CN114166875B - Back-scattering inspection system - Google Patents
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- CN114166875B CN114166875B CN202010954645.4A CN202010954645A CN114166875B CN 114166875 B CN114166875 B CN 114166875B CN 202010954645 A CN202010954645 A CN 202010954645A CN 114166875 B CN114166875 B CN 114166875B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/203—Measuring back scattering
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
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- G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
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- G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
- G01V5/00—Prospecting or detecting by the use of ionising radiation, e.g. of natural or induced radioactivity
- G01V5/20—Detecting prohibited goods, e.g. weapons, explosives, hazardous substances, contraband or smuggled objects
- G01V5/22—Active interrogation, i.e. by irradiating objects or goods using external radiation sources, e.g. using gamma rays or cosmic rays
- G01V5/222—Active interrogation, i.e. by irradiating objects or goods using external radiation sources, e.g. using gamma rays or cosmic rays measuring scattered radiation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/053—Investigating materials by wave or particle radiation by diffraction, scatter or reflection back scatter
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
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Abstract
The present invention relates to a backscatter inspection system. Disclosed is a backscatter inspection system comprising: an X-ray source for generating X-rays; the pencil beam forming device is used for modulating the X-rays generated by the X-ray source into an X-ray pencil beam; two detectors for receiving X-rays backscattered from the modulated X-ray pencil beam upon irradiation of the object to be inspected, the two detectors being arranged spaced apart to form a gap, the detectors comprising a receiving face for facing the object to be inspected; and shielding means, located adjacent to the gap between the two detectors and/or the receiving face of the detectors, for reducing the influence of scattering on the detectors caused before the X-ray pencil beam reaches the object to be examined.
Description
Technical Field
The present invention relates to the field of X-ray inspection, and in particular to a backscatter inspection system.
Background
The X-ray back-scattering imaging technology has been widely used in the field of safety inspection of human bodies, cargoes and vehicles because of its advantages of low radiation dose, good safety, sensitivity to light materials, etc. The X-ray back-scattering imaging technology obtains a substance image within a certain depth of the surface of an object by detecting the scattering intensity of different substances on X-rays. The back scattering inspection system comprises an X-ray source and a detector, wherein X-rays emitted by the X-ray source form pencil beams through a pencil beam forming device, and point-by-point scanning is carried out on the surface of an object to be inspected; the detector receives the scattered signals of the object and forms a depth image of the object surface.
The intensity of the X-ray scattered from the surface of the object after being irradiated by the X-ray is inversely proportional to the square of the distance from the irradiation point of the surface of the object. It is therefore desirable that the detector is located as close as possible to the object surface illumination point. Current backscatter inspection systems typically include two detectors at the front end, with the X-ray source and pencil beam forming device located behind the detectors. The X-ray pen beam passes through the gap between the two detectors and continuously moves to scan and check the target object.
The above described backscatter inspection system puts conflicting demands on the width of the gap between detectors. On the one hand, the gap between the detectors needs to be as narrow as possible to reduce the distance between the detectors and the illuminated point of the object surface for a stronger scattering signal. On the other hand, since the X-ray source and the pencil beam forming device are located behind the detector, when the pencil beam passes through the narrow detector slit, its own scattering can cause interference signals to the detector, affecting the imaging quality. In addition, scatter caused by the X-rays passing through the front panel of the backscatter inspection system can also cause interference signals to the detector.
For this reason, a backscatter inspection system capable of reducing internal scatter interference is required.
Disclosure of Invention
It is an object of the present invention to provide a backscatter inspection system capable of reducing internal scatter interference. It is a further object of the invention to provide a backscatter inspection system that is capable of improving imaging quality.
One aspect of the present invention provides a backscatter inspection system comprising: an X-ray source for generating X-rays; the pencil beam forming device is used for modulating the X-rays generated by the X-ray source into an X-ray pencil beam; two detectors for receiving X-rays backscattered from the modulated X-ray pencil beam upon irradiation of the object to be inspected, the two detectors being arranged spaced apart to form a gap, the detectors comprising a receiving face for facing the object to be inspected; and shielding means, located adjacent to the gap between the two detectors and/or the receiving face of the detectors, for reducing the influence of scattering on the detectors caused before the X-ray pencil beam reaches the object to be examined.
According to an embodiment of the invention, the shielding means comprises two slit shielding portions arranged in a slit between the two detectors and forming a gap, wherein the gap between the two slit shielding portions is aligned with the pencil beam forming means such that the modulated X-ray pencil beam can pass through the gap between the two slit shielding portions.
According to an embodiment of the invention, the backscatter inspection system further comprises a front panel disposed in front of the receiving face of the detector for blocking external foreign objects from contacting the detector.
According to an embodiment of the invention, the shielding means comprises two front side shielding portions arranged between the front panel and the receiving surface of the detector and covering a portion of the receiving surface of the detector close to the slit, the two front side shielding portions being spaced apart to form a gap, the gap between the two front side shielding portions being aligned with the pencil beam forming means to enable the modulated X-ray pencil beam to pass through the gap between the two front side shielding portions.
According to an embodiment of the present invention, the first slit shielding portion and the first front side shielding portion are integrally formed, and the second slit shielding portion and the second front side shielding portion are integrally formed.
According to an embodiment of the present invention, the first slit shielding portion, the first front side shielding portion, the second slit shielding portion, and the second front side shielding portion are integrally formed.
According to an embodiment of the invention, the backscatter inspection system further comprises a housing, the X-ray source, the pencil beam forming device, the two detectors and the shielding device being arranged within the housing.
According to an embodiment of the invention, the backscatter inspection system further comprises a controller for generating a backscatter X-ray image from the backscatter X-rays received by the detector.
According to an embodiment of the invention, the backscatter inspection system further comprises a display for displaying the backscatter X-ray image generated by the controller.
According to an embodiment of the invention, the backscatter inspection system comprises shielding means, which reduces the influence of scatter caused by the X-ray pen beam before it reaches the object to be inspected on the detector, i.e. reduces the influence of disturbing scatter caused inside the backscatter inspection system on the detector. Therefore, the backscatter inspection system including the shielding device can effectively reduce the influence of internal interference scattering on scanning imaging, and improve the quality of a backscatter image, such as image contrast.
Drawings
FIG. 1 is a schematic diagram of a backscatter inspection system in accordance with an embodiment of the present invention.
Fig. 2 is a schematic diagram of a pencil beam forming device according to an embodiment of the present invention.
Fig. 3 is a schematic diagram of a backscatter inspection system including a shielding device in accordance with an embodiment of the present invention.
Fig. 4 is a schematic view of a shielding device according to an embodiment of the invention.
Fig. 5 is a schematic diagram of a backscatter inspection system including a shielding device in accordance with an embodiment of the present invention.
Fig. 6 is a schematic view of a shielding device according to an embodiment of the invention.
Detailed Description
Hereinafter, embodiments of the present invention are described with reference to the drawings. The following detailed description and drawings are provided to illustrate the principles of the invention and are not limited to the preferred embodiments described, the scope of which is defined by the claims. The invention will now be described in detail with reference to exemplary embodiments, some examples of which are illustrated in the accompanying drawings. The following description refers to the accompanying drawings in which the same reference numerals in different drawings represent the same or similar elements, unless otherwise indicated. The schemes described in the following exemplary embodiments do not represent all schemes of the present invention. Rather, these are merely examples of systems and methods of various aspects of the present invention that are set forth in the following claims.
The backscatter inspection device according to embodiments of the present invention can perform scanning inspection on an object, such as a vehicle, a wall surface of a building, or other object requiring authentication of internal structure and internal article security. The backscatter inspection device according to the embodiments of the present invention is particularly suitable as a portable backscatter inspection device.
FIG. 1 is a schematic diagram of a backscatter inspection system in accordance with some embodiments of the present invention. As shown in FIG. 1, the backscatter inspection system 10 can include a housing 11, an X-ray source 12, a pencil beam forming device 13, a detector 14, a controller 15, and a display 16. The X-ray source 12, the pencil beam forming device 13 and the detector 14 may be arranged inside the housing 11. It should be noted that fig. 1 shows the housing 11 in partial cross-section for the purpose of illustrating components within the housing 11. The backscatter inspection system can scan the object 20 towards the object to be inspected. One side of the housing 11 is intended to face the object 20 to be inspected.
The X-ray source 12 is used to generate X-rays. The pencil beam forming device 13 is used for modulating the X-rays generated by the X-ray source 12 into an X-ray pencil beam. The detector 14 is used to receive X-rays back-scattered from the object 20 to be inspected after the X-ray pencil beam modulated by the pencil beam forming device 13 is irradiated to the object 20 to be inspected.
The controller 15 is arranged to generate a back-scattered X-ray image from the back-scattered X-rays received by the detector 14. The controller 15 may be provided inside the housing 11 as shown in fig. 1, for example, on a side of the housing 11 remote from the detector 14, or may be provided outside the housing 11. The controller 15 is communicatively coupled to the X-ray source 12, the detector 14, etc., such as by wired or wireless communication.
The display 16 is used to display the back-scattered X-ray image generated by the controller 15. The display 16 is communicatively connected to the controller 15, for example by wired or wireless communication. In some embodiments, the display 16 may be disposed outside of the housing 11, such as separate from the housing 11 as shown in FIG. 1, or the display 16 may be coupled to the housing 11.
In the backscatter inspection system, the X-ray source 12 is located at the rear of the backscatter inspection system, the detector 14 is located at the front, and the pencil beam forming device 13 is located between the X-ray source 12 and the detector 14. Herein, "front" and "front" refer to the side of the backscatter inspection system facing toward the object 20 to be inspected, and "rear" refer to the side of the backscatter inspection system facing away from the object 20 to be inspected.
According to an embodiment of the invention, the backscatter inspection system includes two detectors 14. The two detectors 14 are arranged spaced apart so as to form a gap between the two detectors 14. Each detector 14 comprises a front surface for facing the object 20 to be inspected and a side surface facing the other detector at the gap. The front surface serves as a receiving surface for the detector 14 for receiving the backscattered X-rays.
The X-ray source 12 emits X-rays (e.g., large opening angle X-rays) when the backscatter inspection system performs a scanning inspection of the object 20 to be inspected; the pencil beam forming device 13 modulates the X-rays emitted from the X-ray source 12 into an X-ray pencil beam rotating at a high speed; the X-ray pencil beam passes through the gap between the two detectors 14 and finally impinges on the object 20 to be inspected. In some embodiments, the pencil beam forming device modulates the pencil beam such that its projection moves in a straight line at a high speed, thereby allowing one-dimensional scanning of the object 20 to be inspected. In addition, when the object 20 to be inspected is scanned in one dimension, the backscatter inspection system may also be moved in a direction perpendicular to the one-dimensional scanning direction, so that the backscatter inspection system scans across a range of a certain area, i.e. performs two-dimensional scanning on the object 20 to be inspected. The detector 14 may receive the X-rays back-scattered from the object 20 to be examined and generate back-scattered signals during scanning, and the controller 15 may acquire the back-scattered signals from the detector 14 and generate an X-ray back-scattered image, e.g. a two-dimensional image with a certain depth. The display 16 may then display the generated X-ray backscatter image. During the scanning process, the outer surface of the backscatter inspection system conforms to the surface of the object 20 to be inspected.
The pencil beam forming device 13 may take various forms, such as a disk, wheel, column, etc. rotary modulation device. The following describes a disk chopper apparatus as an example. Fig. 2 is a schematic diagram of a pencil beam forming device according to an embodiment of the present invention. As shown in fig. 2, the pencil beam forming device 13 may include a shielding plate 31, a chopper wheel 32, and a shielding plate 33. During operation, the high angle X-rays first reach the slotted shield plate 31 and pass through the slots to form a fan beam, and then reach the rotating chopper wheel 32 and form a reciprocating X-ray pencil beam. A shield plate 33 with slits may be placed on the exit side of the chopper wheel 32. In general, the shield plates 31, 33 and the chopper wheel 32 are made of a metallic material having a high atomic number, such as lead, tin, iron, tungsten, or an alloy thereof, or the like. The shielding plates 31, 33 and chopper wheel 32 need to have a certain thickness to have a sufficient shielding effect for rays other than the desired X-ray pencil beam. The shielding plates 31, 33 and the chopper wheel 32 are parallel to each other and kept at a fixed distance, so that the chopper wheel 32 can be rotated at a stable high speed. The pencil beam forming device 13 is capable of forming an X-ray pencil beam and has an effective shielding effect, but at the exit side of the pencil beam forming device 13, a certain scattered X-ray is still unavoidable.
The X-ray pencil beam modulated by the pencil beam forming means 13 passes through the gap between the two detectors 14 and finally irradiates the surface of the object 20 to be inspected. The X-ray pencil beam will penetrate a certain depth of the object 20 to be inspected and interact with the object 20 to be inspected. Part of the X-rays are back-scattered and reach the front surface of the detector 14. As the scanning of the backscatter inspection system moves, the X-ray pencil beam moves across the surface of the object 20 to be inspected. Since the X-ray pencil beam irradiated onto the object 20 to be inspected has a certain moving range, and the receiving range of the front surface of the detector 14 needs to cover the back-scattered X-rays of sufficient intensity from the moving range, the front surface of the detector 14 needs to have a sufficient area to receive the back-scattered X-rays. In some embodiments, to collect backscattered X-rays of sufficient intensity within the area, the detector 14 may be configured as a polyhedron with cavities capable of reflecting the light signal, i.e. the detector 14 has a certain thickness.
According to some embodiments of the present invention, the backscatter inspection system may further include a front panel 17 placed in front of the detector 14 for blocking external foreign objects from contacting the detector 14. The front panel 17 may serve to block external dust, moisture, foreign matter, etc. from entering into gaps between the detectors 14 or scratch the surface of the detectors 14. When the backscatter inspection system includes a front panel 17, the X-ray pencil beam passing through the gap between the two detectors 14 also needs to penetrate the front panel 17 before reaching the object 20 to be inspected. The front panel 17 is generally made of a lighter material to reduce attenuation of radiation, such as acrylic, plastic, carbon fiber, etc. These materials have less attenuation of X-rays but are more diffuse as the X-rays pass through.
In the backscatter inspection system 10, the X-ray pencil beam may produce scatter from other surfaces before reaching the surface of the object 20 to be inspected, which may be detected by the detector 14 as disturbing scatter and thus affect the accuracy of the backscatter inspection. For example, as an X-ray pencil beam passes through a gap between two detectors 14, scattered X-rays leaking from pencil beam forming device 13 may reach side surfaces of two detectors 14 located at the gap. Furthermore, when the X-ray pencil beam penetrates the front panel 17, scattered X-rays caused by the front panel 17 may also reach the surface of the detector 14 as disturbing scatter. Both of these scatter will become interference scatter to detector 14.
In accordance with an embodiment of the present invention, to reduce the effect of interference scattering on detector 14, backscatter inspection system 10 may also include shielding. The structure of the shielding device and the backscatter inspection system including the shielding device is described below with reference to the drawings. Fig. 3 is a schematic diagram of a backscatter inspection system including a shielding device in accordance with some embodiments of the present invention. Fig. 4 is a schematic view of the shielding device shown in fig. 3. Fig. 5 is a schematic diagram of a backscatter inspection system including a shielding device in accordance with some embodiments of the invention. Fig. 6 is a schematic view of the shielding device shown in fig. 5. It should be noted that for ease of illustration and to avoid obscuring emphasis, the housing 11 is shown in fig. 3 and 5 in partial cross-section only, and the X-ray source 12, pencil beam forming device 13, controller 15 and display 16 of the backscatter inspection system 10 are not shown. The descriptions of these non-illustrated components are referred to above and are not repeated here.
As shown in fig. 3 and 5, shielding means 18 may be provided adjacent to the gap between two detectors 14 and/or the front surface of the detectors 14 to reduce the effect of scatter on the detectors 14 caused before the X-ray pencil beam reaches the object to be examined.
In an exemplary embodiment, as shown in fig. 4 and 6, the shielding device 18 may include a slit shielding portion 81 and a front shielding portion 82. The slit shielding portion 81 serves to shield interference scattering in a slit between the two detectors 14. The front side shielding portion 82 serves to shield interference scattering near the slit of the front surface of the detector 14.
In an exemplary embodiment, the shielding device 18 may include two slit shielding portions 81 and two front shielding portions 82. Thereby, the shielding device 18 is divided into two shielding units, each comprising one slit shielding part 81 and one front shielding part 82. One slit unit for one detector 14 and another slit unit for another detector 14. The two slit shielding portions 81 are arranged spaced apart to form a gap and the gap is aligned with a pencil beam forming device of the backscatter inspection system to enable an X-ray pencil beam to pass through the gap. Furthermore, the two front side shielding portions 82 are arranged spaced apart to form a gap, and the gap is aligned with the pencil beam forming device to enable the X-ray pencil beam to pass through the gap.
According to some embodiments of the present invention, as shown in fig. 4, two slit shielding portions 81 and two front side shielding portions 82 may be integrally formed. For example, the shielding device 18 may be integrally formed in a flat tub shape with both ends open. The two slit shielding portions 81 may be respectively attached to side surfaces of the two detectors 14, and the two front side shielding portions 82 may be respectively attached to front surfaces of the two detectors 14 at junctions of the side surfaces and the front surfaces of the detectors 14. The two slit shielding portions 81 may be connected at both lateral sides thereof by side plates. The two slit shielding portions 81 and the two side plates may form an opening on the X-ray entrance side and an opening on the X-ray exit side. The X-ray pen beam can enter from the opening on the X-ray entrance side, pass through the gap between the slit shielding portions 81, and exit from the opening on the X-ray exit side. The X-ray pencil beam will sweep through a fan-shaped space having a certain thickness. The gap between the slit shielding portions 81 allows a fan-shaped space having a certain thickness, which is swept by the X-ray pen beam, to pass therethrough. In some embodiments, the slit shielding portion 81 may have a substantially fan shape. The area of the slit shielding portion 81 is large enough to cover the fan-shaped area swept by the X-ray pen beam entering the slit. The two side plates may be closed on both lateral sides of the slit shielding part 81, thereby more advantageously blocking interference scattering leaking from the pencil beam forming device 13 and/or interference scattering from the front panel 17 from reaching the side surfaces of the two detectors 14 at the slit.
According to some embodiments of the present invention, as shown in fig. 5 and 6, the shielding means 18 may comprise two separate shielding units, i.e. two slit shielding portions 81 for the two detectors 14, respectively, are separated from each other, and front shielding portions 82 for the two detectors 14, respectively, are also separated from each other. In some embodiments, the slit shielding portion 81 and the front side shielding portion 82 for one detector 14 may be integrally formed, and the slit shielding portion 81 and the front side shielding portion 82 for the other detector 14 may be integrally formed. The two slit shielding portions 81 may be respectively attached to side surfaces of the two detectors 14, and the two front side shielding portions 82 may be respectively attached to front surfaces of the two detectors 14 at junctions of the side surfaces and the front surfaces of the detectors 14. The gap between the slit shielding portions 81 allows a fan-shaped space having a certain thickness, which is swept by the X-ray pen beam, to pass therethrough. The area of the slit shielding portion 81 is large enough to cover the fan-shaped area swept by the X-ray pen beam entering the slit. In some embodiments, the area of the two slit shielding portions 81 may cover the side surfaces of the two detectors 14, so that interference scattering leaking from the pencil beam forming device 13 and/or interference scattering from the front panel 17 may be more favorably blocked from reaching the side surfaces of the two detectors 14 at the slit.
The front shielding portion 82 of the shielding device 18 is mainly used for shielding interference scattering that occurs when the X-ray pencil beam reaches and penetrates the front panel 17. This part of the disturbing scatter will reach the detector 14 closest to the position where the X-ray pencil beam reaches the front panel 17, i.e. the junction of the side surface and the front surface of the detector 14. The front side shielding portion 82 of the shielding 18 may be arranged to cover the edge of the front surface of the detector 14 near the side surface. The area or width of the front-side shielding portion 82 (the distance extending from the boundary of the side surface and the front surface of the detector 14) may be determined according to, for example, the material of the front panel 17, the intensity of interference scattering, and the like. The thickness of the slit shielding portion 81 and/or the front shielding portion 82 of the shielding device 18 may be determined according to the shielding effect to be achieved and the material to be used. The shielding 18 may be fixed to the housing 11 or other specially designed support.
In some embodiments, the shielding device 18 may be made of a high atomic number metallic material, such as lead, tin, iron, tungsten, or alloys thereof, for better shielding. In some embodiments, to reduce the weight of the shielding 18 and the backscatter inspection system, the shielding 18 may be made of a low atomic number metallic material, such as aluminum, copper, or alloys thereof.
The shielding device 18 described above includes two parts, the slit shielding portion 81 and the front shielding portion 82. However, the present invention is not limited thereto. For example, in case of strong interference scattering from the front panel 17, the shielding means 18 may comprise only the front side shielding portion 82 without the slit shielding portion 81 between the two detectors 14. In case of weak interference scattering from the front panel 17, the shielding means 18 may comprise only a slit shielding portion 81 between the two detectors 14, without a front side shielding portion 82.
The slit shielding portion 81 and the front side shielding portion 82 of each shielding unit are integrally formed as described above. However, the present invention is not limited thereto. The slit shielding portion 81 and the front side shielding portion 82 of each shielding unit may also be separately formed and separately installed according to some embodiments of the present invention.
According to an embodiment of the invention, the backscatter inspection system comprises shielding means, which reduces the influence of scatter caused by the X-ray pen beam before it reaches the object to be inspected on the detector, i.e. reduces the influence of disturbing scatter caused inside the backscatter inspection system on the detector. Therefore, the backscatter inspection system including the shielding device can effectively reduce the influence of internal interference scattering on scanning imaging, and improve the quality of a backscatter image, such as image contrast.
While the invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the constructions and methods of the above-described embodiments. On the contrary, the invention is intended to cover various modifications and equivalent arrangements. In addition, while the various elements and method steps of the disclosed invention are shown in various combinations and configurations, which are exemplary, other combinations, including more, less elements or methods, are also within the scope of the invention.
Claims (6)
1. A backscatter inspection system comprising:
an X-ray source for generating X-rays;
the pencil beam forming device is used for modulating the X-rays generated by the X-ray source into an X-ray pencil beam;
two detectors for receiving X-rays backscattered upon irradiation of the modulated X-ray pencil beam onto an object to be inspected, the two detectors being arranged in spaced apart relation to form a slit, the detectors comprising a receiving face for facing the object to be inspected; and
shielding means, located adjacent to said gap between said two detectors and/or to said receiving face of said detectors, for reducing the influence of scattering caused by the X-ray pencil beam before it reaches said object to be inspected on said detectors,
wherein the shielding means comprises two slit shielding portions for the two detectors, respectively, which are arranged in the slit between the two detectors and form a gap, wherein the gap between the two slit shielding portions is aligned with the pencil beam forming means such that a modulated X-ray pencil beam can pass through the gap between the two slit shielding portions,
the backscatter inspection system further includes a front panel disposed in front of the receiving face of the detector for blocking external foreign matter from contacting the detector, and
the shielding means comprises two front side shielding portions for the two detectors, respectively, which are arranged between the front panel and the receiving face of the detector and cover a portion of the receiving face of the detector close to the slit, the two front side shielding portions being spaced apart to form a gap, the gap between the two front side shielding portions being aligned with the pencil beam forming means such that a modulated X-ray pencil beam can pass through the gap between the two front side shielding portions.
2. The backscatter inspection system of claim 1, wherein the aperture shield portion and the front side shield portion for one detector are integrally formed and the aperture shield portion and the front side shield portion for the other detector are integrally formed.
3. The backscatter inspection system of claim 2, wherein the two slit shield portions and the two front side shield portions for the two detectors, respectively, are integrally formed.
4. A backscatter inspection system according to any one of claims 1 to 3, further comprising a housing, the X-ray source, the pencil beam forming device, the two detectors and the shielding device being disposed within the housing.
5. The backscatter inspection system of claim 4, further comprising a controller to generate a backscatter X-ray image from the backscatter X-rays received by the detector.
6. The backscatter inspection system of claim 4, further comprising a display to display the backscatter X-ray image generated by the controller.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202010954645.4A CN114166875B (en) | 2020-09-11 | 2020-09-11 | Back-scattering inspection system |
| PCT/CN2021/116726 WO2022052892A1 (en) | 2020-09-11 | 2021-09-06 | Backscatter inspection system |
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| CN202010954645.4A CN114166875B (en) | 2020-09-11 | 2020-09-11 | Back-scattering inspection system |
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| CN115855990B (en) * | 2023-02-15 | 2023-04-28 | 同方威视技术股份有限公司 | Back scattering inspection device for detecting m-layer structure object to be inspected |
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| WO2022052892A1 (en) | 2022-03-17 |
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