CN114605058B - Thermal transfer mold and preparation device of anti-dazzle glass - Google Patents
Thermal transfer mold and preparation device of anti-dazzle glass Download PDFInfo
- Publication number
- CN114605058B CN114605058B CN202210309016.5A CN202210309016A CN114605058B CN 114605058 B CN114605058 B CN 114605058B CN 202210309016 A CN202210309016 A CN 202210309016A CN 114605058 B CN114605058 B CN 114605058B
- Authority
- CN
- China
- Prior art keywords
- glass
- mold
- thermal transfer
- die
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011521 glass Substances 0.000 title claims abstract description 146
- 238000012546 transfer Methods 0.000 title claims abstract description 70
- 238000002360 preparation method Methods 0.000 title abstract description 15
- 238000010023 transfer printing Methods 0.000 claims abstract description 43
- 238000010521 absorption reaction Methods 0.000 claims abstract description 10
- 239000010410 layer Substances 0.000 claims description 88
- 230000007704 transition Effects 0.000 claims description 29
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- 239000000919 ceramic Substances 0.000 claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 6
- 239000002131 composite material Substances 0.000 claims description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 6
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims description 5
- 239000012790 adhesive layer Substances 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 4
- 230000000181 anti-adherent effect Effects 0.000 claims description 4
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 claims description 3
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 claims description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- 229910003470 tongbaite Inorganic materials 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 claims description 2
- 230000001070 adhesive effect Effects 0.000 claims description 2
- 230000002708 enhancing effect Effects 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 33
- 238000000034 method Methods 0.000 abstract description 22
- 239000011148 porous material Substances 0.000 abstract description 21
- 230000008569 process Effects 0.000 abstract description 12
- 230000000052 comparative effect Effects 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 14
- 235000012239 silicon dioxide Nutrition 0.000 description 6
- 230000007547 defect Effects 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 238000003486 chemical etching Methods 0.000 description 3
- 238000003912 environmental pollution Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005488 sandblasting Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
The invention relates to a thermal transfer mold and a preparation device of anti-dazzle glass. The heat transfer printing mold comprises a first mold and a second mold, wherein the first mold and the second mold are enclosed to form a mold cavity, and the mold cavity is used for bearing glass to be treated; the first die is provided with micropores, the pore diameter of the micropores is 5-20 mu m, and the porosity is 10-60%. The heat transfer printing mold comprises a first mold and a second mold, wherein the first mold is provided with micropores, and the aperture and the porosity are adjusted, so that tiny protrusions are formed on the surface of the glass, which is contacted with the heat transfer printing mold, through vacuum heat absorption in the process of preparing the anti-dazzle glass by using the heat transfer printing mold, so that the anti-dazzle effect is realized and the anti-dazzle effect is uniform.
Description
Technical Field
The invention relates to the field of glass, in particular to a thermal transfer mold and a preparation device of anti-dazzle glass.
Background
The traditional preparation method of the anti-dazzle glass generally adopts a sand blasting or etching method to carry out micro-nano treatment on the surface of a thermal transfer printing die so as to form concave-convex patterns on the thermal transfer printing die, thereby realizing the anti-dazzle effect, and then the concave-convex patterns on the surface of the thermal transfer printing die are transferred to the surface of the glass in a thermal transfer printing mode so as to form the anti-dazzle effect on the surface of the glass. Glass prepared by adopting a traditional heat transfer printing die has the problem of uneven AG (anti-dazzle effect).
Disclosure of Invention
Accordingly, it is necessary to provide a thermal transfer mold that can be used for producing an antiglare glass and that makes AG effects of the antiglare glass uniform.
In addition, it is also necessary to provide a manufacturing apparatus of anti-glare glass including the thermal transfer mold.
A thermal transfer mold comprising a first mold and a second mold;
the first die and the second die are enclosed to form a die cavity, and the die cavity is used for bearing glass to be treated;
the first die is provided with micropores, the pore diameter of the micropores is 5-20 mu m, and the porosity is 10-60%.
In one embodiment, a film layer is disposed on a surface of the first mold, which is located in the mold cavity, and the film layer includes a transition layer, a hardening layer and an anti-sticking layer, which are sequentially stacked, the transition layer is stacked on the surface of the first mold, and the transition layer is used for enhancing adhesion force between the first mold and the hardening layer.
In one embodiment, the material of the transition layer is selected from at least one of alumina, silica, and silica-alumina composite.
In one embodiment, the thickness of the transition layer is 20nm to 100nm.
