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CN114577753A - High-Q Refractive Index Sensor Based on Quasi-Continuous Domain Bound State and Its Fabrication Method - Google Patents

High-Q Refractive Index Sensor Based on Quasi-Continuous Domain Bound State and Its Fabrication Method Download PDF

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CN114577753A
CN114577753A CN202210206357.XA CN202210206357A CN114577753A CN 114577753 A CN114577753 A CN 114577753A CN 202210206357 A CN202210206357 A CN 202210206357A CN 114577753 A CN114577753 A CN 114577753A
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refractive index
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CN114577753B (en
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杜庆国
刘欣欣
屠世娟
梁坤林
李政颖
王原丽
付琴
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    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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Abstract

The invention relates to the technical field of metamaterials, in particular to a high-Q-value refractive index sensor based on a quasi-continuous domain bound state and a preparation method thereof. The all-dielectric super-surface structure array is formed by periodically arranging a plurality of all-dielectric super-surface units, each all-dielectric super-surface unit is a square block structure, a notch is formed in one side face of each square block structure along the x direction, the position, the orientation, the shape and the size of each notch formed in each square block structure are identical, and the all-dielectric super-surface unit provided with the notch is used for exciting magnetic dipole moment along the z direction when plane waves polarized along the x direction are normally incident to form a bound state in a quasi-continuous domain and forming a resonant cavity with a high Q value by utilizing the bound state in the quasi-continuous domain. According to the invention, the symmetry of the structure in the x direction is broken, so that the continuous domain bound state is converted into the quasi-continuous domain bound state, a very high Q value is obtained, and the sensing performance of the refractive index sensor is improved to a great extent.

Description

基于准连续域束缚态的高Q值折射率传感器及其制备方法High-Q Refractive Index Sensor Based on Quasi-Continuous Domain Bound State and Its Fabrication Method

技术领域technical field

本发明涉及超材料技术领域,具体涉及一种基于准连续域束缚态的高Q值折射率传感器及其制备方法。The invention relates to the technical field of metamaterials, in particular to a high-Q-value refractive index sensor based on a quasi-continuous domain bound state and a preparation method thereof.

背景技术Background technique

超表面为光学器件小型化指引了新的方向。超表面是一种二维的纳米超材料,一般由亚波长的人工单元结构组成,通过人为设计单元结构及其排列方式,可以制造出不同于自然界材料特性的结构。目前,超表面通常可分为基于表面等离激元的金属超表面和基于米氏谐振的全介质超表面,可应用于折射率传感、光学成像、高次谐波生成等领域。Metasurfaces point a new direction for the miniaturization of optical devices. A metasurface is a two-dimensional nanometer metamaterial, which is generally composed of subwavelength artificial unit structures. By artificially designing the unit structures and their arrangement, structures that are different from the properties of natural materials can be fabricated. At present, metasurfaces can usually be divided into metal metasurfaces based on surface plasmons and all-dielectric metasurfaces based on Mie resonance, which can be used in refractive index sensing, optical imaging, high-order harmonic generation and other fields.

灵敏度和品质因数是折射率传感器重点关注的两个指标,Q值用于衡量谐振谱线的宽度,当灵敏度大小一定时,谐振谱线Q值越高,折射率传感的品质因数越高。由于金属材料存在的欧姆损耗,通常其共振谱线线宽的Q值较低,从而限制了其在折射率传感器方面的应用。基于介电材料的折射率传感器以位移电流代替欧姆电流,减少了欧姆损耗,同时提高了谐振谱线的Q值。介电材料还可激发除电谐振以外的磁谐振、环偶谐振、高阶谐振等模式,不同模式的耦合产生的强局域场有利于形成Q值极高的极窄线宽谱线,大大增强了折射率传感的性能。Sensitivity and quality factor are the two key indicators of refractive index sensors. The Q value is used to measure the width of the resonant spectral line. When the sensitivity is constant, the higher the Q value of the resonant spectral line, the higher the quality factor of the refractive index sensor. Due to the ohmic loss of metal materials, the Q value of the resonant spectral linewidth is usually low, which limits its application in refractive index sensors. The refractive index sensor based on dielectric materials replaces the ohmic current with displacement current, which reduces the ohmic loss and improves the Q value of the resonant spectral line. Dielectric materials can also excite modes such as magnetic resonance, ring-pair resonance, and high-order resonance in addition to electrical resonance. Enhanced refractive index sensing performance.

连续域中的束缚态(Bound-States-in-the-Continuum,BIC)是一种共振频率位于辐射连续域中,但与辐射态完全解耦的模态,也被称为捕获模式(trapped mode)。理论上,由BIC激发的谐振的Q值是无穷大且共振线宽为0,但它只能存在于无损无限的结构中,不能用于现实的折射率传感实验中。现实中,由BIC激发的谐振仍然具有一定的辐射损耗,限制了谐振Q值的进一步提高,导致折射率传感器的传感性能并不理想。Bound-States-in-the-Continuum (BIC) in the continuum domain is a mode whose resonant frequency is located in the radiation continuum domain, but is completely decoupled from the radiation state, also known as trapped mode. ). Theoretically, the Q value of the resonance excited by BIC is infinite and the resonance linewidth is 0, but it can only exist in a lossless infinite structure and cannot be used in practical refractive index sensing experiments. In reality, the resonance excited by the BIC still has a certain radiation loss, which limits the further improvement of the resonance Q value, resulting in an unsatisfactory sensing performance of the refractive index sensor.

发明内容SUMMARY OF THE INVENTION

本发明的目的就是针对现有技术的缺陷,提供一种基于准连续域束缚态的高Q值折射率传感器及其制备方法,通过破坏结构在x方向的对称性,使BIC转为准连续域中的束缚态(quasi-BIC,QBIC),从而获得极高的Q值,在很大程度上提高了折射率传感器的传感性能。The purpose of the present invention is to provide a high-Q refractive index sensor based on the bound state of the quasi-continuous domain and a preparation method thereof, aiming at the defects of the prior art. The bound state (quasi-BIC, QBIC) in , so as to obtain an extremely high Q value, which greatly improves the sensing performance of the refractive index sensor.

本发明提供一种基于准连续域束缚态的高Q值折射率传感器,其技术方案为:包括基底层和位于基底层上的全介质超表面结构阵列,所述全介质超表面结构阵列由若干个全介质超表面单元周期性排列形成,所述全介质超表面单元为方形块结构,所述方形块结构在沿x方向的一侧面上设有缺口,各方形块结构上设置的缺口的位置、朝向、形状和大小均相同,设有所述缺口的全介质超表面单元用于在沿x方向偏振的平面波正入射时,激发沿z方向的磁偶极矩,形成准连续域中的束缚态,并利用所述准连续域中的束缚态形成高Q值的谐振腔;The present invention provides a high-Q refractive index sensor based on a quasi-continuous domain bound state. The all-dielectric metasurface units are periodically arranged to form, and the all-dielectric metasurface unit is a square block structure, the square block structure is provided with a gap on one side along the x direction, and the position of the gap set on each square block structure is , the orientation, shape and size are all the same, and the all-dielectric metasurface unit with the gap is used to excite the magnetic dipole moment along the z-direction when the plane wave polarized along the x-direction is normal incident, forming a confinement in the quasi-continuous domain state, and use the bound state in the quasi-continuous domain to form a high-Q resonant cavity;

其中,x方向为基底层长度方向,y方向为基底层宽度方向,z方向为基底层高度方向。The x direction is the length direction of the base layer, the y direction is the width direction of the base layer, and the z direction is the height direction of the base layer.

较为优选的,每个所述方形块结构仅设置一个缺口,且所述缺口为弧形缺口,所述弧形缺口的弧形面与方形块结构的上表面垂直。More preferably, each of the square block structures is provided with only one notch, and the notch is an arc-shaped notch, and the arc-shaped surface of the arc-shaped notch is perpendicular to the upper surface of the square block structure.

较为优选的,弧形缺口所在圆的直径不小于所述方形块结构沿x方向的长度。More preferably, the diameter of the circle where the arc-shaped notch is located is not less than the length of the square block structure along the x direction.

较为优选的,所述弧形缺口与方形块结构之间满足以下关系:More preferably, the following relationship is satisfied between the arc-shaped gap and the square block structure:

Figure BDA0003528018760000031
Figure BDA0003528018760000031

其中,h为弧形缺口所在圆的圆心距方形块结构的x向中线的垂直距离,r为弧形缺口所在圆的半径,a为方形块结构的x向长度。Among them, h is the vertical distance from the center of the circle where the arc-shaped gap is located to the x-direction centerline of the square block structure, r is the radius of the circle where the arc-shaped gap is located, and a is the x-direction length of the square block structure.

较为优选的,所述弧形面与方形块结构沿y方向的两侧面相切。More preferably, the arc-shaped surface is tangent to both side surfaces of the square block structure along the y-direction.

较为优选的,所述全介质超表面单元沿x方向和y方向的排布周期相等,所述排布周期为7/20*a~5/7*a,a为全介质超表面单元沿x方向的长度。More preferably, the arrangement period of the all-dielectric metasurface units along the x-direction and the y-direction is equal, and the arrangement period is 7/20*a~5/7*a, where a is the all-dielectric metasurface unit along the x direction. the length of the direction.

较为优选的,所述全介质超表面单元沿x方向和y方向的排布周期为700nm-1000nm,全介质超表面单元沿x方向的长度a为350-500nm,弧形面所在圆的半径为175-260nm。More preferably, the arrangement period of the all-dielectric metasurface unit along the x direction and the y direction is 700nm-1000nm, the length a of the all-dielectric metasurface unit along the x direction is 350-500nm, and the radius of the circle where the arc-shaped surface is located is 175-260nm.

本方案还提供一种基于准连续域束缚态的高Q值折射率传感器的制备方法,包括The solution also provides a preparation method of a high-Q refractive index sensor based on a quasi-continuous domain bound state, comprising:

在石英基底上均匀的镀上一层光刻胶;A layer of photoresist is evenly plated on the quartz substrate;

使用电子束曝光法在所述光刻胶上绘制出全介质超表面单元的图案,所述图案在光刻胶表面呈周期性阵列分布,所述图案为带缺口的正方形,所述缺口位于正方形沿x方向的一条侧边上,所述缺口为弧形缺口;A pattern of all-dielectric metasurface units is drawn on the photoresist using electron beam exposure, the pattern is distributed in a periodic array on the surface of the photoresist, and the pattern is a square with a gap, and the gap is located in a square On one side edge along the x direction, the gap is an arc gap;

将绘制完图案的样品置于预先配置的显影液中进行溶解,使光刻胶上绘制图案处形成空腔;Dissolve the patterned sample in a preconfigured developer solution, so that a cavity is formed on the photoresist where the pattern is drawn;

使用化学气相沉积法在所述空腔内沉积出一层指定厚度的硅薄膜;depositing a silicon thin film with a specified thickness in the cavity by chemical vapor deposition;

去除所述光刻胶,形成基于准连续域束缚态的高Q值折射率传感器,所述基于准连续域束缚态的高Q值折射率传感器可在沿x方向偏振的平面波正入射时,激发沿z方向的磁偶极矩,形成准连续域中的束缚态,并利用所述准连续域中的束缚态形成高Q值的谐振腔。The photoresist is removed to form a high-Q refractive index sensor based on a quasi-continuous domain bound state, and the high-Q refractive index sensor based on a quasi-continuous domain bound state can be excited when a plane wave polarized along the x-direction is normally incident. The magnetic dipole moment along the z-direction forms bound states in a quasi-continuous domain, and uses the bound states in the quasi-continuous domain to form a high-Q resonant cavity.

本发明的有益效果为:通过在方形块的全介质超表面单元的x向中引入缺口,打破了超表面单元结构的对称性。当沿x方向偏振的平面波正入射时,激发了沿z方向的磁偶极矩,其谐振模式是绕z轴旋转180°重合的偶模式,由于与沿z向传播的平面波所激发的奇模式不匹配,两种模式不会发生耦合,从而形成了QBIC,在透射谱线中以Fano共振谱线的形式体现出来。本发明利用QBIC产生了高Q值的谐振腔,并带来了强局域场增强,将其应用在折射率传感领域实现了超高品质因数。本发明结构设计简单、易于加工,在化学生物传感等领域有重要的应用。The beneficial effect of the present invention is that the symmetry of the structure of the metasurface unit is broken by introducing a notch in the x-direction of the all-dielectric metasurface unit of the square block. When a plane wave polarized in the x-direction is incident normally, a magnetic dipole moment in the z-direction is excited, and its resonant mode is an even mode that is rotated 180° around the z-axis, due to the odd mode excited by the plane wave propagating in the z-direction Mismatched, the two modes do not couple, resulting in a QBIC, which manifests as a Fano resonance line in the transmission line. The invention utilizes the QBIC to generate a resonant cavity with a high Q value, and brings about a strong local field enhancement, and is applied in the field of refractive index sensing to achieve an ultra-high quality factor. The invention has simple structural design and easy processing, and has important applications in the fields of chemical biosensing and the like.

附图说明Description of drawings

图1为本发明一种基于准连续域束缚态的高Q值折射率传感器的结构示意图;1 is a schematic structural diagram of a high-Q refractive index sensor based on a quasi-continuous domain bound state of the present invention;

图2为本发明全介质超表面单元为正方形块时的结构示意图;Fig. 2 is the structural schematic diagram when the all-dielectric metasurface unit of the present invention is a square block;

图3为本发明全介质超表面单元为正方形块时的俯视图;3 is a top view when the all-dielectric metasurface unit of the present invention is a square block;

图4为正方形硅块与带圆弧形缺口的正方形硅块在边长相同条件下的透射谱;Fig. 4 is the transmission spectrum of the square silicon block and the square silicon block with the arc-shaped notch under the condition of the same side length;

图5为谐振波长处的厚度为结构高度一半时的xy截面的电流分布示意图;5 is a schematic diagram of the current distribution of the xy cross-section when the thickness at the resonance wavelength is half the height of the structure;

图6散射能量的多极分解结果图;Figure 6. Multipole decomposition result diagram of scattered energy;

图7谐振波长处相同破缺面积下的不同缺口结构的电磁场分布图;Fig. 7 Electromagnetic field distribution diagram of different notch structures under the same broken area at the resonance wavelength;

图8透射谱随折射率变化图;Fig. 8 is a graph of the change of the transmission spectrum with the refractive index;

图9共振波长和周围介质折射率变化关系图;Fig. 9 is a graph of the relationship between the resonance wavelength and the refractive index change of the surrounding medium;

图10为本发明全介质超表面单元为长方形块时的俯视图;。Fig. 10 is a top view when the all-dielectric metasurface unit of the present invention is a rectangular block;

图中:1-基底层,2-全介质超表面单元,3-缺口,4-全介质超表面结构阵列,5-弧形面In the figure: 1-Base layer, 2-All-dielectric metasurface unit, 3-Notch, 4-All-dielectric metasurface structure array, 5-Arc surface

具体实施方式Detailed ways

为了使本申请所要解决的技术问题、技术方案及有益效果更加清楚明白,以下结合附图及实施例,对本申请进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本申请,并不用于限定本申请。In order to make the technical problems, technical solutions and beneficial effects to be solved by the present application clearer, the present application will be described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application, but not to limit the present application.

需要说明的是,当元件被称为“固定于”或“设置于”另一个元件,它可以直接在另一个元件上或者间接在该另一个元件上。当一个元件被称为是“连接于”另一个元件,它可以是直接连接到另一个元件或间接连接至该另一个元件上。It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

需要理解的是,术语“长度”、“宽度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。It is to be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top" , "bottom", "inside", "outside", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, which are only for the convenience of describing the application and simplifying the description, rather than indicating or implying the indicated device. Or elements must have a particular orientation, be constructed and operate in a particular orientation, and therefore should not be construed as a limitation of the present application.

此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。In addition, the terms "first" and "second" are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, a feature defined as "first" or "second" may expressly or implicitly include one or more of that feature. In the description of the present application, "plurality" means two or more, unless otherwise expressly and specifically defined.

本发明一种基于准连续域束缚态的高Q值折射率传感器,包括基底层1和位于基底层1上的全介质超表面结构阵列4,全介质超表面结构阵列4由若干个全介质超表面单元2周期性排列形成,全介质超表面单元2为方形块结构,方形块结构在沿x方向的一侧面上设有缺口3,各方形块结构上设置的缺口3的位置、朝向、形状和大小均相同,设有缺口3的全介质超表面单元2用于在沿x方向偏振的平面波正入射时,激发沿z方向的磁偶极矩,形成准连续域中的束缚态,并利用准连续域中的束缚态形成高Q值的谐振腔;A high-Q refractive index sensor based on a quasi-continuous domain bound state of the present invention includes a base layer 1 and an all-dielectric metasurface structure array 4 located on the base layer 1. The all-dielectric metasurface structure array 4 is composed of several all-dielectric metasurface structures. The surface units 2 are periodically arranged and formed. The all-dielectric metasurface unit 2 is a square block structure. The square block structure is provided with a gap 3 on one side along the x direction. The position, orientation and shape of the gap 3 set on each square block structure The all-dielectric metasurface unit 2 with the gap 3 is used to excite the magnetic dipole moment along the z-direction when the plane wave polarized along the x-direction is normal incident, forming bound states in the quasi-continuous domain, and using The bound states in the quasi-continuous domain form high-Q resonators;

其中,x方向为基底层1长度方向,y方向为基底层1宽度方向,z方向为基底层1高度方向,本方案的方形块结构沿x方向的边长a与沿y方向的边长b可以相等,即该方形块结构为正方形块;也可边长a与边长b不相等,即该方形块结构为长方形块。Among them, the x direction is the length direction of the base layer 1, the y direction is the width direction of the base layer 1, and the z direction is the height direction of the base layer 1. The square block structure of this scheme has the side length a along the x direction and the side length b along the y direction. It can be equal, that is, the square block structure is a square block; or the side length a and the side length b are not equal, that is, the square block structure is a rectangular block.

缺口3可以是多个,也可以是单个,缺口的形状可以是方形、v型、U型、弧形等结构。The notch 3 may be multiple or single, and the shape of the notch may be a square, a V-shaped, a U-shaped, an arc, or the like.

本方案利用结构对称性的缺破将基本无辐射、Q值无限大的BIC模式转换为辐射较低、Q值较大的QBIC模式,在谐振波长处激发了原本不能被入射光激发的谐振模式,其共振线宽极窄并伴随着局域电场增强现象,从而在光学传感器件的研制方面具有很大的现实意义。This scheme utilizes the break of structural symmetry to convert the BIC mode with basically no radiation and infinite Q value to the QBIC mode with lower radiation and larger Q value, and excites the resonance mode that cannot be excited by the incident light at the resonance wavelength. , its resonance line width is extremely narrow and accompanied by the phenomenon of localized electric field enhancement, so it has great practical significance in the development of optical sensing devices.

实施例一Example 1

图1、2示出了本申请一种实施例提供的一种基于准连续域束缚态的高Q值折射率传感器的结构示意图,该实施例选取的方形块结构为正方形块,为了便于说明,仅示出了与本实施例相关的部分,详述如下:1 and 2 show a schematic structural diagram of a high-Q refractive index sensor based on a quasi-continuous domain bound state provided by an embodiment of the present application. The square block structure selected in this embodiment is a square block. For the convenience of description, Only the parts related to this embodiment are shown, and the details are as follows:

本实施例中,每个方形块结构仅设置一个缺口3,且缺口3为弧形缺口,弧形缺口的弧形面5与方形块结构的上表面垂直。In this embodiment, each square block structure is provided with only one notch 3, and the notch 3 is an arc-shaped notch, and the arc-shaped surface 5 of the arc-shaped notch is perpendicular to the upper surface of the square block structure.

弧形缺口所在圆的直径不小于方形块结构沿x方向的长度。The diameter of the circle where the arc-shaped notch is located is not less than the length of the square block structure along the x direction.

弧形缺口与方形块结构之间满足以下关系:The following relationship is satisfied between the arc notch and the square block structure:

Figure BDA0003528018760000061
Figure BDA0003528018760000061

其中,h为弧形缺口所在圆的圆心距方形块结构的x向中线的垂直距离(也是圆心与方形块中心的距离),r为弧形缺口所在圆的半径,a为方形块结构的x向长度。Among them, h is the vertical distance from the center of the circle where the arc-shaped gap is located to the x-direction centerline of the square block structure (also the distance between the center of the circle and the center of the square block), r is the radius of the circle where the arc-shaped gap is located, and a is the x of the square block structure to length.

如图3所示,当h在满足表达式的范围中取值时,弧形面5始终与方形块结构沿y方向的两侧面相切或者相交。根据表达式可知,弧形面5对应圆的圆心既可以位于方形体外侧,也可位于方形体的该侧边上,但不应位于方形体内部。同时由于

Figure BDA0003528018760000071
所以弧形面5底部始终不低于正方形的中心点。As shown in FIG. 3 , when h takes a value in the range satisfying the expression, the arc-shaped surface 5 is always tangent or intersecting with both sides of the square block structure along the y-direction. According to the expression, the center of the circle corresponding to the arc-shaped surface 5 can be located either outside the square body or on the side of the square body, but should not be located inside the square body. At the same time due to
Figure BDA0003528018760000071
Therefore, the bottom of the arc surface 5 is always not lower than the center point of the square.

全介质超表面单元2沿x方向和y方向的排布周期相等,排布周期为7/20*a~5/7*a,a为全介质超表面单元2沿x方向的长度。The arrangement period of the all-dielectric metasurface unit 2 along the x-direction and the y-direction is equal, and the arrangement period is 7/20*a~5/7*a, where a is the length of the all-dielectric metasurface unit 2 along the x-direction.

较为优选的,全介质超表面单元2沿x方向和y方向的排布周期为700nm-1000nm,全介质超表面单元2沿x方向的长度a为350-500nm,弧形面5所在圆的半径为175-260nm,全介质超表面单元2沿z方向的高度为20-60nm。More preferably, the arrangement period of the all-dielectric metasurface unit 2 along the x-direction and the y-direction is 700nm-1000nm, the length a of the all-dielectric metasurface unit 2 along the x-direction is 350-500nm, and the radius of the circle where the arcuate surface 5 is located. is 175-260 nm, and the height of the all-dielectric metasurface unit 2 along the z-direction is 20-60 nm.

弧形的缺口相比于三角形、方形缺口等其它形状的缺口而言,在方形超表面结构内部引入圆弧形缺口可最大程度提高电磁场的局域能力,而且可以扩大局域电磁场增强的范围,从而更加有利于传感性能的提高。Compared with the gaps of other shapes such as triangles and square gaps, the introduction of arc-shaped gaps inside the square metasurface structure can maximize the localization ability of the electromagnetic field, and can expand the scope of local electromagnetic field enhancement. Thus, it is more beneficial to improve the sensing performance.

实施例二Embodiment 2

本实施例提供了一种基于准连续域束缚态的高Q值折射率传感器的制备方法,包括This embodiment provides a method for fabricating a high-Q refractive index sensor based on a quasi-continuous domain bound state, comprising:

在石英基底上均匀的镀上一层光刻胶,该光刻胶选用正性光刻胶;A layer of photoresist is evenly plated on the quartz substrate, and the photoresist is positive photoresist;

使用电子束曝光法在光刻胶上绘制出全介质超表面单元2的图案,图案在光刻胶表面呈周期性阵列分布,图案为带缺口3的正方形,缺口3位于正方形沿x方向的一条侧边上,缺口3为弧形缺口;The pattern of the all-dielectric metasurface unit 2 is drawn on the photoresist using the electron beam exposure method. The pattern is distributed in a periodic array on the surface of the photoresist, and the pattern is a square with a notch 3. On the side, the gap 3 is an arc gap;

将绘制完图案的样品置于预先配置的显影液中进行溶解,使光刻胶上绘制图案处形成空腔;Dissolve the patterned sample in a preconfigured developer solution, so that a cavity is formed on the photoresist where the pattern is drawn;

使用化学气相沉积法在空腔内沉积出一层指定厚度的硅薄膜;A silicon thin film of a specified thickness is deposited in the cavity by chemical vapor deposition;

去除光刻胶,形成基于准连续域束缚态的高Q值折射率传感器,基于准连续域束缚态的高Q值折射率传感器可在沿x方向偏振的平面波正入射时,激发沿z方向的磁偶极矩,形成准连续域中的束缚态,并利用准连续域中的束缚态形成高Q值的谐振腔。The photoresist is removed to form a high-Q refractive index sensor based on the quasi-continuous bound state. The high-Q refractive index sensor based on the quasi-continuous bound state can excite the z-direction when the plane wave polarized along the x-direction is normal incident. The magnetic dipole moment forms the bound state in the quasi-continuous domain, and uses the bound state in the quasi-continuous domain to form a high-Q resonator.

实施例三Embodiment 3

本实施例提供了另一种基于准连续域束缚态的高Q值折射率传感器的制备方法,包括This embodiment provides another method for fabricating a high-Q refractive index sensor based on a quasi-continuous domain bound state, comprising:

使用化学气相沉积法在石英基底上沉积一层固定厚度的硅薄膜;A silicon film of a fixed thickness is deposited on a quartz substrate using chemical vapor deposition;

在硅薄膜上均匀的镀上光刻胶;The photoresist is evenly plated on the silicon film;

使用电子束曝光法在光刻胶上绘制出全介质超表面单元的图案,图案在光刻胶表面层周期性阵列分布,图案为带缺口的正方形,缺口位于正方形沿x方向的一条侧边上,缺口为弧形缺口;The pattern of the all-dielectric metasurface unit was drawn on the photoresist using the electron beam exposure method. The pattern is distributed in a periodic array on the surface layer of the photoresist. The pattern is a square with a gap, and the gap is located on one side of the square along the x direction. , the gap is an arc gap;

将绘制完图案的样品置于预先配置的显影液中,使光刻胶上除图案之外的其余区域均被溶解;Place the patterned sample in a pre-configured developer solution to dissolve the rest of the photoresist except for the pattern;

利用反应离子刻蚀的方法对样品表面进行刻蚀,形成基于准连续域束缚态的高Q值折射率传感器,基于准连续域束缚态的高Q值折射率传感器可在沿x方向偏振的平面波正入射时,激发沿z方向的磁偶极矩,形成准连续域中的束缚态,并利用准连续域中的束缚态形成高Q值的谐振腔。The surface of the sample is etched by reactive ion etching to form a high-Q refractive index sensor based on the quasi-continuum bound state. At normal incidence, the magnetic dipole moment along the z-direction is excited, forming bound states in the quasi-continuous domain, and using the bound states in the quasi-continuous domain to form high-Q resonators.

在该制备方法中,光刻胶采用负性光刻胶,具体采用聚甲基丙烯酸甲酯光刻胶。在沉积硅薄膜之前,还包括将石英基底放置在超声波清洗机中进行清洗,并在超声结束后使用去离子水清洗石英基底,最后使用气枪进行吹干。In the preparation method, the photoresist is a negative photoresist, specifically a polymethyl methacrylate photoresist. Before depositing the silicon film, it also includes placing the quartz substrate in an ultrasonic cleaner for cleaning, and cleaning the quartz substrate with deionized water after the ultrasonication, and finally blowing it with an air gun.

本实施例中先沉积硅薄膜,再采用负性光刻胶显影刻蚀,相较于另一实施例中的先采用正性光刻胶显影出空腔,再沉积填充硅薄膜的方法具有以下优势:In this embodiment, a silicon film is deposited first, and then a negative photoresist is used to develop and etch. Compared with another embodiment, the method of first using a positive photoresist to develop the cavity, and then depositing the filled silicon film has the following advantages: Advantage:

1、选择聚甲基丙烯酸甲酯(PMMA)等负性光刻胶,可以在电子束曝光过程中,使被曝光的光刻胶分子键断裂产生的新物质更容易溶解,从而有利于产生更清晰的图案,在更清晰的图案基础上刻蚀形成的全介质超表面单元边界更平整,从而使传感器的性能更优越。1. Selecting a negative photoresist such as polymethyl methacrylate (PMMA) can make the new substances generated by the breaking of the molecular bonds of the exposed photoresist easier to dissolve during the electron beam exposure process, which is conducive to the production of more A clear pattern, the all-dielectric metasurface unit formed by etching on the basis of a clearer pattern has a smoother boundary, so that the performance of the sensor is better.

2、由于需要制备的超表面阵列面积较大,先沉积硅薄膜,再采用负性光刻胶显影刻蚀,相较于先采用正性光刻胶显影出空腔,再沉积填充硅薄膜的方法,耗费的材料更少。2. Due to the large area of the metasurface array to be prepared, a silicon film is deposited first, and then developed and etched with a negative photoresist. method that consumes less material.

实施例四Embodiment 4

本实施例结合具体的取值参数,对本发明的传感器性能进行分析说明。本实施例的取值为:排布周期P的大小为900nm,正方形块的边长a为450nm;圆弧形缺口对应圆半径r为230nm;圆弧形缺口对应圆心距离单元中心的距离h为190nm;方形块结构的高度为30nm。In this embodiment, the performance of the sensor of the present invention is analyzed and explained in combination with specific value parameters. The values in this embodiment are: the size of the arrangement period P is 900 nm, the side length a of the square block is 450 nm; the radius r corresponding to the arc-shaped gap is 230 nm; the distance h between the center of the circle corresponding to the arc-shaped gap and the center of the unit is 190nm; the height of the square block structure is 30nm.

本实施例使用有限元方法模拟入射电磁波与全介质超表面结构阵列的相互作用。在仿真计算过程中,x轴方向和y轴方向设置为周期性边界条件,z轴方向即基底层高度方向设置为完美匹配层,全介质超表面单元的周围物质(在实际应用过程中,通过在全介质超表面单元结构上滴加不同折射率的液体,测量折射率的传感性能)的折射率n=1.45,入射电磁波设置为x方向偏振的平面波,沿z轴负方向入射。This embodiment uses the finite element method to simulate the interaction between incident electromagnetic waves and all-dielectric metasurface structure arrays. In the simulation calculation process, the x-axis direction and the y-axis direction are set as periodic boundary conditions, the z-axis direction, that is, the height direction of the base layer, is set as the perfect matching layer, and the surrounding material of the all-dielectric metasurface unit (in the actual application process, through Liquids with different refractive indices were dropped on the all-dielectric metasurface unit structure to measure the sensing performance of the refractive index (the refractive index n=1.45), and the incident electromagnetic wave was set as a plane wave polarized in the x-direction, incident along the negative direction of the z-axis.

通过上述仿真条件的设置计算正入射平面波的透射光谱,其结果如图4所示。当圆弧型缺口的半径为0即全介质超表面由正方形块组成时,在1307-1309nm波段时透射率基本为1,当引入圆弧形缺口且半径为230nm,可以在透射谱的波长为1307.5nm处发现一个极窄的Fano共振峰,其Q值可以达到130752。The transmission spectrum of the normal incident plane wave is calculated by the setting of the above simulation conditions, and the result is shown in Fig. 4. When the radius of the arc-shaped gap is 0, that is, the all-dielectric metasurface is composed of square blocks, the transmittance is basically 1 in the 1307-1309 nm band. When the arc-shaped gap is introduced and the radius is 230 nm, the wavelength of the transmission spectrum can be A very narrow Fano resonance peak is found at 1307.5nm, and its Q value can reach 130752.

为了更清楚地理解QBIC的形成原因,计算了全介质超表面单元在谐振波长处的xy截面上的位移电流分布,如图5所示。图5中,箭头的方向代表电流的方向,箭头的长短代表该点处电流的大小,灰度代表电场强度的大小。在xy截面上,位移电流呈现一种涡旋状,从而感应生成沿z方向的磁偶极矩,其与沿z向传播的平面波所激发的奇模式不匹配,两种模式之间不会发生耦合,由此形成了QBIC,在入射光的透射谱线中以Fano共振谱线的形式出现。QBIC的形成将绝大部分能量束缚在结构周围,从而使得透射率的最小值接近0。In order to understand the formation reasons of QBIC more clearly, the displacement current distribution on the xy cross-section of the all-dielectric metasurface unit at the resonance wavelength is calculated, as shown in Fig. 5. In Figure 5, the direction of the arrow represents the direction of the current, the length of the arrow represents the magnitude of the current at the point, and the gray scale represents the magnitude of the electric field intensity. In the xy section, the displacement current exhibits a vortex shape, which induces a magnetic dipole moment in the z direction, which does not match the odd mode excited by the plane wave propagating in the z direction, and does not occur between the two modes. The coupling, thereby forming a QBIC, appears as a Fano resonance line in the transmission line of the incident light. The formation of the QBIC traps most of the energy around the structure, resulting in a transmittance minimum close to zero.

笛卡尔坐标系下的多极能量分解结果如图6所示,可以更加清楚观察出各个谐振的散射功率,其中,Ip代表电偶极子的散射能量,Im代表磁偶极子的散射能量,It代表环偶极子的散射能量,IQe代表电四极子的散射能量,IQm代表磁四极子的散射能量。由图6可以看出,在共振波长处,磁偶极子的散射功率占据主导地位,这与图5分析结果一致。同时我们可以观察到电四极子的散射功率几乎与磁偶极子相当,这是因为围绕在超表面结构周围内部的电流在共振波长处也形成了两对相互对立的电流,这正是电四极子的特征。The multipole energy decomposition results in the Cartesian coordinate system are shown in Figure 6, and the scattered power of each resonance can be observed more clearly, where I p represents the scattered energy of the electric dipole, and I m represents the scattering of the magnetic dipole. The energy, I t represents the scattered energy of the ring dipole, I Qe the scattered energy of the electric quadrupole, and I Qm the scattered energy of the magnetic quadrupole. It can be seen from Fig. 6 that at the resonance wavelength, the scattering power of the magnetic dipole dominates, which is consistent with the analysis result in Fig. 5. At the same time, we can observe that the scattering power of the electric quadrupole is almost equal to that of the magnetic dipole. This is because the current surrounding the interior of the metasurface structure also forms two pairs of opposite currents at the resonance wavelength, which is exactly the same as the electric current. Characteristics of a quadrupole.

同时,为了找出具有最佳电场增益效果的缺口形状和缺口数量,我们对不同的数量、缺口形状的组合进行了大量试验,最终得到最优的缺口为单缺口,且弧形缺口形式。以单缺口中的三角形、方形、圆弧形三种不同形状,且所有缺口所占面积几乎相等时为例进行了验证,其结果如图7所示。弧形缺口与其他两种形状的缺口相比,我们可以通过比颜色图得出圆弧形缺口局域电场的能量最强;另外与正方形缺口相比,三角形与圆弧形缺口可以扩大局域电场增强的面积,而圆弧形缺口相较于三角形缺口,其具有最好的局域电场的能力,从而可以更大程度提高折射率传感的性能。At the same time, in order to find out the notch shape and the number of notch with the best electric field gain effect, we carried out a lot of experiments on the combination of different numbers and notch shapes, and finally obtained the optimal notch as a single notch and an arc-shaped notch. It is verified by taking three different shapes of triangle, square and circular arc in a single gap, and the area occupied by all gaps is almost equal, and the results are shown in Figure 7. Compared with the other two shapes of the arc notch, we can find that the local electric field energy of the arc notch is the strongest by comparing the color map; in addition, compared with the square notch, the triangular and circular arc notch can enlarge the local area Compared with the triangular notch, the arc-shaped notch has the best local electric field capability, which can greatly improve the performance of the refractive index sensing.

将此能产生高Q值的全介质超表面应用在折射率传感领域,通过改变结构周围环境的折射率,观测谐振波长的偏移量,利用两者的比值计算出该结构的折射率传感的灵敏度(S)和品质因数(FOM)。具体的,结构的传感性能的计算结果如图8和图9所示,通过计算透射谱谐振波长偏移量Δλ以及折射率变化量Δn,可计算出折射率传感的灵敏度

Figure BDA0003528018760000111
通过计算透射谱的平均半高全宽(Full Width at Half Maximum,FWHM)为0.01nm,可以计算出折射率传感的品质因数
Figure BDA0003528018760000112
This all-dielectric metasurface, which can generate high Q value, is applied in the field of refractive index sensing. By changing the refractive index of the surrounding environment of the structure, the shift of the resonance wavelength is observed, and the ratio of the two is used to calculate the refractive index transfer of the structure. Sensitivity (S) and figure of merit (FOM) of the sense. Specifically, the calculation results of the sensing performance of the structure are shown in Figures 8 and 9. By calculating the resonance wavelength shift Δλ of the transmission spectrum and the refractive index change Δn, the sensitivity of the refractive index sensing can be calculated.
Figure BDA0003528018760000111
By calculating the average full width at half maximum (FWHM) of the transmission spectrum to be 0.01 nm, the quality factor of the refractive index sensor can be calculated
Figure BDA0003528018760000112

综上,本发明通过在正方形硅块中引入圆弧形缺口,实现了Q值为130752的极窄Fano谱线,通过改变全介质超表面的周围环境的折射率,最终实现了灵敏度为434,品质因数为43400的传感性能。本发明具有易制备,体积小,品质因数高的特点,在生物传感领域具有十分广阔的应用前景。In summary, the present invention achieves a very narrow Fano spectral line with a Q value of 130752 by introducing a circular arc-shaped notch in a square silicon block, and finally achieves a sensitivity of 434 by changing the refractive index of the surrounding environment of the all-dielectric metasurface, Sensing performance with a figure of merit of 43400. The invention has the characteristics of easy preparation, small volume and high quality factor, and has a very broad application prospect in the field of biological sensing.

实施例五Embodiment 5

如图10示出了本发明又一实施例进行说明,该实施例选取的方形块结构为长方形块,该长方形块满足沿x方向的边长a大于沿y方向的边长b。FIG. 10 shows another embodiment of the present invention for illustration. The square block structure selected in this embodiment is a rectangular block, and the rectangular block satisfies that the side length a along the x direction is greater than the side length b along the y direction.

在参数优化的过程中,我们发现,如果以方形超表面的最底层边的边长为固定值a(即沿x方向的边长为a),那么通过几何关系的计算我们可以得出不对称因子α=圆弧破缺面积/(a*a),不对称因子α会随着破缺面积的增大逐渐增大,即所剩面积越小所对应的谐振腔的Q值越高。所以当圆弧对应圆心位于边长为a的正方形内部时,谐振腔的Q值更高。圆弧对应圆心位于边长为a的正方形内部时,将其缺口部分补全,该几何结构会形成长方形,且长方形块沿x方向的边长a大于沿y方向的边长b。其几何结构可以由图10表示,相比于正方形结构来说,在如图所示的长方形结构的中引入缺口更能获得高Q因子的谐振腔。In the process of parameter optimization, we found that if the side length of the bottommost side of the square metasurface is a fixed value a (that is, the side length along the x direction is a), then through the calculation of the geometric relationship, we can get the asymmetry The factor α=arc broken area/(a*a), the asymmetry factor α will gradually increase with the increase of the broken area, that is, the smaller the remaining area, the higher the Q value of the resonant cavity. Therefore, when the center of the arc corresponding to the circle is located inside the square whose side length is a, the Q value of the resonant cavity is higher. When the center of the arc corresponding to the circle is located inside the square with the side length a, the gap is filled, the geometric structure will form a rectangle, and the side length a of the rectangular block along the x direction is greater than the side length b along the y direction. Its geometric structure can be shown in Fig. 10. Compared with the square structure, introducing a notch in the rectangular structure as shown in the figure can obtain a resonant cavity with a high Q factor.

应理解,上述实施例中各步骤的序号的大小并不意味着执行顺序的先后,各过程的执行顺序应以其功能和内在逻辑确定,而不应对本申请实施例的实施过程构成任何限定。It should be understood that the size of the sequence numbers of the steps in the above embodiments does not mean the sequence of execution, and the execution sequence of each process should be determined by its function and internal logic, and should not constitute any limitation to the implementation process of the embodiments of the present application.

以上所述实施例仅用以说明本申请的技术方案,而非对其限制;尽管参照前述实施例对本申请进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本申请各实施例技术方案的精神和范围,均应包含在本申请的保护范围之内。The above-mentioned embodiments are only used to illustrate the technical solutions of the present application, but not to limit them; although the present application has been described in detail with reference to the above-mentioned embodiments, those of ordinary skill in the art should understand that the above-mentioned implementations can still be used. The technical solutions recorded in the examples are modified, or some technical features thereof are equivalently replaced; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions in the embodiments of the application, and should be included in the within the scope of protection of this application.

Claims (8)

1.一种基于准连续域束缚态的高Q值折射率传感器,其特征在于:包括基底层(1)和位于基底层(1)上的全介质超表面结构阵列(4),所述全介质超表面结构阵列(4)由若干个全介质超表面单元(2)周期性排列形成,所述全介质超表面单元(2)为方形块结构,所述方形块结构在沿x方向的一侧面上设有缺口(3),各方形块结构上设置的缺口(3)的位置、朝向、形状和大小均相同,设有所述缺口(3)的全介质超表面单元(2)用于在沿x方向偏振的平面波正入射时,激发沿z方向的磁偶极矩,形成准连续域中的束缚态,并利用所述准连续域中的束缚态形成高Q值的谐振腔;1. A high-Q refractive index sensor based on a quasi-continuous domain bound state, characterized in that it comprises a base layer (1) and an all-dielectric metasurface structure array (4) located on the base layer (1), The dielectric metasurface structure array (4) is formed by periodically arranging a plurality of all-dielectric metasurface units (2), and the all-dielectric metasurface unit (2) is a square block structure, and the square block structure is in a direction along the x direction. A gap (3) is provided on the side surface, the position, orientation, shape and size of the gap (3) provided on each square block structure are the same, and the all-dielectric metasurface unit (2) provided with the gap (3) is used for When the plane wave polarized along the x-direction is normally incident, the magnetic dipole moment along the z-direction is excited to form a bound state in a quasi-continuous domain, and a high-Q resonator is formed by using the bound state in the quasi-continuous domain; 其中,x方向为基底层(1)长度方向,y方向为基底层(1)宽度方向,z方向为基底层(1)高度方向。Wherein, the x direction is the length direction of the base layer (1), the y direction is the width direction of the base layer (1), and the z direction is the height direction of the base layer (1). 2.根据权利要求1所述的基于准连续域束缚态的高Q值折射率传感器,其特征在于:每个所述方形块结构仅设置一个缺口(3),且所述缺口(3)为弧形缺口,所述弧形缺口的弧形面(5)与方形块结构的上表面垂直。2. The high-Q-value refractive index sensor based on quasi-continuous domain bound state according to claim 1, characterized in that: each of the square block structures is provided with only one gap (3), and the gap (3) is An arc-shaped gap, the arc-shaped surface (5) of the arc-shaped gap is perpendicular to the upper surface of the square block structure. 3.根据权利要求2所述的基于准连续域束缚态的高Q值折射率传感器,其特征在于:弧形缺口所在圆的直径不小于所述方形块结构沿x方向的长度。3 . The high-Q refractive index sensor based on the quasi-continuous domain bound state according to claim 2 , wherein the diameter of the circle where the arc-shaped gap is located is not less than the length of the square block structure along the x direction. 4 . 4.根据权利要求2所述的基于准连续域束缚态的高Q值折射率传感器,其特征在于,所述弧形缺口与方形块结构之间满足以下关系:4. The high-Q-value refractive index sensor based on the quasi-continuous domain bound state according to claim 2, wherein the arc-shaped gap and the square block structure satisfy the following relationship:
Figure FDA0003528018750000011
Figure FDA0003528018750000011
其中,h为弧形缺口所在圆的圆心距方形块结构的x向中线的垂直距离,r为弧形缺口所在圆的半径,a为方形块结构的x向长度。Among them, h is the vertical distance from the center of the circle where the arc-shaped gap is located to the x-direction centerline of the square block structure, r is the radius of the circle where the arc-shaped gap is located, and a is the x-direction length of the square block structure.
5.根据权利要求2所述的基于准连续域束缚态的高Q值折射率传感器,其特征在于:所述弧形面(5)与方形块结构沿y方向的两侧面相切。5 . The high-Q refractive index sensor based on quasi-continuous domain bound state according to claim 2 , wherein the arc-shaped surface ( 5 ) is tangent to both sides of the square block structure along the y-direction. 6 . 6.根据权利要求2所述的基于准连续域束缚态的高Q值折射率传感器,其特征在于:所述全介质超表面单元(2)沿x方向和y方向的排布周期相等,所述排布周期为7/20*a~5/7*a,a为全介质超表面单元(2)沿x方向的长度。6. The high-Q-value refractive index sensor based on the quasi-continuous domain bound state according to claim 2, characterized in that: the all-dielectric metasurface units (2) have equal periods of arrangement along the x-direction and the y-direction, so The arrangement period is 7/20*a~5/7*a, and a is the length of the all-dielectric metasurface unit (2) along the x direction. 7.根据权利要求6所述的基于准连续域束缚态的高Q值折射率传感器,其特征在于:所述全介质超表面单元(2)沿x方向和y方向的排布周期为700nm-1000nm,全介质超表面单元(2)沿x方向的长度a为350-500nm,弧形面(5)所在圆的半径为175-260nm。7. The high-Q-value refractive index sensor based on quasi-continuous domain bound state according to claim 6, characterized in that: the arrangement period of the all-dielectric metasurface unit (2) along the x-direction and the y-direction is 700nm- 1000 nm, the length a of the all-dielectric metasurface unit (2) along the x direction is 350-500 nm, and the radius of the circle where the arc-shaped surface (5) is located is 175-260 nm. 8.一种基于准连续域束缚态的高Q值折射率传感器的制备方法,其特征在于:包括8. A method for preparing a high-Q refractive index sensor based on a quasi-continuous domain bound state, characterized in that: comprising: 在石英基底上均匀的镀上一层光刻胶;A layer of photoresist is evenly plated on the quartz substrate; 使用电子束曝光法在所述光刻胶上绘制出全介质超表面单元(2)的图案,所述图案在光刻胶表面呈周期性阵列分布,所述图案为带缺口(3)的正方形,所述缺口(3)位于正方形沿x方向的一条侧边上,所述缺口(3)为弧形缺口;A pattern of all-dielectric metasurface units (2) is drawn on the photoresist using an electron beam exposure method, the pattern is distributed in a periodic array on the surface of the photoresist, and the pattern is a square with a gap (3) , the gap (3) is located on one side of the square along the x direction, and the gap (3) is an arc gap; 将绘制完图案的样品置于预先配置的显影液中进行溶解,使光刻胶上绘制图案处形成空腔;Dissolve the patterned sample in a pre-configured developer solution, so that a cavity is formed on the photoresist where the pattern is drawn; 使用化学气相沉积法在所述空腔内沉积出一层指定厚度的硅薄膜;depositing a silicon thin film with a specified thickness in the cavity by chemical vapor deposition; 去除所述光刻胶,形成基于准连续域束缚态的高Q值折射率传感器,所述基于准连续域束缚态的高Q值折射率传感器可在沿x方向偏振的平面波正入射时,激发沿z方向的磁偶极矩,形成准连续域中的束缚态,并利用所述准连续域中的束缚态形成高Q值的谐振腔。The photoresist is removed to form a high-Q-value refractive index sensor based on a quasi-continuous domain bound state, and the high-Q-value refractive index sensor based on a quasi-continuous domain bound state can be excited when a plane wave polarized along the x-direction is normally incident. The magnetic dipole moment along the z-direction forms bound states in a quasi-continuous domain, and uses the bound states in the quasi-continuous domain to form a high-Q resonant cavity.
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