CN114695828A - Preparation device and preparation method of pixel definition layer - Google Patents

Abstract

The present invention provides a preparation device and a preparation method for a pixel definition layer. The preparation device includes: a transfer unit for transferring a substrate, the substrate including a pixel definition layer light located on the side of the substrate away from the transfer unit. Resistor; an imprinting mold is arranged on the side of the substrate away from the conveying unit, and is used for imprinting the photoresist of the pixel definition layer to obtain grooves corresponding to the pixel openings. By using the preparation device provided in the embodiment of the present invention, and implementing the preparation method provided in the embodiment of the present invention, the desired product can be prepared on the substrate only through the four-step process of coating, imprinting, curing, and etching. Compared with the prior art, which requires multiple manufacturing processes of coating, curing, exposure, developing and etching, and requires the use of precise exposure equipment and precise reticle, the present invention saves the preparation of the pixel definition layer. The equipment and material costs in the process improve the production efficiency of the pixel definition layer.

Description

Preparation device and preparation method of pixel definition layer

technical field

The present application relates to the field of display, and in particular, to a preparation device and preparation method of a pixel definition layer.

Background technique

Organic Electroluminescence Display (OLED) and Quantum Dot Light Emitting Diodes (QLED) displays are fabricated by solution printing technology, which have the advantages of low cost, high productivity, and easy realization of large size, which is the future development of display technology. important direction. In the printing process, the pixel-defining layer is very important for the printing yield of the display material and the uniformity of the later film formation.

At present, the manufacturing process of the pixel definition layer is to first coat the pixel definition layer material, then expose and develop through a mask, and finally etch to obtain the required pixel definition layer structure. This manufacturing process requires sophisticated exposure equipment and precise Mask production increases the manufacturing cost, and at the same time requires multiple manufacturing processes of coating, curing, exposure, development, and etching, reducing production efficiency.

SUMMARY OF THE INVENTION

The invention provides a preparation device and a preparation method of a pixel definition layer, so as to save equipment and material costs in the preparation process of the pixel definition layer, and improve the production efficiency of the pixel definition layer.

For solving the above problems, the technical solutions provided by the present invention are as follows:

The present invention provides a preparation device for a pixel definition layer, the pixel definition layer includes a pixel opening, and the preparation device includes:

a transfer unit for transferring a substrate, the substrate comprising a pixel definition layer photoresist on a side of the substrate away from the transfer unit;

The imprinting mold is disposed on the side of the substrate away from the conveying unit, and is used for imprinting the photoresist of the pixel definition layer to obtain the grooves corresponding to the pixel openings.

Optionally, in some embodiments of the present invention, the imprinting mold includes an outer mold and an inner mold, and the outer mold is sleeved outside the inner mold.

Optionally, in some embodiments of the present invention, the outer mold includes a rigid drum and at least two mold teeth, the mold teeth are provided on a side of the rigid drum away from the inner mold, and the mold teeth used for imprinting the pixel definition layer photoresist to obtain grooves corresponding to the pixel openings.

Optionally, in some embodiments of the present invention, the inner mold is a hollow elastic drum, and the hollow space of the elastic drum can be inflated.

Optionally, in some embodiments of the present invention, the conveying unit includes a conveying wheel and a conveying belt, the conveying belt is sleeved on the outer periphery of the conveying wheel, and the conveying wheel is used to drive the conveying belt to the substrate to transmit.

Optionally, in some embodiments of the present invention, the conveying unit further includes a pressure adjusting roller, the conveying belt is sleeved outside the pressure adjusting roller, the center of the embossing die and the pressure The connecting line between the centers of the adjustment rollers is perpendicular to the conveyor belt, and the pressure adjustment roller can move toward or away from the imprinting die.

Optionally, in some embodiments of the present invention, the transmission wheel includes a transmission roller and a transmission belt tensioner, the transmission roller is used for conveying the transmission belt, and the transmission belt tensioner can be used for conveying along the transmission belt. The plane moves to adjust the tension of the conveyor belt.

Optionally, in some embodiments of the present invention, the transmission roller includes one active transmission roller and two driven transmission rollers, the active transmission roller is provided at the transmission starting end of the conveyor belt, and the conveyor belt tensioner is provided. At the end of the transmission of the conveyor belt, the driven transmission roller is arranged between the driving transmission roller and the conveyor belt tensioner.

Correspondingly, the present invention also provides a method for preparing a pixel definition layer, the preparation method comprising:

providing a substrate including electrodes on a surface of the substrate;

Coating a layer of pixel definition layer photoresist on the substrate, the pixel definition layer photoresist covering the electrode;

Passing the substrate through the preparation device described in any one of the embodiments of the present invention, and imprinting the grooves corresponding to the pixel openings;

curing the pixel definition layer photoresist;

The pixel definition layer photoresist is etched and thinned to obtain the pixel opening, and the pixel opening exposes the electrode.

Optionally, in some embodiments of the present invention, the operation of curing the pixel definition layer photoresist is completed within 10 minutes after the groove imprinting is completed.

The present invention provides a preparation device and a preparation method for a pixel definition layer. By using the preparation device provided by the embodiment of the present invention, the preparation method provided by the embodiment of the present invention is implemented, and only by coating, imprinting, curing , The four-step etching process can prepare the required pixel definition layer on the substrate. Compared with the prior art, which requires multiple manufacturing processes of coating, curing, exposure, development, and etching, it requires the use of precise With exposure equipment and a precise mask, the invention saves equipment and material costs in the process of preparing the pixel definition layer, and improves the production efficiency of the pixel definition layer.

Description of drawings

The technical solutions and other beneficial effects of the present application will be apparent through the detailed description of the specific embodiments of the present application in conjunction with the accompanying drawings.

FIG. 1 is a schematic structural diagram of a device for preparing a pixel definition layer according to an embodiment of the present invention;

2 is a flowchart of a method for preparing a pixel definition layer according to an embodiment of the present invention;

FIG. 3 is a schematic structural diagram of a method for preparing a pixel definition layer according to an embodiment of the present invention.

Detailed ways

The following will clearly and completely describe the technical solutions in the embodiments and/or examples of the present invention in conjunction with the specific embodiments of the present invention. Obviously, the embodiments and/or examples described below are only part of the implementation of the present invention. Protocols and/or Examples, but not all embodiments and/or Examples. Based on the embodiments and/or examples in the present invention, all other embodiments and/or examples obtained by persons of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

The directional terms mentioned in the present invention, such as [up], [down], [left], [right], [front], [rear], [inner], [outer], [side], etc., are only for reference Additional schema orientation. Therefore, the directional terms used are for describing and understanding the present invention, not for limiting the present invention. The terms "first", "second", etc. are only used for descriptive purposes, and should not be construed as indicating or implying their relative importance or implying the number of indicated technical features. Thus, a feature defined as "first", "second", etc., may expressly or implicitly include one or more of that feature.

The invention provides a preparation device for a pixel definition layer and a preparation method for preparing a pixel definition layer by using the preparation device, so as to simultaneously solve the problems of high cost, complicated process flow and low production efficiency in the existing pixel definition layer manufacturing process.

Referring to FIG. 1 , FIG. 1 shows a schematic structural diagram of an apparatus for preparing a pixel definition layer provided by an embodiment of the present invention. The present invention provides a device for preparing a pixel definition layer, which is used for preparing a pixel definition layer of a display panel. The pixel definition layer includes a pixel opening, and the pixel opening penetrates the pixel definition layer and exposes the underside of the pixel definition layer. The electrode, the preparation device includes:

a transfer unit for transferring a substrate, the substrate comprising a pixel definition layer photoresist on a side of the substrate away from the transfer unit;

A bank imprinting mold is disposed on the side of the substrate away from the transfer unit, and is used for imprinting the photoresist of the pixel definition layer to obtain grooves corresponding to the pixel openings.

Specifically, the Bank imprinting mold includes an outer mold and an inner mold, the outer mold is sleeved outside the inner mold, and the center of the outer mold coincides with the center of the inner mold.

The outer mold includes a rigid drum and at least two mold teeth, the mold teeth are arranged on the rigid drum at an even interval, and are arranged on the side of the rigid drum away from the inner mold. The gap between the adjacent die teeth is determined by the distance between adjacent pixels of the substrate to be imprinted, that is, the distance between the expansion distance of the adjacent die teeth and the adjacent grooves The shape and size of the die teeth correspond to the size and shape of the pixels respectively, that is, the shape and size of the die teeth correspond to the shape and size of the grooves respectively; the height of the die teeth It is 30-80 microns, that is, the distance from the surface of the die teeth facing away from the rigid cylinder to the rigid cylinder is 30-80 microns. The rigid drum is a seamless spliced nickel alloy drum, the inner diameter of the rigid drum is 20-100 cm, and the thickness of the rigid drum is 300-800 microns. The rigid roller and the die teeth are integrally arranged, and the die teeth are also made of nickel alloy.

The inner mold is a hollow elastic drum, preferably a hollow rubber drum, and the outer diameter of the elastic drum is 20-100 cm. The hollow space of the elastic roller can be inflated to make the inner mold expand and expand, so as to support and fix the outer mold.

The conveying unit includes a conveying wheel and a conveying belt, the conveying belt is sleeved on the outer periphery of the conveying wheel, the conveying belt is used for conveying the substrate, and the conveying wheel is used for driving the conveying belt. The transmission wheel includes a transmission roller and a transmission belt tensioner, the transmission roller is used for conveying the transmission belt, and the transmission belt tensioner is used for adjusting the tension of the transmission belt. In one embodiment, there is only one transmission roller, the transmission roller and the conveyor belt tensioner are respectively located at two ends of the conveyor belt, and the transmission roller is arranged at the transmission starting end of the conveyor belt, so The conveyor belt tensioning pulley is arranged at the end of the transmission of the conveyor belt. The transmission shaft of the transmission roller is a fixed transmission shaft, the transmission shaft of the conveyor belt tensioner is a movable transmission shaft, and the conveyor belt tensioner can move along the transmission plane of the conveyor belt. In another embodiment, the transmission roller includes one active transmission roller and two driven transmission rollers, the active transmission roller is provided at the transmission starting end of the conveyor belt, and the conveyor belt tensioner is provided at the At the end of the transmission of the conveyor belt, the driven transmission roller is arranged between the active transmission roller and the conveyor belt tensioner, the active transmission roller, the two driven transmission rollers, and the conveyor belt tensioner The outer diameters are equal in size, and the centers of the driving roller, the two driven rollers, and the belt tensioner are located on the same straight line. The drive shaft of the active drive roller is a fixed drive shaft, the drive shaft of the conveyor belt tensioner is a movable drive shaft, the conveyor belt tensioner can move along the conveying plane of the conveyor belt, and the driven drive roller The drive shaft can be a fixed drive shaft or a movable drive shaft.

Further, the conveying unit further includes a pressure adjusting roller, the pressure adjusting roller is located in the conveying belt, and the conveying belt is sleeved outside the pressure adjusting roller. The line between the center of the Bank imprinting die and the center of the pressure regulating roller is perpendicular to the conveyor belt, and the pressure regulating roller can move toward or away from the Bank imprinting die to adjust the The distance between the Bank imprinting die and the conveyor belt is adjusted, thereby adjusting the force of the die teeth on the belt imprinting substrate. Further, the pressure adjusting roller is located in the middle position of the conveying unit, that is, the Bank imprinting die is located just above the conveying unit.

Correspondingly, the present invention provides a method for preparing a pixel definition layer. The pixel definition layer is prepared by using the preparation device provided by any one of the embodiments of the present invention. Please refer to FIG. 2 and FIG. 3 . The preparation method includes:

In step S1, a substrate is provided, and the substrate includes electrodes located on the surface of the substrate; please refer to (a) in FIG. 3 .

Step S2, coating a layer of pixel definition layer photoresist on the substrate, and the pixel definition layer photoresist covers the electrodes; please refer to FIG. 3(b). Preferably, the material of the pixel definition layer photoresist is UV curable adhesive with poor fluidity.

Step S3 , passing the substrate through the preparation device, and imprinting the grooves corresponding to the pixel openings; please refer to (c) in FIG. 3 .

Specifically, after step S2 is completed, first, the substrate with the pixel definition layer photoresist is placed on the conveyor belt, and the pixel definition layer photoresist is located on the side of the substrate away from the conveyor belt, so Driven by the driving roller, the conveyor belt drives the substrate to transmit forward. During this process, the driven roller assists in conveying the substrate, and the tensioning wheel of the conveyor belt adjusts the speed of the conveyor belt as required. tension. Then, as the substrate is conveyed to just below the Bank imprinting die, the pressure of the Bank imprinting die on the substrate is adjusted by adjusting the pressure adjusting roller, so that the substrate and the Bank The imprinting die is in contact, and the Bank imprinting die rotates with the conveyance of the substrate, thereby driving the die teeth to imprint the photoresist of the pixel definition layer, so that the substrate is separated from the Bank imprinting The mold then forms grooves corresponding to the pixel openings. Finally, the conveyor belt drives the substrate to continue to transmit and leave the preparation device.

Step S4, curing the pixel definition layer photoresist.

Specifically, in order to ensure the accuracy of the pixel opening and prevent the shape of the groove of the pixel definition layer photoresist flow assembly from changing due to long-term placement, after step S3 is completed, the step S4 The operation of curing the photoresist of the pixel definition layer needs to be completed within 10 minutes after the groove imprinting is completed. The curing of the pixel-defining layer photoresist is specifically irradiating the pixel-defining layer photoresist with UV light, so as to cure the pixel-defining layer photoresist.

Step S5, etching and thinning the photoresist of the pixel definition layer to obtain the pixel opening, and the pixel opening exposes the electrode; please refer to (d) in FIG. 3 .

Specifically, the etching and thinning process on the pixel definition layer is to etch the entire photoresist of the pixel definition layer. Since the thickness of the photoresist of the pixel definition layer at the groove position is small, the The thickness of the photoresist of the pixel definition layer outside the groove is relatively large. By controlling the etching process parameters, the photoresist of the pixel definition layer at the bottom of the groove is etched away to form the pixel opening. The pixel-defining layer photoresist outside the groove is retained to obtain the final desired pixel-defining layer.

To sum up, the embodiments of the present invention provide a preparation device and a preparation method for a pixel definition layer. By using the preparation device provided by the embodiments of the present invention to implement the preparation method provided by the embodiments of the present invention, only by The four-step process of coating, imprinting, curing, and etching can prepare the desired pixel definition layer on the substrate. Compared with the prior art, it requires multiple manufacturing processes of coating, curing, exposure, development, and etching. The process requires the use of precise exposure equipment and a precise mask, the invention saves the cost of equipment and materials in the process of preparing the pixel definition layer, and improves the production efficiency of the pixel definition layer.

The preparation device and preparation method of the pixel definition layer provided by the embodiments of the present invention have been described in detail above. The principles and implementations of the present invention are described with specific examples in this paper. The descriptions of the above embodiments are only used to help understanding. The method of the present invention and its core idea; at the same time, for those skilled in the art, according to the idea of the present invention, there will be changes in the specific implementation and application scope. In summary, the content of this description should not be understood to limit the present invention.

Claims (10)

1. An apparatus for preparing a pixel defining layer, the pixel defining layer including a pixel opening, comprising:

the transmission unit is used for transmitting a substrate, and the substrate comprises a pixel definition layer photoresistor which is positioned on one side of the substrate, which is far away from the transmission unit;

and the imprinting mold is arranged on one side of the substrate, which is far away from the transmission unit, and is used for imprinting the pixel definition layer photoresist to obtain a groove corresponding to the pixel opening.

2. The manufacturing apparatus of claim 1, wherein the imprinting mold comprises an outer mold and an inner mold, and the outer mold is sleeved outside the inner mold.

3. A manufacturing apparatus as set forth in claim 2 wherein said outer mold comprises a rigid roller and at least two mold teeth, said mold teeth being disposed on a side of said rigid roller facing away from said inner mold, said mold teeth being for imprinting said pixel defining layer photoresist to obtain grooves corresponding to said pixel openings.

4. The manufacturing apparatus as set forth in claim 2, wherein said inner mold is a hollow elastic roller, and a hollow space of said elastic roller is inflatable.

5. The manufacturing apparatus according to claim 1, wherein the conveying unit includes a conveying wheel and a conveyor belt, the conveyor belt is sleeved on an outer circumference of the conveying wheel, and the conveying wheel is configured to drive the conveyor belt to convey the substrate.

6. The manufacturing apparatus as set forth in claim 5, wherein the conveying unit further includes a pressure-adjusting roller, the conveyor belt is sleeved outside the pressure-adjusting roller, a connecting line between a center of the imprint mold and a center of the pressure-adjusting roller is perpendicular to the conveyor belt, and the pressure-adjusting roller is movable toward or away from the imprint mold.

7. The manufacturing apparatus of claim 5, wherein said conveyor wheel includes a drive roller for conveying said conveyor belt and a belt tensioner movable along a conveying plane of said conveyor belt to adjust a tension of said conveyor belt.

8. The manufacturing apparatus as set forth in claim 7 wherein said drive rollers include a drive roller disposed at a conveyance start end of said conveyor belt and two driven rollers disposed between said drive roller and said belt tensioner, said belt tensioner being disposed at a conveyance end of said conveyor belt.

9. A method for preparing a pixel definition layer, comprising:

providing a substrate comprising an electrode on a surface of the substrate;

coating a layer of pixel definition layer photoresist on the substrate, wherein the pixel definition layer photoresist covers the electrode;

the substrate is pressed through the preparation device according to any one of claims 1 to 8 to obtain a groove corresponding to a pixel opening;

curing the pixel definition layer photoresist;

and etching and thinning the pixel definition layer light resistance to obtain the pixel opening, wherein the pixel opening exposes the electrode.

10. The manufacturing method according to claim 9, wherein the curing of the pixel defining layer photoresist is completed within 10 minutes after the groove imprinting is completed.

Images