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CN114156374B - Chip transfer device and chip transfer method - Google Patents

Chip transfer device and chip transfer method Download PDF

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Publication number
CN114156374B
CN114156374B CN202111437615.7A CN202111437615A CN114156374B CN 114156374 B CN114156374 B CN 114156374B CN 202111437615 A CN202111437615 A CN 202111437615A CN 114156374 B CN114156374 B CN 114156374B
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chip
led chip
chip transfer
sacrificial
transfer device
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CN114156374A (en
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李林霜
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TCL China Star Optoelectronics Technology Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer

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  • Condensed Matter Physics & Semiconductors (AREA)
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Abstract

The application provides a chip transfer device and chip transfer method, this chip transfer device includes base plate, magnetic part and the sacrifice piece of range upon range of setting in proper order, wherein: the magnetic piece can generate suction force to the LED chip so that the LED chip is adsorbed on the sacrificial piece, and the sacrificial piece can generate gas and enable the gas to impact the LED chip so that the LED chip is separated from the sacrificial piece. The chip transfer device can effectively improve the transfer yield of the LED chips.

Description

芯片转移装置以及芯片转移方法Chip transfer device and chip transfer method

技术领域Technical Field

本发明涉及显示技术领域,尤其涉及一种芯片转移装置以及芯片转移方法。The present invention relates to the field of display technology, and in particular to a chip transfer device and a chip transfer method.

背景技术Background technique

现有技术中,在制作发光二极管(LightEmittingDiode,LED)显示面板时,需要通过转移的方式将发光颜色不同的LED芯片以特定的排列方式转移至承载基板上,从而形成像素阵列。对于发光二极管的转移,激光烧蚀方法具有明显的优势:转移速度快、灵活性高、可快速调整以适用不同尺寸的器件。In the prior art, when manufacturing a light emitting diode (LED) display panel, it is necessary to transfer LED chips of different luminous colors to a carrier substrate in a specific arrangement to form a pixel array. For the transfer of light emitting diodes, the laser ablation method has obvious advantages: fast transfer speed, high flexibility, and can be quickly adjusted to suit devices of different sizes.

上述激光烧蚀方法的使用过程中,一般需要使用激光解黏胶,但是激光解黏胶的用量不好控制。当激光解黏胶偏厚时,会导致芯片陷到胶中,存在无法脱落分离的情况;当激光解黏胶偏薄时,贴合工艺复杂、难度高、且存在黏附性不足等情况。During the use of the above laser ablation method, laser debonding is generally required, but the amount of laser debonding is difficult to control. When the laser debonding is too thick, the chip will be trapped in the glue and cannot be separated; when the laser debonding is too thin, the bonding process is complicated and difficult, and there is insufficient adhesion.

发明内容Summary of the invention

本申请实施例提供一种芯片转移装置以及芯片转移方法,有效地提高LED芯片的转移良率。The embodiments of the present application provide a chip transfer device and a chip transfer method, which effectively improve the transfer yield of LED chips.

本申请实施例提供一种芯片转移装置,包括依次层叠设置的基板、磁性件以及牺牲件,其中:The present application provides a chip transfer device, comprising a substrate, a magnetic member, and a sacrificial member stacked in sequence, wherein:

所述磁性件能够对LED芯片产生吸力,以使所述LED芯片吸附于所述牺牲件上,所述牺牲件能够产生气体并使所述气体冲击所述LED芯片,以使所述LED芯片从所述牺牲件上脱落。The magnetic member can generate suction force on the LED chip so that the LED chip is adsorbed on the sacrificial member, and the sacrificial member can generate gas and make the gas impact the LED chip so that the LED chip falls off the sacrificial member.

在一些实施例中,所述牺牲件为富氢膜,所述富氢膜能够在第一激光的作用下产生氢气。In some embodiments, the sacrificial member is a hydrogen-rich film, and the hydrogen-rich film can generate hydrogen under the action of the first laser.

在一些实施例中,所述富氢膜的厚度大于10nm且小于50nm。In some embodiments, the thickness of the hydrogen rich film is greater than 10 nm and less than 50 nm.

在一些实施例中,所述富氢膜的氢元素的含量大于5%且小于20%。In some embodiments, the hydrogen content of the hydrogen-rich film is greater than 5% and less than 20%.

在一些实施例中,所述磁性件的厚度小于10μm。In some embodiments, the thickness of the magnetic member is less than 10 μm.

本申请实施例还提供一种芯片转移方法,应用于上述的芯片转移装置,所述芯片转移方法包括:The embodiment of the present application further provides a chip transfer method, which is applied to the above-mentioned chip transfer device, and the chip transfer method includes:

控制所述磁性件对LED芯片产生吸力,以使所述LED芯片吸附于所述牺牲件上;Controlling the magnetic member to generate suction force on the LED chip so that the LED chip is adsorbed on the sacrificial member;

控制所述牺牲件产生气体,并使所述气体冲击所述芯片,以使所述芯片从所述牺牲件上脱落。The sacrificial member is controlled to generate gas, and the gas is made to impact the chip, so that the chip falls off from the sacrificial member.

在一些实施例中,所述牺牲件为富氢膜,所述富氢膜能够产生氢气,所述控制所述牺牲件产生气体,所述芯片转移方法包括:使用第一激光照射所述牺牲件,以使得所述牺牲件产生氢气。In some embodiments, the sacrificial member is a hydrogen-rich film capable of generating hydrogen, and the chip transfer method includes: irradiating the sacrificial member with a first laser to generate hydrogen.

在一些实施例中,所述控制所述磁性件对LED芯片产生吸力之前,还包括:In some embodiments, before controlling the magnetic member to generate suction force on the LED chip, the method further includes:

提供施主基板,所述施主基板上设置有LED芯片;Providing a donor substrate, on which an LED chip is disposed;

使用第二激光照射所述施主基板,以使得所述LED芯片脱落于所述施主基板。The donor substrate is irradiated with a second laser so that the LED chip falls off the donor substrate.

在一些实施例中,所述第二激光的波长为308nm。In some embodiments, the wavelength of the second laser is 308 nm.

在一些实施例中,所述控制所述牺牲件产生气体,并使所述气体冲击所述芯片,以使所述芯片从所述牺牲件上脱落之后,还包括,提供接收基板,以承载脱落的所述LED芯片。In some embodiments, after controlling the sacrificial member to generate gas and causing the gas to impact the chip so that the chip falls off from the sacrificial member, the method further includes providing a receiving substrate to carry the fallen LED chip.

本申请实施例提供的芯片转移装置包括基板、磁性件以及牺牲件,该基板、磁性件以及牺牲件依次层叠设置,当需要转移该LED芯片时,该磁性件吸附LED芯片,使得LED芯片能够暂时吸附在牺牲件上,然后该牺牲件产生气体,以冲击该LED芯片,以使LED芯片从牺牲件上脱落,从而完成该LED芯片的转移。可以理解的是,该芯片转移装置没有使用激光解黏胶,所以自然不存在LED芯片转移过程中激光解黏胶无法精准控制芯片的脱落等缺陷,即通过磁性件与牺牲件代替激光解黏胶,有效地提高LED芯片的转移良率。The chip transfer device provided in the embodiment of the present application includes a substrate, a magnetic part and a sacrificial part, which are stacked in sequence. When the LED chip needs to be transferred, the magnetic part adsorbs the LED chip so that the LED chip can be temporarily adsorbed on the sacrificial part, and then the sacrificial part generates gas to impact the LED chip so that the LED chip falls off the sacrificial part, thereby completing the transfer of the LED chip. It can be understood that the chip transfer device does not use laser debonding, so there is naturally no defect that the laser debonding cannot accurately control the chip falling off during the LED chip transfer process, that is, the magnetic part and the sacrificial part are used instead of the laser debonding to effectively improve the transfer yield of the LED chip.

附图说明BRIEF DESCRIPTION OF THE DRAWINGS

为了更清楚地说明本申请实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍。显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present application, and those skilled in the art can obtain other drawings based on these drawings without creative work.

图1为本申请实施例提供的芯片转移装置的结构示意图。FIG1 is a schematic diagram of the structure of a chip transfer device provided in an embodiment of the present application.

图2为本申请实施例提供的芯片转移方法的流程示意图。FIG2 is a schematic flow chart of a chip transfer method provided in an embodiment of the present application.

图3为本申请实施例提供的芯片转移方法对应的第一种结构示意图。FIG3 is a first structural schematic diagram corresponding to the chip transfer method provided in an embodiment of the present application.

图4为本申请实施例提供的芯片转移方法对应的第二种结构示意图。FIG. 4 is a second structural schematic diagram corresponding to the chip transfer method provided in an embodiment of the present application.

具体实施方式Detailed ways

下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述。显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The technical solutions in the embodiments of the present application will be described clearly and completely below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present application.

本申请实施例提供一种芯片转移装置以及芯片转移方法,有效地提高LED芯片的转移良率。以下结合附图进行具体的说明。The present application provides a chip transfer device and a chip transfer method, which effectively improve the transfer yield of LED chips.

请参阅图1,图1为本申请实施例提供的芯片转移装置的结构示意图。Please refer to FIG. 1 , which is a schematic diagram of the structure of a chip transfer device provided in an embodiment of the present application.

该芯片转移装置100包括层叠设置的基板110、磁性件120以及牺牲件130。磁性件能够对LED芯片产生吸力,以使LED芯片吸附于牺牲件上,牺牲件能够产生气体并使气体冲击LED芯片,以使LED芯片从牺牲件上脱落。The chip transfer device 100 comprises a stacked substrate 110, a magnetic member 120 and a sacrificial member 130. The magnetic member can generate suction to the LED chip so that the LED chip is adsorbed on the sacrificial member, and the sacrificial member can generate gas and make the gas impact the LED chip so that the LED chip falls off the sacrificial member.

其中,该磁性件120能够产生吸附LED芯片200的磁力,其中磁性件120正投影的面积与多个LED芯片200的面积相当,该磁性件120能够吸附多个LED芯片200。该磁性件120具有磁性,例如该磁性件120为成分是铁、钴、镍或者铁镍合金的磁铁。该磁性件120的厚度小于10μm,该磁性件120可以通过溅射、沉积或者胶黏等方式覆盖于基板110上。The magnetic member 120 can generate a magnetic force to absorb the LED chip 200, wherein the area of the positive projection of the magnetic member 120 is equivalent to the area of the plurality of LED chips 200, and the magnetic member 120 can absorb the plurality of LED chips 200. The magnetic member 120 has magnetic properties, for example, the magnetic member 120 is a magnet composed of iron, cobalt, nickel or iron-nickel alloy. The thickness of the magnetic member 120 is less than 10 μm, and the magnetic member 120 can be covered on the substrate 110 by sputtering, deposition or gluing.

更为具体的是,本申请提供的LED芯片200可以是普通LED(Light-EmittingDiode,发光二极管)芯片、microLED(microLight-Emitting Diode,微型LED)芯片或miniLED(mini Light-Emitting Diode,次毫米发光二极管)芯片。其中,LED芯片200是一种常用的发光器件,通过电子与空穴复合释放能量发光,LED芯片200在照明领域应用广泛。micro LED芯片200是指以自发光的微米量级的LED为发光像素单元,将其组装到驱动面板上形成高密度LED阵列。由于micro LED芯片200尺寸小、集成度高和自发光等特点,在显示方面与LCD芯片相比在亮度、分辨率、对比度、能耗、使用寿命、响应速度和热稳定性等方面具有更大的优势。该miniLED芯片200是指芯片尺寸介于50~200μm之间的LED芯片200。miniLED芯片200已开始应用于超大屏高清显示,如监控指挥、高清演播、高端影院、医疗诊断、广告显示、会议会展、办公显示、虚拟现实等商用领域。其中,本申请提供的LED芯片200可以是垂直型结构,也可以是横向型结构。该垂直型结构的LED芯片200是指阳极和阴极分别位于LED芯片200的两侧,该横向型结构的LED芯片200是指阳极和阴极位于LED芯片200的同一侧。More specifically, the LED chip 200 provided in the present application may be a common LED (Light-Emitting Diode) chip, a microLED (microLight-Emitting Diode) chip or a miniLED (mini Light-Emitting Diode) chip. Among them, the LED chip 200 is a commonly used light-emitting device that emits light by releasing energy through the recombination of electrons and holes. The LED chip 200 is widely used in the field of lighting. The micro LED chip 200 refers to a self-luminous micron-scale LED as a light-emitting pixel unit, which is assembled on a driving panel to form a high-density LED array. Due to the small size, high integration and self-luminescence of the micro LED chip 200, it has greater advantages in brightness, resolution, contrast, energy consumption, service life, response speed and thermal stability compared with LCD chips in terms of display. The miniLED chip 200 refers to an LED chip 200 with a chip size between 50 and 200 μm. The miniLED chip 200 has begun to be used in ultra-large screen high-definition displays, such as monitoring and command, high-definition broadcasting, high-end cinemas, medical diagnosis, advertising display, conferences and exhibitions, office display, virtual reality and other commercial fields. The LED chip 200 provided in the present application may be a vertical structure or a horizontal structure. The vertical structure of the LED chip 200 means that the anode and cathode are located on both sides of the LED chip 200, respectively, and the horizontal structure of the LED chip 200 means that the anode and cathode are located on the same side of the LED chip 200.

该LED芯片200包括芯片主体以及设置与芯片主体上的金属。其中,该金属被配置为能够被芯片转移装置100吸附的金属。该芯片主体为现有技术中的任一种,例如,芯片主体可以包括衬底、在衬底上生长的外延层结构,以及位于外延层结构上的电极。该金属可以通过溅射或者沉积等方式覆盖上述电极。更为具体的是,该金属可以采用铁、钴、镍或者铁镍合金,当金属采用该材质时,更容易被芯片转移装置100吸附的金属吸附。在一些情况下,该金属也可以是芯片主体的电极本身。The LED chip 200 includes a chip body and a metal disposed on the chip body. The metal is configured to be a metal that can be adsorbed by the chip transfer device 100. The chip body is any one of the prior art. For example, the chip body may include a substrate, an epitaxial layer structure grown on the substrate, and an electrode located on the epitaxial layer structure. The metal may cover the above-mentioned electrode by sputtering or deposition. More specifically, the metal may be iron, cobalt, nickel or an iron-nickel alloy. When the metal is made of this material, it is more easily adsorbed by the metal adsorbed by the chip transfer device 100. In some cases, the metal may also be the electrode of the chip body itself.

其中,该牺牲件130可以产生气体,例如氢气。通过该气体的冲击可以使得吸附在芯片转移装置100上的LED芯片200从牺牲件130上脱落。在本实施例中,该磁性件120和牺牲件130呈层状设置于基板110上,且磁性件120设置于牺牲件130与基板110之间,使得牺牲件130产生的氢气可以直接作用于LED芯片200,使得当牺牲件130产生气体的时候,使得该LED芯片200可以被气体冲击,该冲击力大于磁性件120产生的磁力,以使得LED芯片200从牺牲件130上脱落。在其他实施例中,该磁性件120与牺牲件130可以为其他结构,例如,当牺牲件130为层状结构是,该磁性件120可以为掺杂在牺牲件130中的磁性颗粒。The sacrificial member 130 can generate gas, such as hydrogen. The impact of the gas can cause the LED chip 200 adsorbed on the chip transfer device 100 to fall off from the sacrificial member 130. In this embodiment, the magnetic member 120 and the sacrificial member 130 are arranged in layers on the substrate 110, and the magnetic member 120 is arranged between the sacrificial member 130 and the substrate 110, so that the hydrogen generated by the sacrificial member 130 can directly act on the LED chip 200, so that when the sacrificial member 130 generates gas, the LED chip 200 can be impacted by the gas, and the impact force is greater than the magnetic force generated by the magnetic member 120, so that the LED chip 200 falls off from the sacrificial member 130. In other embodiments, the magnetic member 120 and the sacrificial member 130 can be other structures. For example, when the sacrificial member 130 is a layered structure, the magnetic member 120 can be magnetic particles doped in the sacrificial member 130.

本申请实施例提供的芯片转移装置100包括基板110、磁性件120以及牺牲件130,该基板110、磁性件120以及牺牲件130依次层叠设置,当需要转移该LED芯片200时,该磁性件120吸附LED芯片200,使得LED芯片200能够暂时吸附在牺牲件130上,然后该牺牲件130产生气体,以冲击该LED芯片200,以使LED200芯片从牺牲层130上脱落,从而完成该LED芯片200的转移。可以理解的是,该芯片转移装置100没有使用激光解黏胶,所以自然不存在LED芯片200转移过程中激光解黏胶无法精准控制芯片的脱落等缺陷,即通过磁性件120与牺牲件130代替激光解黏胶,有效地提高LED芯片200的转移良率。The chip transfer device 100 provided in the embodiment of the present application includes a substrate 110, a magnetic member 120 and a sacrificial member 130, and the substrate 110, the magnetic member 120 and the sacrificial member 130 are stacked in sequence. When the LED chip 200 needs to be transferred, the magnetic member 120 adsorbs the LED chip 200 so that the LED chip 200 can be temporarily adsorbed on the sacrificial member 130, and then the sacrificial member 130 generates gas to impact the LED chip 200, so that the LED200 chip falls off from the sacrificial layer 130, thereby completing the transfer of the LED chip 200. It can be understood that the chip transfer device 100 does not use laser debonding, so naturally there is no defect such as the laser debonding cannot accurately control the chip falling off during the transfer of the LED chip 200, that is, the magnetic member 120 and the sacrificial member 130 replace the laser debonding, which effectively improves the transfer yield of the LED chip 200.

该牺牲件130可以为有机材料,也可以是无机材料。在本实施例中,该牺牲件130为无机材料,更为具体的是,该牺牲件130为富氢膜,该富氢膜具有氢元素,能够产生氢气。例如,该富氢膜为非晶硅(a-Si)膜等。当该牺牲件130为非晶硅(a-Si)膜时,第一激光照射该牺牲件130,能够触发该牺牲件130产生氢气。其中,该氢元素的含量大于5%且小于20%,可以理解的是,若该氢元素的含量较小时,该牺牲件130产生的氢气的冲击小于磁性件120产生的磁力,以使得LED芯片200无法从牺牲件130上脱落;该氢元素的含量较大时,该牺牲件130产生的氢气的冲击远大于磁性件120产生的磁力,易造成LED芯片200的损坏。The sacrificial member 130 can be an organic material or an inorganic material. In the present embodiment, the sacrificial member 130 is an inorganic material, more specifically, the sacrificial member 130 is a hydrogen-rich film, which has hydrogen elements and can generate hydrogen. For example, the hydrogen-rich film is an amorphous silicon (a-Si) film, etc. When the sacrificial member 130 is an amorphous silicon (a-Si) film, the first laser irradiates the sacrificial member 130, which can trigger the sacrificial member 130 to generate hydrogen. Among them, the content of the hydrogen element is greater than 5% and less than 20%. It can be understood that if the content of the hydrogen element is small, the impact of the hydrogen generated by the sacrificial member 130 is less than the magnetic force generated by the magnetic member 120, so that the LED chip 200 cannot fall off the sacrificial member 130; when the content of the hydrogen element is large, the impact of the hydrogen generated by the sacrificial member 130 is much greater than the magnetic force generated by the magnetic member 120, which can easily cause damage to the LED chip 200.

该富氢膜的厚度大于10nm且小于50nm,可以理解的是,若该富氢膜的厚度小于等于10nm时,该第一激光容易穿透该富氢膜,造成第一激光的能量的浪费;若该富氢膜的厚度大于等于50nm时,该第一激光容易被富氢膜吸收,使得富氢膜的氢元素不能被完全利用。The thickness of the hydrogen-rich film is greater than 10nm and less than 50nm. It can be understood that if the thickness of the hydrogen-rich film is less than or equal to 10nm, the first laser can easily penetrate the hydrogen-rich film, resulting in a waste of energy of the first laser; if the thickness of the hydrogen-rich film is greater than or equal to 50nm, the first laser can easily be absorbed by the hydrogen-rich film, so that the hydrogen element in the hydrogen-rich film cannot be fully utilized.

请参阅图2以及图3,图2为本申请实施例提供的芯片转移方法的流程示意图,图3为本申请实施例提供的芯片转移方法对应的第一种结构示意图。Please refer to Figures 2 and 3. Figure 2 is a schematic diagram of the process of the chip transfer method provided in the embodiment of the present application, and Figure 3 is a schematic diagram of the first structure corresponding to the chip transfer method provided in the embodiment of the present application.

本申请还提供一种芯片转移方法,应用于上述芯片转移装置100,该芯片转移方法包括:The present application also provides a chip transfer method, which is applied to the above-mentioned chip transfer device 100. The chip transfer method includes:

S101、控制磁性件120对LED芯片200产生吸力,以使LED芯片200吸附于牺牲件130上。S101 , controlling the magnetic component 120 to generate suction force on the LED chip 200 , so that the LED chip 200 is adsorbed on the sacrificial component 130 .

S102、控制牺牲件130产生气体,并使气体冲击LED芯片200,以使LED芯片200从牺牲件上脱落。S102 , controlling the sacrificial member 130 to generate gas, and making the gas impact the LED chip 200 , so that the LED chip 200 falls off from the sacrificial member.

具体的是,该牺牲件130产生气体,使得该LED芯片200可以被气体冲击,该冲击力大于磁性件120产生的磁力,以使得LED芯片200从牺牲件130上脱落。Specifically, the sacrificial member 130 generates gas, so that the LED chip 200 can be impacted by the gas, and the impact force is greater than the magnetic force generated by the magnetic member 120 , so that the LED chip 200 falls off from the sacrificial member 130 .

在一些实施例中,控制牺牲件130产生气体,并使气体冲击LED芯片200,以使LED芯片200从牺牲件130上脱落之后,还包括:提供接收基板400,以承载脱落的LED芯片200。In some embodiments, after controlling the sacrificial member 130 to generate gas and causing the gas to impact the LED chip 200 so that the LED chip 200 falls off from the sacrificial member 130 , the method further includes: providing a receiving substrate 400 to carry the fallen LED chip 200 .

具体的是,为了避免脱落的LED芯片200与接收基板400发生相对位移,在产生气体之前,还可以将LED芯片200于接收基板400的相对位置固定,例如,可以在接收基板400上涂覆一层焊料,通过热回流的方式将LED芯片200于接收基板400的相对位置固定;又例如,在接收基板400上涂覆一层胶黏剂,利用胶黏剂的粘附性将LED芯片200于接收基板400的相对位置固定。Specifically, in order to avoid relative displacement between the detached LED chip 200 and the receiving substrate 400, before the gas is generated, the relative position of the LED chip 200 to the receiving substrate 400 can be fixed. For example, a layer of solder can be coated on the receiving substrate 400, and the relative position of the LED chip 200 to the receiving substrate 400 can be fixed by thermal reflow. For another example, a layer of adhesive can be coated on the receiving substrate 400, and the relative position of the LED chip 200 to the receiving substrate 400 can be fixed by the adhesion of the adhesive.

其中,LED芯片200可以是R芯片、G芯片或者B芯片,以实现R/G/B三颜色的转移。The LED chip 200 may be an R chip, a G chip or a B chip to achieve the transfer of three colors of R/G/B.

其中,该接收基板400可以是TFT(Thin Film Transistor,薄膜晶体管)玻璃基板,当接收基板400接收该LED芯片200之后,制成TFT-LCD,TFT-LCD具有图像细腻逼真、重量轻、功耗低、环保性能好的优点,广泛应用于电视、笔记本电脑、手机、监视器等设备上。Among them, the receiving substrate 400 can be a TFT (Thin Film Transistor) glass substrate. After the receiving substrate 400 receives the LED chip 200, a TFT-LCD is made. TFT-LCD has the advantages of delicate and realistic images, light weight, low power consumption, and good environmental performance. It is widely used in televisions, laptops, mobile phones, monitors and other devices.

在一些实施例中,该牺牲件130为富氢膜,富氢膜能够产生氢气。其中,控制牺牲件130产生气体的步骤包括:使用第一激光照射牺牲件130,以使得牺牲件130产生氢气。In some embodiments, the sacrificial member 130 is a hydrogen-rich film that can generate hydrogen. The step of controlling the sacrificial member 130 to generate gas includes: irradiating the sacrificial member 130 with a first laser so that the sacrificial member 130 generates hydrogen.

该牺牲件130可以为有机材料,也可以是无机材料。在本实施例中,该牺牲件130为无机材料,更为具体的是,该牺牲件130为富氢膜,该富氢膜具有氢元素,能够产生氢气。例如,该富氢膜为非晶硅(a-Si)膜等。当该牺牲件130为非晶硅(a-Si)膜时,第一激光照射该牺牲件130,能够触发该牺牲件130产生氢气。其中,该氢元素的含量大于5%且小于20%,可以理解的是,若该氢元素的含量较小时,该牺牲件130产生的氢气的冲击小于磁性件120产生的磁力,以使得LED芯片200无法从牺牲件130上脱落;该氢元素的含量较大时,该牺牲件130产生的氢气的冲击远大于磁性件120产生的磁力,易造成LED芯片200的损坏。The sacrificial member 130 can be an organic material or an inorganic material. In the present embodiment, the sacrificial member 130 is an inorganic material, more specifically, the sacrificial member 130 is a hydrogen-rich film, which has hydrogen elements and can generate hydrogen. For example, the hydrogen-rich film is an amorphous silicon (a-Si) film, etc. When the sacrificial member 130 is an amorphous silicon (a-Si) film, the first laser irradiates the sacrificial member 130, which can trigger the sacrificial member 130 to generate hydrogen. Among them, the content of the hydrogen element is greater than 5% and less than 20%. It can be understood that if the content of the hydrogen element is small, the impact of the hydrogen generated by the sacrificial member 130 is less than the magnetic force generated by the magnetic member 120, so that the LED chip 200 cannot fall off the sacrificial member 130; when the content of the hydrogen element is large, the impact of the hydrogen generated by the sacrificial member 130 is much greater than the magnetic force generated by the magnetic member 120, which can easily cause damage to the LED chip 200.

该富氢膜的厚度大于10nm且小于50nm,可以理解的是,若该富氢膜的厚度小于等于10nm时,该第一激光容易穿透该富氢膜,造成第一激光的能量的浪费;若该富氢膜的厚度大于等于50nm时,该第一激光容易被富氢膜吸收,使得富氢膜的氢元素不能被完全利用。The thickness of the hydrogen-rich film is greater than 10nm and less than 50nm. It can be understood that if the thickness of the hydrogen-rich film is less than or equal to 10nm, the first laser can easily penetrate the hydrogen-rich film, resulting in a waste of energy of the first laser; if the thickness of the hydrogen-rich film is greater than or equal to 50nm, the first laser can easily be absorbed by the hydrogen-rich film, so that the hydrogen element in the hydrogen-rich film cannot be fully utilized.

在一些实施例中,在控制磁性件120对LED芯片200产生吸力之前,提供施主基板300,该施主基板300上设置有LED芯片200。使用第二激光照射施主基板300,以使得LED芯片200脱落于施主基板300。In some embodiments, before controlling the magnetic member 120 to generate suction force on the LED chip 200, a donor substrate 300 is provided, on which the LED chip 200 is disposed. The donor substrate 300 is irradiated with a second laser so that the LED chip 200 falls off the donor substrate 300.

具体的,该施主基板300可以是晶圆结构,该晶圆结构上设置有LED芯片200。在本实施例中,采用激光剥离技术(Laser Lift-off,LLO),使得LED芯片200脱落于施主基板300。该LLO技术是利用第二激光能量分解该施主基板300。其中,该第二激光的波长为308nm。Specifically, the donor substrate 300 may be a wafer structure, on which the LED chip 200 is disposed. In this embodiment, laser lift-off (LLO) technology is used to remove the LED chip 200 from the donor substrate 300. The LLO technology utilizes a second laser energy to decompose the donor substrate 300. The wavelength of the second laser is 308 nm.

请参阅图4,图4为本申请实施例提供的芯片转移方法对应的第二种结构示意图。Please refer to FIG. 4 , which is a second structural schematic diagram corresponding to the chip transfer method provided in an embodiment of the present application.

在一些实施例中,在提供接收基板400之前,还包括:提供第二芯片转移装置500,以承载脱落的LED芯片200;使用第三激光照射第二芯片转移装置500,以使得LED芯片200脱落于第二芯片转移装置500。In some embodiments, before providing the receiving substrate 400 , it also includes: providing a second chip transfer device 500 to carry the detached LED chip 200 ; using a third laser to irradiate the second chip transfer device 500 so that the LED chip 200 falls off the second chip transfer device 500 .

可以理解的是,当LED芯片200可以是垂直型结构时,使用该第二芯片转移装置500能够使得该LED芯片200翻转,从而实现LED芯片200的正负极连接在TFT玻璃面板上。It is understandable that when the LED chip 200 can be a vertical structure, the second chip transfer device 500 can be used to flip the LED chip 200, so that the positive and negative electrodes of the LED chip 200 are connected to the TFT glass panel.

其中,该第二芯片转移装置500可以是与上述的第一芯片转移装置100相同的结构,例如该第二芯片转移装置500同样包括基板510、磁性件以及牺牲件。该磁性件设置于基板,该磁性件能够吸附LED芯片,该牺牲件设置于磁性件远离基板的一侧,该牺牲件能够产生气体,该气体能够使得LED芯片脱落于基板。第二芯片转移装置500还可以是与上述的第一芯片转移装置100不相同的结构,例如该第二芯片转移装置500包括基板510以及激光解黏胶520,第二芯片转移装置500附有激光解黏胶520的一侧用于接承载脱落的LED芯片200,然后利用第三激光照射该激光解黏胶,使得激光解黏胶520分解,从而LED芯片200脱落至接收基板。Among them, the second chip transfer device 500 can be the same structure as the first chip transfer device 100 mentioned above, for example, the second chip transfer device 500 also includes a substrate 510, a magnetic part and a sacrificial part. The magnetic part is arranged on the substrate, and the magnetic part can adsorb the LED chip. The sacrificial part is arranged on the side of the magnetic part away from the substrate. The sacrificial part can generate gas, and the gas can cause the LED chip to fall off the substrate. The second chip transfer device 500 can also be a structure different from the first chip transfer device 100 mentioned above. For example, the second chip transfer device 500 includes a substrate 510 and a laser debonding glue 520. The second chip transfer device 500 is attached with a side of the laser debonding glue 520 for receiving and carrying the detached LED chip 200, and then the laser debonding glue is irradiated with a third laser to decompose the laser debonding glue 520, so that the LED chip 200 falls off to the receiving substrate.

本申请实施例提供的芯片转移装置100包括基板110、磁性件120以及牺牲件130,该基板110、磁性件120以及牺牲件130依次层叠设置,当需要转移该LED芯片200时,该磁性件120吸附LED芯片200,使得LED芯片200能够暂时吸附在牺牲件130上,然后该牺牲件130产生气体,以冲击该LED芯片200,以使LED200芯片从牺牲层130上脱落,从而完成该LED芯片200的转移。可以理解的是,该芯片转移装置100没有使用激光解黏胶,所以自然不存在LED芯片200转移过程中激光解黏胶无法精准控制芯片的脱落等缺陷,即通过磁性件120与牺牲件130代替激光解黏胶,有效地提高LED芯片200的转移良率。The chip transfer device 100 provided in the embodiment of the present application includes a substrate 110, a magnetic member 120 and a sacrificial member 130, and the substrate 110, the magnetic member 120 and the sacrificial member 130 are stacked in sequence. When the LED chip 200 needs to be transferred, the magnetic member 120 adsorbs the LED chip 200 so that the LED chip 200 can be temporarily adsorbed on the sacrificial member 130, and then the sacrificial member 130 generates gas to impact the LED chip 200, so that the LED200 chip falls off from the sacrificial layer 130, thereby completing the transfer of the LED chip 200. It can be understood that the chip transfer device 100 does not use laser debonding, so naturally there is no defect such as the laser debonding cannot accurately control the chip falling off during the transfer of the LED chip 200, that is, the magnetic member 120 and the sacrificial member 130 replace the laser debonding, which effectively improves the transfer yield of the LED chip 200.

在上述实施例中,对各个实施例的描述都各有侧重,某个实施例中没有详述的部分,可以参见其他实施例的相关描述。In the above embodiments, the description of each embodiment has its own emphasis. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant descriptions of other embodiments.

在本申请的描述中,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个特征。In the description of this application, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more features.

以上对本申请实施例提供的芯片转移装置以及芯片转移方法进行了详细介绍。本文中应用了具体个例对本申请的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本申请。同时,对于本领域的技术人员,依据本申请的思想,在具体实施方式及应用范围上均会有改变之处,综上所述,本说明书内容不应理解为对本申请的限制。The chip transfer device and chip transfer method provided in the embodiments of the present application are described in detail above. Specific examples are used herein to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the present application. At the same time, for those skilled in the art, according to the ideas of the present application, there will be changes in the specific implementation methods and application scopes. In summary, the content of this specification should not be understood as limiting the present application.

Claims (10)

1. The utility model provides a chip transfer device, its characterized in that includes first chip transfer device and second chip transfer device, first chip transfer device includes base plate, magnetic part and the sacrifice piece of laminating the setting in proper order, wherein:
the magnetic piece can generate suction force on the LED chip so that the LED chip is adsorbed on the sacrificial piece, and the sacrificial piece can generate gas and enable the gas to impact the LED chip so that the LED chip is separated from the sacrificial piece;
the second chip transfer device bears the LED chip that drops from on the first chip transfer device, the second chip transfer device includes second base plate and glue film, the glue film is kept away from one side of second base plate is used for bearing the LED chip, the glue film sets up to laser and solves viscose to make under outside laser irradiation, laser and solve viscose and decompose, so that the LED chip drops.
2. The chip transfer apparatus according to claim 1, wherein the sacrificial member is a hydrogen-rich film capable of generating hydrogen gas by the first laser.
3. The chip transfer apparatus of claim 2, wherein the hydrogen-rich film has a thickness greater than 10nm and less than 50nm.
4. The chip transfer apparatus according to claim 2, wherein the hydrogen element content of the hydrogen-rich film is more than 5% and less than 20%.
5. The chip transfer apparatus of claim 1, wherein the magnetic member has a thickness of less than 10 μm.
6. A chip transfer method, characterized by being applied to the chip transfer apparatus of any one of claims 1 to 5, comprising:
controlling the magnetic piece to generate suction force on the LED chip so as to enable the LED chip to be adsorbed on the sacrificial piece;
controlling the sacrificial member to generate gas, and enabling the gas to impact the LED chip so as to enable the LED chip to fall off from the sacrificial member and be carried by a second chip transferring device;
and irradiating the adhesive layer of the second chip transfer device by using laser so as to enable the LED chip to fall off from the second chip transfer device.
7. The chip transfer method according to claim 6, wherein the sacrifice member is a hydrogen-rich film capable of generating hydrogen gas, and the control of the sacrifice member to generate gas, the chip transfer method comprising: the sacrificial member is irradiated with a first laser so that the sacrificial member generates hydrogen.
8. The chip transfer method according to claim 6, further comprising, before said controlling said magnetic member to generate attraction force to the LED chip:
providing a donor substrate, wherein an LED chip is arranged on the donor substrate;
irradiating the donor substrate with a second laser so that the LED chip is detached from the donor substrate.
9. The chip transfer method according to claim 8, wherein the wavelength of the second laser is 308nm.
10. The method of chip transfer according to claim 6, wherein after the controlling the sacrifice member to generate the gas and causing the gas to impinge on the LED chip to peel off the LED chip from the sacrifice member, further comprising: a receiving substrate is provided to carry the LED chips that are detached.
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CN111244010A (en) * 2018-11-29 2020-06-05 昆山工研院新型平板显示技术中心有限公司 LED chip, assembling device and assembling method of display panel
CN112967984A (en) * 2020-09-24 2021-06-15 重庆康佳光电技术研究院有限公司 Huge transfer method of microchip and display back plate

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