CN114855171B - acidic etching liquid waste liquid treatment system and method - Google Patents
acidic etching liquid waste liquid treatment system and method Download PDFInfo
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- CN114855171B CN114855171B CN202210339681.9A CN202210339681A CN114855171B CN 114855171 B CN114855171 B CN 114855171B CN 202210339681 A CN202210339681 A CN 202210339681A CN 114855171 B CN114855171 B CN 114855171B
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- 239000007788 liquid Substances 0.000 title claims abstract description 151
- 238000005530 etching Methods 0.000 title claims abstract description 82
- 230000002378 acidificating effect Effects 0.000 title claims abstract description 17
- 239000010808 liquid waste Substances 0.000 title claims description 29
- 238000000034 method Methods 0.000 title abstract description 17
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 83
- 239000000460 chlorine Substances 0.000 claims abstract description 83
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 83
- 239000002699 waste material Substances 0.000 claims abstract description 58
- 239000003792 electrolyte Substances 0.000 claims abstract description 42
- 239000000243 solution Substances 0.000 claims abstract description 25
- 239000011550 stock solution Substances 0.000 claims abstract description 15
- 238000004064 recycling Methods 0.000 claims abstract description 11
- 239000003814 drug Substances 0.000 claims abstract description 9
- 238000001816 cooling Methods 0.000 claims description 56
- 238000010521 absorption reaction Methods 0.000 claims description 26
- 239000002253 acid Substances 0.000 claims description 26
- 238000003860 storage Methods 0.000 claims description 19
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims description 18
- 238000005192 partition Methods 0.000 claims description 15
- 238000011084 recovery Methods 0.000 claims description 14
- 238000004891 communication Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 5
- 238000009833 condensation Methods 0.000 claims description 3
- 230000005494 condensation Effects 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 25
- 239000010949 copper Substances 0.000 abstract description 24
- 229910052802 copper Inorganic materials 0.000 abstract description 24
- 238000005868 electrolysis reaction Methods 0.000 abstract description 13
- 239000013043 chemical agent Substances 0.000 abstract description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract description 4
- 239000012535 impurity Substances 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 19
- 238000010586 diagram Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- 235000015073 liquid stocks Nutrition 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Abstract
The invention discloses a system and a method for treating waste liquid of an acidic etching solution, which are characterized in that the waste liquid of the etching solution is electrolyzed to form copper and chlorine, the formed copper is recovered, then the chlorine is introduced into the electrolyzed electrolyte again to be dissolved, and finally, a medicament is added into the electrolyte to form an etching solution stock solution; the method has the advantages that the copper in the waste liquid is recycled by carrying out electrolytic treatment on the waste liquid of the etching liquid, new impurities are not introduced, the generated chlorine during electrolysis is introduced into the recycled electrolyte, and the chlorine is reacted with the waste liquid, so that the chlorine is secondarily utilized before treatment, the chloride ion concentration of the waste liquid of the etching liquid is increased, the consumption of chemical agents added in the later period is reduced, and meanwhile, the cost of subsequent chlorine treatment is reduced, so that the recycling of the waste liquid of the etching liquid is realized.
Description
Technical Field
the invention relates to the technical field of acid etching liquid waste liquid treatment, in particular to an acid etching liquid waste liquid treatment system and method.
Background
in the production process of Printed Circuit Board (PCB) an etching process is required, and the etching process uses a large quantity of etching liquid stock solution, and at the same time a large quantity of etching liquid waste solution can be produced. The main components of the common acidic etching liquid stock solution are copper chloride, concentrated hydrochloric acid, hydrogen peroxide, water and other components. In the waste etching solution generated after etching of PCB, cu+h2o2+2hcl=cucl2+2h2o is known from chemical formula, which contains a large amount of copper with high economic value. In order to recover copper in the waste liquid, other impurities are introduced into the existing treatment mode, the subsequent treatment step is needed to be carried out on the waste liquid after copper separation, and meanwhile, other effective etching components in the waste liquid are wasted, so that the environment is polluted.
Disclosure of Invention
In order to solve the technical problems in the background technology, the invention provides an acidic etching liquid waste liquid treatment system and method.
the invention provides a method for treating waste liquid of an acidic etching solution, which comprises the following steps:
And electrolyzing the waste etching solution to form copper and chlorine, recovering the formed copper, introducing the chlorine into the electrolyzed electrolyte again to dissolve the copper, and finally adding a medicament into the electrolyte to form the etching solution stock solution.
Preferably, the etching liquid waste is cooled before electrolysis.
Preferably, the chlorine gas that is not dissolved in the electrolyte is subjected to an absorption treatment;
Preferably, chlorine is collected at the anode and copper is collected at the cathode.
In the method for treating the waste liquid of the acid etching liquid, the waste liquid of the etching liquid is electrolyzed to form copper and chlorine, the formed copper is recovered, then the chlorine is introduced into the electrolyzed electrolyte again to be dissolved, and finally, the chemical agent is added into the electrolyte to form the stock solution of the etching liquid; the method has the advantages that the copper in the waste liquid is recycled by carrying out electrolytic treatment on the waste liquid of the etching liquid, new impurities are not introduced, the generated chlorine during electrolysis is introduced into the recycled electrolyte, and the chlorine is reacted with the waste liquid, so that the chlorine is secondarily utilized before treatment, the chloride ion concentration of the waste liquid of the etching liquid is increased, the consumption of chemical agents added in the later period is reduced, and meanwhile, the cost of subsequent chlorine treatment is reduced, so that the recycling of the waste liquid of the etching liquid is realized.
the invention also provides an acidic etching liquid waste liquid treatment system, which realizes the acidic etching liquid waste liquid treatment method, and comprises the following steps: an electrolytic cell and a chlorine absorption tank;
An electrode assembly is arranged in the electrolytic tank, a waste liquid inlet is arranged at the bottom of the electrolytic tank, a chlorine outlet is arranged at the top of the electrolytic tank, and an electrolyte outlet is arranged on the side wall of the electrolytic tank;
A liquid storage tank and an absorption chamber positioned above the liquid storage tank are arranged in the chlorine absorption tank, an electrolyte inlet, a medicament adding port, a stock solution recovery port and a chlorine inlet are arranged on the side wall of the liquid storage tank, a diaphragm plate for placing absorption materials is arranged in the absorption chamber, a through hole for passing chlorine is formed in the diaphragm plate, and the stock solution recovery port is positioned above the chlorine inlet;
the chlorine outlet is communicated with the chlorine inlet, and the electrolyte outlet is communicated with the electrolyte inlet.
Preferably, the cooling device further comprises a cooling cylinder, wherein the side wall of the cooling cylinder is provided with a high-temperature inlet and a low-temperature outlet;
Preferably, a cooling space is arranged in the cooling cylinder, a vertical partition board which is vertically arranged is arranged in the cooling space, the partition board divides the cooling space into a liquid inlet cavity and a cooling cavity, and a communication port which is communicated with the liquid inlet cavity and the cooling cavity is arranged on the vertical partition board; the cooling cavity is internally provided with a first liquid passing plate and a first condensing pipe, the first condensing pipe is positioned on one side of the first liquid passing plate away from the vertical partition plate, a first liquid passing area which is correspondingly arranged with the first condensing pipe is arranged on the first liquid passing plate, and a first liquid passing hole is formed in the first liquid passing area.
Preferably, the electrode assembly comprises an anode plate, a cathode plate and a mounting frame, wherein a plurality of electrode plate clamps are arranged on the inner edge of the mounting frame, the anode plate is mounted in the mounting frame through the electrode plate clamps, an air guide groove extending along the edge of the anode plate is arranged on the inner edge of the mounting frame, exhaust holes are formed in the side wall of the air guide groove, the cathode plate and the anode plate are oppositely arranged at intervals, and the exhaust holes are communicated with a chlorine outlet through pipelines.
Preferably, the mounting frame is further provided with a front baffle and a rear baffle, the front baffle and the rear baffle are respectively located at two sides of the anode plate, the upper ends of the front baffle and the rear baffle are respectively connected with the mounting frame, the front baffle and the rear baffle and the mounting frame jointly form a gas collecting space surrounding the upper end of the anode plate, and the exhaust hole is located on the side wall of the gas collecting space.
Preferably, the liquid storage tank is internally provided with a cooling cavity and an air inlet cavity, the air inlet cavity is positioned below the absorption chamber, the cooling cavity is positioned at one side of the air inlet cavity and is communicated with the air inlet cavity, and a recovery condensation pipe is arranged in the cooling cavity;
the electrolyte inlet is positioned on the side wall of the cooling cavity, and the medicament adding port, the chlorine inlet and the raw liquid recycling port are positioned on the side wall of the air inlet cavity.
Preferably, a first baffle plate extending upwards from the bottom is arranged in the cooling cavity, the first baffle plate divides the cooling cavity into a first cavity and a second cavity, a communication opening of the first cavity and the second cavity is formed above the baffle plate, a recycling condensing pipe is arranged in the first cavity, an electrolyte inlet is arranged on the side wall of the first cavity, and the second cavity is communicated with the air inlet through a communication opening.
Preferably, the device further comprises a chlorine gas absorbing device, a tail gas outlet is arranged on the chlorine gas absorbing cylinder, and the chlorine gas absorbing device is used for absorbing chlorine gas discharged from the tail gas outlet.
According to the acid etching liquid waste liquid treatment system, a liquid storage tank and an absorption chamber positioned above the liquid storage tank are arranged in a chlorine absorption tank, an electrolyte inlet, a medicament adding port, a raw liquid recovery port and a chlorine inlet are arranged on the side wall of the liquid storage tank, a partition plate for placing an absorption material is arranged in the absorption chamber, a through hole for passing chlorine is formed in the partition plate, and the raw liquid recovery port is positioned above the chlorine inlet; the chlorine outlet of the electrolytic tank is communicated with the chlorine inlet of the chlorine absorption cylinder, and the electrolyte outlet is communicated with the electrolyte inlet; copper recovery and waste liquid recovery of the waste etching liquid are realized through the cooperation of the electrolytic tank and the chlorine absorption cylinder to prepare the stock solution, so that the waste etching liquid treatment and recovery utilization rate is improved to the greatest extent, and the treatment cost is reduced.
Drawings
Fig. 1 is a schematic diagram of an embodiment of an acidic etching solution waste liquid treatment system according to the present invention.
fig. 2 is a schematic structural diagram of an electrolytic cell according to an embodiment of the system for treating waste acidic etching solution according to the present invention.
fig. 3 is a schematic view of an anode structure of an electrolytic cell according to an embodiment of the present invention.
FIG. 4 is a schematic diagram showing the chlorine trend in an electrolytic cell of an embodiment of an acidic etching solution waste liquid treatment system according to the present invention.
Fig. 5 is a schematic structural diagram of a chlorine absorbing cylinder according to an embodiment of the acid etching solution waste liquid treatment system.
fig. 6 is a schematic diagram showing a side view of the inside of a chlorine absorbing cylinder according to an embodiment of the acid etching liquid waste liquid treatment system according to the present invention.
FIG. 7 is a schematic front cross-sectional view of the interior of a chlorine absorber of an embodiment of an acidic etching solution waste liquid treatment system according to the present invention.
FIG. 8 is another schematic front cross-sectional view of the interior of a chlorine absorber of one embodiment of an acidic etching solution waste liquid treatment system according to the present invention.
Fig. 9 is a schematic structural diagram of a cooling cylinder of an embodiment of an acidic etching solution waste liquid treatment system according to the present invention.
Fig. 10 is a schematic diagram showing the internal structure of a cooling cylinder according to an embodiment of the acid etching solution waste liquid treatment system according to the present invention.
Detailed Description
As shown in fig. 1 to 10, fig. 1 is a schematic view of an embodiment of an acid etching solution waste liquid treatment system according to the present invention, fig. 2 is a schematic view of a structure of an electrolytic cell of an embodiment of an acid etching solution waste liquid treatment system according to the present invention, fig. 3 is a schematic view of an anode structure of an electrolytic cell of an embodiment of an acid etching solution waste liquid treatment system according to the present invention, fig. 4 is a schematic view of a chlorine trend in an electrolytic cell of an embodiment of an acid etching solution waste liquid treatment system according to the present invention, fig. 5 is a schematic view of a chlorine absorbing cylinder of an embodiment of an acid etching solution waste liquid treatment system according to the present invention, fig. 6 is a schematic diagram showing a side view structure of an inside of a chlorine absorbing cylinder of an embodiment of an acid etching liquid waste liquid treatment system according to the present invention, fig. 7 is a schematic diagram showing a front view cross section of an inside of a chlorine absorbing cylinder of an embodiment of an acid etching liquid waste liquid treatment system according to the present invention, fig. 8 is another schematic diagram showing a front view cross section of an inside of a chlorine absorbing cylinder of an embodiment of an acid etching liquid waste liquid treatment system according to the present invention, fig. 9 is a schematic diagram showing a structure of a cooling cylinder of an embodiment of an acid etching liquid waste liquid treatment system according to the present invention, and fig. 10 is a schematic diagram showing an inside structure of a cooling cylinder of an embodiment of an acid etching liquid waste liquid treatment system according to the present invention.
referring to fig. 1 to 10, an acidic etching solution waste liquid treatment system according to this embodiment includes: an electrolytic cell 10 and a chlorine absorbing cylinder 300;
An electrode assembly is arranged in the electrolytic tank 10, a waste liquid inlet is arranged at the bottom of the electrolytic tank 10, a chlorine outlet is arranged at the top of the electrolytic tank, and an electrolyte outlet is arranged on the side wall of the electrolytic tank 10;
A liquid storage tank and an absorption chamber 303 positioned above the liquid storage tank are arranged in the chlorine absorption tank 300, an electrolyte inlet, a medicament adding port, a stock solution recycling port and a chlorine inlet are arranged on the side wall of the liquid storage tank, a diaphragm 310 for placing absorption materials is arranged in the absorption chamber 303, a through hole for passing chlorine is formed in the diaphragm 310, and the stock solution recycling port is positioned above the chlorine inlet;
the chlorine outlet is communicated with the chlorine inlet, and the electrolyte outlet is communicated with the electrolyte inlet.
As is known from the chemical formula cu+h202+2hcl=cucl2+2h2o, a large amount of copper ions are contained in the etching liquid waste generated after PCB etching. In order to realize the rapid recovery of copper ions and avoid secondary pollution to the waste etching liquid, the subsequent recovery treatment of the waste etching liquid is convenient.
In the electrolytic tank of the acid etching liquid waste liquid treatment system of the embodiment, first, etching liquid waste liquid is fed into the electrolytic tank so that the electrode assembly is in the waste liquid, and after the cathode and anode plates are electrified, the etching liquid waste liquid is electrolyzed to form copper and chlorine. Wherein chlorine is formed at the anode and copper is formed at the cathode, and thus chlorine is collected at the anode and copper is collected at the cathode.
In the chlorine absorbing cylinder of the acid etching liquid waste liquid treatment system of the embodiment, the electrolyte formed after the electrolysis of the etching liquid waste liquid is sent into the liquid storage tank through the electrolyte inlet, and then the chlorine generated by the electrolysis is led into the liquid storage tank through the chlorine inlet. Since chlorine reacts with water as a reversible reaction. Thus, the chlorine gas is again absorbed by the electrolyte to form chloride ions. Unabsorbed chlorine gas continuously rises to react with the absorption material on the partition board, and chlorine gas absorption treatment is carried out. And finally adding a medicament into the electrolyte to form an etching solution stock solution.
In the embodiment, the system and the method for treating the waste liquid of the acid etching liquid are provided, the waste liquid of the etching liquid is electrolyzed to form copper and chlorine, the formed copper is recovered, then the chlorine is introduced into the electrolyzed electrolyte again to be dissolved, and finally, the chemical agent is added into the electrolyte to form the stock solution of the etching liquid; the method has the advantages that the copper in the waste liquid is recycled by carrying out electrolytic treatment on the waste liquid of the etching liquid, new impurities are not introduced, the generated chlorine during electrolysis is introduced into the recycled electrolyte, and the chlorine is reacted with the waste liquid, so that the chlorine is secondarily utilized before treatment, the chloride ion concentration of the waste liquid of the etching liquid is increased, the consumption of chemical agents added in the later period is reduced, and meanwhile, the cost of subsequent chlorine treatment is reduced, so that the recycling of the waste liquid of the etching liquid is realized.
Because chlorine forms at the positive pole and copper forms at the negative pole in the electrolysis trough, in particular embodiment, electrode assembly includes anode plate 1, negative plate 8 and installing frame 2, and installing frame 2 inner edge is equipped with a plurality of polar plate presss from both sides, and anode plate 1 passes through the polar plate to be pressed from both sides and installs in installing frame 2, and installing frame 2 inner edge is equipped with the air guide tank 21 that extends along anode plate 1 edge, air guide tank 21 lateral wall is equipped with the exhaust hole, and negative plate 8 and anode plate 1 relative interval arrangement, the exhaust hole passes through pipeline and chlorine export intercommunication.
Under the action of electrolysis, copper precipitated in the waste liquid is attached to the cathode plate, and after chlorine gas is generated on the surface of the anode plate, the chlorine gas rises along the air guide groove at the inner edge of the mounting frame, is collected through the exhaust hole and is discharged from the gas outlet through the pipeline. Because the exhaust hole is positioned below the overflow port, the generated chlorine is ensured to rise to the upper part of the liquid level along the anode plate and is exhausted by the exhaust hole, the electrolysis reaction is promoted to be carried out in the forward direction, and the copper precipitation efficiency is further improved.
Further, the mounting frame 2 is further provided with a front baffle 3 and a rear baffle 4, the front baffle 3 and the rear baffle 4 are respectively located at two sides of the anode plate 1, the upper ends of the front baffle 3 and the rear baffle 4 are respectively connected with the mounting frame 2, the front baffle 3 and the rear baffle 4 and the mounting frame 2 jointly form a gas collecting space surrounding the upper end of the anode plate 1, and the exhaust holes are located on the side walls of the gas collecting space. The generated chlorine gas rises to the gas collecting space along the gas guide groove and is intensively sent out through the gas exhaust hole. Due to the design of the front baffle and the rear baffle, a gas collecting space is formed on the upper portion of the anode plate, and when the gas collecting device is used, electrolyte covers the lower ends of the front baffle and the rear baffle, liquid sealing is carried out on the bottom of the gas collecting space, so that generated gas is ensured to be uniformly discharged through the exhaust holes.
In the specific design mode of exhaust, in order to avoid forming relative closed environment in the gas collecting space, and then influence the gas discharge in the gas collecting space both ends are equipped with first exhaust hole 221 and second exhaust hole 222 respectively, the height of first exhaust hole 221 is higher than second exhaust hole 222, through the difference in height of both sides exhaust hole, forms pressure differential in the position of giving vent to anger to guarantee the quick discharge of chlorine of collecting.
In practical design, a plurality of electrode assemblies can be designed in the tank body, and the cathode plate 8 of each electrode assembly is positioned between the anode plate 1 and the anode plate 1 of the adjacent electrode assembly, so that an electrolysis space is formed between any two adjacent cathode plates and anode plates, and the electrolysis efficiency is improved.
In a further specific design manner of the chlorine absorbing cylinder, a cooling cavity 301 and an air inlet cavity 302 are arranged in the liquid storage tank, the air inlet cavity 302 is positioned below the absorbing chamber 303, the cooling cavity 301 is positioned at one side of the air inlet cavity 302 and is communicated with the air inlet cavity 302, and a recovery condensation pipe 320 is arranged in the cooling cavity 301; the electrolyte inlet is positioned on the side wall of the cooling cavity 301, and the reagent adding port, the chlorine inlet and the raw liquid recycling port are positioned on the side wall of the air inlet cavity 302.
Since the reaction of chlorine with water is a reversible reaction, and the reaction is exothermic. Therefore, after the electrolyte enters the liquid storage tank, the temperature is controlled through the condensing pipe, and the reaction is pushed to move forward, so that the absorption rate of chlorine is increased.
In order to ensure that the electrolyte entering the liquid storage tank is cooled by the recovery condensing pipe, a first baffle 330 extending upwards from the bottom is arranged in the cooling cavity 301, the first baffle 330 divides the cooling cavity 301 into a first cavity and a second cavity, a communication opening of the first cavity and the second cavity is formed above the first baffle 330, the condensing pipe 320 is positioned in the first cavity, the electrolyte inlet is positioned on the side wall of the first cavity, and the second cavity is communicated with the air inlet cavity 302 through a communication opening.
Further, the upper edge of the communication port is located below the upper end of the first baffle 330, so that the temperature of the electrolyte is further guaranteed to be reduced through the condenser tube before the electrolyte is introduced with chlorine.
In addition, the acid etching solution waste liquid treatment system of this embodiment further includes a chlorine gas absorbing device, and a tail gas outlet is disposed on the chlorine gas absorbing cylinder 300, and the chlorine gas absorbing device 600 is configured to absorb the chlorine gas discharged from the tail gas outlet.
In a specific treatment process, heat is generated in an electrolytic treatment process, and the temperature of the waste etching liquid is relatively high, so that the waste etching liquid needs to be cooled in advance to meet the temperature requirement of subsequent electrolysis.
Correspondingly, the acid etching liquid waste liquid treatment system of the embodiment further comprises a cooling cylinder 500, and a high-temperature inlet and a low-temperature outlet are arranged on the side wall of the cooling cylinder 500. Specifically, a cooling space is arranged in the cooling cylinder 500, a vertical partition plate 510 is arranged in the cooling space, the vertical partition plate 510 divides the cooling space into a liquid inlet cavity and a cooling cavity 301, and a communication port for communicating the liquid inlet cavity and the cooling cavity 301 is arranged on the vertical partition plate 510; the cooling cavity is internally provided with a first liquid passing plate 521 and a first condensing pipe 531, the first condensing pipe 531 is located at one side of the first liquid passing plate 521 far away from the vertical partition plate 510, the first liquid passing plate 521 is provided with a first liquid passing area corresponding to the first condensing pipe 531, and the first liquid passing area is provided with a first liquid passing hole.
In the specific working process of the cooling cylinder of this embodiment, the etching liquid waste liquid to be cooled first enters the liquid inlet cavity of the cooling space, after steady flow and pre-sedimentation in the liquid inlet cavity, enters the cooling cavity through the communication port, and the waste liquid flows through the first condensing tube through the first liquid passing hole on the first liquid passing plate for cooling, and because the first liquid passing hole corresponds to the first condensing tube in position, the waste liquid entering the cooling cavity exchanges heat with the condensing tube after passing through the liquid passing hole, thereby ensuring the cooling effect.
In addition to the above-mentioned treatment units, in the practical design of the acid etching liquid waste liquid treatment system of the present embodiment, a transfer cylinder 400 for storing etching liquid waste liquid, a copper washing cylinder 200 for cleaning a cathode plate to which copper is attached after electrolysis, and the like may be added according to practical needs, and are provided in cooperation with the electrolytic bath and the chlorine absorbing cylinder.
The foregoing is only a preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art, who is within the scope of the present invention, should make equivalent substitutions or modifications according to the technical scheme of the present invention and the inventive concept thereof, and should be covered by the scope of the present invention.
Claims (5)
1. An acidic etching solution waste liquid treatment system, comprising: an electrolytic cell (10) and a chlorine absorption tank (300);
An electrode assembly is arranged in the electrolytic tank (10), a waste liquid inlet is arranged at the bottom of the electrolytic tank (10), a chlorine outlet is arranged at the top of the electrolytic tank, and an electrolyte outlet is arranged on the side wall of the electrolytic tank (10);
A liquid storage tank and an absorption chamber (303) positioned above the liquid storage tank are arranged in the chlorine absorption tank (300), an electrolyte inlet, a medicament adding port, a stock solution recycling port and a chlorine inlet are arranged on the side wall of the liquid storage tank, a diaphragm (310) for placing absorption materials is arranged in the absorption chamber (303), a through hole for passing chlorine is formed in the diaphragm (310), and the stock solution recycling port is positioned above the chlorine inlet;
The chlorine outlet is communicated with the chlorine inlet, and the electrolyte outlet is communicated with the electrolyte inlet;
The electrode assembly comprises an anode plate (1), a cathode plate (8) and a mounting frame (2), wherein a plurality of electrode plate clamps are arranged on the inner edge of the mounting frame (2), the anode plate (1) is mounted in the mounting frame (2) through the electrode plate clamps, an air guide groove (21) extending along the edge of the anode plate (1) is arranged on the inner edge of the mounting frame (2), exhaust holes are formed in the side wall of the air guide groove (21), the cathode plate (8) and the anode plate (1) are oppositely arranged at intervals, and the exhaust holes are communicated with a chlorine outlet through pipelines;
The mounting frame (2) is also provided with a front baffle plate (3) and a rear baffle plate (4), the front baffle plate (3) and the rear baffle plate (4) are respectively positioned at two sides of the anode plate (1) and the upper ends of the front baffle plate and the rear baffle plate (4) are respectively connected with the mounting frame (2), the front baffle plate (3) and the rear baffle plate (4) and the mounting frame (2) form a gas collecting space surrounding the upper end of the anode plate (1), and the exhaust hole is positioned on the side wall of the gas collecting space;
The two ends of the gas collecting space are respectively provided with a first gas exhaust hole (221) and a second gas exhaust hole (222), and the height of the first gas exhaust hole (221) is higher than that of the second gas exhaust hole (222).
2. The acid etching liquid waste liquid treatment system according to claim 1, further comprising a cooling cylinder (500), wherein a high temperature inlet and a low temperature outlet are provided on a side wall of the cooling cylinder (500);
A cooling space is arranged in the cooling cylinder (500), a vertical partition plate (510) is arranged in the cooling space, the vertical partition plate (510) divides the cooling space into a liquid inlet cavity and a cooling cavity (301), and a communication port for communicating the liquid inlet cavity with the cooling cavity (301) is arranged on the vertical partition plate (510); the cooling cavity is internally provided with a first liquid passing plate (521) and a first condensing pipe (531), the first condensing pipe (531) is positioned on one side of the first liquid passing plate (521) far away from the vertical partition plate (510), the first liquid passing plate (521) is provided with a first liquid passing area which is correspondingly arranged with the first condensing pipe (531), and the first liquid passing area is provided with a first liquid passing hole.
3. The acid etching liquid waste liquid treatment system according to claim 1, wherein a cooling cavity (301) and an air inlet cavity (302) are arranged in the liquid storage tank, the air inlet cavity (302) is positioned below the absorption chamber (303), the cooling cavity (301) is positioned at one side of the air inlet cavity (302) and is communicated with the air inlet cavity (302), and a recovery condensation pipe (320) is arranged in the cooling cavity (301);
The electrolyte inlet is positioned on the side wall of the cooling cavity (301), and the medicament adding port, the chlorine inlet and the stock solution recycling port are positioned on the side wall of the air inlet cavity (302).
4. The acid etching liquid waste liquid treatment system according to claim 3, wherein a first baffle plate (330) extending upward from the bottom is provided in the cooling chamber (301), the first baffle plate (330) divides the cooling chamber (301) into a first chamber and a second chamber, a communication opening of the first chamber and the second chamber is formed above the first baffle plate (330), a recovery condensing tube (320) is provided in the first chamber, the electrolyte inlet is provided in the side wall of the first chamber, and the second chamber is communicated with the air intake chamber (302) through a communication opening.
5. the system for treating waste acidic etching liquid according to claim 1,3 or 4, further comprising a chlorine gas absorbing means for absorbing chlorine gas discharged from the exhaust gas outlet, wherein the exhaust gas outlet is provided in the chlorine gas absorbing cylinder (300).
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