CN115440643B - Wafer carrying device and method - Google Patents
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- CN115440643B CN115440643B CN202211240302.7A CN202211240302A CN115440643B CN 115440643 B CN115440643 B CN 115440643B CN 202211240302 A CN202211240302 A CN 202211240302A CN 115440643 B CN115440643 B CN 115440643B
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- 238000000034 method Methods 0.000 title claims abstract description 12
- 230000005540 biological transmission Effects 0.000 claims description 41
- 238000001514 detection method Methods 0.000 claims description 14
- 230000001681 protective effect Effects 0.000 claims description 10
- 238000007689 inspection Methods 0.000 abstract description 9
- 235000012431 wafers Nutrition 0.000 description 229
- 230000033001 locomotion Effects 0.000 description 8
- 238000003860 storage Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 238000000844 transformation Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
本发明公开了一种晶圆运载装置及方法,晶圆运载装置包括:机柜、基座、升降装置;转盘,设置于升降装置;延伸转架,设置于转盘;第一驱动装置和第二驱动装置,均设置于延伸转架;第一晶圆取放板和第二晶圆取放板,均与延伸转架滑动连接;第一驱动装置驱动第一晶圆取放板滑动;第二驱动装置驱动第二晶圆取放板滑动;第一晶圆取放板位于第二晶圆取放板下方。由于晶圆运载装置中设置两个晶圆取放板,且两个晶圆取放板相互独立,分别取放待检测晶圆和已检测晶圆,尤其是在检测位置上时,通过第二晶圆取放板取出已检测晶圆后,可以立即采用第一晶圆取放板放入待检测晶圆,缩短更换晶圆的时间,提高了晶圆的运载效率。
The invention discloses a wafer carrying device and method. The wafer carrying device includes: a cabinet, a base, and a lifting device; a turntable arranged on the lifting device; an extension turntable arranged on the turntable; a first driving device and a second driving device The devices are all arranged on the extension turntable; the first wafer pick-and-place plate and the second wafer pick-and-place plate are both slidingly connected with the extension turntable; the first drive device drives the first wafer pick-and-place plate to slide; the second drive The device drives the second wafer pick-and-place plate to slide; the first wafer pick-and-place plate is located under the second wafer pick-and-place plate. Since two wafer pick-and-place boards are set in the wafer carrying device, and the two wafer pick-and-place boards are independent of each other, the wafer to be inspected and the inspected wafer are respectively picked and placed, especially at the inspection position, through the second After the wafer pick-and-place board takes out the inspected wafer, the first wafer pick-and-place board can be used to put the wafer to be inspected immediately, which shortens the time for replacing the wafer and improves the carrying efficiency of the wafer.
Description
技术领域technical field
本发明涉及晶圆制造技术领域,尤其涉及的是一种晶圆运载装置及方法。The invention relates to the technical field of wafer manufacturing, in particular to a wafer carrying device and method.
背景技术Background technique
晶圆(wafer)是由高纯度,几乎无缺陷的单晶材料制成的,其纯度为99.9999999%(9N)或更高。以硅制晶圆生产为例,首先用晶圆锯(一种线锯)对硅锭进行切片。在切片后,先进行化学蚀刻以去除加工步骤中的晶体损伤通过研磨去除晶圆正面和背面的锯痕和表面缺陷,最后进行抛光以形成晶圆。Wafers are made of high-purity, nearly defect-free single-crystal material with a purity of 99.9999999% (9N) or higher. Taking silicon wafer production as an example, silicon ingots are first sliced with a wafer saw (a type of wire saw). After slicing, chemical etching is performed to remove crystal damage from processing steps, saw marks and surface defects on the front and back sides of the wafer are removed by grinding, and finally polishing is performed to form the wafer.
晶圆测试平台是芯片生产厂家用于检测晶圆片(Wafer)上的裸片(Die)的结构的一种自动化检测运动平台。主流的晶圆的尺寸正由8英寸往12英寸,甚至18英寸发展。现有技术中,晶圆测试平台的检测位置上更换晶圆时,需要先将晶圆取下放好,再去取另一个晶圆并放到检测位置,这个过程耗时较大,导致晶圆运输效率较低。同时,还存在晶圆运载装置成本较高的问题。The wafer test platform is an automatic detection motion platform used by chip manufacturers to detect the structure of the die on the wafer (Wafer). The size of mainstream wafers is developing from 8 inches to 12 inches, or even 18 inches. In the prior art, when replacing a wafer at the detection position of the wafer test platform, the wafer needs to be removed and put away first, and then another wafer is taken and placed at the detection position. This process takes a long time and causes the wafer Transport efficiency is low. At the same time, there is also the problem of high cost of the wafer carrying device.
因此,现有技术还有待于改进和发展。Therefore, the prior art still needs to be improved and developed.
发明内容Contents of the invention
本发明要解决的技术问题在于,针对现有技术的上述缺陷,提供一种晶圆运载装置及方法,旨在解决现有技术中晶圆运载效率较低的问题。The technical problem to be solved by the present invention is to provide a wafer carrying device and method aiming at solving the problem of low wafer carrying efficiency in the prior art in view of the above defects of the prior art.
本发明解决技术问题所采用的技术方案如下:The technical solution adopted by the present invention to solve technical problems is as follows:
一种晶圆运载装置,其中,包括:A wafer carrier, comprising:
机柜;Cabinet;
基座,设置于所述机柜;a base set on the cabinet;
升降装置,设置于所述基座;a lifting device arranged on the base;
转盘,设置于所述升降装置;Turntable, set on the lifting device;
延伸转架,设置于所述转盘;an extended turntable, arranged on the turntable;
第一驱动装置和第二驱动装置,均设置于所述延伸转架;The first driving device and the second driving device are both arranged on the extension turret;
第一晶圆取放板和第二晶圆取放板,均与所述延伸转架滑动连接;The first wafer pick-and-place plate and the second wafer pick-and-place plate are both slidably connected to the extended turntable;
其中,所述第一驱动装置驱动所述第一晶圆取放板滑动;Wherein, the first driving device drives the first wafer pick-and-place plate to slide;
所述第二驱动装置驱动所述第二晶圆取放板滑动;The second driving device drives the second wafer pick-and-place plate to slide;
所述第一晶圆取放板位于所述第二晶圆取放板下方。The first wafer pick-and-place plate is located below the second wafer pick-and-place plate.
所述的晶圆运载装置,其中,所述转盘采用中空旋转平台,所述延伸转架包括:The wafer carrying device, wherein the turntable adopts a hollow rotating platform, and the extended turntable includes:
筒体,设置于所述中空旋转平台;The cylinder is arranged on the hollow rotating platform;
延伸板,设置于所述筒体背离所述中空旋转平台的一端;an extension plate, arranged at one end of the cylinder away from the hollow rotating platform;
其中,所述第一晶圆取放板和所述第二晶圆取放板均沿所述延伸板的长度方向滑动。Wherein, both the first wafer pick-and-place plate and the second wafer pick-and-place plate slide along the length direction of the extension plate.
所述的晶圆运载装置,其中,所述第一驱动装置包括:The wafer carrying device, wherein the first driving device includes:
第一皮带传动器,设置于所述延伸板,且所述第一皮带传动器的同步带与所述第一晶圆取放板连接;The first belt drive is arranged on the extension plate, and the timing belt of the first belt drive is connected to the first wafer pick-and-place plate;
外传动轴,位于所述筒体内,且与所述第一皮带传动器的主动轮连接;The outer transmission shaft is located in the barrel and connected with the driving pulley of the first belt drive;
第二皮带传动器,所述第二皮带传动器的从动轮与所述外传动轴连接;a second belt drive, the driven wheel of the second belt drive is connected to the outer transmission shaft;
第一驱动件,设置于所述筒体外,所述第一驱动件的输出轴与所述第二皮带传动器的主动轮连接。The first driving part is arranged outside the cylinder, and the output shaft of the first driving part is connected with the driving pulley of the second belt drive.
所述的晶圆运载装置,其中,所述第二驱动装置包括:The wafer carrying device, wherein the second driving device includes:
第三皮带传动器,设置于所述延伸板,且所述第三皮带传动器的同步带与所述第二晶圆取放板连接;所述第三皮带传动器位于所述第一皮带传动器下方;The third belt drive is arranged on the extension plate, and the timing belt of the third belt drive is connected to the second wafer pick-and-place plate; the third belt drive is located on the first belt drive under the device;
内传动轴,位于所述外传动轴内,且与所述第三皮带传动器的主动轮连接;所述内传动轴套设在所述外传动轴外;The inner transmission shaft is located in the outer transmission shaft and connected with the driving wheel of the third belt drive; the inner transmission shaft is sleeved outside the outer transmission shaft;
第四皮带传动器,所述第四皮带传动器的从动轮与所述内传动轴连接;所述第四皮带传动器位于所述第二皮带传动器的上方;A fourth belt drive, the driven wheel of the fourth belt drive is connected to the inner transmission shaft; the fourth belt drive is located above the second belt drive;
第二驱动件,设置于所述筒体外,所述第二驱动件的输出轴与所述第四皮带传动器的主动轮连接。The second driving member is arranged outside the barrel, and the output shaft of the second driving member is connected with the driving pulley of the fourth belt drive.
所述的晶圆运载装置,其中,所述中空旋转平台包括:The wafer carrying device, wherein the hollow rotating platform includes:
轴承,所述轴承的内圈设置于所述升降装置;a bearing, the inner ring of the bearing is arranged on the lifting device;
旋转驱动件,设置于所述升降装置;A rotating drive member is arranged on the lifting device;
第一旋转齿轮,与旋转驱动件的输出轴连接;a first rotary gear connected to the output shaft of the rotary drive;
第二旋转齿轮,设置于所述轴承的外圈,并与所述第一旋转齿轮啮合。The second rotating gear is arranged on the outer ring of the bearing and meshes with the first rotating gear.
所述的晶圆运载装置,其中,所述内传动轴向所述轴承的内圈延伸设置,且所述内传动轴的端部设置抵接块,所述抵接块位于所述轴承的内圈内,且所述抵接块与所述轴承的内圈抵接。In the above-mentioned wafer carrying device, wherein, the inner drive shaft is extended to the inner ring of the bearing, and an abutment block is provided at the end of the inner drive shaft, and the abutment block is located in the inner ring of the bearing. inside the ring, and the abutting block abuts against the inner ring of the bearing.
所述的晶圆运载装置,其中,所述筒体上设置有第一通孔,所述第一驱动件位于所述筒体外,所述第二皮带传动器的主动轮与所述第一驱动件的输出轴连接,所述第二皮带传动器的从动轮与所述外传动轴同心设置,且位于所述筒体内,所述第二皮带传动器的同步带穿过所述第一通孔以围绕所述第二皮带传动器的主动轮和从动轮;Said wafer carrying device, wherein, said barrel is provided with a first through hole, said first drive member is located outside said barrel, and the drive pulley of said second belt drive is connected with said first drive connected to the output shaft of the component, the driven wheel of the second belt drive is set concentrically with the outer drive shaft and is located in the cylinder, and the timing belt of the second belt drive passes through the first through hole to surround the driving pulley and the driven pulley of the second belt drive;
所述筒体上设置有第二通孔,所述第二驱动件位于所述筒体外,所述第四皮带传动器的主动轮与所述第二驱动件的输出轴连接,所述第四皮带传动器的从动轮与所述内传动轴同心设置,且位于所述筒体内以及位于所述内传动轴外,所述第四皮带传动器的同步带穿过所述第二通孔以围绕所述第四皮带传动器的主动轮和从动轮。The cylinder is provided with a second through hole, the second driving member is located outside the cylinder, the driving wheel of the fourth belt drive is connected to the output shaft of the second driving member, and the fourth The driven wheel of the belt drive is arranged concentrically with the inner drive shaft, and is located inside the barrel and outside the inner drive shaft, and the timing belt of the fourth belt drive passes through the second through hole to surround The driving wheel and the driven wheel of the fourth belt drive.
所述的晶圆运载装置,其中,所述升降装置采用丝杆运动台,所述丝杆运动台包括:The wafer carrying device, wherein the lifting device adopts a screw moving table, and the screw moving table includes:
丝杆驱动件,设置于所述基座;a screw driving part arranged on the base;
丝杆,转动设置于所述基座,并与所述丝杆驱动件的输出轴连接;the screw rod is rotatably arranged on the base and connected with the output shaft of the screw drive member;
滑块,与所述丝杆螺纹连接;The slider is threadedly connected with the screw rod;
导轨,设置于所述基座;guide rails, arranged on the base;
其中,所述滑块与所述导轨滑动连接。Wherein, the slider is slidably connected with the guide rail.
所述的晶圆运载装置,其中,所述晶圆运载装置还包括:The wafer carrying device, wherein the wafer carrying device further comprises:
防护罩,设置于所述机柜,所述防护罩具有开口。The protective cover is arranged on the cabinet, and the protective cover has an opening.
一种晶圆运载方法,其中,应用于如上任意一项所述的晶圆运载装置,所述晶圆运载方法包括步骤:A wafer carrying method, wherein, applied to the wafer carrying device as described in any one of the above, the wafer carrying method comprises the steps of:
控制第二晶圆取放板将已检测晶圆自检测位置取出;Controlling the second wafer pick-and-place plate to take out the detected wafer from the detection position;
控制第一晶圆取放板将待检测晶圆放入所述检测位置。Controlling the first wafer pick-and-place plate to place the wafer to be detected into the detection position.
有益效果:由于本申请的晶圆运载装置中设置两个晶圆取放板,且两个晶圆取放板相互独立,分别取放待检测晶圆和已检测晶圆,尤其是在检测位置上时,通过第二晶圆取放板取出已检测晶圆后,可以立即采用第一晶圆取放板放入待检测晶圆,缩短更换晶圆的时间,提高了晶圆的运载效率,且本申请的晶圆运载装置结构简单,成本较低。Beneficial effects: Since two wafer pick-and-place plates are set in the wafer carrying device of the present application, and the two wafer pick-and-place plates are independent of each other, the wafer to be detected and the detected wafer can be picked and placed respectively, especially at the detection position When it is on, after taking out the inspected wafer through the second wafer pick-and-place board, the first wafer pick-and-place board can be used to put the wafer to be tested immediately, which shortens the time for replacing the wafer and improves the carrying efficiency of the wafer. Moreover, the wafer carrying device of the present application has a simple structure and low cost.
附图说明Description of drawings
图1是本发明中晶圆检测系统的第一立体图。FIG. 1 is a first perspective view of a wafer inspection system in the present invention.
图2是本发明中晶圆检测系统的第二立体图。FIG. 2 is a second perspective view of the wafer inspection system in the present invention.
图3是本发明中晶圆运载装置的第一立体图。FIG. 3 is a first perspective view of the wafer carrying device in the present invention.
图4是本发明中晶圆运载装置的剖面图。FIG. 4 is a cross-sectional view of the wafer carrying device in the present invention.
图5是本发明中晶圆运载装置的第二立体图。FIG. 5 is a second perspective view of the wafer carrying device in the present invention.
附图标记说明:Explanation of reference signs:
10、机柜;11、防护罩;20、晶圆检测平台;30、晶圆运载装置;31、基座;32、升降装置;33、转盘;34、延伸转架;341、筒体;342、延伸板;35、第一驱动装置;351、第一皮带传动器;352、外传动轴;353、第二皮带传动器;354、第一驱动件;36、第二驱动装置;361、第三皮带传动器;362、内传动轴;363、第四皮带传动器;364、第二驱动件;365、抵接块;37、第一晶圆取放板;38、第二晶圆取放板;40、晶圆预调整装置;50、晶圆上下料装置。10. Cabinet; 11. Protective cover; 20. Wafer detection platform; 30. Wafer carrying device; 31. Base; 32. Lifting device; 33. Turntable; Extension plate; 35, the first driving device; 351, the first belt drive; 352, the outer transmission shaft; 353, the second belt drive; 354, the first driving member; 36, the second driving device; 361, the third Belt drive; 362, inner transmission shaft; 363, fourth belt drive; 364, second drive member; 365, contact block; 37, first wafer pick-and-place plate; 38, second wafer pick-and-place plate ; 40. Wafer pre-adjustment device; 50. Wafer loading and unloading device.
具体实施方式Detailed ways
为使本发明的目的、技术方案及优点更加清楚、明确,以下参照附图并举实施例对本发明进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。In order to make the object, technical solution and advantages of the present invention more clear and definite, the present invention will be further described in detail below with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
请同时参阅图1-图5,本发明提供了一种晶圆运载装置30的一些实施例。晶圆运载装置应用于晶圆检测系统。晶圆检测系统包括晶圆运载装置30、晶圆检测平台20、晶圆预调整装置40以及晶圆上下料装置50。晶圆运载装置30用于在晶圆在晶圆检测平台20、晶圆预调整装置40以及晶圆上下料装置50之间运载晶圆。Please refer to FIGS. 1-5 at the same time, the present invention provides some embodiments of a
如图1-图4所示,本发明的晶圆运载装置30,包括:As shown in Figures 1-4, the
机柜10;
基座31,设置于所述机柜10;The
升降装置32,设置于所述基座31;The lifting
转盘33,设置于所述升降装置32;The
延伸转架34,设置于所述转盘33;An
第一驱动装置35和第二驱动装置36,均设置于所述延伸转架34;The
第一晶圆取放板37和第二晶圆取放板38,均与所述延伸转架34滑动连接;The first wafer pick-and-
其中,所述第一驱动装置35驱动所述第一晶圆取放板37滑动;Wherein, the
所述第二驱动装置36驱动所述第二晶圆取放板38滑动;The
所述第一晶圆取放板37位于所述第二晶圆取放板38下方。The first wafer pick-and-
晶圆运载装置30是指承载和运输晶圆的装置,晶圆运载装置30具体用于在检测位置、存储位置等晶圆相关位置之间运输晶圆。基座31是指用于安装晶圆运载装置30中各部件的器件。升降装置32是指用于沿Z轴方向移动以运输晶圆的器件。转盘33是指用于驱使延伸转架34转动的器件。延伸转架34是指向外延伸且可以转动的器件,延伸转架34向外延伸,便于向不同的装置(或晶圆相关位置)运输晶圆。第一驱动装置35是指用于驱动第一晶圆取放板37移动的器件。第二驱动装置36是指用于驱动第二晶圆取放板38移动的器件。第一晶圆取放板37是指用于取放待检测晶圆的器件。第二晶圆取放板38是指用于取放已检测晶圆的器件。The
由于本申请的晶圆运载装置30中设置两个晶圆取放板,且两个晶圆取放板相互独立,分别取放待检测晶圆和已检测晶圆,尤其是在检测位置上时,通过第二晶圆取放板38取出已检测晶圆后,可以立即采用第一晶圆取放板37放入待检测晶圆,缩短更换晶圆的时间,提高了晶圆的运载效率,且本申请的晶圆运载装置结构简单,成本较低,本发明中运载装置成本相较市面产品仅有10-30%的价格。Since the
以竖直方向为Z轴方向,在取放晶圆时,需要将晶圆竖直向上托起以取出晶圆,将晶圆竖直向下放下以放置晶圆。由于晶圆运载装置30需要在各晶圆相关位置之间运输晶圆,晶圆运载装置30需要进行转动、伸出以及收回等动作,通过转盘33转动延伸转架34,实现转动的动作。通过第一驱动装置35驱动第一晶圆取放板37在延伸转架34上滑动,以及通过第二驱动装置36驱动第二晶圆取放板38在延伸转架34上滑动,实现伸出和收回的动作。Taking the vertical direction as the Z-axis direction, when picking and placing the wafer, it is necessary to lift the wafer vertically up to take out the wafer, and to place the wafer vertically down to place the wafer. Since the
为了减小晶圆运载装置30的体积,第一晶圆取放板37位于第二晶圆取放板38的下方,位于上方的第二晶圆取放板38取出已检测晶圆后,可以直接采用位于下方的第一晶圆取放板37放置待检测晶圆,缩短了取放晶圆的时间间隔。In order to reduce the volume of the
以下对转移、取放晶圆的具体步骤进行说明:The specific steps of transferring, picking and placing wafers are described below:
在进行转移、取放晶圆操作之前,确保第一晶圆取放板37和第二晶圆取放板38处于初始位置,具体可以控制第一驱动装置35和第二驱动装置36,分别驱动第一晶圆取放板37和第二晶圆取放板38朝向转盘33滑动,以收回第一晶圆取放板37和第二晶圆取放板38。Before transferring and picking and placing wafers, ensure that the first wafer pick-and-
控制转盘33,转动延伸转架34,以使第一晶圆取放板37和第二晶圆取放板38朝向待转移的晶圆。控制升降装置32,降下转盘33,以使第一晶圆取放板37和第二晶圆取放板38位于待转移的晶圆下方的侧面。控制第一驱动装置35驱动第一晶圆取放板37远离转盘33滑动,以使第一晶圆取放板37位于待转移的晶圆下方。控制升降装置32,升起转盘33,以使第一晶圆取放板37托起待转移晶圆。控制第一驱动装置35驱动第一晶圆取放板37朝向转盘33滑动,以使承载待转移晶圆的第一晶圆取放板37收回。控制转盘33,转动延伸转架34,以使承载待转移晶圆的第一晶圆取放板37朝向待转移晶圆的目标位置(可以是检测位置、存储位置等)。控制第一驱动装置35驱动承载待转移晶圆的第一晶圆取放板37远离转盘33滑动,以使承载待转移晶圆到达目标位置。控制升降装置32,降下转盘33,以使第一晶圆取放板37脱离承载待转移晶圆。控制第一驱动装置35驱动第一晶圆取放板37朝向转盘33滑动,以使第一晶圆取放板37收回。Control the
当然采用第二驱动装置36驱动第二晶圆取放板38时,可以采用类似的步骤。控制第二驱动装置36驱动第二晶圆取放板38远离转盘33滑动,以使第二晶圆取放板38位于待转移的晶圆下方。控制升降装置32,升起转盘33,以使第二晶圆取放板38托起待转移晶圆。控制第二驱动装置36驱动第二晶圆取放板38朝向转盘33滑动,以使承载待转移晶圆的第二晶圆取放板38收回。控制转盘33,转动延伸转架34,以使承载待转移晶圆的第二晶圆取放板38朝向待转移晶圆的目标位置(可以是存储位置等)。控制第二驱动装置36驱动承载待转移晶圆的第二晶圆取放板38远离转盘33滑动,以使承载待转移晶圆到达目标位置。控制升降装置32,降下转盘33,以使第二晶圆取放板38脱离承载待转移晶圆。控制第二驱动装置36驱动第二晶圆取放板38朝向转盘33滑动,以使第二晶圆取放板38收回。Of course, when the
在本发明实施例的一个较佳实现方式中,如图5所示,升降装置32采用丝杆运动台,丝杆运动台包括:In a preferred implementation of the embodiment of the present invention, as shown in FIG. 5 , the lifting
丝杆驱动件,设置于基座31;The screw driver is arranged on the
丝杆,转动设置于基座31,并与丝杆驱动件的输出轴连接;The screw rod is arranged on the
滑块,与丝杆螺纹连接;The slider is threadedly connected with the screw rod;
导轨,设置于基座31;The guide rail is arranged on the
其中,滑块与导轨滑动连接。Wherein, the slider is slidably connected with the guide rail.
具体地,转盘33设置在滑块上,丝杆沿Z轴方向(即竖直方向)设置,导轨可以设置2个,2个导轨位于丝杆的两侧,当丝杆驱动件驱动丝杆转动时,滑块在导轨的导向作用下沿丝杆的长度方向(即Z轴方向)移动,从而使转盘33、延伸转架34、第一驱动装置35、第二驱动装置36、第一晶圆取放板37以及第二晶圆取放板38,沿Z轴方向移动。Specifically, the
在本发明实施例的一个较佳实现方式中,如图5所示,所述转盘33采用中空旋转平台。具体地,中空旋转平台包括:In a preferred implementation of the embodiment of the present invention, as shown in FIG. 5 , the
轴承,轴承的内圈设置于所述升降装置32;Bearing, the inner ring of the bearing is arranged on the
旋转驱动件,设置于升降装置32;The rotating drive part is arranged on the
第一旋转齿轮,与旋转驱动件的输出轴连接;a first rotary gear connected to the output shaft of the rotary drive;
第二旋转齿轮,设置于轴承的外圈,与第一旋转齿轮啮合。The second rotating gear is arranged on the outer ring of the bearing and meshes with the first rotating gear.
中空旋转平台是指中部形成空间且可旋转的器件,轴承是指支撑旋转体转动的器件,旋转驱动件是指驱动第一旋转齿轮转动的器件,旋转齿轮是指轮缘上有齿能连续啮合传递运动和动力的器件,第一旋转齿轮随着旋转驱动件的输出轴转动,并带动第二旋转齿轮转动。轴承包括内圈和外圈,在内圈和外圈之间设置滚动件或滑动件,分别形成滚动轴承或滑动轴承。轴承的内圈的中间形成空间。The hollow rotating platform refers to a device that forms a space in the middle and can rotate. The bearing refers to the device that supports the rotation of the rotating body. The rotating drive refers to the device that drives the first rotating gear to rotate. The rotating gear refers to the teeth on the rim that can be continuously meshed. As a device for transmitting motion and power, the first rotating gear rotates with the output shaft of the rotating drive and drives the second rotating gear to rotate. The bearing includes an inner ring and an outer ring, and a rolling element or a sliding element is arranged between the inner ring and the outer ring to form a rolling bearing or a sliding bearing respectively. A space is formed in the middle of the inner ring of the bearing.
具体地,轴承的内圈设置于升降装置32的滑块,轴承的外圈与延伸转架34连接,轴承的外圈在水平面内转动,从而带动延伸转架34、第一驱动装置35、第二驱动装置36、第一晶圆取放板37以及第二晶圆取放板38在水平面内转动,从而可以使第一晶圆取放板37和第二晶圆取放板38朝向不同的装置取放晶圆。当然,采用轴承的外圈转动的方式,而不是轴承内圈转动的方式,轴承的外圈转动,使得延伸转架34、第一驱动装置35、第二驱动装置36、第一晶圆取放板37以及第二晶圆取放板38在水平面内转动更稳定。Specifically, the inner ring of the bearing is arranged on the slider of the
在本发明实施例的一个较佳实现方式中,如图3-图5所示,所述延伸转架34包括:In a preferred implementation of the embodiment of the present invention, as shown in FIGS. 3-5 , the
筒体341,设置于所述中空旋转平台;
延伸板342,设置于所述筒体341背离所述中空旋转平台的一端;The
其中,所述第一晶圆取放板37和所述第二晶圆取放板38均沿所述延伸板342的长度方向滑动。Wherein, both the first wafer pick-and-
筒体341是指中空且两端开口的器件,延伸板342是指向某一方向延伸设置的器件。The
具体地,筒体341设置于中空旋转平台中轴承的外圈,且筒体341与轴承同心设置,随着筒体341的转动,延伸板342指向不同的方向,则使第一晶圆取放板37和第二晶圆取放板38朝向不同的装置取放晶圆。Specifically, the
在本发明实施例的一个较佳实现方式中,如图3-图5所示,所述第一驱动装置35包括:In a preferred implementation of the embodiment of the present invention, as shown in FIGS. 3-5 , the
第一皮带传动器351,设置于所述延伸板342,且所述第一皮带传动器351的同步带与所述第一晶圆取放板37连接;The
外传动轴352,位于所述筒体341内,且与所述第一皮带传动器351的主动轮连接;The
第二皮带传动器353,所述第二皮带传动器353的从动轮与所述外传动轴352连接;The
第一驱动件354,设置于所述筒体341外,所述第一驱动件354的输出轴与所述第二皮带传动器353的主动轮连接。The
皮带传动器是指通过至少两个轮子带动皮带移动以传递运动和动力的器件,通常皮带传动器包括主动轮、从动轮以及皮带,皮带围绕在主动轮和从动轮外。外传动轴352是指位于筒体341内部用于传递运动和动力的器件。第一驱动件354是指用于驱动第二皮带传动器353中主动轮转动的器件。A belt drive refers to a device that drives a belt to move through at least two wheels to transmit motion and power. Usually, a belt drive includes a driving wheel, a driven wheel and a belt, and the belt is wound around the driving wheel and the driven wheel. The
具体地,筒体341上设置有第一通孔,第一驱动件354位于筒体341外,第二皮带传动器353的主动轮与第一驱动件354的输出轴连接,第二皮带传动器353的从动轮与外传动轴352同心设置,且位于筒体341内,第二皮带传动器353的同步带穿过第一通孔以围绕第二皮带传动器353的主动轮和从动轮。Specifically, the
具体地,采用中空旋转平台以及筒体341时,中空旋转平台和筒体341内形成容纳空间,可以将外传动轴352置于该容纳空间内,中空旋转平台中轴承的外圈转动,并不影响外传动轴352的转动。在外传动轴352的上端和下端设置轴承,该轴承的内圈固定于外传动轴352,该轴承的外圈与筒体341固定,进一步确保外传动轴352的稳定转动。延伸板342设置于筒体341的顶部,筒体341起到连接和支撑延伸板342的作用。Specifically, when the hollow rotating platform and the
在本发明实施例的一个较佳实现方式中,如图3-图5所示,所述第二驱动装置36包括:In a preferred implementation of the embodiment of the present invention, as shown in FIGS. 3-5 , the
第三皮带传动器361,设置于所述延伸板342,且所述第三皮带传动器361的同步带与所述第二晶圆取放板38连接;所述第三皮带传动器361位于所述第一皮带传动器351下方;The
内传动轴362,位于所述外传动轴352内,且与所述第三皮带传动器361的主动轮连接;The
第四皮带传动器363,所述第四皮带传动器363的从动轮与所述内传动轴362连接;所述第四皮带传动器363位于所述第二皮带传动器353的上方;A
第二驱动件364,设置于所述筒体341外,所述第二驱动件364的输出轴与所述第四皮带传动器363的主动轮连接。The
内传动轴362是指位于外传动轴352内用于传递运动和动力的器件。第二驱动件364是指用于驱动第四皮带传动器363中主动轮转动的器件。The
具体地,筒体341上设置有第二通孔,第二驱动件364位于筒体341外,第四皮带传动器363的主动轮与第二驱动件364的输出轴连接,第四皮带传动器363的从动轮与内传动轴362同心设置,且位于筒体341内以及位于内传动轴362外,第四皮带传动器363的同步带穿过第二通孔以围绕第四皮带传动器363的主动轮和从动轮。内传动轴362位于外传动轴352内,可以减小整个传动轴的体积,且确保内传动轴362不会偏离外传动轴352。内传动轴362向中空旋转平台中轴承的内圈延伸设置,且内传动轴362的端部设置抵接块365,抵接块365位于中空旋转平台中轴承的内圈内,且抵接块365与中空旋转平台中轴承的内圈抵接,使得内传动轴362的转动更稳定,不会偏移。Specifically, the
在本发明实施例的一个较佳实现方式中,如图1所示,所述晶圆运载装置30还包括:In a preferred implementation of the embodiment of the present invention, as shown in FIG. 1, the
防护罩11,设置于所述机柜10,所述防护罩11具有开口。The protective cover 11 is arranged on the
具体地,晶圆运载装置30位于防护罩11内,为了防止外界环境的因素影响晶圆的运输,在机柜10上设置防护罩11,防护罩11将晶圆运载装置30罩在内。Specifically, the
基于上述任意一实施例的晶圆运载装置,本发明还提供了一种晶圆运载方法的实施例。Based on the wafer carrying device in any one of the above embodiments, the present invention also provides an embodiment of a wafer carrying method.
本发明的晶圆运载方法,包括步骤:The wafer carrying method of the present invention comprises the steps of:
S10、控制第二晶圆取放板将已检测晶圆自检测位置取出。S10. Control the second wafer pick-and-place board to take out the inspected wafer from the inspection position.
S20、控制第一晶圆取放板将待检测晶圆放入所述检测位置S20. Control the first wafer picking and placing board to put the wafer to be detected into the detection position
具体地,由于第一晶圆取放板位于第二晶圆取放板的下方,因此,在控制第二晶圆取放板自检测位置取出已检测晶圆时,需要采用升降装置将第二晶圆取放板及第二晶圆取放板上的已检测晶圆抬起以取出已检测晶圆,当然也会抬起第一晶圆取放板以及第一晶圆取放板上的待检测晶圆,那么后续只需要伸出第一晶圆取放板,并放下待检测晶圆即可实现将待检测晶圆放入检测位置,进一步缩短了升降装置的升降时间,也就缩短了晶圆更换时间。Specifically, since the first wafer pick-and-place plate is located below the second wafer pick-and-place plate, when controlling the second wafer pick-and-place plate to take out the detected wafer from the detection position, it is necessary to use a lifting device to lift the second wafer pick-and-place plate The inspected wafers on the wafer pick-and-place plate and the second wafer pick-and-place plate are lifted to take out the inspected wafers, and of course the first wafer pick-and-place plate and the first wafer pick-and-place plate are also lifted. Wafers to be inspected, then only need to extend the first wafer pick-and-place plate, and put down the wafers to be inspected to put the wafers to be inspected into the inspection position, which further shortens the lifting time of the lifting device, and also shortens the Wafer replacement time is reduced.
应当理解的是,本发明的应用不限于上述的举例,对本领域普通技术人员来说,可以根据上述说明加以改进或变换,所有这些改进和变换都应属于本发明所附权利要求的保护范围。It should be understood that the application of the present invention is not limited to the above examples, and those skilled in the art can make improvements or transformations according to the above descriptions, and all these improvements and transformations should belong to the protection scope of the appended claims of the present invention.
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