CN113897662B - Movable device and method for electropolishing TC4 titanium alloy - Google Patents
Movable device and method for electropolishing TC4 titanium alloy Download PDFInfo
- Publication number
- CN113897662B CN113897662B CN202111330854.2A CN202111330854A CN113897662B CN 113897662 B CN113897662 B CN 113897662B CN 202111330854 A CN202111330854 A CN 202111330854A CN 113897662 B CN113897662 B CN 113897662B
- Authority
- CN
- China
- Prior art keywords
- anode
- cathode
- sample
- titanium alloy
- cathode plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/26—Polishing of heavy metals of refractory metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Sampling And Sample Adjustment (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
Description
技术领域technical field
本发明公开了一种运动式电解抛光钛合金的装置及方法,涉及电解抛光技术,属于金属材料精密表面处理技术领域。The invention discloses a device and method for moving electrolytic polishing titanium alloy, relates to electrolytic polishing technology, and belongs to the technical field of precision surface treatment of metal materials.
背景技术Background technique
Ti6Al4V是一种典型的α+β相钛合金,具有较高的比强度和比刚度、较强的韧性以及优异的抗腐蚀性能等特点,广泛应用于航空航天领域,可以提高结构的抗腐蚀能力和寿命。现有的电解抛光装置一般用夹子夹持被抛工件,工件容易脱落,且工件的所有面都裸露在电解液中,导致TC4钛合金在强酸性溶液中抛光易被氧化,两极板间的放电不均匀,试样被过度腐蚀,出现凹坑。电解抛光过程中,保持阴阳极静止,当工件垂直放置时,表面的粘膜由于重力而向下动,造成上、下区域粘膜厚度不同,抛光速率和抛光效果不同;如果工件是水平放置的,则工作件两端之间的电场差异较大电解液的流动性不好,薄膜的脱落不及时容易导致电解抛光的失败。Ti6Al4V is a typical α+β phase titanium alloy, which has the characteristics of high specific strength and specific stiffness, strong toughness and excellent corrosion resistance. It is widely used in the aerospace field and can improve the corrosion resistance of structures. and longevity. The existing electrolytic polishing device generally uses clamps to hold the workpiece to be polished, the workpiece is easy to fall off, and all surfaces of the workpiece are exposed in the electrolyte, resulting in the TC4 titanium alloy being easily oxidized when polished in a strong acid solution, and the discharge between the two plates Inhomogeneous, the sample is over-corroded and pitted. During the electropolishing process, keep the cathode and anode stationary. When the workpiece is placed vertically, the mucous membrane on the surface moves downward due to gravity, resulting in different thicknesses of the mucous membrane in the upper and lower areas, and different polishing rates and polishing effects; if the workpiece is placed horizontally, then The difference in electric field between the two ends of the workpiece is large, the fluidity of the electrolyte is not good, and the failure of the electrolytic polishing is easily caused if the film does not fall off in time.
基于TC4钛合金的电解抛光易被氧化问题和基于沉浸的静态电解抛光表面均匀性问题。为此,本发明基于这两种问题提出了一种运动式电解抛光TC4钛合金的装置及方法。The electrolytic polishing based on TC4 titanium alloy is easy to be oxidized and the surface uniformity of static electrolytic polishing based on immersion. For this reason, the present invention proposes a device and method for moving electrolytic polishing TC4 titanium alloy based on these two problems.
发明内容Contents of the invention
本发明提供了一种运动式电解抛光TC4钛合金的装置及方法,可实现钛合金表面不被氧化和均匀光亮的抛光。The invention provides a device and method for moving electrolytically polishing TC4 titanium alloy, which can realize uniform and bright polishing on the surface of the titanium alloy without being oxidized.
