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CN114686354A - A solid-state nanopore gene pool and solid-state nanopore gene sequencing device - Google Patents

A solid-state nanopore gene pool and solid-state nanopore gene sequencing device Download PDF

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CN114686354A
CN114686354A CN202011642595.2A CN202011642595A CN114686354A CN 114686354 A CN114686354 A CN 114686354A CN 202011642595 A CN202011642595 A CN 202011642595A CN 114686354 A CN114686354 A CN 114686354A
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凌新生
曹铭
胡岚
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Suzhou Luodao Nanotechnology Co ltd
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Abstract

本发明公开了一种固态纳米孔基因池,包括上液池、下液池、基因附着玻片及纳米孔芯片;所述纳米孔芯片设置于所述上液池底部,所述上液池的下方通孔与所述纳米孔芯片的纳米孔对应设置;所述基因附着玻片位于所述下液池中心上表面,与所述纳米孔芯片对应设置;所述基因附着玻片的上表面包括柱状高台;所述柱状高台用于固定待检测基因。本发明在面对所述基因附着玻片与所述纳米孔芯片的面面角时,可有效缩短所述待检测基因到所述纳米孔的距离,使所述待检测基因更容易被纳米孔附近的电场捕获,提高检测效率,同时显著增加检测中的基因有效长度。本发明同时还提供了一种具有上述有益效果的固态纳米孔基因测序设备。

Figure 202011642595

The invention discloses a solid-state nanopore gene pool, comprising an upper solution pool, a lower solution pool, a gene-attached glass slide and a nanopore chip; the nanopore chip is arranged at the bottom of the upper solution pool, and the upper solution pool has a The lower through-hole is arranged corresponding to the nano-hole of the nano-pore chip; the gene-attached glass slide is located on the upper surface of the center of the lower liquid pool, and is arranged corresponding to the nano-pore chip; the upper surface of the gene-attached glass slide includes A columnar high platform; the columnar high platform is used to fix the gene to be detected. The present invention can effectively shorten the distance between the gene to be detected and the nanopore when facing the face angle of the gene attachment glass slide and the nanopore chip, so that the gene to be detected is easier to be detected by the nanopore Nearby electric field trapping improves detection efficiency while significantly increasing the effective length of genes in the assay. The present invention also provides a solid-state nanopore gene sequencing device with the above beneficial effects.

Figure 202011642595

Description

一种固态纳米孔基因池及固态纳米孔基因测序设备A solid-state nanopore gene pool and solid-state nanopore gene sequencing device

技术领域technical field

本发明涉及基因测序领域,特别是涉及一种固态纳米孔基因池及固态纳米孔基因测序设备。The invention relates to the field of gene sequencing, in particular to a solid-state nanopore gene pool and a solid-state nanopore gene sequencing device.

背景技术Background technique

基因测序技术作为人类探索生命秘密的重要手段之一,对生物、生命科学、医学等领域的技术发展起到了巨大的推动作用。而固态纳米孔测序技术作为新兴的第四代基因测序技术,具有低成本、高读长、易集成等优势。目前的固态纳米孔基因测序技术,是通过在固态氮化硅薄膜芯片上制作出纳米级孔径,使DNA链条穿过固态纳米孔以获得DNA碱基序列。As one of the important means for human beings to explore the secrets of life, gene sequencing technology has played a huge role in promoting the technological development in biology, life sciences, medicine and other fields. As an emerging fourth-generation gene sequencing technology, solid-state nanopore sequencing technology has the advantages of low cost, high read length, and easy integration. The current solid-state nanopore gene sequencing technology is to create a nano-scale pore size on a solid-state silicon nitride thin film chip, and make DNA chains pass through the solid-state nanopore to obtain DNA base sequences.

但目前的固态纳米孔测序技术也面临很多问题,如在基因测序过程中,首先将DNA种植在基因附着玻片上(以下简称玻片),在检测的过程中,由于玻片与纳米孔芯片(下简称芯片)的相对不平行,实际存在面面角,这样玻片面上到芯片存在最短距离,这个最短距离会随着玻片和芯片的大小和面面角的大小发生变化,换句话说,由于存在面面夹角,导致硅片一端先与玻片接触,但此时基因的生长点附近可能还未与芯片接触,而这就导致了DNA无法有效到达纳米孔附近的电场捕获半径内,导致检测效率低下,DNA有效检测长度短的问题。However, the current solid-state nanopore sequencing technology also faces many problems. For example, in the process of gene sequencing, the DNA is first planted on the gene-attached glass slide (hereinafter referred to as the glass slide). During the detection process, due to the glass slide and the nanopore chip ( (hereinafter referred to as the chip) is relatively non-parallel, and there is actually a face angle, so that there is a shortest distance from the glass surface to the chip, and this shortest distance will change with the size of the glass and chip and the size of the face angle, in other words, Due to the surface angle, one end of the silicon wafer is in contact with the glass slide first, but at this time, the gene growth point may not be in contact with the chip, which makes the DNA unable to effectively reach the electric field capture radius near the nanopore. This leads to low detection efficiency and short DNA effective detection length.

