CN113582947B - 一种脱除胺的磺酰基保护的方法 - Google Patents
一种脱除胺的磺酰基保护的方法 Download PDFInfo
- Publication number
- CN113582947B CN113582947B CN202111041496.3A CN202111041496A CN113582947B CN 113582947 B CN113582947 B CN 113582947B CN 202111041496 A CN202111041496 A CN 202111041496A CN 113582947 B CN113582947 B CN 113582947B
- Authority
- CN
- China
- Prior art keywords
- sulfonyl
- reaction
- amine
- base
- protection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 35
- 150000001412 amines Chemical class 0.000 title claims abstract description 21
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 title claims abstract description 19
- 238000006243 chemical reaction Methods 0.000 claims abstract description 30
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000000926 separation method Methods 0.000 claims abstract description 11
- 239000007810 chemical reaction solvent Substances 0.000 claims abstract description 8
- 238000000605 extraction Methods 0.000 claims abstract description 6
- 239000003513 alkali Substances 0.000 claims abstract description 4
- 238000001514 detection method Methods 0.000 claims abstract description 4
- 238000001953 recrystallisation Methods 0.000 claims abstract description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Substances [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 41
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical group CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 39
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 36
- 230000008569 process Effects 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 10
- 239000002585 base Substances 0.000 claims description 9
- 230000007935 neutral effect Effects 0.000 claims description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000004440 column chromatography Methods 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 4
- 239000000741 silica gel Substances 0.000 claims description 4
- 229910002027 silica gel Inorganic materials 0.000 claims description 4
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 claims description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 2
- 125000002723 alicyclic group Chemical group 0.000 claims description 2
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 239000012298 atmosphere Substances 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 239000012044 organic layer Substances 0.000 claims description 2
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims 2
- 235000010290 biphenyl Nutrition 0.000 claims 1
- 239000004305 biphenyl Substances 0.000 claims 1
