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CN114393480A - Polishing equipment - Google Patents

Polishing equipment Download PDF

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Publication number
CN114393480A
CN114393480A CN202111654395.3A CN202111654395A CN114393480A CN 114393480 A CN114393480 A CN 114393480A CN 202111654395 A CN202111654395 A CN 202111654395A CN 114393480 A CN114393480 A CN 114393480A
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China
Prior art keywords
polishing
frame
wheel
bearing
fixed
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Pending
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CN202111654395.3A
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Chinese (zh)
Inventor
邓海滨
王明忠
崔秀珍
黄猛进
郑振宇
魏军
宋坚雄
黄翔
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CSG Holding Co Ltd
Xianning CSG Photoelectric Glass Co Ltd
Qingyuan CSG New Energy Saving Materials Co Ltd
Original Assignee
CSG Holding Co Ltd
Xianning CSG Photoelectric Glass Co Ltd
Qingyuan CSG New Energy Saving Materials Co Ltd
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Application filed by CSG Holding Co Ltd, Xianning CSG Photoelectric Glass Co Ltd, Qingyuan CSG New Energy Saving Materials Co Ltd filed Critical CSG Holding Co Ltd
Priority to CN202111654395.3A priority Critical patent/CN114393480A/en
Publication of CN114393480A publication Critical patent/CN114393480A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00Machines or devices using grinding or polishing belts; Accessories therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/18Accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

本发明涉及一种抛光设备,用于对辊轴类标的物进行表面抛光,包括:支架,承载所述标的物;导轨,固定在所述支架上;驱动机构,固定在所述支架上,用于驱动所述标的物转动;抛光机构,包括抛光架和位于所述抛光架上的抛光轮,所述抛光架设置于所述导轨上且沿所述导轨往返滑动,以带动所述抛光轮相对所述标的物移动;调节机构,位于所述抛光架上,以调节所述抛光轮相对于所述标的物的位置。上述抛光设备,无需人工操作,且大大提升抛光效率。

Figure 202111654395

The present invention relates to a polishing device, which is used to polish the surface of an object such as a roller shaft, comprising: a bracket, which carries the object; a guide rail, which is fixed on the bracket; The polishing mechanism includes a polishing frame and a polishing wheel located on the polishing frame. The polishing frame is arranged on the guide rail and slides back and forth along the guide rail to drive the polishing wheel to face each other. The target moves; an adjusting mechanism is located on the polishing frame to adjust the position of the polishing wheel relative to the target. The above-mentioned polishing equipment does not require manual operation, and greatly improves the polishing efficiency.

Figure 202111654395

Description

抛光设备polishing equipment

技术领域technical field

本发明涉及机械加工设备技术领域,特别是涉及抛光设备。The present invention relates to the technical field of mechanical processing equipment, in particular to polishing equipment.

背景技术Background technique

浮法玻璃在加工后期需经退火窑进行退火处理,玻璃在退火窑中会与辊道表面接触。在长期的生产过程中,退火窑内的辊道表面会粘附锡点等杂物,从而在与玻璃面接触过程中造成玻璃表面划伤,影响玻璃质量,因此需定期对退火窑辊道进行表面抛光,去除表面杂质。Float glass needs to be annealed in an annealing kiln in the later stage of processing, and the glass will contact the surface of the roller table in the annealing kiln. In the long-term production process, the surface of the roller table in the annealing kiln will adhere to the sundries such as tin spots, which will cause scratches on the glass surface during the contact with the glass surface and affect the quality of the glass. Surface polishing to remove surface impurities.

当辊道从退火窑中取出时温度可达几百摄氏度,为最大限度保证玻璃生产连续性,需尽快对辊道进行旋转抛光,若采用手持式抛光机进行人工抛光,不仅温度过高增加人员劳动强度,还容易造成烫伤安全事故。而且采取人工抛光时,操作人员行走速度不稳定、用力不均匀,会造成辊道表面平整度与光洁度不一致,抛光效率低下,严重时还会损坏退火窑辊道,从而影响玻璃连续性生产。When the roller table is taken out of the annealing kiln, the temperature can reach several hundred degrees Celsius. In order to ensure the continuity of glass production to the greatest extent, the roller table needs to be rotated and polished as soon as possible. Labor intensity, but also easy to cause scalding safety accidents. Moreover, when manual polishing is adopted, the operator's walking speed is unstable and the force is uneven, which will cause inconsistent surface flatness and smoothness of the roller table, low polishing efficiency, and in severe cases, damage to the annealing kiln roller table, thus affecting the continuous production of glass.

发明内容SUMMARY OF THE INVENTION

基于此,有必要针对辊道人工抛光效率低的问题,提供一种抛光设备。Based on this, it is necessary to provide a polishing device for the problem of low efficiency of manual polishing of the roller table.

一种抛光设备,用于对辊轴类标的物进行表面抛光,包括:A polishing equipment used for surface polishing of a roller-like object, including:

支架,承载所述标的物;a bracket that carries the subject matter;

导轨,固定在所述支架上;a guide rail, fixed on the bracket;

驱动机构,固定在所述支架上,用于驱动所述标的物转动;a driving mechanism, fixed on the bracket, for driving the object to rotate;

抛光机构,包括抛光架和位于所述抛光架上的抛光轮,所述抛光架设置于所述导轨上且沿所述导轨往返滑动,以带动所述抛光轮相对所述标的物移动;a polishing mechanism, comprising a polishing frame and a polishing wheel on the polishing frame, the polishing frame is arranged on the guide rail and slides back and forth along the guide rail to drive the polishing wheel to move relative to the target object;

调节机构,位于所述抛光架上,以调节所述抛光轮相对于所述标的物的位置。An adjusting mechanism is located on the polishing frame to adjust the position of the polishing wheel relative to the target.

在其中一个实施例中,所述抛光架包括基板、第一抛光架和第二抛光架,所述基板位于所述导轨上,所述第一抛光架位于所述基板上,所述第二抛光架与所述第一抛光架连接,所述抛光轮位于所述第二抛光架上且可相对所述标的物移动。In one embodiment, the polishing rack includes a substrate, a first polishing rack and a second polishing rack, the substrate is located on the guide rail, the first polishing rack is located on the substrate, and the second polishing rack The frame is connected with the first polishing frame, and the polishing wheel is located on the second polishing frame and can move relative to the target.

在其中一个实施例中,所述第二抛光架靠近所述标的物的一端设有缺口,所述第二抛光架上设有伸缩杆,所述伸缩杆一端与所述第二抛光架连接,所述抛光轮的固定端穿过所述缺口与所述伸缩杆的另一端连接,以使所述抛光轮在所述伸缩杆的带动下相对所述标的物发生位移。In one embodiment, an end of the second polishing frame close to the target is provided with a notch, a telescopic rod is provided on the second polishing frame, and one end of the telescopic rod is connected to the second polishing frame, The fixed end of the polishing wheel is connected to the other end of the telescopic rod through the gap, so that the polishing wheel is displaced relative to the target object under the driving of the telescopic rod.

在其中一个实施例中,所述伸缩杆包括固定段和活动段,所述固定段位于所述第二抛光架上,所述活动段一端与所述固定段活动连接,另一端与所述抛光轮的固定端连接。In one embodiment, the telescopic rod includes a fixed section and a movable section, the fixed section is located on the second polishing frame, one end of the movable section is movably connected to the fixed section, and the other end is connected to the polishing frame The fixed end of the wheel is connected.

在其中一个实施例中,还包括顶杆,所述顶杆转动连接于所述第二抛光架,以在转动时抵接所述抛光轮的固定端使其相对所述第二抛光架固定或者,远离所述抛光轮的固定端使其相对所述标的物移动。In one of the embodiments, it further includes a push rod, the push rod is rotatably connected to the second polishing frame, so as to abut against the fixed end of the polishing wheel to be fixed relative to the second polishing frame when rotating, or , away from the fixed end of the polishing wheel to move it relative to the target.

在其中一个实施例中,在所述抛光机构的运动方向上,所述顶杆位于所述伸缩杆和所述抛光轮之间。In one of the embodiments, in the moving direction of the polishing mechanism, the top rod is located between the telescopic rod and the polishing wheel.

在其中一个实施例中,所述调节机构包括水平调节组件和竖直调节组件,所述水平调节组件与所述第一抛光架连接,所述竖直调节组件位于所述第一抛光架上并与所述第二抛光架连接。In one embodiment, the adjustment mechanism includes a horizontal adjustment assembly and a vertical adjustment assembly, the horizontal adjustment assembly is connected with the first polishing frame, and the vertical adjustment assembly is located on the first polishing frame and connected with the second polishing frame.

在其中一个实施例中,所述第二抛光架上设有转接板,所述转接板与所述竖直调节组件连接。In one embodiment, an adapter plate is provided on the second polishing frame, and the adapter plate is connected with the vertical adjustment assembly.

在其中一个实施例中,所述抛光机构还包括驱动件和运动转换件,所述驱动件设于所述基板上,所述运动转换件设于所述支架上,所述驱动件与所述运动转换件啮合传动。In one embodiment, the polishing mechanism further includes a driving member and a motion converting member, the driving member is provided on the substrate, the motion converting member is provided on the support, the driving member is connected to the The motion conversion member engages and drives.

在其中一个实施例中,还包括第一轴承、第二轴承和轴承卡座,所述第一轴承和第二轴承分别用于与所述标的物两端转动连接;所述轴承卡座设有与所述第一轴承配合的卡槽。In one of the embodiments, it further includes a first bearing, a second bearing and a bearing holder, the first bearing and the second bearing are respectively used for rotational connection with both ends of the object; the bearing holder is provided with A card slot matched with the first bearing.

上述抛光设备,在支架上设有相对标的物自动移动的抛光机构,可无需人工操作;通过在抛光设备上设置调节机构,可以调节抛光轮相对于标的物的位置,使绕设于抛光轮上的抛光带与标的物接触良好。The above-mentioned polishing equipment is provided with a polishing mechanism that automatically moves relative to the target object on the bracket, so that manual operation is not required; by setting an adjustment mechanism on the polishing equipment, the position of the polishing wheel relative to the target object can be adjusted, so that the polishing wheel is wound around the polishing wheel. The polishing tape is in good contact with the target.

附图说明Description of drawings

图1为本发明一实施例中的抛光设备的整体结构示意图。FIG. 1 is a schematic diagram of the overall structure of a polishing apparatus in an embodiment of the present invention.

图2为本发明一实施例中的抛光设备的部分结构示意图。FIG. 2 is a schematic diagram of a partial structure of a polishing apparatus in an embodiment of the present invention.

具体实施方式Detailed ways

本发明能够以很多不同于在此描述的其它方式来实施,本领域技术人员可以在不违背本发明内涵的情况下做类似改进,因此本发明不受下面公开的具体实施例的限制。The present invention can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the present invention. Therefore, the present invention is not limited by the specific embodiments disclosed below.

在本发明的描述中,所使用的术语“竖直”、“水平”、“上”、“下”、“左”、“右”、“中心”、“纵向”、“横向”、“长度”、“之间”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述。第一特征在第二特征“上”或“下”可以是第一和第二特征直接接触,或第一和第二特征通过中间媒介间接接触。术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。在本发明的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。In the description of the present invention, the terms "vertical", "horizontal", "upper", "lower", "left", "right", "center", "portrait", "horizontal", "length" are used The orientation or positional relationship indicated by "", "between" and the like is based on the orientation or positional relationship shown in the accompanying drawings, and is only for the convenience of describing the present invention and simplifying the description. A first feature "on" or "under" a second feature may be in direct contact with the first and second features, or in indirect contact with the first and second features through an intermediary. The terms "first" and "second" are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. In the description of the present invention, "plurality" means at least two, such as two, three, etc., unless otherwise expressly and specifically defined.

在本发明中,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解。当元件被称为“固定于”或“设置于”另一个元件,它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是“连接”另一个元件,它可以是直接连接到另一个元件或者可能同时存在居中元件。In the present invention, unless otherwise expressly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be construed in a broad sense. When an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.

参阅图1所示,本发明一实施例提供的抛光设备,可用于对辊轴类标的物进行表面抛光。上述抛光设备包括支架100,和位于支架100上的导轨200、抛光机构300、驱动机构400和调节机构500。当将被抛光的标的物,如用于浮法玻璃生产的过渡辊10,安放至支架100进行抛光时,驱动机构400提供驱动过渡辊10转动的动力。抛光机构300用于对转动状态下的过渡辊10进行表面抛光处理。抛光机构300可以沿导轨200往返滑动,以对设定长度的过渡辊10进行全面抛光。调节机构500用于在进行抛光工作前,调整抛光机构300相对过渡辊10的位置,以使抛光机构300与过渡辊10具有良好接触。Referring to FIG. 1 , a polishing apparatus provided by an embodiment of the present invention can be used to perform surface polishing on an object such as a roller shaft. The above-mentioned polishing apparatus includes a bracket 100 , a guide rail 200 located on the bracket 100 , a polishing mechanism 300 , a driving mechanism 400 and an adjusting mechanism 500 . When the object to be polished, such as the transition roller 10 for float glass production, is placed on the bracket 100 for polishing, the driving mechanism 400 provides the power to drive the transition roller 10 to rotate. The polishing mechanism 300 is used to perform surface polishing treatment on the transition roller 10 in a rotating state. The polishing mechanism 300 can slide back and forth along the guide rail 200 to perform overall polishing on the transition roller 10 of a set length. The adjusting mechanism 500 is used to adjust the position of the polishing mechanism 300 relative to the transition roller 10 before the polishing work, so that the polishing mechanism 300 and the transition roller 10 have good contact.

参阅图1所示,在本实施例中,导轨200位于支架100的工作台上,抛光机构300滑动设置于导轨200上,待抛光的过渡辊10设置导轨200的旁侧。抛光机构300上设有用于直接接触过渡辊10以对其进行抛光处理的抛光带301,抛光带301位于过渡辊10一侧且和过渡辊10表面接触。调节机构500设置在抛光机构300上。Referring to FIG. 1 , in this embodiment, the guide rail 200 is located on the worktable of the bracket 100 , the polishing mechanism 300 is slidably arranged on the guide rail 200 , and the transition roller 10 to be polished is arranged on the side of the guide rail 200 . The polishing mechanism 300 is provided with a polishing belt 301 for directly contacting the transition roller 10 for polishing. The adjustment mechanism 500 is provided on the polishing mechanism 300 .

参阅图1所示,抛光机构300包括抛光架310、抛光轮320和动力源330,抛光架310设置于导轨200上并与导轨200滑动连接。抛光轮320设置在抛光架310上,上述的抛光带301绕设在抛光轮320上,绕设在抛光轮320上的抛光带301为闭合的环状结构。动力源330与抛光轮320传动连接,用于驱动抛光轮320转动进而带动抛光带301转动。动力源330可以选用电机。Referring to FIG. 1 , the polishing mechanism 300 includes a polishing frame 310 , a polishing wheel 320 and a power source 330 . The polishing frame 310 is disposed on the guide rail 200 and is slidably connected to the guide rail 200 . The polishing wheel 320 is arranged on the polishing frame 310 , the above-mentioned polishing belt 301 is wound around the polishing wheel 320 , and the polishing belt 301 wound around the polishing wheel 320 is a closed annular structure. The power source 330 is drivingly connected with the polishing wheel 320 for driving the polishing wheel 320 to rotate, thereby driving the polishing belt 301 to rotate. The power source 330 can be an electric motor.

参阅图1所示,在本实施例所呈现的一实施方式中,设置在抛光架310上的抛光轮320包括主动轮321、第一从动轮323和第二从动轮325。主动轮321、第一从动轮323和第二从动轮325三者的中心点之间的连线呈三角形。主动轮321与动力源330连接。第一从动轮323位于过渡辊10的旁侧,以便随抛光带301转动的同时,为抛光带301作用于过渡辊10提供支撑力。第二从动轮325设置在靠近支架100工作台的位置。Referring to FIG. 1 , in an implementation manner presented in this embodiment, the polishing wheel 320 disposed on the polishing frame 310 includes a driving wheel 321 , a first driven wheel 323 and a second driven wheel 325 . The connecting line between the center points of the driving wheel 321 , the first driven wheel 323 and the second driven wheel 325 is in the shape of a triangle. The driving wheel 321 is connected to the power source 330 . The first driven wheel 323 is located on the side of the transition roller 10 to provide a supporting force for the polishing belt 301 to act on the transition roller 10 while rotating with the polishing belt 301 . The second driven wheel 325 is disposed at a position close to the working table of the bracket 100 .

参阅图2所示,为便于观察,图2中抛光设备省略了过渡辊10。抛光架310包括基板311、第一抛光架313和第二抛光架315,基板311滑动设置于导轨200上,第一抛光架313设置于基板311上,第二抛光架315与第一抛光架313连接,抛光轮320和动力源330均设置于第二抛光架315上。第二抛光架315可以与第一抛光架313直接连接,也可以通过中间元件连接。Referring to FIG. 2 , for the convenience of observation, the polishing apparatus in FIG. 2 omits the transition roller 10 . The polishing frame 310 includes a substrate 311 , a first polishing frame 313 and a second polishing frame 315 . The substrate 311 is slidably arranged on the guide rail 200 , the first polishing frame 313 is arranged on the substrate 311 , the second polishing frame 315 and the first polishing frame 313 In connection, the polishing wheel 320 and the power source 330 are both disposed on the second polishing frame 315 . The second polishing frame 315 may be directly connected with the first polishing frame 313, or may be connected through an intermediate element.

参阅图2所示,在一实施方式中,第一抛光架313包括相对基板311平行的第一水平段和相对基板311垂直的第一竖直段,上述第一水平段位于基板311上,上述第一竖直段与第二抛光架315连接。第二抛光架315包括相对基板311垂直的第二竖直段和相对基板311大致平行的第二水平段,上述第二竖直段与上述第一竖直段连接,上述第二水平段一端与第二竖直段连接,另一端朝向过渡辊10的方向。可同时参阅图1所示,主动轮321大致设置在第二竖直段与第二水平段相交的夹角位置,第一从动轮323设置在第二水平段上靠近过渡辊10的一端,第二从动轮325设置在第二竖直段上靠近基板311的一端。主动轮321、第一从动轮323和第二从动轮325均位于第二抛光架315的同一侧,动力源330位于第二抛光架315的另一侧。在本实施例中,第一从动轮323与第二从动轮315结构相同。第一从动轮323和第二从动轮325分别通过各自对应的支撑轴302与第二抛光架315连接。支撑轴302可以看作第一从动轮323的固定端部分,以支撑第一从动轮323且可使第一从动轮323绕其轴线转动。Referring to FIG. 2 , in one embodiment, the first polishing frame 313 includes a first horizontal section parallel to the substrate 311 and a first vertical section perpendicular to the substrate 311 , the first horizontal section is located on the substrate 311 , the above The first vertical section is connected to the second polishing frame 315 . The second polishing frame 315 includes a second vertical section perpendicular to the substrate 311 and a second horizontal section substantially parallel to the substrate 311 . The second vertical section is connected to the first vertical section, and one end of the second horizontal section is connected to the first vertical section. The second vertical section is connected with the other end facing the direction of the transition roller 10 . Referring to FIG. 1 at the same time, the driving wheel 321 is generally arranged at the included angle where the second vertical section and the second horizontal section intersect, the first driven wheel 323 is arranged on the second horizontal section close to one end of the transition roller 10, The two driven wheels 325 are disposed on one end of the second vertical section close to the base plate 311 . The driving wheel 321 , the first driven wheel 323 and the second driven wheel 325 are all located on the same side of the second polishing frame 315 , and the power source 330 is located on the other side of the second polishing frame 315 . In this embodiment, the first driven wheel 323 and the second driven wheel 315 have the same structure. The first driven wheel 323 and the second driven wheel 325 are respectively connected to the second polishing frame 315 through their corresponding support shafts 302 . The support shaft 302 can be regarded as a fixed end portion of the first driven wheel 323 to support the first driven wheel 323 and enable the first driven wheel 323 to rotate around its axis.

第一抛光架313的第一水平板和第一竖直段为一体成型结构,第二抛光架315的第二竖直段和第二水平段为一体成型结构,但均不限于一体成型。The first horizontal plate and the first vertical section of the first polishing frame 313 are integrally formed, and the second vertical section and the second horizontal section of the second polishing frame 315 are integrally formed, but are not limited to integral formation.

参阅图2所示,第二抛光架315的第二水平段上靠近过渡辊10的一端设有缺口312,缺口312被构造为从第二水平段上与过渡辊10相对的表面向第二竖直段的方向凹陷而成型。也就是说,第二抛光架315上对应第一从动轮323的部分被设置为缺口312。相应地,第二水平段上设有一顶杆314和一伸缩杆316,顶杆314伸缩杆316均位于第二水平段同一侧,且与抛光轮320相背。伸缩杆316一端与第二水平段固定连接,另一端与第一从动轮323的固定端连接。在水平方向上,即抛光机构300的运动方向上,顶杆314位于第一从动轮323和伸缩杆316之间。Referring to FIG. 2 , the end of the second horizontal section of the second polishing frame 315 close to the transition roller 10 is provided with a notch 312 , and the notch 312 is configured to extend from the surface of the second horizontal section opposite to the transition roll 10 to the second vertical The direction of the straight section is concave and formed. That is to say, the portion of the second polishing frame 315 corresponding to the first driven wheel 323 is set as the notch 312 . Correspondingly, a top rod 314 and a telescopic rod 316 are provided on the second horizontal section, and the telescopic rods 316 of the top rod 314 are both located on the same side of the second horizontal section and opposite to the polishing wheel 320 . One end of the telescopic rod 316 is fixedly connected to the second horizontal section, and the other end is connected to the fixed end of the first driven wheel 323 . In the horizontal direction, that is, in the moving direction of the polishing mechanism 300 , the top rod 314 is located between the first driven wheel 323 and the telescopic rod 316 .

参阅图2所示,伸缩杆316水平设置,包括固定段303和活动段305。固定段303固定在第二水平段上,活动段305的一端插设于固定段303内并可相对于固定段303往返直线运动,活动段305的另一端连接第一从动轮323的固定端部分。在本实施例中,与活动段305相对应的位置,第一从动轮323的固定端部分还设有支撑块304,活动段305的另一端与支撑块304连接。第一从动轮323对应的支撑轴302远离第一从动轮323的一端穿过缺口312与支撑块304连接。也就是说,支撑块304和第一从动轮323分别位于第二抛光架315的两侧,且对应于缺口312。需要说明的是,伸缩杆316设有自锁结构,自锁结构可以使活动段305从固定段303伸出至设定位置时,不会在异常外力作用下回缩至固定段303。自锁结构的具体设置以实现上述目的为适。Referring to FIG. 2 , the telescopic rod 316 is arranged horizontally, and includes a fixed section 303 and a movable section 305 . The fixed section 303 is fixed on the second horizontal section, one end of the movable section 305 is inserted into the fixed section 303 and can move back and forth linearly relative to the fixed section 303, and the other end of the movable section 305 is connected to the fixed end portion of the first driven wheel 323 . In this embodiment, at a position corresponding to the movable segment 305 , a support block 304 is further provided on the fixed end portion of the first driven wheel 323 , and the other end of the movable segment 305 is connected to the support block 304 . One end of the support shaft 302 corresponding to the first driven wheel 323 away from the first driven wheel 323 is connected to the support block 304 through the gap 312 . That is to say, the support block 304 and the first driven wheel 323 are respectively located on two sides of the second polishing frame 315 and correspond to the notches 312 . It should be noted that the telescopic rod 316 is provided with a self-locking structure, and the self-locking structure can make the movable section 305 extend from the fixed section 303 to the set position without retracting to the fixed section 303 under the action of abnormal external force. The specific setting of the self-locking structure is suitable to achieve the above purpose.

由于第一从动轮323连接于活动段305,活动段305可以靠近或远离固定段303,使得第一从动轮323可以靠近或远离设置过渡辊10的位置,其中,缺口312为支撑轴302提供活动空间。也即,在本实施中,主动轮321和第二从动轮325均相对第二抛光架315固定,而第一从动轮323可相对第二抛光架315移动。以上设置,可以在将过渡辊10安装至支架100之前,通过将活动段305收缩至固定段303以挪动第一从动轮323的位置而不至于干涉过渡辊10的安装。当将过渡辊10安装至支架100后,可以将活动段305从固定段303内拉伸出以使第一从动轮323移动至对应工位。Since the first driven wheel 323 is connected to the movable section 305 , the movable section 305 can be close to or away from the fixed section 303 , so that the first driven wheel 323 can be close to or away from the position where the transition roller 10 is provided, wherein the gap 312 provides movement for the support shaft 302 space. That is, in this embodiment, both the driving wheel 321 and the second driven wheel 325 are fixed relative to the second polishing frame 315 , and the first driven wheel 323 is movable relative to the second polishing frame 315 . With the above arrangement, before installing the transition roller 10 to the bracket 100 , the movable segment 305 can be retracted to the fixed segment 303 to move the position of the first driven wheel 323 without interfering with the installation of the transition roller 10 . After the transition roller 10 is installed to the bracket 100 , the movable section 305 can be pulled out from the fixed section 303 to move the first driven wheel 323 to a corresponding station.

参阅图2所示,位于第一从动轮323和伸缩杆316之间的顶杆314,与支撑块304均位于第二水平段的同侧;在水平方向上,即抛光机构300的运动方向上,也可看做顶杆314位于第二水平段和伸缩杆316之间。顶杆314可相对于第二水平段转动以抵接支撑块304或远离支撑块304。顶杆314相对于第二水平段转动的实现方式,比如,通过转轴等柱状结构与第二水平段转动连接等。顶杆314的转动平面与抛光架310沿导轨200的运动方向垂直。顶杆314在转动过程中具有偏离竖直方向设定夹角的转动范围。也就是说,顶杆31转动至与支撑块304抵接时,处于倾斜状态。Referring to FIG. 2 , the top rod 314 located between the first driven wheel 323 and the telescopic rod 316 is located on the same side of the second horizontal section as the support block 304 ; in the horizontal direction, that is, the movement direction of the polishing mechanism 300 , it can also be seen that the top rod 314 is located between the second horizontal section and the telescopic rod 316 . The top rod 314 can be rotated relative to the second horizontal section to abut against the support block 304 or away from the support block 304 . The rotation of the top rod 314 relative to the second horizontal section is implemented, for example, by connecting with the second horizontal section in rotation through a columnar structure such as a rotating shaft. The rotation plane of the ejector rod 314 is perpendicular to the movement direction of the polishing frame 310 along the guide rail 200 . The ejector rod 314 has a rotation range deviating from the vertical direction set angle during the rotation. That is, when the ejector rod 31 is rotated to contact the support block 304, it is in a tilted state.

参阅图2所示,顶杆314大致为长方体结构。顶杆314上相对的两个侧面中一侧面与支撑块304侧面相对。当伸缩杆316中活动段305未相对固定段303收缩时,将顶杆314转动至与支撑块304面接触。此时,顶杆314在竖直平面内倾斜,且对支撑块304存在作用力,可以使第一从动轮323远离主动轮321和第二从动轮325(图2未示出),以便张紧绕设在抛光轮320上的抛光带301。便于第一从动轮323在伸缩杆316的带动下发生位置变化后,可以便捷的张紧抛光带301。Referring to FIG. 2 , the top rod 314 has a substantially rectangular parallelepiped structure. One of the two opposite sides on the top rod 314 is opposite to the side of the support block 304 . When the movable section 305 in the telescopic rod 316 is not retracted relative to the fixed section 303 , the top rod 314 is rotated to make surface contact with the support block 304 . At this time, the top rod 314 is inclined in the vertical plane, and there is a force on the support block 304, which can make the first driven wheel 323 away from the driving wheel 321 and the second driven wheel 325 (not shown in FIG. 2 ), so as to be tensioned The polishing belt 301 is wound around the polishing wheel 320 . It is convenient for the polishing belt 301 to be easily tensioned after the position of the first driven wheel 323 changes under the driving of the telescopic rod 316 .

参阅图1所示,抛光机构300还包括动力组件340,动力组件340用于带动抛光架310移动。动力组件340包括驱动件341和运动转换件343。驱动件341固设在基板311上,驱动件341位于基板311的移动方向上。运动转换件343设置在支架100上的工作台上,且与导轨200并行设置。驱动件341与运动转换件343啮合传动。驱动件341的转动平面与运动转换件343的长度方向平行。在一实施方式中,驱动件341具有转动轴,转动轴与运动转换件343啮合。较为具体地,转动轴的周向上设有齿,运动转换件343上设有与转动轴啮合连接的齿。当驱动件341驱动转动轴转动时,运动转换件343将转动轴的旋转运动转化为直线运动,从而使抛光机构300实现直线位移。运动转换件343可以采用齿条结构。驱动件341可选用电机。Referring to FIG. 1 , the polishing mechanism 300 further includes a power assembly 340 , and the power assembly 340 is used to drive the polishing frame 310 to move. The power assembly 340 includes a driving member 341 and a motion converting member 343 . The driving member 341 is fixed on the base plate 311 , and the driving member 341 is located in the moving direction of the base plate 311 . The motion converting member 343 is arranged on the worktable on the bracket 100 and is arranged in parallel with the guide rail 200 . The driving member 341 is engaged with the motion converting member 343 for transmission. The rotation plane of the driving member 341 is parallel to the length direction of the motion converting member 343 . In one embodiment, the driving member 341 has a rotating shaft, and the rotating shaft is engaged with the motion converting member 343 . More specifically, teeth are provided on the circumferential direction of the rotating shaft, and teeth are provided on the motion converting member 343 in meshing connection with the rotating shaft. When the driving member 341 drives the rotating shaft to rotate, the motion converting member 343 converts the rotary motion of the rotating shaft into linear motion, so that the polishing mechanism 300 realizes linear displacement. The motion converting member 343 may adopt a rack structure. The driving member 341 may be a motor.

相比于其他驱动抛光架310运动的方式,通过驱动件341的转动轴与运动转换件343啮合传动来带动抛光机构300移动,在驱动件341与运动转换件343的传动比恒定的情况下,抛光架310的运动平稳性高且速度可调。Compared with other ways of driving the polishing frame 310 to move, the polishing mechanism 300 is driven to move by the rotating shaft of the driving member 341 engaging with the motion converting member 343 to drive. The motion of the polishing frame 310 is highly stable and the speed is adjustable.

与动力组件340的设置相适应地,在本实施例中,导轨200采用平行设置的双导轨结构,运动转换件343位于双导轨之间,也可进一步使得抛光架310运动平稳。Compatible with the setting of the power assembly 340 , in this embodiment, the guide rails 200 adopt a double guide rail structure arranged in parallel, and the motion converting member 343 is located between the double guide rails, which can further make the polishing frame 310 move smoothly.

参阅图1所示,导轨200的两端设有第一感应元件210和第二感应元件220,当第一感应元件210检测到抛光机构300运动至设定位置后,将检测信号输送给对应的控制器,控制器对抛光机构300发出控制命令使抛光机构300停止运动或者反向运动。同理,第二感应元件220也同样用于检测抛光机构300的位置并与控制器信号连接。第一感应元件210可设置为接触式换向开关,以与控制器配合改变抛光机构300与运动方向。第二感应元件220可设置为接触式停止开关,以与控制器配合控制动力源330、驱动件341和动力件410停止转动。Referring to FIG. 1 , both ends of the guide rail 200 are provided with a first sensing element 210 and a second sensing element 220 . When the first sensing element 210 detects that the polishing mechanism 300 has moved to a set position, it transmits a detection signal to the corresponding The controller sends a control command to the polishing mechanism 300 to stop or reverse the motion of the polishing mechanism 300 . Similarly, the second sensing element 220 is also used to detect the position of the polishing mechanism 300 and is signal-connected to the controller. The first sensing element 210 can be configured as a contact-type reversing switch, so as to cooperate with the controller to change the polishing mechanism 300 and the moving direction. The second sensing element 220 can be configured as a contact stop switch, so as to cooperate with the controller to control the power source 330 , the driving member 341 and the power member 410 to stop rotating.

参阅图2所示,设置于抛光机构300上的调节机构500包括水平调节组件510和竖直调节组件530。水平调节组件510用于调整抛光带301在水平方向上相对于过渡辊10的距离,竖直调节组件530用于调整抛光带301在竖直方向上相对于过渡辊10的距离。Referring to FIG. 2 , the adjusting mechanism 500 disposed on the polishing mechanism 300 includes a horizontal adjusting assembly 510 and a vertical adjusting assembly 530 . The horizontal adjustment assembly 510 is used to adjust the distance of the polishing belt 301 relative to the transition roller 10 in the horizontal direction, and the vertical adjustment assembly 530 is used to adjust the distance of the polishing belt 301 relative to the transition roller 10 in the vertical direction.

参阅图2所示,水平调节组件510位于基板311上,且与第一抛光架313连接以使第一抛光架313发生位移。水平调节组件510包括第一手轮511和第一调节杆513,第一调节杆513一端与第一手轮511连接,另一端与第一抛光架313的第一水平段连接。当顺时针或逆时针转动第一手轮511时,第一抛光架313沿第一调节杆513水平往返移动,进而带动抛光带301靠近或远离过渡辊10。竖直调节组件530位于第一抛光架313的第一竖直段上。竖直调节组件530包括第二手轮531和第二调节杆533,第二调节杆533一端与第二手轮531连接,另一端与第二抛光架315的第二竖直段连接。当顺时针或逆时针转动第二手轮531时,第二抛光架315沿第二调节杆533竖直往返移动,进而调整抛光带301相对过渡辊10的位置,在调整过程中,第一抛光架313不发生位移。Referring to FIG. 2 , the leveling component 510 is located on the substrate 311 and is connected to the first polishing frame 313 so that the first polishing frame 313 can be displaced. The level adjustment assembly 510 includes a first hand wheel 511 and a first adjustment rod 513 , one end of the first adjustment rod 513 is connected with the first hand wheel 511 , and the other end is connected with the first horizontal section of the first polishing frame 313 . When the first hand wheel 511 is rotated clockwise or counterclockwise, the first polishing frame 313 moves horizontally back and forth along the first adjusting rod 513 , thereby driving the polishing belt 301 closer to or away from the transition roller 10 . The vertical adjustment assembly 530 is located on the first vertical section of the first polishing frame 313 . The vertical adjustment assembly 530 includes a second hand wheel 531 and a second adjustment rod 533 , one end of the second adjustment rod 533 is connected with the second hand wheel 531 , and the other end is connected with the second vertical section of the second polishing frame 315 . When the second hand wheel 531 is rotated clockwise or counterclockwise, the second polishing frame 315 vertically moves back and forth along the second adjusting rod 533, thereby adjusting the position of the polishing belt 301 relative to the transition roller 10. During the adjustment process, the first polishing The frame 313 is not displaced.

参阅图2所示,与竖直调节组件530带动第二抛光架315相适应地,第二抛光架315上设有转接板317,转接板317一端与第二调节杆533连接,另一端位于第二抛光架315的第二竖直段上。也就是说,第二抛光架315不与第一抛光架313直接连接,而是与第二调节杆533连接。如此设置,可以使得在调整水平调节组件510时,第一抛光架313与第二抛光架315同时发生位移,在调整竖直调节组件530时,仅第二抛光架315发生位移。Referring to FIG. 2 , in accordance with the vertical adjustment assembly 530 driving the second polishing frame 315 , the second polishing frame 315 is provided with an adapter plate 317 , one end of the adapter plate 317 is connected to the second adjustment rod 533 , and the other end On the second vertical section of the second polishing frame 315 . That is, the second polishing frame 315 is not directly connected with the first polishing frame 313 , but is connected with the second adjusting rod 533 . In this way, the first polishing frame 313 and the second polishing frame 315 can be displaced simultaneously when the horizontal adjusting assembly 510 is adjusted, and only the second polishing frame 315 can be displaced when the vertical adjusting assembly 530 is adjusted.

将水平调节组件510设置在基板311上且与第一抛光架313连接、竖直调节组件530设置在第一抛光架313上且第二抛光架315与竖直调节组件530连接的结构设置,相比于另一些实施例中竖直调节组件530不设置在第一抛光架313上,本实施例中上述的结构设置,结构简单,占用空间小且元件个数少。The horizontal adjustment assembly 510 is disposed on the substrate 311 and connected to the first polishing frame 313, the vertical adjustment assembly 530 is disposed on the first polishing frame 313, and the second polishing frame 315 is connected to the vertical adjustment assembly 530. Compared with other embodiments in which the vertical adjustment assembly 530 is not disposed on the first polishing frame 313, the above-mentioned structural arrangement in this embodiment has a simple structure, occupies a small space and has a small number of components.

参阅图2所示,驱动机构400包括动力件410,动力件410可通过带传动的方式驱动过渡辊10转动。可同时参阅图1所示,驱动机构400包括传动带420,当过渡辊10安装至支架100上后,动力件410通过传动带420驱动过渡辊10转动。Referring to FIG. 2 , the driving mechanism 400 includes a power member 410 , and the power member 410 can drive the transition roller 10 to rotate through a belt drive. 1 , the driving mechanism 400 includes a transmission belt 420 . When the transition roller 10 is installed on the bracket 100 , the power member 410 drives the transition roller 10 to rotate through the transmission belt 420 .

参阅图1所示,抛光设备还包括滚轮20,滚轮20安装在支架100的底端,支架100在外力作用下被推动时,滚轮20发生转动以便于支架100被移动到设定位置。滚轮20可以采用万向轮等。通过在支架100上安装滚轮20,可以使得整台抛光设备便于移动,以随时更换抛光设备的工作地点。Referring to FIG. 1 , the polishing apparatus further includes a roller 20 . The roller 20 is installed at the bottom end of the bracket 100 . When the bracket 100 is pushed by an external force, the roller 20 rotates so that the bracket 100 can be moved to a set position. The roller 20 can be a universal wheel or the like. By installing the roller 20 on the bracket 100, the entire polishing equipment can be moved easily, so as to change the working location of the polishing equipment at any time.

参阅图1所示,抛光设备还包括轴承卡座110、第一轴承11和第二轴承12。第一轴承11和第二轴承12用于将过渡辊10支撑在支架100上,同时过渡辊10可相对第一轴承11和第二轴承12转动。轴承卡座110用于支撑第一轴承11。在一具体实施方式中,轴承卡座110上设有卡槽111,卡槽111被构造为轴承卡座110的上表面向下凹陷成型的结构。轴承卡座110上形成的卡槽111在过渡辊10的长度方向上是开放的,而非封闭,以利于过渡辊10的安装。卡槽111的槽底呈台阶形式,台阶形式是指卡槽111的槽宽在竖直方向上不是恒定的,至少具有两个不同尺寸。Referring to FIG. 1 , the polishing apparatus further includes a bearing holder 110 , a first bearing 11 and a second bearing 12 . The first bearing 11 and the second bearing 12 are used to support the transition roller 10 on the bracket 100 , and the transition roller 10 can rotate relative to the first bearing 11 and the second bearing 12 . The bearing holder 110 is used to support the first bearing 11 . In a specific embodiment, the bearing holder 110 is provided with a holder groove 111 , and the holder groove 111 is configured as a structure in which the upper surface of the bearing holder 110 is concavely formed downward. The slot 111 formed on the bearing holder 110 is open in the length direction of the transition roller 10 instead of being closed, so as to facilitate the installation of the transition roller 10 . The groove bottom of the card slot 111 is in the form of steps, and the step form means that the groove width of the card slot 111 is not constant in the vertical direction, and has at least two different sizes.

当过渡辊10安装在支架100状态下,支撑过渡辊10的第一轴承11嵌合在卡槽111内,第一轴承11与卡槽111槽底的台阶面上下抵接,支撑过渡辊10的第二轴承12可直接设置在支架100工作台上。当过渡辊10被抛光过程中发生弯曲或倾斜时,第一轴承11具有倾斜趋势,由于第一轴承11被轴承卡座110卡槽111的台阶面抵接,因此轴承卡座110具有防止第一轴承11移位的作用,进而自适应调整过渡辊10的位置。When the transition roller 10 is installed on the bracket 100 , the first bearing 11 supporting the transition roller 10 is fitted into the clamping groove 111 , the first bearing 11 abuts the stepped surface of the groove bottom of the clamping groove 111 up and down, and supports the transition roller 10 . The second bearing 12 may be directly disposed on the working table of the bracket 100 . When the transition roller 10 is bent or inclined during the polishing process, the first bearing 11 has a tendency to incline. The position of the transition roller 10 is adaptively adjusted due to the displacement of the bearing 11 .

在一些实际工作场景中,如过渡辊10用于浮法玻璃生产工艺时,若干个过渡辊10并行设置,浮法玻璃可在过渡辊10转动过程中被输送至指定位置。其中用于生产线上的过渡辊10,其两端安装有第一轴承11和第二轴承12,当需要对过渡辊10进行表面抛光时,可以直接将安装有第一轴承11和第二轴承12的过渡辊10作为整体安放至支架100上,其中第一轴承11嵌合于支架100上的轴承卡座110内,第二轴承12直接放置于支架100工作台上,通过螺钉与支架100工作台固定。以此,可以不用将过渡辊10从原来的具有装配关系的第一轴承11和第二轴承12上拆除再放置到抛光设备上,降低操作难度,降低拆装时间成本。其中,轴承卡座110上卡槽111的尺寸等与第一轴承11形状相适应。In some practical working scenarios, for example, when the transition rollers 10 are used in the float glass production process, several transition rollers 10 are arranged in parallel, and the float glass can be transported to a designated position during the rotation of the transition rollers 10 . The first bearing 11 and the second bearing 12 are installed at both ends of the transition roll 10 used in the production line. When the surface of the transition roll 10 needs to be polished, the first bearing 11 and the second bearing 12 can be directly installed. The transition roller 10 is placed on the bracket 100 as a whole, wherein the first bearing 11 is embedded in the bearing holder 110 on the bracket 100, the second bearing 12 is directly placed on the bracket 100 worktable, and the bracket 100 worktable is connected to the bracket 100 by screws. fixed. In this way, the transition roller 10 does not need to be removed from the original first bearing 11 and the second bearing 12 having an assembled relationship and placed on the polishing equipment, which reduces the difficulty of operation and reduces the time and cost of disassembly and assembly. The size of the slot 111 on the bearing holder 110 is adapted to the shape of the first bearing 11 .

参阅图1所示,抛光设备还设有控制柜600,控制柜600上设有操作面板。抛光机构300、驱动机构400、第一感应元件210和第二感应元件220均与控制柜600内控制器连接。操作者可通过操控操作面板启停抛光设备。Referring to FIG. 1 , the polishing equipment is further provided with a control cabinet 600 , and the control cabinet 600 is provided with an operation panel. The polishing mechanism 300 , the driving mechanism 400 , the first sensing element 210 and the second sensing element 220 are all connected to the controller in the control cabinet 600 . The operator can start and stop the polishing equipment by operating the operation panel.

本发明实施例提供的抛光设备,对过渡辊10进行抛光的工作过程为:在安装过渡辊10前,转动第二抛光架315上的顶杆314使其远离支撑块304,然后将活动段305收缩至固定段303使第一从动轮323为过渡辊10的安装提供避让。将过渡辊10吊装至支架100,过渡辊10一端的第一轴承11嵌合于轴承卡座110,另一端的第二轴承12固定在支架100上。将第一从动轮323复位至待工作的位置并张紧抛光带301。然后控制过渡辊10先转动,同时启动抛光机构300上的动力源330。操作调节机构500,将抛光带301上绕设于第一从动轮323的部分调整至适合于过渡辊10抛光的位置。然后启动抛光机构300中的驱动件341,使驱动件341与运动转换件343啮合传动,以带动抛光架310沿导轨200移动对旋转的过渡辊10进行抛光。当抛光架310中基板311触碰到第一感应元件210或第二感应元件220时,抛光架310改变运动方向或停止移动。In the polishing apparatus provided by the embodiment of the present invention, the working process of polishing the transition roller 10 is as follows: before installing the transition roller 10, rotate the top rod 314 on the second polishing frame 315 to keep it away from the support block 304, and then move the movable section 305 Retraction to the fixed section 303 allows the first driven wheel 323 to provide relief for the installation of the transition roller 10 . The transition roller 10 is hoisted to the bracket 100 , the first bearing 11 at one end of the transition roller 10 is fitted into the bearing holder 110 , and the second bearing 12 at the other end is fixed on the bracket 100 . The first driven wheel 323 is reset to the position to be operated and the polishing belt 301 is tensioned. Then, the transition roller 10 is controlled to rotate first, and the power source 330 on the polishing mechanism 300 is activated at the same time. The adjusting mechanism 500 is operated to adjust the portion of the polishing belt 301 wound around the first driven wheel 323 to a position suitable for polishing by the transition roller 10 . Then, the driving member 341 in the polishing mechanism 300 is activated, so that the driving member 341 engages with the motion converting member 343 for transmission, so as to drive the polishing frame 310 to move along the guide rail 200 to polish the rotating transition roller 10 . When the substrate 311 in the polishing frame 310 touches the first sensing element 210 or the second sensing element 220 , the polishing frame 310 changes the moving direction or stops moving.

上述抛光设备,结构紧凑,便于移动。抛光机构300运动平稳,抛光过程中无需人工操作,抛光后的过渡辊10表面精度高。The above-mentioned polishing equipment has a compact structure and is easy to move. The polishing mechanism 300 moves smoothly, no manual operation is required in the polishing process, and the surface precision of the transition roller 10 after polishing is high.

以上所述实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例中的各个技术特征所有可能的组合都进行描述,然而,只要这些技术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。The technical features of the above-described embodiments can be combined arbitrarily. For the sake of brevity, all possible combinations of the technical features in the above-described embodiments are not described. However, as long as there is no contradiction between the combinations of these technical features, All should be regarded as the scope described in this specification.

以上所述实施例仅表达了本发明的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。The above-mentioned embodiments only represent several embodiments of the present invention, and the descriptions thereof are specific and detailed, but should not be construed as a limitation on the scope of the invention patent. It should be pointed out that for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can also be made, which all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention should be subject to the appended claims.

Claims (10)

1. A polishing device is used for polishing the surface of a roll shaft type object and is characterized by comprising:
a support carrying the subject matter;
the guide rail is fixed on the bracket;
the driving mechanism is fixed on the bracket and used for driving the target object to rotate;
the polishing frame is arranged on the guide rail and slides back and forth along the guide rail so as to drive the polishing wheel to move relative to the object;
and the adjusting mechanism is positioned on the polishing frame so as to adjust the position of the polishing wheel relative to the object.
2. The polishing apparatus of claim 1, wherein the polishing carrier comprises a substrate, a first polishing carrier, and a second polishing carrier, the substrate being positioned on the rail, the first polishing carrier being positioned on the substrate, the second polishing carrier being coupled to the first polishing carrier, the polishing wheel being positioned on the second polishing carrier and being movable relative to the target.
3. The polishing apparatus as claimed in claim 2, wherein a notch is provided at one end of the second polishing frame close to the object, a telescopic rod is provided on the second polishing frame, one end of the telescopic rod is connected to the second polishing frame, and the fixed end of the polishing wheel passes through the notch and is connected to the other end of the telescopic rod, so that the polishing wheel is driven by the telescopic rod to displace relative to the object.
4. The polishing apparatus as recited in claim 3, wherein the telescopic rod comprises a fixed section and a movable section, the fixed section is located on the second polishing frame, one end of the movable section is movably connected with the fixed section, and the other end of the movable section is connected with the fixed end of the polishing wheel.
5. The polishing apparatus as recited in claim 3, further comprising a carrier rod rotatably coupled to the second polishing frame to abut against the fixed end of the polishing wheel to be fixed relative to the second polishing frame or to move away from the fixed end of the polishing wheel to be movable relative to the subject when rotated.
6. The polishing apparatus as recited in claim 5, wherein the carrier rod is located between the telescopic rod and the polishing wheel in a moving direction of the polishing mechanism.
7. The polishing apparatus of claim 2, wherein the adjustment mechanism comprises a horizontal adjustment assembly coupled to the first polishing frame and a vertical adjustment assembly positioned on the first polishing frame and coupled to the second polishing frame.
8. The polishing apparatus of claim 7, wherein an adapter plate is provided on the second polishing frame, the adapter plate being connected to the vertical adjustment assembly.
9. The polishing apparatus as recited in claim 2, wherein the polishing mechanism further comprises a driving member disposed on the substrate and a motion conversion member disposed on the frame, the driving member being in meshing engagement with the motion conversion member.
10. The polishing apparatus according to claim 1, further comprising: the bearing comprises a first bearing, a second bearing and a bearing clamping seat, wherein the first bearing and the second bearing are respectively used for being rotationally connected with two ends of the object; the bearing clamping seat is provided with a clamping groove matched with the first bearing.
CN202111654395.3A 2021-12-30 2021-12-30 Polishing equipment Pending CN114393480A (en)

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Citations (7)

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Publication number Priority date Publication date Assignee Title
CN107175567A (en) * 2017-06-05 2017-09-19 江苏省(扬州)数控机床研究院 A kind of polishing machine
CN208100042U (en) * 2018-03-28 2018-11-16 东莞市欧莱溅射靶材有限公司 A kind of outer cylindrical polishing equipment of high-purity copper rotating target
CN208231496U (en) * 2018-05-25 2018-12-14 嘉兴洁尘环保科技有限公司温州分公司 Explosion-proof abrasive belt polishing equipment
US20190118335A1 (en) * 2017-10-25 2019-04-25 Ebara Corporation Polishing apparatus
CN110355658A (en) * 2018-04-10 2019-10-22 厦门佰事兴新材料科技有限公司 A kind of polishing mechanical hand
CN111660178A (en) * 2020-07-17 2020-09-15 航成(天津)科技有限公司 Longitudinal polishing equipment for shaft parts
CN213438885U (en) * 2020-06-22 2021-06-15 辽宁忠旺模具有限公司 Polishing device for shaft excircle

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107175567A (en) * 2017-06-05 2017-09-19 江苏省(扬州)数控机床研究院 A kind of polishing machine
US20190118335A1 (en) * 2017-10-25 2019-04-25 Ebara Corporation Polishing apparatus
CN208100042U (en) * 2018-03-28 2018-11-16 东莞市欧莱溅射靶材有限公司 A kind of outer cylindrical polishing equipment of high-purity copper rotating target
CN110355658A (en) * 2018-04-10 2019-10-22 厦门佰事兴新材料科技有限公司 A kind of polishing mechanical hand
CN208231496U (en) * 2018-05-25 2018-12-14 嘉兴洁尘环保科技有限公司温州分公司 Explosion-proof abrasive belt polishing equipment
CN213438885U (en) * 2020-06-22 2021-06-15 辽宁忠旺模具有限公司 Polishing device for shaft excircle
CN111660178A (en) * 2020-07-17 2020-09-15 航成(天津)科技有限公司 Longitudinal polishing equipment for shaft parts

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Application publication date: 20220426