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CN115084334A - An LED chip structure and its manufacturing method, and electronic equipment - Google Patents

An LED chip structure and its manufacturing method, and electronic equipment Download PDF

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CN115084334A
CN115084334A CN202210702425.1A CN202210702425A CN115084334A CN 115084334 A CN115084334 A CN 115084334A CN 202210702425 A CN202210702425 A CN 202210702425A CN 115084334 A CN115084334 A CN 115084334A
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layer
led chip
back metal
chip structure
metal plate
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阚钦
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Anhui Geen Semiconductor Co ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/83Electrodes
    • H10H20/832Electrodes characterised by their material
    • H10H20/835Reflective materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/83Electrodes
    • H10H20/831Electrodes characterised by their shape
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/032Manufacture or treatment of electrodes

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Abstract

本发明提出了一种LED芯片结构及其制作方法、电子设备,在常规LED芯片结构的基础上,将背面金属板的边缘向中心收缩,即削除背面金属板边缘包含有不规则晶相的部分材料。本发明将常规的初始LED芯片结构中不规则的晶相进行处理,有效改善LED芯片结构的表面平整度,提高LED芯片结构与封装体之间的贴合度,减少固晶后的空洞率,易于封装过程中有机污染物的挥发,改善LED芯片结构的封装效果。

Figure 202210702425

The invention proposes an LED chip structure, a manufacturing method thereof, and an electronic device. On the basis of the conventional LED chip structure, the edge of the back metal plate is shrunk toward the center, that is, the part of the back metal plate containing the irregular crystal phase is removed. Material. The invention processes the irregular crystal phase in the conventional initial LED chip structure, effectively improves the surface flatness of the LED chip structure, improves the fit between the LED chip structure and the package body, and reduces the void rate after solid crystals. It is easy to volatilize organic pollutants in the packaging process and improve the packaging effect of the LED chip structure.

Figure 202210702425

Description

一种LED芯片结构及其制作方法、电子设备An LED chip structure and its manufacturing method, and electronic equipment

技术领域technical field

本申请涉及LED芯片制作领域,尤其涉及一种LED芯片结构及其制作方法、电子设备。The present application relates to the field of LED chip fabrication, and in particular, to an LED chip structure, a fabrication method thereof, and an electronic device.

背景技术Background technique

在LED芯片的制作过程中,芯片并非一颗颗独立,而是众多LED芯片整体连接在一起。直到大部分制作工序完成后,才进行激光切割作业,获得一颗颗独立的LED芯片,如图1所示。激光通过聚焦后照射到材料上,使得被切割材料表面温度急速上升。激光加热材料开始熔化,形成液相并出现部分汽化,形成高压蒸汽,并以极高的速度喷射。与此同时,高浓度气体使液相加工物运动至熔池边缘,在熔池中心形成凹陷,烧蚀效果加深。由于激光切割作业过程是高温、高热、高速过程,液相冷却后容易产生不规则的回熔现象,在芯片边缘易形成不规则的晶相,如图2所示。不规则晶相的存在会导致LED芯片在封装过程中与封装体无法充分贴合,影响封装效果。In the production process of LED chips, the chips are not independent one by one, but many LED chips are connected together as a whole. It is not until most of the manufacturing processes are completed that the laser cutting operation is performed to obtain individual LED chips, as shown in Figure 1. The laser is focused and irradiated onto the material, causing the surface temperature of the material to be cut to rise rapidly. The laser-heated material begins to melt, forms a liquid phase and partially vaporizes, forming a high-pressure vapor, which is ejected at extremely high speeds. At the same time, the high-concentration gas moves the liquid-phase processing material to the edge of the molten pool, forming a depression in the center of the molten pool, and the ablation effect is deepened. Since the laser cutting process is a high-temperature, high-heat, and high-speed process, irregular melting back is easy to occur after liquid phase cooling, and irregular crystal phases are easily formed at the edge of the chip, as shown in Figure 2. The existence of irregular crystal phases will cause the LED chip to not be fully attached to the package body during the packaging process, which will affect the packaging effect.

发明内容SUMMARY OF THE INVENTION

为解决上述技术问题之一,本发明提供了一种LED芯片结构及其制作方法、电子设备。In order to solve one of the above technical problems, the present invention provides an LED chip structure, a manufacturing method thereof, and an electronic device.

本发明实施例第一方面提供了一种LED芯片结构,包括:A first aspect of the embodiments of the present invention provides an LED chip structure, including:

第一半导体层、第二半导体层、位于所述第一半导体层和第二半导体层之间有源层,a first semiconductor layer, a second semiconductor layer, an active layer between the first semiconductor layer and the second semiconductor layer,

与第一半导体层形成欧姆接触的第一导电层、与所述第一导电层形成电连接反射层,与所述反射层形成电连接的第二导电层、与所述第二导电层形成电连接的电极,所述第一导电层、反射层、第二导电层和电极共同组成第一电连接层,A first conductive layer that forms ohmic contact with the first semiconductor layer, a reflective layer that forms electrical connection with the first conductive layer, a second conductive layer that forms electrical connection with the reflective layer, and an electrical connection to the second conductive layer connected electrodes, the first conductive layer, the reflective layer, the second conductive layer and the electrodes together form a first electrical connection layer,

贯穿所述第一半导体层及有源层,并延伸到第二半导体层内部的凹陷,penetrates through the first semiconductor layer and the active layer, and extends to the recess inside the second semiconductor layer,

与所述第一半导体层表面部分接触且部分暴露于所述第二半导体层外部的第一绝缘层、覆盖于所述凹陷侧壁及所述第一电连接层一侧的第二绝缘层,部分接触于所述第二绝缘层表面并且与所述第二半导体层形成电连接的第三导电层、以及与所述第三导电层接触的基板,a first insulating layer partially in contact with the surface of the first semiconductor layer and partially exposed to the outside of the second semiconductor layer, a second insulating layer covering the sidewall of the recess and the side of the first electrical connection layer, a third conductive layer partially in contact with the surface of the second insulating layer and electrically connected to the second semiconductor layer, and a substrate in contact with the third conductive layer,

覆盖于所述基板表面的背面金属板,the back metal plate covering the surface of the substrate,

所述背面金属板的边缘向中心收缩,且所述背面金属板表面不存在晶相。The edge of the back metal plate shrinks toward the center, and there is no crystal phase on the surface of the back metal plate.

优选地,所述背面金属板的纵截面为梯形,所述背面金属板的下底与所述基板贴合。Preferably, the longitudinal section of the back metal plate is a trapezoid, and the lower bottom of the back metal plate is attached to the base plate.

优选地,所述背面金属板为多层金属结构。Preferably, the back metal plate is a multi-layer metal structure.

优选地,所述背面金属板包括第一背面金属层和第二背面金属层,所述第二背面金属层包裹在所述第一背面金属层表面。Preferably, the back metal plate includes a first back metal layer and a second back metal layer, and the second back metal layer is wrapped on the surface of the first back metal layer.

优选地,所述第一导电层、第二导电层、第三导电层和电极均为多层金属结构。Preferably, the first conductive layer, the second conductive layer, the third conductive layer and the electrodes are all multi-layer metal structures.

优选地,所述基板为不导电材料时,所述第三导电层为第二电连接层;所述基板导电时,所述第三导电层与所述基板共同组成电连接层。Preferably, when the substrate is a non-conductive material, the third conductive layer is a second electrical connection layer; when the substrate is conductive, the third conductive layer and the substrate together form an electrical connection layer.

本发明实施例第二方面提供了一种LED芯片结构的制作方法,所述方法应用于由LED芯片板切割获得的独立的初始LED芯片结构制作中,所述初始LED芯片结构的背面金属板边缘表面形成有突出于背面金属板表面的晶相;A second aspect of the embodiments of the present invention provides a method for fabricating an LED chip structure. The method is applied to the fabrication of an independent initial LED chip structure obtained by cutting an LED chip board. The edge of the back metal plate of the initial LED chip structure is The surface is formed with a crystal phase protruding from the surface of the back metal plate;

所述方法包括:The method includes:

削除初始LED芯片结构中背面金属板边缘包含有所述突出于背面金属板表面晶相的部分材料,获得背面金属板的边缘向中心收缩,且背面金属板表面不存在晶相的最终LED芯片结构。The edge of the back metal plate in the initial LED chip structure contains the part of the material that protrudes from the surface of the back metal plate to obtain the final LED chip structure in which the edge of the back metal plate shrinks toward the center and there is no crystal phase on the surface of the back metal plate .

本发明实施例第三方面提供了一种电子设备,所述电子设备包括本发明实施例第一方面所述的LED芯片结构。A third aspect of the embodiments of the present invention provides an electronic device, where the electronic device includes the LED chip structure described in the first aspect of the embodiments of the present invention.

本发明的有益效果如下:本发明所提出的LED芯片结构及其制作方法,可将常规的初始LED芯片结构中不规则的晶相进行处理,有效改善LED芯片结构的表面平整度,提高LED芯片结构与封装体之间的贴合度,减少固晶后的空洞率,易于封装过程中有机污染物的挥发,改善LED芯片结构的封装效果。The beneficial effects of the present invention are as follows: the LED chip structure and the manufacturing method thereof proposed by the present invention can process the irregular crystal phase in the conventional initial LED chip structure, effectively improve the surface flatness of the LED chip structure, and improve the LED chip structure. The adhesion between the structure and the package body reduces the void rate after die bonding, facilitates the volatilization of organic pollutants during the packaging process, and improves the packaging effect of the LED chip structure.

附图说明Description of drawings

此处所说明的附图用来提供对本申请的进一步理解,构成本申请的一部分,本申请的示意性实施例及其说明用于解释本申请,并不构成对本申请的不当限定。在附图中:The drawings described herein are used to provide further understanding of the present application and constitute a part of the present application. The schematic embodiments and descriptions of the present application are used to explain the present application and do not constitute an improper limitation of the present application. In the attached image:

图1为LED芯片板切割流程示意图;Figure 1 is a schematic diagram of the LED chip board cutting process;

图2为现有LED芯片结构的结构示意图;2 is a schematic structural diagram of an existing LED chip structure;

图3为本发明实施例1所述的LED芯片结构的一种结构示意图;3 is a schematic structural diagram of the LED chip structure according to Embodiment 1 of the present invention;

图4为本发明实施例1所述的LED芯片结构的另一种结构示意图。FIG. 4 is another schematic structural diagram of the LED chip structure according to Embodiment 1 of the present invention.

附图标记:Reference number:

1、第一半导体层,2、第二半导体层,3、有源层,4、第一导电层,5、反射层,6、第二导电层,7、电极,8、凹陷,9、第一绝缘层,10、第二绝缘层,11、第三导电层,12、基板,13、背面金属板,14、晶相;1. The first semiconductor layer, 2, the second semiconductor layer, 3, the active layer, 4, the first conductive layer, 5, the reflective layer, 6, the second conductive layer, 7, the electrode, 8, the depression, 9, the first An insulating layer, 10, a second insulating layer, 11, a third conductive layer, 12, a substrate, 13, a back metal plate, 14, a crystal phase;

13-1、第一背面金属层,13-2、第二背面金属层。13-1, the first backside metal layer, 13-2, the second backside metal layer.

具体实施方式Detailed ways

为了使本申请实施例中的技术方案及优点更加清楚明白,以下结合附图对本申请的示例性实施例进行进一步详细的说明,显然,所描述的实施例仅是本申请的一部分实施例,而不是所有实施例的穷举。需要说明的是,在不冲突的情况下,本申请中的实施例及实施例中的特征可以相互组合。In order to make the technical solutions and advantages of the embodiments of the present application more clear, the exemplary embodiments of the present application will be described in further detail below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present application, and Not all embodiments are exhaustive. It should be noted that the embodiments in the present application and the features of the embodiments may be combined with each other in the case of no conflict.

实施例1Example 1

如图2所示为一种LED芯片结构,该LED芯片结构具体包括:Figure 2 shows an LED chip structure, the LED chip structure specifically includes:

第一半导体层1、第二半导体层2、位于所述第一半导体层1和第二半导体层2之间有源层3,a first semiconductor layer 1, a second semiconductor layer 2, an active layer 3 located between the first semiconductor layer 1 and the second semiconductor layer 2,

与第一半导体层1形成欧姆接触的第一导电层4、与所述第一导电层4形成电连接反射层5,与所述反射层5形成电连接的第二导电层6、与所述第二导电层6形成电连接的电极7,所述第一导电层4、反射层5、第二导电层6和电极7共同组成第一电连接层,A first conductive layer 4 that forms ohmic contact with the first semiconductor layer 1 , a reflective layer 5 that forms electrical connection with the first conductive layer 4 , a second conductive layer 6 that forms electrical connection with the reflective layer 5 , and the The second conductive layer 6 forms an electrode 7 that is electrically connected, and the first conductive layer 4, the reflective layer 5, the second conductive layer 6 and the electrode 7 together form a first electrical connection layer,

贯穿所述第一半导体层1及有源层3,并延伸到第二半导体层2内部的凹陷8,penetrating through the first semiconductor layer 1 and the active layer 3 and extending to the recess 8 inside the second semiconductor layer 2,

与所述第一半导体层1表面部分接触且部分暴露于所述第二半导体层2外部的第一绝缘层9、覆盖于所述凹陷8侧壁及所述第一电连接层一侧的第二绝缘层10,部分接触于所述第二绝缘层10表面并且与所述第二半导体层2形成电连接的第三导电层11、以及与所述第三导电层11接触的基板12,A first insulating layer 9 partially in contact with the surface of the first semiconductor layer 1 and partially exposed to the outside of the second semiconductor layer 2 , a first insulating layer 9 covering the sidewall of the recess 8 and the side of the first electrical connection layer. Two insulating layers 10, a third conductive layer 11 partially in contact with the surface of the second insulating layer 10 and electrically connected with the second semiconductor layer 2, and a substrate 12 in contact with the third conductive layer 11,

覆盖于所述基板12表面的背面金属板13,The back metal plate 13 covering the surface of the substrate 12,

其中,第一导电层4、第二导电层6、第三导电层11和电极7均为多层金属结构。当基板12为不导电材料时,第三导电层11为第二电连接层;当基板12导电时,第三导电层11与基板12共同组成电连接层。The first conductive layer 4 , the second conductive layer 6 , the third conductive layer 11 and the electrode 7 are all multi-layer metal structures. When the substrate 12 is made of non-conductive material, the third conductive layer 11 is the second electrical connection layer; when the substrate 12 is conductive, the third conductive layer 11 and the substrate 12 together form an electrical connection layer.

上述LED芯片结构为目前现有的LED芯片结构的常规结构。该LED芯片结构的常规结构中,由于在激光切割过程中高温、高热等因素影响,会在背面金属板13的边缘形成不规则的晶相14。因此,本实施例在常规LED芯片结构的基础上,对背面金属板13进行处理。具体的,将背面金属板13的边缘向中心收缩,即削除背面金属板13边缘包含有不规则晶相14的部分材料,如图3所示。从而改善背面金属板13的表面平整度,提高背面金属板13与封装体之间的贴合度,减少固晶后的空洞率,易于封装过程中有机污染物的挥发,改善LED芯片结构的封装效果。The above-mentioned LED chip structure is a conventional structure of the existing LED chip structure. In the conventional structure of the LED chip structure, due to the influence of high temperature, high heat and other factors during the laser cutting process, an irregular crystal phase 14 will be formed on the edge of the back metal plate 13 . Therefore, in this embodiment, the back metal plate 13 is processed on the basis of the conventional LED chip structure. Specifically, the edge of the back metal plate 13 is shrunk toward the center, that is, a part of the material containing the irregular crystal phase 14 at the edge of the back metal plate 13 is removed, as shown in FIG. 3 . Thereby, the surface flatness of the back metal plate 13 is improved, the adhesion between the back metal plate 13 and the package body is improved, the void rate after die bonding is reduced, the volatilization of organic pollutants during the packaging process is easy, and the packaging of the LED chip structure is improved. Effect.

本实施例中,背面金属板13可以通过蒸发的方法覆盖在基板12上。背面金属板13纵截面为梯形,背面金属板13的长下底与基板12贴合。该结构的背面金属板13由于中间区域和边缘区域存在高度差,在封装过程中,有助于固晶时中间区域有机污染物的挥发。In this embodiment, the back metal plate 13 may be covered on the substrate 12 by evaporation. The longitudinal section of the back metal plate 13 is a trapezoid, and the long lower bottom of the back metal plate 13 is attached to the base plate 12 . Due to the height difference between the middle area and the edge area of the back metal plate 13 of this structure, during the packaging process, it is helpful for the volatilization of organic pollutants in the middle area during die bonding.

进一步的,本实施例中,背面金属板13可为多层金属结构。本实施例提出一种双层金属结构的背面金属板13为例,如图4所示。背面金属板13包括第一背面金属层13-1和第二背面金属层13-2。在仅有第一背面金属层13-1时,第一背面金属层13-1表面积较小,为了提高边缘金属与基板12的粘附性,改善背面金属板13脱落等现象,通过在第一背面金属层13-1表面包裹第二背面金属层13-2,增加固晶的有效面积,能够进一步提升LED芯片结构的封装效果。Further, in this embodiment, the back metal plate 13 may be a multi-layer metal structure. This embodiment provides a back metal plate 13 with a double-layer metal structure as an example, as shown in FIG. 4 . The back metal plate 13 includes a first back metal layer 13-1 and a second back metal layer 13-2. When there is only the first back metal layer 13-1, the surface area of the first back metal layer 13-1 is small. The surface of the backside metal layer 13-1 wraps the second backside metal layer 13-2 to increase the effective area of die bonding, which can further improve the packaging effect of the LED chip structure.

实施例2Example 2

本实施例提出一种LED芯片结构的制作方法,该LED芯片结构可参照实施例1所记载的内容,本实施例不再进行赘述。本实施例所提出的方法应用于由LED芯片板切割获得的独立的初始LED芯片结构制作中,在初始LED芯片结构的背面金属板13边缘表面形成有突出于背面金属板13表面的晶相14;This embodiment proposes a method for fabricating an LED chip structure. For the LED chip structure, reference may be made to the content described in Embodiment 1, which will not be repeated in this embodiment. The method proposed in this embodiment is applied to the fabrication of an independent initial LED chip structure obtained by cutting an LED chip board. A crystal phase 14 protruding from the surface of the back metal plate 13 is formed on the edge surface of the back metal plate 13 of the initial LED chip structure. ;

该方法包括:The method includes:

削除初始LED芯片结构中背面金属板13边缘包含有所述突出于背面金属板13表面晶相14的部分材料,获得背面金属板13的边缘向中心收缩,且背面金属板13表面不存在晶相14的最终LED芯片结构。The edge of the back metal plate 13 in the initial LED chip structure contains the part of the material that protrudes from the crystal phase 14 on the surface of the back metal plate 13, so that the edge of the back metal plate 13 shrinks toward the center, and there is no crystal phase on the surface of the back metal plate 13. 14. Final LED chip structure.

具体的,本实施例中,由于背面金属板13与基板12为两种不同的材料,背面金属板13与基板12的贴合面粘附性相对较弱。因此,在机械外力的作用下,就可以将背面金属板13边缘轻松去除,从而剔除背面金属板13表面的晶相14。当然,本实施例对如何削除背面金属板13边缘部分材料的方式不做特殊限定,只要能够实现本实施例所最终获得的LED芯片结构即可。Specifically, in this embodiment, since the back metal plate 13 and the substrate 12 are made of two different materials, the adhesion of the bonding surface of the back metal plate 13 and the substrate 12 is relatively weak. Therefore, under the action of external mechanical force, the edge of the back metal plate 13 can be easily removed, thereby removing the crystal phase 14 on the surface of the back metal plate 13 . Of course, this embodiment does not specifically limit how to remove the material of the edge portion of the back metal plate 13, as long as the LED chip structure finally obtained in this embodiment can be realized.

实施例3Example 3

本实施例提出一种电子设备,所述电子设备包括实施例1所述的LED芯片结构,在此不再进行赘述。This embodiment provides an electronic device, and the electronic device includes the LED chip structure described in Embodiment 1, and details are not described herein again.

显然,本领域的技术人员可以对本申请进行各种改动和变型而不脱离本申请的精神和范围。这样,倘若本申请的这些修改和变型属于本申请权利要求及其等同技术的范围之内,则本申请也意图包含这些改动和变型在内。Obviously, those skilled in the art can make various changes and modifications to the present application without departing from the spirit and scope of the present application. Thus, if these modifications and variations of the present application fall within the scope of the claims of the present application and their equivalents, the present application is also intended to include these modifications and variations.

Claims (8)

1. An LED chip structure comprising:
a first semiconductor layer, a second semiconductor layer, an active layer between the first semiconductor layer and the second semiconductor layer,
the first conductive layer forms ohmic contact with the first semiconductor layer, the first conductive layer forms an electrically connected reflection layer with the first conductive layer, the second conductive layer forms an electrically connected reflection layer with the reflection layer, the electrode forms an electrically connected electrode with the second conductive layer, the first conductive layer, the reflection layer, the second conductive layer and the electrode jointly form a first electrically connected layer,
a recess penetrating the first semiconductor layer and the active layer and extending into the second semiconductor layer,
a first insulating layer partially contacting the surface of the first semiconductor layer and partially exposed to the outside of the second semiconductor layer, a second insulating layer covering the side wall of the recess and one side of the first electrical connection layer, a third conductive layer partially contacting the surface of the second insulating layer and forming electrical connection with the second semiconductor layer, and a substrate contacting the third conductive layer,
a back metal plate covering the surface of the substrate,
wherein the edge of the back metal plate is shrunk toward the center, and no crystal phase exists on the surface of the back metal plate.
2. The LED chip structure of claim 1, wherein the back metal plate has a trapezoidal longitudinal cross section, and a bottom of the back metal plate is attached to the substrate.
3. The LED chip structure of claim 1, wherein said back metal plate is a multilayer metal structure.
4. The LED chip structure of claim 3, wherein the back metal plate comprises a first back metal layer and a second back metal layer, and the second back metal layer is wrapped on the surface of the first back metal layer.
5. The LED chip structure of claim 1, wherein the first, second, third and electrode layers are all multilayer metal structures.
6. The LED chip structure of claim 1, wherein when the substrate is a non-conductive material, the third conductive layer is a second electrical connection layer; when the substrate is conductive, the third conductive layer and the substrate jointly form an electric connection layer.
7. A method for manufacturing the LED chip structure according to any one of claims 1 to 6, wherein the method is applied to manufacture of an independent initial LED chip structure obtained by cutting an LED chip plate, and the edge surface of the back metal plate of the initial LED chip structure is formed with a crystalline phase protruding out of the surface of the back metal plate;
the method comprises the following steps:
and removing part of materials which are contained in the edge of the back metal plate and protrude out of the crystal phase on the surface of the back metal plate in the initial LED chip structure to obtain the final LED chip structure, wherein the edge of the back metal plate shrinks towards the center, and the crystal phase does not exist on the surface of the back metal plate.
8. An electronic device characterized in that the electronic device comprises the LED chip structure of any one of claims 1 to 6.
CN202210702425.1A 2022-06-21 2022-06-21 An LED chip structure and its manufacturing method, and electronic equipment Pending CN115084334A (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201128704A (en) * 2010-02-12 2011-08-16 Win Semiconductors Corp A method of processing copper backside metal layer for semiconductor chips
CN205900579U (en) * 2016-07-27 2017-01-18 映瑞光电科技(上海)有限公司 Vertical light emitting diode
CN109791964A (en) * 2018-10-11 2019-05-21 厦门市三安光电科技有限公司 A kind of light-emitting diode chip for backlight unit and preparation method thereof
CN209232780U (en) * 2018-12-29 2019-08-09 苏州能讯高能半导体有限公司 Semiconductor chip, semiconductor crystal wafer
CN111009463A (en) * 2019-11-22 2020-04-14 中国电子科技集团公司第五十五研究所 Method for neatly separating back surface metal of SiC chip laser scribing

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201128704A (en) * 2010-02-12 2011-08-16 Win Semiconductors Corp A method of processing copper backside metal layer for semiconductor chips
US20110201192A1 (en) * 2010-02-12 2011-08-18 Chang-Hwang Hua Method of processing backside copper layer for semiconductor chips
CN205900579U (en) * 2016-07-27 2017-01-18 映瑞光电科技(上海)有限公司 Vertical light emitting diode
CN109791964A (en) * 2018-10-11 2019-05-21 厦门市三安光电科技有限公司 A kind of light-emitting diode chip for backlight unit and preparation method thereof
CN209232780U (en) * 2018-12-29 2019-08-09 苏州能讯高能半导体有限公司 Semiconductor chip, semiconductor crystal wafer
CN111009463A (en) * 2019-11-22 2020-04-14 中国电子科技集团公司第五十五研究所 Method for neatly separating back surface metal of SiC chip laser scribing

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