CN114137645B - Diffraction optical element, preparation method thereof and design method of master plate diffraction pattern - Google Patents
Diffraction optical element, preparation method thereof and design method of master plate diffraction pattern Download PDFInfo
- Publication number
- CN114137645B CN114137645B CN202111465867.0A CN202111465867A CN114137645B CN 114137645 B CN114137645 B CN 114137645B CN 202111465867 A CN202111465867 A CN 202111465867A CN 114137645 B CN114137645 B CN 114137645B
- Authority
- CN
- China
- Prior art keywords
- light intensity
- grating structure
- structure layer
- master
- preset
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 65
- 238000000034 method Methods 0.000 title claims abstract description 60
- 238000013461 design Methods 0.000 title claims abstract description 28
- 238000002360 preparation method Methods 0.000 title abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 238000009826 distribution Methods 0.000 claims description 25
- 230000000737 periodic effect Effects 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000012788 optical film Substances 0.000 claims description 8
- 125000004122 cyclic group Chemical group 0.000 claims description 7
- 238000006467 substitution reaction Methods 0.000 claims description 6
- 230000001131 transforming effect Effects 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 abstract description 25
- 238000012545 processing Methods 0.000 abstract description 7
- 239000010410 layer Substances 0.000 description 186
- 238000010586 diagram Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 10
- 238000012937 correction Methods 0.000 description 9
- 238000005457 optimization Methods 0.000 description 6
- 239000000047 product Substances 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 239000002086 nanomaterial Substances 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 241000226585 Antennaria plantaginifolia Species 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000011218 segmentation Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 1
- 238000012938 design process Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 230000002068 genetic effect Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000013178 mathematical model Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
- G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
- G02B5/1823—Plural gratings positioned on the same surface, e.g. array of gratings in an overlapping or superposed manner
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B2005/1804—Transmission gratings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
The application provides a diffraction optical element, a preparation method thereof and a design method of a master mask diffraction pattern, relating to the technical field of diffraction optics, comprising the steps of providing a transparent substrate; forming a first grating structure layer on one side surface of the transparent substrate through a first master; forming a second grating structure layer on the transparent substrate with the first grating structure layer through a second mother plate, wherein a first preset diffraction pattern on the first mother plate is different from a second preset diffraction pattern on the second mother plate, and at least one of the first grating structure layer and the second grating structure layer is a one-dimensional grating structure layer. The lattices generated by the first grating structure layer and the second grating structure layer are combined to form a preset array lattice. After the double-layer grating structure layer is adopted, the decomposed dot matrix has the characteristics of few dot matrixes, regular shape and the like, the design and processing difficulty of the diffraction optical element is greatly reduced, high-performance beam splitting is achieved, and the two-dimensional dot matrix is kept to have good beam splitting uniformity.
Description
Technical Field
The application relates to the technical field of diffraction optics, in particular to a diffraction optical element, a preparation method thereof and a design method of a master plate diffraction pattern.
Background
A Diffractive Optical Element (DOE) is an optical beam splitter device and the optical index parameters involved in a DOE product include overall beam efficiency, intensity of the zero-order diffraction order, and degree of uniformity of the optical intensity of the individual diffraction orders. The uniformity degree is an important design index, namely, the uniformity degree of the optical intensity of each diffraction order, which is defined as the ratio of the highest and the lowest difference value to the sum value of the light intensity in each diffraction order, and the lower the index value is, the better the performance is represented.
The diffractive optical element splits the light source and irradiates the receiving screen, and when the field angle of the split light beam is too large and the effective diffraction orders on the receiving screen are too many, the index hardly reaches the usable standard according to the conventional design (namely, DOE with a single-layer structure) for production and processing.
Disclosure of Invention
The embodiment of the application aims to provide a diffraction optical element, a preparation method thereof and a design method of a master plate diffraction pattern, wherein a first grating structure layer and a second grating structure layer are formed on a transparent substrate so as to split light beams, and uniformity of diffraction order optical intensity can be improved.
In one aspect of an embodiment of the present application, a method for manufacturing a diffractive optical element is provided, including providing a transparent substrate; forming a first grating structure layer on one side surface of the transparent substrate through a first master plate; forming a second grating structure layer on the transparent substrate with the first grating structure layer formed by a second mother plate, wherein a first preset diffraction pattern on the first mother plate is different from a second preset diffraction pattern on the second mother plate, and at least one of the first grating structure layer and the second grating structure layer is a one-dimensional grating structure layer.
In another aspect of the embodiment of the present application, there is provided a method for designing a diffraction pattern of a master, including: will input light intensity I 0 And input phase phi 0 Substitution formulaFourier transforming to obtain output light intensity I t And output phase phi t The method comprises the steps of carrying out a first treatment on the surface of the Wherein the input light intensity is 1, the input phase is randomly valued between 0 and pi, i is the coefficient +.>The method comprises the steps of carrying out a first treatment on the surface of the Calculating the output light intensity I t With the target light intensity I m Is the difference I of (2) c The method comprises the steps of carrying out a first treatment on the surface of the Let formula->Fourier transform and binarization are carried out to obtain target input light intensity I 0m And a target input phase phi 0m The method comprises the steps of carrying out a first treatment on the surface of the When outputting light intensity I t With the target light intensity I m Is the difference I of (2) c Less than the preset value of the light intensity according to the formulaCalculating the binarized phase phi of each coordinate point t0 Obtaining a preset diffraction pattern.
Alternatively, the formulation will beFourier transform and binarization are carried out to obtain target input light intensity I 0m And a target input phase phi 0m Thereafter, the method further comprises: when outputting light intensity I t With the target light intensity I m Is the difference I of (2) c The light intensity is larger than or equal to a preset value, and the formula is +.>Fourier transform to obtain corrected input light intensity I r And correcting the input phase phi r The method comprises the steps of carrying out a first treatment on the surface of the For the corrected input phase phi r Binarizing to obtain the circulating input light intensity I n And cyclic input phase phi n The method comprises the steps of carrying out a first treatment on the surface of the Will cycle the input light intensity I n And cyclic input phase phi n Substitution formula->Fourier transform to obtain the output light intensity I t1 And cyclically outputting the binarized phase phi t1 The method comprises the steps of carrying out a first treatment on the surface of the Wherein i is a coefficient->The method comprises the steps of carrying out a first treatment on the surface of the Calculating the output light intensity I of the circulation t1 With the target light intensity I m Is the difference I of (2) c1 The method comprises the steps of carrying out a first treatment on the surface of the When the light intensity I is circularly output t1 With the target light intensity I m Is the difference I of (2) c1 Less than the preset value of the light intensity, the formula +.>Fourier transform to obtain target input light intensity I 0m And a target input phase phi 0m The method comprises the steps of carrying out a first treatment on the surface of the According to the formula->Calculating the binarized phase phi of each coordinate point t0 Obtaining a preset diffraction pattern.
Optionally, the formula is based onCalculating the binarized phase phi of each coordinate point t0 After obtaining the preset diffraction pattern, the methodThe method further comprises the steps of: comparing the light intensity distribution of each coordinate point of the preset diffraction pattern with the light intensity distribution of each coordinate point corresponding to the target diffraction pattern; correcting the target light intensity I when the light intensity distribution of the coordinate point of the preset diffraction pattern exceeds the light intensity distribution threshold value of the coordinate point corresponding to the target diffraction pattern m And obtaining a light intensity distribution scheme of each coordinate point.
Optionally, when the light intensity distribution of the coordinate points of the preset diffraction pattern exceeds the light intensity distribution threshold of the corresponding coordinate points of the target diffraction pattern, correcting the target light intensity I m The light intensity distribution scheme for obtaining each coordinate point comprises the following steps: adjusting the target light intensity I m =I 0 X 1/cos (θ), θ is the angle between the direction of each point in the target lattice and the direction of beam propagation.
In still another aspect of the embodiment of the present application, there is provided a diffractive optical element including: the light beam incident on the transparent substrate passes through the first grating structure layer and the second grating structure layer, and then a preset array diffraction light spot is emitted.
Optionally, the surface pattern of the one-dimensional grating structure layer is a strip-shaped periodic grating pattern.
Optionally, a filling layer is formed between the first grating structure layer and the second grating structure layer.
Optionally, an optical film is plated between the transparent substrate and the first grating structure layer, and/or an optical film is plated on a side of the transparent substrate away from the first grating structure layer.
Optionally, refractive index differences are arranged between the first grating structure layer and the filling layer, and between the second grating structure layer and the filling layer respectively, and the refractive index difference is more than or equal to 0.2.
According to the diffraction optical element, the preparation method thereof and the design method of the master diffraction pattern provided by the embodiment of the application, a first grating structure layer and a second grating structure layer are sequentially formed on a transparent substrate, at least one of the first grating structure layer and the second grating structure layer is a one-dimensional grating structure layer, the other layer is a one-dimensional grating structure layer or a two-dimensional grating structure layer, stripe grating patterns are formed on the one-dimensional grating structure layer, complex patterns are formed on the two-dimensional grating structure layer, and the patterns can be obtained through an algorithm; the first grating structure layer generates a corresponding lattice pattern, the second grating structure layer generates a corresponding lattice pattern, when the first grating structure layer and the second grating structure layer are combined on the transparent substrate, the lattices generated by the first grating structure layer and the second grating structure layer are combined to form a preset array lattice, and the receiving screen can receive preset array diffraction light spots. The method is equivalent to disassembling the formed preset array lattice into two simple lattices, and the two simple lattices can be obtained through the first grating structure layer and the second grating structure layer respectively. After the double-layer grating structure layer is adopted, the decomposed dot matrix has the characteristics of few dot matrixes, regular shape and the like, so that the design and processing difficulty of the diffraction optical element is greatly reduced, and high-performance beam splitting can be achieved through the diffraction optical element, so that the two-dimensional dot matrix is kept to have better beam splitting uniformity.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the embodiments of the present application will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present application and should not be considered as limiting the scope, and other related drawings can be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of a diffractive optical element according to the present embodiment;
fig. 2 is one of the optical path diagrams of the diffractive optical element provided in the present embodiment;
FIG. 3 is a diagram of a preset lattice disassembly process;
FIG. 4 is a schematic diagram of a diffraction micro-nano structure pattern corresponding to FIG. 3;
FIG. 5 is a flowchart of a method for manufacturing a diffractive optical element according to the present embodiment;
FIG. 6 is a flow chart of a method for designing a master diffraction pattern provided in this embodiment;
FIG. 7 is a second optical path diagram of the diffractive optical element according to the present embodiment;
fig. 8 is a diffraction pattern of example 3 x 5doe and its corresponding lattice plot;
FIG. 9 is a three-dimensional view of the diffraction pattern of FIG. 8;
FIG. 10 is a schematic diagram of a first grating structure layer and a second grating structure layer of the diffractive optical element structure provided in this embodiment;
fig. 11 is a lattice diagram corresponding to fig. 10;
FIG. 12 is a second schematic diagram of a first grating structure layer and a second grating structure layer of the diffractive optical element structure according to the present embodiment;
fig. 13 is a lattice diagram corresponding to fig. 12;
FIG. 14 is a third schematic view of the first grating structure layer and the second grating structure layer of the diffractive optical element structure according to the present embodiment;
fig. 15 is a lattice diagram corresponding to fig. 14.
Icon: a 100-diffractive optical element; 101-a transparent substrate; 110-a first grating structure layer; 120-a second grating structure layer; 130-a filler layer; 200-receiving screen.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application.
In the description of the present application, it should be noted that, the azimuth or positional relationship indicated by the terms "inner", "outer", etc. are based on the azimuth or positional relationship shown in the drawings, or the azimuth or positional relationship that is commonly put in use of the product of this application, are merely for convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element to be referred to must have a specific azimuth, be configured and operated in a specific azimuth, and therefore should not be construed as limiting the present application. Furthermore, the terms "first," "second," and the like, are used merely to distinguish between descriptions and should not be construed as indicating or implying relative importance.
It should also be noted that the terms "disposed," "coupled," and "connected" are to be construed broadly, and may be, for example, fixedly coupled, detachably coupled, or integrally coupled, unless otherwise specifically defined and limited; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present application will be understood in specific cases by those of ordinary skill in the art.
