CN113649582B - Metal liquid film monitoring control system and method based on plasma rotating electrode atomization - Google Patents
Metal liquid film monitoring control system and method based on plasma rotating electrode atomization Download PDFInfo
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- 239000002184 metal Substances 0.000 title claims abstract description 53
- 238000000889 atomisation Methods 0.000 title claims abstract description 26
- 239000007788 liquid Substances 0.000 title claims abstract description 25
- 238000012544 monitoring process Methods 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims abstract description 18
- 238000006073 displacement reaction Methods 0.000 claims abstract description 43
- 239000000956 alloy Substances 0.000 claims abstract description 18
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 18
- 238000007789 sealing Methods 0.000 claims abstract description 11
- 230000001276 controlling effect Effects 0.000 claims description 13
- 230000001105 regulatory effect Effects 0.000 claims description 3
- 239000000843 powder Substances 0.000 description 25
- 238000010586 diagram Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000006872 improvement Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000010146 3D printing Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
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Abstract
The invention discloses a metal liquid film monitoring and controlling system and method based on plasma rotary electrode atomization, comprising a sealing shell, wherein an electric spindle and a plasma gun are arranged in the sealing shell, the driving end of the electric spindle is connected with an alloy bar, a metal film is formed at the end part of the alloy bar, a plurality of displacement sensors are arranged outside the plasma gun, and the displacement sensors are arranged opposite to the metal film; the outside of sealed casing has arranged controller and power, the controller is connected with electric main shaft, plasma gun and displacement sensor respectively, the power with the controller with the plasma gun is connected. The invention also discloses a metal liquid film monitoring and controlling method based on plasma rotating electrode atomization.
Description
Technical Field
The invention belongs to the technical field of powder preparation, and particularly relates to a metal liquid film monitoring and controlling system and method based on plasma rotating electrode atomization.
Background
With the rapid development of additive technology, the demand for spherical metal powder is steadily increasing, mainly focusing on the following two aspects: (1) For 3D printer manufacturers, the ratio of metal spherical powder in the product cost is increasing, and on the basis of this, the demand for metal spherical powder having high quality, low cost, high sphericity and narrow powder particle size interval is increasing. However, the existing powder preparation process is mainly an air atomization method (EIGA for short), and the produced metal spherical powder has the defects of low sphericity, high satellite powder, special-shaped powder and oxygen content, wide powder particle size distribution interval and the like although the cost is low, and directly restricts the service performance of 3D printing parts. (2) The production of the spherical metal powder can also be carried out by using an ultra-high-rotation-speed plasma rotary electrode atomization method (SS-PREP for short), and the method has the advantages that the prepared powder has high sphericity, narrow powder particle size distribution interval, no hollow powder, satellite powder and less special-shaped powder, but the fluctuation of the powder particle size is larger, and meanwhile, the utilization rate of alloy bars is low.
Based on the problems, the problems of large fluctuation range of powder granularity and low effective utilization rate of alloy bars existing in metal powder prepared by an ultrahigh-speed plasma rotary electrode atomization method (SS-PREP) are particularly urgent and important.
Disclosure of Invention
The invention aims to provide a metal liquid film monitoring and controlling system based on plasma rotating electrode atomization, which solves the problems that metal powder prepared by an ultrahigh-speed plasma rotating electrode atomization method has larger fluctuation range of powder granularity and low effective utilization rate of alloy bars.
In order to achieve the first object, the present invention adopts the following technical scheme: the metal liquid film monitoring and controlling system based on plasma rotary electrode atomization comprises a sealing shell, wherein an electric spindle and a plasma gun are arranged in the sealing shell, the driving end of the electric spindle is connected with an alloy bar, a metal film is formed at the end part of the alloy bar, a plurality of displacement sensors are arranged outside the plasma gun, and the displacement sensors are arranged opposite to the metal film; the outside of sealed casing has arranged controller and power, the controller is connected with electric main shaft, plasma gun and displacement sensor respectively, the power with the controller with the plasma gun is connected.
The technical scheme of the invention also has the following characteristics:
as a further improvement of the technical scheme of the invention, the controller is a Siemens S7 series programmable logic controller.
The second object of the invention is to provide a metal liquid film monitoring and controlling method based on plasma rotating electrode atomization, which solves the problems of larger fluctuation range of powder granularity and low effective utilization rate of alloy bars in metal powder prepared by an ultrahigh-speed plasma rotating electrode atomization method by utilizing the metal liquid film monitoring and controlling system based on plasma rotating electrode atomization.
In order to achieve the second object, a first technical scheme adopted by the invention is as follows: a metal liquid film monitoring control method based on plasma rotary electrode atomization is implemented according to the following steps:
step 1, measuring the distance from the metal film to the displacement sensors through a plurality of displacement sensors and transmitting the distance to a controller, wherein the distance is denoted as d i ，d i ＝{d 1 ，d 2 ，…，d n N represents the nth displacement sensor, n.gtoreq.2;
step 2, after that, the controller is according to d i Determining a minimum distance, the minimum distance being denoted as d m ，d m ＝min{d 1 ，d 2 ，…，d n }；
Step 4, Δd m And a preset value d 0 And (5) comparing and judging: if Δd m Not greater than d 0 The power of the plasma gun remains unchanged; if Δd m Greater than d 0 The controller will adjust the power of the plasma gun to Δd m ≤d 0 。
As a further improvement of the technical solution of the present invention, in the step 4: if Δd m Greater than d 0 The amplitude of the power of each time of the plasma gun is adjusted to be 0.5kw-1.5kw.
In order to achieve the second object, a second technical scheme adopted by the invention is as follows: a metal liquid film monitoring control method based on plasma rotary electrode atomization is implemented according to the following steps:
step 1, firstly, leading toThe plurality of displacement sensors measure the distance between the metal film and the displacement sensors and transmit the distance to the controller, and the distance is recorded as d i ，d i ＝{d 1 ，d 2 ，…，d n N represents the nth displacement sensor, n.gtoreq.2;
step 2, after that, the controller is according to d i Determining a minimum distance, the minimum distance being denoted as d m ，d m ＝min{d 1 ，d 2 ，…，d n }；
Step 4, Δd m And a preset value d 0 And (5) comparing and judging: if Δd m Not greater than d 0 The power of the plasma gun remains unchanged; if Δd m Greater than d 0 The motorized spindle is moved by the controller until Δd m ≤d 0 。
As a further improvement of the technical solution of the present invention, in the step 4: if Δd m Greater than d 0 The distance of each movement of the motorized spindle is 0.5mm-5mm.
The beneficial effects of the invention are as follows: according to the metal liquid film monitoring control system and method based on plasma rotary electrode atomization, the maximum curvature value of the metal liquid film on the end face of an alloy bar is monitored in real time, judgment is carried out according to the preset maximum curvature value and the actual measurement value of the metal liquid film, automatic adjustment of power of a plasma gun or displacement adjustment of an electric spindle is carried out, the curvature value of the metal liquid film on the end face of the alloy bar is not larger than the preset value of the system, the powder yield of each batch is improved, the fluctuation range of the powder granularity of each batch is reduced, meanwhile, the process stability and the effective utilization rate of the alloy bar are improved, the production cost is reduced, the production period is shortened, and the operability and the controllability of production equipment are improved.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the invention and do not constitute a limitation on the invention. In the drawings:
FIG. 1 is a schematic diagram of a metal liquid film monitoring control system and method based on plasma rotary electrode atomization in accordance with the present invention;
FIG. 2 is a schematic diagram of a displacement sensor for measuring the distance between a metal film and a displacement sensor using a plasma rotary electrode atomization-based metal liquid film monitoring control system and method of the present invention;
FIG. 3 is a schematic diagram of a first embodiment of a plasma rotating electrode based metal liquid film monitoring control system and method according to the present invention;
FIG. 4 is a schematic diagram of a second embodiment of a system and method for controlling metal liquid film monitoring based on plasma rotary electrode atomization according to the present invention.
In the figure: 1. the device comprises a controller, a power supply, a displacement sensor, a sealing shell, a plasma gun, a metal film and an alloy bar.
Detailed Description
Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative only and are not to be construed as limiting the invention.
Example 1
As shown in fig. 1, the main body frame of the metal liquid film monitoring and controlling system based on plasma rotary electrode atomization is a sealed shell 4. An electric spindle (not shown) and a plasma gun 5 are mounted on the inner wall of the sealed housing 4.
The motorized spindle is driven by the controller 1, so that the alloy bar 7 connected with the end part of the motorized spindle can rotate at a high speed. Under the action of the plasma gun 5, the end of the alloy rod 7 is formed with a metal film 6.
Referring to fig. 2, the outside of the plasma gun 5 is provided with a plurality of displacement sensors 3, and the plurality of displacement sensors 3 are arranged opposite to the metal film 6 for testing the distances between a plurality of points on the metal film 6 to the corresponding displacement sensors.
The controller 1 and the power supply 2 are arranged outside the sealed shell 4, and the controller 1 is respectively and electrically connected with the electric spindle, the plasma gun 5 and the displacement sensor 3 and is used for controlling the rotating speed of the plasma gun 5 and receiving and analyzing distance data acquired by the displacement sensor 3.
The power supply 2 is connected to the controller 1 and the plasma gun 5.
The invention relates to a metal liquid film monitoring and controlling system based on plasma rotary electrode atomization, which has the following working principle: the distance between the metal film 6 and the displacement sensor 3 is measured by a plurality of displacement sensors 3 and transmitted to the controller 1, and the distance is denoted as d i ，d i ＝{d 1 ，d 2 ，…，d n N represents the nth displacement sensor 3, n.gtoreq.2; after which the controller 1 is according to d i Determining a minimum distance, the minimum distance being denoted as d m ，d m ＝min{d 1 ，d 2 ，…，d n -a }; the controller 1 then compares di with d m Subtracting absolute values to obtain a distance difference value, and recording the distance difference value as delta d i ，Δd i ＝|d n -d m I, calculating and solving the maximum value of the distance difference, namely the maximum curvature value, and recording the maximum curvature value as delta d m ，Δd m ＝max{Δd 1 ，Δd 2 ，…，Δd n -a }; finally, the controller 1 will Δd m And a preset value d 0 The comparison is judged to determine whether the power of the plasma gun 5 or the displacement of the electric spindle is regulated to ensure Δd m And a preset value d 0 The comparison result of (2) meets the requirement.
It should be noted that the controller 1 used in the present application is preferably a siemens S7 series programmable logic controller.
Example 2
Referring to fig. 3, the metal liquid film monitoring and controlling method based on plasma rotary electrode atomization of the invention is implemented according to the following steps:
step 1, the distance between the metal film 6 and the displacement sensor 3 is measured by a plurality of displacement sensors 3 and transmitted to the controller 1, and the distance is denoted as d i ，d i ＝{d 1 ，d 2 ，…，d n N represents the nth displacement sensor 3, n.gtoreq.2;
step 2, the controller 1 according to d i Determining a minimum distance, the minimum distance being denoted as d m ，d m ＝min{d 1 ，d 2 ，…，d n }；
Step 4, Δd m And a preset value d 0 And (5) comparing and judging: if Δd m Not greater than d 0 The power of the plasma gun 5 remains unchanged; if Δd m Greater than d 0 The controller 1 will adjust the power of the plasma gun 5 to Δd m ≤d 0 。
In step 4 of example 2, if Δd m Greater than d 0 The amplitude of the power of the plasma gun 5 is 0.5kw-1.5kw each time, so that the purpose of accurate control is achieved with the minimum adjustment times.
Example 3
Referring to fig. 4, the metal liquid film monitoring and controlling method based on plasma rotary electrode atomization of the invention is implemented according to the following steps:
step 1, the distance between the metal film 6 and the displacement sensor 3 is measured by a plurality of displacement sensors 3 and transmitted to the controller 1, and the distance is denoted as d i ，d i ＝{d 1 ，d 2 ，…，d n N represents the nth displacement sensor 3, n.gtoreq.2;
step 2, the controller 1 according to d i Determining a minimum distance, the minimum distance being denoted as d m ，d m ＝min{d 1 ，d 2 ，…，d n }；
Step 4, Δd m And a preset value d 0 And (5) comparing and judging: if Δd m Not greater than d 0 The power of the electric spindle of the plasma gun is kept unchanged; if Δd m Greater than d 0 The motorized spindle is moved by the controller until Δd m ≤d 0 。
In step 4 of example 3: if Δd m Greater than d 0 The distance of each movement of the motorized spindle is 0.5mm-5mm, so that the aim of accurate control is fulfilled with the minimum adjustment times.
While the foregoing description illustrates and describes several preferred embodiments of the invention, it is to be understood that the invention is not limited to the forms disclosed herein, but is not to be construed as limited to other embodiments, and is capable of use in various other combinations, modifications and environments and is capable of changes or modifications within the spirit of the invention described herein, either as a result of the foregoing teachings or as a result of the knowledge or skill of the relevant art. And that modifications and variations which do not depart from the spirit and scope of the invention are intended to be within the scope of the appended claims.
Claims (2)
1. The metal liquid film monitoring control system based on the plasma rotary electrode atomization comprises a sealing shell (4), wherein an electric spindle and a plasma gun (5) are arranged in the sealing shell (4), the driving end of the electric spindle is connected with an alloy bar (7), a metal film (6) is formed at the end part of the alloy bar (7), a plurality of displacement sensors (3) are arranged outside the plasma gun (5), and the displacement sensors (3) are arranged relative to the metal film (6); the controller (1) and the power supply (2) are arranged outside the sealing shell (4), the controller (1) is respectively connected with the electric spindle, the plasma gun (5) and the displacement sensor (3), and the power supply (2) is connected with the controller (1) and the plasma gun (5); the controller (1) is a Siemens S7 series programmable logic controller, and is characterized in that,
the method is implemented according to the following steps:
step 1, measuring the distance between the metal film (6) and the displacement sensor (3) through a plurality of displacement sensors (3) and transmitting the distance to the controller (1), wherein the distance is denoted as d i ，d i ={d 1 ，d 2 ，…，d n N represents an nth displacement sensor (3), n.gtoreq.2;
step 2, the controller (1) is used for controlling the operation according to d i Determining a minimum distance, the minimum distance being denoted as d m ，d m =min{ d 1 ，d 2 ，…，d n } ；
Step 3, the controller (1) combines di with d m Subtracting absolute values to obtain a distance difference value, and recording the distance difference value as delta d i ，Δd i =ǀd n -d m ǀ calculating and finding out the maximum value of the distance difference, namely the maximum curvature value, and recording the maximum curvature value as delta d m ，Δd m =max{Δd 1 ，Δd 2 ，…，Δd n }；
Step 4, Δd m And a preset value d 0 And (5) comparing and judging: if Δd m Not greater than d 0 The power of the plasma gun (5) remains unchanged; if Δd m Greater than d 0 The power of the plasma gun (5) is regulated by the controller (1), and the amplitude of the regulated power of the plasma gun (5) is 0.5 each timekw-1.5kw up to Δd m ≤d 0 。
2. The metal liquid film monitoring control system based on the plasma rotary electrode atomization comprises a sealing shell (4), wherein an electric spindle and a plasma gun (5) are arranged in the sealing shell (4), the driving end of the electric spindle is connected with an alloy bar (7), a metal film (6) is formed at the end part of the alloy bar (7), a plurality of displacement sensors (3) are arranged outside the plasma gun (5), and the displacement sensors (3) are arranged relative to the metal film (6); the controller (1) and the power supply (2) are arranged outside the sealing shell (4), the controller (1) is respectively connected with the electric spindle, the plasma gun (5) and the displacement sensor (3), and the power supply (2) is connected with the controller (1) and the plasma gun (5); the controller (1) is a Siemens S7 series programmable logic controller, and is characterized by being implemented according to the following steps:
step 1, measuring the distance between the metal film (6) and the displacement sensor (3) through a plurality of displacement sensors (3) and transmitting the distance to the controller (1), wherein the distance is denoted as d i ，d i ={d 1 ，d 2 ，…，d n N represents an nth displacement sensor (3), n.gtoreq.2;
step 2, the controller (1) is used for controlling the operation according to d i Determining a minimum distance, the minimum distance being denoted as d m ，d m =min{ d 1 ，d 2 ，…，d n } ；
Step 3, the controller (1) combines di with d m Subtracting absolute values to obtain a distance difference value, and recording the distance difference value as delta d i ，Δd i =ǀd n -d m ǀ calculating and finding out the maximum value of the distance difference, namely the maximum curvature value, and recording the maximum curvature value as delta d m ，Δd m =max{Δd 1 ，Δd 2 ，…，Δd n }；
Step 4, Δd m And a preset value d 0 And (5) comparing and judging: if Δd m Not greater than d 0 The power of the electric spindle of the plasma gun is kept unchanged; if Δd m Greater than d 0 The electric spindle is moved by the controller, and the distance of each movement of the electric spindle is 0.5mm-5mm until delta d m ≤d 0 。
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Address after: 710018 No. 45, Fengcheng Second Road, Xi'an Economic and Technological Development Zone, Xi'an City, Shaanxi Province Patentee after: Xi'an Ouzhong Materials Technology Co.,Ltd. Country or region after: China Address before: No.45, Fengcheng 2nd Road, economic development zone, Xi'an, Shaanxi 710018 Patentee before: XI'AN SINO-EURO MATERIALS TECHNOLOGIES Co.,Ltd. Country or region before: China |