CN113441487B - MO source pipeline and cleaning method thereof - Google Patents
MO source pipeline and cleaning method thereof Download PDFInfo
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- CN113441487B CN113441487B CN202010941222.9A CN202010941222A CN113441487B CN 113441487 B CN113441487 B CN 113441487B CN 202010941222 A CN202010941222 A CN 202010941222A CN 113441487 B CN113441487 B CN 113441487B
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- 238000004140 cleaning Methods 0.000 title claims abstract description 189
- 238000000034 method Methods 0.000 title claims abstract description 70
- 239000007789 gas Substances 0.000 claims abstract description 200
- 239000012159 carrier gas Substances 0.000 claims abstract description 48
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 29
- 239000010959 steel Substances 0.000 claims abstract description 29
- 238000004891 communication Methods 0.000 claims abstract description 26
- 238000010926 purge Methods 0.000 claims description 50
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 42
- 229910052757 nitrogen Inorganic materials 0.000 claims description 21
- 239000001257 hydrogen Substances 0.000 claims description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 12
- 238000007599 discharging Methods 0.000 claims description 6
- 239000001307 helium Substances 0.000 claims description 6
- 229910052734 helium Inorganic materials 0.000 claims description 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 6
- 239000012535 impurity Substances 0.000 description 17
- 238000001514 detection method Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000002360 explosive Substances 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 3
- 230000003749 cleanliness Effects 0.000 description 2
- 150000004678 hydrides Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- 229910000070 arsenic hydride Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002633 protecting effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 1
- 229910000058 selane Inorganic materials 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 210000003437 trachea Anatomy 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
- B08B9/027—Cleaning the internal surfaces; Removal of blockages
- B08B9/032—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
- B08B9/0321—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing using pressurised, pulsating or purging fluid
- B08B9/0328—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing using pressurised, pulsating or purging fluid by purging the pipe with a gas or a mixture of gas and liquid
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning In General (AREA)
Abstract
The application relates to a cleaning method of an MO source pipeline. This MO source pipeline includes MO air inlet pipeline and MO air outlet pipeline be connected with the MO source steel bottle respectively, and the MO air inlet pipeline is connected with the carrier gas inlet via first normally closed pneumatic valve, and the MO air outlet pipeline is connected with the carrier gas inlet via second normally closed pneumatic valve, is connected with the normally open pneumatic valve between the air inlet of first normally closed pneumatic valve and the gas outlet of second normally closed pneumatic valve, and MO air inlet pipeline and MO air outlet pipeline are connected with the MO vacuum tube respectively. The cleaning method comprises the following steps. Closing an MO gas inlet hand valve connected between the MO source steel cylinder and the MO gas inlet pipeline and an MO gas outlet hand valve connected between the MO source steel cylinder and the MO gas outlet pipeline. A communication air pipe is used for short-circuiting the normally-opened pneumatic valve. And introducing a first cleaning gas into the carrier gas inlet and cleaning the MO source pipeline by using the first cleaning gas. And replacing the MO source steel cylinder, cleaning the MO source pipeline again when the leakage rate of the MO source pipeline meets the preset condition, and then removing the communicating gas pipe.
Description
Technical Field
The invention relates to the technical field of semiconductor preparation, in particular to an MO source pipeline and a cleaning method thereof.
Background
The Metal Organic Chemical Vapor Deposition (MOCVD) technique has been highly successful in the production of semiconductor materials, semiconductor devices, and semiconductor thin films. The MO Source (metal organic Source) used in the deposition process is enclosed in a closed container, and is continuously consumed as the deposition process proceeds. When the source body in the closed container is reduced to a certain value, the source body needs to be replaced and the pipeline needs to be cleaned. After the MO source pipeline is used for a plurality of times for a long time, the existing method for replacing the MO source and cleaning the pipeline has the following defects. Because the mutual diffusion of residual impurities between the MO vacuum tube and the cleaning pipelines of different MO sources and the entrance of air and other impurities when the source bottle is disassembled, the cleanliness of the tube wall of the cleaning pipeline is deteriorated, and the stability of the process is further influenced.
Disclosure of Invention
In view of the above-mentioned shortcomings of the prior art, the present application aims to provide an MO source pipeline and a cleaning method thereof to enhance the cleaning effect and ensure the stability of the process.
According to a first aspect of the present application, a method for cleaning an MO source line is provided. This MO source pipeline is including MO air inlet pipeline and the MO air outlet pipeline of being connected with the MO source steel bottle respectively, and the MO air inlet pipeline is via first normally closed pneumatic valve and carrier gas entry intercommunication, and the MO air outlet pipeline is via second normally closed pneumatic valve and carrier gas entry intercommunication, is connected with normally open pneumatic valve between the air inlet of first normally closed pneumatic valve and the gas outlet of second normally closed pneumatic valve, and MO air inlet pipeline and MO air outlet pipeline are connected with the MO vacuum tube respectively. Wherein, the cleaning method comprises the following steps. Closing an MO gas inlet hand valve connected between the MO source steel cylinder and the MO gas inlet pipeline and an MO gas outlet hand valve connected between the MO source steel cylinder and the MO gas outlet pipeline. And the normally open pneumatic valve is in a communication state by short-circuiting the normally open pneumatic valve through a communication air pipe. And introducing a first cleaning gas into the carrier gas inlet and cleaning the MO source pipeline by using the first cleaning gas. And replacing the MO source steel cylinder, and then detecting whether the leakage rate of the MO source pipeline meets the preset condition. When the leakage rate of the MO source pipeline meets the preset condition, the MO source pipeline is cleaned again, and then the communication air pipe which is in short connection with the normally-open pneumatic valve is removed.
According to one embodiment of the present application, introducing a first cleaning gas into the carrier gas inlet and cleaning the MO source line with the first cleaning gas includes the following steps. And first cleaning gas is introduced into the carrier gas inlet, and the MO gas inlet pipeline and the MO gas outlet pipeline are not communicated with the MO vacuum tube, so that the first cleaning gas reaches the first normally closed pneumatic valve, the normally open pneumatic valve and the second normally closed pneumatic valve and is filled in the MO gas inlet pipeline and the MO gas outlet pipeline. And disconnecting the first normally closed pneumatic valve and the second normally closed pneumatic valve, respectively communicating the MO air inlet pipeline and the MO air outlet pipeline with the MO vacuum tube, and discharging the first cleaning gas and residual MO steam in the MO air inlet pipeline and the MO air outlet pipeline through the MO vacuum tube.
According to an embodiment of the present application, after introducing the first cleaning gas into the carrier gas inlet and cleaning the MO source pipeline by using the first cleaning gas, and before replacing the MO source steel cylinder and detecting whether the leak rate of the MO source pipeline satisfies the preset condition, the cleaning method further includes the following steps. And stopping introducing the first cleaning gas. And introducing a second cleaning gas into the carrier gas inlet and cleaning the MO source pipeline by using the second cleaning gas.
According to one embodiment of the present application, flowing a second purge gas into the carrier gas inlet and purging the MO source line with the second purge gas includes the following steps. And second cleaning gas is introduced into the carrier gas inlet, and the MO gas inlet pipeline and the MO gas outlet pipeline are not communicated with the MO vacuum tube respectively, so that the second cleaning gas reaches the first normally closed pneumatic valve, the normally open pneumatic valve and the second normally closed pneumatic valve and is filled in the MO gas inlet pipeline and the MO gas outlet pipeline. And disconnecting the first normally closed pneumatic valve and the second normally closed pneumatic valve, respectively communicating the MO air inlet pipeline and the MO air outlet pipeline with the MO vacuum tube, and discharging the second cleaning gas and other residual MO steam in the MO air inlet pipeline and the MO air outlet pipeline through the MO vacuum tube.
According to an embodiment of the application, the steps of replacing the MO source steel cylinder and detecting whether the leakage rate of the MO source pipeline meets the preset condition or not comprise the following steps. And the MO vacuum pipe is controlled to be communicated with and disconnected from the MO air inlet pipeline and the MO air outlet pipeline through the first vacuum hand valve and the second vacuum hand valve respectively. An MO VCR inlet port is arranged between the MO inlet hand valve and the MO inlet pipeline, and an MO VCR outlet port is arranged between the MO outlet hand valve and the MO outlet pipeline. And closing the first vacuum hand valve and the second vacuum hand valve, and communicating the first normally-closed pneumatic valve and the second normally-closed pneumatic valve respectively so as to blow out the second cleaning gas from the MO VCR gas inlet port and the MO VCR gas outlet port. And replacing the MO source steel cylinder and VCR gaskets at the MO VCR inlet port and the MO VCR outlet port. And closing the first normally closed pneumatic valve and the second normally closed pneumatic valve, detecting leakage through a leak detector connected to one end of the MO vacuum tube, and inputting helium to the MO VCR inlet port and the MO VCR outlet port to determine whether the leakage rate meets preset conditions.
According to an embodiment of the present application, the re-cleaning of the MO source line comprises the following steps. And cleaning the MO source pipeline by using a second cleaning gas. And stopping introducing the second cleaning gas. The MO source line is purged with a first purge gas. It will be appreciated that after the leak rate meets the preset conditions and the re-purge is completed, the communicating air tube shorting the normally open pneumatic valve is removed.
According to an embodiment of the present application, the first purge gas comprises hydrogen and the second purge gas comprises nitrogen.
According to an embodiment of the present application, the cleaning method includes the following steps. The first cleaning gas reaches the first normally closed pneumatic valve, the normally open pneumatic valve and the second normally closed pneumatic valve through the first mass flow controller and the second mass flow controller respectively, wherein the first mass flow controller is connected between the first normally closed pneumatic valve and the carrier gas inlet, and the second mass flow controller is connected between the second normally closed pneumatic valve and the carrier gas inlet. The second purge gas reaches the first normally closed pneumatic valve, the normally open pneumatic valve, and the second normally closed pneumatic valve via the first mass flow controller and the second mass flow controller, respectively.
According to an embodiment of the present application, wherein the MO source line is further provided with a pressure controller, one end of the pressure controller is connected between the second mass flow controller and the second normally closed pneumatic valve.
According to a first aspect of the present application, there is provided an MO source line. Wherein, this MO source pipeline includes MO air inlet pipeline and MO air outlet pipeline be connected with the MO source steel bottle respectively, MO air inlet pipeline is connected with carrier gas inlet via first normally closed pneumatic valve, MO air outlet pipeline is connected with carrier gas inlet via second normally closed pneumatic valve, be connected with normally open pneumatic valve between the air inlet of first normally closed pneumatic valve and the gas outlet of second normally closed pneumatic valve, and MO air inlet pipeline and MO air outlet pipeline are connected with the MO vacuum tube respectively, before letting in cleaning gas through carrier gas inlet and wasing MO source pipeline, normally open pneumatic valve is in the intercommunication state through the intercommunication trachea short circuit, when letting in cleaning gas, MO air inlet pipeline and MO air outlet pipeline do not communicate with each other between the MO vacuum tube, and when discharging cleaning gas, MO air inlet pipeline and MO air outlet pipeline communicate with the MO vacuum tube respectively. It will be appreciated that the MO source line provided in the second aspect of the present application is suitable for cleaning according to the cleaning method of the first aspect and any embodiment thereof.
The MO source pipeline and the cleaning method thereof can enhance the cleaning effect on the MO source pipeline, especially after long-time repeated use, the MO air inlet pipeline of the MO source pipeline and the inner pipe wall of the MO air outlet pipeline can still be kept clean and smooth, the stability of the process is ensured, meanwhile, because the diffusion of impurities among different pipelines and the diffusion of air impurities to the pipelines are reduced, the circulation frequency of pipeline cleaning can be further reduced, and the production utilization rate of MOCVD machine tables is improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 shows a flow diagram of a method of cleaning a MO source line according to the present application;
fig. 2 shows a flow chart of a method of cleaning a MO source line according to an embodiment of the present application;
FIG. 3 is a schematic diagram showing the normal operating condition of a normally open pneumatic valve when normally connected;
FIG. 4 shows a schematic diagram of a shorted operating condition of a normally open pneumatic valve according to an embodiment of the present application;
fig. 5 shows a schematic diagram of the MO source line of the present application.
Description of reference numerals:
10-carrier gas inlet; 20-a first mass flow controller; 30-a second mass flow controller; 41-a first normally closed pneumatic valve; 42-a second normally closed pneumatic valve; 43-normally open pneumatic valve; 51-a first vacuum hand valve; 52-second vacuum hand valve; a 61-MO VCR inlet port; 62-MO VCR outlet port; 71-MO air inlet hand valve; 72-MO air outlet hand valve; an 81-MO air inlet line; 82-MO gas outlet pipeline; 90-a pressure controller; a 100-MO source steel cylinder; a 101-MO leak detection port; 102-MO vacuum tubes; 103-MO vacuum valve; 104-a pump; 105-a tail drain; 412-connecting the gas pipe 3; 413-trachea; 423-trachea.
Detailed Description
In order to make those skilled in the art better understand the technical solutions of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Before discussing exemplary embodiments in greater detail, it should be noted that some exemplary embodiments are described as processes or methods depicted as flowcharts. Although a flowchart may describe the steps as a sequential process, many of the steps can be performed in parallel, concurrently or simultaneously. In addition, the order of the steps may be rearranged. The process may be terminated when its operations are completed, but may have additional steps not included in the figure.
MO sources (metal organic sources) are in a wide variety, more than 70 MO sources are used in research and production, the concept of MO sources is beyond the scope of metal organic compounds, and now the meaning of MO sources is: since metals or elemental organic compounds used as basic materials in MOCVD epitaxy are collectively called MO sources, MO sources are commonly referred to as "precursors of MOCVD (Precursor)" in foreign literature. However, in the development and production of compound semiconductor materials, hydrides (e.g. NH) of elements other than groups V and VI elements are removed3、AsH3、H2Se, etc.), the high-purity base materials used in the MOCVD process are mainly metal organic compounds of groups ii and iii (such as TMGa, DMCd, etc.) and organic compounds of group v and vi elements (TBP, TBAs, etc.), and the group v and vi materials used in the MOCVD process are still mainly hydrides of the elements at present.
In the traditional cleaning method of the MO source pipeline, the pipe wall cleanliness of the cleaning pipeline is deteriorated due to the mutual diffusion of residual impurities between the MO vacuum pipe and the cleaning pipelines of different MO sources and the entrance of air and other impurities when the source bottle is disassembled, so that the stability of the process is influenced.
Based on this, this application provides a cleaning method of MO source pipeline, compares in traditional method, in the cleaning method of MO source pipeline according to this application embodiment, with the normal open valve short circuit between MO inlet line and the MO outlet line, adopted two kinds of different purge gas to wash simultaneously to close the vacuum hand valve in the cleaning process, make the cleaning method that this application provided not only can strengthen the pipeline cleaning performance, improve cleaning efficiency, can prevent moreover that impurity from diffusing between the different pipelines.
In a first aspect, the present application provides a method of cleaning an MO source line. The MO source pipeline comprises an MO air inlet pipeline 81 and an MO air outlet pipeline 82 which are respectively connected with the MO source steel cylinder 100, the MO air inlet pipeline 81 is communicated with the carrier gas inlet 10 through a first normally closed air-operated valve 41, the MO air outlet pipeline 82 is communicated with the carrier gas inlet 10 through a second normally closed air-operated valve 42, a normally open air-operated valve 43 is connected between the air inlet of the first normally closed air-operated valve 41 and the air outlet of the second normally closed air-operated valve 42, and the MO air inlet pipeline 81 and the MO air outlet pipeline 82 are respectively connected with the MO vacuum pipe 102.
The method for cleaning the MO source line provided in the present application will be described in detail below with reference to fig. 1. Fig. 1 shows a flow chart of a method of cleaning a MO source line according to the present application. As shown in fig. 1, the cleaning method of the present application includes steps 100 to 700. Step 100: the MO inlet hand valve 71 connected between the MO source cylinder 100 and the MO inlet line 81 and the MO outlet hand valve 72 connected between the MO source cylinder 100 and the MO outlet line 82 are closed. Step 200: the normally open air-operated valve 43 is short-circuited by the communication air pipe 412 so that the normally open air-operated valve 43 is in a communication state. Step 300: a first cleaning gas is introduced into the carrier gas inlet 10 and used to clean the MO source line. Step 600: and replacing the MO source steel cylinder and detecting whether the leakage rate of the MO source pipeline meets the preset condition. Step 700: when the leak rate of the MO source line satisfies the preset condition, the MO source line is cleaned again, and then the communication air pipe 412 short-circuited with the normally open pneumatic valve 43 is removed.
The details of the above steps will be described separately below.
Step 100: the MO inlet hand valve 71 connected between the MO source cylinder 100 and the MO inlet line 81 and the MO outlet hand valve 72 connected between the MO source cylinder 100 and the MO outlet line 82 are closed.
For the MOCVD process, the MO source in the MO source cylinder 100 is continuously consumed as the deposition process proceeds. When the MO source in the MO source steel cylinder 100 is reduced to a specific value, the MO source needs to be replaced and the MO source pipeline needs to be cleaned. In this application, when cleaning the MO source line, first, the MO inlet hand valve 71 connected between the MO source cylinder 100 and the MO inlet line 81 is closed, and the MO outlet hand valve 72 connected between the MO source cylinder 100 and the MO outlet line 82 is closed. Purging of the MO source line may be performed after closing MO inlet hand valve 71 and MO outlet hand valve 72.
Step 200: the normally open air-operated valve 43 is short-circuited by the communication air pipe 412 so that the normally open air-operated valve 43 is in a communication state.
It can be understood that the normally open pneumatic valve means that the valve of the normally open pneumatic valve is in an open state (the air path is open) in a state without a control air source; when the control air source is connected, the valve of the normally open pneumatic valve is in a closed state (the air path is broken). The normally closed pneumatic valve is in a state that a valve of the normally closed pneumatic valve is closed (an air path is broken) under the state that an air source is not controlled; when the control air source is connected, the valve of the normally closed pneumatic valve is in an open state (the air path is open).
Fig. 3 shows a schematic view of the operation state of the normally open air-operated valve 43 in the normal connection. The drawing on the left side of fig. 3 shows the operation state of each valve when the air pipes 413 and 423 are not ventilated, in which the normally open air-operated valve 43 is in an open state (the air passage is open), and the first and second normally closed air-operated valves 41 and 42 are disconnected. The drawing on the right side of fig. 3 shows the operation state of each valve when the air pipe 413 and the air pipe 423 are ventilated, in which the normally-open air-operated valve 43 is in a closed state (the air passage is broken), and the first normally-closed air-operated valve 41 and the second normally-closed air-operated valve 42 are communicated.
Fig. 4 shows a schematic view of the operation state of the normally open air-operated valve 43 at the time of short circuit according to the embodiment of the present application. The normally open air-operated valve 43 is short-circuited by the communication air pipe 412, that is, the normally open air-operated valve 43 is always in the communication state. The drawing on the left side of fig. 4 shows the operation state diagram of each valve when the air pipe 412 is not ventilated, in which the first normally-closed air-operated valve 41 and the second normally-closed air-operated valve 42 are disconnected. The drawing on the right side of fig. 4 shows the operation state diagram of each valve when the air pipe 412 is ventilated, in which the first normally-closed air-operated valve 41 and the second normally-closed air-operated valve 42 are communicated.
In the cleaning method for the MO source pipeline of the present application, the normally open pneumatic valve 43 is short-circuited by the communication air pipe 412, so that the normally open pneumatic valve 43 is always in a communication state in the cleaning process of the MO source pipeline.
The normally open pneumatic valve 43 is always in a communication state by short-circuiting the normally open pneumatic valve 43 (also referred to as a normal-open valve), so that the normally open pneumatic valve 43 itself can be well cleaned in the cleaning process of the MO source pipeline, and moreover, the normally open pneumatic valve 43 always in the communication state is more favorable for the flow of the cleaning gas (including the first cleaning gas and the second cleaning gas).
Step 300: a first cleaning gas is introduced into the carrier gas inlet 10 and used to clean the MO source line.
In one embodiment, the first purge gas is hydrogen. Because of the small molecules of the hydrogen, possible small residual impurities on the tube wall of the MO source pipeline can be removed.
It is understood that in another embodiment, the first purge gas may also be nitrogen.
In one embodiment of the present application, step 300 includes step 302 and step 304. Step 302 and step 304 are described in detail later.
Step 302: a first cleaning gas is introduced into the carrier gas inlet 10, and the MO inlet line 81 and the MO outlet line 82 are not communicated with the MO vacuum pipe 102, so that the first cleaning gas reaches the first normally closed pneumatic valve 41, the normally open pneumatic valve 43, and the second normally closed pneumatic valve 42, and fills the MO inlet line 81 and the MO outlet line 82.
As shown in fig. 5, in the process of executing step 302, the first vacuum hand valve 51 and the second vacuum hand valve 52 corresponding to the MO inlet line 81 and the MO outlet line 82, respectively, are closed, and the MO vacuum valve 103 is closed.
In one embodiment of the cleaning method of the present application, the first cleaning gas reaches the first normally closed air-operated valve 41, the normally open air-operated valve 43, and the second normally closed air-operated valve 42 via the first mass flow controller 20 and the second mass flow controller 30, respectively, wherein the first mass flow controller 20 is connected between the first normally closed air-operated valve 41 and the carrier gas inlet 10, and the second mass flow controller 30 is connected between the second normally closed air-operated valve 42 and the carrier gas inlet 10. It is understood that when the first purge gas reaches the first normally closed air-operated valve 41, the normally open air-operated valve 43, and the second normally closed air-operated valve 42, the first normally closed air-operated valve 41, the normally open air-operated valve 43, and the second normally closed air-operated valve 42 are all in the communication state.
Referring to fig. 5, the MO source line of the present application is further provided with a pressure controller 90, and one end of the pressure controller 90 is connected between the second mass flow controller 30 and the second normally-closed pneumatic valve 42.
The first purge gas is filled in the MO inlet line 81 and the MO outlet line 82 for 5s to 15s by the pressure controller 90.
In one embodiment of the cleaning method of the present application, the flow rates of the first and second mass flow controllers 20 and 30 are set to 80% to 100% of the actual range, and the output pressure of the first pressure controller 90 is set to 2000mbar to 2500 mbar. The flow settings of the first and second mass flow controllers 20 and 30 can increase the flow of the purge gas (including the first and second purge gases) and save purge time. The output pressure setting of the first pressure controller 90 is advantageous to fill the MO inlet line 81 and the MO outlet line 82 with cleaning gas (including the first cleaning gas and the second cleaning gas).
Step 304: the first and second normally closed pneumatic valves 41 and 42 are disconnected to communicate the MO inlet line 81 and the MO outlet line 82 with the MO vacuum line 102, respectively, and to discharge the first cleaning gas and the residual MO vapor in the MO inlet line 1 and the MO outlet line 82 via the MO vacuum line 102.
Referring to fig. 5, the MO source pipeline of the present application further includes a MO vacuum tube 102. An MO vacuum line 102 has an MO leak detection port 101 at one end and is connected to a pump 104 via an MO vacuum valve 103 at the other end, and the pump 104 discharges gas from a tail discharge port 105.
In addition, the MO source line of the present application further comprises a first vacuum hand valve 51 and a second vacuum hand valve 52, such that the MO inlet line 81 is in operable communication with the MO vacuum line 102 via the first vacuum hand valve 51, and the MO outlet line 82 is in operable communication with the MO vacuum line 102 via the second vacuum hand valve 52.
It should be understood that when the first cleaning gas is filled in the MO inlet line 81 and the MO outlet line 82 by the pressure controller 90, the first vacuum hand valve 51 and the second vacuum hand valve 52 are in a closed state, and the MO vacuum valve 103 is in an open state. When the lines are cleaned, the first vacuum hand valve 51 and the second vacuum hand valve 52 are closed, so that the residual impurities in the MO vacuum line 102 can be prevented from diffusing into the MO inlet line 81 and the MO outlet line 82, and particularly, when two or more MO sources are replaced, the residual impurities in the MO inlet line 81 and the MO outlet line 82 of different MO sources can be prevented from diffusing into each other. Because MOCVD MO sources are of various types and numbers, sometimes two or more MO sources are replaced at the same time, and the pipelines of each MO source are connected with the MO vacuum pipes through respective vacuum hand valves. Therefore, when the cleaning gas is flushed into the MO pipeline, the MO vacuum valve is closed to prevent impurities or MO source steam of different MO source pipelines from mutually diffusing in the pipeline.
When the first pneumatic valve 41 and the second pneumatic valve 42 are disconnected, the first vacuum hand valve 51 and the second vacuum hand valve 52 are opened, and the MO vacuum valve 103 is communicated, the first cleaning gas and the residual MO vapor in the MO inlet pipeline 81 and the MO outlet pipeline 82 enter the MO vacuum pipe 102 through the first vacuum hand valve 51 and the second vacuum hand valve 52, and are pumped away by the pump 104 through the MO vacuum valve 103, and finally the pump 104 discharges the first cleaning gas and the residual MO vapor from the tail discharge port 105 to the tail gas treatment system, wherein the process lasts for 20s to 40 s.
In the present application, the MO source line can be cleaned through the operations of step 100 to step 300.
In one embodiment of the method for purging a MO source line of the present application, steps 302 and 304 comprise a cyclic purge with a first purge gas. To achieve the desired MO source line cleaning effect, steps 302 and 304 include performing the above operations of step 302 and the above operations of step 304 in a 20 to 30 cycle-by-cycle sequence. That is, upon completion of one purge with the first purge gas, the operation of step 302 and the operation of step 304 are sequentially cyclically performed 20 to 30 times (i.e., the first purge gas cyclically purges the MO source line 20 to 30 times), thereby achieving a desired purge effect.
Step 600: and replacing the MO source steel cylinder 100 and detecting whether the leakage rate of the MO source pipeline meets the preset condition.
Step 700: when the leak rate of the MO source pipeline meets the preset condition, the MO source pipeline is cleaned again, and then the communication air pipe 412 which short-circuits the normally open pneumatic valve is removed.
As shown in fig. 2, in one embodiment of the cleaning method of the present application, after introducing the first cleaning gas into the carrier gas inlet 10 and cleaning the MO source line with the first cleaning gas (i.e., after step 300), and before replacing the MO source cylinder 100 and detecting whether the leak rate of the MO source line satisfies the predetermined condition, the cleaning method of the MO source line of the present application further includes steps 400 to 500.
Step 400: and stopping introducing the first cleaning gas.
Step 500: a second cleaning gas is introduced into the carrier gas inlet 10 and the MO source line is cleaned with the second cleaning gas.
In one embodiment of the present application, step 500 includes step 502 and step 504.
Step 502: the second cleaning gas is introduced into the carrier gas inlet 10, and the MO gas inlet line 81 and the MO gas outlet line 82 are not communicated with the MO vacuum tube 102, respectively, so that the second cleaning gas reaches the first normally closed pneumatic valve 41, the normally open pneumatic valve 43, and the second normally closed pneumatic valve 42, and fills the MO gas inlet line 81 and the MO gas outlet line 82.
Step 504: the first and second normally-closed air-operated valves 41 and 42 are opened to communicate the MO inlet line 81 and the MO outlet line 82 with the MO vacuum line 102, respectively, and to discharge the second cleaning gas and other residual MO vapors in the MO inlet line 81 and the MO outlet line 82 via the MO vacuum line 102.
In one embodiment, the second purge gas is nitrogen.
It should be understood that the operations of step 502 and step 504 described above are the same as the operations of step 302 and step 304, except that step 302 and step 04 are performed by introducing the first cleaning gas from carrier gas inlet 10 and removing the first cleaning gas and a portion of the residual MO vapor, while step 502 and step 504 are performed by replacing the first cleaning gas introduced from carrier gas inlet 10 with the second cleaning gas and removing the second cleaning gas and additional residual MO vapor (additional residual MO vapor may be understood as MO vapor remaining after the last cleaning).
In one embodiment of the method for purging a MO source line of the present application, steps 502 and 504 comprise a cyclical purge with a second purge gas. In order to achieve the desired MO source line cleaning effect, steps 502 and 504 include performing the above operation of step 502 and the above operation of step 504 cyclically from 5 to 10 times in sequence. That is, upon completion of one purge with the second purge gas, the operation of step 502 and the operation of step 504 are sequentially cyclically performed 5 to 10 times (i.e., the second purge gas cyclically purges the MO source line 5 to 10 times).
It should be understood that the steps 400 to 500 are described above for safety reasons, and that flammable and explosive hydrogen is exchanged for inert nitrogen.
In one embodiment of the method for cleaning an MO source line of the present application, the steps of replacing the MO source cylinder 100 and detecting whether the leak rate of the MO source line satisfies the predetermined condition (i.e., step 600) further include the following steps.
The connection and disconnection between the MO vacuum pipe 102 and the MO inlet pipe 81 and the MO outlet pipe 82 are controlled by the first vacuum hand valve 51 and the second vacuum hand valve 52, respectively. An MO VCR (Vacuum coupled radial) inlet port 61 is provided between the MO inlet hand valve 71 and the MO inlet line 81, and an MO VCR outlet port 62 is provided between the MO outlet hand valve 72 and the MO outlet line 82. The first vacuum hand valve 51 and the second vacuum hand valve 52 are closed to communicate the first normally-closed air-operated valve 41 and the second normally-closed air-operated valve 42, respectively, so that the second purge gas is blown out from the MO VCR air-in port 61 and MO VCR air-out port 62. The MO source cylinder 100 is replaced with VCR gaskets at the MO VCR inlet port 61 and MO VCR outlet port 62. The first and second normally closed pneumatic valves 41 and 42 are closed, leak detection is performed by a leak detector connected to one end of the MO vacuum tube 102, and helium gas is input to the MO VCR air inlet port 61 and MO VCR air outlet port 62 to determine whether the leak rate satisfies a preset condition.
In the present embodiment, the second cleaning gas is blown out from the MO VCR inlet port 61 and MO VCR outlet port 62, and the second cleaning gas is nitrogen. The first cleaning gas which is hydrogen is stopped to be introduced, and the second cleaning gas which is nitrogen is used for replacing the first cleaning gas, so that the flammable and explosive hydrogen is replaced by inert nitrogen, and the safety is guaranteed.
In one embodiment of the method for cleaning an MO source line of the present application, the preset condition is that a leak rate detected by a leak detector is 1E to 10 or less.
The specific leak detection process and principles are described below.
(1) The leak detector is connected with the MO leak detection port 101, and a hand valve at the MO leak detection port 101 is closed at the moment;
(2) the leak detector utilizes a self molecular pump to pump vacuum, and the vacuum leak rate value is below 1E-10 (the unit is mbar.L/s, mbar.L/s);
(3) opening the hand valves at the MO leak detection port 101 (at this time, the first and second normally-closed air-operated valves 41 and 42 are closed, the MO vacuum valve 103 is closed, and the first and vacuum hand valves 51 and 52 are opened), and spraying helium gas with a helium gun at the MO VCR air inlet port 61 and MO VCR air outlet port 62;
(4) if the nuts for the MO VCR inlet port 61 and MO VCR outlet port 62 are not tightened or the replacement VCR gasket is not seated, helium gas with a smaller molecular volume will enter the MO line and reach the MO leak detector port 101 and be drawn away by the leak detector. If the leak rate of the leak detector rises due to the gas entering, the preset leak detection condition is not met (when the preset leak detection condition is leak detection, the leak rate of the leak detector needs to be kept unchanged).
When the MO source steel cylinder 100 is disassembled, the second cleaning gas is always blown out (i.e., nitrogen) from the MO VCR gas inlet port 61 and the MO VCR gas outlet port 62, so that external air and impurities can be prevented from entering the MO gas inlet pipeline 81 and the MO gas outlet pipeline 82, a good cleaning and protecting effect is achieved on the inner wall of the pipeline, and the nitrogen rushing out the air is safe and harmless. Compared with H2, the safety coefficient of N2 is high, and the environment of an epitaxial workshop absolutely prohibits the discharge of inflammable and explosive gases.
In an embodiment of the method for cleaning an MO source line of the present application, the above-mentioned cleaning an MO source line again includes steps 702 to 706. Step 702: the MO source line is purged with a second purge gas. Step 704: and stopping introducing the second cleaning gas. Step 706: the MO source line is purged with a first purge gas.
In one embodiment of the present application, step 702 described above includes the same operations as steps 502 and 504. That is, step 702 includes cyclically purging the MO source line 5 to 10 times with the second purge gas. The specific operation steps of step 702 are the same as those of step 500, and are not described herein again.
In one embodiment of the present application, step 704 described above includes the same operations as steps 302 and 304. That is, step 704 includes cyclically purging the MO source line 20 to 30 times with the first purge gas. The specific operation steps of step 704 are the same as step 300, and are not described herein again.
The communicating air pipe 412 of the normally open air-operated valve 43 is pulled out (i.e., the normally open air-operated valve 43 is restored to the communicating state when not ventilating and the cut-off state when ventilating), and the first and second mass flow controllers 20 and 30 are set to default values, the first pressure controller 90 is set to 1000mbar (room temperature 300K), and the MO air outlet hand valve 72 and the MO air inlet hand valve 71 are opened in sequence.
In one embodiment of the method for cleaning an MO source line of the present application, the method further includes the following steps. After the MO source cylinder 100 is replaced and the communication gas pipe 412 short-circuiting the normally open pneumatic valve 43 is removed, the MO gas outlet hand valve 72 and the MO gas inlet hand valve 71 are opened in sequence.
In the cleaning method of the MO source pipeline provided by the application, the MO air inlet pipeline 72 and the MO air outlet pipeline 71 are in short connection with a normally open valve, so that the flow of cleaning gas is facilitated, and the cleaning effect is enhanced. Meanwhile, two different cleaning gases (hydrogen and nitrogen) are adopted for cleaning, so that the cleaning effect can be further improved. Furthermore, the first vacuum hand valve 51 and the second vacuum hand valve 52 are closed during the cleaning process, so that the diffusion of impurities between different pipelines can be prevented. When the MO source steel cylinder 100 is disassembled, the cleaning gas is always blown out from the MO VCR gas inlet port 61 and the MO VCR gas outlet port 62, so that the external air and impurities can be prevented from entering the MO gas inlet pipeline 81 and the MO gas outlet pipeline 82, the inner wall of the pipeline can be well cleaned and protected, and the N2 rushing out the air is safe and harmless.
In one embodiment of the present application, when the first purge gas is nitrogen, there is no need to introduce the second purge gas for purging (since the second purge gas is also nitrogen). In this case, the number of purging cycles of the first purging gas may be increased. It should be understood that when the first cleaning gas is nitrogen, the step of switching to the second cleaning gas and the circulating operation thereof before the source change can be omitted in the above step, and the step of switching to the second cleaning gas and the circulating operation thereof after the source change leak detection is normal can be omitted.
It will be appreciated that purging with hydrogen and nitrogen, respectively, in the present application has the following advantages. The volume of hydrogen molecules is smaller than that of nitrogen, impurities remained on the pipe wall can be relatively cleaned, the nitrogen is inert gas, and 78% of the components in the air are nitrogen, so that the hydrogen is not flammable, explosive and non-toxic. Because the purge gas is flushed out of the VCR gas inlet and outlet ports into the air when the MO source cylinder is removed, air is prevented from entering the lines and contaminating the lines. Thus, nitrogen flushed out to air is safer than hydrogen. The reason why the last program is switched to nitrogen before source change is that nitrogen can be switched to hydrogen only by switching specific conditions due to the safety limit of the MOCVD system after the MO source steel cylinder (source change) is changed.
In a second aspect, the present application further provides an MO source line. The MO source pipeline comprises an MO inlet pipeline 81 and an MO outlet pipeline 82 which are respectively connected with an MO source steel cylinder 100, the MO inlet pipeline 81 is communicated with the carrier gas inlet 10 through a first normally closed pneumatic valve 41, the MO outlet pipeline 82 is communicated with the carrier gas inlet 10 through a second normally closed pneumatic valve 42, a normally open pneumatic valve 43 is connected between the air inlet of the first normally closed pneumatic valve 41 and the air outlet of the second normally closed pneumatic valve 42, and the MO gas inlet line 81 and the MO gas outlet line 82 are respectively connected to the MO vacuum pipe 102, before the MO source pipeline is cleaned by introducing cleaning gas through the carrier gas inlet 10, the normally open pneumatic valve 43 is in a communication state through short circuit of the communication air pipe 412, when the cleaning gas is introduced, the MO gas inlet pipeline 81 and the MO gas outlet pipeline 82 are not communicated with the MO vacuum pipe 102, and the MO gas inlet line 81 and the MO gas outlet line 82 are respectively communicated with the MO vacuum pipe 102 when discharging the cleaning gas. It will be appreciated that the MO source line provided in the second aspect of the present application is suitable for cleaning according to the cleaning method of the first aspect and any of its embodiments described above.
The MO source pipeline and the cleaning method thereof can enhance the cleaning effect on the MO source pipeline, especially after long-time repeated use, the MO air inlet pipeline of the MO source pipeline and the inner pipe wall of the MO air outlet pipeline can still be kept clean and smooth, the stability of the process is ensured, meanwhile, because the diffusion of impurities among different pipelines and the diffusion of air impurities to the pipelines are reduced, the circulation frequency of pipeline cleaning can be further reduced, and the production utilization rate of MOCVD machine tables is improved.
It will be understood that the invention is not limited to the examples described above, but that modifications and variations will occur to those skilled in the art in light of the above teachings, and that all such modifications and variations are considered to be within the scope of the invention as defined by the appended claims.
Claims (10)
1. The utility model provides a cleaning method of MO source pipeline, MO source pipeline includes MO air inlet pipeline and MO air outlet pipeline that is connected with MO source steel bottle respectively, MO air inlet pipeline via first normally closed pneumatic valve and carrier gas entry intercommunication, MO air outlet pipeline via second normally closed pneumatic valve with carrier gas entry intercommunication, be connected with normally open pneumatic valve between the air inlet of first normally closed pneumatic valve and the gas outlet of second normally closed pneumatic valve, just MO air inlet pipeline with MO air outlet pipeline is connected with the MO vacuum tube respectively, its characterized in that, cleaning method includes:
closing an MO gas inlet hand valve connected between the MO source steel cylinder and the MO gas inlet pipeline and an MO gas outlet hand valve connected between the MO source steel cylinder and the MO gas outlet pipeline;
the normally open pneumatic valve is in a short circuit state by a communicating air pipe, so that the normally open pneumatic valve is in a communicating state when cleaning gas is introduced into the carrier gas inlet, wherein the cleaning gas comprises first cleaning gas;
introducing the first cleaning gas into the carrier gas inlet and cleaning the MO source pipeline by using the first cleaning gas;
replacing the MO source steel cylinder and detecting whether the leakage rate of the MO source pipeline meets a preset condition or not; and
when the leakage rate of the MO source pipeline meets the preset condition, the MO source pipeline is cleaned again, and then the communication air pipe which is in short connection with the normally-open pneumatic valve is removed.
2. The cleaning method of claim 1, wherein passing the first cleaning gas into the carrier gas inlet and cleaning the MO source line with the first cleaning gas comprises:
introducing the first cleaning gas into the carrier gas inlet, wherein the MO gas inlet pipeline and the MO gas outlet pipeline are not communicated with the MO vacuum pipe, so that the first cleaning gas reaches the first normally closed pneumatic valve, the normally open pneumatic valve and the second normally closed pneumatic valve and fills the MO gas inlet pipeline and the MO gas outlet pipeline; and
and disconnecting the first normally closed pneumatic valve and the second normally closed pneumatic valve, communicating the MO air inlet pipeline and the MO air outlet pipeline with the MO vacuum tube respectively, and discharging the first cleaning gas and residual MO steam in the MO air inlet pipeline and the MO air outlet pipeline through the MO vacuum tube.
3. The cleaning method according to claim 1 or 2, wherein after introducing the first cleaning gas into the carrier gas inlet and cleaning the MO source pipeline by using the first cleaning gas, and before replacing the MO source steel cylinder and detecting whether the leakage rate of the MO source pipeline satisfies the preset condition, the cleaning method further comprises:
stopping introducing the first cleaning gas, wherein the cleaning gas also comprises a second cleaning gas; and
and introducing the second cleaning gas into the carrier gas inlet and cleaning the MO source pipeline by using the second cleaning gas.
4. The cleaning method of claim 3, wherein passing the second cleaning gas into the carrier gas inlet and cleaning the MO source line with the second cleaning gas comprises:
introducing the second cleaning gas into the carrier gas inlet, wherein the MO gas inlet pipeline and the MO gas outlet pipeline are not communicated with the MO vacuum pipe respectively, so that the second cleaning gas reaches the first normally closed pneumatic valve, the normally open pneumatic valve and the second normally closed pneumatic valve and fills the MO gas inlet pipeline and the MO gas outlet pipeline; and
and disconnecting the first normally closed pneumatic valve and the second normally closed pneumatic valve, communicating the MO air inlet pipeline and the MO air outlet pipeline with the MO vacuum tube respectively, and discharging the second cleaning gas and other residual MO steam in the MO air inlet pipeline and the MO air outlet pipeline through the MO vacuum tube.
5. The cleaning method according to claim 3 or 4, wherein the replacing the MO source steel cylinder and detecting whether the leakage rate of the MO source pipeline meets the preset condition comprises:
the MO vacuum pipe is controlled to be communicated with and disconnected from the MO air inlet pipeline and the MO air outlet pipeline through a first vacuum hand valve and a second vacuum hand valve respectively;
an MO VCR air inlet port is arranged between the MO air inlet hand valve and the MO air inlet pipeline, and an MO VCR air outlet port is arranged between the MO air outlet hand valve and the MO air outlet pipeline;
closing the first vacuum hand valve and the second vacuum hand valve, and communicating the first normally-closed pneumatic valve and the second normally-closed pneumatic valve respectively, so that the second cleaning gas is blown out from the MO VCR inlet port and the MO VCR outlet port;
replacing VCR gaskets at the MO source steel cylinder, the MO VCR inlet port and the MO VCR outlet port; and
and closing the first normally closed pneumatic valve and the second normally closed pneumatic valve, detecting leakage through a leak detector connected to one end of the MO vacuum tube, and inputting helium into the MO VCR air inlet port and the MO VCR air outlet port to determine whether the leakage rate meets the preset condition.
6. The cleaning method of claim 5, wherein said re-cleaning said MO source line includes:
cleaning the MO source pipeline by using the second cleaning gas;
stopping introducing the second cleaning gas; and
and cleaning the MO source pipeline by using the first cleaning gas.
7. The cleaning method of claim 3, wherein the first cleaning gas comprises hydrogen and the second cleaning gas comprises nitrogen.
8. The cleaning method according to claim 4, wherein:
the first purge gas reaches the first normally closed pneumatic valve, the normally open pneumatic valve, and the second normally closed pneumatic valve via a first mass flow controller and a second mass flow controller, respectively, wherein the first mass flow controller is connected between the first normally closed pneumatic valve and the carrier gas inlet, and the second mass flow controller is connected between the second normally closed pneumatic valve and the carrier gas inlet; and
the second purge gas reaches the first normally closed pneumatic valve, the normally open pneumatic valve, and the second normally closed pneumatic valve via the first mass flow controller and the second mass flow controller, respectively.
9. The cleaning method according to claim 8, comprising:
the MO source pipeline is further provided with a pressure controller, and one end of the pressure controller is connected between the second mass flow controller and the second normally-closed pneumatic valve.
10. The MO source pipeline is characterized by comprising an MO air inlet pipeline and an MO air outlet pipeline which are respectively connected with an MO source steel cylinder, wherein the MO air inlet pipeline is communicated with a carrier gas inlet through a first normally closed pneumatic valve, the MO air outlet pipeline is communicated with the carrier gas inlet through a second normally closed pneumatic valve, a normally open pneumatic valve is connected between an air inlet of the first normally closed pneumatic valve and an air outlet of the second normally closed pneumatic valve, the MO air inlet pipeline and the MO air outlet pipeline are respectively connected with an MO vacuum tube, the normally open pneumatic valve is in a communication state through a communication air tube short circuit before the MO source pipeline is cleaned by introducing cleaning gas through the carrier gas inlet, the normally open pneumatic valve is in a communication state when the cleaning gas is introduced, and the MO air inlet pipeline and the MO air outlet pipeline are not communicated with the MO vacuum tube, and when the cleaning gas is discharged, the MO gas inlet pipeline and the MO gas outlet pipeline are respectively communicated with the MO vacuum tube.
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| CN202010941222.9A CN113441487B (en) | 2020-09-09 | 2020-09-09 | MO source pipeline and cleaning method thereof |
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| CN202010941222.9A CN113441487B (en) | 2020-09-09 | 2020-09-09 | MO source pipeline and cleaning method thereof |
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| CN118793813B (en) * | 2024-09-14 | 2025-01-10 | 苏州中科重仪半导体材料有限公司 | A MO source bottle switch structure |
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Address after: 402760 No.69, Wushan Road, Biquan street, Bishan District, Chongqing Patentee after: Chongqing Kangjia Optoelectronic Technology Co.,Ltd. Country or region after: China Address before: 402760 No.69, Wushan Road, Biquan street, Bishan District, Chongqing Patentee before: Chongqing Kangjia Photoelectric Technology Research Institute Co.,Ltd. Country or region before: China |