The optical index parameters involved in DOE products include overall beam efficiency, intensity of the zero-order diffraction orders, and degree of uniformity of the optical intensity of the individual diffraction orders. Where the degree of uniformity, defined as the ratio of the highest and lowest difference in intensity to the sum of the individual diffraction orders, is lower, representing better performance. The source of uniformity requirements is also at the product end, and when the uniformity requirements are applied to three-dimensional detection, in order to improve the point cloud processing efficiency of depth information, each light spot projected onto a receiving screen is required to keep the light intensity as consistent as possible. Too low uniformity can affect the efficiency and accuracy of the receiving end in the process of analyzing the point cloud, and even the target light spot cannot be effectively identified if the light intensity is too low.
The existing DOE adopting a single-layer structure is difficult to realize because the design and manufacturing of the DOE device with the single-layer structure have too high requirements on the precision degree of the micro-nano structure, so that better uniformity (less than 20%) is difficult to realize. According to industry experience, the uniformity of the DOE obtained under the photoetching machining scheme under the mass production form is generally not ideal.
In order to solve the above-mentioned problems, the present embodiment of the present application provides a diffractive optical element 100, which emits a preset array of diffraction spots, so as to improve the uniformity of the diffraction spots received on the receiving screen 200, reduce the difficulty of preparation, and be suitable for correction design, so that the spots actually striking the optical screen can reach a better uniformity.
Specifically, referring to fig. 1, an embodiment of the present application provides a diffractive optical element 100, including: the light beam incident on the transparent substrate 101 passes through the first grating structure layer 110 and the second grating structure layer 120, and then emits a preset array diffraction light spot.
The material of the transparent substrate 101 may be glass, sapphire glass, resin or plastic, and the first grating structure layer 110 and the second grating structure layer 120 are sequentially formed on the transparent substrate 101, in other words, two grating structure layers are formed on the transparent substrate 101, so that after the light beam incident on the transparent substrate 101 passes through the first grating structure layer 110 and the second grating structure layer 120, a preset array diffraction light spot can be emitted, so that the uniformity of the light spot received on the receiving screen 200 is better.
At least one of the first grating structure layer 110 and the second grating structure layer 120 is a one-dimensional grating structure layer, and the other layer may be a one-dimensional grating structure layer or a two-dimensional grating structure layer. The surface pattern of the one-dimensional grating structure layer is a strip-shaped periodic grating pattern, the two-dimensional grating structure layer is a complex pattern, and the two-dimensional grating structure layer can be calculated by a design method of a master plate diffraction pattern, and the specific calculation process is described below.
The first grating structure layer 110 and the second grating structure layer 120 are of a thickness of 10 microns, wherein the effective part is a three-dimensional micro-nano structure on top of the material, namely an interface structure with refractive index difference between an upper layer and a lower layer, and the thickness is of the micron. A filling layer 130 is formed between the first grating structure layer 110 and the second grating structure layer 120, the second grating structure layer 120 forms a structural interface with air above in fig. 1, and the first grating structure layer 110 forms a structural interface with the filling layer 130 material. The three-dimensional wiener structure of the grating structure layer can adopt a two-to-eight-order multi-layer step structure or a gray structure, and the specific pattern is obtained by optimizing and designing under a series of specifications such as the wavelength of an incident light source, a target lattice, a field angle and the like.
The materials of the grating structure layer and the filling layer 130 have a certain refractive index difference, the first grating structure layer 110 and the filling layer 130 have a refractive index difference, the second grating structure layer 120 and the filling layer 130 have a refractive index difference which is more than or equal to 0.2, the materials constituting the grating structure layer have a relatively high refractive index, and the materials constituting the filling layer 130 have a relatively low refractive index; it is also possible that the material constituting the grating structure layer has a relatively low refractive index and the material constituting the filling layer 130 has a relatively high refractive index.
In addition, an optical film is plated between the transparent substrate 101 and the first grating structure layer 110, and/or an optical film is disposed on a side of the transparent substrate 101 away from the first grating structure layer 110.
The surface of the transparent substrate 101 facing away from the grating structure layer may be provided with an optical element or a plated optical film to expand the optical performance of the diffractive optical element 100, such as plating an anti-reflection film, a wear-resistant layer, protecting an ITO layer, etc.; in addition, one side of the grating structure layer of the transparent substrate 101 may also be coated to expand the optical performance of the diffractive optical element 100, or both sides of the transparent substrate 101 may be coated with an optical film, so that the effect is doubled.
The collimated light source of the module enters the diffractive optical element 100 provided in the embodiment of the present application, where the two grating structure layers of the diffractive optical element 100 split the incident light, and finally form the diffracted light of the preset array, and the diffraction spots of the preset array are formed on the receiving screen 200. By way of example, a uniformly distributed spot appears as shown in fig. 2, wherein the modular light source may be a VCSEL light source, an EEL light source, a light source of a fiber laser, or the like. The following description will be made with respect to an example in which a point light source is used as a light source for intuitively describing the beam splitting characteristics.
The diffractive optical element 100 provided by the embodiment of the application can optimize a high-difficulty regular lattice, the diffractive optical element 100 generates an optical lattice through a periodic pattern formed by a double-layer grating structure layer, a high-difficulty DOE multi-lattice requirement is properly disassembled into a lattice scheme of the double-layer grating structure layer for processing, the process difficulty can be reduced, and the yield of a final product is improved. In the disassembly process, one of the grating structure layers is a one-dimensional grating structure layer, specifically, the surface pattern of the one-dimensional grating structure layer is a strip-shaped periodic grating pattern, the generated diffraction orders are in one-dimensional linear arrangement, and the diffraction orders are combined with the other grating structure layer to form a final preset array diffraction light spot, namely an array lattice light spot. As shown in fig. 3, the array type lattice light spots on the left side of the equal sign may be disassembled into two lattice schemes on the right side of the equal sign, where the two lattice schemes disassembled in fig. 3 correspond to the preset patterns formed by the two grating structure layers in fig. 4, and the two grating structure layers, i.e. the first grating structure layer 110 and the second grating structure layer 120, respectively generate two lattice schemes, and after the light beams sequentially pass through the first grating structure layer 110 and the second grating structure layer 120 through the transparent substrate 101, the leftmost array type lattice light spots in fig. 3 can be formed.
The present application illustrates three lattice schemes for disassembly, in a first possible manner, the lattices generated by the two grating structure layers of the diffractive optical element 100 can be all connected into a straight line arrangement, and the straight lines are mutually perpendicular. The number of lattice generated by one grating structure layer is Nx1 and Ny1, and the number of lattice generated by the other grating structure layer is Nx2 and Ny2. One grating structure layer must be a strip-shaped periodic grating (which can be calculated by a design method of a master diffraction pattern), and a one-dimensional symmetrical lattice with Nx1 or Ny1 as 1 is formed after light is incident, wherein zero order is at the symmetrical center. The other grating structure layer can be a complex two-dimensional grating structure layer (complex morphology calculated by the design method of the master diffraction pattern) which generates a one-dimensional lattice with an asymmetric shape, the straight line direction is perpendicular to the former, and the zero order of the lattice is not in the symmetric center.
In the second implementation manner, the one-dimensional lattices generated by the two grating structure layers can be connected into a straight line arrangement, and the straight lines of the lattices generated by the two grating structure layers are not perpendicular to each other at any angle. Let one lattice number be Nx1 x Ny1 and the other lattice number be Nx2 x Ny2. One of the grating structure layers is a strip grating structure layer, the lattices generated after light beam irradiation are one-dimensional symmetrical lattices, nx1 or Ny1 is 1, and zero order is required to be at the symmetrical center. The other grating structure layer can be a strip grating to generate a one-dimensional symmetric lattice, or can be a complex shape obtained by a design method of a master mask diffraction pattern to form an asymmetric one-dimensional lattice, wherein zero order is not in the symmetric center, nx1 or Ny1 is 1, and a straight line formed by connecting the one-dimensional grating lattices forms a certain included angle with the former.
In a third implementation manner, one grating structure layer generates a one-dimensional symmetric lattice for the strip grating, and the other grating structure layer generates a two-dimensional symmetric lattice by calculating a design method of a master diffraction pattern. One of the grating structure layers (one-dimensional strip grating) generates a lattice number of Nx1 x Ny1, wherein one of Nx1 and Ny1 is required to be 1, and both are odd; the number of lattices generated by the other grating structure layer (the complex image calculated by the design method of the master diffraction pattern) is Nx2 and Ny2 two-dimensional lattice structure, if one direction can be an odd number, the lattices are symmetrical in the direction, the zero order is at the symmetrical center, and if the number is an even number, the non-symmetrical zero order of the lattices is not at the symmetrical center.
In the lattices corresponding to the two grating structure layers, one of the numbers of the horizontal rows and the vertical columns is 1, for example, in the three realizable modes, the lattice number generated by one grating structure layer is Nx1 x Ny1, nx1 or Ny1 is 1. Taking fig. 11 as an example, one dot matrix disassembled in fig. 11 is a horizontal row and two vertical rows, the other dot matrix is a five-horizontal row and one vertical row, and the number of the two dot matrices in fig. 11 is 1; one lattice disassembled in FIG. 13 is a horizontal row and three vertical columns, the other lattice is a five-horizontal row and one vertical column, and the number of the two lattices in FIG. 13 which are in line with the horizontal row and the vertical column is 1; one dot matrix in fig. 15 is a horizontal row and three columns, and one dot matrix is five horizontal rows and three columns, so that the number of the first dot matrix in fig. 15 conforming to the horizontal row and the number of the columns are 1, and therefore, only one dot matrix in the two dot matrices is required to be arranged to conform to the number of the horizontal row and the number of the columns are 1.
Among the three realizable modes, different periodic patterns of the DOE can realize different optical lattice arrangements. Some DOEs are one-dimensional optical lattices with symmetry and periodic grating morphology, and some DOEs are odd-shaped in periodic morphology and can generate asymmetric optical lattice arrangement. The symmetry refers to whether the one-dimensional lattice of the DOE periodic morphology is exactly symmetrically segmented at the position of the optical zero diffraction order, the symmetric segmentation represents symmetry, and the asymmetric segmentation represents asymmetry.
Where the period of the pattern profile of the DOE is approximately several times the wavelength, the feature size is even to the order of hundreds of nanometers. In the process of designing the DOE, the present embodiment employs a GS (Gerchberg-Saxton algorithm) phase recovery algorithm to complete the optimization design process. Besides, various heuristic optimization algorithms such as Particle Swarm Optimization (PSO), genetic Algorithm (GA) and the like can be used for designing the DOE in combination with electromagnetic wave calculation theory (angular spectrum theorem and the like).
As can be seen from the above, for the high-difficulty DOE multi-lattice pattern serving as the target pattern, the high-difficulty DOE multi-lattice pattern is first disassembled into two lattice schemes, and the two lattice schemes respectively have corresponding grating structure layer patterns.
It should be emphasized that the dot matrix scheme disassembly is not limited to the three realizable modes, and besides the disassembly modes, a high-difficulty DOE multi-dot matrix can be disassembled into other two proper dot matrix schemes according to specific requirements, the disassembled two dot matrix schemes have surface patterns of corresponding grating structure layers, and finally, the light beams form diffraction light of a preset array after passing through the double-layer grating structure layers, so that the high-difficulty DOE multi-dot matrix patterns are obtained. Therefore, no matter how the two dot matrix schemes are disassembled, only the difficulty of the process can be reduced, the yield of the final product can be improved, and the preset high-difficulty DOE multi-dot matrix pattern can be obtained after the two double-layer grating structure layers corresponding to the two dot matrix schemes are disassembled. In addition, because the preset high-difficulty DOE multi-lattice pattern is the only target, even if the preset high-difficulty DOE multi-lattice pattern is disassembled into different lattice schemes, the preset high-difficulty DOE multi-lattice pattern is finally obtained to be the only target through the double-layer grating structure layers corresponding to different lattices.
On the other hand, referring to fig. 5, an embodiment of the present application provides a method for manufacturing a diffractive optical element 100, including:
s100: a transparent substrate 101 is provided.
S110: a first grating structure layer 110 is formed on one side surface of the transparent substrate 101 through a first master.
