CN114752897A - Photoelectric alignment device inside the evaporation machine - Google Patents
Photoelectric alignment device inside the evaporation machine Download PDFInfo
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- CN114752897A CN114752897A CN202210338711.4A CN202210338711A CN114752897A CN 114752897 A CN114752897 A CN 114752897A CN 202210338711 A CN202210338711 A CN 202210338711A CN 114752897 A CN114752897 A CN 114752897A
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- 230000008020 evaporation Effects 0.000 title claims abstract description 14
- 238000001704 evaporation Methods 0.000 title claims abstract description 14
- 238000005286 illumination Methods 0.000 claims abstract description 10
- 238000000576 coating method Methods 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 8
- 239000013078 crystal Substances 0.000 abstract description 15
- 230000003287 optical effect Effects 0.000 abstract description 11
- 230000007246 mechanism Effects 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 2
- 238000001771 vacuum deposition Methods 0.000 abstract description 2
- 238000012423 maintenance Methods 0.000 description 5
- 239000000523 sample Substances 0.000 description 3
- 239000005338 frosted glass Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
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- Electroluminescent Light Sources (AREA)
Abstract
蒸镀机内部光电对位装置,涉及真空镀膜技术领域。本发明的蒸镀机内部光电对位装置,其特征在于该对位装置包括外壳、照明系统、半反半透式光路、准直激光器和电源,照明系统设置在外壳上部,半反半透式光路设置在外壳内部,准直激光器水平设置在外壳一端,外壳另一端设置有出口光阑。本发明的蒸镀机内部光电对位装置,设计科学,使用方便,结构合理,操作人员通过调整半反半透式光路位置,将LED光源发出的光线进入遮挡机构,并照射在晶振片上,并可以通过观察口直接观察或外接CCD以呈现光照效果和位置,并利用准直激光器发射红外光产生红色光斑,便于观察调整,提高定位的准确性。
A photoelectric alignment device inside an evaporation machine relates to the technical field of vacuum coating. The photoelectric alignment device inside the evaporation machine of the present invention is characterized in that the alignment device comprises a casing, an illumination system, a transflective optical path, a collimating laser and a power supply, and the illumination system is arranged on the upper part of the casing; The optical path is arranged inside the casing, the collimating laser is horizontally arranged at one end of the casing, and the other end of the casing is provided with an exit aperture. The internal photoelectric alignment device of the evaporation machine of the invention has scientific design, convenient use and reasonable structure. The operator adjusts the position of the transflective and translucent optical path, and the light emitted by the LED light source enters the shielding mechanism, and irradiates it on the crystal oscillator plate. It can be directly observed through the observation port or externally connected to a CCD to show the lighting effect and position, and use a collimated laser to emit infrared light to generate a red spot, which is convenient for observation and adjustment and improves the accuracy of positioning.
Description
技术领域technical field
本发明涉及真空镀膜技术领域,尤其是一种在镀膜机的有限狭小的空间内使用,帮助使用者克服人体视觉限制,确定蒸发源坩埚和晶振头晶振片的相对位置,发现和避免部件干涉的蒸镀机内部光电对位装置。The invention relates to the technical field of vacuum coating, in particular to a method that is used in a limited and narrow space of a coating machine, helps users overcome the limitation of human vision, determines the relative positions of the evaporation source crucible and the crystal oscillator plate, and finds and avoids component interference. Photoelectric alignment device inside the evaporation machine.
背景技术Background technique
在蒸镀机设备上,蒸发源坩埚和晶振探头(晶振片)同处于一个真空环境中,且坩埚中心位置与晶振片位置要相对固定,若位置出现变化或出现空间干涉则会影响膜层性能,发生参数偏移。生产用大型镀膜机的真空腔体中通常会设置多个蒸发源(比如主料源和参杂源),也就是多个坩埚位(主坩埚和参杂坩埚),每个坩埚位原则上要对应一个晶振探头,为了避免各个源同时工作时的相互干扰,在加热源附近和各晶振探头附近会安装一些遮挡机构,这些机构调整不到位就会引起上面所说的空间干涉。On the evaporation equipment, the evaporation source crucible and the crystal probe (crystal oscillator) are in the same vacuum environment, and the central position of the crucible and the crystal oscillator should be relatively fixed. If the position changes or there is spatial interference, it will affect the film performance. , a parameter offset occurs. Multiple evaporation sources (such as main material source and impurity source) are usually set in the vacuum chamber of large-scale coating machines for production, that is, multiple crucible positions (main crucible and impurity crucible). Corresponding to a crystal probe, in order to avoid mutual interference when each source works at the same time, some shielding mechanisms will be installed near the heating source and each crystal probe. If these mechanisms are not adjusted properly, the space interference mentioned above will be caused.
在镀膜生产中,经常需要进行必要维护,比如坩埚加换料、更换晶振片、校准控制参数、清洗真空腔体结构件等。维护前后要保证各个部件位置的准确性,这是非常重要的,特别是在对镀膜工艺批次一致性要求高的场合,如OLED白光结构镀膜。In coating production, necessary maintenance is often required, such as refueling of crucibles, replacement of crystal oscillators, calibration of control parameters, cleaning of vacuum chamber structural parts, etc. It is very important to ensure the accuracy of the position of each component before and after maintenance, especially in occasions that require high batch consistency of the coating process, such as OLED white light structure coating.
一般来说,镀膜机腔体空间有限,坩埚和晶振头嵌入在腔壁内,一般不可能同时采取有效照明,再加上可能有很多遮挡机构,操作人员在维护时很难进行多部件的准确定位,只能靠经验来定位。Generally speaking, the cavity space of the coating machine is limited, the crucible and the crystal head are embedded in the cavity wall, and it is generally impossible to take effective lighting at the same time. In addition, there may be many shielding mechanisms, and it is difficult for the operator to perform accurate multi-component maintenance during maintenance. Positioning can only be determined by experience.
发明内容SUMMARY OF THE INVENTION
本发明所要解决的就是目前镀膜机内腔体空间有限,操作人员维修时定位困难且不准确的问题,提供一种在镀膜机的有限狭小的空间内使用,帮助使用者克服人体视觉限制,确定蒸发源坩埚和晶振头晶振片的相对位置,发现和避免部件干涉的蒸镀机内部光电对位装置。The present invention solves the problems of limited space in the inner cavity of the current coating machine, difficult and inaccurate positioning for operators during maintenance, and provides a coating machine that can be used in a limited and narrow space to help users overcome the limitations of human vision and determine The relative position of the evaporation source crucible and the crystal oscillator plate of the crystal oscillator, and the internal photoelectric alignment device of the vapor deposition machine to find and avoid component interference.
本发明的蒸镀机内部光电对位装置,其特征在于该对位装置包括外壳、照明系统、半反半透式光路、准直激光器和电源,照明系统设置在外壳上部,半反半透式光路设置在外壳内部,准直激光器水平设置在外壳一端,外壳另一端设置有出口光阑;其中:The photoelectric alignment device inside the evaporation machine of the present invention is characterized in that the alignment device comprises a casing, an illumination system, a transflective optical path, a collimating laser and a power supply, the illumination system is arranged on the upper part of the casing, and the transflective type The optical path is arranged inside the casing, the collimating laser is horizontally arranged at one end of the casing, and the other end of the casing is provided with an exit aperture; wherein:
照明系统包括从上至下顺序设置的LED光源、凸透镜和玻璃窗口,LED光源朝下发光,凸透镜为单面磨砂凸透镜,凸面朝上;玻璃窗口为双面磨砂的玻璃;The lighting system includes an LED light source, a convex lens and a glass window arranged in sequence from top to bottom, the LED light source emits light downward, the convex lens is a single-sided frosted convex lens, and the convex surface is upward; the glass window is a double-sided frosted glass;
半反半透式光路由三个三棱镜组合而成,其中第一个三棱镜的斜边朝上,一个直角边朝向准直激光器,另一个直角边向下,第二个三棱镜与第一个三棱镜平行放置,第三个三棱镜的斜边覆盖在第二个三棱镜的斜边上,准直激光器射出的光线顺序穿过半反半透式光路后从出口光阑中射出;The transflective light is composed of three triangular prisms, in which the hypotenuse of the first triangular prism faces upwards, one right-angled side faces the collimating laser, the other right-angled side faces downwards, and the second triangular prism is parallel to the first triangular prism Placed, the hypotenuse of the third prism covers the hypotenuse of the second prism, and the light emitted by the collimating laser sequentially passes through the transflective light path and then exits the exit aperture;
电源通过导线与LED光源和准直激光器连接,为LED光源和准直激光器提供电能。The power supply is connected with the LED light source and the collimating laser through a wire, and provides power for the LED light source and the collimating laser.
所述的外壳侧壁上还设置有观察口,观察口位置位于第二个三棱镜和第三个三棱镜的斜面的接触位置上方。An observation port is also provided on the side wall of the casing, and the position of the observation port is located above the contact position of the inclined surfaces of the second triangular prism and the third triangular prism.
本发明的蒸镀机内部光电对位装置,设计科学,使用方便,结构合理,操作人员通过调整半反半透式光路位置,将LED光源发出的光线进入遮挡机构,并照射在晶振片上,并可以通过观察口直接观察或外接CCD以呈现光照效果和位置,并利用准直激光器发射红外光产生红色光斑,便于观察调整,提高定位的准确性。The photoelectric alignment device inside the evaporation machine of the invention is scientific in design, convenient in use and reasonable in structure. The operator adjusts the position of the transflective and translucent optical path, so that the light emitted by the LED light source enters the shielding mechanism, and irradiates it on the crystal oscillator plate. It can be directly observed through the observation port or externally connected to a CCD to show the lighting effect and position, and use a collimated laser to emit infrared light to generate a red spot, which is convenient for observation and adjustment and improves the accuracy of positioning.
附图说明Description of drawings
图1为本发明结构示意图。Figure 1 is a schematic structural diagram of the present invention.
其中,LED光源1,凸透镜2,玻璃窗口3,三棱镜4,准直激光器5,出口光阑6,观察口7,晶振片8。Among them, LED light source 1, convex
具体实施方式Detailed ways
实施例1:一种蒸镀机内部光电对位装置,包括外壳、照明系统、半反半透式光路、准直激光器5和电源,照明系统设置在外壳上部,半反半透式光路设置在外壳内部,准直激光器5水平设置在外壳一端,外壳另一端设置有出口光阑6;其中:Embodiment 1: An internal photoelectric alignment device of an evaporation machine, comprising a casing, an illumination system, a transflective optical path, a collimating
照明系统包括从上至下顺序设置的LED光源1、凸透镜2和玻璃窗口3,LED光源1朝下发光,凸透镜2为单面磨砂凸透镜2,凸面朝上;玻璃窗口3为双面磨砂的玻璃;The lighting system includes an LED light source 1, a
半反半透式光路由三个三棱镜4组合而成,其中第一个三棱镜4的斜边朝上,一个直角边朝向准直激光器5,另一个直角边向下,第二个三棱镜4与第一个三棱镜4平行放置,第三个三棱镜4的斜边覆盖在第二个三棱镜4的斜边上,准直激光器5射出的光线顺序穿过半反半透式光路后从出口光阑6中射出;The transflective light path is composed of three
电源通过导线与LED光源1和准直激光器5连接,为LED光源1和准直激光器5提供电能。The power supply is connected to the LED light source 1 and the collimating
外壳侧壁上还设置有观察口7,观察口7位置位于第二个三棱镜4和第三个三棱镜4的斜面的接触位置上方。An
照明系统的LED光源1所发射的点状光线通过单面磨砂的凸透镜2和双面磨砂的玻璃窗口3转化为平行出射光,既为平面光线。平面光线通过第一个三棱镜4的斜面反射后光路改变90°,此时中心光路与系统轴线重合,,光线进入第二个三棱镜4的入射面,穿过第二个三棱镜4后通过第二个三棱镜4和第三个三棱镜4相接触的斜面,从第三个三棱镜4以平行光形式射出,并通过出口光阑6来控制有效的照明区域。The point-like light emitted by the LED light source 1 of the lighting system is converted into parallel outgoing light through a single-sided frosted
操作人员通过调整半反半透式光路在外壳中的位置,使得出射的照明平行光进入遮挡机构后照射在晶振片8上,晶振片8的像通过第二个三棱镜4和第三个三棱镜4带的接触面在观察口7处呈现。同时,操作人员观察准直激光器5的红点光斑着落点,是否在关心的区域,如坩埚口;如果出口光阑6与晶振片8之间出现遮挡物,就会在观察口7中呈现,此时就需要进行调整,避免干涉。The operator adjusts the position of the transflective and translucent optical path in the housing, so that the outgoing illumination parallel light enters the shielding mechanism and then irradiates on the
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Citations (6)
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JPH02112709A (en) * | 1988-10-21 | 1990-04-25 | Olympus Optical Co Ltd | Method and device for alignment |
US5473409A (en) * | 1993-09-21 | 1995-12-05 | Sony Corporation | Semiconductor light exposure device |
CN1841122A (en) * | 2005-03-31 | 2006-10-04 | 鸿富锦精密工业(深圳)有限公司 | Optical system and optical recording/reproducing device using the same |
CN206819052U (en) * | 2017-04-05 | 2017-12-29 | 无锡影速半导体科技有限公司 | One kind alignment demarcation integrated device |
CN109870816A (en) * | 2019-03-16 | 2019-06-11 | 南京华群光电技术有限公司 | A kind of optical system and its displacement measurement method of laser displacement sensor |
JP2019113341A (en) * | 2017-12-21 | 2019-07-11 | 株式会社アルバック | Gap measurement method |
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- 2022-04-01 CN CN202210338711.4A patent/CN114752897A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02112709A (en) * | 1988-10-21 | 1990-04-25 | Olympus Optical Co Ltd | Method and device for alignment |
US5473409A (en) * | 1993-09-21 | 1995-12-05 | Sony Corporation | Semiconductor light exposure device |
CN1841122A (en) * | 2005-03-31 | 2006-10-04 | 鸿富锦精密工业(深圳)有限公司 | Optical system and optical recording/reproducing device using the same |
CN206819052U (en) * | 2017-04-05 | 2017-12-29 | 无锡影速半导体科技有限公司 | One kind alignment demarcation integrated device |
JP2019113341A (en) * | 2017-12-21 | 2019-07-11 | 株式会社アルバック | Gap measurement method |
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