CN115356509B - A method and device for correcting PRC sensitivity - Google Patents
A method and device for correcting PRC sensitivity Download PDFInfo
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- 238000010894 electron beam technology Methods 0.000 claims abstract description 13
- 238000012937 correction Methods 0.000 claims description 11
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- 230000005484 gravity Effects 0.000 abstract description 16
- 239000000523 sample Substances 0.000 description 27
- 239000000463 material Substances 0.000 description 6
- 238000009825 accumulation Methods 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 5
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- 238000005452 bending Methods 0.000 description 4
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- 238000004630 atomic force microscopy Methods 0.000 description 1
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- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
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Abstract
本发明涉及一种纠正PRC灵敏度的方法及装置，包括：先将PRC悬空标准角度放置并打开SEM电子束，将PRC悬臂电阻的输出电压和DAC的输出初始电压输入到放大器；ADC采集放大器的输出电压并反馈给MCU；改变PRC的放置角度，并将此角度下PRC悬臂电阻的输出电压输入到放大器；ADC采集当前放大器的输出电压并反馈给MCU；MCU计算两次放大器输出电压的差值并将差值转换为电压改变量输入DAC；DAC将输出初始电压与所述电压改变量相加作为二次输出电压再次输入放大器，直到放大器的输出电压与标准角度下放大器的输出电压差值在预定误差内。本发明提供的纠正PRC灵敏度的方法，改善了在多角度测量时受重力影响PRC灵敏度无法保持一致的问题。
The present invention relates to a method and device for correcting PRC sensitivity, comprising: first placing the PRC at a standard suspended angle and turning on the SEM electron beam, inputting the output voltage of the PRC cantilever resistor and the output initial voltage of the DAC into the amplifier; the ADC collects the output voltage of the amplifier and feeds it back to the MCU; changing the placement angle of the PRC, and inputting the output voltage of the PRC cantilever resistor at this angle into the amplifier; the ADC collects the output voltage of the current amplifier and feeds it back to the MCU; the MCU calculates the difference between the two amplifier output voltages and converts the difference into a voltage change and inputs it into the DAC; the DAC adds the output initial voltage and the voltage change as a secondary output voltage and inputs it into the amplifier again, until the difference between the output voltage of the amplifier and the output voltage of the amplifier at the standard angle is within a predetermined error. The method for correcting PRC sensitivity provided by the present invention improves the problem that the PRC sensitivity cannot be kept consistent due to the influence of gravity during multi-angle measurement.
Description
Technical Field
The invention relates to the technical field of AFM-SEM hybrid microscopes, in particular to a method and a device for correcting PRC sensitivity.
Background
PRCs based on MEMS technology have compact dimensions and are widely used in AFM-SEM hybrid microscope systems, where the addition of semiconductor material to the PRC substrate creates two separate piezoresistors, one comprising a cantilever and a probe, and the other being a resistor with a fixed resistance. As the piezoresistance effect of the PRC as a semiconductor material is particularly strong, after the probe is acted by the acting force, the resistance value is changed due to the change of the cantilever resistivity, and the current force is changed through collecting the voltage signal changed due to the resistance.
In some special measurements, such as the characterization of stiffness properties of nanomaterials, touch from multiple angles of nanomaterials is needed, the sensitivity of the PRC is required to be consistent when the angle measurement is switched to analyze the stiffness of the current measurement point, the sensitivity of the PRC to force is usually calibrated before the measurement, however, when the angle of measurement is changed, the PRC cantilever beam bends to different degrees due to the influence of gravity of the PRC probe, in addition, when the PRC is applied, the angle of measurement is changed, the size of the area of the PRC irradiated by an electron beam of an SEM (scanning electron microscope) is also changed, the current with variable size is generated on the PRC due to the difference of the electron beam irradiation area, the density of electrons falling on the PRC is changed, the charge accumulation forms a fluctuation potential on the PRC, the fluctuation potential can be regarded as noise, the useful signal of the PRC is submerged in the noise, the sensitivity of the PRC is reduced, in addition, if the charge accumulation on the probe has too much mass, the bending resistivity changes, the c signal also shifts, and the PRC signal cannot be accurately characterized by the fact that the PRC is commonly influenced by the residual charge and the gravity has good sensitivity.