- 125000006267 biphenyl group Chemical group 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 5
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 4
- 238000010511 deprotection reaction Methods 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 239000003814 drug Substances 0.000 abstract description 2
- 229940079593 drug Drugs 0.000 abstract description 2
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 238000009776 industrial production Methods 0.000 abstract description 2
- 238000010534 nucleophilic substitution reaction Methods 0.000 abstract description 2
- 238000012827 research and development Methods 0.000 abstract description 2
- 238000006257 total synthesis reaction Methods 0.000 abstract description 2
- 231100001261 hazardous Toxicity 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 27
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 14
- 230000002829 reductive effect Effects 0.000 description 11
- 239000012300 argon atmosphere Substances 0.000 description 10
- 239000012074 organic phase Substances 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 9
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 9
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 9
- YZTJYBJCZXZGCT-UHFFFAOYSA-N phenylpiperazine Chemical compound C1CNCCN1C1=CC=CC=C1 YZTJYBJCZXZGCT-UHFFFAOYSA-N 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 6
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 6
- 125000006248 tosyl amino group Chemical group [H]N(*)S(=O)(=O)C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 5
- -1 Cs 2 CO 3 Chemical compound 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000010791 quenching Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- RPROHCOBMVQVIV-UHFFFAOYSA-N 2,3,4,5-tetrahydro-1h-pyrido[4,3-b]indole Chemical compound N1C2=CC=CC=C2C2=C1CCNC2 RPROHCOBMVQVIV-UHFFFAOYSA-N 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011941 photocatalyst Substances 0.000 description 2
- 125000006239 protecting group Chemical group 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- KDWPQSBXEHQMSD-UHFFFAOYSA-N 1-(4-methylphenyl)sulfonylpyrrolidine Chemical compound C1=CC(C)=CC=C1S(=O)(=O)N1CCCC1 KDWPQSBXEHQMSD-UHFFFAOYSA-N 0.000 description 1
- JISMCDXWZGJAKZ-UHFFFAOYSA-N 1-benzylsulfonylimidazole Chemical compound C1=CN=CN1S(=O)(=O)CC1=CC=CC=C1 JISMCDXWZGJAKZ-UHFFFAOYSA-N 0.000 description 1
- FRGBALBETGOADC-UHFFFAOYSA-N 1-cyclohexylsulfonyl-4-phenylpiperazine Chemical compound C1CN(C=2C=CC=CC=2)CCN1S(=O)(=O)C1CCCCC1 FRGBALBETGOADC-UHFFFAOYSA-N 0.000 description 1
- DORHRKIMFCOCQM-UHFFFAOYSA-N 2,5-bis-(4-methylphenyl)sulfonyl-3,4-dihydro-1H-pyrido[4,3-b]indole Chemical compound CC(C=C1)=CC=C1S(N1C(C=CC=C2)=C2C(C2)=C1CCN2S(C1=CC=C(C)C=C1)(=O)=O)(=O)=O DORHRKIMFCOCQM-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- KXJAWOFXMSYLMB-UHFFFAOYSA-N 2-(4-methylphenyl)sulfonyl-3h-isoindol-1-one Chemical compound C1=CC(C)=CC=C1S(=O)(=O)N1C(=O)C2=CC=CC=C2C1 KXJAWOFXMSYLMB-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 1
- DIIWSYPKAJVXBV-UHFFFAOYSA-N Hantzch dihydropyridine Natural products CCOC(=O)C1=CC(C(=O)OCC)=C(C)N=C1C DIIWSYPKAJVXBV-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000003889 chemical engineering Methods 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005695 dehalogenation reaction Methods 0.000 description 1
- 230000006104 desulfonylation Effects 0.000 description 1
- 238000005688 desulfonylation reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- PXZQEOJJUGGUIB-UHFFFAOYSA-N isoindolin-1-one Chemical compound C1=CC=C2C(=O)NCC2=C1 PXZQEOJJUGGUIB-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000001404 mediated effect Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- HEFFCQILGLLHQC-UHFFFAOYSA-N n,4-dimethyl-n-phenylbenzenesulfonamide Chemical compound C=1C=C(C)C=CC=1S(=O)(=O)N(C)C1=CC=CC=C1 HEFFCQILGLLHQC-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000002186 photoactivation Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000006894 reductive elimination reaction Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/02—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms containing only hydrogen and carbon atoms in addition to the ring hetero elements
- C07D295/023—Preparation; Separation; Stabilisation; Use of additives
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B43/00—Formation or introduction of functional groups containing nitrogen
- C07B43/04—Formation or introduction of functional groups containing nitrogen of amino groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
- C07C209/62—Preparation of compounds containing amino groups bound to a carbon skeleton by cleaving carbon-to-nitrogen, sulfur-to-nitrogen, or phosphorus-to-nitrogen bonds, e.g. hydrolysis of amides, N-dealkylation of amines or quaternary ammonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/04—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D207/06—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with radicals, containing only hydrogen and carbon atoms, attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/44—Iso-indoles; Hydrogenated iso-indoles
- C07D209/46—Iso-indoles; Hydrogenated iso-indoles with an oxygen atom in position 1
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/56—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms
- C07D233/58—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/02—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms containing only hydrogen and carbon atoms in addition to the ring hetero elements
- C07D295/027—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms containing only hydrogen and carbon atoms in addition to the ring hetero elements containing only one hetero ring
- C07D295/033—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms containing only hydrogen and carbon atoms in addition to the ring hetero elements containing only one hetero ring with the ring nitrogen atoms directly attached to carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
- C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
- C07D471/04—Ortho-condensed systems
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Indole Compounds (AREA)
Abstract
本发明公开了一种脱除胺的磺酰基保护的方法。该方法包括以下步骤:将N‑磺酰基保护的胺与碱溶解于反应溶剂中,然后加入二苯基膦混匀并保持90℃;待TCL检测反应完全时,采用重结晶法或萃取分离法得到目标产物。本发明的方法采用二苯基膦作为脱出试剂,利用其碱性加热条件下对于磺酰基的亲核取代,反应活性好,选择性高,可以替代危险试剂的使用,对环境友好,符合绿色化学的概念,同时简便易操作且适用范围广,可以有效降低脱保护成本,无金属参与,反应价廉高效,对全合成、药物研发及工业生产有着重要意义。
Description
技术领域
本发明属于生物医药技术及化学工程领域,具体涉及一种脱除胺的磺酰基保护的方法。
背景技术
由于氨基本身具有很高的反应活性,故而氨基的保护与脱保护策略在有机合成中有着至关重要的作用。至今,对于氨基的保护策略已有较好的进展,一些保护基(-Boc、-Fmoc等)及其有效的脱除方案被开发,但仍有弊端,比如其稳定性较差而无法在一些剧烈条件下进行下一步反应。近年来,N-Ts基团在含氮化学领域中越来越受到关注。N-Ts基团可以轻易得到,所得到的化合物由于结晶度高,通常很稳定且易于纯化。然而缺乏脱除磺酰基保护的有效方法,很大程度的限制了N-Ts作为保护基的使用。
目前已开发出的脱除胺的磺酰基保护的方法主要包括以下几点:
首先,N-Ts基团可经强酸促进水解而脱除,如HBr、CF3CO2H、CF3SO3H或HClO4;T s基团也可以在强碱性的条件之下脱除,但是通常在实施中上述的条件需要高浓度、高温或较长反应时间,因而导致很多底物不能耐受这些极端恶劣的条件而限制了使用。
其次,通过单电子转移而进行的还原性裂解过程(ET)也被发现可用于该反应的进行。上述方法通常由碱金属、Mg/MeOH、SmI2、AIBN、低价钛等介导。最近,通过在各种光催化剂(PC)存在下的光活化还原也成为了新的N-Ts裂解方法。然而,由于一些有毒和危险化学品或昂贵的催化剂的使用的影响,上述大多数方法对工业应用仍有局限性。
因此,仍然需要开发实用和简单的方法来脱除化学工艺中涉及到的N-Ts保护。
发明内容
为解决上述问题,本发明提出了一种新颖的脱除胺的磺酰基保护的方法,简便易操作且适用范围广,无金属参与,反应价廉高效,对全合成、药物研发及工业生产有着重要意义。
为达到上述目的,本发明的技术方案是这样实现的:
一种脱除胺的磺酰基保护的方法,包括以下步骤:
步骤一、将N-磺酰基保护的胺与碱溶解于反应溶剂中,然后加入二苯基膦混匀并保持90℃;
步骤二、待TCL检测反应完全时,采用重结晶法或萃取分离法得到目标产物;
所述萃取分离法包括以下过程:将产物用水洗涤,然后采用乙酸乙酯萃取,分液保留有机层,干燥后去除溶剂,经柱层析分离得到目标产物;
N-磺酰基保护的胺、碱与二苯基膦的摩尔比为1:(3-5):(1.1-1.4);所述反应溶剂为DMSO、DMF、DMA、NMP、1,4-Dioxane和THF中的一种。
其中,上述方法中的碱为KOH、t-BuOK、Cs2CO3、K2CO3、NaOH、t-BuONa和Na2CO3中的一种;最优为KOH。
上述方法中提及的磺酰基为芳香磺酰基、脂肪环磺酰基或直链脂肪磺酰基。
步骤一的具体过程为:将N-磺酰基保护的胺与碱溶解于反应溶剂中,并在惰性气体气氛下密封,然后加入二苯基膦混匀并保持90℃。惰性气体为氮气或氩气。
在萃取分离法中,采用中性氧化铝柱或硅胶柱进行柱层析分离。
本发明的有益效果为:
(1)简便易操作且适用范围广,无金属参与,反应价廉高效,对全合成、药物研发及工业生产有着重要意义;
(2)本发明采用二苯基膦作为脱出试剂,利用其碱性加热条件下对于磺酰基的亲核取代,反应活性好,选择性高,可以替代危险试剂的使用,对环境友好,不会损害人身体健康,可以高效的实现目标化合物的构建,并且产生的废物较少,原子利用率较高,符合绿色化学的概念,同时可以有效降低脱保护成本,在环保要求越来越严格的工业化生产中,将占领技术领先地位。
具体实施方式
以下将结合实施例对本发明的构思及产生的技术效果进行清楚、完整的描述,以充分地理解本发明的目的、方案和效果。
发明人以N-Ts-N’-苯基哌嗪作为底物,采用先前文献所采用的t-BuOK条件(Desulfonylation and Dehalogenation Reactions:Hantzsch Ester Anion asElectron and Hydrogen Atom Donor,J.Org.Chem.2020,85,13481-13494.具体指表1中实验1-2),发现并未能裂解C-S键以合成所需的目标产物。
但是发明人发现采用二苯基膦在碱性条件下能够显著促进磺酰基的脱除,而不存在碱(如表1中实验14)或不存在二苯基膦(如表1中实验1、2、12),或者采用Ph2P(O)H代替二苯基膦(如表1中实验13)的情况下,脱除反应均无法启动;此外,反应溶剂为DMSO,碱使用KOH效果最佳,具体如表1所示(少量表示为1%)。
表1
实施例1:
1-苯基哌嗪的制备,具体过程如下:
在N-对甲苯磺酰基-1-苯基哌嗪(1.00g,3.16mmol)的DMSO(8mL)溶液中,加入氢氧化钾(531mg,9.48mmol),并在氩气气氛下密封;然后加入HPPh2(647mg,3.48mmol),在90℃下搅拌1h至反应完全;用水(20mL)淬灭反应,并去除沉淀物,然后用乙酸乙酯(20mL)萃取,合并有机相后用无水硫酸钠干燥,减压浓缩;残留物用中性氧化铝柱(DCM:MeOH=15:1)分离纯化,得到1-苯基哌嗪(510mg,产率99%)。
实施例2:
1-苯基哌嗪的制备,具体过程如下:
在1-(吡啶-3-磺酰)-4-苯基哌嗪(303mg,1.0mmol)的DMSO(5mL)溶液中,加入氢氧化钾(224mg,4.0mmol),并在氩气气氛下密封;然后加入HPPh2(261mg,1.4mmol),在90℃下搅拌6h至反应完全;用水(10mL)淬灭反应,并去除沉淀物,然后用乙酸乙酯(10mL)萃取,合并有机相后用无水硫酸钠干燥,减压浓缩;残留物用中性氧化铝柱(DCM:MeOH=15:1)分离纯化,得到1-苯基哌嗪(131mg,产率81%)。
实施例3:
1-苯基哌嗪的制备,具体过程如下:
在1-(环己基磺酰)-4-苯基哌嗪(339mg,1.1mmol)的DMSO(5mL)溶液中,加入氢氧化钾(309mg,5.5mmol),并在氩气气氛下密封;然后加入HPPh2(246mg,1.32mmol),在90℃下搅拌10h至反应完全;用水(10mL)淬灭反应,并去除沉淀物;然后用乙酸乙酯(10mL)萃取,合并有机相后用无水硫酸钠干燥,减压浓缩;残留物用中性氧化铝柱(DCM:MeOH=15:1)分离纯化,得到1-苯基哌嗪(30mg,产率17%)。
实施例4:
1-苯基哌嗪的制备,具体过程如下:
在1-(丙基磺酰)-4-苯基哌嗪(268mg,1.0mmol)的DMSO(5mL)溶液中,加入氢氧化钾(280mg,5.0mmol),并在氩气气氛下密封;然后加入HPPh2(242mg,1.3mmol),在90℃下搅拌10h至反应完全;用水(10mL)淬灭反应,并去除沉淀物;然后用乙酸乙酯(10mL)萃取,合并有机相后用无水硫酸钠干燥,减压浓缩;残留物用中性氧化铝柱(DCM:MeOH=15:1)分离纯化,得到1-苯基哌嗪(83mg,产率51%)。
实施例5:
二苯胺的制备,具体过程如下:
在N-对甲苯磺酰基二苯胺(647mg,2.0mmol)的DMSO(5mL)溶液中,加入氢氧化钾(449mg,8.0mmol),并在氩气气氛下密封;然后加入HPPh2(484mg,2.6mmol),在90℃下搅拌2.5h至反应完全;用水(15mL)淬灭反应,用乙酸乙酯(15mL)萃取,合并有机相后用无水硫酸钠干燥,减压浓缩;残留物用硅胶柱(PE:EA=6:1)分离纯化,得到二苯胺(274mg,产率81%),熔点52.8-53.4℃。
实施例6:
2,3,4,5-四氢-1H-吡啶并[4,3-b]吲哚的制备,具体过程如下:
在N,N’-二对甲苯磺酰基-2,3,4,5-四氢-1H-吡啶并[4,3-b]吲哚(481mg,1.0mmol)的DMSO(4mL)溶液中,加入氢氧化钾(225mg,4.0mmol),并在氩气气氛下密封;然后加入HPPh2(242mg,1.3mmol),在90℃下搅拌2h至反应完全;用水(10mL)淬灭反应,然后用乙酸乙酯(10mL)萃取,合并有机相后用无水硫酸钠干燥,减压浓缩;残留物用中性氧化铝柱(DCM:MeOH=15:1)分离纯化,得到2,3,4,5-四氢-1H-吡啶并[4,3-b]吲哚(153mg,产率89%)。
实施例7:
N-甲基苯胺的制备,具体过程如下:
在N-对甲苯磺酰基-N-甲基苯胺(340mg,1.3mmol)的DMSO(6mL)溶液中,加入氢氧化钾(292mg,5.2mmol),并在氩气气氛下密封;然后加入HPPh2(315mg,1.7mmol),在90℃下搅拌1.5h至反应完全;用水(15mL)淬灭反应,然后用乙酸乙酯(15mL)萃取,合并有机相后用无水硫酸钠干燥,减压浓缩;残留物用硅胶柱(PE:EA=10:1)分离纯化,得到N-甲基苯胺(134mg,产率96%)。
实施例8:
咪唑的制备,具体过程如下:
在N-对甲苯磺酰基咪唑(267mg,1.2mmol)的DMSO(5mL)溶液中,加入氢氧化钾(303mg,5.4mmol),并在氩气气氛下密封;然后加入HPPh2(268mg,1.44mmol),在90℃下搅拌1.5h至反应完全;用水(10mL)淬灭反应,然后用乙酸乙酯(10mL)萃取,合并有机相后用无水硫酸钠干燥,减压浓缩;残留物用中性氧化铝柱(DCM:MeOH=20:1)分离纯化,得到咪唑(77mg,产率94%),熔点为90.2-91.8℃。
实施例9:
异吲哚啉-1-酮的制备,具体过程如下:
在N-对甲苯磺酰基异吲哚啉-1-酮(430mg,1.5mmol)的DMSO(6mL)溶液中,加入氢氧化钾(337mg,6.0mmol),并在氩气气氛下密封;然后加入HPPh2(391mg,2.1mmol),在90℃下搅拌1.5h至反应完全;用水(15mL)淬灭反应,然后用乙酸乙酯(15mL)萃取,合并有机相后用无水硫酸钠干燥,减压浓缩;残留物用中性氧化铝柱(DCM:MeOH=30:1)分离纯化,得到异吲哚啉-1-酮(188mg,产率94%),熔点为149.8-151.7℃。
实施例10:
四氢吡咯的制备,具体过程如下:
在N-对甲苯磺酰基四氢吡咯(248mg,1.1mmol)的DMSO(5mL)溶液中,加入氢氧化钾(278mg,4.95mmol),并在氩气气氛下密封;然后加入HPPh2(266mg,1.43mmol),在90℃下搅拌1.5h至反应完全;用水(15mL)淬灭反应,然后用乙酸乙酯(15mL)萃取,合并有机相后用无水硫酸钠干燥,减压浓缩;残留物用中性氧化铝柱(DCM:MeOH=10:1)分离纯化,得到四氢吡咯(62mg,产率79%)。
检测实验:
(1)实施例1-4制得的脱Ts保护的胺的化学式为:
1H NMR(400MHz,Chloroform-d)δ7.20–7.20(m,2H),6.91–6.73(m,3H),3.10–3.02(m,4H),3.01–2.87(m,4H),1.69(s,1H)。13C NMR(101MHz,Chloroform-d)δ151.9,129.1,119.6,116.1,50.4,46.2。
(2)实施例5制得的脱Ts保护的胺的化学式为:
1H NMR(400MHz,Chloroform-d)δ7.26–7.21(m,4H),7.06(d,J=7.9Hz,4H),6.92(t,J=7.4Hz,2H),5.66(s,1H)。13C NMR(101MHz,Chloroform-d)δ143.2,129.4,121.0,117.9。
(3)实施例6制得的脱Ts保护的胺的化学式为:
1H NMR(400MHz,Chloroform-d)δ10.80(s,1H),7.35(d,J=7.7Hz,1H),7.28(d,J=8.0Hz,1H),7.00(ddd,J=8.1,7.0,1.3Hz,1H),6.94(td,J=7.4,1.1Hz,1H),4.92(d,J=7.8Hz,1H),3.97(s,2H),3.08(t,J=5.7Hz,2H),2.66(t,J=5.5Hz,2H)。13C NMR(101MHz,Chloroform-d)δ136.1,132.2,127.3,121.0,118.8,117.8,111.4,106.9,43.2,42.3,21.3。
(4)实施例7制得的脱Ts保护的胺的化学式为:
1H NMR(400MHz,Chloroform-d)δ7.56–7.43(m,2H),7.03(tt,J=7.3,1.2Hz,1H),6.92–6.75(m,2H),3.80(s,1H),3.01(s,3H)。13C NMR(101MHz,Chloroform-d)δ149.8,129.5,117.4,112.7,30.9。
(5)实施例8制得的脱Ts保护的胺的化学式为:
1H NMR(400MHz,Chloroform-d)δ12.16(s,1H),7.68(t,J=1.1Hz,1H),7.05(d,J=0.9Hz,2H)。13C NMR(101MHz,Chloroform-d)δ135.6,122.2。
(6)实施例9制得的脱Ts保护的胺的化学式为:
1H NMR(400MHz,Chloroform-d)δ13.34(s,1H),12.31(s,2H),12.23(s,1H),9.13(s,2H)。13C NMR(101MHz,Chloroform-d)δ175.2,149.3,137.8,136.4,132.8,128.9,128.0,50.1。
(7)实施例10制得的脱Ts保护的胺的化学式为:
1H NMR(400MHz,Chloroform-d)δ2.88–2.46(m,4H),2.09(s,1H),1.74–1.36(m,4H)。13C NMR(101MHz,Chloroform-d)δ47.0,25.7。
以上所述,只是本发明的较佳实施例而已,本发明并不局限于上述实施方式,只要其以相同的手段达到本发明的技术效果,都应属于本发明的保护范围。在本发明的保护范围内其技术方案和/或实施方式可以有各种不同的修改和变化。
Claims (6)
1.一种脱除胺的磺酰基保护的方法,其特征在于,包括以下步骤:
步骤一、将N-磺酰基保护的胺与碱溶解于反应溶剂中,然后加入二苯基膦混匀并保持90 ℃;
步骤二、待TCL检测反应完全时,采用重结晶法或萃取分离法得到目标产物;
所述萃取分离法包括以下过程:将产物用水洗涤,然后采用乙酸乙酯萃取,分液保留有机层,干燥后去除溶剂,经柱层析分离得到目标产物;
N-磺酰基保护的胺、碱与二苯基膦的摩尔比为1:(3-5):(1.1-1.4);所述反应溶剂为DMSO、DMF、DMA、NMP、1,4-Dioxane和THF中的一种;所述碱为KOH、t-BuOK、Cs2CO3、K2CO3、NaOH、t-BuONa和Na2CO3中的一种。
2.根据权利要求1所述的方法,其特征在于,所述碱为KOH。
3.根据权利要求1所述的方法,其特征在于,所述磺酰基为芳香磺酰基、脂肪环磺酰基或直链脂肪磺酰基。
4.根据权利要求1所述的方法,其特征在于,步骤一的具体过程为:将N-磺酰基保护的胺与碱溶解于反应溶剂中,并在惰性气体气氛下密封,然后加入二苯基膦混匀并保持90℃。
5.根据权利要求4所述的方法,其特征在于,所述惰性气体为氮气或氩气。
6.根据权利要求1所述的方法,其特征在于,采用中性氧化铝柱或硅胶柱进行柱层析分离。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202111041496.3A CN113582947B (zh) | 2021-09-07 | 2021-09-07 | 一种脱除胺的磺酰基保护的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202111041496.3A CN113582947B (zh) | 2021-09-07 | 2021-09-07 | 一种脱除胺的磺酰基保护的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN113582947A CN113582947A (zh) | 2021-11-02 |
CN113582947B true CN113582947B (zh) | 2023-06-20 |
Family
ID=78241463
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202111041496.3A Active CN113582947B (zh) | 2021-09-07 | 2021-09-07 | 一种脱除胺的磺酰基保护的方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN113582947B (zh) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SI21655A (sl) * | 2003-12-29 | 2005-06-30 | LEK farmacevtska dru�ba d.d. | Sinteza optično čistega (R)-5-(2-aminopropil)-2-metoksibenzensulfonamida |
WO2007095276A2 (en) * | 2006-02-13 | 2007-08-23 | Signa Chemistry, Llc | Method for deprotecting aryl or alkyl sulfonamides of primary or secondary amines |
HUE031673T2 (en) * | 2011-09-14 | 2017-07-28 | Lek Pharmaceuticals | Synthesis of triazolopyrimidine compounds |
-
2021
- 2021-09-07 CN CN202111041496.3A patent/CN113582947B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN113582947A (zh) | 2021-11-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN116102464B (zh) | 一种不对称氢化制备氨基醇的方法及其应用 | |
CN113214129B (zh) | 一种磺酰自由基引发的1,6-二烯类化合物碘化/磺酰化反应方法 | |
CN105408302A (zh) | 制备纯化形式的胺化合物的方法 | |
CN107540574A (zh) | R‑联苯丙氨醇的制备方法 | |
CN113582947B (zh) | 一种脱除胺的磺酰基保护的方法 | |
CN114605310B (zh) | 一种氮杂五元环并三元环羧酸酯衍生物及其盐的合成方法 | |
CN110003081A (zh) | 一种多氟烷基取代的吲哚啉和四氢异喹啉的合成方法 | |
CN105017181B (zh) | 卡非佐米关键中间体及其衍生物的制备方法 | |
CN103435456B (zh) | 一种9-芴酮的制备方法 | |
CN106008316B (zh) | 一种合成雷迪帕韦手性中间体的方法 | |
CN109942514B (zh) | 一种制备硫酸阿扎拉韦中间体的方法 | |
CN103073492A (zh) | 2-[3-(s)-[3-[2-(7-氯-2-喹啉基)乙烯基]苯基]-3-羟基丙基]苯甲酸酯的合成方法 | |
CN114573512B (zh) | 一种合成c2-二氟烷基苯并咪唑衍生物的方法 | |
CN112174837B (zh) | 一种合成(R)-4-甲氧基-α-甲基苯乙胺的方法 | |
CN106543050B (zh) | 一种阿普斯特中间体的合成工艺 | |
CN101591329B (zh) | 一种制备手性阿折地平及其可接受盐的方法 | |
CN103224438B (zh) | Dmf亲核取代合成n,n-二甲基胺类化合物的方法 | |
WO2021093374A1 (zh) | 一种阿加曲班水合物的合成方法 | |
CN102731386B (zh) | 一种仲二酰亚胺衍生物的制备方法 | |
CN111848647B (zh) | 甲基四氢吡啶并噻唑类活性化合物及其制备方法和应用 | |
CN112830957B (zh) | 一种制备卡非佐米的方法 | |
WO2020051853A1 (zh) | 3,3-二取代氧化吲哚及其制备方法 | |
CN117603117B (zh) | 一种手性3-(2-卤乙酰基)-4-乙基吡咯烷的制备方法 | |
CN114990590B (zh) | 一种电催化无金属转酰胺化反应的新方法 | |
CN115368292B (zh) | 一种苯并吲哚类化合物及其合成方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |