CN115110127B - Hydrophobic bright silver film for inhibiting microbial dirt adhesion growth and preparation method thereof - Google Patents
Hydrophobic bright silver film for inhibiting microbial dirt adhesion growth and preparation method thereof Download PDFInfo
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Abstract
本发明涉及抑制微生物污垢附着生长技术领域,具体提供一种用于抑制微生物污垢附着生长的疏水光亮银薄膜及其制备方法。该薄膜是通过电沉积银而得到的具有超疏水性和光亮的银薄膜,由于银具有杀灭细菌能力,微生物污垢的胞外分泌物总量减少,结构空洞化,蛋白质变性,使得污垢整体生长缓慢,达到抑制微生物在银薄膜表面的初期粘附和生长,形成抑垢作用。在光亮的银薄膜表面,由于微生物污垢在表面的粘附力下降,进而减少微生物污垢的附着。随着银薄膜表面的疏水性增强,进一步降低微生物的粘附力。基于这些协同效果,本发明所制备的超疏水光亮银薄膜可有效地抑制微生物污垢生长和在其表面的附着。
The present invention relates to the technical field of inhibiting the adhesion and growth of microbial dirt, and specifically provides a hydrophobic bright silver film for inhibiting the adhesion and growth of microbial dirt and a preparation method thereof. The film is a super-hydrophobic and bright silver film obtained by electroplating silver. Since silver has the ability to kill bacteria, the total amount of extracellular secretions of microbial dirt is reduced, the structure is hollowed out, and the protein is denatured, so that the overall growth of dirt is slow, thereby inhibiting the initial adhesion and growth of microorganisms on the surface of the silver film, forming a scale inhibition effect. On the surface of the bright silver film, the adhesion of microbial dirt on the surface decreases, thereby reducing the adhesion of microbial dirt. As the hydrophobicity of the surface of the silver film increases, the adhesion of microorganisms is further reduced. Based on these synergistic effects, the super-hydrophobic bright silver film prepared by the present invention can effectively inhibit the growth of microbial dirt and the adhesion on its surface.
Description
技术领域Technical Field
本发明属于抑制微生物污垢附着生长技术领域,用于防止如流量限制器、热交换器的微生物附着,导致流量限制器和热交换器失控,以及其它应用在海水和城市用水管网中的防止金属的微生物腐蚀。具体提供一种用于抑制微生物污垢附着生长的疏水光亮银薄膜及其制备方法。The present invention belongs to the technical field of inhibiting the attachment and growth of microbial dirt, and is used to prevent the attachment of microorganisms to flow restrictors and heat exchangers, which may cause the flow restrictors and heat exchangers to lose control, and to prevent the microbial corrosion of metals in other applications such as seawater and urban water pipe networks. Specifically, a hydrophobic bright silver film for inhibiting the attachment and growth of microbial dirt and a preparation method thereof are provided.
背景技术Background technique
自然水环境中存在着大量的微生物,在长时间的使用中,由于微生物的附着,会导致水循环管网中的污染和水管网上流量控制器的失控;在循环冷凝器上的附着,导致热交换器的失效。同样在金属器壁上的附着,也会引起城市管网中水环境质量的下降以及金属的腐蚀,特别是目前我国大力开发海洋资源的当下,抑制微生物污垢附着,防止海洋环境下的微生物金属腐蚀。There are a large number of microorganisms in the natural water environment. In long-term use, the attachment of microorganisms will cause pollution in the water circulation network and loss of control of the flow controller on the water network; attachment on the circulating condenser will cause the failure of the heat exchanger. Similarly, attachment on the metal wall will also cause the decline of water environment quality in the urban pipe network and metal corrosion. Especially at the moment when my country is vigorously developing marine resources, it is necessary to inhibit the attachment of microbial dirt and prevent microbial metal corrosion in the marine environment.
在水体中,微生物污垢的形成分为几个阶段,理清微生物污垢的形成,对抑制微生物污垢的附着生长至关重要。微生物污垢形成的早期阶段是微生物附着和生物膜形成阶段。水环境中的微生物附着过程包括细菌起始黏附、生物膜黏附期、生长期、成熟和剥落期等4个阶段。首先有机分子和少量细菌黏附在基材表面,在化学键合、静电作用、机械连锁或扩散作用下进行黏附,也会在剥离、平面剪切、非平面剪切等作用下从基材表面脱落,因此此时为可逆附着阶段,此时微生物利用自身分泌的聚合物在表面牢固黏附,进入不可逆附着阶段,不可逆附着后,生物膜继续生长,经过几天或数周时间到达成熟和剥落期,微生物在材料表面的附着和固定是一个十分复杂的动态过程,受很多因素的影响。研究表明微生物的附着量与材料的本质(材料对微生物的毒性)有关;并随着材料表面粗糙度的增加,微生物污垢的附着量增加;同时与材料表面的疏水性呈正相关。In water bodies, the formation of microbial fouling is divided into several stages. It is crucial to clarify the formation of microbial fouling to inhibit the attachment and growth of microbial fouling. The early stage of microbial fouling formation is the stage of microbial attachment and biofilm formation. The microbial attachment process in water environments includes four stages: bacterial initial adhesion, biofilm adhesion period, growth period, maturity and peeling period. First, organic molecules and a small amount of bacteria adhere to the surface of the substrate, and adhere under chemical bonding, electrostatic action, mechanical linkage or diffusion. They will also fall off from the surface of the substrate under the action of peeling, plane shearing, non-plane shearing, etc. Therefore, this is the reversible attachment stage. At this time, microorganisms use the polymers they secrete to firmly adhere to the surface and enter the irreversible attachment stage. After irreversible attachment, the biofilm continues to grow and reaches the maturity and peeling period after several days or weeks. The attachment and fixation of microorganisms on the surface of the material is a very complex dynamic process, which is affected by many factors. Studies have shown that the amount of microbial attachment is related to the nature of the material (the toxicity of the material to microorganisms); and as the surface roughness of the material increases, the amount of microbial fouling increases; at the same time, it is positively correlated with the hydrophobicity of the material surface.
到目前为止很多研究采用银或氧化亚铜作为抑制微生物附着生长的材料,如银薄膜或纳米氧化亚铜,其原理是利用其杀灭细菌能力,微生物污垢的胞外分泌物总量减少,结构空洞化,蛋白质变性,造成污垢整体生长缓慢。达到抑制微生物在表面的初期粘附和生长,形成抑垢作用。也有通过将金属表面进行硅烷偶联剂修饰后,使其表面形成疏水性结构,达到抑制微生物污垢附着生长的目的。就目前所使用的效果来看,无论哪种方法,其抑制微生物附着生长的效果均不是十分理想。So far, many studies have used silver or cuprous oxide as materials to inhibit the attachment and growth of microorganisms, such as silver film or nano cuprous oxide. The principle is to use its ability to kill bacteria, reduce the total amount of extracellular secretions of microbial dirt, hollow out the structure, and denature the protein, causing the overall growth of dirt to slow down. This can inhibit the initial adhesion and growth of microorganisms on the surface, forming a scale inhibition effect. There are also methods that modify the metal surface with silane coupling agents to form a hydrophobic structure on the surface to achieve the purpose of inhibiting the attachment and growth of microbial dirt. Judging from the effects currently used, no matter which method is used, the effect of inhibiting the attachment and growth of microorganisms is not very ideal.
发明内容Summary of the invention
为了解决水体系中由于微生物污垢的附着,所引起的如流量控制器的堵塞、热交换器隔热以及微生物导致的金属腐蚀等问题,本发明将银薄膜具有杀菌的效果与微生物难于附着的光亮表面银薄膜相结合,提供一种用于抑制微生物污垢附着生长的疏水光亮银薄膜及其制备方法。In order to solve the problems such as blockage of flow controller, insulation of heat exchanger and metal corrosion caused by microorganisms caused by the attachment of microbial dirt in water system, the present invention combines the bactericidal effect of silver film with the bright surface silver film on which microorganisms are difficult to attach, and provides a hydrophobic bright silver film for inhibiting the attachment and growth of microbial dirt and a preparation method thereof.
为了评价超疏水光亮银薄膜抑制微生物污染物附着生长的能力,我们选用304不锈钢作为基材(当然除了304不锈钢基材外,还可以是其它表面为金属的基材),在其表面进行电沉积超疏水光亮银薄膜。为了获得良好附着强度的银薄膜,在进行电沉积银薄膜之前,对基材进行了电镀铜的预处理。超疏水光亮银薄膜的制备方法是采用电沉积的方法。银电沉积的基础溶液构成为,主盐使用硝酸银,络合剂为丁二酰亚胺,导电盐为焦磷酸钾。硝酸银的浓度范围为10~100g/L,浓度低于10g/L时由于浓度过低,导致电沉积银薄膜的质量下降,浓度大于100g/L时,由于浓度过高,所获得的银薄膜会变得疏松,硝酸银的最佳浓度范围是30~60g/L。络合剂丁二酰亚胺的最佳浓度范围是50~100g/L,导电盐焦磷酸钾的浓度范围为50~120g/L。毋容置疑,对于导电盐和络合剂而言,也可以选择电沉积领域其它常用试剂,但是对于本发明的光亮剂而言,与焦磷酸钾和丁二酰亚胺是最佳组合。In order to evaluate the ability of super-hydrophobic bright silver film to inhibit the attachment and growth of microbial pollutants, we selected 304 stainless steel as the substrate (of course, in addition to 304 stainless steel substrate, it can also be other substrates with metal surfaces), and electro-deposited super-hydrophobic bright silver film on its surface. In order to obtain a silver film with good adhesion strength, the substrate was pre-treated with electroplating copper before the electro-deposited silver film. The preparation method of super-hydrophobic bright silver film is to adopt the method of electrodeposition. The basic solution of silver electrodeposition is composed of silver nitrate as the main salt, succinimide as the complexing agent, and potassium pyrophosphate as the conductive salt. The concentration range of silver nitrate is 10-100g/L. When the concentration is lower than 10g/L, the quality of the electro-deposited silver film decreases due to the low concentration. When the concentration is greater than 100g/L, the obtained silver film becomes loose due to the high concentration. The optimal concentration range of silver nitrate is 30-60g/L. The optimal concentration range of the complexing agent succinimide is 50-100 g/L, and the concentration range of the conductive salt potassium pyrophosphate is 50-120 g/L. Undoubtedly, for the conductive salt and the complexing agent, other commonly used reagents in the field of electrodeposition can also be selected, but for the brightener of the present invention, potassium pyrophosphate and succinimide are the best combination.
为了获得稳定的银电沉积溶液,控制银电沉积液的pH在8~11之间,例如可以使用KOH或NaOH调整银电沉积溶液的pH。In order to obtain a stable silver electrodeposition solution, the pH of the silver electrodeposition solution is controlled between 8 and 11. For example, KOH or NaOH may be used to adjust the pH of the silver electrodeposition solution.
该银电沉积溶液的操作温度范围较为宽泛,可设定在10~50℃之间,电流密度范围为0.1~2A/dm2。The operating temperature range of the silver electrodeposition solution is relatively wide and can be set between 10 and 50° C., and the current density range is 0.1 to 2 A/dm 2 .
为了获得光亮的银薄膜,银电沉积溶液中添加了5-甲基乙内酰脲或其衍生物的光亮剂,光亮剂的浓度范围为5~30g/L,最佳浓度范围为10~20g/L。银电沉积光亮剂不仅可以使用5-甲基乙内酰脲,它的部分衍生物也具有良好的光亮剂效果,其衍生物的结构式为其中R1=H或CH3;R2=H、CH3、Cl或Br;R3=H、CH3、Cl或Br。In order to obtain a bright silver film, a brightener of 5-methylhydantoin or its derivatives is added to the silver electrodeposition solution. The concentration of the brightener ranges from 5 to 30 g/L, and the optimal concentration range is 10 to 20 g/L. Not only 5-methylhydantoin can be used as a brightener for silver electrodeposition, but some of its derivatives also have good brightener effects. The structural formula of its derivatives is wherein R 1 =H or CH 3 ; R 2 =H, CH 3 , Cl or Br; R 3 =H, CH 3 , Cl or Br.
为了更加有利于抑制微生物污染物的附着生长,将大约粒径为20-800nm的银颗粒加入到上述银电沉积溶液中,可获得超疏水性且光亮的银薄膜。毋容置疑,在一定范围内,银颗粒的粒径越小越好,但是颗粒非常小的银颗粒所带来的是成本的急剧增加,当银颗粒较大时,辅以超声波振动,足以将银颗粒均匀的复合电沉积到银薄膜中。本发明将银薄膜具有杀菌的效果与微生物难于附着的光亮且疏水的表面银薄膜相结合,获得了兼具必要光亮特点和超疏水效果的银薄膜,从而能够更好的抑制微生物污垢的附着生长。In order to be more conducive to inhibiting the attachment and growth of microbial pollutants, silver particles with a particle size of about 20-800nm are added to the above-mentioned silver electrodeposition solution to obtain a super-hydrophobic and bright silver film. Undoubtedly, within a certain range, the smaller the particle size of the silver particles, the better, but the silver particles with very small particles bring about a sharp increase in cost. When the silver particles are larger, ultrasonic vibration is used to uniformly composite-electrodeposit the silver particles into the silver film. The present invention combines the bactericidal effect of the silver film with the bright and hydrophobic surface silver film to which microorganisms are difficult to attach, and obtains a silver film with both the necessary bright characteristics and the super-hydrophobic effect, thereby being able to better inhibit the attachment and growth of microbial dirt.
与现有技术相比,本发明取得了如下有益效果:本发明将银薄膜具有杀菌的效果与微生物难于附着的光亮表面银薄膜相结合,提供一种用于抑制微生物污垢附着生长的超疏水光亮银薄膜,该薄膜是通过电沉积银而得到的具有疏水性和光亮的银薄膜,由于银具有杀灭细菌能力,微生物污垢的胞外分泌物总量减少,结构空洞化,蛋白质变性,使得污垢整体生长缓慢,达到抑制微生物在银薄膜表面的初期粘附和生长,形成抑垢作用。在光亮的银薄膜表面,由于微生物污垢在表面的粘附力下降,进而减少微生物污垢的附着。随着银薄膜表面的疏水性增强,进一步降低微生物的粘附力。基于这些协同效果,本发明所制备的疏水光亮银薄膜可有效地抑制微生物污垢生长和在其表面的附着,108h吸附周期时微生物附着生长的抑制效果比不添加光亮剂可提升31%左右。Compared with the prior art, the present invention has achieved the following beneficial effects: the present invention combines the bactericidal effect of the silver film with the bright surface silver film on which microorganisms are difficult to adhere, and provides a super hydrophobic bright silver film for inhibiting the adhesion and growth of microbial dirt. The film is a hydrophobic and bright silver film obtained by electroplating silver. Since silver has the ability to kill bacteria, the total amount of extracellular secretions of microbial dirt is reduced, the structure is hollowed out, and the protein is denatured, so that the overall growth of dirt is slow, thereby inhibiting the initial adhesion and growth of microorganisms on the surface of the silver film, forming a scale inhibition effect. On the surface of the bright silver film, the adhesion of microbial dirt on the surface is reduced, thereby reducing the adhesion of microbial dirt. As the hydrophobicity of the silver film surface increases, the adhesion of microorganisms is further reduced. Based on these synergistic effects, the hydrophobic bright silver film prepared by the present invention can effectively inhibit the growth of microbial dirt and the attachment on its surface. During the 108h adsorption cycle, the inhibition effect of microbial attachment and growth can be increased by about 31% compared with not adding a brightener.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1为电沉积银薄膜的SEM图,其中A为无5-甲基乙内酰脲;B为15g/L 5-甲基乙内酰脲。FIG1 is a SEM image of the electrodeposited silver film, wherein A is without 5-methylhydantoin; and B is 15 g/L 5-methylhydantoin.
图2为加入500nm银颗粒后的SEM图。Figure 2 is a SEM image after adding 500nm silver particles.
图3不同条件下电沉积银薄膜的接触角。Fig. 3 Contact angle of electrodeposited silver films under different conditions.
具体实施方式Detailed ways
下面结合实施例对本发明做进一步说明。实施例给出了详细的实施方式和具体的操作过程,但本发明的保护范围不限于下述的实施例。The present invention is further described below in conjunction with the following examples. The examples provide detailed implementation methods and specific operating processes, but the protection scope of the present invention is not limited to the following examples.
为了有效说明本发明的效果,首先准备好1.5x4cm(厚度为0.5mm)的304不锈钢片,经碱洗除油后,在其表面进行了预镀铜处理,然后将其置于银基础镀液(硝酸银、丁二酰亚胺、焦磷酸钾,用KOH调整溶液的pH)中进行电沉积,电沉积的条件是在30℃。若需要光亮银薄膜,可向上述溶液中加入5-甲基乙内酰脲或其衍生物均可以获得与5-甲基乙内酰脲相当的性能,以下具体实施例不再一一证明。进一步若需要超疏水性光亮银薄膜时,可向上述银溶液中加入纳米银颗粒。若在未添加光亮剂的情况下添加纳米银颗粒,则获得的基材表面会呈现粗糙和疏水性能不佳的缺陷,不能很好的抑制微生物附着、生长。In order to effectively illustrate the effect of the present invention, a 304 stainless steel sheet of 1.5x4cm (thickness 0.5mm) was first prepared, and after alkali washing and degreasing, a copper plating treatment was performed on the surface, and then the sheet was placed in a silver-based plating solution (silver nitrate, succinimide, potassium pyrophosphate, and the pH of the solution was adjusted with KOH) for electrodeposition. The electrodeposition condition was 30°C. If a bright silver film is required, 5-methylhydantoin or its derivatives can be added to the above solution. All can obtain the performance equivalent to 5-methylhydantoin, and the following specific examples will not be proved one by one. Further, if a super-hydrophobic bright silver film is needed, nano silver particles can be added to the above silver solution. If nano silver particles are added without adding a brightener, the surface of the obtained substrate will show the defects of roughness and poor hydrophobicity, and microbial attachment and growth cannot be well inhibited.
为了评价超疏水光亮银薄膜抑制微生物污染物附着生长的能力,将培养好的铁细菌以1:100比例配置成稀释的菌悬液,置于不同的烧杯中,将试片分别垂直悬挂于含有培养好的铁细菌溶液的烧杯中,将上述烧杯置于30℃模拟加热环境,微生物污垢实验周期为108h。使用电子分析天平称量实验前和实验后试样质量,以此来衡量在试样片上附着微生物污染物的多少。为了评价超疏水光亮银薄膜抑制微生物污染物附着生长的能力,培养了实验用铁细菌。首先将配制好的培养基在高压蒸汽灭菌锅中,在0.1Mp,120℃的条件下灭菌20min。待培养基冷却在净化工作台中,紫外灯灭菌15min。用接种枪取菌种10ml,接种量为1%,接种至1 000ml培养基,在恒温培养箱中30℃恒温培养72h。In order to evaluate the ability of super-hydrophobic bright silver film to inhibit the attachment and growth of microbial pollutants, the cultured iron bacteria were prepared into a diluted bacterial suspension at a ratio of 1:100 and placed in different beakers. The test pieces were vertically suspended in beakers containing the cultured iron bacteria solution, and the beakers were placed in a 30°C simulated heating environment. The microbial fouling experiment cycle was 108h. The mass of the sample before and after the experiment was weighed using an electronic analytical balance to measure the amount of microbial pollutants attached to the sample. In order to evaluate the ability of super-hydrophobic bright silver film to inhibit the attachment and growth of microbial pollutants, experimental iron bacteria were cultured. First, the prepared culture medium was sterilized in a high-pressure steam autoclave at 0.1Mp and 120°C for 20min. After the culture medium was cooled in a clean bench, it was sterilized with a UV lamp for 15min. Take 10ml of the strain with an inoculation gun, the inoculation amount is 1%, inoculate to 1 000ml of the culture medium, and culture at 30°C in a constant temperature incubator for 72h.
以下为具体实施例,本发明的权利要求,并不限于以下实施例中所列举反应条件及原料浓度。The following are specific examples. The claims of the present invention are not limited to the reaction conditions and raw material concentrations listed in the following examples.
实施例1Example 1
将除油和预镀铜处理后的1.5x4cm(厚度为0.5mm)的304不锈钢片,在硝酸银10g/L、丁二酰亚胺50g/L和焦磷酸钾60g/L的电沉积溶液中,用KOH调节溶液的pH至8,在25℃的条件下,施加电流密度0.3A/dm2,电沉积时间30min,获得了电沉积银薄膜试片。在30℃条件下,将该试片垂直悬挂于含有培养好的铁细菌溶液的烧杯中,实验周期为108h。使用电子分析天平称量实验前和实验后试片质量,其它实验条件和结果如表1中例1所示。A 304 stainless steel sheet of 1.5x4cm (0.5mm thick) after degreasing and pre-copper plating was placed in an electroplating solution of 10g/L silver nitrate, 50g/L succinimide and 60g/L potassium pyrophosphate. The pH of the solution was adjusted to 8 with KOH. At 25°C, a current density of 0.3A/dm 2 was applied for an electroplating time of 30min to obtain an electroplated silver film test piece. At 30°C, the test piece was vertically hung in a beaker containing a cultured iron bacteria solution. The experimental period was 108h. The mass of the test piece before and after the experiment was weighed using an electronic analytical balance. Other experimental conditions and results are shown in Example 1 in Table 1.
实施例2Example 2
将除油和预镀铜处理后的1.5x4cm(厚度为0.5mm)的304不锈钢片,在硝酸银45g/L、丁二酰亚胺50g/L、焦磷酸钾60g/L和5-甲基乙内酰脲15g/L的电沉积溶液中,用KOH调节溶液的pH至10,在25℃的条件下,施加电流密度0.3A/dm2,电沉积时间30min,获得了电沉积银薄膜试片。在30℃条件下,将该试片垂直悬挂于含有培养好的铁细菌溶液的烧杯中,实验周期为108h。使用电子分析天平称量实验前和实验后试片质量,其它实验条件和结果如表1中例2所示。A 1.5x4cm (0.5mm thick) 304 stainless steel sheet after degreasing and pre-copper plating was placed in an electroplating solution of 45g/L silver nitrate, 50g/L succinimide, 60g/L potassium pyrophosphate and 15g/L 5-methylhydantoin. The pH of the solution was adjusted to 10 with KOH. At 25°C, a current density of 0.3A/dm 2 was applied for an electroplating time of 30min to obtain an electroplated silver film test piece. At 30°C, the test piece was vertically hung in a beaker containing a cultured iron bacteria solution. The experimental period was 108h. The mass of the test piece before and after the experiment was weighed using an electronic analytical balance. Other experimental conditions and results are shown in Example 2 in Table 1.
实施例3Example 3
将除油和预镀铜处理后的1.5x4cm(厚度为0.5mm)的304不锈钢片,在硝酸银45g/L、丁二酰亚胺50g/L、焦磷酸钾60g/L、5-甲基乙内酰脲15g/L和500nm的银粉3g/L的电沉积溶液中,用KOH调节溶液的pH至10,在超声波的辐照、25℃的条件下,施加电流密度0.3A/dm2,电沉积时间30min,获得了电沉积银薄膜试片。在30℃条件下,将该试片垂直悬挂于含有培养好的铁细菌溶液的烧杯中,实验周期为108h。使用电子分析天平称量实验前和实验后试片质量,其它实验条件和结果如表1中例3所示,可以看出试片上几乎没有附着的铁细菌微生物污染物。A 1.5x4cm (0.5mm thick) 304 stainless steel sheet after degreasing and pre-copper plating was placed in an electroplating solution of 45g/L silver nitrate, 50g/L succinimide, 60g/L potassium pyrophosphate, 15g/L 5-methylhydantoin and 3g/L 500nm silver powder. The pH of the solution was adjusted to 10 with KOH. Under ultrasonic irradiation and 25°C, a current density of 0.3A/dm 2 was applied for an electroplating time of 30min to obtain an electroplated silver film test piece. At 30°C, the test piece was vertically hung in a beaker containing a cultured iron bacteria solution. The experimental period was 108h. The mass of the test piece before and after the experiment was weighed using an electronic analytical balance. Other experimental conditions and results are shown in Example 3 in Table 1. It can be seen that there is almost no iron bacteria microbial contaminant attached to the test piece.
实施例4Example 4
将除油和预镀铜处理后的1.5x4cm(厚度为0.5mm)的304不锈钢片,在硝酸银60g/L、丁二酰亚胺70g/L、焦磷酸钾100g/L、5,5-二甲基乙内酰脲15g/L和500nm的银粉3g/L的电沉积溶液中,用KOH调节溶液的pH至10,在超声波的辐照、25℃的条件下,施加电流密度0.3A/dm2,电沉积时间30min,获得了电沉积银薄膜试片。在30℃条件下,将该试片垂直悬挂于含有培养好的铁细菌溶液的烧杯中,实验周期为108h。使用电子分析天平称量实验前和实验后试片质量,其它实验条件和结果如表1中例4所示,可以看出试片上几乎没有附着的铁细菌微生物污染物。A 1.5x4cm (0.5mm thick) 304 stainless steel sheet after degreasing and pre-copper plating was placed in an electroplating solution of 60g/L silver nitrate, 70g/L succinimide, 100g/L potassium pyrophosphate, 15g/L 5,5-dimethylhydantoin and 3g/L 500nm silver powder. The pH of the solution was adjusted to 10 with KOH. Under ultrasonic irradiation and 25°C, a current density of 0.3A/dm 2 was applied for an electroplating time of 30min to obtain an electroplated silver film test piece. At 30°C, the test piece was vertically hung in a beaker containing a cultured iron bacteria solution, and the experimental period was 108h. The mass of the test piece before and after the experiment was weighed using an electronic analytical balance. Other experimental conditions and results are shown in Example 4 in Table 1. It can be seen that there is almost no iron bacteria microbial contaminant attached to the test piece.
实施例5Example 5
将除油和预镀铜处理后的1.5x4cm(厚度为0.5mm)的304不锈钢片,在硝酸银100g/L、丁二酰亚胺100g/L、焦磷酸钾120g/L、3-溴-1-氯-5,5-二甲基乙内酰脲5g/L和300nm的银粉2g/L的电沉积溶液中,用KOH调节溶液的pH至10,在超声波的辐照、25℃的条件下,施加电流密度0.6A/dm2,电沉积时间15min,获得了电沉积银薄膜试片。在30℃条件下,将该试片垂直悬挂于含有培养好的铁细菌溶液的烧杯中,实验周期为108h。使用电子分析天平称量实验前和实验后试片质量,其它实验条件和结果如表1中例5所示,可以看出试片上几乎没有附着的铁细菌微生物污染物。A 304 stainless steel sheet of 1.5x4cm (0.5mm thick) after degreasing and pre-copper plating was placed in an electroplating solution of 100g/L silver nitrate, 100g/L succinimide, 120g/L potassium pyrophosphate, 5g/L 3-bromo-1-chloro-5,5-dimethylhydantoin and 2g/L 300nm silver powder. The pH of the solution was adjusted to 10 with KOH. Under ultrasonic irradiation and 25°C, a current density of 0.6A/dm 2 was applied for an electroplating time of 15min to obtain an electroplated silver film test piece. At 30°C, the test piece was vertically hung in a beaker containing a cultured iron bacteria solution, and the experimental period was 108h. The mass of the test piece before and after the experiment was weighed using an electronic analytical balance. Other experimental conditions and results are shown in Example 5 in Table 1. It can be seen that there is almost no iron bacteria microbial contaminant attached to the test piece.
实施例6Example 6
将除油和预镀铜处理后的1.5x4cm(厚度为0.5mm)的304不锈钢片,在硝酸银45g/L、丁二酰亚胺50g/L、焦磷酸钾60g/L、1,3-二氯-5-甲基乙内酰脲20g/L和800nm的银粉2g/L的电沉积溶液中,用KOH调节溶液的pH至10,在超声波的辐照、25℃的条件下,施加电流密度1A/dm2,电沉积时间10min,获得了电沉积银薄膜试片。在30℃条件下,将该试片垂直悬挂于含有培养好的铁细菌溶液的烧杯中,实验周期为108h。使用电子分析天平称量实验前和实验后试片质量,其它实验条件和结果如表1中例6所示,可以看出试片上几乎没有附着的铁细菌微生物污染物。A 1.5x4cm (0.5mm thick) 304 stainless steel sheet after degreasing and pre-copper plating was placed in an electroplating solution of 45g/L silver nitrate, 50g/L succinimide, 60g/L potassium pyrophosphate, 20g/L 1,3-dichloro-5-methylhydantoin and 2g/L 800nm silver powder. The pH of the solution was adjusted to 10 with KOH. Under ultrasonic irradiation and 25°C, a current density of 1A/dm 2 was applied for an electroplating time of 10min to obtain an electroplated silver film test piece. At 30°C, the test piece was vertically hung in a beaker containing a cultured iron bacteria solution, and the experimental period was 108h. The mass of the test piece before and after the experiment was weighed using an electronic analytical balance. Other experimental conditions and results are shown in Example 6 in Table 1. It can be seen that there is almost no iron bacteria microbial contaminant attached to the test piece.
表1不同电沉积实施例条件下抑制铁细菌吸附的试片质量变化Table 1 Changes in the mass of test pieces inhibiting iron bacteria adsorption under different electrodeposition examples
比较例1Comparative Example 1
将除油和预镀铜处理后的1.5x4cm(厚度为0.5mm)的304不锈钢片,称重的质量为2.0683g,在30℃条件下,将该试片垂直悬挂于含有培养好的铁细菌溶液的烧杯中,实验周期为108h后,称重为2.1964g。可以看出未经电沉积银薄膜的304不锈钢试片表面附着了大量的铁细菌微生物。The 1.5x4cm (0.5mm thick) 304 stainless steel sheet after degreasing and pre-copper plating weighed 2.0683g. The sheet was vertically hung in a beaker containing a cultured iron bacteria solution at 30°C. After the experimental period of 108h, the weight was 2.1964g. It can be seen that a large number of iron bacteria microorganisms are attached to the surface of the 304 stainless steel sheet without electrodeposited silver film.
比较例2Comparative Example 2
将除油和预镀铜处理后的1.5x4cm(厚度为0.5mm)的304不锈钢片,在硝酸银45g/L、柠檬酸钠50g/L、硝酸钠60g/L和5-甲基乙内酰脲15g/L的电沉积溶液中,用KOH调节溶液的pH至10,在25℃的条件下,施加电流密度0.3A/dm2,电沉积时间30min,获得了电沉积银薄膜试片。获得的试片不光亮,称重的质量为2.9123g。在30℃条件下,将该试片垂直悬挂于含有培养好的铁细菌溶液的烧杯中,实验周期为108h后,称重质量为2.9754。微生物污染物吸附前后的质量变化为0.0631g。A 1.5x4cm (0.5mm thick) 304 stainless steel sheet after degreasing and pre-copper plating was placed in an electroplating solution of 45g/L silver nitrate, 50g/L sodium citrate, 60g/L sodium nitrate and 15g/L 5-methylhydantoin. The pH of the solution was adjusted to 10 with KOH. At 25°C, a current density of 0.3A/dm 2 was applied for an electroplating time of 30min to obtain an electroplated silver film test piece. The obtained test piece was not bright and weighed a mass of 2.9123g. At 30°C, the test piece was vertically hung in a beaker containing a cultured iron bacteria solution. After an experimental period of 108h, the weighed mass was 2.9754. The mass change before and after the adsorption of microbial pollutants was 0.0631g.
由比较例1的结果可知,由于没有电沉积银的薄膜,304不锈钢上出现了大量的铁细菌微生物污染物。从表1中的实施例1的结果可知,当304不锈钢上有银薄膜存在时,铁细菌微生物污染物得到充分抑制,进而当银表面成为疏水性且光亮的薄膜时,在304不锈钢基材的银薄膜表面几乎看不到铁细菌微生物污染物的存在,如表例3所示,其质量变化仅为0.0038g。从比较例2可知,虽然银对微生物污垢的生长具有抑制作用,但是光亮的银层可进一步抑制微生物的附着,进而与实施例的结果相比较,光亮且疏水的银层对微生物污垢附着生长起到了显著的抑制作用。由此结果可知,通过构筑超疏水光亮银薄膜可以有效地抑制微生物污染物在基材表面的附着生长。As can be seen from the results of Comparative Example 1, due to the absence of a film of electrodeposited silver, a large amount of iron bacteria microbial contaminants have occurred on 304 stainless steel. As can be seen from the results of Example 1 in Table 1, when there is a silver film on 304 stainless steel, iron bacteria microbial contaminants are fully suppressed, and then when the silver surface becomes a hydrophobic and bright film, the presence of iron bacteria microbial contaminants is hardly seen on the silver film surface of 304 stainless steel substrates, as shown in Table 3, and its mass change is only 0.0038g. As can be seen from Comparative Example 2, although silver has an inhibitory effect on the growth of microbial dirt, the bright silver layer can further inhibit the attachment of microorganisms, and then compared with the results of the embodiment, the bright and hydrophobic silver layer has played a significant inhibitory effect on the attachment and growth of microbial dirt. As can be seen from this result, the attachment and growth of microbial contaminants on the substrate surface can be effectively suppressed by constructing a super-hydrophobic bright silver film.
图1是在硝酸银45g/L、丁二酰亚胺50g/L、焦磷酸钾60g/L的电沉积溶液中,用KOH调节溶液的pH至10,在25℃的条件下,施加电流密度0.3A/dm2,电沉积时间30min所获得的银薄膜电子显微镜图像。图1中A是无添加光亮剂5-甲基乙内酰脲,图1中B添加了15g/L 5-甲基乙内酰脲。从图1的电子显微镜图片可以看出,在银电沉积溶液中添加了5-甲基乙内酰脲后,所获得的电沉积薄膜非常平整,同时外观也非常光亮。Figure 1 is an electron microscope image of a silver film obtained in an electroplating solution of 45 g/L silver nitrate, 50 g/L succinimide, and 60 g/L potassium pyrophosphate, with the pH of the solution adjusted to 10 with KOH, at 25°C, with a current density of 0.3 A/dm 2 and an electroplating time of 30 min. A in Figure 1 is without the addition of brightener 5-methylhydantoin, and B in Figure 1 is with the addition of 15 g/L 5-methylhydantoin. It can be seen from the electron microscope image of Figure 1 that after adding 5-methylhydantoin to the silver electroplating solution, the obtained electroplated film is very flat and has a very bright appearance.
图2是在图1中B对应的电沉积溶液中加入3g/L的500nm的银颗粒所获得的电子显微镜图片。FIG. 2 is an electron microscope image obtained by adding 3 g/L of 500 nm silver particles to the electrodeposition solution corresponding to B in FIG. 1 .
图3显示的是不同条件下电沉积银薄膜的接触角的大小,图3中的A是不含光亮剂5-甲基乙内酰脲的银薄膜所测定的接触角,其角度为110.2°,当加入15g/L 5-甲基乙内酰脲时,所获得银薄膜变得光亮,且接触角增大至129.6°,银薄膜表面的疏水性增强。当继续加入0.5g/L的500nm银颗粒时,所获得的银薄膜虽然较未加入前变得粗糙,但是银薄膜表面依然光亮,其接触角继续增大到141.4°,继续提高银颗粒的浓度接触角持续增大,银颗粒浓度在3g/L时,所获得的银薄膜接触角达到最大值152.2°,继续增加银纳米颗粒,所获得的银薄膜接触角将减小。Figure 3 shows the contact angle of the electrodeposited silver film under different conditions. A in Figure 3 is the contact angle measured by the silver film without the brightener 5-methylhydantoin, which is 110.2°. When 15g/L 5-methylhydantoin is added, the obtained silver film becomes bright, and the contact angle increases to 129.6°, and the hydrophobicity of the surface of the silver film is enhanced. When 0.5g/L of 500nm silver particles are added, the obtained silver film becomes rougher than before, but the surface of the silver film is still bright, and its contact angle continues to increase to 141.4°. The contact angle continues to increase with the increase of the concentration of silver particles. When the concentration of silver particles is 3g/L, the contact angle of the obtained silver film reaches a maximum value of 152.2°. If silver nanoparticles are added, the contact angle of the obtained silver film will decrease.
以上述依据本发明的理想实施例为启示,通过上述的说明内容,相关工作人员完全可以在不偏离本项发明技术思想的范围内,进行多样的变更以及修改。本项发明的技术性范围并不局限于说明书上的内容,必须要根据权利要求范围来确定其技术性范围。Based on the above ideal embodiments of the present invention, the relevant staff can make various changes and modifications without departing from the technical concept of the present invention through the above description. The technical scope of the present invention is not limited to the content in the specification, and its technical scope must be determined according to the scope of the claims.
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KR20040095581A (en) * | 2003-05-09 | 2004-11-15 | 주식회사 큐시스 | Electrodeposition coating composition containing nano silver particles and using method thereof |
CN103397355A (en) * | 2013-07-19 | 2013-11-20 | 哈尔滨工业大学 | Cyanide-free electrosilvering solution applicable to high-speed electroplating and electroplating process |
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CN107313084B (en) * | 2017-08-10 | 2019-03-01 | 佛山市南博旺环保科技有限公司 | A kind of alkaline non-cyanide plate silver plating solution and silver-coating method |
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CN103397355A (en) * | 2013-07-19 | 2013-11-20 | 哈尔滨工业大学 | Cyanide-free electrosilvering solution applicable to high-speed electroplating and electroplating process |
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