本发明的技术方案如下:Technical scheme of the present invention is as follows:
一种运动式电解抛光TC4钛合金的装置,包括:阴极运动升降支架、阳极试样、阴极板、电解抛光槽;A mobile electropolishing device for TC4 titanium alloy, comprising: a cathode moving lifting support, an anode sample, a cathode plate, and an electropolishing tank;
所述阴极运动升降支架用于支撑阴极板,阴极板通过导电线连接电源负极,导电线外设有保护壳(材质为塑料,避免参加反应);The cathode movement lifting support is used to support the cathode plate, the cathode plate is connected to the negative pole of the power supply through a conductive wire, and a protective shell (material is plastic, to avoid participating in the reaction) is provided outside the conductive wire;
所述阳极试样除了抛光面其余表面均被保护壳包裹,确保只有抛光面参与反应,阳极试样通过阳极导电棒连接电源正极;The surface of the anode sample except the polished surface is covered by a protective shell to ensure that only the polished surface participates in the reaction, and the anode sample is connected to the positive pole of the power supply through the anode conductive rod;
所述阴极板、阳极试样均竖直设于电解抛光槽内且保持平行,阳极试样的抛光面与阴极板处于相对位置,电解抛光槽内放有磁极转子;The cathode plate and the anode sample are all vertically arranged in the electropolishing tank and kept parallel, the polished surface of the anode sample is in a relative position to the cathode plate, and a magnetic pole rotor is placed in the electropolishing tank;
所述阴极运动升降支架的一端连接计算机,通过计算机程序使阴极板保持匀速运动,运动方向为从阳极试样的底部运动到顶部;One end of the cathode movement lifting bracket is connected to a computer, and the cathode plate is kept moving at a constant speed through a computer program, and the movement direction is from the bottom of the anode sample to the top;
所述阳极试样为TC4钛合金;所述阴极板也为TC4钛合金;The anode sample is TC4 titanium alloy; the cathode plate is also TC4 titanium alloy;
进一步,阴阳极的宽度比保持1:1,高度比可任意,优选阴阳极面积比为1:4。Furthermore, the width ratio of the cathode and anode remains 1:1, and the height ratio can be arbitrary, preferably the area ratio of the cathode and anode is 1:4.
利用本发明装置进行运动式电解抛光TC4钛合金的方法,所述方法包括如下步骤:Utilize device of the present invention to carry out the method for motion type electrolytic polishing TC4 titanium alloy, described method comprises the steps:
(1)将TC4钛合金基材用砂纸进行表面打磨,然后超声清洗,吹干备用;(1) The surface of the TC4 titanium alloy substrate is polished with sandpaper, then ultrasonically cleaned, and dried for later use;
(2)以步骤(1)准备好的TC4钛合金为阳极接电源正极,阴极板接电源负极,将阴、阳两极浸没于电解液中,开启电源进行电解抛光;(2) Connect the positive pole of the power supply with the TC4 titanium alloy prepared in step (1) as the anode, connect the negative pole of the power supply with the cathode plate, immerse the cathode and anode poles in the electrolyte, and turn on the power supply for electrolytic polishing;
所述电解液的组成为:高氯酸50~100g/L,三乙醇胺5~10g/L,溶剂为乙酸;The composition of the electrolyte is: 50-100 g/L of perchloric acid, 5-10 g/L of triethanolamine, and the solvent is acetic acid;
所述电解抛光的电压为45~60V,时间为40~100s,阴、阳两极之间水平间距为1~2cm;The voltage of the electrolytic polishing is 45-60V, the time is 40-100s, and the horizontal distance between the cathode and anode is 1-2cm;
阴极板顶部对齐阳极试样底部,通过阴极运动升降支架控制阴极板从阳极试样底部匀速向上移动,移动速度为1~100mm/s,直至试样被完全抛光;抛光过程中磁极转子搅拌溶液,促进电解液的流动,保证抛光区域的离子扩散和电解液的补充同时促进薄膜的脱落。The top of the cathode plate is aligned with the bottom of the anode sample, and the cathode plate is controlled to move upward at a constant speed from the bottom of the anode sample through the cathode movement lifting bracket, and the moving speed is 1-100mm/s until the sample is completely polished; during the polishing process, the magnetic pole rotor stirs the solution, Promote the flow of electrolyte, ensure the diffusion of ions in the polishing area and the replenishment of electrolyte while promoting the shedding of the film.
相比于现有技术,本发明有益效果主要有:Compared with the prior art, the beneficial effects of the present invention mainly include:
(1)阴极匀速向上运动对试样进行抛光,试样竖直完全浸入电解质中,在这种情况下,表面上的粘性膜由于重力而向下流动,因此,从下向上运动时,下面区域的抛光不受上面区域抛光的影响,避免了静止抛光时由于粘性膜的厚度不同而产生不同的蚀刻率和抛光效果。(1) The cathode moves upward at a constant speed to polish the sample. The sample is vertically immersed in the electrolyte completely. In this case, the viscous film on the surface flows downward due to gravity. Therefore, when moving from bottom to top, the lower area The polishing is not affected by the polishing of the upper area, which avoids different etching rates and polishing effects due to different thicknesses of the viscous film during static polishing.
