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CN113655643A - An arrayed dynamic optical phase correction plate based on electro-optic material - Google Patents

An arrayed dynamic optical phase correction plate based on electro-optic material Download PDF

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CN113655643A
CN113655643A CN202110946312.1A CN202110946312A CN113655643A CN 113655643 A CN113655643 A CN 113655643A CN 202110946312 A CN202110946312 A CN 202110946312A CN 113655643 A CN113655643 A CN 113655643A
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electro
phase correction
correction plate
optical
optical phase
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高国涵
杜俊峰
边疆
雷柏平
汪利华
刘盾
罗倩
李志炜
蒋仁奎
石恒
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Institute of Optics and Electronics of CAS
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    • G02F1/03Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
    • G02F1/0327Operation of the cell; Circuit arrangements
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    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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Abstract

本发明提供了一种基于电光材料的阵列化动态光学相位修正板。所述的光学相位修正板包含X方向多路电压控制器、Y方向多路电压控制器、电光材料基板、X方向透明电极、Y方向透明电极、电压控制微区。光学系统的初始波前经过未加电压的光学相位修正板后被干涉仪或波前传感器接收,将检测结果与理论波前进行对比,根据经验或算法对光学相位修正板施加电压,由X方向多路电压控制器和Y方向多路电压控制器对其进行程序控制,最后获得优化波前。相对现有技术可以实现局部波前误差的精确校正,且提高了动态波前校正的响应速度。

Figure 202110946312

The invention provides an arrayed dynamic optical phase correction plate based on electro-optic material. The optical phase correction plate includes an X-direction multi-channel voltage controller, a Y-direction multi-channel voltage controller, an electro-optical material substrate, an X-direction transparent electrode, a Y-direction transparent electrode, and a voltage control micro-region. The initial wavefront of the optical system is received by the interferometer or wavefront sensor after passing through the unvoltage optical phase correction plate. The detection results are compared with the theoretical wavefront, and voltage is applied to the optical phase correction plate according to experience or algorithm. The multi-channel voltage controller and the Y-direction multi-channel voltage controller carry out program control on it, and finally obtain the optimized wave front. Compared with the prior art, accurate correction of local wavefront errors can be achieved, and the response speed of dynamic wavefront correction is improved.

