CN115390171B - Variable-color high-reflection reflector and preparation method thereof - Google Patents
Variable-color high-reflection reflector and preparation method thereof Download PDFInfo
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- 229910052751 metal Inorganic materials 0.000 claims abstract description 44
- 239000002184 metal Substances 0.000 claims abstract description 44
- 238000007747 plating Methods 0.000 claims abstract description 30
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- 238000000576 coating method Methods 0.000 claims description 22
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 17
- 239000003292 glue Substances 0.000 claims description 16
- 239000011651 chromium Substances 0.000 claims description 10
- 229930192419 itoside Natural products 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 230000037452 priming Effects 0.000 claims description 9
- 229910052709 silver Inorganic materials 0.000 claims description 9
- 239000004332 silver Substances 0.000 claims description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052804 chromium Inorganic materials 0.000 claims description 7
- 230000003595 spectral effect Effects 0.000 claims description 7
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical group O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 5
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 5
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 5
- AZCUJQOIQYJWQJ-UHFFFAOYSA-N oxygen(2-) titanium(4+) trihydrate Chemical compound [O-2].[O-2].[Ti+4].O.O.O AZCUJQOIQYJWQJ-UHFFFAOYSA-N 0.000 claims description 5
- 238000002834 transmittance Methods 0.000 claims description 5
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- 238000004026 adhesive bonding Methods 0.000 claims description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 3
- DLINORNFHVEIFE-UHFFFAOYSA-N hydrogen peroxide;zinc Chemical compound [Zn].OO DLINORNFHVEIFE-UHFFFAOYSA-N 0.000 claims description 3
- 150000007530 organic bases Chemical class 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
- 229910000599 Cr alloy Inorganic materials 0.000 claims description 2
- 239000000788 chromium alloy Substances 0.000 claims description 2
- 238000002310 reflectometry Methods 0.000 abstract description 20
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- 238000007872 degassing Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 118
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- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 8
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- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
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- 239000010936 titanium Substances 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical group [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910001930 tungsten oxide Inorganic materials 0.000 description 3
- 229910018487 Ni—Cr Inorganic materials 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
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- -1 tungsten bronze compound Chemical class 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B60—VEHICLES IN GENERAL
- B60R—VEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR
- B60R1/00—Optical viewing arrangements; Real-time viewing arrangements for drivers or passengers using optical image capturing systems, e.g. cameras or video systems specially adapted for use in or on vehicles
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Mechanical Engineering (AREA)
- Optical Elements Other Than Lenses (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
The invention relates to the technical field of motor vehicle reflectors, in particular to a variable-color high-reflection reflector and a preparation method thereof. The preparation method comprises the following steps: after cleaning the glass, plating a metal layer and a low-refractive-index and high-refractive-index material layer on the front side of the glass to obtain a high-reflection lens; and plating an ITO film layer on the organic substrate, leading out electrodes, preparing and obtaining two parts of ITO-substrates, plating an electrochromic layer on the film plating surface of the first part of ITO substrate, adhering the substrate side to the rear side of the high-reflection lens, adhering the other part of ITO-substrate to the electrochromic layer side through conductive adhesive, and finally performing degassing bubble treatment to obtain the variable-color high-reflection reflector. The preparation method of the invention has the advantages of low cost, stable process, high reflectivity of the obtained reflector, high response speed of color change and good cycle reversibility.
Description
Technical Field
The invention relates to the technical field of motor vehicle reflectors, in particular to a variable-color high-reflection reflector and a preparation method thereof.
Background
Currently, reflectors usable in motor vehicles can be divided into two types, one type being aluminized or chromed reflectors, and a color film is plated on the reflectors, called blue or green mirrors; for example, the existing chromium-plated reflecting mirror has the reflectivity of only 60% after vacuum coating, and has the defects of low reflectivity, insufficient brightness and single color in the night or in the sealwort with poor light environment. Therefore, a motor vehicle reflector with reflecting brightness, reflectivity, anti-glare and variable reflecting intensity under different light conditions meeting the requirements is developed.
Disclosure of Invention
Aiming at the technical problems, the invention adopts the materials with different refractive indexes to coat and match, improves the reflectivity of the reflector, and in addition, the electrochromic material is arranged to ensure that the reflector has the functions of color changing and anti-glare.
Aiming at the purposes, the embodiment of the invention provides a preparation method of a variable color high-reflection reflecting mirror, which specifically comprises the following steps:
s1, cleaning glass to obtain glass with the smooth finish reaching the standard;
s2, plating a metal layer and a material layer with low refractive index and high refractive index on the front side of the glass with the smooth finish reaching the standard by adopting a vacuum coating method to obtain a high-reflection lens;
s3, preparing two parts of ITO-base materials by plating an ITO film on the surface of the organic base material by a true idle winding film plating method, and leading out electrodes at the edge of the ITO layer; obtaining a first ITO-substrate and a second ITO-substrate; depositing an electrochromic layer on the ITO side of the first ITO-substrate to obtain an ITO-substrate with a color-changing layer;
s4, adhering the substrate side of the ITO-substrate with the color-changing layer to the rear side of the high-reflection lens through conductive glue, coating the conductive glue on the electrochromic layer, and gluing with the ITO side of the second ITO-substrate;
and S5, carrying out defoaming and exhausting treatment on the material obtained in the step S4 to obtain the variable-color high-reflection reflecting mirror.
Further, the metal plating in the step 2 specifically includes: plating a priming metal layer and a reflecting metal layer on one side of the glass with the standard finish in sequence;
the priming metal layer is high-purity chromium or chromium alloy; the reflective metal layer is high-purity silver;
the thickness of the priming metal layer is 2-15nm, and the thickness of the reflecting metal layer is 30-200nm.
Further, the plating of the high-low refractive index material layer in the step S2 specifically includes: after plating the metal layer, plating a low refractive index material and a high refractive index material in sequence;
the low refractive index material and the high refractive index material are one group, and 1-4 groups can be arranged on the metal layer;
the low refractive index material is silicon dioxide or aluminum oxide, and the high refractive index material is any one of titanium pentoxide, niobium pentoxide, zirconium dioxide or zinc dioxide;
the thickness of the low refractive index material is 60-200nm, and the thickness of the high refractive index material is 20-120nm.
Further, in the step S3, the organic substrate is any one of PET, PC or PNT, and the thickness of the substrate is 35-128 μm.
Further, after the ITO film is plated in the step S3, the transmittance of the ITO film is 50-90%, and the resistance is 1-5 omega.
Further, the electrochromic layer is a tungsten trioxide material.
Furthermore, the cleaning process in the step S1 is specifically performed by an ultrasonic cleaner or a flat plate cleaner, and the surface finish of the glass reaches 10-20 levels after cleaning.
Based on the same inventive concept, the embodiment of the invention also provides a variable color high-reflection reflector, wherein the reflector is prepared by the preparation method;
the reflector comprises glass, a high-reflection coating and a color-changing coating;
the high-reflection coating comprises a bottoming metal layer, a reflecting metal layer and a low-refraction material layer and a high-refraction material layer which are plated on the front side of the glass in sequence;
the color-changing coating comprises a conductive glue layer, a first substrate layer, a first ITO film layer, an electrochromic film layer, a second ITO film layer and a second substrate layer which are arranged on the rear side of glass.
Further, the first ITO film layer and the second ITO film layer are provided with electrodes for connecting with an external circuit.
Further, the reflectivity of the reflector in the spectral range of 420-650nm is more than 95%.
The beneficial effects are that:
the high-reflection layer and the color-changing layer are respectively arranged on two sides of the glass, wherein the high-reflection layer is formed by plating metal layers and high-low refractive index materials in sequence, and the high-low refractive index material layers can be alternately arranged into a plurality of layers, so that the high-reflection layer has high reflectivity which can be more than 95%; the electrochromic layer is combined with the ITO transparent conductive film layer, so that the color change speed is high, the surface reflection brightness is adjustable, the cycle reversibility is good, and the use requirement of a photovoltaic product for 10 years is met. And the reflector has stable production process and low cost, and is suitable for large-scale popularization and application.
