CN114778521A - Method for measuring high-temperature alloy impurities by hollow cathode emission spectrum - Google Patents
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Abstract
Description
技术领域technical field
本申请属于合金检测技术领域,具体涉及一种空心阴极发射光谱测定高温合金痕量杂质的方法。The application belongs to the technical field of alloy detection, and in particular relates to a method for measuring trace impurities in superalloys by hollow cathode emission spectroscopy.
背景技术Background technique
目前,高温合金是军用和民用航空发动机以及燃气轮机热端零部件不可替代的关键结构材料,而高温合金通常含有10~20种合金元素,这些元素通过固溶强化、沉淀强化和晶界强韧化,以及各种工艺强韧化方法,保证高温合金具有从室温至高温的良好强度、表面稳定性和较好的塑性,所以高温合金有着非常复杂的化学成分。除此外,高温合金中还含有几十种微量和痕量元素,有些微量痕量元素有益于高温合金性能,而有些微量痕量元素对高温合金持久、蠕变性能及拉伸塑性会产生有害影响,因此高温合金中有害痕量杂质的准确测定非常重要。At present, superalloys are irreplaceable key structural materials for military and civil aero-engines and hot-end components of gas turbines, and superalloys usually contain 10 to 20 alloying elements, which are strengthened and toughened through solid solution strengthening, precipitation strengthening and grain boundary toughening. , and various process strengthening and toughening methods to ensure that the superalloy has good strength, surface stability and good plasticity from room temperature to high temperature, so the superalloy has a very complex chemical composition. In addition, there are dozens of trace and trace elements in superalloys. Some trace elements are beneficial to the performance of superalloys, while some trace elements have harmful effects on the durability, creep properties and tensile ductility of superalloys. Therefore, the accurate determination of harmful trace impurities in superalloys is very important.
现有常用的测定高温合金中痕量杂质方法主要有空心阴极光谱法(HCD-AES)、电感耦合等离子体质谱法(ICP-MS)、原子吸收光谱法(AAS)。其中ICP-MS和AAS法为溶液分析,试样需要经过酸解和稀释等化学前处理过程,容易引入污染。而空心阴极光谱法为固体试样分析,无需化学前处理过程,避免了稀释和污染引入,灵敏度高,能多元素同时测定,效率高,检测成本低。但是,空心阴极光谱法容易受到光谱干扰。高温合金中常见的痕量杂质元素主要有Pb、As、Sn、Sb、Bi、Se、Te、Ga、In、Tl、Ag、Zn、Cd,在以氩作载气的热空心阴极中,试样的蒸发主要是热蒸发,同时也有阴极溅射作用。实验结果表明各杂质元素的蒸发规律有所不同,有些元素蒸发很快,在较短时间内可以蒸发完,有些较慢,有些会更慢一些,为使所有元素都能充分蒸发并能同时测定,有必要加长高电流下放电时间。而在此条件下,基体元素虽多是难熔元素,但也会在这两种蒸发作用下,被部分蒸发出来成为气态原子,这些被蒸发出来的基体元素会对杂质元素分析产生很强的光谱叠加干扰,谱线叠加会严重影响分析结果的准确度,因此GJB8781.17-2015中规定空心阴极光谱分析需要试样基体与标准物质基体基本一致,主要是为了避免合金基体元素产生的光谱干扰对测试结果准确度的影响。但是一些杂质元素受基体光谱干扰严重,这就要求试样基体与标准物质基体完全一致才能得到正确的检测结果。然而高温合金种类繁多,痕量标准物质极其有限,这对高温合金痕量杂质的测定有了很大的局限性。The commonly used methods for the determination of trace impurities in superalloys mainly include hollow cathode spectroscopy (HCD-AES), inductively coupled plasma mass spectrometry (ICP-MS), and atomic absorption spectroscopy (AAS). Among them, ICP-MS and AAS methods are solution analysis, and the sample needs to undergo chemical pretreatment such as acidolysis and dilution, which is easy to introduce pollution. The hollow cathode spectrometry is the analysis of solid samples without chemical pretreatment process, avoiding the introduction of dilution and pollution, high sensitivity, simultaneous determination of multiple elements, high efficiency and low detection cost. However, hollow cathode spectroscopy is susceptible to spectral interference. The common trace impurity elements in superalloys are mainly Pb, As, Sn, Sb, Bi, Se, Te, Ga, In, Tl, Ag, Zn, Cd. In the hot hollow cathode with argon as the carrier gas, the test Such evaporation is mainly thermal evaporation, but also has the effect of cathode sputtering. The experimental results show that the evaporation rules of each impurity element are different. Some elements evaporate quickly and can be evaporated in a short time, some are slower, and some are slower. In order to make all elements fully evaporate and measure at the same time. , it is necessary to lengthen the discharge time under high current. Under these conditions, although most of the matrix elements are refractory elements, they will also be partially evaporated into gaseous atoms under these two evaporation effects. These evaporated matrix elements will have a strong impact on the analysis of impurity elements. Spectral superposition interference and spectral line superposition will seriously affect the accuracy of the analysis results. Therefore, GJB8781.17-2015 stipulates that the hollow cathode spectral analysis requires that the sample matrix and the reference material matrix are basically consistent, mainly to avoid the spectral interference caused by the alloy matrix elements. Influence on the accuracy of test results. However, some impurity elements are seriously interfered by the matrix spectrum, which requires the sample matrix to be completely consistent with the reference material matrix to obtain correct detection results. However, there are many kinds of superalloys, and trace reference materials are extremely limited, which has great limitations on the determination of trace impurities in superalloys.
因此,如何提供一种无需试样和标准物质的基体一致的高温合金痕量元素检测方法成为本领域技术人员急需解决的问题。Therefore, how to provide a method for detecting trace elements in superalloys that does not require a sample and a standard substance with a consistent matrix has become an urgent problem for those skilled in the art to solve.
发明内容SUMMARY OF THE INVENTION
因此,本申请要解决的技术问题在于提供一种空心阴极发射光谱测定高温合金杂质的方法,其无需试样和标准物质的基体一致。Therefore, the technical problem to be solved by the present application is to provide a method for measuring impurities in superalloys by hollow cathode emission spectroscopy, which does not require that the matrix of the sample and the standard substance be consistent.
为了解决上述问题,本申请提供了一种空心阴极发射光谱测定高温合金杂质的方法,包括如下步骤:In order to solve the above problems, the present application provides a method for measuring impurities in superalloys by hollow cathode emission spectroscopy, comprising the following steps:
S1步骤:在第一条件下检测试样中待测元素在对应分析波长处的光谱强度;Step S1: detecting the spectral intensity of the element to be measured in the sample at the corresponding analysis wavelength under the first condition;
S2步骤:采用S1步骤中的光谱强度,在标准曲线上求出待测元素的浓度值C总试样;Step S2: use the spectral intensity in step S1 to obtain the concentration value C of the element to be tested on the standard curve; the total sample ;
S3步骤:检测试样中基体元素的光谱干扰值C试样基体;Step S3: detecting the spectral interference value C of the matrix elements in the sample matrix ;
S4步骤:计算出试样中待测元素的准确值,C待测元素=C总试样-C试样基体。Step S4: Calculate the exact value of the element to be measured in the sample, C to be measured element = C total sample - C sample matrix .
根据本申请的空心阴极发射光谱测定高温合金杂质的方法,无需试样和标准物质基体一致。According to the method for determining impurities of superalloy by hollow cathode emission spectrometry of the present application, it is not necessary that the sample and the reference material matrix are consistent.
进一步地,S3步骤中检测试样中基体元素的光谱干扰值C试样基体包括如下步骤:在空心阴极中对试样进行灼烧,以除去试样中的待测元素,形成纯净基体。Further, detecting the spectral interference value C of the matrix element in the sample in step S3 includes the following steps: burning the sample in the hollow cathode to remove the element to be tested in the sample to form a pure matrix.
进一步地,S3步骤中检测试样中基体元素的光谱干扰值C试样基体还包括如下步骤:Further, in step S3, detecting the spectral interference value C of the matrix element in the sample, the sample matrix also includes the following steps:
在第一条件下检测纯净基体在待测元素的波长处产生的光谱强度;Detecting the spectral intensity generated by the pure matrix at the wavelength of the element to be measured under the first condition;
采用纯净基体在待测元素的波长处产生的光谱强度,在标准曲线上求出试样中基体元素的光谱干扰所产生的浓度值C试样基体;Using the spectral intensity generated by the pure matrix at the wavelength of the element to be tested, the concentration value C sample matrix produced by the spectral interference of the matrix element in the sample is obtained on the standard curve;
和/或,S3步骤中检测试样中基体元素的光谱干扰值C试样基体包括如下步骤:在空心阴极中对试样进行灼烧后,对连续两次灼烧后的光谱强度值进行对比,以判断是否完全除去试样中的待测元素。And/or, in step S3, detecting the spectral interference value C of the matrix element in the sample, the sample matrix includes the following steps: after burning the sample in the hollow cathode, comparing the spectral intensity values after two consecutive burnings , to judge whether the analyte in the sample is completely removed.
进一步地,对试样进行灼烧包括如下步骤:连续灼烧2-4次。Further, burning the sample includes the following steps: burning 2-4 times continuously.
进一步地,第一条件包括采用的仪器为LPG-2000型号真空型固定通道空心阴极光电光谱仪;且操作条件为:电流为300mA-200s至500mA-400s;线性控制;初始电压为0.090V,步进0.00026V;Further, the first condition includes that the instrument used is the LPG-2000 model vacuum type fixed channel hollow cathode photoelectric spectrometer; and the operating conditions are: the current is 300mA-200s to 500mA-400s; linear control; initial voltage is 0.090V, step 0.00026V;
和/或,所述待测元素的积分时间为200s-400s;And/or, the integration time of the element to be measured is 200s-400s;
和/或,所述试样经过直径为0.28mm-0.45mm筛孔的金属筛;And/or, the sample passes through a metal sieve with a diameter of 0.28mm-0.45mm;
和/或,所述试样表面光滑。And/or, the sample surface is smooth.
进一步地,标准曲线的制作方法包括如下步骤:Further, the preparation method of the standard curve comprises the following steps:
H1步骤:在第二条件下检测标准物质中待测元素的光谱强度I标;H1 step: detect the spectral intensity I mark of the element to be measured in the standard substance under the second condition;
H2步骤:检测标准物质中基体元素的光谱干扰强度I标准基体;H2 step: detect the spectral interference intensity 1 standard matrix of matrix elements in the reference material;
H3步骤:计算出标准物质中待测元素的净强度I净标准,其中I净标准=I标-I标准基体;H3 step: calculate the net strength I net standard of the element to be measured in the standard substance, wherein I net standard =1 standard -1 standard matrix ;
H4步骤:以所选标准物质中待测元素的浓度为横坐标,待测元素的净强度I净标准为纵坐标绘制标准曲线。Step H4: take the concentration of the element to be tested in the selected standard substance as the abscissa, and the net intensity I of the element to be tested as the ordinate to draw a standard curve.
进一步地,H2步骤中检测标准物质中基体元素的光谱干扰强度I标准基体还包括如下步骤:在空心阴极中对标准物质进行灼烧,以除去标准物质中的待测元素,形成标准基体。Further, in the H2 step, the spectral interference intensity I of the matrix element in the standard substance is detected. The standard substrate also includes the following steps: burning the standard substance in the hollow cathode to remove the element to be tested in the standard substance to form the standard substrate.
进一步地,H2步骤中检测标准物质中基体元素的光谱干扰强度I标准基体还包括如下步骤:在第二条件下检测标准基体,标准基体在待测元素的波长处产生的光谱强度为光谱干扰强度I标准基体;Further, the H2 step detects the spectral interference intensity I of the matrix element in the standard substance. The standard matrix also includes the steps: detecting the standard matrix under the second condition, and the spectral intensity that the standard matrix produces at the wavelength of the element to be measured is the spectral interference intensity. I standard matrix ;
和/或,H2步骤中检测标准物质中基体元素的光谱干扰强度I标准基体还包括如下步骤:在空心阴极中对标准物质进行灼烧后,对连续两次灼烧后的光谱强度值进行对比,以判断是否完全除去标准物质中的待测元素。And/or, in the H2 step, the spectral interference intensity I of the matrix element in the standard substance is detected, and the standard matrix further comprises the following steps: after the standard substance is calcined in the hollow cathode, the spectral intensity values after two consecutive calcinations are compared. , to judge whether the analyte in the standard substance is completely removed.
进一步地,对标准物质进行灼烧包括如下步骤:连续灼烧2-4次。Further, burning the standard substance includes the following steps: burning 2-4 times continuously.
进一步地,第二条件包括采用的仪器为LPG-2000型号真空型固定通道空心阴极光电光谱仪;且操作条件为:电流为300mA-200s至500mA-400s;线性控制;初始电压为0.090V,步进0.00026V;载气压力0.12Pa;Further, the second condition includes that the instrument used is the LPG-2000 model vacuum type fixed channel hollow cathode photoelectric spectrometer; and the operating conditions are: the current is 300mA-200s to 500mA-400s; linear control; initial voltage is 0.090V, step 0.00026V; carrier gas pressure 0.12Pa;
和/或,待测元素的积分时间为200s-400s;And/or, the integration time of the element to be measured is 200s-400s;
和/或,试样经过直径为0.28mm-0.45mm筛孔的金属筛;And/or, the sample is passed through a metal sieve with a diameter of 0.28mm-0.45mm;
和/或,试样表面光滑。and/or, the surface of the specimen is smooth.
本申请空心阴极发射光谱测定高温合金杂质的方法,通过扣除基体元素的光谱干扰值,使得测试更准确,且无需试样和标准物质的基体一致,因此,本申请应用范围更广泛。The method for measuring superalloy impurities by hollow cathode emission spectrometry of the present application makes the test more accurate by deducting the spectral interference value of the matrix element, and does not require the matrix of the sample and the standard material to be consistent, so the application scope of the present application is wider.
具体实施方式Detailed ways
本申请实施例公开了一种空心阴极发射光谱测定高温合金杂质的方法,包括如下步骤:The embodiment of the present application discloses a method for measuring impurities in a superalloy by hollow cathode emission spectroscopy, which includes the following steps:
S1步骤:在第一条件下检测试样中待测元素在对应分析波长处的光谱强度;Step S1: detecting the spectral intensity of the element to be measured in the sample at the corresponding analysis wavelength under the first condition;
S2步骤:采用S1步骤中的光谱强度,在标准曲线上求出待测元素的浓度值C总试样;Step S2: use the spectral intensity in step S1 to obtain the concentration value C of the element to be tested on the standard curve; the total sample ;
S3步骤:检测试样中基体元素的光谱干扰值C试样基体;Step S3: detecting the spectral interference value C of the matrix elements in the sample matrix ;
S4步骤:计算出试样中待测元素的准确值,C待测元素=C总试样-C试样基体。Step S4: Calculate the exact value of the element to be measured in the sample, C to be measured element = C total sample - C sample matrix .
本申请空心阴极发射光谱测定高温合金杂质的方法能够测定高温合金中痕量杂质,即本申请的方法可以为空心阴极发射光谱测定高温合金中痕量杂质的方法。本申请能够校正空心阴极发射光谱测定高温合金痕量杂质时基体所产生的光谱干扰。本申请实施例通过扣除基体元素的光谱干扰值C试样基体,使得测试更准确,且无需试样和标准物质的基体一致,应用范围更广泛。本申请方法简单快速,无需试样和标准物质的基体一致,能充分发挥空心阴极光谱的“痕量元素直接分析”(指试样不经过化学处理,直接激发,求出痕量元素含量)的优势,大大提高空心阴极发射光谱的利用率。The method for measuring impurities in superalloys by hollow cathode emission spectroscopy of the present application can measure trace impurities in superalloys, that is, the method in the present application can be a method for measuring trace impurities in superalloys by hollow cathode emission spectroscopy. The present application can correct the spectral interference produced by the matrix when the hollow cathode emission spectrometry measures the trace impurities of the superalloy. In the examples of the present application, by deducting the spectral interference value C of the matrix element, the sample matrix makes the test more accurate, and the matrix of the sample and the standard substance does not need to be consistent, and the application range is wider. The method of this application is simple and fast, does not require the same matrix as the sample and the reference material, and can give full play to the "trace element direct analysis" of hollow cathode spectroscopy (referring to the sample is directly excited without chemical treatment, and the trace element content is calculated). Advantages, greatly improve the utilization of hollow cathode emission spectrum.
本申请还公开了一些实施例,S3步骤中检测试样中基体元素的光谱干扰值C试样基体包括如下步骤:在空心阴极中对试样进行灼烧,以除去试样中的待测元素,形成纯净基体。本申请发明人经过创造性研究和大量的实验证明在分析元素含量小于等于0.5μg/g时,按照试样分析程序连续灼烧两次就可以除尽易挥发元素。因此,本申请的灼烧次数可以为连续灼烧两次以上。The present application also discloses some embodiments. In step S3, detecting the spectral interference value C of the matrix element in the sample, the sample matrix includes the following steps: burning the sample in the hollow cathode to remove the element to be tested in the sample. , forming a pure matrix. Through creative research and a large number of experiments, the inventors of the present application have proved that when the content of the analytical elements is less than or equal to 0.5 μg/g, the volatile elements can be removed by continuous burning twice according to the sample analysis procedure. Therefore, the number of times of burning in the present application may be two or more times of continuous burning.
本申请还公开了一些实施例,S3步骤中检测试样中基体元素的光谱干扰值C试样基体包括如下步骤:The application also discloses some embodiments. In step S3, detecting the spectral interference value C of the matrix element in the sample, the sample matrix includes the following steps:
在第一条件下检测纯净基体在待测元素的波长处产生的光谱强度;Detecting the spectral intensity generated by the pure matrix at the wavelength of the element to be measured under the first condition;
采用纯净基体在待测元素的波长处产生的光谱强度,在标准曲线上求出试样中基体元素的光谱干扰所产生的浓度值C试样基体;即在与检测试样中待测元素光谱强度的同样条件下进行检测纯净基体,获得光谱干扰强度,这样得到的光谱干扰强度与检测试样中待测元素光谱强度时基体元素的干扰光谱能够对应,使得S5步骤中C待测元素=C总试样-C试样基体为准确的待测元素的浓度。Using the spectral intensity generated by the pure matrix at the wavelength of the element to be tested, the concentration value C sample matrix generated by the spectral interference of the matrix element in the sample is obtained on the standard curve; that is, the spectrum of the element to be tested in the test sample The pure matrix is detected under the same conditions as the intensity, and the spectral interference intensity is obtained. The spectral interference intensity obtained in this way can correspond to the interference spectrum of the matrix element when the spectral intensity of the element to be measured in the test sample is detected, so that in the step S5, the element to be measured is C=C The total sample -C sample matrix is the exact concentration of the analyte.
本申请还公开了一些实施例,S3步骤中检测试样中基体元素的光谱干扰值C试样基体包括如下步骤:在空心阴极中对试样进行灼烧后,对连续两次灼烧后的光谱强度值进行对比,以判断是否完全除去试样中的待测元素。因为每次灼烧时都会除去试样中的待测元素,只有试样中无待测元素,那么前后两次灼烧的强度才会相同,因此本申请在分析过程中可根据连续两次灼烧后的强度值来判断,若强度值基本一致就说明分析元素基本被除尽。阴极溅射作用会使基体有部分蒸发损失,但对于整个基体来说该损失量可以忽略。实验证明基体元素的量在灼烧25次左右时才会有明显的降低,而本申请除去待测元素的灼烧次数明显少于25次,所以不会对基体元素的量造成影响。The present application also discloses some embodiments. In step S3, detecting the spectral interference value C of the matrix element in the sample, the sample matrix includes the following steps: after calcining the sample in the hollow cathode, calcining the sample after two consecutive calcinations. The spectral intensity values are compared to determine whether the analyte in the sample is completely removed. Because the element to be tested in the sample will be removed every time of burning, only if there is no element to be tested in the sample, the intensity of the two times of burning before and after will be the same. Judging by the intensity value after burning, if the intensity value is basically the same, it means that the analytical elements are basically removed. Cathode sputtering causes some evaporation losses of the substrate, but this loss is negligible for the entire substrate. Experiments have shown that the amount of matrix elements will be significantly reduced after about 25 times of burning, while the number of burning times to remove the element to be tested in the present application is significantly less than 25 times, so the amount of matrix elements will not be affected.
本申请还公开了一些实施例,对试样进行灼烧包括如下步骤:连续灼烧2-4次,不仅可以除去试样中的待测元素,且对基体元素的总量不造成影响。本申请发明人经过创造性研究和大量的实验证明在分析元素含量小于等于0.5μg/g时,按照试样分析程序连续灼烧两次就可以除尽易挥发元素。The present application also discloses some embodiments. The burning of the sample includes the following steps: continuous burning for 2-4 times, which can not only remove the element to be tested in the sample, but also does not affect the total amount of matrix elements. Through creative research and a large number of experiments, the inventors of the present application have proved that when the content of the analytical elements is less than or equal to 0.5 μg/g, the volatile elements can be removed by continuous burning twice according to the sample analysis procedure.
本申请还公开了一些实施例,第一条件包括采用的仪器为LPG-2000型号真空型固定通道空心阴极光电光谱仪;且操作条件为:电流为300mA-200s至500mA-400s;线性控制;初始电压为0.090V,步进0.00026V;载气压力0.12Pa。The application also discloses some embodiments, the first condition includes that the instrument used is LPG-2000 model vacuum type fixed channel hollow cathode photoelectric spectrometer; and the operating conditions are: the current is 300mA-200s to 500mA-400s; linear control; initial voltage is 0.090V, the step is 0.00026V; the carrier gas pressure is 0.12Pa.
本申请还公开了一些实施例,待测元素的积分时间为200s-400s;The application also discloses some embodiments, the integration time of the element to be measured is 200s-400s;
本申请还公开了一些实施例,试样经过直径为0.28mm-0.45mm筛孔的金属筛;The application also discloses some embodiments, the sample passes through a metal sieve with a diameter of 0.28mm-0.45mm;
本申请还公开了一些实施例,试样表面光滑。The application also discloses some examples where the surface of the sample is smooth.
具体地,As、Se、Sn、Bi的积分时间为200秒,Pb、Ag、Cd、Ga、In、Tl、Sb、Te、Zn的积分时间为400秒;试样过筛孔直径分别为0.28mm和0.45mm的金属筛,且表面光滑无粉末。产生光谱干扰的基体元素主要有Cr、Ni、Mo、Ti和Co,这些都是难挥发性物质,而热空心阴极放电阴极温度最高只有2000℃左右,所以这些基体物质的挥发主要是由于阴极溅射作用产生的。而溅射率,也就是被正离子碰撞后从阴极表面溅射出的原子的多少与阴极的表面状态、几何形状、载气气压、放电电压等有很大关系。为最大程度上保证样品和灼烧后的纯净基体的溅射率一致,也就是使基体干扰值扣除得更加准确,本申请发明人通过利用有确定数值的标准物质和大量条件实验研究了主要影响因素对溅射率的影响,确定了最佳样品状态和最佳分析参数。研究发现试样表面粗糙或试样有明显棱角或试样在破碎过程中产生的粉末附着于试样表面,溅射都会增强,因此确定试样过筛、表面光滑、无粉末附着的最佳状态。在最佳样品状态下,实验证明载气压力为0.12Pa,起始电压为0.090V时测得的标准物质中元素含量,即减去灼烧后的基体干扰值的含量C待测元素=C总试样-C试样基体最接近标准值。Se、As、Sn、Bi这四个元素受到的基体干扰过强,对于痕量分析来说,利用灼烧后的纯净基体检测的干扰值稍有波动就会对最终检测结果产生较大的影响。实验中发现基体元素的溅射主要集中在阴极放电的后200秒,因此为更准确地扣除基体干扰,这四个元素的积分时间截止到阴极放电的前200秒,这样做虽然牺牲了一些灵敏度,但可以大大提高分析的准确度。Specifically, the integration time of As, Se, Sn, and Bi was 200 seconds, and the integration time of Pb, Ag, Cd, Ga, In, Tl, Sb, Te, and Zn was 400 seconds; the sieve hole diameters of the samples were 0.28 mm and 0.45mm metal sieve, and the surface is smooth and powder-free. The matrix elements that produce spectral interference are mainly Cr, Ni, Mo, Ti and Co, which are all non-volatile substances, and the maximum temperature of the hot hollow cathode discharge cathode is only about 2000 °C, so the volatilization of these matrix substances is mainly due to cathode sputtering. produced by radiation. The sputtering rate, that is, the number of atoms sputtered from the surface of the cathode after being collided by positive ions, has a great relationship with the surface state, geometric shape, carrier gas pressure, and discharge voltage of the cathode. In order to ensure that the sputtering rate of the sample and the calcined pure substrate is consistent to the greatest extent, that is, the deduction of the substrate interference value is more accurate, the inventor of the present application has studied the main influence by using a standard substance with a certain value and a large number of conditions. The influence of factors on sputtering rate, the optimal sample condition and the optimal analysis parameters were determined. The study found that the surface of the sample is rough or the sample has obvious edges and corners, or the powder produced by the sample during the crushing process adheres to the surface of the sample, and the sputtering will increase. . In the best sample state, the experiment proves that the carrier gas pressure is 0.12Pa, the initial voltage is 0.090V, and the element content in the standard material is measured, that is, the content of the matrix interference value after deducting the calcination. Element to be measured = C Total Specimen - C Specimen Matrix is closest to the standard value. The four elements of Se, As, Sn, and Bi are too strongly interfered by the matrix. For trace analysis, a slight fluctuation in the interference value detected by the pure matrix after burning will have a greater impact on the final detection result. . In the experiment, it is found that the sputtering of the matrix elements is mainly concentrated in the last 200 seconds of the cathode discharge. Therefore, in order to more accurately deduct the matrix interference, the integration time of these four elements is up to the first 200 seconds of the cathode discharge, although some sensitivity is sacrificed. , but can greatly improve the accuracy of the analysis.
本申请还公开了一些实施例,标准曲线的制作方法包括如下步骤:The application also discloses some embodiments, and the preparation method of the standard curve includes the following steps:
H1步骤:在第二条件下检测标准物质中待测元素的光谱强度I标;H1 step: detect the spectral intensity I mark of the element to be measured in the standard substance under the second condition;
H2步骤:检测标准物质中基体元素的光谱干扰强度I标准基体;H2 step: detect the spectral interference intensity 1 standard matrix of matrix elements in the reference material;
H3步骤:计算出标准物质中待测元素的净强度I净标准,其中I净标准=I标-I标准基体。H3 step: calculate the net strength I net standard of the element to be measured in the standard material, wherein I net standard =I standard -I standard matrix .
H4步骤:以所选标准物质中待测元素的浓度为横坐标,待测元素的净强度值I净标准为纵坐标绘制标准曲线。Step H4: take the concentration of the element to be tested in the selected standard substance as the abscissa, and the net intensity value I of the element to be tested as the ordinate to draw a standard curve.
本申请还公开了一些实施例,H2步骤中检测标准物质中基体元素的光谱干扰值I标准基体还包括如下步骤:在空心阴极中对标准物质进行灼烧,以除去标准物质中的待测元素,形成标准基体。同样的,对标准物质进行灼烧,也可以使得待测元素挥发去除。The application also discloses some embodiments. In the H2 step, the spectral interference value I of the matrix element in the standard substance is detected. The standard matrix further includes the following steps: burning the standard substance in the hollow cathode to remove the element to be tested in the standard substance. , forming a standard matrix. Similarly, burning the standard material can also make the element to be tested volatilized and removed.
本申请还公开了一些实施例,H2步骤中检测标准物质中基体元素的光谱干扰强度I标准基体还包括如下步骤:在第二条件下检测标准基体,标准基体在待测元素的波长处产生的光谱强度为光谱干扰强度I标准基体。The application also discloses some embodiments. In the H2 step, the spectral interference intensity of the matrix element in the standard substance is detected. The standard matrix further includes the following steps: detecting the standard matrix under the second condition, and the standard matrix is generated at the wavelength of the element to be tested. The spectral intensity is the spectral interference intensity I standard matrix.
本申请还公开了一些实施例,对标准物质进行灼烧包括如下步骤:连续灼烧2-4次。在该次数下,基本上不影响基体的总量,且能够除尽待检测元素。The present application also discloses some embodiments. The burning of the standard material includes the following steps: burning continuously for 2-4 times. Under this number of times, the total amount of the matrix is basically not affected, and the elements to be detected can be completely removed.
本申请还公开了一些实施例,H2步骤中检测标准物质中基体元素的光谱干扰强度I标准基体还包括如下步骤:在空心阴极中对标准物质进行灼烧后,对连续两次灼烧后的光谱强度值进行对比,以判断是否完全除去标准物质中的待测元素。本申请在分析过程中可根据连续两次灼烧后的强度值来判断,若强度值基本一致就说明分析元素基本被除尽。阴极溅射作用会使基体有部分蒸发损失,但对于整个基体来说该损失量可以忽略。实验证明基体元素的量在灼烧25次左右时才会有明显的降低。本申请中所说的杂质为痕量杂质。The application also discloses some embodiments. In the H2 step, the spectral interference intensity I of the matrix element in the standard substance is detected. The standard matrix further includes the following steps: after the standard substance is calcined in the hollow cathode, calcinations are performed for two consecutive calcinations. The spectral intensity values are compared to determine whether the analyte in the standard material is completely removed. In the analysis process of the present application, it can be judged according to the intensity values after two consecutive burnings. If the intensity values are basically the same, it means that the analysis elements are basically removed. Cathode sputtering causes some evaporation losses of the substrate, but this loss is negligible for the entire substrate. Experiments have shown that the amount of matrix elements will be significantly reduced only when the amount of calcination is about 25 times. Impurities mentioned in this application are trace impurities.
本申请还公开了一些实施例,第二条件包括采用的仪器为LPG-2000型号真空型固定通道空心阴极光电光谱仪;且操作条件为:电流为300mA-200s至500mA-400s;线性控制;初始电压为0.090V,步进0.00026V;载气压力0.12Pa;The application also discloses some embodiments, the second condition includes that the instrument used is LPG-2000 model vacuum type fixed channel hollow cathode photoelectric spectrometer; and the operating conditions are: the current is 300mA-200s to 500mA-400s; linear control; initial voltage is 0.090V, the step is 0.00026V; the carrier gas pressure is 0.12Pa;
本申请还公开了一些实施例,待测元素的积分时间为200s-400s;The application also discloses some embodiments, the integration time of the element to be measured is 200s-400s;
本申请还公开了一些实施例,试样经过直径为0.28mm-0.45mm筛孔的金属筛;The application also discloses some embodiments, the sample passes through a metal sieve with a diameter of 0.28mm-0.45mm;
本申请还公开了一些实施例,试样表面光滑。The application also discloses some examples where the surface of the sample is smooth.
As、Se、Sn、Bi的积分时间为200秒,Pb、Ag、Cd、Ga、In、Tl、Sb、Te、Zn的积分时间为400秒;试样过筛孔直径分别为0.28mm和0.45mm的金属筛,且表面光滑无粉末。The integration time of As, Se, Sn, Bi is 200 seconds, and the integration time of Pb, Ag, Cd, Ga, In, Tl, Sb, Te, Zn is 400 seconds; the sieve diameters of the samples are 0.28 mm and 0.45 mm metal sieve, and the surface is smooth and powder-free.
本申请空心阴极发射光谱测定高温合金杂质的方法,无需试样和标准物质的基体一致,可以有效的测出高温合金中杂质含量,即本申请提供了一种可以利用现有标准物质来测定与标准物质基体不一致的高温合金痕量杂质的方法,可测高温合金中常见的易挥发杂质Pb、As、Sn、Sb、Bi、Se、Te、Ga、In、Tl、Ag、Zn、Cd,方法简单快速,检测结果与ICP-MS的检测结果基本一致。The method for measuring impurities in superalloys by hollow cathode emission spectrometry of the present application does not require the matrix of the sample and the reference material to be consistent, and can effectively measure the impurity content in the superalloy. The method for trace impurities in superalloys with inconsistent standard material matrix can measure the common volatile impurities Pb, As, Sn, Sb, Bi, Se, Te, Ga, In, Tl, Ag, Zn, Cd in superalloys. It is simple and fast, and the detection results are basically consistent with the detection results of ICP-MS.
具体的方法步骤如下:The specific method steps are as follows:
1.仪器准备1. Instrument Preparation
仪器型号:LPG-2000真空型固定通道空心阴极光电光谱仪,放电电流由低到高分段控制。Instrument model: LPG-2000 vacuum type fixed channel hollow cathode photoelectric spectrometer, the discharge current is controlled in stages from low to high.
2.样品准备2. Sample Preparation
标准试样及待测试样过筛,筛孔直径分别为0.28mm和0.45mm。如试样在破碎过程中产生金属粉末,可用超声清洗附着在金属屑上的粉末并烘干。标准试样及待测试样均称两个平行样品,称重量为50mg。The standard sample and the sample to be tested are sieved, and the sieve diameters are 0.28mm and 0.45mm respectively. If the sample produces metal powder during the crushing process, the powder attached to the metal chips can be cleaned by ultrasonic and dried. Both the standard sample and the sample to be tested are weighed as two parallel samples with a weight of 50 mg.
3.标准系列3. Standard series
高温合金痕量标准物质。Superalloy trace standards.
4.分析过程4. Analysis process
将各个试样分别装入灼烧过的光谱纯石墨电极中,将装有试样的电极插在空心阴极灯的阴极端,待测元素的光谱强度由光电倍增管采集测试。Put each sample into the burned spectrally pure graphite electrode, insert the electrode with the sample into the cathode end of the hollow cathode lamp, and the spectral intensity of the element to be measured is collected and tested by a photomultiplier tube.
1)校准曲线的建立1) Establishment of calibration curve
标准基体:标准基体是指不含待测元素的高温合金纯基体。将标准基体与待测试样在同条件下进行检测,在待测元素波长处产生的光谱强度就是基体元素的干扰强度,试样中每个待测元素强度扣除对应的干扰强度就可以达到校正基体光谱干扰的目的。Standard matrix: The standard matrix refers to the pure matrix of the superalloy that does not contain the element to be tested. The standard matrix and the sample to be tested are tested under the same conditions, the spectral intensity generated at the wavelength of the element to be tested is the interference intensity of the matrix element, and the correction can be achieved by deducting the corresponding interference intensity from the intensity of each element to be tested in the sample The purpose of matrix spectral interference.
标准基体的制作:空心阴极中元素的蒸发过程和原子的激发过程是在电极之中(阴极孔中)进行的,原子蒸汽在阴极孔中停留约1秒时间后会被真空抽走。实验证明在待测元素含量小于等于0.5μg/g时,按照试样分析程序连续灼烧两次就可以除尽易挥发元素。实际分析过程中可根据连续两次灼烧后的强度值来判断,若强度值基本一致就说明待测元素基本被除尽。阴极溅射作用会使基体有部分蒸发损失,但对于整个基体来说该损失量可以忽略。实验证明基体元素的量在灼烧25次左右时会有明显的降低。Fabrication of standard matrix: The evaporation process of elements in the hollow cathode and the excitation process of atoms are carried out in the electrode (cathode hole), and the atomic vapor will be evacuated by vacuum after staying in the cathode hole for about 1 second. Experiments show that when the content of the element to be measured is less than or equal to 0.5μg/g, the volatile elements can be removed by burning twice continuously according to the sample analysis procedure. In the actual analysis process, it can be judged according to the intensity values after two consecutive burnings. If the intensity values are basically the same, it means that the elements to be tested are basically removed. Cathode sputtering causes some evaporation losses of the substrate, but this loss is negligible for the entire substrate. Experiments show that the amount of matrix elements will be significantly reduced when calcined for about 25 times.
标准基体的具体制作方法:在所用标准系列中选一个杂质元素含量最低的标准物质试样,称取50mg,在空心阴极中连续灼烧(一般为2~4次),若连续两次灼烧后的强度基体一致,则已除尽易挥发的待测元素,用这个烧制过的石墨电极作为标准曲线的标准基体。The specific production method of the standard matrix: select a standard material sample with the lowest impurity element content in the standard series used, weigh 50 mg, and burn it continuously (usually 2 to 4 times) in the hollow cathode. If the strength of the matrix is the same, the volatile elements to be tested have been removed, and the fired graphite electrode is used as the standard matrix of the standard curve.
标准曲线:在选定分析条件下测定标准系列样品中待测元素的发射强度,并在同样条件下测量按上述方法制作的标准基体在待测元素波长处产生的干扰强度。标准系列的每个待测元素的强度值都要扣除上述相对应的标准基体的干扰强度,得到每个待测元素的净发射强度,然后以该净强度为纵坐标,浓度为横坐标绘制校准曲线。如此得到的校准曲线是没有基体光谱干扰的待测元素的净强度与浓度的关系曲线。Standard curve: measure the emission intensity of the element to be measured in the standard series of samples under the selected analysis conditions, and measure the interference intensity at the wavelength of the element to be measured from the standard matrix prepared by the above method under the same conditions. The intensity value of each element to be tested in the standard series must deduct the interference intensity of the corresponding standard matrix above to obtain the net emission intensity of each element to be tested, and then draw the calibration with the net intensity as the ordinate and the concentration as the abscissa curve. The calibration curve thus obtained is the net intensity versus concentration of the analyte without matrix spectral interference.
2)试样测量2) Sample measurement
试样的纯净基体:与烧制标准基体一样的方法,烧制试样的纯净基体。不同牌号的试样都要制备该牌号自己的纯净基体。Pure Matrix of Specimen: The pure matrix of the specimen is fired in the same way as the standard matrix. The samples of different grades should prepare their own pure matrix.
具体测量方法:Specific measurement methods:
①称取平行试样分别装入灼烧过的光谱纯石墨电极中,将装有试料的电极插在空心阴极灯的阴极端,待测元素的光谱强度由光电倍增管采集测试。在上述标准曲线上求得待测元素的浓度,此时的浓度值是带有分析试样基体光谱干扰的浓度值C总试样。① Weigh the parallel samples and put them into the burned spectrally pure graphite electrodes respectively, insert the electrode containing the sample into the cathode end of the hollow cathode lamp, and the spectral intensity of the element to be measured is collected and tested by a photomultiplier tube. Calculate the concentration of the element to be tested on the above standard curve, the concentration value at this time is the concentration value C total sample with the spectral interference of the analytical sample matrix.
②将各不同牌号的试样的纯净基体当作试样检测,在标准曲线上求得各不同牌号基体光谱所产生的叠加干扰值C试样基体;② The pure matrix of the samples of different brands is used as the sample to detect, and the superimposed interference value C sample matrix produced by the spectra of the different brands of matrix is obtained on the standard curve;
③第一步中测得的各待测元素的浓度值减去第二步中测得的纯净基体产生的各元素的干扰值即可得出试样中待测元素的含量,③ The content of the element to be tested in the sample can be obtained by subtracting the interference value of each element produced by the pure matrix measured in the second step from the concentration value of each element to be tested measured in the first step.
即C待测元素=C总试样-C试样基体。That is, C analyte element =C total sample -C sample matrix .
实施例Example
本实施例中利用本申请方法使用空心阴极发射光谱测定了4份高温合金样品的杂质元素含量,包括K438高温合金样品一份、K417G高温合金样品2份和K4800高温合金样品一份。用K3系列标准物质作标准曲线。即在本实施例中,K3为标准物质,K438、K417G和K4800分别为三种不同的待测物质。K3标准物质与K438、K417G和K4800是不同牌号的高温合金,各个高温合金的基体元素种类和含量都不同,主要化学成分见表1。In this example, the method of the present application is used to determine the impurity element content of 4 superalloy samples, including one K438 superalloy sample, 2 K417G superalloy samples and one K4800 superalloy sample. Use K3 series standard material as standard curve. That is, in this embodiment, K3 is a standard substance, and K438, K417G and K4800 are three different substances to be tested, respectively. K3 standard material and K438, K417G and K4800 are superalloys of different grades. The types and contents of matrix elements of each superalloy are different. The main chemical compositions are shown in Table 1.
表1 K3、K438、K417G主要化学成分(wt%)Table 1 Main chemical components of K3, K438, K417G (wt%)
本实施例中所用仪器及操作条件如下:The instruments and operating conditions used in this embodiment are as follows:
仪器型号:LPG-2000真空型固定通道空心阴极光电光谱仪Instrument model: LPG-2000 vacuum type fixed channel hollow cathode photoelectric spectrometer
操作条件:电流300mA-200s,500mA-400s,线性控制步进0.00026VOperating conditions: current 300mA-200s, 500mA-400s, linear control step 0.00026V
初始电压:0.090VInitial voltage: 0.090V
具体分析步骤如下:The specific analysis steps are as follows:
1.样品准备:按GB/T 222标准的规定取制样。试样破碎后,用金属标准筛筛选成直径为0.28mm~0.45mm的颗粒。过筛后的标准试样及每种合金试样均称两个平行试样,每个样品称重量为50mg;平行试样指的是同一种样品称两份即每种合金和标准试样均具有各自的试样1和试样2,同样检测条件下检测两次,结果取平均值,这样可以有效的减小随机误差。1. Sample preparation: sample preparation according to GB/T 222 standard. After the sample is crushed, it is screened into particles with a diameter of 0.28mm to 0.45mm using a metal standard sieve. The sieved standard sample and each alloy sample are weighed as two parallel samples, and each sample weighs 50 mg; the parallel sample refers to the same sample weighed in two copies, that is, each alloy and standard sample are weighed in two. It has its own sample 1 and sample 2, which are tested twice under the same testing conditions, and the results are averaged, which can effectively reduce random errors.
2.光谱纯石墨电极:外径6mm,内径3mm,孔深30mm,总长41mm。2. Spectral pure graphite electrode: outer diameter 6mm, inner diameter 3mm, hole depth 30mm, total length 41mm.
3.对石墨电极进行预处理:在装入样品前,将空电极插入空心阴极灯的阴极钨丝上,在氩气氛围中放电,进行高温灼烧除气、除水分和杂质元素。逐渐升高电流到设定的三个阶段电流(400mA、600mA、750mA)处,灼烧电极至放电稳定,当电流升至750mA且能保持稳定放电1min时停止放电,取出电极待用。3. Pretreatment of the graphite electrode: Before loading the sample, insert the empty electrode into the cathode tungsten wire of the hollow cathode lamp, discharge it in an argon atmosphere, and carry out high-temperature burning and degassing, moisture and impurity elements. Gradually increase the current to the set three-stage current (400mA, 600mA, 750mA), burn the electrode until the discharge is stable, stop the discharge when the current rises to 750mA and can maintain a stable discharge for 1min, and take out the electrode for use.
4.高温合金标准物质:采用K3系列标准物质,有K3-1至K3-8八个标准物质,其含量见附录B。4. Superalloy reference material: K3 series reference material is used, there are eight reference materials from K3-1 to K3-8, and the content is shown in Appendix B.
5.分析过程:将各个试样分别装入灼烧过的光谱纯石墨电极中,将装有试料的电极插在空心阴极灯的阴极端,待测元素谱线选用仪器推荐谱线,待测元素的光谱强度由光电倍增管采集测试。5. Analysis process: Put each sample into the burned spectroscopic pure graphite electrode, insert the electrode containing the sample into the cathode end of the hollow cathode lamp, and select the recommended spectral line of the instrument for the spectral line of the element to be measured. The spectral intensity of the measured element was collected and tested by a photomultiplier tube.
1)标准基体:用杂质含量最低的标准物质烧制标准系列的纯净基体。K3-1杂质含量除As和Sn外,其它元素含量均最低,综合看,最适合用来制备标准基体,因此用一份K3-1试样在空心阴极中连续灼烧3次,除尽易挥发的待测元素,用这个烧制过的石墨电极作为标准曲线的标准基体。四次烧制的各分析元素发射光谱强度值列于表2,由表2可见第三次和第四次烧制后各分析元素的发射强度已经达到基本一致,说明待测元素以挥发除尽,所以K3-1烧制三次即可。1) Standard matrix: The standard series of pure matrix is fired with the standard material with the lowest impurity content. Except As and Sn, the impurity content of K3-1 is the lowest, and it is the most suitable for preparing standard matrix. For the volatilized element to be measured, this fired graphite electrode was used as the standard matrix for the standard curve. The emission spectrum intensity values of each analytical element of the four firings are listed in Table 2. It can be seen from Table 2 that the emission intensities of each analytical element after the third and fourth firings have basically reached the same level, indicating that the element to be tested is eliminated by volatilization. , so K3-1 can be fired three times.
表2K3-1四次烧制的各分析元素发射光谱强度Table 2K3-1 Emission spectrum intensity of each analytical element in four firings
2)标准曲线的建立:根据待测杂质元素的参考含量,在K3系列8个标准物质中选三个或三个以上标准物质来绘制标准曲线。标准试样中的每个待测元素的强度值都要扣除上述的标准基体干扰强度值,得到I净标准,然后以该净强度为纵坐标、浓度为横坐标绘制标准曲线。2) Establishment of the standard curve: According to the reference content of the impurity element to be measured, three or more standard substances are selected from the 8 standard substances of the K3 series to draw the standard curve. The intensity value of each element to be tested in the standard sample must deduct the above-mentioned standard matrix interference intensity value to obtain the I net standard , and then draw the standard curve with the net intensity as the ordinate and the concentration as the abscissa.
3)制作待测合金试样的纯净基体:与烧制标准基体一样的方法,分别烧制K438、K417G和K4800的纯净基体。3) Making the pure matrix of the alloy sample to be tested: The pure matrix of K438, K417G and K4800 is fired in the same method as the standard matrix.
4)试样测量:4) Sample measurement:
①称取的各个平行的合金试样分别装入灼烧过的光谱纯石墨电极中,将装有试料的电极插在空心阴极灯的阴极端,待测元素的光谱强度由光电倍增管采集测试。在上述标准曲线上求得待测元素的浓度,此时的浓度值是带有分析试样基体光谱干扰的浓度值C总试样。①The weighed parallel alloy samples were put into the burnt spectroscopic pure graphite electrode respectively, the electrode containing the sample was inserted into the cathode end of the hollow cathode lamp, and the spectral intensity of the element to be measured was collected by a photomultiplier tube test. Calculate the concentration of the element to be tested on the above standard curve, the concentration value at this time is the concentration value C total sample with the spectral interference of the analytical sample matrix.
②将各不同牌号的合金试样的纯净基体当作试样检测,在标准曲线上求得各不同牌号基体光谱所产生的叠加干扰值C试样基体;② The pure matrix of alloy samples of different grades is used as a sample for detection, and the superimposed interference value C generated by the spectrum of the different grades of matrix is obtained on the standard curve. Sample matrix ;
③第一步中测得的各待测元素的浓度值减去第二步中测得的试样基体产生的各元素的干扰浓度即可得出试样中待测元素的含量,即C待测元素=C总试样-C试样基体。③ The concentration value of each element to be tested measured in the first step is subtracted from the interference concentration of each element produced by the sample matrix measured in the second step to obtain the content of the element to be tested in the sample, that is, C to be Detector = C total sample - C sample matrix .
一个K438样品、两个K417G样品和一个K4800样品的空心阴极光谱检测数据(每个试样测一组平行数据)以及用现有技术中的电感耦合等离子体质谱法(ICP-MS)、原子吸收光谱(AAS)和辉光放电质谱法(GDMS)的检测数据列于下列表3、表4表5和表6中:Hollow cathode spectral detection data of one K438 sample, two K417G samples and one K4800 sample (one set of parallel data for each sample) and the use of inductively coupled plasma mass spectrometry (ICP-MS), atomic absorption Spectroscopy (AAS) and glow discharge mass spectrometry (GDMS) detection data are listed in Table 3, Table 4, Table 5, and Table 6 below:
表3 K438样品检测数据(%)Table 3 K438 sample detection data (%)
表4 1#K417G样品检测数据(%)Table 4 1#K417G sample detection data (%)
表5 2#K417G样品检测数据(%)Table 5 2#K417G sample detection data (%)
表6 K4800样品检测数据(%)Table 6 K4800 sample test data (%)
在上述表3-6中,总量和纯净基体采用两个试样分别检测的,一个试样烧成纯净基体,测出干扰值;另一个试样直接检测,测带干扰的总量;平行试样均值是试样1与试样2的平均值。In the above Table 3-6, the total amount and the pure matrix were detected by two samples, one sample was fired into the pure matrix, and the interference value was measured; the other sample was directly detected, and the total amount of interference was measured; parallel The sample mean is the average of Sample 1 and Sample 2.
通过以上实施例,可以看出本申请采用空心阴极发射光谱测定高温合金中痕量杂质元素含量时有效且较准确的校正了基体叠加光谱干扰,可以测定高温合金中常见易挥发痕量杂质元素,与其它分析方法对比数据基本一致。分析方法简单、快速、准确、检测成本低,可以在日常检测工作中推广、使用。Through the above examples, it can be seen that the application of the hollow cathode emission spectrum to measure the content of trace impurity elements in the superalloy effectively and accurately corrects the interference of the matrix superposition spectrum, and can measure the common volatile trace impurity elements in the superalloy, The data are basically consistent with other analysis methods. The analysis method is simple, fast, accurate, and has low detection cost, and can be popularized and used in daily detection work.
附录AAppendix A
(资料性附录)(informative appendix)
空心阴极与原子光谱相对强度(溅射和热蒸发同时作用)Relative intensities of hollow cathode and atomic spectra (simultaneous effects of sputtering and thermal evaporation)
上述附录A为高温合金的合金元素对被测元素的干扰情况。The above Appendix A shows the interference of alloying elements of superalloys to the measured elements.
本领域的技术人员容易理解的是,在不冲突的前提下,上述各有利方式可以自由地组合、叠加。It can be easily understood by those skilled in the art that, on the premise of no conflict, the above advantageous manners can be freely combined and superimposed.
以上仅为本申请的较佳实施例而已,并不用以限制本申请,凡在本申请的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本申请的保护范围之内。以上仅是本申请的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本申请技术原理的前提下,还可以做出若干改进和变型,这些改进和变型也应视为本申请的保护范围。The above are only preferred embodiments of the present application and are not intended to limit the present application. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present application shall be included in the protection scope of the present application. Inside. The above are only the preferred embodiments of the present application. It should be pointed out that for those skilled in the art, without departing from the technical principles of the present application, several improvements and modifications can also be made, and these improvements and modifications should also be It is regarded as the protection scope of this application.
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