Figure 202110946312

Description

Array dynamic optical phase correction plate based on electro-optical material
Technical Field
The invention belongs to the field of optical imaging, and particularly relates to an array dynamic optical phase correction plate based on an electro-optic material.
Background
In the field of optical imaging, the main technical index for evaluating the imaging quality is transmitted wavefront, and factors influencing the transmitted wavefront mainly include lens processing error, adjusting error, medium refractive index nonuniformity and the like. When the transmitted wavefront does not meet the imaging requirement and changes along with time, dynamic optical phase correction needs to be carried out on the transmitted wavefront, and the traditional solution mainly adopts a wavefront sensor to detect the initial wavefront and then utilizes a micro actuator to correct the shape of a deformable mirror to realize dynamic optical phase correction of the reflected wavefront. However, as the aperture of the optical system increases, the cost of the method increases exponentially, and the time of the closed-loop feedback gradually becomes difficult to meet the use requirement.
Disclosure of Invention
The invention provides an array dynamic optical phase correction plate based on an electro-optical material, aiming at realizing real-time correction of a large-caliber optical system transmission wavefront.
The technical scheme adopted by the invention for solving the technical problems is as follows:
an array dynamic optical phase correcting plate based on an electro-optic material, wherein the optical phase correcting plate 2 comprises an X-direction multi-path voltage controller 2-1, a Y-direction multi-path voltage controller 2-2, an electro-optic material substrate 2-3, an X-direction transparent electrode 2-4, a Y-direction transparent electrode 2-5 and a voltage control micro-area 2-6; the X-direction transparent electrode 2-4 is attached to the lower surface of the electro-optical material substrate 2-3 in a physical deposition or chemical deposition mode; the Y-direction transparent electrode 2-5 is attached to the upper surface of the electro-optic material substrate 2-3 in a physical deposition or chemical deposition mode; the initial wavefront 1 of the optical system is received and detected by an interferometer or a wavefront sensor after passing through the optical phase correction plate 2 without voltage, voltage is applied to the optical phase correction plate according to comparison between the detection result and the theoretical wavefront, and the applied voltage is controlled by the X-direction multi-path voltage controller 2-1 and the Y-direction multi-path voltage controller 2-2 to obtain an optimized wavefront 3.
Further, the X-direction multi-path voltage controller 2-1 is connected with the X-direction transparent electrode 2-4 through a lead; the X-direction multi-path voltage controller 2-1 is used for controlling each electrode X in the X-direction transparent electrodes 2-4 in real time1,X2……XN-1,XNThe voltage of (2) is a positive integer greater than or equal to 3, the numerical value of N depends on the width of the electrode and the light transmission aperture of the optical system, the direct-current voltage control range of the X-direction multi-path voltage controller 2-1 is +/-12V, the voltage control precision is +/-0.1V, and the response time is less than 1 ms.
Further, the Y-direction multi-path voltage controller 2-2 is connected with the Y-direction transparent electrode 2-5 through a lead; the Y-direction multi-path voltage controller 2-2 is used for controlling each electrode Y of the Y-direction transparent electrodes 2-5 in real time1,Y2……YN-1,YNThe voltage of (2) is a positive integer greater than or equal to 3, the numerical value of N depends on the width of the electrode and the clear aperture of the optical system, the direct-current voltage control range of the Y-direction multi-path voltage controller 2-2 is +/-12V, the voltage control precision is +/-0.1V, and the response time is less than 1 ms.
Further, the electro-optic material substrate 2-3 is used for transmitting light and changing the refractive index under the action of voltage; the electro-optical material substrate 2-3 comprises a substrate material and an electro-optical material, wherein the electro-optical material is attached to the surface of the substrate material, and the overall transmittance of the electro-optical material substrate 2-3 is greater than 90%.
Further, the electro-optical material is selected from potassium dihydrogen phosphate, ammonium dihydrogen phosphate or liquid crystal, and the substrate material is the same as the electro-optical material, or is one of K9 glass and fused silica.
Further, the electrode material of the Y-direction transparent electrodes 2-5 is selected from graphene, carbon nanotubes, indium tin oxide or metal, and the film transmittance of the electrode material is greater than 90%.
Further, the electrode material of the Y-direction transparent electrodes 2-5 is selected from graphene, carbon nanotubes, indium tin oxide or metal, and the film transmittance of the electrode material is greater than 90%.
Further, the voltage control micro-area 2-6 is the overlapping area of the X-direction transparent electrode 2-4 and the Y-direction transparent electrode 2-5, and the electric field intensity in this area is determined by the voltage difference between the X-direction transparent electrode 2-4 and the Y-direction transparent electrode 2-5 on the upper and lower surfaces of the area.
When the optical phase correction plate is used for optimizing wavefront, the initial wavefront of an optical system passes through the optical phase correction plate without voltage and then is received by an interferometer or a wavefront sensor, a detection result is compared with a theoretical wavefront, voltage is applied to the optical phase correction plate according to experience or an algorithm, an X-direction multi-path voltage controller and a Y-direction multi-path voltage controller are used for carrying out program control on the optical phase correction plate, and finally the optimized wavefront is obtained.
Compared with the prior art, the invention has the advantages that:
(1) compared with the existing method depending on a deformable reflector and a micro actuator, the invention adopts the arrayed orthogonal electrodes to carry out pixel-level regulation and control on the refractive index of the electro-optic material, effectively improves the resolution of optical phase correction and can realize accurate correction of local wavefront errors.
(2) Compared with the existing method depending on a deformable reflector and a micro actuator, the method can realize lower delay by regulating the refractive index of the electro-optic material through voltage, effectively improve the dynamic response speed of optical phase correction, and can meet the requirement of high-speed dynamic wavefront error correction.
Drawings
FIG. 1 is a general schematic diagram of an arrayed dynamic optical phase correction plate based on an electro-optic material according to the present invention;
in the figure, 1 is the initial wavefront, 2 is the optical phase correction plate, and 3 is the optimized wavefront.
FIG. 2 is a schematic diagram of an optical phase correction plate;
in the figure, 2-1 is an X-direction multi-path voltage controller, 2-2 is a Y-direction multi-path voltage controller, 2-3 is an electro-optical material substrate, 2-4 is an X-direction transparent electrode, 2-5 is a Y-direction transparent electrode, and 2-6 is a voltage control micro-area.
Detailed Description
The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
Example 1
The invention provides an arrayed dynamic optical phase correction plate based on an electro-optic material, when the arrayed dynamic optical phase correction plate is used, an initial wave front 1 of an optical system passes through an optical phase correction plate 2 without voltage and then is received by an interferometer or a wave front sensor, a detection result is compared with a theoretical wave front, wave front errors are fitted through a least square method, or optimization is carried out by utilizing a convolutional neural network algorithm, then a multi-path voltage controller 2-1 in the X direction and a multi-path voltage controller 2-2 in the Y direction apply voltage to the optical phase correction plate through program control, and finally an optimized wave front 3 is obtained.
The optical phase correction plate 2 comprises an X-direction multi-path voltage controller 2-1, a Y-direction multi-path voltage controller 2-2, an electro-optical material substrate 2-3, an X-direction transparent electrode 2-4, a Y-direction transparent electrode 2-5 and a voltage control micro-area 2-6.
The X-direction multi-path voltage controller 2-1 is used for controlling the X direction X in real time1,X2……XN-1,XNThe voltage of each electrode, N is a positive integer greater than or equal to 3, and the value of N depends on the width of the electrode and the clear aperture of the system. The control range of the direct current voltage is +/-12V, the control precision of the voltage is +/-0.1V, the response time is less than 1ms, and the controller is connected with the X-direction transparent electrodes 2-4 through leads.
The above-mentionedThe Y-direction multi-path voltage controller 2-2 is used for controlling Y direction Y in real time1,Y2……YN-1,YNThe voltage of each electrode, N is a positive integer greater than or equal to 3, and the value of N depends on the width of the electrode and the clear aperture of the system. The control range of the direct current voltage is +/-12V, the control precision of the voltage is +/-0.1V, the response time is less than 1ms, and the controller is connected with the Y-direction transparent electrodes 2-5 through leads.
The electro-optic material substrate 2-3 is used for transmitting light and changing the refractive index under the action of voltage. The electro-optical material can be selected from potassium dihydrogen phosphate, ammonium dihydrogen phosphate, and liquid crystal. The substrate material may be the electro-optical material itself, or K9 glass or fused silica, and the electro-optical material is attached to the surface of the substrate material. The overall transmittance of the electro-optic material substrate is required to be greater than 90%.
The X-direction transparent electrode 2-4 is attached to the lower surface of the electro-optical material in a physical deposition or chemical deposition mode. The electrode material can be selected from graphene, carbon nano tubes, indium tin oxide and metal, and the transmittance of the film layer is required to be more than 90%.
The Y-direction transparent electrode 2-5 is attached to the upper surface of the electro-optical material in a physical deposition or chemical deposition mode. The electrode material can be selected from graphene, carbon nano tubes, indium tin oxide and metal, and the transmittance of the film layer is required to be more than 90%.
The voltage control micro-area 2-6 is the overlapping area of the X-direction transparent electrode 2-4 and the Y-direction transparent electrode 2-5, and the electric field intensity in the area is determined by the voltage difference between the X-direction transparent electrode 2-4 and the Y-direction transparent electrode 2-5 on the upper and lower surfaces of the area.
The working process of the invention is as follows: the initial wavefront of the optical system is received by the interferometer or the wavefront sensor after passing through the optical phase correction plate without voltage, the detection result is compared with the theoretical wavefront, the voltage is applied to the optical phase correction plate according to experience or an algorithm, the optical phase correction plate is subjected to program control by the X-direction multi-path voltage controller and the Y-direction multi-path voltage controller, and finally the optimized wavefront is obtained.
Although illustrative embodiments of the present invention have been described above to facilitate the understanding of the present invention by those skilled in the art, it should be understood that the present invention is not limited to the scope of the embodiments, and various changes may be made apparent to those skilled in the art as long as they are within the spirit and scope of the present invention as defined and defined by the appended claims, and all matters of the invention which utilize the inventive concepts are protected.

