CN114690577B - Pipeline flexible adaptation device and immersion lithography machine - Google Patents
Pipeline flexible adaptation device and immersion lithography machine Download PDFInfo
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- CN114690577B CN114690577B CN202011628770.2A CN202011628770A CN114690577B CN 114690577 B CN114690577 B CN 114690577B CN 202011628770 A CN202011628770 A CN 202011628770A CN 114690577 B CN114690577 B CN 114690577B
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- 238000000671 immersion lithography Methods 0.000 title claims abstract description 17
- 230000006978 adaptation Effects 0.000 title claims description 8
- 235000014676 Phragmites communis Nutrition 0.000 claims abstract description 82
- 239000007788 liquid Substances 0.000 claims abstract description 69
- 238000007654 immersion Methods 0.000 claims abstract description 66
- 238000002347 injection Methods 0.000 claims abstract description 66
- 239000007924 injection Substances 0.000 claims abstract description 66
- 238000000926 separation method Methods 0.000 claims abstract description 55
- 238000011084 recovery Methods 0.000 claims abstract description 33
- 238000002955 isolation Methods 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
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- 238000001259 photo etching Methods 0.000 abstract description 6
- 230000009286 beneficial effect Effects 0.000 abstract description 4
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention relates to the technical field of photoetching machines, and discloses a pipeline flexible adapting device and an immersion photoetching machine, wherein the pipeline flexible adapting device comprises: the flexible connecting device comprises a connecting reed and a vibration isolation structure, wherein one end of the connecting reed is connected to the gas-liquid separation device through the vibration isolation structure, the other end of the connecting reed is free to release, and the connecting reed is arranged along the height direction of the gas-liquid separation device; the immersed flow field pipeline comprises a recovery pipeline and an injection pipeline, two ends of the recovery pipeline are respectively communicated with the immersed head and the gas-liquid separation device, one end of the injection pipeline is communicated with the immersed head, a part of the injection pipeline, which is far away from the immersed head, is connected to the connecting reed and is arranged along the height direction of the connecting reed, and a part of the injection pipeline and the recovery pipeline, which is close to the immersed head, are arranged on the same horizontal plane. Through the structure, the pipeline flexible adapting device can reduce the influence of the pipeline on the immersion head and the gas-liquid separation device, and is beneficial to improving the precision of the immersion lithography machine.
Description
Technical Field
The invention relates to the technical field of photoetching machines, in particular to a pipeline flexible adapting device and an immersion type photoetching machine.
Background
The immersion lithography machine is a key device in the semiconductor industry, and has extremely high precision requirements and extremely complex structures. The immersion head of the immersion lithography machine is arranged between the lower surface of the bottommost lens of the objective lens and the upper surface of the chuck, and the immersion head realizes the maintenance and stabilization of an immersion liquid field through pipelines with different materials and different diameters. Wherein, part of the pipelines are connected between the immersion head and the gas-liquid separation device through the pagoda joint, and part of the pipelines are arranged along the height direction of the gas-liquid separation device.
Because of the operation requirement, the immersion head module needs to realize vertical servo motion control and horizontal positioning, at present, the immersion head module usually realizes vertical motion control through a servo motor and a gravity compensator, and carries out horizontal positioning on the immersion head through a pull rod connected horizontally. However, in the actual operation process of the immersion head module, a pipeline connected with the immersion head can generate traction force on the immersion head, so that the servo motion of the immersion head is affected, and errors are brought to the immersion head; meanwhile, the tight pipeline can also transmit the vibration of the gas-liquid separation device to the immersion head module, so that the working stability of the immersion head is affected; moreover, vibration generated by the pipeline is also transmitted to the gas-liquid separation device, and interference is generated on the substrate connected with the gas-liquid separation device, so that the accuracy of the photoetching machine is reduced.
Disclosure of Invention
An object of the present invention is to provide a pipeline flexible adapting device, which can reduce the influence of a pipeline on an immersion head and a gas-liquid separating device, and is beneficial to improving the precision of an immersion lithography machine.
To achieve the purpose, the invention adopts the following technical scheme:
A pipeline flexible adaptation device comprising: the flexible connecting device comprises a connecting reed and a vibration isolation structure, one end of the connecting reed is connected to the gas-liquid separation device through the vibration isolation structure, the other end of the connecting reed is free to release, and the connecting reed is arranged along the height direction of the gas-liquid separation device; the immersed flow field pipeline comprises a recovery pipeline and an injection pipeline, two ends of the recovery pipeline are respectively communicated with the immersed head and the gas-liquid separation device, one end of the injection pipeline is communicated with the immersed head, a part, far away from the immersed head, of the injection pipeline is connected to the connecting reed and is arranged along the height direction of the connecting reed, and a part, close to the immersed head, of the injection pipeline and the recovery pipeline is arranged on the same horizontal plane.
As a preferable scheme of the pipeline flexible adapting device, the connecting reed is provided with a protruding part, and the protruding part protrudes towards the injection pipeline and is propped against the injection pipeline.
As a preferable scheme of the flexible pipeline adapting device, the flexible connecting device further comprises a horizontal limiting block, the horizontal limiting block is connected to the gas-liquid separating device, a limiting hole is formed in the horizontal limiting block, and one end of the connecting reed, which is free to release, is arranged in the limiting hole.
As a preferable scheme of the pipeline flexible adapting device, the pipeline flexible adapting device further comprises an adjusting structure, wherein the adjusting structure comprises a horizontal adjusting gasket, the horizontal adjusting gasket is clamped between the vibration isolation structure and the gas-liquid separation device, and the horizontal adjusting gasket is used for adjusting the horizontal position of the connecting reed.
As a preferred scheme of flexible adaptation device of pipeline, the adjustment structure still includes vertical adjustment subassembly, vertical adjustment subassembly includes vertical locating piece, vertical adjustment gasket and vertical connecting block, vertical locating piece connect in on the gas-liquid separation device, vertical connecting block with connect the reed and connect, vertical adjustment gasket clamp locates vertical locating piece with between the vertical connecting block, vertical adjustment gasket is used for right connect the vertical height of reed to adjust.
As an optimal scheme of the flexible pipeline adapting device, the flexible connecting device further comprises a first protecting pipe fitting and a second protecting pipe fitting, the first protecting pipe fitting and the second protecting pipe fitting are respectively arranged on the upper part and the lower part of the connecting reed, and the injection pipeline is connected to the connecting reed through the first protecting pipe fitting and the second protecting pipe fitting.
As a preferable scheme of the pipeline flexible adapting device, the pipeline flexible adapting device further comprises a vertical protecting device and a submerged installing seat, wherein the submerged head and the vertical protecting device are both installed on the submerged installing seat, and the injection pipeline and the recovery pipeline penetrate through the vertical protecting device.
As a preferable scheme of the pipeline flexible adapting device, the vertical protecting device comprises a fixed seat and a lifting hook pipe clamp, wherein the fixed seat is arranged on the immersed installation seat, the lifting hook pipe clamp is hung on the fixed seat, and the injection pipeline and the recovery pipeline penetrate through the lifting hook pipe clamp.
As a preferable scheme of the pipeline flexible adapting device, the vibration isolation structure is a rubber block or a silica gel block.
Another object of the present invention is to provide an immersion lithography machine with a high accuracy.
To achieve the purpose, the invention adopts the following technical scheme:
The utility model provides an immersion lithography machine, includes work piece platform, base plate, plane grating and the flexible adaptation device of pipeline of arbitrary technical scheme of above-mentioned, gas-liquid separation device install in on the base plate, the work piece platform is used for the location silicon chip, the plane grating install in on the base plate, the plane grating is used for measuring the degree of freedom of work piece platform.
The invention has the beneficial effects that:
The invention provides a pipeline flexible adapting device, which comprises a flexible connecting device and an immersed flow field pipeline, wherein the flexible connecting device comprises a connecting reed and a vibration isolation structure, the connecting reed is arranged along the height direction of a gas-liquid separation device, one end of the gas-liquid separation device is connected with the gas-liquid separation device through the vibration isolation structure, the other end of the gas-liquid separation device is free to release, a recovery pipeline of the immersed flow field pipeline is communicated between an immersed head and the gas-liquid separation device and is used for recovering liquid and gas used by the immersed head, one end of an injection pipeline of the immersed flow field pipeline is communicated with the immersed head, and the part of the injection pipeline, which is far away from the immersed head, is connected with the connecting reed and is arranged along the height direction of the connecting reed, so that the injection pipeline is connected with the gas-liquid separation device through the connecting reed and the vibration isolation structure, the vibration of the gas-liquid separation device can be effectively reduced and the injection pipeline can swing along with the connecting reed, and the acting force of the injection pipeline on the immersed head is reduced; the parts of the injection pipeline and the recovery pipeline, which are close to the immersion head, are arranged on the same horizontal plane, so that the acting force of the injection pipeline and the recovery pipeline on the immersion head in the vertical direction due to self gravity or tightening can be reduced. Through the structure, the pipeline flexible adapting device can reduce the influence of the immersed flow field pipeline on the immersed head and the gas-liquid separating device, and is beneficial to improving the precision of the immersed photoetching machine.
The invention also provides an immersion lithography machine, which comprises the pipeline flexible adapting device provided by the technical scheme, so that the pipeline in the immersion lithography machine has smaller influence on the immersion head and the gas-liquid separating device and higher precision.
Drawings
FIG. 1 is a schematic view of a flexible adapting device for a pipeline according to an embodiment of the present invention;
FIG. 2 is a schematic view of a flexible adapting device for pipeline according to another embodiment of the present invention;
FIG. 3 is a schematic view of a connecting reed in a flexible adapting device for a pipeline according to an embodiment of the present invention;
FIG. 4 is a schematic view of a flexible adapting device for pipeline according to another embodiment of the present invention;
FIG. 5 is a schematic view of a vertical shield in a flexible adapting device for piping according to an embodiment of the present invention;
FIG. 6 is a schematic view of a vertical shield apparatus in a flexible adapting device for piping according to another embodiment of the present invention;
Fig. 7 is a cross-sectional view of a vertical adjustment assembly in a pipeline flexible accommodation device provided in an embodiment of the present invention.
In the figure:
1. Connecting the reed; 11. a boss; 12. a hanging lug; 2. a vibration isolation structure; 3. a gas-liquid separation device; 41. a recovery pipeline; 42. an injection line; 5. an immersion head; 51. immersing the shunt block; 6. a horizontal limiting block; 7. a gasket is horizontally adjusted; 81. a vertical positioning block; 82. a vertical adjusting gasket; 83. a vertical connecting block; 91. a first protective tube member; 92. a second protective tube member; 101. immersing the mounting seat; 102. a fixing seat; 103. a hook pipe clamp; 104. a work table; 105. a substrate; 106. a planar grating.
Detailed Description
In order to make the technical problems solved by the present invention, the technical solutions adopted and the technical effects achieved more clear, the technical solutions of the embodiments of the present invention will be described in further detail below with reference to the accompanying drawings, and it is obvious that the described embodiments are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In the description of the present invention, unless explicitly stated and limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present invention will be understood in specific cases by those of ordinary skill in the art.
In the present invention, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or simply means that the first feature is less level than the second feature.
The invention provides a pipeline flexible adapting device which is used for flexibly connecting a pipeline connected with an immersion head 5 of an immersion lithography machine to a gas-liquid separation device 3, and as shown in fig. 1 and 2, the pipeline flexible adapting device comprises a flexible connecting device and an immersion flow field pipeline, the immersion flow field pipeline comprises a recovery pipeline 41 and an injection pipeline 42 for realizing liquid injection, gas injection and gas-liquid recovery, two ends of the recovery pipeline 41 are respectively communicated with the immersion head 5 and the gas-liquid separation device 3, one end of the injection pipeline 42 is communicated with the immersion head 5 through a pagoda joint, the part of the injection pipeline 42, which is far away from the immersion head 5, is connected to the gas-liquid separation device 3 through the flexible connecting device, and the parts of the injection pipeline 42 and the recovery pipeline 41, which are close to the immersion head 5, are arranged on the same horizontal plane. The flexible adapting device can effectively reduce the vibration of the gas-liquid separation device 3 to be transmitted to the immersion head 5, reduce the influence of the vibration of the gas-liquid separation device 3 on the immersion head 5, and the injection pipeline 42 and the recovery pipeline 41 are arranged on the same horizontal plane near the immersion head 5, so that the acting force of the injection pipeline 42 and the recovery pipeline 41 on the immersion head 5 in the vertical direction due to self gravity or tightening can be reduced, the influence on the servo motion of the immersion head 5 is reduced, and the precision of the immersion lithography machine is improved. Specifically, the immersion head 5 is provided with an immersion flow distribution block 51, and the immersion head 5 is connected with an immersion flow field pipeline through the immersion flow distribution block 51, so that the immersion flow field pipeline is convenient to disassemble, assemble and replace.
In this embodiment, the flexible connection device includes the connection reed 1 and vibration isolation structure 2, the connection reed 1 is the rectangle sheet metal, the one end of connection reed 1 passes through vibration isolation structure 2 and connects on gas-liquid separation device 3, the other end free release of connection reed 1, connection reed 1 is arranged along the direction of height of gas-liquid separation device 3, the injection line 42 is kept away from the part of immersion head 5 and is connected on connection reed 1 and is arranged along the direction of height of connection reed 1, not only make the vibration that gas-liquid separation device 3 transmitted to on the immersion head 5 show and reduce, moreover, injection line 42 can follow connection reed 1 and use vibration isolation structure 2 as the centre small amplitude swing, the degree of freedom of injection line 42 has been released, the effort of injection line 42 to immersion head 5 has been reduced, be favorable to reducing the influence of immersion line to immersion head 5 and gas-liquid separation device 3, be favorable to improving the precision of immersion type flow field lithography machine. Specifically, the thickness of the connecting reed 1 is 0.2mm, and the material is 0Cr18Ni9, so that the connecting reed 1 has good corrosion resistance.
It should be noted that, during the vertical servo movement of the immersion head 5, the injection pipe 42 will move vertically along with the immersion head 5 and drive the free end of the connection reed 1 to perform a very small pendulum movement in the horizontal direction, so that in use, the degree of freedom of the injection pipe 42 and its connection piece in the horizontal direction will be released. In addition, decoupling of the connecting reed 1 and the immersed flow field lines from the immersion head 5 in the horizontal direction can also reduce the introduction of vibratory forces and associated frequencies of the gas-liquid separation apparatus 3 into the immersion head 5.
As the rigidity of the immersed flow field pipeline belongs to a nonlinear value, the horizontal rigidity of the immersed flow field pipeline is 79.2N/m only according to an ideal state through simulation calculation. When the flexible connecting device is placed vertically, the horizontal rigidity of the flexible connecting device is far smaller than that of the immersed flow field pipeline, and the horizontal rigidity value of the flexible connecting device is 3.79N/m.
Preferably, the flexible connection means further includes a first pipe protection member 91 and a second pipe protection member 92, the first pipe protection member 91 and the second pipe protection member 92 being respectively installed at the upper portion and the lower portion of the connection reed 1, and the injection line 42 being connected to the connection reed 1 through the first pipe protection member 91 and the second pipe protection member 92, not only enables the injection line 42 to be firmly installed on the connection reed 1 (restrains the injection line 42 to a designated position), but also ensures that the injection line 42 is arranged in the height direction of the connection reed 1.
Specifically, the vibration isolation structure 2 is a rubber block or a silica gel block, has high elasticity, and can effectively isolate vibration transmission between the gas-liquid separation device 3 and the connecting reed 1. The existing test data show that the gas-liquid separation device 3 has a vibration force of about 0.35N in the vertical direction, and the vibration of the injection pipeline 42 in the state of no vibration isolation can influence the immersion head 5 to a certain extent, the vibration force of the gas-liquid separation device 3 and further the vibration of other parts of the immersion lithography machine. It will be appreciated that the vibration isolation structure 2 may also be a spring, as long as the vibration isolation structure 2 is capable of satisfying the vibration transmission between the isolation gas-liquid separation device 3 and the connection reed 1, and ensuring that the free release end of the connection reed 1 can swing.
In this embodiment, the connection reed 1 is located between the injection pipeline 42 and the gas-liquid separation device 3, as shown in fig. 3 and 4, the connection reed 1 is provided with the protruding portion 11, the protruding portion 11 protrudes toward the injection pipeline 42, and the protruding portion 11 is propped against the injection pipeline 42, so that the protruding portion 11 can be in close contact with the injection pipeline 42 in the use process, thereby bearing a certain pipeline pulling force, storing a certain energy, reducing the influence of the pipeline pulling force on the servo motion of the immersion head 5, and further improving the precision of the immersion lithography machine.
Preferably, the flexible connection device further comprises a horizontal limiting block 6, the horizontal limiting block 6 is connected to the lower portion of the gas-liquid separation device 3, a limiting hole is formed in the horizontal limiting block 6, one end of the connecting reed 1, which is free to release, is arranged in the limiting hole, the horizontal limiting block 6 can limit the horizontal position of the connecting reed 1, and the connecting reed 1 and the injection pipeline 42 connected to the connecting reed 1 are prevented from collision with other structures.
In this embodiment, the pipeline flexible adapting device further includes a vertical protecting device and an immersion mounting seat 101, where the immersion head 5 and the vertical protecting device are both installed on the immersion mounting seat 101, the immersion mounting seat 101 is installed on the substrate 105, and the injection pipeline 42 and the recovery pipeline 41 pass through the vertical protecting device, and the vertical protecting device can prevent the phenomenon that the gas-liquid level of the immersed flow field pipeline horizontally arranged sags and contacts with other components due to gravity.
Specifically, as shown in fig. 5 and 6, the vertical protection device includes a fixing seat 102 and a hook pipe clamp 103, the fixing seat 102 is connected to the immersion mounting seat 101 by a screw, the hook pipe clamp 103 is suspended on the fixing seat 102, the injection pipeline 42 and the recovery pipeline 41 are arranged in the hook pipe clamp 103 in a penetrating manner, the hook pipe clamp 103 can support the injection pipeline 42 and the recovery pipeline 41, and the injection pipeline 42 and the recovery pipeline 41 can be prevented from being excessively suspended to be contacted with other components. Preferably, both the anchor block 102 and the hook clamp 103 are made of non-metallic materials, which can reduce scraping of the injection line 42 and the recovery line 41.
Preferably, the flexible adapting device of the pipeline further comprises an adjusting structure, the adjusting structure comprises a horizontal adjusting gasket 7, the horizontal adjusting gasket 7 is clamped between the vibration isolation structure 2 and the gas-liquid separation device 3, and the horizontal position of the connecting reed 1 can be adjusted by replacing the horizontal adjusting gaskets 7 with different thicknesses. Specifically, the horizontal adjustment gasket 7 is fastened to the gas-liquid separator by screws, so that the horizontal adjustment gasket 7 is convenient to replace. It should be noted that, one end of the vibration isolation structure 2 is connected to the gas-liquid separation device 3, the other end is propped against the connection reed 1, and the vibration isolation structure 2 is propped against the connection reed 1, so that the connection reed 1 can vertically move, and the subsequent vertical adjustment of the connection reed 1 is facilitated. More preferably, the material of the leveling pad 7 is stainless steel 0Cr18Ni9, so that the leveling pad 7 has good corrosion resistance. Optionally, the material of the leveling pad 7 may also be iso-electric nitrile rubber, so that the leveling pad 7 has a certain shock absorbing capability, and a person skilled in the art may select a specific material of the leveling pad 7 according to the actual situation.
In this embodiment, as shown in fig. 7, the adjusting structure further includes a vertical adjusting component, where the vertical adjusting component includes a vertical positioning block 81, a vertical adjusting gasket 82 and a vertical connecting block 83, the vertical connecting block 83 is connected with the connecting reed 1, the vertical adjusting gasket 82 is sandwiched between the vertical positioning block 81 and the vertical connecting block 83, the vertical positioning block 81 is connected to the gas-liquid separation device 3, and the vertical positioning block 81 is used to bear the weight of the connecting reed 1 and the injection pipeline 42 thereon, and perform vertical positioning on the connecting reed 1. The vertical adjustment assembly can adjust the vertical height of the connecting reed 1 by changing the vertical adjustment shims 82 with different thicknesses or changing the number of the vertical adjustment shims 82.
Specifically, the vertical positioning block 81 is connected to the gas-liquid separation device 3 by welding, so that the connection of the vertical positioning block 81 is firm. Preferably, the vertical connecting block 83 and the vertical adjusting gasket 82 are sequentially fastened and connected to the vertical positioning block 81 through screws, so that the vertical adjusting gasket 82 is convenient to assemble, disassemble and replace. Further, the connecting reed 1 is provided with the hanging lug 12, and the hanging lug 12 is connected to the vertical connecting block 83 in a hanging manner, so that one free end of the connecting reed 1 can swing conveniently, and more degrees of freedom can be provided for the connecting reed 1.
The invention also provides an immersion lithography machine, which comprises a workpiece table 104, a substrate 105, a plane grating 106 and the pipeline flexible adapting device provided by the technical scheme, wherein an immersion mounting seat 101 in the pipeline flexible adapting device is arranged on the substrate 105, and a gas-liquid separation device 3 is arranged on the substrate 105 through a vibration damper, so that the outward transmission of the vibration force of the gas-liquid separation device 3 can be reduced; the workpiece stage 104 is used for positioning the silicon wafer and is used for meeting the positioning requirement on the silicon wafer when the measurement flow and the exposure flow of the immersion lithography machine are processed in parallel; a planar grating 106 is mounted on the substrate 105, the planar grating 106 being used to measure the degrees of freedom of the workpiece stage 104.
The process of installing the flexible pipe fitting device provided by the invention is further described below.
One end of the recovery pipeline 41 is connected with the gas-liquid separation device 3, and the other end is connected with the immersion head 5 through a pagoda joint, and the horizontal smoothness of the recovery pipeline 41 is ensured. The injection pipe 42 is constrained to the connecting reed 1 of the flexible connecting device through the first protecting pipe 91 and the second protecting pipe 92, the flexible connecting device and the horizontal adjusting gasket 7 are connected to the gas-liquid separating device 3, the gas-liquid separating device is screwed down by a screw, and the lower end (free release end) of the connecting reed 1 is smoothly arranged inside the horizontal limiting block 6. The injection line 42 is connected to the immersion diverter block 51 at an end near the immersion head 5.
When placed vertically, the height difference between the injection pipeline 42 and the recovery pipeline 41 is not more than 0.5mm; and measuring the height difference between the injection line 42 and the recovery line 41 and the bottom surface of the split block at this time; the dimensional deviation of the lowest surface of the immersed split flow block 51 from the lowest surface of the gas-liquid separation device 3 is not more than 0.5mm.
The vertical adjusting assembly is fixed below the horizontal adjusting gasket 7, the vertical height of the vertical connecting block 83 is changed by increasing or decreasing the number of the vertical adjusting gaskets 82, the injection pipeline 42 and the recovery pipeline 41 are adjusted to be horizontal and level, and the vertical adjusting gaskets 82 and the vertical connecting block 83 are fixed by screws.
If the lower end of the connecting reed 1 is found to be obviously deflected vertically, the horizontal adjusting gasket 7 needs to be adjusted, so that the vertical smoothness of the injection pipeline 42 is ensured, the lower end of the connecting reed 1 is not obviously deflected, and the distance between the lower end of the connecting reed 1 and the horizontal limiting block 6 is kept to be more than 0.5 mm. At this time, the pipeline flexible adapting device, the immersed flow field pipeline and the gas-liquid separating device 3 are integrated.
After the pipeline flexible adapting device is installed, the planar grating 106, the immersion head 5 and the immersion mounting seat 101 are connected to the substrate 105, and then the fixing seat 102 is installed on the immersion mounting seat 101; the gas-liquid separation device 3 is positioned using the positioning pins, and the gas-liquid separation device 3 is fixed to the substrate 105 using screws.
It is to be understood that the above examples of the present invention are provided for clarity of illustration only and are not limiting of the embodiments of the present invention. Various obvious changes, rearrangements and substitutions can be made by those skilled in the art without departing from the scope of the invention. It is not necessary here nor is it exhaustive of all embodiments. Any modification, equivalent replacement, improvement, etc. which come within the spirit and principles of the invention are desired to be protected by the following claims.
Claims (10)
1. A pipeline flexible adaptation device, comprising:
The flexible connecting device comprises a connecting reed (1) and a vibration isolation structure (2), one end of the connecting reed (1) is connected to the gas-liquid separation device (3) through the vibration isolation structure (2), the other end of the connecting reed (1) is free to release, and the connecting reed (1) is arranged along the height direction of the gas-liquid separation device (3);
The immersion flow field pipeline, the immersion flow field pipeline includes recovery pipeline (41) and injection pipeline (42), the both ends of recovery pipeline (41) communicate respectively in submergence head (5) with gas-liquid separation device (3), the one end of injection pipeline (42) communicates in submergence head (5), injection pipeline (42) keep away from submergence head (5) the part connect in on connecting reed (1) and follow the direction of height of connecting reed (1) is arranged, injection pipeline (42) with recovery pipeline (41) are close to submergence head (5) the part is arranged on same horizontal plane.
2. The pipeline flexible adapting device according to claim 1, characterized in that a protruding part (11) is arranged on the connecting reed (1), and the protruding part (11) protrudes towards the injection pipeline (42) and is abutted against the injection pipeline (42).
3. The flexible pipeline adapting device according to claim 1, wherein the flexible connecting device further comprises a horizontal limiting block (6), the horizontal limiting block (6) is connected to the gas-liquid separation device (3), a limiting hole is formed in the horizontal limiting block (6), and one end of the connecting reed (1) which is free to release is placed in the limiting hole.
4. The pipeline flexible adapting device according to claim 1, further comprising an adjusting structure, wherein the adjusting structure comprises a horizontal adjusting gasket (7), the horizontal adjusting gasket (7) is clamped between the vibration isolation structure (2) and the gas-liquid separation device (3), and the horizontal adjusting gasket (7) is used for adjusting the horizontal position of the connecting reed (1).
5. The flexible adapting device for pipeline according to claim 4, wherein the adjusting structure further comprises a vertical adjusting component, the vertical adjusting component comprises a vertical positioning block (81), a vertical adjusting gasket (82) and a vertical connecting block (83), the vertical positioning block (81) is connected to the gas-liquid separating device (3), the vertical connecting block (83) is connected with the connecting reed (1), the vertical adjusting gasket (82) is clamped between the vertical positioning block (81) and the vertical connecting block (83), and the vertical adjusting gasket (82) is used for adjusting the vertical height of the connecting reed (1).
6. The flexible adapting device according to claim 1, characterized in that the flexible connection device further comprises a first protecting pipe (91) and a second protecting pipe (92), the first protecting pipe (91) and the second protecting pipe (92) are respectively installed at the upper part and the lower part of the connecting reed (1), and the injection pipeline (42) is connected to the connecting reed (1) through the first protecting pipe (91) and the second protecting pipe (92).
7. The pipeline flexible adaptation device according to claim 1, further comprising a vertical protection device and a submerged mount (101), the submerged head (5) and the vertical protection device being mounted on the submerged mount (101), the injection pipeline (42) and the recovery pipeline (41) passing through the vertical protection device.
8. The pipeline flexible adapting device according to claim 7, characterized in that the vertical protection device comprises a fixed seat (102) and a hook clamp (103), the fixed seat (102) being mounted on the submerged mount (101), the hook clamp (103) being suspended from the fixed seat (102), the injection pipeline (42) and the recovery pipeline (41) passing through the hook clamp (103).
9. Pipeline flexible adaptation device according to claim 1, characterized in that the vibration isolation structure (2) is a rubber block or a silicone block.
10. An immersion lithography machine, comprising a workpiece table (104), a substrate (105), a planar grating (106) and a pipeline flexible adapting device according to any one of claims 1-9, wherein the gas-liquid separation device (3) is mounted on the substrate (105), the workpiece table (104) is used for positioning a silicon wafer, the planar grating (106) is mounted on the substrate (105), and the planar grating (106) is used for measuring the degree of freedom of the workpiece table (104).
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| Application Number | Priority Date | Filing Date | Title |
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| CN202011628770.2A CN114690577B (en) | 2020-12-31 | 2020-12-31 | Pipeline flexible adaptation device and immersion lithography machine |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011628770.2A CN114690577B (en) | 2020-12-31 | 2020-12-31 | Pipeline flexible adaptation device and immersion lithography machine |
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| CN114690577A CN114690577A (en) | 2022-07-01 |
| CN114690577B true CN114690577B (en) | 2024-10-25 |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09236153A (en) * | 1996-02-29 | 1997-09-09 | Canon Inc | Pneumatic active mount device |
| CN111830796A (en) * | 2020-07-15 | 2020-10-27 | 浙江启尔机电技术有限公司 | Immersion liquid supply and recovery device with novel pumping and drainage assembly and immersion liquid pumping and drainage method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010112265A (en) * | 1999-02-12 | 2001-12-20 | 시마무라 테루오 | Exposure method and apparatus |
| TWI518744B (en) * | 2004-03-25 | 2016-01-21 | 尼康股份有限公司 | Exposure apparatus, exposure method, and component manufacturing method |
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2020
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09236153A (en) * | 1996-02-29 | 1997-09-09 | Canon Inc | Pneumatic active mount device |
| CN111830796A (en) * | 2020-07-15 | 2020-10-27 | 浙江启尔机电技术有限公司 | Immersion liquid supply and recovery device with novel pumping and drainage assembly and immersion liquid pumping and drainage method |
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