CN115261798A - Crucible and evaporation device - Google Patents
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- CN115261798A CN115261798A CN202110482952.1A CN202110482952A CN115261798A CN 115261798 A CN115261798 A CN 115261798A CN 202110482952 A CN202110482952 A CN 202110482952A CN 115261798 A CN115261798 A CN 115261798A
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- 230000008020 evaporation Effects 0.000 title claims abstract description 32
- 238000001704 evaporation Methods 0.000 title claims abstract description 32
- 239000011248 coating agent Substances 0.000 claims abstract description 79
- 238000000576 coating method Methods 0.000 claims abstract description 79
- 239000000463 material Substances 0.000 claims abstract description 61
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 14
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical group [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 14
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 9
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 239000002699 waste material Substances 0.000 abstract description 9
- 230000002035 prolonged effect Effects 0.000 abstract description 3
- 238000007740 vapor deposition Methods 0.000 description 8
- 230000009286 beneficial effect Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000004064 recycling Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 241001391944 Commicarpus scandens Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- Chemical Kinetics & Catalysis (AREA)
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- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
技术领域technical field
本发明涉及了蒸镀技术领域,具体涉及了一种坩埚和蒸镀装置。The invention relates to the technical field of evaporation, in particular to a crucible and an evaporation device.
背景技术Background technique
随着显示行业的发展,有机发光显示OLED(Organic Light-Emitting Diode)技术是目前最有前景的屏幕显示技术之一,而且OLED器件的大部分核心功能膜层是采用坩埚进行膜层蒸镀形成的。With the development of the display industry, OLED (Organic Light-Emitting Diode) technology is currently one of the most promising screen display technologies, and most of the core functional film layers of OLED devices are formed by film evaporation using crucibles of.
但是,现有技术中的坩埚存在容易出现破损,坩埚内材料粘附在坩埚底部、难以取出的问题。However, the crucible in the prior art is prone to breakage, and the material in the crucible adheres to the bottom of the crucible and is difficult to take out.
发明内容Contents of the invention
有鉴于此,本发明实施例提供了一种坩埚和蒸镀装置,以改善现有技术中存在的问题。In view of this, an embodiment of the present invention provides a crucible and an evaporation device to improve the problems existing in the prior art.
本发明第一方面提供了一种坩埚,包括:The first aspect of the present invention provides a crucible, comprising:
本体,所述本体包括相互连接的底部和侧部,所述本体还包括内壁和外壁;a body comprising an interconnected bottom and side portions, the body further comprising an inner wall and an outer wall;
涂层,所述涂层至少位于所述底部的内壁上,用于降低所述本体与所述坩埚内材料的粘附性;a coating, at least on the inner wall of the bottom, for reducing the adhesion of the body to the material in the crucible;
其中,所述本体的材料为钽。Wherein, the material of the body is tantalum.
在一个实施例中,所述涂层的材料包括热解氮化硼、氮化硅或氧化硅。通过设置涂层,可使得蒸镀材料容易从坩埚中取出、利于回收,避免材料的浪费。In one embodiment, the material of the coating includes pyrolytic boron nitride, silicon nitride or silicon oxide. By setting the coating, the evaporation material can be easily taken out from the crucible, which is beneficial to recycling and avoids waste of materials.
在一个实施例中,所述涂层的厚度小于5微米。在保证顺利取出坩埚内蒸镀材料的基础上有效简化制备工艺,节约制备原料。In one embodiment, the thickness of the coating is less than 5 microns. On the basis of ensuring smooth removal of the vapor deposition material in the crucible, the preparation process is effectively simplified and the preparation raw materials are saved.
在一个实施例中,所述涂层的面积占所述本体的所述内壁面积的30%-90%;In one embodiment, the area of the coating accounts for 30%-90% of the area of the inner wall of the body;
优选地,所述涂层的面积占所述本体的所述内壁面积的50%-90%。可以合理设置涂层的面积,使得其更容易取出坩埚内的蒸镀材料,避免蒸镀材料的浪费。Preferably, the area of the coating accounts for 50%-90% of the area of the inner wall of the body. The area of the coating can be reasonably set, making it easier to take out the evaporation material in the crucible, and avoiding the waste of the evaporation material.
在一个实施例中,所述坩埚还包括开口,在沿所述开口到所述底部的方向上,所述侧部的所述内壁和所述外壁之间的距离逐渐增大。可有效增大坩埚底部强度,避免坩埚损坏,同时还可避免坩埚受力产生形变。In one embodiment, the crucible further includes an opening, and the distance between the inner wall and the outer wall of the side part gradually increases along the direction from the opening to the bottom. It can effectively increase the strength of the bottom of the crucible, avoid damage to the crucible, and at the same time avoid deformation of the crucible due to force.
在一个实施例中,所述侧部包括第一部分和第二部分,所述第二部分与所述底部连接,所述第二部分的所述内壁和所述外壁之间的距离大于所述底部的所述内壁和所述外壁之间的距离。通过在坩埚易损坏的位置设置更厚的结构,能进一步增大坩埚底部附近的强度,避免坩埚损坏,增大坩埚使用寿命。In one embodiment, the side portion comprises a first portion and a second portion, the second portion is connected to the bottom, and the distance between the inner wall and the outer wall of the second portion is greater than that of the bottom The distance between the inner wall and the outer wall. By arranging a thicker structure at the easily damaged position of the crucible, the strength near the bottom of the crucible can be further increased, damage to the crucible can be avoided, and the service life of the crucible can be increased.
在一个实施例中,所述第一部分的所述内壁和所述外壁之间的距离小于或等于所述底部的所述内壁和所述外壁之间的距离。通过合理设置本体的厚度,能在保证坩埚具有有益效果的基础上更大程度的节约原料。In one embodiment, the distance between the inner wall and the outer wall of the first portion is less than or equal to the distance between the inner wall and the outer wall of the bottom. By reasonably setting the thickness of the body, raw materials can be saved to a greater extent on the basis of ensuring that the crucible has beneficial effects.
在一个实施例中,所述第一部分设置有凸起;In one embodiment, said first portion is provided with a protrusion;
优选地,所述涂层位于所述凸起的下方。涂层制备时沿该凸起向下制作,增加涂层的粘附性,避免涂层脱落,有效保护涂层。Preferably, the coating is located below the protrusions. When the coating is prepared, it is made downward along the protrusion, which increases the adhesion of the coating, prevents the coating from falling off, and effectively protects the coating.
在一个实施例中,所述凸起的高度为0.1mm-1.5mm;优选地,所述凸起的高度为0.1mm-1mm。通过限定凸起的高度可以限定涂层的起始涂覆位置。In one embodiment, the height of the protrusion is 0.1 mm-1.5 mm; preferably, the height of the protrusion is 0.1 mm-1 mm. By defining the height of the protrusions it is possible to define the initial application position of the coating.
本发明另一方面提供了一种蒸镀装置,包括上述任一实施例所述的坩埚。Another aspect of the present invention provides an evaporation device, including the crucible described in any one of the above embodiments.
本发明提供了一种坩埚和蒸镀装置,其中,该坩埚包括本体和涂层,其中,所述本体包括内壁;所述涂层至少位于所述底部的内壁上;所述本体的材料为钽。通过本发明提供的坩埚,由于其底部包括双层结构即本体和涂层,且本体的材料为钽,能有效避免现有技术中的坩埚存在的容易出现破损的问题,且由于涂层的存在,可有效降低蒸镀材料与坩埚的内壁的附着性,坩埚内材料不易粘附在坩埚底部、容易取出、利于回收,避免材料的浪费,同时还可避免坩埚受力产生的形变,延长坩埚使用寿命。The present invention provides a crucible and an evaporation device, wherein the crucible includes a body and a coating, wherein the body includes an inner wall; the coating is located at least on the inner wall of the bottom; the material of the body is tantalum . The crucible provided by the present invention, because its bottom includes a double-layer structure, that is, a body and a coating, and the material of the body is tantalum, can effectively avoid the problem that the crucible in the prior art is prone to breakage, and due to the existence of the coating , which can effectively reduce the adhesion between the evaporation material and the inner wall of the crucible. The material in the crucible is not easy to adhere to the bottom of the crucible, easy to take out, which is conducive to recycling, avoiding material waste, and at the same time avoiding the deformation of the crucible due to force, prolonging the use of the crucible life.
附图说明Description of drawings
图1所示为本发明一实施例提供的一种坩埚的结构示意图;Figure 1 shows a schematic structural view of a crucible provided by an embodiment of the present invention;
图2所示为图1的分解的结构示意图;Fig. 2 is a schematic structural diagram of the decomposition of Fig. 1;
图3所示为本发明另一实施例提供的一种坩埚的结构示意图;Fig. 3 is a schematic structural view of a crucible provided by another embodiment of the present invention;
图4所示为本发明另一实施例提供的一种外围结构的结构示意图。FIG. 4 is a schematic structural diagram of a peripheral structure provided by another embodiment of the present invention.
附图标记:Reference signs:
1-坩埚;10-本体;110-底部;120-侧部;122-第一部分;124-第二部分;126-内壁;128-外壁;20-涂层;30-开口;40-凸起;50-外围结构;X-第一方向;h-高度;d-距离。1-crucible; 10-body; 110-bottom; 120-side; 122-first part; 124-second part; 126-inner wall; 128-outer wall; 20-coating; 30-opening; 40-protrusion; 50—peripheral structure; X—first direction; h—height; d—distance.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然所描述的实施例仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他的实施例,都属于本发明保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
在本发明的描述中,需要说明的是,术语“中心”、“上”、“下”、“左”、“右”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明,而不是指示所指的装置或元件必须具有特定的方位,因此不能理解为对本发明的限制。此外,术语“第一”、“第二”等仅用于区分描述,而不能理解为指示或暗示相对重要性。此外,需要说明的是,下面所描述的本发明不同实施方式中所涉及的技术特征只要彼此之间未构成冲突就可以相互结合。In the description of the present invention, it should be noted that the orientation or positional relationship indicated by the terms "center", "upper", "lower", "left", "right" etc. is based on the orientation or positional relationship shown in the drawings , is only for the convenience of describing the present invention, but does not indicate that the device or element referred to must have a specific orientation, so it should not be construed as a limitation of the present invention. In addition, the terms "first", "second", etc. are only used for distinguishing descriptions, and should not be construed as indicating or implying relative importance. In addition, it should be noted that the technical features involved in the different embodiments of the present invention described below can be combined as long as they do not constitute a conflict with each other.
所应说明的是,以上现有技术中的方案所存在的缺陷,均是发明人在经过实践并仔细研究后得出的结果,因此,上述技术问题的发现过程以及下文中本申请实施例针对上述问题所提出的解决方案,都应该是发明人在发明创造过程中对本申请做出的贡献,而不应当理解为本领域技术人员所公知的技术内容。It should be noted that the defects in the above solutions in the prior art are the results obtained by the inventor after practice and careful research. Therefore, the discovery process of the above technical problems and the following embodiments of the application are aimed at The solutions proposed for the above problems should be the contributions made by the inventors to this application during the process of invention and creation, and should not be understood as technical content known to those skilled in the art.
本申请的发明人经过长期研究发现,在用蒸镀工艺蒸镀OLED的各个膜层时,若具体的蒸镀工艺为点源蒸镀时,现有技术的坩埚通常会使用的两种材料为:热解氮化硼和钽,当使用的坩埚的材料是热解氮化硼(PBN)时,其缺点是易浸润泄漏,且其本身硬度较小,碰撞中容易破裂出现裂纹,因此在实际生产时,容易出现坩埚破损异常,造成生产延迟;如果该坩埚的材料是钽(Ta)时,蒸镀完后坩埚内剩余材料会粘附在坩埚底部,难以取出,并且温度降低后,坩埚底部会受力收缩,产生形变。The inventors of the present application have found through long-term research that when using the evaporation process to evaporate the various film layers of the OLED, if the specific evaporation process is point source evaporation, the two materials that are usually used in the crucible of the prior art are : Pyrolytic boron nitride and tantalum, when the material of the crucible used is pyrolytic boron nitride (PBN), its disadvantage is that it is easy to infiltrate and leak, and its own hardness is small, and it is easy to break and crack in the collision, so in practice During production, the crucible is likely to be damaged abnormally, causing production delay; if the material of the crucible is tantalum (Ta), the remaining material in the crucible will adhere to the bottom of the crucible after evaporation, which is difficult to take out, and after the temperature drops, the bottom of the crucible will It will shrink under force and deform.
基于上述一系列的问题,本发明提供了一种坩埚,能够有效改善现有技术中的坩埚存在的容易出现破损,坩埚内材料粘附在坩埚底部、难以取出的问题,具体方案如下所示。Based on the above-mentioned series of problems, the present invention provides a crucible, which can effectively improve the problems in the prior art that the crucible is prone to breakage, and the material in the crucible sticks to the bottom of the crucible and is difficult to take out. The specific solution is as follows.
本发明一实施例中提供了一种坩埚,具体可参见图1和图2,图1所示为本发明一实施例提供的一种坩埚的结构示意图。图2所示为图1的分解的结构示意图。具体的,该坩埚1包括本体10和涂层20,其中,本体10包括相互连接的底部110和侧部120,本体10还包括内壁126和外壁128,且本体10的材料为钽(Ta);涂层20至少位于底部110的内壁126上,用于降低本体10与坩埚1内材料的粘附性。可以理解的是,钽材料有非常出色的化学性质,具有极高的抗腐蚀性、富有延展性,其热膨胀系数很小。本体10的材料为钽,使得该坩埚1具有优异的性能。可以理解的是,坩埚1内材料具体为坩埚1内的蒸镀材料。A crucible is provided in an embodiment of the present invention, and details may be referred to FIG. 1 and FIG. 2 . FIG. 1 is a schematic structural diagram of a crucible provided in an embodiment of the present invention. FIG. 2 is a schematic diagram showing the exploded structure of FIG. 1 . Specifically, the
涂层20至少位于底部110的内壁126上,可以理解的是,涂层20还可以位于侧部120的内壁126上,即涂层20位于本体10的内壁126的所有部分,具体可根据实际情况进行设置。通过设置涂层20至少位于底部110的内壁126上,能够保证坩埚1内的材料尽量与内壁126上涂覆的涂层20接触,尽量不与无涂层20的内壁126接触,可有效降低蒸镀材料与坩埚1的内壁126的附着性,以便于后续材料可以快速取出涂层。The
可以理解的是,在本实施例中,涂层20在内壁126各处膜层厚度相同,可有效简化制备工艺,在其他实施例中,也可以设置涂层20的膜层厚度不同,且靠近底部110处内壁126的涂层20膜层厚度大于远离底部110处的涂层20的膜层厚度,有利于加强坩埚1底部的强度。在另一实施例中,在沿X的方向,涂层20的膜层厚度逐渐增大,通过此种设置方式,可进一步增强坩埚1底部的强度。It can be understood that, in this embodiment, the film thickness of the
可以理解的是,本申请提供的坩埚1为蒸镀工艺中用到的点源坩埚。It can be understood that the
本发明提供了一种坩埚,该坩埚包括本体和涂层,其中,本体包括内壁,且本体的材料为钽;涂层至少位于底部的内壁上。通过本发明提供的坩埚,由于其中底部包括双层结构即本体和涂层,且本体的材料为钽,能有效避免现有技术中的坩埚存在的容易出现破损的问题,且由于涂层的存在,可有效降低蒸镀材料与坩埚的内壁的附着性,坩埚内材料不易粘附在坩埚底部、容易取出、利于回收,避免材料的浪费,同时还可避免坩埚受力产生的形变,延长坩埚使用寿命。The invention provides a crucible, which includes a body and a coating, wherein the body includes an inner wall, and the material of the body is tantalum; the coating is at least located on the inner wall of the bottom. Through the crucible provided by the present invention, since the bottom includes a double-layer structure, that is, a body and a coating, and the material of the body is tantalum, it can effectively avoid the problem that the crucible in the prior art is prone to breakage, and due to the existence of the coating , which can effectively reduce the adhesion between the evaporation material and the inner wall of the crucible. The material in the crucible is not easy to adhere to the bottom of the crucible, easy to take out, which is conducive to recycling, avoiding material waste, and at the same time avoiding the deformation of the crucible due to force, prolonging the use of the crucible life.
具体的,侧部120还可以包括第一部分122和第二部分124,第二部分124与底部110连接。Specifically, the
可以理解的是,本实施例中的涂层20是按照沿X方向的反方向依次设置的,即,涂层20先位于底部110的内壁126(即内壁126的底部)上,再位于第二部分124的内壁126上,最后是第一部分122的内壁126上。可以理解的是,该涂层20是环绕该内壁126整圈设置的。It can be understood that the
可以理解的是,涂层20沿X方向上的高度位于同一水平面,即涂层20在坩埚1四周的内壁126上的最高点位于同一水平面,通过此种设置方式,可以便于简化制备工艺、有利于蒸镀完成后蒸镀材料从坩埚1中取出。It can be understood that the height of the
在其他实施例中,涂层20不止位于底部110的内壁126上,还可以位于至少部分第二部分124的内壁126上,或者是位于第二部分124的内壁126上和至少部分第一部分122的内壁126上,具体可根据实际情况进行设置。In other embodiments, the
在一实施方式中,本体10设置为圆柱体形状,在其他实施例中本体10还可以设置成其他形状;且本体10的顶端设置外围结构50。具体的,外围结构50可方便移动该坩埚1,该外围结构50的具体形状可参见图4,图4所示为本发明另一实施例提供的一种外围结构的结构示意图。图4中外围结构50为圆环形,在其他实施方式中,外围结构50还可以设置成其他形状如方形、三角形等,在此不作具体的限定。In one embodiment, the
在一实施方式中,涂层20的材料可以包括热解氮化硼(PBN)、氮化硅或氧化硅。通过设置涂层20,可使得蒸镀材料容易从坩埚1中取出,避免材料的浪费。优选地,涂层20的材料包括热解氮化硼,热解氮化硼是特种陶瓷材料,具有耐高温,耐酸、碱、盐及有机试剂的性质,抗热震性好,热导性好,热膨胀系数低。热解氮化硼材料可有效使得坩埚1内蒸镀材料不易粘附在坩埚1底部、容易取出、利于回收,避免材料的浪费。In one embodiment, the material of
在一实施方式中,涂层20的厚度小于5微米。相对于本体10的厚度,涂层20只是相对较薄的一涂层,通过将涂层20的厚度设置在此范围内,在保证顺利取出坩埚1内蒸镀材料的基础上,有效简化制备工艺,节约制备原料。In one embodiment, coating 20 has a thickness of less than 5 microns. Compared with the thickness of the
在一实施方式中,涂层20的面积占本体10的内壁126面积的30%-100%。进一步的,涂层20的面积占本体10的内壁126面积的30%-90%。通过将涂层20的面积设置在此范围内,可以合理设置涂层20的面积,使得更容易取出坩埚1内的蒸镀材料。优选地,涂层20的面积占本体10的内壁126面积的50%-90%,通过将涂层20的面积设置在此范围内,可以保证蒸镀时,坩埚内的蒸镀材料完全与涂层20接触,尽量不与无涂层20的内壁126接触,可有效降低蒸镀材料与坩埚1的内壁126的附着性,进一步使得蒸镀完后坩埚1内材料不易粘附在坩埚1底部、材料便于取出、利于回收,避免材料的浪费。In one embodiment, the area of the
在一实施方式中,坩埚1还包括开口30,在沿开口30到底部110的方向上,侧部120的内壁126和外壁128之间的距离逐渐增大。具体的,侧部120的内壁126和外壁128之间的距离可参见图2中的d标记,即d为内壁126和外壁128之间的距离,外围结构50围设形成开口30,该开口30与底部110相对设置;在沿开口30到底部110的方向即为图1中的X方向,侧部120的内壁126和外壁128之间的距离逐渐增大可有效增大坩埚1底部强度,避免坩埚1损坏,同时还可避免坩埚1受力产生的形变,延长坩埚1使用寿命。In one embodiment, the
可以理解的是,侧部120的内壁126和外壁128之间的距离逐渐增大是往侧部120内侧增大,在外表面,该坩埚1沿X方向上下分布是垂直的形状。It can be understood that the distance between the
在一实施方式中,第二部分124的内壁126和外壁128之间的距离d大于底部110的内壁126和外壁128之间的距离。经过发明人长期研究发现,由于现有技术中坩埚1容易出现破损的地方为侧部120的底部附近,因此本实施例通过设置第二部分124的内壁126和外壁128之间的距离d大于底部110的内壁126和外壁128之间的距离,能进一步增大坩埚1底部附件的强度,避免坩埚1损坏,同时还可避免坩埚1受力产生的形变,延长了坩埚1的使用寿命。In one embodiment, the distance d between the
在一实施方式中,第一部分122的内壁126和外壁128之间的距离d小于或等于底部110的内壁126和外壁128之间的距离。可以理解的是,在第一部分122中,可以有部分区域处的内壁126和外壁128之间的距离d是不变的,但总体上沿X的方向,内壁126和外壁128之间的距离d逐渐变大。通过此种设置方式可以在保证坩埚1效果的基础上有利于节约材料。In one embodiment, the distance d between the
在一实施方式中,与第二部分124的内壁126和外壁128之间的距离d为0.5mm至2mm,通过第二部分124的内壁126和外壁128之间的距离d设置在此范围内,能有效保证坩埚1的强度,延长该坩埚1的使用寿命。优选地,第二部分124的内壁126和外壁128之间的距离d为1mm至2mm,通过将第二部分124的内壁126和外壁128之间的距离d设置在此范围内,能进一步增强该坩埚1的强度,有效避免坩埚1损坏,同时还可避免坩埚1受力产生的形变,极大的延长了坩埚1使用寿命。In one embodiment, the distance d between the
在一实施方式中,第一部分122与第二部分124在沿X方向上的长度的比值范围为0.2-5,优选地,第一部分122与第二部分124在沿X方向上的长度的比值范围为0.5-3,能更合理的设置第一部分122和第二部分124的长度。具体可根据实际情况进行设置,在此不作严格的限定。In one embodiment, the ratio of the lengths of the
在一实施方式中,第一部分122设置有凸起,具体的,第一部分122的内壁126的上部分设置有凸起40;优选地,涂层20位于凸起40的下方。具体的,可参见图3,图3所示为本发明另一实施例提供的一种坩埚的结构示意图。第一部分122的内壁126的上部分靠近顶端的位置设置有凸起40后,涂层20制备时可以沿该凸起40向下制作,增加涂层20的粘附性,避免涂层20脱落,即该坩埚1的具体的制备工艺是首先制备本体10,然后是凸起40,最后形成涂层20。可以理解的是,该凸起40环绕内壁100是整圈设置的。In one embodiment, the
可以理解的是,在本实施例中,凸起40与涂层20相邻且连接设置,且凸起40的厚度和与凸起40相邻的涂层20的厚度相同,从而在往坩埚1中加蒸镀材料时,蒸镀材料能够沿凸起40和涂层20的内壁进入坩埚1中,此种设置方式可有效避免因凸起40的厚度小于涂层20的厚度时或不设置凸起40时,蒸镀材料进入坩埚1中时会落在涂层20上,从而到达不了坩埚1的内部,而避免蒸镀材料的浪费的问题。It can be understood that, in this embodiment, the
在一实施方式中,凸起40的高度为0.1mm-1.5mm。凸起40的高度可参见图3中的h标记,即h为0.1mm-1.5mm,优选地,凸起40的高度为0.1mm-1mm。由于凸起40的起始位置是该内壁126的顶端,通过设置凸起40的高度,可以限定凸起的结束位置,即可以限定涂层20的起始位置,有利于简化制备工艺。In one embodiment, the height of the
可以理解的是,在其他实施例中,该凸起40的起始位置可以不是该内壁126的顶端,可以是内壁126的上部的任意位置,只要凸起40位于涂层20的上方,能够起到保护涂层20,避免其脱落的作用即可,在此不作具体的限定,具体可根据实际情况进行设置。It can be understood that, in other embodiments, the initial position of the
在一实施方式中,在制备该坩埚1时,可以先制备该坩埚1的本体10,然后在本体10的内壁126处涂覆涂层20。还可以采用其他的生产步骤工序,具体可根据实际情况进行设置,在此不作具体的限定。In one embodiment, when preparing the
本发明另一实施例中提供了一种蒸镀装置,包括上述任一实施例中的坩埚。可以理解的是,该蒸镀装置用于蒸镀OLED器件的部分功能膜层。该蒸镀装置除了坩埚外,还可以包括加热源、固定结构等,其中,加热源用于加热坩埚,固定结构用于固定待蒸镀基板,具体可根据实际情况进行设置,在此不作具体的限定。Another embodiment of the present invention provides an evaporation device, including the crucible in any one of the above embodiments. It can be understood that the vapor deposition device is used for vapor deposition of part of the functional film layers of the OLED device. In addition to the crucible, the evaporation device may also include a heating source, a fixed structure, etc., wherein the heating source is used to heat the crucible, and the fixed structure is used to fix the substrate to be evaporated, which can be set according to actual conditions, and will not be described here. limited.
本实施例中的蒸镀装置的有益效果可见上述坩埚的描述,在此不赘述。The beneficial effects of the vapor deposition device in this embodiment can be seen in the description of the crucible above, and will not be repeated here.
以上所述实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例中的各个技术特征所有可能的组合都进行描述,然而,只要这些技术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。The technical features of the above-mentioned embodiments can be combined arbitrarily. To make the description concise, all possible combinations of the technical features in the above-mentioned embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, should be considered as within the scope of this specification.
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内,所作的任何修改、等同替换等,均应包含在本发明的保护范围之内。The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention within.
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