CN114518695B - Correction method and exposure method of double-sided exposure system - Google Patents
Correction method and exposure method of double-sided exposure system Download PDFInfo
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- CN114518695B CN114518695B CN202011312520.8A CN202011312520A CN114518695B CN 114518695 B CN114518695 B CN 114518695B CN 202011312520 A CN202011312520 A CN 202011312520A CN 114518695 B CN114518695 B CN 114518695B
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- 238000012937 correction Methods 0.000 title claims abstract description 56
- 238000000034 method Methods 0.000 title claims abstract description 28
- 239000000758 substrate Substances 0.000 claims description 56
- 241000669003 Aspidiotus destructor Species 0.000 claims description 37
- 239000000463 material Substances 0.000 claims description 9
- 238000010586 diagram Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
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- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
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- 238000005562 fading Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
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- 229910000679 solder Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2032—Simultaneous exposure of the front side and the backside
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Abstract
The invention provides a correction method and an exposure method of a double-sided exposure system, wherein the double-sided exposure system comprises a correction alignment system and a correction system, the correction alignment system comprises at least two alignment cameras, one alignment camera of the correction alignment system is set as a reference camera, and a world coordinate system taking the reference camera as a reference is acquired; the rest alignment cameras are unified to the world coordinate system of the reference camera; the first exposure system and the second exposure system respectively expose the first graphic mark and the second graphic mark to a scale arranged on the motion platform; world coordinates of the first graphic mark and the second graphic mark are obtained through an alignment camera, and the world coordinates of the first exposure system and the second exposure system are obtained. And calculating graphic data position coordinate information of the first exposure system and the second exposure system according to world coordinates of the first exposure system and the second exposure system. And the coordinate systems of all the components are integrated into the same coordinate system, so that the position deviation of the upper and lower exposure is corrected, and the exposure precision is improved.
Description
Technical Field
The invention relates to the technical field of direct-writing exposure machines, in particular to a correction method and an exposure method of a double-sided exposure system.
Background
The exposure technology is widely applied to the field of semiconductor and PCB production, is one of the process steps for manufacturing semiconductor devices, chips and PCB products, and is used for printing characteristic patterns on the surface of a substrate, and finally, the pattern structure required by circuit design is obtained. The traditional photoetching technology needs to make a master mask or a film negative film of a mask for exposure operation, has long making period, corresponds to a single pattern, and cannot be widely applied. In order to solve the problem of the traditional exposure technology, the direct writing exposure mechanism has developed, and uses the digital light processing technology to edit different pattern structures through a programmable digital micro-mirror device, so that the patterns can be quickly switched, the cost can be reduced, the time of the manufacturing process can be reduced, and the direct writing exposure mechanism is widely applied to the technical field of photoetching.
The original direct-writing exposure machine only has a single table surface for bearing the substrate, and performs exposure operation on the substrate. Along with the continuous development of the direct-writing exposure machine and the pursuit of the productivity of the direct-writing exposure machine, a double-table direct-writing exposure machine and a double-sided direct-writing exposure machine are sequentially arranged, and the double-table direct-writing exposure machine can expose two substrates simultaneously to improve the productivity, but for the substrates with two sides needing to be exposed, the other side of the substrate needs to be exposed after one side of the substrate is exposed, and the other side of the substrate can be exposed through a turning plate and a transfer mechanism, so that the process needs to be subjected to two upper and lower plates, two contraposition and two exposure, and the operation is complex. The double-sided direct writing exposure machine can adopt one table board to expose two sides of one substrate at the same time, so that the operation is simpler and more convenient, and the efficiency is higher. However, as two sets of exposure and alignment systems exist in the double-sided direct-writing exposure machine, the non-uniformity of the coordinate system can cause deviation of patterns on the front surface and the back surface of the substrate, and the high-precision application requirement cannot be met.
Disclosure of Invention
In view of the above problems, the present invention provides a correction method and an exposure method for a double-sided exposure system, which improve the exposure accuracy of an exposure machine.
The technical scheme is as follows: the correction method of the double-sided exposure system comprises a moving platform and an exposure system, wherein the exposure system comprises a first exposure system and a second exposure system which are positioned on two opposite sides of the moving platform, the double-sided exposure system further comprises a correction alignment system, the correction alignment system comprises at least two alignment cameras, the alignment cameras are positioned on two opposite sides of the moving platform, world coordinates of the first exposure system and the second exposure system are obtained, alignment is carried out on a substrate on the moving platform, one alignment camera of the correction alignment system is set to be a reference camera, and a world coordinate system taking the reference camera as a reference is obtained; the other alignment cameras except the reference camera in the correction alignment system are unified to the world coordinate system of the reference camera; the first exposure system and the second exposure system respectively expose the first graphic mark and the second graphic mark to a scale arranged on the motion platform; and acquiring world coordinates of the first graphic mark and the second graphic mark through an alignment camera of the correction alignment system to obtain world coordinates of an exposure lens in the first exposure system and the second exposure system.
Further, the reference camera grabs the mark points on the scale to obtain coordinates of the mark points in a world coordinate system; and the rest of the alignment cameras respectively move to the corresponding positions to acquire the coordinate information of the mark points, and the positions of the rest of the alignment cameras, which move to the movement axes, are converted into world coordinates of the rest of the alignment cameras at the positions.
Further, at least one mark point on the scale is selected as a reference point, the reference camera acquires world coordinate values of all the reference points, the coordinates of the corresponding reference points acquired by other alignment cameras are recorded, and the world coordinate values of any position of the camera to be corrected are obtained by combining the world coordinate values of the reference points according to the difference value between the coordinates of any position of the other alignment cameras and the recorded coordinates of the corresponding reference point position.
Further, after the first exposure system exposes the first graphic mark to the scale, the alignment camera of the correction alignment system grabs the world coordinate of the first graphic mark; and moving the motion platform in the scanning direction, exposing a second graph to the scale by the second exposure system, and capturing world coordinates of the second graph mark by an alignment camera of the correction alignment system.
Further, the first exposure system exposes the first graphic mark to the scale, the alignment camera of the correction alignment system captures world coordinates of the first graphic mark, after the first graphic mark disappears on the scale, the second exposure system exposes the second graphic mark to the scale, and the alignment camera of the correction alignment system captures world coordinates of the second graphic mark.
Further, world coordinates of exposure lenses in the first exposure system and the second exposure system are calculated according to world coordinates of the first graphic mark and the second graphic mark and the moving distance of the moving platform.
The correction method of the double-sided exposure system for the inner layer plate comprises a moving platform and an exposure system, wherein the exposure system comprises a first exposure system and a second exposure system which are positioned on two opposite sides of the moving platform, the double-sided exposure system further comprises a correction alignment system, the correction alignment system comprises at least one alignment camera, one alignment camera is set as a reference camera, and a world coordinate system taking the reference camera as a reference is obtained; the first exposure system and the second exposure system respectively expose the first graphic mark and the second graphic mark to a scale arranged on the motion platform; world coordinates of the first graphic mark and the second graphic mark are obtained through a reference camera, and the world coordinates of the exposure lens in the first exposure system and the second exposure system are obtained.
Further, after the first exposure system exposes the first graphic mark to the scale, the reference camera grabs world coordinates of the first graphic mark; and moving the motion platform in the scanning direction, exposing a second graph to the scale by the second exposure system, and capturing world coordinates of the second graph mark by the reference camera.
Further, the first exposure system exposes the first graphic mark to the scale, the reference camera grabs world coordinates of the first graphic mark, and after the first graphic mark disappears on the scale, the second exposure system exposes the second graphic mark to the scale, and the reference camera grabs world coordinates of the second graphic mark.
Further, world coordinates of exposure lenses in the first exposure system and the second exposure system are calculated according to world coordinates of the first graphic mark and the second graphic mark and the moving distance of the moving platform.
Further, the scale is a transparent scale, and the transparent scale is provided with photosensitive materials.
The exposure method of the double-sided exposure system obtains world coordinates of the first exposure system and the second exposure system according to the correction method, and obtains graphic data of the first exposure system and the second exposure system according to the world coordinates of the first exposure system and the second exposure system.
The world coordinates of the first exposure system and the second exposure system correspond to the world coordinates of the substrate, the graphic data of the first exposure system and the second exposure system are obtained, and the world coordinates of the substrate are obtained by obtaining the alignment points on the substrate through the alignment camera of the correction alignment system.
The invention establishes a world coordinate system by setting the reference camera and taking the reference camera as a reference, and unifies an alignment camera except the reference camera and an exposure lens of the first exposure system and the second exposure system to the world coordinate system established by taking the reference camera as the reference by utilizing the scale. And the coordinate systems of all the components are integrated into the same coordinate system, so that the position deviation of the upper and lower exposure is corrected, and the exposure precision is improved.
Meanwhile, the alignment camera in the alignment correction system and the exposure lenses of the first exposure system and the second exposure system are unified to world coordinates through the reference camera, so that the trouble of mutual calibration and correction among the systems is avoided. The correction alignment system can not only achieve grabbing of substrate alignment points, but also achieve correction of the first exposure system and the second exposure system, and the same mechanism can achieve multiple purposes.
Drawings
FIG. 1 is a schematic diagram of a portion of a dual-sided exposure system according to one embodiment.
FIG. 2 is a schematic diagram of a portion of a dual-sided exposure system according to an embodiment.
Fig. 3 is a schematic view of a multi-row exposure lens scheme.
Fig. 4 is a schematic diagram of a motion platform.
FIG. 5 is a schematic illustration of the exposure pattern on the scale at time t 1-tn.
FIG. 6 is a schematic diagram of an embodiment of the first and second exposure systems exposing graphic indicia to the scale.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention.
As shown in fig. 1-6, a double-sided exposure system includes a motion stage 1, a correction alignment system 2, a first exposure system 3 located on one side of the motion stage 1, and a second exposure system 4 located on the opposite side of the motion stage. The motion platform 1 is used for carrying a substrate and a scale 5, the first exposure system 3 and the second exposure system 4 are used for carrying out exposure operation on the substrate, the correction alignment system 2 is used for establishing a world coordinate system, and the coordinates of the first exposure system 3 and the second exposure system 4 are unified to the same world coordinate system according to the correction alignment system 2.
The direction of exposing the first exposure system 3 and the second exposure system 3 to the substrate is set as a Z direction, a scanning direction of longitudinal movement of the moving stage toward the first exposure system 3 and the second exposure system 4 is set as a Y direction, and a sub-scanning movement of lateral movement of the moving stage 1 between the first exposure system 3 and the second exposure system 4 is set as an X direction. The side of the substrate, on which the exposure operation is completed by the first exposure system 3, is the front side, and the side, on which the exposure operation is completed by the second exposure system 4, is the back side. The above settings are only for clarity of description of the technical solution, and not limitation of the technical solution.
The first exposure system 3 includes a plurality of first exposure lenses 30 arranged in the X direction, and the first exposure lenses 30 perform an exposure operation on the front surface of the substrate placed on the motion stage 1. The second exposure system 4 includes a plurality of second exposure lenses 40 arranged in the X direction, and the second exposure lenses 40 perform an exposure operation on the back surface of the substrate placed on the motion stage 1. The arrangement of the first exposure lens 30 and the second exposure lens 40 is not limited to one row, and a plurality of rows of exposure lenses may be arranged in the Y direction, and any two adjacent rows of exposure lenses may be arranged in a staggered manner.
One end of the motion platform 1 is provided with a scale 5, and the scale 5 may be disposed at the front end of the motion platform 1 or the rear end of the motion platform. The scale 5 is provided with a mark point 50 and a photosensitive area 51 with fixed intervals, the photosensitive area 51 is positioned in a blank area on the scale 5, a photosensitive material is coated on the blank area to form a photosensitive pattern layer, the photosensitive material has a function of fading gradually after being sensitized, when the first exposure lens 30 and the second exposure lens 40 expose the photosensitive area 51, a graphic mark is formed in the photosensitive area 51, the graphic mark can fade gradually along with the time until completely disappearing, namely, the graphic mark automatically disappears after standing for a period of time, and the repeated use is convenient. Wherein the graphical indicia may take any shape, such as circular, square, etc.
As shown in fig. 5, at time t1, the first exposure lens or the second exposure lens exposes the graphic mark to the photosensitive area of the scale, and the graphic mark fades and finally disappears from time t2 to tn as time passes.
The photosensitive material can also be made of a disposable exposure material, and is attached to the scale 5 in a film form, and after the disposable exposure is completed, the used photosensitive material is removed, and a new photosensitive material is replaced; of course, the scale 5 may not have a gradual fading function, and after the calibration of one exposure is completed, the first exposure system 3 and the second exposure system 4 may perform the calibration of the next exposure by directly replacing the scale 5.
The correcting alignment system 2 comprises at least one driving mechanism and at least one alignment camera, wherein one alignment camera is used as a reference camera to establish a world coordinate system, the zero point of the world coordinate is the zero point of the reference camera, the moving direction of the reference camera is the X-axis direction of the world coordinate system, and the moving direction of the moving platform along the Y-direction is the Y-direction of the world coordinate system.
As shown in fig. 1-2, the calibration alignment system 2 preferably includes a first alignment system 20 and a second alignment system 21, wherein the first alignment system 20 faces the front surface of the substrate and the second alignment system 21 faces the back surface of the substrate. The first alignment system 20 comprises a first drive mechanism 200 and first alignment cameras (201, 202), and the second alignment system 21 comprises a second drive mechanism 210 and second alignment cameras (211, 212).
When the correction alignment system 2 corrects the first exposure system 3 and the second exposure system 4, a world coordinate system is established by taking one of the first alignment cameras of the first alignment system 20 or one of the second alignment cameras 211 of the second alignment system 21 as a reference camera, and the position information of the rest alignment cameras and the exposure lens are recorded by the world coordinate system established by the reference camera. When the external environment changes to cause the deviation of the positions of the exposure lens and the alignment camera, the scale 5 on the motion platform 1 is used for updating the world coordinate value of the exposure lens or the alignment camera, so that the deviation is quickly and automatically corrected. Meanwhile, the alignment correction system is used for aligning alignment points on the substrate when the substrate is exposed, and can be used for correcting each system and aligning the substrate pattern.
The first alignment system 20 and the second alignment system 21 of the calibration alignment system 2 each include two alignment cameras.
The first alignment system 20 includes a first alignment camera a201 and a first alignment camera B202, and the second alignment system 21 includes a second alignment camera C211 and a second alignment camera D212.
Taking the first alignment camera a201 as a reference camera as an example, at least one mark point on the scale 5 is selected as a reference point, and coordinate information of the reference point is obtained by the first alignment camera a201, wherein the coordinate information is unique coordinate information of a world coordinate system established by taking the first alignment camera a201 as a reference.
After the unique coordinate information is obtained, the first alignment camera B202, the second alignment camera C211 and the second alignment camera D212 are used to obtain the coordinate information of the reference point, so as to obtain the world coordinates of any position of the first alignment camera B202, the second alignment camera C211 and the second alignment camera D212.
For example: selecting one of the mark points on the scale 5 as a reference point, the first alignment camera a201 obtains the coordinate of the reference point as (X1, Y1), the first alignment camera B202 moves to the position of the motion axis n mm through the first driving mechanism, the coordinate information of the same reference point is obtained as (n, Y2), and the arbitrary image coordinate information obtained by the first alignment camera B202 at the position of the motion axis arbitrary m mm is (m, Y3), then the world coordinate of the first alignment camera B202 at the position of the motion axis m mm is (m-n+x1, Y3-y2+y1). The n millimeter position of the motion axis and the m millimeter position of the motion axis are the distance that the first alignment camera B202 walks away from the zero point position of the first alignment camera B on the motion axis. And obtaining the world coordinate value of the arbitrary position of the first alignment camera B202 according to the coordinate difference value of the arbitrary position of the first alignment camera B202 and the coordinate value of the reference point and combining the world coordinate value of the reference point.
The second alignment camera C211 and the second alignment camera D212 also calculate world coordinates each in a world coordinate system with the first alignment camera a201 as a reference, by grasping the same reference point. Thus, all the alignment camera coordinates are unified to the world coordinate system based on the first alignment camera a 201.
Preferably, as many mark points as possible are selected as reference points, the first alignment camera a201 and the first alignment camera B202 acquire world coordinate information of all the reference points and store the world coordinate information, for example, acquire coordinate information of all the mark points on the scale, and the accuracy is improved maximally by reducing the calibration interval. Specifically, the world coordinate values of the first alignment camera a (reference camera) 201 corresponding to as many mark points as possible are recorded, the coordinate values under the respective coordinate systems obtained by capturing the corresponding mark points by the first alignment camera B202, the second alignment camera C211 and the second alignment camera D212 are recorded, and when the coordinate values of the first alignment camera B202, the second alignment camera C211 and the second alignment camera D212 in the world coordinate systems are calculated, the recorded world coordinate values of the nearest mark point and the corresponding alignment camera coordinate values are selected, so that the improvement precision is maximized. By selecting a plurality of datum points, the movement distance of other alignment cameras in the calibration process is reduced, and accumulated errors caused by overlong movement distances are avoided.
When world coordinates of exposure lenses of the first exposure system 3 and the second exposure system 4 are acquired, the first exposure system 3 exposes the first graphic mark 60 to the scale 5, and the second exposure system 4 exposes the second graphic mark 61 to the scale 5, and the scale 5 can be a transparent scale or a non-transparent scale. When the transparent scale is adopted, the photosensitive layer of the transparent scale can be arranged on two sides or one side of the transparent scale; when the non-transparent scale is adopted, photosensitive materials are arranged on two sides of the scale, and the positions of the marking points are transparent materials or are symmetrically arranged on two sides.
For the transparent scale, the first exposure lens 30 of the first exposure system 3 and the second exposure lens 40 of the second exposure system 4 expose graphic marks on the transparent scale, the photosensitive coating of the transparent scale forms graphic marks (60, 61) corresponding to the exposure lenses, the driving mechanism drives the first alignment camera a201 (reference camera) or the first alignment camera a201 and the first alignment camera B201 to jointly obtain world coordinate information of the graphic marks, and coordinate information of the corresponding exposure lenses in a world coordinate system established by the reference camera is obtained by combining the moving distance of the motion platform 1 in the world coordinate system.
Specifically, the motion stage 1 moves between the first exposure system 3 and the second exposure system 4, so that the transparent scale is located between the first exposure system 3 and the second exposure system 4, and the first exposure system 3 exposes the first graphic mark 60 to the transparent scale 5.
The driving mechanism 22 drives the reference camera 201 to move and grasp the first graphic mark on the transparent scale, or the first alignment camera a201 and the first alignment camera B202 move together and grasp the first graphic mark on the transparent scale, record the position information of the first graphic mark, and calculate the position information of the exposure lens in the first exposure system corresponding to the first graphic mark according to the position information of the first graphic mark and the moving distance of the moving platform in the Y direction, that is, the world coordinates corresponding to the exposure lens of the first exposure system.
The motion stage 1 is moved such that the transparent scale is moved a small distance in the Y direction with respect to the first and second exposure systems 3 and 4, the second exposure system 4 can expose a second graphic mark 61 to the transparent scale 5, the second graphic mark 61 being spaced apart in the Y direction with respect to the first graphic mark 60. The driving mechanism drives the reference camera 201 to capture the second graphic mark on the transparent scale, or the first alignment camera a201 and the first alignment camera B202 move together to capture the second graphic mark on the transparent scale, or the second alignment camera C211 and the second alignment camera D212 move together to capture the second graphic mark on the transparent scale, or other alignment camera combinations, which are not listed here, record the information of the position of the second graphic mark 61, and calculate the world coordinates of the exposure lens of the second exposure system corresponding to the second graphic mark in combination with the moving distance of the moving platform.
For example, the world coordinate 60 of the first graphic mark is (X1, Y1), the distance the moving platform moves in the X direction is h mm, the distance the moving platform moves in the Y direction is s mm, and the world coordinate of the first exposure lens corresponding to the first graphic mark is ((X1-h), (Y1-s)). Of course, the motion platform can only move in the Y direction. The motion stage moves by k millimeters in the Y direction, the second graphic mark 61 is obtained as (X2, Y2), and the world coordinate of the second exposure lens corresponding to the second graphic mark is (X2, Y2-k).
Or the first exposure system 3 exposes the first graphic mark 60 to the transparent scale 5, the first graphic mark 60 is grabbed by the alignment camera to obtain the world coordinate of the exposure lens in the first exposure system 3, after the first transparent mark 60 gradually disappears or the photosensitive film is replaced, the second exposure system 4 exposes the second graphic mark 61 to the transparent scale 5, and the second graphic mark 61 is grabbed by the alignment camera to obtain the world coordinate of the exposure lens in the second exposure system 4. The moving platform 1 can obtain world coordinates of the exposure lenses of the first exposure system 3 and the second exposure system 4 without moving.
Besides the method of respectively capturing the first graphic mark and the second graphic mark by using the reference camera, the world coordinates of the first graphic mark can be captured by using the first alignment camera A and the second alignment camera B of the first alignment system, and the world coordinates of the second graphic mark can be captured by using the second alignment camera C and the second alignment camera D of the second alignment system.
For a non-transparent scale, the first exposure system 3 and the second exposure system 4 expose the first graphic mark 60 and the second graphic mark 61 to two sides of the non-transparent scale simultaneously or respectively, the world coordinates of the first graphic mark 60 are captured by the first alignment system 20, the alignment coordinates of the second graphic mark 61 are captured by the second alignment system 21, and the world coordinates of the exposure lenses of the first exposure system 3 and the second exposure system 4 are obtained.
The world coordinates of the exposure lenses in the first exposure system 3 and the second exposure system 4 are obtained in the above manner, and the coordinates of the exposure lenses of the first exposure system 3 and the second exposure system 4 are unified to the world coordinates established with the reference camera 201.
The alignment correction system 2 may also include only one driving mechanism and one alignment camera, and this structure may be applied to double-sided exposure of the inner layer board.
When the correction alignment system has only one alignment camera, the alignment camera is a reference camera. The scale is a transparent scale, so that the graphic marks exposed by the first exposure system and the second exposure system can be acquired by the reference camera. The photosensitive layer of the transparent scale can be arranged on two sides or one side of the transparent scale.
In actual operation, the exposure lens of the first exposure system and the exposure lens of the second exposure system expose graphic marks on the transparent scale, the photosensitive coating of the transparent scale forms the graphic marks corresponding to the exposure lens, the driving mechanism drives the reference camera to respectively acquire world coordinate information of each graphic mark, and coordinate information of the corresponding exposure lens in a world coordinate system established by the reference camera is obtained by combining the moving distance of the moving platform in the world coordinate system.
Specifically, the motion stage is moved between the first and second exposure systems such that the transparent scale is positioned between the first and second exposure systems, the first exposure system exposing a first graphic mark to the transparent scale.
The driving mechanism drives the reference camera to move and grasp a first graphic mark on the transparent scale, records the position information of the first graphic mark, and calculates the position information of an exposure lens in the first exposure system corresponding to the first graphic mark, namely the world coordinates corresponding to the exposure lens of the first exposure system according to the position information of the first graphic mark and the moving distance of the moving platform in the Y direction.
The motion platform is further moved, so that the transparent scale moves a small distance in the Y direction relative to the first exposure system and the second exposure system, the second exposure system can expose a second graphic mark to the transparent scale, and the second graphic mark has a certain interval in the Y direction relative to the first graphic mark. The driving mechanism drives the reference camera to capture a second graphic mark on the transparent scale, records information of the position of the second graphic mark, and calculates world coordinates of an exposure lens of the second exposure system corresponding to the second graphic mark in combination with the moving distance of the moving platform.
The exposure method of the above-described double-sided exposure system is specifically described below.
As shown in the figure, after the correction step is completed, the alignment camera of the correction alignment system 2 and the exposure lenses (30, 40) of the first exposure system 3 and the second exposure system 4 are unified into the world coordinate system established by the reference camera 201.
If the substrate is an outer layer plate or is subjected to exposure operation on the solder resist ink, the first alignment system 20 and the second alignment system 21 grasp alignment points on the corresponding sides of the substrate to obtain world coordinates of the alignment points, obtain world coordinates of an exposure area of the substrate according to the world coordinates of the alignment points, obtain exposure pattern data of the first exposure system 3 and exposure pattern data of the second exposure system 4 according to the world coordinates of the substrate and world coordinates of exposure lenses (30, 40) in the first exposure system 3 and the second exposure system 4, and further expose corresponding patterns to the two sides of the substrate through the first exposure system 3 and the second exposure system 4 according to the world coordinates of the substrate when moving between the first exposure system 3 and the second exposure system 4.
Since the position coordinates of the exposure lenses (30, 40) of the first exposure system 3 and the second exposure system 4 and the position coordinates of the substrate are world coordinates established by the reference camera 201, the data of the exposure pattern of the exposure lens can be obtained only according to the world coordinates of the exposure lenses (30, 40) and the substrate, so that the pattern of the first exposure system 3 exposed to the front surface of the substrate corresponds to the pattern of the second exposure system 4 exposed to the back surface of the substrate.
If the substrate is an inner layer plate, no alignment point is arranged on the substrate, the same world coordinates of the first exposure system 3, the second exposure system 4 and the substrate correspond to the same position point, exposure pattern data of the first exposure system 3 and the second exposure system 4 are obtained according to the world coordinate information of the first exposure system 3 and the second exposure system 4, the first exposure system 3 exposes to the front surface of the substrate according to the pattern data of the first exposure system 3, the second exposure system 4 exposes to the back surface of the substrate according to the pattern data of the second exposure system 4, and the patterns on two sides of the substrate are aligned according to the same coordinate system. Because the substrate, the first exposure system 3 and the second exposure system 4 are all in the same world coordinate system, the same position corresponds to the same world coordinate, therefore, only the graphic data determined according to the world coordinate system is required to be exposed, that is, the first exposure system 3 exposes the image to the position of the substrate corresponding to the world coordinate according to the front graphic data under the world coordinate system, the second exposure system 4 exposes the image to the position of the substrate corresponding to the world coordinate according to the back graphic data under the world coordinate system, the first exposure system 3 and the second exposure system 4 correspond to the same world coordinate system, and the positions of the two sides of the substrate exposed to the same world coordinate system are the same position, thereby realizing the alignment of the double-sided graphics of the substrate.
The offset values of the two exposure systems (3, 4) may be obtained according to the data of the first exposure lens 30 of the first exposure system 3 and the second exposure lens 40 of the second exposure system 4, so as to correct the image data of the first exposure system 3 and the second exposure system 4, and make the patterns of the two exposure systems correspond to each other on the two sides of the substrate.
The double-sided exposure system can be applied to the fields of printed circuit boards, integrated circuits, liquid crystal displays and the like, can be applied to different light modulation devices such as DMDs (Digital Micromirror Device, digital micro-lens devices), SLMs (SPETIALLIGHT MODULATOR, spatial light modulators) and can be applied to exposure development, laser etching and the like.
A plurality of opposite small-size substrates can be placed on the moving table top of the double-sided exposure system according to the size of the moving table top, so that a plurality of substrates can be exposed at one time.
When the double-sided exposure system performs automatic correction, the reference camera grabs marks on the staff gauge, and if the correction alignment system comprises a plurality of alignment cameras, other alignment cameras except the reference camera also respectively grabs the same marks on the staff gauge; the first exposure system and the second exposure system are respectively exposed once, and the pattern marks exposed by the first exposure system and the second exposure system are grabbed by a reference camera. The first exposure system, the second exposure system, the first alignment system and the second alignment system are unified to the world coordinate system established by the reference camera, so that the complicated processes of mutual calibration and correction among the systems are omitted, and the calibration operation of the systems is simplified.
And unifying the first exposure system and the second exposure system to the same world coordinate system by utilizing an alignment camera for grabbing the position points of the substrate, and adjusting the exposure patterns of the first exposure system and the second exposure system on the front surface and the back surface of the substrate to be consistent. The corresponding exposure of the double-sided pattern is realized without adding an additional correction mechanism for the first exposure system and the second exposure system.
Claims (7)
1. A method for correcting a double-sided exposure system, the double-sided exposure system comprising a motion stage and an exposure system, the exposure system comprising a first exposure system and a second exposure system on opposite sides of the motion stage, characterized in that: the double-sided exposure system further comprises a correction alignment system, the correction alignment system comprises at least two alignment cameras, the alignment cameras are positioned on two opposite sides of the motion platform, world coordinates of the first exposure system and the second exposure system are obtained, alignment is carried out on a substrate on the motion platform, any alignment camera of the correction alignment system is set as a reference camera, a world coordinate system taking the reference camera as a reference is determined, the reference camera grabs mark points arranged on a scale of the motion platform, and coordinates of the mark points in the world coordinate system are obtained; the other alignment cameras respectively move to corresponding positions to acquire the coordinate information of the mark points, the positions of the other alignment cameras moving to the moving axes are converted into world coordinates of the other alignment cameras at the positions, and the coordinates of the other alignment cameras except the reference camera in the correction alignment system are unified to the world coordinate system of the reference camera; the first exposure system and the second exposure system expose the first graphic mark and the second graphic mark to a scale arranged on the motion platform respectively; world coordinates of the first graphic mark and the second graphic mark are obtained through an alignment camera of the correction alignment system, and the world coordinates of the exposure lens in the first exposure system and the second exposure system are calculated according to the world coordinates of the first graphic mark and the second graphic mark and the moving distance of the motion platform.
2. The correction method according to claim 1, characterized in that: selecting at least one mark point on the scale as a datum point, acquiring world coordinate values of all the datum points by the datum camera, recording coordinates of corresponding datum points acquired by other alignment cameras, and acquiring the world coordinate values of any position of the camera to be corrected according to the difference value between the coordinates of any position of the other alignment cameras and the recorded coordinates of the corresponding datum point position and combining the world coordinate values of the datum points.
3. The correction method according to claim 1, characterized in that: after the first exposure system exposes the first graphic mark to the scale, an alignment camera of the correction alignment system grabs world coordinates of the first graphic mark; and moving the motion platform in the scanning direction, exposing a second graph to the scale by the second exposure system, and capturing world coordinates of the second graph mark by an alignment camera of the correction alignment system.
4. The correction method according to claim 1, characterized in that: the first exposure system exposes the first graphic mark to the scale, the alignment camera of the correction alignment system grabs world coordinates of the first graphic mark, after the first graphic mark disappears on the scale, the second exposure system exposes the second graphic mark to the scale, and the alignment camera of the correction alignment system grabs world coordinates of the second graphic mark.
5. The correction method according to claim 1, characterized in that: the scale is a transparent scale, and the transparent scale is provided with photosensitive materials.
6. An exposure method of a double-sided exposure system is characterized in that: obtaining world coordinates of the first exposure system and the second exposure system using the correction method according to any one of claims 1 to 5, and calculating graphic data position coordinate information of the first exposure system and the second exposure system from the world coordinates of the first exposure system and the second exposure system.
7. The exposure method according to claim 6, characterized in that: the world coordinates of the first exposure system and the second exposure system correspond to the world coordinates of the substrate, the position coordinate information of the graph data of the first exposure system and the second exposure system is obtained, and the world coordinates of the graph area of the substrate are obtained by obtaining the alignment points on the substrate through the alignment camera of the correction alignment system.
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