rotatably connected with the support 16, and the second motor 17 controls the second screw to rotate 18.
In one embodiment, as shown in fig. 3-5, an auxiliary device is disposed above the cleaning tank 1, and the auxiliary device includes: the movable plate 19, the third motor 20, the first sector cam 21, the second sector cam 22, the swinging plate 23, the sliding rail 24, the sliding rod 25, the rack 26, the sector gear 27, the first swinging rod 28, the second swinging rod 29, the first roller 30, the second roller 31, the first rotating shaft 32, the second rotating shaft 33, the connecting post 34, the sliding sleeve 35, the torsion spring 37, the movable plate 19 is in threaded connection with the second screw 18, the movable plate 19 is in sliding connection with the supporting frame 16, the third motor 20 is arranged on the movable plate 19, the output shaft of the third motor 20 is respectively connected with the circle center of the first sector cam 21 and the circle center of the second sector cam 22, the output shaft of the third motor 20 is in rotating connection with the swinging plate 23, one side of the swinging plate 23 is provided with the sliding rail 24, the sliding rail 24 is in sliding connection with the sliding rod 25, the sliding rod 25 is provided with the first sector gear 26, the rack 26 is in sliding connection with the first rotating shaft 32, the second rotating shaft 28 is in vertical connection with the swinging plate 32, the other side of the swinging plate 27 is in sliding connection with the first rotating shaft 32, the second rotating shaft is in vertical connection with the swinging plate 34, the second rotating shaft 28 is in sliding connection with the second rotating shaft 32, the other end of the second rotating shaft 33 is rotatably connected with the movable plate 19, the other end of the second swinging rod 29 is rotatably connected with the second roller 31, the second roller 31 can be in contact with the second sector cam 22, the sliding sleeve 35 is rotatably connected with the middle part of the second swinging rod 29, the movable plate 19 is further connected with the first swinging rod 28 through a torsion spring 37, and the movable plate 19 is further connected with the second swinging rod 29 through another torsion spring 37.
In one embodiment, the second swing lever 29 is V-shaped.
In one embodiment, the bottom of the sliding bar 25 is provided with a cleaning brush 36.
The working principle of the technical scheme has the beneficial effects that: after the mounting plate 2 lifts the basket containing the silicon chips above the cleaning groove 1, the third motor 20 rotates to drive the first sector cam 21 and the second sector cam 22 to rotate, so that the first swinging rod 28 and the second swinging rod 29 swing, when the first roller 30 moves from the linear edge of the first sector cam 21 to the arc edge of the outer ring, the first roller 30 is lifted upwards, and the sector gear 27 simultaneously rotates upwards, so that the rack 26 drives the sliding rod 25 to move upwards; then, the linear edge of the second sector cam 22 pushes the second roller 31 to move backward, and the second roller 31 gradually approaches the arc edge of the outer ring of the second sector cam 22, so that the bottom end of the sliding rod 25 also moves backward; when the second roller 31 moves to the outer arc edge of the second sector cam 22, the first roller 30 just moves from the outer arc edge of the first sector cam 21 to the straight line edge, so that the first roller 30 moves down quickly, the sector gear 27 rotates down, drives the rack 26 to move down, and further makes the bottom of the sliding rod 25 move down; when the second roller 31 moves from the arc edge to the straight edge of the outer ring of the second sector cam 22, the second roller 31 rolls forward, the second swinging rod 29 swings forward, and drives the swinging plate 23 to rotate, so that the bottom of the sliding rod 25 moves forward; therefore, the positions of the first roller 30 and the second roller 31 are alternately changed by the rotation of the first sector cam 21 and the second sector cam 22, so that the bottom end of the swinging rod moves in a nearly rectangular track, the cleaning brush 3636 at the bottom of the swinging rod cleans the surface of silicon wafers, the swinging rod stretches the cleaning brush 36 into the gap between two silicon wafers by using the downward movement because the silicon wafers are uniformly arranged on the basket, the bottom end of the swinging rod moves forward to clean the surface of the silicon wafers, and then the cleaning brush 36 is pulled upward, so that the water on the surface of the silicon wafers can be accelerated to flow downwards and drain, the efficiency is improved when the subsequent drying process is shortened, the floating foam which is not washed away can be cleaned off, the second motor 17 is used for controlling the movement of the movable plate 19, the position of the auxiliary device is adjusted, the surfaces of a plurality of silicon wafers can be continuously cleaned, and the specific surface of the silicon wafers can be cleaned.
It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.

Claims (6)

1. The utility model provides a take cleaning machine of function of spraying to carry slowly and draw cell body which characterized in that includes: the cleaning tank comprises a cleaning tank (1), a mounting plate (2) and a spraying device, wherein the mounting plate (2) is arranged in the cleaning tank (1), the mounting plate (2) is parallel to the bottom surface of the cleaning tank (1), and the spraying device is arranged at the top of the cleaning tank (1);
A supporting frame (16) is arranged on the cleaning tank (1);
the support frame (16) is provided with a second motor (17), the output end of the second motor (17) is connected with one end of a second screw rod (18), and the other end of the second screw rod (18) is rotationally connected with the support frame (16);
An auxiliary device is arranged on the supporting frame (16), and the auxiliary device comprises: the movable plate (19), the third motor (20), the first sector cam (21), the second sector cam (22), the swinging plate (23), the sliding rail (24), the sliding rod (25), the rack (26), the sector gear (27), the first swinging rod (28), the second swinging rod (29), the first roller (30), the second roller (31), the first rotating shaft (32), the second rotating shaft (33), the connecting column (34), the sliding sleeve (35) and the torsion spring (37), the movable plate (19) is in threaded connection with the second screw (18), the movable plate (19) is in sliding connection with the supporting frame (16), the third motor (20) is arranged on the movable plate (19), the output shaft of the third motor (20) is respectively connected with the center of the first sector cam (21) and the center of the second sector cam (22), the output shaft of the third motor (20) is rotationally connected with the swinging plate (23), the first sector cam (21) is in sliding connection with the second sector cam (22) and is in sliding connection with the sliding rail (24) on one side of the sliding rail (24), the upper part of the sliding rod (25) is provided with a section of the rack (26), the rack (26) is meshed with the sector gear (27), the sector gear (27) is vertically connected with the first rotating shaft (32), one end of the first rotating shaft (32) is vertically connected with the movable plate (19), the first rotating shaft (32) is vertically connected with one end of the first swinging rod (28), the other end of the first swinging rod (28) is rotationally connected with the first roller (30), the first roller (30) can be contacted with the first sector cam (21), the bottom of the swinging plate (23) is connected with one end of the connecting column (34), the connecting column (34) is in sliding connection with the sliding sleeve (35), one end of the second swinging rod (29) is vertically connected with one end of the second rotating shaft (33), the other end of the second rotating shaft (33) is rotationally connected with the movable plate (19), the second swinging rod (29) is in contact with the second roller (31) through the second roller (31), the second roller (31) is in sliding connection with the middle part (37), the movable plate (19) is connected with the second swinging rod (29) through the other torsion spring (37);
The second swinging rod (29) is in a V shape, and a cleaning brush (36) is arranged at the bottom of the sliding rod (25).
2. The slow lifting groove body with the spraying function for the cleaning machine according to claim 1, wherein the mounting plate (2) is connected with a lifting device.
3. The slow-lifting tank body with a spraying function for a cleaning machine according to claim 2, wherein the lifting device comprises: the first mounting frame (3), the first motor (4), the first screw rod (5), the first lifting plate (6), the first connecting plate (7), the second connecting plate (8), the second mounting frame (9), the sliding rod (10) and the second lifting plate (11),
The utility model discloses a cleaning tank, including washing tank (1), first mounting frame (3), washing tank (1), second mounting frame (9), slide bar (10) are connected with the top rotation of first mounting frame (3), first screw (5) with first lifter plate (6) threaded connection, front end, the rear end of first lifter plate (6) with first mounting frame (3) sliding connection, washing tank (1) outside is kept away from one side of first mounting frame (3) is provided with second mounting frame (9), the top and the bottom of second mounting frame (9) respectively with the both ends rotation of slide bar (10) are connected, on slide bar (10) with second lifter plate (11) sliding connection, the top of second lifter plate (11) with another first lifter plate (6) threaded connection, the bottom of first lifter plate (6) is provided with second connecting plate (8), the bottom of second mounting frame (9) is connected with first connecting plate (8), the bottom of second lifter plate (8) is connected with connecting plate (8) perpendicular, connecting plate (8) is connected with first connecting plate (8).
4. The slow-lifting tank body with the spraying function for the cleaning machine according to claim 1, wherein a plurality of fixing plates (12) are arranged on the mounting plate (2).
5. The slow lifting groove body with the spraying function for the cleaning machine according to claim 1 is characterized in that the middle of the mounting plate (2) is hollowed out.
6. The slow-lifting tank body with a spraying function for a cleaning machine according to claim 1, wherein the spraying device comprises: the cleaning tank comprises a spray pipe (13), nozzles (14) and a first water inlet pipe (15), wherein the spray pipe (13) is fixed at the top edge of the cleaning tank (1), a plurality of the nozzles (14) are arranged on the spray pipe (13), and one end of the spray pipe (13) is connected with one end of the first water inlet pipe (15).
CN202211031171.1A 2022-08-26 2022-08-26 Slow lifting groove body with spraying function for cleaning machine Active CN115458439B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202211031171.1A CN115458439B (en) 2022-08-26 2022-08-26 Slow lifting groove body with spraying function for cleaning machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202211031171.1A CN115458439B (en) 2022-08-26 2022-08-26 Slow lifting groove body with spraying function for cleaning machine

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CN115458439A CN115458439A (en) 2022-12-09
CN115458439B true CN115458439B (en) 2024-05-28

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