(2)抛光过程中磁极转子搅拌溶液,促进电解液的流动,保证抛光区域的离子扩散和电解液的补充同时促进薄膜的脱落。(2) During the polishing process, the magnetic pole rotor stirs the solution, promotes the flow of the electrolyte, ensures the diffusion of ions in the polishing area and the replenishment of the electrolyte, and at the same time promotes the shedding of the film.
(3)钛合金所有面都暴露在电解液中抛光时易被氧化,阳极试样保护壳保证只露出抛光面能有效避免这个问题。(3) All surfaces of the titanium alloy are exposed to the electrolyte and are easily oxidized during polishing. The protective shell of the anode sample ensures that only the polished surface is exposed to effectively avoid this problem.
(4)高氯酸乙酸溶液对TC4钛合金的电解抛光有肉眼可见的平整光亮效果。(4) Perchloric acid acetic acid solution has a smooth and bright effect visible to the naked eye on the electrolytic polishing of TC4 titanium alloy.
(5)实验操作简单、安全,工艺稳定效率高,且可用于钛合金EBSD试样的制备。(5) The experimental operation is simple and safe, the process is stable and efficient, and can be used for the preparation of titanium alloy EBSD samples.
附图说明Description of drawings
图1为本发明运动式电解抛光TC4钛合金的装置图,其中,1-阴极运动升降支架、2-导电线、3-导电线塑料保护壳、4-阳极导电棒、5-阳极试样、6-阳极试样保护壳、7-电解液、8-阴极板、9-磁极转子、10-电解抛光槽。Fig. 1 is the device diagram of the present invention's movable type electropolishing TC4 titanium alloy, wherein, 1-cathode moving lifting bracket, 2-conductive wire, 3-conductive wire plastic protective case, 4-anode conductive rod, 5-anode sample, 6-Anode sample protection shell, 7-Electrolyte, 8-Cathode plate, 9-Magnetic pole rotor, 10-Electrolytic polishing tank.
图2为钛合金基体和实施例1~3抛光后试样的表面形貌图。Fig. 2 is a surface topography diagram of the titanium alloy substrate and samples after polishing in Examples 1-3.
图3为钛合金基体和实施例1~3抛光后试样的电化学极化曲线图。Fig. 3 is the electrochemical polarization curves of the titanium alloy substrate and samples after polishing in Examples 1-3.
具体实施方式Detailed ways
下面通过具体实施例进一步描述本发明,但本发明的保护范围并不仅限于此。The present invention is further described below through specific examples, but the protection scope of the present invention is not limited thereto.
实施例1Example 1
(1)试样预处理:TC4钛合金基材厚度为2mm,经线切割加工成边长为2cm的矩形,用80#、240#、400#、800#的砂纸进行表面打磨,并用超声波在酒精溶液中清洗表面20min后,用吹风机吹干。(1) Sample pretreatment: The thickness of the TC4 titanium alloy base material is 2mm, and it is processed into a rectangle with a side length of 2cm by wire cutting. After cleaning the surface in the solution for 20 minutes, dry it with a hair dryer.
(2)用显微镜拍试样抛光前的显微图(图2中a)和测试样的耐腐蚀性(图3)。(2) Use a microscope to take a micrograph of the sample before polishing (a in Figure 2) and the corrosion resistance of the test sample (Figure 3).
(3)电解抛光工艺参数设置:在8%的高氯酸乙酸电解液中进行,并加入7g/L的三乙醇胺;抛光电压20V,抛光时间20s,磁极转子转度300r/min,电极间隙2cm,室温下进行;TC4钛合金试样做阳极,另一TC4钛合金做阴极,阴阳极面积比例为1:4;阴极板顶部对齐阳极试样底部,通过阴极运动升降支架控制阴极板从阳极试样底部匀速向上移动,移动速度为1mm/s,直至试样被完全抛光。(3) Electropolishing process parameter setting: carry out in 8% perchloric acid acetic acid electrolyte, and add 7g/L triethanolamine; polishing voltage 20V, polishing time 20s, magnetic pole rotor rotation speed 300r/min, electrode gap 2cm , carried out at room temperature; TC4 titanium alloy sample is used as anode, another TC4 titanium alloy is used as cathode, the ratio of cathode and anode area is 1:4; the top of the cathode plate is aligned with the bottom of the anode sample, and the cathode plate is controlled from the anode test to The bottom of the sample is moved upward at a constant speed at a speed of 1 mm/s until the sample is completely polished.
(4)将经电解抛光的TC4钛合金试样用无水乙醇超声清洗5min后取出,吹风机吹干。(4) The electropolished TC4 titanium alloy sample was ultrasonically cleaned with absolute ethanol for 5 minutes, then taken out, and dried with a hair dryer.
(5)再次用显微镜拍试样表观图(图2中b)和测试样的耐腐蚀性(图3)。(5) Use the microscope again to take pictures of the appearance of the sample (b in Figure 2) and the corrosion resistance of the test sample (Figure 3).
实施例2Example 2
(1)预处理及后续处理参照实施例1中(1)、(2)、(4)、(5)。(1) Pretreatment and subsequent treatment Refer to (1), (2), (4), and (5) in Example 1.
(2)电解抛光工艺参数设置:在8%的高氯酸乙酸电解液中进行,并加入7g/L的三乙醇胺;抛光电压40V,抛光时间40s,磁极转子转度300r/min,电极间隙2cm,室温下进行;TC4钛合金试样做阳极,另一TC4钛合金做阴极,阴阳极面积比例为1:4;阴极板顶部对齐阳极试样底部,通过阴极运动升降支架控制阴极板从阳极试样底部匀速向上移动,移动速度为1mm/s,直至试样被完全抛光。(2) Electropolishing process parameter setting: carry out in 8% perchloric acid acetic acid electrolyte, and add 7g/L triethanolamine; polishing voltage 40V, polishing time 40s, magnetic pole rotor rotation speed 300r/min, electrode gap 2cm , carried out at room temperature; TC4 titanium alloy sample is used as anode, another TC4 titanium alloy is used as cathode, the ratio of cathode and anode area is 1:4; the top of the cathode plate is aligned with the bottom of the anode sample, and the cathode plate is controlled from the anode test to The bottom of the sample is moved upward at a constant speed at a speed of 1 mm/s until the sample is completely polished.
实施例3Example 3
(1)预处理及激光抛光参数设置参照实施例1中(1)、(2)、(4)、(5)。(1) Pretreatment and laser polishing parameter settings refer to (1), (2), (4), and (5) in Example 1.
(2)电解抛光工艺参数设置:在8%的高氯酸乙酸电解液中进行,并加入7g/L的三乙醇胺;抛光电压60V,抛光时间60s,磁极转子转度300r/min,电极间隙2cm,室温下进行;TC4钛合金试样做阳极,另一TC4钛合金做阴极,阴阳极面积比例为1:4;阴极板顶部对齐阳极试样底部,通过阴极运动升降支架控制阴极板从阳极试样底部匀速向上移动,移动速度为1mm/s,直至试样被完全抛光。(2) Electropolishing process parameter setting: carry out in 8% perchloric acid acetic acid electrolyte, and add 7g/L triethanolamine; polishing voltage 60V, polishing time 60s, magnetic pole rotor rotation speed 300r/min, electrode gap 2cm , carried out at room temperature; TC4 titanium alloy sample is used as anode, another TC4 titanium alloy is used as cathode, the ratio of cathode and anode area is 1:4; the top of the cathode plate is aligned with the bottom of the anode sample, and the cathode plate is controlled from the anode test to The bottom of the sample is moved upward at a constant speed at a speed of 1 mm/s until the sample is completely polished.
对以上电解抛光的TC4钛合金试样进行表面形貌(图2)和耐腐蚀性分析(图3),发现在实施例3中的试样具有最好的电解抛光效果。Surface morphology ( FIG. 2 ) and corrosion resistance analysis ( FIG. 3 ) were performed on the electropolished TC4 titanium alloy sample above, and it was found that the sample in Example 3 had the best electrolytic polishing effect.
以上对本发明的具体实施例进行了描述。需要理解的是,本发明并不局限于上述特定实施方式,本领域技术人员可以在权利要求的范围内做出各种变形或修改,这并不影响本发明的实质内容。Specific embodiments of the present invention have been described above. It should be understood that the present invention is not limited to the specific embodiments described above, and those skilled in the art may make various changes or modifications within the scope of the claims, which do not affect the essence of the present invention.
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202111330854.2A CN113897662B (en) | 2021-11-11 | 2021-11-11 | Movable device and method for electropolishing TC4 titanium alloy |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202111330854.2A CN113897662B (en) | 2021-11-11 | 2021-11-11 | Movable device and method for electropolishing TC4 titanium alloy |
Publications (2)
Publication Number | Publication Date |
---|---|
CN113897662A CN113897662A (en) | 2022-01-07 |
CN113897662B true CN113897662B (en) | 2022-11-25 |
Family
ID=79194057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202111330854.2A Active CN113897662B (en) | 2021-11-11 | 2021-11-11 | Movable device and method for electropolishing TC4 titanium alloy |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN113897662B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN119145031A (en) * | 2024-11-15 | 2024-12-17 | 青岛科技大学 | Electrolytic rust removing equipment capable of automatically controlling movement of electrode |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103603024A (en) * | 2013-12-02 | 2014-02-26 | 昆山亿诚化工容器有限公司 | Electroplating device capable of realizing uniform electroplated layer thickness |
CN204298503U (en) * | 2014-12-04 | 2015-04-29 | 朱晓飞 | For the electrochemical polish apparatus of metal substrate |
CN107350970B (en) * | 2017-05-12 | 2021-09-10 | 河南理工大学 | ELID grinding wheel oxide film friction and wear online measurement, ELID grinding and polishing all-in-one machine |
CN209941141U (en) * | 2019-03-07 | 2020-01-14 | 苏州热工研究院有限公司 | Apparatus for electropolishing of metal samples |
CN109763166B (en) * | 2019-03-07 | 2025-02-11 | 苏州热工研究院有限公司 | Device for electrolytic polishing of metal samples |
CN110695472A (en) * | 2019-10-22 | 2020-01-17 | 安徽工业大学 | Movable template electrolytic grinding composite machining tool cathode and method |
CN111850669B (en) * | 2020-08-17 | 2025-02-07 | 内蒙古工业大学 | Electrochemical polishing device and polishing method for vascular stent |
CN213091317U (en) * | 2020-09-21 | 2021-04-30 | 江苏亚太轻合金科技股份有限公司 | Automatic anode film coating device for aluminum alloy |
CN112975592B (en) * | 2021-03-29 | 2022-02-15 | 中国电子科技集团公司第十三研究所 | Polishing process of indium phosphide substrate |
-
2021
- 2021-11-11 CN CN202111330854.2A patent/CN113897662B/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN113897662A (en) | 2022-01-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106567122B (en) | Electrochemical polishing electrolyte for titanium and titanium alloy and polishing method thereof | |
CN108118388B (en) | Ni-Ti alloy electrochemical polishing solution and polishing method | |
CN103046088B (en) | A kind of micro-nano compound porous copper surface tissue and preparation method thereof and device | |
CN103276435B (en) | Aluminum or aluminum alloy surface micro-nano processing method and aluminum or aluminum alloy structure | |
CN107904644B (en) | A method of preparing tungsten nano surface porous active layer | |
CN113897662B (en) | Movable device and method for electropolishing TC4 titanium alloy | |
CN111850669A (en) | Electrochemical polishing device and polishing method for vascular stent | |
CN106521604A (en) | Method for preparing nano-porous structure on surfaces of stainless steel and cobalt alloy | |
CN108456917A (en) | A kind of preparation method of porous tantalum piece | |
CN103436947B (en) | The electrochemical polishing method of coating conductor Ni-5at.%W alloy base band | |
CN113897664B (en) | Device and method for laser composite electrochemical polishing of titanium alloy | |
CN109440181B (en) | Method for removing anodic oxidation Ni-Ti-O nano-pore disordered layer on surface of NiTi alloy | |
CN114113176A (en) | Preparation method of titanium alloy EBSD sample | |
CN107999908A (en) | A kind of production method of micro-pit array | |
CN104018211B (en) | A kind of electrochemical etching processing method of nano-precision | |
CN102409385A (en) | A method for insulating sidewalls of microelectrode arrays | |
CN103528873B (en) | The finishing method of self-forced type high-voltage electric contact material afterbody chromium bronze metallographic specimen | |
CN207937336U (en) | Metallographic coating test device on metal or alloy surface | |
JP2006514712A (en) | Electro-polishing method for nickel-titanium alloy dental instruments | |
CN109570664B (en) | Preparation method of micro tool electrode | |
CN114088497A (en) | Preparation device and method of titanium alloy EBSD sample | |
CN113774473A (en) | Novel electrochemical polishing device and method | |
CN207738886U (en) | It is a kind of simple metallographical sample electrolytic polishing device applied | |
CN111676508A (en) | An electrolytic corrosion solution and its application | |
CN104532304B (en) | A kind of welding method of glassy metal |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |