CN113502459A - Double-sided magnetron sputtering vacuum coating machine and vacuum coating method thereof - Google Patents
Double-sided magnetron sputtering vacuum coating machine and vacuum coating method thereof Download PDFInfo
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- CN113502459A CN113502459A CN202110775306.4A CN202110775306A CN113502459A CN 113502459 A CN113502459 A CN 113502459A CN 202110775306 A CN202110775306 A CN 202110775306A CN 113502459 A CN113502459 A CN 113502459A
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- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 32
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 16
- 238000001816 cooling Methods 0.000 claims abstract description 203
- 238000004804 winding Methods 0.000 claims abstract description 78
- 238000005477 sputtering target Methods 0.000 claims abstract description 71
- 239000011248 coating agent Substances 0.000 claims abstract description 31
- 238000000576 coating method Methods 0.000 claims abstract description 31
- 239000010408 film Substances 0.000 claims description 88
- 239000010409 thin film Substances 0.000 claims description 21
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 description 47
- 238000005096 rolling process Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 4
- 239000013077 target material Substances 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a double-sided magnetron sputtering vacuum coating machine which comprises a vacuum cavity with a vacuum cavity, and an unwinding mechanism, a winding mechanism, a first sputtering target unit, a second sputtering target unit, a first cooling drum, a second cooling drum, a first ion source and a second ion source which are arranged in the vacuum cavity. The number of the first cooling drums and the number of the second cooling drums are the same, the first cooling drums and the second cooling drums are alternately arranged in a spaced mode, one first sputtering target unit is arranged beside each first cooling drum, and one second sputtering target unit is arranged beside each second cooling drum; the film between the unwinding mechanism and the winding mechanism bypasses the first cooling drum from a gap between the first cooling drum and the first sputtering target unit and bypasses the second cooling drum from a gap between the second cooling drum and the second sputtering target unit, and the first ion source and the second ion source are respectively positioned between the unwinding mechanism and the first cooling drum at the initial position so as to realize the purpose of alternately and repeatedly coating the film on two sides. In addition, the invention also discloses a vacuum coating method.
Description
Technical Field
The invention relates to the field of vacuum coating, in particular to a double-sided magnetron sputtering vacuum coating machine and a vacuum coating method capable of realizing double-sided alternate repeated coating.
Background
The magnetron sputtering coating refers to: the coating material is used as a target cathode, argon ions are used for bombarding a target material to generate cathode sputtering, and target material atoms are sputtered onto a workpiece to form a deposition layer.
In the magnetron sputtering coating, the magnetron sputtering vacuum coating machine is not used, so that a vacuum environment is created for a sputtering target unit arranged in a vacuum cavity by virtue of the vacuum cavity of the magnetron sputtering vacuum coating machine, and the reliability of the coiled film coating is ensured.
At present, in the existing magnetron sputtering vacuum coating machine, only one side of a film can be coated at one time, when the other side of the film is coated, the film needs to be moved out of a vacuum cavity to exchange the position of the film, and then the film in the exchanged position is moved into the vacuum cavity to be coated, so that the aim of coating the two sides of the film is fulfilled. That is, the double-sided coating of the film is completed in two steps, and the film needs to be removed from the vacuum chamber during the process of completing the double-sided coating, so the film is easily polluted by the surrounding environment to affect the quality, and on the other hand, the vacuumizing time is increased to affect the efficiency.
In addition, although the vacuum coating machine can realize the double-sided coating of the film at one time, the vacuum coating machine cannot realize the function of alternately and repeatedly coating the film on the double sides.
Therefore, there is a need for a double-sided magnetron sputtering vacuum coater and a vacuum coating method thereof, which can realize double-sided alternate repeated coating to ensure quality and improve efficiency, so as to overcome the above-mentioned drawbacks.
Disclosure of Invention
The invention aims to provide a double-sided magnetron sputtering vacuum coating machine which can realize double-sided alternate repeated coating to ensure quality and improve efficiency.
Another object of the present invention is to provide a vacuum coating method capable of realizing double-sided alternate repetitive coating to ensure quality and improve efficiency.
In order to achieve the purpose, the double-sided magnetron sputtering vacuum coating machine comprises a vacuum cavity with a vacuum cavity, and an unwinding mechanism, a winding mechanism, a first sputtering target unit, a second sputtering target unit, a first cooling drum, a second cooling drum, a first ion source and a second ion source which are arranged in the vacuum cavity. The unwinding mechanism is used for unwinding a film, and the winding mechanism is used for winding the film after coating; the first cooling drums and the second cooling drums are the same in number and are arranged in an alternate and spaced mode, one first sputtering target unit is arranged beside each first cooling drum, and one second sputtering target unit is arranged beside each second cooling drum; the film between the unwinding mechanism and the winding mechanism bypasses the first cooling drum from a gap between the first cooling drum and the first sputtering target unit and bypasses the second cooling drum from a gap between the second cooling drum and the second sputtering target unit, all the first cooling drums are abutted against one surface of the film, and all the second cooling drums are abutted against the other surface opposite to the film; the first ion source and the second ion source are respectively positioned between the unwinding mechanism and the first cooling drum at the initial position, and a film between the first cooling drum at the initial position and the unwinding mechanism penetrates through a gap between the first ion source and the second ion source.
Preferably, the unwinding mechanism and the winding mechanism are aligned with each other along the front-back direction of the vacuum cavity, the unwinding mechanism and the winding mechanism are also arranged adjacent to the right cavity wall of the vacuum cavity, the first cooling drum is arranged along the front-back direction of the vacuum cavity and the second cooling drum in an alternating manner, the first cooling drum and the second cooling drum are further respectively far away from the right cavity wall of the vacuum cavity, and the first ion source and the second ion source are adjacent to the rear cavity wall of the vacuum cavity.
Preferably, the first cooling drum and the second cooling drum are staggered with each other along the front-back direction of the vacuum cavity, the first cooling drum is far away from the left cavity wall of the vacuum cavity, the second cooling drum is arranged adjacent to the left cavity wall of the vacuum cavity, the first sputtering target unit is positioned beside the right side of the first cooling drum, and the second sputtering target unit is positioned beside the left side of the second cooling drum.
Preferably, the double-sided magnetron sputtering vacuum coating machine further comprises an unwinding guide roller set arranged in the vacuum chamber and located between the unwinding mechanism and the first cooling drum located at the starting position, and the unwinding guide roller set is arranged adjacent to the rear chamber wall of the vacuum chamber.
Preferably, the unwinding guide roller set comprises an unwinding common roller unit, a first unwinding branch roller unit and a second unwinding branch roller unit, the unwinding common roller unit is adjacent to a first cooling drum at an initial position, the first ion source and the second ion source are adjacent to the unwinding common roller unit, the first unwinding branch roller unit and the second unwinding branch roller unit are adjacent to the unwinding mechanism, and a film between the unwinding mechanism and the first cooling drum at the initial position is selectively wound on the unwinding common roller unit and the first unwinding branch roller unit or on the unwinding common roller unit and the second unwinding branch roller unit.
Preferably, the double-sided magnetron sputtering vacuum coating machine further comprises a winding guide roller set arranged in the vacuum chamber and located between the winding mechanism and the second cooling drum at the termination position, and the winding guide roller set is arranged adjacent to the front chamber wall of the vacuum chamber.
Preferably, the rolling guide roller group contains rolling sharing roller unit, first rolling branch roller unit and second rolling branch roller unit, rolling sharing roller unit establishes with the second cooling drum that is in termination point is adjacent, first rolling branch roller unit and second rolling branch roller unit respectively with winding mechanism is adjacent establishes, film between winding mechanism and the second cooling drum that is in termination point is around locating rolling sharing roller unit and first rolling branch roller unit or around locating rolling sharing roller unit and second rolling branch roller unit selectively.
Preferably, the vacuum cavity is a square cavity.
In order to achieve the above object, the vacuum coating method of the present invention comprises the steps of:
(1) the film unreeled by the unreeling mechanism is sequentially and alternately wound around all the first cooling drums and all the second cooling drums and then assembled at the reeling mechanism; and
(2) under the coordination of the unwinding mechanism and the winding mechanism, the film is continuously conveyed to bypass all the first cooling drums and all the second cooling drums; in the process of conveying the thin film, the first ion source and the second ion source respectively bombard one surface of the corresponding thin film to increase the adhesive force of a coating to the thin film, the first sputtering target unit repeatedly coats one surface of the thin film under conveying under the cooperation of the first cooling drum, and the second sputtering target unit repeatedly coats the other surface of the thin film under conveying under the cooperation of the second cooling drum, so that the two-sided coating of the thin film under conveying is alternately and repeatedly performed.
Compared with the prior art, the double-sided magnetron sputtering vacuum coating machine further comprises first sputtering target units, second sputtering target units, first cooling drums, second cooling drums, first ion sources and second ion sources which are arranged in the vacuum cavity, the first cooling drums and the second cooling drums are the same in number and are arranged in an alternating separation mode, one first sputtering target unit is arranged beside each first cooling drum, one second sputtering target unit is arranged beside each second cooling drum, a film between the unwinding mechanism and the winding mechanism bypasses the first cooling drums from a gap between the first cooling drums and the first sputtering target units and bypasses the second cooling drums from a gap between the second cooling drums and the second sputtering target units, all the first cooling drums are abutted to one surface of the film, and all the second cooling drums are abutted to the other surface opposite to the film; the first ion source and the second ion source are respectively positioned between the unwinding mechanism and the first cooling drum at the initial position, and a film between the first cooling drum at the initial position and the unwinding mechanism penetrates through a gap between the first ion source and the second ion source; therefore, the film is continuously conveyed by bypassing all the first cooling drums and all the second cooling drums under the coordination of the unwinding mechanism and the winding mechanism, wherein in the output process of the film, one surface of the corresponding film is bombarded by the first ion source and the second ion source respectively, namely, the opposite two surfaces of the film are bombarded under the coordination of the first ion source and the second ion source so as to increase the adhesive force of a coating to the film, and then the second sputtering target unit repeatedly coats the opposite surface of the film under conveyance under the coordination of the second cooling drum while repeatedly coating the one surface of the film under conveyance under the coordination of the first sputtering target unit, so that the alternate and repeated double-surface coating of the film under conveyance is realized, and the coating quality is ensured and the efficiency is improved. In addition, by the arrangement in which both the first cooling drums and the second cooling drums are the same in number and alternately spaced, the interval time between the first sputtering target unit repeatedly coating one side of the film being conveyed in cooperation with the first cooling drum and the interval time between the second sputtering target unit repeatedly coating the other side of the film being conveyed in cooperation with the second cooling drum are ensured.
Drawings
Fig. 1 is a schematic structural diagram of the double-sided magnetron sputtering vacuum coating machine of the present invention after a film is wound around an unwinding common roller unit and a first unwinding branch roller unit and a film is wound around a winding common roller unit and a first winding branch roller unit.
Fig. 2 is a schematic structural diagram of the double-sided magnetron sputtering vacuum coating machine of the present invention after the film is wound on the unwinding common roller unit and the first unwinding branch roller unit and the film is wound on the winding common roller unit and the second winding branch roller unit.
Fig. 3 is a schematic structural diagram of the double-sided magnetron sputtering vacuum coater of the present invention after the film is wound around the unwinding common roller unit and the second unwinding branch roller unit and the film is wound around the winding common roller unit and the first winding branch roller unit.
Fig. 4 is a schematic structural diagram of the double-sided magnetron sputtering vacuum coater of the present invention after the film is wound around the unwinding common roller unit and the second unwinding branch roller unit and the film is wound around the winding common roller unit and the second winding branch roller unit.
FIG. 5 is a flow chart of a vacuum coating method of the present invention.
Detailed Description
In order to explain technical contents and structural features of the present invention in detail, the following description is made with reference to the embodiments and the accompanying drawings.
Referring to fig. 1 to 4, the double-sided magnetron sputtering vacuum coater 100 of the present invention includes a vacuum chamber 10 having a vacuum chamber 11, and an unwinding mechanism 20, a winding mechanism 30, a first sputtering target unit 40a, a second sputtering target unit 40b, a first cooling drum 50a, a second cooling drum 50b, a first ion source 50c, and a second ion source 50d disposed in the vacuum chamber 11, so that eight of the unwinding mechanism 20, the winding mechanism 30, the first sputtering target unit 40a, the second sputtering target unit 40b, the first cooling drum 50a, the second cooling drum 50b, the first ion source 50c, and the second ion source 50d operate in a vacuum environment by means of the vacuum chamber 10. The unwinding mechanism 20 is used for unwinding the film 200, and the winding mechanism 30 is used for winding the film 200 after coating, so as to realize continuous conveying of the film 200 under unwinding of the unwinding mechanism 20 and winding of the winding mechanism 30, and since the specific structures of the unwinding mechanism 20 and the winding mechanism 30 are well known in the art, detailed description thereof is omitted here. While the number of the first cooling drums 50a and the second cooling drums 50b is the same and the cooling drums are arranged in an alternate and spaced manner, for example, in fig. 1 to 4, the number of the first cooling drums 50a and the second cooling drums 50b is two, and of course, the number of the first cooling drums 50a and the second cooling drums 50b may be three or four respectively according to actual needs, so that the number is not limited thereto; one first sputtering target unit 40a is provided beside each first cooling drum 50a, and one second sputtering target unit 40b is provided beside each second cooling drum 50 b. The film between the unwinding mechanism 20 and the winding mechanism 30 bypasses the first cooling drum 50a from the gap 60a between the first cooling drum 50a and the first sputtering target unit 40a and bypasses the second cooling drum 50b from the gap 60b between the second cooling drum 50b and the second sputtering target unit 40b, all the first cooling drums 50a abut on one surface of the film 200, and all the second cooling drums 50b abut on the other surface opposite to the film 200. The first ion source 50c and the second ion source 50d are each located between the unwinding mechanism 20 and the first cooling drum 50a (see the upper one of the first cooling drums 50a in fig. 1 to 4) in the initial position, and the thin film 200 between the first cooling drum 50a in the initial position and the unwinding mechanism 20 passes through a gap between the first ion source 50c and the second ion source 50d to meet a requirement that the opposite sides of the thin film 200 are bombarded. Specifically, in fig. 1 to 4, the vacuum chamber 11 is a square chamber, but not limited thereto. More specifically, the following:
as shown in fig. 1 to 4, the unwinding mechanism 20 and the winding mechanism 30 are aligned with each other in the front-rear direction of the vacuum chamber 10, and both the unwinding mechanism 20 and the winding mechanism 30 are further disposed adjacent to the right chamber wall 11a of the vacuum chamber 11, and the first cooling drums 50a are disposed alternately spaced apart from the second cooling drums 50b in the front-rear direction of the vacuum chamber 11, for example, in fig. 1 to 4, the rearmost point in the rear second cooling drum 50b is aligned with the foremost point of the rear first cooling drum 50a in the left-right direction of the vacuum chamber 10, and likewise, the foremost point in the rear second cooling drum 50b is aligned with the rearmost point of the front first cooling drum 50a in the left-right direction of the vacuum chamber 10 to ensure that the film between the rear second cooling drum 50b and the rear first cooling drum 50a, and the film between the rear second cooling drum 50b and the front first cooling drum 50a is horizontally conveyed in the left-right direction of the chamber 10, but not limited thereto; the first and second cooling drums 50a and 50b are also each remote from the right chamber wall 11a of the vacuum chamber 11, with the first and second ion sources 50c and 50d adjacent the rear chamber wall 11c of the vacuum chamber 10; this arrangement enables the vacuum chamber 11 to be effectively utilized everywhere, thereby improving the utilization efficiency of the vacuum chamber 11. Specifically, in fig. 1 to 4, the first cooling drum 50a and the second cooling drum 50b are displaced from each other in the front-rear direction of the vacuum chamber 11, i.e., are not aligned in the front-rear direction of the vacuum chamber 11, the first cooling drum 50a is away from the left chamber wall 11b of the vacuum chamber 11, and the second cooling drum 50b is disposed adjacent to the left chamber wall 11b of the vacuum chamber 11, i.e., such that the first cooling drum 50a is located beside the right side of the second cooling drum 50 b; the first sputtering target unit 40a is located beside the right side of the first cooling drum 50a, and the second sputtering target unit 40b is located beside the left side of the second cooling drum 50b, so that the arrangement enables further utilization of all parts of the vacuum chamber 11, thereby improving the utilization efficiency of the vacuum chamber 11, and making the unwinding mechanism 20, the winding mechanism 30, the first sputtering target unit 40a, the second sputtering target unit 40b, the first cooling drum 50a, and the second cooling drum 50b more compact and reasonable in the vacuum chamber 11. For example, each first sputtering target unit 40a is composed of two sputtering targets arranged around the first cooling drum 50a, and similarly, each second sputtering target unit 40b is composed of two sputtering targets arranged around the second cooling drum 50b, but not limited thereto.
As shown in fig. 1 to 4, in order to further ensure the reliability of the film 200, the double-sided magnetron sputtering vacuum coater 100 of the present invention further includes an unwinding guide roller set 70 disposed in the vacuum chamber 11 and located between the unwinding mechanism 20 and the first cooling drum 50a (the rear first cooling drum 50a in fig. 1 to 4) at the initial position, wherein the unwinding guide roller set 70 is disposed adjacent to the rear chamber wall 11c of the vacuum chamber 11, so that the unwinding guide roller set 70 is more reasonably disposed in the vacuum chamber 11. Specifically, in fig. 1 to 4, the unwinding guide roller group 70 includes an unwinding common roller unit 71, a first unwinding branch roller unit 72, and a second unwinding branch roller unit 72; the unwinding common roller unit 71 is adjacent to the first cooling drum 50a at the initial position, the first ion source 50c and the second ion source 50d are adjacent to the unwinding common roller unit 71, and the first unwinding branch roller unit 72 and the second unwinding branch roller unit 73 are adjacent to the unwinding mechanism 20, so that the film 200 between the unwinding mechanism 20 and the first cooling drum 50a at the initial position is wound around the unwinding common roller unit 71 and the first unwinding branch roller unit 72, and the state is shown in fig. 1 and fig. 2, or the film 200 between the unwinding mechanism 20 and the first cooling drum 50a at the initial position is wound around the unwinding common roller unit 71 and the second unwinding branch roller unit 73, and the state is shown in fig. 3 and fig. 4, so that the flexibility of unwinding direction of the film 200 is realized.
As shown in fig. 1 to 4, in order to further ensure the reliability of winding the film 200, the double-sided magnetron sputtering vacuum coater 100 of the present invention further includes a winding guide roller set 80 disposed in the vacuum chamber 11 between the winding mechanism 30 and the second cooling drum 50b (the rear second cooling drum 50b in fig. 1 to 4) at the end position, the winding guide roller set 80 being disposed adjacent to the front chamber wall 11d of the vacuum chamber 11, so that the winding guide roller set 80 is more reasonably disposed in the vacuum chamber 11. Specifically, in fig. 1 to 4, the winding guide roller group 80 includes a winding common roller unit 81, a first winding branch roller unit 82, and a second winding branch roller unit 83; the winding common roller unit 81 is disposed adjacent to the second cooling drum 50b at the termination position, and the first winding branch roller unit 82 and the second winding branch roller unit 83 are disposed adjacent to the winding mechanism 30, so that the film 200 between the winding mechanism 30 and the second cooling drum 50b at the termination position is wound around the winding common roller unit 81 and the first winding branch roller unit 82, as shown in fig. 1 and 3; alternatively, the film 200 between the winding mechanism 30 and the second cooling drum 50b at the termination position is wound around the winding common roller unit 81 and the second winding branch roller unit 83, as shown in fig. 2 and 4, and flexibility in the winding direction of the film 200 is achieved.
Referring to fig. 5, the vacuum coating method of the present invention includes the following steps:
s001, the film 200 unwound by the unwinding mechanism 20 sequentially and alternately bypasses all the first cooling drums 50a and all the second cooling drums 50b, and then is assembled at the winding mechanism 30, that is, in fig. 1 to 4, the unwound film 200 firstly bypasses the rear first cooling drum 50a from the gap 60a between the rear first cooling drum 50a and the rear first sputtering target unit 40a, and then bypasses the rear second cooling drum 50b from the gap 60b between the rear second cooling drum 50b and the rear second sputtering target unit 40 b; then, the film 200 continuously bypasses the front first cooling drum 50a from the gap 60a between the front first cooling drum 50a and the front first sputtering target unit 40a, and then the film 200 continuously bypasses the front second cooling drum 50b from the gap 60b between the front second cooling drum 50b and the front second sputtering target unit 40b, and finally is assembled on the winding mechanism 30, so that the film 200 unwound by the unwinding mechanism 20 sequentially and alternately bypasses all the first cooling drums 50a and all the second cooling drums 50b and then is assembled on the winding mechanism 30; and
s002, under the cooperation of the unwinding mechanism 20 and the winding mechanism 30, the film 200 is continuously conveyed to bypass all the first cooling drums 50a and all the second cooling drums 50 b; in the process of transporting the thin film 200, the first ion source 50c and the second ion source 50d bombard one side of the corresponding thin film 200, for example, in fig. 1 to 4, the first ion source 50c bombards the upper surface of the thin film 200 and the second ion source 50d bombards the lower surface of the thin film 200, but not limited thereto, so as to increase the adhesion of the plating layer to the thin film; while one surface of the film 200 being conveyed is repeatedly coated by the first sputtering target unit 40a in cooperation with the first cooling drum 50a, the other surface of the film 200 being conveyed, which is opposite to the other surface, is repeatedly coated by the second sputtering target unit 40b in cooperation with the second cooling drum 50b, thereby alternately and repeatedly coating both surfaces of the film 200 being conveyed.
Compared with the prior art, since the double-sided magnetron sputtering vacuum coater 100 of the present invention further includes the first sputtering target unit 40a, the second sputtering target unit 40b, the first cooling drum 50a, the second cooling drum 50b, the first ion source 50c and the second ion source 50d which are disposed in the vacuum chamber 11, the number of the first cooling drum 50a and the second cooling drum 50b is the same and are alternately arranged, one first sputtering target unit 40a is disposed beside each first cooling drum 50a, one second sputtering target unit 40b is disposed beside each second cooling drum 50b, the thin film 200 between the unwinding mechanism 20 and the winding mechanism 30 bypasses the first cooling drum 50a from the gap 60a between the first cooling drum 50a and the first sputtering target unit 40a and bypasses the second cooling drum 50b from the gap 60b between the second cooling drum 50b and the second sputtering target unit 40b, all the first cooling drums 50a abut against one surface of the film 200, and all the second cooling drums 50b abut against the other surface of the film 200 opposite thereto; the first ion source 50c and the second ion source 50d are each located between the unwinding mechanism 20 and the first cooling drum 50a in the initial position (i.e., the upper one of the first cooling drums 50a in fig. 1 to 4), and the thin film 200 between the first cooling drum 50a in the initial position and the unwinding mechanism 20 passes through a gap between the first ion source 50c and the second ion source 50 d; therefore, the film 200 is continuously conveyed to bypass all the first cooling drums 50a and all the second cooling drums 50b under the coordination of the unwinding mechanism 20 and the winding mechanism 30, wherein, in the output process of the film 200, the first ion source 50c and the second ion source 50d respectively bombard one surface of the corresponding film 200, namely, the bombardment of the two opposite surfaces of the film 200 is completed under the coordination of the first ion source 50c and the second ion source 50d so as to increase the adhesive force of the coating on the film 200, then the first sputtering target unit 40a repeatedly coats one surface of the film 200 under the coordination of the first cooling drum 50a, and the second sputtering target unit 40b repeatedly coats the other opposite surface of the film 200 under conveyance under the coordination of the second cooling drum 50b, so as to realize the alternate and repeated coating of the two surfaces of the film 200 under conveyance, thereby ensuring the coating quality and improving the efficiency. In addition, by the arrangement in which both the first cooling drum 50a and the second cooling drum 50b are equal in number and alternately spaced, the interval time between the first sputtering target unit 40a repeatedly coating one surface of the film 200 under conveyance in cooperation with the first cooling drum 50a is ensured, and the interval time between the second sputtering target unit 40b repeatedly coating the other surface of the film 200 under conveyance in cooperation with the second cooling drum 50b is ensured.
In the drawings, the direction indicated by the arrow a is a front-to-back direction of the vacuum chamber 10, and the direction indicated by the arrow B is a left-to-right direction of the vacuum chamber 10.
The above disclosure is only a preferred embodiment of the present invention, and should not be taken as limiting the scope of the invention, so that the appended claims are intended to cover all such modifications and changes as fall within the true spirit of the invention.
Claims (9)
1. The double-sided magnetron sputtering vacuum coating machine is characterized by further comprising a first sputtering target unit, a second sputtering target unit, a first cooling drum, a second cooling drum, a first ion source and a second ion source which are arranged in the vacuum cavity, wherein the first cooling drum and the second cooling drum are the same in number and are alternately arranged, one first sputtering target unit is arranged beside each first cooling drum, one second sputtering target unit is arranged beside each second cooling drum, and the film between the unwinding mechanism and the winding mechanism bypasses the first cooling drum from a gap between the first cooling drum and the first sputtering target unit and bypasses the first cooling drum from the gap between the first cooling drum and the second sputtering target unit from the gap between the second cooling drum and the second sputtering target unit And the gaps between the cooling drums and the second sputtering target unit bypass the second cooling drums, all the first cooling drums are abutted with one surface of the film, all the second cooling drums are abutted with the other surface opposite to the film, the first ion source and the second ion source are respectively positioned between the unwinding mechanism and the first cooling drum at the initial position, and the film between the first cooling drum at the initial position and the unwinding mechanism passes through the gap between the first ion source and the second ion source.
2. The double-sided magnetron sputtering vacuum coater according to claim 1, wherein the unwinding mechanism and the winding mechanism are aligned with each other along the front-back direction of the vacuum chamber, and both the unwinding mechanism and the winding mechanism are further disposed adjacent to the right chamber wall of the vacuum chamber, the first cooling drum is disposed in an alternating spaced arrangement with the second cooling drum along the front-back direction of the vacuum chamber, the first cooling drum and the second cooling drum are further away from the right chamber wall of the vacuum chamber, and the first ion source and the second ion source are adjacent to the rear chamber wall of the vacuum chamber.
3. The double-sided magnetron sputtering vacuum coater according to claim 2, wherein said first cooling drum and said second cooling drum are offset from each other in a front-rear direction of said vacuum chamber, said first cooling drum being located away from a left chamber wall of said vacuum chamber, said second cooling drum being located adjacent to said left chamber wall of said vacuum chamber, said first sputtering target unit being located beside a right side of said first cooling drum, said second sputtering target unit being located beside a left side of said second cooling drum.
4. The double-sided magnetron sputtering vacuum coater according to claim 2, further comprising an unwinding guide roller set disposed in the vacuum chamber between the unwinding mechanism and the first cooling drum at the starting position, the unwinding guide roller set being disposed adjacent to a rear chamber wall of the vacuum chamber.
5. The double-sided magnetron sputtering vacuum coating machine according to claim 4, wherein the unwinding guide roller set comprises an unwinding common roller unit, a first unwinding branch roller unit and a second unwinding branch roller unit, the unwinding common roller unit is adjacent to a first cooling drum at an initial position, the first ion source and the second ion source are adjacent to the unwinding common roller unit, the first unwinding branch roller unit and the second unwinding branch roller unit are adjacent to the unwinding mechanism, and a film between the unwinding mechanism and the first cooling drum at the initial position is selectively wound on the unwinding common roller unit and the first unwinding branch roller unit or on the unwinding common roller unit and the second unwinding branch roller unit.
6. The dual-sided magnetron sputtering vacuum coater of claim 2 further comprising a take-up guide roller set disposed in said vacuum chamber between said take-up mechanism and said second cooling drum in the end position, said take-up guide roller set being disposed adjacent to the front chamber wall of said vacuum chamber.
7. The double-sided magnetron sputtering vacuum coating machine according to claim 6 wherein the winding guide roller group comprises a winding common roller unit, a first winding branch roller unit and a second winding branch roller unit, the winding common roller unit is disposed adjacent to the second cooling drum at the termination position, the first winding branch roller unit and the second winding branch roller unit are disposed adjacent to the winding mechanism, and the film between the winding mechanism and the second cooling drum at the termination position is selectively wound around the winding common roller unit and the first winding branch roller unit or around the winding common roller unit and the second winding branch roller unit.
8. The double-sided magnetron sputtering vacuum coater according to claim 1, wherein the vacuum chamber is a square chamber.
9. A vacuum coating method using the double-sided magnetron sputtering vacuum coater according to any one of claims 1 to 8, characterized by comprising the steps of:
(1) the film unreeled by the unreeling mechanism is sequentially and alternately wound around all the first cooling drums and all the second cooling drums and then assembled at the reeling mechanism; and
(2) under the coordination of the unwinding mechanism and the winding mechanism, the film is continuously conveyed to bypass all the first cooling drums and all the second cooling drums; in the process of conveying the thin film, the first ion source and the second ion source respectively bombard one surface of the corresponding thin film to increase the adhesive force of a coating to the thin film, the first sputtering target unit repeatedly coats one surface of the thin film under conveying under the cooperation of the first cooling drum, and the second sputtering target unit repeatedly coats the other surface of the thin film under conveying under the cooperation of the second cooling drum, so that the two-sided coating of the thin film under conveying is alternately and repeatedly performed.
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| CN202110775306.4A CN113502459A (en) | 2021-07-08 | 2021-07-08 | Double-sided magnetron sputtering vacuum coating machine and vacuum coating method thereof |
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