In summary, in the conventional PRC measurement, there is a problem that the sensitivity of the PRC cannot be kept consistent due to the residual charge gravity of the SEM electron beam and the probe gravity during the multi-angle measurement.
Disclosure of Invention
Therefore, the invention aims to solve the technical problem that the PRC sensitivity cannot be kept consistent due to the influence of the residual charge gravity of the SEM electron beam and the PRC probe gravity during multi-angle measurement in the prior art.
In order to solve the technical problems, the invention provides a method for correcting PRC sensitivity, which comprises the following steps:
Suspending PRC at standard working angle, opening SEM electron beam, inputting output voltage of PRC cantilever resistor at standard working angle to positive input end of amplifier, and inputting output initial voltage of DAC to negative input end of amplifier;
an ADC (analog-to-digital converter) collects the output voltage value of an amplifier when the PRC is suspended at a standard working angle, converts the output voltage value into a reference ADC value and feeds the reference ADC value back to the MCU;
suspending the PRC at a measurement angle, and inputting the output voltage of the PRC cantilever resistor when the PRC is suspended at the measurement angle to the non-inverting input end of the amplifier;
The ADC acquires the output voltage value of the amplifier when the PRC is suspended at a measurement angle, converts the output voltage value into a current ADC value and feeds the current ADC value back to the MCU;
the MCU calculates the difference value between the current ADC value and the reference ADC value, and compares the difference value with a preset error;
If the difference value is larger than the preset error, the MCU converts the difference value into a voltage change amount and inputs the voltage change amount to the DAC, the DAC adds the output initial voltage and the voltage change amount to input the voltage change amount to the inverting input end of the amplifier, and the ADC acquires the PRC again to measure the output voltage value of the amplifier when the angle is suspended and placed, converts the output voltage value into a current ADC value and feeds the current ADC value back to the MCU;
And if the difference value is less than or equal to the preset error, finishing PRC sensitivity correction.
In one embodiment of the invention, after PRC sensitivity correction is completed, it includes:
Contacting a PRC which is suspended at a standard working angle with a reference PRC and pressing down a preset distance, and converting the current output voltage of an ADC acquisition amplifier into a second ADC value;
Determining the stress of the reference PRC according to the resistance change of the cantilever resistor of the reference PRC;
Calculating the sensitivity S of the PRC according to the reference ADC value a1, the second ADC value a2 and the stress F of the reference PRC, wherein the calculation formula is as follows:
S=F/(a2-a1)。
In one embodiment of the invention, inputting the output voltage of the PRC cantilever resistor to the non-inverting input of the amplifier comprises:
performing temperature compensation on the output voltage of the PRC cantilever resistor;
the output voltage of the temperature compensated PRC cantilever resistor is input to the non-inverting input of the amplifier.
In one embodiment of the invention, the temperature compensation method includes, but is not limited to, bridge compensation method, strain gauge self-compensation method.
In one embodiment of the invention, the output voltage of the amplifier is the difference between the output voltage of the PRC cantilever resistor and the DAC output voltage.
In one embodiment of the invention, the placement will be at a PRC standard operating angle with the PRC either horizontally upright or horizontally inverted.
The invention also provides a PRC sensitivity correction method in the AFM-SEM hybrid microscope system, and the PRC sensitivity in the AFM-SEM hybrid microscope system is corrected by using the method for correcting the PRC sensitivity.
The invention also provides a device for any one of the methods for correcting PRC sensitivity, comprising:
DAC;
the positive input end of the amplifier is connected with the output end of the PRC to be corrected, and the negative input end of the amplifier is connected with the output end of the DAC;
an input end of the ADC is connected with an output end of the amplifier;
and the input end of the MCU is connected with the output end of the ADC, and the output end of the MCU is connected with the input end of the DAC.
In one embodiment of the invention, the output of the bridge compensation circuit is connected with the output end of the PRC to be corrected, and the output end of the bridge compensation circuit is connected with the positive input end of the amplifier.
In one embodiment of the present invention, the MCU further includes:
the data receiving module is used for receiving a reference ADC value fed back when the PRC is placed in a suspended state at a standard working angle and a current ADC value fed back when the PRC is placed in a suspended state at a measuring working angle;
the difference value calculation module is used for calculating the difference value between the current ADC value and the reference ADC value, comparing the difference value with the preset error and converting the difference value into a voltage change amount;
And the data output module is used for inputting the voltage change amount to the DAC.
The application provides a method for correcting the sensitivity of PRC, which is characterized in that the PRC is suspended at a standard working angle and does not contact any sample, the SEM electron beam is opened, the output voltage of the PRC cantilever resistor is input to the normal phase input end of an amplifier, the output initial voltage of a DAC is input to the reverse phase input end of the amplifier, the ADC acquires the output voltage value of the current amplifier and converts the output voltage value of the current amplifier to an ADC value for feedback to an MCU, the placement angle of the PRC is changed, the output voltage of the PRC cantilever resistor is input to the normal phase input end of the amplifier, the ADC acquires the output voltage value of the amplifier and converts the output voltage value of the amplifier to the ADC value for feedback to the MCU, and the sensitivity of the PRC is judged according to the difference between the two angles and the sensitivity of the PRC is adjusted according to the difference between the two angles. According to the method for correcting the PRC sensitivity, the PRC sensitivity value can be kept unchanged even if the measuring angle is changed, so that the PRC cantilever beam is subjected to different degrees of bending under the influence of the residual charge gravity of the SEM electron beam and the gravity of the PRC probe, the sensitivity value in the measuring process is kept consistent, and the measuring quality is ensured.
Drawings
In order that the invention may be more readily understood, a more particular description of the invention will be rendered by reference to specific embodiments thereof that are illustrated in the appended drawings, in which
FIG. 1 is a diagram of PRC electrical equivalent model and signal output;
FIG. 2 is a schematic diagram of the PRC sensitivity correction principle;
FIG. 3 is a schematic illustration of the PRC standard operating angle level set-up;
FIG. 4 is a schematic diagram of a PRC standard operating angle horizontal inversion;
FIG. 5 is a schematic view of the tilt working angle of the PRC;
fig. 6 is a schematic diagram of the principle of PRC sensitivity calculation by the MCU.
Detailed Description
The present invention will be further described with reference to the accompanying drawings and specific examples, which are not intended to be limiting, so that those skilled in the art will better understand the invention and practice it.
The PRC comprises a PRC substrate and two independent piezoresistors of semiconductor materials on the substrate, wherein one piezoresistor comprises a cantilever and a probe, the piezoresistor effect of the semiconductor material is particularly strong, after the probe is acted by the acting force, the resistance value of the cantilever is changed due to the change of the resistivity of the cantilever, the change of the current force can be obtained by collecting voltage signals changed due to the resistance, an equivalent electrical model is shown as figure 1 and comprises a variable resistor R1 and a fixed resistor R2, wherein the upper end of the R1 is connected with a power supply voltage VCC, and the lower end of the R2 is grounded;
The application discovers for the first time that when the measurement angle of the PRC changes in the application process of the PRC, the PRC cantilever beam bends to different degrees due to the influence of the gravity of the probe, the size of the area of the PRC irradiated by the SEM electron beam also changes, the electron density falling on the PRC changes along with the change, and the cantilever beam bends due to the accumulation of charges to influence the sensitivity of the PRC.
Example 1:
The present invention provides a method of correcting PRC sensitivity, as shown in FIG. 2, comprising:
s10, suspending the PRC at a standard working angle;
wherein the standard working angle is suspended, i.e. the PRC is horizontally arranged or horizontally inverted and does not contact any sample, as shown in FIG. 3 for the PRC and FIG. 4 for the PRC;
s11, opening an SEM electron beam, setting an accelerating voltage, inputting the output voltage of the PRC cantilever resistor to a non-inverting input end of an amplifier, and inputting the output initial voltage of a DAC to an inverting input end of the amplifier;
the accelerating voltage of the SEM electron beam is set as a set value and is kept unchanged, when a measured sample is changed, the accelerating voltage is set according to the measured sample, the sensitivity correction is carried out on the PRC, the output initial voltage value of the DAC is a preset value, and the DAC can be adjusted according to the measured sample.