In one embodiment, the hardening layer is made of at least one material selected from the group consisting of silicon nitride, silicon carbide, chromium carbide and chromium nitride.
In one embodiment, the thickness of the stiffening layer is 100nm to 300nm.
In one embodiment, the material of the anti-adhesion layer is selected from at least one of silicon dioxide and silicon aluminum composite materials.
In one embodiment, the thickness of the anti-adhesive layer is 20nm to 100nm.
In one embodiment, the total thickness of the film layer is 140nm to 500nm.
In one embodiment, the thermal transfer mold is a ceramic mold.
In one embodiment, the pore size of the micropores is 8-15 μm, and the porosity is 20% -40%.
An apparatus for producing an antiglare glass, comprising:
the thermal transfer printing die is the thermal transfer printing die; and
And the heat absorption equipment is used for carrying out heating treatment and vacuumizing on the heat transfer printing die and the glass to be treated, so that the heat transfer printing die is contacted with the glass to be treated and the glass to be treated is heated and molded.
In one embodiment, the method further comprises: and the conveying equipment is used for conveying the thermal transfer mold and the glass to be processed into the heat absorbing equipment.
The heat transfer printing mold comprises a first mold and a second mold, wherein the first mold is provided with micropores, and the aperture and the porosity are adjusted, so that tiny protrusions are formed on the surface of the glass, which is contacted with the heat transfer printing mold, through vacuum heat absorption in the process of preparing the anti-dazzle glass by using the heat transfer printing mold, and the anti-dazzle effect and the even anti-dazzle effect of the glass are realized.
Drawings
Fig. 1 is a schematic diagram of a micropore structure of a first mold of a thermal transfer mold according to an embodiment.
Detailed Description
In order that the invention may be readily understood, a more complete description of the invention will be rendered by reference to specific embodiments that are now described. Preferred embodiments of the invention are given in the detailed description. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and/or" as used herein includes any and all combinations of one or more of the associated listed items.
The glass is specially treated on its surface, and its principle is that it is treated on one or both sides to make it have lower reflectance than common glass, so that it can reduce interference of ambient light, raise definition, visibility and visual angle of picture, reduce screen reflection and make the image more clear and lifelike, and is applicable to various displays and protecting screens.
The traditional preparation method of the anti-dazzle glass generally adopts spraying, sand blasting and chemical etching methods to form concave-convex shapes on the surface of a thermal transfer printing die to realize AG effect, then the concave-convex shapes on the thermal transfer printing die are transferred to the surface of the glass to further realize AG effect on the surface of the glass, and the method has the problems of large environmental pollution, uneven anti-dazzle effect and the like.
Based on the above, the inventor of the application found in experiments that an anti-dazzle glass is prepared by using a thermal transfer mold with a micropore structure, tiny protrusions are formed on the surface of the glass to be treated, which is in contact with the thermal transfer mold, through heating and vacuum adsorption by means of the micropore structure of the thermal transfer mold, so that a uniform AG effect is achieved, and the anti-dazzle glass is obtained, and further the thermal transfer mold with a uniform anti-dazzle effect is provided. In addition, in the process of preparing the anti-glare glass by adopting the thermal transfer mold, the anti-glare glass has small environmental pollution, and the prepared anti-glare glass has good friction resistance and high strength.
Specifically, a first aspect of the present application provides a thermal transfer mold of an embodiment, including: the glass processing device comprises a first die and a second die, wherein the first die and the second die are enclosed to form a die cavity, and the die cavity is used for bearing glass to be processed. The first die is provided with micropores, the pore diameter of the micropores is 5-20 mu m, and the porosity is 10-60%. Specifically, the thermal transfer mold is a mold used for preparing anti-glare glass.
Wherein the aperture of the micropore is 5-20 mu m, and the porosity is 10-60%. For example, in one embodiment, the pore size of the micropores may be 5 μm, 8 μm, 10 μm, 12 μm, 15 μm, 18 μm, 20 μm, 5 μm to 10 μm, 5 μm to 12 μm, 5 μm to 15 μm, 5 μm to 18 μm, 8 μm to 10 μm, 8 μm to 12 μm, 8 μm to 15 μm, 8 μm to 18 μm, 8 μm to 20 μm, 10 μm to 12 μm, 10 μm to 15 μm, 10 μm to 18 μm, 10 μm to 20 μm, etc. Further, the pore diameter of the micropores is 8 μm to 15 μm.
In this context, the pore diameter of micropores refers to the average pore diameter thereof.
In one embodiment, the porosity may be 10%, 20%, 30%, 40%, 50%, 60%, 10% to 50%, 10% to 40%, 20% to 60%, 20% to 50%, 20% to 40%, 30% to 60%, 30% to 50%, 30% to 40%, 40% to 60%, 40% to 50%, etc. Further, the porosity is 20% -40%. The pore diameter or porosity of the micropores is too small, and a certain suction force is difficult to achieve in the vacuum heat suction process, so that a uniform anti-dazzle effect is difficult to form on the surface of the glass. The pore diameter or porosity of the micropores is too large, and the formed anti-dazzle glass has high haze and poor definition and is not suitable for being used as display glass. Therefore, in this embodiment, micropores are provided with a pore diameter of 5 μm to 20 μm and a porosity of 10% to 60%. Further, the pore diameter of the micropores is 8-15 μm, and the porosity is 20-40%.
The first die is provided with micropores, the pore diameter and the porosity of the micropores are controlled, so that in the process of preparing the anti-glare glass by using the heat transfer die, vacuum heat absorption is adopted, on one hand, the first die is tightly attached to the glass to be treated by the micropores, the stress is uniform, uneven stress caused by a hot pressing mode is avoided, and on the other hand, tiny protrusions are formed on the contact surface of the glass to be treated and the heat transfer die through heating and vacuum absorption, so that AG effect is achieved and AG effect is uniform.
Further, the micropores are uniformly distributed in the first mold. Referring to fig. 1, a schematic diagram of a micropore structure of a first mold of a thermal transfer mold is shown. As can be seen from the figure, the micro-holes are uniformly distributed in the first mold.
In particular, the mold cavity is used to carry the glass to be treated. The shape of the mold cavity corresponds to the shape of the glass to be treated, and can be designed according to the shape of the glass to be treated.
Further, the first mould is located the side surface of die cavity and is equipped with the rete, and the rete is including the transition layer, the hardening layer and the antiseized layer of laminating gradually, and the transition layer stacks on first mould surface, and the transition layer is used for reinforcing the adhesive force of first mould and hardening layer.
Specifically, the material of the transition layer is aluminum oxide. It will be appreciated that the material of the transition layer is not limited to alumina, but may be other materials that enhance the adhesion of the first mold to the stiffening layer. For example, the material of the transition layer may also be silicon dioxide or silicon-aluminum composite material. Further, the thickness of the transition layer is 20 nm-100 nm. In a specific example, the thickness of the transition layer may be 20nm, 30nm, 40nm, 50nm, 60nm, 70nm, 80nm, 90nm, 100nm, 20nm to 90nm, 20nm to 80nm, 20nm to 70nm, 20nm to 60nm, 20nm to 50nm, 30nm to 90nm, 30nm to 80nm, 30nm to 70nm, 30nm to 60nm, 30nm to 50nm, 40nm to 90nm, 40nm to 80nm, 40nm to 70nm, 40nm to 60nm, 40nm to 50nm, 50nm to 90nm, 50nm to 80nm, 50nm to 70nm, 50nm to 60nm, etc.
The hardening layer is made of at least one material selected from silicon nitride, silicon carbide, chromium carbide and chromium nitride. Stiffening the layer can increase the hardness of the film layer. It will be appreciated that the above list only a few stiffening layers, but is not limited thereto and other materials that increase the stiffness of the film are possible. Further, the thickness of the stiffening layer is 100nm to 300nm. In a specific example, the stiffening layer may have a thickness of 100nm, 120nm, 150nm, 180nm, 200nm, 220nm, 250nm, 280nm, 300nm, 100nm to 280nm, 100nm to 250nm, 100nm to 220nm, 100nm to 200nm, 120nm to 280nm, 120nm to 250nm, 120nm to 220nm, 120nm to 200nm, 150nm to 280nm, 150nm to 250nm, 150nm to 220nm, 150nm to 200nm, 180nm to 280nm, 180nm to 250nm, 180nm to 220nm, 180nm to 200nm, and the like.
The material of the anti-sticking layer is at least one selected from silicon dioxide and silicon-aluminum composite materials. It will be appreciated that the above list only a few materials for the release layer, but is not limited thereto and other materials capable of releasing may be used. Further, the thickness of the anti-adhesive layer is 20 nm-100 nm. In a specific example, the thickness of the anti-adhesive layer may be 20nm, 30nm, 40nm, 50nm, 60nm, 70nm, 80nm, 90nm, 100nm, 20nm to 90nm, 20nm to 80nm, 20nm to 70nm, 20nm to 60nm, 20nm to 50nm, 30nm to 90nm, 30nm to 80nm, 30nm to 70nm, 30nm to 60nm, 30nm to 50nm, 40nm to 90nm, 40nm to 80nm, 40nm to 70nm, 40nm to 60nm, 40nm to 50nm, 50nm to 90nm, 50nm to 80nm, 50nm to 70nm, 50nm to 60nm, and the like.
The film layer is arranged on the surface of one side of the first die, which is positioned in the die cavity, so that the surface flatness of the thermal transfer printing die is improved, the defects of the prepared anti-glare glass are reduced, and the glass is separated from the thermal transfer printing die after being molded, so that the service life of the thermal transfer printing die can be prolonged.
In one embodiment, the total thickness of the film layer is 140nm to 500nm. The total thickness of the film layer is too thick to influence the pore structure of the first die, and the total thickness of the film layer is smaller and can not play roles in preventing adhesion and improving surface flatness. For example, the total thickness of the film layer may be 50nm, 100nm, 120nm, 200nm, 250nm, 300nm, 350nm, 400nm, 450nm, 500nm, 150nm to 450nm, 150nm to 400nm, 150nm to 350nm, 150nm to 300nm, 200nm to 500nm, 200nm to 450nm, 200nm to 400nm, 200nm to 350nm, 200nm to 300nm, 250nm to 500nm, 250nm to 450nm, 250nm to 400nm, 250nm to 350nm, 250nm to 300nm, and the like. Further, the total thickness of the film layer is 200nm to 400nm.
Further, the film layer is formed on the surface of the first die by adopting a sputtering plating mode. The specific sputter coating process may be conventional in the art and will not be described in detail herein.
Preferably, in the present embodiment, the thermal transfer mold is a ceramic mold. The ceramic mold has low cost, is easy to obtain a micropore structure, and is easy to carry out surface treatment, such as coating and the like, so as to reduce the surface defects of the ceramic mold, and further the prepared anti-dazzle glass has few surface defects. In addition, the ceramic mold is resistant to high temperature, and AG effect can be formed on the glass surface by a thermal transfer method.
The traditional preparation method of the anti-dazzle glass generally adopts a chemical etching, spraying or sand blasting mode to form concave-convex shapes on the glass so as to realize the anti-dazzle effect, or firstly forms the anti-dazzle effect on a thermal transfer printing die, and then transfers the anti-dazzle effect on the die to the glass in a thermal transfer printing mode so as to realize the anti-dazzle effect on the glass. In this embodiment, the thermal transfer mold includes a first mold and a second mold, the first mold has micropores, and the aperture and the porosity are adjusted, so that in the process of preparing the anti-glare glass by using the thermal transfer mold, micro protrusions are formed on the surface of the glass to be treated, which is in contact with the thermal transfer mold, through vacuum heat absorption, thereby realizing an anti-glare effect and having uniform anti-glare effect.
In actual treatment, the first die of the heat transfer die is required to be connected with a vacuum generator, suction force is generated on glass to be treated through the holes of the heat transfer die, so that the glass to be treated can be closely contacted with the heat transfer die, in addition, AG effect is formed on the surface of the glass to be treated at the contact part of the glass to be treated and the heat transfer die in a heat suction mode, and the technical difficulty of the traditional process can be solved. In addition, by adopting a vacuum heat absorption mode, the stress of the glass to be treated is more uniform, and the anti-dazzle effect formed on the surface of the glass to be treated is uniform and has few defects.
A second aspect of the present application provides an apparatus for manufacturing an antiglare glass according to an embodiment, including: the heat transfer mold is the heat transfer mold of the above embodiment, and is not described here again.
The heat absorbing device is used for carrying out heating treatment and vacuumizing on the heat transfer printing die and the glass to be treated, so that the heat transfer printing die is in contact with the glass to be treated and the glass to be treated is heated and molded.
Specifically, the heat absorbing device comprises a heating mechanism and a vacuumizing mechanism, wherein the heating mechanism is used for heating the heat transfer printing die and the glass to be processed, and the vacuumizing mechanism is used for vacuumizing the heat transfer printing die. Specifically, the vacuumizing mechanism is connected with a first die of the thermal transfer die.
In one embodiment, the apparatus for preparing the anti-glare glass may further include a transfer device for transferring the thermal transfer mold and the glass to be treated into the heat absorbing device.
Specifically, in some embodiments, the method for preparing the anti-glare glass by using the preparation device of the anti-glare glass comprises the following steps: and placing the glass to be treated in a die cavity of a thermal transfer mold, conveying the glass to be treated and the thermal transfer mold into a thermal suction device by using a conveying device, heating the glass to be treated and the thermal transfer mold by using the thermal suction device, and vacuumizing the thermal transfer mold from one side of the first mold far away from the second mold so as to heat and mold the glass to be treated, thereby obtaining the anti-dazzle glass.
In one embodiment, the temperature in the step of heating the glass to be treated and the thermal transfer mold is 500-900 ℃. The vacuum pumping pressure is 0.02 MPa-0.10 MPa. The time of the heating forming is 100 s-500 s. The specific temperature, pressure and forming time can be adjusted according to different materials of the glass to be treated.
The preparation device of the anti-dazzle glass has at least the following advantages:
(1) The preparation device of the anti-dazzle glass comprises the heat transfer printing die and the heat absorbing equipment, the heat absorbing equipment is utilized to heat the glass to be treated and the heat transfer printing die, the vacuum pumping is carried out at the same time, the surface of the glass to be treated is in close contact with the heat transfer printing die, the aperture and the porosity of the heat transfer printing die are controlled, tiny protrusions are formed on the surface of the glass to be treated, which is in contact with the heat transfer printing die, through heating and vacuum absorption, the AG effect is achieved, so that the anti-dazzle glass is obtained, the small protrusions with AG effect are formed by the device and the glass into a whole, the stability is good, the friction resistance is better, the surface of the glass is not damaged, and the strength of the obtained anti-dazzle glass is better.
(2) The preparation device of the anti-dazzle glass can solve the problems that the traditional chemical etching process is large in environmental pollution and large in damage to human bodies, can also avoid the problem that sand grains fall off and the performance is not up to standard, is simple to operate and is convenient for mass production.
(3) According to the preparation device of the anti-dazzle glass, tiny protrusions are formed on the surface of the glass to be treated in a vacuum heat absorption mode, AG effect is achieved, stress of the glass is more uniform, and the anti-dazzle effect formed on the surface of the glass is uniform and has few defects.
(4) The anti-dazzle glass prepared by the preparation device of the anti-dazzle glass has the characteristics of low flicker point and high definition by controlling the porosity and the aperture of the thermal transfer mold, and can meet the performance requirement of the cover plate of the electronic display glass.
In order to make the objects and advantages of the present invention more apparent, the following description of the thermal transfer mold and the effects thereof will be given in detail with reference to several examples, it being understood that the specific examples described herein are for the purpose of illustration only and are not intended to limit the invention, and the following examples and comparative examples are the same as the glass to be treated and are all available from corning:
example 1
The embodiment provides a thermal transfer mold and a method for preparing anti-glare glass by using the same, and the method comprises the following steps:
the thermal transfer mold of this embodiment is a ceramic mold, and the structure is specifically as follows:
the thermal transfer mold comprises a first mold and a second mold, wherein a mold cavity is formed between the first mold and the second mold and is used for bearing glass to be processed. The first mold had micropores with a pore diameter of 10 μm and a porosity of 40%. The surface of one side of the first die, which is close to the second die, is provided with a film layer, wherein the film layer comprises a transition layer, a hardening layer and an anti-sticking layer which are sequentially laminated, the transition layer is laminated on the surface of the first die, the transition layer is made of aluminum oxide, and the thickness of the transition layer is 50nm; the hardening layer is made of silicon nitride and has the thickness of 200nm; the anti-sticking layer is made of silicon dioxide and has the thickness of 50nm; the total thickness of the film layer was 300nm.
The preparation process of the anti-glare glass of the embodiment specifically comprises the following steps:
and placing the glass to be treated in the die cavity of the heat transfer printing die, heating the glass to be treated and the heat transfer printing die at 700 ℃, vacuumizing the heat transfer printing die from the side, far away from the second die, of the first die, wherein the vacuum negative pressure is 0.03MPa, the time is 400s, tightly attaching the glass to be treated to the first die by utilizing the pore structure of the first die, and forming protrusions on the surface, in contact with the first die, of the glass to be treated to obtain the anti-glare glass.
Comparative example 1
Comparative example 1 provides a thermal transfer mold and a method for preparing anti-glare glass using the same, which comprises the following steps:
the structure of the thermal transfer mold of comparative example 1 is specifically as follows:
the thermal transfer mold comprises a first mold and a second mold, wherein a mold cavity is formed between the first mold and the second mold and is used for bearing glass to be processed. The first mold had micropores with a pore diameter of 3 μm and a porosity of 15%. The surface of one side of the first die, which is close to the second die, is provided with a film layer, wherein the film layer comprises a transition layer, a hardening layer and an anti-sticking layer which are sequentially laminated, the transition layer is laminated on the surface of the first die, the transition layer is made of aluminum oxide, and the thickness of the transition layer is 50nm; the hardening layer is made of silicon nitride and has the thickness of 200nm; the anti-sticking layer is made of silicon dioxide and has the thickness of 50nm; the total thickness of the film layer was 50nm.
The antiglare glass of comparative example 1 was prepared as follows:
and placing the glass to be treated in the die cavity of the heat transfer printing die, heating the glass to be treated and the heat transfer printing die at 700 ℃, vacuumizing the heat transfer printing die from the side, far away from the second die, of the first die, wherein the vacuum negative pressure is 0.03MPa, the time is 400s, tightly attaching the glass to be treated to the first die by utilizing the pore structure of the first die, and forming protrusions on the surface, in contact with the first die, of the glass to be treated to obtain the anti-glare glass.
Comparative example 2
Comparative example 2 provides a thermal transfer mold and a method for preparing anti-glare glass using the same, which are specifically as follows:
the structure of the thermal transfer mold of comparative example 2 is specifically as follows:
the thermal transfer mold comprises a first mold and a second mold, wherein a mold cavity is formed between the first mold and the second mold and is used for bearing glass to be processed. The first mold had micropores with a pore diameter of 30 μm and a porosity of 40%. The surface of one side of the first die, which is close to the second die, is provided with a film layer, wherein the film layer comprises a transition layer, a hardening layer and an anti-sticking layer which are sequentially laminated, the transition layer is laminated on the surface of the first die, the transition layer is made of aluminum oxide, and the thickness of the transition layer is 50nm; the hardening layer is made of silicon nitride and has the thickness of 200nm; the anti-sticking layer is made of silicon dioxide and has the thickness of 50nm; the total thickness of the film layer was 50nm.
The antiglare glass of comparative example 2 was prepared as follows:
and placing the glass to be treated in the die cavity of the heat transfer printing die, heating the glass to be treated and the heat transfer printing die at 700 ℃, vacuumizing the heat transfer printing die from the side, far away from the second die, of the first die, wherein the vacuum negative pressure is 0.03MPa, the time is 400s, tightly attaching the glass to be treated to the first die by utilizing the pore structure of the first die, and forming protrusions on the surface, in contact with the first die, of the glass to be treated to obtain the anti-glare glass.
The process parameters during the preparation of the antiglare glasses of the above examples and comparative examples are shown in table 1 below:
table 1 process parameters of the antiglare glasses of examples and comparative examples
The antiglare glasses prepared in the above examples and comparative examples were tested to obtain experimental data shown in table 2 below. Wherein, the surface roughness is tested by a roughness meter with the model of SJ-210, the haze is tested by a haze meter with the model of German BYK-4725, the gloss is tested by German BYK-4430, and the sharpness (DOI) and the Sparkle point (spark) are tested by German DM & S SMS-1000.
Table 2 test data for antiglare glasses of examples and comparative examples
From the experimental results, the anti-dazzle glass is prepared by adopting the thermal transfer mold in the embodiment 1, and tiny protrusions are formed on the surface of the glass to be treated, which is in contact with the thermal transfer mold, through heating and vacuum adsorption by controlling the aperture and the porosity of the thermal transfer mold, so that the better AG effect is achieved, and the prepared anti-dazzle glass has proper haze and glossiness, high definition and low flickering point, and can more meet the performance requirements of the cover plate of the electronic display glass. In comparative example 1, the pore diameter and porosity of the thermal transfer mold are too small, and a certain suction force is difficult to achieve in the vacuum heat suction process, so that the prepared anti-dazzle glass has high glossiness and poor anti-dazzle effect. In comparative example 2, the aperture of the thermal transfer mold was too large, and the prepared antiglare glass had high haze and poor definition, and was difficult to satisfy the performance requirements of the electronic display glass cover plate. In addition, the anti-dazzle glass prepared by using the thermal transfer mold of the embodiment 1 has the advantages that small protrusions with AG effect are formed on the surface of the glass, the anti-dazzle glass is integrally formed with the glass, the stability is good, the friction resistance is better, the glass surface is not damaged, and the strength of the obtained anti-dazzle glass is better.
The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The above examples merely represent a few embodiments of the present invention, which facilitate a specific and detailed understanding of the technical solutions of the present invention, but are not to be construed as limiting the scope of the invention. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the invention, which are all within the scope of the invention. It should be understood that, based on the technical solutions provided by the present invention, those skilled in the art can obtain technical solutions through logical analysis, reasoning or limited experiments, which are all within the protection scope of the appended claims. The scope of the patent is therefore intended to be covered by the appended claims, and the description and drawings may be interpreted as illustrative of the contents of the claims.
Claims (10)
1. A thermal transfer mold, wherein the thermal transfer mold comprises a first mold and a second mold;
the first die and the second die are enclosed to form a die cavity, and the die cavity is used for bearing glass to be treated;
the first die is provided with micropores, the aperture of the micropores is 8-15 mu m, and the porosity is 20-40%;
the thermal transfer mold is used for preparing anti-dazzle glass;
the first die is located one side surface in the die cavity is provided with a film layer, the film layer comprises a transition layer, a hardening layer and an anti-sticking layer which are laminated in sequence, the transition layer is laminated on the surface of the first die and used for enhancing the adhesive force of the first die and the hardening layer, and the total thickness of the film layer is 140-500 nm.
2. The thermal transfer mold of claim 1, wherein the material of the transition layer is selected from at least one of alumina, silica, and a silicon aluminum composite.
3. The thermal transfer mold of claim 1, wherein the transition layer has a thickness of 20nm to 100nm.
4. The thermal transfer mold according to claim 1, wherein the hardening layer is made of at least one material selected from the group consisting of silicon nitride, silicon carbide, chromium carbide and chromium nitride; and/or the thickness of the hardening layer is 100 nm-300 nm.
5. The thermal transfer mold according to claim 1, wherein the material of the anti-sticking layer is at least one selected from the group consisting of silica and silicon-aluminum composite materials; and/or the thickness of the anti-adhesive layer is 20 nm-100 nm.
6. The thermal transfer mold according to any one of claims 1 to 5, wherein the total thickness of the film layer is 200nm to 400nm.
7. The thermal transfer mold according to any one of claims 1 to 5, wherein the thermal transfer mold is a ceramic mold.
8. The thermal transfer mold according to any one of claims 1 to 5, wherein the micropores are uniformly distributed in the first mold.
9. An apparatus for producing an antiglare glass, comprising:
a thermal transfer mold according to any one of claims 1 to 8; and
And the heat absorption equipment is used for carrying out heating treatment and vacuumizing on the heat transfer printing die and the glass to be treated, so that the heat transfer printing die is contacted with the glass to be treated and the glass to be treated is heated and molded.
10. The apparatus for producing an antiglare glass according to claim 9, further comprising: and the conveying equipment is used for conveying the thermal transfer mold and the glass to be processed into the heat absorbing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210309016.5A CN114605058B (en) | 2022-03-28 | 2022-03-28 | Thermal transfer mold and preparation device of anti-dazzle glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210309016.5A CN114605058B (en) | 2022-03-28 | 2022-03-28 | Thermal transfer mold and preparation device of anti-dazzle glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114605058A CN114605058A (en) | 2022-06-10 |
| CN114605058B true CN114605058B (en) | 2024-01-26 |
Family
ID=81866638
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210309016.5A Active CN114605058B (en) | 2022-03-28 | 2022-03-28 | Thermal transfer mold and preparation device of anti-dazzle glass |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114605058B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115432946B (en) * | 2022-08-30 | 2024-06-07 | 维达力实业(深圳)有限公司 | AG effect microcrystalline glass preparation mold, microcrystalline glass and preparation method thereof |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS627639A (en) * | 1985-07-02 | 1987-01-14 | Matsushita Electric Ind Co Ltd | Method for molding optical glass element |
| JPH07172849A (en) * | 1993-12-16 | 1995-07-11 | Matsushita Electric Ind Co Ltd | Mold for press-molding optical element and method for manufacturing the same |
| JPH10231129A (en) * | 1997-02-21 | 1998-09-02 | Matsushita Electric Ind Co Ltd | Press forming mold and glass molded product using this mold |
| JP2010224428A (en) * | 2009-03-25 | 2010-10-07 | Sumitomo Chemical Co Ltd | Method for producing antiglare film and method for producing mold for production of antiglare film |
| CN105102383A (en) * | 2011-11-23 | 2015-11-25 | 康宁股份有限公司 | Reconditioning glass - forming molds having a surface oxidized titanium -aluminum -nitride glass release coating |
| JP2016012095A (en) * | 2014-06-30 | 2016-01-21 | サンテックオプト株式会社 | Glare reduction antiglare film and manufacturing method thereof |
| CN208776579U (en) * | 2018-08-10 | 2019-04-23 | 浙江昱鑫光电科技有限公司 | AG glass hot forming tool |
| CN112028500A (en) * | 2020-07-27 | 2020-12-04 | 江西沃格光电股份有限公司 | Anti-glare glass and preparation method and application thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018020958A (en) * | 2016-07-22 | 2018-02-08 | 旭硝子株式会社 | Mold, molding apparatus, and method of manufacturing bent glass |
-
2022
- 2022-03-28 CN CN202210309016.5A patent/CN114605058B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS627639A (en) * | 1985-07-02 | 1987-01-14 | Matsushita Electric Ind Co Ltd | Method for molding optical glass element |
| JPH07172849A (en) * | 1993-12-16 | 1995-07-11 | Matsushita Electric Ind Co Ltd | Mold for press-molding optical element and method for manufacturing the same |
| JPH10231129A (en) * | 1997-02-21 | 1998-09-02 | Matsushita Electric Ind Co Ltd | Press forming mold and glass molded product using this mold |
| JP2010224428A (en) * | 2009-03-25 | 2010-10-07 | Sumitomo Chemical Co Ltd | Method for producing antiglare film and method for producing mold for production of antiglare film |
| CN105102383A (en) * | 2011-11-23 | 2015-11-25 | 康宁股份有限公司 | Reconditioning glass - forming molds having a surface oxidized titanium -aluminum -nitride glass release coating |
| JP2016012095A (en) * | 2014-06-30 | 2016-01-21 | サンテックオプト株式会社 | Glare reduction antiglare film and manufacturing method thereof |
| CN208776579U (en) * | 2018-08-10 | 2019-04-23 | 浙江昱鑫光电科技有限公司 | AG glass hot forming tool |
| CN112028500A (en) * | 2020-07-27 | 2020-12-04 | 江西沃格光电股份有限公司 | Anti-glare glass and preparation method and application thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114605058A (en) | 2022-06-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN114702235B (en) | Anti-glare glass, preparation method thereof and display device | |
| WO2021227634A1 (en) | Ceramic-like housing of electronic device, preparation method therefor, and electronic device | |
| US11795116B2 (en) | Ceramic assembly and method of forming the same | |
| TWI567414B (en) | Manufacturing Method of Glass Curved Plate with Anti - glare | |
| CN114605058B (en) | Thermal transfer mold and preparation device of anti-dazzle glass | |
| JP6311776B2 (en) | Laminated glass manufacturing method, laminated glass and window glass | |
| CN108638729A (en) | Shell and preparation method thereof, mobile terminal | |
| CN110191605A (en) | Shell assembly, preparation method and electronic equipment | |
| TW201504058A (en) | Methods of forming laminated glass structures | |
| CA2519944A1 (en) | Method of making coated articles and coated articles made thereby | |
| CN113132510B (en) | Housings and electronics | |
| CN111592234B (en) | Patterned curved glass and preparation method and application thereof | |
| JP2012014138A (en) | Method for manufacturing anti-reflection display window panel, and anti-reflection display window panel manufactured by the same | |
| WO2020063285A1 (en) | Anti-fingerprint terminal housing and terminal | |
| CN106573490B (en) | In-mold forming film, in-mold article, and method for producing in-mold article | |
| CN112778918B (en) | Mother board diaphragm, decorative diaphragm, shell, preparation method and electronic equipment | |
| CN111114161B (en) | Housing, electronic device, and method for manufacturing housing | |
| TWI304016B (en) | Composite brightened shell and method for fabricating the same | |
| CN110484862B (en) | Composite coating Logo, preparation method thereof, ceramic cover plate comprising composite coating Logo and electronic equipment comprising composite coating Logo | |
| CN206870487U (en) | A kind of diaphragm | |
| CN116744589A (en) | Shell structure, manufacturing method thereof and electronic equipment | |
| CN110484868B (en) | Logo for ceramic substrate, preparation method thereof, ceramic cover plate comprising Logo and electronic equipment comprising Logo | |
| CN209869607U (en) | Physical wire drawing texture PET film | |
| CN111718107A (en) | 3D glass and its production method, glass cover plate and electronic equipment | |
| CN111614808A (en) | a film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |