CN113584552B - Preparation method and application of nano composite film - Google Patents
Preparation method and application of nano composite film Download PDFInfo
- Publication number
- CN113584552B CN113584552B CN202110871397.1A CN202110871397A CN113584552B CN 113584552 B CN113584552 B CN 113584552B CN 202110871397 A CN202110871397 A CN 202110871397A CN 113584552 B CN113584552 B CN 113584552B
- Authority
- CN
- China
- Prior art keywords
- molybdenum oxide
- electrodeposition
- preparation
- oxide film
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002114 nanocomposite Substances 0.000 title claims abstract description 31
- 238000002360 preparation method Methods 0.000 title claims abstract description 22
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 43
- 229910000476 molybdenum oxide Inorganic materials 0.000 claims abstract description 41
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 claims abstract description 40
- QGAVSDVURUSLQK-UHFFFAOYSA-N ammonium heptamolybdate Chemical compound N.N.N.N.N.N.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.[Mo].[Mo].[Mo].[Mo].[Mo].[Mo].[Mo] QGAVSDVURUSLQK-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000000463 material Substances 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000004070 electrodeposition Methods 0.000 claims abstract description 21
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 claims abstract description 21
- 239000002105 nanoparticle Substances 0.000 claims abstract description 16
- 239000010408 film Substances 0.000 claims description 47
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 24
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 24
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 13
- 229910052799 carbon Inorganic materials 0.000 claims description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 239000002131 composite material Substances 0.000 claims description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 8
- 229910052737 gold Inorganic materials 0.000 claims description 8
- 239000010931 gold Substances 0.000 claims description 8
- 229910021607 Silver chloride Inorganic materials 0.000 claims description 7
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 239000004332 silver Substances 0.000 claims description 7
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims description 7
- 239000003054 catalyst Substances 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 2
- 239000011540 sensing material Substances 0.000 claims description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract description 26
- 229910052763 palladium Inorganic materials 0.000 abstract description 13
- 238000000034 method Methods 0.000 abstract description 6
- 239000010409 thin film Substances 0.000 description 16
- 101150003085 Pdcl gene Proteins 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000009210 therapy by ultrasound Methods 0.000 description 5
- 238000004502 linear sweep voltammetry Methods 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000002082 metal nanoparticle Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000002086 nanomaterial Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000002687 intercalation Effects 0.000 description 2
- 238000009830 intercalation Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002484 cyclic voltammetry Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D9/00—Electrolytic coating other than with metals
- C25D9/04—Electrolytic coating other than with metals with inorganic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/54—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/56—Platinum group metals
- B01J23/64—Platinum group metals with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/652—Chromium, molybdenum or tungsten
- B01J23/6525—Molybdenum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/40—Catalysts, in general, characterised by their form or physical properties characterised by dimensions, e.g. grain size
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/348—Electrochemical processes, e.g. electrochemical deposition or anodisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K9/00—Tenebrescent materials, i.e. materials for which the range of wavelengths for energy absorption is changed as a result of excitation by some form of energy
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Nanotechnology (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Toxicology (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Composite Materials (AREA)
- Catalysts (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Abstract
Description
技术领域technical field
本发明涉及复合纳米薄膜材料技术领域,更具体的说是涉及一种纳米复合薄膜的制备方法及应用。The invention relates to the technical field of composite nano-film materials, and more particularly to a preparation method and application of a nano-composite film.
背景技术Background technique
纳米复合薄膜材料具有比单一纳米材料更优异的性能,在电子、传感器、能量存储、润滑剂、电致变色、光致变色、催化剂等领域广泛应用。常规纳米复合薄膜材料的制备方法是先分别制备两种纳米材料,然后将两种或多种纳米材料进行简单的混合,通过刮涂或旋涂来制备纳米复合薄膜材料。此种纳米复合薄膜材料的制备流程复杂,耗时,成本高,复合薄膜材料成份易发生彼此包埋,活性成份不能充分暴露于材料表面,导致活性成份的损失。Nanocomposite thin film materials have better properties than single nanomaterials and are widely used in electronics, sensors, energy storage, lubricants, electrochromic, photochromic, catalysts and other fields. The preparation method of conventional nanocomposite thin film materials is to prepare two kinds of nanomaterials separately, then simply mix two or more kinds of nanomaterials, and prepare nanocomposite thin film materials by blade coating or spin coating. The preparation process of such nano-composite film material is complicated, time-consuming, and high cost. The components of the composite film material are prone to bury each other, and the active components cannot be fully exposed on the surface of the material, resulting in the loss of the active components.
目前,纳米复合薄膜材料一般是先分别制备复合薄膜的各个成份,然后通过多组分混合刮涂或旋涂来制备纳米复合薄膜,制备工艺复杂,成本高,部分有效成份被包埋,导致利用率低,不能充分利用各成份的性能。At present, nano-composite film materials are generally prepared by first preparing each component of the composite film, and then preparing the nano-composite film by multi-component mixing by blade coating or spin coating. The rate is low, and the performance of each component cannot be fully utilized.
因此,如何提供一种开发制备工艺简单、成本低廉、省时、高效的纳米复合薄膜材料的制备方法是本领域技术人员亟需解决的问题。Therefore, how to provide a preparation method for developing a nanocomposite thin film material with simple preparation process, low cost, time saving and high efficiency is an urgent problem to be solved by those skilled in the art.
发明内容SUMMARY OF THE INVENTION
有鉴于此,本发明提供了一种纳米复合薄膜的制备方法及应用,本发明利用湿法电沉积制备氧化钼薄膜及开放嵌入的金属纳米粒子。制备工艺简单,制备时间极短,仪器设备简单,纳米复合薄膜性能优异,具有显著的应用价值。In view of this, the present invention provides a preparation method and application of a nanocomposite thin film. The present invention utilizes wet electrodeposition to prepare a molybdenum oxide thin film and open embedded metal nanoparticles. The preparation process is simple, the preparation time is extremely short, the equipment is simple, the nanocomposite film has excellent performance, and has significant application value.
为了达到上述目的,本发明采用如下技术方案:In order to achieve the above object, the present invention adopts the following technical solutions:
一种纳米复合薄膜的制备方法,包括以下步骤:A preparation method of nanocomposite film, comprising the following steps:
(1)将导电基底用3000目砂纸打磨光滑,并洗净;(1) Smooth the conductive substrate with 3000-grit sandpaper and wash it;
(2)配置七钼酸铵溶液和氯化钯的盐酸溶液;(2) configure the hydrochloric acid solution of ammonium heptamolybdate solution and palladium chloride;
(3)采用三电极体系进行电沉积,将七钼酸铵溶液置于电解池中,然后将三电极置于七钼酸铵溶液中进行电沉积,得到氧化钼薄膜;(3) using a three-electrode system for electrodeposition, placing the ammonium heptamolybdate solution in an electrolytic cell, and then placing the three electrodes in the ammonium heptamolybdate solution for electrodeposition to obtain a molybdenum oxide film;
(4)将氧化钼薄膜置于氯化钯的盐酸溶液中,然后再利用三电极进行电沉积,即得所述纳米复合薄膜。(4) placing the molybdenum oxide film in a hydrochloric acid solution of palladium chloride, and then using three electrodes for electrodeposition to obtain the nanocomposite film.
优选的,步骤(1)中所述导电基底为直径3mm的圆盘金/碳导电基底。Preferably, the conductive substrate in step (1) is a disc gold/carbon conductive substrate with a diameter of 3 mm.
优选的,步骤(1)所述洗净为将打磨光滑的导电基底依次放入硫酸、丙酮、酒精和二次水中超声4-6min,所述超声频率为40kHZ。Preferably, the cleaning in step (1) is to put the polished conductive substrate into sulfuric acid, acetone, alcohol and secondary water in sequence for 4-6 minutes, and the ultrasonic frequency is 40kHZ.
上述步骤中洗净是指去除表面灰尘等吸附物和油脂等,目的是为了提高薄膜与导电基底的连接程度,防止脱落。Cleaning in the above steps refers to removing surface dust and other adsorbents and grease, etc., the purpose is to improve the degree of connection between the film and the conductive substrate, and prevent falling off.
优选的,步骤(2)中所述七钼酸铵溶液的浓度为1-100mM;所述氯化钯的盐酸溶液中,所述氯化钯的浓度为0.1-100mM,所述氯化钯与盐酸的摩尔浓度比为(1:2)-(1:10)。Preferably, the concentration of the ammonium heptamolybdate solution in step (2) is 1-100 mM; in the hydrochloric acid solution of the palladium chloride, the concentration of the palladium chloride is 0.1-100 mM, and the palladium chloride and The molar concentration ratio of hydrochloric acid is (1:2)-(1:10).
上述设置中,七钼酸铵溶液的浓度为能够电沉积获得薄膜的浓度,在浓度范围内均可获得薄膜;In the above setting, the concentration of the ammonium heptamolybdate solution is the concentration that can obtain the thin film by electrodeposition, and the thin film can be obtained within the concentration range;
浓度比的限定是能够有效电沉积钯的比例,过低或过高不利于钯的电沉积。The concentration ratio is limited by the ratio that can effectively electrodeposit palladium, and too low or too high is unfavorable for the electrodeposition of palladium.
优选的,所述三电极包括工作电极、参比电极和对电极,所述工作电极的材料为导电基底;所述参比电极的材料为银/氯化银;对电极的材料为碳棒。Preferably, the three electrodes include a working electrode, a reference electrode and a counter electrode, and the material of the working electrode is a conductive substrate; the material of the reference electrode is silver/silver chloride; the material of the counter electrode is a carbon rod.
优选的,步骤(3)中所述电沉积为采用恒电压或恒电流的方式进行电沉积,沉积时间为0.001s-10s,所述电压为-0.5~-1.0V,所述电流为1-500mA/cm2。Preferably, in step (3), the electrodeposition is performed by means of constant voltage or constant current, the deposition time is 0.001s-10s, the voltage is -0.5~-1.0V, and the current is 1- 500mA/cm 2 .
上述步骤中,可以通过控制沉积电量或沉积时间来控制薄膜厚度。In the above steps, the film thickness can be controlled by controlling the deposition amount or deposition time.
优选的,步骤(4)中所述电沉积为采用恒电压或恒电流的方式进行电沉积,沉积时间为0.001s-10s,所述电压为0~-0.6V,所述电流为1-500mA/cm2。Preferably, in step (4), the electrodeposition is performed by means of constant voltage or constant current, the deposition time is 0.001s-10s, the voltage is 0-0.6V, and the current is 1-500mA /cm 2 .
本发明的另一个目的在于提供上述的一种纳米复合薄膜的制备方法制备的纳米复合薄膜在光/电致变色薄膜、催化剂、传感材料中的应用。Another object of the present invention is to provide the application of the nanocomposite film prepared by the above-mentioned method for preparing a nanocomposite film in optical/electrochromic films, catalysts and sensing materials.
经由上述的技术方案可知,与现有技术相比,本发明具有如下有益效果:As can be seen from the above-mentioned technical solutions, compared with the prior art, the present invention has the following beneficial effects:
由于氧化钼前驱体七钼酸铵分子尺寸比较大,电沉积时转移单位电荷能够产生大量氧化钼产物,能够覆盖较大面积的导电基底,加之氧化钼为半导体,电阻较高,继续沉积的氧化钼倾向于在电阻较低的未沉积或沉积较少的部位继续沉积,因而能够高效生成纳米级极薄膜。进一步沉积金属纳米粒子时,氧化钼薄膜的晶体与氧缺陷位具有更高的表面能及较低的电阻,致使电沉积的金属原子优先在缺陷位生长,最终形成纳米粒子开放嵌入氧化钼薄膜的复合结构。该结构中涉及到的纳米粒子尺寸在1-100nm,氧化钼薄膜厚度在1nm-10μm。这种特殊结构同时结合了氧化钼和金属纳米粒子的特性,并且,纳米粒子在孔洞中,保证了长期使用的稳定性。Due to the relatively large molecular size of ammonium heptamolybdate, the precursor of molybdenum oxide, a large number of molybdenum oxide products can be generated by transferring unit charge during electrodeposition, which can cover a large area of conductive substrate. In addition, molybdenum oxide is a semiconductor with high resistance, and the oxidation of continuous deposition Molybdenum tends to continue to deposit at lower resistance un-deposited or less-deposited sites, thus enabling efficient formation of nanoscale extremely thin films. When metal nanoparticles are further deposited, the crystal and oxygen defect sites of the molybdenum oxide film have higher surface energy and lower resistance, resulting in the preferential growth of electrodeposited metal atoms at the defect sites, and finally the formation of nanoparticles that are open and embedded in the molybdenum oxide film. Composite structure. The size of the nanoparticles involved in this structure is 1-100 nm, and the thickness of the molybdenum oxide film is 1 nm-10 μm. This special structure combines the properties of molybdenum oxide and metal nanoparticles at the same time, and the nanoparticles are in the pores to ensure long-term stability.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据提供的附图获得其他的附图。In order to explain the embodiments of the present invention or the technical solutions in the prior art more clearly, the following briefly introduces the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only It is an embodiment of the present invention. For those of ordinary skill in the art, other drawings can also be obtained according to the provided drawings without creative work.
图1为氧化钼薄膜的SEM图;Fig. 1 is the SEM image of molybdenum oxide thin film;
图2为钯-氧化钼复合薄膜材料的SEM图;Fig. 2 is the SEM image of palladium-molybdenum oxide composite thin film material;
图3为钯纳米粒子嵌入氧化钼薄膜在1mol/L KOH溶液中催化析氢反应的线性扫描伏安(LSV)图对比;Figure 3 is a comparison of linear sweep voltammetry (LSV) images of palladium nanoparticles embedded in molybdenum oxide films in 1 mol/L KOH solution catalyzing the hydrogen evolution reaction;
图4为钯纳米粒子嵌入氧化钼薄膜在1mol/L KOH溶液中循环500圈前后的线性扫描伏安(LSV)图对比。Figure 4 is a comparison of the linear sweep voltammetry (LSV) images of the palladium nanoparticles embedded in the molybdenum oxide film before and after 500 cycles of circulation in a 1 mol/L KOH solution.
具体实施方式Detailed ways
下面将对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be described clearly and completely below. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
实施例1Example 1
一种纳米复合薄膜的制备方法,包括以下步骤:A preparation method of nanocomposite film, comprising the following steps:
(1)将3mm直径圆盘金导电基底打磨光滑,并依次放入硫酸、丙酮、酒精和二次水中超声4min(在硫酸、丙酮、酒精和二次水中均需要超声处理);(1) Polish the 3mm diameter disc gold conductive substrate to smooth, and put it into sulfuric acid, acetone, alcohol and secondary water for ultrasonic 4min in turn (ultrasonic treatment is required in sulfuric acid, acetone, alcohol and secondary water);
(2)配置浓度为100mM的七钼酸铵溶液;在30mM的HCl溶液中加入10mM的PdCl2得到氯化钯的盐酸溶液;(2) the ammonium heptamolybdate solution with a configuration concentration of 100mM; in the HCl solution of 30mM, add the PdCl of 10mM to obtain the hydrochloric acid solution of palladium chloride;
(3)采用三电极体系进行电沉积,以圆盘金导电基底为工作电极,银/氯化银作为参比电极,碳棒作为对电极,将七钼酸铵溶液置于电解池中,然后将三电极置于七钼酸铵溶液中在-0.8V下,沉积1s,得到氧化钼薄膜;(3) Electrodeposition is carried out by using a three-electrode system, using the disc gold conductive substrate as the working electrode, silver/silver chloride as the reference electrode, and a carbon rod as the counter electrode, placing the ammonium heptamolybdate solution in the electrolytic cell, and then The three electrodes were placed in an ammonium heptamolybdate solution at -0.8V, and deposited for 1 s to obtain a molybdenum oxide film;
(4)将氧化钼薄膜置于氯化钯的盐酸溶液中,然后利用三电极体系在-0.3V下,沉积10s,即得所述纳米复合薄膜,制得的钯纳米粒子尺寸在约25nm,氧化钼薄膜生成高密度孔洞,钯纳米粒子开放式嵌入氧化钼薄膜。(4) placing the platinum oxide film in the hydrochloric acid solution of palladium chloride, then utilizing the three-electrode system at -0.3V to deposit 10s to obtain the nanocomposite film, and the obtained palladium nanoparticle size is about 25nm, The molybdenum oxide film generates high-density holes, and the palladium nanoparticles are openly embedded in the molybdenum oxide film.
实施例2Example 2
一种纳米复合薄膜的制备方法,包括以下步骤:A preparation method of nanocomposite film, comprising the following steps:
(1)将直径3mm圆盘金导电基底用砂纸打磨光滑,并依次放入硫酸、丙酮、酒精和二次水中超声4min(在硫酸、丙酮、酒精和二次水中均需要超声处理);(1) The 3mm diameter disc gold conductive substrate is polished smooth with sandpaper, and placed in sulfuric acid, acetone, alcohol and secondary water for ultrasonic 4min in turn (all need ultrasonic treatment in sulfuric acid, acetone, alcohol and secondary water);
(2)在10mM的HCl溶液中加入2mM的PdCl2得到氯化钯的盐酸溶液,然后配置浓度为10mM的七钼酸铵溶液;( 2 ) in the HCl solution of 10mM, add the PdCl of 2mM to obtain the hydrochloric acid solution of palladium chloride, and then configure the ammonium heptamolybdate solution with a concentration of 10mM;
(3)采用三电极体系进行电沉积,以圆盘金导电基底为工作电极,银/氯化银作为参比电极,碳棒作为对电极,将七钼酸铵溶液置于电解池中,然后将三电极置于七钼酸铵溶液中在-0.7V下,沉积0.1s,得到氧化钼薄膜;(3) Electrodeposition is carried out by using a three-electrode system, using the disc gold conductive substrate as the working electrode, silver/silver chloride as the reference electrode, and a carbon rod as the counter electrode, placing the ammonium heptamolybdate solution in the electrolytic cell, and then The three electrodes were placed in an ammonium heptamolybdate solution at -0.7V, and deposited for 0.1s to obtain a molybdenum oxide film;
(4)将氧化钼薄膜置于氯化钯的盐酸溶液中,然后利用三电极体系在-0.4V下,沉积5s,即得所述纳米复合薄膜。(4) placing the molybdenum oxide film in a hydrochloric acid solution of palladium chloride, and then using a three-electrode system at -0.4V to deposit for 5s to obtain the nanocomposite film.
实施例3Example 3
一种纳米复合薄膜的制备方法,包括以下步骤:A preparation method of nanocomposite film, comprising the following steps:
(1)将直径3mm圆盘碳导电基底打磨光滑,并依次放入硫酸、丙酮、酒精和二次水中超声4min(在硫酸、丙酮、酒精和二次水中均需要超声处理);(1) Grind the 3mm diameter disc carbon conductive substrate smooth, and put it into sulfuric acid, acetone, alcohol and secondary water for ultrasonic 4min in turn (ultrasonic treatment is required in sulfuric acid, acetone, alcohol and secondary water);
(2)在2mM的HCl溶液中加入0.5mM的PdCl2得到氯化钯的盐酸溶液,然后配置浓度为100mM的七钼酸铵溶液;( 2 ) adding 0.5mM PdCl to the 2mM HCl solution to obtain the hydrochloric acid solution of palladium chloride, and then configuring the ammonium heptamolybdate solution with a concentration of 100mM;
(3)采用三电极体系进行电沉积,以圆盘碳导电基底为工作电极,银/氯化银作为参比电极,碳棒作为对电极,将七钼酸铵溶液置于电解池中,然后将三电极置于七钼酸铵溶液中在-0.9V下,沉积10ms,得到氧化钼薄膜;(3) Electrodeposition is carried out by using a three-electrode system, using the disc carbon conductive substrate as the working electrode, silver/silver chloride as the reference electrode, and a carbon rod as the counter electrode, placing the ammonium heptamolybdate solution in the electrolytic cell, and then The three electrodes were placed in an ammonium heptamolybdate solution at -0.9V, and deposited for 10ms to obtain a molybdenum oxide film;
(4)将氧化钼薄膜置于氯化钯的盐酸溶液中,然后再利用三电极在-0.5V下,沉积2s,即得所述纳米复合薄膜。(4) The molybdenum oxide film is placed in a hydrochloric acid solution of palladium chloride, and then three electrodes are used to deposit at -0.5V for 2s to obtain the nanocomposite film.
实施例4Example 4
一种纳米复合薄膜的制备方法,包括以下步骤:A preparation method of nanocomposite film, comprising the following steps:
(1)将直径3mm圆盘金导电基底打磨光滑,并依次放入硫酸、丙酮、酒精和二次水中超声4min(在硫酸、丙酮、酒精和二次水中均需要超声处理);(1) Grind the 3mm diameter disc gold conductive substrate smooth, and put it into sulfuric acid, acetone, alcohol and secondary water for ultrasonic 4min in turn (all need ultrasonic treatment in sulfuric acid, acetone, alcohol and secondary water);
(2)配置浓度为100mM的七钼酸铵溶液;在1mM的HCl溶液中加入0.2mM的PdCl2得到氯化钯的盐酸溶液;(2) the ammonium heptamolybdate solution with a configuration concentration of 100 mM is added; 0.2 mM of PdCl is added to the 1 mM HCl solution to obtain a hydrochloric acid solution of palladium chloride;
(3)采用三电极体系进行电沉积,以圆盘金导电基底为工作电极,银/氯化银作为参比电极,碳棒作为对电极,将七钼酸铵溶液置于电解池中,然后将三电极置于七钼酸铵溶液中在10mA/cm2下,沉积3s,得到氧化钼薄膜;(3) Electrodeposition is carried out by using a three-electrode system, using the disc gold conductive substrate as the working electrode, silver/silver chloride as the reference electrode, and a carbon rod as the counter electrode, placing the ammonium heptamolybdate solution in the electrolytic cell, and then The three electrodes were placed in an ammonium heptamolybdate solution at 10 mA/cm 2 and deposited for 3 s to obtain a molybdenum oxide film;
(4)将氧化钼薄膜置于氯化钯的盐酸溶液中,然后利用三电极体系在1mA/cm2下,沉积1s,即得所述纳米复合薄膜。(4) placing the molybdenum oxide film in a hydrochloric acid solution of palladium chloride, and then using a three-electrode system at 1 mA/cm 2 to deposit for 1 s to obtain the nanocomposite film.
实施例5Example 5
一种纳米复合薄膜的制备方法,包括以下步骤:A preparation method of nanocomposite film, comprising the following steps:
(1)将直径3mm圆盘碳导电基底打磨光滑,并依次放入硫酸、丙酮、酒精和二次水中超声4min(在硫酸、丙酮、酒精和二次水中均需要超声处理);(1) Grind the 3mm diameter disc carbon conductive substrate smooth, and put it into sulfuric acid, acetone, alcohol and secondary water for ultrasonic 4min in turn (ultrasonic treatment is required in sulfuric acid, acetone, alcohol and secondary water);
(2)配置浓度为100mM的七钼酸铵溶液;在10mM的HCl溶液中加入1mM的PdCl2得到氯化钯的盐酸溶液;(2) the ammonium heptamolybdate solution with a configuration concentration of 100 mM is added; 1 mM of PdCl is added to the 10 mM HCl solution to obtain a hydrochloric acid solution of palladium chloride;
(3)采用三电极体系进行电沉积,以圆盘碳导电基底为工作电极,银/氯化银作为参比电极,碳棒作为对电极,将七钼酸铵溶液置于电解池中,然后将三电极置于七钼酸铵溶液中在1mA/cm2下,沉积0.1s,得到氧化钼薄膜;(3) Electrodeposition is carried out by using a three-electrode system, using the disc carbon conductive substrate as the working electrode, silver/silver chloride as the reference electrode, and a carbon rod as the counter electrode, placing the ammonium heptamolybdate solution in the electrolytic cell, and then The three electrodes were placed in an ammonium heptamolybdate solution at 1 mA/cm 2 and deposited for 0.1 s to obtain a molybdenum oxide film;
(4)将氧化钼薄膜置于氯化钯的盐酸溶液中,然后利用三电极在20mA/cm2下,沉积0.2s,即得所述纳米复合薄膜。(4) placing the molybdenum oxide thin film in a hydrochloric acid solution of palladium chloride, and then using three electrodes to deposit for 0.2 s at 20 mA/cm 2 to obtain the nanocomposite thin film.
实施例6Example 6
通过电化学析氢反应对实施例1制备的氧化钼薄膜、钯纳米粒子开放嵌入式复合氧化钼薄膜的催化性能进行测试,溶液为1mol/L KOH。The catalytic performance of the molybdenum oxide film and the palladium nanoparticle open-embedded composite molybdenum oxide film prepared in Example 1 were tested by electrochemical hydrogen evolution reaction, and the solution was 1 mol/L KOH.
所得的电沉积氧化钼薄膜的SEM图,如图1所示,从图可以看出氧化钼为二维薄膜结构,表面十分光滑、平整。如表1所示,其化学成份为MoOx(2≤x≤3)。The SEM image of the obtained electrodeposited molybdenum oxide film is shown in FIG. 1 . It can be seen from the figure that the molybdenum oxide is a two-dimensional film structure, and the surface is very smooth and flat. As shown in Table 1, its chemical composition is MoO x (2≤x≤3).
表1 氧化钼X射线能谱成份分析Table 1 Molybdenum oxide X-ray energy spectrum composition analysis
所得的钯纳米粒子开放嵌入型氧化钼薄膜的SEM图,如图2所示,从图可以看出该材料出现了高密度的纳米孔,孔内为钯纳米粒子。The SEM image of the obtained palladium nanoparticle open-embedded molybdenum oxide thin film is shown in FIG. 2 . It can be seen from the figure that the material has high-density nanopores, and the pores are palladium nanoparticles.
所得的钯纳米粒子开放嵌入型氧化钼薄膜材料在1mol/L KOH溶液中的线性循环伏安曲线,如图3所示,从图可以看出起始电位较低(约-60mV),10mA/cm2和100mA/cm2电流密度下的过电位分别为90mV和200mV,表明该材料具有较高的催化析氢性能,显著高于氧化钼薄膜及纯钯纳米粒子的催化析氢性能。The linear cyclic voltammetry curve of the obtained palladium nanoparticle open intercalation molybdenum oxide thin film material in 1mol/L KOH solution is shown in Figure 3. It can be seen from the figure that the onset potential is low (about -60mV), 10mA/L The overpotentials at current densities of cm and 100 mA/cm are 90 mV and 200 mV, respectively, indicating that the material has high catalytic hydrogen evolution performance, which is significantly higher than that of molybdenum oxide films and pure palladium nanoparticles.
所得的钯纳米粒子开放嵌入型氧化钼薄膜材料在1mol/L KOH溶液中循环500圈前后的线性扫描伏安(LSV)图,如图4所示。从图可以看出该材料在1mol/L KOH溶液中扫500圈CV前后的LSV图变化较小,表明该材料具有较高的稳定性。The linear sweep voltammetry (LSV) diagrams of the obtained palladium nanoparticle open intercalation molybdenum oxide thin film material before and after 500 cycles of circulation in a 1 mol/L KOH solution are shown in Fig. 4 . It can be seen from the figure that the LSV diagram of the material before and after 500 CV sweeps in 1 mol/L KOH solution changes little, indicating that the material has high stability.
本说明书中各个实施例采用递进的方式描述,每个实施例重点说明的都是与其他实施例的不同之处,各个实施例之间相同相似部分互相参见即可。对于实施例公开的装置而言,由于其与实施例公开的方法相对应,所以描述的比较简单,相关之处参见方法部分说明即可。The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments, and the same and similar parts between the various embodiments can be referred to each other. For the device disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant part can be referred to the description of the method.
对所公开的实施例的上述说明,使本领域专业技术人员能够实现或使用本发明。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见的,本文中所定义的一般原理可以在不脱离本发明的精神或范围的情况下,在其它实施例中实现。因此,本发明将不会被限制于本文所示的这些实施例,而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。The above description of the disclosed embodiments enables any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110871397.1A CN113584552B (en) | 2021-07-30 | 2021-07-30 | Preparation method and application of nano composite film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110871397.1A CN113584552B (en) | 2021-07-30 | 2021-07-30 | Preparation method and application of nano composite film |
Publications (2)
Publication Number | Publication Date |
---|---|
CN113584552A CN113584552A (en) | 2021-11-02 |
CN113584552B true CN113584552B (en) | 2022-10-11 |
Family
ID=78252641
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202110871397.1A Active CN113584552B (en) | 2021-07-30 | 2021-07-30 | Preparation method and application of nano composite film |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN113584552B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116864604B (en) * | 2023-08-07 | 2025-03-04 | 常州工学院 | Preparation and application of a composite zinc anode modified by hydrated molybdenum oxide |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100507088C (en) * | 2006-02-20 | 2009-07-01 | 清华大学 | Preparation method of palladium-supported metal-based electrode for electrocatalytic dechlorination of chlorinated aromatic hydrocarbons |
CN101235517A (en) * | 2007-11-16 | 2008-08-06 | 北京工业大学 | Preparation method of palladium-polypyrrole modified nickel foam catalytic electrode |
CN102703942B (en) * | 2012-06-20 | 2015-04-29 | 北京工业大学 | Method for preparing nano-platinum/palladium titanium dioxide nanotube composite electrode by pulse electrodeposition |
CN103280585A (en) * | 2013-06-07 | 2013-09-04 | 苏州诺信创新能源有限公司 | Preparation method of foamed nickel carrier palladium iridium electrode |
CN103500668B (en) * | 2013-09-30 | 2016-01-13 | 武汉理工大学 | MoO 2/ Co (OH) 2classification composite nano materials and its preparation method and application |
CN106311227B (en) * | 2015-04-08 | 2018-12-28 | 天津大学 | The synthetic method of three-dimensional macroporous structure molybdenum dioxide supported palladium granular materials |
CN105355456B (en) * | 2015-11-27 | 2017-07-18 | 中南大学 | A kind of molybdenum dioxide metal composite electrode and its preparation method and application |
CN109712816A (en) * | 2018-12-27 | 2019-05-03 | 新疆大学 | A kind of nickel cobalt hydroxide/molybdenum trioxide core-shell nano rod array material and its preparation method and application |
CN111118539B (en) * | 2019-06-06 | 2022-03-22 | 天津大学 | Nickel-molybdenum oxide quantum dot loaded on nickel oxide nano sheet prepared by electrodeposition method |
US11186493B2 (en) * | 2019-09-05 | 2021-11-30 | Imam Abdulrahman Bin Faisal University | Green synthesis of noble metal/transition metal oxide nanocomposite |
CN112387294A (en) * | 2020-12-02 | 2021-02-23 | 丹阳恒安化学科技研究所有限公司 | Preparation method of palladium-loaded ammonium decamolybdate catalyst material |
-
2021
- 2021-07-30 CN CN202110871397.1A patent/CN113584552B/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN113584552A (en) | 2021-11-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Wang et al. | Adsorption and direct electron transfer from hemoglobin into a three‐dimensionally ordered macroporous gold film | |
Yang et al. | Ni–Co oxides nanowire arrays grown on ordered TiO 2 nanotubes with high performance in supercapacitors | |
KR101199004B1 (en) | Nano Porous Electrode for Super Capacitor and Method for Preparing the Same | |
Raoof et al. | An electrochemical investigation of methanol oxidation on nickel hydroxide nanoparticles | |
Martin et al. | Growth mode transition involving a potential-dependent isotropic to anisotropic surface atom diffusion change. Gold electrodeposition on HOPG followed by STM | |
Wu et al. | Anodically potentiostatic deposition of flaky nickel oxide nanostructures and their electrochemical performances | |
CN103668376B (en) | A kind of volume to volume makes the method for electrode material | |
Yin et al. | Mingled MnO2 and Co3O4 binary nanostructures on well-aligned electrospun carbon nanofibers for nonenzymatic glucose oxidation and sensing | |
CN102181914A (en) | Preparation process for tunneling scanning microscope probe with reverse exponent shape and depth-to-length-diameter ratio | |
Ma et al. | In situ unipolar pulse electrodeposition of nickel hexacyanoferrate nanocubes on flexible carbon fibers for supercapacitor working in neutral electrolyte | |
Mole et al. | Highly conductive nanostructured C-TiO2 electrodes with enhanced electrochemical stability and double layer charge storage capacitance | |
Sheridan et al. | Hydrogen adsorption, absorption, and desorption at palladium nanofilms formed on Au (111) by electrochemical atomic layer deposition (E-ALD): Studies using voltammetry and in situ scanning tunneling microscopy | |
Wu et al. | Enhanced electrochemical performance of nickel hydroxide electrode with monolayer hollow spheres composed of nanoflakes | |
CN102197517A (en) | Composite electrode for electricity storage device, method for producing same and electricity storage device | |
CN106108891A (en) | Microelectrode array that a kind of platinum nano-pillar is modified and preparation method thereof | |
CN113584552B (en) | Preparation method and application of nano composite film | |
CN111593347A (en) | Flexible composite film material and preparation method thereof | |
CN108220991A (en) | A kind of method of the porous cobalt selenides of electrodeposited nanocrystalline in eutectic type ionic liquid | |
CN107247082A (en) | A kind of preparation method based on pulse electrodeposition carbon nano tube modified electrode | |
Shi et al. | A growth mechanism investigation on the anodic deposition of nanoporous gold supported manganese oxide nanostructures for high performance flexible supercapacitors | |
CN103043597B (en) | Method for preparing metal micro-nano array electrode by using ZnO crystal as template | |
CN105914046B (en) | The preparation method of hydroxy carbonate cobalt thin film electrode material for super capacitor | |
CN109468668B (en) | A kind of preparation method and application of platinum nanocone array structure | |
Chen et al. | Molybdenum sulfide for hydrogen evolution reaction: the importance of solution dynamic wetting behavior in the drying process | |
Hessam et al. | A comparison between growth of direct and pulse current electrodeposited crystalline SnO2 films; electrochemical properties for application in lithium-ion batteries |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP03 | Change of name, title or address |
Address after: 314000 No. 899, guangqiong Road, Nanhu District, Jiaxing City, Zhejiang Province Patentee after: Jiaxing University Country or region after: China Address before: No. 899 Guangqiong Road, Nanhu District, Jiaxing City, Zhejiang Province Patentee before: JIAXING University Country or region before: China |
|
CP03 | Change of name, title or address |