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CN114846403A - High-refractive index imprint composition and material and its manufacturing process - Google Patents

High-refractive index imprint composition and material and its manufacturing process Download PDF

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Publication number
CN114846403A
CN114846403A CN202080088002.4A CN202080088002A CN114846403A CN 114846403 A CN114846403 A CN 114846403A CN 202080088002 A CN202080088002 A CN 202080088002A CN 114846403 A CN114846403 A CN 114846403A
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composition
foregoing
imprint
imprinting
acrylate
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阿弥陀·乔希
伊恩·马修·麦克马金
拉米·胡拉尼
骆英东
斯瓦帕基亚·甘纳塔皮亚潘
卢多维克·戈代
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Applied Materials Inc
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    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
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Abstract

本发明的多个实施方式一般涉及对于纳米压印平板印刷术(NIL)有用的压印组成物与材料和相关工艺。在一个或多个实施方式中,压印组成物含有一种或多种的纳米粒子、一个或多个表面配体、一个或多个溶剂、一个或多个添加剂、和一个或多个丙烯酸酯。

Figure 202080088002

Various embodiments of the present invention generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, the imprint composition contains one or more nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates .

Figure 202080088002

Description

高折射率压印组成物与材料及其制造工艺High-refractive-index imprint composition and material and its manufacturing process

背景background

领域field

本公开内容的多个实施方式一般涉及微电子处理,并且更具体地涉及对于纳米压印平板印刷术(NIL)有用的压印组成物与材料及相关工艺。Various embodiments of the present disclosure relate generally to microelectronic processing, and more particularly to imprint compositions and materials useful for nanoimprint lithography (NIL) and related processes.

相关技术描述Related technical description

纳米粒子压印的纳米和微米图案化提供用于发展具有纳米尺度分辨率的基于纳米材料的电子装置、能量装置、传感器、和其他类型装置的机会。现行的压印材料含有有机(高指数聚合物(high index polymer))或者无机-有机混合材料(溶胶-凝胶)。大多数的压印材料具有低折射率(<1.7),以及关于可见光区域中的光学透明性、光学分辨率、可处理性、压印特征的高收缩和成本效益的多个问题。Nano- and micro-patterning of nanoparticle imprinting offers opportunities for developing nanomaterial-based electronic devices, energy devices, sensors, and other types of devices with nanoscale resolution. Current imprint materials contain organic (high index polymers) or inorganic-organic hybrid materials (sol-gels). Most imprint materials have a low refractive index (<1.7), as well as multiple concerns regarding optical transparency in the visible region, optical resolution, processability, high shrinkage of imprinted features, and cost-effectiveness.

因此,需要改善的压印组成物与材料和相关工艺。Accordingly, there is a need for improved imprint compositions and materials and related processes.

发明内容SUMMARY OF THE INVENTION

本公开内容的多个实施方式一般涉及对于纳米压印平板印刷术(NIL)有用的压印组成物与材料和相关工艺。在一个或多个实施方式中,压印组成物含有一种或多种的纳米粒子、一个或多个溶剂、一个或多个表面配体、一个或多个添加剂、和一个或多个丙烯酸酯。Various embodiments of the present disclosure relate generally to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, the imprint composition contains one or more nanoparticles, one or more solvents, one or more surface ligands, one or more additives, and one or more acrylates .

在一些实施方式中,压印组成物含有约0.5重量百分比(wt%)至约40wt%的纳米粒子、约50wt%至约90wt%的溶剂、约5wt%至约40wt%的表面配体、约0.01wt%至约5wt%的添加剂、和约0.1wt%至约10wt%的丙烯酸酯。在一些实例中,每个纳米粒子是没有涂层(coating)或外壳(shell)的裸粒子。在其他多个实例中,每个纳米粒子含有核心和一个或多个外壳。例如,核心可含有氧化钛、氧化铌、或氧化锆,而外壳可含有氧化硅、氧化锆、氧化铌、或前述物质的任何组合。核心与外壳可包括相同材料或不同材料。In some embodiments, the imprint composition contains about 0.5 weight percent (wt %) to about 40 wt % nanoparticles, about 50 wt % to about 90 wt % solvent, about 5 wt % to about 40 wt % surface ligand, about 0.01 wt% to about 5 wt% additive, and about 0.1 wt% to about 10 wt% acrylate. In some examples, each nanoparticle is a bare particle without a coating or shell. In other various examples, each nanoparticle contains a core and one or more shells. For example, the core may contain titanium oxide, niobium oxide, or zirconium oxide, while the outer shell may contain silicon oxide, zirconium oxide, niobium oxide, or any combination of the foregoing. The core and shell may comprise the same material or different materials.

在其他多个实施方式中,制备压印表面的方法包括在一个或多个基板上设置、涂布、或者放置压印组成物、使压印组成物接触具有图案的印模(stamp)、将压印组成物转变成压印材料、和从压印材料移除印模。In other various embodiments, methods of preparing an imprint surface include disposing, coating, or placing an imprint composition on one or more substrates, contacting the imprint composition with a stamp having a pattern, applying The imprint composition is converted into an imprint material, and the stamp is removed from the imprint material.

附图说明Description of drawings

通过通过参照多个实施方式,一些实施方式绘示在附图中,可获得简短总结于上的本发明的更具体的描述,使得本发明的上述特征的方式可被详细理解。然而,需注意到附图仅绘示示例性实施方式,且因而不被视为本发明的范围的限制,本发明可承认其他多个等效实施方式。By reference to a number of embodiments, some of which are illustrated in the accompanying drawings, a more detailed description of the invention, briefly summarized above, may be obtained so that the manner in which the above-described features of the invention may be understood in detail. It is to be noted, however, that the appended drawings depict only exemplary embodiments and are therefore not to be considered limiting of the scope of the invention, for the invention may admit to other various equivalent embodiments.

图1A-图1F描绘根据本文所说明与论述的一个或多个实施方式的通过在制备含有纳米粒子的纳米压印膜时的多个操作而被处理的工件的截面图。1A-1F depict cross-sectional views of a workpiece being processed through various operations in preparing nanoparticle-containing nanoimprint films, according to one or more embodiments described and discussed herein.

图2描绘根据本文所说明与论述的一个或多个实施方式的光学装置的前视图。2 depicts a front view of an optical device in accordance with one or more embodiments described and discussed herein.

为了易于理解,已尽可能使用相同的附图标记指代图式中共通的相同元件。可以料想一个或多个实施方式的元件和特征可有利地并入其他多个实施方式中。For ease of understanding, the same reference numerals have been used wherever possible to refer to the same elements that are common to the drawings. It is contemplated that elements and features of one or more embodiments may be advantageously incorporated into various other embodiments.

具体实施方式Detailed ways

本公开内容的多个实施方式一般涉及对于纳米压印平板印刷术(NIL)有用的压印组成物与压印材料。通过施加热和/或一种或多种辐射(诸如光或微波),压印组成物可转变成压印材料。在一个或多个实施方式中,压印组成物含有一种或多种纳米粒子、一个或多个溶剂、一个或多个表面配体、一个或多个添加剂、和一个或多个丙烯酸酯。Various embodiments of the present disclosure generally relate to imprint compositions and imprint materials useful for nanoimprint lithography (NIL). The imprint composition can be transformed into an imprint material by applying heat and/or one or more radiations, such as light or microwaves. In one or more embodiments, the imprint composition contains one or more nanoparticles, one or more solvents, one or more surface ligands, one or more additives, and one or more acrylates.

每个纳米粒子(NP)可以是单一粒子或裸粒子或可以是被涂布粒子,诸如含有设置围绕核心的一个或多个外壳的NP。在一些实例中,纳米粒子可含有耦接至粒子的外表面的一种或多种的表面配体(例如,经配体NP或稳定化NP)。纳米粒子可具有一种或多种不同形状或几何图形,诸如球形、卵形、杆形、立方形、线形、圆柱形、矩形、或前述形状的组合。Each nanoparticle (NP) can be a single particle or a bare particle or can be a coated particle, such as an NP containing one or more shells disposed around a core. In some examples, nanoparticles can contain one or more surface ligands (eg, liganded NPs or stabilized NPs) coupled to the outer surface of the particle. Nanoparticles can have one or more different shapes or geometries, such as spherical, oval, rod-shaped, cubic, linear, cylindrical, rectangular, or a combination of the foregoing.

纳米粒子或核心可具有尺寸或直径是约2nm、约5nm、约8nm、约10nm、约12nm、约15nm、约20nm、约25nm、约30nm、或约35nm至约40nm、约50nm、约60nm、约80nm、约100nm、约150nm、约200nm、约250nm、约300nm、约400nm、约500nm、或更大。例如,纳米粒子或核心可具有尺寸或直径是约2nm至约500nm、约2nm至约300nm、约2nm至约200nm、约2nm至约150nm、约2nm至约100nm、约2nm至约80nm、约2nm至约60nm、约2nm至约50nm、约2nm至约40nm、约2nm至约30nm、约2nm至约20nm、约2nm至约15nm、约2nm至约10nm、约10nm至约500nm、约10nm至约300nm、约10nm至约200nm、约10nm至约150nm、约10nm至约100nm、约10nm至约80nm、约10nm至约60nm、约10nm至约50nm、约10nm至约40nm、约10nm至约30nm、约10nm至约20nm、约10nm至约15nm、约50nm至约500nm、约50nm至约300nm、约50nm至约200nm、约50nm至约150nm、约50nm至约100nm、约50nm至约80nm、或约50nm至约60nm。The nanoparticle or core can have a size or diameter of about 2 nm, about 5 nm, about 8 nm, about 10 nm, about 12 nm, about 15 nm, about 20 nm, about 25 nm, about 30 nm, or about 35 nm to about 40 nm, about 50 nm, about 60 nm, About 80 nm, about 100 nm, about 150 nm, about 200 nm, about 250 nm, about 300 nm, about 400 nm, about 500 nm, or larger. For example, a nanoparticle or core can have a size or diameter of about 2 nm to about 500 nm, about 2 nm to about 300 nm, about 2 nm to about 200 nm, about 2 nm to about 150 nm, about 2 nm to about 100 nm, about 2 nm to about 80 nm, about 2 nm to about 60 nm, about 2 nm to about 50 nm, about 2 nm to about 40 nm, about 2 nm to about 30 nm, about 2 nm to about 20 nm, about 2 nm to about 15 nm, about 2 nm to about 10 nm, about 10 nm to about 500 nm, about 10 nm to about 300 nm, about 10 nm to about 200 nm, about 10 nm to about 150 nm, about 10 nm to about 100 nm, about 10 nm to about 80 nm, about 10 nm to about 60 nm, about 10 nm to about 50 nm, about 10 nm to about 40 nm, about 10 nm to about 30 nm, about 10 nm to about 20 nm, about 10 nm to about 15 nm, about 50 nm to about 500 nm, about 50 nm to about 300 nm, about 50 nm to about 200 nm, about 50 nm to about 150 nm, about 50 nm to about 100 nm, about 50 nm to about 80 nm, or about 50nm to about 60nm.

纳米粒子可以是或含有一个或多个金属氧化物、非金属氧化物、和/或钻石材料。纳米粒子可含有氧化铌、氧化钛、氧化锆、氧化铪、氧化钽、氧化硅、钻石、或前述物质的任何组合。在一些实施方式中,若纳米粒子具有设置围绕核心的一个或多个外壳,核心与外壳可以是相同材料或不同材料。核心可含有一个或多个无机材料,而外壳可含有一个或多个有机材料和/或一个或多个无机材料。在一个或多个实施方式中,核心可含有氧化钛、氧化铌、或氧化锆,而外壳可含有氧化硅、氧化锆、氧化铌、或前述物质的任何组合。通常,核心与外壳含有不同材料。在一个或多个实例中,核心含有氧化钛而外壳含有氧化硅、氧化锆、氧化铌、或前述物质的任何组合。在其他多个实例中,核心含有氧化铌而外壳含有氧化硅、氧化锆、或前述物质的任何组合。在一些实例中,核心含有氧化锆而外壳含有氧化硅。Nanoparticles can be or contain one or more metal oxides, non-metal oxides, and/or diamond materials. The nanoparticles may contain niobium oxide, titanium oxide, zirconium oxide, hafnium oxide, tantalum oxide, silicon oxide, diamond, or any combination of the foregoing. In some embodiments, if the nanoparticle has one or more shells disposed around the core, the core and shell can be the same material or different materials. The core may contain one or more inorganic materials, while the outer shell may contain one or more organic materials and/or one or more inorganic materials. In one or more embodiments, the core may contain titanium oxide, niobium oxide, or zirconium oxide, and the outer shell may contain silicon oxide, zirconium oxide, niobium oxide, or any combination of the foregoing. Typically, the core and shell contain different materials. In one or more examples, the core contains titanium oxide and the outer shell contains silicon oxide, zirconium oxide, niobium oxide, or any combination of the foregoing. In other various examples, the core contains niobium oxide and the outer shell contains silicon oxide, zirconium oxide, or any combination of the foregoing. In some examples, the core contains zirconia and the outer shell contains silica.

核心具有直径是约2nm、约3nm、约5nm、约8nm、约10nm、约15nm、约20nm、约30nm或约40nm至约50nm、约65nm、约80nm、约100nm、约150nm、约200nm、约250nm、约300nm、约400nm、约500nm、或更大。例如,核心具有直径是约2nm至约500nm、约5nm至约500nm、约10nm至约500nm、约20nm至约500nm、约50nm至约500nm、约100nm至约500nm、约150nm至约500nm、约200nm至约500nm、约300nm至约500nm、约2nm至约200nm、约5nm至约200nm、约10nm至约200nm、约20nm至约200nm、约50nm至约200nm、约100nm至约200nm、约150nm至约200nm、约2nm至约100nm、约5nm至约100nm、约10nm至约100nm、约20nm至约100nm、约50nm至约100nm、或约80nm至约100nm。The core has a diameter of about 2 nm, about 3 nm, about 5 nm, about 8 nm, about 10 nm, about 15 nm, about 20 nm, about 30 nm, or about 40 nm to about 50 nm, about 65 nm, about 80 nm, about 100 nm, about 150 nm, about 200 nm, about 250 nm, about 300 nm, about 400 nm, about 500 nm, or larger. For example, the core has a diameter of about 2 nm to about 500 nm, about 5 nm to about 500 nm, about 10 nm to about 500 nm, about 20 nm to about 500 nm, about 50 nm to about 500 nm, about 100 nm to about 500 nm, about 150 nm to about 500 nm, about 200 nm to about 500 nm, about 300 nm to about 500 nm, about 2 nm to about 200 nm, about 5 nm to about 200 nm, about 10 nm to about 200 nm, about 20 nm to about 200 nm, about 50 nm to about 200 nm, about 100 nm to about 200 nm, about 150 nm to about 200 nm, about 2 nm to about 100 nm, about 5 nm to about 100 nm, about 10 nm to about 100 nm, about 20 nm to about 100 nm, about 50 nm to about 100 nm, or about 80 nm to about 100 nm.

外壳具有厚度是约0.1nm、约0.2nm、约0.5nm、约0.8nm、约1nm、约1.5nm、约2nm、约5nm、约8nm、或约10nm至约12nm、约15nm、约18nm、约20nm、约30nm、约40nm、约50nm、约60nm、约80nm、约100nm、约150nm、或更大。例如,外壳具有厚度是约0.1nm至约150nm、约0.1nm至约100nm、约0.1nm至约80nm、约0.1nm至约60nm、约0.1nm至约50nm、约0.1nm至约40nm、约0.1nm至约30nm、约0.1nm至约20nm、约0.1nm至约15nm、约0.1nm至约10nm、约0.1nm至约5nm、约0.1nm至约1nm、约0.5nm至约100nm、约0.5nm至约80nm、约0.5nm至约60nm、约0.5nm至约50nm、约0.5nm至约40nm、约0.5nm至约20nm、约0.5nm至约15nm、约0.5nm至约10nm、约0.5nm至约5nm、约0.5nm至约1nm、约1nm至约150nm、约1nm至约100nm、约1nm至约80nm、约1nm至约60nm、约1nm至约50nm、约1nm至约40nm、约1nm至约30nm、约1nm至约20nm、约1nm至约15nm、约1nm至约10nm、约1nm至约5nm、或约1nm至约3nm。The shell has a thickness of about 0.1 nm, about 0.2 nm, about 0.5 nm, about 0.8 nm, about 1 nm, about 1.5 nm, about 2 nm, about 5 nm, about 8 nm, or about 10 nm to about 12 nm, about 15 nm, about 18 nm, about 20 nm, about 30 nm, about 40 nm, about 50 nm, about 60 nm, about 80 nm, about 100 nm, about 150 nm, or more. For example, the shell has a thickness of about 0.1 nm to about 150 nm, about 0.1 nm to about 100 nm, about 0.1 nm to about 80 nm, about 0.1 nm to about 60 nm, about 0.1 nm to about 50 nm, about 0.1 nm to about 40 nm, about 0.1 nm nm to about 30 nm, about 0.1 nm to about 20 nm, about 0.1 nm to about 15 nm, about 0.1 nm to about 10 nm, about 0.1 nm to about 5 nm, about 0.1 nm to about 1 nm, about 0.5 nm to about 100 nm, about 0.5 nm to about 80 nm, about 0.5 nm to about 60 nm, about 0.5 nm to about 50 nm, about 0.5 nm to about 40 nm, about 0.5 nm to about 20 nm, about 0.5 nm to about 15 nm, about 0.5 nm to about 10 nm, about 0.5 nm to about about 5 nm, about 0.5 nm to about 1 nm, about 1 nm to about 150 nm, about 1 nm to about 100 nm, about 1 nm to about 80 nm, about 1 nm to about 60 nm, about 1 nm to about 50 nm, about 1 nm to about 40 nm, about 1 nm to about 30 nm, about 1 nm to about 20 nm, about 1 nm to about 15 nm, about 1 nm to about 10 nm, about 1 nm to about 5 nm, or about 1 nm to about 3 nm.

在一些实例中,核心具有直径是约2nm至约500nm且外壳具有厚度是约0.1nm至约100nm。在其他多个实例中,核心具有直径是约5nm至约200nm且外壳具有厚度是约0.5nm至约60nm。在一些实例中,核心具有直径是约10nm至约100nm且外壳具有厚度是约1nm至约15nm。In some examples, the core has a diameter of about 2 nm to about 500 nm and the outer shell has a thickness of about 0.1 nm to about 100 nm. In other examples, the core has a diameter of about 5 nm to about 200 nm and the shell has a thickness of about 0.5 nm to about 60 nm. In some examples, the core has a diameter of about 10 nm to about 100 nm and the outer shell has a thickness of about 1 nm to about 15 nm.

在一个或多个实施方式中,压印组成物含有纳米粒子的浓度是约0.1重量百分比(wt%)、约0.5wt%、约1wt%、约2wt%、约3wt%、约5wt%、约6wt%、约8wt%、或约10wt%至约12wt%、约15wt%、约18wt%、约20wt%、约22wt%、约24wt%、约25wt%、约28wt%、约30wt%、约32wt%、约35wt%、约38wt%、或约40wt%。例如,压印组成物含有纳米粒子的浓度是约0.1wt%至约40wt%、约0.5wt%至约40wt%、约0.5wt%至约35wt%、约0.5wt%至约32wt%、约0.5wt%至约30wt%、约0.5wt%至约28wt%、约0.5wt%至约25wt%、约0.5wt%至约22wt%、约0.5wt%至约20wt%、约0.5wt%至约18wt%、约0.5wt%至约15wt%、约0.5wt%至约12wt%、约0.5wt%至约10wt%、约0.5wt%至约8wt%、约0.5wt%至约6wt%、约0.5wt%至约5wt%、约0.5wt%至约4wt%、约0.5wt%至约3wt%、约0.5wt%至约2wt%、约0.5wt%至约1.5wt%、约0.5wt%至约1wt%、约2wt%至约40wt%、约2wt%至约35wt%、约2wt%至约32wt%、约2wt%至约30wt%、约2wt%至约28wt%、约2wt%至约25wt%、约2wt%至约22wt%、约2wt%至约20wt%、约2wt%至约18wt%、约2wt%至约15wt%、约2wt%至约12wt%、约2wt%至约10wt%、约2wt%至约8wt%、约2wt%至约6wt%、约2wt%至约5wt%、约2wt%至约4wt%、约2wt%至约3wt%、约5wt%至约40wt%、约5wt%至约35wt%、约5wt%至约32wt%、约5wt%至约30wt%、约5wt%至约28wt%、约5wt%至约25wt%、约5wt%至约22wt%、约5wt%至约20wt%、约5wt%至约18wt%、约5wt%至约15wt%、约5wt%至约12wt%、约5wt%至约10wt%、约5wt%至约8wt%、或约5wt%至约6wt%。In one or more embodiments, the imprint composition contains nanoparticles at a concentration of about 0.1 weight percent (wt %), about 0.5 wt %, about 1 wt %, about 2 wt %, about 3 wt %, about 5 wt %, about 6wt%, about 8wt%, or about 10wt% to about 12wt%, about 15wt%, about 18wt%, about 20wt%, about 22wt%, about 24wt%, about 25wt%, about 28wt%, about 30wt%, about 32wt% %, about 35 wt%, about 38 wt%, or about 40 wt%. For example, the imprint composition contains nanoparticles at a concentration of about 0.1 wt% to about 40 wt%, about 0.5 wt% to about 40 wt%, about 0.5 wt% to about 35 wt%, about 0.5 wt% to about 32 wt%, about 0.5 wt% wt % to about 30 wt %, about 0.5 wt % to about 28 wt %, about 0.5 wt % to about 25 wt %, about 0.5 wt % to about 22 wt %, about 0.5 wt % to about 20 wt %, about 0.5 wt % to about 18 wt % %, about 0.5wt% to about 15wt%, about 0.5wt% to about 12wt%, about 0.5wt% to about 10wt%, about 0.5wt% to about 8wt%, about 0.5wt% to about 6wt%, about 0.5wt% % to about 5wt%, about 0.5wt% to about 4wt%, about 0.5wt% to about 3wt%, about 0.5wt% to about 2wt%, about 0.5wt% to about 1.5wt%, about 0.5wt% to about 1wt% %, about 2wt% to about 40wt%, about 2wt% to about 35wt%, about 2wt% to about 32wt%, about 2wt% to about 30wt%, about 2wt% to about 28wt%, about 2wt% to about 25wt%, about 2wt% to about 22wt%, about 2wt% to about 20wt%, about 2wt% to about 18wt%, about 2wt% to about 15wt%, about 2wt% to about 12wt%, about 2wt% to about 10wt%, about 2wt% % to about 8wt%, about 2wt% to about 6wt%, about 2wt% to about 5wt%, about 2wt% to about 4wt%, about 2wt% to about 3wt%, about 5wt% to about 40wt%, about 5wt% to about 35wt%, about 5wt% to about 32wt%, about 5wt% to about 30wt%, about 5wt% to about 28wt%, about 5wt% to about 25wt%, about 5wt% to about 22wt%, about 5wt% to about 20wt% %, about 5 wt% to about 18 wt%, about 5 wt% to about 15 wt%, about 5 wt% to about 12 wt%, about 5 wt% to about 10 wt%, about 5 wt% to about 8 wt%, or about 5 wt% to about 6 wt% .

在其他多个实施方式中,压印组成物含有纳米粒子的浓度是约40wt%、约50wt%、约55wt%、约60wt%、约62wt%、或约65wt%至约68wt%、约70wt%、约75wt%、约80wt%、约85wt%、约88wt%、约90wt%、约92wt%、约93wt%、约94wt%、约95wt%、约96wt%、约97wt%、约98wt%、或更多。例如,压印组成物含有纳米粒子的浓度是约40wt%至约98wt%、约50wt%至约95wt%、约50wt%至约90wt%、约50wt%至约80wt%、约50wt%至约75wt%、约50wt%至约70wt%、约50wt%至约65wt%、约50wt%至约60wt%、约50wt%至约55wt%、约60wt%至约95wt%、约60wt%至约90wt%、约60wt%至约80wt%、约60wt%至约75wt%、约60wt%至约70wt%、约60wt%至约65wt%、约70wt%至约95wt%、约70wt%至约90wt%、约70wt%至约80wt%、或约70wt%至约75wt%。In other various embodiments, the imprint composition contains nanoparticles at a concentration of about 40 wt %, about 50 wt %, about 55 wt %, about 60 wt %, about 62 wt %, or about 65 wt % to about 68 wt %, about 70 wt % or More. For example, the imprint composition contains nanoparticles at a concentration of about 40 wt % to about 98 wt %, about 50 wt % to about 95 wt %, about 50 wt % to about 90 wt %, about 50 wt % to about 80 wt %, about 50 wt % to about 75 wt % %, about 50wt% to about 70wt%, about 50wt% to about 65wt%, about 50wt% to about 60wt%, about 50wt% to about 55wt%, about 60wt% to about 95wt%, about 60wt% to about 90wt%, about 60wt% to about 80wt%, about 60wt% to about 75wt%, about 60wt% to about 70wt%, about 60wt% to about 65wt%, about 70wt% to about 95wt%, about 70wt% to about 90wt%, about 70wt% % to about 80 wt %, or about 70 wt % to about 75 wt %.

表面配体可以是或包括一个或多个羧酸、一个或多个酯类、一个或多个胺类、一个或多个醇类、一个或多个硅烷、前述物质的盐类、前述物质的配合物、或前述物质的任何组合。示例性表面配体可以是或包括油酸(oleic acid)、硬脂酸(stearic acid)、丙酸(propionic acid)、苯甲酸(benzoic acid)、棕榈酸(palmitic acid)、肉豆蔻酸(myristicacid)、甲胺(methylamine)、油胺(oleylamine)、丁胺(butylamine)、苯甲醇(benzylalcohol)、油醇(oleyl alcohol)、丁醇(butanol)、辛醇(octanol)、十二醇(dodecanol)、正辛基三甲氧基硅烷(octyltrimethoxy silane)、正辛基三乙氧基硅烷(octyltriethoxysilane)、辛烯基三甲氧基硅烷(octenyltrimethoxy silane)、辛烯基三乙氧基硅烷(octenyltriethoxy silane)、3-(三甲氧基硅烷基)甲基丙烯酸丙酯(3-(trimethoxysilyl)propyl methacrylate)、丙基三乙氧基硅烷(propyltriethoxysilane)、前述物质的盐类、前述物质的酯类、前述物质的配合物、或前述物质的任何组合。在一些实例中,基于这些纳米粒子的重量,表面配体是约8wt%至约50wt%的浓度。Surface ligands may be or include one or more carboxylic acids, one or more esters, one or more amines, one or more alcohols, one or more silanes, salts of the foregoing, complex, or any combination of the foregoing. Exemplary surface ligands can be or include oleic acid, stearic acid, propionic acid, benzoic acid, palmitic acid, myristic acid ), methylamine, oleylamine, butylamine, benzylalcohol, oleyl alcohol, butanol, octanol, dodecanol ), octyltrimethoxy silane, octyltriethoxysilane, octenyltrimethoxy silane, octenyltriethoxy silane , 3-(trimethoxysilyl)propyl methacrylate, propyltriethoxysilane, salts of the aforementioned substances, esters of the aforementioned substances, the aforementioned substances complexes, or any combination of the foregoing. In some examples, the surface ligand is at a concentration of about 8 wt % to about 50 wt % based on the weight of the nanoparticles.

压印组成物含有表面配体的浓度是约0.5wt%、约1wt%、约2wt%、约3wt%、约5wt%、约7wt%、约8wt%、或约10wt%至约12wt%、约15wt%、约18wt%、约20wt%、约25wt%、约30wt%、约35wt%、约40wt%、约45wt%、或约50wt%。例如,压印组成物含有表面配体的浓度是约0.5wt%至约50wt%、约1wt%至约50wt%、约3wt%至约50wt%、约5wt%至约50wt%、约5wt%至约40wt%、约5wt%至约35wt%、约5wt%至约30wt%、约5wt%至约25wt%、约5wt%至约20wt%、约5wt%至约15wt%、约5wt%至约10wt%、约10wt%至约50wt%、约10wt%至约40wt%、约10wt%至约35wt%、约10wt%至约30wt%、约10wt%至约25wt%、约10wt%至约20wt%、约10wt%至约15wt%、约15wt%至约50wt%、约15wt%至约40wt%、约15wt%至约35wt%、约15wt%至约30wt%、约15wt%至约25wt%、或约15wt%至约20wt%。The imprint composition contains the surface ligand at a concentration of about 0.5 wt %, about 1 wt %, about 2 wt %, about 3 wt %, about 5 wt %, about 7 wt %, about 8 wt %, or about 10 wt % to about 12 wt %, about 15 wt %, about 18 wt %, about 20 wt %, about 25 wt %, about 30 wt %, about 35 wt %, about 40 wt %, about 45 wt %, or about 50 wt %. For example, the imprint composition contains surface ligands at a concentration of about 0.5 wt% to about 50 wt%, about 1 wt% to about 50 wt%, about 3 wt% to about 50 wt%, about 5 wt% to about 50 wt%, about 5 wt% to about 5 wt% about 40wt%, about 5wt% to about 35wt%, about 5wt% to about 30wt%, about 5wt% to about 25wt%, about 5wt% to about 20wt%, about 5wt% to about 15wt%, about 5wt% to about 10wt% %, about 10wt% to about 50wt%, about 10wt% to about 40wt%, about 10wt% to about 35wt%, about 10wt% to about 30wt%, about 10wt% to about 25wt%, about 10wt% to about 20wt%, about 10 wt % to about 15 wt %, about 15 wt % to about 50 wt %, about 15 wt % to about 40 wt %, about 15 wt % to about 35 wt %, about 15 wt % to about 30 wt %, about 15 wt % to about 25 wt %, or about 15 wt% to about 20 wt%.

溶剂可以是或包括一个或多个纳米粒子分散溶剂、一个或多个压印溶剂、其他类型的溶剂、或前述物质的组合。纳米粒子分散溶剂可以是或包括一个或多个乙二醇醚、醇类、乙酸、前述物质的酯类、前述物质的盐类、前述物质的衍生物、或前述物质的任何组合。在一些实例中,纳米粒子分散溶剂可以是或包括一个或多个p系列乙二醇醚、一个或多个e系列乙二醇醚、或前述物质的任何组合。在一个或多个实例中,纳米粒子分散溶剂含有丙二醇甲醚醋酸酯(propylene glycol methyl ether acetate(PGMEA))。压印溶剂可以是或包括一个或多个醇类、一个或多个酯类、前述物质的盐类、或前述物质的任何组合。在一个或多个实例中,压印溶剂含有乳酸乙酯(ethyl lactate)。The solvent may be or include one or more nanoparticle dispersion solvents, one or more imprinting solvents, other types of solvents, or a combination of the foregoing. The nanoparticle dispersion solvent may be or include one or more glycol ethers, alcohols, acetic acid, esters of the foregoing, salts of the foregoing, derivatives of the foregoing, or any combination of the foregoing. In some examples, the nanoparticle dispersion solvent can be or include one or more p-series glycol ethers, one or more e-series glycol ethers, or any combination of the foregoing. In one or more examples, the nanoparticle dispersion solvent contains propylene glycol methyl ether acetate (PGMEA). The imprint solvent may be or include one or more alcohols, one or more esters, salts of the foregoing, or any combination of the foregoing. In one or more examples, the imprinting solvent contains ethyl lactate.

在一个或多个实施方式中,压印组成物含有一个或多个溶剂的浓度是约50wt%、约55wt%、约60wt%、约62wt%、约65wt%、约68wt%、约70wt%、约72wt%、约75wt%、或约80wt%至约83wt%、约85wt%、约87wt%、约88wt%、约90wt%、约92wt%、约94wt%、约95wt%、约97wt%、或约98wt%。例如,压印组成物含有一个或多个溶剂的浓度是约50wt%至约98wt%、约60wt%至约98wt%、约60wt%至约95wt%、约60wt%至约90wt%、约60wt%至约88wt%、约60wt%至约85wt%、约60wt%至约83wt%、约60wt%至约80wt%、约60wt%至约78wt%、约60wt%至约75wt%、约60wt%至约72wt%、约60wt%至约70wt%、约60wt%至约68wt%、约60wt%至约65wt%、约60wt%至约63wt%、约70wt%至约98wt%、约70wt%至约95wt%、约70wt%至约90wt%、约70wt%至约88wt%、约70wt%至约85wt%、约70wt%至约83wt%、约70wt%至约80wt%、约70wt%至约78wt%、约70wt%至约75wt%、约70wt%至约72wt%、约80wt%至约98wt%、约80wt%至约95wt%、约80wt%至约90wt%、约80wt%至约88wt%、约80wt%至约85wt%、约80wt%至约83wt%、或约80wt%至约82wt%。In one or more embodiments, the imprint composition contains the one or more solvents at a concentration of about 50 wt %, about 55 wt %, about 60 wt %, about 62 wt %, about 65 wt %, about 68 wt %, about 70 wt %, about 72 wt %, about 75 wt %, or about 80 wt % to about 83 wt %, about 85 wt %, about 87 wt %, about 88 wt %, about 90 wt %, about 92 wt %, about 94 wt %, about 95 wt %, about 97 wt %, or About 98 wt%. For example, the imprint composition contains one or more solvents at a concentration of about 50 wt% to about 98 wt%, about 60 wt% to about 98 wt%, about 60 wt% to about 95 wt%, about 60 wt% to about 90 wt%, about 60 wt% to about 88wt%, about 60wt% to about 85wt%, about 60wt% to about 83wt%, about 60wt% to about 80wt%, about 60wt% to about 78wt%, about 60wt% to about 75wt%, about 60wt% to about 72wt%, about 60wt% to about 70wt%, about 60wt% to about 68wt%, about 60wt% to about 65wt%, about 60wt% to about 63wt%, about 70wt% to about 98wt%, about 70wt% to about 95wt% , about 70wt% to about 90wt%, about 70wt% to about 88wt%, about 70wt% to about 85wt%, about 70wt% to about 83wt%, about 70wt% to about 80wt%, about 70wt% to about 78wt%, about 70wt% to about 75wt%, about 70wt% to about 72wt%, about 80wt% to about 98wt%, about 80wt% to about 95wt%, about 80wt% to about 90wt%, about 80wt% to about 88wt%, about 80wt% To about 85 wt%, about 80 wt% to about 83 wt%, or about 80 wt% to about 82 wt%.

在一些实施方式中,压印组成物含有纳米粒子分散溶剂的浓度是约0.5wt%、约0.8wt%、约1wt%、约1.5wt%、约2wt%、约2.5wt%、约3wt%、约3.5wt%、约4wt%、约5wt%、或约6wt%至约7wt%、约8wt%、约10wt%、约12wt%、约14wt%、约15wt%、约18wt%、约20wt%、或约25wt%。例如,压印组成物含有纳米分散溶剂的浓度是约0.5wt%至约20wt%、约1wt%至约20wt%、约1wt%至约18wt%、约1wt%至约15wt%、约1wt%至约13wt%、约1wt%至约12wt%、约1wt%至约11wt%、约1wt%至约10wt%、约1wt%至约8wt%、约1wt%至约7wt%、约1wt%至约6wt%、约1wt%至约5wt%、约1wt%至约4wt%、约1wt%至约3wt%、约5wt%至约20wt%、约5wt%至约18wt%、约5wt%至约15wt%、约5wt%至约13wt%、约5wt%至约12wt%、约5wt%至约11wt%、约5wt%至约10wt%、约5wt%至约8wt%、约5wt%至约7wt%、约5wt%至约6wt%、约8wt%至约20wt%、约8wt%至约18wt%、约8wt%至约15wt%、约8wt%至约13wt%、约8wt至约12wt%、约8wt%至约11wt%、约8wt%至约10wt%、或约8wt%至约9wt%。In some embodiments, the imprint composition contains the nanoparticle dispersion solvent at a concentration of about 0.5 wt %, about 0.8 wt %, about 1 wt %, about 1.5 wt %, about 2 wt %, about 2.5 wt %, about 3 wt %, about 3.5wt%, about 4wt%, about 5wt%, or about 6wt% to about 7wt%, about 8wt%, about 10wt%, about 12wt%, about 14wt%, about 15wt%, about 18wt%, about 20wt%, or about 25 wt%. For example, the imprint composition contains the nanodispersion solvent at a concentration of about 0.5 wt % to about 20 wt %, about 1 wt % to about 20 wt %, about 1 wt % to about 18 wt %, about 1 wt % to about 15 wt %, about 1 wt % to about 1 wt % about 13wt%, about 1wt% to about 12wt%, about 1wt% to about 11wt%, about 1wt% to about 10wt%, about 1wt% to about 8wt%, about 1wt% to about 7wt%, about 1wt% to about 6wt% %, about 1 wt% to about 5wt%, about 1wt% to about 4wt%, about 1wt% to about 3wt%, about 5wt% to about 20wt%, about 5wt% to about 18wt%, about 5wt% to about 15wt%, about 5wt% to about 13wt%, about 5wt% to about 12wt%, about 5wt% to about 11wt%, about 5wt% to about 10wt%, about 5wt% to about 8wt%, about 5wt% to about 7wt%, about 5wt% % to about 6wt%, about 8wt% to about 20wt%, about 8wt% to about 18wt%, about 8wt% to about 15wt%, about 8wt% to about 13wt%, about 8wt% to about 12wt%, about 8wt% to about 11 wt%, about 8 wt% to about 10 wt%, or about 8 wt% to about 9 wt%.

在其他多个实施方式中,压印组成物含有压印溶剂的浓度是约50wt%、约55wt%、约60wt%、约62wt%、约65wt%、约68wt%、或约70wt%至约72wt%、约75wt%、约78wt%、约80wt%、约82wt%、约83wt%、约85wt%、约87wt%、约88wt%、约90wt%、或约95wt%。例如,压印组成物含有压印溶剂的浓度是约50wt%至约95wt%、约60wt%至约95wt%、约60wt%至约90wt%、约60wt%至约88wt%、约60wt%至约85wt%、约60wt%至约83wt%、约60wt%至约80wt%、约60wt%至约78wt%、约60wt%至约75wt%、约60wt%至约72wt%、约60wt%至约70wt%、约60wt%至约68wt%、约60wt%至约65wt%、约60wt%至约63wt%、约70wt%至约98wt%、约70wt%至约95wt%、约70wt%至约90wt%、约70wt%至约88wt%、约70wt%至约85wt%、约70wt%至约83wt%、约70wt%至约80wt%、约70wt%至约78wt%、约70wt%至约75wt%、约70wt%至约72wt%、约75wt%至约98wt%、约75wt%至约95wt%、约75wt%至约90wt%、约75wt%至约88wt%、约75wt%至约85wt%、约75wt%至约83wt%、约75wt%至约80wt%、或约75wt%至约78wt%。In other various embodiments, the imprint composition contains the imprint solvent at a concentration of about 50 wt %, about 55 wt %, about 60 wt %, about 62 wt %, about 65 wt %, about 68 wt %, or about 70 wt % to about 72 wt % %, about 75 wt %, about 78 wt %, about 80 wt %, about 82 wt %, about 83 wt %, about 85 wt %, about 87 wt %, about 88 wt %, about 90 wt %, or about 95 wt %. For example, the imprint composition contains the imprint solvent at a concentration of about 50 wt % to about 95 wt %, about 60 wt % to about 95 wt %, about 60 wt % to about 90 wt %, about 60 wt % to about 88 wt %, about 60 wt % to about 60 wt % 85wt%, about 60wt% to about 83wt%, about 60wt% to about 80wt%, about 60wt% to about 78wt%, about 60wt% to about 75wt%, about 60wt% to about 72wt%, about 60wt% to about 70wt% , about 60wt% to about 68wt%, about 60wt% to about 65wt%, about 60wt% to about 63wt%, about 70wt% to about 98wt%, about 70wt% to about 95wt%, about 70wt% to about 90wt%, about 70wt% to about 88wt%, about 70wt% to about 85wt%, about 70wt% to about 83wt%, about 70wt% to about 80wt%, about 70wt% to about 78wt%, about 70wt% to about 75wt%, about 70wt% to about 72wt%, about 75wt% to about 98wt%, about 75wt% to about 95wt%, about 75wt% to about 90wt%, about 75wt% to about 88wt%, about 75wt% to about 85wt%, about 75wt% to about 83 wt %, about 75 wt % to about 80 wt %, or about 75 wt % to about 78 wt %.

添加剂可以是或包括一个或多个全氟烷基醚(perfluoroalkyl ether)、一个或多个聚乙二醇、一个或多个脂肪酸、一个或多个硅烷、一个或多个硅氧烷、或前述物质的任何组合。示例性添加剂可以是或包括含氟表面活性剂、含氟添加剂、和/或碳氟化合物(例如,可从杜邦(DuPont)取得的

Figure BDA0003698694250000081
FS-66或FS-68含氟表面活性剂)、乙醇酸乙氧基油醚(glycolic acid ethoxylate oleyl ether)、聚乙二醇、聚丙二醇、月桂酸、肉豆蔻酸、硬脂酸、棕榈酸、二甲基二乙氧基硅烷(dimethyldiethoxysilane)、聚二甲基硅氧烷(polydimethylsiloxane)、聚二苯基硅氧烷(polydiphenylsiloxane)、六甲基环三硅氧烷(hexamethylcyclotrisiloxane)、八甲基环四硅氧烷(octamethylcyclotetrasiloxane)、硅烷醇封端聚二甲基硅氧烷(silanol terminated polydimethylsiloxane)、乙烯基封端聚二甲基硅氧烷(vinyl terminated polydimethylsiloxane)、1,2-丙二醇(1,2-propanediol)、前述物质的盐类、前述物质的酯类、前述物质的配合物、或前述物质的任何组合。添加剂可以是或包括一个或多个二元醇、一个或多个具有三个或更多个醇基团的醇类、或前述物质的任何组合。在一个或多个实例中,添加剂含有1,2-丙二醇。在一些实例中,基于这些纳米粒子的重量,添加剂的浓度是约0.01wt%至约2.5wt%。The additive may be or include one or more perfluoroalkyl ethers, one or more polyethylene glycols, one or more fatty acids, one or more silanes, one or more siloxanes, or the foregoing any combination of substances. Exemplary additives may be or include fluorosurfactants, fluoroadditives, and/or fluorocarbons (eg, available from DuPont)
Figure BDA0003698694250000081
FS-66 or FS-68 fluorosurfactant), glycolic acid ethoxylate oleyl ether, polyethylene glycol, polypropylene glycol, lauric acid, myristic acid, stearic acid, palmitic acid , dimethyldiethoxysilane, polydimethylsiloxane, polydiphenylsiloxane, hexamethylcyclotrisiloxane, octamethyl cyclotetrasiloxane (octamethylcyclotetrasiloxane), silanol terminated polydimethylsiloxane (silanol terminated polydimethylsiloxane), vinyl terminated polydimethylsiloxane (vinyl terminated polydimethylsiloxane), 1,2-propanediol (1 , 2-propanediol), salts of the foregoing, esters of the foregoing, complexes of the foregoing, or any combination of the foregoing. The additive may be or include one or more glycols, one or more alcohols having three or more alcohol groups, or any combination of the foregoing. In one or more examples, the additive contains 1,2-propanediol. In some examples, the concentration of the additive is from about 0.01 wt% to about 2.5 wt% based on the weight of the nanoparticles.

压印组成物含有添加剂的浓度是约0.01wt%、约0.05wt%、约0.1wt%、约0.2wt%、约0.3wt%、约0.5wt%、约0.8wt%、或约1wt%至约1.2wt%、约1.5wt%、约1.8wt%、约2wt%、约2.5wt%、约3wt%、约3.5wt%、约4wt%、约5wt%、约6wt%、约8wt%、或约10wt%。例如,压印组成物含有添加剂的浓度是约0.01wt%至约10wt%、约0.01wt%至约8wt%、约0.01wt%至约5wt%、约0.01wt%至约4wt%、约0.01wt%至约3wt%、约0.01wt%至约2wt%、约0.01wt%至约1wt%、约0.01wt%至约0.5wt%、约0.01wt%至约0.1wt%、约0.01wt%至约0.05wt%、约0.1wt%至约10wt%、约0.1wt%至约8wt%、约0.1wt%至约5wt%、约0.1wt%至约4wt%、约0.1wt%至约3wt%、约0.1wt%至约2wt%、约0.1wt%至约1wt%、约0.1wt%至约0.5wt%、约1wt%至约10wt%、约1wt%至约8wt%、约1wt%至约5wt%、约1wt%至约4wt%、约1wt%至约3wt%、约1wt%至约2wt%、或约1wt%至约1.5wt%。The imprint composition contains the additive at a concentration of about 0.01 wt %, about 0.05 wt %, about 0.1 wt %, about 0.2 wt %, about 0.3 wt %, about 0.5 wt %, about 0.8 wt %, or about 1 wt % to about 1.2 wt %, about 1.5 wt %, about 1.8 wt %, about 2 wt %, about 2.5 wt %, about 3 wt %, about 3.5 wt %, about 4 wt %, about 5 wt %, about 6 wt %, about 8 wt %, or about 10wt%. For example, the imprint composition contains the additive at a concentration of about 0.01 wt % to about 10 wt %, about 0.01 wt % to about 8 wt %, about 0.01 wt % to about 5 wt %, about 0.01 wt % to about 4 wt %, about 0.01 wt % % to about 3wt%, about 0.01wt% to about 2wt%, about 0.01wt% to about 1wt%, about 0.01wt% to about 0.5wt%, about 0.01wt% to about 0.1wt%, about 0.01wt% to about 0.05wt%, about 0.1wt% to about 10wt%, about 0.1wt% to about 8wt%, about 0.1wt% to about 5wt%, about 0.1wt% to about 4wt%, about 0.1wt% to about 3wt%, about 0.1 wt % to about 2 wt %, about 0.1 wt % to about 1 wt %, about 0.1 wt % to about 0.5 wt %, about 1 wt % to about 10 wt %, about 1 wt % to about 8 wt %, about 1 wt % to about 5 wt % , about 1 wt % to about 4 wt %, about 1 wt % to about 3 wt %, about 1 wt % to about 2 wt %, or about 1 wt % to about 1.5 wt %.

丙烯酸酯可以是或包括一个或多个甲基丙烯酸酯(methacrylate)、一个或多个丙烯酸乙酯(ethylacrylate)、一个或多个丙烯酸丙酯(propylacrylate)、一个或多个丙烯酸丁酯(butylacrylate)、一个或多个单官能基丙烯酸酯(mono-functional acrylate)、一个或多个双官能基丙烯酸酯(di-functional acrylate)、一个或多个三官能基丙烯酸酯(tri-functional acrylate)、其他多官能基丙烯酸酯(multi-functional acrylate)、或前述物质的任何组合。示例性丙烯酸酯可以是或包括3-(三甲氧基硅烷基)甲基丙烯酸丙酯(3-(trimethoxysilyl)propyl methacrylate)(3-MPS)、3-(三甲氧基硅烷基)丙烯酸丙酯(3-(trimethoxysilyl)propyl acrylate)、二(乙二醇)甲基醚丙烯酸酯(di(ethyleneglycol)methyl ether methacrylate)、乙二醇甲基醚丙烯酸酯(ethylene glycol methylether methacrylate)、甲基丙烯酸2-乙基己酯(2-ethylhexyl methacrylate)、甲基丙烯酸乙酯(ethyl methacrylate)、甲基丙烯酸己酯(hexyl methacrylate)、甲基丙烯酸(methacrylic acid)、甲基丙烯酸乙烯酯(vinyl methacrylate)、前述物质的单体分子、前述物质的聚合物、前述物质的盐类、前述物质的配合物、或任何组合。在一些实例中,基于这些纳米粒子的重量,丙烯酸酯的浓度是约0.05wt%至约10wt%。The acrylate may be or include one or more methacrylate, one or more ethylacrylate, one or more propylacrylate, one or more butylacrylate , one or more mono-functional acrylate (mono-functional acrylate), one or more di-functional acrylate (di-functional acrylate), one or more tri-functional acrylate (tri-functional acrylate), other Multi-functional acrylate, or any combination of the foregoing. Exemplary acrylates can be or include 3-(trimethoxysilyl)propyl methacrylate (3-MPS), 3-(trimethoxysilyl)propyl methacrylate ( 3-(trimethoxysilyl)propyl acrylate), di(ethyleneglycol)methyl ether methacrylate, ethylene glycol methylether methacrylate, 2-methacrylate 2-ethylhexyl methacrylate, ethyl methacrylate, hexyl methacrylate, methacrylic acid, vinyl methacrylate, the foregoing Monomeric molecules of the foregoing, polymers of the foregoing, salts of the foregoing, complexes of the foregoing, or any combination. In some examples, the concentration of acrylate is from about 0.05 wt% to about 10 wt% based on the weight of the nanoparticles.

压印组成物含有丙烯酸酯的浓度是约0.1wt%、约0.2wt%、约0.3wt%、约0.5wt%、约0.8wt%、约1wt%至约1.2wt%、约1.5wt%、约1.8wt%、或约2wt%、约2.2wt%、约2.3wt%、约2.5wt%、约2.8wt%、约3wt%、约3.2wt%、约3.5wt%、约3.8wt%、约4wt%、约5wt%、约6wt%、约8wt%、约10wt%、约12wt%、约15wt%、约18wt%、或约20wt%。例如,压印组成物含有丙烯酸酯的浓度是约0.1wt%至约20wt%、约0.1wt%至约15wt%、约0.1wt%至约10wt%、约0.1wt%至约8wt%、约0.1wt%至约5wt%、约0.1wt%至约4wt%、约0.1wt%至约3wt%、约0.1wt%至约2wt%、约0.1wt%至约1wt%、约0.1wt%至约0.5wt%、约1wt%至约20wt%、约1wt%至约15wt%、约1wt%至约10wt%、约1wt%至约8wt%、约1wt%至约5wt%、约1wt%至约4wt%、约1wt%至约3.5wt%、约1wt%至约3.2wt%、约1wt%至约3wt%、约1wt%至约2.8wt%、约1wt%至约2.5wt%、约1wt%至约2.3wt%、约1wt%至约2.2wt%、约1wt%至约2wt%、约1wt%至约1.8wt%、约1wt%至约1.5wt%、约1.8wt%至约20wt%、约1.8wt%至约15wt%、约1.8wt%至约10wt%、约1.8wt%至约8wt%、约1.8wt%至约5wt%、约1.8wt%至约4wt%、约1.8wt%至约3.5wt%、约1.8wt%至约3.2wt%、约1.8wt%至约3wt%、约1.8wt%至约2.8wt%、约1.8wt%至约2.5wt%、约1.8wt%至约2.3wt%、约1.8wt%至约2.2wt%、或约1.8wt%至约2wt%。The imprint composition contains acrylate at a concentration of about 0.1 wt %, about 0.2 wt %, about 0.3 wt %, about 0.5 wt %, about 0.8 wt %, about 1 wt % to about 1.2 wt %, about 1.5 wt %, about 1.8wt%, or about 2wt%, about 2.2wt%, about 2.3wt%, about 2.5wt%, about 2.8wt%, about 3wt%, about 3.2wt%, about 3.5wt%, about 3.8wt%, about 4wt% %, about 5 wt %, about 6 wt %, about 8 wt %, about 10 wt %, about 12 wt %, about 15 wt %, about 18 wt %, or about 20 wt %. For example, the imprint composition contains acrylates at a concentration of about 0.1 wt% to about 20 wt%, about 0.1 wt% to about 15 wt%, about 0.1 wt% to about 10 wt%, about 0.1 wt% to about 8 wt%, about 0.1 wt% wt % to about 5 wt %, about 0.1 wt % to about 4 wt %, about 0.1 wt % to about 3 wt %, about 0.1 wt % to about 2 wt %, about 0.1 wt % to about 1 wt %, about 0.1 wt % to about 0.5 wt % wt %, about 1 wt % to about 20 wt %, about 1 wt % to about 15 wt %, about 1 wt % to about 10 wt %, about 1 wt % to about 8 wt %, about 1 wt % to about 5 wt %, about 1 wt % to about 4 wt % , about 1 wt % to about 3.5 wt %, about 1 wt % to about 3.2 wt %, about 1 wt % to about 3 wt %, about 1 wt % to about 2.8 wt %, about 1 wt % to about 2.5 wt %, about 1 wt % to about 1 wt % 2.3wt%, about 1wt% to about 2.2wt%, about 1wt% to about 2wt%, about 1wt% to about 1.8wt%, about 1wt% to about 1.5wt%, about 1.8wt% to about 20wt%, about 1.8 wt % to about 15 wt %, about 1.8 wt % to about 10 wt %, about 1.8 wt % to about 8 wt %, about 1.8 wt % to about 5 wt %, about 1.8 wt % to about 4 wt %, about 1.8 wt % to about 3.5 wt % wt %, about 1.8 wt % to about 3.2 wt %, about 1.8 wt % to about 3 wt %, about 1.8 wt % to about 2.8 wt %, about 1.8 wt % to about 2.5 wt %, about 1.8 wt % to about 2.3 wt % %, from about 1.8 wt % to about 2.2 wt %, or from about 1.8 wt % to about 2 wt %.

在一个或多个实例中,压印组成物含有约0.5wt%至约40wt%的纳米粒子、约50wt%至约90wt%的一个或多个溶剂、约5wt%至约40wt%的表面配体、约0.01wt%至约5wt%的添加剂、和约0.1wt%至约10wt%的丙烯酸酯。在其他多个实例中,压印组成物含有约1wt%至约25wt%的纳米粒子、约60wt%至约85wt%的一个或多个溶剂、约6wt%至约35wt%的表面配体、约0.05wt%至约3wt%的添加剂、和约0.3wt%至约8wt%的丙烯酸酯。在一些实例中,压印组成物含有约5wt%至约20wt%的纳米粒子、约65wt%至约80wt%的一个或多个溶剂、约7wt%至约31wt%的表面配体、约0.09wt%至约1.5wt%的添加剂、和约0.5wt%至约6wt%的丙烯酸酯。In one or more examples, the imprint composition contains about 0.5 wt% to about 40 wt% nanoparticles, about 50 wt% to about 90 wt% one or more solvents, about 5 wt% to about 40 wt% surface ligands , about 0.01 wt % to about 5 wt % additives, and about 0.1 wt % to about 10 wt % acrylate. In other various examples, the imprint composition contains from about 1 wt % to about 25 wt % nanoparticles, from about 60 wt % to about 85 wt % one or more solvents, from about 6 wt % to about 35 wt % surface ligands, about 0.05 wt% to about 3 wt% additive, and about 0.3 wt% to about 8 wt% acrylate. In some examples, the imprint composition contains about 5 wt% to about 20 wt% nanoparticles, about 65 wt% to about 80 wt% one or more solvents, about 7 wt% to about 31 wt% surface ligands, about 0.09 wt% % to about 1.5 wt% additive, and about 0.5 wt% to about 6 wt% acrylate.

压印组成物可具有于23℃的温度所量测的黏度是约1cP、约2cP、约3cP、约5cP、约8cP、或约10cP至约12cP、约15cP、约20cP、约25cP、约30cP、约40cP、约50cP、或约70cP。例如,压印组成物可具有于23℃的温度所量测的黏度是约1cP至约70cP、约1cP至约50cP、约1cP至约40cP、约1cP至约30cP、约1cP至约20cP、约1cP至约10cP、约1cP至约5cP、约10cP至约70cP、约10cP至约50cP、约10cP至约40cP、约10cP至约30cP、约10cP至约20cP、约20cP至约70cP、约20cP至约50cP、约20cP至约40cP、约20cP至约30cP、或约20cP至约25cP。The imprint composition may have a viscosity measured at a temperature of 23°C of about 1 cP, about 2 cP, about 3 cP, about 5 cP, about 8 cP, or about 10 cP to about 12 cP, about 15 cP, about 20 cP, about 25 cP, about 30 cP , about 40 cP, about 50 cP, or about 70 cP. For example, the imprint composition may have a viscosity measured at a temperature of 23°C of about 1 cP to about 70 cP, about 1 cP to about 50 cP, about 1 cP to about 40 cP, about 1 cP to about 30 cP, about 1 cP to about 20 cP, about 1 cP to about 10 cP, about 1 cP to about 5 cP, about 10 cP to about 70 cP, about 10 cP to about 50 cP, about 10 cP to about 40 cP, about 10 cP to about 30 cP, about 10 cP to about 20 cP, about 20 cP to about 70 cP, about 20 cP to About 50 cP, about 20 cP to about 40 cP, about 20 cP to about 30 cP, or about 20 cP to about 25 cP.

制备压印表面的方法Method for preparing an embossed surface

在一个或多个实施方式中,提供制备压印表面的方法,诸如NIL膜。压印表面是本文所说明与论述的纳米压印膜的一个或多个暴露表面。此方法包括将压印组成物设置、涂布、或者放置在一个或多个基板上、使压印组成物接触具有图案的印模、将压印组成物转变成压印材料(例如,纳米压印膜)、和从压印材料移除印模。在一些实例中,基板(例如,晶片)可以是或包括玻璃、石英、氧化硅,诸如玻璃基板或玻璃晶片。在其他多个实例中,基板可以是或包括硅、硅锗、塑料、和/或其他材料。压印组成物可具有约1.7至约2.0的折射率。在印模上且被转移至压印表面的图案可以是1维图案、2维图案、或3维图案。In one or more embodiments, methods of making imprinted surfaces, such as NIL films, are provided. An imprinted surface is one or more exposed surfaces of the nanoimprinted films described and discussed herein. The method includes disposing, coating, or otherwise placing an imprint composition on one or more substrates, contacting the imprint composition with a patterned stamp, converting the imprint composition into an imprint material (eg, nanoimprint printing film), and removing the stamp from the stamping material. In some examples, the substrate (eg, wafer) may be or include glass, quartz, silicon oxide, such as a glass substrate or glass wafer. In other examples, the substrate may be or include silicon, silicon germanium, plastic, and/or other materials. The imprint composition may have a refractive index of about 1.7 to about 2.0. The pattern on the stamp and transferred to the imprint surface can be a 1-dimensional pattern, a 2-dimensional pattern, or a 3-dimensional pattern.

图1A-图1F图描绘通过在制备诸如根据本文所说明与论述的一个或多个实施方式的纳米压印膜的含有纳米粒子的纳米压印膜时的多个操作而被处理的工件的截面图。纳米压印膜通过压印工艺形成在基板上。压印工艺包括将含有纳米粒子的压印组成物104设置在基板102上并将印模120对准在压印组成物104上或接近于压印组成物104(图1A)。以具有图案的印模120压印或者接触压印组成物104(图1B-图1C)。压印组成物104转变成纳米压印膜106(图1D图)。在一些实例中,使用以热和/或辐射(UV光)的固化工艺以将压印组成物104转变成纳米压印膜106。从纳米压印膜106移除印模120,留下纳米压印膜106设置在基板102上(图1E-图1F)。FIGS. 1A-1F depict cross-sections of workpieces processed through various operations in preparing nanoparticle-containing nanoimprint films, such as nanoimprint films in accordance with one or more embodiments described and discussed herein. picture. The nanoimprint film is formed on the substrate through an imprint process. The imprint process includes disposing a nanoparticle-containing imprint composition 104 on a substrate 102 and aligning a stamp 120 on or near the imprint composition 104 (FIG. 1A). Composition 104 is imprinted or contact imprinted with patterned stamp 120 (FIGS. 1B-1C). The imprint composition 104 is transformed into a nanoimprint film 106 (FIG. ID). In some examples, a curing process with heat and/or radiation (UV light) is used to convert imprint composition 104 into nanoimprint film 106 . The stamp 120 is removed from the nanoimprinted film 106, leaving the nanoimprinted film 106 disposed on the substrate 102 (FIGS. 1E-1F).

在一些实例中,压印组成物通过旋涂、滴降式涂布(drop casting)、刮刀涂布(blade coating)、和/或其他涂布处理而设置在基板上。压印组成物设置在基板上作为具有预定厚度的膜或层。压印组成物的厚度是约50nm、约80nm、约100nm、约120nm、约150nm、或约200nm至约250nm、约300nm、约400nm、约500nm、约600nm、约800nm、约1,000nm、约1,200nm、或更厚。例如,压印组成物的厚度是约50nm至约1,000nm、约100nm至约1,000nm、约200nm至约1,000nm、约400nm至约1,000nm、约500nm至约1,000nm、约600nm至约1,000nm、约800nm至约1,000nm、约50nm至约600nm、约100nm至约600nm、约200nm至约600nm、约400nm至约600nm、约500nm至约600nm、约50nm至约400nm、约100nm至约400nm、约200nm至约400nm、或约300nm至约400nm。In some examples, the imprint composition is disposed on the substrate by spin coating, drop casting, blade coating, and/or other coating processes. The imprint composition is provided on the substrate as a film or layer having a predetermined thickness. The thickness of the imprint composition is about 50 nm, about 80 nm, about 100 nm, about 120 nm, about 150 nm, or about 200 nm to about 250 nm, about 300 nm, about 400 nm, about 500 nm, about 600 nm, about 800 nm, about 1,000 nm, about 1,200 nm nm, or thicker. For example, the thickness of the imprint composition is about 50 nm to about 1,000 nm, about 100 nm to about 1,000 nm, about 200 nm to about 1,000 nm, about 400 nm to about 1,000 nm, about 500 nm to about 1,000 nm, about 600 nm to about 1,000 nm , about 800 nm to about 1,000 nm, about 50 nm to about 600 nm, about 100 nm to about 600 nm, about 200 nm to about 600 nm, about 400 nm to about 600 nm, about 500 nm to about 600 nm, about 50 nm to about 400 nm, about 100 nm to about 400 nm, About 200 nm to about 400 nm, or about 300 nm to about 400 nm.

通过将压印组成物暴露于热、紫外线光、红外线光、可见光、微波辐射、和/或前述物质的任何组合,压印组成物转变成压印材料。在一个或多个实例中,当将压印组成物转变为压印材料时,压印组成物暴露于具有约300nm至约365nm的波长的光源。在其他多个实例中,当将压印组成物转变为压印材料时,压印组成物暴露于热并保持在约30℃至约100℃的温度持续约30秒至约1小时的时期。在一些实例中,压印组成物暴露于热并保持在约50℃至约60℃的温度持续约1分钟至约15分钟的时期。The imprinting composition is converted into an imprinting material by exposing the imprinting composition to heat, ultraviolet light, infrared light, visible light, microwave radiation, and/or any combination of the foregoing. In one or more examples, when converting the imprint composition into an imprint material, the imprint composition is exposed to a light source having a wavelength of about 300 nm to about 365 nm. In other various examples, when converting the imprint composition into an imprint material, the imprint composition is exposed to heat and maintained at a temperature of about 30°C to about 100°C for a period of about 30 seconds to about 1 hour. In some examples, the imprint composition is exposed to heat and maintained at a temperature of about 50°C to about 60°C for a period of about 1 minute to about 15 minutes.

在一个或多个实施方式中,压印组成物中的一个或多个丙烯酸酯可被聚合和/或寡聚化,同时产生(例如,固化或者转变)压印材料。In one or more embodiments, one or more acrylates in the imprint composition can be polymerized and/or oligomerized while producing (eg, curing or transforming) the imprint material.

下方是可以通过本文所说明与论述的多个实施方式生产的压印组成物的多个预示实例。The following are several prophetic examples of imprint compositions that can be produced by the various embodiments described and discussed herein.

Figure BDA0003698694250000121
Figure BDA0003698694250000121

Figure BDA0003698694250000122
Figure BDA0003698694250000122

Figure BDA0003698694250000131
Figure BDA0003698694250000131

Figure BDA0003698694250000132
Figure BDA0003698694250000132

在本文所说明与论述的一个或多个实施方式中,压印材料含有或包括无机氧化物纳米粒子(约1wt%至约95wt%)、甲基丙烯酸酯或丙烯酸酯或氯-丙烯酸酯黏合剂(约0.1wt%至约10wt%)、诸如二元醇、脂肪酸、胺类的高沸点成分(约0.1wt%至约5wt%)、和乙醚或乙酸溶剂(约5wt%至约20wt%),带有最佳的黏度(在约23℃下约1cP至约50cP)。压印材料在不同重量百分比(约1wt%至约50wt%)展现带有在可见光区域中大于90%的光学透明性的大于1.7的高折射率,且容许带有约1%至约30%(在一些实例中,小于1%)的特征收缩的高分辨率大面积图案化。与高折射率材料结合的纳米压印平板印刷术提供独特程序以通过直接压印此功能性材料来制造可压印装置。图案化膜具有最终所期望的光学功能性,且不需要额外的蚀刻步骤。此方法结合由上至下的平板印刷术工艺以制造带有高度地控制的微/纳米结构和由下至上的合成化学方法以设计与调整图案化膜的性质的两者的优点。In one or more embodiments described and discussed herein, the imprint material contains or includes inorganic oxide nanoparticles (about 1 wt % to about 95 wt %), a methacrylate or acrylate or chloro-acrylate binder (about 0.1 wt % to about 10 wt %), high boiling components such as glycols, fatty acids, amines (about 0.1 wt % to about 5 wt %), and diethyl ether or acetic acid solvent (about 5 wt % to about 20 wt %), With optimum viscosity (about 1 cP to about 50 cP at about 23°C). The imprint material exhibits a high index of refraction greater than 1.7 with optical transparency greater than 90% in the visible region at various weight percentages (about 1 wt % to about 50 wt %), and is tolerated with about 1 wt % to about 30 wt % ( In some examples, high-resolution large area patterning of feature shrinkage of less than 1%). Nanoimprint lithography combined with high refractive index materials provides a unique procedure to fabricate imprintable devices by directly imprinting this functional material. The patterned film has the final desired optical functionality and does not require additional etching steps. This approach combines the advantages of both a top-down lithography process to fabricate micro/nanostructures with a high degree of control and a bottom-up synthetic chemistry approach to design and tune the properties of patterned films.

在本文所说明与论述的其他多个实施方式中,制备无机纳米粒子压印组成物且具有约1cP至约50cP(在约23℃)的低黏度、高折射率、且光学地透明和可简单地处理。无机压印组成物可包括或含有在约1wt%至约80wt%的高沸点基于乙醚或乙酸溶剂中的球形或立方形或卵形纳米粒子,可以是或可以不是核心-外壳,(约2至约20nm)。压印组成物可包括或含有以下一种或多种:甲基丙烯酸酯或丙烯酸酯黏合剂(约0.1wt%至约10wt%)、脂肪酸(约0.05wt%至约5wt%)、胺(约0.05wt%至约5wt%)、基于PEG的单体分子(约0.1wt%至约15wt%)、及全氟或硅氧烷分散剂(约0.05wt%至约5wt%),上述物质的一种或多种作为表面活性剂。最终的压印组成物维持在室温(约23℃)的光学透明持续大于6个月且可被过滤或不过滤使用。In other various embodiments described and discussed herein, inorganic nanoparticle imprint compositions are prepared and have a low viscosity of about 1 cP to about 50 cP (at about 23° C.), a high refractive index, and are optically transparent and simple deal with. The inorganic imprint composition may comprise or contain spherical or cubic or oval nanoparticles, which may or may not be core-shell, in a high boiling ether or acetic acid based solvent from about 1 wt % to about 80 wt %, (about 2 to about 20 nm). The imprint composition may include or contain one or more of the following: methacrylate or acrylate binders (about 0.1 wt % to about 10 wt %), fatty acids (about 0.05 wt % to about 5 wt %), amines (about 0.05 wt % to about 5 wt %) 0.05 wt % to about 5 wt %), PEG-based monomer molecules (about 0.1 wt % to about 15 wt %), and perfluoro or silicone dispersants (about 0.05 wt % to about 5 wt %), one of the foregoing one or more as surfactants. The final imprint composition maintains optical clarity at room temperature (about 23°C) for greater than 6 months and can be used with or without filtration.

在某些实施方式中,可缩放、溶剂辅助的软NIL方法用以产生大面积的纳米图案化特征和结构。此形式的NIL使用聚二甲基硅氧烷(PDMS)或其他硅酮印模,聚二甲基硅氧烷或其他硅酮印模中的许多可由一硅母料(silicon master)所生产,且聚二甲基硅氧烷或其他硅酮印模中的每一者可再使用许多次,而最小化成本。压印结构的面积因而主要地仅受限于原始图案化母料的尺寸。使用PDMS可复制小于100nm的特征尺寸。简洁地,经过滤或保持原样的压印组成物被分配在基板的表面上。旋转基板以产生具有约100nm至约400nm的厚度的膜。PDMS模具放置在旋转膜的表面上,然后在约50℃至约60℃热固化。以波长为约300nm至约365nm的光源且以约10Jcm-2至约50Jcm-2的功率完成UV固化。在压印组成物的固化以产生压印材料之后,在格栅的方向上或相对于(opposite)格栅的方向上移除PDMS印模。释放的印模被再次使用,而压印可通过热和/或UV处理而被额外固化以致密化此材料。In certain embodiments, scalable, solvent-assisted soft NIL methods are used to generate large-area nanopatterned features and structures. This form of NIL uses polydimethylsiloxane (PDMS) or other silicone stamps, many of which can be produced from a silicon master, And each of the polydimethylsiloxane or other silicone stamps can be reused many times with minimal cost. The area of the imprinted structures is thus mainly limited only by the size of the original patterned masterbatch. Feature sizes smaller than 100 nm can be replicated using PDMS. Briefly, the filtered or undisturbed imprint composition is dispensed on the surface of the substrate. The substrate is rotated to produce a film having a thickness of about 100 nm to about 400 nm. The PDMS mold is placed on the surface of the spinning film and then thermally cured at about 50°C to about 60°C. UV curing is accomplished with a light source having a wavelength of about 300 nm to about 365 nm and a power of about 10 Jcm" 2 to about 50 Jcm" 2 . After curing of the imprint composition to produce the imprint material, the PDMS stamp is removed in the direction of the grid or opposite to the grid. The released stamp is reused, and the stamp can be additionally cured by thermal and/or UV treatment to densify the material.

图2描绘根据本文所说明与论述的一个或多个实施方式的含有如图1F所描绘的纳米压印膜106的光学装置200的前视图。需要理解的是下方所述的光学装置200是示例性光学装置。在一个或多个实施方式中,光学装置200是波导组合器,诸如扩增实境波导组合器。在其他多个实施方式中,光学装置200是平坦光学装置,诸如超颖表面(metasurface)。光学装置200包括多个装置结构204。装置结构204可以是具有亚微米尺度的纳米结构,例如,纳米尺寸尺度,诸如小于1μm的临界尺寸。在一个或多个实施方式中,装置结构204的区域对应于一个或多个格栅202,诸如格栅区域202a和格栅区域202b。在一个或多个实施方式中,光学装置200包括第一格栅区域202a和第二格栅区域202b,且第一格栅区域202a与202b的每一个分别含有多个装置结构204。FIG. 2 depicts a front view of an optical device 200 including a nanoimprinted film 106 as depicted in FIG. 1F , in accordance with one or more embodiments described and discussed herein. It is to be understood that the optical device 200 described below is an exemplary optical device. In one or more embodiments, the optical device 200 is a waveguide combiner, such as an augmented reality waveguide combiner. In other various embodiments, the optical device 200 is a flat optical device, such as a metasurface. Optical device 200 includes a plurality of device structures 204 . The device structures 204 may be nanostructures having sub-micron scales, eg, nanoscale scales, such as critical dimensions of less than 1 μm. In one or more embodiments, regions of device structure 204 correspond to one or more grids 202, such as grid region 202a and grid region 202b. In one or more embodiments, the optical device 200 includes a first grid region 202a and a second grid region 202b, and each of the first grid regions 202a and 202b includes a plurality of device structures 204, respectively.

在本文所述的多个实施方式中,格栅202的深度可跨越格栅区域202a与格栅区域202b变动。在一些实施方式中,格栅202的深度可在第一格栅区域202a与第二格栅区域202b的范围平滑地变动。在一个或多个实施方式中,跨越这些格栅区域的一个格栅区域的深度可从约10nm变化至约400nm。一些实例中的格栅区域202a在一给定侧部上可从约20mm变化至约50mm。因此,如一些实例,格栅202的深度中的改变的角度可在.0005度的程度。In various embodiments described herein, the depth of grid 202 may vary across grid region 202a and grid region 202b. In some embodiments, the depth of the grid 202 may smoothly vary over the range of the first grid region 202a and the second grid region 202b. In one or more embodiments, the depth of a grid region across the grid regions can vary from about 10 nm to about 400 nm. The grid area 202a in some examples may vary from about 20 mm to about 50 mm on a given side. Thus, as some examples, the angle of change in the depth of grid 202 may be on the order of .0005 degrees.

在本文所述的多个实施方式中,可使用激光烧蚀创造装置结构204。当在本文中使用时,激光烧蚀用以在装置材料中产生三维微结构,或任选地在覆盖装置材料的牺牲层中创造可变动深度结构作为可变动深度结构处理的部分。使用激光烧蚀以创造光学结构204容许相较于现存方法更少的处理操作和更高的可变动深度分辨率。In various embodiments described herein, laser ablation may be used to create device structures 204 . As used herein, laser ablation is used to create three-dimensional microstructures in the device material, or optionally to create variable depth structures in a sacrificial layer overlying the device material as part of variable depth structure processing. The use of laser ablation to create the optical structure 204 allows fewer processing operations and higher variable depth resolution than existing methods.

本发明的多个实施方式进一步涉及接下来的段落1-46中的任一个或多个:Embodiments of the invention further relate to any one or more of the following paragraphs 1-46:

1.一种压印组成物,包含:纳米粒子;一个或多个溶剂;表面配体;添加剂;和丙烯酸酯。CLAIMS 1. An imprint composition comprising: nanoparticles; one or more solvents; surface ligands; additives; and acrylates.

2.一种压印组成物,包含:约0.5wt%至约40wt%的纳米粒子;约50wt%至约90wt%的溶剂;约5wt%至约40wt%的表面配体;约0.01wt%至约5wt%的添加剂;和约0.1wt%至约10wt%的丙烯酸酯,其中每个纳米粒子包含核心和外壳,其中核心包含氧化钛、氧化铌、或氧化锆,其中外壳包含氧化硅、氧化锆、氧化铌、或前述物质的任何组合,且其中核心与外壳包含不同材料。2. An imprint composition comprising: about 0.5 wt % to about 40 wt % nanoparticles; about 50 wt % to about 90 wt % solvent; about 5 wt % to about 40 wt % surface ligands; about 0.01 wt % to about 0.01 wt % about 5 wt % additive; and about 0.1 wt % to about 10 wt % acrylate, wherein each nanoparticle comprises a core and a shell, wherein the core comprises titanium oxide, niobium oxide, or zirconia, wherein the shell comprises silicon oxide, zirconium oxide, Niobium oxide, or any combination of the foregoing, and wherein the core and outer shell comprise different materials.

3.根据段落1的压印组成物,其中压印组成物包含:约0.5wt%至约40wt%的纳米粒子;约50wt%至约90wt%的溶剂;约5wt%至约40wt%的表面配体;约0.01wt%至约5wt%的添加剂;和约0.1wt%至约10wt%的丙烯酸酯。3. The imprint composition of paragraph 1, wherein the imprint composition comprises: about 0.5 wt % to about 40 wt % nanoparticles; about 50 wt % to about 90 wt % solvent; about 5 wt % to about 40 wt % surface formulation; body; about 0.01 wt % to about 5 wt % additive; and about 0.1 wt % to about 10 wt % acrylate.

4.根据段落1~3中的任一段落的压印组成物,其中压印组成物包含:约1wt%至约25wt%的纳米粒子;约60wt%至约85wt%的溶剂;约6wt%至约35wt%的表面配体;约0.05wt%至约3wt%的添加剂;和约0.3wt%至约8wt%的丙烯酸酯。4. The imprint composition of any of paragraphs 1-3, wherein the imprint composition comprises: about 1 wt % to about 25 wt % nanoparticles; about 60 wt % to about 85 wt % solvent; about 6 wt % to about 35 wt% surface ligand; about 0.05 wt% to about 3 wt% additive; and about 0.3 wt% to about 8 wt% acrylate.

5.根据段落1~4中的任一段落的压印组成物,其中压印组成物包含:约5wt%至约20wt%的纳米粒子;约65wt%至约80wt%的溶剂;约7wt%至约31wt%的表面配体;约0.09wt%至约1.5wt%的添加剂;和约0.5wt%至约6wt%的丙烯酸酯。5. The imprint composition of any of paragraphs 1-4, wherein the imprint composition comprises: about 5 wt % to about 20 wt % nanoparticles; about 65 wt % to about 80 wt % solvent; about 7 wt % to about 31 wt% surface ligand; about 0.09 wt% to about 1.5 wt% additive; and about 0.5 wt% to about 6 wt% acrylate.

6.根据段落1~5中的任一段落的压印组成物,其中纳米粒子具有选自由球形、卵形、杆形、立方形、线形、圆柱形、矩形、或前述形状的组合所构成的群组中的形状。6. The imprint composition of any of paragraphs 1-5, wherein the nanoparticles have a group selected from the group consisting of spherical, oval, rod-shaped, cubic, linear, cylindrical, rectangular, or a combination of the foregoing shapes Group of shapes.

7.根据段落1~6中的任一段落的压印组成物,其中纳米粒子包含金属氧化物或钻石材料。7. The imprint composition of any of paragraphs 1-6, wherein the nanoparticles comprise a metal oxide or diamond material.

8.根据段落1~7中的任一段落的压印组成物,其中纳米粒子包含氧化铌。8. The imprint composition of any of paragraphs 1-7, wherein the nanoparticles comprise niobium oxide.

9.根据段落1~8中的任一段落的压印组成物,其中每个纳米粒子包含核心和一个或多个外壳。9. The imprint composition of any of paragraphs 1-8, wherein each nanoparticle comprises a core and one or more shells.

10.根据段落9的压印组成物,其中核心包含氧化钛而外壳包含氧化硅、氧化锆、氧化铌、或前述物质的任何组合。10. The imprint composition of paragraph 9, wherein the core comprises titanium oxide and the outer shell comprises silicon oxide, zirconium oxide, niobium oxide, or any combination of the foregoing.

11.根据段落9的压印组成物,其中核心包含氧化铌而外壳包含氧化硅、氧化锆、或前述物质的任何组合。11. The imprint composition of paragraph 9, wherein the core comprises niobium oxide and the outer shell comprises silicon oxide, zirconium oxide, or any combination of the foregoing.

12.根据段落9的压印组成物,其中核心包含氧化锆而外壳包含氧化硅。12. The imprint composition of paragraph 9, wherein the core comprises zirconia and the outer shell comprises silicon oxide.

13.根据段落1~12中的任一段落的压印组成物,其中纳米粒子和/或核心的每一者独立地具有约2nm至约500nm的直径且外壳具有约0.1nm至约100nm的厚度。13. The imprint composition of any of paragraphs 1-12, wherein each of the nanoparticles and/or core independently has a diameter of about 2 nm to about 500 nm and the shell has a thickness of about 0.1 nm to about 100 nm.

14.根据段落1~13中的任一段落的压印组成物,其中纳米粒子和/或核心的每一者独立地具有约5nm至约200nm的直径且外壳具有约0.5nm至约60nm的厚度。14. The imprint composition of any of paragraphs 1-13, wherein each of the nanoparticles and/or core independently has a diameter of about 5 nm to about 200 nm and the shell has a thickness of about 0.5 nm to about 60 nm.

15.根据段落1~14中的任一段落的压印组成物,其中纳米粒子和/或核心的每一者独立地具有约10nm至约100nm的直径且外壳具有约1nm至约15nm的厚度。15. The imprint composition of any of paragraphs 1-14, wherein each of the nanoparticles and/or core independently has a diameter of about 10 nm to about 100 nm and the shell has a thickness of about 1 nm to about 15 nm.

16.根据段落1~15中的任一段落的压印组成物,其中表面配体包含羧酸、酯、胺、醇、硅烷、前述物质的盐类、前述物质的配合物、或前述物质的任何组合。16. The imprint composition of any of paragraphs 1 to 15, wherein the surface ligands comprise carboxylic acids, esters, amines, alcohols, silanes, salts of the foregoing, complexes of the foregoing, or any of the foregoing combination.

17.根据段落1~16中的任一段落的压印组成物,其中表面配体包含油酸(oleicacid)、硬脂酸(stearic acid)、丙酸(propionic acid)、苯甲酸(benzoic acid)、棕榈酸(palmitic acid)、肉豆蔻酸(myristic acid)、甲胺(methylamine)、油胺(oleylamine)、丁胺(butylamine)、苯甲醇(benzyl alcohol)、油醇(oleyl alcohol)、丁醇(butanol)、辛醇(octanol)、十二醇(dodecanol)、正辛基三甲氧基硅烷(octyltrimethoxy silane)、正辛基三乙氧基硅烷(octyltriethoxy silane)、辛烯基三甲氧基硅烷(octenyltrimethoxysilane)、辛烯基三乙氧基硅烷(octenyltriethoxy silane)、3-(三甲氧基硅烷基)甲基丙烯酸丙酯(3-(trimethoxysilyl)propyl methacrylate)、丙基三乙氧基硅烷(propyltriethoxy silane)、前述物质的盐类、前述物质的酯类、前述物质的配合物、或前述物质的任何组合。17. The imprint composition according to any of paragraphs 1 to 16, wherein the surface ligand comprises oleic acid, stearic acid, propionic acid, benzoic acid, Palmitic acid, myristic acid, methylamine, oleylamine, butylamine, benzyl alcohol, oleyl alcohol, butanol ( butanol), octanol, dodecanol, octyltrimethoxy silane, octyltriethoxy silane, octenyltrimethoxy silane ), octenyltriethoxy silane, 3-(trimethoxysilyl)propyl methacrylate, propyltriethoxy silane , salts of the foregoing, esters of the foregoing, complexes of the foregoing, or any combination of the foregoing.

18.根据段落1~17中的任一段落的压印组成物,其中基于这些纳米粒子的重量,表面配体的浓度是约8wt%至约50wt%。18. The imprint composition of any of paragraphs 1-17, wherein the concentration of the surface ligand is from about 8 wt% to about 50 wt% based on the weight of the nanoparticles.

19.根据段落1~18中的任一段落的压印组成物,其中溶剂包含纳米粒子分散溶剂、压印溶剂、或前述物质的组合。19. The imprint composition of any of paragraphs 1-18, wherein the solvent comprises a nanoparticle dispersion solvent, an imprint solvent, or a combination of the foregoing.

20.根据段落1~19中的任一段落的压印组成物,其中溶剂包含纳米粒子分散溶剂,且其中纳米粒子分散溶剂包含乙二醇醚、醇、乙酸、前述物质的酯类、前述物质的盐类、前述物质的衍生物、或前述物质的任何组合。20. The imprint composition according to any of paragraphs 1 to 19, wherein the solvent comprises a nanoparticle dispersion solvent, and wherein the nanoparticle dispersion solvent comprises glycol ethers, alcohols, acetic acid, esters of the foregoing, Salts, derivatives of the foregoing, or any combination of the foregoing.

21.根据段落20的压印组成物,其中纳米粒子分散溶剂包含p系列乙二醇醚、e系列乙二醇醚、或前述物质的任何组合。21. The imprint composition of paragraph 20, wherein the nanoparticle dispersion solvent comprises p-series glycol ethers, e-series glycol ethers, or any combination of the foregoing.

22.根据段落21的压印组成物,其中纳米粒子分散溶剂包含丙二醇甲醚醋酸酯(PGMEA)。22. The imprint composition of paragraph 21, wherein the nanoparticle dispersion solvent comprises propylene glycol methyl ether acetate (PGMEA).

23.根据段落20的压印组成物,其中压印组成物包含纳米粒子分散溶剂的浓度是约0.5wt%至约20wt%。23. The imprint composition of paragraph 20, wherein the imprint composition comprises the nanoparticle dispersion solvent at a concentration of about 0.5 wt% to about 20 wt%.

24.根据段落1~23中的任一段落的压印组成物,其中溶剂包含压印溶剂,且其中压印溶剂包含醇、酯、前述物质的盐类、或前述物质的组合。24. The imprinting composition of any of paragraphs 1-23, wherein the solvent comprises an imprinting solvent, and wherein the imprinting solvent comprises an alcohol, an ester, a salt of the foregoing, or a combination of the foregoing.

25.根据段落24的压印组成物,其中压印溶剂包含乳酸乙酯。25. The imprinting composition of paragraph 24, wherein the imprinting solvent comprises ethyl lactate.

26.根据段落24或25的压印组成物,其中压印组成物包含压印溶剂的浓度是约60wt%至约95wt%。26. The imprinting composition according to paragraph 24 or 25, wherein the imprinting composition comprises the imprinting solvent at a concentration of from about 60 wt% to about 95 wt%.

27.根据段落1~26中的任一段落的压印组成物,其中添加剂包含二元醇、具有三个或更多个醇基团的醇、或前述物质的任何组合。27. The imprint composition of any of paragraphs 1-26, wherein the additive comprises a dihydric alcohol, an alcohol having three or more alcohol groups, or any combination of the foregoing.

28.根据段落27的压印组成物,其中添加剂包含1,2-丙二醇。28. The imprint composition according to paragraph 27, wherein the additive comprises 1,2-propanediol.

29.根据段落1~28中的任一段落的压印组成物,其中添加剂包含全氟烷基醚、聚乙二醇、脂肪酸、硅烷、硅氧烷、或前述物质的任何组合。29. The imprint composition of any of paragraphs 1-28, wherein the additive comprises a perfluoroalkyl ether, polyethylene glycol, fatty acid, silane, siloxane, or any combination of the foregoing.

30.根据段落1~29中的任一段落的压印组成物,其中添加剂包含含氟表面活性剂、含氟添加剂、和/或碳氟化合物、乙醇酸乙氧基油醚(glycolic acid ethoxylate oleylether)、聚乙二醇、聚丙二醇、月桂酸、肉豆蔻酸、硬脂酸、棕榈酸、二甲基二乙氧基硅烷(dimethyldiethoxysilane)、聚二甲基硅氧烷(polydimethylsiloxane)、聚二苯基硅氧烷(polydiphenylsiloxane)、六甲基环三硅氧烷(hexamethylcyclotrisiloxane)、八甲基环四硅氧烷(octamethylcyclotetrasiloxane)、硅烷醇封端聚二甲基硅氧烷(silanolterminated polydimethylsiloxane)、乙烯基封端聚二甲基硅氧烷(vinyl terminatedpolydimethylsiloxane)、前述物质的盐类、前述物质的酯类、前述物质的配合物、或前述物质的任何组合。30. The imprint composition according to any of paragraphs 1 to 29, wherein the additive comprises a fluorosurfactant, a fluoroadditive, and/or a fluorocarbon, glycolic acid ethoxylate oleylether , polyethylene glycol, polypropylene glycol, lauric acid, myristic acid, stearic acid, palmitic acid, dimethyldiethoxysilane, polydimethylsiloxane, polydiphenyl Siloxane (polydiphenylsiloxane), hexamethylcyclotrisiloxane (hexamethylcyclotrisiloxane), octamethylcyclotetrasiloxane (octamethylcyclotetrasiloxane), silanolterminated polydimethylsiloxane (silanolterminated polydimethylsiloxane), vinyl blocked Vinyl terminated polydimethylsiloxane, salts of the foregoing, esters of the foregoing, complexes of the foregoing, or any combination of the foregoing.

31.根据段落1~30中的任一段落的压印组成物,其中基于这些纳米粒子的重量,添加剂的浓度是约0.01wt%至约2.5wt%。31. The imprint composition of any of paragraphs 1-30, wherein the concentration of the additive is from about 0.01 wt% to about 2.5 wt% based on the weight of the nanoparticles.

32.根据段落1~31中的任一段落的压印组成物,其中丙烯酸酯包含甲基丙烯酸酯(methacrylate)、丙烯酸乙酯(ethylacrylate)、丙烯酸丙酯(propylacrylate)、丙烯酸丁酯(butylacrylate)、单官能基丙烯酸酯(mono-functional acrylate)、双官能基丙烯酸酯(di-functional acrylate)、三官能基丙烯酸酯(tri-functional acrylate)、或其他多官能基丙烯酸酯(multi-functional acrylate)、或前述物质的任何组合。32. The imprint composition according to any one of paragraphs 1 to 31, wherein the acrylate comprises methacrylate, ethylacrylate, propylacrylate, butylacrylate, Mono-functional acrylate, di-functional acrylate, tri-functional acrylate, or other multi-functional acrylate, or any combination of the foregoing.

33.根据段落1~32中的任一段落的压印组成物,其中丙烯酸酯包含3-(三甲氧基硅烷基)甲基丙烯酸丙酯(3-(trimethoxysilyl)propyl methacrylate)(3-MPS)、3-(三甲氧基硅烷基)丙烯酸丙酯(3-(trimethoxysilyl)propyl acrylate)、二(乙二醇)甲基醚丙烯酸酯(di(ethylene glycol)methyl ether methacrylate)、乙二醇甲基醚丙烯酸酯(ethylene glycol methyl ether methacrylate)、甲基丙烯酸2-乙基己酯(2-ethylhexylmethacrylate)、甲基丙烯酸乙酯(ethyl methacrylate)、甲基丙烯酸己酯(hexylmethacrylate)、甲基丙烯酸(methacrylic acid)、甲基丙烯酸乙烯酯(vinylmethacrylate)、前述物质的盐类、前述物质的配合物、或任何组合。33. The imprint composition according to any one of paragraphs 1 to 32, wherein the acrylate comprises 3-(trimethoxysilyl)propyl methacrylate (3-MPS), 3-(trimethoxysilyl)propyl acrylate (3-(trimethoxysilyl)propyl acrylate), di(ethylene glycol) methyl ether methacrylate, ethylene glycol methyl ether ethylene glycol methyl ether methacrylate, 2-ethylhexylmethacrylate, ethyl methacrylate, hexylmethacrylate, methacrylic acid ), vinylmethacrylate, salts of the foregoing, complexes of the foregoing, or any combination.

34.根据段落1~33中的任一段落的压印组成物,其中基于这些纳米粒子的重量,丙烯酸酯的浓度是约0.05wt%至约10wt%。34. The imprint composition of any of paragraphs 1-33, wherein the concentration of acrylate is from about 0.05 wt% to about 10 wt% based on the weight of the nanoparticles.

35.根据段落1~34中的任一段落的压印组成物,其中压印组成物具有在23℃的温度量测时的约1cP至约50cP的黏度。35. The imprint composition of any of paragraphs 1-34, wherein the imprint composition has a viscosity of about 1 cP to about 50 cP when measured at a temperature of 23°C.

36.一种制备压印表面的方法,包含:将根据段落1~35中的任一段落的压印组成物设置在基板上;使压印组成物接触具有图案的印模;将压印组成物转变为压印材料;和从压印材料移除印模。36. A method of making an imprint surface, comprising: disposing an imprint composition according to any of paragraphs 1-35 on a substrate; contacting the imprint composition with a patterned stamp; placing the imprint composition Converting to an imprint material; and removing the impression from the imprint material.

37.根据段落36的方法,其中通过将压印组成物暴露于热、紫外线光、红外线光、可见光、微波辐射、或前述物质的任何组合,压印组成物转变成压印材料。37. The method of paragraph 36, wherein the imprinting composition is converted into an imprinting material by exposing the imprinting composition to heat, ultraviolet light, infrared light, visible light, microwave radiation, or any combination of the foregoing.

38.根据段落36或37的方法,其中将压印组成物转变成压印材料进一步包含将压印组成物暴露于具有约300nm至约365nm的波长的光源。38. The method of paragraph 36 or 37, wherein converting the imprint composition into an imprint material further comprises exposing the imprint composition to a light source having a wavelength of about 300 nm to about 365 nm.

39.根据段落36~38中任一段落的方法,其中将压印组成物转变成压印材料进一步包含将压印组成物加热至约30℃至约100℃的温度持续约30秒至约1小时的时期。39. The method according to any of paragraphs 36-38, wherein converting the imprint composition into an imprint material further comprises heating the imprint composition to a temperature of about 30°C to about 100°C for about 30 seconds to about 1 hour period.

40.根据段落36~39中任一段落的方法,其中将压印组成物转变成压印材料进一步包含将压印组成物加热至约50℃至约60℃的温度持续约1分钟至约15分钟的时期。40. The method according to any of paragraphs 36-39, wherein converting the imprint composition into an imprint material further comprises heating the imprint composition to a temperature of about 50°C to about 60°C for about 1 minute to about 15 minutes period.

41.根据段落36~40中任一段落的方法,其中压印组成物通过旋涂、滴降式涂布、或刮刀涂布而设置在基板上。41. The method of any of paragraphs 36-40, wherein the imprint composition is disposed on the substrate by spin coating, drop coating, or blade coating.

42.根据段落36~41中任一段落的方法,其中压印组成物设置在基板上作为具有约50nm至约1,000nm的厚度的层。42. The method of any of paragraphs 36-41, wherein the imprint composition is disposed on the substrate as a layer having a thickness of from about 50 nm to about 1,000 nm.

43.根据段落36~42中任一段落的方法,其中压印组成物设置在基板上作为具有约100nm至约400nm的厚度的层。43. The method of any of paragraphs 36-42, wherein the imprint composition is disposed on the substrate as a layer having a thickness of from about 100 nm to about 400 nm.

44.根据段落36~43中任一段落的方法,其中压印组成物具有约1.7至约2.0的折射率。44. The method of any of paragraphs 36-43, wherein the imprint composition has an index of refraction of about 1.7 to about 2.0.

45.根据段落36~44中任一段落的方法,其中印模上的图案为1维图案、2维图案、或3维图案。45. The method of any of paragraphs 36-44, wherein the pattern on the stamp is a 1-dimensional pattern, a 2-dimensional pattern, or a 3-dimensional pattern.

46.根据段落36~45中任一段落的方法,其中基板包含玻璃。46. The method according to any of paragraphs 36-45, wherein the substrate comprises glass.

尽管前述内容关于本发明的多个实施方式,但在不背离本发明的基本范围下可构想到其他与进一步实施方式,且本发明的范围由所附的权利要求所决定。本文所述的所有文件通过引用方式并入本文,包括任何的优先权文件和/或与本文件不一致的测试步骤。如从前述的概要说明与多个具体实施方式所显而易见的,当本公开内容的形式已被绘示与说明的同时,在不背离本公开内容的精神与范围下可进行各种修改。因此,不希望本发明从而受到局限。同样地,术语“包含”在专利法的目的上被当作为术语“包括”的同义词。同样地,每当以过渡词组“包含”前缀于组成物、元件、或一组元件时,应理解到可料想到以过渡词组“基本上由…所组成”、“由…所组成”、“选自由…所组成的群组”、或“是”前缀的相同的组成物或元件组所提及的组成物、元件、或多个元件,且反之亦然。While the foregoing has been directed to various embodiments of the invention, other and further embodiments may be contemplated without departing from the essential scope of the invention, which is to be determined by the appended claims. All documents described herein are incorporated herein by reference, including any priority documents and/or test procedures inconsistent with this document. As will be apparent from the foregoing general description and various detailed descriptions, while the form of this disclosure has been shown and described, various modifications may be made without departing from the spirit and scope of the disclosure. Accordingly, it is not intended that the present invention be limited thereby. Likewise, the term "comprising" is used as a synonym for the term "comprising" for purposes of patent law. Likewise, whenever a composition, element, or group of elements is prefixed with the transitional phrase "comprising", it will be understood that the transitional phrase "consisting essentially of," "consisting of," "consisting essentially of," "consisting of," "consisting of," "consisting of," The constituent, element, or elements referred to are selected from the group consisting of", or "is" prefixed with the same constituent or group of elements, and vice versa.

已经使用一组的数值上限与一组的数值下限说明某些实施方式与特征。除非另外指明,应领会到包括任两个数值的组合,例如,料想到任何较低值与任何较高值的组合、任和两个较低值的组合、和/或任和两个较高值的组合。某些下限值、上限值和范围出现在下方的一个或多个权利要求中。Certain embodiments and features have been described using a set of upper numerical limits and a set of lower numerical limits. Unless otherwise specified, it is to be appreciated that combinations of any two numerical values are included, for example, combinations of any lower value with any higher value, a combination of any and two lower values, and/or any and two higher values are contemplated combination of values. Certain lower values, upper values and ranges appear in one or more of the claims below.

Claims (20)

1. An imprinting composition comprising:
a plurality of nanoparticles;
one or more solvents;
a surface ligand;
an additive; and
an acrylate.
2. The stamping composition of claim 1, wherein the stamping composition comprises:
about 1 weight percent (wt%) to about 25 wt% of the plurality of nanoparticles;
about 60 wt% to about 85 wt% of the solvent;
about 6 wt% to about 35 wt% of the surface ligand;
about 0.05 wt% to about 3 wt% of the additive; and
about 0.3 wt% to about 8 wt% of the acrylate.
3. The imprint composition of claim 1, wherein the plurality of nanoparticles comprises a niobium oxide or a diamond material, and wherein the plurality of nanoparticles have a diameter of about 5nm to about 200 nm.
4. The imprinting composition of claim 1, wherein each nanoparticle comprises a core and a shell.
5. The imprinting composition of claim 4, wherein the core comprises titanium oxide, niobium oxide, or zirconium oxide, wherein the shell comprises silicon oxide, zirconium oxide, niobium oxide, or any combination of silicon oxide, zirconium oxide, niobium oxide, and wherein the core and the shell comprise different materials.
6. The imprinting composition of claim 4, wherein the core has a diameter of about 2nm to about 500nm and the shell has a thickness of about 0.1nm to about 100 nm.
7. The imprinting composition of claim 1, wherein the surface ligand comprises oleic acid, stearic acid, propionic acid, benzoic acid, palmitic acid, myristic acid, methylamine, oleylamine, butylamine, benzyl alcohol, oleyl alcohol, butanol, octanol, dodecanol, n-octyltrimethoxysilane, n-octyltriethoxysilane, octenyltrimethoxysilane, octenyltriethoxysilane, 3- (trimethoxysilyl) propyl methacrylate, propyltriethoxysilane, salts of the foregoing, esters of the foregoing, complexes of the foregoing, or any combination of the foregoing, and wherein the surface ligand is at a concentration of about 8 wt% to about 50 wt% based on the weight of the plurality of nanoparticles.
8. The imprinting composition of claim 1, wherein the solvent comprises a nanoparticle dispersing solvent, and wherein the nanoparticle dispersing solvent comprises a glycol ether, an alcohol, acetic acid, an ester of the foregoing, a salt of the foregoing, a derivative of the foregoing, or any combination of the foregoing.
9. The imprint composition of claim 8, wherein the nanoparticle dispersion solvent includes a p-series glycol ether, an e-series glycol ether, or a combination of the foregoing, and wherein the imprint composition includes the nanoparticle dispersion solvent at a concentration of about 0.5 wt% to about 20 wt%.
10. The imprinting composition of claim 1, wherein the solvent comprises an imprinting solvent, wherein the imprinting solvent comprises an alcohol, an ester, a salt of the foregoing, or a combination of the foregoing, and wherein the imprinting composition comprises the imprinting solvent at a concentration of between about 60 wt% and about 95 wt%.
11. The imprinting composition of claim 1, wherein the additive comprises a glycol, an alcohol having three or more alcohol groups, or any combination of the foregoing.
12. The imprinting composition of claim 1, wherein the additive comprises a perfluoroalkyl ether, a polyethylene glycol, a fatty acid, a silane, a siloxane, or any combination of the foregoing.
13. The imprinting composition of claim 1, wherein the additive comprises a fluorosurfactant, a fluorine-containing additive, and/or a fluorocarbon, glycolic acid ethoxy-based oil ether, polyethylene glycol, polypropylene glycol, lauric acid, myristic acid, stearic acid, palmitic acid, dimethyldiethoxysilane, polydimethylsiloxane, polydiphenylsiloxane, hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, silanol-terminated polydimethylsiloxane, vinyl-terminated polydimethylsiloxane, salts of the foregoing, esters of the foregoing, complexes of the foregoing, or any combination of the foregoing.
14. The imprinting composition of claim 1, wherein the additive is at a concentration of about 0.01 wt% to about 2.5 wt%, based on the weight of the plurality of nanoparticles.
15. The imprinting composition of claim 1, wherein the acrylate comprises methacrylate, ethyl acrylate, propyl acrylate, butyl acrylate, monofunctional acrylate, difunctional acrylate, trifunctional acrylate, or other multifunctional acrylate, or a combination of the foregoing, and wherein the acrylate is at a concentration of about 0.05 wt% to about 10 wt% based on the weight of the plurality of nanoparticles.
16. The imprinting composition of claim 1, wherein the imprinting composition has a viscosity of about 1cP to about 50cP, and a refractive index of about 1.7 to about 2.0, when measured at a temperature of 23 ℃.
17. An imprinting composition comprising:
about 0.5 wt% to about 40 wt% of a plurality of nanoparticles;
about 50 wt% to about 90 wt% of a solvent;
about 5 wt% to about 40 wt% of a surface ligand;
about 0.01 wt% to about 5 wt% of an additive; and
about 0.1 wt% to about 10 wt% of an acrylate,
wherein each nanoparticle comprises a core and a shell,
wherein the core comprises titanium oxide, niobium oxide, or zirconium oxide,
wherein the shell comprises silicon oxide, zirconium oxide, niobium oxide, or any combination of the foregoing, and
wherein the core and the shell comprise different materials.
18. A method of preparing a stamping surface, comprising the steps of:
disposing an imprinting composition on a substrate, wherein the imprinting composition comprises a plurality of nanoparticles, a solvent, a surface ligand, an additive, and an acrylate;
contacting the imprint composition with a stamp having a pattern;
converting the imprint composition into an imprint material; and
removing the stamp from the imprint material.
19. The method of claim 18, wherein converting the imprint composition into the imprint material further comprises exposing the imprint composition to a light source having a wavelength of about 300nm to about 365 nm.
20. The method of claim 18, wherein converting the imprint composition to the imprint material further comprises heating the imprint composition to a temperature of about 50 ℃ to about 60 ℃ for a period of about 1 minute to about 15 minutes.
CN202080088002.4A 2020-01-22 2020-12-07 High-refractive index imprint composition and material and its manufacturing process Pending CN114846403A (en)

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