Array dynamic optical phase correction plate based on electro-optical material
Technical Field
The invention belongs to the field of optical imaging, and particularly relates to an array dynamic optical phase correction plate based on an electro-optic material.
Background
In the field of optical imaging, the main technical index for evaluating the imaging quality is transmitted wavefront, and factors influencing the transmitted wavefront mainly include lens processing error, adjusting error, medium refractive index nonuniformity and the like. When the transmitted wavefront does not meet the imaging requirement and changes along with time, dynamic optical phase correction needs to be carried out on the transmitted wavefront, and the traditional solution mainly adopts a wavefront sensor to detect the initial wavefront and then utilizes a micro actuator to correct the shape of a deformable mirror to realize dynamic optical phase correction of the reflected wavefront. However, as the aperture of the optical system increases, the cost of the method increases exponentially, and the time of the closed-loop feedback gradually becomes difficult to meet the use requirement.
Disclosure of Invention
The invention provides an array dynamic optical phase correction plate based on an electro-optical material, aiming at realizing real-time correction of a large-caliber optical system transmission wavefront.
The technical scheme adopted by the invention for solving the technical problems is as follows:
an array dynamic optical phase correcting plate based on an electro-optic material, wherein the optical phase correcting plate 2 comprises an X-direction multi-path voltage controller 2-1, a Y-direction multi-path voltage controller 2-2, an electro-optic material substrate 2-3, an X-direction transparent electrode 2-4, a Y-direction transparent electrode 2-5 and a voltage control micro-area 2-6; the X-direction transparent electrode 2-4 is attached to the lower surface of the electro-optical material substrate 2-3 in a physical deposition or chemical deposition mode; the Y-direction transparent electrode 2-5 is attached to the upper surface of the electro-optic material substrate 2-3 in a physical deposition or chemical deposition mode; the initial wavefront 1 of the optical system is received and detected by an interferometer or a wavefront sensor after passing through the optical phase correction plate 2 without voltage, voltage is applied to the optical phase correction plate according to comparison between the detection result and the theoretical wavefront, and the applied voltage is controlled by the X-direction multi-path voltage controller 2-1 and the Y-direction multi-path voltage controller 2-2 to obtain an optimized wavefront 3.
Further, the X-direction multi-path voltage controller 2-1 is connected with the X-direction transparent electrode 2-4 through a lead; the X-direction multi-path voltage controller 2-1 is used for controlling each electrode X in the X-direction transparent electrodes 2-4 in real time1,X2……XN-1,XNThe voltage of (2) is a positive integer greater than or equal to 3, the numerical value of N depends on the width of the electrode and the light transmission aperture of the optical system, the direct-current voltage control range of the X-direction multi-path voltage controller 2-1 is +/-12V, the voltage control precision is +/-0.1V, and the response time is less than 1 ms.
Further, the Y-direction multi-path voltage controller 2-2 is connected with the Y-direction transparent electrode 2-5 through a lead; the Y-direction multi-path voltage controller 2-2 is used for controlling each electrode Y of the Y-direction transparent electrodes 2-5 in real time1,Y2……YN-1,YNThe voltage of (2) is a positive integer greater than or equal to 3, the numerical value of N depends on the width of the electrode and the clear aperture of the optical system, the direct-current voltage control range of the Y-direction multi-path voltage controller 2-2 is +/-12V, the voltage control precision is +/-0.1V, and the response time is less than 1 ms.
Further, the electro-optic material substrate 2-3 is used for transmitting light and changing the refractive index under the action of voltage; the electro-optical material substrate 2-3 comprises a substrate material and an electro-optical material, wherein the electro-optical material is attached to the surface of the substrate material, and the overall transmittance of the electro-optical material substrate 2-3 is greater than 90%.
Further, the electro-optical material is selected from potassium dihydrogen phosphate, ammonium dihydrogen phosphate or liquid crystal, and the substrate material is the same as the electro-optical material, or is one of K9 glass and fused silica.
Further, the electrode material of the Y-direction transparent electrodes 2-5 is selected from graphene, carbon nanotubes, indium tin oxide or metal, and the film transmittance of the electrode material is greater than 90%.
Further, the electrode material of the Y-direction transparent electrodes 2-5 is selected from graphene, carbon nanotubes, indium tin oxide or metal, and the film transmittance of the electrode material is greater than 90%.
Further, the voltage control micro-area 2-6 is the overlapping area of the X-direction transparent electrode 2-4 and the Y-direction transparent electrode 2-5, and the electric field intensity in this area is determined by the voltage difference between the X-direction transparent electrode 2-4 and the Y-direction transparent electrode 2-5 on the upper and lower surfaces of the area.
When the optical phase correction plate is used for optimizing wavefront, the initial wavefront of an optical system passes through the optical phase correction plate without voltage and then is received by an interferometer or a wavefront sensor, a detection result is compared with a theoretical wavefront, voltage is applied to the optical phase correction plate according to experience or an algorithm, an X-direction multi-path voltage controller and a Y-direction multi-path voltage controller are used for carrying out program control on the optical phase correction plate, and finally the optimized wavefront is obtained.
Compared with the prior art, the invention has the advantages that:
(1) compared with the existing method depending on a deformable reflector and a micro actuator, the invention adopts the arrayed orthogonal electrodes to carry out pixel-level regulation and control on the refractive index of the electro-optic material, effectively improves the resolution of optical phase correction and can realize accurate correction of local wavefront errors.
(2) Compared with the existing method depending on a deformable reflector and a micro actuator, the method can realize lower delay by regulating the refractive index of the electro-optic material through voltage, effectively improve the dynamic response speed of optical phase correction, and can meet the requirement of high-speed dynamic wavefront error correction.
Drawings
FIG. 1 is a general schematic diagram of an arrayed dynamic optical phase correction plate based on an electro-optic material according to the present invention;
in the figure, 1 is the initial wavefront, 2 is the optical phase correction plate, and 3 is the optimized wavefront.
FIG. 2 is a schematic diagram of an optical phase correction plate;
in the figure, 2-1 is an X-direction multi-path voltage controller, 2-2 is a Y-direction multi-path voltage controller, 2-3 is an electro-optical material substrate, 2-4 is an X-direction transparent electrode, 2-5 is a Y-direction transparent electrode, and 2-6 is a voltage control micro-area.
Detailed Description
The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
Example 1
The invention provides an arrayed dynamic optical phase correction plate based on an electro-optic material, when the arrayed dynamic optical phase correction plate is used, an initial wave front 1 of an optical system passes through an optical phase correction plate 2 without voltage and then is received by an interferometer or a wave front sensor, a detection result is compared with a theoretical wave front, wave front errors are fitted through a least square method, or optimization is carried out by utilizing a convolutional neural network algorithm, then a multi-path voltage controller 2-1 in the X direction and a multi-path voltage controller 2-2 in the Y direction apply voltage to the optical phase correction plate through program control, and finally an optimized wave front 3 is obtained.
The optical phase correction plate 2 comprises an X-direction multi-path voltage controller 2-1, a Y-direction multi-path voltage controller 2-2, an electro-optical material substrate 2-3, an X-direction transparent electrode 2-4, a Y-direction transparent electrode 2-5 and a voltage control micro-area 2-6.
The X-direction multi-path voltage controller 2-1 is used for controlling the X direction X in real time1,X2……XN-1,XNThe voltage of each electrode, N is a positive integer greater than or equal to 3, and the value of N depends on the width of the electrode and the clear aperture of the system. The control range of the direct current voltage is +/-12V, the control precision of the voltage is +/-0.1V, the response time is less than 1ms, and the controller is connected with the X-direction transparent electrodes 2-4 through leads.
The above-mentionedThe Y-direction multi-path voltage controller 2-2 is used for controlling Y direction Y in real time1,Y2……YN-1,YNThe voltage of each electrode, N is a positive integer greater than or equal to 3, and the value of N depends on the width of the electrode and the clear aperture of the system. The control range of the direct current voltage is +/-12V, the control precision of the voltage is +/-0.1V, the response time is less than 1ms, and the controller is connected with the Y-direction transparent electrodes 2-5 through leads.
The electro-optic material substrate 2-3 is used for transmitting light and changing the refractive index under the action of voltage. The electro-optical material can be selected from potassium dihydrogen phosphate, ammonium dihydrogen phosphate, and liquid crystal. The substrate material may be the electro-optical material itself, or K9 glass or fused silica, and the electro-optical material is attached to the surface of the substrate material. The overall transmittance of the electro-optic material substrate is required to be greater than 90%.
The X-direction transparent electrode 2-4 is attached to the lower surface of the electro-optical material in a physical deposition or chemical deposition mode. The electrode material can be selected from graphene, carbon nano tubes, indium tin oxide and metal, and the transmittance of the film layer is required to be more than 90%.
The Y-direction transparent electrode 2-5 is attached to the upper surface of the electro-optical material in a physical deposition or chemical deposition mode. The electrode material can be selected from graphene, carbon nano tubes, indium tin oxide and metal, and the transmittance of the film layer is required to be more than 90%.
The voltage control micro-area 2-6 is the overlapping area of the X-direction transparent electrode 2-4 and the Y-direction transparent electrode 2-5, and the electric field intensity in the area is determined by the voltage difference between the X-direction transparent electrode 2-4 and the Y-direction transparent electrode 2-5 on the upper and lower surfaces of the area.
The working process of the invention is as follows: the initial wavefront of the optical system is received by the interferometer or the wavefront sensor after passing through the optical phase correction plate without voltage, the detection result is compared with the theoretical wavefront, the voltage is applied to the optical phase correction plate according to experience or an algorithm, the optical phase correction plate is subjected to program control by the X-direction multi-path voltage controller and the Y-direction multi-path voltage controller, and finally the optimized wavefront is obtained.
Although illustrative embodiments of the present invention have been described above to facilitate the understanding of the present invention by those skilled in the art, it should be understood that the present invention is not limited to the scope of the embodiments, and various changes may be made apparent to those skilled in the art as long as they are within the spirit and scope of the present invention as defined and defined by the appended claims, and all matters of the invention which utilize the inventive concepts are protected.