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CN115074731A - Porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating and preparation method and application thereof - Google Patents

Porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating and preparation method and application thereof Download PDF

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CN115074731A
CN115074731A CN202210504888.7A CN202210504888A CN115074731A CN 115074731 A CN115074731 A CN 115074731A CN 202210504888 A CN202210504888 A CN 202210504888A CN 115074731 A CN115074731 A CN 115074731A
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resistant
wear
tialxn
oxidation
ticn
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游钱炳
易健松
熊计
郭智兴
向清洲
向艺桐
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Sichuan University
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Abstract

本发明公开了一种多孔复合TiCN/TiAlXN耐磨抗氧化涂层及其制备方法、应用,多孔复合TiCN/TiAlXN耐磨抗氧化涂层由TiN粘结层、TiCN多孔耐磨层、TiAlXN基耐磨抗氧层三个子层构成的整体,这三个子层的顺序是由内至外,涂层总厚度为7~10μm。本发明通过利用高温气相沉积+阴极电弧+HiPIMS技术制备的复合涂层,兼具化学物理气相沉积的优点,同时充分利用了电弧、磁控的优点,通过控制氮气与氩气流量、脉冲峰值电流和沉积时间等,在基体表面沉积TiAlXN层;不同功能子层有机组合的多层复合涂层韧性高、耐磨、耐氧化及耐冲击,非常适合断续切削方式的加工及耐磨、抗氧化、耐振动场景,且制备工艺简单,便于工业化生产。

Figure 202210504888

The invention discloses a porous composite TiCN/TiAlXN wear-resistant and anti-oxidation coating, a preparation method and application thereof. The whole is composed of three sub-layers of the anti-oxidation layer. The order of the three sub-layers is from the inside to the outside, and the total thickness of the coating is 7-10 μm. The invention adopts the composite coating prepared by high temperature vapor deposition + cathodic arc + HiPIMS technology, has the advantages of chemical physical vapor deposition, and fully utilizes the advantages of arc and magnetron, by controlling nitrogen and argon flow, pulse peak current and deposition time, etc., deposit TiAlXN layer on the surface of the substrate; the multi-layer composite coating with organic combination of different functional sub-layers has high toughness, wear resistance, oxidation resistance and impact resistance, which is very suitable for intermittent cutting processing and wear and oxidation resistance. , Vibration-resistant scene, and the preparation process is simple, which is convenient for industrial production.

Figure 202210504888

Description

一种多孔复合TiCN/TiAlXN耐磨抗氧化涂层及其制备方法、 应用A porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating and preparation method thereof, application

技术领域technical field

本发明涉及表面涂层技术领域,具体涉及一种多孔复合TiCN/TiAlXN耐磨抗氧化涂层及其制备方法、应用。The invention relates to the technical field of surface coatings, in particular to a porous composite TiCN/TiAlXN wear-resistant and anti-oxidative coating and a preparation method and application thereof.

背景技术Background technique

近年来,在工模具、机械零部件等产品上涂覆金属氮化物来提高产品表面性能和使用寿命的方法已经成为一种广泛应用的表面改性技术。随着涂层技术不断地发展,新高的抗氧化性等,符合现代制造业对涂层的高硬度、高韧性、高耐磨性和高温性能的要求。In recent years, the method of coating metal nitrides on tools, molds, mechanical parts and other products to improve the surface properties and service life of products has become a widely used surface modification technology. With the continuous development of coating technology, new high oxidation resistance, etc., meet the requirements of modern manufacturing for high hardness, high toughness, high wear resistance and high temperature performance of coatings.

氮化物涂层是铣刀、车刀等切削刀具广泛使用的涂层材料,如TiAlN、TiAlCrN、TiAlSiN等,氮化物涂层硬度高、耐磨性好。但是,氮化物涂层也存在着不足:脆性偏大,与基底结合强度不够高,在高温条件下的热稳定性能不足、抗冲击性能差。为了发挥各涂层的性能优势,采用化学气相沉积方法制备的多层氧化物/(碳)氮化物复合涂层具有非常优异的综合性能,在切削刀具上获得了广泛应用。但是由于化学气相沉积法的工艺温度高,刀具基底材料在涂层沉积过程中容易发生元素的扩散、化学反应等行为。物理气相沉积法具有沉积温度低、对基底材料性质影响小、表面质量好、工艺灵活等特点,是制备复杂结构复合涂层更有前景的方法。Nitride coating is a widely used coating material for milling cutters, turning tools and other cutting tools, such as TiAlN, TiAlCrN, TiAlSiN, etc. The nitride coating has high hardness and good wear resistance. However, the nitride coating also has shortcomings: too high brittleness, insufficient bonding strength with the substrate, insufficient thermal stability under high temperature conditions, and poor impact resistance. In order to give play to the performance advantages of each coating, the multi-layer oxide/(carbon) nitride composite coating prepared by chemical vapor deposition method has excellent comprehensive properties and has been widely used in cutting tools. However, due to the high process temperature of chemical vapor deposition, the tool substrate material is prone to element diffusion and chemical reaction during the coating deposition process. The physical vapor deposition method has the characteristics of low deposition temperature, little influence on the properties of the substrate material, good surface quality, and flexible process. It is a more promising method for preparing complex structure composite coatings.

目前物理气相沉积(PVD)中电弧离子镀和磁控溅射的运用最为广泛。其中,电弧离子镀比磁控溅射离化率更高,耐磨性更强,膜基结合力更好,是硬质涂层刀具的主流选择。但传统的阴极电弧离子镀沉积的薄膜表面不可避免的存在大颗粒,表面粗糙,导致涂层刀具切削时摩擦力大,产热更多,更容易磨损。采用高温气相沉积+阴极电弧+HiPIMS制备方法,可以产生更高密度的等离子体,离化率更高,沉积速率更快。制备出的厚薄膜表面大颗粒明显减少,耐磨层组织成多孔结构具有较好的抗冲击、抗崩刃的效果,在高温下摩擦系数显著降低,膜基结合力更高。At present, arc ion plating and magnetron sputtering are the most widely used in physical vapor deposition (PVD). Among them, arc ion plating has higher ionization rate, stronger wear resistance and better film-base bonding force than magnetron sputtering, and is the mainstream choice for hard coating tools. However, the surface of the film deposited by traditional cathodic arc ion plating inevitably has large particles and a rough surface, which leads to high friction, more heat generation, and easier wear of the coated tool when cutting. The high temperature vapor deposition + cathodic arc + HiPIMS preparation method can generate higher density plasma, higher ionization rate and faster deposition rate. The large particles on the surface of the prepared thick film are significantly reduced, and the wear-resistant layer is organized into a porous structure, which has good impact resistance and anti-chipping effect.

利用高温气相沉积+阴极电弧+HiPIMS方法制备多孔TiCN/TiAlXN耐磨涂层的方法,还未见报道,沉积有多孔TiCN/TiAlXN耐磨复合涂层的硬质合金刀具,是目前提高硬质薄膜刀具抗冲击、抗氧化、耐磨的重要发展方向之一。There is no report on the method of preparing porous TiCN/TiAlXN wear-resistant coating by high temperature vapor deposition + cathodic arc + HiPIMS method. It is one of the important development directions of tool impact resistance, oxidation resistance and wear resistance.

发明内容SUMMARY OF THE INVENTION

为解决现有技术中存在的问题,本发明提供了一种多孔复合TiCN/TiAlXN耐磨抗氧化涂层及其制备方法、应用,保证了涂层整体的抗冲击性能、耐磨性能、低应力、高结合强度,解决了上述背景技术中提到的问题。In order to solve the problems existing in the prior art, the present invention provides a porous composite TiCN/TiAlXN wear-resistant and anti-oxidative coating and its preparation method and application, which ensure the overall impact resistance, wear resistance and low stress of the coating. , high bonding strength, solve the problems mentioned in the above background technology.

为实现上述目的,本发明提供如下技术方案:一种多孔复合TiCN/TiAlXN耐磨抗氧化涂层,所述TiCN/TiAlXN耐磨抗氧化涂层由3个子层构成,子层顺序由内至外依次为TiN粘结层、TiCN多孔耐磨层、TiAlXN基耐磨抗氧化层;所述TiCN/TiAlXN耐磨抗氧化涂层总厚度为7~10μm,TiN粘结层厚度为0.05~0.1μm,TiCN多孔耐磨层厚度为5~7μm,TiAlXN基耐磨抗氧化层厚度为2~3μm。In order to achieve the above purpose, the present invention provides the following technical solutions: a porous composite TiCN/TiAlXN wear-resistant and anti-oxidative coating, the TiCN/TiAlXN wear-resistant and anti-oxidative coating is composed of 3 sub-layers, and the sub-layer order is from inside to outside The order is TiN bonding layer, TiCN porous wear-resistant layer, TiAlXN-based wear-resistant and anti-oxidation layer; the total thickness of the TiCN/TiAlXN wear-resistant and anti-oxidative coating is 7-10 μm, and the thickness of the TiN bonding layer is 0.05-0.1 μm, The thickness of the TiCN porous wear-resistant layer is 5-7 μm, and the thickness of the TiAlXN-based wear-resistant and anti-oxidation layer is 2-3 μm.

优选的,所述TiAlXN基耐磨抗氧化层中各元素的原子百分比含量为Ti:30~50at.%,Al:30~70at.%,N:10~50at.%,X:0~20at.%;其中,X是C、Si、Zr、Mo、V、Cr及稀土元素。Preferably, the atomic percentage content of each element in the TiAlXN-based wear-resistant and oxidation-resistant layer is Ti: 30-50 at.%, Al: 30-70 at.%, N: 10-50 at.%, X: 0-20 at.%. %; wherein, X is C, Si, Zr, Mo, V, Cr and rare earth elements.

另外,为实现上述目的,本发明还提供如下技术方案:一种多孔复合TiCN/TiAlXN耐磨抗氧化涂层的制备方法,包括如下步骤:In addition, in order to achieve the above purpose, the present invention also provides the following technical solutions: a preparation method of a porous composite TiCN/TiAlXN wear-resistant and anti-oxidative coating, comprising the following steps:

S1、将基体表面进行抛光,然后放入35℃热水浴中的溶液中进行超声波清洗;再采用细颗粒砂砾进行喷洒3~5次,每次喷2~5秒,喷砂压力0.8~1.3Kg/cm2,再次放入热水浴的溶液中清洗30min,最后放入烘箱中烘烤;S1. Polish the surface of the substrate, and then put it into a solution in a 35°C hot water bath for ultrasonic cleaning; then spray fine-grained gravel for 3 to 5 times, each time for 2 to 5 seconds, and the blasting pressure is 0.8 to 1.3 Kg/cm 2 , put it into the solution of the hot water bath again for 30min, and finally put it into the oven to bake;

S2、将步骤S1得到的样品,装夹进炉子,抽真空升温开始沉积制备TiN粘结层;S2, the sample obtained in step S1 is clamped into the furnace, and the temperature is vacuumed to start deposition to prepare the TiN bonding layer;

S3、在步骤S2的基础上开始沉积制备TiCN多孔耐磨层;S3, on the basis of step S2, start to deposit and prepare the TiCN porous wear-resistant layer;

S4、取出步骤S3中的样品,重复S1;S4, take out the sample in step S3, repeat S1;

S5、将步骤S4的样品装炉,在300~500℃下进行中频脉冲刻蚀,将真空室抽至3.0~10.0x10-3Pa,通入Ar气350-550sccm,设置工件偏压-600~-1000V,频率为20~250k Hz,转速1.5~5.5转/min,对样品表面进行脉冲刻蚀10~15min,再用H2清洗炉腔;S5. Load the sample in step S4 into a furnace, perform intermediate frequency pulse etching at 300-500°C, pump the vacuum chamber to 3.0-10.0x10-3 Pa, pass in Ar gas for 350-550sccm, and set the workpiece bias to -600- -1000V, the frequency is 20~250k Hz, the rotation speed is 1.5~5.5 rev/min, the sample surface is subjected to pulse etching for 10~15min, and then the furnace cavity is cleaned with H 2 ;

S6、通入Ar气350~550sccm,调节偏压至-100~-200V,设定离子源电流为10~15A,转速为1.5~5.5转/min,对步骤S5样品进行气体离子源直流刻蚀20~25min,再用H2清洗炉腔;S6. Pour in Ar gas for 350-550 sccm, adjust the bias voltage to -100--200V, set the ion source current to 10-15A, and set the rotational speed to 1.5-5.5 r/min, and perform gas ion source DC etching on the sample in step S5 20 ~ 25min, then use H 2 to clean the furnace cavity;

S7、对步骤S6样品,采用阴极电弧结合HiPIMS高能脉冲磁控溅射技术,通过控制氮气与氩气流量、脉冲峰值电流和沉积时间参数,进行沉积TiAlXN基耐磨抗氧化功能层。S7. For the sample in step S6, using cathodic arc combined with HiPIMS high-energy pulsed magnetron sputtering technology, by controlling nitrogen and argon gas flow, pulse peak current and deposition time parameters, a TiAlXN-based wear-resistant and anti-oxidation functional layer is deposited.

优选的,所述步骤S1中的溶液是丙酮或酒精;所述的细颗粒砂砾是刚玉、氧化锆或金刚砂;所述的烘烤具体是在60℃下烘烤20min。Preferably, the solution in the step S1 is acetone or alcohol; the fine-grained grit is corundum, zirconia or emery; and the baking is specifically baking at 60° C. for 20 minutes.

优选的,在所述步骤S2沉积制备TiN粘结层中,沉积温度为850~900℃,沉积压力95~101KPa,使用气体包括TiCl4,H2,N2和Ar,其中,TiCl4由H2带入反应炉中,TiCl4的水浴温度为45~48℃。Preferably, in the deposition and preparation of the TiN bonding layer in the step S2, the deposition temperature is 850-900° C., the deposition pressure is 95-101 KPa, and the gases used include TiCl 4 , H 2 , N 2 and Ar, wherein TiCl 4 is composed of H 2 Bring it into the reaction furnace, and the temperature of the water bath of TiCl 4 is 45-48 ℃.

优选的,所述步骤S3沉积制备TiCN多孔耐磨层中,沉积温度为1000~1050℃,沉积压力6~50KPa,使用气体包括TiCl4,H2,CH4,N2和Ar,主要用于控制气体浓度及化学平衡使用,其中,TiCl4由H带入反应炉中,TiCl4的水浴温度为45~48℃。Preferably, in the preparation of the TiCN porous wear-resistant layer by deposition in step S3, the deposition temperature is 1000-1050° C., the deposition pressure is 6-50 KPa, and the gases used include TiCl 4 , H 2 , CH 4 , N 2 and Ar, which are mainly used for It is used to control the gas concentration and chemical balance, wherein, TiCl 4 is brought into the reaction furnace by H, and the temperature of the water bath of TiCl 4 is 45-48 ℃.

优选的,所述CH4气体流量百分比为3.5%~4%,TiCl4气体流量百分比为1.5%~3%。Preferably, the percentage of the flow rate of the CH 4 gas is 3.5% to 4%, and the percentage of the flow rate of the TiCl 4 gas is 1.5% to 3%.

优选的,所述步骤S7中采用阴极电弧结合HiPIMS高能脉冲磁控溅射技术,通过控制氮气与氩气流量、脉冲峰值电流和沉积时间,具体是指:将偏压调至-100~-250V,通入400~750sccm的N2气、400~750sccm的Ar气,点燃至少2个TiaAlbXc矩形磁控靶、至少4个TiaAlbXc圆柱形电弧靶,调节N2气压至0.5~3.5Pa,调节Ar气压至0.5~3.5Pa,沉积温度为450~550℃,沉积压力为9800~10500Mpa,转速为1.5~5.5转/min,脉冲电弧电源波形为矩形波,平均电流70~120A,偏压:-30~-500V,频率:20~250KHz,占空比:5%~75%,弧源电磁线圈输出电流:0.3~5.2A,沉积TiAlXN层100~300min。Preferably, the cathode arc combined with HiPIMS high-energy pulsed magnetron sputtering technology is used in the step S7, and by controlling the flow rates of nitrogen and argon, the pulse peak current and the deposition time, specifically: adjusting the bias voltage to -100~-250V , pass 400~750sccm N 2 gas, 400~750sccm Ar gas, ignite at least 2 Ti a Al b X c rectangular magnetron targets, at least 4 Ti a Al b X c cylindrical arc targets, adjust N 2 The air pressure is 0.5~3.5Pa, the Ar air pressure is adjusted to 0.5~3.5Pa, the deposition temperature is 450~550℃, the deposition pressure is 9800~10500Mpa, the rotation speed is 1.5~5.5 rpm, the pulse arc power waveform is rectangular wave, and the average current 70~120A, bias voltage: -30~-500V, frequency: 20~250KHz, duty cycle: 5%~75%, output current of arc source electromagnetic coil: 0.3~5.2A, deposit TiAlXN layer for 100~300min.

优选的,所述TiaAlbXc靶材中的原子百分比为Ti:10~50at.%,Al:30~67at.%,X是C、Si、Zr、Mo、V或Cr;a+b+c=100at.%。Preferably, the atomic percentage in the Ti a Al b X c target material is Ti: 10-50 at. %, Al: 30-67 at. %, X is C, Si, Zr, Mo, V or Cr; a+ b+c=100at.%.

另外,为实现上述目的,本发明还提供如下技术方案:一种多孔复合TiCN/TiAlXN耐磨抗氧化涂层在机械零部件和刀模具表面防护领域中的应用。In addition, in order to achieve the above purpose, the present invention also provides the following technical solution: the application of a porous composite TiCN/TiAlXN wear-resistant and anti-oxidative coating in the field of surface protection of mechanical parts and tool molds.

本发明的有益效果是:The beneficial effects of the present invention are:

1)本发明提供的多孔耐磨复合涂层由功能与成分均不同的三个子层构成,首先,纳米TiN粘结层相比于传统的Cr、Ti纯金属粘结层而言,具有更高的强韧性,能在刀具基底材料与表面涂层材料之间起到很好的粘结作用,使涂层与基底结合牢固;其次,在850-900℃制备涂层时它能保证涂层的结合强度,阻隔元素扩散避免形成脆性层;再次为多孔耐磨层的形核生长提供了共格生长的条件,避免了因晶格畸变造成残余应力过大;最后,在制备好多孔耐磨层后采用喷砂降低了涂层自身的应力,为后续制备耐磨抗氧化层提供了支撑基础,保证了涂层整体的抗冲击性能、耐磨性能、低应力、高结合强度。1) The porous wear-resistant composite coating provided by the present invention is composed of three sub-layers with different functions and components. First, the nano-TiN bonding layer has higher performance than the traditional Cr and Ti pure metal bonding layers. It can play a good bonding effect between the tool base material and the surface coating material, so that the coating and the base are combined firmly; secondly, when the coating is prepared at 850-900 ℃, it can ensure the coating The bonding strength prevents the diffusion of elements and avoids the formation of a brittle layer; once again, it provides a coherent growth condition for the nucleation and growth of the porous wear-resistant layer, and avoids excessive residual stress caused by lattice distortion. Finally, after the porous wear-resistant layer is prepared Sandblasting is then used to reduce the stress of the coating itself, which provides a support foundation for the subsequent preparation of the wear-resistant and oxidation-resistant layer, and ensures the overall impact resistance, wear resistance, low stress and high bonding strength of the coating.

2)本发明通过利用高温气相沉积+阴极电弧+HiPIMS技术制备的复合涂层,兼具化学物理气相沉积的优点(利用高温气相沉积形成共格生长并形成多孔等轴晶,保证了涂层抗冲击吸能的作用再利用物理气相沉积形成纤维状晶体保证了涂层够硬、够耐磨兼抗氧化),同时充分利用了电弧、磁控的优点,通过控制氮气与氩气流量、脉冲峰值电流和沉积时间等,在基体表面沉积TiAlXN层。相比传统电弧离子镀,本发明脉冲电弧离子镀可以产生更高密度的等离子体、沉积速率更快、残余应力更低、涂层硬度更高更耐磨。2) The present invention has the advantages of chemical physical vapor deposition by using the composite coating prepared by high temperature vapor deposition + cathodic arc + HiPIMS technology (using high temperature vapor deposition to form coherent growth and form porous equiaxed crystals, ensuring that the coating resists The effect of impact energy absorption is to use physical vapor deposition to form fibrous crystals to ensure that the coating is hard enough, wear-resistant and anti-oxidative), and at the same time makes full use of the advantages of arc and magnetron, by controlling nitrogen and argon flow, pulse peak value Current and deposition time, etc., deposit a TiAlXN layer on the surface of the substrate. Compared with traditional arc ion plating, the pulsed arc ion plating of the present invention can generate higher density plasma, faster deposition rate, lower residual stress, higher coating hardness and more wear resistance.

附图说明Description of drawings

图1为多孔复合TiCN/TiAlXN耐磨抗氧化涂层示意图;Figure 1 is a schematic diagram of the porous composite TiCN/TiAlXN wear-resistant and anti-oxidation coating;

图2为实施例1制备的多孔耐磨抗氧化涂层的摩擦曲线;Fig. 2 is the friction curve of the porous wear-resistant anti-oxidation coating prepared in Example 1;

图3为实施例2制备的多孔耐磨抗氧化涂层的摩擦曲线;Fig. 3 is the friction curve of the porous wear-resistant anti-oxidation coating prepared in Example 2;

图4为实施例3制备的多孔耐磨抗氧化涂层的摩擦曲线。FIG. 4 is the friction curve of the porous wear-resistant and oxidation-resistant coating prepared in Example 3. FIG.

具体实施方式Detailed ways

下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

请参阅图1,本发明提供一种技术方案:一种多孔复合TiCN/TiAlXN耐磨抗氧化涂层,所述TiCN/TiAlXN耐磨抗氧化涂层由3个子层构成,如图1所示,子层顺序由内至外依次为TiN粘结层、TiCN多孔耐磨层、TiAlXN基耐磨抗氧化层;所述TiCN/TiAlXN耐磨抗氧化涂层总厚度为7~10μm,TiN粘结层厚度为0.05~0.1μm,TiCN多孔耐磨层厚度为5~7μm,TiAlXN基耐磨抗氧化层厚度为2~3μm。Please refer to FIG. 1 , the present invention provides a technical solution: a porous composite TiCN/TiAlXN wear-resistant and anti-oxidative coating, the TiCN/TiAlXN wear-resistant and anti-oxidative coating is composed of three sub-layers, as shown in FIG. 1 , The sub-layer sequence from inside to outside is TiN bonding layer, TiCN porous wear-resistant layer, TiAlXN-based wear-resistant and anti-oxidation layer; the total thickness of the TiCN/TiAlXN wear-resistant and anti-oxidative coating is 7-10 μm, and the TiN bonding layer is The thickness is 0.05-0.1 μm, the thickness of the TiCN porous wear-resistant layer is 5-7 μm, and the thickness of the TiAlXN-based wear-resistant and oxidation-resistant layer is 2-3 μm.

进一步的,所述TiAlXN基耐磨抗氧化层中各元素的原子百分比含量为Ti:30~50at.%,Al:30~70at.%,N:10~50at.%,X:0~20at.%;其中,X是C、Si、Zr、Mo、V、Cr及稀土元素。Further, the atomic percentage content of each element in the TiAlXN-based wear-resistant and oxidation-resistant layer is Ti: 30-50 at.%, Al: 30-70 at.%, N: 10-50 at.%, X: 0-20 at.% %; wherein, X is C, Si, Zr, Mo, V, Cr and rare earth elements.

一种多孔复合TiCN/TiAlXN耐磨抗氧化涂层的制备方法,包括如下具体步骤:A preparation method of a porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating, comprising the following specific steps:

S1:沉积粘结层:将基体表面抛光成镜面(Ra=0.2μm),将其放入超声波中采用热水浴35℃的丙酮溶液中清洗30min,在采用细颗粒刚玉进行喷洒三次,每次喷2-5秒,喷砂压力0.8-1.3Kg/cm2,再次放入热水浴的丙酮溶液中清洗30min,再放入烘箱在60℃下烘烤20分钟,装夹进炉子,抽真空升温开始制备粘结层,沉积温度为850-900℃,沉积压力95-101KPa,使用气体包括TiCl4,H2,N2和Ar,其中TiCl4由H2带入反应炉中,TiCl4的水浴温度为45-48℃,涂层厚度0.05-0.1μm。S1: Deposition of bonding layer: Polish the surface of the substrate to a mirror surface (Ra=0.2 μm), put it in ultrasonic waves and wash it in an acetone solution of 35°C in a hot water bath for 30 minutes, and spray it with fine-grained corundum three times, each time Spray for 2-5 seconds, sand blasting pressure 0.8-1.3Kg/cm 2 , put it in the acetone solution of the hot water bath again for 30 minutes, then put it in the oven to bake at 60 ℃ for 20 minutes, put it into the furnace, and vacuumize The temperature rises to start the preparation of the bonding layer, the deposition temperature is 850-900°C, the deposition pressure is 95-101KPa, and the gases used include TiCl 4 , H 2 , N 2 and Ar, wherein TiCl 4 is brought into the reaction furnace by H 2 , and the TiCl 4 The temperature of the water bath is 45-48°C, and the coating thickness is 0.05-0.1 μm.

S2:TiCN多孔耐磨层:在步骤S1的基础上开始制备多孔耐磨层,沉积温度为1000-1050℃,沉积压力6-50KPa,使用气体包括TiCl4,H2,CH4,N2和Ar,其中TiCl4由H2带入反应炉中,TiCl4的水浴温度为45-48℃,其中涂层厚度5-7μm。其中的温度和气体比例是形成多孔耐磨层的关键,CH4气体流量百分比在3.5%-4%,TiCl4气体流量百分比在1.5%-3%。S2: TiCN porous wear-resistant layer: start to prepare the porous wear-resistant layer on the basis of step S1, the deposition temperature is 1000-1050°C, the deposition pressure is 6-50KPa, and the gases used include TiCl 4 , H 2 , CH 4 , N 2 and Ar, in which TiCl 4 is brought into the reaction furnace by H 2 , the water bath temperature of TiCl 4 is 45-48 °C, and the coating thickness is 5-7 μm. The temperature and gas ratio are the keys to forming the porous wear-resistant layer. The percentage of CH4 gas flow is 3.5%-4%, and the percentage of TiCl4 gas flow is 1.5%-3%.

S3:TiAlXN基功能涂层:将S2制备后的样品放入超声波中采用热水浴35℃的丙酮溶液中清洗30min,放入烘箱在50℃下烘烤20分钟,装夹进有阴极电弧+HiPIMS真空系统制备TiAlXN基涂层,沉积TiAlXN基功能层:将偏压调至-100~-250V,通入400~750sccm的N2气,400~750sccm的Ar气,点燃至少2个TiaAlbXc矩形磁控靶、至少4个TiaAlbXc圆柱形电弧靶(靶材TiaAlbXc中的原子百分比为Ti:10~50at.%,Al:30~67at.%,X可为C、Si、Zr、Mo、V、Cr及稀土金属元素,a+b+c=100at.%),调节N2气压至0.5~3.5Pa,调节Ar气压至0.5~3.5Pa,沉积温度为450~550℃,沉积压力为9800-10500Mpa,转速为1.5~5.5转/min,脉冲电弧电源波形为矩形波,平均电流70~120A,偏压:-30~-500V,频率:20~250KHz,占空比:5%~75%,弧源电磁线圈输出电流:0.3~5.2A,沉积TiAlXN功能层100~300min,制得高性能TiAlXN纳米复合涂层,涂层厚度2-3μm,其中TiAlXN基涂层中各元素的原子百分比为含量为Ti:30~50at.%,Al:30~70at.%,N:10~50at.%,X:0~20at.%。S3: TiAlXN-based functional coating: put the sample prepared by S2 into ultrasonic wave and wash it in acetone solution at 35°C in a hot water bath for 30min, put it in an oven and bake at 50°C for 20 minutes. HiPIMS vacuum system prepares TiAlXN-based coating and deposits TiAlXN-based functional layer: adjust the bias voltage to -100~-250V, pass N 2 gas of 400~750sccm, Ar gas of 400~750sccm, and ignite at least 2 Ti a Al b X c rectangular magnetron target, at least 4 Ti a Al b X c cylindrical arc targets (the atomic percentage in the target Ti a Al b X c is Ti: 10-50 at.%, Al: 30-67 at.% , X can be C, Si, Zr, Mo, V, Cr and rare earth metal elements, a+b+c=100at.%), adjust N 2 pressure to 0.5~3.5Pa, adjust Ar pressure to 0.5~3.5Pa, The deposition temperature is 450~550℃, the deposition pressure is 9800~10500Mpa, the rotation speed is 1.5~5.5 rpm, the pulse arc power waveform is rectangular wave, the average current is 70~120A, the bias voltage: -30~-500V, the frequency: 20 ~250KHz, duty cycle: 5%~75%, output current of arc source electromagnetic coil: 0.3~5.2A, deposit TiAlXN functional layer for 100~300min, and obtain high-performance TiAlXN nanocomposite coating, coating thickness 2-3μm, The atomic percentage of each element in the TiAlXN-based coating is Ti: 30-50 at.%, Al: 30-70 at.%, N: 10-50 at.%, X: 0-20 at.%.

一种多孔复合TiCN/TiAlXN耐磨抗氧化涂层在机械零部件和刀模具表面防护领域中的应用。The application of a porous composite TiCN/TiAlXN wear-resistant and anti-oxidative coating in the field of surface protection of mechanical parts and tool molds.

实施例1Example 1

在TiCN-WC-MoC-Ni-Co金属陶瓷基体沉积这种多孔耐磨抗氧化涂层Deposition of this porous wear-resistant and oxidation-resistant coating on a TiCN-WC-MoC-Ni-Co cermet matrix

S1、将金属陶瓷刀具基体进行抛光去掉表面的氧化层,放入35℃热水浴中的溶液中进行超声波清洗30min;再采用细颗粒砂砾进行喷洒5次,每次喷5秒,喷砂压力1.3Kg/cm2,再次放入热水浴的溶液中清洗30min,再放入烘箱在60℃下烘烤20分钟;S1. Polish the cermet tool substrate to remove the oxide layer on the surface, put it into a solution in a 35°C hot water bath for ultrasonic cleaning for 30 minutes; then spray with fine-grained gravel for 5 times, each spray for 5 seconds, and the blasting pressure 1.3Kg/cm 2 , put it into the solution of hot water bath again for 30min, then put it into the oven and bake it at 60℃ for 20min;

S2、将步骤S1得到的样品,装夹进炉子,抽真空升温开始制备粘结层,沉积温度为900℃,沉积压力101KPa,使用气体包括TiCl4,H2,N2和Ar,其中TiCl4由H2带入反应炉中,TiCl4的水浴温度为48℃,涂层厚度0.1μm;S2. Clamp the sample obtained in step S1 into the furnace, vacuumize and heat up to start the preparation of the bonding layer, the deposition temperature is 900°C, the deposition pressure is 101KPa, and the gases used include TiCl 4 , H 2 , N 2 and Ar, among which TiCl 4 The water bath temperature of TiCl 4 is 48 ℃, and the coating thickness is 0.1 μm;

S3、在步骤S2的基础上开始制备多孔耐磨层,沉积温度为1050℃,沉积压力50KPa,使用气体包括TiCl4,H2,CH4,N2和Ar,其中,TiCl4由H2带入反应炉中,TiCl4的水浴温度为48℃,其中涂层厚度7μm,其中的温度和气体比例是形成多孔耐磨层的关键,CH4气体流量百分比在4%,TiCl4气体流量百分比在3%。S3. On the basis of step S2, start to prepare the porous wear-resistant layer, the deposition temperature is 1050°C, the deposition pressure is 50KPa, and the gases used include TiCl 4 , H 2 , CH 4 , N 2 and Ar, wherein TiCl 4 is carried by H 2 Into the reaction furnace, the water bath temperature of TiCl 4 is 48°C, and the coating thickness is 7 μm. The temperature and gas ratio are the keys to forming the porous wear-resistant layer. The percentage of CH 4 gas flow is 4%, and the percentage of TiCl 4 gas flow is 3%.

S4、取出步骤S3中的样品,重复步骤S1。S4. Take out the sample in step S3, and repeat step S1.

S5、将步骤S4样品装炉,在500℃下进行中频脉冲刻蚀,将真空室抽至10.0x10-3Pa,通入Ar气550sccm,设置工件偏压-1000V,频率为250k Hz,转速5.5转/min,对样品表面进行脉冲刻蚀15min,再用H2清洗炉腔;S5. Load the sample in step S4 into a furnace, perform intermediate frequency pulse etching at 500°C, pump the vacuum chamber to 10.0x10 -3 Pa, pass in Ar gas for 550sccm, set the workpiece bias voltage to -1000V, the frequency to 250k Hz, and the rotation speed to 5.5 rev/min, pulse etching the sample surface for 15min, and then clean the furnace cavity with H 2 ;

S6、DC直流刻蚀:通入Ar气550sccm,调节偏压至-200V,设定离子源电流为15A,转速为5.5转/min,对步骤S5样品进行气体离子源直流刻蚀25min,再用H2清洗炉腔。S6, DC direct current etching: pass Ar gas 550sccm, adjust the bias voltage to -200V, set the ion source current to 15A, and set the ion source current to 5.5 r/min, perform the gas ion source direct current etching on the sample in step S5 for 25min, and then use H 2 to clean the oven cavity.

S7、沉积TiAlMoN功能层:将偏压调至-250V,通入750sccm的N2气,750sccm的Ar气,点燃至少2个TiaAlbMoc矩形磁控靶、至少4个TiaAlbMoc圆柱形电弧靶。比如:3个TiaAlbMoc矩形磁控靶、6个TiaAlbMoc圆柱形电弧靶。(靶材TiaAlbMoc中的原子百分比为Ti:10~50at.%,Al:30~67at.%,a+b+c=100at.%),调节N2气压至3.5Pa,调节Ar气压至3.5Pa,温度550℃,转速为5.5转/min,脉冲电弧电源波形为矩形波,平均电流120A,偏压:-500V,频率:250KHz,占空比:70%,弧源电磁线圈输出电流:5.2A,沉积TiAl MoN功能层100min,制得高性能TiAlMoN纳米复合涂层,涂层厚3μm,其中TiAlMoN基涂层中各元素的原子百分比为含量为Ti:30~50at.%,Al:30~70at.%,N:10~50at.%,Mo:0~20at.%。S7. Deposition of TiAlMoN functional layer: adjust the bias voltage to -250V, pass N 2 gas of 750 sccm, Ar gas of 750 sccm, ignite at least 2 Ti a Al b Mo c rectangular magnetron targets, at least 4 Ti a Al b Mo c cylindrical arc target. For example: 3 Ti a Al b Mo c rectangular magnetron targets, 6 Ti a Al b Mo c cylindrical arc targets. (The atomic percentage in the target Ti a Al b Mo c is Ti: 10-50 at. %, Al: 30-67 at. %, a+b+c=100 at. %), adjust the N 2 gas pressure to 3.5Pa, adjust Ar pressure to 3.5Pa, temperature 550℃, rotation speed 5.5 rpm, pulse arc power waveform is rectangular wave, average current 120A, bias voltage: -500V, frequency: 250KHz, duty cycle: 70%, arc source electromagnetic coil Output current: 5.2A, deposit TiAlMoN functional layer for 100min, and obtain high-performance TiAlMoN nanocomposite coating with a coating thickness of 3μm, in which the atomic percentage of each element in the TiAlMoN-based coating is Ti: 30~50at.%, Al: 30 to 70 at.%, N: 10 to 50 at.%, Mo: 0 to 20 at.%.

本实施例制备多孔TiCN/TiAlMoN耐磨抗氧化涂层的硬度45GPa,残余应力-0.3GPa,表面粗糙度90nm,平均摩擦系数为0.36,摩擦曲线如图2所示。The porous TiCN/TiAlMoN wear-resistant and anti-oxidation coating prepared in this example has a hardness of 45GPa, a residual stress of -0.3GPa, a surface roughness of 90nm, and an average friction coefficient of 0.36. The friction curve is shown in Figure 2.

实施例2:Example 2:

在WC-Co硬质合金基体沉积这种多孔耐磨抗氧化涂层Deposition of this porous wear-resistant and oxidation-resistant coating on WC-Co cemented carbide substrates

S1、将硬质合金基体进行抛光去掉表面的氧化层,放入35℃热水浴中的溶液中进行超声波清洗30min;再采用细颗粒砂砾进行喷洒3次,每次喷2秒,喷砂压力0.8Kg/cm2,再次放入热水浴的溶液中清洗30min,再放入烘箱在60℃下烘烤20分钟;S1. Polish the cemented carbide substrate to remove the oxide layer on the surface, put it into a solution in a 35 ℃ hot water bath for ultrasonic cleaning for 30 minutes; then spray with fine-grained gravel for 3 times, each time for 2 seconds, and the blasting pressure 0.8Kg/cm 2 , put it into the solution of hot water bath again for 30min, then put it into the oven and bake it at 60℃ for 20min;

S2、将步骤S1得到的样品,装夹进炉子,抽真空升温开始制备粘结层,沉积温度为850℃,沉积压力95KPa,使用气体包括TiCl4,H2,N2和Ar,其中TiCl4由H2带入反应炉中,TiCl4的水浴温度为45℃,涂层厚度0.05μm;S2. Clamp the sample obtained in step S1 into the furnace, vacuumize and heat up to start the preparation of the bonding layer, the deposition temperature is 850°C, the deposition pressure is 95KPa, and the gases used include TiCl 4 , H 2 , N 2 and Ar, among which TiCl 4 It is brought into the reaction furnace by H 2 , the water bath temperature of TiCl 4 is 45 °C, and the coating thickness is 0.05 μm;

S3、在步骤S2的基础上开始制备多孔耐磨层,沉积温度为1000℃,沉积压力6KPa,使用气体包括TiCl4,H2,CH4,N2和Ar,其中TiCl4由H2带入反应炉中,TiCl4的水浴温度为45℃,其中涂层厚度5μm,其中的温度和气体比例是形成多孔耐磨层的关键,CH4气体流量百分比在3.5%,TiCl4气体流量百分比在1.5%。S3. The porous wear-resistant layer is prepared on the basis of step S2. The deposition temperature is 1000° C. and the deposition pressure is 6KPa. The gases used include TiCl 4 , H 2 , CH 4 , N 2 and Ar, wherein TiCl 4 is brought in by H 2 In the reaction furnace, the water bath temperature of TiCl 4 is 45°C, and the coating thickness is 5 μm. The temperature and gas ratio are the keys to forming the porous wear-resistant layer. The percentage of gas flow rate of CH 4 is 3.5%, and the percentage of gas flow rate of TiCl 4 is 1.5%. %.

S4、取出S3中的样品,重复S1。S4, take out the sample in S3, and repeat S1.

S5、将S4样品装炉,在300℃下进行中频脉冲刻蚀,将真空室抽至3.0x10-3Pa,通入Ar气350sccm,设置工件偏压-600V,频率为20k Hz,转速1.5转/min,对样品表面进行脉冲刻蚀10min,再用H2清洗炉腔;S5. Load the S4 sample into the furnace, perform intermediate frequency pulse etching at 300°C, pump the vacuum chamber to 3.0x10 -3 Pa, pass in Ar gas for 350sccm, set the workpiece bias to -600V, the frequency to 20k Hz, and the rotation speed to 1.5 rpm /min, pulse etching the sample surface for 10min, and then clean the furnace cavity with H 2 ;

S6、DC直流刻蚀:通入Ar气350sccm,调节偏压至-100,设定离子源电流为10A,转速为1.5转/min,对S5样品进行气体离子源直流刻蚀20min,再用H2清洗炉腔。S6, DC etching: pass Ar gas for 350sccm, adjust the bias voltage to -100, set the ion source current to 10A, and set the speed to 1.5 r/min, perform gas ion source DC etching on the S5 sample for 20min, and then use H 2 Clean the oven cavity.

S7、沉积TiAlVN功能层:将偏压调至-100V,通入400sccm的N2气,400sccm的Ar气,点燃至少2个TiaAlbVc矩形磁控靶、至少4个TiaAlbVc圆柱形电弧靶(靶材TiaAlbVc中的原子百分比为Ti:23at.%,Al:67at.%,a+b+c=100at.%),调节N2气压至0.5Pa,调节Ar气压至3Pa,温度450℃,转速为1.5转/min,脉冲电弧电源波形为矩形波,平均电流70A,偏压:-30V,频率:20KHz,占空比:25%,弧源电磁线圈输出电流:0.3A,沉积TiAlVN功能层300min,制得高性能TiAlVN纳米复合涂层,涂层厚度2-3μm,其中TiAlVN基涂层中各元素的原子百分比为含量为Ti:30~50at.%,Al:30~70at.%,N:10~50at.%,V:0~20at.%。S7. Deposition of TiAlVN functional layer: adjust the bias voltage to -100V, pass N 2 gas of 400 sccm, Ar gas of 400 sccm, ignite at least 2 Ti a Al b V c rectangular magnetron targets, at least 4 Ti a Al b V c cylindrical arc target (the atomic percentage in the target Ti a Al b V c is Ti: 23 at. %, Al: 67 at. %, a+b+c=100 at. %), adjust the N 2 gas pressure to 0.5Pa , adjust Ar pressure to 3Pa, temperature 450℃, speed 1.5 rpm, pulse arc power waveform is rectangular wave, average current 70A, bias voltage: -30V, frequency: 20KHz, duty cycle: 25%, arc source electromagnetic Coil output current: 0.3A, deposition of TiAlVN functional layer for 300min, to obtain high-performance TiAlVN nanocomposite coating, coating thickness 2-3μm, in which the atomic percentage of each element in the TiAlVN-based coating is Ti: 30~50at. %, Al: 30-70 at.%, N: 10-50 at.%, V: 0-20 at.%.

本实施例制备的多孔TiCN/TiAlVN耐磨抗氧化涂层的硬度46GPa,残余应力-0.32GPa,表面粗糙度85nm,平均摩擦系数为0.342,摩擦曲线如图3所示。The porous TiCN/TiAlVN wear-resistant and oxidation-resistant coating prepared in this example has a hardness of 46GPa, a residual stress of -0.32GPa, a surface roughness of 85nm, and an average friction coefficient of 0.342. The friction curve is shown in Figure 3.

实施例3:Example 3:

在WC-TiC-Co硬质合金基体沉积这种多孔耐磨抗氧化涂层Deposition of this porous wear-resistant and oxidation-resistant coating on WC-TiC-Co cemented carbide substrates

S1、将硬质合金刀具基体进行抛光去掉表面的氧化层,放入35℃热水浴中的溶液中进行超声波清洗30min;再采用细颗粒砂砾进行喷洒3次,每次喷3秒,喷砂压力1.2Kg/cm2,再次放入热水浴的溶液中清洗30min,再放入烘箱在60℃下烘烤20分钟;S1. Polish the cemented carbide tool base to remove the oxide layer on the surface, put it into a solution in a 35 ℃ hot water bath for ultrasonic cleaning for 30 minutes; then spray with fine-grained gravel for 3 times, each time for 3 seconds, sandblasting The pressure is 1.2Kg/cm 2 , put it into the solution of the hot water bath again for 30 minutes, and then put it into the oven and bake it at 60 ℃ for 20 minutes;

S2、将步骤S1得到的样品,装夹进炉子,抽真空升温开始制备粘结层,沉积温度为850℃,沉积压力95KPa,使用气体包括TiCl4,H2,N2和Ar,其中TiCl4由H2带入反应炉中,TiCl4的水浴温度为45℃,涂层厚度0.06μm;S2. Clamp the sample obtained in step S1 into the furnace, vacuumize and heat up to start the preparation of the bonding layer, the deposition temperature is 850°C, the deposition pressure is 95KPa, and the gases used include TiCl 4 , H 2 , N 2 and Ar, among which TiCl 4 The water bath temperature of TiCl 4 is 45 °C, and the coating thickness is 0.06 μm;

S3、在步骤S2的基础上开始制备多孔耐磨层,沉积温度为1000℃,沉积压力20KPa,使用气体包括TiCl4,H2,CH4,N2和Ar,其中TiCl4由H2带入反应炉中,TiCl4的水浴温度为45℃,其中涂层厚度5.3μm,其中的温度和气体比例是形成多孔耐磨层的关键,CH4气体流量百分比在3.5%,TiCl4气体流量百分比在2%。S3. The porous wear-resistant layer is prepared on the basis of step S2. The deposition temperature is 1000°C and the deposition pressure is 20KPa. The gases used include TiCl 4 , H 2 , CH 4 , N 2 and Ar, wherein TiCl 4 is brought in by H 2 In the reaction furnace, the water bath temperature of TiCl 4 is 45°C, and the coating thickness is 5.3 μm. The temperature and gas ratio are the keys to forming the porous wear-resistant layer. The percentage of CH 4 gas flow is 3.5%, and the percentage of TiCl 4 gas flow is 2%.

S4、取出S3中的样品,重复S1。S4, take out the sample in S3, and repeat S1.

S5、将S4样品装炉,在400℃下进行中频脉冲刻蚀,将真空室抽至5.0x10-3Pa,通入Ar气450sccm,设置工件偏压-800V,频率为50k Hz,转速5转/min,对样品表面进行脉冲刻蚀12min,再用H2清洗炉腔;S5. Load the S4 sample into the furnace, perform intermediate frequency pulse etching at 400°C, pump the vacuum chamber to 5.0x10 -3 Pa, pass in Ar gas for 450sccm, set the workpiece bias to -800V, the frequency to 50k Hz, and the rotation speed to 5 rpm /min, pulse etching the sample surface for 12min, and then clean the furnace cavity with H 2 ;

S6、DC直流刻蚀:通入Ar气450sccm,调节偏压至-120V,设定离子源电流为12A,转速为5转/min,对S5样品进行气体离子源直流刻蚀22min,再用H2清洗炉腔。S6, DC Etching: Pass in Ar gas for 450sccm, adjust the bias voltage to -120V, set the ion source current to 12A, and set the speed to 5 r/min. Perform the gas ion source DC etching on the S5 sample for 22min, and then use H 2 Clean the oven cavity.

S7、沉积TiAlYN功能层:将偏压调至-200V,通入450sccm的N2气,450sccm的Ar气,点燃至少2个TiaAlbYc矩形磁控靶、至少4个TiaAlbYc圆柱形电弧靶(靶材TiaAlbYc中的原子百分比为Ti:25at.%,Al:67at.%,a+b+c=100at.%),调节N2气压至1Pa,调节Ar气压至3Pa,温度480℃,转速为5转/min,脉冲电弧电源波形为矩形波,平均电流90A,偏压:-100V,频率:100KHz,占空比:50%,弧源电磁线圈输出电流:1.2A,沉积TiAlYN功能层150min,制得高性能TiAlYN纳米复合涂层,涂层厚度2μm,其中TiAlYN基涂层中各元素的原子百分比为含量为Ti:30~50at.%,Al:30~70at.%,N:10~50at.%,Y:0~20at.%。S7. Deposition of TiAlYN functional layer: adjust the bias voltage to -200V, pass N 2 gas of 450 sccm, Ar gas of 450 sccm, ignite at least 2 Ti a Al b Y c rectangular magnetron targets, at least 4 Ti a Al b Y c cylindrical arc target (the atomic percentage in the target Ti a Al b Y c is Ti: 25 at. %, Al: 67 at. %, a+b+c=100 at. %), adjust the N 2 gas pressure to 1Pa, Adjust the Ar pressure to 3Pa, the temperature to 480℃, the rotation speed to be 5 rpm, the pulse arc power waveform to be rectangular wave, the average current to be 90A, the bias voltage: -100V, the frequency: 100KHz, the duty cycle: 50%, the arc source electromagnetic coil Output current: 1.2A, deposition of TiAlYN functional layer for 150min, to obtain high-performance TiAlYN nanocomposite coating, coating thickness 2μm, in which the atomic percentage of each element in the TiAlYN-based coating is Ti: 30~50at.%, Al : 30 to 70 at.%, N: 10 to 50 at.%, Y: 0 to 20 at.%.

本实施例制备的多孔TiCN/TiAlYN耐磨抗氧化涂层的硬度50GPa,残余应力-0.22GPa,表面粗糙度80nm,平均摩擦系数为0.325,摩擦曲线如图4所示。The porous TiCN/TiAlYN wear-resistant and oxidation-resistant coating prepared in this example has a hardness of 50GPa, a residual stress of -0.22GPa, a surface roughness of 80nm, and an average friction coefficient of 0.325. The friction curve is shown in Figure 4.

本发明通过不同功能子层有机组合的多层复合涂层韧性高、耐磨、耐氧化及耐冲击,非常适合断续切削方式的加工及耐磨、抗氧化、耐振动场景,且制备工艺简单,便于工业化生产。The multi-layer composite coating organically combined with different functional sub-layers has high toughness, wear resistance, oxidation resistance and impact resistance, and is very suitable for intermittent cutting processing and wear resistance, oxidation resistance and vibration resistance scenarios, and the preparation process is simple. , which is convenient for industrial production.

本发明采用高温气相沉积+阴极电弧+HiPIMS制备方法,可以产生更高密度的等离子体,离化率更高,沉积速率更快。制备出的厚薄膜表面大颗粒明显减少,耐磨层组织成多孔结构具有较好的抗冲击、抗崩刃的效果,在高温下摩擦系数显著降低,膜基结合力更高。The present invention adopts the preparation method of high temperature vapor deposition + cathode arc + HiPIMS, which can generate higher density plasma, higher ionization rate and faster deposition rate. The large particles on the surface of the prepared thick film are significantly reduced, and the wear-resistant layer is organized into a porous structure, which has good impact resistance and anti-chipping effect.

尽管参照前述实施例对本发明进行了详细的说明,对于本领域的技术人员来说,其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。Although the present invention has been described in detail with reference to the foregoing embodiments, for those skilled in the art, it is still possible to modify the technical solutions described in the foregoing embodiments, or to perform equivalent replacements for some of the technical features. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims (10)

1. The porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating is characterized by comprising 3 sublayers, wherein the sublayers sequentially comprise a TiN bonding layer, a TiCN porous wear-resistant layer and a TiAlXN-based wear-resistant and oxidation-resistant layer from inside to outside; the total thickness of the TiCN/TiAlXN wear-resistant and oxidation-resistant coating is 7-10 mu m, the thickness of the TiN bonding layer is 0.05-0.1 mu m, the thickness of the TiCN porous wear-resistant layer is 5-7 mu m, and the thickness of the TiAlXN-based wear-resistant and oxidation-resistant layer is 2-3 mu m.
2. The porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating of claim 1, wherein: the TiAlXN-based wear-resistant anti-oxidation layer comprises the following elements in atomic percent: 30-50 at.%, Al: 30-70 at.%, N: 10-50 at.%, X: 0-20 at.%; wherein X is C, Si, Zr, Mo, V or Cr.
3. A preparation method of the porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating according to claims 1-2 is characterized in that: the method comprises the following steps:
s1, polishing the surface of the substrate, and then putting the substrate into a solution in a hot water bath at 35 ℃ for ultrasonic cleaning; spraying fine gravel for 3-5 times, wherein each time of spraying is 2-5 seconds, and the sand spraying pressure is 0.8-1.3Kg/cm 2 Cleaning in hot water bath solution for 30min, and baking in oven;
s2, clamping the sample obtained in the step S1 into a furnace, vacuumizing, heating and starting to deposit to prepare a TiN bonding layer;
s3, starting to deposit and prepare a TiCN porous wear-resistant layer on the basis of the step S2;
s4, taking out the sample in the step S3, and repeating the step S1;
s5, charging the sample obtained in the step S4 into a furnace, performing medium-frequency pulse etching at 300-500 ℃, and pumping the vacuum chamber to 3.0-10.0 x10 -3 Pa, introducing Ar gas 350-550sccm, setting the workpiece bias voltage to-600-1000V, the frequency to 20-250 k Hz, the rotating speed to 1.5-5.5 r/min, performing pulse etching on the surface of the sample for 10-15 min, and then using H 2 Cleaning the furnace chamber;
s6, introducing Ar gas of 350-550sccm, adjusting the bias voltage to-100-200V, setting the ion source current to 10-15A and the rotation speed to 1.5-5.5 rpm, performing gas ion source direct current etching on the sample obtained in the step S5 for 20-25 min, and then using H 2 Cleaning the furnace chamber;
and S7, depositing the TiAlXN-based wear-resistant and oxidation-resistant functional layer on the sample obtained in the step S6 by adopting a cathodic arc combined HiPIMS high-energy pulse magnetron sputtering technology and controlling the flow of nitrogen and argon, the pulse peak current and the deposition time parameters.
4. The preparation method of the porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating according to claim 3, characterized in that: the solution in the step S1 is acetone or alcohol; the fine granular gravel is corundum, zirconia or carborundum; the baking is specifically baking at 60 ℃ for 20 min.
5. The preparation method of the porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating according to claim 3, characterized by comprising the following steps: in the step S2 of preparing the TiN bonding layer by deposition, the deposition temperature is 850-900 ℃, the deposition pressure is 95-101KPa, and the used gas comprises TiCl 4 ,H 2 ,N 2 And Ar, wherein, TiCl 4 From H 2 Carried into a reaction furnace, TiCl 4 The temperature of the water bath is 45-48 ℃.
6. According to the claimsThe preparation method of the porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating is characterized by comprising the following steps: in the step S3 of preparing the TiCN porous wear-resistant layer by deposition, the deposition temperature is 1000-1050 ℃, the deposition pressure is 6-50KPa, and the used gas comprises TiCl 4 ,H 2 ,CH 4 ,N 2 And Ar, wherein, TiCl 4 From H 2 Carried into a reaction furnace, TiCl 4 The temperature of the water bath is 45-48 ℃.
7. The preparation method of the porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating according to claim 6, characterized in that: the CH 4 The gas flow percentage is 3.5 percent to 4 percent, TiCl 4 The gas flow percentage is 1.5% -3%.
8. The preparation method of the porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating according to claim 3, characterized in that: in the step S7, a cathodic arc and HiPIMS high-energy pulse magnetron sputtering technology is adopted, and the flow rate of nitrogen and argon, the pulse peak current and the deposition time are controlled, specifically: adjusting the bias voltage to-100 to-250V, and introducing N of 400 to 750sccm 2 Igniting at least 2 Ti with Ar gas of 400-750 sccm a Al b X c Rectangular magnetron target, at least 4 Ti a Al b X c Cylindrical arc target, regulation N 2 The pressure is 0.5-3.5 Pa, the Ar pressure is adjusted to 0.5-3.5 Pa, the deposition temperature is 450-550 ℃, the deposition pressure is 9800-10500Mpa, the rotating speed is 1.5-5.5 r/min, the waveform of a pulse arc power supply is rectangular wave, the average current is 70-120A, and the bias voltage is as follows: -30 to-500V, frequency: 20-250 KHz, duty cycle: 5% -75%, the output current of the arc source electromagnetic coil: 0.3-5.2A, depositing the TiAlXN layer for 100-300 min.
9. The preparation method of the porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating according to claim 8, characterized in that: the Ti a Al b X c The atomic percentage of Ti in the target material is 10-50 at.%, and Al: 30-67 at.%, X is C, Si, Zr, Mo, V or Cr; a + b + c is 100at.%。
10. The application of the porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating according to any one of claims 1-2 or the porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating prepared by the preparation method according to any one of claims 3-9 in the field of surface protection of mechanical parts and cutting tools and dies.
CN202210504888.7A 2022-05-10 2022-05-10 Porous composite TiCN/TiAlXN wear-resistant and oxidation-resistant coating and preparation method and application thereof Pending CN115074731A (en)

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