First, the first grating structure layer 110 is imprinted on the transparent substrate 101 through the first master, and then the filling layer 130 is coated on the first grating structure layer 110 in a spin-coating manner.
S120: a second grating structure layer 120 is formed through a second master on the transparent substrate 101 on which the first grating structure layer 110 is formed.
Wherein the first preset diffraction pattern on the first master is different from the second preset diffraction pattern on the second master, and at least one of the first grating structure layer 110 and the second grating structure layer 120 is a one-dimensional grating structure layer.
The glue is cured with an ultraviolet lamp and the second grating structure layer 120 is imprinted on top of the filling layer 130.
When the first grating structure layer 110 is formed by the first master and the second grating structure layer 120 is formed by the second master, the first preset diffraction pattern on the first master corresponds to the pattern of the first grating structure layer 110, but is not necessarily identical, and the second master is identical depending on whether positive photoresist or negative photoresist is used.
The master can be prepared by photolithography and re-etching by using a DUV device or directly by using a laser direct writing method. After the master is prepared, the master is pressed on the transparent substrate 101 material by adopting a nano-imprinting method, and nano-imprinting is performed on the transparent substrate 101 to prepare the diffraction optical element 100 in two steps, namely, the first grating structure layer 110 is imprinted on the transparent substrate 101 through the first master, then the filling layer 130 is coated, and the second grating structure layer 120 is imprinted through the second master. The alignment accuracy can be improved by adding marks in the imprinting process, the alignment error of the structure depends on the alignment included angle accuracy between wafers, and the requirement of the position error is far smaller than that between components in the traditional method, so that the overall optical performance of the diffraction optical element 100 can be improved.
It can be seen how the first grating structure layer 110 and the second grating structure layer 120 are formed on the transparent substrate 101 mainly depends on how the master is designed, and the predetermined diffraction pattern on the master determines the pattern of the grating structure layer to generate the predetermined lattice light spot.
Therefore, referring to fig. 6, an embodiment of the present application further provides a method for designing a master diffraction pattern, including:
s200: will input light intensity I 0 And input phase phi 0 Substitution formulaFourier transforming to obtain output light intensity I t And output phase phi t The method comprises the steps of carrying out a first treatment on the surface of the Wherein the input light intensity is 1, the input phase is randomly valued between 0 and pi, i is the coefficient +.>。
In the embodiment of the present application, the diffractive optical element 100 is designed to have a second-order structure, the height of the step is determined by the wavelength of the light source and the refractive index of the material, and the second-order top view structure is realized by the GS algorithm. The algorithm is applicable to both one-dimensional grating structure layers and two-dimensional grating structure layers. The phase of the light source changes after the light source passes through the DOE due to different refractive indexes of the steps, the phase change of the light source meets the approximation of a thin element, the phase change of the light source is equivalent to the phase change of a structure, and the phase change of the light source is equal to the phase change of an n-type light source, wherein lambda is the wavelength of the light source, n1 and n2 are the refractive indexes of medium on and off the DOE respectively, so the height h meets the following equation:
the period Px, py length and width of the DOE will first be determined according to the FOV of the on-screen lattice and the wavelength, satisfying the following equation:
wherein FOV_H, V represents the transverse, longitudinal field angle, n of the lattice H,V Representing the number of points in the horizontal and vertical directions. After determining the length and width of the period Px and Py of the DOE, adopting a GS algorithm to optimize the DOE structure, wherein a logic diagram and an optical path diagram of the algorithm optimization are shown in figures 7-9.
Wherein the light source is initially set as a uniform light sourceThe input phase phi t is random phase distribution between 0 and pi, and the dot matrix light intensity distribution I of the target m All 1 and the rest are 0.
S210: calculating the output light intensity I t With the target light intensity I m Is the difference I of (2) c 。
The first mother board and the second mother board respectively correspond to the two disassembled dot matrix patterns, and when the first mother board is designed, the target light intensity I is m For the light intensity of the dot matrix pattern corresponding to the first master, when the second master is designed, the target light intensity I m Is the light intensity of the dot matrix pattern corresponding to the second master.
S220: the formula is given byFourier transform and binarization are carried out to obtain target input light intensity I 0m And a target input phase phi 0m 。
The propagation of the beam can be reduced to a fourier transform on a mathematical model, so the propagation process is simulated using fft and ifft in the optimization.
S230: when outputting light intensity I t With the target light intensity I m Is the difference I of (2) c Less than the preset value of the light intensity according to the formulaCalculating the binarized phase phi of each coordinate point t0 Obtaining a preset diffraction pattern.
S240: when outputting light intensity I t With the target light intensity I m Is the difference I of (2) c The light intensity is larger than or equal to a preset value, and the formula is given as followsFourier transform to obtain corrected input light intensity I r And correcting the input phase phi r。
S241: for the corrected input phase phi r Binarizing to obtain the circulating input light intensity I n And cyclic input phase phi n。
Returning to S200, the input light intensity I is cycled n And cyclic input phase phi n Substitution formulaFourier transform to obtain the output light intensity I t1 And cyclically outputting the binarized phase phi t1 The method comprises the steps of carrying out a first treatment on the surface of the Wherein i is a coefficient->。
Calculating the output light intensity I of the circulation t1 With the target light intensity I m Is the difference I of (2) c1 Until the light intensity I is circularly output t1 With the target light intensity I m Is the difference I of (2) c1 Less than the preset value of the light intensity, and the formula is as followsFourier transform to obtain target input light intensity I 0m And a target input phase phi 0m 。
According to the formulaCalculating the binarized phase phi of each coordinate point t0 Obtaining a preset diffraction pattern.
The iteration is performed by continuously modifying the light intensity and the phase distribution so as to finally meet the preset light intensity target. Thus obtaining the second order distribution structure of DOEAnd the corresponding light intensity value I of each dot of the dot matrix 0m The phase of each coordinate point can obtain a preset diffraction pattern corresponding to the lattice, the preset diffraction pattern is prepared on a master plate by adopting a DUV equipment photoetching, re-etching or laser direct writing method, and a corresponding grating structure layer is formed on the transparent substrate 101 through the master plate, so that the diffraction optical element 100 is obtained. The first master forms a first grating structure layer 110 and the second master forms a second grating structure layer 120.
In addition, when the light source is projected on the receiving screen 200 through the DOE, the overall lattice arrangement position generates pincushion distortion due to overlarge propagation inclination angles of some diffraction orders, in addition, the light intensity can also change, and the edge relative to the center is weakened. Therefore, the lattice scheme is designed and the intensity compensation correction (the width of the grid bars is adjusted by an optimization algorithm or the edges of the complex image are adjusted in a changing way) is required to be performed on the pincushion distortion in advance, so that the uniform distribution of the intensity of each diffraction order on the receiving screen 200 is shown in the following table, which shows the lattice design of 3*5 and the distribution of the intensity of the lattice after the distortion generated on the receiving screen 200, and as can be seen from the following table, for the lattice, when the designed intensity is 1, the intensity received by the receiving screen 200 may be reduced due to the distortion, and thus the correction is required.
The specific correction process is as follows: comparing the light intensity distribution of each coordinate point of the preset diffraction pattern with the light intensity distribution of each coordinate point corresponding to the target diffraction pattern, and judging that the pattern is affected by distortion when the light intensity distribution of the coordinate point of the preset diffraction pattern exceeds the light intensity distribution threshold range of the coordinate point corresponding to the target diffraction pattern, wherein the light spot intensity is excessively strong or excessively weak for correcting the travelling light intensity. Correcting the target light intensity I m Obtaining a light intensity distribution scheme of each coordinate point position, and adjusting the target light intensity I m =I 0 X 1/cos (θ), θ is the angle between the direction of each spot in the target lattice and the direction of beam propagation. The adjusted target light intensity I m Re-substituting the final master plate obtained by re-calculation in the corresponding formulas and stepsIs a diffraction pattern of the diffraction pattern (a).
Three embodiments are also provided for correcting the present application, in a first embodiment, as shown in fig. 10 and 11, a portion of the double structure of the DOE is composed of a one-dimensional transverse grating of the second grating structure layer 120 corresponding to the symmetrical lattice and another portion of the first grating structure layer 110. The first grating structure layer 110 corresponds to other structures of an asymmetric lattice, and may be a vertical one-dimensional grating of a symmetric lattice. In fig. 10, black represents the portion of the dielectric where the recess was etched away, and white represents the portion of the dielectric that remains unetched.
The first embodiment also requires pre-correction of the spot array as shown in the following figure, and the first embodiment is applicable to correction design to make the spot intensity uniform. The following table is a light intensity correspondence table, for example, after correction, the light intensity of a certain preset coordinate point is 1.07, and finally the light intensity of a corresponding point light spot formed on the receiving screen 200 is 1, and other coordinate points are the same.
In the second embodiment, as shown in fig. 12 and 13, the one-dimensional dislocation lattice may be a periodic dislocation lattice or an aperiodic dislocation lattice. The periodicity of the dislocation here means that it is composed of repeated dislocation units in the transverse or longitudinal direction. In the second embodiment, the first grating structure layer 110 uses oblique gratings, the second grating structure layer 120 is a one-dimensional grating, so that the final lattice arrangement forms a staggered arrangement, and white representing structures in the pattern are convex and black representing structures are concave. In the process, it is required to pay attention to the alignment angle of two DOEs, which requires higher precision (less than 0.1 DEG) and forms a fixed included angle.
In the third embodiment, as shown in fig. 14 and 15, the first grating structure layer 110 is an oblique binary grating, the second grating structure layer 120 is a two-dimensional binary diagram, and the two-dimensional dislocation lattice function is realized through two-time beam splitting. White in the pattern represents the structure protruding and black represents the structure recessing. Also, the number of steps of the pattern can be two to eight steps, which is determined by the efficiency of design specification and the processing difficulty. In the process, it is noted that the alignment angles of the two structures are required to have higher precision (less than 0.1 °) and form a fixed included angle. The design of the oblique grating is consistent with the thought of the lattice in class B, and the design of the two-dimensional grating is the same as the thought of the asymmetric lattice.
In the structural design of fig. 14, since the second grating structure layer 120 has a lattice arrangement in both the horizontal and vertical directions, the matching of the FOVs of the two model lattices needs to be considered in the design of the oblique grating, so that the lattices are regularly distributed at equal intervals under a single light source.
In summary, according to the diffractive optical element 100 and the preparation method thereof provided by the embodiments of the present application, a first grating structure layer 110 and a second grating structure layer 120 are sequentially formed on a transparent substrate 101, at least one of the first grating structure layer 110 and the second grating structure layer 120 is a one-dimensional grating structure layer, the other layer is a one-dimensional grating structure layer or a two-dimensional grating structure layer, a stripe grating pattern is formed on the one-dimensional grating structure layer, and a complex pattern is formed on the two-dimensional grating structure layer, wherein the patterns can be obtained through an algorithm; the first grating structure layer 110 generates a corresponding lattice pattern, the second grating structure layer 120 generates a corresponding lattice pattern, and when the first grating structure layer 110 and the second grating structure layer 120 are combined on the transparent substrate 101, the lattices generated by the first grating structure layer 110 and the second grating structure layer 120 are combined to form a preset array lattice, and the receiving screen 200 can receive preset array diffraction light spots. The method is equivalent to the step of disassembling the formed preset array lattice into two simple lattices, which can be obtained through the first grating structure layer 110 and the second grating structure layer 120, respectively. After the double-layer grating structure layer is adopted, as the decomposed dot matrix has the characteristics of few dot matrixes, regular shape and the like, the design and processing difficulty of the diffraction optical element 100 is greatly reduced, and high-performance beam splitting can be achieved through the diffraction optical element 100, so that the two-dimensional dot matrix is kept to have better beam splitting uniformity. And the correction design can be further carried out subsequently, the corresponding correction factors are set according to the parameter requirements of different lenses and photosensitive devices, and the uniformity is improved to the maximum extent.
The above description is only an example of the present application and is not intended to limit the scope of the present application, and various modifications and variations will be apparent to those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included in the protection scope of the present application.
Claims (10)
1. A method of designing a master diffraction pattern, comprising:
will input light intensity I 0 And input phase phi 0 Substitution formulaFourier transforming to obtain output light intensity I t And output phase phi t The method comprises the steps of carrying out a first treatment on the surface of the Wherein the input light intensity is 1, the input phase is randomly valued between 0 and pi, i is the coefficient +.>；
Calculating the output light intensity I t With the target light intensity I m Is the difference I of (2) c ；
The formula is given byFourier transform and binarization are carried out to obtain target input light intensity I 0m And a target input phase phi 0m ；
When the output light intensity I t Is in accordance with the target light intensity I m Is the difference I of (1) c Less than the preset value of the light intensity according to the formulaCalculating the binarized phase phi of each coordinate point t0 Obtaining a diffraction pattern on a preset master plate.
2. The method of designing a master diffraction pattern according to claim 1, wherein the formula is as followsFourier transform and binarization are carried out to obtain target input light intensity I 0m And a target input phase phi 0m Thereafter, the method further comprises:
when the output light intensity I t Is in accordance with the target light intensity I m Is the difference I of (1) c The light intensity preset value is larger than or equal to the light intensity preset value, and the formula is given as followsFourier transform to obtain corrected input light intensity I r And correcting the input phase phi r ；
For the corrected input phase phi r Binarizing to obtain the circulating input light intensity I n And cyclic input phase phi n ；
The cyclic input light intensity I n And the cyclic input phase phi n Substitution formulaFourier transform to obtain the output light intensity I t1 And cyclically outputting the binarized phase phi t1 The method comprises the steps of carrying out a first treatment on the surface of the Wherein i is a coefficient->；
Calculating the output light intensity I of the circulation t1 Is in accordance with the target light intensity I m Is the difference I of (2) c1 ；
When the light intensity I is circularly output t1 Is in accordance with the target light intensity I m Is the difference I of (1) c1 Less than the preset value of the light intensity, and the formula is as followsFourier transform is carried out to obtain the target input light intensity I 0m And the target input phase phi 0m ；
According to the formulaCalculating the binarized phase phi of each coordinate point t0 Obtaining a diffraction pattern on a preset master plate.
3. The method of designing a master diffraction pattern according to claim 1 or 2, wherein the following formulaCalculating the binarized phase phi of each coordinate point t0 After obtaining the diffraction pattern on the preset master, the method further comprises:
comparing the light intensity distribution of the lattice on the receiving screen corresponding to the diffraction pattern on the preset master plate with the light intensity distribution of the lattice preset on the receiving screen;
when the light intensity distribution of the diffraction pattern on the preset master plate corresponding to the lattice on the receiving screen exceeds the preset lattice light intensity distribution threshold value on the receiving screen, correcting the target light intensity I m And redesigning the diffraction pattern on the preset master according to the design method of the master diffraction pattern as claimed in claim 1 or 2.
4. The method according to claim 3, wherein the target light intensity I is corrected when the light intensity distribution of the diffraction pattern on the predetermined master corresponding to the lattice on the receiving screen exceeds a light intensity distribution threshold of the lattice preset on the receiving screen m The light intensity distribution scheme for obtaining each coordinate point comprises the following steps:
adjusting the target light intensity I m =I 0 X 1/cos (θ), θ is the angle between the direction of each point in the target lattice and the direction of beam propagation.
5. A method for producing a diffractive optical element, which is produced by obtaining a master using the method for designing a master diffraction pattern according to any one of claims 1 to 4, comprising:
providing a transparent substrate;
forming a first grating structure layer on one side surface of the transparent substrate through first master stamping;
and forming a second grating structure layer on the transparent substrate on which the first grating structure layer is formed through imprinting of a second master, wherein a first preset diffraction pattern on the first master is different from a second preset diffraction pattern on the second master, and at least one of the first grating structure layer and the second grating structure layer is a one-dimensional grating structure layer.
6. A diffractive optical element produced by the production method of the diffractive optical element according to claim 5, comprising: the light beam incident on the transparent substrate passes through the first grating structure layer and the second grating structure layer, and then a preset array diffraction light spot is emitted.
7. The diffractive optical element according to claim 6, characterized in that the surface pattern of the one-dimensional grating structure layer is a striped periodic grating pattern.
8. A diffractive optical element according to claim 6 or 7, characterized in that a filling layer is formed between the first grating structure layer and the second grating structure layer.
9. A diffractive optical element according to claim 8, characterized in that there is a refractive index difference between the first grating structure layer and the filling layer, between the second grating structure layer and the filling layer, respectively, and the refractive index difference is not less than 0.2.
10. The diffractive optical element according to claim 6, characterized in that an optical film is plated between the transparent substrate and the first grating structure layer and/or that an optical film is plated on the side of the transparent substrate remote from the first grating structure layer.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111465867.0A CN114137645B (en) | 2021-12-03 | 2021-12-03 | Diffraction optical element, preparation method thereof and design method of master plate diffraction pattern |
| PCT/CN2021/142666 WO2023097850A1 (en) | 2021-12-03 | 2021-12-29 | Diffractive optical element and preparation method therefor, and method for designing master diffraction pattern |
| PCT/CN2022/136316 WO2023098897A1 (en) | 2021-12-03 | 2022-12-02 | Diffractive optical element, manufacturing method therefor, and design method for micro-nano structure of master |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111465867.0A CN114137645B (en) | 2021-12-03 | 2021-12-03 | Diffraction optical element, preparation method thereof and design method of master plate diffraction pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114137645A CN114137645A (en) | 2022-03-04 |
| CN114137645B true CN114137645B (en) | 2023-10-24 |
Family
ID=80387619
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111465867.0A Active CN114137645B (en) | 2021-12-03 | 2021-12-03 | Diffraction optical element, preparation method thereof and design method of master plate diffraction pattern |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN114137645B (en) |
| WO (2) | WO2023097850A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114137645B (en) * | 2021-12-03 | 2023-10-24 | 浙江水晶光电科技股份有限公司 | Diffraction optical element, preparation method thereof and design method of master plate diffraction pattern |
| CN114913326A (en) * | 2022-04-25 | 2022-08-16 | 合肥的卢深视科技有限公司 | Image segmentation method, electronic device and computer-readable storage medium |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101187709A (en) * | 2007-11-30 | 2008-05-28 | 中国科学院上海光学精密机械研究所 | Equal Intensity Beam-Splitting Grating Eliminating Zero-Order Diffraction Spectrum Points |
| CN101443712A (en) * | 2006-05-11 | 2009-05-27 | 剑桥实业有限公司 | Phase retrieval and phase hologram synthesis |
| CN110161679A (en) * | 2019-04-26 | 2019-08-23 | 清华大学 | A kind of design method expanding diffraction image |
| CN111812758A (en) * | 2020-07-21 | 2020-10-23 | 欧菲微电子技术有限公司 | Diffractive optical element, manufacturing method thereof, optical system under screen and electronic equipment |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4006362B2 (en) * | 2002-06-17 | 2007-11-14 | キヤノン株式会社 | Diffractive optical element and optical system having the same |
| US20060181770A1 (en) * | 2005-02-15 | 2006-08-17 | K Laser Technology, Inc. | Rear projection screen with spatial varying diffusing angle |
| JP5464327B2 (en) * | 2009-07-22 | 2014-04-09 | 大日本印刷株式会社 | Diffraction structure display |
| CN106624354B (en) * | 2017-02-21 | 2018-09-21 | 长春理工大学 | Interfere micro-nano technology device and method based on the multi-beam laser of Darman raster and speculum |
| CN106933027B (en) * | 2017-04-28 | 2020-07-07 | 河南科技大学 | A design method of annular vortex array mask with controllable number of vortices |
| TWI649586B (en) * | 2017-07-20 | 2019-02-01 | Benq Materials Corporation | Light weight guiding film and manufacturing method thereof |
| CN112840238B (en) * | 2018-10-15 | 2023-08-22 | Ａｇｃ株式会社 | Diffraction optical element and illumination optical system |
| WO2020158419A1 (en) * | 2019-01-31 | 2020-08-06 | Ａｇｃ株式会社 | Diffraction optical element, projection device using same, and measurement device |
| CN109814256A (en) * | 2019-02-25 | 2019-05-28 | 中国科学院光电技术研究所 | A monolithic intensity correction type lattice structured light DOE device and design method |
| CN111781733A (en) * | 2020-06-09 | 2020-10-16 | 北京理工大学 | Multi-layer complex domain imaging method and device based on light wave modulation and phase recovery |
| CN111812773A (en) * | 2020-07-27 | 2020-10-23 | 宁波舜宇奥来技术有限公司 | A kind of diffractive optical waveguide and preparation method thereof |
| CN214225473U (en) * | 2021-03-01 | 2021-09-17 | 浙江舜宇光学有限公司 | Double-layer diffraction element and imprinting master plate thereof |
| CN114137645B (en) * | 2021-12-03 | 2023-10-24 | 浙江水晶光电科技股份有限公司 | Diffraction optical element, preparation method thereof and design method of master plate diffraction pattern |
-
2021
- 2021-12-03 CN CN202111465867.0A patent/CN114137645B/en active Active
- 2021-12-29 WO PCT/CN2021/142666 patent/WO2023097850A1/en active Application Filing
-
2022
- 2022-12-02 WO PCT/CN2022/136316 patent/WO2023098897A1/en active Application Filing
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101443712A (en) * | 2006-05-11 | 2009-05-27 | 剑桥实业有限公司 | Phase retrieval and phase hologram synthesis |
| CN101187709A (en) * | 2007-11-30 | 2008-05-28 | 中国科学院上海光学精密机械研究所 | Equal Intensity Beam-Splitting Grating Eliminating Zero-Order Diffraction Spectrum Points |
| CN110161679A (en) * | 2019-04-26 | 2019-08-23 | 清华大学 | A kind of design method expanding diffraction image |
| CN111812758A (en) * | 2020-07-21 | 2020-10-23 | 欧菲微电子技术有限公司 | Diffractive optical element, manufacturing method thereof, optical system under screen and electronic equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023098897A1 (en) | 2023-06-08 |
| WO2023097850A1 (en) | 2023-06-08 |
| CN114137645A (en) | 2022-03-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN110221447B (en) | Structured light projection diffraction optical device based on super-structured surface | |
| CN109061887B (en) | Diffractive Optical Elements and Measuring Devices | |
| CN114137645B (en) | Diffraction optical element, preparation method thereof and design method of master plate diffraction pattern | |
| CN109633946B (en) | Display device, manufacturing method thereof and 3D printing system | |
| US20240345463A1 (en) | Point cloud projection system | |
| CN115552278B (en) | Optical system device and optical element manufacturing method | |
| JP6186679B2 (en) | Illumination optical system, measuring apparatus, and diffractive optical element used therefor | |
| WO2019111787A1 (en) | Light-emitting device and production method for same | |
| CN113671612A (en) | Super-surface optical element, design method and structured light projection module | |
| CN110824721A (en) | Method for designing diffractive optical element and diffractive optical element | |
| CN107430220A (en) | Complex diffuser | |
| WO2022002273A1 (en) | Periodic optimization method for diffractive optical element | |
| CN111771147A (en) | Design method of multi-plane transformation device, phase plate and multi-plane transformation device obtained by the method | |
| KR20210100581A (en) | Diffractive optical device providing structured light | |
| US11340389B2 (en) | Diffractive optical element | |
| WO2004077115A1 (en) | Diffractive optical element and laser machining apparatus using same | |
| CN212379600U (en) | Diffractive optical element, TOF depth sensor, optical system and device | |
| CN113311590A (en) | Diffractive optical element, projection module, and electronic apparatus | |
| CN113671613A (en) | A metasurface optical element and design method, and structured light projection module | |
| WO2023124667A1 (en) | Diffractive optical element for beam splitting and design method therefor, and structured light projector | |
| US12265233B2 (en) | Method for increasing speckle spot density, diffractive optical element, and projector | |
| CN109471213B (en) | Diffractive optical element, method for producing same, lidar system and motor vehicle | |
| US6643300B1 (en) | Laser irradiation optical system | |
| CN102162925A (en) | A beam shaping device | |
| EP4063935B1 (en) | Diffractive optical element capable of being used for projecting oblique line, projection apparatus, and design method therefor |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |