CN115449746B - Coating device with fixture tool for realizing batch coating - Google Patents
Coating device with fixture tool for realizing batch coating Download PDFInfo
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- CN115449746B CN115449746B CN202211122368.6A CN202211122368A CN115449746B CN 115449746 B CN115449746 B CN 115449746B CN 202211122368 A CN202211122368 A CN 202211122368A CN 115449746 B CN115449746 B CN 115449746B
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- 238000000576 coating method Methods 0.000 title claims abstract description 57
- 239000011248 coating agent Substances 0.000 title claims abstract description 52
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 99
- 239000000758 substrate Substances 0.000 claims abstract description 38
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 36
- 239000011733 molybdenum Substances 0.000 claims abstract description 36
- 230000000694 effects Effects 0.000 claims description 8
- 230000000712 assembly Effects 0.000 abstract description 3
- 238000000429 assembly Methods 0.000 abstract description 3
- 238000003825 pressing Methods 0.000 abstract description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 14
- 238000000034 method Methods 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Measurement Of Radiation (AREA)
Abstract
Description
技术领域Technical field
本发明涉及镀膜技术领域,具体涉及一种具有实现批量镀膜的夹具工装的镀膜装置。The invention relates to the field of coating technology, and in particular to a coating device having a fixture and tooling for batch coating.
背景技术Background technique
掩膜法是由宏观机械加工中的电解加工技术发展而来的,有着悠久的历史,该法的要点是用绝缘掩膜将被加工材料不需刻蚀的部分屏蔽起来而后进行阳极溶解,从而使金属膜仅镀在没有被屏蔽掩盖的地方。The mask method was developed from the electrolytic machining technology in macro-machining and has a long history. The main point of this method is to use an insulating mask to shield the parts of the material being processed that do not need to be etched and then perform anode dissolution, thereby Allow the metal film to be plated only where it is not covered by the shield.
掩膜片通常采用钼片,可通过线切割的方式加工,获取不同形状、长度和宽度的钼片,并通过在加工出的钼片上切割任意形状的缝隙,从而使后续金属膜仅能够通过缝隙,从而在钼片下方镀成缝隙相应形状的金属膜。Mask sheets usually use molybdenum sheets, which can be processed by wire cutting to obtain molybdenum sheets of different shapes, lengths and widths, and by cutting slits of any shape on the processed molybdenum sheets, so that subsequent metal films can only pass through the slits , thereby plating a metal film with a corresponding shape of the gap under the molybdenum sheet.
现有技术中,一般是通过在不同的钼片上切割出不同的缝隙,在进行镀膜时,先将需镀膜的基底放置在镀膜机上,并取出相应的钼片手动放置在基底上方进行固定,从而使镀膜机在基底上镀上所需形状的金属膜,上述方式仅能用于少量基底的镀膜使用,在需要进行大批量镀膜时难以保障多个基底镀膜的一致性。In the existing technology, different slits are generally cut on different molybdenum sheets. When coating, the substrate to be coated is first placed on the coating machine, and the corresponding molybdenum sheet is taken out and placed manually on top of the substrate for fixation. The coating machine is used to coat a metal film of the desired shape on the substrate. The above method can only be used for coating a small number of substrates. When large quantities of coatings are required, it is difficult to ensure the consistency of the coatings on multiple substrates.
另外,在钼片放置在基底上时,一般需要调整钼片覆盖的位置,以保障钼片上的缝隙位于基底上的相应区域,但是,钼片在与基底贴合时调整钼片位置可能会导致基底被钼片划伤,从而降低加工成品的良品率。In addition, when the molybdenum sheet is placed on the base, it is generally necessary to adjust the position of the molybdenum sheet to ensure that the gap on the molybdenum sheet is located in the corresponding area on the base. However, adjusting the position of the molybdenum sheet when the molybdenum sheet is attached to the base may cause The substrate is scratched by the molybdenum sheet, thereby reducing the yield of the finished product.
发明内容Contents of the invention
本发明的目的在于提供一种具有实现批量镀膜的夹具工装的镀膜装置,以解决现有技术中的不适用于大批量对基底镀膜,以及调整钼片位置可能会划伤钼片的问题。The purpose of the present invention is to provide a coating device with a fixture for batch coating, so as to solve the problems in the prior art that it is not suitable for coating substrates in large batches, and that adjusting the position of the molybdenum sheet may scratch the molybdenum sheet.
为解决上述技术问题,本发明具体提供下述技术方案:In order to solve the above technical problems, the present invention specifically provides the following technical solutions:
一种具有实现批量镀膜的夹具工装的镀膜装置,具备:A coating device with a fixture and tooling for batch coating, which has:
底座,其上表面用于放置传感器基底;a base, the upper surface of which is used to place the sensor substrate;
钼片,其设置在所述底座上,并用于贴合所述底座上传感器基底的顶端,并在所述钼片覆盖传感器基底的区域开设缝隙;A molybdenum sheet, which is arranged on the base and used to fit the top of the sensor base on the base, and a gap is opened in the area where the molybdenum sheet covers the sensor base;
盖板,其贴合在所述钼片的上表面,并开在传感器基底正上方的区域开设通槽;A cover plate, which is attached to the upper surface of the molybdenum sheet and has a through-slot in the area directly above the sensor base;
水平调整组件,其设置在所述底座的内部,并能够调整位于所述底座内部的水平位置;A horizontal adjustment component, which is arranged inside the base and capable of adjusting the horizontal position inside the base;
多个定位组件,其皆固定连接在所述水平调整组件上,并依次穿过所述底座和所述钼片与所述盖板连接;A plurality of positioning components, all of which are fixedly connected to the horizontal adjustment component, and are connected to the cover plate through the base and the molybdenum piece in turn;
所述水平调整组件能够通过多个所述定位组件调整所述钼片在所述底座顶端的位置。The horizontal adjustment component can adjust the position of the molybdenum piece on the top of the base through a plurality of positioning components.
作为本发明的一种优选方案,所述底座包括上底座和下底座,并在所述上底座和所述下底座之间设有四个支撑件;As a preferred solution of the present invention, the base includes an upper base and a lower base, and four supports are provided between the upper base and the lower base;
所述上底座位于所述下底座的正上方,四个所述支撑件分别位于所述上底座和所述下底座的四角处,所述上底座和所述下底座通过四个所述支撑件连接为一体结构;The upper base is located directly above the lower base, and the four support members are respectively located at the four corners of the upper base and the lower base. The upper base and the lower base pass through the four support members. Connected into an integrated structure;
其中,在任意两个相邻的所述支撑件之间形成用于连接所述水平调整组件的活动空间。Wherein, an activity space for connecting the level adjustment assembly is formed between any two adjacent support members.
作为本发明的一种优选方案,所述上底座上开设有多个用于放入传感器基底的条形凹槽,所述上底座上设有多个用于供所述定位组件穿过的圆孔;As a preferred solution of the present invention, the upper base is provided with a plurality of strip grooves for placing the sensor substrate, and the upper base is provided with a plurality of circular grooves for the positioning assembly to pass through. hole;
所述圆孔的内径大于所述定位组件的直径,多个所述圆孔均匀分布在多个所述条形凹槽的外侧。The inner diameter of the circular hole is larger than the diameter of the positioning component, and a plurality of the circular holes are evenly distributed outside the plurality of strip grooves.
所述条形凹槽的深度小于传感器基底的厚度。The depth of the strip groove is less than the thickness of the sensor substrate.
作为本发明的一种优选方案,所述下底座上设有两个第一滑轨和两个第二滑轨,两个所述第一滑轨分别位于所述下底座的左右两侧的活动空间,并且所述第一滑轨的两端分别朝向两个相邻的所述支撑件,两个所述第二滑轨分别位于所述下底座的前后两侧的活动空间,并且所述第二滑轨的两端分别朝向两个相邻的所述支撑件。As a preferred solution of the present invention, the lower base is provided with two first slide rails and two second slide rails, and the two first slide rails are respectively located on the left and right sides of the lower base. space, and the two ends of the first slide rail are respectively facing the two adjacent supports, the two second slide rails are respectively located in the activity space on the front and rear sides of the lower base, and the third The two ends of the two slide rails face the two adjacent supporting members respectively.
作为本发明的一种优选方案,所述钼片上开设有多个用于供所述定位组件穿过的定位孔,在所述钼片上位于所述条形凹槽正上方的区域开设有多个镀膜缝;As a preferred solution of the present invention, the molybdenum sheet is provided with a plurality of positioning holes for the positioning assembly to pass through, and a plurality of positioning holes are provided on the molybdenum sheet in the area directly above the strip groove. coating seams;
其中,多个所述定位孔与多个所述定位组件一一对应,所述定位孔的内径与所述定位组件的直径相等。Wherein, a plurality of positioning holes correspond to a plurality of positioning components, and the inner diameter of the positioning holes is equal to the diameter of the positioning component.
作为本发明的一种优选方案,所述盖板上设有多个用于连接所述定位组件的定位件,在所述盖板上位于所述条形凹槽的正上方开设有镀膜槽;As a preferred solution of the present invention, the cover plate is provided with a plurality of positioning members for connecting the positioning components, and a coating groove is provided on the cover plate directly above the strip groove;
所述定位件的内部设有用于供所述定位组件伸入的内腔,并在所述定位件的顶端中心位置开设有螺栓孔,所述螺栓孔的内部设有能够与所述定位组件顶端通过螺纹连接的固定螺栓。The interior of the positioning member is provided with an inner cavity for the positioning component to extend into, and a bolt hole is provided at the center of the top of the positioning member. The interior of the bolt hole is provided with an inner cavity capable of connecting with the top of the positioning component. Threaded fixing bolts.
作为本发明的一种优选方案,所述水平调整组件包括设置在所述上底座和所述下底座之间的活动连板,所述活动连板上设有横向分布的左右调节件和前后调节件,所述左右调节件和所述前后调节件在所述活动连板相互垂直分布,并且所述左右调节件在所述活动连板内位于所述前后调节件的上方;As a preferred solution of the present invention, the horizontal adjustment assembly includes a movable connecting plate disposed between the upper base and the lower base. The movable connecting plate is provided with transversely distributed left and right adjustment members and front and rear adjustment members. parts, the left and right adjusting parts and the front and rear adjusting parts are vertically distributed with each other on the movable connecting plate, and the left and right adjusting parts are located above the front and rear adjusting parts in the movable connecting plate;
所述左右调节件能够控制所述活动连板和所述前后调节件同步左右移动,所述前后调节件能够控制所述活动连板和所述左右调节件同步前后移动。The left and right adjusting parts can control the movable connecting plate and the left and right adjusting parts to move left and right synchronously, and the front and rear adjusting parts can control the movable connecting plate and the left and right adjusting parts to move forward and backward synchronously.
作为本发明的一种优选方案,所述左右调节件包括横向穿过所述活动连板并与之通过螺纹连接的左右丝杆,所述左右丝杆的两端分别位于所述活动连板的左右两侧并转动连接有第一滑块,在一所述第一滑块的外侧转动连接有第一旋钮,所述第一旋钮通过与所述左右丝杆的一端连接以控制所述左右丝杆转动;As a preferred solution of the present invention, the left and right adjustment members include left and right screw rods that pass transversely through the movable connecting plate and are threadedly connected thereto. The two ends of the left and right screw rods are respectively located on the movable connecting plate. A first slide block is rotatably connected to the left and right sides, and a first knob is rotatably connected to the outside of the first slide block. The first knob is connected to one end of the left and right screw rods to control the left and right screw rods. The rod rotates;
两个所述第一滑块的底端皆开设有滑槽,两个所述第一滑块皆通过所述滑槽各滑动连接在两个所述第一滑轨上;The bottom ends of the two first slide blocks are provided with slide grooves, and the two first slide blocks are each slidably connected to the two first slide rails through the slide grooves;
所述前后调节件包括横向穿过所述活动连板并与之通过螺纹连接的前后丝杆,所述前后丝杆的两端分别位于所述活动连板的前后两侧并转动连接有第二滑块,在一所述第二滑块的外侧转动连接有第二旋钮,所述第二旋钮通过与所述前后丝杆的一端连接以控制所述前后丝杆转动;The front and rear adjustment members include front and rear screw rods that pass through the movable connecting plate transversely and are threadedly connected to the movable connecting plate. The two ends of the front and rear screw rods are respectively located at the front and rear sides of the movable connecting plate and are rotationally connected with a second screw rod. The slider is rotatably connected to a second knob on the outside of the second slider. The second knob is connected to one end of the front and rear screw rods to control the rotation of the front and rear screw rods;
两个所述第二滑块的底端皆开设有滑槽,两个所述第二滑块皆通过所述滑槽各滑动连接在两个所述第二滑轨上。The bottom ends of the two second slide blocks are each provided with slide grooves, and the two second slide blocks are each slidably connected to the two second slide rails through the slide grooves.
作为本发明的一种优选方案,所述定位组件包括固定在所述活动连板上的定位柱,所述定位柱的外侧套设有滑套,在所述滑套的外侧套设有波形弹簧;As a preferred solution of the present invention, the positioning assembly includes a positioning post fixed on the movable connecting plate, a sliding sleeve is set on the outside of the positioning post, and a wave spring is set on the outside of the sliding sleeve. ;
所述滑套在所述定位柱的外侧用于支撑所述钼片,多个所述滑套共同支撑以使所述钼片在放置时不与所述底座上的传感器基底接触;The sliding sleeve is used to support the molybdenum piece on the outside of the positioning post, and multiple sliding sleeves are supported together so that the molybdenum piece does not contact the sensor base on the base when placed;
其中,所述定位柱的顶端中心位置开设有螺纹孔。Wherein, a threaded hole is provided at the center of the top of the positioning post.
作为本发明的一种优选方案,所述滑套在所述定位柱上能够纵向滑动,所述定位柱的外侧设有凹陷结构,所述滑套的内侧设有凸起结构,所述滑套的凸起结构始终在所述定位柱的凹陷结构内上下位移,在所述滑套的凸起结构与所述定位柱的凹陷结构顶端顶合时所述滑套位于所述定位柱上的最高位置;As a preferred solution of the present invention, the sliding sleeve can slide longitudinally on the positioning post, a concave structure is provided on the outside of the positioning post, and a convex structure is provided on the inside of the sliding sleeve. The convex structure always moves up and down in the recessed structure of the positioning post. When the convex structure of the sliding sleeve and the top of the recessed structure of the positioning post collide, the sliding sleeve is located at the highest point on the positioning post. Location;
其中,所述波形弹簧的底端与所述活动连板接触以弹性支撑所述滑套,并且所述波形弹簧通过弹性支撑以使所述滑套在所述定位柱上处于最高位置。Wherein, the bottom end of the wave spring is in contact with the movable connecting plate to elastically support the sliding sleeve, and the wave spring is elastically supported so that the sliding sleeve is in the highest position on the positioning post.
本发明与现有技术相比较具有如下有益效果:Compared with the prior art, the present invention has the following beneficial effects:
(1)本发明的镀膜夹具能够定位并固定基底,通过采用掩膜法以获取有效的铂膜镀层,且能够同时制作多个不同测点、不同种类的传感器,在保障了多个基底镀膜的一致性同时提高了研制效率。(1) The coating fixture of the present invention can position and fix the substrate, obtain effective platinum film coating by using the mask method, and can simultaneously produce multiple different measuring points and different types of sensors, while ensuring the coating of multiple substrates. Consistency also improves development efficiency.
(2)本发明通过将钼片连接的方式设为先定位后压合的方式,并且能够通过控制多个定位件同步移动以连带调整钼片的位置,且在未压合时钼片不与传感器基底接触,从而便于对钼片的位置进行微调,以保障钼片上开缝的区域精准的贴合下方的传感器基底。(2) The present invention connects the molybdenum pieces by positioning them first and then pressing them, and can jointly adjust the position of the molybdenum pieces by controlling the synchronous movement of multiple positioning parts, and the molybdenum pieces are not connected to each other when they are not pressed. The sensor base is in contact, making it easy to fine-tune the position of the molybdenum piece to ensure that the slit area on the molybdenum piece accurately fits the sensor base below.
附图说明Description of the drawings
为了更清楚地说明本发明的实施方式或现有技术中的技术方案,下面将对实施方式或现有技术描述中所需要使用的附图作简单地介绍。显而易见地,下面描述中的附图仅仅是示例性的,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据提供的附图引伸获得其它的实施附图。In order to more clearly explain the embodiments of the present invention or the technical solutions in the prior art, the drawings that need to be used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings in the following description are only exemplary. For those of ordinary skill in the art, other implementation drawings can be obtained based on the extension of the provided drawings without exerting creative efforts.
图1为本发明提供装置整体的示意图。Figure 1 is a schematic diagram of the entire device provided by the present invention.
图2为本发明提供钼片的结构示意图。Figure 2 is a schematic structural diagram of the molybdenum sheet provided by the present invention.
图3为本发明提供底座的结构示意图。Figure 3 is a schematic structural diagram of the base provided by the present invention.
图4为本发明提供左右、前后调节件的安装示意图。Figure 4 is a schematic diagram of the installation of the left and right, front and rear adjustment components provided by the present invention.
图5为本发明提供活动连板的结构示意图。Figure 5 is a schematic structural diagram of the movable connecting plate provided by the present invention.
图6为本发明提供定位组件的连接剖面图。Figure 6 is a cross-sectional view of the connection of the positioning assembly provided by the present invention.
图中的标号分别表示如下:The labels in the figure are as follows:
1-底座;2-钼片;3-盖板;4-水平调整组件;5-定位组件;1-base; 2-molybdenum plate; 3-cover plate; 4-level adjustment component; 5-positioning component;
11-上底座;12-下底座;13-支撑件;11-Upper base; 12-Lower base; 13-Support;
111-条形凹槽;112-圆孔;121-第一滑轨;122-第二滑轨;111-strip groove; 112-round hole; 121-first slide rail; 122-second slide rail;
21-定位孔;22-镀膜缝;21-Positioning hole; 22-Coating seam;
31-定位件;32-镀膜槽;31-positioning piece; 32-coating tank;
311-内腔;312-螺栓孔;313-固定螺栓;311-inner cavity; 312-bolt hole; 313-fixing bolt;
41-活动连板;42-左右调节件;43-前后调节件;41-movable connecting plate; 42-left and right adjustment parts; 43-front and rear adjustment parts;
421-左右丝杆;422-第一滑块;423-第一旋钮;431-前后丝杆;432-第二滑块;433-第二旋钮;421-left and right screw rods; 422-first slider; 423-first knob; 431-front and rear screw rods; 432-second slider; 433-second knob;
51-定位柱;52-滑套;53-波形弹簧。51-positioning column; 52-sliding sleeve; 53-wave spring.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of protection of the present invention.
如图1至图6所示,本发明提供了一种具有实现批量镀膜的夹具工装的镀膜装置,具备:As shown in Figures 1 to 6, the present invention provides a coating device with a fixture and tooling for batch coating, which is provided with:
底座1,其上表面用于放置传感器基底;Base 1, the upper surface of which is used to place the sensor substrate;
钼片2,其设置在底座1上,并用于贴合底座1上传感器基底的顶端,并在钼片2覆盖传感器基底的区域开设缝隙;The molybdenum sheet 2 is arranged on the base 1 and is used to fit the top of the sensor base on the base 1, and a gap is opened in the area where the molybdenum sheet 2 covers the sensor base;
盖板3,其贴合在钼片2的上表面,并开在传感器基底正上方的区域开设通槽;The cover plate 3 is attached to the upper surface of the molybdenum sheet 2 and has a slot in the area directly above the sensor base;
水平调整组件4,其设置在底座1的内部,并能够调整位于底座1内部的水平位置;The horizontal adjustment component 4 is arranged inside the base 1 and can adjust the horizontal position inside the base 1;
多个定位组件5,其皆固定连接在水平调整组件4上,并依次穿过底座1和钼片2与盖板3连接;A plurality of positioning components 5 are all fixedly connected to the horizontal adjustment component 4, and are connected to the cover plate 3 through the base 1 and the molybdenum piece 2 in turn;
水平调整组件4能够通过多个定位组件5调整钼片2在底座1顶端的位置。The horizontal adjustment component 4 can adjust the position of the molybdenum sheet 2 on the top of the base 1 through a plurality of positioning components 5 .
现有技术中,一般是通过在不同的钼片2上切割出不同的缝隙,在进行镀膜时,先将需镀膜的基底放置在镀膜机上,并取出相应的钼片2手动放置在基底上方进行固定,从而使镀膜机在基底上镀上所需形状的金属膜,上述方式仅能用于少量基底的镀膜使用,在需要进行大批量镀膜时难以保障多个基底镀膜的一致性。In the prior art, different slits are generally cut on different molybdenum sheets 2. When coating, the substrate to be coated is first placed on the coating machine, and the corresponding molybdenum sheet 2 is taken out and manually placed on top of the substrate. Fixed, so that the coating machine can plate a metal film of the required shape on the substrate. The above method can only be used for coating a small number of substrates. It is difficult to ensure the consistency of the coatings on multiple substrates when large batches of coatings are required.
本发明的镀膜夹具能够定位并固定基底,通过采用掩膜法以获取有效的铂膜镀层,且能够同时制作多个不同测点、不同种类的传感器,在保障了多个基底镀膜的一致性同时提高了研制效率。The coating fixture of the present invention can position and fix the substrate, obtain effective platinum film coating by using the mask method, and can simultaneously produce multiple different measuring points and different types of sensors, while ensuring the consistency of multiple substrate coatings. Improved development efficiency.
在钼片2放置在基底上时,一般需要调整钼片2覆盖的位置,以保障钼片2上的缝隙位于基底上的相应区域,但是,钼片2在与基底贴合时调整钼片2位置可能会导致基底被钼片2划伤,从而降低加工成品的良品率。When the molybdenum sheet 2 is placed on the base, it is generally necessary to adjust the position covered by the molybdenum sheet 2 to ensure that the gap on the molybdenum sheet 2 is located in the corresponding area on the base. However, the molybdenum sheet 2 must be adjusted when it is attached to the base. The position may cause the substrate to be scratched by the molybdenum sheet 2, thereby reducing the yield rate of the processed products.
本发明通过将钼片2连接的方式设为先定位后压合的方式,并且能够通过控制多个定位件同步移动以连带调整钼片2的位置,且在未压合时钼片2不与传感器基底接触,从而便于对钼片2的位置进行微调,以保障钼片2上开缝的区域精准的贴合下方的传感器基底。In the present invention, the molybdenum sheet 2 is connected by positioning first and then pressing, and can jointly adjust the position of the molybdenum sheet 2 by controlling multiple positioning parts to move synchronously, and the molybdenum sheet 2 does not interact with the molybdenum sheet 2 when it is not pressed. The sensor base is in contact, thereby making it easy to fine-tune the position of the molybdenum piece 2 to ensure that the slit area on the molybdenum piece 2 accurately fits the sensor base below.
其中,底座1包括上底座11和下底座12,并在上底座11和下底座12之间设有四个支撑件13;The base 1 includes an upper base 11 and a lower base 12, and four supports 13 are provided between the upper base 11 and the lower base 12;
上底座11位于下底座12的正上方,四个支撑件13分别位于上底座11和下底座12的四角处,上底座11和下底座12通过四个支撑件13连接为一体结构;The upper base 11 is located directly above the lower base 12, and four support members 13 are located at the four corners of the upper base 11 and the lower base 12. The upper base 11 and the lower base 12 are connected into an integrated structure by the four support members 13;
其中,在任意两个相邻的支撑件13之间形成用于连接水平调整组件4的活动空间。An activity space for connecting the level adjustment assembly 4 is formed between any two adjacent supports 13 .
上底座11上开设有多个用于放入传感器基底的条形凹槽111,上底座11上设有多个用于供定位组件5穿过的圆孔112,该镀膜夹具工装是用于片状铂膜电阻热流传感器,可以根据传感器种类的使用需求设计为条形凹槽111,或是柱形的凹槽用于镀柱状传感器基底。The upper base 11 is provided with a plurality of strip grooves 111 for placing the sensor substrate. The upper base 11 is provided with a plurality of round holes 112 for the positioning assembly 5 to pass through. The coating fixture tooling is used for film The platinum film resistance heat flow sensor can be designed as a strip groove 111 according to the use requirements of the sensor type, or a cylindrical groove for plating the cylindrical sensor substrate.
圆孔112的内径大于定位组件5的直径,多个圆孔112均匀分布在多个条形凹槽111的外侧。The inner diameter of the circular holes 112 is larger than the diameter of the positioning component 5 , and the plurality of circular holes 112 are evenly distributed outside the plurality of strip grooves 111 .
条形凹槽111的深度小于传感器基底的厚度。The depth of the strip groove 111 is smaller than the thickness of the sensor substrate.
下底座12上设有两个第一滑轨121和两个第二滑轨122,两个第一滑轨121分别位于下底座12的左右两侧的活动空间,并且第一滑轨121的两端分别朝向两个相邻的支撑件13,两个第二滑轨122分别位于下底座12的前后两侧的活动空间,并且第二滑轨122的两端分别朝向两个相邻的支撑件13。The lower base 12 is provided with two first slide rails 121 and two second slide rails 122. The two first slide rails 121 are respectively located in the activity spaces on the left and right sides of the lower base 12, and both sides of the first slide rail 121 The two second slide rails 122 are respectively located in the activity spaces on the front and rear sides of the lower base 12, and the two ends of the second slide rail 122 are respectively facing the two adjacent support members. 13.
钼片2上开设有多个用于供定位组件5穿过的定位孔21,在钼片2上位于条形凹槽111正上方的区域开设有多个镀膜缝22,钼片2上开的缝实际上就是镀的膜的形状(可以是直线也可以是“S”形或“W”形)。因为铂金被电离后溅射到底座1,底座1上放置传感器基底上只有钼片2没有遮挡的位置,才能溅射上铂金。A plurality of positioning holes 21 are opened on the molybdenum sheet 2 for the positioning components 5 to pass through. A plurality of coating slits 22 are opened on the molybdenum sheet 2 in the area directly above the strip groove 111. The seam is actually the shape of the plated film (it can be a straight line or an "S" shape or a "W" shape). Because platinum is sputtered to the base 1 after being ionized, platinum can only be sputtered on the unobstructed position of the sensor substrate placed on the base 1 by the molybdenum sheet 2.
其中,多个定位孔21与多个定位组件5一一对应,定位孔21的内径与定位组件5的直径相等。The plurality of positioning holes 21 correspond to the plurality of positioning components 5 one-to-one, and the inner diameter of the positioning holes 21 is equal to the diameter of the positioning components 5 .
盖板3上设有多个用于连接定位组件5的定位件31,在盖板3上位于条形凹槽111的正上方开设有镀膜槽32;The cover plate 3 is provided with a plurality of positioning pieces 31 for connecting the positioning components 5, and a coating groove 32 is provided on the cover plate 3 directly above the strip groove 111;
定位件31的内部设有用于供定位组件5伸入的内腔311,并在定位件31的顶端中心位置开设有螺栓孔312,螺栓孔312的内部设有能够与定位组件5顶端通过螺纹连接的固定螺栓313。The interior of the positioning member 31 is provided with an inner cavity 311 for the positioning component 5 to extend into, and a bolt hole 312 is provided at the center of the top of the positioning member 31. The interior of the bolt hole 312 is provided with an inner cavity 311 that can be threadedly connected to the top of the positioning component 5. of fixing bolts 313.
一般一次上底座11的条形凹槽111上可以放置几十个片状传感器基底,钼片2仅在需要在相应位置加工出相应的缝即可。Generally, dozens of sheet sensor substrates can be placed on the strip groove 111 of the upper base 11 at one time, and the molybdenum sheet 2 only needs to be processed with corresponding seams at corresponding positions.
将玻璃基底放置在底座1的条形凹槽111内,并将钼片2的多个定位孔21穿过各定位组件5,直至钼片覆盖下方的传感器基底,之后将盖板3的多个定位件31套在各定位组件5上,之后拧紧多个固定螺栓313,使盖板3将钼片2充分压合在上底座11上的传感器基底。Place the glass substrate in the strip groove 111 of the base 1, and pass the multiple positioning holes 21 of the molybdenum sheet 2 through each positioning component 5 until the molybdenum sheet covers the sensor base below, and then put the multiple positioning holes 21 of the cover plate 3 The positioning parts 31 are placed on each positioning component 5, and then a plurality of fixing bolts 313 are tightened so that the cover plate 3 fully presses the molybdenum sheet 2 to the sensor base on the upper base 11.
之后将夹具置入镀膜机中,密封好后,抽真空,充入氩气,调节高压放电电流(或电压),使铂金靶片电离,产生离子束,根据电压控制镀膜时间,完成后,关闭高压电源,放气即可。Then put the fixture into the coating machine, seal it, evacuate it, fill it with argon gas, adjust the high-voltage discharge current (or voltage) to ionize the platinum target, generate an ion beam, control the coating time according to the voltage, and close it after completion High voltage power supply, just deflate it.
上底座11上的条形凹槽111是放置玻璃片基底的,玻璃片状基底厚度只有1mm,钼片2是平的,只有0.09mm厚,传感器基底装在上底座11的条形凹槽111里,基底表面比上底座11表面略高0.1mm,上面覆盖钼片2,在钼片2压合时,会优先与传感器基底接触,使钼片2与基底表面贴合紧密,铂金通过钼片2上的缝隙溅射传感器基底上。The strip groove 111 on the upper base 11 is for placing the glass sheet substrate. The thickness of the glass sheet substrate is only 1mm. The molybdenum sheet 2 is flat and only 0.09mm thick. The sensor substrate is installed in the strip groove 111 of the upper base 11. Here, the surface of the base is slightly higher than the surface of the upper base 11 by 0.1mm, and is covered with molybdenum sheet 2. When the molybdenum sheet 2 is pressed, it will be in preferential contact with the sensor base, so that the molybdenum sheet 2 is closely attached to the base surface, and the platinum passes through the molybdenum sheet. 2 on the gap sputtered sensor substrate.
其中,定位组件5包括固定在活动连板41上的定位柱51,定位柱51的外侧套设有滑套52,在滑套52的外侧套设有波形弹簧53;Among them, the positioning assembly 5 includes a positioning post 51 fixed on the movable connecting plate 41, a sliding sleeve 52 is set on the outside of the positioning post 51, and a wave spring 53 is set on the outside of the sliding sleeve 52;
滑套52在定位柱51的外侧用于支撑钼片2,多个滑套52共同支撑以使钼片2在放置时不与底座1上的传感器基底接触;The sliding sleeve 52 is used to support the molybdenum piece 2 on the outside of the positioning column 51. Multiple sliding sleeves 52 are supported together so that the molybdenum piece 2 does not contact the sensor base on the base 1 when placed;
其中,定位柱51的顶端中心位置开设有螺纹孔。A threaded hole is provided at the center of the top of the positioning post 51 .
滑套52在定位柱51上能够纵向滑动,定位柱51的外侧设有凹陷结构,滑套52的内侧设有凸起结构,滑套52的凸起结构始终在定位柱51的凹陷结构内上下位移,在滑套52的凸起结构与定位柱51的凹陷结构顶端顶合时滑套52位于定位柱51上的最高位置;The sliding sleeve 52 can slide longitudinally on the positioning post 51. The outside of the positioning post 51 is provided with a recessed structure, and the inside of the sliding sleeve 52 is provided with a convex structure. The convex structure of the sliding sleeve 52 is always up and down within the recessed structure of the positioning post 51. Displacement, when the convex structure of the sliding sleeve 52 and the top of the concave structure of the positioning column 51 are pushed together, the sliding sleeve 52 is located at the highest position on the positioning column 51;
其中,波形弹簧53的底端与活动连板41接触以弹性支撑滑套52,并且波形弹簧53通过弹性支撑以使滑套52在定位柱51上处于最高位置。The bottom end of the wave spring 53 is in contact with the movable connecting plate 41 to elastically support the sliding sleeve 52 , and the wave spring 53 is elastically supported so that the sliding sleeve 52 is at the highest position on the positioning post 51 .
在钼片2放入多个定位组件5上时,是通过多个定位孔21活动套在多个定位柱51上,直至钼片底端与滑套52接触,由波形弹簧53提供弹力,使得钼片2底端被过个滑套52弹性支撑,从而使钼片2放置后其底端不与下方的传感器基底接触,便于后续使用水平调整组件微调钼片2的位置。When the molybdenum sheet 2 is placed on the multiple positioning assemblies 5, it is movable on the multiple positioning posts 51 through the multiple positioning holes 21 until the bottom end of the molybdenum sheet contacts the sliding sleeve 52, and the wave spring 53 provides elastic force, so that The bottom end of the molybdenum piece 2 is elastically supported by a sliding sleeve 52, so that after the molybdenum piece 2 is placed, its bottom end does not contact the sensor base below, which facilitates the subsequent use of the horizontal adjustment component to fine-tune the position of the molybdenum piece 2.
在钼片2位置确定后,安装盖板3的过程中,多个定位柱51伸入多个定位件31的内腔311中,并使用固定螺栓313持续拧入定位柱,从而使盖板3均匀压合钼片2,并通过钼片2持续下降压合多个滑套52和波形弹簧53,直至钼片2与传感器基底接触。After the position of the molybdenum sheet 2 is determined, during the installation of the cover plate 3, the plurality of positioning posts 51 extend into the inner cavities 311 of the plurality of positioning parts 31, and the fixing bolts 313 are used to continuously screw into the positioning posts, so that the cover plate 3 Press the molybdenum piece 2 evenly, and press the plurality of sliding sleeves 52 and wave springs 53 by continuously lowering the molybdenum piece 2 until the molybdenum piece 2 contacts the sensor base.
其中,水平调整组件4包括设置在上底座11和下底座12之间的活动连板41,活动连板41上设有横向分布的左右调节件42和前后调节件43,左右调节件42和前后调节件43在活动连板41相互垂直分布,并且左右调节件42在活动连板41内位于前后调节件43的上方;Among them, the horizontal adjustment assembly 4 includes a movable connecting plate 41 arranged between the upper base 11 and the lower base 12. The movable connecting plate 41 is provided with horizontally distributed left and right adjustment members 42 and front and rear adjustment members 43. The adjusting parts 43 are vertically distributed with each other on the movable connecting plate 41, and the left and right adjusting parts 42 are located above the front and rear adjusting parts 43 in the movable connecting plate 41;
左右调节件42能够控制活动连板41和前后调节件43同步左右移动,前后调节件43能够控制活动连板41和左右调节件42同步前后移动。The left and right adjusting members 42 can control the movable connecting plate 41 and the front and rear adjusting members 43 to move left and right synchronously, and the front and rear adjusting members 43 can control the movable connecting plate 41 and the left and right adjusting members 42 to move forward and backward synchronously.
左右调节件42包括横向穿过活动连板41并与之通过螺纹连接的左右丝杆421,左右丝杆421的两端分别位于活动连板41的左右两侧并转动连接有第一滑块422,在一第一滑块422的外侧转动连接有第一旋钮423,第一旋钮423通过与左右丝杆421的一端连接以控制左右丝杆421转动;The left and right adjusting members 42 include left and right screw rods 421 that pass transversely through the movable connecting plate 41 and are threadedly connected to the movable connecting plate 41. The two ends of the left and right screw rods 421 are respectively located on the left and right sides of the movable connecting plate 41 and are rotationally connected with a first slider 422. , a first knob 423 is rotatably connected to the outside of a first slider 422, and the first knob 423 is connected to one end of the left and right screw rods 421 to control the rotation of the left and right screw rods 421;
两个第一滑块422的底端皆开设有滑槽,两个第一滑块422皆通过滑槽各滑动连接在两个第一滑轨121上;The bottom ends of the two first slide blocks 422 are both provided with slide grooves, and the two first slide blocks 422 are each slidably connected to the two first slide rails 121 through the slide grooves;
前后调节件43包括横向穿过活动连板41并与之通过螺纹连接的前后丝杆431,前后丝杆431的两端分别位于活动连板41的前后两侧并转动连接有第二滑块432,在一第二滑块432的外侧转动连接有第二旋钮433,第二旋钮433通过与前后丝杆431的一端连接以控制前后丝杆431转动;The front and rear adjustment members 43 include front and rear screw rods 431 that pass transversely through the movable connecting plate 41 and are threadedly connected thereto. Both ends of the front and rear screw rods 431 are respectively located at the front and rear sides of the movable connecting plate 41 and are rotationally connected with a second slide block 432. , a second knob 433 is rotatably connected to the outside of a second slider 432, and the second knob 433 is connected to one end of the front and rear screw rods 431 to control the rotation of the front and rear screw rods 431;
两个第二滑块432的底端皆开设有滑槽,两个第二滑块432皆通过滑槽各滑动连接在两个第二滑轨122上。The bottom ends of the two second slide blocks 432 are each provided with slide grooves, and the two second slide blocks 432 are each slidably connected to the two second slide rails 122 through the slide grooves.
在放置钼片2后,此时钼片2位于传感器基底接触,若是需要调整钼片2覆盖传感器基底的位置时,可通过转动第一旋钮423,由第一旋钮423连同左右丝杆421在两个第一滑块422之间转动,通过螺纹的作用会连同活动连板41左右移动,活动连板41会连同多个定位组件5在圆孔内移动,从而使定位在多个定位组件5上的钼片2左右移动,活动连板41左右移动时,通过前后调节件43的两个第二滑块432在各第二滑轨122上滑动,以确保活动连板41始终能朝向特定方向往复滑动。After placing the molybdenum piece 2, the molybdenum piece 2 is in contact with the sensor base. If you need to adjust the position of the molybdenum piece 2 covering the sensor base, you can rotate the first knob 423, and the first knob 423 together with the left and right screw rods 421 move between the two sides. The first slide blocks 422 rotate between each other, and the movable connecting plate 41 will move left and right through the action of the thread. The movable connecting plate 41 will move in the circular hole together with the multiple positioning components 5, thereby positioning on the multiple positioning components 5. When the molybdenum piece 2 moves left and right, and the movable connecting plate 41 moves left and right, the two second slide blocks 432 of the front and rear adjustment members 43 slide on each second slide rail 122 to ensure that the movable connecting plate 41 can always reciprocate in a specific direction. slide.
可通过转动第二旋钮433,由第二旋钮433连同前后丝杆431在两个第二滑块432之间转动,通过螺纹的作用会连同活动连板41前后移动,活动连板41会连同多个定位组件5在圆孔内移动,从而使定位在多个定位组件5上的钼片2前后移动,活动连板41前后移动时,通过左右调节件42的两个第一滑块422在各第一滑轨121上滑动,以确保活动连板41始终能朝向特定方向往复滑动。By turning the second knob 433, the second knob 433 together with the front and rear screw rods 431 rotate between the two second slide blocks 432. Through the action of the threads, the movable connecting plate 41 will move forward and backward, and the movable connecting plate 41 will move together with the multiple Each positioning component 5 moves within the circular hole, thereby causing the molybdenum sheets 2 positioned on the multiple positioning components 5 to move forward and backward. When the movable connecting plate 41 moves forward and backward, the two first slide blocks 422 of the left and right adjustment members 42 move in each direction. The first slide rail 121 slides upward to ensure that the movable connecting plate 41 can always slide back and forth in a specific direction.
以上实施例仅为本申请的示例性实施例,不用于限制本申请,本申请的保护范围由权利要求书限定。本领域技术人员可以在本申请的实质和保护范围内,对本申请做出各种修改或等同替换,这种修改或等同替换也应视为落在本申请的保护范围内。The above embodiments are only exemplary embodiments of the present application and are not used to limit the present application. The protection scope of the present application is defined by the claims. Those skilled in the art can make various modifications or equivalent substitutions to this application within the essence and protection scope of this application, and such modifications or equivalent substitutions should also be deemed to fall within the protection scope of this application.
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