综上所述,如何避免面面角引起的待检测基因与纳米孔芯片难以有效接触,进而导致检测效率低下、基因有效检测长度过短的问题,是本领域技术人员亟待解决的问题。To sum up, how to avoid the difficulty of effective contact between the gene to be detected and the nanopore chip caused by the face angle, resulting in low detection efficiency and too short effective detection length of the gene, is an urgent problem to be solved by those skilled in the art.

发明内容SUMMARY OF THE INVENTION

本发明的目的是提供一种固态纳米孔基因池及固态纳米孔基因测序设备,以解决现有技术中面面角引起的待检测基因与纳米孔芯片难以有效接触,进而导致检测效率低下、基因有效检测长度过短的问题。The purpose of the present invention is to provide a solid-state nanopore gene pool and a solid-state nanopore gene sequencing device, so as to solve the problem that the gene to be detected is difficult to contact effectively with the nanopore chip caused by the face angle in the prior art, which in turn leads to low detection efficiency and gene sequencing. Effectively detect problems with too short lengths.

为解决上述技术问题,本发明提供一种固态纳米孔基因池,包括上液池、下液池、基因附着玻片及纳米孔芯片;In order to solve the above technical problems, the present invention provides a solid-state nanopore gene pool, including an upper liquid pool, a lower liquid pool, a gene-attached glass slide and a nanopore chip;

所述纳米孔芯片设置于所述上液池底部,所述上液池的下方通孔与所述纳米孔芯片的纳米孔对应设置;The nanopore chip is arranged at the bottom of the upper liquid pool, and the lower through holes of the upper liquid pool are correspondingly arranged with the nanopores of the nanopore chip;

所述基因附着玻片位于所述下液池中心上表面,与所述纳米孔芯片对应设置;The gene-attached glass slide is located on the upper surface of the center of the lower liquid pool, and is arranged corresponding to the nanopore chip;

所述基因附着玻片的上表面包括柱状高台;所述柱状高台用于固定待检测基因。The upper surface of the gene-attached glass slide includes a column-shaped high platform; the column-shaped high platform is used to fix the gene to be detected.

可选地,在所述的固态纳米孔基因池中,所述固态纳米孔基因池还包括补正高台;Optionally, in the solid-state nanopore gene pool, the solid-state nanopore gene pool further includes a correction plateau;

所述补正高台设置于所述柱状高台周围,且所述补正高台高于所述柱状高台;The correction high platform is arranged around the columnar high platform, and the correction high platform is higher than the columnar high platform;

所述补正高台的高度与所述补正高台到所述基因附着玻片的边缘的最短距离的比值不低于接触阈值。The ratio of the height of the correction plateau to the shortest distance from the correction plateau to the edge of the gene-attached glass slide is not lower than the contact threshold.

可选地,在所述的固态纳米孔基因池中,所述补正高台为环形高台;Optionally, in the solid-state nanopore gene pool, the correction plateau is an annular plateau;

所述柱状高台位于所述环形高台内部。The columnar platform is located inside the annular platform.

可选地,在所述的固态纳米孔基因池中,所述环形高台包括电解液交换口。Optionally, in the solid-state nanopore gene pool, the annular high platform includes an electrolyte exchange port.

可选地,在所述的固态纳米孔基因池中,所述补正高台与所述柱状高台的高度差的范围为2微米至10微米,包括端点值。Optionally, in the solid-state nanopore gene pool, the height difference between the correction plateau and the columnar plateau ranges from 2 microns to 10 microns, inclusive.

可选地,在所述的固态纳米孔基因池中,所述基因附着玻片的尺寸的范围为1毫米至10毫米。Optionally, in the solid-state nanopore gene pool, the size of the gene-attached glass slide ranges from 1 mm to 10 mm.

可选地,在所述的固态纳米孔基因池中,所述补正高台的高度度范围为20微米至500微米,包括端点值。Optionally, in the solid-state nanopore gene pool, the height of the correction plateau ranges from 20 microns to 500 microns, inclusive.

可选地,在所述的固态纳米孔基因池中,所述基因附着玻片为硅基玻片。Optionally, in the solid-state nanopore gene pool, the gene-attached glass slide is a silicon-based glass slide.

可选地,在所述的固态纳米孔基因池中,所述柱状高台为圆柱高台。Optionally, in the solid-state nanopore gene pool, the columnar platform is a cylindrical platform.

一种固态纳米孔基因测序设备,所述固态纳米孔基因测序设备包括如上述任一种所述的固态纳米孔基因池。A solid-state nanopore gene sequencing device, the solid-state nanopore gene sequencing device comprising the solid-state nanopore gene pool according to any one of the above.

本发明所提供的固态纳米孔基因池,包括上液池、下液池、基因附着玻片及纳米孔芯片;所述纳米孔芯片设置于所述上液池底部,所述上液池的下方通孔与所述纳米孔芯片的纳米孔对应设置;所述基因附着玻片位于所述下液池中心上表面,与所述纳米孔芯片对应设置;所述基因附着玻片的上表面包括柱状高台;所述柱状高台用于固定待检测基因。The solid-state nanopore gene pool provided by the present invention includes an upper solution pool, a lower solution pool, a gene-attached glass slide and a nanopore chip; the nanopore chip is arranged at the bottom of the upper solution pool, below the upper solution pool The through-holes are arranged corresponding to the nano-holes of the nano-pore chip; the gene-attached glass slide is located on the upper surface of the center of the lower liquid pool, and is arranged corresponding to the nano-pore chip; the upper surface of the gene-attached glass slide comprises a columnar High platform; the columnar high platform is used to fix the gene to be detected.

本发明通过在所述基因附着玻片上设置所述柱状高台,使所述待检测基因的附着位置高于所述基因附着玻片的平面,在面对所述基因附着玻片与所述纳米孔芯片的面面角时,可有效缩短所述待检测基因到所述纳米孔的距离,使所述待检测基因更容易被纳米孔附近的电场捕获,提高检测效率,同时显著增加检测中的基因有效长度。本发明同时还提供了一种具有上述有益效果的固态纳米孔基因测序设备。In the present invention, the columnar high platform is arranged on the gene attachment glass slide, so that the attachment position of the gene to be detected is higher than the plane of the gene attachment glass slide, and when facing the gene attachment glass slide and the nanopore When the face-to-face angle of the chip is used, the distance from the gene to be detected to the nanopore can be effectively shortened, so that the gene to be detected is more easily captured by the electric field near the nanopore, the detection efficiency is improved, and the number of genes under detection is significantly increased. Effective length. The present invention also provides a solid-state nanopore gene sequencing device with the above beneficial effects.

附图说明Description of drawings

为了更清楚的说明本发明实施例或现有技术的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单的介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to illustrate the technical solutions of the embodiments of the present invention or the prior art more clearly, the following will briefly introduce the accompanying drawings used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only For some embodiments of the present invention, for those of ordinary skill in the art, other drawings can also be obtained according to these drawings without creative efforts.

图1为本发明提供的固态纳米孔基因池的一种具体实施方式的局部结构示意图;FIG. 1 is a schematic partial structure diagram of a specific embodiment of a solid-state nanopore gene pool provided by the present invention;

图2为本发明提供的固态纳米孔基因池的另一种具体实施方式的局部结构示意图;Figure 2 is a schematic partial structure diagram of another specific embodiment of the solid-state nanopore gene pool provided by the present invention;

图3为本发明提供的固态纳米孔基因池的另一种具体实施方式的局部结构俯视图;FIG. 3 is a top view of the partial structure of another specific embodiment of the solid-state nanopore gene pool provided by the present invention;

图4为本发明提供的固态纳米孔基因池的又一种具体实施方式的局部结构俯视图。FIG. 4 is a top view of the partial structure of another specific embodiment of the solid-state nanopore gene pool provided by the present invention.

具体实施方式Detailed ways

为了使本技术领域的人员更好地理解本发明方案,下面结合附图和具体实施方式对本发明作进一步的详细说明。显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。In order to make those skilled in the art better understand the solution of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. Obviously, the described embodiments are only some, but not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

本发明的核心是提供一种固态纳米孔基因池,其一种具体实施方式的结构示意图如图1所示,称其为具体实施方式一,包括上液池、下液池、基因附着玻片及纳米孔芯片;The core of the present invention is to provide a solid-state nanopore gene pool. The schematic structural diagram of a specific embodiment of the gene pool is shown in FIG. 1, which is called specific embodiment 1, including an upper liquid pool, a lower liquid pool, and a gene attachment glass slide. and nanopore chips;

所述纳米孔芯片设置于所述上液池底部,所述上液池的下方通孔与所述纳米孔芯片的纳米孔对应设置;The nanopore chip is arranged at the bottom of the upper liquid pool, and the lower through holes of the upper liquid pool are correspondingly arranged with the nanopores of the nanopore chip;

所述基因附着玻片位于所述下液池中心上表面,与所述纳米孔芯片对应设置;The gene-attached glass slide is located on the upper surface of the center of the lower liquid pool, and is arranged corresponding to the nanopore chip;

所述基因附着玻片的上表面包括柱状高台10;所述柱状高台10 用于固定待检测基因。The upper surface of the gene-attached glass slide includes a columnar high platform 10; the columnar high platform 10 is used to fix the gene to be detected.

