CN114864796A - Ultraviolet device packaging structure and manufacturing method - Google Patents
Ultraviolet device packaging structure and manufacturing method Download PDFInfo
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- CN114864796A CN114864796A CN202210780387.1A CN202210780387A CN114864796A CN 114864796 A CN114864796 A CN 114864796A CN 202210780387 A CN202210780387 A CN 202210780387A CN 114864796 A CN114864796 A CN 114864796A
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- 238000004806 packaging method and process Methods 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 53
- 230000005496 eutectics Effects 0.000 claims abstract description 27
- 230000001681 protective effect Effects 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 7
- 238000003466 welding Methods 0.000 claims abstract description 6
- 239000004020 conductor Substances 0.000 claims description 6
- 239000007888 film coating Substances 0.000 claims description 4
- 238000009501 film coating Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 abstract description 23
- 238000004659 sterilization and disinfection Methods 0.000 abstract description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 6
- 238000005538 encapsulation Methods 0.000 abstract description 4
- 230000002708 enhancing effect Effects 0.000 abstract description 4
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 4
- 239000011261 inert gas Substances 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 10
- 230000005855 radiation Effects 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000001954 sterilising effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- JVPLOXQKFGYFMN-UHFFFAOYSA-N gold tin Chemical compound [Sn].[Au] JVPLOXQKFGYFMN-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/855—Optical field-shaping means, e.g. lenses
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/8506—Containers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/855—Optical field-shaping means, e.g. lenses
- H10H20/856—Reflecting means
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/857—Interconnections, e.g. lead-frames, bond wires or solder balls
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
- H10H20/0363—Manufacture or treatment of packages of optical field-shaping means
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
- H10H20/0364—Manufacture or treatment of packages of interconnections
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Abstract
本发明公开一种紫外器件封装结构,包括芯片、透镜以及基板,芯片设置于透镜的聚光型的容置孔内,芯片能够利用第一导通元件与外部元件导通,基板封堵容置孔,将芯片封装于封装腔体内,且封装腔体内填充有保护气体,保护气体可选择氮气等惰性气体,避免芯片受到大气影响,从而提高深紫外发光二极管辐射能量,增强提高深紫外发光二极管的杀菌消毒效果。与此同时,本发明还提供一种上述紫外器件封装结构的制作方法,利用共晶炉将保护气体进入基板与透镜之间,并使第一导通元件与透镜实现共晶焊接,将芯片和保护气体封装在封装腔体内,从而有效避免大气对芯片的影响,提高深紫外发光二极管的性能。
The invention discloses an ultraviolet device packaging structure, comprising a chip, a lens and a substrate. The chip is arranged in a concentrating accommodating hole of the lens, the chip can be connected to external elements by using a first conducting element, and the substrate is blocked and accommodated. The chip is packaged in the package cavity, and the package cavity is filled with protective gas. The protective gas can be selected from inert gas such as nitrogen to prevent the chip from being affected by the atmosphere, thereby increasing the radiant energy of the deep ultraviolet light emitting diode and enhancing the efficiency of the deep ultraviolet light emitting diode. Sterilization and disinfection effect. At the same time, the present invention also provides a method for manufacturing the above-mentioned ultraviolet device packaging structure, which uses an eutectic furnace to introduce a protective gas between the substrate and the lens, and enables the first conducting element and the lens to achieve eutectic welding, and the chip and the lens are eutectic. The protective gas is encapsulated in the encapsulation cavity, thereby effectively avoiding the influence of the atmosphere on the chip and improving the performance of the deep ultraviolet light emitting diode.
Description
技术领域technical field
本发明涉及半导体封装技术领域,特别是涉及一种紫外器件封装结构及制作方法。The invention relates to the technical field of semiconductor packaging, in particular to a packaging structure and a manufacturing method of an ultraviolet device.
背景技术Background technique
深紫外发光二极管(UVC LED)是波长在220nm至350nm之间的高功率深紫外线发光二极管,深紫外发光二极管具有可靠性高,寿命长,反应快,功耗低,环保无污染,体型小等优势,在杀菌、净水、医疗、高密度光纪录、高显色性led照明以及高速分解处理公害物质等领域有广泛应用。Deep ultraviolet light emitting diode (UVC LED) is a high power deep ultraviolet light emitting diode with a wavelength between 220nm and 350nm. The deep ultraviolet light emitting diode has high reliability, long life, fast response, low power consumption, environmental protection, no pollution, small size, etc. Advantages, it is widely used in the fields of sterilization, water purification, medical treatment, high-density optical recording, high color rendering LED lighting and high-speed decomposition and treatment of pollution substances.
