CN114875361A - A kind of high-adhesion metal coating and preparation process thereof - Google Patents
A kind of high-adhesion metal coating and preparation process thereof Download PDFInfo
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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Abstract
Description
技术领域technical field
本发明涉及复合涂层技术领域,特别是涉及一种高附着力金属涂层及其制备工艺。The invention relates to the technical field of composite coatings, in particular to a high-adhesion metal coating and a preparation process thereof.
背景技术Background technique
金属材料受外界物质环境的影响或者金属件间的摩擦等发生化学或机械摩擦,使金属表面发生为氧化或腐蚀,将会显著降低基底的硬度、塑性、韧性等力学性能,并破坏金属件的几何形状,增加零件的磨损,恶化电学和化学等物理性能,亟需新表面处理工艺改善金属零件的使用寿命,节约资源。The metal material is affected by the external material environment or the friction between metal parts occurs chemical or mechanical friction, so that the metal surface is oxidized or corroded, which will significantly reduce the hardness, plasticity, toughness and other mechanical properties of the substrate, and damage the metal parts. Geometry, increased wear of parts, deterioration of physical properties such as electrical and chemical, and new surface treatment processes are urgently needed to improve the service life of metal parts and save resources.
四面体非晶碳是一种无定形、无周期、过渡态的碳晶体结构,形态多样,通常按照涂层结构中氢含量、sp3键含量划分DLC和无氢DLC薄膜,四面体无氢非晶碳典型特征为氢含量极少(5%摩尔,通常≤2%摩尔)或不含氢,同时sp3键含量高达85%以上,无氢DLC的制备方法主要采用过滤阴极电弧沉积镀膜工艺、多弧离子镀膜工艺或化学气相沉积镀膜工艺中的一种或者几种。Tetrahedral amorphous carbon is an amorphous, aperiodic, transition-state carbon crystal structure with various forms. Usually, DLC and hydrogen-free DLC films are divided according to the hydrogen content and sp3 bond content in the coating structure. Tetrahedral hydrogen-free amorphous carbon The typical characteristics of carbon are that the hydrogen content is very small (5% mol, usually ≤ 2% mol) or does not contain hydrogen, and the sp3 bond content is as high as 85% or more. The preparation method of hydrogen-free DLC mainly adopts filtered cathodic arc deposition coating process, multi-arc One or more of ion plating process or chemical vapor deposition coating process.
目前金属材质的表面处理技术较多,如PIP,镀铬,DLC等各种金属件表面处理技术,较为突出的问题是涂层表面附着力不高,涂层经过机械磨损或者耐磨测试后涂层脱落严重,此问题在表处理行业中有位显著。因此基于上述原因提出表处理新的金属涂层及其制备工艺,提升金属件表面的强附着力。而本专利提出的无氢DLC膜的原材是几乎不含氢的高纯石墨靶材,含氢量少于2%mol(几乎不含氢),并含有超过90%的sp3键。选择使用磁约束过滤聚焦纯离子真空镀膜技术研制无氢DLC涂层,制成高附着力的硬质薄膜,满足市场需求降低使用成本,提升表处理行业水平。At present, there are many surface treatment technologies for metal materials, such as PIP, chrome plating, DLC and other surface treatment technologies for various metal parts. The more prominent problem is that the surface adhesion of the coating is not high. The shedding is serious, and this problem is significant in the table processing industry. Therefore, based on the above reasons, a new surface treatment metal coating and its preparation process are proposed to improve the strong adhesion on the surface of metal parts. The raw material of the hydrogen-free DLC film proposed in this patent is a high-purity graphite target material that contains almost no hydrogen, contains less than 2% mol of hydrogen (almost no hydrogen), and contains more than 90% of sp3 bonds. Choose to use magnetic confinement filtration focusing pure ion vacuum coating technology to develop hydrogen-free DLC coating, make a hard film with high adhesion, meet market demand, reduce use cost, and improve the level of surface treatment industry.
发明内容SUMMARY OF THE INVENTION
针对上述现有技术的不足,本专利申请所要解决的技术问题是如何提供一种增强基底的附着力和薄膜硬度,提升基底机械耐磨性能和抗腐蚀性,延长使用寿命,降低成本的高附着力金属涂层及其制备工艺。In view of the above-mentioned deficiencies of the prior art, the technical problem to be solved by this patent application is how to provide a high adhesion and film hardness that enhances the adhesion and film hardness of the substrate, improves the mechanical wear resistance and corrosion resistance of the substrate, prolongs the service life, and reduces the cost. Focus on metal coating and its preparation process.
为了解决上述技术问题,本发明采用了如下的技术方案:In order to solve the above-mentioned technical problems, the present invention adopts the following technical solutions:
一种高附着力金属涂层,包括:A high adhesion metal coating comprising:
基底;base;
打底层,其沉积在所述基底上,使用PVD法沉积Ni、Cr、Ti、W、Si或其混合物或其氮化物或其碳化物组成一层或几层的高结合力膜;A primer layer, which is deposited on the substrate, uses PVD to deposit Ni, Cr, Ti, W, Si or their mixtures or their nitrides or their carbides to form one or several layers of high-bonding films;
金属层,其沉积在打底层上,使用PVD沉积Ni、Cr、Ti、W、Si或其混合物或其氮化物或其碳化物组成一层或几层的金属连接层;Metal layer, which is deposited on the base layer, using PVD to deposit Ni, Cr, Ti, W, Si or their mixtures or their nitrides or their carbides to form one or several metal connection layers;
过渡层,其沉积在金属层上,包括第一过渡层和第二过渡层,使用FCVA法沉积,所述第一过渡层和第二过渡层均包含一种基本元素氮化物或碳化物;a transition layer, deposited on the metal layer, comprising a first transition layer and a second transition layer, deposited using the FCVA method, the first transition layer and the second transition layer each comprising an essential element nitride or carbide;
功能交替层,其沉积在过渡层上,采用FCVA法沉积,其包含一种基本元素氮化物或碳化物,在第二过渡层表面附着交替设置的功能交替层;A functional alternating layer, which is deposited on the transition layer, is deposited by the FCVA method, and comprises a basic element nitride or carbide, and the alternately arranged functional alternating layers are attached on the surface of the second transition layer;
功能超硬层,其沉积在功能交替层上,采用FCVA法沉积,其包含一种基本元素氮化物或碳化物。The functional superhard layer, which is deposited on the functional alternating layer, is deposited using the FCVA method, which contains a basic element nitride or carbide.
其中,所述基底为不锈钢、高速钢、合金钢、钛合金或铝合金。Wherein, the substrate is stainless steel, high-speed steel, alloy steel, titanium alloy or aluminum alloy.
其中,所述第一过渡层、第二过渡层、功能交替层和功能超硬层均为无氢DLC涂层,所述无氢DLC涂层中氢含量少于2%,sp3键含量大于90%。Wherein, the first transition layer, the second transition layer, the functional alternate layer and the functional superhard layer are all hydrogen-free DLC coatings, the hydrogen content in the hydrogen-free DLC coating is less than 2%, and the sp 3 bond content is greater than 90%.
其中,所述金属涂层的总厚度在1-5um,硬度为2500-4000Hv。Wherein, the total thickness of the metal coating is 1-5um, and the hardness is 2500-4000Hv.
一种高附着力金属涂层的制备工艺,包括以下步骤:A preparation process of a high-adhesion metal coating, comprising the following steps:
S1:选择基底:不锈钢、高速钢、合金钢、钛合金或铝合金为基底零件,并利用装夹夹具将基底零件装夹在抽至真空的腔室内镀膜,镀膜工装为三级自转;S1: Select the base: stainless steel, high-speed steel, alloy steel, titanium alloy or aluminum alloy as the base part, and use the clamping fixture to clamp the base part in the vacuumed chamber for coating, and the coating tool is three-level rotation;
S2:在基底上沉积打底层,在特定偏压一作用下使用PVD法沉积Ni、Cr、Ti、W、Si或其混合物或其氮化物或其碳化物组成一层或几层的高结合力膜;S2: deposit a primer layer on the substrate, and use PVD method to deposit Ni, Cr, Ti, W, Si or its mixture or its nitride or its carbide to form one or several layers of high bonding force under the action of a specific bias membrane;
S3:在打底层上沉积金属层,在特定偏压二下使用PVD沉积Ni、Cr、Ti、W、Si或其混合物或其氮化物或其碳化物组成一层或几层的金属连接层;S3: deposit a metal layer on the base layer, and use PVD to deposit Ni, Cr, Ti, W, Si or their mixtures or their nitrides or their carbides under a specific bias voltage to form one or several metal connection layers;
S4:在金属层上沉积第一过渡层和第二过渡层,使用FCVA法在特定第一偏压下沉积第一过渡层,包含一种基本元素氮化物或碳化物的第一过渡层;使用FCVA法沉积第二偏压下的第二过渡层,包含一种基本元素氮化物或碳化物的第二过渡层;S4: depositing a first transition layer and a second transition layer on the metal layer, using the FCVA method to deposit a first transition layer under a specific first bias, comprising a first transition layer of a basic element nitride or carbide; using depositing a second transition layer under a second bias voltage by FCVA method, comprising a second transition layer of a basic element nitride or carbide;
S5:在第二过渡层上沉积功能交替层,使用FCVA法沉积第三偏压下的功能交替层,在第二过渡层表面附着几层交替的功能交替层,包含一种基本元素氮化物或碳化物的功能交替层;S5: depositing a functional alternating layer on the second transition layer, using the FCVA method to deposit a functional alternating layer under a third bias voltage, and attaching several alternating functional alternating layers on the surface of the second transition layer, containing a basic element nitride or Functionally alternating layers of carbides;
S6:在功能交替层上沉积功能超硬层,使用CVA法沉积第四偏压下的功能超硬层,包含一种基本元素氮化物或碳化物的功能超硬。S6: depositing a functional superhard layer on the functionally alternating layer, using the CVA method to deposit a functional superhard layer under a fourth bias, including a functional superhard layer of a basic element nitride or carbide.
综上,本高附着力金属涂层及其制备工艺,采用新型离子刻蚀工艺并加热在130°-150℃之间对基材表面具有最佳的清洗效果,以增强打底层与基底材料的附着力,可显著提高膜层结合力。发明中提供的一种高附着力金属涂层及其制备工艺,使用磁约束过滤聚焦纯离子镀膜技术,在高真空状态下镀制无氢DLC膜多层功能交替的硬质功能薄膜,该工艺不仅提高基材表面的硬度,膜层均匀性好,同时具有较强的机械耐磨性和耐环境性能。In conclusion, the high-adhesion metal coating and its preparation process, using a new ion etching process and heating between 130°-150°C, have the best cleaning effect on the surface of the substrate, so as to enhance the bonding between the primer layer and the substrate material. Adhesion, which can significantly improve the bonding force of the film layer. The invention provides a high-adhesion metal coating and a preparation process thereof. The magnetic confinement filtration focusing pure ion coating technology is used to coat a hydrogen-free DLC film in a high vacuum state with a rigid functional film with alternating multi-layer functions. It not only improves the hardness of the surface of the substrate, but also has good uniformity of the film layer, and has strong mechanical wear resistance and environmental resistance.
附图说明Description of drawings
图1为本发明所述的一种高附着力金属涂层的示意图。FIG. 1 is a schematic diagram of a high-adhesion metal coating according to the present invention.
具体实施方式Detailed ways
下面结合附图对本发明作进一步的详细说明。在本发明的描述中,需要理解的是,方位词如“上、下”和“顶、底”等所指示的方位或位置关系通常是基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,在未作相反说明的情况下,这些方位词并不指示和暗示所指的装置或元件必须具有特定的方位或者以特定的方位构造和操作,因此不能理解为对本发明保护范围的限制;方位词“内、外”是指相对于各部件本身的轮廓的内外。The present invention will be further described in detail below in conjunction with the accompanying drawings. In the description of the present invention, it should be understood that the orientation or positional relationship indicated by the orientation words such as "upper, lower" and "top, bottom" is usually based on the orientation or positional relationship shown in the accompanying drawings, only for the purpose of For the convenience of describing the present invention and simplifying the description, in the absence of the contrary, these directional words do not indicate or imply that the device or element referred to must have a particular orientation or be constructed and operated in a particular orientation, and therefore should not be construed as a reference to the present invention. Limitation of the protection scope of the invention; the orientation words "inside and outside" refer to the inside and outside relative to the contour of each component itself.
一种高附着力金属涂层,包括:A high adhesion metal coating comprising:
基底,基底为不锈钢、高速钢、合金钢、钛合金或铝合金;Substrate, the substrate is stainless steel, high-speed steel, alloy steel, titanium alloy or aluminum alloy;
打底层,其沉积在所述基底上,第一偏压下使用PVD法沉积Ni、Cr、Ti、W、Si或其混合物或其氮化物或其碳化物组成一层或几层的高结合力膜;膜厚一般为0.1-1um;A primer layer, which is deposited on the substrate, using PVD to deposit Ni, Cr, Ti, W, Si or their mixtures or their nitrides or their carbides to form one or more layers of high bonding force under a first bias film; film thickness is generally 0.1-1um;
金属层,其沉积在打底层上,第二偏压下使用PVD沉积Ni、Cr、Ti、W、Si或其混合物或其氮化物或其碳化物组成一层或几层的金属连接层;膜厚一般为0.1-0.5um;A metal layer, which is deposited on the primer layer, using PVD to deposit Ni, Cr, Ti, W, Si or mixtures thereof or their nitrides or their carbides to form one or more metal connection layers under a second bias; Thickness is generally 0.1-0.5um;
使用PVD法沉积的打底层和金属层的第一偏压和第二偏压在结构和硬度上具有关联性和奠基性。The first bias voltage and the second bias voltage of the primer layer and metal layer deposited by the PVD method are related and foundational in structure and hardness.
过渡层,其沉积在金属层上,包括第一过渡层和第二过渡层,分别在第一偏压下和第二偏压下使用FCVA法沉积,所述第一过渡层和第二过渡层均包含一种基本元素氮化物或碳化物;第一过渡层膜厚在0.2um或其他,第一过渡层涂层硬度在1400Hv或其他;第二过渡层膜厚在0.3um或其他,第二过渡层涂层硬度可在1900Hv或其他。A transition layer deposited on the metal layer, including a first transition layer and a second transition layer, deposited using the FCVA method under a first bias voltage and a second bias voltage, respectively, the first transition layer and the second transition layer Both contain a basic element nitride or carbide; the thickness of the first transition layer is 0.2um or other, the hardness of the first transition layer coating is 1400Hv or other; the thickness of the second transition layer is 0.3um or other, the second The hardness of the transition layer coating can be 1900Hv or others.
功能交替层,其沉积在过渡层上,第三偏压下采用FCVA法沉积,其包含一种基本元素氮化物或碳化物,在第二过渡层表面附着交替设置的功能交替层;功能交替层膜厚在0.8um或其他,其功能交替层硬度可在2500Hv或其他。A functional alternating layer, which is deposited on the transition layer, is deposited by the FCVA method under the third bias, and comprises a basic element nitride or carbide, and alternately arranged functional alternating layers are attached on the surface of the second transition layer; the functional alternating layer The film thickness is 0.8um or other, and the hardness of its functional alternating layer can be 2500Hv or other.
功能超硬层,其沉积在功能交替层上,第四偏压下采用FCVA法沉积,其包含一种基本元素氮化物或碳化物。功能超硬层膜厚在1.2um或其他,其功能超硬层可在3200Hv或其他。The functional superhard layer, which is deposited on the functional alternating layer, is deposited by the FCVA method under the fourth bias, and which comprises a basic element nitride or carbide. The thickness of the functional superhard layer is 1.2um or other, and the functional superhard layer can be 3200Hv or others.
使用FCVA法沉积的过渡层、功能交替层和功能超硬层的第一偏压、第二偏压、第三偏压和第四偏压在结构和硬度上存在关联性和奠基性,杨氏模量和硬度随着涂层顺序保持稳定或独立变化。The first bias, the second bias, the third bias and the fourth bias of the transition layer, the functional alternating layer and the functional superhard layer deposited by the FCVA method are related and foundational in structure and hardness, Young's Modulus and hardness remain stable or vary independently with coating sequence.
其中,所述第一过渡层、第二过渡层、功能交替层和功能超硬层均为无氢DLC涂层,所述无氢DLC涂层中氢含量少于2%,sp3键含量大于90%。Wherein, the first transition layer, the second transition layer, the functional alternating layer and the functional superhard layer are all hydrogen-free DLC coatings, the hydrogen content in the hydrogen-free DLC coating is less than 2%, and the sp3 bond content is greater than 90% %.
打底层膜厚在0.6um或其他,其与基底强附着力的涂层硬度在700Hv或其他。The thickness of the primer layer is 0.6um or other, and the hardness of the coating with strong adhesion to the substrate is 700Hv or other.
金属层膜厚在0.3um或其他,其金属层硬度在800Hv或其他。The thickness of the metal layer is 0.3um or other, and the hardness of the metal layer is 800Hv or other.
第一过渡层膜厚在0.2um或其他,其第一过渡层硬度在1400Hv或其他。The thickness of the first transition layer is 0.2um or other, and the hardness of the first transition layer is 1400Hv or other.
第二过渡层膜厚在0.3um或其他,其第二过渡层层硬度可在1900Hv或其他。The thickness of the second transition layer is 0.3um or others, and the hardness of the second transition layer can be 1900Hv or others.
功能交替层膜厚在0.8um或其他,其功能交替层硬度可在2500Hv或其他。The thickness of the functional alternate layer is 0.8um or others, and the hardness of the functional alternate layer can be 2500Hv or others.
功能超硬层膜厚在1.2um或其他,其功能超硬层硬度可在3200Hv或其他。The thickness of the functional superhard layer is 1.2um or others, and the hardness of the functional superhard layer can be 3200Hv or others.
工艺膜厚可达5um或其他,其涂层硬度也可达3500Hv以上或其他。The process film thickness can reach 5um or others, and the coating hardness can also reach 3500Hv or more.
真空镀膜设备腔室内设有转架,镀件可实现二、三级自转调整,涂层均匀性可控,且均匀性在5%以内。The vacuum coating equipment chamber is provided with a turret, the coating parts can be adjusted by two or three levels of rotation, and the uniformity of the coating is controllable, and the uniformity is within 5%.
其中,所述金属涂层的总厚度在1-5um,硬度为2500-4000Hv。Wherein, the total thickness of the metal coating is 1-5um, and the hardness is 2500-4000Hv.
一种高附着力金属涂层的制备工艺,包括以下步骤:A preparation process of a high-adhesion metal coating, comprising the following steps:
S1:选择基底:不锈钢、高速钢、合金钢、钛合金或铝合金为基底零件,并利用装夹夹具将基底零件装夹在抽至真空的腔室内镀膜,镀膜工装为三级自转;S1: Select the base: stainless steel, high-speed steel, alloy steel, titanium alloy or aluminum alloy as the base part, and use the clamping fixture to clamp the base part in the vacuumed chamber for coating, and the coating tool is three-level rotation;
S2:在基底上沉积打底层,在特定偏压一作用下使用PVD法沉积Ni、Cr、Ti、W、Si或其混合物或其氮化物或其碳化物组成一层或几层的高结合力膜;S2: deposit a primer layer on the substrate, and use PVD method to deposit Ni, Cr, Ti, W, Si or its mixture or its nitride or its carbide to form one or several layers of high bonding force under the action of a specific bias membrane;
S3:在打底层上沉积金属层,在特定偏压二下使用PVD沉积Ni、Cr、Ti、W、Si或其混合物或其氮化物或其碳化物组成一层或几层的金属连接层;S3: deposit a metal layer on the base layer, and use PVD to deposit Ni, Cr, Ti, W, Si or their mixtures or their nitrides or their carbides under a specific bias voltage to form one or several metal connection layers;
S4:在金属层上沉积第一过渡层和第二过渡层,使用FCVA法在特定第一偏压下沉积第一过渡层,包含一种基本元素氮化物或碳化物的第一过渡层;使用FCVA法沉积第二偏压下的第二过渡层,包含一种基本元素氮化物或碳化物的第二过渡层;S4: depositing a first transition layer and a second transition layer on the metal layer, using the FCVA method to deposit a first transition layer under a specific first bias, comprising a first transition layer of a basic element nitride or carbide; using depositing a second transition layer under a second bias voltage by FCVA method, comprising a second transition layer of a basic element nitride or carbide;
S5:在第二过渡层上沉积功能交替层,使用FCVA法沉积第三偏压下的功能交替层,在第二过渡层表面附着几层交替的功能交替层,包含一种基本元素氮化物或碳化物的功能交替层;S5: depositing a functional alternating layer on the second transition layer, using the FCVA method to deposit a functional alternating layer under a third bias voltage, and attaching several alternating functional alternating layers on the surface of the second transition layer, containing a basic element nitride or Functionally alternating layers of carbides;
S6:在功能交替层上沉积功能超硬层,使用CVA法沉积第四偏压下的功能超硬层,包含一种基本元素氮化物或碳化物的功能超硬。S6: depositing a functional superhard layer on the functionally alternating layer, using the CVA method to deposit a functional superhard layer under a fourth bias, including a functional superhard layer of a basic element nitride or carbide.
本发明提供了一种高附着力金属涂层及其制备工艺,基底采用硬质合金材料,由内而外依次在基底表面进行离子刻蚀,清洁基材表面;使用磁控溅射沉积镀制打底层(如Cr、NiCr层);金属层亦采用磁控溅射沉积(如Ti、TiC层);功能层均由磁约束过滤聚焦纯离子镀膜技术镀制多层交替的无氢-DLC膜,由以上主要工艺顺序组成多层交替无氢-DLC膜高附着力金属涂层。The invention provides a high-adhesion metal coating and a preparation process thereof. The base is made of hard alloy material, and ion etching is sequentially performed on the surface of the base from the inside to the outside to clean the surface of the base; The bottom layer (such as Cr, NiCr layer); the metal layer is also deposited by magnetron sputtering (such as Ti, TiC layer); the functional layer is coated by the magnetic confinement filter focusing pure ion coating technology. , which consists of the above-mentioned main process sequence of multi-layer alternating hydrogen-free-DLC film high-adhesion metal coating.
实施例1Example 1
本发明提供了一种高附着力金属涂层及其制备工艺,其中一种具体实施的镀膜膜系方案(如图1所示)是:基底/Cr/NiCr/Ti/TiC/无氢DLC/Air;The invention provides a high-adhesion metal coating and a preparation process thereof, wherein a specific implementation of the coating film system scheme (as shown in Figure 1) is: substrate/Cr/NiCr/Ti/TiC/hydrogen-free DLC/ Air;
基底采用硬质合金材料制成,其中打底层一Cr的厚度为0.3um,打底层二NiCr的厚度为0.5um;Ti层的膜厚为0.2um,TiC层的膜厚为0.3um,多层交替无氢DLC层的厚度为2.5um,膜层总厚度为3.8um。The base is made of cemented carbide material, in which the thickness of the first layer of Cr is 0.3um, the thickness of the second layer of NiCr is 0.5um; the thickness of the Ti layer is 0.2um, the thickness of the TiC layer is 0.3um, and the multilayer The thickness of the alternating hydrogen-free DLC layers is 2.5um, and the total film thickness is 3.8um.
本实例的镀膜工艺过程和制备方法如下所述:The coating process and preparation method of this example are as follows:
使用全自动超声波清洗机以最佳的超洗工艺将高速钢基底清洗干净,并使用三级自转工装装夹在纯离子镀膜机的高真空环境中。在炉温为100°-130°,真空度为3*10-3Pa环境下,使用IBM对基材表面进行离子刻蚀,清洁基材表面以提高膜层附着力。The high-speed steel substrate is cleaned with the best ultra-cleaning process using a fully automatic ultrasonic cleaning machine, and clamped in a high vacuum environment of a pure ion coating machine using a three-stage rotation tooling. Under the environment of furnace temperature of 100°-130° and vacuum degree of 3*10 -3 Pa, IBM was used to ion-etch the surface of the substrate to clean the surface of the substrate to improve the adhesion of the film.
将镀膜机腔室的真空抽至3*10-3Pa以下、腔室温度约100-130℃的工作气体环境中,首先使用磁控溅射做打底层沉积,将Cr靶材在外加偏压一的条件下溅射镀膜在基材表面,将会在衬底上得到高附着力的Cr膜层,接着在特定外加偏压二的条件下进行NiCr层的磁控溅射,进一步提升Cr的结合力;然后使用磁控溅射进行金属层沉积,在特定外加偏压三的条件进行Ti层的溅射镀膜,在进行金属层过渡层的磁控溅射沉积TiC,以提升金属层和无氢DLC层的附着力;最后使用FCV法沉积无氢DLC层,将使用磁约束过滤聚焦纯离子镀膜技术在真空度2*10-3Pa以下、在室温温度下的工作气体环境中作用于碳靶上,将会在过渡层表面特定外加不同偏压的条件下沉积高纯度的无氢-DLC膜层,通过调整镀膜工艺参数等实现多层无氢-DLC膜的偏压差异下进行交替镀制,沉积完成后此膜层将成为高附着力的硬质功能薄膜。The vacuum of the coating machine chamber is evacuated to below 3*10 -3 Pa, and the chamber temperature is about 100-130 ℃ in the working gas environment. First, magnetron sputtering is used for the bottom layer deposition, and the Cr target is biased under the external voltage. Under the condition of 1, sputtering the coating on the surface of the substrate will obtain a Cr film with high adhesion on the substrate. Then, under the condition of a specific external bias voltage 2, the magnetron sputtering of the NiCr layer will be carried out to further improve the Cr film. Bonding force; then use magnetron sputtering to deposit the metal layer, perform sputtering coating of the Ti layer under the condition of a specific external bias voltage 3, and deposit TiC by magnetron sputtering of the transition layer of the metal layer to improve the metal layer and the free Adhesion of the hydrogen DLC layer; finally, the hydrogen-free DLC layer is deposited by the FCV method, and the magnetic confinement filtration focusing pure ion coating technology will be used to act on the carbon in a working gas environment with a vacuum degree of 2*10 -3 Pa or less at room temperature On the target, a high-purity hydrogen-free-DLC film will be deposited on the surface of the transition layer under the condition of applying different bias voltages. By adjusting the coating process parameters, the multi-layer hydrogen-free-DLC film will be alternately plated under the bias voltage difference. After the deposition is completed, the film layer will become a hard functional film with high adhesion.
本发明的实例中无氢-DLC膜层的SP3键含量高达90%以上,石墨靶的纯度在99.999%以上,结合多层交替的功能层成为附着力极高耐磨的硬质薄膜。其中磁控溅射靶材的的纯度均为99.999%以上的高纯度靶材。In the example of the present invention, the SP 3 bond content of the hydrogen-free-DLC film layer is as high as 90% or more, and the purity of the graphite target is more than 99.999%. Combined with multiple alternating functional layers, it becomes a hard film with extremely high adhesion and wear resistance. Among them, the purity of the magnetron sputtering targets are all high-purity targets of more than 99.999%.
现对上述制得的无氢DLC硬质薄膜的试块进行以下性能测试进行检测,检测结果如下:Now the test block of the above-mentioned hydrogen-free DLC hard film is carried out the following performance tests to detect, and the test results are as follows:
综上,本发明的高附着力硬质薄膜镀膜工艺,在真空腔室内的工件盘上实现三级自转,膜层均匀性好,附着力牢固,硬度高,耐腐蚀性强,加工良率高,成本底,效率高,是一种值得推广的高附着力硬质功能薄膜。In summary, the high-adhesion hard film coating process of the present invention realizes three-level rotation on the workpiece disk in the vacuum chamber, and has good film uniformity, firm adhesion, high hardness, strong corrosion resistance, and high processing yield. , low cost, high efficiency, is a high-adhesion hard functional film worthy of promotion.
最后应说明的是:本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等统计数的范围之内,则本发明也意图包含这些改动和变型。Finally, it should be noted that those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, provided that these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
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