S12, the ADC acquires the output voltage of the current amplifier and converts the output voltage into a reference ADC value which is fed back to the MCU;
the output voltage V o＝Vp-Vn of the amplifier, wherein V p is the output voltage of the PRC cantilever resistor when the PRC standard working angle is placed in a suspending mode, and V n is the output initial voltage of the DAC;
S13, suspending the PRC at a measurement angle, and inputting the output voltage of the PRC cantilever resistor to the non-inverting input end of the amplifier when the measurement angle is suspended as shown in FIG. 5;
S14, converting the output voltage V o' of the ADC acquisition amplifier into a current ADC value and feeding the current ADC value back to the MCU;
the current output voltage V o'＝Vp'-Vn of the amplifier, wherein V p' is the output voltage of the PRC cantilever resistor when the PRC is suspended at a measurement angle;
s15, MCU calculates the difference value between the current ADC value and the reference ADC value, and judges whether the difference value is larger than a preset error;
If the difference is greater than the predetermined error, the MCU converts the difference into a voltage change amount DeltaV and inputs the voltage change amount into the DAC, the DAC adds the output initial voltage and the voltage change amount to input the voltage change amount into the inverting input end of the amplifier, and the step S14 is executed in a returning manner until the difference between the output voltage value of the amplifier and the voltage value V o in the step S12 is within the predetermined error, and the PRC sensitivity correction is completed.
In this embodiment, the error of the ADC difference value of the two times in step S15 is preferably controlled within 1%, and if the error is greater than 1%, the sensitivity of PRC at different angles in measuring the sample is greatly different, resulting in a decrease in measurement quality.
The method also comprises the step of calculating the sensitivity value of the PRC after the correction of the sensitivity of the PRC, and comprises the following specific calculation steps:
S16, the PRC is contacted with a reference PRC and is pressed down for a preset distance, as shown in FIG. 6, the current output voltage value of the ADC acquisition amplifier is converted into an ADC value a2;
s17, determining the stress F of the reference PRC according to the resistance change of the cantilever resistor of the reference PRC;
S18, calculating the sensitivity S of the PRC according to the reference ADC value a1, the ADC value a2 and the stress F of the reference PRC, wherein the calculation formula is as follows:
S=F/(a2-a1)。
Wherein, the magnitude relation of the force corresponding to the bending degree of the reference PRC is known, namely the reference PRC is the PRC with known sensitivity.
In this embodiment, since PRC is a semiconductor material, the temperature affects the change of the variable resistor R1, and thus in this embodiment, inputting the output voltage of the PRC cantilever resistor to the positive input terminal of the amplifier further includes performing temperature compensation on the output voltage of the PRC cantilever resistor to obtain a stable output voltage, and inputting a stable voltage signal after temperature compensation to the positive input terminal of the amplifier to eliminate the influence of temperature on the variable resistor R1.
The PRC sensitivity correction method provided by the embodiment ensures that the sensitivity of the PRC in different measurement angles can be kept unchanged, avoids the influence of the gravity of the residual charges of the SEM electron beam and the gravity of the PRC probe on the sensitivity of the PRC after the measurement angles are changed, and ensures the measurement quality.
Example 2:
Hybrid microscopes provide complementary imaging functions, multimode measurements have higher data acquisition efficiency than single microscopes, e.g., SEM can only provide 2D images of the sample, but AFM can provide depth information of the sample, AFM and SEM represent two complementary imaging techniques based on different imaging physics principles, traditional sample measurement methods are to image the sample separately in AFM and SEM and then correlate the images to obtain more information about the sample, but transferring the sample back and forth and switching between AFM and SEM can damage the sample, and observing the same area of the sample on both microscopes is difficult, which can be made very convenient by integrating AFM-SEM hybrid microscope systems in SEM.
PRCs based on MEMS processes have compact dimensions and are widely used in AFM-SEM hybrid microscope systems, but when AFMs based on PRCs are integrated into SEM, when SEM operations are changed during SEM imaging, such as image scaling, image quality changes, imaging area changes, etc., the density of electrons falling on the PRCs changes, charge accumulation can form a fluctuating potential on the PRCs, which can be seen as noise, the useful signal of the PRCs can be submerged in the noise, causing the PRC sensitivity to decrease, and in addition the charge itself has mass, which can drift if excessive charge accumulation on the probe causes cantilever bending resistivity changes, so gravity factors can affect the measurement of material stiffness properties when measured by AFM-SEM hybrid microscope.
Based on the above factors, this embodiment provides a method for correcting PRC sensitivity applied to an AFM-SEM hybrid microscope system, and the specific implementation steps thereof may be referred to in embodiment 1.
The specific embodiment of the invention also provides a device for realizing the PRC sensitivity correction method, which comprises the following steps:
A DAC for converting the digital signal into an analog voltage signal and inputting the analog voltage signal into the amplifier;
the non-inverting input end of the amplifier is connected with the output end of the PRC to be corrected, and the inverting input end of the amplifier is connected with the output end of the DAC and is used for processing the output voltages of the PRC and the DAC;
The input end of the ADC is connected with the output end of the amplifier and is used for converting the output voltage of the amplifier into an ADC value;
the MCU is connected with the output end of the ADC, the output end of the MCU is connected with the input end of the DAC, and the MCU is used for calculating the difference value between the ADC value under the PRC standard working angle and the ADC value under the PRC measuring angle, comparing the difference value with the preset error, converting the difference value into the voltage change quantity of the DAC, and inputting the voltage change quantity into the DAC;
in this embodiment, preferably, the apparatus further includes a bridge compensation circuit for eliminating the influence of temperature on the PRC cantilever resistance, an input terminal thereof being connected to an output terminal of the PRC cantilever resistance, and an output terminal thereof being connected to a positive input terminal of the amplifier;
preferably, the MCU includes:
the data receiving module is used for receiving a reference ADC value fed back when the PRC is placed in a suspended state at a standard working angle and a current ADC value fed back when the PRC is placed in a suspended state at a measuring working angle;
the difference value calculation module is used for calculating the difference value between the current ADC value and the reference ADC value, comparing the difference value with the preset error and converting the difference value into a voltage change amount;
And the data output module is used for inputting the voltage change amount to the DAC.
The device for correcting the sensitivity of the PRC is used for realizing the method for correcting the sensitivity of the PRC, and can reduce the influence of residual charge gravity on the PRC and probe gravity factors on the sensitivity of the PRC.
According to the method and the device for correcting the PRC sensitivity, when the PRC measurement angle is changed, the PRC sensitivity value can be kept unchanged even if the PRC cantilever beam is bent to different degrees under the influence of gravity, the sensitivity value of the PRC in the measurement process is kept consistent, and the measurement quality is ensured.
It is apparent that the above examples are given by way of illustration only and are not limiting of the embodiments. Other variations and modifications of the present invention will be apparent to those of ordinary skill in the art in light of the foregoing description. It is not necessary here nor is it exhaustive of all embodiments. While still being apparent from variations or modifications that may be made by those skilled in the art are within the scope of the invention.
Claims (10)
1. A method of correcting PRC sensitivity, comprising:
Suspending PRC at a standard working angle, opening SEM electron beam, inputting output voltage of PRC cantilever resistor at the standard working angle to the non-inverting input end of the amplifier, and inputting output initial voltage of DAC to the inverting input end of the amplifier;
The ADC collects the output voltage value of the amplifier when the PRC is suspended at a standard working angle, converts the output voltage value into a reference ADC value and feeds the reference ADC value back to the MCU;
suspending the PRC at a measurement angle, and inputting the output voltage of the PRC cantilever resistor when the PRC is suspended at the measurement angle to the non-inverting input end of the amplifier;
The ADC acquires the output voltage value of the amplifier when the PRC is suspended at a measurement angle, converts the output voltage value into a current ADC value and feeds the current ADC value back to the MCU;
the MCU calculates the difference value between the current ADC value and the reference ADC value, and compares the difference value with a preset error;
If the difference value is larger than the preset error, the MCU converts the difference value into a voltage change amount and inputs the voltage change amount to the DAC, the DAC adds the output initial voltage and the voltage change amount to input the voltage change amount to the inverting input end of the amplifier, and the ADC acquires the PRC again to measure the output voltage value of the amplifier when the angle is suspended and placed, converts the output voltage value into a current ADC value and feeds the current ADC value back to the MCU;
And if the difference value is less than or equal to the preset error, finishing PRC sensitivity correction.
2. The method of correcting PRC sensitivity according to claim 1, characterized by comprising, after completion of PRC sensitivity correction:
Contacting a PRC which is suspended at a standard working angle with a reference PRC and pressing down a preset distance, and converting the current output voltage of an ADC acquisition amplifier into a second ADC value;
Determining the stress of the reference PRC according to the resistance change of the cantilever resistor of the reference PRC;
Based on reference ADC values Second ADC valueAnd stress of reference PRCCalculation of sensitivity of PRCThe calculation formula is as follows:
。
3. The method of correcting for PRC sensitivity of claim 1 wherein inputting the output voltage of the PRC cantilever resistor to the non-inverting input of the amplifier comprises:
performing temperature compensation on the output voltage of the PRC cantilever resistor;
the output voltage of the temperature compensated PRC cantilever resistor is input to the non-inverting input of the amplifier.
4. A method of correcting PRC sensitivity according to claim 3, characterized in that the temperature compensation method includes, but is not limited to, bridge compensation method, strain gauge self-compensation method.
5. The method of correcting for PRC sensitivity according to claim 1, characterized in that the output voltage of the amplifier is the difference between the output voltage of the PRC cantilever resistance and the output voltage of the DAC.
6. The method of correcting for PRC sensitivity according to claim 1, characterized in that said placing the PRC at a standard operating angle is either horizontally right up or horizontally upside down.
7. A method for correcting PRC sensitivity in an AFM-SEM hybrid microscope system, characterized in that the PRC sensitivity in the AFM-SEM hybrid microscope system is corrected by the method for correcting PRC sensitivity according to any one of claims 1 to 6.
8. An apparatus for use in the method of correcting PRC sensitivity as claimed in any one of claims 1-6, comprising:
DAC;
the positive input end of the amplifier is connected with the output end of the PRC to be corrected, and the negative input end of the amplifier is connected with the output end of the DAC;
an input end of the ADC is connected with an output end of the amplifier;
and the input end of the MCU is connected with the output end of the ADC, and the output end of the MCU is connected with the input end of the DAC.
9. The apparatus for correcting sensitivity of PRC of claim 8 further comprising a bridge compensation circuit having an input connected to the output of the PRC to be corrected and an output connected to the positive input of the amplifier.
10. The apparatus for correcting a PRC sensitivity method of claim 8, wherein the MCU includes:
the data receiving module is used for receiving a reference ADC value fed back when the PRC is placed in a suspended state at a standard working angle and a current ADC value fed back when the PRC is placed in a suspended state at a measuring working angle;
the difference value calculation module is used for calculating the difference value between the current ADC value and the reference ADC value, comparing the difference value with the preset error and converting the difference value into a voltage change amount;
And the data output module is used for inputting the voltage change amount to the DAC.
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| RU2589755C1 (en) * | 2015-04-14 | 2016-07-10 | Акционерное общество "Зеленоградский нанотехнологический центр" | Calibration method and device for measuring angle based on bridge magnetosensitive sensor |
| US20180075798A1 (en) * | 2016-09-14 | 2018-03-15 | Apple Inc. | External Compensation for Display on Mobile Device |
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| JP2018141676A (en) * | 2017-02-27 | 2018-09-13 | 三菱重工業株式会社 | Current detection circuit |
| CN108871633A (en) * | 2017-05-10 | 2018-11-23 | 盾安传感科技有限公司 | The signal conditioning circuit of pressure sensor |
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