CN115368023B - Etching solution, micro-flash AG effect glass and application thereof - Google Patents
Etching solution, micro-flash AG effect glass and application thereof Download PDFInfo
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- CN115368023B CN115368023B CN202210936225.2A CN202210936225A CN115368023B CN 115368023 B CN115368023 B CN 115368023B CN 202210936225 A CN202210936225 A CN 202210936225A CN 115368023 B CN115368023 B CN 115368023B
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- 239000011521 glass Substances 0.000 title claims abstract description 100
- 238000005530 etching Methods 0.000 title claims abstract description 57
- 230000000694 effects Effects 0.000 title claims abstract description 49
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 47
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 claims abstract description 28
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 27
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 21
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000011575 calcium Substances 0.000 claims abstract description 13
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 13
- LXPCOISGJFXEJE-UHFFFAOYSA-N oxifentorex Chemical compound C=1C=CC=CC=1C[N+](C)([O-])C(C)CC1=CC=CC=C1 LXPCOISGJFXEJE-UHFFFAOYSA-N 0.000 claims abstract description 13
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000002994 raw material Substances 0.000 claims abstract description 8
- 239000000654 additive Substances 0.000 claims abstract description 6
- 230000000996 additive effect Effects 0.000 claims abstract description 6
- 239000002270 dispersing agent Substances 0.000 claims abstract description 6
- 239000007788 liquid Substances 0.000 claims abstract description 3
- 239000000203 mixture Substances 0.000 claims abstract description 3
- 239000000243 solution Substances 0.000 claims description 31
- 239000007864 aqueous solution Substances 0.000 claims description 15
- 239000013078 crystal Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 13
- 229910021538 borax Inorganic materials 0.000 claims description 10
- 239000004328 sodium tetraborate Substances 0.000 claims description 10
- 235000010339 sodium tetraborate Nutrition 0.000 claims description 10
- 229920002472 Starch Polymers 0.000 claims description 8
- 239000008107 starch Substances 0.000 claims description 8
- 235000019698 starch Nutrition 0.000 claims description 8
- 238000002791 soaking Methods 0.000 claims description 7
- 208000025174 PANDAS Diseases 0.000 claims description 4
- 208000021155 Paediatric autoimmune neuropsychiatric disorders associated with streptococcal infection Diseases 0.000 claims description 4
- 235000016496 Panda oleosa Nutrition 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 238000003756 stirring Methods 0.000 claims description 4
- 230000032683 aging Effects 0.000 claims description 3
- 230000001680 brushing effect Effects 0.000 claims description 3
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 3
- 240000000220 Panda oleosa Species 0.000 claims 1
- 239000004576 sand Substances 0.000 abstract description 6
- 238000002360 preparation method Methods 0.000 abstract description 3
- 230000000052 comparative effect Effects 0.000 description 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 238000001000 micrograph Methods 0.000 description 6
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 6
- 229910004014 SiF4 Inorganic materials 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 240000004718 Panda Species 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 229940104869 fluorosilicate Drugs 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910004883 Na2SiF6 Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- -1 calcium fluorosilicate Chemical compound 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000009828 non-uniform distribution Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention discloses an etching solution, which comprises the following raw materials in parts by weight: 3-5 parts of ammonium bifluoride, 0.3-2.1 parts of additive, 0.8-1.8 parts of barium sulfate, 0.3-0.9 part of dispersing agent, 0.2-0.4 part of hydrofluoric acid, 2-3.3 parts of hydrochloric acid and 0.6-1.5 parts of water, wherein the additive is a mixture of ammonium hexafluorosilicate and calcium fluosilicate. The invention also discloses a preparation method of the etching solution. The invention also discloses the micro-flash AG effect glass, which is obtained by etching the glass by using the etching solution. The invention also discloses application of the micro-flash AG effect glass. The etching liquid can etch various glasses, and can generate stable micro-flash, fine sand effect and soft hand feeling AG effect, thus meeting new requirements of users; can be produced in batches, and has high AG yield.
Description
Technical Field
The invention relates to the technical field of etching solutions, in particular to an etching solution, micro-flash AG effect glass and application thereof.
Background
AG glass is also called anti-dazzle glass, non-reflection glass or anti-reflection glass, etc. the glass substrate is subjected to special surface treatment, so that the glass substrate has lower reflectance than common glass, and the light transmission is not affected basically. The AG glass can improve the visual angle and brightness of a display picture, so that the image is clearer, the color is more gorgeous and the color is more saturated, thereby obviously improving the display effect. Can be widely used for manufacturing liquid crystal display screens, mobile phone cover plates and the like.
Etching solution is commonly used for etching glass at present, but the glass etched by the existing etching solution has higher flash, coarse sand effect and rough hand feeling; the existing etching solution AG has poor stability, can only be used for Corning GG5 glass, and has the phenomena of uneven etching and easy punctiform penetration points at the edge position of the etched glass for glass made of other materials.
Disclosure of Invention
Based on the technical problems in the background technology, the invention provides the etching solution, the glass with the micro-flash AG effect and the application thereof, and the etching solution can etch various glasses, generate stable micro-flash, fine sand effect and soft hand feeling AG effect, and can meet the new requirements of users; can be produced in batches, and has high AG yield.
The invention provides an etching solution, which comprises the following raw materials in parts by weight: 3-5 parts of ammonium bifluoride, 0.3-2.1 parts of additive, 0.8-1.8 parts of barium sulfate, 0.3-0.9 part of dispersing agent, 0.2-0.4 part of hydrofluoric acid, 2-3.3 parts of hydrochloric acid and 0.6-1.5 parts of water, wherein the additive is a mixture of ammonium hexafluorosilicate and calcium fluosilicate.
Preferably, the weight ratio of the ammonium hexafluorosilicate to the calcium fluosilicate is 5-15:2-6.
Preferably, the etching solution also contains borax, and the weight ratio of the barium sulfate to the borax is 8-18:5-7.
Preferably, the dispersant is starch.
Preferably, the hydrofluoric acid is an aqueous solution of hydrogen fluoride with a mass fraction of 50-55 wt%.
Preferably, the hydrochloric acid is 34-38wt% hydrochloric acid aqueous solution.
Taking silicon dioxide and sodium silicate as examples, the etching mechanism of the invention is as follows:
4hf+sio 2＝SiF4↑+2H2O;(SiF4 is very soluble in water);
6HF+Na2SiO3＝2NaF+3H2O+SiF4↑；
SiF4+2NaF＝Na2SiF6↓。
the elements Al, ca, K and the like in the glass can also react with HF to form a fluorosilicate protective layer, and the glass is blocked from further reaction so as to form the rugged AG effect.
The invention also provides a preparation method of the etching solution, which comprises the following steps: mixing the above materials, and sealing and aging at 15-20deg.C to obtain etching solution.
Preferably, the time of seal curing is more than or equal to 24 hours.
Preferably, during the curing process, stirring is carried out every 1-3 hours for 5-15min.
The invention also provides the micro-flash AG effect glass, and the glass is etched by using the etching liquid to obtain the micro-flash AG effect glass.
Preferably, the haze of the micro-flash AG effect glass is 85-90% and the roughness is 2.0-2.5 μm.
Preferably, the surface of the micro-flash AG effect glass is provided with crystals, the crystals are provided with a protruding structure, and the crystals are mutually connected and uniformly distributed to form uniformly distributed concave-convex textures.
Preferably, the etched glass is at least one of panda second generation glass, corning GG5 glass and corning GG6 glass of an owner.
The panda second generation glass, corning GG5 glass, corning GG6 glass of the above-mentioned principals are commercially available.
Preferably, the etching temperature is 16-25 ℃.
Preferably, the etching method is as follows: brushing in etching solution for 10-30s, and soaking for 60-110s.
By selecting proper etching conditions, better anti-dazzle effect can be obtained.
Before etching, the glass protects the surface of the glass which does not need to be etched, and ultrasonic washing, mixed acid soaking and water washing are sequentially carried out on the surface of the glass which needs to be etched; after etching, the glass is sequentially subjected to water washing, acid liquor soaking and water washing treatment.
The water of the invention can be tap water, purified water or deionized water, etc.
The invention also provides application of the micro-flash AG effect glass in electronic equipment.
Preferably in the housing of an electronic device.
The beneficial effects are that:
The ammonium bifluoride is selected and is easy to dissolve in cold water, the aqueous solution of the ammonium bifluoride has strong acidity and is decomposed into hydrogen fluoride and ammonia gas in hot water, and the aqueous solution of the ammonium bifluoride can react with silicon dioxide in glass to generate silicon fluoride at the temperature of 25-30 ℃; the silicon fluoride further reacts with sodium, calcium, aluminum, potassium and other elements of the glass seed to form a fluorosilicate crystal protection layer, and the glass is prevented from further reacting to form an uneven anti-dazzle effect; according to the invention, ammonium hexafluorosilicate and calcium fluosilicate are selected to be matched with each other in a proper proportion, so that the flash degree can be reduced, and the AG effect of micro flash is kept for the glass; and barium sulfate or barium sulfate and borax are matched with each other, so that the surface roughness of glass can be reduced in the etching process, and the AG glass is fine in sand effect and soft in hand feeling; the proper dispersing agent is selected to promote the barium sulfate to be uniformly dispersed in the etching solution, so that the sand effect and the hand feeling of AG glass are further improved; proper hydrofluoric acid is selected to uniformly distribute and accumulate generated crystals, so that uniformly distributed concave-convex textures are obtained; in addition, the invention can improve the haze of the glass, the stability and uniformity of AG effect and avoid the phenomenon that the edge of the glass is easy to have punctiform penetration points by mutually matching the components; the etching solution can etch various glasses (such as panda two-strength glass, corning GG6 glass, corning GG5 glass and the like), can generate a stable micro-flash AG effect, can be produced in batches, and has high AG yield; and the operation is simple; the AG effect formed by the method has the advantages of micro flash, fine sand effect and soft hand feeling, and can meet the new requirements of users.
Drawings
FIG. 1 is a 300 Xelectron microscope image of a glass surface etched using example 4.
FIG. 2 is a 300 Xelectron microscope image of the surface of the glass etched in comparative example 3.
FIG. 3 is a 200 Xelectron microscope image of the surface of the glass etched in comparative example 3.
FIG. 4 is a graph of the edge position of glass after etching in example 4 and comparative example 3, wherein a is example 4 and b is comparative example 3.
FIG. 5 is an external view of the glass surface after etching in example 4 and comparative example 3, wherein a is example 4 and b is comparative example 3.
Detailed Description
The technical scheme of the present invention will be described in detail by means of specific examples, which should be explicitly set forth for illustration, but should not be construed as limiting the scope of the present invention.
Example 1
An etching solution comprises the following raw materials in parts by weight: 4kg of ammonium bifluoride, 1kg of ammonium hexafluorosilicate, 0.4kg of calcium fluosilicate, 1.3kg of barium sulfate, 0.6kg of starch, 0.3kg of hydrofluoric acid aqueous solution with the mass fraction of 50wt%, 2.6kg of hydrochloric acid aqueous solution with the mass fraction of 38wt% and 1kg of water.
Example 2
An etching solution comprises the following raw materials in parts by weight: 3kg of ammonium bifluoride, 1.5kg of ammonium hexafluorosilicate, 0.6kg of calcium fluosilicate, 1.8kg of barium sulfate, 0.3kg of starch, 0.7kg of borax, 0.2kg of 55wt% hydrofluoric acid aqueous solution, 3.3kg of 34wt% hydrochloric acid aqueous solution and 0.6kg of water.
Example 3
An etching solution comprises the following raw materials in parts by weight: 5kg of ammonium bifluoride, 0.5kg of ammonium hexafluorosilicate, 0.2kg of calcium fluosilicate, 0.8kg of barium sulfate, 0.9kg of starch, 0.5kg of borax, 0.4kg of 55wt% hydrofluoric acid aqueous solution, 2kg of 36wt% hydrochloric acid aqueous solution and 1.5kg of water.
Example 4
An etching solution comprises the following raw materials in parts by weight: 4kg of ammonium bifluoride, 1kg of ammonium hexafluorosilicate, 0.4kg of calcium fluosilicate, 1.3kg of barium sulfate, 0.6kg of starch, 0.6kg of borax, 0.3kg of 55wt% hydrofluoric acid aqueous solution, 2.6kg of 36wt% hydrochloric acid aqueous solution and 1kg of water.
Example 5
The preparation methods of examples 1-4 are the same and include the following steps: weighing the raw materials according to the weight of the formula, mixing the materials uniformly according to the sequence of ammonium bifluoride, ammonium hexafluorosilicate, barium sulfate, calcium fluosilicate, borax, starch, water, hydrofluoric acid and hydrochloric acid, and placing in a sealing groove body at 17 ℃ for curing for 24 hours, wherein in the curing process, stirring is carried out every 2 hours, and stirring is carried out every 5-15 minutes.
Comparative example 1
The process is the same as in example 4 except that the process does not contain barium sulfate or borax.
Comparative example 2
Without "starch", otherwise the same as in example 4.
Comparative example 3
The existing commercially available etching solution HHDS-02 is available from Zhengzhou Heng optical technologies Co.
Comparative example 4
The procedure of example 4 was repeated except that ammonium hexafluorosilicate and calcium fluorosilicate were not contained.
Comparative example 5
The procedure of example 4 was repeated except that "ammonium hexafluorosilicate" was not contained.
Comparative example 6
The procedure of example 4 was repeated except that "calcium fluorosilicate" was not contained.
Example 6
The Conning GG6 glass was etched with the etching solutions of examples 1 to 4 and comparative examples 1 to 6, respectively, to obtain a micro-flash AG effect glass.
The etching method specifically comprises the following steps: ultrasonic cleaning glass with water, soaking for 60s with mixed acid (nitric acid and hydrofluoric acid), cleaning the glass with water, placing the glass into etching solution, adjusting the temperature to 20 ℃, brushing for 20s, soaking for 90s, taking out the etched glass, cleaning with water, soaking for 2min with 4% sulfuric acid aqueous solution, cleaning with water, and air drying to obtain the micro flash AG effect glass.
The micro-flash AG effect glasses prepared from the etching solutions of examples 1 to 4 and comparative examples 1 to 6 were examined, and the results are shown in Table 1 and FIGS. 1 to 5.
FIG. 1 is a 300 Xelectron microscope image of a glass surface etched using example 4.
FIG. 2 is a 300 Xelectron microscope image of the surface of the glass etched in comparative example 3.
FIG. 3 is a 200 Xelectron microscope image of the surface of the glass etched in comparative example 3.
As can be seen from fig. 1-2: the surface of the glass with the micro-flash AG effect obtained by using the etching solution in the embodiment 4 is provided with crystals, the crystals are provided with a protruding structure, the crystals are mutually connected and uniformly distributed to form uniformly distributed concave-convex textures, and the crystals are smaller, so that the hand feeling is softer, and no leakage point exists on the surface of the glass; whereas the glass surface crystals obtained using the etching solution of comparative example 3 were large and there were a plurality of leak points (circled in fig. 2).
As can be seen from fig. 3, the glass surface obtained using the etching solution of comparative example 3 has a large crystal gap and a non-uniform distribution.
FIG. 4 is a graph of the edge position of glass after etching in example 4 and comparative example 3, wherein a is example 4 and b is comparative example 3.
FIG. 5 is an external view of the glass surface after etching in example 4 and comparative example 3, wherein a is example 4 and b is comparative example 3.
As can be seen from fig. 4, the AG effect of the present invention is stable and uniform, and the glass edge has no transparent point phenomenon, under the premise of the same light source, the same height and the same photographing angle; in contrast, in comparative example 3, there was a dotted penetration point at the edge of the glass (circled portion in FIG. 4 b), and AG effect was not stable.
As can be seen from fig. 5, the haze of example 4 is significantly better than that of comparative example 3 and the brightness is lower than that of comparative example 3 after etching under the same light source, the same height and the same photographing angle.
TABLE 1 detection results
Remarks: the haze and the light transmittance are detected by a special haze meter; roughness was measured using a roughness meter; the flash detection method comprises the following steps: under the same illumination conditions, the brightness of the glass was observed and compared with comparative example 3.
As can be seen from table 1: the AG effect of the etched glasses of examples 1-4 was characterized by high haze, low flash, and soft hand.
The foregoing is only a preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art, who is within the scope of the present invention, should make equivalent substitutions or modifications according to the technical scheme of the present invention and the inventive concept thereof, and should be covered by the scope of the present invention.
Claims (12)
1. The micro-flash AG effect glass is characterized in that etching liquid is used for etching the glass to obtain the micro-flash AG effect glass;
the haze of the glass with the micro-flash AG effect is 85-90%, and the roughness is 2.0-2.5 mu m;
The etching solution comprises the following raw materials in parts by weight: 3-5 parts of ammonium bifluoride, 0.3-2.1 parts of additive, 0.8-1.8 parts of barium sulfate, 0.3-0.9 part of dispersing agent, 0.2-0.4 part of hydrofluoric acid, 2-3.3 parts of hydrochloric acid and 0.6-1.5 parts of water, wherein the additive is a mixture of ammonium hexafluorosilicate and calcium fluosilicate;
the weight ratio of the ammonium hexafluorosilicate to the calcium fluosilicate is 5-15:2-6;
The etching solution also contains borax, and the weight ratio of the barium sulfate to the borax is 8-18:5-7; the dispersant is starch.
2. The micro flash AG effect glass according to claim 1 wherein hydrofluoric acid is an aqueous solution of hydrogen fluoride having a mass fraction of 50 to 55 wt%.
3. The micro flash AG effect glass according to claim 1 wherein the hydrochloric acid is an aqueous solution of 34 to 38wt% hydrochloric acid.
4. The micro flash AG effect glass according to claim 1, wherein the etching solution preparing method comprises the steps of: mixing the above materials, and sealing and aging at 15-20deg.C to obtain etching solution.
5. The micro-flash AG effect glass according to claim 4, wherein the time of seal curing is not less than 24 hours.
6. The micro flash AG effect glass according to claim 4, wherein during aging, stirring is performed every 1 to 3 hours for 5 to 15 minutes.
7. The micro-flash AG effect glass according to claim 1, wherein the surface of the micro-flash AG effect glass has crystals, the crystals have a protruding structure, and the crystals are connected to each other and uniformly distributed to form a uniformly distributed concave-convex texture.
8. The micro-flash AG effect glass according to claim 1, wherein the etched glass is at least one of panda second-generation glass, corning GG5 glass, corning GG6 glass of an owner.
9. The micro flash AG effect glass according to claim 1 wherein the etching temperature is 16 to 25 ℃.
10. The micro flash AG effect glass according to claim 1, wherein the etching method is: brushing in etching solution for 10-30s, and soaking for 60-110s.
11. Use of a micro-flash AG effect glass according to any one of claims 1 to 10 in an electronic device.
12. Use of the micro-flash AG effect glass according to claim 11 in an electronic device housing.
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| CN115368023B true CN115368023B (en) | 2024-04-16 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102432185A (en) * | 2011-09-30 | 2012-05-02 | 郑州恒昊玻璃技术有限公司 | Anti-dazzle glass product etching solution and etching process |
| CN110563341A (en) * | 2019-09-29 | 2019-12-13 | 宜昌南玻显示器件有限公司 | High-alumina glass frosting liquid and preparation method thereof |
| CN111362584A (en) * | 2020-03-21 | 2020-07-03 | 郑州恒昊光学科技有限公司 | High borosilicate glass etching solution and preparation method and application thereof |
| CN112851132A (en) * | 2019-11-28 | 2021-05-28 | 比亚迪股份有限公司 | Etching solution for glass gradual-change frosting and preparation method and application thereof |
| CN114349360A (en) * | 2022-02-23 | 2022-04-15 | Oppo广东移动通信有限公司 | Method for preparing glass substrate, glass substrate, housing assembly, and electronic device |
-
2022
- 2022-08-05 CN CN202210936225.2A patent/CN115368023B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102432185A (en) * | 2011-09-30 | 2012-05-02 | 郑州恒昊玻璃技术有限公司 | Anti-dazzle glass product etching solution and etching process |
| CN110563341A (en) * | 2019-09-29 | 2019-12-13 | 宜昌南玻显示器件有限公司 | High-alumina glass frosting liquid and preparation method thereof |
| CN112851132A (en) * | 2019-11-28 | 2021-05-28 | 比亚迪股份有限公司 | Etching solution for glass gradual-change frosting and preparation method and application thereof |
| CN111362584A (en) * | 2020-03-21 | 2020-07-03 | 郑州恒昊光学科技有限公司 | High borosilicate glass etching solution and preparation method and application thereof |
| CN114349360A (en) * | 2022-02-23 | 2022-04-15 | Oppo广东移动通信有限公司 | Method for preparing glass substrate, glass substrate, housing assembly, and electronic device |
Non-Patent Citations (1)
| Title |
|---|
| 王琦.《无机非金属材料工艺学》.北京：中国建材工业出版社,2005,第227页. * |
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