CN113613832B - 用于通过激光金属沉积制造经涂覆的金属基材的方法 - Google Patents
用于通过激光金属沉积制造经涂覆的金属基材的方法 Download PDFInfo
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- CN113613832B CN113613832B CN202080022910.3A CN202080022910A CN113613832B CN 113613832 B CN113613832 B CN 113613832B CN 202080022910 A CN202080022910 A CN 202080022910A CN 113613832 B CN113613832 B CN 113613832B
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- metal substrate
- coating
- coated
- coated metal
- titanate
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 121
- 239000002184 metal Substances 0.000 title claims abstract description 121
- 239000000758 substrate Substances 0.000 title claims abstract description 100
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000001465 metallisation Methods 0.000 title description 9
- 238000000576 coating method Methods 0.000 claims abstract description 79
- 239000011248 coating agent Substances 0.000 claims abstract description 71
- 239000002105 nanoparticle Substances 0.000 claims abstract description 27
- 238000002310 reflectometry Methods 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 23
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 22
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 18
- 239000010949 copper Substances 0.000 claims description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 17
- 229910052802 copper Inorganic materials 0.000 claims description 17
- 238000000151 deposition Methods 0.000 claims description 17
- 239000010410 layer Substances 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 17
- 239000011230 binding agent Substances 0.000 claims description 15
- 230000008021 deposition Effects 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 238000001816 cooling Methods 0.000 claims description 14
- 239000003960 organic solvent Substances 0.000 claims description 13
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 12
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 12
- 239000011247 coating layer Substances 0.000 claims description 12
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 claims description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 12
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 claims description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- 239000007789 gas Substances 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- -1 al 2O3 Inorganic materials 0.000 claims description 7
- 229910052681 coesite Inorganic materials 0.000 claims description 7
- 229910052906 cristobalite Inorganic materials 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- 229910052682 stishovite Inorganic materials 0.000 claims description 7
- 229910052905 tridymite Inorganic materials 0.000 claims description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 6
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 6
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 6
- 229910052749 magnesium Inorganic materials 0.000 claims description 6
- 239000011777 magnesium Substances 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 6
- 229910052703 rhodium Inorganic materials 0.000 claims description 6
- 239000010948 rhodium Substances 0.000 claims description 6
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 239000004332 silver Substances 0.000 claims description 6
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 239000002243 precursor Substances 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- 229910000684 Cobalt-chrome Inorganic materials 0.000 claims description 3
- 229910005451 FeTiO3 Inorganic materials 0.000 claims description 3
- 229910017676 MgTiO3 Inorganic materials 0.000 claims description 3
- 229910020293 Na2Ti3O7 Inorganic materials 0.000 claims description 3
- 229910002370 SrTiO3 Inorganic materials 0.000 claims description 3
- 229910010252 TiO3 Inorganic materials 0.000 claims description 3
- WAIPAZQMEIHHTJ-UHFFFAOYSA-N [Cr].[Co] Chemical compound [Cr].[Co] WAIPAZQMEIHHTJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910002113 barium titanate Inorganic materials 0.000 claims description 3
- 239000010952 cobalt-chrome Substances 0.000 claims description 3
- 238000003618 dip coating Methods 0.000 claims description 3
- 229910001026 inconel Inorganic materials 0.000 claims description 3
- 229910001105 martensitic stainless steel Inorganic materials 0.000 claims description 3
- 238000004528 spin coating Methods 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910002971 CaTiO3 Inorganic materials 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 230000035515 penetration Effects 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000003723 Smelting Methods 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 229910001119 inconels 625 Inorganic materials 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000004103 aminoalkyl group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 description 2
- 125000005641 methacryl group Chemical group 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/365—Selection of non-metallic compositions of coating materials either alone or conjoint with selection of soldering or welding materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
- B23K26/123—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an atmosphere of particular gases
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/20—Bonding
- B23K26/21—Bonding by welding
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/60—Preliminary treatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/082—Coating starting from inorganic powder by application of heat or pressure and heat without intermediate formation of a liquid in the layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/082—Coating starting from inorganic powder by application of heat or pressure and heat without intermediate formation of a liquid in the layer
- C23C24/085—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/10—Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/10—Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer
- C23C24/103—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
- C23C26/02—Coating not provided for in groups C23C2/00 - C23C24/00 applying molten material to the substrate
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
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Abstract
本发明涉及：预涂覆的金属基材，其中在0.5μm至5.0μm的所有波长处具有高于或等于60％的反射率的裸金属基材涂覆有包含至少一种钛酸盐和至少一种纳米颗粒的预涂层；用于制造这种预涂覆的金属基材的方法；用于制造经涂覆的金属基材的方法和经涂覆的金属基材。
Description
技术领域
本发明涉及：预涂覆的金属基材，其中涂层包含至少一种钛酸盐和至少一种纳米颗粒，所述金属基材在0.5μm至5.0μm的所有波长处具有高于或等于60％的反射率；用于制造这种预涂覆的金属基材的方法；用于制造经涂覆的金属基材的方法和最终的经涂覆的金属基材。其特别好地适合于金属工业。
背景技术
已知使用具有高反射率的金属基材来生产金属工业设备中使用的零件。实际上，例如，用于火法冶金炉、冷却辊、高炉的冷却部件可以由铜制成。这些零件经受磨损、刮擦、高温等。为了提高这些零件的寿命，在其上沉积涂层是已知的。
专利申请EP2785881公开了用于火法冶金炉(例如，用于闪速熔炼炉或用于闪速吹炼炉或用于悬浮熔炼炉)的冷却元件，其中冷却元件具有与冶金炉的内部接触的火表面，其中冷却元件包括包含铜的基础元件和至少部分地覆盖基础元件的涂层，其中涂层形成冷却元件的火表面，特征在于涂层通过激光涂覆过程(例如激光沉积)被至少部分地施加以及涂层包含基于Ni的合金。
本专利申请还公开了用于制造用于火法冶金炉(例如，用于闪速熔炼炉或用于闪速吹炼炉或用于悬浮熔炼炉)的冷却元件的方法，其中冷却元件包括包含铜的基础元件和与冶金炉的内部接触的火表面，其中所述方法包括用于提供包含铜的基础元件的提供步骤，和用于用至少部分地覆盖基础元件的涂层涂覆基础元件使得涂层形成冷却元件的火表面的涂覆步骤，特征在于在涂覆步骤中至少部分地通过激光涂覆过程(例如，激光沉积)施加涂层，以及在涂覆步骤中施加包含基于Ni的合金的涂层。
然而，当金属基材具有高反射率时，例如铜，存在能量损失并因此存在涂层厚度损失。实际上，为了高效，激光应该被金属基材吸收以使其表面改性。如果金属基材的反射率高，则激光主要被反射导致能量损失、较少改性的表面，因此导致具有较低厚度的涂层。
因此，需要改善在具有高反射率的金属基材上的激光金属沉积。还需要获得与现有技术相比被较厚涂层良好保护的具有高反射率的金属基材。
发明内容
为此，本发明涉及预涂覆的金属基材，其中预涂层包含至少一种钛酸盐和至少一种纳米颗粒，所述裸金属基材在0.5μm至5.0μm的所有波长处具有高于或等于60％的反射率。
根据本发明的预涂覆的金属基材还可以具有单独或组合考虑的以下列出的任选特征：
-预涂层包含选自以下中的至少一种钛酸盐：Na2Ti3O7、K2TiO3、K2Ti2O5、MgTiO3、SrTiO3、BaTiO3、以及CaTiO3、FeTiO3和ZnTiO4或其混合物，
-预涂层包含选自以下中的至少一种纳米颗粒：TiO2、SiO2、氧化钇稳定的氧化锆(YSZ)、Al2O3、MoO3、CrO3、CeO2或其混合物，
-预涂层还包含有机溶剂，
-有机溶剂选自：丙酮、甲醇和乙醇，
-涂层的厚度为10μm至140μm，
-裸金属基材在0.5μm至5.0μm的所有波长处具有高于或等于70％的反射率，
-金属基材选自：铜、铝、镁、铂、铑、钽、银和金。
本发明还涉及用于制造根据本发明的预涂覆的金属基材的方法，包括顺序的以下步骤：
A.提供根据本发明的金属基材，
B.沉积根据本发明的预涂层，
C.任选地，对步骤B)中获得的涂覆的金属基材进行干燥。
根据本发明的方法也可以具有单独或组合考虑的以下列出的任选特征：
-预涂层的沉积通过旋涂、喷涂、浸涂或刷涂进行，
-预涂层包含1g/L至200g/L的纳米颗粒，
-预涂层包含100g/L至500g/L的钛酸盐。
本发明还涉及用于制造经涂覆的金属基材的方法，包括以下顺序的步骤：
I.提供根据本发明的预涂覆的金属基材，以及
II.通过激光沉积来沉积至少一个金属涂层，激光的波长为0.5μm至5.0μm。
根据本发明的方法也可以具有单独或组合考虑的以下列出的任选特征：
-在步骤II)中，激光沉积用作为惰性气体和/或活性气体的保护气体进行，
-在步骤II)中，激光的功率为0.2kW至17kW，
-至少一个金属涂层选自：Inconel、316L不锈钢以及42C马氏体不锈钢和基于钴铬的合金。
本发明还涉及可由根据本发明的方法获得的经涂覆的金属基材，其中：
-反射率高于或等于60％的裸金属基材涂覆有至少一个金属涂层，
-在金属基材与至少一个金属涂层之间的界面处存在熔融的预涂层，以及
-裸金属基材包含溶解和/或析出的预涂层。
根据本发明的经涂覆的金属基材还可以具有单独或组合考虑的以下列出的任选特征：
