CN114753150A - Conductive fabric and manufacturing method and application thereof - Google Patents
Conductive fabric and manufacturing method and application thereof Download PDFInfo
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- CN114753150A CN114753150A CN202210512608.7A CN202210512608A CN114753150A CN 114753150 A CN114753150 A CN 114753150A CN 202210512608 A CN202210512608 A CN 202210512608A CN 114753150 A CN114753150 A CN 114753150A
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/83—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with metals; with metal-generating compounds, e.g. metal carbonyls; Reduction of metal compounds on textiles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
- D06M2101/16—Synthetic fibres, other than mineral fibres
- D06M2101/30—Synthetic polymers consisting of macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- D06M2101/32—Polyesters
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
- D06M2101/16—Synthetic fibres, other than mineral fibres
- D06M2101/30—Synthetic polymers consisting of macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- D06M2101/34—Polyamides
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Textile Engineering (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a conductive fabric and a manufacturing method and application thereof, and relates to the technical field of textile materials. The conductive fabric is prepared by the following method: treating the base cloth: cleaning and drying the base cloth, and heating to remove water and gas adsorbed on the surface; pre-sputtering: vacuumizing the coating environment, and pre-sputtering the target to remove oxides on the surface layer of the target; vacuum deposition: conveying the base cloth to a film coating environment, and controlling the temperature of the base cloth to be 5-8 ℃; starting magnetron sputtering, and sequentially performing film coating on the surface of the base fabric for three times to form a nano composite film layer with three films to obtain the conductive fabric. The conductive fabric has good conductive performance and bending resistance, and the conductive performance loss is small after long-time use.
Description
Technical Field
The invention relates to the technical field of textile materials, in particular to a conductive fabric and a manufacturing method and application thereof.
Background
Due to the progress of modern technology and the rapid development of society, the living standard of people is also continuously improved. When people choose clothes, people pay attention to basic performance of the clothes in use and pay attention to functionality of the clothes. The combination of smart wearable devices with garments is a research hotspot in the field of modern functional garments. Moreover, with the development of sensor integration and functionality, more and more electronic devices will be integrated into the smart garment in the future. Therefore, the development of the fabric with the conductive function has an important promoting effect on the development progress of the intelligent clothes.
The conductivity properties of the fabric are mainly determined by the conductivity of the fibers. At present, the conductive fabric which is popular in the market is mainly manufactured by the following method: blending the metal wire with common fiber; preparing certain high molecular compounds into a colloidal solution, and processing by electrostatic spinning; ordinary fibers are immersed in the solution, and the conductive substances are attached and solidified on the fibers through chemical reaction.
However, the above-described method of manufacturing the conductive fabric has some problems. For example, a conductive fabric made by blending metal wires and common fibers has poor elasticity and low wearing comfort, and the conductive material is broken due to the bending effect in the wearing process, so that the conductive effect is lost; the post-treatment process of the electrostatic spinning method is complicated, the requirement on the manufacturing condition is high, and the conductivity of the manufactured fabric is not high; the impregnation method has the advantages of complex manufacturing process, low material utilization rate and relatively high production cost.
Disclosure of Invention
Therefore, it is necessary to provide a method for manufacturing a conductive fabric, in which a nano composite film layer is formed on the surface of a base fabric through vacuum deposition, and the manufactured fabric has good conductive performance, high safety, good bending resistance and less conductive performance loss after long-term use.
A method for manufacturing a conductive fabric comprises the following steps:
treating the base cloth: cleaning and drying the base cloth, and heating to remove water and gas adsorbed on the surface;
pre-sputtering: vacuumizing the coating environment, and pre-sputtering the target to remove oxides on the surface layer of the target;
vacuum deposition: conveying the base cloth to a film coating environment, and controlling the temperature of the base cloth to be 5-8 ℃; starting magnetron sputtering, and sequentially performing film coating for three times on the surface of the base fabric to form a nano composite film layer with three films to obtain the conductive fabric;
in the vacuum deposition step, the conditions of three times of film coating are respectively as follows:
during the first coating, the target material is titanium, titanium alloy, zinc alloy or nickel alloy, and a dielectric film layer is obtained through the first coating;
during the second film coating, the target material is copper, silver or molybdenum-copper alloy, and a conductive film layer is obtained through the second film coating;
and in the third coating, the target is titanium alloy, tin alloy or stainless steel, and the protective film is obtained through the third coating.
According to the preparation method, the nano composite film layer with the three-layer structure is formed on the base cloth through a vacuum deposition method. In the nano composite film layer prepared by the method, the dielectric layer and the protective film layer are in an amorphous structure, and the conductive layer is in a crystalline structure or an amorphous structure. The dielectric film layer can increase the binding force between the conductive film layer and the base cloth, has an insulation effect and prevents the damage to a human body caused by overlarge current of the conductive film layer; the conductive film layer is of a continuous conductive alloy amorphous structure or a high-conductivity high-ductility pure metal crystal structure, and as the conductive alloy amorphous structure does not form complete crystals and has no crystal boundary defects, compared with the conductive alloy with a crystalline structure, the conductive alloy is less prone to fracture due to folding in mechanical property, thereby being more beneficial to ensuring lasting conductive performance; the protection film layer possesses certain conductivity, and amorphous structure makes the rete more compact, and no crystal boundary defect can form the better separation effect to the ambient air on the one hand, prevents that the conducting layer from oxidizing, and on the other hand can protect the electrically conductive rete, reducing wear. Moreover, the preparation method is simple and easy to operate, and can reduce the production cost of the product.
The three-layer structure of the nano composite film layer provided by the invention supports each other, so that good conductivity can be provided, the use safety of the product can be improved, and the service life of the product can be prolonged.
The amorphous structure of the conductive film layer is the key for ensuring the conductive performance of the fabric, and the inventor finds that the key of the amorphous formation is to slow down the crystallization speed of the film layer, so that the film layer stays in the amorphous state without forming the crystalline state, and the amorphous formation is facilitated by controlling the temperature of the substrate to be at a lower level. Compared with the crystalline film layer, the amorphous film layer has the advantages that the free electron moving speed is improved, and the conductivity can be improved by about 20%.
The main factor of crystalline film layer breakage is along-crystal breakage, while the amorphous film layer can avoid along-crystal breakage, and the amorphous film layer, especially the ceramic non-static film layer, is less prone to breakage and falling off, improves the breakage resistance and bending resistance of the product, and is more suitable for use scenes with frequent bending, such as clothes and the like.
In one embodiment, in the first coating, the target is titanium alloy or titanium, the sputtering power is 180-230W, the vacuum gas is argon, the flow rate of the vacuum gas is 25-35 sccm, the reaction gas is nitrogen, and the flow rate of the reaction gas is 30-60 sccm.
In one embodiment, in the second coating, the target is molybdenum-copper alloy or silver, the sputtering power is 300-350W, the vacuum gas is argon, and the flow rate of the vacuum gas is 70-80 sccm.
The inventors have also found that for the fabrication of copper conductive layers, the use of copper alloy targets is more prone to amorphous state formation than pure copper targets. For the ceramic amorphous layer, the difficulty of forming stable crystals on the film layer can be increased by reducing the ventilation of reaction gas, and an amorphous structure is easier to form.
Under the condition of the same element proportion, the conductive effect of the amorphous conductive layer is improved relative to the conductive layer of the crystalline state, but for example, pure copper and pure silver belong to elements which are difficult to achieve the amorphous state, although the pure metal conductive layer is not in an amorphous structure, because the dielectric film layer and the protective film layer are in an amorphous state, and the copper and the silver are metals with good ductility, the whole film layer is not easy to bend and fall off, and the conductive layer can be prevented from being oxidized. The resistance of the conductive layer is raised by oxidation in an order of magnitude, however, even if the conductive layer is not an amorphous structure, the amorphous dielectric film layer and the amorphous protective film layer can still protect and prolong the conductive effect of the conductive layer.
In one embodiment, the target material in the third coating is 316L stainless steel, the sputtering power is 260-280W, the vacuum gas is argon, and the flow rate of the vacuum gas is 65-75 sccm.
In one embodiment, in the pre-sputtering step, the vacuum degree of the vacuum environment is 0.8-1.2 × 10-3Pa。
In one embodiment, in the vacuum deposition step, the sputtering vacuum degree is maintained at 0.8-1.2 × 10- 1Pa。
In one embodiment, in the vacuum deposition step, the conveying speed of the base cloth is 0.5-5 m/min.
In one embodiment, the base fabric is a organzine yarn.
The invention also provides the conductive fabric obtained by the manufacturing method, the conductive fabric comprises a base cloth and a nano composite film layer which are arranged in a laminated mode, the nano composite film layer is a continuous amorphous composite nano film, the nano composite film layer comprises a dielectric film layer, a conductive film layer and a protective film layer which are arranged in a laminated mode in sequence, the dielectric film layer and the protective film layer are of amorphous structures, and the conductive layer is of a crystalline structure or an amorphous structure.
The conductive fabric has good conductive performance, high safety, good bending resistance and less conductive performance loss after long-term use.
In one embodiment, the thickness of the dielectric film layer is 15-55 nm, the thickness of the conductive film layer is 10-150 nm, and the thickness of the protective film layer is 5-45 nm.
The invention also provides application of the conductive fabric in preparing functional clothes.
The conductive fabric has good bending and breaking resistance and is suitable for preparing functional clothes, so that the long-time conductivity of the product is ensured, and the service life of the product is prolonged.
Compared with the prior art, the invention has the following beneficial effects:
according to the preparation method, the nano composite film layer with the three-layer structure is formed on the base cloth through a vacuum deposition method. In the nano composite film layer prepared by the method, the dielectric layer and the protective film layer are in an amorphous structure, and the conductive layer is in a crystalline structure or an amorphous structure. The dielectric film layer in the nano composite film layer can not only increase the binding force between the conductive film layer and the base cloth, but also prevent the damage to human body caused by overlarge current of the conductive film layer; the conductive film layer is of a continuous conductive alloy amorphous structure or a high-conductivity high-ductility pure metal crystal structure, and as the conductive alloy amorphous structure does not form complete crystals and has no crystal boundary defects, compared with the conductive alloy with a crystalline structure, the conductive alloy is less prone to fracture due to folding on the aspect of mechanical property, so that the conductive film layer is more beneficial to ensuring lasting conductive performance; the protection rete possesses certain conductivity, and amorphous structure makes the rete more compact, and no crystal boundary defect can form the better separation effect to the outside air on the one hand, prevents that the conducting layer from oxidizing, and on the other hand can protect the electrically conductive rete, reduces the outside and produces wearing and tearing to it. Moreover, the preparation method is simple and easy to operate, and can reduce the production cost of the product. The conductive fabric has the advantages of good conductive performance, high safety, good bending resistance and less conductive performance loss after long-time use.
Drawings
Figure 1 is the XRD pattern of the fabric of example 1.
Figure 2 is the XRD pattern of the fabric of example 2.
Detailed Description
In order that the invention may be more fully understood, preferred embodiments will now be given. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.
Example 1
An electrically conductive fabric, made by the following method:
(1) the European-root yarn is used as base cloth, the base cloth is cleaned, impurities such as dust and oil stain are removed, and then drying treatment is carried out.
(2) And putting the base cloth into the unreeling chamber, flatly running the base cloth on the transmission device under the condition that the transmission device applies tension, and vacuumizing the sealed chamber. The base cloth passes through the heating chamber before entering the film coating chamber, so that the moisture and gas adsorbed on the surface of the base cloth are reduced.
(3) When the vacuum degree of the film coating chamber reaches 1.0 multiplied by 10-3And when Pa is needed, pre-sputtering the target to remove the oxide on the surface of the target. The temperature of the base cloth coating hub is controlled at 5 ℃.
(4) And after the pre-sputtering is finished, depositing a nano composite film layer on the surface of the base fabric, and setting the speed to be 1 m/min. The coating target materials are respectively sputtered onto the surface of the base cloth through the three coating chambers, and the nano composite film layers are sequentially formed on the surface of the base cloth through deposition.
The target material of the first film plating chamber is TiNi alloy, the sputtering power is 230W, the vacuum gas is argon (Ar), the gas flow is 30sccm, the vacuum gas is nitrogen, and the gas flow is 60 sccm.
The target material of the second film plating chamber is molybdenum-copper alloy, the sputtering power is 350W, the vacuum gas is argon, and the gas flow is 70 sccm.
The target material of the third film plating chamber is 316L stainless steel, the sputtering power is 270W, the vacuum gas is argon, and the gas flow is 70 sccm. During the sputtering period, the sputtering process is carried out,the degree of vacuum of each sputtering chamber was maintained at 1.0X 10-1Pa。
(5) And the base cloth after film coating enters a rolling chamber under the transmission of a transmission device, and a finished fabric is taken out. The fabric is formed by laminating a base fabric and a nano composite film layer, wherein the nano composite film layer comprises TiNiN which is sequentially laminatedxThe thickness of each layer is 20nm, 130nm and 30nm respectively.
And taking the finished fabric for detection. Through detection, no obvious crystal form peak is found in the material of the nano composite film layer through XRD analysis (see figure 1), which indicates that the nano composite film layer is an amorphous film layer. The resistance of the fabric was 1.3 ohm/mm2Thus, the conductive material has better conductivity.
Example 2
An electrically conductive fabric, made by the following method:
(1) the European-root yarn is used as base cloth, the base cloth is cleaned, impurities such as dust and oil stain are removed, and then drying treatment is carried out.
(2) And putting the base cloth into the unreeling chamber, flatly running the base cloth on the transmission device under the condition that the transmission device applies tension, and vacuumizing the sealed chamber. The base cloth passes through the heating chamber before entering the film coating chamber, so that the moisture and gas adsorbed on the surface of the base cloth are reduced.
(3) When the vacuum degree of the film coating chamber reaches 1.0 multiplied by 10-3And when Pa is needed, pre-sputtering the target to remove the oxide on the surface of the target. The temperature of the base cloth coating hub is controlled at 7 ℃.
(4) And after the pre-sputtering is finished, depositing a nano composite film layer on the surface of the base cloth, and setting the speed to be 1 m/min. The coating target materials are respectively sputtered onto the surface of the base cloth through the three coating chambers, and a dielectric film layer, a conductive film layer and a protective film layer are sequentially formed on the surface of the base cloth in a deposition mode.
The target material of the first film plating chamber is Ti, the sputtering power is 180W, the vacuum gas is argon, the gas flow is 30sccm, the vacuum gas is nitrogen, and the gas flow is 30 sccm.
The target material of the second film plating chamber is Ag, the sputtering power is 300W, the vacuum gas is argon, and the gas flow is 80 sccm.
The target material of the third film plating chamber is 316 stainless steel L, the sputtering power is 270W, the vacuum gas is argon, and the gas flow is 70 sccm. During sputtering, the degree of vacuum of each sputtering chamber was maintained at 1.0X 10-1Pa。
(5) The base cloth after film coating enters a rolling chamber under the transmission of a transmission device, and a finished fabric is taken out. The fabric is formed by laminating base cloth and a nano composite film layer, wherein the nano composite film layer comprises a titanium nitride medium film layer (an amorphous ceramic layer), a silver film layer and a stainless steel film layer which are sequentially stacked, and the thicknesses of the layers are respectively 18nm, 150nm and 30 nm.
And taking the finished fabric for detection. Through detection, the material of the nano composite film layer is analyzed by XRD, only the Ag peak of the conductive layer can be seen, and the other peaks do not have obvious crystal form peaks (see figure 2), which indicates that the dielectric layer and the protective layer are both amorphous film layers. The resistance of the fabric was 0.8 ohm/mm2Thus, the conductive material has better conductivity.
Comparative example 1
A conductive fabric prepared in substantially the same manner as in example 1 except that the base fabric was coated with a film at a hub base temperature of 15 c in step (3).
The prepared conductive fabric is taken, and XRD analysis shows that complete TiN crystals and molybdenum copper crystals, and Ni crystals and stainless steel crystals which are not completely developed are formed in the film layer, so that the composite film on the base fabric is a crystalline film layer. The resistance of the fabric was 3.9 ohm/mm2Which is less conductive than the conductive fabric of example 1.
The resistance of the conductive fabric of example 1 and the conductive fabric of comparative example 1 were measured after exposure to air for 3 months, and the resistance of the fabric of example 1 was 3.4 ohm/mm2Comparative example 1, the fabric resistance was 139 ohm/mm2It can be seen that the oxidation resistance of the fabric of example 1 is significantly better than that of comparative example 1.
All possible combinations of the technical features of the above embodiments may not be described for the sake of brevity, but should be considered as within the scope of the present disclosure as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent should be subject to the appended claims.
Claims (10)
1. The manufacturing method of the conductive fabric is characterized by comprising the following steps of:
treating the base cloth: cleaning and drying the base cloth, and heating to remove water and gas adsorbed on the surface;
pre-sputtering: vacuumizing the coating environment, and pre-sputtering the target to remove oxides on the surface layer of the target;
vacuum deposition: conveying the base cloth to a film coating environment, and controlling the temperature of the base cloth to be 5-8 ℃; starting magnetron sputtering, and sequentially performing three-time film coating on the surface of the base fabric to form a nano composite film layer with three layers of films to obtain the conductive fabric;
in the vacuum deposition step, the conditions of three times of film coating are respectively as follows:
during the first film coating, the target material is titanium, titanium alloy, zinc alloy or nickel alloy, and a dielectric film layer is obtained through the first film coating;
during the second film coating, the target material is copper, silver or molybdenum-copper alloy, and a conductive film layer is obtained through the second film coating;
and in the third film coating, the target is titanium alloy, tin alloy or stainless steel, and the protective film layer is obtained through the third film coating.
2. The method according to claim 1, wherein the first coating comprises a titanium alloy or titanium target, a sputtering power of 180-230W, argon gas as a vacuum gas, a flow rate of the vacuum gas of 25-35 sccm, nitrogen gas as a reactive gas, and a flow rate of the reactive gas of 30-60 sccm.
3. The method according to claim 1, wherein the target material in the second coating is Mo-Cu alloy or Ag, the sputtering power is 300-350W, the vacuum gas is Ar, and the flow rate of the vacuum gas is 70-80 sccm.
4. The method according to claim 1, wherein the third coating is performed with a target of 316L stainless steel, a sputtering power of 260 to 280W, a vacuum gas of argon, and a flow rate of 65 to 75 sccm.
5. The method according to any one of claims 1 to 4, wherein in the pre-sputtering step, the degree of vacuum is 0.8 to 1.2 x 10 in the vacuum environment-3Pa。
6. The method according to any one of claims 1 to 4, wherein in the vacuum deposition step, the base fabric is transported at a speed of 0.5 to 5m/min and the degree of sputtering vacuum is maintained at 0.8 to 1.2X 10-1Pa。
7. The method according to any one of claims 1 to 4, wherein the base fabric is selected from the group consisting of: european root yarn.
8. A conductive fabric obtained by the manufacturing method of any one of claims 1 to 7, wherein the conductive fabric comprises a base cloth and a nano composite film layer which are arranged in a laminated manner, the nano composite film layer is a continuous amorphous composite nano film, the nano composite film layer comprises a dielectric film layer, a conductive film layer and a protective film layer which are arranged in a laminated manner in sequence, the dielectric film layer and the protective film layer are in an amorphous structure, and the conductive layer is in a crystalline structure or an amorphous structure.
9. The conductive fabric according to claim 8, wherein the dielectric film layer has a thickness of 15 to 55nm, the conductive film layer has a thickness of 10 to 150nm, and the protective film layer has a thickness of 5 to 45 nm.
10. Use of the conductive fabric of any one of claims 8 or 9 in the manufacture of a functional garment.
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