CN114457426B - Ti-doped monolayer molybdenum disulfide single crystal and its preparation method and application - Google Patents
Ti-doped monolayer molybdenum disulfide single crystal and its preparation method and application Download PDFInfo
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Abstract
本发明公开了一种Ti掺杂单层二硫化钼单晶及其制备方法和应用,制备方法包括以下步骤:准备一两端敞口的石英管,所述石英管的两端分别为原料端和基底端,在所述石英管的基底端内放置一基底,在所述石英管的原料端内放置原材料和输运剂,对所述石英管抽真空,密封所述石英管,以使该石英管的管内压强为10‑6~10‑3Pa,对所述石英管的原料端和基底端同时加热0.5~1h,冷却至室温20~25℃,在基底上得到Ti掺杂单层二硫化钼单晶。本发明的制备方法可在保证单层MoS2单晶结晶质量的前提下,实现过渡元素Ti的对单层MoS2单晶面内取代掺杂,并实现MoS2光致发光强度的大幅增强。
The invention discloses a Ti-doped single-layer molybdenum disulfide single crystal and its preparation method and application. The preparation method includes the following steps: preparing a quartz tube with two ends open, and the two ends of the quartz tube are respectively raw material ends and a base end, place a base in the base end of the quartz tube, place raw material and transport agent in the raw material end of the quartz tube, evacuate the quartz tube, seal the quartz tube, so that the The inner pressure of the quartz tube is 10 -6 ~ 10 -3 Pa, the raw material end and the base end of the quartz tube are heated simultaneously for 0.5 ~ 1h, cooled to room temperature 20 ~ 25°C, and a Ti-doped monolayer bismuth is obtained on the substrate. Molybdenum sulfide single crystal. The preparation method of the present invention can realize the in-plane substitution and doping of the transition element Ti on the single - layer MoS2 single - crystal under the premise of ensuring the crystal quality of the single - layer MoS2 single crystal, and realize the substantial enhancement of the photoluminescence intensity of the MoS2.
Description
技术领域technical field
本发明属于二硫化钼单晶技术领域,具体来说涉及一种Ti掺杂单层二硫化钼单晶及其制备方法和应用。The invention belongs to the technical field of molybdenum disulfide single crystal, and specifically relates to a Ti-doped single-layer molybdenum disulfide single crystal and a preparation method and application thereof.
背景技术Background technique
二维硫属化合物材料在柔性晶体管、光电子传感器以及信息存储方面有着巨大的应用潜力。但是二维材料本征的缺陷态较多,捕获大量载流子,导致其发光效率较弱,通过选择合适的掺杂原子可以在不改变其本征带隙的条件下改善其发光性能。Two-dimensional chalcogenide materials have great application potential in flexible transistors, optoelectronic sensors, and information storage. However, two-dimensional materials have more intrinsic defect states, which trap a large number of carriers, resulting in weaker luminous efficiency. By selecting appropriate dopant atoms, their luminescent properties can be improved without changing their intrinsic bandgap.
但目前存在的掺杂方法并不多,且在掺杂后无法保持单层MoS2单晶的高结晶质量,结晶性差且易污染、受外界的干扰较大。However, there are not many doping methods currently available, and the high crystal quality of single-layer MoS2 single crystal cannot be maintained after doping, and the crystallinity is poor, easy to be polluted, and greatly affected by external interference.
发明内容Contents of the invention
针对现有技术的不足,本发明的目的在于提供一种Ti掺杂单层二硫化钼单晶的制备方法,该制备方法可在保证单层MoS2单晶的高结晶质量的前提下,实现Ti元素对单层MoS2的面内掺杂,并实现MoS2的光致发光增强,解决了Ti掺杂二维单层MoS2技术难题,所获得的Ti掺杂单层二硫化钼单晶的光致发光效率大幅提升,为实现高性能的光电探测器提供了支撑。For the deficiencies in the prior art, the object of the present invention is to provide a method for preparing a Ti-doped single-layer molybdenum disulfide single crystal, which can realize the high crystallization quality of the single-layer MoS2 single crystal The in-plane doping of single-layer MoS 2 with Ti element can realize the enhancement of photoluminescence of MoS 2 , which solves the technical problem of Ti-doped two-dimensional single-layer MoS 2 , and the obtained Ti-doped single-layer molybdenum disulfide single crystal The photoluminescent efficiency is greatly improved, which provides support for the realization of high-performance photodetectors.
本发明的目的是通过下述技术方案予以实现的。The purpose of the present invention is achieved through the following technical solutions.
一种Ti掺杂单层二硫化钼单晶的制备方法,包括以下步骤:A method for preparing a Ti-doped monolayer molybdenum disulfide single crystal, comprising the following steps:
1)准备一两端敞口的石英管,所述石英管的两端分别为原料端和基底端,在所述石英管的基底端内放置一基底,在所述石英管的原料端内放置原材料和输运剂,对所述石英管抽真空,密封所述石英管,以使该石英管的管内压强为10-6~10-3Pa,其中,所述原材料为1.5~2.5质量份数的MoO3、0.36-0.42质量份数的S粉和0.2~1.0质量份数的TiO2,所述输运剂为单质碘;1) Prepare a quartz tube with open ends, the two ends of the quartz tube are respectively the raw material end and the base end, a base is placed in the base end of the quartz tube, and a base is placed in the raw material end of the quartz tube. Raw material and transport agent, vacuumize the quartz tube, seal the quartz tube so that the inner pressure of the quartz tube is 10 -6 ~ 10 -3 Pa, wherein the raw material is 1.5 ~ 2.5 parts by mass MoO 3 , 0.36-0.42 parts by mass of S powder and 0.2-1.0 parts by mass of TiO 2 , the transport agent is elemental iodine;
在所述步骤1)中,所述基底为云母或石墨。In the step 1), the substrate is mica or graphite.
在所述步骤1)中,所述石英管的长度为15~40cm,内径为10-20mm。In the step 1), the length of the quartz tube is 15-40 cm, and the inner diameter is 10-20 mm.
在所述步骤1)中,按质量份数计,所述原材料和输运剂的比为(2~6):(3-8)。In the step 1), in parts by mass, the ratio of the raw material to the transport agent is (2-6):(3-8).
2)对所述石英管的原料端和基底端同时加热0.5~1h,冷却至室温20~25℃,在基底上得到Ti掺杂单层二硫化钼单晶,其中,所述原料端的加热温度为750~900℃,所述基底端的加热温度为400~700℃。2) Heating the raw material end and the base end of the quartz tube simultaneously for 0.5-1h, cooling to room temperature 20-25°C, and obtaining a Ti-doped single-layer molybdenum disulfide single crystal on the substrate, wherein the heating temperature of the raw material end is 750-900°C, and the heating temperature of the base end is 400-700°C.
在所述步骤2)中,加热至750~900℃的升温速率为25~50℃/min,加热至400~700℃的升温速率为25~50℃/min。In the step 2), the heating rate to 750-900°C is 25-50°C/min, and the heating rate to 400-700°C is 25-50°C/min.
在所述步骤2)中,所述原料端和基底端之间温度的梯度为3~30℃/cm。In the step 2), the temperature gradient between the raw material end and the base end is 3-30° C./cm.
上述制备方法获得的Ti掺杂单层二硫化钼单晶。The Ti-doped monolayer molybdenum disulfide single crystal obtained by the above preparation method.
上述制备方法在同时实现单层二硫化钼光致发光增强和单层二硫化钼单晶制备中的应用。The application of the above preparation method in simultaneously realizing the enhancement of photoluminescence of monolayer molybdenum disulfide and the preparation of monolayer molybdenum disulfide single crystal.
本发明的制备方法可在保证单层MoS2单晶结晶质量的前提下,实现过渡元素Ti的对单层MoS2单晶面内取代掺杂,并实现MoS2光致发光强度的大幅增强。The preparation method of the present invention can realize the in-plane substitution and doping of the transition element Ti on the single-layer MoS2 single crystal under the premise of ensuring the crystal quality of the single-layer MoS2 single crystal, and realize the substantial enhancement of the photoluminescence intensity of the MoS2 .
附图说明Description of drawings
图1为Ti掺杂单层二硫化钼单晶的光学照片,其中,a为实施例1所得Ti掺杂单层二硫化钼单晶,b为实施例2所得Ti掺杂单层二硫化钼单晶,c为实施例3所得Ti掺杂单层二硫化钼单晶;Figure 1 is an optical photograph of a Ti-doped single-layer molybdenum disulfide single crystal, where a is the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1, and b is the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 2 Single crystal, c is the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 3;
图2为对比例1和2所得Ti掺杂单层二硫化钼单晶的光学照片,其中,a为对比例1所得Ti掺杂单层二硫化钼单晶,b为对比例2所得Ti掺杂单层二硫化钼单晶;Fig. 2 is the optical photograph of the Ti-doped single-layer molybdenum disulfide single crystal obtained in Comparative Example 1 and 2, wherein, a is the Ti-doped single-layer molybdenum disulfide single crystal obtained in Comparative Example 1, and b is the Ti-doped single-layer molybdenum disulfide single crystal obtained in Comparative Example 2. Heterogeneous monolayer molybdenum disulfide single crystal;
图3为实施例1所得Ti掺杂单层二硫化钼单晶和对比例3所得二硫化钼单晶的光致发光;Fig. 3 is the photoluminescence of the Ti-doped monolayer molybdenum disulfide single crystal obtained in Example 1 and the molybdenum disulfide single crystal obtained in Comparative Example 3;
图4为对比例1所得Ti掺杂单层二硫化钼单晶和对比例3所得二硫化钼单晶的光致发光;Fig. 4 is the photoluminescence of the obtained Ti-doped monolayer molybdenum disulfide single crystal obtained in Comparative Example 1 and the obtained molybdenum disulfide single crystal obtained in Comparative Example 3;
图5为对比例2所得Ti掺杂单层二硫化钼单晶和对比例3所得二硫化钼单晶的光致发光;Fig. 5 is the photoluminescence of the obtained Ti-doped monolayer molybdenum disulfide single crystal obtained in Comparative Example 2 and the obtained molybdenum disulfide single crystal obtained in Comparative Example 3;
图6为实施例1所得Ti掺杂单层二硫化钼单晶的Raman Mapping和PL Mapping图,其中,a为Raman Mapping,b为PL Mapping;Fig. 6 is the Raman Mapping and PL Mapping figure of Ti-doped monolayer molybdenum disulfide single crystal obtained in Example 1, wherein, a is Raman Mapping, b is PL Mapping;
图7为实施例1所得Ti掺杂单层二硫化钼单晶的AFM图片,其中,a为AFM图,b为a图中划线部分Ti掺杂单层二硫化钼单晶的高度测量图;Fig. 7 is the AFM image of the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1, wherein, a is the AFM image, and b is the height measurement map of the Ti-doped single-layer molybdenum disulfide single crystal of the underlined part in a. ;
图8为实施例1所得Ti掺杂单层二硫化钼单晶中Mo元素的XPS数据图;Fig. 8 is the XPS data figure of Mo element in the Ti-doped single-layer molybdenum disulfide single crystal obtained in
图9为实施例1所得Ti掺杂单层二硫化钼单晶中S元素的XPS数据图;Fig. 9 is the XPS data diagram of the S element in the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1;
图10为实施例1所得Ti掺杂单层二硫化钼单晶中Ti元素的XPS数据图;Fig. 10 is the XPS data diagram of the Ti element in the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1;
图11为实施例1所得Ti掺杂单层二硫化钼单晶的低倍TEM图;Fig. 11 is the low magnification TEM figure of the obtained Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1;
图12为实施例1所得Ti掺杂单层二硫化钼单晶中Mo元素的TEM-EDS elementalmapping图;Fig. 12 is the TEM-EDS elementalmapping diagram of the Mo element in the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1;
图13为实施例1所得Ti掺杂单层二硫化钼单晶中S元素的TEM-EDS elementalmapping图;Fig. 13 is the TEM-EDS elementalmapping diagram of the S element in the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1;
图14为实施例1所得Ti掺杂单层二硫化钼单晶中Ti元素的TEM-EDS elementalmapping图;Fig. 14 is the TEM-EDS elementalmapping diagram of the Ti element in the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1;
图15为实施例1所得Ti掺杂单层二硫化钼单晶中各元素的EDS能谱图及元素含量;Fig. 15 is the EDS energy spectrum diagram and the element content of each element in the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1;
图16为实施例1所得Ti掺杂单层二硫化钼单晶的STEM图。FIG. 16 is a STEM image of a Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1. FIG.
具体实施方式Detailed ways
下面结合具体实施例进一步说明本发明的技术方案。The technical solutions of the present invention will be further described below in conjunction with specific embodiments.
MoO3:纯度≥99.9%,北京浩克;MoO 3 : purity ≥ 99.9%, Beijing Hulk;
S粉:纯度≥99.999%,sigma;S powder: purity ≥ 99.999%, sigma;
I2:纯度≥99.999%,Alfa Aesar;I 2 : purity ≥ 99.999%, Alfa Aesar;
TiO2:纯度≥99.99%,北京浩克;TiO 2 : purity ≥99.99%, Beijing Hulk;
OLYMPUS-bx53m-显微镜;OLYMPUS-bx53m-microscope;
WITec共聚焦拉曼与原子力显微镜连用系统(Raman-AFM);WITec confocal Raman and atomic force microscope system (Raman-AFM);
石英管加热使用管式炉。The quartz tube is heated using a tube furnace.
下述实施例和对比例所使用石英管的长度为15cm,内径为11mm。The quartz tubes used in the following examples and comparative examples have a length of 15 cm and an inner diameter of 11 mm.
实施例1~3Examples 1-3
一种Ti掺杂单层二硫化钼单晶的制备方法,包括以下步骤:A method for preparing a Ti-doped monolayer molybdenum disulfide single crystal, comprising the following steps:
1)准备一两端敞口的石英管,石英管的两端分别为原料端和基底端,在石英管的基底端内放置一基底,在石英管的原料端内放置原材料和输运剂,用真空封管装置对石英管抽真空,用火焰枪焰封石英管,使该石英管的管内压强为3.5*10-4Pa,确保除Ti元素外不会引入其他元素,其中,原材料为MoO3、S粉和TiO2,输运剂为单质碘;1) Prepare a quartz tube with open ends, the two ends of the quartz tube are respectively the raw material end and the base end, a base is placed in the base end of the quartz tube, and raw materials and transport agents are placed in the raw material end of the quartz tube, Vacuum the quartz tube with a vacuum sealing device, and seal the quartz tube with a flame gun, so that the internal pressure of the quartz tube is 3.5*10 -4 Pa, to ensure that no other elements except Ti are introduced, and the raw material is MoO 3. S powder and TiO 2 , the transport agent is elemental iodine;
2)对石英管的原料端和基底端同时加热0.5h,随炉自然冷却至室温20~25℃,在基底上得到Ti掺杂单层二硫化钼单晶,其中,原料端的加热温度为T1℃,基底端的加热温度为T2℃,加热至T1℃的升温速率为t1℃/min,加热至T2℃的升温速率为t2℃/min,原料端和基底端之间温度的梯度为x℃/cm。2) Heat the raw material end and the base end of the quartz tube simultaneously for 0.5h, then cool naturally with the furnace to room temperature 20-25°C, and obtain a Ti-doped single-layer molybdenum disulfide single crystal on the substrate, wherein the heating temperature of the raw material end is T1 ℃, the heating temperature at the base end is T2°C, the heating rate to T1°C is t1°C/min, the heating rate to T2°C is t2°C/min, and the temperature gradient between the raw material end and the base end is x°C/min cm.
表1Table 1
对比例1~2Comparative example 1~2
一种Ti掺杂单层二硫化钼单晶的制备方法,包括以下步骤:A method for preparing a Ti-doped monolayer molybdenum disulfide single crystal, comprising the following steps:
1)准备一两端敞口的石英管,石英管的两端分别为原料端和基底端,在石英管的基底端内放置一云母作为基底,在石英管的原料端内放置原材料和输运剂,用真空封管装置对石英管抽真空,用火焰枪焰封石英管,使该石英管的管内压强为3.5*10-4Pa,确保除Ti元素外不会引入其他元素,其中,原材料为MoO3、S粉和TiO2,输运剂为单质碘;1) Prepare a quartz tube with open ends. The two ends of the quartz tube are the raw material end and the base end respectively. A mica is placed in the base end of the quartz tube as the base, and the raw material and transportation are placed in the raw material end of the quartz tube. Use a vacuum sealing device to evacuate the quartz tube, and use a flame gun to seal the quartz tube so that the internal pressure of the quartz tube is 3.5*10 -4 Pa to ensure that no other elements except Ti will be introduced. Among them, the raw material MoO 3 , S powder and TiO 2 , and the transport agent is elemental iodine;
2)对石英管的原料端和基底端同时加热0.5h,随炉自然冷却至室温20~25℃,在基底上得到Ti掺杂单层二硫化钼单晶,其中,原料端的加热温度为850℃,基底端的加热温度为600℃,加热至850℃的升温速率为42.5℃/min,加热至600℃的升温速率为30℃/min,原料端和基底端之间温度的梯度为16℃/cm。2) Heat the raw material end and the base end of the quartz tube simultaneously for 0.5h, then cool naturally to room temperature 20-25°C with the furnace, and obtain a Ti-doped single-layer molybdenum disulfide single crystal on the substrate, wherein the heating temperature of the raw material end is 850 °C, the heating temperature at the base end is 600 °C, the heating rate to 850 °C is 42.5 °C/min, the heating rate to 600 °C is 30 °C/min, and the temperature gradient between the raw material end and the base end is 16 °C/min cm.
表2Table 2
对比例3Comparative example 3
一种二硫化钼单晶的制备方法,包括以下步骤:A method for preparing molybdenum disulfide single crystal, comprising the following steps:
1)准备一两端敞口的石英管,石英管的两端分别为原料端和基底端,在石英管的基底端内放置一云母作为基底,在石英管的原料端内放置原材料和输运剂,用真空封管装置对石英管抽真空,用火焰枪焰封石英管,使该石英管的管内压强为3.5*10-4Pa,其中,原材料为2.7mg的MoO3和0.4mg的S粉,输运剂为3mg的单质碘;1) Prepare a quartz tube with open ends. The two ends of the quartz tube are the raw material end and the base end respectively. A mica is placed in the base end of the quartz tube as the base, and the raw material and transportation are placed in the raw material end of the quartz tube. Use a vacuum sealing device to evacuate the quartz tube, and use a flame gun to seal the quartz tube so that the internal pressure of the quartz tube is 3.5*10 -4 Pa, wherein the raw materials are 2.7 mg of MoO 3 and 0.4 mg of S Powder, the transport agent is 3mg of elemental iodine;
2)对石英管的原料端和基底端同时加热0.5h,随炉自然冷却至室温20~25℃,在基底上得到二硫化钼单晶,其中,原料端的加热温度为850℃,基底端的加热温度为600℃,加热至8501℃的升温速率为42.5℃/min,加热至6002℃的升温速率为30℃/min,原料端和基底端之间温度的梯度为16℃/cm。2) Heat the raw material end and the base end of the quartz tube simultaneously for 0.5h, then cool naturally with the furnace to room temperature 20-25°C, and obtain molybdenum disulfide single crystal on the substrate, wherein, the heating temperature of the raw material end is 850°C, and the heating temperature of the base end The temperature is 600°C, the heating rate to 8501°C is 42.5°C/min, the heating rate to 6002°C is 30°C/min, and the temperature gradient between the raw material end and the base end is 16°C/cm.
图1中的a、b、c分别是本发明实施例1~3在不同基底上所生长Ti掺杂单层二硫化钼单晶的光显照片,表明本发明制备方法获得的Ti掺杂单层二硫化钼单晶能够适用于多种基底生长,且生长温度的范围较宽,并且在掺杂后仍能维持单层MoS2的三角形形貌。A, b, and c in Fig. 1 are light micrographs of Ti-doped single-layer molybdenum disulfide single crystals grown on different substrates in Examples 1 to 3 of the present invention, indicating that the Ti-doped single-layer molybdenum disulfide single crystals obtained by the preparation method of the present invention Layered molybdenum disulfide single crystal can be suitable for growth on a variety of substrates, and the growth temperature range is wide, and it can still maintain the triangular shape of single-layer MoS 2 after doping.
图2中a和b分别为对比例1和对比例2的掺杂量下生长得到Ti掺杂单层二硫化钼单晶的光学照片。相比于实施例1,对比例1具有比实施例1更小的掺杂量,生长形貌几乎没有变化;对比例2具有比实施例1更大的掺杂量,生长形貌发生明显变形,且中心形核严重,不能得到理想的单层MoS2单晶。In Fig. 2, a and b are the optical photographs of Ti-doped single-layer molybdenum disulfide single crystal grown under the doping amounts of Comparative Example 1 and Comparative Example 2, respectively. Compared with Example 1, Comparative Example 1 has a smaller doping amount than Example 1, and the growth morphology hardly changes; Comparative Example 2 has a larger doping amount than Example 1, and the growth morphology is obviously deformed , and the central nucleation is serious, and the ideal single-layer MoS 2 single crystal cannot be obtained.
图3为实施例1所得Ti掺杂单层二硫化钼单晶和对比例3所得二硫化钼单晶的光致发光,表明Ti掺杂相比于未掺杂的单层MoS2单晶的光致发光大幅增强。插图为将发光强度归一化后的发光峰位对比,说明掺杂Ti元素后峰位发生了蓝移。Fig. 3 is the photoluminescence of the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1 and the molybdenum disulfide single crystal obtained in Comparative Example 3, showing that the Ti-doped single-layer MoS2 single crystal is compared with the undoped single-layer MoS2 single crystal. The photoluminescence is greatly enhanced. The inset is the comparison of the luminescence peak position after normalizing the luminescence intensity, indicating that the peak position is blue-shifted after doping with Ti element.
图4为对比例1所得Ti掺杂单层二硫化钼单晶和对比例3所得二硫化钼单晶的光致发光,发现在较小的掺杂量下单层MoS2单晶的光致发光性能增强效果并不明显。Figure 4 is the photoluminescence of the Ti-doped single-layer molybdenum disulfide single crystal obtained in Comparative Example 1 and the molybdenum disulfide single crystal obtained in Comparative Example 3 . The luminous performance enhancement effect is not obvious.
图5为对比例2所得Ti掺杂单层二硫化钼单晶和对比例3所得二硫化钼单晶的光致发光,发现在较大的掺杂量下单层MoS2单晶的光致发光性能增强效果也不明显,是由于过量掺杂引入了大量缺陷,影响了其结晶性。Figure 5 is the photoluminescence of the Ti-doped single-layer molybdenum disulfide single crystal obtained in Comparative Example 2 and the molybdenum disulfide single crystal obtained in Comparative Example 3 . The effect of enhancing the luminescence performance is not obvious, because excessive doping introduces a large number of defects, which affects its crystallinity.
图6为本发明实施例1所得Ti掺杂单层二硫化钼单晶的孤立三角形形貌的样品的Raman Mapping和PL Mapping图,显示了掺杂后的MoS2仍具有结晶质量的均一性和发光性能的均匀性。Fig. 6 is the Raman Mapping and PL Mapping diagram of the isolated triangular morphology sample of Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1 of the present invention, which shows that the doped MoS still has the uniformity of crystalline quality and Uniformity of luminous performance.
图7中a图为本发明实施例1所得Ti掺杂单层二硫化钼单晶的AFM图片,b图对应的是图1中划线处的高度变化曲线,显示出生长得到Ti掺杂单层二硫化钼单晶的厚度约为0.8nm,与单层MoS2的厚度保持一致,说明通过本发明制备方法获得的MoS2为单层材料。Figure a in Figure 7 is an AFM image of a Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1 of the present invention, and Figure b corresponds to the height change curve at the line in Figure 1, showing that a Ti-doped single crystal was grown. The thickness of the single-layer molybdenum disulfide single crystal is about 0.8nm, which is consistent with the thickness of the single-layer MoS 2 , indicating that the MoS 2 obtained by the preparation method of the present invention is a single-layer material.
图8~10为本发明实施例1所获得Ti掺杂单层二硫化钼单晶的XPS数据图,通过对该数据分析,表明Ti原子成功进入MoS2晶格内,并形成Ti-S键。Figures 8 to 10 are the XPS data diagrams of the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1 of the present invention. Through the analysis of the data, it shows that Ti atoms have successfully entered the MoS2 lattice and formed Ti-S bonds .
图11~14为本发明实施例1所得Ti掺杂单层二硫化钼单晶的TEM-EDS elementalmapping图,更直观的说明了掺杂元素在MoS2晶体中均匀的分布。11 to 14 are TEM-EDS elemental mapping diagrams of the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1 of the present invention, which more intuitively illustrate the uniform distribution of doping elements in the MoS 2 crystal.
图15为本发明实施例1所得Ti掺杂单层二硫化钼单晶的TEM-EDS能谱图以及各个元素所含比例,能够看到Ti-K的特征峰,并且Ti元素的掺杂量约为1.2%。Figure 15 is the TEM-EDS energy spectrum of the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1 of the present invention and the proportion of each element. The characteristic peak of Ti-K can be seen, and the doping amount of Ti element About 1.2%.
图16为本发明实施例1所得Ti掺杂单层二硫化钼单晶的STEM图,通过该图可以判断出Ti元素在MoS2晶格中替代了原有的Mo的位置,从而得到了过渡元素掺杂的单层MoS2单晶。Figure 16 is the STEM image of the Ti-doped single-layer molybdenum disulfide single crystal obtained in Example 1 of the present invention, from which it can be judged that the Ti element has replaced the original Mo position in the MoS2 lattice, thereby obtaining a transition Element-doped monolayer MoS single crystals.
以上对本发明做了示例性的描述,应该说明的是,在不脱离本发明的核心的情况下,任何简单的变形、修改或者其他本领域技术人员能够不花费创造性劳动的等同替换均落入本发明的保护范围。The present invention has been described as an example above, and it should be noted that, without departing from the core of the present invention, any simple deformation, modification or other equivalent replacements that can be made by those skilled in the art without creative labor all fall within the scope of this invention. protection scope of the invention.
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