值得注意的是,由于深紫外发光二极管芯片材料与结构,目前深紫外发光二极管芯片正面TE出光弱于侧面TM出光辐射能量,深紫外发光二极管LED芯片封装好器件之后,被广泛应用于水杀菌消毒、空气杀菌消毒、表面杀菌消毒等领域。现有技术中深紫外发光二极管芯片封装,受到大气影响导致性能下降,无法输出更高的深紫外辐射能量,降低了杀菌消毒效果。It is worth noting that due to the material and structure of the deep ultraviolet light emitting diode chip, the current TE output of the deep ultraviolet light emitting diode chip is weaker than the side TM light radiant energy. After the deep ultraviolet light emitting diode LED chip is packaged, it is widely used in water sterilization and disinfection. , air sterilization, surface sterilization and other fields. In the prior art, the package of the deep ultraviolet light emitting diode chip is affected by the atmosphere, resulting in performance degradation, and cannot output higher deep ultraviolet radiation energy, thereby reducing the sterilization and disinfection effect.
因此,如何改变现有技术中,深紫外发光二极管芯片受大气影响导致性能下降、以及芯片侧面TM出光辐射能量封装提取难度大的现状,成为了本领域技术人员亟待解决的问题。Therefore, how to change the current situation in the prior art that the performance of the deep ultraviolet light emitting diode chip is degraded due to the influence of the atmosphere, and the difficulty in packaging and extracting the TM light-emitting radiation energy from the side of the chip has become an urgent problem to be solved by those skilled in the art.
发明内容SUMMARY OF THE INVENTION
本发明的目的是提供一种紫外器件封装结构及制作方法,以解决上述现有技术存在的问题,避免芯片受大气影响,提高深紫外发光二极管辐射能量。The purpose of the present invention is to provide an ultraviolet device packaging structure and a manufacturing method, so as to solve the above-mentioned problems in the prior art, avoid the chip being affected by the atmosphere, and improve the radiation energy of the deep ultraviolet light emitting diode.
为实现上述目的,本发明提供了如下方案:本发明提供一种紫外器件封装结构,包括:In order to achieve the above purpose, the present invention provides the following solutions: the present invention provides a UV device packaging structure, comprising:
芯片;chip;
透镜,所述透镜具有容置孔,所述芯片设置于所述容置孔内;a lens, the lens has an accommodating hole, and the chip is arranged in the accommodating hole;
基板,所述基板上设置第一导通元件,所述第一导通元件与所述芯片相连,所述芯片能够利用所述第一导通元件与外部元件导通,且所述基板利用所述第一导通元件与所述透镜密封连接,所述基板封堵所述容置孔形成密闭的封装腔体,所述封装腔体内填充保护气体。A substrate, on which a first conduction element is arranged, the first conduction element is connected to the chip, the chip can be connected to an external element by the first conduction element, and the substrate uses all the The first conducting element is sealedly connected to the lens, the substrate blocks the accommodating hole to form a sealed package cavity, and the package cavity is filled with protective gas.
优选地,所述第一导通元件为分体式结构,所述第一导通元件包括导通板和连接板,所述导通板的数量为两片,两片所述导通板分别与所述芯片相连,且两片所述导通板之间具有间隙,所述导通板由导电材质制成,所述连接板连接所述基板与所述透镜。Preferably, the first conducting element has a split structure, the first conducting element includes a conducting plate and a connecting plate, the number of the conducting plates is two, and the two conducting plates are respectively connected to The chips are connected, and there is a gap between the two conducting plates, the conducting plates are made of conductive material, and the connecting plates are connected to the substrate and the lens.
优选地,所述连接板为环状结构,所述透镜具有与所述连接板相适配的凸台,所述凸台伸入所述连接板的中空部并与所述基板相抵。Preferably, the connecting plate is an annular structure, and the lens has a boss adapted to the connecting plate, the boss extending into the hollow part of the connecting plate and abutting against the base plate.
优选地,所述透镜具有连接结构层,所述连接结构层为环状,所述连接结构层环绕所述凸台设置,所述连接结构层与所述连接板焊接相连。Preferably, the lens has a connection structure layer, the connection structure layer is annular, the connection structure layer is arranged around the boss, and the connection structure layer is connected to the connection plate by welding.
优选地,所述基板还连接有第二导通元件,所述基板位于所述第一导通元件与所述第二导通元件之间,所述第二导通元件由导电材质制成,所述第二导通元件的数量为两组,所述第二导通元件与所述导通板相连且一一对应,两组所述第二导通元件之间具有间隙。Preferably, the substrate is further connected with a second conducting element, the substrate is located between the first conducting element and the second conducting element, and the second conducting element is made of a conductive material, The number of the second conducting elements is two groups, the second conducting elements are connected with the conducting plates and correspond one-to-one, and there is a gap between the two groups of the second conducting elements.
优选地,所述第二导通元件利用连接柱与所述导通板相连,所述基板具有通孔,所述连接柱穿过所述通孔连接所述导通板与所述第二导通元件。Preferably, the second conducting element is connected to the conducting plate by connecting posts, the substrate has through holes, and the connecting posts pass through the through holes to connect the conducting plate and the second conducting plate pass element.
优选地,所述第二导通元件连接有焊盘,所述焊盘的数量为两组,所述焊盘与所述第二导通元件一一对应,两组所述焊盘之间具有间隙。Preferably, the second conduction element is connected with pads, the number of the pads is two groups, the pads are in one-to-one correspondence with the second conduction element, and there are two groups of the pads between the two groups. gap.
优选地,所述透镜远离所述基板的一端为球状结构,所述容置孔为圆台状结构,所述容置孔的底面为入射面,所述容置孔的开口直径较所述入射面的直径小,所述容置孔的锥面侧壁为聚光面。Preferably, one end of the lens away from the substrate is a spherical structure, the accommodating hole is a truncated truncated structure, the bottom surface of the accommodating hole is an incident surface, and the opening diameter of the accommodating hole is larger than that of the incident surface The diameter of the accommodating hole is small, and the tapered side wall of the accommodating hole is a light-gathering surface.
优选地,所述聚光面设置有紫外光线高反射薄膜镀层。Preferably, the light-collecting surface is provided with a high-reflection film coating for ultraviolet light.
本发明还提供一种上述的紫外器件封装结构的制作方法,将所述芯片放入所述容置孔中,将所述透镜与所述基板相抵,将所述芯片、所述透镜以及所述基板放入共晶炉中,对所述共晶炉进行抽真空,然后向所述共晶炉内充入所述保护气体,所述保护气体进入所述容置孔中,控制所述共晶炉的温度,通过所述第一导通元件使所述透镜与所述基板实现共晶焊接,所述基板与所述透镜连接后封堵所述容置孔并形成所述封装腔体,所述芯片以及所述保护气体被封装在所述封装腔体内。The present invention also provides a method for fabricating the above-mentioned UV device packaging structure. The substrate is put into the eutectic furnace, the eutectic furnace is evacuated, and then the protective gas is filled into the eutectic furnace, and the protective gas enters the accommodating hole to control the eutectic the temperature of the furnace, the lens and the substrate are eutectic welded through the first conducting element, the substrate and the lens are connected to block the accommodating hole and form the packaging cavity, so The chip and the protective gas are encapsulated in the encapsulation cavity.
本发明相对于现有技术取得了以下技术效果:本发明的紫外器件封装结构,包括芯片、透镜以及基板,透镜具有容置孔,芯片设置于容置孔内;基板上设置第一导通元件,第一导通元件与芯片相连,芯片能够利用第一导通元件与外部元件导通,且基板利用第一导通元件与透镜密封连接,基板封堵容置孔形成密闭的封装腔体,封装腔体内填充保护气体。Compared with the prior art, the present invention achieves the following technical effects: the UV device packaging structure of the present invention includes a chip, a lens and a substrate, the lens has an accommodating hole, and the chip is arranged in the accommodating hole; the substrate is provided with a first conducting element , the first conducting element is connected to the chip, the chip can be conducted with external elements by the first conducting element, and the substrate is sealed and connected to the lens by the first conducting element, and the substrate seals the accommodating hole to form a sealed package cavity, The encapsulation cavity is filled with protective gas.
本发明的紫外器件封装结构,芯片设置于透镜的容置孔内,通过容置孔内锥面侧壁的聚光面,把深紫外发光二极管的芯片侧面TM出光辐射能量光线反射到容置孔底面的入射面,进一步通过透镜的球状结构把深紫外光线照射出,从而提高了深紫外发光二极管芯片侧面TM出光辐射能量利用率。具体地,芯片设置于透镜的容置孔内,芯片能够利用第一导通元件与外部元件导通,基板封堵容置孔,将芯片封装于封装腔体内,且封装腔体内填充有保护气体,保护气体可选择氮气等惰性气体,避免芯片受到大气影响,从而提高深紫外发光二极管辐射能量,增强提高深紫外发光二极管的杀菌消毒效果。In the UV device packaging structure of the present invention, the chip is arranged in the accommodating hole of the lens, and the radiant energy light emitted from the side TM of the chip of the deep ultraviolet light emitting diode is reflected to the accommodating hole through the condensing surface of the sidewall of the inner cone of the accommodating hole. The incident surface of the bottom surface further irradiates the deep ultraviolet light through the spherical structure of the lens, thereby improving the utilization rate of the light emitting radiation energy of the TM on the side of the deep ultraviolet light emitting diode chip. Specifically, the chip is arranged in the accommodating hole of the lens, and the chip can conduct conduction with the external elements by using the first conducting element, the substrate blocks the accommodating hole, and the chip is packaged in the package cavity, and the package cavity is filled with protective gas , The protective gas can choose inert gas such as nitrogen to avoid the chip from being affected by the atmosphere, thereby increasing the radiant energy of the deep ultraviolet light emitting diode and enhancing the sterilization and disinfection effect of the deep ultraviolet light emitting diode.
与此同时,本发明还提供一种上述紫外器件封装结构的制作方法,将芯片放入容置孔中,将透镜与基板相抵,将芯片、透镜以及基板放入共晶炉中,对共晶炉进行抽真空,然后向共晶炉内充入保护气体,保护气体进入容置孔中,控制共晶炉的温度,通过第一导通元件使透镜与基板实现共晶焊接,基板与透镜连接后封堵容置孔并形成封装腔体,芯片以及保护气体被封装在封装腔体内。本发明利用共晶炉将保护气体进入基板与透镜之间,并使第一导通元件与透镜实现共晶焊接,将芯片和保护气体封装在封装腔体内,从而有效避免大气对芯片的影响,提高深紫外发光二极管的性能。At the same time, the present invention also provides a method for manufacturing the above-mentioned ultraviolet device packaging structure, which comprises placing the chip into the accommodating hole, abutting the lens and the substrate, placing the chip, the lens and the substrate into a eutectic furnace, and aligning the eutectic The furnace is evacuated, and then the protective gas is filled into the eutectic furnace, the protective gas enters the accommodating hole, the temperature of the eutectic furnace is controlled, the lens and the substrate are eutectic welding through the first conducting element, and the substrate and the lens are connected. The accommodating hole is then blocked to form a package cavity, and the chip and the protective gas are packaged in the package cavity. The invention utilizes the eutectic furnace to enter the protective gas between the substrate and the lens, enables the first conducting element and the lens to realize eutectic welding, and encapsulates the chip and the protective gas in the packaging cavity, thereby effectively avoiding the influence of the atmosphere on the chip. Improve the performance of deep ultraviolet light-emitting diodes.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the accompanying drawings required in the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some of the present invention. In the embodiments, for those of ordinary skill in the art, other drawings can also be obtained according to these drawings without any creative effort.
图1为本发明的紫外器件封装结构的结构示意图;Fig. 1 is the structural representation of the ultraviolet device packaging structure of the present invention;
图2为本发明的紫外器件封装结构的其他角度的结构示意图;2 is a schematic structural diagram of the UV device packaging structure of the present invention from other angles;
图3为本发明的紫外器件封装结构的剖切结构示意图;Fig. 3 is the cutaway structure schematic diagram of the ultraviolet device packaging structure of the present invention;
图4为本发明的紫外器件封装结构的透镜的结构示意图;4 is a schematic structural diagram of a lens of the UV device packaging structure of the present invention;
图5为本发明的紫外器件封装结构的透镜的其他角度的结构示意图;5 is a schematic structural diagram of the lens of the ultraviolet device packaging structure of the present invention from other angles;
图6为本发明的紫外器件封装结构的透镜的剖切结构示意图;6 is a schematic diagram of a cutaway structure of a lens of the UV device packaging structure of the present invention;
图7为本发明的紫外器件封装结构的拆解结构示意图。FIG. 7 is a schematic view of the disassembled structure of the UV device packaging structure of the present invention.
其中,100为紫外器件封装结构;Among them, 100 is the packaging structure of the ultraviolet device;
1为芯片,2为透镜,201为容置孔,202为凸台,203为连接结构层,204为入射面,205为聚光面,3为基板,301为通孔,4为第一导通元件,401为导通板,402为连接板,5为封装腔体,6为第二导通元件,7为连接柱,8为焊盘。1 is the chip, 2 is the lens, 201 is the accommodating hole, 202 is the boss, 203 is the connection structure layer, 204 is the incident surface, 205 is the condensing surface, 3 is the substrate, 301 is the through hole, and 4 is the
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
本发明的目的是提供一种紫外器件封装结构及制作方法,以解决上述现有技术存在的问题,避免芯片受大气影响,提高深紫外发光二极管辐射能量。The purpose of the present invention is to provide an ultraviolet device packaging structure and a manufacturing method, so as to solve the above-mentioned problems in the prior art, avoid the chip being affected by the atmosphere, and improve the radiation energy of the deep ultraviolet light emitting diode.
为使本发明的上述目的、特征和优点能够更加明显易懂,下面结合附图和具体实施方式对本发明作进一步详细的说明。In order to make the above objects, features and advantages of the present invention more clearly understood, the present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments.
请参考图1-图7,其中,图1为本发明的紫外器件封装结构的结构示意图,图2为本发明的紫外器件封装结构的其他角度的结构示意图,图3为本发明的紫外器件封装结构的剖切结构示意图,图4为本发明的紫外器件封装结构的透镜的结构示意图,图5为本发明的紫外器件封装结构的透镜的其他角度的结构示意图,图6为本发明的紫外器件封装结构的透镜的剖切结构示意图,图7为本发明的紫外器件封装结构的拆解结构示意图。Please refer to FIG. 1 to FIG. 7, wherein, FIG. 1 is a schematic structural diagram of the UV device packaging structure of the present invention, FIG. 2 is a structural schematic diagram of the UV device packaging structure of the present invention from other angles, and FIG. 3 is the UV device packaging structure of the present invention. Figure 4 is a schematic structural diagram of the lens of the UV device packaging structure of the present invention, Figure 5 is a schematic structural diagram of the lens of the UV device packaging structure of the present invention from other angles, and Figure 6 is the UV device of the present invention. Fig. 7 is a schematic diagram of the disassembled structure of the package structure of the ultraviolet device of the present invention.
本发明提供一种紫外器件封装结构100,包括芯片1、透镜2以及基板3,透镜2具有容置孔201,芯片1设置于容置孔201内;基板3上设置第一导通元件4,第一导通元件4与芯片1相连,芯片1能够利用第一导通元件4与外部元件导通(此处需要解释说明的是,“导通”即实现电连接,属于本领域技术人员的公知常识),且基板3利用第一导通元件4与透镜2密封连接,基板3封堵容置孔201形成密闭的封装腔体5,封装腔体5内填充保护气体。The present invention provides an ultraviolet
本发明的紫外器件封装结构100,芯片1设置于透镜2的容置孔201内,芯片1能够利用第一导通元件4与外部元件导通,基板3封堵容置孔201,将芯片1封装于封装腔体5内,且封装腔体5内填充有保护气体,保护气体可选择氮气等惰性气体,避免芯片1受到大气影响,从而提高深紫外发光二极管辐射能量,增强提高深紫外发光二极管的杀菌消毒效果。In the UV
具体地,第一导通元件4为分体式结构,第一导通元件4包括导通板401和连接板402,导通板401的数量为两片,两片导通板401分别与芯片1的正极和负极相连,且两片导通板401之间具有间隙,避免短路,基板3选择陶瓷材质制成,导通板401由导电材质制成,连接板402连接基板3与透镜2,使得基板3能够封堵容置孔201,以保证封装腔体5的密封性。Specifically, the
在本具体实施方式中,连接板402为环状结构,透镜2具有与连接板402相适配的凸台202,凸台202伸入连接板402的中空部并与基板3相抵,方便安装定位,导通板401为半圆形板状结构,能够伸入容置孔201中,提高导通板401与芯片1的连接便捷性。In this specific embodiment, the connecting
还需要说明的是,透镜2具有连接结构层203,连接结构层203为环状,连接结构层203环绕凸台202设置,连接结构层203与连接板402焊接相连,在本具体实施方式中,连接结构层203为金锡合金制成,连接板402由铜材质制成,在实际应用中,连接板402以及连接结构层203均可采用镀层的方式制作。It should also be noted that the
更具体地,基板3还连接有第二导通元件6,基板3位于第一导通元件4与第二导通元件6之间,第二导通元件6由导电材质制成,第二导通元件6的数量为两组,第二导通元件6与导通板401相连且一一对应,两组第二导通元件6之间具有间隙,设置第二导通元件6方便芯片1利用导通板401与外部元件导通,第二导通元件6可采用铜材质制成。More specifically, the
其中,第二导通元件6利用连接柱7与导通板401相连,基板3具有通孔301,连接柱7穿过通孔301连接导通板401与第二导通元件6,连接柱7同样采用铜材质制成,利用连接柱7实现导通板401与第二导通元件6的导通。实际应用中,可选择在通孔301处电镀铜填充的方式形成连接柱7。The
还需要说明的是,第二导通元件6连接有焊盘8,焊盘8的数量为两组,焊盘8与第二导通元件6一一对应,两组焊盘8之间具有间隙,设置焊盘8方便了封装结构的使用固定,提高了封装结构的适应性。It should also be noted that the
进一步地,透镜2远离基板3的一端为球状结构,容置孔201为圆台状结构,容置孔201的底面为入射面204,容置孔201的开口直径较入射面204的直径小,容置孔201的锥面侧壁为聚光面205,芯片1发射的紫外光线直接照射入射面204,芯片1侧面发射的紫外光线通过聚光面205反射到入射面204,提高芯片1的紫外光线的利用率。Further, the end of the
与此同时,聚光面205设置有紫外光线高反射薄膜镀层,紫外光线高反射薄膜镀层能够使聚光面205形成高反射聚光面205,进一步提高紫外光线的利用率。At the same time, the light-converging
本发明还提供一种上述的紫外器件封装结构100的制作方法,将芯片1放入容置孔201中,将透镜2与基板3相抵,将芯片1、透镜2以及基板3放入共晶炉中,对共晶炉进行抽真空,然后向共晶炉内充入保护气体,保护气体进入容置孔201中,控制共晶炉的温度,通过第一导通元件4以及连接结构层203使透镜2与基板3实现共晶焊接,基板3与透镜2连接后封堵容置孔201并形成封装腔体5,芯片1以及保护气体被封装在封装腔体5内。The present invention also provides a method for manufacturing the above-mentioned UV
本发明通过在封装腔体5内填充氮气作为保护气体,在芯片1发射紫外光线的同时,保护芯片1性能不受大气的影响,从而提高深紫外发光二极管芯片1的稳定性能,增强提高深紫外发光二极管的杀菌消毒效果。By filling the
本发明中应用了具体个例对本发明的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本发明的方法及其核心思想;同时,对于本领域的一般技术人员,依据本发明的思想,在具体实施方式及应用范围上均会有改变之处。综上所述,本说明书内容不应理解为对本发明的限制。In the present invention, specific examples are used to illustrate the principles and implementations of the present invention, and the descriptions of the above embodiments are only used to help understand the method and the core idea of the present invention; There will be changes in the specific implementation manner and application scope of the idea of the invention. In conclusion, the contents of this specification should not be construed as limiting the present invention.
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