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CN113596690B - Structure and device of novel piezoelectric type MEMS microphone - Google Patents

Structure and device of novel piezoelectric type MEMS microphone Download PDF

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CN113596690B
CN113596690B CN202110927935.4A CN202110927935A CN113596690B CN 113596690 B CN113596690 B CN 113596690B CN 202110927935 A CN202110927935 A CN 202110927935A CN 113596690 B CN113596690 B CN 113596690B
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electrode layer
piezoelectric
layer
microphone
connection hole
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CN113596690A (en
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臧俊斌
崔丹凤
薛晨阳
张志东
张增星
李鹏璐
范正
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North University of China
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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R17/00Piezoelectric transducers; Electrostrictive transducers
    • H04R17/02Microphones
    • H04R17/025Microphones using a piezoelectric polymer
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R19/00Electrostatic transducers
    • H04R19/04Microphones
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R2201/00Details of transducers, loudspeakers or microphones covered by H04R1/00 but not provided for in any of its subgroups
    • H04R2201/003Mems transducers or their use

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  • Engineering & Computer Science (AREA)
  • Acoustics & Sound (AREA)
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  • Piezo-Electric Transducers For Audible Bands (AREA)
  • Micromachines (AREA)

Abstract

本发明涉及新型压电式MEMS麦克风的结构及装置,主要涉及麦克风领域。本申请涉及的新型压电式MEMS麦克风的结构,该第一电极层、压电结构层和第二电极层可以在声音信号的作用下,进行振动,使得该第一电极层和第二电极层上的电荷量发生改变,即该麦克风结构的输出电信号发生改变,通过对输出电信号进行检测,可以得到准确的声音信号。利用集成在薄膜硅材表面的压电材料进行能量转换。当薄膜受到气流压迫式,薄膜进行形变并带动压电材质产生形变,压电材质产在物理特性改善时产生电信号进行输出。即本申请通过增加边缘与中心孔隙,使得本申请的麦克风检测声音信号的灵敏度得到提高,进而使得该麦克风输出的与声音相关的电压信号更准确稳定。

Figure 202110927935

The invention relates to the structure and device of a novel piezoelectric MEMS microphone, and mainly relates to the field of microphones. The structure of the novel piezoelectric MEMS microphone that this application relates to, the first electrode layer, the piezoelectric structure layer and the second electrode layer can vibrate under the action of the sound signal, so that the first electrode layer and the second electrode layer The amount of charge on the microphone changes, that is, the output electrical signal of the microphone structure changes. By detecting the output electrical signal, an accurate sound signal can be obtained. Energy conversion using piezoelectric materials integrated on the surface of thin-film silicon. When the film is compressed by the airflow, the film deforms and drives the piezoelectric material to deform, and the piezoelectric material produces an electrical signal for output when its physical properties are improved. That is, the present application increases the sensitivity of the microphone to detect sound signals by increasing the edge and central apertures, thereby making the sound-related voltage signal output by the microphone more accurate and stable.

Figure 202110927935

Description

新型压电式MEMS麦克风的结构及装置The Structure and Device of a New Piezoelectric MEMS Microphone

技术领域technical field

本发明涉及麦克风领域,主要涉及一种新型压电式MEMS麦克风的结构及装置。The invention relates to the field of microphones, and mainly relates to the structure and device of a novel piezoelectric MEMS microphone.

背景技术Background technique

麦克风,学名为传声器,由英语microphone(送话器)翻译而来,也称话筒,微音器。麦克风是将声音信号转换为电信号的能量转换器件。分类有动圈式、电容式、驻极体和最近新兴的硅微传声器,此外还有液体传声器和激光传声器。大多数麦克风都是驻极体电容器麦克风,其的工作原理是利用具有永久电荷隔离的聚合材料振动膜。Microphone, scientific name microphone, translated from English microphone (microphone), also known as microphone, microphone. Microphones are energy conversion devices that convert sound signals into electrical signals. There are moving coil, condenser, electret and recently emerging silicon micro microphones, as well as liquid microphones and laser microphones. Most microphones are electret condenser microphones, which work by utilizing a polymeric diaphragm with permanent charge isolation.

现有技术中,为了降低传感器的谐振频率并且进一步的提升压电式麦克风的灵敏度,大多数厂商皆采用在压电膜上设置狭槽。In the prior art, in order to reduce the resonance frequency of the sensor and further improve the sensitivity of the piezoelectric microphone, most manufacturers adopt slots on the piezoelectric film.

但是,现有技术中狭槽的设计使得低频信号甚至中频信号的泄漏非常严重,使得现有技术中的麦克风灵敏度较低。However, the design of the slot in the prior art makes the leakage of the low-frequency signal or even the intermediate-frequency signal very serious, which makes the sensitivity of the microphone in the prior art low.

发明内容Contents of the invention

本发明的目的在于,针对上述现有技术中的不足,提供一种新型压电式MEMS麦克风的结构及装置,以解决现有技术中狭槽的设计使得低频信号甚至中频信号的泄漏非常严重,使得现有技术中的麦克风灵敏度较低的问题。The purpose of the present invention is to, aiming at the deficiencies in the above-mentioned prior art, provide a kind of structure and the device of novel piezoelectric MEMS microphone, to solve the design of the slot in the prior art makes the leakage of low-frequency signal or even intermediate-frequency signal very serious, The problem that the sensitivity of the microphone in the prior art is low.

为实现上述目的,本发明实施例采用的技术方案如下:In order to achieve the above object, the technical solution adopted in the embodiment of the present invention is as follows:

第一方面,本申请提供一种新型压电式MEMS麦克风的结构,结构包括:衬底、压电结构层、第一电极层和第二电极层;衬底为空腔结构,且空腔结构的衬底的一面设置有开口,第一电极层覆盖设置在开口位置上方,压电结构层设置在第一电极层远离衬底的一侧,第二电极层设置在压电结构层远离第一电极层的一侧,且第一电极层、压电结构层和第二电极层上相同的位置设置有贯穿的边缘孔,边缘孔分布在第一电极层、压电结构层和第二电极层的边缘位置。In the first aspect, the present application provides a structure of a novel piezoelectric MEMS microphone, which includes: a substrate, a piezoelectric structure layer, a first electrode layer, and a second electrode layer; the substrate is a cavity structure, and the cavity structure One side of the substrate is provided with an opening, the first electrode layer is arranged above the opening position, the piezoelectric structure layer is arranged on the side of the first electrode layer away from the substrate, and the second electrode layer is arranged on the side of the piezoelectric structure layer far away from the first electrode layer. One side of the electrode layer, and the same position on the first electrode layer, the piezoelectric structure layer and the second electrode layer is provided with through edge holes, and the edge holes are distributed in the first electrode layer, the piezoelectric structure layer and the second electrode layer edge position.

可选地,该结构的边缘孔的位置为四个,四个边缘孔两两对应设置。Optionally, there are four edge holes in the structure, and the four edge holes are set in pairs.

可选地,该结构还包括第一连接孔和第二连接孔,第一连接孔和第二连接孔的轴线相互垂直,且第一连接孔和第二连接孔贯穿第一电极层、压电结构层和第二电极层,且第一连接孔和第二连接孔的两端分别连接对应的两个边缘孔。Optionally, the structure further includes a first connection hole and a second connection hole, the axes of the first connection hole and the second connection hole are perpendicular to each other, and the first connection hole and the second connection hole pass through the first electrode layer, the piezoelectric The structural layer and the second electrode layer, and the two ends of the first connection hole and the second connection hole are respectively connected to two corresponding edge holes.

可选地,该结构还包括第二压电结构层和第三电极层,第二压电结构层设置在第二电极层远离衬底的一侧,第三电极层设置在第二压电结构层远离第二电极的一侧。Optionally, the structure further includes a second piezoelectric structure layer and a third electrode layer, the second piezoelectric structure layer is disposed on the side of the second electrode layer away from the substrate, and the third electrode layer is disposed on the second piezoelectric structure layer. layer away from the side of the second electrode.

可选地,该第一连接孔和第二连接孔贯穿第二压电结构层和第三电极层。Optionally, the first connection hole and the second connection hole penetrate through the second piezoelectric structure layer and the third electrode layer.

可选地,该结构还包括支撑部,支撑部设置在衬底远离第一电极的一侧。Optionally, the structure further includes a support part, and the support part is disposed on a side of the substrate away from the first electrode.

可选地,该结构还包括氧化硅部与器件层硅部,氧化硅部设置在衬底靠近第一电极层的一侧,器件层硅部设置在氧化硅部与第一电极层之间。Optionally, the structure further includes a silicon oxide portion and a device layer silicon portion, the silicon oxide portion is disposed on a side of the substrate close to the first electrode layer, and the device layer silicon portion is disposed between the silicon oxide portion and the first electrode layer.

第二方面,本申请提供的一种新型压电式MEMS麦克风的装置,装置包括:数模转化装置和第一方面任意一项的新型压电式MEMS麦克风的结构,数模转化装置的正负极分别与结构的第一电极层和第二电极层电连接,用于将第一电极层和第二电极层输出的电压信号转化为数字信号。In the second aspect, the application provides a device for a novel piezoelectric MEMS microphone, which includes: a digital-to-analog conversion device and the structure of any one of the novel piezoelectric MEMS microphones in the first aspect, the positive and negative of the digital-to-analog conversion device The poles are respectively electrically connected to the first electrode layer and the second electrode layer of the structure, and are used to convert the voltage signals output by the first electrode layer and the second electrode layer into digital signals.

本发明的有益效果是:The beneficial effects of the present invention are:

本申请涉及的新型压电式MEMS麦克风的结构,结构包括:衬底、压电结构层、第一电极层和第二电极层;衬底为空腔结构,且空腔结构的衬底的一面设置有开口,第一电极层覆盖设置在开口位置,压电结构层设置在第一电极层远离衬底的一侧,第二电极层设置在压电结构层远离第一电极层的一侧,且第一电极层、压电结构层和第二电极层上相同的位置设置有贯穿的边缘孔,边缘孔分布在第一电极层、压电结构层和第二电极层的边缘位置,由于本申请的结构的第一电极层、压电结构层和第二电极层的边缘位置均设置有边缘孔,使得该第一电极层、压电结构层和第二电极层可以在声音信号的作用下,进行振动,且振幅得到增大,由于该压电结构层在震动的作用下表面电荷发生转移,使得该第一电极层和第二电极层上的电荷量发生改变,即该麦克风结构的输出电压发生改变,通过对输出电压信号进行检测,可以得到准确的声音信号,当薄膜受到气流压迫式,薄膜进行形变并带动压电材质产生形变,压电材质产在物理特性改善时产生电信号进行输出。当薄膜受连续气流压迫时,压力材质的物理性质也相应改善,与之产生连续的电信号。即本申请通过增加边缘与中心连接孔,使得本申请的麦克风检测声音信号的灵敏度得到提高,进而使得该麦克风输出的与声音相关的电压信号更准确稳定。The structure of the novel piezoelectric MEMS microphone involved in the application comprises: a substrate, a piezoelectric structure layer, a first electrode layer and a second electrode layer; the substrate is a cavity structure, and one side of the substrate of the cavity structure An opening is provided, the first electrode layer is arranged on the opening position, the piezoelectric structure layer is arranged on the side of the first electrode layer away from the substrate, and the second electrode layer is arranged on the side of the piezoelectric structure layer away from the first electrode layer, And the same positions on the first electrode layer, the piezoelectric structure layer and the second electrode layer are provided with penetrating edge holes, and the edge holes are distributed at the edge positions of the first electrode layer, the piezoelectric structure layer and the second electrode layer. The edge positions of the first electrode layer, the piezoelectric structure layer and the second electrode layer of the structure of the application are all provided with edge holes, so that the first electrode layer, the piezoelectric structure layer and the second electrode layer can be , vibrate, and the amplitude is increased, because the surface charge of the piezoelectric structure layer is transferred under the action of the vibration, so that the amount of charge on the first electrode layer and the second electrode layer changes, that is, the output of the microphone structure When the voltage changes, an accurate sound signal can be obtained by detecting the output voltage signal. When the film is compressed by the airflow, the film deforms and drives the piezoelectric material to deform. The piezoelectric material produces an electrical signal when its physical properties improve. output. When the film is pressed by the continuous air flow, the physical properties of the pressure material are also improved accordingly, and a continuous electrical signal is generated with it. That is, the present application improves the sensitivity of the sound signal detection of the microphone of the present application by adding the connection holes between the edge and the center, thereby making the sound-related voltage signal output by the microphone more accurate and stable.

附图说明Description of drawings

为了更清楚地说明本发明实施例的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,应当理解,以下附图仅示出了本发明的某些实施例,因此不应被看作是对范围的限定,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他相关的附图。In order to illustrate the technical solutions of the embodiments of the present invention more clearly, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention, and thus It should be regarded as a limitation on the scope, and those skilled in the art can also obtain other related drawings based on these drawings without creative work.

图1为本发明实施例提供的一种新型压电式MEMS麦克风的结构的结构示意图;Fig. 1 is the structural representation of the structure of a kind of novel piezoelectric MEMS microphone that the embodiment of the present invention provides;

图2为发明一实施例提供的另一种新型压电式MEMS麦克风的结构的结构示意图;Fig. 2 is the structural representation of the structure of another novel piezoelectric MEMS microphone provided by an embodiment of the invention;

图3为发明一实施例提供的另一种新型压电式MEMS麦克风的结构的示意图;Fig. 3 is the schematic diagram of the structure of another novel piezoelectric MEMS microphone provided by an embodiment of the invention;

图4为发明一实施例提供的另一种新型压电式MEMS麦克风的结构的示意图;4 is a schematic diagram of the structure of another novel piezoelectric MEMS microphone provided by an embodiment of the invention;

图5为发明一实施例提供的另一种新型压电式MEMS麦克风的结构的示意图;5 is a schematic diagram of the structure of another novel piezoelectric MEMS microphone provided by an embodiment of the invention;

图6为发明一实施例提供的一种新型压电式MEMS麦克风的结构的圆形边缘孔弧长尺寸的变化对整体麦克风结构谐振频率的影响示意图;Fig. 6 is a schematic diagram of the influence of a change in the arc length of the circular edge hole of the structure of a novel piezoelectric MEMS microphone on the resonant frequency of the overall microphone structure provided by an embodiment of the invention;

图7为发明一实施例提供的一种新型压电式MEMS麦克风的结构的中心第一连接孔、第二连接孔边长的变化对整体麦克风谐振频率的影响示意图;7 is a schematic diagram of the influence of the change of the side lengths of the first connection hole and the second connection hole in the center of the structure of a novel piezoelectric MEMS microphone provided by an embodiment of the invention on the resonant frequency of the overall microphone;

图8为发明一实施例提供的一种新型压电式MEMS麦克风的结构中心空腔的半径变化对麦克风整体结构谐振频率的影响示意图;Fig. 8 is a schematic diagram of the influence of the radius change of the structure central cavity of a novel piezoelectric MEMS microphone on the resonant frequency of the overall structure of the microphone provided by an embodiment of the invention;

图9为发明一实施例提供的一种MEMS压电麦克风的灵敏度曲线示意图;9 is a schematic diagram of a sensitivity curve of a MEMS piezoelectric microphone provided by an embodiment of the invention;

图10为本发明一实施例提供的一种MEMS压电麦克风的频响曲线示意图。FIG. 10 is a schematic diagram of a frequency response curve of a MEMS piezoelectric microphone provided by an embodiment of the present invention.

图标:10-衬底;20-第一电极层;30-压电结构层;40-第二电极层;50-边缘孔;60-第一连接孔;70-第二连接孔;80-第二压电结构层;90-第三电极层。Icons: 10-substrate; 20-first electrode layer; 30-piezoelectric structure layer; 40-second electrode layer; 50-edge hole; 60-first connection hole; 70-second connection hole; 80-th Two piezoelectric structural layers; 90—the third electrode layer.

具体实施方式Detailed ways

为使本发明实施例的目的、技术方案和优点更加清楚,下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本发明一金属板实施例,而不是全部的实施例。通常在此处附图中描述和示出的本发明实施例的组件可以以各种不同的配置来布置和设计。In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is an embodiment of the metal plate of the present invention, but not all embodiments. The components of the embodiments of the invention generally described and illustrated in the figures herein may be arranged and designed in a variety of different configurations.

因此,以下对在附图中提供的本发明的实施例的详细描述并非旨在限制要求保护的本发明的范围,而是仅仅表示本发明的选定实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。Accordingly, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

为了使本发明的实施过程更加清楚,下面将会结合附图进行详细说明。In order to make the implementation process of the present invention clearer, the following will be described in detail in conjunction with the accompanying drawings.

图1为发明实施例提供的一种新型压电式MEMS麦克风的结构的结构示意图;如图1所示,本申请提供一种新型压电式MEMS麦克风的结构,结构包括:衬底10、压电结构层30、第一电极层20和第二电极层40;衬底10为空腔结构,且空腔结构的衬底10的一面设置有开口,第一电极层20覆盖设置在开口位置,压电结构层30设置在第一电极层20远离衬底10的一侧,第二电极层40设置在压电结构层30远离第一电极层20的一侧,且第一电极层20、压电结构层30和第二电极层40上相同的位置设置有贯穿的边缘孔50,边缘孔50分布在第一电极层20、压电结构层30和第二电极层40的边缘位置。Fig. 1 is the structure schematic diagram of the structure of a kind of novel piezoelectric MEMS microphone that the embodiment of the invention provides; As shown in Fig. 1, the application provides the structure of a kind of novel piezoelectric MEMS microphone, and structure comprises: substrate 10, piezoelectric The electrical structure layer 30, the first electrode layer 20 and the second electrode layer 40; the substrate 10 is a cavity structure, and one side of the substrate 10 of the cavity structure is provided with an opening, and the first electrode layer 20 is covered and arranged at the opening position, The piezoelectric structure layer 30 is disposed on the side of the first electrode layer 20 away from the substrate 10, the second electrode layer 40 is disposed on the side of the piezoelectric structure layer 30 away from the first electrode layer 20, and the first electrode layer 20, piezoelectric The electrical structure layer 30 and the second electrode layer 40 are provided with through edge holes 50 at the same positions, and the edge holes 50 are distributed at the edge positions of the first electrode layer 20 , the piezoelectric structure layer 30 and the second electrode layer 40 .

该麦克风的结构从下往上依次为衬底10、第一电极层20、压电结构层30和第二电极层40,该衬底10的形状和尺寸根据实际需要而进行设置,在此不做具体限定,为了方便说明,在此以该衬底10的形状为长方体的空腔结构进行说明,长方体空腔结构的该衬底10的一个面上设置有开口,该开口的尺寸根据实际需要而定,为了方便说明,在此以该开口的尺寸和形状与该衬底10开口一面的尺寸和形状相同,该开口位置上依次覆盖设置有第一电极层20、压电结构层30和第二电极层40,该第一电极层20、压电结构层30和第二电极层40均为薄膜状结构,使得该第一电极层20、压电结构层30和第二电极层40可以在声音信号的作用下发生震动,且该第一电极层20、压电结构层30和第二电极层40的边缘位置设置有边缘孔50,该边缘孔50为长条形孔洞,且该边缘孔50贯穿第一电极层20、压电结构层30和第二电极层40,该边缘孔50的具体形状根据该开口的形状进行设置,一般的,若该开口的形状为圆形,则该边缘孔50的形状为围绕该圆形开口的边缘位置设置的弧形孔洞,若该开口的形状为矩形,则该边缘孔50的形状为设置在该矩形边缘位置的多条直线形孔洞。The structure of the microphone includes substrate 10, first electrode layer 20, piezoelectric structure layer 30, and second electrode layer 40 from bottom to top. The shape and size of the substrate 10 are set according to actual needs, and are not described here To be specifically defined, for the convenience of description, the substrate 10 is described here as a cuboid cavity structure. One surface of the substrate 10 of the cuboid cavity structure is provided with an opening, and the size of the opening is based on actual needs. However, for the convenience of description, the size and shape of the opening are the same as the size and shape of the opening side of the substrate 10, and the position of the opening is sequentially covered with the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer. Two electrode layers 40, the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40 are film-like structures, so that the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40 can be Vibration occurs under the action of the sound signal, and the edge positions of the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40 are provided with edge holes 50, the edge holes 50 are elongated holes, and the edge holes 50 runs through the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40. The specific shape of the edge hole 50 is set according to the shape of the opening. Generally, if the shape of the opening is circular, the edge The shape of the hole 50 is an arc-shaped hole arranged around the edge of the circular opening. If the shape of the opening is rectangular, the shape of the edge hole 50 is a plurality of linear holes arranged at the edge of the rectangle.

本申请的该麦克风结构设置贯穿该第一电极层20、压电结构层30和第二电极层40的边缘孔50,使得该第一电极层20、压电结构层30和第二电极层40构成的振动层在声音信号的作用下振幅得到增大,从而使得本申请的麦克风输出的声音信号的平坦度和灵敏度更高,本申请的麦克风在获取声音信号的时候,该第一电极层20、压电结构层30和第二电极层40接收到声音信号的振动,并在声音信号的振动的作用下,进行共振,且振幅得到增大,由于该压电结构层30在震动的作用下表面电荷发生转移,使得该第一电极层20和第二电极层40上的电荷量发生改变,即该麦克风结构的输出电压发生改变,通过对输出电压信号进行检测,可以得到准确的声音信号,由于麦克风的灵敏度与该麦克风中的振动部位的谐振频率负相关,并且谐振频率与振幅也为负相关,则该麦克风的灵敏度与该麦克风中的振动部位的振幅正相关,即本申请通过增加边缘孔50,使得本申请的麦克风检测声音信号的灵敏度得到提高,进而使得该麦克风输出的与声音相关的电压信号更准确稳定。The microphone structure of the present application is provided with an edge hole 50 passing through the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40, so that the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40 The amplitude of the formed vibration layer is increased under the action of the sound signal, so that the flatness and sensitivity of the sound signal output by the microphone of the present application are higher. When the microphone of the present application acquires the sound signal, the first electrode layer 20 , the piezoelectric structure layer 30 and the second electrode layer 40 receive the vibration of the sound signal, and under the action of the vibration of the sound signal, resonate, and the amplitude is increased, because the piezoelectric structure layer 30 is under the action of the vibration The surface charge is transferred, so that the amount of charge on the first electrode layer 20 and the second electrode layer 40 changes, that is, the output voltage of the microphone structure changes. By detecting the output voltage signal, an accurate sound signal can be obtained. Since the sensitivity of the microphone is negatively correlated with the resonant frequency of the vibrating part in the microphone, and the resonant frequency and the amplitude are also negatively correlated, the sensitivity of the microphone is positively correlated with the amplitude of the vibrating part in the microphone, that is, the present application increases the edge The hole 50 improves the sensitivity of the sound signal detection of the microphone of the present application, thereby making the sound-related voltage signal output by the microphone more accurate and stable.

在实际应用中,该第一电极层20和第二电极层40的材料可以选择钼、钛、金、铜及合金等,压电结构层30的材料为压电材料,压电材料是指受到压力作用在其两端面出现电荷的一大类单晶或多晶的固体材料,是进行能量转换和信号传递的重要载体。压电材料本身具有良好的动态特性,振型丰富,各种材料的声发射频谱几乎覆盖整个频段。压电材料以其优异的机电耦合效应,可以快速响应外力。本专利中压电材料可选取氮化铝,氮化铝相较于其他MEMS压电材料(例如氧化锌、锆钛酸铅)具有相同或更高的性能,而且它的兼容性要比两种材料中任何一种都要好。此外,压电材料还可以选取铌酸锂等。In practical applications, the materials of the first electrode layer 20 and the second electrode layer 40 can be selected from molybdenum, titanium, gold, copper and alloys, etc., and the material of the piezoelectric structure layer 30 is a piezoelectric material. A large class of single crystal or polycrystalline solid materials with charges appearing on both ends of them under pressure are important carriers for energy conversion and signal transmission. Piezoelectric materials have good dynamic characteristics and rich mode shapes, and the acoustic emission spectrum of various materials covers almost the entire frequency band. With its excellent electromechanical coupling effect, piezoelectric materials can quickly respond to external forces. The piezoelectric material in this patent can be aluminum nitride, which has the same or higher performance than other MEMS piezoelectric materials (such as zinc oxide, lead zirconate titanate), and its compatibility is better than that of the two Either material is better. In addition, the piezoelectric material can also choose lithium niobate and the like.

可选地,该结构的边缘孔50的位置为四个,四个边缘孔50两两对应设置。Optionally, there are four edge holes 50 in this structure, and the four edge holes 50 are set in pairs.

四个边缘孔50设置在置贯该第一电极层20、压电结构层30和第二电极层40,且两两相对,即若该开口位置的形状为圆形,则相邻的两个边缘孔50中心位置的夹角为90度,呈现出弧形状,并且边缘孔的尺寸可更改,相对两个边缘孔50中心位置的连线进过圆心位置,若该开口位置的形状为矩形,则四个圆弧孔分别设置在矩形的四个边线上,且该四个边缘孔50的中心位置分别与矩形的开口的四条边的中心位置重合,四个边缘孔50的设置使得本申请的麦克风具有对称结构,对称结构的麦克风在声音信号的作用下,麦克风结构的每部分的振动频率和振动幅度均相同,避免了麦克风结构的每部分在不同振动频率或者不同振幅的作用下,能量相互抵消造成的能量损失,由于本申请的麦克风结构减少了能量的损耗,从而使得该麦克风获取到的声音信号的振动信息更准确,减少不对称结构带来的振动不均衡,使得获取得到的声音信号的振动信息的误差。The four edge holes 50 are arranged through the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40, and are opposite to each other, that is, if the shape of the opening position is circular, the adjacent two The included angle at the center of the edge hole 50 is 90 degrees, showing an arc shape, and the size of the edge hole can be changed. The line connecting the centers of the two edge holes 50 passes through the center of the circle. If the shape of the opening is rectangular, Then the four arc holes are arranged on the four sides of the rectangle respectively, and the center positions of the four edge holes 50 coincide with the center positions of the four sides of the opening of the rectangle respectively. The setting of the four edge holes 50 makes the application The microphone has a symmetrical structure. Under the action of the sound signal, the vibration frequency and vibration amplitude of each part of the microphone structure are the same, which avoids the energy interaction of each part of the microphone structure under the action of different vibration frequencies or different amplitudes. To offset the energy loss caused by the microphone structure of the present application, the energy loss is reduced, so that the vibration information of the sound signal obtained by the microphone is more accurate, and the vibration imbalance caused by the asymmetric structure is reduced, so that the obtained sound signal The error of the vibration information.

图2为发明实施例提供的另一种新型压电式MEMS麦克风的结构的结构示意图;如图2所示,可选地,该结构还包括第一连接孔60和第二连接孔70,第一连接孔60和第二连接孔70的轴线相互垂直,且第一连接孔60和第二连接孔70贯穿第一电极层20、压电结构层30和第二电极层40,且第一连接孔60和第二连接孔70的两端分别连接对应的两个边缘孔50。Fig. 2 is the structural representation of the structure of another kind of novel piezoelectric MEMS microphone that the embodiment of the invention provides; As shown in Fig. 2, optionally, this structure also comprises first connecting hole 60 and second connecting hole 70, the The axes of the first connection hole 60 and the second connection hole 70 are perpendicular to each other, and the first connection hole 60 and the second connection hole 70 pass through the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40, and the first connection Two ends of the hole 60 and the second connecting hole 70 are respectively connected to two corresponding edge holes 50 .

该第一连接孔60和第二连接孔70相互垂直设置在该第一电极层20、压电结构层30和第二电极层40上,且该第一连接孔60和该第二连接孔70的均将该第一电极层20、压电结构层30和第二电极层40贯穿,该边缘孔50的数量为四个,则该第一连接孔60连接四个边缘孔50中的相对应的两个,第二连接孔70连接四个边缘孔50剩余的两个边缘孔50,若该开口为圆形孔,则该第一连接孔60和第二连接孔70分别连接对应两个边缘孔50的中心位置,使得该第一连接孔60和第二连接孔70经过该圆形的开口的中心位置,若该开口为矩形孔,则该第一连接孔60和第二连接孔70分别连接该矩形的开口相对的两个边上的边缘孔50,使得该第一连接孔60和第二连接孔70的交点与该矩形的开口的中点重合,在该麦克风上设置有该第一连接孔60和第二连接孔70,将该麦克风的第一电极层20、压电结构层30和第二电极层40均分为四份,使得本申请的麦克风在工作的时候,四个部分的振动部分别向上或者向下翘起,使得本申请的麦克风在获取声音信号的振动信息的振幅在四个部分的振动部的作用下进一步的增大,即使得该麦克风在相同强度的声音信号的作用下,振动幅度更大,振动频率减小,从而使得该麦克风的频带内的平坦度得到进一步的提高,从而使得获取到的声音信息的质量更高,进而使得本申请的麦克风检测声音信号更加准确;另外,第一连接孔60和第二连接孔70减少了振动部的需要被固定的面积,也进一步的提高本申请麦克风获取声音信号的振幅,从而使得本申请输出压电的能力得到增强。The first connection hole 60 and the second connection hole 70 are vertically arranged on the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40, and the first connection hole 60 and the second connection hole 70 The first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40 are all penetrated, the number of the edge holes 50 is four, and the first connection hole 60 is connected to the corresponding one of the four edge holes 50. The second connection hole 70 connects the remaining two edge holes 50 of the four edge holes 50. If the opening is a circular hole, the first connection hole 60 and the second connection hole 70 are respectively connected to the corresponding two edges. The central position of the hole 50, so that the first connecting hole 60 and the second connecting hole 70 pass through the central position of the circular opening, if the opening is a rectangular hole, the first connecting hole 60 and the second connecting hole 70 respectively Connect the edge holes 50 on the opposite sides of the rectangular opening so that the intersection of the first connecting hole 60 and the second connecting hole 70 coincides with the midpoint of the rectangular opening, and the microphone is provided with the first The connection hole 60 and the second connection hole 70 divide the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40 of the microphone into four parts, so that when the microphone of the present application is working, the four parts The vibrating parts are tilted upwards or downwards respectively, so that the amplitude of the vibration information of the microphone in the acquisition of the sound signal is further increased under the action of the four parts of the vibrating parts, that is, the microphone can be used under the sound signal of the same intensity. Under the action of , the vibration amplitude is larger and the vibration frequency is reduced, so that the flatness in the frequency band of the microphone is further improved, so that the quality of the acquired sound information is higher, and then the microphone of the present application detects sound signals More accurate; In addition, the first connection hole 60 and the second connection hole 70 reduce the area that needs to be fixed by the vibrating part, and also further improve the amplitude of the sound signal acquired by the microphone of the present application, so that the ability of the application to output piezoelectricity is improved. enhanced.

图3为发明实施例提供的另一种新型压电式MEMS麦克风的结构的结构示意图;如图3所示,可选地,该结构还包括第一连接孔和第二连接孔,第一连接孔和第二连接孔的轴线相互垂直,且第一连接孔和第二连接孔贯穿第一电极层、压电结构层和第二电极层,且第一连接孔和第二连接孔的两端分别连接对应的两个边缘孔的连接处,如此设置,使得本实施例中由压电结构层30、第一电极层20、第二电极层40、边缘孔50、第一连接孔60和第二连接孔70组成的振动部在相同的力的作用下产生的振幅更大,进而使得本申请传输声信号的灵敏度高。Fig. 3 is the structure schematic diagram of the structure of another kind of novel piezoelectric MEMS microphone that the embodiment of the invention provides; As shown in Fig. The axes of the hole and the second connection hole are perpendicular to each other, and the first connection hole and the second connection hole pass through the first electrode layer, the piezoelectric structure layer and the second electrode layer, and the two ends of the first connection hole and the second connection hole Respectively connect the joints of the corresponding two edge holes, so that in this embodiment, the piezoelectric structure layer 30, the first electrode layer 20, the second electrode layer 40, the edge hole 50, the first connection hole 60 and the second The vibrating part composed of the two connection holes 70 can generate larger vibration amplitude under the action of the same force, which further makes the sensitivity of the acoustic signal transmission of the present application high.

图4为发明实施例提供的另一种新型压电式MEMS麦克风的结构的结构示意图;如图4所示,可选地,该结构还包括第二压电结构层80和第三电极层90,第二压电结构层80设置在第二电极层40远离衬底10的一侧,第三电极层90设置在第二压电结构层80远离第二电极的一侧。Fig. 4 is a schematic structural view of the structure of another novel piezoelectric MEMS microphone provided by the embodiment of the invention; as shown in Fig. 4, optionally, the structure also includes a second piezoelectric structure layer 80 and a third electrode layer 90 , the second piezoelectric structure layer 80 is disposed on the side of the second electrode layer 40 away from the substrate 10 , and the third electrode layer 90 is disposed on the side of the second piezoelectric structure layer 80 away from the second electrode.

该第二电极层40的上部设置有第二压电结构层80,该第二压电结构层80的上部设置有第三电极层90,该压电结构层30和第二压电结构层80均会在声音信号的作用下产生振动,从而改变该压电结构层30和第二压电结构层80中的电压信息,从而使得本申请获取的声音信息的准确度得到进一步提高,将振动部在原来的第一电极层20、压电结构层30和第二电极层40顶部增加该第二压电结构层80和第三电极层90使得该振动部的谐振频率进一步的降低,从而使得该麦克风的频带内的平坦度得到进一步的提高,从而使得获取到的声音信息的质量更高。The upper part of the second electrode layer 40 is provided with the second piezoelectric structure layer 80, the upper part of the second piezoelectric structure layer 80 is provided with the third electrode layer 90, the piezoelectric structure layer 30 and the second piezoelectric structure layer 80 Both will generate vibration under the action of the sound signal, thereby changing the voltage information in the piezoelectric structure layer 30 and the second piezoelectric structure layer 80, so that the accuracy of the sound information obtained by the application is further improved, and the vibration part Adding the second piezoelectric structure layer 80 and the third electrode layer 90 on top of the original first electrode layer 20, piezoelectric structure layer 30 and second electrode layer 40 further reduces the resonant frequency of the vibrating part, so that the The flatness within the frequency band of the microphone is further improved, so that the quality of the acquired sound information is higher.

图5为发明实施例提供的另一种新型压电式MEMS麦克风的结构的结构示意图;如图5所示,可选地,该第二压电结构层80和第三电极层90上还设置有第一连接孔60和第二连接孔70,该第一连接孔60和第二连接孔70将该麦克风的第一电极层20、压电结构层30、第二电极层40、第二压电结构层80和第三电极层90均分为四份,使得本申请的麦克风在工作的时候,四个部分的振动部分别向上或者向下翘起,使得本申请的麦克风在获取声音信号的振动信息的振幅在四个部分的振动部的作用下进一步的增大,即使得该麦克风在相同强度的声音信号的作用下,振动幅度更大,振动频率减小,从而使得该麦克风的频带内的平坦度得到进一步的提高,从而使得获取到的声音信息的质量更高,进而使得本申请的麦克风检测声音信号更加准确;另外,第一连接孔60和第二连接孔70减少了振动部的需要被固定的面积,也进一步的提高本申请麦克风获取声音信号的振幅,从而使得本申请输出压电的能力得到增强。Fig. 5 is the structure schematic diagram of the structure of another kind of novel piezoelectric MEMS microphone that the embodiment of the invention provides; There are a first connection hole 60 and a second connection hole 70, and the first connection hole 60 and the second connection hole 70 connect the first electrode layer 20, the piezoelectric structure layer 30, the second electrode layer 40, and the second piezoelectric layer of the microphone to each other. The electrical structure layer 80 and the third electrode layer 90 are equally divided into four parts, so that when the microphone of the present application is working, the vibrating parts of the four parts are respectively tilted up or down, so that the microphone of the present application can obtain sound signals. The amplitude of the vibration information is further increased under the action of the vibration parts of the four parts, that is, the microphone has a larger vibration amplitude and a reduced vibration frequency under the action of the sound signal of the same intensity, so that within the frequency band of the microphone The flatness is further improved, so that the quality of the acquired sound information is higher, and the microphone of the present application detects the sound signal more accurately; in addition, the first connection hole 60 and the second connection hole 70 reduce the vibration of the vibration part. The area that needs to be fixed further increases the amplitude of the sound signal acquired by the microphone of this application, so that the ability of this application to output piezoelectricity is enhanced.

图6为发明一实施例提供的一种新型压电式MEMS麦克风的结构的圆形边缘孔弧长尺寸的变化对整体麦克风结构谐振频率的影响示意图;图7为发明一实施例提供的一种新型压电式MEMS麦克风的结构的中心第一连接孔、第二连接孔边长的变化对整体麦克风谐振频率的影响示意图;图8为发明一实施例提供的一种新型压电式MEMS麦克风的结构中心空腔的半径变化对麦克风整体结构谐振频率的影响示意图;图9为发明一实施例提供的一种MEMS压电麦克风的灵敏度示意图;图10为本发明一实施例提供的一种MEMS压电麦克风的频响曲线示意图;本实施例提供的结构,可以通过优化器件尺寸,使得本申请的结构达到较低的频率范围,其中可以优化的尺寸包括第一电极层20、第二电极层40、压电材料层30的尺寸,包含大小与材料厚度,使得本申请的结构达到较低的频率范围,进而在低频压电器件设计制备方面具有很大潜能,如图6所示,横坐标表示圆形空腔的边缘孔弧长大小,纵坐标表示结构的谐振频率,改变边缘孔弧长,根据数据示意图,在其他参数确定的情况下,边缘孔弧长的增加会降低器件的谐振频率,进而影响麦克风结构的灵敏度;如图7所示,横坐标表示第一连接孔与第二连接孔宽度的大小,纵坐标表示结构的谐振频率,根据数据示意图,在其他参数确定的情况下,中心连接孔宽度的增加会使得器件的谐振频率升高,与谐振频率呈正相关;如图8所示,横坐标表示开口位置处圆形空腔的大小,纵坐标表示结构的谐振频率,根据数据示意图,在其他参数确定的情况下,空腔尺寸的增加会使得器件的谐振频率降低,与谐振频率呈负相关,是影响器件谐振频率的重要因素。此外,结构层各个单元的厚度也对结构起到关键作用,应从仿真结构优化出来,考虑工艺制备可行性最终确定最优尺寸。同时,对结构进行多物理场耦合仿真还可以得到,如图9所示,横坐标表示频率,纵坐标表示结构的灵敏度,即输出电压与输入声压的比例关系,此示意图可以表示麦克风灵敏度随振动频率的变化情况,可以得出,结构的灵敏度可达0.225mV/Pa,并且灵敏度还可以通过进一步优化结构关键尺寸并结合材料的优化得到进一步的提升。此外,图10所示为本发明五实施例所示麦克风结构的频率响应曲线,表示结构的输出与输入频率之间的关系,可以看到在20-20kHz频率范围内,结构的不平坦度约为0.45dB,最大不平坦度远在3dB以内,频响曲线平坦度较高。Fig. 6 is a schematic diagram of the influence of the change of the arc length of the circular edge hole of the structure of a novel piezoelectric MEMS microphone provided by an embodiment of the invention on the resonant frequency of the overall microphone structure; A schematic diagram of the influence of the change of the length of the first connection hole and the second connection hole side length on the overall microphone resonance frequency in the structure of the novel piezoelectric MEMS microphone; Fig. 8 is a schematic diagram of a novel piezoelectric MEMS microphone provided by an embodiment of the invention A schematic diagram of the influence of the radius change of the central cavity of the structure on the resonant frequency of the overall structure of the microphone; Figure 9 is a schematic diagram of the sensitivity of a MEMS piezoelectric microphone provided by an embodiment of the invention; Figure 10 is a schematic diagram of a MEMS piezoelectric microphone provided by an embodiment of the invention Schematic diagram of the frequency response curve of an electric microphone; the structure provided in this embodiment can make the structure of the present application reach a lower frequency range by optimizing the device size, wherein the optimized size includes the first electrode layer 20 and the second electrode layer 40 1. The size of the piezoelectric material layer 30, including size and material thickness, makes the structure of the present application reach a lower frequency range, and then has great potential in the design and manufacture of low-frequency piezoelectric devices, as shown in Figure 6, the abscissa indicates The arc length of the edge hole of the circular cavity, the ordinate indicates the resonant frequency of the structure, changing the arc length of the edge hole, according to the data schematic diagram, when other parameters are determined, the increase of the arc length of the edge hole will reduce the resonant frequency of the device, Then affect the sensitivity of the microphone structure; as shown in Figure 7, the abscissa represents the size of the width of the first connection hole and the second connection hole, and the ordinate represents the resonant frequency of the structure. According to the data schematic diagram, when other parameters are determined, the center The increase in the width of the connection hole will increase the resonant frequency of the device, which is positively correlated with the resonant frequency; as shown in Figure 8, the abscissa indicates the size of the circular cavity at the opening position, and the ordinate indicates the resonant frequency of the structure. According to the data schematic diagram , when other parameters are determined, the increase of the cavity size will reduce the resonant frequency of the device, which is negatively correlated with the resonant frequency, and is an important factor affecting the resonant frequency of the device. In addition, the thickness of each unit of the structural layer also plays a key role in the structure. It should be optimized from the simulated structure, and the optimal size should be finally determined considering the feasibility of the process preparation. At the same time, the multi-physics field coupling simulation of the structure can also be obtained, as shown in Figure 9, the abscissa represents the frequency, and the ordinate represents the sensitivity of the structure, that is, the proportional relationship between the output voltage and the input sound pressure. This schematic diagram can show that the sensitivity of the microphone varies with From the change of vibration frequency, it can be concluded that the sensitivity of the structure can reach 0.225mV/Pa, and the sensitivity can be further improved by further optimizing the key dimensions of the structure combined with the optimization of materials. In addition, Fig. 10 shows the frequency response curve of the microphone structure shown in the fifth embodiment of the present invention, which shows the relationship between the output of the structure and the input frequency. It can be seen that in the frequency range of 20-20kHz, the unevenness of the structure is about It is 0.45dB, the maximum unevenness is far within 3dB, and the flatness of the frequency response curve is relatively high.

可选地,该结构还包括支撑部,支撑部设置在衬底10远离第一电极的一侧。Optionally, the structure further includes a support portion, and the support portion is disposed on a side of the substrate 10 away from the first electrode.

该支撑部设置在该衬底10远离第一电极层20的一侧,该支撑部用于对该衬底10进行支撑,防止压电结构层30断裂,当麦克风结构振动时,支撑层可以起到保护作用,防止过载时结构出现断裂。因此在实际应用中,一般使用Si-Si键合工艺制备衬底10底部的支撑层。The support part is arranged on the side of the substrate 10 away from the first electrode layer 20, and the support part is used to support the substrate 10 to prevent the piezoelectric structure layer 30 from breaking. When the microphone structure vibrates, the support layer can act To protect and prevent the structure from breaking when overloaded. Therefore, in practical applications, the support layer at the bottom of the substrate 10 is generally prepared using a Si—Si bonding process.

可选地,该结构还包括氧化硅部与器件层硅部,氧化硅部设置在衬底10的上方,与衬底10的上表面一致,具有相同的开口位置,器件层硅部放置在氧化硅上部且放置在第一电极层远离第一压电层的一侧。Optionally, the structure further includes a silicon oxide part and a device layer silicon part, the silicon oxide part is arranged above the substrate 10, is consistent with the upper surface of the substrate 10, and has the same opening position, and the device layer silicon part is placed on the oxide layer. The upper part of the silicon is placed on the side of the first electrode layer away from the first piezoelectric layer.

该衬底层结构采用SOI基底,采用SOI基底可减少工艺工序,提升工艺制备的可靠性。SOI底层硅与SOI氧化硅部分作为支撑层,同时底层硅与氧化硅部均采用悬臂梁衬底10所示的开口结构,SOI顶层器件层硅用于对该第一电极层20、压电结构层30和第二电极层40组成的振动部进行支撑,进而相当于增加整个振动部的厚度,放置在第一电极层远离第一压电层的一侧,与电极层与压电层的结构上表面一致。SOI顶层器件层硅的存在增加了整个悬臂梁的厚度,提升了器件的可靠性,相对的提升了器件的谐振频率,从而使得该麦克风的频带内的平坦度得到进一步的提高,从而使得获取到的声音信息的质量更高。The substrate layer structure adopts an SOI substrate, which can reduce process steps and improve the reliability of process preparation. The SOI bottom silicon and SOI silicon oxide part are used as supporting layers, and the bottom silicon and silicon oxide parts both adopt the opening structure shown in the cantilever beam substrate 10, and the SOI top device layer silicon is used for the first electrode layer 20 and the piezoelectric structure. Layer 30 and the second electrode layer 40 are supported by the vibrating part, which is equivalent to increasing the thickness of the entire vibrating part. The upper surface is consistent. The presence of silicon on the top layer of the SOI device increases the thickness of the entire cantilever beam, improves the reliability of the device, and relatively increases the resonant frequency of the device, thereby further improving the flatness of the microphone's frequency band. The audio information is of higher quality.

可选地,该结构还包括硅层,硅层设置在第一电极层20靠近衬底10的一侧。Optionally, the structure further includes a silicon layer, and the silicon layer is disposed on a side of the first electrode layer 20 close to the substrate 10 .

该硅层用于对该第一电极层20、压电材料层和第二电极层40进行支撑,以增加该第一电极层20、压电结构层30和第二电极层40组成的振动部的厚度,从而使得在相同强度的声信号的作用下,该第一电极层20、压电结构层30和第二电极层40组成的振动部产生振动的振幅降低,即该压电结构层30的形变量更小,进而改变该压电结构层30中的电压信息,从而使得本申请获取的声音信息的准确度得到进一步提高,并且加厚该震动部使得该震动部的谐振频率进一步的降低,从而使得该麦克风的频带内的平坦度得到进一步的提高,从而使得获取到的声音信息的质量更高。The silicon layer is used to support the first electrode layer 20, the piezoelectric material layer and the second electrode layer 40, so as to increase the vibration part composed of the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40 thickness, so that under the action of an acoustic signal of the same intensity, the vibration amplitude of the vibrating part composed of the first electrode layer 20, the piezoelectric structure layer 30 and the second electrode layer 40 is reduced, that is, the piezoelectric structure layer 30 The deformation of the piezoelectric structure layer 30 is smaller, thereby changing the voltage information in the piezoelectric structure layer 30, so that the accuracy of the sound information obtained by the present application is further improved, and thickening the vibrating part further reduces the resonant frequency of the vibrating part , so that the flatness within the frequency band of the microphone is further improved, so that the quality of the acquired sound information is higher.

本申请提供的结构的工艺制备方法:准备硅片,在硅衬底上依次溅射电极材料/压电材料/电极材料,从上到下依次图案化电极材料/压电材料/电极材料,并完成电极焊盘的刻蚀,最后进行背腔刻蚀,刻蚀衬底开口空腔The process preparation method of the structure provided by this application: prepare a silicon wafer, sequentially sputter electrode material/piezoelectric material/electrode material on a silicon substrate, pattern the electrode material/piezoelectric material/electrode material sequentially from top to bottom, and Complete the etching of the electrode pad, and finally perform back cavity etching to etch the substrate opening cavity

本申请提供的一种新型压电式MEMS麦克风的装置,装置包括:数模转化装置和上述任意一项的新型压电式MEMS麦克风的结构,数模转化装置的正负极分别与结构的第一电极层20和第二电极层40电连接,用于将第一电极层20和第二电极层40输出的电压信号转化为数字信号。The application provides a device for a novel piezoelectric MEMS microphone, which includes: a digital-to-analog conversion device and the structure of any one of the above-mentioned novel piezoelectric MEMS microphones, the positive and negative poles of the digital-to-analog conversion device are respectively connected to the first structure of the structure. The first electrode layer 20 is electrically connected to the second electrode layer 40 for converting the voltage signal output by the first electrode layer 20 and the second electrode layer 40 into a digital signal.

以上仅为本发明的优选实施例而已,并不用于限制本发明,对于本领域的技术人员来说,本发明可以有各种更改和变化。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The above are only preferred embodiments of the present invention, and are not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and changes. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.

Claims (6)

1.一种新型压电式MEMS麦克风的结构,其特征在于,所述结构包括:衬底、压电结构层、第一电极层和第二电极层;所述衬底为空腔结构,且空腔结构的所述衬底的一面设置有开口,所述第一电极层覆盖设置在所述开口位置上方,所述压电结构层设置在所述第一电极层远离所述衬底的一侧,所述第二电极层设置在所述压电结构层远离所述第一电极层的一侧,且所述第一电极层、所述压电结构层和所述第二电极层上相同的位置设置有贯穿的边缘孔,所述边缘孔分布在所述第一电极层、所述压电结构层和所述第二电极层的边缘位置;所述结构的所述边缘孔的位置为四个,四个所述边缘孔两两对应设置,所述结构还包括第一连接孔和第二连接孔,所述第一连接孔和所述第二连接孔的轴线相互垂直,且所述第一连接孔和所述第二连接孔贯穿所述第一电极层、所述压电结构层和所述第二电极层,且所述第一连接孔和所述第二连接孔的两端分别连接对应的两个边缘孔。1. the structure of a novel piezoelectric MEMS microphone is characterized in that, said structure comprises: substrate, piezoelectric structure layer, first electrode layer and second electrode layer; Described substrate is cavity structure, and One side of the substrate of the cavity structure is provided with an opening, the first electrode layer is covered and arranged above the opening position, and the piezoelectric structure layer is arranged on a side of the first electrode layer away from the substrate. side, the second electrode layer is arranged on the side of the piezoelectric structure layer away from the first electrode layer, and the first electrode layer, the piezoelectric structure layer and the second electrode layer are the same The position of the penetrating edge hole is provided, and the edge hole is distributed at the edge positions of the first electrode layer, the piezoelectric structure layer and the second electrode layer; the position of the edge hole of the structure is Four, the four edge holes are set in pairs, the structure also includes a first connection hole and a second connection hole, the axes of the first connection hole and the second connection hole are perpendicular to each other, and the The first connection hole and the second connection hole pass through the first electrode layer, the piezoelectric structure layer and the second electrode layer, and the two ends of the first connection hole and the second connection hole Connect the corresponding two edge holes respectively. 2.根据权利要求1所述的新型压电式MEMS麦克风的结构,其特征在于,所述结构还包括第二压电结构层和第三电极层,所述第二压电结构层设置在所述第二电极层远离所述衬底的一侧,所述第三电极层设置在所述第二压电结构层远离所述第二电极的一侧。2. the structure of novel piezoelectric MEMS microphone according to claim 1, is characterized in that, described structure also comprises second piezoelectric structure layer and the 3rd electrode layer, and described second piezoelectric structure layer is arranged on said The second electrode layer is disposed on a side away from the substrate, and the third electrode layer is disposed on a side of the second piezoelectric structure layer away from the second electrode. 3.根据权利要求2所述的新型压电式MEMS麦克风的结构,其特征在于,所述第一连接孔和所述第二连接孔贯穿所述第二压电结构层和所述第三电极层。3. The structure of the novel piezoelectric MEMS microphone according to claim 2, wherein the first connection hole and the second connection hole run through the second piezoelectric structure layer and the third electrode layer. 4.根据权利要求3所述的新型压电式MEMS麦克风的结构,其特征在于,所述结构还包括支撑部,所述支撑部设置在所述衬底远离所述第一电极的一侧。4 . The structure of the novel piezoelectric MEMS microphone according to claim 3 , wherein the structure further comprises a support portion, and the support portion is disposed on a side of the substrate away from the first electrode. 5.根据权利要求4所述的新型压电式MEMS麦克风的结构,其特征在于,所述结构还包括氧化硅部与器件层硅部,所述氧化硅部设置在衬底靠近第一电极层的一侧,所述器件层硅部设置在所述氧化硅部与所述第一电极层之间。5. The structure of the novel piezoelectric MEMS microphone according to claim 4, wherein the structure further comprises a silicon oxide portion and a device layer silicon portion, and the silicon oxide portion is arranged on the substrate near the first electrode layer On one side, the silicon part of the device layer is disposed between the silicon oxide part and the first electrode layer. 6.一种新型压电式MEMS麦克风的装置,其特征在于,所述装置包括:数模转化装置和权利要求1-5任意一项所述的新型压电式MEMS麦克风的结构,所述数模转化装置的正负极分别与所述结构的第一电极层和第二电极层电连接,用于将所述第一电极层和所述第二电极层输出的电压信号转化为数字信号。6. A device for a novel piezoelectric MEMS microphone, characterized in that, said device comprises: a digital-to-analog conversion device and the structure of the novel piezoelectric MEMS microphone described in any one of claims 1-5, said digital The positive and negative poles of the mode conversion device are respectively electrically connected to the first electrode layer and the second electrode layer of the structure, and are used to convert the voltage signals output by the first electrode layer and the second electrode layer into digital signals.
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CN119402802A (en) * 2023-07-27 2025-02-07 京东方科技集团股份有限公司 Display panel and display device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102056061A (en) * 2009-10-29 2011-05-11 苏州敏芯微电子技术有限公司 Capacitive miniature silicon microphone and manufacturing method thereof
CN103460721A (en) * 2011-03-31 2013-12-18 巴克-卡琳公司 Acoustic transducer with gap-controlling geometry and method of manufacturing an acoustic transducer
CN107071672A (en) * 2017-05-22 2017-08-18 歌尔股份有限公司 A kind of piezoelectric microphone
CN206948611U (en) * 2017-06-16 2018-01-30 歌尔科技有限公司 A kind of piezoelectric microphones
JP2018041788A (en) * 2016-09-06 2018-03-15 新日本無線株式会社 Piezoelectric device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105721997B (en) * 2015-04-08 2019-04-05 华景科技无锡有限公司 A kind of MEMS silicon microphone and preparation method thereof
US9516421B1 (en) * 2015-12-18 2016-12-06 Knowles Electronics, Llc Acoustic sensing apparatus and method of manufacturing the same
CN109587613B (en) * 2018-12-31 2020-11-10 瑞声声学科技(深圳)有限公司 Piezoelectric microphone
CN110545514B (en) * 2019-08-16 2021-01-08 瑞声声学科技(深圳)有限公司 Piezoelectric MEMS Microphone

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102056061A (en) * 2009-10-29 2011-05-11 苏州敏芯微电子技术有限公司 Capacitive miniature silicon microphone and manufacturing method thereof
CN103460721A (en) * 2011-03-31 2013-12-18 巴克-卡琳公司 Acoustic transducer with gap-controlling geometry and method of manufacturing an acoustic transducer
JP2018041788A (en) * 2016-09-06 2018-03-15 新日本無線株式会社 Piezoelectric device
CN107071672A (en) * 2017-05-22 2017-08-18 歌尔股份有限公司 A kind of piezoelectric microphone
CN206948611U (en) * 2017-06-16 2018-01-30 歌尔科技有限公司 A kind of piezoelectric microphones

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
《不同沉积层的纳米波导谐振腔特性测试》;臧俊斌等;《光子学报》;20160816;第45卷(第8期);第168-172页 *

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