WO (WO) with electrochromic layer under the action of external electric field 3 The redox reaction occurs and the color of the material is reversibly changed. According to the intervalence transition theory proposed by Faughnan, electrons and metal cations are injected into tungsten oxide from two sides of a film under the condition of an externally applied electric field, the electrons are trapped by tungsten atoms to form a local state, and the cations form a deep blue tungsten bronze compound (M) x WO 3 ) At M x WO 3 The valence state of the tungsten atoms is different, and electrons are transited between the tungsten atoms, so that the color of the film is changed. The reaction equation is as follows: WO (WO) 3 (colorless) +xM+xe→M x WO 3 (dark blue) where M is generally H, li, na, ag, etc., and x is between 0 and 1.
In the invention, high-purity silver is used as a metal reflecting layer, the metal silver has a small optical absorption coefficient in a visible light wavelength range, the average reflectivity of the metal silver is not less than 95% in a 380nm-780nm wavelength range, but the plated optical film layer has a transmittance spike in the 380nm-780nm wavelength range by utilizing an optical interference principle, has higher transmittance in a local small wavelength range and has lower reflectivity, but the average reflectivity of the metal silver is not less than 95% in the 380nm-780nm wavelength range, and the electrochromic is reflected to the front surface of reflecting glass in a shallow and bright manner by utilizing a certain transmittance range interval, so that the electrochromic effect is realized.
Drawings
Fig. 1 is a schematic structural diagram of an electrochromic layer according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a structure of a high reflection layer according to an embodiment of the present invention;
fig. 3 is a process flow chart of a preparation method of a variable color high reflection reflector provided by an embodiment of the invention.
Fig. 4 is a reflectance comparison chart of the reflector provided in embodiment 1 of the present invention and a common chrome-plated reflector.
Labeling and describing: 1. a glass plate; 2. a glass rear surface; 3. conductive glue; 4. a first PET substrate; 5. a first ITO film layer; 6. an electrochromic film layer; 7. a second ITO film layer; 8. a second PET substrate; 9. a glass front surface; 10. priming a metal layer; 11. a reflective metal layer; 12. a first layer of low refractive index material; 13. a first high refractive index material layer; 14. a second low refractive index material layer; 15. a second layer of high refractive index material.
Detailed Description
For a clearer explanation of the technical content of the present invention, reference is made to the detailed description herein with reference to specific examples and drawings, it being evident that the examples cited are only preferred embodiments of the present technical solution, and that other technical solutions obvious to those skilled in the art from the disclosed technical content still fall within the scope of the present invention.
In embodiments of the present invention, the chemicals and equipment used may be obtained by either purchased or prepared by existing methods.
As shown in fig. 1 and 2, the structure of the color-changeable high-reflection reflector provided by the invention specifically comprises glass, a high-reflection layer on the front side of the glass, and a color-changing layer on the rear side of the glass.
Specifically as shown in fig. 2, the high reflection layer sequentially comprises a priming metal layer 10, a reflecting metal layer 11, and low refraction material layers 12 and 14 and high refraction material layers 13 and 15 which are alternately arranged from inside to outside, wherein the priming metal layer 10 is high-purity metal chromium (Cr) or chromium (Cr) alloy, and the thickness of the film layer is 2-15nm, and is mainly used for improving the binding force between the film layer and glass; the reflective metal layer 11 is high-purity metal silver (Ag), and the thickness of the film layer is 30-200nm; the low refractive index material layers 12, 14 are mainly silicon dioxide (SiO 2 ) Or aluminum oxide (Al) 2 O3) the thickness of the film layer is 60-200nm, the high refractive index material layer is mainly oxide materials with refractive indexes n more than 2.0, such as titanium pentoxide (Ti 3O 5), niobium pentoxide (Nb 2O 5), zirconium dioxide (ZrO 2), zinc dioxide (ZnO 2) and the like, and the thickness of the film layer is 20-120nm; in an embodiment of the present invention, the low refractive index materialLayers and high refractive index material layers are alternately arranged; according to different bandwidths of the reflection spectrum, 1 group or multiple groups of high-low refractive index materials can be arranged alternately, for example, the spectral range of 450-600nm, the reflectivity R is more than or equal to 95%, and 1 group of high-low refractive index material film layers are arranged; in the spectral range of 420-650nm, the reflectivity R is more than or equal to 95%, and 2 groups of high-low refractive index material film layers are arranged; in the spectral range of 400-700nm, the reflectivity R is more than or equal to 95 percent, and 3 groups of high-low refractive index material film layers are arranged.
Specifically as shown in fig. 1, the color-changing layer sequentially comprises a conductive adhesive 3, a first substrate layer 4, a first ITO film layer 5, an electrochromic film layer 6, a second ITO film layer 7 and a second substrate layer 8 from inside to outside; the substrate layer is any one of PET, PC or PNT, the thickness of the substrate is 35-100 mu m, the substrate layer is mainly used for protecting the ITO film layer and the electrochromic film layer to a certain extent, and meanwhile, when glass is broken, glass can be prevented from splashing, and personnel injury is caused; the first ITO film layer and the second ITO film layer are provided with electrodes for connecting with an external circuit; the electrodes are connected with a power supply facility, and the voltage is controlled to be 1-3V.
As shown in FIG. 3, the preparation method of the color-changeable high-reflection reflecting mirror specifically comprises the following steps:
the glass cleaning process comprises the following steps: and cleaning the surface of the glass by an ultrasonic cleaner or a flat plate cleaner to achieve the surface finish of the glass of 10-20 grades.
And (3) a coating process: the vacuum coating processing method is adopted, the glass is clamped in the cavity of the vacuum coating equipment, and the coating material and the coating layer structure adopted by the high-reflection lens are coated on the surface of the glass through the magnetron sputtering coating equipment or the evaporation vacuum equipment.
The preparation process of the color-changing layer comprises the following steps: preparing two parts of ITO-base materials on the surface of the organic base material by plating an ITO film by a vacuum idle winding film plating method, and leading out electrodes at the edge of the ITO layer; obtaining a first ITO-substrate and a second ITO-substrate; depositing an electrochromic layer on the ITO side of the first ITO-substrate to obtain an ITO-substrate with a color-changing layer; adhering the substrate side of the ITO-substrate with the color-changing layer to the rear side of the high-reflection lens through conductive glue, and coating the conductive glue on the electrochromic layer to be glued with the ITO side of the second ITO-substrate; after the conductive glue is coated, the tensile force is more than or equal to 16 newtons.
The defoaming and exhausting process comprises the following steps: and (3) placing the integrally bonded glass substrate into a deaerating machine, applying kilogram force to eliminate bubbles between bonding layers and avoid the persistence of the bubbles.
The following is a further description of specific examples.
Example 1
180mmX100mmX20mm high borosilicate glass is placed in an 11-groove ultrasonic cleaner, and the glass surface is cleaned by washing with medicine water, rinsing, washing with pure water, slow-pulling drying and the like until the glass surface has a finish of 10-20 clean grade. Clamping the cleaned glass onto an umbrella of an optical coating machine in a clamp mode, and coating a high-reflection film on the front surface of the outer glass, wherein the film layers sequentially coated from inside to outside are as follows: the thickness of the high-purity metal chromium (Cr) film layer is 2nm; the thickness of the high-purity metal silver (Ag) film is 100nm, and the surface reflectivity reaches 85%; silica (SIO 2) 80nm; the thickness of the titanium pentoxide (Ti 3O 5) film layer is 55nm; the thickness of the silicon dioxide (SIO 2) film layer is 80nm; the thickness of the titanium pentoxide (Ti 3O 5) film layer is 50nm; the reflectivity R is more than or equal to 95 percent in the spectral range of 400-700 nm.
Preparing two parts of ITO-base materials by plating an ITO film on the surface of the PET base material by a vacuum winding film plating method, wherein the resistance of an ITO coating is 2 omega, and an electrode is led out from the edge of the ITO layer; obtaining a first ITO-substrate and a second ITO-substrate; depositing an electrochromic layer tungsten oxide WO3 film layer on the ITO side of the first ITO-substrate to obtain an ITO-substrate with a color-changing layer; adhering the substrate side of the ITO-substrate with the color-changing layer to the rear side of the high-reflection lens through conductive glue OCA, coating conductive glue on the electrochromic layer, and gluing with the ITO side of the second ITO-substrate; after the conductive glue is coated, the tensile force is more than or equal to 16 newtons.
And placing the integrally bonded glass substrate into a deaerating machine, applying kilogram force to eliminate bubbles between bonding layers, avoiding the persistence of the bubbles and obtaining the high-reflection electrochromic reflector.
And applying 2 volts to the electrodes at the two ends of the high-reflection electrochromic reflector to excite the color of the electrochromic film layer to change, so that the appearance color sensitivity of the reflector changes correspondingly, and specific data are shown in table 1.
TABLE 1
Example 1 | Unpowered | Energizing 2 volts |
Brightness L | 93 | 70 |
Color A | 0.8 | -2.1 |
Color B | -0.2 | -2.5 |
Example 2
Placing 150mmX120mmX3mm high alumina silicate glass in a flat plate cleaning machine, and carrying out the procedures of washing with medicine water, washing with pure water, drying with an air knife and the like until the surface of the glass is cleaned, so that the surface finish of the glass reaches the cleaning grade of 10-20. And clamping the cleaned glass onto a magnetron sputtering coating machine in a clamp mode, and coating the high-reflection film on the front surface of the outer glass. The film layer plated from inside to outside is as follows: the thickness of the high-purity metal nickel chromium (NiCr) film layer is 5nm; the thickness of the high-purity metal silver (Ag) film is 100nm, and the surface reflectivity reaches 90%; silicon dioxide (SiO) 2 ) 90nm; niobium pentoxide (Nb) 2 O 5 ) The thickness of the film layer is 45nm; silicon dioxide (SiO) 2 ) Film and method for producing the sameThe layer thickness was 65nm; niobium pentoxide (Nb 2O 5)) film thickness was 55nm; the reflectivity R is more than or equal to 96 percent in the spectral range of 400-700 nm.
Preparing two parts of ITO-base materials by plating an ITO film on the surface of the PET base material by a vacuum winding film plating method, wherein the resistance of the ITO coating is 1.5 omega, and an electrode is led out from the edge of the ITO layer; obtaining a first ITO-substrate and a second ITO-substrate; depositing an electrochromic layer tungsten oxide WO3 film layer on the ITO side of the first ITO-substrate to obtain an ITO-substrate with a color-changing layer; adhering the substrate side of the ITO-substrate with the color-changing layer to the rear side of the high-reflection lens through conductive glue OCA, coating conductive glue on the electrochromic layer, and gluing with the ITO side of the second ITO-substrate; after the conductive glue is coated, the tensile force is more than or equal to 16 newtons.
And placing the integrally bonded glass substrate into a deaerating machine, applying kilogram force to eliminate bubbles between bonding layers, avoiding the persistence of the bubbles and obtaining the high-reflection electrochromic reflector.
And applying 2 volts to the electrodes at the two ends of the high-reflection electrochromic reflector to excite the color of the electrochromic film layer to change, so that the appearance color sensitivity of the reflector changes correspondingly, and specific data are shown in table 1.
TABLE 2
Example 2 | Unpowered | Energizing 2 volts |
Brightness L | 95 | 78 |
Color A | 1.2 | -1.2 |
Color B | 1 | -1.5 |
Comparative example 1
180mmX100mmX20mm high borosilicate glass is placed in an 11-groove ultrasonic cleaner, and the glass surface is cleaned by washing with medicine water, rinsing, washing with pure water, slow-pulling drying and the like until the glass surface has a finish of 10-20 clean grade. And plating a 10nm pure silicon layer and an 80nm metal chromium layer on the rear side of the cleaned glass by adopting a vacuum plating method to obtain the chromium plating reflective mirror.
The chromed mirror was compared in reflectance with the high-reflectance electrochromic mirror obtained in example 1, as shown in fig. 4. It can be known that the reflectivity of the chromed reflective mirror is 57.5%, and the reflectivity of the reflective mirror obtained in the examples is 96.5%; in addition, the brightness of the high-reflection electrochromic mirror and the chrome-plated mirror are measured, the brightness of the high-reflection electrochromic mirror and the chrome-plated mirror is 98.3, and the high-reflection electrochromic mirror has obvious advantages in reflectivity and brightness compared with the common chrome-plated mirror.
The above embodiments are only preferred embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be able to apply equivalents and modifications according to the technical solution and the concept of the present invention within the scope of the present invention.
Claims (10)
1. The preparation method of the color-changeable high-reflection reflector is characterized by comprising the following steps of:
s1, cleaning glass to obtain glass with the smooth finish reaching the standard;
s2, plating a metal layer and a material layer with low refractive index and high refractive index on the front side of the glass with the smooth finish reaching the standard by adopting a vacuum coating method to obtain a high-reflection lens;
s3, preparing two parts of ITO-base materials by plating an ITO film on the surface of the organic base material by a true idle winding film plating method, and leading out electrodes at the edge of the ITO layer; obtaining a first ITO-substrate and a second ITO-substrate; depositing an electrochromic layer on the ITO side of the first ITO-substrate to obtain an ITO-substrate with a color-changing layer;
s4, adhering the substrate side of the ITO-substrate with the color-changing layer to the rear side of the high-reflection lens through conductive glue, coating the conductive glue on the electrochromic layer, and gluing with the ITO side of the second ITO-substrate;
and S5, carrying out defoaming and exhausting treatment on the material obtained in the step S4 to obtain the variable-color high-reflection reflecting mirror.
2. The method for manufacturing a color-changeable high-reflection mirror according to claim 1, wherein the metal plating in the step 2 is specifically: plating a priming metal layer and a reflecting metal layer on one side of the glass with the standard finish in sequence;
the priming metal layer is high-purity chromium or chromium alloy; the reflective metal layer is high-purity silver;
the thickness of the priming metal layer is 2-15nm, and the thickness of the reflecting metal layer is 30-200nm.
3. The method for manufacturing a variable color high reflection mirror according to claim 1, wherein the plating of the high-low refractive index material layer in the step S2 is specifically: after plating the metal layer, plating a low refractive index material and a high refractive index material in sequence;
the low refractive index material and the high refractive index material are one group, and 1-4 groups can be arranged on the metal layer;
the low refractive index material is silicon dioxide or aluminum oxide, and the high refractive index material is any one of titanium pentoxide, niobium pentoxide, zirconium dioxide or zinc dioxide;
the thickness of the low refractive index material is 60-200nm, and the thickness of the high refractive index material is 20-120nm.
4. The method for manufacturing a color-changeable high-reflection mirror according to claim 1, wherein the organic substrate in the step S3 is any one of PET, PC or PNT, and the thickness of the substrate is 35-128 μm.
5. The method for manufacturing a color-changeable high-reflection mirror according to claim 1, wherein after the ITO film is plated in the step S3, the transmittance of the ITO film is 50-90% and the resistance is 1-5 Ω.
6. The method of manufacturing a variable color high reflection mirror according to claim 1, wherein the electrochromic layer is a tungsten trioxide material.
7. The method for manufacturing a color-changeable high-reflection reflecting mirror according to claim 1, wherein the cleaning process in the step S1 is specifically performed by using an ultrasonic cleaner or a flat plate cleaner, and the surface finish of the glass is 10-20 level after cleaning.
8. A variable color highly reflective mirror, characterized in that the mirror is produced by the production method according to any of claims 1 to 7;
the reflector comprises glass, a high-reflection coating and a color-changing coating;
the high-reflection coating comprises a bottoming metal layer, a reflecting metal layer and a low-refraction material layer and a high-refraction material layer which are plated on the front side of the glass in sequence;
the color-changing coating comprises a conductive glue layer, a first substrate layer, a first ITO film layer, an electrochromic film layer, a second ITO film layer and a second substrate layer which are arranged on the rear side of glass.
9. The variable color highly reflective mirror according to claim 8, wherein the first and second ITO film layers are provided with electrodes for connection to an external circuit.
10. The variable color highly reflective mirror according to claim 8, wherein the mirror has a reflectance of greater than 95% in the spectral range of 420-650 nm.
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