另外,所述基因附着玻片为硅基玻片,可为硅玻片或二氧化硅玻片。In addition, the gene-attached glass slide is a silicon-based glass slide, which can be a silicon glass slide or a silica glass slide.

作为已汇总优选实施方式,所述柱状高台10为圆柱高台,圆柱高台便于生产加工,可大大提升所述固态纳米孔基因池的生产效率及生产良品率。As a summary of the preferred embodiments, the columnar platform 10 is a columnar platform, which is convenient for production and processing, and can greatly improve the production efficiency and production yield of the solid-state nanopore gene pool.

当然,为了方便所述纳米孔与所述柱状高台10对准,且保证所述柱状高台10在应对各个方向的面面角时效果一致,所述柱状高台 10优选地设置于所述基因附着玻片的中心区域。Of course, in order to facilitate the alignment of the nanopore with the columnar platform 10 and to ensure that the columnar platform 10 has the same effect when dealing with face angles in all directions, the columnar platform 10 is preferably arranged on the gene attachment glass. the central area of the slice.

需要注意的是,本发明附图中的图1至图4,均为所述固态纳米孔基因池的局部结构示意图,更具体地,均为所述基因附着玻片的结构示意图。It should be noted that, FIGS. 1 to 4 in the accompanying drawings of the present invention are schematic diagrams of the local structure of the solid-state nanopore gene pool, and more specifically, are schematic diagrams of the structure of the gene-attached glass slide.

所述基因附着玻片的上表面指靠近所述纳米孔芯片的表面。The upper surface of the gene-attached glass slide refers to the surface close to the nanopore chip.

本发明所提供的固态纳米孔基因池,包括上液池、下液池、基因附着玻片及纳米孔芯片;所述纳米孔芯片设置于所述上液池底部,所述上液池的下方通孔与所述纳米孔芯片的纳米孔对应设置;所述基因附着玻片位于所述下液池中心上表面,与所述纳米孔芯片对应设置;所述基因附着玻片的上表面包括柱状高台10;所述柱状高台10用于固定待检测基因。本发明通过在所述基因附着玻片上设置所述柱状高台10,使所述待检测基因的附着位置高于所述基因附着玻片的平面,在面对所述基因附着玻片与所述纳米孔芯片的面面角时,可有效缩短所述待检测基因到所述纳米孔的距离,使所述待检测基因更容易被纳米孔附近的电场捕获,提高检测效率,同时显著增加检测中的基因有效长度。The solid-state nanopore gene pool provided by the present invention includes an upper solution pool, a lower solution pool, a gene-attached glass slide and a nanopore chip; the nanopore chip is arranged at the bottom of the upper solution pool, below the upper solution pool The through-holes are arranged corresponding to the nano-holes of the nano-pore chip; the gene-attached glass slide is located on the upper surface of the center of the lower liquid pool, and is arranged corresponding to the nano-pore chip; the upper surface of the gene-attached glass slide comprises a columnar The high platform 10; the columnar high platform 10 is used to fix the gene to be detected. In the present invention, the columnar high platform 10 is arranged on the gene attachment glass slide, so that the attachment position of the gene to be detected is higher than the plane of the gene attachment glass slide, and when facing the gene attachment glass slide and the nanometer When the surface angle of the hole chip is high, the distance from the gene to be detected to the nanopore can be effectively shortened, so that the gene to be detected is more easily captured by the electric field near the nanopore, the detection efficiency is improved, and the detection efficiency is significantly increased. Gene effective length.

