CN114690582A - Anti-collision device and photoetching equipment - Google Patents
Anti-collision device and photoetching equipment Download PDFInfo
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- CN114690582A CN114690582A CN202011632415.2A CN202011632415A CN114690582A CN 114690582 A CN114690582 A CN 114690582A CN 202011632415 A CN202011632415 A CN 202011632415A CN 114690582 A CN114690582 A CN 114690582A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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Abstract
Description
技术领域technical field
本发明涉及光刻技术领域,尤其是涉及一种防撞装置及光刻设备。The present invention relates to the technical field of lithography, in particular to an anti-collision device and a lithography apparatus.
背景技术Background technique
光刻是半导体制造过程中一道非常重要的工序,它是将一系列掩模板上的图形通过曝光依次转移到基板相应层上的工艺过程,被认为是大规模集成电路制造中的核心步骤。半导体制造中一系列复杂而耗时的光刻工艺主要由相应的光刻设备来完成。Photolithography is a very important process in the semiconductor manufacturing process. It is a process in which a series of patterns on a mask are sequentially transferred to the corresponding layers of the substrate through exposure. It is considered to be the core step in the manufacture of large-scale integrated circuits. A series of complex and time-consuming photolithography processes in semiconductor manufacturing are mainly completed by corresponding photolithography equipment.
光刻设备包含多个运动台,例如工件台、掩模台等,在具体光刻时需要调整各个运动台的位置。不可避免的,光刻设备的运动台在运行时可能发生多种情况的意外碰撞,为了保护光刻设备内尤其是粗微动运动台的各精密部件不在碰撞中被损毁,设计可靠有效的防撞装置是必不可少的。目前,通常是在工运动台上设置防撞装置以防止撞击,但在撞击发生时或者撞击发生后,撞击不能被技术人员知晓,且运动台继续运动,如此通常会发生二次甚至于多次撞击而导致电机损毁和由此导致的衍生事故,例如电机烧毁对光刻机环境洁净度的影响等。A lithography apparatus includes multiple moving stages, such as a workpiece stage, a mask stage, etc., and the positions of each moving stage need to be adjusted during specific lithography. Inevitably, the motion stage of the lithography equipment may encounter accidental collisions in various situations during operation. A crash device is essential. At present, an anti-collision device is usually installed on the working table to prevent the impact, but when the impact occurs or after the impact, the impact cannot be known by the technicians, and the sports table continues to move, so it usually occurs twice or even multiple times. The damage of the motor and the resulting accidents caused by the impact, such as the impact of motor burning on the environmental cleanliness of the lithography machine, etc.
发明内容SUMMARY OF THE INVENTION
本发明的目的在于提供一种防撞装置及光刻设备,以解决现有技术的光刻设备中工件台运动发生撞击经防撞装置缓冲后,仍会发生二次甚至多次撞击而导致工件台损坏的问题。The purpose of the present invention is to provide an anti-collision device and a lithography apparatus, so as to solve the problem that in the prior art lithography equipment, after the impact of the workpiece table movement is buffered by the anti-collision device, two or even multiple impacts will still occur, causing the workpiece The problem of damage to the table.
为解决上述技术问题,本发明提供一种防撞装置,包括:In order to solve the above-mentioned technical problems, the present invention provides an anti-collision device, comprising:
防撞组件,所述防撞组件包括液压缓冲器和缓冲组件,所述液压缓冲器包括壳体和活塞组件,所述壳体内具有第一空腔,所述活塞组件的一端伸入所述第一空腔以将所述第一空腔分割为压力腔和具有液体的液压腔,所述活塞组件的另一端与所述缓冲组件连接,用于在外力撞击所述缓冲组件时,所述缓冲组件推动所述活塞朝向所述压力腔的方向运动以挤压所述压力腔;The anti-collision assembly includes a hydraulic buffer and a buffer assembly, the hydraulic buffer includes a casing and a piston assembly, the casing has a first cavity, and one end of the piston assembly extends into the first cavity. A cavity is used to divide the first cavity into a pressure cavity and a hydraulic cavity with liquid, and the other end of the piston assembly is connected with the buffer assembly, so that when an external force hits the buffer assembly, the buffer The assembly pushes the piston toward the direction of the pressure chamber to squeeze the pressure chamber;
控制组件,所述控制组件包括安装在所述缓冲组件上的感触器和安装在所述壳体上的传感器,所述传感器和所述感触器用于在所述缓冲组件推动所述活塞朝向所述压力腔运动时相互脱离至预定距离,以发出指令。a control assembly, the control assembly includes a sensor mounted on the buffer assembly and a sensor mounted on the housing, the sensor and the sensor are used to push the piston toward the buffer assembly When the pressure chambers move, they are separated from each other to a predetermined distance to issue commands.
可选的,所述控制组件还包括第一固定杆和横杆,所述第一固定杆固定在所述缓冲组件上,所述横杆一端固定在所述第一固定杆上,另一端朝向所述壳体方向延伸并固定有所述感触器。Optionally, the control assembly further includes a first fixing rod and a transverse rod, the first fixing rod is fixed on the buffer assembly, one end of the transverse rod is fixed on the first fixing rod, and the other end faces the first fixing rod. The housing direction extends and is fixed with the sensor.
可选的,所述控制组件还包括第二固定杆,所述第二固定杆一端固定在所述壳体上,所述第二固定杆另一端固定有所述传感器。Optionally, the control assembly further includes a second fixing rod, one end of the second fixing rod is fixed on the housing, and the other end of the second fixing rod is fixed with the sensor.
可选的,所述缓冲组件包括支架和缓冲头,所述支架固定在所述活塞组件远离所述壳体的一端上,所述支架上安装有所述感触器,所述缓冲头安装在所述支架远离所述壳体的一侧上。Optionally, the buffer assembly includes a bracket and a buffer head, the bracket is fixed on one end of the piston assembly away from the housing, the bracket is mounted with the sensor, and the buffer head is installed on the The bracket is on a side away from the housing.
可选的,所述支架具有安装槽,所述缓冲头安装在所述安装槽内并凸出所述支架,所述缓冲头凸出所述支架的部分用于被外力撞击。Optionally, the bracket has an installation groove, the buffer head is installed in the installation groove and protrudes from the bracket, and the part of the buffer head protruding from the bracket is used for being hit by an external force.
可选的,所述缓冲组件还包括连接销,所述连接销贯穿所述安装槽和所述缓冲头以将所述缓冲头安装在所述安装槽内。Optionally, the buffer assembly further includes a connecting pin, and the connecting pin penetrates the installation groove and the buffer head to install the buffer head in the installation groove.
可选的,所述缓冲组件还包括扣环,所述扣环套设在所述连接销凸出所述支架的部分上,并与所述支架抵接。Optionally, the buffer assembly further includes a retaining ring, the retaining ring is sleeved on the part of the connecting pin protruding from the bracket, and abuts with the bracket.
可选的,所述缓冲头具有第二空腔,所述缓冲头的内壁上设有至少一个环绕所述第二空腔的增强环,所述增强环用以增强所述缓冲头的抗力性。Optionally, the buffer head has a second cavity, the inner wall of the buffer head is provided with at least one reinforcement ring surrounding the second cavity, and the reinforcement ring is used to enhance the resistance of the buffer head .
可选的,所述增强环间断设置。Optionally, the enhancement ring is set intermittently.
可选的,所述增强环为多个,多个所述增强环间隔设置,且相邻所述增强环之间的间隔距离相等。Optionally, there are multiple reinforcement rings, the multiple reinforcement rings are arranged at intervals, and the spacing distances between adjacent reinforcement rings are equal.
可选的,所述支架包括相互连接的第一支架和第二支架,所述第一支架上安装有所述感触器,所述第二支架固定在所述活塞组件远离所述壳体的一端的上,所述缓冲头安装在所述第二支架上。Optionally, the bracket includes a first bracket and a second bracket that are connected to each other, the first bracket is mounted with the sensor, and the second bracket is fixed on an end of the piston assembly away from the housing The buffer head is mounted on the second bracket.
可选的,所述第一支架和所述第二支架间具有间隙,所述支架还包括调节件,所述调节件跨过所述间隙与所述第一支架和所述第二支架连接,用以调整所述间隙的宽度。Optionally, there is a gap between the first bracket and the second bracket, and the bracket further includes an adjustment member, and the adjustment member is connected to the first bracket and the second bracket across the gap, Used to adjust the width of the gap.
可选的,所述活塞组件包括活塞和活塞杆,所述液压缓冲器还包括位于所述第一空腔内的限位挡块,所述限位挡块至少环绕所述活塞杆设置,以对所述活塞组件进行限位;且所述活塞组件和所述限位挡块将所述第一空腔分割为液压腔和压力腔。Optionally, the piston assembly includes a piston and a piston rod, and the hydraulic buffer further includes a limit block located in the first cavity, and the limit block is disposed at least around the piston rod to The piston assembly is limited; and the piston assembly and the limiting block divide the first cavity into a hydraulic chamber and a pressure chamber.
可选的,所述限位挡块环绕所述壳体内壁设置,位于所述液压腔和所述压力腔之间的所述限位挡块上设有出液孔。Optionally, the limiting block is arranged around the inner wall of the housing, and a liquid outlet hole is provided on the limiting block located between the hydraulic chamber and the pressure chamber.
可选的,所述液压缓冲器还包括弹性件,所述弹性件设置在所述壳体和所述缓冲组件之间的所述活塞组件上;和/或,所述液压缓冲器还包括位于所述壳体内的缓冲腔,所述缓冲腔设置在所述压力腔远离所述活塞组件的一侧,所述弹性件设置在所述缓冲腔内。Optionally, the hydraulic buffer further includes an elastic member, the elastic member is disposed on the piston assembly between the housing and the buffer assembly; and/or, the hydraulic buffer further includes a A buffer cavity in the housing, the buffer cavity is arranged on the side of the pressure cavity away from the piston assembly, and the elastic member is arranged in the buffer cavity.
可选的,所述弹性件包括弹簧。Optionally, the elastic member includes a spring.
可选的,所述液压缓冲器还包括至少一个密封件,所述密封件至少设置在所述活塞组件与所述壳体交接处,以密封所述第一空腔。Optionally, the hydraulic shock absorber further includes at least one seal, which is disposed at least at the interface of the piston assembly and the housing to seal the first cavity.
为解决上述问题,本发明还提供一种光刻设备,所述光刻设备包括具有腔室的机架、位于所述腔室内的运动台以及上述任意一项所述的防撞装置,所述防装装置安装在所述运动台上或安装在所述机架的内壁上,用于缓冲所述运动台受到外力撞击。In order to solve the above problems, the present invention also provides a lithography apparatus, the lithography apparatus includes a rack having a chamber, a motion table located in the chamber, and the anti-collision device according to any one of the above, the The anti-installation device is installed on the sports table or on the inner wall of the frame, and is used for buffering the sports table from being hit by an external force.
可选的,所述防撞装置的数量为四个,四个所述防撞装置安装在所述工件台四角,或者四个所述防撞装置两两一组,两组所述防撞装置安装在所述机架相对的两个内壁上。Optionally, the number of the anti-collision devices is four, and the four anti-collision devices are installed at the four corners of the workpiece table, or the four anti-collision devices are set in two groups, and there are two groups of the anti-collision devices. Installed on two opposite inner walls of the rack.
本发明提供的一种防撞装置,防撞装置包括防撞组件和控制组件,当外力撞击防撞组件中的缓冲组件时,缓冲组件推动防撞组件中的活塞组件朝向位于防撞组件的壳体内的压力腔运动以压缩压力腔,压力腔产生一反作用力,进而对该外力进行缓冲。同时,缓冲组件推动活塞朝向压力腔运动时,安装在缓冲组件上的感触器和安装在壳体上的传感器相互脱离或相互靠近至预定距离时,控制组件发出指令。如此一来,防撞装置用于对运动台进行防撞时,不仅可以对外力撞击时产生的力进行缓冲,进而避免出现运动台继续运动带来的的二次或多次撞击而导致的运动台损坏的问题。The present invention provides an anti-collision device. The anti-collision device includes an anti-collision component and a control component. When an external force hits a buffer component in the anti-collision component, the buffer component pushes the piston component in the anti-collision component toward a shell located in the anti-collision component. The pressure chamber in the body moves to compress the pressure chamber, and the pressure chamber generates a reaction force, thereby buffering the external force. At the same time, when the buffer assembly pushes the piston to move toward the pressure chamber, the control assembly sends an instruction when the sensor mounted on the buffer assembly and the sensor mounted on the housing are separated from each other or approach each other to a predetermined distance. In this way, when the anti-collision device is used for anti-collision of the sports platform, it can not only buffer the force generated by the impact of external force, but also avoid the movement caused by the second or multiple impacts caused by the continuous movement of the sports platform. The problem of damage to the table.
附图说明Description of drawings
图1是本发明一实施例的防撞装置的结构示意图。FIG. 1 is a schematic structural diagram of an anti-collision device according to an embodiment of the present invention.
图2是本发明一实施例的防撞装置中的液压缓冲器的结构示意图。2 is a schematic structural diagram of a hydraulic shock absorber in an anti-collision device according to an embodiment of the present invention.
图3是本发明一实施例的防撞装置中的缓冲组件中的缓冲头的结构示意图。FIG. 3 is a schematic structural diagram of a buffer head in a buffer assembly in an anti-collision device according to an embodiment of the present invention.
图4是本发明一实施例的防撞装置中的缓冲组件的另一结构示意图。FIG. 4 is another schematic structural diagram of a buffer assembly in an anti-collision device according to an embodiment of the present invention.
图5是本发明一实施例的光刻设备的侧视结构示意图。FIG. 5 is a schematic structural diagram of a side view of a lithography apparatus according to an embodiment of the present invention.
图6是本发明一实施例的光刻设备的俯视结构示意图。FIG. 6 is a schematic top-view structural diagram of a lithography apparatus according to an embodiment of the present invention.
图7是本发明一实施例的光刻设备的另一侧视结构示意图。FIG. 7 is a schematic structural diagram of another side view of the lithography apparatus according to an embodiment of the present invention.
图8是本发明一实施例的光刻设备的另一俯视结构示意图。FIG. 8 is another top-view structural schematic diagram of a lithography apparatus according to an embodiment of the present invention.
附图标记reference number
1-防撞组件;1- Anti-collision components;
11-液压缓冲器;11- hydraulic buffer;
111-壳体; 112-活塞组件;111-housing; 112-piston assembly;
1121-活塞; 1122-活塞杆;1121-piston; 1122-piston rod;
113-限位挡块; 114-密封件;113-limit stop; 114-seal;
115-弹性件; 116-逆止阀;115-elastic part; 116-check valve;
117-锁紧螺母;117 - lock nut;
11A-第一空腔; 11B-缓冲腔;11A-first cavity; 11B-buffer cavity;
11A1-压力腔; 11A2-液压腔;11A1-pressure chamber; 11A2-hydraulic chamber;
11A3-出液孔;11A3- liquid outlet;
12-缓冲组件;12-buffer assembly;
121-支架;121 - bracket;
122-缓冲头; 1221-增强环;122-buffer head; 1221-enhancing ring;
123-连接销; 124-扣环;123-connecting pin; 124-retaining ring;
125-第二支架; 126-第一支架;125-second bracket; 126-first bracket;
12A-间隙; 122A-第二空腔;12A-gap; 122A-second cavity;
125A-第二螺孔; 125B-第二调整孔;125A-Second screw hole; 125B-Second adjustment hole;
126A-第一螺孔; 126B-第一调整孔;126A-first screw hole; 126B-first adjustment hole;
13-联轴器;13- coupling;
2-控制组件;2- control components;
21-感触器; 22-第二固定杆;21- touch sensor; 22- second fixing rod;
23-传感器; 24-横杆;23-sensor; 24-crossbar;
25-第一固定杆;25 - the first fixed rod;
10-防撞装置;10-anti-collision device;
20-运动台;20 - sports table;
30-机架; 30A-腔室。30-rack; 30A-chamber.
具体实施方式Detailed ways
以下结合附图和具体实施例对本发明提出的防撞装置和光刻设备作进一步详细说明。根据下面说明,本发明的优点和特征将更清楚。需说明的是,附图均采用非常简化的形式且均使用非精准的比例,仅用以方便、明晰地辅助说明本发明实施例的目的。此外,附图所展示的结构往往是实际结构的一部分。特别的,各附图需要展示的侧重点不同,有时会采用不同的比例。The anti-collision device and the lithography apparatus proposed by the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become more apparent from the following description. It should be noted that, the accompanying drawings are all in a very simplified form and in inaccurate scales, and are only used to facilitate and clearly assist the purpose of explaining the embodiments of the present invention. Furthermore, the structures shown in the drawings are often part of the actual structure. In particular, each drawing needs to show different emphases, and sometimes different scales are used.
图1是本发明一实施例的防撞装置的结构示意图。图2是本发明一实施例的防撞装置中的液压缓冲器的结构示意图。如图1和图2所示,本实施例公开的防撞装置10包括:FIG. 1 is a schematic structural diagram of an anti-collision device according to an embodiment of the present invention. 2 is a schematic structural diagram of a hydraulic shock absorber in an anti-collision device according to an embodiment of the present invention. As shown in FIG. 1 and FIG. 2 , the
防撞组件1,所述防撞组件1包括液压缓冲器11和缓冲组件12,所述液压缓冲器11包括壳体111和活塞组件112,所述壳体111内具有第一空腔11A,所述活塞组件112的一端伸入所述第一空腔11A以将所述第一空腔11A分割为压力腔11A1和具有液体的液压腔11A2,所述活塞组件112的另一端与所述缓冲组件12连接,用于在外力撞击所述缓冲组件12时,所述缓冲组件12推动所述活塞1121朝向所述压力腔11A1运动以挤压所述压力腔11A1。以及,
控制组件2,所述控制组件2包括安装在所述缓冲组件12上的感触器21和安装在所述壳体111上的传感器23,所述传感器23和所述感触器21用于在所述缓冲组件12推动所述活塞1121朝向所述压力腔11A1运动时相互脱离或相互靠近至预定距离,以发出指令。A control assembly 2, the control assembly 2 includes a
本实施例的一种防撞装置10,所述防撞装置10包括所述防撞组件1和所述控制组件2,当外力撞击所述防撞组件1中的所述缓冲组件12时,所述缓冲组件12推动所述防撞组件1中的所述活塞组件112朝向,位于所述防撞组件1的所述壳体111内的所述压力腔11A1运动以压缩所述压力腔11A1,所述压力腔11A1产生一反作用力,进而对该外力进行缓冲。同时,所述缓冲组件12推动所述活塞1121朝向所述压力腔11A1运动时,安装在所述缓冲组件12上的感触器21和安装在所述壳体111上的传感器23相互脱离或相互靠近至预定距离时,所述控制组件2发出指令。如此一来,所述防撞装置10用于对运动台进行防撞时,不仅可以对外力撞击时产生的力进行缓冲,同时可以通过所述控制组件2发出指令来控制运动台的运动,进而避免出现运动台继续运动带来的的二次或多次撞击而导致的运动台损坏的问题。An
具体的,继续参图1和图2所示,在本实施例中,所述液压缓冲器11还包括位于所述第一空腔11A内的限位挡块113,所述活塞组件112包括活塞1121和活塞杆1122,所述活塞杆1122一端与所述活塞1121固定连接,所述活塞杆1122的另一端连接所述缓冲组件12。其中,所述缓冲组件12和所述活塞杆通过联轴器13相互连接。Specifically, continuing to refer to FIGS. 1 and 2 , in this embodiment, the
进一步的,继续参图2所示,所述限位挡块113至少环绕所述活塞杆1122设置,以对所述活塞组件112进行限位。以及,所述活塞组件112和所述限位挡块113将所述第一空腔11A分割为液压腔11A2和压力腔11A1。Further, as shown in FIG. 2 , the limiting
具体的,继续参图1所示,在本实施例中,所述限位挡块113不规则,且至少环绕部分所述壳体111的内壁设置,所述限位挡块113与所述壳体111的内壁之间形成有液压腔11A2,所述液压腔11A2内具有有液体。此外,当所述限位挡块113完全环绕所述壳体111的内壁设置时,所述限位挡块113和所述活塞1121之间的空间形成所述压力腔11A1。当所述限位挡块113部分环绕所述壳体111的内壁时,所述壳体111的内壁、所述限位挡块113以及所述活塞1121之间的空间形成所述压力腔11A1。此外,在本实施例中,所述压力腔11A1和所述液压腔11A2之间的所述限位挡块113上形成有出液孔11A3,所述出液孔11A3用于位于所述液压腔11A2内的所述液体从所述液压腔11A2流入所述压力腔11A2,或者从所述压力腔11A1流入所述液压腔11A2。以及,所述压力腔11A1中具有空气。Specifically, continuing to refer to FIG. 1 , in this embodiment, the limiting
具体的,继续参图1并结合图2所示,在本实施例中,当外力撞击所述缓冲组件12时,所述缓冲组件12朝向所述压力腔11A1移动,如此以带动所述活塞杆1122朝向所述压力腔11A1移动,所述活塞杆1122带动所述活塞1121移动以挤压所述压力腔11A1。如此,所述压力腔11A1体积变小,且所述压力腔11A1的压力增大。当所述压力腔11A1的压力大于所述液压腔11A2的压力时,位于所述压力腔11A1内的液体通过所述出液孔11A3流向所述液压腔11A2。当外力撤销,未撞击所述缓冲组件12时,所述压力腔11A1较大的压力推动所述活塞组件112远离所述压力腔11A1方向运动时,所述压力腔11A1体积增大,压力减小。当所述压力腔11A1的压力小于所述液压腔11A2的压力时,位于所述液压腔11A2内的液体通过所述出液孔11A3流向所述液压腔11A2,所述压力腔11A1的体积增大进一步的推动所述活塞组件112远离所述压力腔11A1运动。直至所述活塞1121卡持在所述限位挡块113上的限位部上时,所述活塞组件112停止运动,所述放撞装置10复位。继续参图2所示,所述活塞1121此时卡持在所述限位挡块113的限位部上,所述限位部可以由所述限位挡块113环绕所述活塞杆1122的部分朝向所述压力腔11A1的部分内凹组成。Specifically, continuing to refer to FIG. 1 in conjunction with FIG. 2 , in this embodiment, when an external force hits the
进一步的,继续参图2所示,在本实施例中,所述液压缓冲器11还包括弹性件115,所述弹性件115设置在所述壳体111和所述缓冲组件12之间的所述活塞组件112上。具体的,在本实施例中,所述弹性件115为弹簧,所述弹性件115套设在所述壳体111和所述缓冲组件12之间的所述活塞杆1122上,且一端固定在所述壳体111上,另一端固定在所述联轴器13上。如此,当所述缓冲组件12受外力撞击以朝向所述压力腔11A1方向运动挤压所述压力腔11A1时,所述弹性件115被压缩,产生与所述外力方向相反的压缩力,以抵消至少部分所述外力的撞击。当外力撤销时,所述活塞组件112和所述缓冲组件12朝向远离所述压力腔11A1方向运动;此时,所述弹性件115复位,以避免所述活塞组件112和所述缓冲组件12运动过快而导致所述活塞1121对所述限位挡块113产生过大的撞击。此外,可选的,所述弹性件115还可以是弹块,例如橡胶等材料形成的弹块。Further, as shown in FIG. 2 , in this embodiment, the
进一步的,继续参图2所示,在本实施例中,所述液压缓冲器11还具有缓冲腔11B,所述缓冲腔11B位于所述壳体111内,并设置在所述压力腔11A1远离所述活塞组件112的一侧,所述弹性件115设置在所述缓冲腔11B内。在本实施例中,所述弹性件115一端与所述壳体111远离所述活塞组件112的内壁抵接或固定连接,另一端与分割所述缓冲腔11B和所述压力腔11A1之间的隔板抵接或固定连接。其中,所述隔板在沿所述活塞组件112运动方向上可移动设置。所述隔板可以由单独设置的板状结构组成,也可以由所述限位挡块113的部分结构组成。所述隔板的具体结构以及形成方式在此不做具体限定。如此,当所述缓冲组件12受外力撞击以朝向所述压力腔11A1方向运动挤压所述压力腔11A1时,所述弹性件115被压缩,产生与所述外力方向相反的压缩力,以抵消至少部分所述外力的撞击。当外力撤销时,所述活塞组件112和所述缓冲组件12朝向远离所述压力腔11A1方向运动。此时,所述弹性件115被拉伸,产生与所述活塞组件112和所述缓冲组件12运动方向相反的拉伸力,以避免所述活塞组件112和所述缓冲组件12运动过快而导致所述活塞1121对所述限位挡块113产生过大的撞击。此外,在本实施例中,所述弹性件115设置在所述壳体111和所述缓冲组件12之间的所述活塞组件112上,也可以设置在所述缓冲腔11B内,或者所述弹性件115为两个,两个所述弹性件115分别设置设置在所述壳体111和所述缓冲组件12之间的所述活塞组件112上和所述缓冲腔11B内。Further, as shown in FIG. 2 , in this embodiment, the
进一步的,继续参图2所示,本实施例的所述液压缓冲器11还包括锁紧螺母117,所述锁紧螺母117固定在所述壳体111的内壁或所述活塞杆1122上,并伸入所述弹性件115内,以调整所述弹性件115能够工作的部分的长短度,如此以使所述弹性件115能够适用于不同压力的撞击。具体的,可使位于所述缓冲腔11B内的所述弹性件115靠近所述壳体111远离所述活塞组件112的内壁的部分压缩,或者位于所述活塞组件112上的所述弹性件115靠近所述壳体111的部分被压缩;并使所述锁紧螺母117伸入所述弹性件115压缩部分与非压缩部分之间的位置,之后拧紧所述锁紧螺母117,则所述弹性件115被压缩的部分无法工作,未被压缩的部分工作。如此,以调整所述弹性件115能够工作的部分的长短度,如此以使所述弹性件115能够适用于不同压力的撞击。Further, continuing to refer to FIG. 2 , the
进一步的,继续参图2所示,在本实施例中,所述液压缓冲器11还包括至少一个密封件114,所述密封件114至少设置在所述活塞组件112与所述壳体111交接处,以密封所述第一空腔11A,防止位于所述液压腔11A2中的液体流出所述液压缓冲器11。同时,所述密封件114还可以设置在所述缓冲腔11B和所述压力腔11A1的交接处,以密封所述压力腔11A1。此外,所述密封件114可以为密封圈,也可以为密封膜。Further, continuing to refer to FIG. 2 , in this embodiment, the
此外,在本实施例中,继续参图2所示,本实施例的所述液压缓冲器11还包括逆止阀116,所述逆止阀116设置在所述缓冲腔11B和所述压力腔11A1的交接处,所述逆止阀116用于防止所述压力腔11A1内的压力过大而导致所述液压缓冲器11损伤。所述逆止阀116的结构以及工作原理为本领域公知技术,在此不做赘述。In addition, in this embodiment, continuing to refer to FIG. 2 , the
进一步的,继续参图2和并结合图1所示,在本实施例中,所述缓冲组件12包括支架121和缓冲头122,所述支架121固定在所述活塞组件112远离所述壳体111的一端上,所述缓冲头122安装在所述支架121远离所述壳体111的一侧上,所述支架121上还安装有所述感触器21。在本实施例中,所述缓冲头122用于在被外力撞击时,产生与所述外力相反的力,以首先吸收部分所述外力产生的撞击力。在本实施例中,所述缓冲头122采用高强度、高韧性、高洁净度的金属材料或非金属材料或复合材料,如沉淀硬化不锈钢、优质马氏体时效钢、铍青铜、弹簧钢或2Cr13等,或以此为基材的金属基复合材料,也可以是POM(聚甲醛塑料)、部分硅橡胶或以此为基材的非金属基材料。Further, as shown in FIG. 2 and in conjunction with FIG. 1 , in this embodiment, the
所述控制组件2还包括第一固定杆25和横杆24,所述第一固定杆25固定在所述缓冲组件12的所述支架121上,所述横杆24一端固定在所述第一固定杆25上,另一端朝向所述壳体111方向延伸并固定有所述感触器21。在本实施例中,所述感触器21固定在所述横杆24的端部上,且所述感触器21凸出于所述横杆24,并朝向远离所述壳体111的方向延伸。The control assembly 2 further includes a
以及,所述控制组件2还包括第二固定杆22,所述第二固定杆22一端固定在所述壳体111上,所述第二固定杆22另一端固定有所述传感器23。继续参图1所示,在本实施例中,所述感触器21位于所述传感器23和所述缓冲组件12之间,且当所述防撞装置10未被外力撞击时,所述感触器21和所述传感器23贴合。其中,所述感触器21例如可以为金属片等。所述传感器23可以为距离传感器,所述传感器23能够测量所述感触器21与其自身之间的距离。当所述缓冲组件12被撞击时,所述缓冲组件12朝向所述压力腔11A1方向移动,以带动固定在所述横杆24端部的所述感触器21朝向所述压力腔11A1方向运动,如此使得所述感触器21和所述传感器23相互脱离,当所述感触器21和所述传感器23相互脱离至预定距离时,发出指令。此外,在可选实施例中,所述传感器23位于所述感触器21和所述缓冲组件12之间,且当所述防撞装置10未被外力撞击时,所述传感器23和所述感触器21之间具有一定距离。当所述缓冲组件12被撞击时,所述缓冲组件12朝向所述压力腔11A1方向移动,以带动固定在所述横杆24端部的所述感触器21朝向所述压力腔11A1方向运动,如此使得所述感触器21和所述传感器23相互靠近,当所述感触器21和所述传感器23相互靠近至预定距离时,发出指令。In addition, the control assembly 2 further includes a
在本实施例中,所述指令例如为报警指令,即报警以对工作人员警示所述防撞装置10在使用过程中被撞击。或者,所述指令还可以为对停止指令,即,当所述防撞装置10用于防撞时,该停止指令用于控制所述防撞装置10用于防止撞击的所述载体停止运动。以及,所述指令还可以为记录指令,以将所述故障信息上传给故障管理库,以便工作人员进行故障分析,以获得故障原因并改善该故障。In this embodiment, the instruction is, for example, an alarm instruction, that is, an alarm to warn the staff that the
图3是本发明一实施例的防撞装置中的缓冲组件中的缓冲头的结构示意图。继续参图3并结合图1和图2所示,在本实施例中,所述支架121具有安装槽(图未示),所述安装槽(图未示)的开口设置在所述支架121远离所述活塞组件112的一侧,所述缓冲头122安装在所述安装槽(图未示)内并凸出所述支架121,所述缓冲头122凸出所述支架121的部分用于被外力撞击,以吸收外力撞击产生的撞击力。在本实施例中,所述支架为圆柱体。FIG. 3 is a schematic structural diagram of a buffer head in a buffer assembly in an anti-collision device according to an embodiment of the present invention. Continuing to refer to FIG. 3 in conjunction with FIG. 1 and FIG. 2 , in this embodiment, the
所述缓冲头122具有第二空腔122A,所述第二空腔122A贯穿所述缓冲头122。所述缓冲组件12还包括连接销123,所述连接销123贯穿所述支架121和所述缓冲头122的所述第二空腔122A以将所述缓冲头122安装在所述安装槽(图未示)内。其中,所述缓冲组件12还包括扣环124,所述扣环124套设在所述连接销123凸出所述支架121的部分上,并与所述支架121抵接。具体的,继续参图3所示,所述缓冲头122可以为圆环形,当所述缓冲头122被撞击时,撞击的动能转化为所述缓冲头122的旋转动能。此外,形成所述缓冲头122的材料可以为柔性材料,例如为橡胶等。当所述缓冲头122柔性设置时,其自身的可靠性增强,并能进一步的吸收部分能量,更加适用于光刻环境。The
进一步的,继续参图3所示,在本实施例中,所述缓冲头122的内壁上设有至少一个环绕所述第二空腔122A的增强环1221,所述增强环1221用以增强所述缓冲头122的抗力性。所述增强环1221所采用的材料与所述缓冲头122的材料相同,在此不做过多赘述。Further, as shown in FIG. 3, in this embodiment, at least one reinforcing
进一步的,继续参图3所示,在本实施例中,所述增强环1221间断设置,如此以增大所述增强环1221的抗力性,以提升所述缓冲头122的抗力性。Further, continuing to refer to FIG. 3 , in this embodiment, the reinforcing
进一步的,在本实施例中,所述增强环1221为多个,多个所述增强环1221间隔设置,且相邻所述增强环1221之间的间隔距离相等。如此,不仅能够增强所述缓冲头122的抗力性,同时以使所述缓冲头122各部分结构的抗力性均匀。Further, in this embodiment, there are a plurality of the reinforcing
图4是本发明一实施例的防撞装置中的缓冲组件的另一结构示意图。参图4并结合图1~图3所示,在本实施例中,所述支架121包括相互连接的第一支架126和第二支架125,所述第一支架126上安装有所述感触器21,所述第二支架125固定在所述活塞组件112远离所述壳体111的一端的上,所述缓冲头122安装在所述第二支架125上。具体的,所述第一固定杆25一端固定在所述第一支架126,另一端朝向远离所述第一支架126方向延伸。其中,所述第一支架126上设有第一螺孔126A,螺丝穿过所述第一螺孔126A以使所述第一固定杆25与所述第一支架126相互固定连接。所述横杆24一端固定在所述第一固定杆25上,另一端朝向所述壳体111方向延伸,所述横杆24另一端固定有所述感触器21。FIG. 4 is another schematic structural diagram of a buffer assembly in an anti-collision device according to an embodiment of the present invention. Referring to FIG. 4 in combination with FIGS. 1 to 3 , in this embodiment, the
所述第二支架125设有第二螺孔125A,所述第二螺孔125A的延伸方向与所述活塞组件112延伸方向相同,所述缓冲头122的所述第二空腔122A与所述第二螺孔125A对准,如此,以将螺丝伸入所述第二空腔122A并穿过所述第二螺孔125A之后拧紧在所述活塞杆1122或所述联轴器13上,所述联轴器13套设在所述活塞杆1122上。The
以及,所述第一支架126和所述第二支架125相对设置且部分连接,如此以使所述第一支架126和所述第二支架125之间具有间隙12A。可选的,所述第一支架126和所述第二支架125连接的部分固定连接,例如,一体成型,或者通过焊接以固定连接。可选的,所述第一支架126和所述第二支架125之间还可以通过螺栓可拆卸连接。当所述第一支架126和所述第二支架125之间可拆卸连接时,若所述第一支架126或所述第二支架125损坏,则更换损坏的所述第一支架126或所述第二支架125即可。And, the
进一步的,继续参图4所示,所述第一支架126上具有第一调整孔126B,所述第二支架125上具有第二调整孔125B,所述支架121还包括调节件(图未示),所述调节件(图未示)跨过所述间隙12A,并通过所述第一调整孔126B与所述第一支架126连接,以及通过所述第二调整孔125B与所述第二支架125连接,以调整所述间隙12A的宽度。Further, as shown in FIG. 4 , the
具体的,当所述调节件(图未示)与所述第一支架126和所述第二支架125连接,且所述调节件(图未示)与所述第一支架126和所述第二支架125连接点之间的距离大于,所述支架121未设置所述调节件(图未示)时所述第一调整孔126B和所述第二调整孔125B之间的距离时,所述调节件(图未示)能够增大所述间隙12A的宽度。当所述调节件(图未示)与所述第一支架126和所述第二支架125连接,且所述调节件(图未示)与所述第一支架126和所述第二支架125连接点之间的距离小于,所述支架121未设置所述调节件(图未示)时所述第一调整孔126B和所述第二调整孔125B之间的距离时,所述调节件(图未示)以减小所述间隙12A的宽度。Specifically, when the adjustment member (not shown) is connected to the
图5是本发明一实施例的光刻设备的侧视结构示意图。图6是本发明一实施例的光刻设备的俯视结构示意图。本实施例还公开了一种光刻设备,参图5和图6,并结合图1和图2所示,在本实施例中,所述光刻设备包括具有腔室30A的机架30,位于所述腔室30A内的运动台20,以及如上述所述的防撞装置10安装在所述运动台20上,以用于缓冲所述运动台20受所述外力的撞击。FIG. 5 is a schematic structural diagram of a side view of a lithography apparatus according to an embodiment of the present invention. FIG. 6 is a schematic top-view structural diagram of a lithography apparatus according to an embodiment of the present invention. This embodiment also discloses a lithography apparatus. Referring to FIG. 5 and FIG. 6 , in conjunction with FIG. 1 and FIG. 2 , in this embodiment, the lithography apparatus includes a
具体的,在本实施例中,当所述运动台20在所述腔室30A内运动时,若所述运动台20靠近所述机架30内壁且与所述机架30内壁相撞时,固定在所述运动台30上的所述防撞装置10中的所述缓冲组件20中的所述缓冲头122被所述机架30产生的外力撞击。此时,所述缓冲头122首先产生一与所述外力相反方向的力以缓冲所述外力的撞击,同时,所述缓冲头122产生变形和旋转以吸收部分能力,且在自身结构在反复被撞击后,仍能恢复原样,以保持初始设计的形态。之后,所述缓冲组件20在所述外力撞击下朝向位于所述液压缓冲器11内的所述压力腔11A1方向运动,以带动所述活塞组件112朝向所述压力腔11A1方向运动,以使所述活塞1121压缩所述压力腔11A1,所述压力腔11A1产生与所述外力方向相反的力以缓冲所述外力。在此过程中,所述弹性件115同时也产生与所述外力方向相反的力以缓冲所述外力。此外,当所述缓冲组件12被外力撞击而朝向所述压力腔11A1方向运动时,所述缓冲组件12带动固定在其上的所述感触器21运动,以使得所述感触器21与所述传感器23相互脱离。且当所述感触器21与所述传感器23相互脱离至预定距离时,所述传感器23发出指令。Specifically, in this embodiment, when the moving table 20 moves in the
其中,所述指令例如为报警指令,即可在所述光刻设备上设置报警装置,根据所述报警指1令报警以通知工作人员所述运动台20与所述机架30相撞,以便工作人员进行维修。或者,所述指令还可以为对所述运动台20发出的停止指令,可以将所述传感器23与所述运动台20的控制系统通讯连接,如此则可在所述感触器21和所述传感器23相互脱离或相互靠近至预定距离时,所述传感器23发出停止指令给所述运动台20的控制系统以控制所述运动台20停止运动。在本实施例中,所述预定距离为0,即,当所述感触器21和所述传感器23相互脱离或相互靠近时即发出停止指令以使所述运动台20停止运动。可选的,所述指令还可以为倒退指令,即当所述运动台20和所述机架30内壁碰撞时,所述运动台20朝向远离所述机架30内壁的方向运动,以远离所述机架30的内壁。可选的,所述指令还可以为记录指令,即可以将所述故障信息上传给故障管理库,以便工作人员进行故障分析,以获得故障原因并改善该故障。Wherein, the instruction is an alarm instruction, for example, an alarm device can be set on the lithography apparatus, and an alarm is issued according to the
其中,在本实施例中,所述防撞装置10为4个,所述运动台20为矩形,4个所述防撞装置10安装在所述运动台20的四角,如此当所述运动台20在所述腔室30A内运动时,能够全方位的用于缓冲所述运动台受到外力撞击。Wherein, in this embodiment, the number of the
进一步的,在本实施例中,可以通过在所述壳体111上设置安装孔(图未示),通过支架121穿过所述安装孔(图未示),以将所述防撞装置10安装在所述运动台20上。此外,在本实施例中,所述运动台20例如为掩模台,所述掩模台用于承载基板,所述基板例如可以为硅基板、晶圆或玻璃基板等。此外,所述腔室30A为真空腔。Further, in this embodiment, a mounting hole (not shown in the figure) may be provided on the
图7是本发明一实施例的光刻设备的另一侧视结构示意图。图8是本发明一实施例的光刻设备的另一俯视结构示意图。参图7和图8,并参图1和图2所示,在本实施例中,所述防撞装置10还可以安装在所述机架30的内壁上,当所述防撞装置10安装在所述机架30的内壁上时,所述运动台20的重量能减轻。具体的,参图7和图8所示,在本实施例中,所述防撞装置10的数量为四个,四个所述防撞装置10两两一组,两组所述防撞装置10安装在所述机架30相对的两个内壁上。且每组所述防撞装置10之间的距离小于与该组所述防撞装置10所对应的所述运动台20的一侧的宽度。可选的,所述防撞装置10为多个,多个所述防撞装置10间隔安装在所述机架30的所有内壁上,如此则能够全方位的保护所述运动台20不与所述机架30的内壁发生碰撞。FIG. 7 is a schematic structural diagram of another side view of the lithography apparatus according to an embodiment of the present invention. FIG. 8 is another top-view structural schematic diagram of a lithography apparatus according to an embodiment of the present invention. Referring to FIGS. 7 and 8 , and as shown in FIGS. 1 and 2 , in this embodiment, the
上述描述仅是对本发明较佳实施例的描述,并非对本发明范围的任何限定,本发明领域的普通技术人员根据上述揭示内容做的任何变更、修饰,均属于权利要求书的保护范围。The above description is only a description of the preferred embodiments of the present invention, and is not intended to limit the scope of the present invention. Any changes and modifications made by those of ordinary skill in the field of the present invention based on the above disclosure all belong to the protection scope of the claims.
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