-至少一个金属涂层的厚度为0.3mm至10mm，
-金属基材涂覆有至少两层金属涂层，
-金属基材包含溶解和/或析出的钛酸盐和纳米颗粒。
最后，本发明涉及根据本发明的经涂覆的金属基材用于制造用于火法冶金炉、冷却辊、高炉的冷却部件的用途。
定义了以下术语：
-纳米颗粒为尺寸为1纳米至100纳米(nm)的颗粒。
-钛酸盐是指其组成结合钛氧化物以及至少一种其他氧化物的无机化合物。其可以为其盐的形式。
-“涂覆的”意指金属基材至少局部地覆盖有预涂层。覆盖可以例如限于金属基材将被焊接的区域。“涂覆的”广泛地包括“直接在其上”(其间未设置有中间材料、元件或空间)和“间接在其上”(其间设置有中间材料、元件或空间)。例如，涂覆金属基材可以包括在其间不具有中间材料/元件的情况下在基材上直接施加预涂层，以及在其间具有一种或更多种中间材料/元件(例如抗腐蚀涂层)的情况下在基材上间接施加预涂层。
-材料的表面的反射率是其反射辐射能的有效性。它是在界面处反射的入射电磁功率的分数。反射率可以通过光谱来测量。
不希望受任何理论的束缚，认为预涂层主要改进随后的金属涂层和金属基材的熔池物理性质，允许在其表面上沉积较厚的涂层。在激光金属沉积期间，预涂层改善了马兰戈尼(Marangoni)流动，其是由于表面张力的梯度而产生沿金属基材与随后的金属涂层之间的界面的传质。这种改进导致更多的渗透，在这种情况下导致更大的涂层渗透深度。似乎包含至少一种钛酸盐和至少一种纳米颗粒的涂层导致高沉积的金属涂层和在金属基材中的高渗透深度。
另外地，似乎所选择的纳米颗粒增加金属基材的吸光度，导致更高的渗透。因此，即使其裸表面的反射率在0.5μm至5.0μm的所有波长处高于或等于60％，也可以有效地进行激光金属沉积。
优选地，预涂层包含选自以下中的至少一种纳米颗粒：TiO2、SiO2、氧化钇稳定的氧化锆(YSZ)、Al2O3、MoO3、CrO3、CeO2、或其混合物。实际上，不希望受任何理论的束缚，认为这些纳米颗粒进一步改进了熔池物理性质，允许更有效的材料沉积。
优选地，纳米颗粒为SiO2和TiO2，并且更优选地为SiO2和TiO2的混合物。
优选地，纳米颗粒的尺寸为5nm至55nm。
优选地，纳米颗粒以干重计的百分比低于或等于80％，并且优选地为2％至40％。在一些情况下，可能必须限制纳米颗粒的百分比以避免太高的耐火效应。了解各种纳米颗粒的耐火效应的本领域技术人员将根据情况调整百分比情况。
优选地，钛酸盐的颗粒尺寸分布为1μm至40μm，更优选地为1μm至20μm，并且有利地为1μm至10μm。实际上，不希望受任何理论的束缚，认为这种钛酸盐直径进一步改善了马兰戈尼流动。
优选地，预涂层包含选自以下的钛酸盐中的至少一种：Na2Ti3O7、NaTiO3、K2TiO3、K2Ti2O5、MgTiO3、SrTiO3、BaTiO3、CaTiO3、FeTiO3和ZnTiO4或其混合物。实际上，不希望受任何理论的束缚，认为这些钛酸盐进一步增加了金属涂层的沉积并且基于马兰戈尼流动增加了涂层渗透深度。
优选地，至少一种钛酸盐以干重计的百分比高于或等于45％，并且例如为50％或70％。
根据本发明的一种变型，一旦在金属基材上施加预涂层并干燥，预涂层就由至少一种钛酸盐和至少一种纳米颗粒组成。
根据本发明的另一种变型，涂层还包含嵌入钛酸盐和纳米颗粒并改善预涂层在钢基材上的粘合力的至少一种粘结剂。优选地，粘结剂是纯无机的，特别地为了避免有机粘结剂在焊接期间可能产生的烟雾。无机粘结剂的实例为有机官能化的硅烷或硅氧烷的溶胶-凝胶。有机官能化的硅烷的实例为用特别是以下的家族的基团官能化的硅烷：胺、二胺、烷基、氨基-烷基、芳基、环氧基、甲基丙烯酰基、氟烷基、烷氧基、乙烯基、巯基和芳基。特别优选氨基-烷基硅烷，因为它们极大地促进了粘合力并且具有长的储存期限。优选地，粘结剂以干燥的预涂层的1重量％至20重量％的量添加。
优选地，涂层的厚度为10μm至140μm，更优选地为30μm至100μm。
根据本发明，裸金属基材在0.5μm至5.0μm，优选0.5μm至3.0μm，并且例如0.5μm至1.5μm的所有波长处具有高于或等于60％，优选高于或等于70％的反射率。实际上，不希望受任何理论的束缚，认为金属基材的反射率取决于激光源的波长。
在根据本发明的预涂层的情况下，认为金属基材反射率在0.5μm至5.0μm的所有波长处降低至低于30％，优选低于20％。
更优选地，金属基材选自铜、铝、镁、铂、铑、钽、银和金。优选地，金属基材不包含具有高于50重量％的铁的铁合金。特别地，金属基材不包括钢基材。实际上，似乎钢基材在0.5μm至5.0μm的所有波长处的反射率为约30％。
本发明还涉及用于制造预涂覆的金属基材的方法，包括顺序的以下步骤：
A.提供根据本发明的金属基材，
B.沉积根据本发明的预涂层，
C.任选地，对步骤B)中获得的涂覆的金属基材进行干燥。
优选地，在步骤B)中，预涂层的沉积通过旋涂、喷涂、浸涂或刷涂进行。
优选地，在步骤B)中，预涂层仅局部地沉积。特别地，将预涂层施加在其中将通过激光金属沉积来沉积金属涂层的区域中。其可以为金属基材的表面上的任何地方。更优选地，所施加的预涂层的宽度至少与待沉积的金属涂层一样大。预涂层尤其可以以图案的形式施加。
有利地，预涂层还包含有机溶剂。实际上，不希望受任何理论的束缚，认为有机溶剂允许使预涂层良好地分散。优选地，有机溶剂在环境温度下是挥发性的。例如，有机溶剂选自以下：挥发性有机溶剂，例如丙酮、甲醇、异丙醇、乙醇、乙酸乙酯、二乙醚；非挥发性有机溶剂，例如乙二醇和水。
有利地，在步骤B)中，预涂层包含1g/L至200g/L，更优选地5g.L-1至80g.L-1的纳米颗粒。
优选地，在步骤B)中，预涂层包含100g/L至500g/L，更优选地175g.L-1至250g.L-1的钛酸盐。
根据本发明的一种变型，步骤B)的预涂层由至少一种钛酸盐、至少一种纳米颗粒和至少一种有机溶剂组成。
根据本发明的另一种变型，步骤B)的预涂层还包含用于嵌入钛酸盐和纳米颗粒并且改善预涂层在钢基材上的粘合力的粘结剂前体。优选地，粘结剂前体为至少一种有机官能化的硅烷的溶胶。有机官能化的硅烷的实例为用特别是以下的家族的基团官能化的硅烷：胺、二胺、烷基、氨基-烷基、芳基、环氧基、甲基丙烯酰基、氟烷基、烷氧基、乙烯基、巯基和芳基。优选地，粘结剂前体以预涂层的40g.L-1至400g.L-1的量添加。
当进行干燥步骤C)时，所述干燥通过在环境温度或高温下鼓入空气或惰性气体来进行。当预涂层包含粘结剂时，干燥步骤C)还优选为在期间粘结剂被固化的固化步骤。固化可以通过红外(IR)、近红外(NIR)、常规的烘箱进行。
优选地，当有机溶剂在环境温度下是挥发性的时，不进行干燥步骤C)。实际上，认为在涂层的沉积之后，有机溶剂蒸发，在金属基材上产生干燥的预涂层。
本发明还涉及用于制造经涂覆的金属基材的方法，包括以下顺序的步骤：
I.提供根据本发明的预涂覆的金属基材，以及
II.通过激光沉积来沉积至少一个金属涂层。
优选地，在步骤II)中，激光沉积用作为惰性气体和/或活性气体的保护气体进行。例如，惰性气体选自氦、氖、氩、氪、氙或其混合物。例如，活性气体选自：CO2、CO或其混合物。活性气体还可以与惰性气体混合。
优选地，在步骤II)中，激光的功率为200W至17000W，并且更优选地为1000W至4000W。
优选地，至少一个金属涂层选自：Inconel、316L不锈钢、AISI 431马氏体不锈钢和基于钴铬的合金。实际上，不希望受任何理论的束缚，认为该涂层改善了具有等于或高于60％的反射率的金属基材的耐腐蚀性、耐磨性、上浆。
优选地，在步骤II)中，至少一个金属涂层仅局部地沉积。特别地，将预涂层施加在其中已经施加预涂层的区域中。金属涂层尤其可以以图案的形式被施加。
根据本发明，激光源的波长为0.5μm至5.0μm，优选为0.5μm至3.0μm，并且例如为0.5μm至1.5μm。
使用根据本发明的方法，可以获得包含裸金属基材的经涂覆的金属基材，所述裸金属基材在0.5μm至5.0μm的所有波长处具有高于或等于60％的反射率并且涂覆有至少一个金属涂层，其中金属基材与至少一个金属涂层之间的界面包含溶解和/或析出的预涂层，所述预涂层包含至少一种钛酸盐和至少一种纳米颗粒。
认为这种经涂覆的金属基材与现有技术相比由于预涂层而具有较厚的金属涂层，因此具有更高的保护。
通过“溶解和/或析出的预涂层”，意指在液体金属沉积期间，预涂层的组分可以在金属基材与至少一个金属涂层之间的界面处被牵引到熔融金属的内部。一些组分溶解在熔池中，这导致相应元素在界面处的富集。其他组分析出物是在界面处形成夹杂物的复合氧化物的一部分。界面的具体组成可以通过电子探针微区分析(EPMA)观察和评估。
优选地，至少一个金属涂层的厚度为0.3mm至10mm，并且更优选地为1mm至8mm。
优选地，金属基材涂覆有至少两层金属涂层。
最后，本发明涉及根据本发明的经涂覆的金属基材用于制造用于火法冶金炉、冷却辊、高炉的冷却部件的用途。
具体实施方式
实施例
以下实施例和测试本质上是非限制性的并且必须仅为了举例说明的目的而考虑。它们将举例说明本发明的有利特征，本发明人在大量的实验之后选择的参数的重要性并且进一步确定了可以通过本发明实现的特性。
对于试验，使用具有下表1中的以重量百分比计的化学组成的铜基材：
| Ag | Bi | Co | Cr | Fe | Ni | S | Si | Sn | Zn | Cu |
| 0.0020 | 0.0002 | 0.0001 | 0.0005 | 0.0002 | 0.0001 | <0.002 | 0.0007 | 0.0006 | 0.0003 | 余量 |
铜基材在1.030μm至1.064μm的波长处的反射率为85％。这些波长通常用于激光金属沉积中的激光源。
实施例1：
通过将丙酮与MgTiO3(直径：2μm)、SiO2(直径：10nm)和TiO2(直径：50nm)混合来制备包含所述要素的丙酮溶液。在丙酮溶液中，MgTiO3的浓度为175g.L-1。SiO2的浓度为25g.L-1。TiO2的浓度为50g.L-1。
然后，用丙酮溶液通过喷洒涂覆试验1。使丙酮蒸发。MgTiO3在涂层中的百分比为70重量％，SiO2的百分比为10重量％以及TiO2的百分比为20重量％。试验2未经该溶液涂覆。
然后，通过激光金属沉积在试验1和2上沉积包含2层Inconel 625的金属涂层。Inconel 625的以重量百分比计的化学组成在下表2中。
| Mo | Fe | Mn | Cr | Si | O | N | Al | Nb | Ni |
| 9.0 | 0.38 | 0.38 | 21.0 | 0.46 | 0.06 | 0.10 | 0.02 | 3.61 | 余量 |
第一层用3.8kW的激光功率进行沉积。第二用1.2kW的激光功率进行沉积。保护气体为氩气。
在试验1和2上沉积Inconel 625之后，通过扫描电子显微镜(SEM)测量层的厚度和在铜基材中的涂层渗透深度。根据标准ISO 15614-7将试验弯曲直至180°。结果在下表3中：
*：根据本发明
在试验1的情况下，Inconel 625金属涂层的厚度比试验2更厚。此外，在试验1的情况下，涂层渗透深度比试验2更高。实际上，试验1的反射率已经降低，导致激光沉积的改进。
然后，使用显微硬度测试仪在金属涂层和铜基材上确定两个试验的硬度。结果在下表4中，其中“a”表示涂层的第二层的硬度；“b”表示涂层的第一层的硬度；“c”表示铜基材与涂层的第一层之间的界面处的硬度；以及“d”表示铜基材的厚度：
| 试验 | a | b | c | d |
| 1* | 246 | 255 | 261 | 56 |
| 2 | 263 | 274 | 203 | 55 |
*：根据本发明
试验1的硬度值在金属涂层上比试验2更均匀，在试验2中观察到软化的界面。
实施例2：
对于试验3，制备包含以下组分的水溶液：363g.L-1的MgTiO3(直径：2μm)、77.8g.L-1的SiO2(直径范围：12nm至23nm)、77.8g.L-1的TiO2(直径范围：36nm至55nm)和238g.L-1的3-氨基丙基三乙氧基硅烷(由制造的/>AMEO)。在钢基材上施加所述溶液并通过1)IR和2)NIR干燥。经干燥的涂层为40μm厚并且包含62重量％的MgTiO3、13重量％的SiO2、13重量％的TiO2和12重量％的由3-氨基丙基三乙氧基硅烷获得的粘结剂。
对于试验4，制备包含以下组分的水溶液：330g.L-1的MgTiO3(直径：2μm)、70.8g.L-1的SiO2(直径范围：12nm至23nm)、70.8g.L-1的TiO2(直径范围：36nm至55nm)、216g.L-1的3-氨基丙基三乙氧基硅烷(由制造的/>AMEO)以及104.5g.L-1的有机官能化的硅烷和官能化的纳米级SiO2颗粒的组合物(由Evonik制造的/>Sivo110)。在钢基材上施加所述溶液并通过1)IR和2)NIR干燥。经干燥的涂层为40μm厚并且包含59.5重量％的MgTiO3、13.46重量％的SiO2、12.8重量％的TiO2以及14.24重量％的由3-氨基丙基三乙氧基硅烷和有机官能化的硅烷获得的粘结剂。
在所有情况下，预涂层在金属基材上的粘合力都得到了极大地改善。
Claims (21)
1.一种预涂覆的金属基材，其中在0.5μm至5.0μm的所有波长处具有高于或等于60％的反射率并且选自铜、铝、镁、铂、铑、钽、银和金的裸金属基材涂覆有包含至少一种钛酸盐和选自TiO2、SiO2、氧化钇稳定的氧化锆(YSZ)、Al2O3、MoO3、CrO3、CeO2、或其混合物的至少一种纳米颗粒的预涂层。
2.根据权利要求1所述的预涂覆的金属基材，其中所述至少一种钛酸盐选自：Na2Ti3O7、NaTiO3、K2TiO3、K2Ti2O5、MgTiO3、SrTiO3、BaTiO3、CaTiO3、FeTiO3和ZnTiO4或其混合物。
3.根据权利要求1或2所述的预涂覆的金属基材，其中所述预涂层的厚度为10μm至140μm。
4.根据权利要求1或2所述的预涂覆的金属基材，其中所述裸金属基材在0.5μm至5.0μm的所有波长处具有高于或等于70％的反射率。
5.根据权利要求1或2所述的预涂覆的金属基材，其中所述预涂层还包含粘结剂。
6.根据权利要求5所述的预涂覆的金属基材，其中粘结剂在所述预涂层中的百分比为1重量％至20重量％。
7.一种用于制造根据权利要求1至6中任一项所述的预涂覆的金属基材的方法，包括顺序的以下步骤：
A.提供裸金属基材，所述裸金属基材在0.5μm至5.0μm的所有波长处具有高于或等于60％的反射率并且选自铜、铝、镁、铂、铑、钽、银和金，
B.沉积包含至少一种钛酸盐和选自TiO2、SiO2、氧化钇稳定的氧化锆(YSZ)、Al2O3、MoO3、CrO3、CeO2、或其混合物的至少一种纳米颗粒的预涂层。
8.根据权利要求7所述的方法，其中在步骤B)中，所述预涂层的沉积通过旋涂、喷涂、浸涂或刷涂进行。
9.根据权利要求7或8中任一项所述的方法，其中在步骤B)中，所述预涂层还包含有机溶剂。
10.根据权利要求9所述的方法，其中所述有机溶剂选自：丙酮、甲醇、乙醇、乙酸乙酯、乙二醇和水。
11.根据权利要求7或8所述的方法，其中在步骤B)中，所述预涂层包含1g/L至200g/L的至少一种纳米颗粒。
12.根据权利要求7或8所述的方法，其中在步骤B)中，所述预涂层包含100g/L至500g/L的钛酸盐。
13.根据权利要求7或8所述的方法，其中在步骤B)中，所述预涂层还包含粘结剂前体。
14.一种用于制造经涂覆的金属基材的方法，包括以下顺序的步骤：
I.提供预涂覆的金属基材，其中在0.5μm至5.0μm的所有波长处具有高于或等于60％的反射率并且选自铜、铝、镁、铂、铑、钽、银和金的裸金属基材涂覆有包含至少一种钛酸盐和选自TiO2、SiO2、氧化钇稳定的氧化锆(YSZ)、Al2O3、MoO3、CrO3、CeO2、或其混合物的至少一种纳米颗粒的预涂层，以及
II.通过激光沉积来沉积至少一个金属涂层，所述激光的波长为0.5μm至5.0μm。
15.根据权利要求14所述的方法，其中在步骤II)中，所述激光沉积用作为惰性气体和/或活性气体的保护气体进行。
16.根据权利要求14或15中任一项所述的方法，其中在步骤II)中，所述激光的功率为0.2kW至17kW。
17.根据权利要求14或15所述的方法，其中所述至少一个金属涂层选自：Inconel、316L不锈钢、42C马氏体不锈钢和基于钴铬的合金。
18.一种经涂覆的金属基材，包含在0.5μm至5.0μm的所有波长处具有高于或等于60％的反射率并且选自铜、铝、镁、铂、铑、钽、银和金并且涂覆有至少一个金属涂层的裸金属基材，其中所述金属基材与所述至少一个金属涂层之间的界面包含溶解和/或析出的预涂层，所述预涂层包含至少一种钛酸盐和选自TiO2、SiO2、氧化钇稳定的氧化锆(YSZ)、Al2O3、MoO3、CrO3、CeO2、或其混合物的至少一种纳米颗粒。
19.根据权利要求18所述的经涂覆的金属基材，其中所述至少一个金属涂层的厚度为0.3mm至10mm。
20.根据权利要求18或19中任一项所述的经涂覆的金属基材，其中所述金属基材经至少两层金属涂层涂覆。
21.根据权利要求18至20中任一项所述的经涂覆的金属基材用于制造用于火法冶金炉、冷却辊、高炉的冷却部件的用途。
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| US6312812B1 (en) * | 1998-12-01 | 2001-11-06 | Ppg Industries Ohio, Inc. | Coated metal substrates and methods for preparing and inhibiting corrosion of the same |
| CN1809440A (zh) * | 2003-06-25 | 2006-07-26 | 贝洱两合公司 | 用于金属部件钎焊的钎剂 |
| WO2007002017A1 (en) * | 2005-06-20 | 2007-01-04 | Praxair S.T. Technology, Inc. | Laser cladding on low heat resistant substrates |
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| KR20210137543A (ko) | 2021-11-17 |
| BR112021018772A2 (pt) | 2021-11-23 |
| CN113613832A (zh) | 2021-11-05 |
| WO2020212737A1 (en) | 2020-10-22 |
| KR102700215B1 (ko) | 2024-08-28 |
| EP3956100A1 (en) | 2022-02-23 |
| CA3133408C (en) | 2023-07-11 |
| WO2020212891A1 (en) | 2020-10-22 |
| JP7362771B2 (ja) | 2023-10-17 |
| US20220251711A1 (en) | 2022-08-11 |
| CA3133408A1 (en) | 2020-10-22 |
| JP2022530352A (ja) | 2022-06-29 |
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