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CN115332227A - The method of chip area layout - Google Patents

The method of chip area layout Download PDF

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Publication number
CN115332227A
CN115332227A CN202110506288.XA CN202110506288A CN115332227A CN 115332227 A CN115332227 A CN 115332227A CN 202110506288 A CN202110506288 A CN 202110506288A CN 115332227 A CN115332227 A CN 115332227A
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preset
area
chip
debugging
initial
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左孝
张诗华
赵志平
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Semiconductor Manufacturing International Shanghai Corp
Semiconductor Manufacturing International Beijing Corp
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Semiconductor Manufacturing International Shanghai Corp
Semiconductor Manufacturing International Beijing Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54433Marks applied to semiconductor devices or parts containing identification or tracking information

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Abstract

A method for chip area typesetting comprises the following steps: providing a preset wafer area, a process node and a preset chip area; arranging a plurality of rectangular initial chip regions which are mutually independent in a preset wafer region according to the area of a preset chip, wherein the initial chip regions have an initial preset length and an initial preset width; debugging the initial preset length and the initial preset width for a plurality of times according to the preset chip area and the process node so as to arrange a plurality of mutually independent rectangular chip areas in the preset wafer area, wherein the chip areas have the preset chip area, and the number of the chip areas is greater than that of the preset chip areas. The chip area typesetting method can improve the number of chips which can be manufactured on one wafer, reduce the waste of raw materials and improve the productivity and benefit of semiconductor manufacturing.

Description

芯片区域排版的方法The method of typesetting the chip area

技术领域technical field

本发明涉及半导体制造领域,尤其是涉及一种芯片区域排版的方法。The invention relates to the field of semiconductor manufacturing, in particular to a method for layout of chip regions.

背景技术Background technique

随着集成电路制造技术的快速发展,集成电路中的电子器件尺寸越来越小,集成电路的集成度越来越高。相应的,随着集成电路的集成度越来越高,在一片晶圆(wafer)上能够形成的芯片数量越来越多。With the rapid development of integrated circuit manufacturing technology, the size of electronic devices in integrated circuits is getting smaller and smaller, and the integration level of integrated circuits is getting higher and higher. Correspondingly, with the integration level of integrated circuits getting higher and higher, the number of chips that can be formed on a wafer (wafer) is increasing.

通常,现有技术中,在芯片设计之前,会根据晶圆尺寸及预设的几种芯片形状进行模拟推演,粗略的在与晶圆对应的晶圆区域中,对与各芯片形状对应的芯片区域进行几次排版,形成相应的芯片区域排版方案。通过每一种芯片区域排版方案,能获取一片晶圆上在相应的芯片形状下能够制造的芯片数量、以及多个该芯片形状在晶圆上的排版方式等。接着,选取一种芯片排版方案后,根据该芯片排版方案中的芯片形状进行后续的芯片设计。Usually, in the prior art, before chip design, simulation deduction will be carried out according to the wafer size and several preset chip shapes, roughly in the wafer area corresponding to the wafer, the chip corresponding to each chip shape The area is typesetting several times to form a corresponding chip area typesetting scheme. Through each chip area layout scheme, it is possible to obtain the number of chips that can be manufactured under the corresponding chip shape on a wafer, and the layout methods of multiple chip shapes on the wafer, etc. Next, after selecting a chip layout scheme, follow-up chip design is performed according to the shape of the chip in the chip layout scheme.

众所周知,晶圆属于一次性使用原材料,每一片晶圆价格昂贵,因此,需要在一片晶圆上尽可能制造更多的芯片,以充分利用原材料、提升半导体制造的产能和效益。As we all know, wafers are disposable raw materials, and each wafer is expensive. Therefore, it is necessary to manufacture as many chips as possible on a wafer to make full use of raw materials and improve the production capacity and efficiency of semiconductor manufacturing.

然而,现有技术的芯片区域排版方案中在一片晶圆上能够制造的芯片数量较少,导致原材料浪费、半导体制造的产能和效益较差。However, the number of chips that can be manufactured on a single wafer is relatively small in the chip area layout scheme of the prior art, resulting in waste of raw materials and poor productivity and efficiency of semiconductor manufacturing.

发明内容Contents of the invention

本发明解决的技术问题是提供一种芯片区域排版的方法,以提高在一片晶圆上能够制造的芯片数量,减少原材料的浪费、提升半导体制造的产能和效益。The technical problem to be solved by the present invention is to provide a method for typesetting chip regions, so as to increase the number of chips that can be manufactured on a wafer, reduce the waste of raw materials, and improve the productivity and efficiency of semiconductor manufacturing.

为解决上述技术问题,本发明的技术方案提供一种芯片区域排版的方法,包括:提供预设晶圆区域、工艺节点及预设芯片面积;根据预设芯片面积在预设晶圆区域中排布相互独立的多个矩形的初始芯片区域,所述初始芯片区域具有初始预设长度和初始预设宽度;根据预设芯片面积和工艺节点对初始预设长度和初始预设宽度进行若干次调试处理,以在预设晶圆区域中排布相互独立的多个矩形的芯片区域,并且,所述芯片区域具有预设芯片面积,所述芯片区域的数量大于预设芯片区域的数量。In order to solve the above technical problems, the technical solution of the present invention provides a method for typesetting a chip area, including: providing a preset wafer area, a process node, and a preset chip area; Lay out a plurality of rectangular initial chip areas that are independent of each other, and the initial chip area has an initial preset length and an initial preset width; perform several times of debugging on the initial preset length and initial preset width according to the preset chip area and process node processing to arrange a plurality of mutually independent rectangular chip areas in a preset wafer area, and the chip areas have a preset chip area, and the number of the chip areas is greater than the number of the preset chip areas.

可选的,所述调试处理的次数为2次以上;每次所述调试处理的方法包括:根据预设芯片面积和工艺节点调节初始预设长度和初始预设宽度,获取调试预设长度和调试预设宽度,各次的调试预设长度不同,各次的调试预设宽度不同;根据调试预设长度和调试预设宽度在预设晶圆区域中排布相互独立的多个矩形的调试芯片区域,所述调试芯片区域具有预设芯片面积。Optionally, the number of times of the debugging process is more than 2; each time the method of the debugging process includes: adjusting the initial preset length and the initial preset width according to the preset chip area and process node, and obtaining the debugging preset length and Debugging preset width, each debugging preset length is different, and each debugging preset width is different; according to the debugging preset length and debugging preset width, multiple independent rectangular debuggings are arranged in the preset wafer area A chip area, the debugging chip area has a preset chip area.

可选的,进行若干次调试处理的方法包括:提供预设调试次数;进行预设调试次数的调试处理,并获取与每次调试处理对应的调试预设长度和调试预设宽度。Optionally, the method for performing several times of debugging includes: providing a preset number of times of debugging; performing the debugging process for the preset number of times of debugging, and obtaining a debugging preset length and a debugging preset width corresponding to each debugging process.

可选的,进行若干次调试处理的方法还包括:提供预设变化百分比、预设变化函数或预设变化量;每次调试处理的方法还包括:根据预设变化百分比、预设变化函数或预设变化量,变更第n-1次获取的调试预设长度和调试预设宽度,形成第n次获取的调试预设长度和调试预设宽度,其中,n为大于或等于2的自然数。Optionally, the method for performing several debugging processes also includes: providing a preset change percentage, a preset change function or a preset change amount; the method for each debugging process also includes: according to the preset change percentage, the preset change function or The preset change amount is to change the debugging preset length and debugging preset width acquired in the n-1th time to form the debugging preset length and debugging preset width acquired in the nth time, wherein n is a natural number greater than or equal to 2.

可选的,根据预设芯片面积和工艺节点对初始预设长度和初始预设宽度进行若干次调试处理,以在预设晶圆区域中排布相互独立的多个矩形的芯片区域的方法包括:根据若干次调试处理中排布了调试芯片区域数量最多的一次,在预设晶圆区域中排布相互独立的多个矩形的芯片区域,所述芯片区域具有该次调试处理对应的调试预设长度和调试预设宽度。Optionally, the initial preset length and the initial preset width are debugged several times according to the preset chip area and process node, so that the method of arranging multiple independent rectangular chip areas in the preset wafer area includes : According to the one with the largest number of debugging chip areas arranged in several debugging processes, a plurality of mutually independent rectangular chip areas are arranged in the preset wafer area, and the chip areas have the corresponding debugging presets for this debugging process. Set length and debug preset width.

可选的,根据预设芯片面积和工艺节点对初始预设长度和初始预设宽度进行若干次调试处理,以在预设晶圆区域中排布相互独立的多个矩形的芯片区域的方法还包括:当若干次调试处理中,多次排布了最多且相同的调试芯片区域数量时,根据首次排布了最多调试芯片区域数量的一次,在预设晶圆区域中排布相互独立的多个矩形的芯片区域,所述芯片区域具有该次调试处理对应的调试预设长度和调试预设宽度。Optionally, the initial preset length and the initial preset width are debugged several times according to the preset chip area and process node, so as to arrange a plurality of mutually independent rectangular chip areas in the preset wafer area. Including: when the most and the same number of debug chip areas are arranged for several times in several debugging processes, according to the time when the largest number of debug chip areas is arranged for the first time, arrange multiple independent chips in the preset wafer area. A rectangular chip area, the chip area has a debugging preset length and a debugging preset width corresponding to this debugging process.

可选的,还包括:提供预设切割道宽度;根据所述预设切割道宽度排布所述初始芯片区域,其中,相邻初始芯片区域之间具有所述预设切割道宽度;根据切割道宽度进行若干次所述调试处理,其中,相邻的芯片区域之间具有所述预设切割道宽度。Optionally, it also includes: providing a preset scribe width; arranging the initial chip regions according to the preset scribe width, wherein there is the preset scribe width between adjacent initial chip regions; The debugging process is performed several times according to the street width, wherein the preset dicing street width exists between adjacent chip regions.

可选的,所述预设晶圆区域包括凹槽区域和晶圆标识区域,所述凹槽区域用于晶圆的固定,所述凹槽区域与初始芯片区域之间相互独立,所述凹槽区域与芯片区域之间相互独立,所述晶圆标识区域用于形成区分各晶圆的记号,所述晶圆标识区域与初始芯片区域之间相互独立,所述晶圆标识区域与芯片区域之间相互独立。Optionally, the preset wafer area includes a groove area and a wafer identification area, the groove area is used for fixing the wafer, the groove area is independent from the initial chip area, the groove area The groove area and the chip area are independent of each other. The wafer identification area is used to form marks to distinguish each wafer. The wafer identification area and the initial chip area are independent of each other. The wafer identification area and the chip area independent of each other.

可选的,还包括:提供边缘区域宽度;根据边缘区域宽度排布所述初始芯片区域,所述初始芯片区域的边缘与预设晶圆区域的边缘之间的最小间距大于或等于边缘区域宽度;根据边缘区域宽度进行若干次所述调试处理,其中,所述芯片区域的边缘与预设晶圆区域的边缘之间的最小间距大于或等于边缘区域宽度。Optionally, it also includes: providing the width of the edge area; arranging the initial chip area according to the width of the edge area, the minimum distance between the edge of the initial chip area and the edge of the predetermined wafer area is greater than or equal to the width of the edge area ; performing the debugging process several times according to the width of the edge area, wherein the minimum distance between the edge of the chip area and the edge of the preset wafer area is greater than or equal to the width of the edge area.

与现有技术相比,本发明实施例的技术方案具有以下有益效果:Compared with the prior art, the technical solutions of the embodiments of the present invention have the following beneficial effects:

本发明的技术方案提供的芯片区域排版的方法中,由于芯片区域具有预设芯片面积且基于工艺节点调整后获取,因此,所述芯片区域满足具有该预设芯片面积的芯片的设计需求。在此基础上,由于在排布初始芯片区域后,根据预设芯片面积和工艺节点对初始预设长度和初始预设宽度进行若干次调试处理,以在预设晶圆区域中排布相互独立的多个矩形的芯片区域,因此,通过所述调试处理,能够在初始芯片区域的排版基础上进行精细的调试,在预设晶圆区域中形成相比于初始芯片区域数量更多的芯片区域,从而,获得了更优化的芯片区域排版方法、更合理的芯片区域形状,进而,提高了在一片晶圆上能够制造的芯片数量、减少了原材料的浪费、提升了半导体制造的产能和效益。In the chip region typesetting method provided by the technical solution of the present invention, since the chip region has a preset chip area and is obtained after adjustment based on the process node, the chip region meets the design requirements of a chip with the preset chip area. On this basis, after the initial chip area is arranged, the initial preset length and the initial preset width are debugged several times according to the preset chip area and process node, so that the arrangement in the preset wafer area is independent of each other. Therefore, through the debugging process, fine debugging can be carried out on the basis of the layout of the initial chip area, and a larger number of chip areas than the initial chip area can be formed in the preset wafer area , Thus, a more optimized chip area layout method and a more reasonable chip area shape are obtained, thereby increasing the number of chips that can be manufactured on a wafer, reducing the waste of raw materials, and improving the productivity and efficiency of semiconductor manufacturing.

附图说明Description of drawings

图1是本发明一实施例的芯片区域排版的方法的流程示意图;FIG. 1 is a schematic flow chart of a method for typesetting a chip area according to an embodiment of the present invention;

图2为预设晶圆区域的示意图;FIG. 2 is a schematic diagram of a preset wafer area;

图3为初始芯片区域的排版示意图;Fig. 3 is a layout schematic diagram of the initial chip area;

图4为图1中的调试处理的流程示意图;FIG. 4 is a schematic flow chart of the debugging process in FIG. 1;

图5为调试芯片区域的排版示意图。FIG. 5 is a layout diagram of the debug chip area.

具体实施方式Detailed ways

如背景技术所述,现有技术的芯片区域排版方案中在一片晶圆上能够制造的芯片数量较少,导致原材料浪费、半导体制造的产能和效益较差。As mentioned in the background art, in the chip area layout scheme of the prior art, the number of chips that can be manufactured on a wafer is small, resulting in waste of raw materials, and poor productivity and efficiency of semiconductor manufacturing.

为了解决所述技术问题,本发明实施例提供一种芯片区域排版的方法,通过根据预设芯片面积和工艺节点对初始预设长度和初始预设宽度进行若干次调试处理,以在预设晶圆区域中排布相互独立的多个矩形的芯片区域,并且,所述芯片区域具有预设芯片面积,所述芯片区域的数量大于预设芯片区域的数量,能够提高在一片晶圆上能够制造的芯片数量,减少原材料的浪费、提升半导体制造的产能和效益。In order to solve the above-mentioned technical problems, an embodiment of the present invention provides a method for laying out a chip area. By performing several debugging processes on the initial preset length and initial preset width according to the preset chip area and process node, the preset chip area A plurality of mutually independent rectangular chip areas are arranged in the circular area, and the chip area has a preset chip area, and the number of the chip areas is greater than the number of the preset chip areas, which can improve the ability to manufacture on a wafer. The number of chips, reduce the waste of raw materials, improve the production capacity and efficiency of semiconductor manufacturing.

为使本发明的上述目的、特征和有益效果能够更为明显易懂,下面结合附图对本发明的具体实施例做详细的说明。In order to make the above objects, features and beneficial effects of the present invention more comprehensible, specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

图1是本发明一实施例的芯片区域排版的方法的流程示意图。FIG. 1 is a schematic flowchart of a method for laying out chip regions according to an embodiment of the present invention.

请参考图1,所述芯片区域排版的方法包括:Please refer to Figure 1, the method for layout of the chip area includes:

步骤S100,提供预设晶圆区域、工艺节点及预设芯片面积;Step S100, providing a preset wafer area, a process node and a preset chip area;

步骤S110,根据预设芯片面积在预设晶圆区域中排布相互独立的多个矩形的初始芯片区域,所述初始芯片区域具有初始预设长度和初始预设宽度;Step S110, arranging a plurality of mutually independent rectangular initial chip areas in the preset wafer area according to the preset chip area, the initial chip areas have an initial preset length and an initial preset width;

步骤S120,根据预设芯片面积和工艺节点对初始预设长度和初始预设宽度进行若干次调试处理,以在预设晶圆区域中排布相互独立的多个矩形的芯片区域,并且,所述芯片区域具有预设芯片面积,所述芯片区域的数量大于预设芯片区域的数量。Step S120, according to the preset chip area and process node, perform several debugging processes on the initial preset length and initial preset width, so as to arrange a plurality of mutually independent rectangular chip areas in the preset wafer area, and, the The chip area has a preset chip area, and the number of the chip areas is greater than the number of the preset chip areas.

所述工艺节点是指,集成电路加工过程中半导体结构达到的最小线条宽度,即,半导体结构达到的特征尺寸。The process node refers to the minimum line width achieved by the semiconductor structure during the processing of the integrated circuit, that is, the feature size achieved by the semiconductor structure.

由于芯片区域具有预设芯片面积且基于工艺节点调整后获取,因此,所述芯片区域满足具有该预设芯片面积的芯片的设计需求。在此基础上,由于在排布初始芯片区域后,根据预设芯片面积和工艺节点对初始预设长度和初始预设宽度进行若干次调试处理,以在预设晶圆区域中排布相互独立的多个矩形的芯片区域,因此,通过所述调试处理,能够在初始芯片区域的排版基础上进行精细的调试,在预设晶圆区域中形成相比于初始芯片区域数量更多的芯片区域,从而,获得了更优化的芯片区域排版方法、更合理的芯片区域形状,进而,提高了在一片晶圆上能够制造的芯片数量、减少了原材料的浪费、提升了半导体制造的产能和效益。Since the chip area has a preset chip area and is obtained after adjustment based on a process node, the chip area meets the design requirements of a chip with the preset chip area. On this basis, after the initial chip area is arranged, the initial preset length and the initial preset width are debugged several times according to the preset chip area and process node, so that the arrangement in the preset wafer area is independent of each other. Therefore, through the debugging process, fine debugging can be carried out on the basis of the layout of the initial chip area, and a larger number of chip areas than the initial chip area can be formed in the preset wafer area , Thus, a more optimized chip area layout method and a more reasonable chip area shape are obtained, thereby increasing the number of chips that can be manufactured on a wafer, reducing the waste of raw materials, and improving the productivity and efficiency of semiconductor manufacturing.

请参考图2,图2是图1中预设晶圆区域的示意图,提供预设晶圆区域100。Please refer to FIG. 2 . FIG. 2 is a schematic diagram of a predetermined wafer area in FIG. 1 , providing a predetermined wafer area 100 .

在本实施例中,预设晶圆区域100根据芯片制造时,预定采用的晶圆的直径尺寸D提供。In this embodiment, the preset wafer area 100 is provided according to the diameter size D of the wafer that is scheduled to be used during chip manufacturing.

例如,在芯片制造过程中,当预定采用直径为200mm的晶圆时,通过模拟出的与该种直径的晶圆的形状所对应的区域提供预设晶圆区域。For example, in the chip manufacturing process, when a wafer with a diameter of 200mm is scheduled to be used, the preset wafer area is provided by simulating the area corresponding to the shape of the wafer with this diameter.

应当理解的是,预设晶圆区域不限于根据直径为200mm的晶圆提供,例如,当预定采用直径为300mm的晶圆时,预设晶圆区域100根据直径为300mm的晶圆提供等。It should be understood that the preset wafer area is not limited to being provided based on a wafer with a diameter of 200 mm. For example, when a wafer with a diameter of 300 mm is intended to be used, the preset wafer area 100 is provided based on a wafer with a diameter of 300 mm.

在本实施例中,预设芯片面积S根据芯片的占用面积提供。In this embodiment, the preset chip area S is provided according to the occupied area of the chip.

具体的,在对芯片进行最终的详细设计之前,根据工艺节点、芯片的功能要求等,对该芯片所述需要的面积进行预估,以确定与该芯片对应的预设芯片面积S。Specifically, before the final detailed design of the chip, the required area of the chip is estimated according to the process node, the functional requirements of the chip, etc., so as to determine the preset chip area S corresponding to the chip.

在本实施例中,所述预设晶圆区域100包括凹槽区域101(notch)和晶圆标识区域102(Id Zone area),所述晶圆标识区域102用于形成区分各晶圆的记号。In this embodiment, the preset wafer area 100 includes a groove area 101 (notch) and a wafer identification area 102 (Id Zone area), and the wafer identification area 102 is used to form marks for distinguishing each wafer .

在本实施例中,凹槽区域101位于晶圆标识区域102内。In this embodiment, the groove area 101 is located in the wafer marking area 102 .

需要说明的是,虽然图2中单独示意出预设晶圆区域100、凹槽区域101和晶圆标识区域102。但是,在实际对芯片区域排版的过程中,可以通过提供晶圆尺寸(例如晶圆的直径尺寸D)单独获取并显示预设晶圆区域100、预设的凹槽区域101和晶圆标识区域102,还可以在执行步骤S110的过程中,获取相应的预设晶圆区域100、凹槽区域101和晶圆标识区域102,并使预设晶圆区域100、凹槽区域101和晶圆标识区域102与排布的多个初始芯片区域同步显示。It should be noted that although the preset wafer area 100 , the groove area 101 and the wafer identification area 102 are shown separately in FIG. 2 . However, in the actual process of typesetting the chip area, the preset wafer area 100, the preset groove area 101 and the wafer identification area can be obtained and displayed separately by providing the wafer size (such as the diameter size D of the wafer) 102. It is also possible to acquire the corresponding preset wafer area 100, groove area 101 and wafer identification area 102 during the execution of step S110, and make the preset wafer area 100, groove area 101 and wafer identification area Area 102 is displayed synchronously with the arranged multiple initial chip areas.

请参考图3,图3为初始芯片区域的排版示意图,根据预设芯片面积S在预设晶圆区域100中排布相互独立的多个矩形的初始芯片区域110,所述初始芯片区域110具有初始预设长度HX和初始预设宽度WXPlease refer to FIG. 3. FIG. 3 is a schematic diagram of the layout of the initial chip area. According to the preset chip area S, a plurality of mutually independent rectangular initial chip areas 110 are arranged in the preset wafer area 100. The initial chip area 110 has Initial preset length H X and initial preset width W X .

具体而言,每个初始芯片区域110的面积为预设芯片面积S。Specifically, the area of each initial chip region 110 is the predetermined chip area S.

在本实施例中,根据预设芯片面积S在预设晶圆区域100中排布相互独立的多个矩形的初始芯片区域110的方法包括:根据预设芯片面积S获取初始预设长度HX和初始预设宽度WX,其中,初始预设长度HX和初始预设宽度WX的乘积等于预设芯片面积S;将多个具有初始预设长度HX和初始预设宽度WX的矩形区域在预设晶圆区域100中沿第一方向X和第二方向Y阵列排布,所述具有初始预设长度HX和初始预设宽度WX的矩形区域为初始芯片区域110,第一方向X和第二方向Y之间互垂直。In this embodiment, the method for arranging a plurality of mutually independent rectangular initial chip regions 110 in the preset wafer region 100 according to the preset chip area S includes: obtaining the initial preset length H X according to the preset chip area S and the initial preset width W X , wherein the product of the initial preset length H X and the initial preset width W X is equal to the preset chip area S; a plurality of initial preset lengths H X and initial preset width W X The rectangular areas are arranged in an array along the first direction X and the second direction Y in the preset wafer area 100, and the rectangular area with an initial preset length H X and an initial preset width W X is the initial chip area 110, the first The first direction X and the second direction Y are perpendicular to each other.

在本实施例中,所述凹槽区域101与初始芯片区域之间相互独立,所述晶圆标识区域102与初始芯片区域之间相互独立。具体而言,所述初始芯片区域110在预设晶圆区域100中除了凹槽区域101、晶圆标识区域102以外的区域排布。In this embodiment, the groove area 101 is independent from the initial chip area, and the wafer identification area 102 is independent from the initial chip area. Specifically, the initial chip area 110 is arranged in areas other than the groove area 101 and the wafer identification area 102 in the predetermined wafer area 100 .

在本实施例中,提供预设切割道宽度M。并且,在根据预设芯片面积S排布多个初始芯片区域110的同时,还根据所述预设切割道宽度M排布所述初始芯片区域110。具体的,相邻初始芯片区域110之间具有所述预设切割道宽度M,即,相邻初始芯片区域110之间具有切割道区域。In this embodiment, a preset cutting line width M is provided. Moreover, while arranging the plurality of initial chip regions 110 according to the predetermined chip area S, the initial chip regions 110 are also arranged according to the predetermined scribe line width M. Specifically, there is the preset scribe width M between adjacent initial chip regions 110 , that is, there is a scribe region between adjacent initial chip regions 110 .

在本实施例中,提供边缘区域宽度WE(Edge Exclusion)。并且,在根据预设芯片面积S排布多个初始芯片区域110的同时,还根据边缘区域宽度WE排布所述初始芯片区域110。具体的,所述初始芯片区域110的边缘与所述预设晶圆区域100的边缘之间的最小间距大于或等于边缘区域宽度WEIn this embodiment, an edge region width W E (Edge Exclusion) is provided. Moreover, while arranging the plurality of initial chip regions 110 according to the preset chip area S , the initial chip regions 110 are also arranged according to the edge region width WE. Specifically, the minimum distance between the edge of the initial chip area 110 and the edge of the preset wafer area 100 is greater than or equal to the edge area width W E .

通过使相邻初始芯片区域110之间具有所述预设切割道宽度M,以及使初始芯片区域110的边缘与所述预设晶圆区域100的边缘之间的最小间距大于或等于边缘区域宽度WE,能够使初始芯片区域110的排版与后续调试处理中的调试芯片区域的排版具有同样的限制条件。By making the preset dicing line width M between adjacent initial chip regions 110, and making the minimum distance between the edge of the initial chip region 110 and the edge of the preset wafer region 100 greater than or equal to the edge region width W E , the layout of the initial chip area 110 and the layout of the debug chip area in the subsequent debugging process can have the same restriction conditions.

需要说明的是,图3中仅示意性的示出在预设晶圆区域100排布的部分初始芯片区域110。同时,图3中虽然为了便于理解,示意性的显示出预设晶圆区域100、凹槽区域101、晶圆标识区域102和初始芯片区域110,但是,步骤S110中也可以不显示预设晶圆区域100、凹槽区域101、晶圆标识区域102和初始芯片区域110,而是通过提供的晶圆尺寸(例如晶圆的直径尺寸D)、初始预设长度HX和初始预设宽度WX等参数进行运算,并输出初始芯片区域110的数量等与初始芯片区域110的排版相关的参数。It should be noted that, FIG. 3 only schematically shows part of the initial chip area 110 arranged in the predetermined wafer area 100 . At the same time, although in FIG. 3, the preset wafer area 100, the groove area 101, the wafer identification area 102 and the initial chip area 110 are schematically shown for ease of understanding, but the preset wafer area may not be displayed in step S110. The circle area 100, the groove area 101, the wafer identification area 102 and the initial chip area 110, but through the provided wafer size (such as the diameter size D of the wafer), the initial preset length H X and the initial preset width W The parameters such as X are calculated, and the parameters related to the layout of the initial chip area 110 such as the number of the initial chip area 110 are output.

在本实施例中,步骤S120中的调试处理的次数为2次以上。通过2次以上的调试处理,能够至少获取2组与调试处理相应的参数,从而,有利于在预设晶圆区域100排布更多数量的芯片区域。In this embodiment, the number of debugging processes in step S120 is 2 or more. Through more than two debug processes, at least two sets of parameters corresponding to the debug processes can be obtained, thereby facilitating the arrangement of a greater number of chip areas in the preset wafer area 100 .

在其他实施例中,步骤S120中的调试处理的次数为1次。In other embodiments, the number of debugging processes in step S120 is 1 time.

请参考图4,图4为图1中的调试处理的流程示意图,每次所述调试处理的方法包括:Please refer to FIG. 4. FIG. 4 is a schematic flow chart of the debugging process in FIG. 1, and each method of the debugging process includes:

步骤S121,根据预设芯片面积和工艺节点调节初始预设长度和初始预设宽度,获取调试预设长度和调试预设宽度,各次的调试预设长度不同,各次的调试预设宽度不同;Step S121, adjust the initial preset length and the initial preset width according to the preset chip area and process node, and obtain the debugging preset length and debugging preset width, each debugging preset length is different, and each debugging preset width is different ;

步骤S122,根据调试预设长度和调试预设宽度在预设晶圆区域中排布相互独立的多个矩形的调试芯片区域,所述调试芯片区域具有预设芯片面积。Step S122 , arranging a plurality of mutually independent rectangular debugging chip areas in the preset wafer area according to the debugging preset length and the debugging preset width, and the debugging chip areas have a preset chip area.

请参考图5,图5为调试芯片区域的排版示意图,根据预设芯片面积S和工艺节点调节初始预设长度HX和初始预设宽度WX,获取调试预设长度HT和调试预设宽度WT,各次的调试预设长度HT不同,各次的调试预设宽度WT不同;根据调试预设长度HT和调试预设宽度WT在预设晶圆区域100中排布相互独立的多个矩形的调试芯片区域120,所述调试芯片区域120具有预设芯片面积S。Please refer to Figure 5. Figure 5 is a schematic diagram of the layout of the debug chip area. Adjust the initial preset length H X and initial preset width W X according to the preset chip area S and process node, and obtain the debug preset length H T and debug preset Width W T , the preset length H T of debugging is different each time, and the preset width W T of debugging is different each time; it is arranged in the preset wafer area 100 according to the preset length H T of debugging and the preset width W T of debugging Multiple rectangular debug chip areas 120 that are independent from each other, and the debug chip areas 120 have a predetermined chip area S.

具体的,调试芯片区域120具有调试预设长度HT和调试预设宽度WT,调试预设长度HT和调试预设宽度WT的乘积等于预设芯片面积S。Specifically, the debug chip area 120 has a preset debug length H T and a preset debug width W T , and the product of the preset debug length H T and the preset debug width W T is equal to the preset chip area S.

需要说明的是,为了便于理解,图5中示意性的表示出2种调试芯片区域120的排版示意图,并且,每种调试芯片区域120的排版示意图中,均仅示意性的示出在预设晶圆区域100排布的部分调试芯片区域120。在图5中,每种调试芯片区域120的排版示意图与1次调试处理后的结果对应,并且,2种调试芯片区域120的排版示意图中,调试芯片区域120的形状和尺寸均不相同。具体的,在一种调试芯片区域120的排版示意图中,调试芯片区域120具有调试预设长度HT1和调试预设宽度WT1,在另一种调试芯片区域120的排版示意图中,调试芯片区域120具有调试预设长度HT2和调试预设宽度WT2,并且,调试预设长度HT1与调试预设长度HT2不同,调试预设宽度WT1与调试预设宽度WT2不同。It should be noted that, for the sake of easy understanding, FIG. 5 schematically shows the layout diagrams of two kinds of debugging chip regions 120, and in the layout diagrams of each debugging chip region 120, they are only schematically shown in the preset Part of the debug chip area 120 arranged in the wafer area 100 . In FIG. 5 , the schematic layout of each debugging chip area 120 corresponds to the result after one debugging process, and in the layout schematic diagrams of the two types of debugging chip areas 120 , the shapes and sizes of the debugging chip areas 120 are different. Specifically, in a typesetting schematic diagram of the debugging chip area 120, the debugging chip area 120 has a debugging preset length H T1 and a debugging preset width W T1 ; in another type of layout schematic diagram of the debugging chip area 120, the debugging chip area 120 has a preset length H T2 and a width W T2 , and the default length H T1 is different from the length H T2 , and the width W T1 is different from the width W T2 .

需要说明的是,在实际调试处理的过程中,尽管各次的调试预设长度HT不同,各次的调试预设宽度WT不同,即,各次的调试芯片区域120的排版不同。但是,各次的调试处理后,在预设晶圆区域100中排布的调试芯片区域120的数量可能相同,也可能不相同。It should be noted that, in the actual debugging process, although the debugging preset length H T is different each time, the debugging preset width W T is different each time, that is, the layout of the debugging chip area 120 is different each time. However, after each debugging process, the number of debug chip regions 120 arranged in the preset wafer region 100 may be the same or may not be the same.

应当理解的是,调试处理的次数不限于2次,可以根据实际需求进行3次或者更多次。It should be understood that the number of debugging processes is not limited to two, and may be performed three or more times according to actual needs.

在本实施例中,进行若干次调试处理的方法包括:提供预设调试次数;进行预设调试次数的调试处理,并获取与每次调试处理对应的调试预设长度HT和调试预设宽度WTIn this embodiment, the method for performing several debugging processes includes: providing a preset number of times of debugging; performing the debugging process of the preset number of times of debugging, and obtaining a debugging preset length H T and a debugging preset width corresponding to each debugging process W T .

在其他实施例中,还可以根据实际的调试结果,在若干次调试处理的过程中确定最终的调试次数。In other embodiments, the final number of times of debugging may also be determined during several times of debugging according to actual debugging results.

在本实施例中,进行若干次调试处理的方法还包括:提供预设变化百分比、预设变化函数或预设变化量。并且,每次调试处理的方法还包括:根据预设变化百分比、预设变化函数或预设变化量,变更第n-1次获取的调试预设长度HTn-1和调试预设宽度WTn-1,形成第n次获取的调试预设长度HTn和调试预设宽度WTn,其中,n为大于或等于2的自然数。In this embodiment, the method for performing several debugging processes further includes: providing a preset change percentage, a preset change function, or a preset change amount. Moreover, the method for each debugging process also includes: changing the debugging preset length H Tn-1 and debugging preset width W Tn acquired for the n-1th time according to the preset change percentage, preset change function or preset change amount -1 to form the debugging preset length H Tn and the debugging preset width W Tn acquired for the nth time, wherein, n is a natural number greater than or equal to 2.

具体的,根据预设变化百分比、预设变化函数或预设变化量,变更初始初始预设长度HX和初始预设宽度WX,形成第1次的调试预设长度HT1和调试预设宽度WT1Specifically, according to the preset change percentage, preset change function or preset change amount, the initial initial preset length H X and initial preset width W X are changed to form the first debugging preset length H T1 and debugging preset Width W T1 .

例如,将初始预设长度HX和初始预设宽度WX分别乘以预设变化百分比,以形成第1次的调试预设长度HT1和调试预设宽度WT1,以进行第1次调试处理。在此基础上,自第2次调试处理起,依次将第n-1次获取的调试预设长度HTn-1和调试预设宽度WTn-1分别乘以预设变化百分比,形成第n次获取的调试预设长度HTn和调试预设宽度WTnFor example, the initial preset length H X and the initial preset width W X are multiplied by the preset change percentage respectively to form the first debugging preset length H T1 and debugging preset width W T1 for the first debugging deal with. On this basis, starting from the second debugging process, the debugging preset length H Tn-1 and the debugging preset width W Tn-1 acquired in the n-1th time are multiplied by the preset change percentage respectively to form the nth The debugging preset length H Tn and the debugging preset width W Tn acquired for the second time.

在本实施例中,根据预设芯片面积S和工艺节点对初始预设长度HX和初始预设宽度WX进行若干次调试处理,以在预设晶圆区域100中排布相互独立的多个矩形的芯片区域的方法包括:根据若干次调试处理中排布了调试芯片区域120数量最多的一次,在预设晶圆区域100中排布相互独立的多个矩形的芯片区域,所述芯片区域具有该次调试处理对应的调试预设长度HT和调试预设宽度WT。从而,能够更好的优化芯片区域的排版,进一步提高在一片晶圆上能够制造的芯片数量、减少了原材料的浪费、提升了半导体制造的产能和效益。In this embodiment, according to the preset chip area S and the process node, the initial preset length HX and the initial preset width WX are debugged several times, so as to arrange mutually independent multiple chips in the preset wafer area 100. The method for a rectangular chip area includes: arranging a plurality of mutually independent rectangular chip areas in the preset wafer area 100 according to the one in which the number of debug chip areas 120 is the largest in several debugging processes, the chips The area has a preset debugging length H T and a preset debugging width W T corresponding to the debugging process. Thus, the typesetting of the chip area can be better optimized, the number of chips that can be manufactured on a wafer can be further increased, the waste of raw materials can be reduced, and the productivity and efficiency of semiconductor manufacturing can be improved.

具体而言,通过每次调试处理,能够获取与该次调试处理对应的调试结果:调试芯片区域120的数量、与调试芯片区域120的排版相关的调试预设长度HT和调试预设宽度WT等参数。在获取若干次调试处理对应的调试结果后,选取调试芯片区域120数量最多的一次调试处理,将该次调试处理所对应的调试芯片区域120的排版方法,作为在预设晶圆区域100中排布芯片区域的方法。即,将该次调试处理所对应的调试芯片区域120的排版方法,作为芯片区域的排版方法,相应的,将该次调试处理中的调试芯片区域120作为芯片区域。Specifically, through each debugging process, the debugging results corresponding to this debugging process can be obtained: the number of debugging chip areas 120, the debugging preset length H T and the debugging preset width W related to the layout of the debugging chip area 120 T and other parameters. After obtaining the debugging results corresponding to several debugging processes, select a debugging process with the largest number of debugging chip areas 120, and use the layout method of the debugging chip area 120 corresponding to this debugging process as the layout method in the preset wafer area 100. The method of laying out the chip area. That is, the typesetting method of the debugging chip area 120 corresponding to this debugging process is used as the typesetting method of the chip area, and correspondingly, the debugging chip area 120 in this debugging process is used as the chip area.

在本实施例中,根据预设芯片面积S和工艺节点对初始预设长度HX和初始预设宽度WX进行若干次调试处理,以在预设晶圆区域100中排布相互独立的多个矩形的芯片区域的方法还包括:当若干次调试处理中,多次排布了最多且相同的调试芯片区域120数量时,根据首次排布了最多调试芯片区域120数量的一次,在预设晶圆区域100中排布相互独立的多个矩形的芯片区域,所述芯片区域具有该次调试处理对应的调试预设长度HTn和调试预设宽度WTnIn this embodiment, according to the preset chip area S and the process node, the initial preset length HX and the initial preset width WX are debugged several times, so as to arrange mutually independent multiple chips in the preset wafer area 100. The method for a rectangular chip area also includes: when the most and the same number of debug chip areas 120 are arranged for several times in several debugging processes, according to the first arrangement of the largest number of debug chip areas 120, in the preset A plurality of mutually independent rectangular chip areas are arranged in the wafer area 100 , and the chip areas have a debugging preset length H Tn and a debugging preset width W Tn corresponding to this debugging process.

在其他实施例中,当若干次调试处理中,多次排布了最多且相同的调试芯片区域数量时,根据其中的任一次,预设晶圆区域中排布相互独立的多个矩形的芯片区域,所述芯片区域具有该次调试处理对应的调试预设长度HTn和调试预设宽度WTnIn other embodiments, when the largest and the same number of debug chip areas are arranged multiple times in several debug processes, according to any one of them, a plurality of mutually independent rectangular chips are arranged in the preset wafer area area, the chip area has a debugging preset length H Tn and a debugging preset width W Tn corresponding to the debugging process.

需要说明的是,根据实际的制造需求,可以在整个预设晶圆区域100中排布相同形状的芯片区域,以在一片晶圆上制造同样的芯片。也可以在预设晶圆区域100中至少两个不重合的区域中,分别进行所述调试处理并排布不同形状的芯片区域,以在一片晶圆上制造至少2种不同的芯片。It should be noted that, according to actual manufacturing requirements, chip regions of the same shape can be arranged in the entire preset wafer region 100 to manufacture the same chip on a wafer. Alternatively, in at least two non-overlapping areas of the predetermined wafer area 100, the debugging process may be performed separately and chip areas of different shapes may be arranged to manufacture at least two different types of chips on one wafer.

在本实施例中,所述凹槽区域101与调试芯片区域120之间相互独立,所述晶圆标识区域102与调试芯片区域120之间相互独立。具体而言,所述调试芯片区域120在预设晶圆区域100中除了凹槽区域101、晶圆标识区域102以外的区域排布。相应的,芯片区域在预设晶圆区域100中除了凹槽区域101、晶圆标识区域102以外的区域排布。In this embodiment, the groove area 101 and the debug chip area 120 are independent from each other, and the wafer identification area 102 and the debug chip area 120 are independent from each other. Specifically, the debug chip area 120 is arranged in areas other than the groove area 101 and the wafer identification area 102 in the preset wafer area 100 . Correspondingly, the chip areas are arranged in areas other than the groove area 101 and the wafer identification area 102 in the predetermined wafer area 100 .

在本实施例中,所述芯片区域排版的方法还包括:根据切割道宽度M进行若干次所述调试处理。每次调试处理中,相邻的调试芯片区域120之间具有所述预设切割道宽度M,即,相邻调试芯片区域120之间也具有切割道区域。相应的,相邻的芯片区域之间具有所述预设切割道宽度M,即,相邻芯片区域之间也具有切割道区域。In this embodiment, the method for layout of the chip area further includes: performing the debugging process several times according to the width M of the scribe line. In each debugging process, the preset scribe width M exists between adjacent debug chip regions 120 , that is, there is also a scribe region between adjacent debug chip regions 120 . Correspondingly, there is the preset scribe width M between adjacent chip regions, that is, there is also a scribe region between adjacent chip regions.

通过使相邻的芯片区域之间具有所述预设切割道宽度M,即,使相邻芯片区域之间具有切割道区域,为制造芯片预留了切割道(Scribe Lane)的空间,以切割晶圆形成多个芯片。By having the preset scribe lane width M between adjacent chip areas, that is, having a scribe lane area between adjacent chip areas, a space for a scribe lane (Scribe Lane) is reserved for manufacturing chips to cut The wafer forms a plurality of chips.

需要理解的是,各次调试处理时,相邻调试芯片区域120之间的切割道区域的形状随着调试芯片区域120尺寸的变化而变化。It should be understood that, during each debugging process, the shape of the dicing line region between adjacent debugging chip regions 120 changes as the size of the debugging chip region 120 changes.

在本实施例中,所述芯片区域排版的方法还包括:根据边缘区域宽度WE进行若干次所述调试处理。每次调试处理中,调试芯片区域120的边缘与所述预设晶圆区域100的边缘之间的最小间距大于或等于边缘区域宽度WE。相应的,所述芯片区域的边缘与所述预设晶圆区域100的边缘之间的最小间距大于或等于边缘区域宽度WEIn this embodiment, the method for layout of the chip area further includes: performing the debugging process several times according to the width W E of the edge area. In each debugging process, the minimum distance between the edge of the debugging chip area 120 and the edge of the preset wafer area 100 is greater than or equal to the edge area width W E . Correspondingly, the minimum distance between the edge of the chip area and the edge of the preset wafer area 100 is greater than or equal to the edge area width W E .

由于在晶圆的边缘区域发生变形等缺陷的风险较大,通过使芯片区域的边缘与预设晶圆区域100的边缘之间的最小间距大于或等于边缘区域宽度WE,减小了边缘区域发生的变形等缺陷对芯片的影响,提高了芯片的性能和可靠性。Due to the greater risk of defects such as deformation occurring in the edge area of the wafer, the edge area is reduced by making the minimum distance between the edge of the chip area and the edge of the preset wafer area 100 greater than or equal to the edge area width W E The impact of deformation and other defects on the chip improves the performance and reliability of the chip.

虽然本发明披露如上,但本发明并非限定于此。任何本领域技术人员,在不脱离本发明的精神和范围内,均可作各种更动与修改,因此本发明的保护范围应当以权利要求所限定的范围为准。Although the present invention is disclosed above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, so the protection scope of the present invention should be based on the scope defined in the claims.

Claims (9)

1.一种芯片区域排版的方法,其特征在于,包括:1. A method for typesetting a chip region, characterized in that it comprises: 提供预设晶圆区域、工艺节点及预设芯片面积;Provide preset wafer area, process node and preset chip area; 根据预设芯片面积在预设晶圆区域中排布相互独立的多个矩形的初始芯片区域,所述初始芯片区域具有初始预设长度和初始预设宽度;Arranging a plurality of independent rectangular initial chip areas in the predetermined wafer area according to the predetermined chip area, the initial chip area has an initial predetermined length and an initial predetermined width; 根据预设芯片面积和工艺节点对初始预设长度和初始预设宽度进行若干次调试处理,以在预设晶圆区域中排布相互独立的多个矩形的芯片区域,并且,所述芯片区域具有预设芯片面积,所述芯片区域的数量大于预设芯片区域的数量。According to the preset chip area and process node, the initial preset length and the initial preset width are debugged several times, so as to arrange a plurality of mutually independent rectangular chip areas in the preset wafer area, and the chip area It has a preset chip area, and the number of the chip areas is greater than the number of the preset chip areas. 2.如权利要求1所述的芯片区域排版的方法,其特征在于,所述调试处理的次数为2次以上;每次所述调试处理的方法包括:根据预设芯片面积和工艺节点调节初始预设长度和初始预设宽度,获取调试预设长度和调试预设宽度,各次的调试预设长度不同,各次的调试预设宽度不同;根据调试预设长度和调试预设宽度在预设晶圆区域中排布相互独立的多个矩形的调试芯片区域,所述调试芯片区域具有预设芯片面积。2. The method for layout of chip area according to claim 1, characterized in that, the number of times of the debugging process is more than 2 times; each time the method of the debugging process comprises: adjusting the initial chip area and the process node according to the preset The preset length and initial preset width are used to obtain the preset length for debugging and the preset width for debugging. It is assumed that a plurality of mutually independent rectangular debug chip areas are arranged in the wafer area, and the debug chip areas have a preset chip area. 3.如权利要求2所述的芯片区域排版的方法,其特征在于,进行若干次调试处理的方法包括:提供预设调试次数;进行预设调试次数的调试处理,并获取与每次调试处理对应的调试预设长度和调试预设宽度。3. The method for typesetting a chip area as claimed in claim 2, wherein the method for performing several debugging processes comprises: providing a preset number of times of debugging; performing the debugging process of the preset number of times of debugging, and obtaining the same number of times as each debugging process The corresponding debug preset length and debug preset width. 4.如权利要求2所述的芯片区域排版的方法,其特征在于,进行若干次调试处理的方法还包括:提供预设变化百分比、预设变化函数或预设变化量;每次调试处理的方法还包括:根据预设变化百分比、预设变化函数或预设变化量,变更第n-1次获取的调试预设长度和调试预设宽度,形成第n次获取的调试预设长度和调试预设宽度,其中,n为大于或等于2的自然数。4. The method for typesetting a chip area as claimed in claim 2, characterized in that, the method for performing several debugging processes also includes: providing a preset change percentage, a preset change function or a preset change amount; The method also includes: according to the preset change percentage, preset change function or preset change amount, changing the debugging preset length and debugging preset width acquired in the n-1th time to form the debugging preset length and debugging width acquired in the nth time. Preset width, where n is a natural number greater than or equal to 2. 5.如权利要求2所述的芯片区域排版的方法,其特征在于,根据预设芯片面积和工艺节点对初始预设长度和初始预设宽度进行若干次调试处理,以在预设晶圆区域中排布相互独立的多个矩形的芯片区域的方法包括:根据若干次调试处理中排布了调试芯片区域数量最多的一次,在预设晶圆区域中排布相互独立的多个矩形的芯片区域,所述芯片区域具有该次调试处理对应的调试预设长度和调试预设宽度。5. The method for typesetting a chip area as claimed in claim 2, characterized in that, according to the preset chip area and process node, the initial preset length and the initial preset width are debugged several times, so that in the preset wafer area The method for arranging a plurality of mutually independent rectangular chip areas includes: arranging a plurality of mutually independent rectangular chip areas in a preset wafer area according to the one with the largest number of debug chip areas arranged in several debugging processes area, the chip area has a debugging preset length and a debugging preset width corresponding to the debugging process. 6.如权利要求5所述的芯片区域排版的方法,其特征在于,根据预设芯片面积和工艺节点对初始预设长度和初始预设宽度进行若干次调试处理,以在预设晶圆区域中排布相互独立的多个矩形的芯片区域的方法还包括:当若干次调试处理中,多次排布了最多且相同的调试芯片区域数量时,根据首次排布了最多调试芯片区域数量的一次,在预设晶圆区域中排布相互独立的多个矩形的芯片区域,所述芯片区域具有该次调试处理对应的调试预设长度和调试预设宽度。6. The method for typesetting a chip area according to claim 5, characterized in that, according to the preset chip area and the process node, the initial preset length and the initial preset width are debugged several times, so that in the preset wafer area The method for arranging a plurality of mutually independent rectangular chip areas also includes: when the largest and the same number of debugging chip areas are arranged for several times in several debugging processes, according to the number of the largest number of debugging chip areas arranged for the first time Once, a plurality of mutually independent rectangular chip areas are arranged in the preset wafer area, and the chip areas have a debugging preset length and a debugging preset width corresponding to the debugging process. 7.如权利要求1所述的芯片区域排版的方法,其特征在于,还包括:提供预设切割道宽度;根据所述预设切割道宽度排布所述初始芯片区域,其中,相邻初始芯片区域之间具有所述预设切割道宽度;根据切割道宽度进行若干次所述调试处理,其中,相邻的芯片区域之间具有所述预设切割道宽度。7. The method for typesetting a chip region according to claim 1, further comprising: providing a preset scribe width; arranging the initial chip regions according to the preset scribe width, wherein adjacent initial There is the preset scribe width between the chip regions; the debugging process is performed several times according to the scribe width, wherein the preset scribe width exists between adjacent chip regions. 8.如权利要求1所述的芯片区域排版的方法,其特征在于,所述预设晶圆区域包括凹槽区域和晶圆标识区域,所述凹槽区域用于晶圆的固定,所述凹槽区域与初始芯片区域之间相互独立,所述凹槽区域与芯片区域之间相互独立,所述晶圆标识区域用于形成区分各晶圆的记号,所述晶圆标识区域与初始芯片区域之间相互独立,所述晶圆标识区域与芯片区域之间相互独立。8. The method for typesetting a chip area according to claim 1, wherein the preset wafer area includes a groove area and a wafer identification area, the groove area is used for fixing the wafer, and the The groove area and the initial chip area are independent of each other, the groove area and the chip area are independent of each other, the wafer identification area is used to form marks to distinguish each wafer, and the wafer identification area and the initial chip area are independent of each other. The areas are independent of each other, and the wafer identification area and the chip area are independent of each other. 9.如权利要求1所述的芯片区域排版的方法,其特征在于,还包括:提供边缘区域宽度;根据边缘区域宽度排布所述初始芯片区域,所述初始芯片区域的边缘与预设晶圆区域的边缘之间的最小间距大于或等于边缘区域宽度;根据边缘区域宽度进行若干次所述调试处理,其中,所述芯片区域的边缘与预设晶圆区域的边缘之间的最小间距大于或等于边缘区域宽度。9. The method for typesetting a chip area according to claim 1, further comprising: providing the width of the edge area; The minimum distance between the edges of the circle area is greater than or equal to the width of the edge area; the debugging process is performed several times according to the width of the edge area, wherein the minimum distance between the edge of the chip area and the edge of the preset wafer area is greater than or equal to the margin area width.
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CN118362868B (en) * 2024-06-14 2024-08-20 亿芯微半导体科技(深圳)有限公司 Dynamic thermal management method, device, equipment and storage medium

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