Claims (8)

1.一种基于电光材料的阵列化动态光学相位修正板,其特征在于:1. an arrayed dynamic optical phase correction plate based on electro-optical material, is characterized in that: 所述的光学相位修正板(2)包含X方向多路电压控制器(2-1)、Y方向多路电压控制器(2-2)、电光材料基板(2-3)、X方向透明电极(2-4)、Y方向透明电极(2-5)、电压控制微区(2-6);所述的X方向透明电极(2-4)通过物理沉积或化学沉积的方式附着于所述电光材料基板(2-3)下表面;所述的Y方向透明电极(2-5)通过物理沉积或化学沉积的方式附着于所述电光材料基板(2-3)上表面;其中,光学系统的初始波前(1)经过未加电压的所述光学相位修正板(2)后被干涉仪或波前传感器接收检测,根据其检测结果与理论波前的对比而对所述光学相位修正板施加电压,并由所述X方向多路电压控制器(2-1)和Y方向多路电压控制器(2-2)控制所施加的电压以获得优化波前(3)。The optical phase correction plate (2) comprises an X-direction multi-channel voltage controller (2-1), a Y-direction multi-channel voltage controller (2-2), an electro-optical material substrate (2-3), and an X-direction transparent electrode (2-4), Y-direction transparent electrodes (2-5), and voltage control micro-regions (2-6); the X-direction transparent electrodes (2-4) are attached to the X-direction transparent electrodes (2-4) by means of physical deposition or chemical deposition The lower surface of the electro-optical material substrate (2-3); the Y-direction transparent electrode (2-5) is attached to the upper surface of the electro-optical material substrate (2-3) by means of physical deposition or chemical deposition; wherein, the optical system The initial wavefront (1) of the optical phase correction plate (2) without voltage is received and detected by an interferometer or a wavefront sensor, and the optical phase correction plate is compared according to the comparison between the detection result and the theoretical wavefront. A voltage is applied, and the applied voltage is controlled by the X-direction multi-channel voltage controller (2-1) and the Y-direction multi-channel voltage controller (2-2) to obtain an optimized wavefront (3). 2.根据权利要求1所述的一种基于电光材料的阵列化动态光学相位修正板,其特征在于:2. a kind of array dynamic optical phase correction plate based on electro-optical material according to claim 1, is characterized in that: 所述X方向多路电压控制器(2-1)通过导线与所述X方向透明电极(2-4)相连;所述X方向多路电压控制器(2-1)用于实时控制X方向透明电极(2-4)中各电极X1,X2……XN-1,XN的电压,N为大于等于3的正整数,N的数值取决于电极的宽度和光学系统的通光孔径,所述X方向多路电压控制器(2-1)的直流电压控制范围为±12V,电压控制精度为±0.1V,响应时间小于1ms。The X-direction multi-channel voltage controller (2-1) is connected to the X-direction transparent electrode (2-4) through a wire; the X-direction multi-channel voltage controller (2-1) is used to control the X-direction in real time The voltage of each electrode X 1 , X 2 ...... Aperture, the DC voltage control range of the X-direction multi-channel voltage controller (2-1) is ±12V, the voltage control accuracy is ±0.1V, and the response time is less than 1ms. 3.根据权利要求1所述的一种基于电光材料的阵列化动态光学相位修正板,其特征在于:3. a kind of array dynamic optical phase correction plate based on electro-optical material according to claim 1, is characterized in that: 所述Y方向多路电压控制器(2-2)通过导线与Y方向透明电极(2-5)相连;所述的Y方向多路电压控制器(2-2)用于实时控制Y方向透明电极(2-5)各电极Y1,Y2……YN-1,YN的电压,N为大于等于3的正整数,N的数值取决于电极的宽度和光学系统的通光孔径,所述Y方向多路电压控制器(2-2)直流电压控制范围为±12V,电压控制精度为±0.1V,响应时间小于1ms。The Y-direction multi-channel voltage controller (2-2) is connected to the Y-direction transparent electrode (2-5) through a wire; the Y-direction multi-channel voltage controller (2-2) is used for real-time control of the Y-direction transparency Electrode (2-5) The voltage of each electrode Y 1 , Y 2 ...... Y N-1 , Y N , N is a positive integer greater than or equal to 3, the value of N depends on the width of the electrode and the clear aperture of the optical system, The Y-direction multi-channel voltage controller (2-2) has a DC voltage control range of ±12V, a voltage control accuracy of ±0.1V, and a response time of less than 1ms. 4.根据权利要求1所述的一种基于电光材料的阵列化动态光学相位修正板,其特征在于:4. a kind of array dynamic optical phase correction plate based on electro-optical material according to claim 1, is characterized in that: 所述的电光材料基板(2-3)用于透过光线并在电压作用下改变折射率;所述的电光材料基板(2-3)包括基板材料和电光材料,所述电光材料附着于基板材料表面,所述电光材料基板(2-3)的整体透过率大于90%。The electro-optical material substrate (2-3) is used to transmit light and change the refractive index under the action of voltage; the electro-optical material substrate (2-3) includes a substrate material and an electro-optical material, and the electro-optical material is attached to the substrate On the surface of the material, the overall transmittance of the electro-optic material substrate (2-3) is greater than 90%. 5.根据权利要求1所述的一种基于电光材料的阵列化动态光学相位修正板,其特征在于:5. a kind of array dynamic optical phase correction plate based on electro-optical material according to claim 1, is characterized in that: 所述电光材料选自氛化磷酸二氢钾、磷酸二氢胺或液晶,所述基板材料与所述电光材料相同,或者为K9玻璃和融石英中的一种。The electro-optic material is selected from potassium dihydrogen phosphate, ammonium dihydrogen phosphate or liquid crystal, and the substrate material is the same as the electro-optic material, or one of K9 glass and fused silica. 6.根据权利要求1所述的一种基于电光材料的阵列化动态光学相位修正板,其特征在于:6. A kind of array dynamic optical phase correction plate based on electro-optical material according to claim 1, is characterized in that: 所述的Y方向透明电极(2-5)的电极材料选自石墨烯、碳纳米管、铟锡氧化物或金属,所述电极材料的膜层透过率大于90%。The electrode material of the Y-direction transparent electrode (2-5) is selected from graphene, carbon nanotube, indium tin oxide or metal, and the film transmittance of the electrode material is greater than 90%. 7.根据权利要求1所述的一种基于电光材料的阵列化动态光学相位修正板,其特征在于:7. A kind of array dynamic optical phase correction plate based on electro-optical material according to claim 1, is characterized in that: 所述的Y方向透明电极(2-5)的电极材料选自石墨烯、碳纳米管、铟锡氧化物或金属,所述电极材料的膜层透过率大于90%。The electrode material of the Y-direction transparent electrode (2-5) is selected from graphene, carbon nanotube, indium tin oxide or metal, and the film transmittance of the electrode material is greater than 90%. 8.根据权利要求1所述的一种基于电光材料的阵列化动态光学相位修正板,其特征在于:8. A kind of array dynamic optical phase correction plate based on electro-optical material according to claim 1, is characterized in that: 所述的电压控制微区(2-6)是X方向透明电极(2-4)与Y方向透明电极(2-5)重叠的区域,在此区域内的电场强度由该区域上下表面的X方向透明电极(2-4)与Y方向透明电极(2-5)的电压差值决定。The voltage control micro-area (2-6) is the area where the X-direction transparent electrode (2-4) and the Y-direction transparent electrode (2-5) overlap, and the electric field intensity in this area is determined by the X direction on the upper and lower surfaces of the area. The voltage difference between the directional transparent electrode (2-4) and the Y-directional transparent electrode (2-5) is determined.
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