在具体实施方式一的基础上,进一步为所述基因附着玻片增设补正高台20,得到具体实施方式二,其结构示意图如图2所示,包括上液池、下液池、基因附着玻片及纳米孔芯片;On the basis of the first embodiment, a correction high platform 20 is further added for the gene attachment glass slide, and the second embodiment is obtained. and nanopore chips;

所述纳米孔芯片设置于所述上液池底部,所述上液池的下方通孔与所述纳米孔芯片的纳米孔对应设置;The nanopore chip is arranged at the bottom of the upper liquid pool, and the lower through holes of the upper liquid pool are correspondingly arranged with the nanopores of the nanopore chip;

所述基因附着玻片位于所述下液池中心上表面,与所述纳米孔芯片对应设置;The gene-attached glass slide is located on the upper surface of the center of the lower liquid pool, and is arranged corresponding to the nanopore chip;

所述基因附着玻片的上表面包括柱状高台10;所述柱状高台10 用于固定待检测基因;The upper surface of the gene attachment glass slide includes a columnar high platform 10; the columnar high platform 10 is used to fix the gene to be detected;

所述固态纳米孔基因池还包括补正高台20;The solid-state nanopore gene pool also includes a correction platform 20;

所述补正高台20设置于所述柱状高台10周围,且所述补正高台 20高于所述柱状高台10;Described correction high platform 20 is arranged around described columnar high platform 10, and described correction high platform 20 is higher than described columnar high platform 10;

所述补正高台20的高度与所述补正高台20到所述基因附着玻片的边缘的最短距离的比值不低于接触阈值;需要注意的是,所述接触阈值的作用在于保证所述纳米孔芯片先与所述补正高台20接触,所述接触阈值的可选范围为0.03至0.06,当然,可根据实际需要作调整。The ratio of the height of the correction plateau 20 to the shortest distance from the correction plateau 20 to the edge of the gene-attached glass slide is not lower than the contact threshold; it should be noted that the contact threshold is used to ensure that the nanopore The chip is firstly contacted with the correction platform 20 , and the contact threshold can be selected in the range of 0.03 to 0.06. Of course, it can be adjusted according to actual needs.

本具体实施方式中,为所述固态纳米孔基因池增设了所述补正高台20,所述补正高台20设置于所述柱状高台10周围,且比所述柱状高台10高,且限定了所述补正高台20的高度与所述补正高台20到玻片边缘的最短值之间的比值范围,其目的在于保证所述纳米孔芯片在下压的过程中,先与所述补正高台20接触,由于所述补正高台20距离生长所述待检测基因的柱状高台10的距离远小于没有所述补正高台20的情况下所述纳米孔芯片与所述基因附着芯片的接触点刀所述柱状高台10的距离,因此相比于没有所述补正高台20的情况,本具体实施方式通过增设所述补正高台20,使得在同样面面角的情况下,所述待检测基因到所述纳米孔的距离显著缩短,进一步提升检测效率及检测中的有效基因长度。In this specific embodiment, the correction plateau 20 is added to the solid-state nanopore gene pool, and the correction plateau 20 is arranged around the columnar plateau 10 and is higher than the columnar plateau 10 and defines the The ratio range between the height of the correction high platform 20 and the shortest value of the correction high platform 20 to the edge of the glass slide is to ensure that the nanopore chip is in contact with the correction high platform 20 in the process of pressing down. The distance of the columnar platform 10 that grows the described gene to be detected from the correction platform 20 is far less than the distance between the contact point knife of the nanopore chip and the gene attachment chip without the correction platform 20 and the distance of the columnar platform 10 Therefore, compared with the situation without the correction high platform 20, the specific embodiment adds the correction high platform 20, so that under the same face angle, the distance from the gene to be detected to the nanopore is significantly shortened , to further improve the detection efficiency and the effective gene length in detection.

另外,增设所述补正高台20后,在所述纳米孔芯片与所述基因附着玻片之间预留了一定空间,避免出现现有技术中由于所述纳米孔芯片与所述基因附着玻片之间的粉尘颗粒影响,使所述面面角进一步扩大的情况。还有,通过使用所述补正高台20,显著增加了所述纳米孔芯片与所述基因附着玻片的接触面积,避免所述纳米孔芯片与所述基因附着玻片之间由于面面角的存在,在下压过程中出现简单线接触,导致压强过大进而发生碎片的情况,降低了检测中的事故率。In addition, after adding the correction platform 20, a certain space is reserved between the nanopore chip and the gene-attached glass slide to avoid the occurrence of the nanopore chip and the gene-attached glass slide in the prior art. The influence of the dust particles between them further expands the face angle. In addition, by using the correction platform 20, the contact area between the nanopore chip and the gene-attached glass slide is significantly increased, and the difference between the nanopore chip and the gene-attached glass slide due to surface angle differences is avoided. There is a situation in which simple line contact occurs during the pressing process, resulting in excessive pressure and fragmentation, which reduces the accident rate in detection.

作为一种优选实施方式,所述补正高台20为环形高台;As a preferred embodiment, the correction high platform 20 is an annular high platform;

所述柱状高台10位于所述环形高台内部;所述补正高台20为环形高台,可有效对付各个方向的面面角,使得所述纳米孔芯片不管朝向哪个方向偏,都能先与所述补正高台20接触,优选地,所述柱状高台10位于所述环形高台中心。当然,所述补正高台20也可不为环形,可为矩形边框状高台,或者分散的点状高台等,图3为与图2对应的本具体实施方式中所述补正高台20为环形高台时的俯视图,图4即为所述补正高台20为分散的点状高台的一种分布方式的俯视图,具体图案可根据实际需要自行选择。The columnar high platform 10 is located inside the annular high platform; the correction high platform 20 is an annular high platform, which can effectively deal with the face angles in all directions, so that no matter which direction the nanopore chip is oriented, it can be corrected first. The elevated platform 20 is in contact, and preferably, the columnar elevated platform 10 is located at the center of the annular elevated platform. Of course, the correction high platform 20 may not be a ring, but can be a rectangular frame-shaped high platform, or a scattered point-shaped high platform, etc. FIG. 3 is the embodiment corresponding to FIG. 2 when the correction high platform 20 is a ring high platform. A plan view, FIG. 4 is a plan view of a distribution mode in which the correction platform 20 is a scattered point-shaped platform, and the specific pattern can be selected according to actual needs.

进一步地,所述环形高台包括电解液交换口21,所述电解液交换口21用于使环形内侧及环形外侧的电解液流通交换,可参考图2,图 2中的环形高台被均分为四段,每一个豁口即为上述电解液交换口21,当然,所述电解液交换口21也可不破坏所述环形高台的连续性,仅在所述环形高台的侧壁上开孔洞,当然,可根据实际使用需要做调整。Further, the annular high platform includes an electrolyte exchange port 21, and the electrolyte exchange port 21 is used for the circulation and exchange of electrolytes on the inside and outside of the annular shape. Referring to FIG. 2, the annular high platform in FIG. 2 is divided into Four sections, each gap is the above-mentioned electrolyte exchange port 21. Of course, the electrolyte exchange port 21 may not destroy the continuity of the annular high platform, but only open holes on the side wall of the annular high platform. Of course, It can be adjusted according to actual needs.

更进一步地,所述补正高台20与所述柱状高台10的高度差的范围为2微米至10微米,包括端点值,如2.0微米、6.5微米或10.0微米中任一个,当然,具体情况可根据实际需求做变动。Further, the range of the height difference between the correction high platform 20 and the columnar high platform 10 is 2 microns to 10 microns, including the endpoint value, such as any one of 2.0 microns, 6.5 microns or 10.0 microns, of course, the specific situation can be based on Actual demand changes.

再进一步地,所述补正高台20的高度度范围为20微米至500微米,包括端点值,如20.0微米、120.3微米或500.0微米中任一个,举例说明,由前文可知,所述补正高台20的高度与所述补正高台20 到所述基因附着玻片的边缘的最短距离的比值不低于接触阈值,而所述补正高台20的高度最小是20微米,则所述补正高台20至所述基因附着玻片的边缘的最短距离的最大值可为500微米。Still further, the height range of the described correction high platform 20 is 20 micrometers to 500 micrometers, including the endpoint value, such as any one of 20.0 micrometers, 120.3 micrometers or 500.0 micrometers. The ratio between the height and the shortest distance between the correction high platform 20 and the edge of the gene-attached glass slide is not lower than the contact threshold, and the height of the correction high platform 20 is at least 20 microns, then the correction high platform 20 is to the gene The maximum value of the shortest distance to the edge of the attached slide can be 500 microns.

另外,所述基因附着玻片的尺寸的范围为1毫米至10毫米,包括端点值,如1.0毫米、5.2毫米或10.0毫米中任一个。因所述基因附着玻片多为正方形玻片,因此所述尺寸的范围指正方形玻片的范围。In addition, the size of the gene attachment slides ranges from 1 mm to 10 mm, inclusive, such as any of 1.0 mm, 5.2 mm, or 10.0 mm. Since the gene-attached slides are mostly square slides, the range of the size refers to the range of the square slides.

下面提供一种包括所述补正高台20的基因附着玻片的制作方法,包括(步骤中参数可根据实际情况变动):The following provides a method for making a gene-attached glass slide including the correction platform 20, including (parameters in the steps can be changed according to actual conditions):

(1)清洗玻片;(1) Cleaning the slides;

(2)磁控溅射沉积铝膜500nm;(2) Magnetron sputtering deposition of aluminum film 500nm;

(3)涂光刻胶1.7um;(3) Apply photoresist 1.7um;

(4)光刻,显影,制备工艺图形;(4) photolithography, development, and preparation of process patterns;

(5)刻蚀铝膜,转移光刻图形;(5) Etch the aluminum film and transfer the lithography pattern;

(6)刻蚀玻片,深度2um,直径10-50um,得到所述柱状高台的前置物;(6) etching glass slide, depth 2um, diameter 10-50um, obtains the preposition of described columnar high platform;

(7)去胶,剥离金属铝膜;(7) Remove the glue and peel off the metal aluminum film;

(8)磁控溅射沉积铝膜3um;(8) Magnetron sputtering deposition of aluminum film 3um;

(9)涂光刻胶1.7um;(9) Apply photoresist 1.7um;

(10)光刻,显影,制备工艺图形;(10) photolithography, development, and preparation of process patterns;

(11)刻蚀铝膜,转移光刻图形;(11) Etch the aluminum film and transfer the lithography pattern;

(12)刻蚀玻片,深度20-100um,形成所述柱状高台及所述补正高台,环形的所述补正高台的厚度25um;(12) etching the glass slide, the depth is 20-100um, forming the columnar high platform and the correction high platform, and the thickness of the annular correction high platform is 25um;

(13)去胶,剥离金属铝膜;(13) Remove glue and peel off the metal aluminum film;

(14)切片,即可得到2*2mm的所述基因附着玻片。(14) Sectioning, the gene attachment glass slide of 2*2mm can be obtained.

一种固态纳米孔基因测序设备,所述固态纳米孔基因测序设备包括如上述任一种所述的固态纳米孔基因池。本发明所提供的固态纳米孔基因池,包括上液池、下液池、基因附着玻片及纳米孔芯片;所述纳米孔芯片设置于所述上液池底部,所述上液池的下方通孔与所述纳米孔芯片的纳米孔对应设置;所述基因附着玻片位于所述下液池中心上表面,与所述纳米孔芯片对应设置;所述基因附着玻片的上表面包括柱状高台10;所述柱状高台10用于固定待检测基因。本发明通过在所述基因附着玻片上设置所述柱状高台10,使所述待检测基因的附着位置高于所述基因附着玻片的平面,在面对所述基因附着玻片与所述纳米孔芯片的面面角时,可有效缩短所述待检测基因到所述纳米孔的距离,使所述待检测基因更容易被纳米孔附近的电场捕获,提高检测效率,同时显著增加检测中的基因有效长度。A solid-state nanopore gene sequencing device, the solid-state nanopore gene sequencing device comprising the solid-state nanopore gene pool according to any one of the above. The solid-state nanopore gene pool provided by the present invention includes an upper solution pool, a lower solution pool, a gene-attached glass slide and a nanopore chip; the nanopore chip is arranged at the bottom of the upper solution pool, below the upper solution pool The through-holes are arranged corresponding to the nano-holes of the nano-pore chip; the gene-attached glass slide is located on the upper surface of the center of the lower liquid pool, and is arranged corresponding to the nano-pore chip; the upper surface of the gene-attached glass slide comprises a columnar The high platform 10; the columnar high platform 10 is used to fix the gene to be detected. In the present invention, the columnar high platform 10 is arranged on the gene attachment glass slide, so that the attachment position of the gene to be detected is higher than the plane of the gene attachment glass slide, and when facing the gene attachment glass slide and the nanometer When the surface angle of the hole chip is high, the distance from the gene to be detected to the nanopore can be effectively shortened, so that the gene to be detected is more easily captured by the electric field near the nanopore, the detection efficiency is improved, and the detection efficiency is significantly increased. Gene effective length.

本说明书中各个实施例采用递进的方式描述,每个实施例重点说明的都是与其它实施例的不同之处,各个实施例之间相同或相似部分互相参见即可。对于实施例公开的装置而言,由于其与实施例公开的方法相对应,所以描述的比较简单,相关之处参见方法部分说明即可。The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments, and the same or similar parts between the various embodiments may be referred to each other. As for the device disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant part can be referred to the description of the method.

需要说明的是,在本说明书中,诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下,由语句“包括一个……”限定的要素,并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素。It should be noted that in this specification, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply these entities or operations There is no such actual relationship or order between them. Moreover, the terms "comprising", "comprising" or any other variation thereof are intended to encompass non-exclusive inclusion such that a process, method, article or device comprising a list of elements includes not only those elements, but also includes not explicitly listed or other elements inherent to such a process, method, article or apparatus. Without further limitation, an element qualified by the phrase "comprising a..." does not preclude the presence of additional identical elements in a process, method, article or apparatus that includes the element.

以上对本发明所提供的固态纳米孔基因池及固态纳米孔基因测序设备进行了详细介绍。本文中应用了具体个例对本发明的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本发明的方法及其核心思想。应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以对本发明进行若干改进和修饰,这些改进和修饰也落入本发明权利要求的保护范围内。The solid-state nanopore gene pool and the solid-state nanopore gene sequencing device provided by the present invention are described in detail above. The principles and implementations of the present invention are described herein by using specific examples, and the descriptions of the above embodiments are only used to help understand the method and the core idea of the present invention. It should be pointed out that for those skilled in the art, without departing from the principle of the present invention, several improvements and modifications can also be made to the present invention, and these improvements and modifications also fall within the protection scope of the claims of the present invention.

Claims (10)

1.一种固态纳米孔基因池,其特征在于,包括上液池、下液池、基因附着玻片及纳米孔芯片;1. a solid-state nanopore gene pool, is characterized in that, comprises upper liquid pool, lower liquid pool, gene attachment glass slide and nanopore chip; 所述纳米孔芯片设置于所述上液池底部,所述上液池的下方通孔与所述纳米孔芯片的纳米孔对应设置;The nanopore chip is arranged at the bottom of the upper liquid pool, and the lower through holes of the upper liquid pool are correspondingly arranged with the nanopores of the nanopore chip; 所述基因附着玻片位于所述下液池中心上表面,与所述纳米孔芯片对应设置;The gene-attached glass slide is located on the upper surface of the center of the lower liquid pool, and is arranged corresponding to the nanopore chip; 所述基因附着玻片的上表面包括柱状高台;所述柱状高台用于固定待检测基因。The upper surface of the gene-attached glass slide includes a column-shaped high platform; the column-shaped high platform is used to fix the gene to be detected. 2.如权利要求1所述的固态纳米孔基因池,其特征在于,所述固态纳米孔基因池还包括补正高台;2. The solid-state nanopore gene pool of claim 1, wherein the solid-state nanopore gene pool further comprises a correction plateau; 所述补正高台设置于所述柱状高台周围,且所述补正高台高于所述柱状高台;The correction high platform is arranged around the columnar high platform, and the correction high platform is higher than the columnar high platform; 所述补正高台的高度与所述补正高台到所述基因附着玻片的边缘的最短距离的比值不低于接触阈值。The ratio of the height of the correction plateau to the shortest distance from the correction plateau to the edge of the gene-attached glass slide is not lower than the contact threshold. 3.如权利要求2所述的固态纳米孔基因池,其特征在于,所述补正高台为环形高台;3. The solid-state nanopore gene pool as claimed in claim 2, wherein the correction plateau is an annular plateau; 所述柱状高台位于所述环形高台内部。The columnar platform is located inside the annular platform. 4.如权利要求3所述的固态纳米孔基因池,其特征在于,所述环形高台包括电解液交换口。4 . The solid-state nanopore gene pool of claim 3 , wherein the annular high platform comprises an electrolyte exchange port. 5 . 5.如权利要求2所述的固态纳米孔基因池,其特征在于,所述补正高台与所述柱状高台的高度差的范围为2微米至10微米,包括端点值。5 . The solid-state nanopore gene pool according to claim 2 , wherein the height difference between the correction plateau and the columnar plateau is in a range of 2 μm to 10 μm, inclusive. 6 . 6.如权利要求2所述的固态纳米孔基因池,其特征在于,所述基因附着玻片的尺寸的范围为1毫米至10毫米。6. The solid-state nanopore gene pool of claim 2, wherein the size of the gene-attached slide is in the range of 1 mm to 10 mm. 7.如权利要求6所述的固态纳米孔基因池,其特征在于,所述补正高台的高度度范围为20微米至500微米,包括端点值。7 . The solid-state nanopore gene pool of claim 6 , wherein the height of the correction plateau ranges from 20 μm to 500 μm, inclusive. 8 . 8.如权利要求1所述的固态纳米孔基因池,其特征在于,所述基因附着玻片为硅基玻片。8 . The solid-state nanopore gene pool of claim 1 , wherein the gene-attached glass slide is a silicon-based glass slide. 9 . 9.如权利要求1至9任一项所述的固态纳米孔基因池,其特征在于,所述柱状高台为圆柱高台。9 . The solid-state nanopore gene pool according to claim 1 , wherein the columnar plateau is a cylindrical plateau. 10 . 10.一种固态纳米孔基因测序设备,其特征在于,所述固态纳米孔基因测序设备包括如权利要求1至9任一项所述的固态纳米孔基因池。10. A solid-state nanopore gene sequencing device, wherein the solid-state nanopore gene sequencing device comprises the solid-state nanopore gene pool according to any one of claims 1 to 9.
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